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WO2011101327A1 - Procédé de fabrication d'un creuset en verre de quartz - Google Patents

Procédé de fabrication d'un creuset en verre de quartz Download PDF

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Publication number
WO2011101327A1
WO2011101327A1 PCT/EP2011/052177 EP2011052177W WO2011101327A1 WO 2011101327 A1 WO2011101327 A1 WO 2011101327A1 EP 2011052177 W EP2011052177 W EP 2011052177W WO 2011101327 A1 WO2011101327 A1 WO 2011101327A1
Authority
WO
WIPO (PCT)
Prior art keywords
quartz glass
silica glass
granules
layer
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2011/052177
Other languages
German (de)
English (en)
Inventor
Walter Lehmann
Thomas Kayser
Michael Huenermann
Christian Nasarow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG filed Critical Heraeus Quarzglas GmbH and Co KG
Priority to JP2012553284A priority Critical patent/JP2013519624A/ja
Priority to CN2011800098057A priority patent/CN102753493A/zh
Publication of WO2011101327A1 publication Critical patent/WO2011101327A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles

Definitions

  • the invention relates to a method for producing a quartz glass crucible for pulling a single crystal by forming a graining layer in a melt mold and sintering or melting the same to form the quartz glass crucible.
  • Quartz glass crucibles are used to hold the molten metal when pulling single crystals using the so-called Czochralski process. Their preparation is usually carried out by the fact that on the inner wall of a melt mold, a layer of SiO 2 grain produced and this heated using an arc (plasma) and thereby sintered to the quartz glass crucible.
  • the wall of such a quartz glass crucible is usually formed by a heat-insulating outer layer of opaque quartz glass, which is provided with an inner layer of transparent, bubble-free as possible quartz glass.
  • the transparent inner layer is in contact with the silicon melt during the drawing process and is subject to high mechanical, chemical and thermal loads. Bubbles remaining in the inner layer grow under the influence of temperature and pressure and eventually burst, causing debris and impurities to enter the silicon melt, thereby providing a lower yield of dislocation-free silicon single crystal.
  • the inner layer In order to reduce the corrosive attack of the silicon melt and thus to minimize the release of impurities from the crucible wall, the inner layer is therefore as homogeneous as possible and low in bubbles. In contrast, for the outer layer for the purpose of thermal insulation usually sought a uniform, fine-grained as possible opacity. State of the art
  • a method of the type mentioned is known.
  • a vacuum melt mold is used to produce a quartz glass crucible.
  • a rotationally symmetrical, crucible-shaped graining layer of mechanically solidified quartz sand with a layer thickness of about 12 mm is formed using a forming template, onto which an inner grain layer of synthetically produced quartz glass powder is then likewise formed using a shaping template.
  • the synthetic quartz glass powder has particle sizes in the range of 50 to 120 ⁇ , wherein the average particle size is about 85 ⁇ .
  • Layer thickness of the inner grain layer is about 12 mm.
  • the sintering of the graining layers takes place from inside to outside by generating an arc in the interior of the melt mold, so that the finely divided quartz glass powder first sinters and forms a dense glass layer.
  • sol-gel methods and granulation methods are known.
  • a suspension is first produced from the loose SiO 2 soy dust by mixing in water and homogenization, this suspension is processed to SiO 2 granules by means of a wet granulation method, and these become dense after drying and cleaning by heating in a chlorine-containing atmosphere Quarzglaskörnung with a mean diameter of 140 ⁇ gesin- tert.
  • finely divided silica powder is passed between counter-rotating rollers, which may be smooth or profiled, and compacted into SiO 2 granules in the form of so-called "scabs."
  • scabs These form more or less band-shaped structures which are normally broken and sized Granules produced therefrom typically have rupture densities in the range of 185 to 700 g / l.
  • the slug fragments can be dried in a halogen-containing atmosphere at a temperature in the range from 400 to 1100 ° and densely sintered in the range from 1200 ° C. to 1700 ° C. to form a "silica glass granulate.”
  • EP 2 014 622 A1 describes one densely sintered silica glass granules produced in this way by breaking and sintering slugs, which are largely free of bubbles
  • the individual granules have diameters in the range of 10 to 140 ⁇ and the specific surface is less than 1 m 2 / g.
  • silica glass "slugs" or their fragments result in a low-dust, readily flowable "silica glass granules” with increased bulk density, which is fundamentally suitable for cost-effective production of high-purity quartz glass products. It turns out, however, that the starting material can be improved for applications with particularly high demands on the homogeneity of the quartz glass.
  • the invention has for its object to provide a method that allows a cost-effective production of quartz glass for a quartz glass crucible, which is characterized by high purity and allows both the reproducible setting of freedom from bubbles and a defined and homogeneous fine porosity.
  • silica powder provided according to process step (a) is present, for example, as pyrogenically produced, finely divided SiO 2 in the form of a soot dust consisting of discrete SiO 2 nanoparticles which may also be partially agglomerated to improve handling, for example by means of spray granulation.
  • the press rolls have mutually running, corresponding mold cavities which mutually terminate outwardly as the press rolls rotate, thereby producing tablet shaped moldings from the silica powder which is trapped between the adjacent mold cavities during rotation.
  • These are usually mirror-symmetrical depending on the internal geometry of the mold cavities and are in spheroidal, uniform geometry, in particular in spherical shape or in the form of flattened (oblate) ellipsoids or up to the cylindrical shape elongated (prolater) ellipsoids. In this way moldings are obtained inexpensively and with high purity, in reproducible size, shape and density.
  • the density of the molded compacts is adjustable via the roller pressure.
  • the press rollers exert-in contrast to the flaring method-a unidirectional pressing pressure on the fumed silica powder, so that the silica powder enclosed in the mold cavities experiences a compressive pressure acting on all sides, which leads to a spatially uniform compaction.
  • the adjustment of the density, which is variable in terms of the roller pressure interval, and its spatially uniform distribution also facilitate the production of a reproducible end product, even in the case of density-sensitive further processing of the molded parts, for example in sintering processes in which a quartz glass having a predetermined volatility or transparency is obtained by heating a mass of the molded parts shall be.
  • the molded compacts - or fragments thereof - are used as raw material for the production of quartz glass for the production of crucibles.
  • the most homogeneous possible distribution of the density in the molding briquettes is advantageous, regardless of whether bubble freedom or fine porosity is to be set in the respective wall region of the quartz glass crucible.
  • a high roll pressure in the roll briquetting process results in a high internal density of the molded compacts, so that a high density in the thermal densification and a faster formation of a quartz glass network is favored.
  • a low roll pressure can be used to set a lower inner density of the molded compacts, which leads to the formation of closed bubbles during thermal compression and promotes the formation of fine porosity during sintering.
  • the good reproducibility in the thermal densification of the porous SiO 2 granulate can also be attributed to the uniform and well-defined morphology of the molded compacts.
  • the fused silica granulate particles of synthetic quartz glass obtained after thermally compacting the molded compacts have a comparatively large volume, which further improves the productivity and economy of quartz glass production.
  • This comparatively large "pre-glazed volume” contributes to the fact that the silica glass granules sinter relatively easily and homogeneously to opaque quartz glass or melt into transparent quartz glass.
  • the silica glass granules are characterized by high purity, so that crystallization of the quartz glass and bubble growth can be prevented during sintering or melting.
  • the molded compacts have a mean equivalent diameter in the range of 1 mm to 5 mm.
  • Diameters of less than 1 mm are on the order of the diameter of typical synthetic silica grain. With larger diameters of the molded articles and the silica glass granules produced therefrom, the productivity gain becomes more noticeable due to the larger, pre-glazed volume. Molded compacts with equivalent diameters greater than 5 mm result in large interstitial fillings, which can be unfavorable to sintering for the purpose of transparency or fine poredness.
  • Fragments of such large molded compacts are readily usable, but have no uniform morphology.
  • the equivalent diameter refers here only to the size of the particles (mesh size).
  • the individual molded compacts have an average volume in the range of 1 to 100 mm 3 .
  • an average volume of less than 1 mm 3 there is no significant advantage in terms of the economy of the process and on a homogenization of the spatial density.
  • Large-volume moldings can show a noticeable density gradient from outside to inside, which can affect the freedom from bubbles of the quartz glass to be produced. Therefore, molded compacts having an average volume of more than 100 mm 3 are not preferred.
  • the individual molded compacts have an average specific density in the range from 0.6 to 1.3 g / cm 3 .
  • the high specific gravity of the molded compacts facilitates the reproducible, bubble-free thermal densification of the porous SiO 2 granules to the silica glass granules.
  • the crushed shaped compacts form a SiO 2 granulate having a bulk density in the range of more than 0.45 g / cm 3 , preferably from 0.8 to 1.1 g / cm 3 .
  • the high bulk density which is determined according to DIN ISO 697 (1984), not only contributes to the dense packing, but also the high specific gravity of the individual granulate particles or of fragments thereof.
  • a high bulk density facilitates melting and sintering into quartz glass.
  • a procedure is preferred in which the molded compacts or fragments thereof are treated in a chlorine-containing atmosphere before the thermal densification according to process step (b).
  • impurities are eliminated and hydroxyl groups are largely removed.
  • silica glass granules particles which consist of hydrogen-doped quartz glass.
  • Hydrogen is a gas that diffuses relatively easily in quartz glass and is released when heated. During sintering or melting of the silica glass granules, the escaping hydrogen reacts with existing gaseous oxygen to form H 2 O, which is soluble in the form of hydroxyl groups in the quartz glass. This facilitates bubble-free sintering or melting.
  • the hydrogen loading can be carried out during the thermal compression of the molded compacts by carrying out these under a hydrogen-containing atmosphere.
  • the silica glass granules are suitable for the production of transparent quartz glass and fine-pored quartz glass.
  • the silica glass granules thermally compacted according to process step (b) are applied as an outer grain layer on an inner wall of the melt mold and sintered to a crucible wall outer layer of at least partially opaque quartz glass.
  • a fine-pored, not completely compacted silica glass granulate is used.
  • the silica glass granules thermally compacted according to process step (b) are applied as an intermediate granulation layer on an outer granulation layer and sintered to a crucible wall intermediate layer or to a crucible wall outer layer of at least partially opaque quartz glass.
  • the intergranular layer forms an intermediate layer within the crucible wall or forms the crucible wall outer layer.
  • the silica glass granules thermally compacted according to process step (b) are applied as an inner granulation layer on an inner wall of a bony base body and melted to form a crucible wall inner layer of transparent quartz glass on the base body.
  • a bony base body made of quartz glass or quartz glass grain is provided with a transparent quartz glass layer, which serves as a diffusion barrier against any impurities in the intended use, which are contained in the quartz glass of the base body.
  • the crucible wall inner layer improves the surface finish of the base body.
  • a porous SiO 2 granulation layer of a less dense silica glass granulate is produced on the inner wall of an evacuable melt mold and a further body of SiO 2 is applied thereon.
  • applied layer of a silica glass granules of higher density When sintering the granulation layers from inside to outside, a vacuum is applied from the outside of the melt mold.
  • the inner crucible wall of higher density silica glass granules produced by virtue of the method according to the invention is characterized by high purity and low bubble content, and it can be reproduced and produced economically even in large layer thicknesses.
  • the lower density silica glass granules provide an outer layer of which at least the outer region is opaque and is characterized by a uniform porosity, as explained above.
  • the silica glass granules thermally compacted according to process step (b) are fed to an arc for sintering or melting, melted therein and deposited on an inner wall of a bell-shaped base body made of quartz glass to form a crucible wall Inner layer of transparent quartz glass is spun on.
  • an arc is ignited within the interior of a rotating about its longitudinal axis crucible base body.
  • the silica glass granules are interspersed, melted and thrown against the inner wall of the base body under the action of the arc pressure, where it adheres to form a crucible-wall inner layer of transparent quartz glass.
  • the size interspersed silica glass granules particles and their impact point in the arc it can lead to different degrees of fusion and to a considerable scattering of the thrown particles.
  • a uniform particle size of the interspersed silica glass granules causes both a defined impact point in the arc and a uniform degree of fusion, which promotes the reproducibility of the production of the crucible wall inner layer. Preference is given to using silica glass granulate particles whose diameter deviates from a nominal diameter by a maximum of 10%.
  • Silica glass granulate particles of uniform diameter exhibit a similar sintering and melting behavior.
  • beds of such particles have a comparatively low bulk density so that they are easier to treat or degasify with reactive gases.
  • FIG. 1 shows, in a schematic representation, a melting apparatus for producing a quartz glass crucible using silica glass granules with reference to a first method variant of the invention
  • FIG. 2 shows a schematic representation of a melting apparatus for producing a quartz glass crucible with a transparent inner layer produced using silica glass granules, using a second method variant.
  • the molded compacts form a SiO 2 granulate with a specific surface area of about 50 m 2 / g (BET) and a bulk density of about 0.7 g / cm 3 . They are then crushed by means of a crusher and classified by sieving. The particle size range of 120 to 600 ⁇ is further processed, as described below; and the defective fraction is added to the silica input material of the roll briquetting plant.
  • the SiO 2 granulate produced in this way consists of fragments and has a specific surface area of about 50 m 2 / g (BET) and a bulk density of about 0.9 g / cm 3, which is higher than that of the non-shredded granules.
  • the treated SiO 2 granules have total content of impurities of Li, Na, K, Mg, Ca, Fe, Cu and Mn of less than 200 wt. Ppb and a hydroxyl group content of 30 wt. Ppm.
  • the thus treated SiO 2 granules are then placed in a graphite mold and vitrified by vacuum sintering.
  • the mold is heated to the sintering temperature of 1600 ° C and held for about 60 minutes after reaching the sintering temperature.
  • the silica glass granules thus obtained consist of glassy, bubble-free quartz glass particles with equivalent diameters in the range from about 100 to 500 ⁇ m and with a specific surface area (according to BET) of less than 1 m 2 / g.
  • the silica glass granules are subsequently loaded with hydrogen by being exposed to a hydrogen-containing atmosphere at a temperature of 800 ° C. for a period of 5 hours.
  • the synthetic, high-purity silica is compacted by means of a commercial roller briquetting plant into spherical compacts having the following properties:
  • the SiO 2 granules so produced consist of elongated molded compacts of identical geometry and size and have a specific surface area of about 50 m 2 / g (BET) and a relatively low bulk density of about 0.7 g / cm 3 . It is purified and thermally densified as described above with reference to Example 1.
  • the silica glass granules obtained after vacuum sintering consist of glassy, bubble-free quartz glass particles of uniform dimensions (without fines) and with a specific surface area (according to BET) of less than 1 m 2 / g.
  • Synthetic high purity silica is processed and pelletized by means of a roll briquetting machine into tablet-shaped, spheroidal compacts, as explained in Example 1.
  • the SiO 2 granules obtained thereafter are then placed in a graphite mold and vitrified under helium.
  • the graphite mold is heated to the sintering temperature of 1600 ° C and held for about 60 minutes after reaching the sintering temperature. After cooling, a mass of more or less loosely connected, glassy SiO 2 particles is obtained, which can be separated by slight pressure.
  • the silica glass granules thus obtained consist of glassy, bubble-free quartz glass particles with uniform dimensions (equivalent diameter) of about 100 to 500 ⁇ and with a specific surface area (according to BET) of less than 1 m 2 / g.
  • Example 4 Production of a quartz glass crucible with inner layer
  • the melting apparatus comprises a metal melt mold 1 with an inner diameter of 75 cm, which rests on a support 3 with an outer flange.
  • the carrier 3 is rotatable about the central axis 4.
  • a cathode 5 and an anode 6 (electrodes 5, 6) made of graphite protrude into the interior 10 of the melt mold 1 and can be moved within the melt mold 1 in all spatial directions, as indicated by the directional arrows 7.
  • the open top side of the melt mold 1 is partially covered by a heat shield 11 in the form of a water-cooled metal plate with a central through-hole through which the electrodes 5, 6 protrude into the melt mold 1.
  • the heat shield 1 1 is connected to a gas inlet 9 for hydrogen (alternatively also for the supply of helium).
  • the heat shield 2 is horizontally movable in the plane above the mold 1 (in the x and y direction), as indicated by the directional arrows 22.
  • the space between the carrier 3 and the melt mold 1 can be evacuated by means of a vacuum device, which is represented by the directional arrow 17.
  • the melt mold 1 has a plurality of passages 8 (these are shown in FIG 1 symbolically indicated in the bottom area), through which the voltage applied to the outside of the mold 1 vacuum 17 can pass through to the inside.
  • fused silica granules which have been produced on the basis of example 3 above are filled into the melt mold 1 rotating about its longitudinal axis 4.
  • a rotationally symmetrical, bony-shaped granulation layer 12 of the mechanically solidified granules is formed on the inner wall of the melt mold 1.
  • the average layer thickness of the granulation layer 12 is about 12 mm.
  • the average layer thickness of the inner graining layer 14 is also about 12 mm.
  • the heat shield 11 is positioned over the opening of the melt mold 1 and helium is introduced via the inlet 9 into the crucible interior 10.
  • the electrodes 5; 6 are inserted through the central opening of the heat shield 1 1 in the interior 10 and between the electrodes 5; 6 an arc ignited, which is characterized in Figure 1 by the plasma zone 13 as gray background area.
  • a vacuum is applied to the outside of the melt mold 1.
  • the electrodes 5; 6 are brought together with the heat shield 1 1 in the lateral position shown in Figure 1 and applied with a power of 600 kW (300 V, 2000 A) and, to the granulation layers 12; 14 glazed in the area of the side wall.
  • the plasma zone 13 is moved slowly downwards, while the quartz glass powder of the inner granulation layer 14 is continuously and partially melted into a bubble-free inner layer 16.
  • heat shield 1 1 and electrodes 5; 6 brought into a central position and the electrodes 5; 6 lowered down.
  • the layer is sintered, a dense inner skin initially forms. Thereafter, the applied negative pressure (vacuum) can be increased, so that the vacuum can develop its full effect.
  • the melting process is terminated before the melt front reaches the inner wall of the melt mold 1.
  • the transparent inner layer 16 is smooth, low-bubble and has an average thickness of about 8 mm.
  • the outer layer 12 remains at least partially opaque.
  • Example 5 Production of a quartz glass crucible with inner layer
  • the melting device has a spreading tube 18, which can be moved in all spatial directions (directional arrows 7) and projects into the interior of the melt mold 1 and which is connected to a storage container 19.
  • the litter tube 18 is provided with a trouser piece 23 for the supply of compressed air - symbolized by the directional arrow 24.
  • the storage container 19 is filled with silica glass granulate particles 25 of pure, synthetically produced and hydrogen-doped quartz glass according to Example 2 above.
  • the fused silica granules particles 25 have uniform dimension without fines and are accordingly defined in terms of their mechanical properties and easy to handle.
  • the inner layer 26 of the quartz glass crucible thus produced has an average thickness of 2.5 mm. It is smooth, low-bubble and firmly connected to the outer layer 27 of opaque quartz glass.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

L'invention concerne un procédé basé sur un procédé connu pour la fabrication d'un creuset en verre de quartz pour l'extraction d'un monocristal, selon lequel, sous une forme fondue, une couche de granulation est façonnée et frittée ou fondue, formant ainsi le creuset en verre de quartz. L'invention vise à fabriquer à faible coût du verre de quartz pour un creuset en verre de quartz qui se caractérise par une grande pureté et qui d'une part permette un réglage reproductible du caractère exempt de bulles et d'autre part présente une porosité fine définie et homogène. A cet effet, au moins une partie de la couche de granulation est produite à partir de granulés de verre de silice, dont la fabrication comprend : le compactage mécanique de poudre d'acide silicique au moyen d'un procédé de briquetage au rouleau entraînant la formation de comprimés moulés présentant une morphologie sensiblement uniforme, sphéroïdale, et le compactage thermique des comprimés moulés ou de leurs fragments en granulés de verre de silice.
PCT/EP2011/052177 2010-02-16 2011-02-15 Procédé de fabrication d'un creuset en verre de quartz Ceased WO2011101327A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012553284A JP2013519624A (ja) 2010-02-16 2011-02-15 石英ガラスるつぼの製造法
CN2011800098057A CN102753493A (zh) 2010-02-16 2011-02-15 用于生产石英玻璃坩埚的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010008162.0A DE102010008162B4 (de) 2010-02-16 2010-02-16 Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel
DE102010008162.0 2010-02-16

Publications (1)

Publication Number Publication Date
WO2011101327A1 true WO2011101327A1 (fr) 2011-08-25

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PCT/EP2011/052177 Ceased WO2011101327A1 (fr) 2010-02-16 2011-02-15 Procédé de fabrication d'un creuset en verre de quartz

Country Status (4)

Country Link
JP (1) JP2013519624A (fr)
CN (1) CN102753493A (fr)
DE (1) DE102010008162B4 (fr)
WO (1) WO2011101327A1 (fr)

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US10024577B2 (en) 2011-09-14 2018-07-17 Heraeus Quarzglas Gmbh & Co. Kg Solar radiation receiver having an entry window made of quartz glass and method for producing an entry window
CN111479785A (zh) * 2017-12-12 2020-07-31 信越石英株式会社 铸模及石英玻璃坩埚的制造方法
CN115246704A (zh) * 2021-04-27 2022-10-28 新沂市中鑫光电科技有限公司 一种石英坩埚透明层消除杂质元素方法

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US9758901B2 (en) 2013-05-31 2017-09-12 Sumco Corporation Vitreous silica crucible for pulling of silicon single crystal and method for manufacturing the same
JP6208080B2 (ja) * 2014-05-22 2017-10-04 クアーズテック株式会社 石英ガラスルツボ
KR20180095616A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
EP3390296B1 (fr) 2015-12-18 2024-09-04 Heraeus Quarzglas GmbH & Co. KG Fabrication d'un corps en verre de quartz dans un four multi-chambres
EP3390290B1 (fr) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Fabrication d'un corps en verre de quartz opaque
WO2017103153A1 (fr) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Fibres de verre et préformes en verre de silice à faible teneur en oh, cl et al
WO2017103115A2 (fr) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Fabrication d'un corps en verre de silice dans un creuset en métal réfractaire
WO2017103156A2 (fr) * 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Fabrication de corps en verre de silice à partir de poudre de dioxyde de silicium
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
EP3390292B1 (fr) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Fabrication d'une particule de verre de quartz synthetique
WO2017103131A1 (fr) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Diminution de la teneur en métaux alcalino-terreux d'un granulat de dioxyde de silicium par traitement à haute température de granulat de dioxyde de silicium dopé au carbone
EP3339256A1 (fr) * 2016-12-23 2018-06-27 Heraeus Quarzglas GmbH & Co. KG Procédé de fabrication de verre de quartz opaque et ébauche en verre de quartz opaque
JP7141844B2 (ja) * 2018-04-06 2022-09-26 信越石英株式会社 石英ガラスるつぼの製造方法
JP7157932B2 (ja) * 2019-01-11 2022-10-21 株式会社Sumco シリカガラスルツボの製造装置および製造方法
CN113415978B (zh) * 2021-07-03 2022-06-24 四川神光石英科技有限公司 一种耐辐照石英玻璃的制备方法及制备用坩埚和料架

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