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WO2011108878A3 - 그래핀을 이용한 전자파 차폐 방법 및 전자파 차폐재 - Google Patents

그래핀을 이용한 전자파 차폐 방법 및 전자파 차폐재 Download PDF

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Publication number
WO2011108878A3
WO2011108878A3 PCT/KR2011/001491 KR2011001491W WO2011108878A3 WO 2011108878 A3 WO2011108878 A3 WO 2011108878A3 KR 2011001491 W KR2011001491 W KR 2011001491W WO 2011108878 A3 WO2011108878 A3 WO 2011108878A3
Authority
WO
WIPO (PCT)
Prior art keywords
electromagnetic shielding
graphene
shielding material
electromagnetic
shielding method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/001491
Other languages
English (en)
French (fr)
Other versions
WO2011108878A2 (ko
Inventor
홍병희
최재붕
김영진
김형근
배수강
강준모
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sungkyunkwan University Foundation for Corporate Collaboration
Original Assignee
Sungkyunkwan University Foundation for Corporate Collaboration
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sungkyunkwan University Foundation for Corporate Collaboration filed Critical Sungkyunkwan University Foundation for Corporate Collaboration
Priority to US13/582,944 priority Critical patent/US20130068521A1/en
Publication of WO2011108878A2 publication Critical patent/WO2011108878A2/ko
Publication of WO2011108878A3 publication Critical patent/WO2011108878A3/ko
Anticipated expiration legal-status Critical
Priority to US16/025,118 priority patent/US11071241B2/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073—Shielding materials
    • H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0084—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/16—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073—Shielding materials
    • H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

본원은 전자파 발생원의 내부 또는 외부에 그래핀 및/또는 기재 상에 형성된 그래핀을 이용하여 전자파를 차폐시키 방법 및 그래핀을 포함하는 전자파 차폐재에 관한 것이다.
PCT/KR2011/001491 2010-03-05 2011-03-04 그래핀을 이용한 전자파 차폐 방법 및 전자파 차폐재 Ceased WO2011108878A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/582,944 US20130068521A1 (en) 2010-03-05 2011-03-04 Electromagnetic shielding method using graphene and electromagnetic shiedling material
US16/025,118 US11071241B2 (en) 2010-03-05 2018-07-02 Electromagnetic shielding method using graphene and electromagnetic shielding material

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20100020069 2010-03-05
KR10-2010-0020069 2010-03-05

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US13/582,944 A-371-Of-International US20130068521A1 (en) 2010-03-05 2011-03-04 Electromagnetic shielding method using graphene and electromagnetic shiedling material
US16/025,118 Continuation-In-Part US11071241B2 (en) 2010-03-05 2018-07-02 Electromagnetic shielding method using graphene and electromagnetic shielding material

Publications (2)

Publication Number Publication Date
WO2011108878A2 WO2011108878A2 (ko) 2011-09-09
WO2011108878A3 true WO2011108878A3 (ko) 2012-01-12

Family

ID=44542735

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/001491 Ceased WO2011108878A2 (ko) 2010-03-05 2011-03-04 그래핀을 이용한 전자파 차폐 방법 및 전자파 차폐재

Country Status (3)

Country Link
US (1) US20130068521A1 (ko)
KR (1) KR101171818B1 (ko)
WO (1) WO2011108878A2 (ko)

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KR200460258Y1 (ko) * 2011-10-05 2012-05-23 (주)제이엔에이치네트웍스 전자파 차단 기능을 갖는 휴대용 단말기 화면 보호 필름
KR101292643B1 (ko) 2011-10-26 2013-08-02 성균관대학교산학협력단 그래핀을 포함하는 전자파 감쇄 및 방열용 필름 및 이를 포함하는 전자기 소자
WO2013077108A1 (ja) * 2011-11-24 2013-05-30 タツタ電線株式会社 シールドフィルム、シールドプリント配線板、及び、シールドフィルムの製造方法
DE102013210162B4 (de) 2012-06-14 2020-01-23 International Business Machines Corporation Strukturen auf Graphen-Basis und Verfahren zum Abschirmen elektromagnetischer Strahlung
US9413075B2 (en) 2012-06-14 2016-08-09 Globalfoundries Inc. Graphene based structures and methods for broadband electromagnetic radiation absorption at the microwave and terahertz frequencies
US9174413B2 (en) 2012-06-14 2015-11-03 International Business Machines Corporation Graphene based structures and methods for shielding electromagnetic radiation
KR101980711B1 (ko) 2012-11-16 2019-08-28 엘지전자 주식회사 그래핀 전자파 차단판, 이의 제조방법 및 이를 이용하는 전자기기 및 전자레인지의 도어
US9991023B2 (en) * 2013-01-29 2018-06-05 Creganna Unlimited Company Interconnect cable having insulated wires with a conductive coating
US20140209347A1 (en) 2013-01-29 2014-07-31 Tyco Electronics Corporation Cable Having a Sparse Shield
US9627485B2 (en) * 2013-03-15 2017-04-18 University Of Southern California Vapor-trapping growth of single-crystalline graphene flowers
KR102055361B1 (ko) 2013-06-05 2019-12-12 삼성전자주식회사 반도체 패키지
KR101982157B1 (ko) * 2013-11-18 2019-05-24 한화에어로스페이스 주식회사 그래핀층을 포함하는 전자기기 제조방법
CN104495821B (zh) * 2014-12-16 2016-06-15 重庆墨希科技有限公司 一种单层连续石墨烯薄膜卷材的制备方法及装置
CN104495822B (zh) * 2014-12-16 2016-06-15 重庆墨希科技有限公司 一种石墨烯薄膜卷材的制备方法及装置
ES2579003B1 (es) 2014-12-31 2017-04-18 General Equipment For Medical Imaging, S.A. Apantallamiento de radiofrecuencia para equipos de imagen híbridos
US10490314B2 (en) 2015-08-12 2019-11-26 King Abdulaziz University Graphene oxide free-standing film and methods for shielding electromagnetic radiation at microwave frequencies
WO2017068931A1 (ja) * 2015-10-20 2017-04-27 国立研究開発法人産業技術総合研究所 電磁波吸収遮蔽体及びその製造方法
KR102642749B1 (ko) 2016-09-07 2024-03-04 엘지전자 주식회사 다중 도핑된 그래핀 및 그 제조방법
CN106653931B (zh) * 2016-12-27 2018-02-23 中国建筑材料科学研究总院 石墨烯基透红外电磁屏蔽滤波器、硫化锌窗口及其制备方法
KR102338593B1 (ko) 2017-03-24 2021-12-14 서울대학교산학협력단 기능성 콘택트 렌즈 및 이의 제조방법
US11629420B2 (en) * 2018-03-26 2023-04-18 Global Graphene Group, Inc. Production process for metal matrix nanocomposite containing oriented graphene sheets
CN109526191B (zh) * 2018-10-15 2020-07-10 华中科技大学 一种石墨烯基电磁屏蔽复合材料
KR102370413B1 (ko) * 2018-11-07 2022-03-04 피아이첨단소재 주식회사 전자파 차폐성능이 우수한 폴리이미드 복합 필름 및 이를 제조하는 방법
CN109406899A (zh) * 2018-11-12 2019-03-01 中国科学院长春光学精密机械与物理研究所 主动式透光屏蔽薄膜屏蔽效能测试方法、装置及系统
EP3723122B1 (en) 2019-04-10 2023-02-15 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Component carrier comprising a double layer structure
ES2778548A1 (es) * 2019-11-25 2020-08-10 Santafe Jesus Perez Dispositivo para neutralizar la transmisión de ondas electromagnéticas por apantallamiento eletromagnético
US11770882B2 (en) 2020-03-31 2023-09-26 Midea Group Co., Ltd. Microwave cooking appliance with user interface display
US11765796B2 (en) 2020-03-31 2023-09-19 Midea Group Co., Ltd. Microwave cooking appliance with leak detection
US11849526B2 (en) 2020-03-31 2023-12-19 Midea Group Co., Ltd. Microwave cooking appliance with increased visibility into the cavity
CN111996795B (zh) * 2020-09-02 2023-01-03 江西龙泰新材料股份有限公司 电磁屏蔽复合膜布及制备方法
CN112698110A (zh) * 2020-12-09 2021-04-23 北京无线电测量研究所 一种用于测试材料屏蔽效能的测试方法及系统
KR102648577B1 (ko) 2022-07-07 2024-03-18 (주)라드피온 이온 주입을 이용한 고분자 재료의 전자파 차폐 및 정전기 방지 방법 방법
KR102692093B1 (ko) * 2023-11-24 2024-08-08 삼도에이티에스(주) 수용성 코팅액으로 코팅된 코팅층을 포함하는 친환경 전자파 차폐 테이프 및 이의 제조방법

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Also Published As

Publication number Publication date
WO2011108878A2 (ko) 2011-09-09
KR101171818B1 (ko) 2012-08-16
US20130068521A1 (en) 2013-03-21
KR20110101081A (ko) 2011-09-15

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