[go: up one dir, main page]

WO2011146912A8 - Pochoirs pour gravure de substrats à échelle de l'ordre du micromètre à rendement de production élevé et leurs procédés de fabrication et d'utilisation - Google Patents

Pochoirs pour gravure de substrats à échelle de l'ordre du micromètre à rendement de production élevé et leurs procédés de fabrication et d'utilisation Download PDF

Info

Publication number
WO2011146912A8
WO2011146912A8 PCT/US2011/037478 US2011037478W WO2011146912A8 WO 2011146912 A8 WO2011146912 A8 WO 2011146912A8 US 2011037478 W US2011037478 W US 2011037478W WO 2011146912 A8 WO2011146912 A8 WO 2011146912A8
Authority
WO
WIPO (PCT)
Prior art keywords
stencils
throughput
substrates
processes
making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2011/037478
Other languages
English (en)
Other versions
WO2011146912A3 (fr
WO2011146912A2 (fr
Inventor
Eric Stern
Graciela Beatriz Blanchet
Lindsay Hunting
Brian T. Mayers
Joseph M. Mclellan
Patrick Reust
Ralf Kügler
Jennifer Gillies
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Patent GmbH
Nano Terra Inc
Original Assignee
Merck Patent GmbH
Nano Terra Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent GmbH, Nano Terra Inc filed Critical Merck Patent GmbH
Priority to SG2012083515A priority Critical patent/SG185549A1/en
Priority to CN201180035314XA priority patent/CN103118805A/zh
Priority to KR1020127033361A priority patent/KR20130124167A/ko
Priority to EP11784370.6A priority patent/EP2571629A4/fr
Priority to JP2013511407A priority patent/JP2013531808A/ja
Publication of WO2011146912A2 publication Critical patent/WO2011146912A2/fr
Publication of WO2011146912A3 publication Critical patent/WO2011146912A3/fr
Anticipated expiration legal-status Critical
Publication of WO2011146912A8 publication Critical patent/WO2011146912A8/fr
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/227—Removing surface-material, e.g. by engraving, by etching by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/16—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length only at particular parts of the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/14—Forme preparation for stencil-printing or silk-screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/14—Forme preparation for stencil-printing or silk-screen printing
    • B41C1/148—Forme preparation for stencil-printing or silk-screen printing by a traditional thermographic exposure using the heat- or light- absorbing properties of the pattern on the original, e.g. by using a flash
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/24—Stencils; Stencil materials; Carriers therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

La présente invention porte sur des pochoirs pour une gravure de substrats de haute définition et à rendement de production élevé et sur leurs procédés de fabrication et d'utilisation.
PCT/US2011/037478 2010-05-21 2011-05-21 Pochoirs pour gravure de substrats à échelle de l'ordre du micromètre à rendement de production élevé et leurs procédés de fabrication et d'utilisation Ceased WO2011146912A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
SG2012083515A SG185549A1 (en) 2010-05-21 2011-05-21 Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same
CN201180035314XA CN103118805A (zh) 2010-05-21 2011-05-21 用于基质的高生产量微米规格蚀刻的模版及其制备和使用方法
KR1020127033361A KR20130124167A (ko) 2010-05-21 2011-05-21 기판들의 고 스루풋 미크론 스케일 식각을 위한 스텐실 및 이의 제조 및 이용 방법
EP11784370.6A EP2571629A4 (fr) 2010-05-21 2011-05-21 Pochoirs pour gravure de substrats à échelle de l'ordre du micromètre à rendement de production élevé et leurs procédés de fabrication et d'utilisation
JP2013511407A JP2013531808A (ja) 2010-05-21 2011-05-21 基板のハイスループット、ミクロンスケールエッチングのためのステンシルならびにその製造方法および使用方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34705310P 2010-05-21 2010-05-21
US61/347,053 2010-05-21

Publications (3)

Publication Number Publication Date
WO2011146912A2 WO2011146912A2 (fr) 2011-11-24
WO2011146912A3 WO2011146912A3 (fr) 2012-03-01
WO2011146912A8 true WO2011146912A8 (fr) 2012-12-20

Family

ID=44992372

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2011/037478 Ceased WO2011146912A2 (fr) 2010-05-21 2011-05-21 Pochoirs pour gravure de substrats à échelle de l'ordre du micromètre à rendement de production élevé et leurs procédés de fabrication et d'utilisation

Country Status (8)

Country Link
US (1) US20120097329A1 (fr)
EP (1) EP2571629A4 (fr)
JP (1) JP2013531808A (fr)
KR (1) KR20130124167A (fr)
CN (1) CN103118805A (fr)
SG (1) SG185549A1 (fr)
TW (1) TW201220974A (fr)
WO (1) WO2011146912A2 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100124268A (ko) * 2008-02-06 2010-11-26 나노 테라 인코포레이티드 표면에 미크론 크기의 특징형상을 형성하기 위한 제거가능 뒷댐재를 가지는 스텐실 및 그의 제조 및 사용 방법
EP2694595A4 (fr) * 2011-04-04 2014-09-03 Wasbbb Inc Plastique lourd
KR101360281B1 (ko) * 2012-01-12 2014-02-12 한국과학기술원 다중 진공 여과 방법을 이용한 단일벽 탄소나노튜브 포화 흡수체 제작법
US9952147B2 (en) * 2013-09-12 2018-04-24 Sio2 Medical Products, Inc. Rapid, non-destructive, selective infrared spectrometry analysis of organic coatings on molded articles
US9731437B2 (en) * 2013-11-22 2017-08-15 Johnson & Johnson Vision Care, Inc. Method of manufacturing hydrogel ophthalmic devices with electronic elements
CN109835867B (zh) * 2017-11-24 2023-07-14 中芯国际集成电路制造(上海)有限公司 刻蚀溶液和刻蚀方法
KR20190087694A (ko) * 2018-01-15 2019-07-25 삼성디스플레이 주식회사 표시 장치 및 그 표시 장치의 제조 방법
KR102532774B1 (ko) * 2018-08-20 2023-05-12 동우 화인켐 주식회사 절연막 식각액 조성물 및 이를 이용한 패턴 형성 방법
US10971472B2 (en) * 2019-07-09 2021-04-06 Mikro Mesa Technology Co., Ltd. Method of liquid assisted bonding
US20230271445A1 (en) * 2022-02-25 2023-08-31 Intel Corporation Reusable composite stencil for spray processes
CN114573931B (zh) * 2022-03-04 2023-05-09 中国工程物理研究院激光聚变研究中心 用于光学元件表面损伤坑修复的胶体的制备及应用
US12371797B2 (en) * 2023-03-24 2025-07-29 Adrienne Reisinger Etching a design on a metal surface covered with a pigmented layer

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209582A (en) * 1977-02-22 1980-06-24 Arthur D. Little, Inc. Method of preparing screen printing stencils using novel compounds and compositions
US4820746A (en) * 1986-08-12 1989-04-11 Avery International Corporation Radiation-cured rubber-based pressure-sensitive adhesive
CA1332093C (fr) * 1986-12-08 1994-09-20 Songvit Setthachayanon Revetement pour masque a soudure, pour photogravure
GB9721973D0 (en) * 1997-10-17 1997-12-17 Sericol Ltd A screen printing stencil
JP3560042B2 (ja) * 2001-03-22 2004-09-02 インターナショナル・ビジネス・マシーンズ・コーポレーション パターニング・マスクおよびパターニング方法
US20030070569A1 (en) * 2001-10-11 2003-04-17 Colin Bulthaup Micro-stencil
JP4324390B2 (ja) * 2002-02-13 2009-09-02 大日本印刷株式会社 感光性樹脂組成物およびスクリーン印刷用版
DE102006028640A1 (de) * 2006-06-22 2008-01-03 Flint Group Germany Gmbh Fotopolymerisierbarer Schichtenverbund zur Herstellung von Flexodruckelementen
WO2008070087A2 (fr) * 2006-12-05 2008-06-12 Nano Terra Inc. Procédé pour représenter un motif sur une surface
JP2008221697A (ja) * 2007-03-14 2008-09-25 Mitsubishi Electric Corp シール印刷用スクリーン版、シール印刷方法及びこれらを用いて製造された液晶パネル
JP5102078B2 (ja) * 2007-03-15 2012-12-19 株式会社リコー 画像形成方法及びプロセスカートリッジ
US8080615B2 (en) * 2007-06-19 2011-12-20 Micron Technology, Inc. Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
KR101452705B1 (ko) * 2008-01-10 2014-10-24 삼성전자주식회사 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드
KR20100124268A (ko) * 2008-02-06 2010-11-26 나노 테라 인코포레이티드 표면에 미크론 크기의 특징형상을 형성하기 위한 제거가능 뒷댐재를 가지는 스텐실 및 그의 제조 및 사용 방법
US8574710B2 (en) * 2008-10-10 2013-11-05 Nano Terra Inc. Anti-reflective coatings comprising ordered layers of nanowires and methods of making and using the same
TW201128301A (en) * 2009-08-21 2011-08-16 Nano Terra Inc Methods for patterning substrates using heterogeneous stamps and stencils and methods of making the stamps and stencils
JP2011090878A (ja) * 2009-10-22 2011-05-06 Fujifilm Corp 透明導電体の製造方法
CN102834472B (zh) * 2010-02-05 2015-04-22 凯博瑞奥斯技术公司 光敏墨组合物和透明导体以及它们的使用方法
WO2011119707A2 (fr) * 2010-03-23 2011-09-29 Cambrios Technologies Corporation Formation de motifs de gravure sur des nanoconducteurs transparents

Also Published As

Publication number Publication date
WO2011146912A3 (fr) 2012-03-01
TW201220974A (en) 2012-05-16
SG185549A1 (en) 2012-12-28
EP2571629A2 (fr) 2013-03-27
JP2013531808A (ja) 2013-08-08
EP2571629A4 (fr) 2014-05-21
US20120097329A1 (en) 2012-04-26
WO2011146912A2 (fr) 2011-11-24
KR20130124167A (ko) 2013-11-13
CN103118805A (zh) 2013-05-22

Similar Documents

Publication Publication Date Title
WO2011146912A8 (fr) Pochoirs pour gravure de substrats à échelle de l'ordre du micromètre à rendement de production élevé et leurs procédés de fabrication et d'utilisation
WO2010122578A3 (fr) Procédé de préparation de la sitagliptine et de ses intermédiaires
WO2010123728A3 (fr) Procédé de fabrication et d'utilisation de substrats revêtus contenant du charbon actif et produits obtenus à partir de ceux-ci
EP4223730A3 (fr) Destruction organo-catalytique de biomasse
WO2011062791A3 (fr) Texturation de surfaces de substrat absorbant la lumière
WO2011055231A3 (fr) Polymorphes de rébaudioside a et procédés pour préparer ceux-ci
EP2634795A4 (fr) Processus de fabrication d'un substrat de circuit de type traversant, et substrat de circuit de type traversant
WO2011133504A3 (fr) Nanozymes, procédés de production de nanozymes, et procédés d'utilisation de nanozymes
WO2010138351A3 (fr) Compositions de géopolymères modifiés, procédés et utilisations
SG2014013098A (en) Method for the enzymatic production of isoprenol using mevalonate as a substrate
EP3214066B8 (fr) Procédé de préparation de fluoroalkyl fluoroformiates
EP3036335A4 (fr) Microorganismes pour la biosynthèse de limonène sur des substrats gazeux
WO2011014831A3 (fr) Substrats revêtus et procédés de préparation associés
WO2012089611A3 (fr) Traitement à la flamme d'un substrat
WO2011058525A3 (fr) Procédé de synthèse de la forme a du chlorhydrate d'erlotinib et de la forme b du chlorhydrate d'erlotinib
WO2010065586A3 (fr) Préparation de capécitabine
BRPI0912306A2 (pt) produção de um jato de pulverização puro contendo substância sólida.
WO2011000361A3 (fr) Procédé de réalisation et de montage en série d'éléments en forme de bande sur un substrat
EP2359367B8 (fr) Contrôle de processus d'anneaux de tolérance
MX339772B (es) Metodo y composicion para producir azucar clarificada.
WO2012051126A3 (fr) Macrolides antiinflammatoires
WO2009158039A8 (fr) Procédés de photogravure comprenant des motifs amplifiés
WO2011100081A8 (fr) Procédés utilisant des condensateurs de commutation
WO2013030654A8 (fr) Procédés de préparation du (r)-2-acétamido-n-benzyl-3-méthoxypropionamide et de ses intermédiaires
WO2011063072A3 (fr) Procédé de préparation de phénylalanines substituées

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201180035314.X

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11784370

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 2013511407

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2011784370

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 20127033361

Country of ref document: KR

Kind code of ref document: A