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WO2011145354A1 - Method for purification of 2-alkyl-2-adamantyl (meth)acrylates - Google Patents

Method for purification of 2-alkyl-2-adamantyl (meth)acrylates Download PDF

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Publication number
WO2011145354A1
WO2011145354A1 PCT/JP2011/002833 JP2011002833W WO2011145354A1 WO 2011145354 A1 WO2011145354 A1 WO 2011145354A1 JP 2011002833 W JP2011002833 W JP 2011002833W WO 2011145354 A1 WO2011145354 A1 WO 2011145354A1
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Prior art keywords
alkyl
adamantyl
meth
acrylate
distillation
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PCT/JP2011/002833
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French (fr)
Japanese (ja)
Inventor
直弥 河野
慎司 田中
義崇 上野山
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Idemitsu Kosan Co Ltd
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Idemitsu Kosan Co Ltd
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Priority to KR1020127030059A priority Critical patent/KR20130079400A/en
Priority to JP2012515765A priority patent/JPWO2011145354A1/en
Priority to CN2011800253048A priority patent/CN102892744A/en
Publication of WO2011145354A1 publication Critical patent/WO2011145354A1/en
Anticipated expiration legal-status Critical
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
    • C07C67/48Separation; Purification; Stabilisation; Use of additives
    • C07C67/52Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
    • C07C67/48Separation; Purification; Stabilisation; Use of additives
    • C07C67/62Use of additives, e.g. for stabilisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/56Ring systems containing bridged rings
    • C07C2603/58Ring systems containing bridged rings containing three rings
    • C07C2603/70Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74Adamantanes

Definitions

  • the present invention relates to a method for purifying 2-alkyl-2-adamantyl (meth) acrylate.
  • 2-Alkyl-2-adamantyl (meth) acrylate is a base material that is particularly useful as a monomer for ArF semiconductor photoresists, and is required to have higher purity as semiconductor processing becomes finer. Since an alkyl group having 1 to 3 carbon atoms can be purified by distillation, distillation purification is carried out for the purpose of removing metal components. Since these are polymerizable substances, simple distillation or thin film distillation is employed. However, as a high-purity monomer for resist, it is further required that there are few non-polymerizable impurities and heavy components as well as polymerizable impurities.
  • Patent Document 1 2-alkyl-2-adamantyl (meth) acrylate is purified by distillation. However, it is difficult to obtain a high purity by removing only components having boiling points by distillation alone.
  • Patent Document 2 discloses a production method for obtaining a high-purity product by performing distillation of alkyladamantyl (meth) acrylate twice. However, since the distillation operation is performed twice, it is exposed to high temperatures and has a heavy content. The risk of generating is great.
  • Patent Document 3 discloses a method of performing thin film distillation by adjusting the heating temperature and time.
  • Patent Document 4 discloses a method for obtaining a high-purity product by performing distillation in the presence of a heterocyclic compound or a basic compound. Heterocyclic compounds and basic compounds may be mixed.
  • Patent Document 5 discloses 2,4-bis- (n-octylthio) -6- (4-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine as a decomposition inhibitor and a polymerization inhibitor. Etc. are added and purified.
  • An object of the present invention is to provide a method for purifying 2-alkyl-2-adamantyl (meth) acrylate with less impurities.
  • 1.2-Alkyl-2-adamantyl (meth) acrylate is distilled by adding a polymerization inhibitor, Crystallization by adding an alcohol solvent to the distilled 2-alkyl-2-adamantyl (meth) acrylate, A method for purifying 2-alkyl-2-adamantyl (meth) acrylate.
  • a method for purifying 2-alkyl-2-adamantyl (meth) acrylate with less impurities can be provided.
  • the method for purifying 2-alkyl-2-adamantyl (meth) acrylate of the present invention comprises the following two steps. 1) A polymerization inhibitor is added to 2-alkyl-2-adamantyl (meth) acrylate and distilled (distillation step). 2) Crystallize by adding an alcohol solvent to distilled 2-alkyl-2-adamantyl (meth) acrylate (crystallization step).
  • the distillation step By adding a polymerization inhibitor to the distillation step, it is possible to suppress the formation of a polymer that is an impurity.
  • the polymerization inhibitor can be removed in the crystallization process. Accordingly, the selection range of the type, amount and operating conditions of the polymerization inhibitor that can be used in the distillation process is widened. Since the product is finished by crystallization, the thermal history of the final product can be relaxed, and impurities such as heavy components can be suppressed. Further, by performing crystallization, impurities having a boiling point close to each other can be removed and the purity can be increased. From the viewpoint of relaxing the thermal history, the distillation is preferably performed once. In the present invention, a high-purity product can be obtained even by one distillation by combining with crystallization.
  • the distillation may be simple distillation or thin film distillation, but simple distillation is preferred.
  • a compound having a melting point of room temperature or higher can be easily handled as a crystalline powder. This eliminates the need for operations such as heating and melting when the product monomer is used, and it is possible to maintain the monomer quality and simplify the handling operation.
  • 2-Alkyl-2-adamantyl (meth) acrylate is represented by the following formula (10).
  • R 11 is an alkyl group.
  • R 12 is a hydrogen atom or a methyl group.
  • 2-Alkyl-2-adamantyl (meth) acrylate can be produced, for example, by the following method.
  • a metal 2-alkyl-2-adamantyl alcoholate represented by the formula (1) is reacted with an esterifying agent which is (meth) acrylic acid or a derivative thereof.
  • R 11 is an alkyl group.
  • Alkyl groups having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group, and an isopropyl group are highly useful as raw materials for semiconductor resist materials.
  • M represents Li atom or -MgX.
  • X represents a halogen atom, preferably a chlorine atom or a bromine atom from the viewpoint of easy availability of the metal compound, and most preferably a bromine atom from the viewpoint of reactivity.
  • magnesium halide 2-alkyl-2-adamantyl alcoholate examples include magnesium chloride 2-methyl-2-adamantyl alcoholate, magnesium bromide 2-methyl-2-adamantyl alcoholate, Examples thereof include magnesium chloride 2-ethyl-2-adamantyl alcoholate and magnesium bromide 2-ethyl-2-adamantyl alcoholate. From the viewpoint of ease of production, magnesium bromide 2-methyl-2-adamantyl alcoholate is preferable.
  • Magnesium halide 2-alkyl-2-adamantyl alcoholate can be easily produced from 2-adamantanone and Grignard reagent.
  • lithium 2-alkyl-2-adamantyl alcoholate can be produced from 2-adamantanone and alkyllithium by a known method.
  • the alkyl halide is not particularly limited, and alkyl bromide, alkyl iodide, alkyl chloride and the like can be used.
  • Alkyl chloride or alkyl bromide having an alkyl group having 1 to 6 carbon atoms is preferable because the raw material is easily available. Specific examples include 2-chloropropane, butyl chloride, pentyl chloride, hexyl chloride, methyl bromide, ethyl bromide, butyl bromide, methyl iodide, ethyl iodide and the like.
  • an organic solvent that is stable with respect to metallic lithium, alkyllithium, and lithium alkoxide
  • examples of such an organic solvent include ether solvents such as diethyl ether, tetrahydrofuran, and dioxane, hydrocarbon solvents such as hexane, benzene, and toluene, and mixed solvents thereof.
  • the amount of metallic lithium added is preferably 3 mol or less, particularly 1.5 to 2.5 mol per mol of 2-adamantanone.
  • the reaction time for the alkylation reaction is usually 0.5 to 48 hours, although it varies depending on the addition rate of metallic lithium, the removal efficiency of reaction heat, and the like. In order to prevent the deactivation of metallic lithium, it is desirable to perform the reaction in an inert atmosphere such as argon.
  • esterifying agent (meth) acrylic acid halide, (meth) acrylic anhydride represented by the following formula (4), or carbon atoms having double bonds at the ⁇ and ⁇ positions represented by the following formula (5):
  • An ester compound of (8) alcohol or phenol and (meth) acrylic acid can be used.
  • R 20 represents a hydrogen atom or a methyl group.
  • R 30 , R 40 and R 50 represent a hydrogen atom, an alkyl group or an aryl group which may have a substituent, and R 30 and R 40 or R 40 and R 50 may be connected to each other to form a ring.
  • the total number of carbon atoms of R 30 , R 40 , and R 50 is 0-6.
  • Examples of the compound represented by the formula (5) include vinyl (meth) acrylate, isopropenyl (meth) acrylate, 1-cyclohexenyl (meth) acrylate, and 2,6-dimethyl-1- (meth) acrylate.
  • Examples include cyclohexenyl, 1-phenylethenyl (meth) acrylate, phenyl (meth) acrylate, 4-nitrophenyl (meth) acrylate, and the like.
  • a 2-alkyl-2-adamantyl (meth) acrylate of the formula (10) can be produced by reacting the metal compound of the formula (1) with the esterifying agent. This reaction is carried out by mixing the above compounds. Use of the reaction solvent improves workability and further facilitates control of the reaction temperature.
  • any solvent can be used as long as it does not react with the metal compound and the esterifying agent.
  • ether solvents such as ethyl ether, tetrahydrofuran (THF) and dioxane
  • hydrocarbon solvents such as hexane, benzene, toluene and xylene
  • halogen solvents such as dichloromethane.
  • concentration of the metal compound in the solvent is preferably 0.01 to 10 mol / l.
  • the amount of the esterifying agent used in the reaction is preferably 0.9 to 1.3 mol per 1 mol of the metal compound.
  • the reaction time varies depending on the length of the dropping time, it is usually preferably 0.5 to 6 hours after the dropping.
  • the esterification reaction temperature is preferably ⁇ 20 to 100 ° C. From the viewpoint of preventing the deactivation of the esterifying agent and the metal compound, the reaction is desirably performed in an inert atmosphere such as nitrogen or argon.
  • an ester compound can be obtained with a higher conversion rate by adding a tertiary amine compound to the reaction system during the esterification reaction.
  • the tertiary amine compound is not particularly limited, but triethylamine, tributylamine, N-methylpiberidine, N-methylmorpholine, 1,4-diazabicyclo [2.2.2] octane, 1,7-diazabicyclo [4.3.0].
  • Cyclic or acyclic aliphatic tertiary amines such as non-6-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene, dimethylaniline, pyridine, 4-dimethylaminopyridine, etc.
  • An aromatic tertiary amine can be used.
  • the amount of tertiary amine compound added is usually 0.01 to 0.5 equivalents relative to the metal 2-alkyl-2-adamantyl alcoholate.
  • a polymerization inhibitor is added to crude 2-alkyl-2-adamantyl (meth) acrylate and distilled.
  • the polymerization inhibitor include methoquinone, hydroquinone, phenothiazine, and methoxyphenothiazine.
  • the addition amount of the polymerization inhibitor is, for example, 10 to 10,000 wtppm with respect to the crude 2-alkyl-2-adamantyl (meth) acrylate.
  • an adamantane compound is known as a sublimable substance.
  • alkyladamantyl (meth) acrylate is a thermally unstable compound having a polymerizable functional group. Therefore, the distillation operation in the distillation purification process is preferably performed at a temperature as low as possible under reduced pressure.
  • the degree of vacuum when performing the distillation operation under reduced pressure is usually 2 kPa or less, preferably 1 kPa or less, and more preferably 100 Pa or less. Further, there is no particular problem if the lower limit is not too low, but there is usually a limit due to the tightness of the distillation equipment and the performance of the vacuum pump.
  • the degree of vacuum is preferably controlled so that the distillation temperature is within the following range.
  • the distillation temperature is usually 170 ° C. or lower, preferably 150 ° C. or lower, and particularly preferably 130 ° C. or lower.
  • the lower limit is usually 20 ° C. or higher. If this temperature is too high, there may be a problem with the stability of the object. On the other hand, if the temperature is too low, the condenser must be set at a very low temperature, which is not an industrially advantageous operation.
  • the cooling temperature of the condenser can be arbitrarily selected, but is usually 40 ° C. or lower, preferably 30 ° C. or lower.
  • the lower limit of the cooling temperature is ⁇ 20 ° C. or higher, preferably ⁇ 10 ° C. or higher.
  • the distillation operation can be carried out either batchwise or continuously.
  • the target compound of the present invention is a thermally unstable compound, and continuous distillation is preferable from the viewpoint of shortening the residence time in the heating section and productivity.
  • Examples of continuous distillation include flash distillation and molecular distillation.
  • As an industrial apparatus it is preferable to use a thin film distillation apparatus generally used for distillation of thermally unstable compounds.
  • an alcoholic solvent is added to the distilled 2-alkyl-2-adamantyl (meth) acrylate to cause crystallization.
  • the alcohol solvent is preferably one that dissolves the polymerization inhibitor.
  • methanol, ethanol, n-propanol or isopropanol with methanol being preferred.
  • Crystallization is performed by cooling the solution to which the alcohol solvent has been added and holding it for a certain period of time to precipitate crystals.
  • the crystallization conditions vary depending on the polymerization inhibitor, solvent, etc. used, but the crystallization temperature is, for example, -20 ° C to 20 ° C.
  • the crystallization time is, for example, 0.5 to 24 hours.
  • the liquid part after crystallization may be extracted by, for example, decantation, and crystallization may be performed a plurality of times. Further, crystallization may be performed by adding a small amount of seed crystals to the solution. Crystallization may be performed once or twice or more.
  • Example 1 Add 0.2% of methoquinone as a polymerization inhibitor to the crude 2-methyl-2-adamantyl methacrylate obtained in Synthesis Example 1 and perform simple distillation under reduced pressure of 0.3 mmHg at 85 ° C. to 90 ° C. -101 g of methyl-2-adamantyl methacrylate (recovery rate 88%) (GC (gas chromatography) purity 99.0%) was obtained. 200 g of methanol is added to 200 g of the above-purified 2-methyl-2-adamantyl methacrylate to make a solution, then cooled to ⁇ 10 ° C., a small amount of seed crystals are added, and the mixture is kept at ⁇ 10 ° C. for 2 hours.
  • methoquinone as a polymerization inhibitor
  • Crystallization was performed. Decant and extract 200 g of liquid, add 200 g of methanol to this, dissolve at 20 ° C., cool to ⁇ 10 ° C., add a small amount of seed crystals, and hold at ⁇ 10 ° C. for 2 hours. Was crystallized. After extracting the liquid part, the crystal was returned to room temperature and dissolved, and concentrated under reduced pressure at 20 ° C. while bubbling dry air through a capillary to obtain 134.0 g of high-purity 2-methyl-2-adamantyl methacrylate (GC purity 99 9%, 67% recovery) (purified monomer A). The high purity 2-methyl-2-adamantyl methacrylate had a melting point of 12.6 to 13.1 ° C. (differential scanning calorimetry (DSC)).
  • DSC differential scanning calorimetry
  • Example 2 To the crude 2-isopropyl-2-adamantyl methacrylate obtained in Synthesis Example 2, 0.07 g of methoquinone was added as a polymerization inhibitor, and simple distillation was performed at 100 to 120 ° C. while bubbling dry air through a capillary. 36.9 g (0.14 mol, GC purity 86.9%, GPC (gel permeation chromatography) purity 97.1%, methoquinone content 0.2%) of purified 2-isopropyl-2-adamantyl methacrylate was obtained.
  • each of these resist films was spin-coated on a silicon wafer subjected to HMDS (hexamethyldisilazane) treatment, and heated at 100 ° C. for 180 seconds to form a thin film.
  • the substrate having this thin film is drawn using an electron beam drawing apparatus (acceleration voltage 50 kV), baked at 100 ° C. for 60 seconds, and then developed with an aqueous tetrabutylammonium solution having a concentration of 2.38 wt% for 60 seconds.
  • washing with pure water for 60 seconds, and then drying with a nitrogen stream a 100 nm line and space pattern was produced.
  • the obtained patterns were observed with a scanning electron microscope, no defects such as unsolved residues could be observed in the resist compositions R2 and R4, but unsolved in the resist compositions R1 and R3. And other defects were observed.
  • the 2-alkyl-2-adamantyl (meth) acrylate obtained by the method of the present invention includes a photoresist for semiconductor, a sealing agent for optical semiconductor, an optical electronic member (optical waveguide, optical communication lens, optical film, etc.) and It can be used as these adhesives.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

A method for the purification of 2-alkyl-2-adamantyl(meth)acrylates, which comprises: adding a polymerization inhibitor to a 2-alkyl-2-adamantyl (meth)acrylate; subjecting the resulting mixture to distillation; adding an alcoholic solvent to the 2-alkyl-2-adamantyl (meth)acrylate obtained by the distillation; and subjecting the mixture thus obtained to crystallization.

Description

2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法Method for purifying 2-alkyl-2-adamantyl (meth) acrylate

 本発明は、2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法に関する。 The present invention relates to a method for purifying 2-alkyl-2-adamantyl (meth) acrylate.

 2-アルキル-2-アダマンチル(メタ)アクリレートは特にArF用半導体用フォトレジスト向けのモノマーとして有用な基材で、半導体加工の微細化に伴い、より高純度のものが要望されている。アルキル基が炭素数1~3のものは蒸留精製できることから金属分の除去を目的として蒸留精製が行なわれている。これらは重合性の物質であることから、単蒸留又は薄膜蒸留が採用される。しかしながら、レジスト向けの高純度モノマーとして、重合性不純物のみならず非重合性不純物や重質成分が少ないことがさらに要求されている。 2-Alkyl-2-adamantyl (meth) acrylate is a base material that is particularly useful as a monomer for ArF semiconductor photoresists, and is required to have higher purity as semiconductor processing becomes finer. Since an alkyl group having 1 to 3 carbon atoms can be purified by distillation, distillation purification is carried out for the purpose of removing metal components. Since these are polymerizable substances, simple distillation or thin film distillation is employed. However, as a high-purity monomer for resist, it is further required that there are few non-polymerizable impurities and heavy components as well as polymerizable impurities.

 特許文献1では、2-アルキル-2-アダマンチル(メタ)アクリレートを蒸留して精製しているが、蒸留だけでは沸点の近い成分を除去できず、高純度とすることが困難である。
 特許文献2は、アルキルアダマンチル(メタ)アクリレートの蒸留を2回行なうことにより高純度品を得る製造方法を開示するが、蒸留操作を2度行なうことから、高温にさらされて重質分が多く生成する危険性が大きい。
In Patent Document 1, 2-alkyl-2-adamantyl (meth) acrylate is purified by distillation. However, it is difficult to obtain a high purity by removing only components having boiling points by distillation alone.
Patent Document 2 discloses a production method for obtaining a high-purity product by performing distillation of alkyladamantyl (meth) acrylate twice. However, since the distillation operation is performed twice, it is exposed to high temperatures and has a heavy content. The risk of generating is great.

 特許文献3は、加熱温度、時間を調整して薄膜蒸留を実施する方法を開示している。
 特許文献4は、複素環化合物、塩基性化合物の存在下で蒸留を行い、高純度品を得る方法を開示している。複素環化合物や塩基性化合物が混入する恐れがある。
 特許文献5は、分解抑制剤及び重合抑制剤として2,4-ビス-(n-オクチルチオ)-6-(4-ヒドロキシ-3,5-ジ-t-ブチルアニリノ)-1,3,5-トリアジン等を添加させて精製する。
Patent Document 3 discloses a method of performing thin film distillation by adjusting the heating temperature and time.
Patent Document 4 discloses a method for obtaining a high-purity product by performing distillation in the presence of a heterocyclic compound or a basic compound. Heterocyclic compounds and basic compounds may be mixed.
Patent Document 5 discloses 2,4-bis- (n-octylthio) -6- (4-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine as a decomposition inhibitor and a polymerization inhibitor. Etc. are added and purified.

特開2003-55301号公報JP 2003-55301 A 特開2008-297242号公報JP 2008-297242 A 特開2002-3448号公報Japanese Patent Laid-Open No. 2002-3448 特開2001-328967号公報JP 2001-328967 A 特開2005-120018号公報JP-A-2005-120018

 本発明の目的は、不純物が少ない2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法を提供することである。 An object of the present invention is to provide a method for purifying 2-alkyl-2-adamantyl (meth) acrylate with less impurities.

 本発明によれば、以下の精製方法が提供される。
1.2-アルキル-2-アダマンチル(メタ)アクリレートに、重合禁止剤を入れて蒸留し、
 前記蒸留した2-アルキル-2-アダマンチル(メタ)アクリレートに、アルコール系溶媒を添加して晶析する、
 2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法。
2.前記2-アルキル-2-アダマンチル(メタ)アクリレートのアルキルの炭素数が1~3である1記載の精製方法。
3.前記重合禁止剤がメトキノンである1又は2記載の精製方法。
4.前記アルコール系溶媒がメタノール、エタノール、n-プロパノール又はイソプロパノールである1~3のいずれか記載の精製方法。
According to the present invention, the following purification method is provided.
1.2-Alkyl-2-adamantyl (meth) acrylate is distilled by adding a polymerization inhibitor,
Crystallization by adding an alcohol solvent to the distilled 2-alkyl-2-adamantyl (meth) acrylate,
A method for purifying 2-alkyl-2-adamantyl (meth) acrylate.
2. 2. The purification method according to 1, wherein the alkyl of the 2-alkyl-2-adamantyl (meth) acrylate has 1 to 3 carbon atoms.
3. The purification method according to 1 or 2, wherein the polymerization inhibitor is methoquinone.
4). 4. The purification method according to any one of 1 to 3, wherein the alcohol solvent is methanol, ethanol, n-propanol or isopropanol.

 本発明によれば、不純物が少ない2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法が提供できる。 According to the present invention, a method for purifying 2-alkyl-2-adamantyl (meth) acrylate with less impurities can be provided.

 本発明の2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法は、以下の2工程を行う。
1)2-アルキル-2-アダマンチル(メタ)アクリレートに重合禁止剤を入れて蒸留する(蒸留工程)。
2)蒸留した2-アルキル-2-アダマンチル(メタ)アクリレートに、アルコール系溶媒を添加して晶析する(晶析工程)。
The method for purifying 2-alkyl-2-adamantyl (meth) acrylate of the present invention comprises the following two steps.
1) A polymerization inhibitor is added to 2-alkyl-2-adamantyl (meth) acrylate and distilled (distillation step).
2) Crystallize by adding an alcohol solvent to distilled 2-alkyl-2-adamantyl (meth) acrylate (crystallization step).

 蒸留工程に重合禁止剤を加えることにより、不純物である重合体の生成を抑制できる。重合禁止剤は、晶析工程で除去できる。従って、蒸留工程において使用できる重合禁止剤の種類、量や運転条件の選択幅が広くなる。
 晶析で製品を仕上げるため、最終製品の熱履歴を緩和することができ、重質分等不純物の副生を抑えることができる。また、晶析を行うことにより、沸点の近い不純物の除去が可能となり純度を高めることができる。
 熱履歴の緩和の観点から、蒸留は、好ましくは1回である。本発明では、晶析と組み合わせることにより1回の蒸留でも高純度の製品が得られる。蒸留は単蒸留又は薄膜蒸留でもよいが、単蒸留が好ましい。
By adding a polymerization inhibitor to the distillation step, it is possible to suppress the formation of a polymer that is an impurity. The polymerization inhibitor can be removed in the crystallization process. Accordingly, the selection range of the type, amount and operating conditions of the polymerization inhibitor that can be used in the distillation process is widened.
Since the product is finished by crystallization, the thermal history of the final product can be relaxed, and impurities such as heavy components can be suppressed. Further, by performing crystallization, impurities having a boiling point close to each other can be removed and the purity can be increased.
From the viewpoint of relaxing the thermal history, the distillation is preferably performed once. In the present invention, a high-purity product can be obtained even by one distillation by combining with crystallization. The distillation may be simple distillation or thin film distillation, but simple distillation is preferred.

 本発明の方法では、融点が常温以上の化合物は結晶粉末として容易に取り扱うことができる。これにより製品モノマーを使用する際の加熱溶融等の操作が不要になり、モノマー品質の維持や取り扱い作業の簡略化が実現できる。 In the method of the present invention, a compound having a melting point of room temperature or higher can be easily handled as a crystalline powder. This eliminates the need for operations such as heating and melting when the product monomer is used, and it is possible to maintain the monomer quality and simplify the handling operation.

 2-アルキル-2-アダマンチル(メタ)アクリレートは、以下の式(10)で表わされる。

Figure JPOXMLDOC01-appb-C000001
 式中、R11はアルキル基である。R12は水素原子又はメチル基である。 2-Alkyl-2-adamantyl (meth) acrylate is represented by the following formula (10).
Figure JPOXMLDOC01-appb-C000001
In the formula, R 11 is an alkyl group. R 12 is a hydrogen atom or a methyl group.

 2-アルキル-2-アダマンチル(メタ)アクリレートは、例えば以下の方法により製造できる。
 式(1)で示される金属2-アルキル-2-アダマンチルアルコラートと、(メタ)アクリル酸又はその誘導体であるエステル化剤を反応させる。
2-Alkyl-2-adamantyl (meth) acrylate can be produced, for example, by the following method.
A metal 2-alkyl-2-adamantyl alcoholate represented by the formula (1) is reacted with an esterifying agent which is (meth) acrylic acid or a derivative thereof.

Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002

 R11はアルキル基である。メチル基、エチル基、プロピル基、イソプロピル基等の炭素数1~3のアルキル基は、半導体用レジスト材料の原料としての有用性が高い。 R 11 is an alkyl group. Alkyl groups having 1 to 3 carbon atoms such as a methyl group, an ethyl group, a propyl group, and an isopropyl group are highly useful as raw materials for semiconductor resist materials.

 MはLi原子又は-MgXを表す。Xはハロゲン原子を表し、金属化合物の入手の容易さから塩素原子又は臭素原子が好ましく、反応性の観点から臭素原子が最も好ましい。 M represents Li atom or -MgX. X represents a halogen atom, preferably a chlorine atom or a bromine atom from the viewpoint of easy availability of the metal compound, and most preferably a bromine atom from the viewpoint of reactivity.

 式(1)の金属化合物のうち、ハロゲン化マグネシウム2-アルキル-2-アダマンチルアルコラートの具体例としては、塩化マグネシウム2-メチル-2-アダマンチルアルコラート、臭化マグネシウム2-メチル-2-アダマンチルアルコラート、塩化マグネシウム2-エチル-2-アダマンチルアルコラート、臭化マグネシウム2-エチル-2-アダマンチルアルコラート等が挙げられ、製造のし易さの観点から、臭化マグネシウム2-メチル-2-アダマンチルアルコラートが好ましい。 Among the metal compounds of the formula (1), specific examples of the magnesium halide 2-alkyl-2-adamantyl alcoholate include magnesium chloride 2-methyl-2-adamantyl alcoholate, magnesium bromide 2-methyl-2-adamantyl alcoholate, Examples thereof include magnesium chloride 2-ethyl-2-adamantyl alcoholate and magnesium bromide 2-ethyl-2-adamantyl alcoholate. From the viewpoint of ease of production, magnesium bromide 2-methyl-2-adamantyl alcoholate is preferable.

 ハロゲン化マグネシウム2-アルキル-2-アダマンチルアルコラートは、2-アダマンタノンとグリニアール試薬から簡単に製造できる。 Magnesium halide 2-alkyl-2-adamantyl alcoholate can be easily produced from 2-adamantanone and Grignard reagent.

 式(1)で示される金属化合物のうち、リチウム2-アルキル-2-アダマンチルアルコラートは、2-アダマンタノンとアルキルリチウムから公知の方法で製造できる。 Among the metal compounds represented by the formula (1), lithium 2-alkyl-2-adamantyl alcoholate can be produced from 2-adamantanone and alkyllithium by a known method.

 例えば、2-アダマンタノン及びハロゲン化アルキルを含有する溶液又は懸濁液(以下、有機原料液ともいう。)と金属リチウムを混合して直接反応させて得られる。 For example, it can be obtained by mixing and directly reacting a solution or suspension containing 2-adamantanone and an alkyl halide (hereinafter also referred to as organic raw material liquid) and metallic lithium.

 ハロゲン化アルキルは、特に限定されず、アルキルブロマイド、アルキルアイオダイド、アルキルクロライド等が使用できる。原料の入手が容易なことから、炭素数1~6のアルキル基を有するアルキルクロライド又はアルキルブロマイドが好ましい。具体的には、2-塩化プロパン、塩化ブチル、塩化ペンチル、塩化ヘキシル、臭化メチル、臭化エチル、臭化ブチル、よう化メチル、よう化エチル等が例示できる。
 ハロゲン化アルキルの使用量は、2-アダマンタノンの転化率の高さの点を考慮すると、モル比で2-アダマンタノン:ハロゲン化アルキル=1:1~1:2が望ましい。
The alkyl halide is not particularly limited, and alkyl bromide, alkyl iodide, alkyl chloride and the like can be used. Alkyl chloride or alkyl bromide having an alkyl group having 1 to 6 carbon atoms is preferable because the raw material is easily available. Specific examples include 2-chloropropane, butyl chloride, pentyl chloride, hexyl chloride, methyl bromide, ethyl bromide, butyl bromide, methyl iodide, ethyl iodide and the like.
Considering the high conversion rate of 2-adamantanone, the amount of alkyl halide used is preferably 2-adamantanone: alkyl halide = 1: 1 to 1: 2 in molar ratio.

 上記2-アダマンタノン及びハロゲン化アルキルを溶解又は分散させる溶媒又は分散媒としては、金属リチウム、アルキルリチウム及びリチウムアルコキシドに対して安定な有機溶媒が使用できる。このような有機溶媒としては、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ヘキサン、ベンゼン、トルエン等の炭化水素系溶媒、及びこれらの混合溶媒等が挙げられる。 As the solvent or dispersion medium for dissolving or dispersing the 2-adamantanone and the alkyl halide, an organic solvent that is stable with respect to metallic lithium, alkyllithium, and lithium alkoxide can be used. Examples of such an organic solvent include ether solvents such as diethyl ether, tetrahydrofuran, and dioxane, hydrocarbon solvents such as hexane, benzene, and toluene, and mixed solvents thereof.

 尚、後述するエステル化反応を引続き行う場合には、上記反応終了後の反応液中に金属リチウムが殆ど残らないようにすることが好ましい。このため金属リチウムの添加量は2-アダマンタノン1モルに対して3モル以下、特に1.5~2.5モルとすることが好ましい。 In addition, when continuing the esterification reaction mentioned later, it is preferable that almost no metallic lithium remains in the reaction liquid after completion of the above reaction. Therefore, the amount of metallic lithium added is preferably 3 mol or less, particularly 1.5 to 2.5 mol per mol of 2-adamantanone.

 上記アルキル化反応の反応時間は、金属リチウムの添加速度や、反応熱の除去効率等によって異なるが、通常0.5時間~48時間である。また、金属リチウムの失活を防ぐため、アルゴン等の不活性雰囲気下で反応を行うことが望ましい。 The reaction time for the alkylation reaction is usually 0.5 to 48 hours, although it varies depending on the addition rate of metallic lithium, the removal efficiency of reaction heat, and the like. In order to prevent the deactivation of metallic lithium, it is desirable to perform the reaction in an inert atmosphere such as argon.

 エステル化剤として、(メタ)アクリル酸ハライド、下記式(4)で示される(メタ)アクリル酸無水物、又は下記式(5)で示されるα,β位に二重結合を有する炭素数2~8のアルコール又はフェノール類と、(メタ)アクリル酸とのエステル化合物を用いることができる。

Figure JPOXMLDOC01-appb-C000003
As an esterifying agent, (meth) acrylic acid halide, (meth) acrylic anhydride represented by the following formula (4), or carbon atoms having double bonds at the α and β positions represented by the following formula (5): An ester compound of (8) alcohol or phenol and (meth) acrylic acid can be used.
Figure JPOXMLDOC01-appb-C000003

 式(4)、(5)中、R20は水素原子又はメチル基を表す。R30、R40及びR50は水素原子、アルキル基又は置換基を有してもよいアリール基を表し、R30とR40又はR40とR50が互いに繋がって環状となってもよい。R30、R40、R50の炭素数の合計は0~6である。 In formulas (4) and (5), R 20 represents a hydrogen atom or a methyl group. R 30 , R 40 and R 50 represent a hydrogen atom, an alkyl group or an aryl group which may have a substituent, and R 30 and R 40 or R 40 and R 50 may be connected to each other to form a ring. The total number of carbon atoms of R 30 , R 40 , and R 50 is 0-6.

 式(5)で表される化合物としては、(メタ)アクリル酸ビニル、(メタ)アクリル酸イソプロペニル、(メタ)アクリル酸1-シクロヘキセニル、(メタ)アクリル酸2,6-ジメチル-1-シクロヘキセニル、(メタ)アクリル酸1-フェニルエテニル、(メタ)アクリル酸フェニル、(メタ)アクリル酸4-ニトロフェニル等を例示できる。 Examples of the compound represented by the formula (5) include vinyl (meth) acrylate, isopropenyl (meth) acrylate, 1-cyclohexenyl (meth) acrylate, and 2,6-dimethyl-1- (meth) acrylate. Examples include cyclohexenyl, 1-phenylethenyl (meth) acrylate, phenyl (meth) acrylate, 4-nitrophenyl (meth) acrylate, and the like.

 上記式(1)の金属化合物と上記のエステル化剤を反応させて、式(10)の2-アルキル-2-アダマンチル(メタ)アクリレートを製造できる。この反応は上記化合物を混合することにより行う。反応溶媒の使用により作業性が向上し、さらに反応温度の制御が容易になる。 A 2-alkyl-2-adamantyl (meth) acrylate of the formula (10) can be produced by reacting the metal compound of the formula (1) with the esterifying agent. This reaction is carried out by mixing the above compounds. Use of the reaction solvent improves workability and further facilitates control of the reaction temperature.

 反応に用いる溶媒としては、金属化合物及びエステル化剤と反応を起さないものであれば任意の溶媒を利用できる。具体的には、エチルエーテル、テトラヒドロフラン(THF)、ジオキサン等のエーテル系溶媒、ヘキサン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒、ジクロロメタン等のハロゲン系溶媒等を例示できる。
 溶媒中の金属化合物の濃度は、0.01~10mol/lが好ましい。
 反応に使用するエステル化剤の量は、金属化合物1モルに対し、0.9~1.3モルが好ましい。
As the solvent used in the reaction, any solvent can be used as long as it does not react with the metal compound and the esterifying agent. Specific examples include ether solvents such as ethyl ether, tetrahydrofuran (THF) and dioxane, hydrocarbon solvents such as hexane, benzene, toluene and xylene, and halogen solvents such as dichloromethane.
The concentration of the metal compound in the solvent is preferably 0.01 to 10 mol / l.
The amount of the esterifying agent used in the reaction is preferably 0.9 to 1.3 mol per 1 mol of the metal compound.

 金属化合物溶液にエステル化剤又はその溶液を加える場合、反応温度を制御しながら、比較的時間をかけて、少量ずつ、連続的又は間欠的に金属化合物溶液を滴下することが好ましい。 When adding an esterifying agent or a solution thereof to the metal compound solution, it is preferable to drop the metal compound solution continuously or intermittently little by little over a relatively long time while controlling the reaction temperature.

 反応時間は滴下時間の長短によっても異なるが、通常滴下終了後0.5~6時間とすることが好ましい。エステル化反応温度は、-20~100℃が好ましい。エステル化剤や金属化合物の失活を防ぐ観点から、反応は窒素やアルゴンのような不活性雰囲気下で行うことが望ましい。 Although the reaction time varies depending on the length of the dropping time, it is usually preferably 0.5 to 6 hours after the dropping. The esterification reaction temperature is preferably −20 to 100 ° C. From the viewpoint of preventing the deactivation of the esterifying agent and the metal compound, the reaction is desirably performed in an inert atmosphere such as nitrogen or argon.

 さらに、エステル化反応の際に反応系に3級アミン化合物を加えることにより、より高い転化率でエステル化合物を得ることができる。3級アミン化合物は、特に限定されないが、トリエチルアミン、トリブチルアミン、N-メチルピベリジン、N-メチルモルホリン、1,4-ジアザビシクロ[2.2.2]オクタン、1,7-ジアザビシクロ[4.3.0]ノナ-6-エン、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン等の環状、又は非環状の脂肪族3級アミンや、ジメチルアニリン、ピリジン、4-ジメチルアミノピリジン等の芳香族3級アミンを用いることができる。3級アミン化合物の添加量は、金属2-アルキル-2-アダマンチルアルコラートに対して通常0.01当量~0.5当量で十分である。 Furthermore, an ester compound can be obtained with a higher conversion rate by adding a tertiary amine compound to the reaction system during the esterification reaction. The tertiary amine compound is not particularly limited, but triethylamine, tributylamine, N-methylpiberidine, N-methylmorpholine, 1,4-diazabicyclo [2.2.2] octane, 1,7-diazabicyclo [4.3.0]. ] Cyclic or acyclic aliphatic tertiary amines such as non-6-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene, dimethylaniline, pyridine, 4-dimethylaminopyridine, etc. An aromatic tertiary amine can be used. The amount of tertiary amine compound added is usually 0.01 to 0.5 equivalents relative to the metal 2-alkyl-2-adamantyl alcoholate.

 本発明の精製方法では、粗2-アルキル-2-アダマンチル(メタ)アクリレートに重合禁止剤を加え、蒸留する。重合禁止剤としては、例えばメトキノン、ヒドロキノン、フェノチアジン、メトキシフェノチアジンが挙げられる。重合禁止剤の添加量は粗2-アルキル-2-アダマンチル(メタ)アクリレートに対して例えば、10~10000wtppmである。 In the purification method of the present invention, a polymerization inhibitor is added to crude 2-alkyl-2-adamantyl (meth) acrylate and distilled. Examples of the polymerization inhibitor include methoquinone, hydroquinone, phenothiazine, and methoxyphenothiazine. The addition amount of the polymerization inhibitor is, for example, 10 to 10,000 wtppm with respect to the crude 2-alkyl-2-adamantyl (meth) acrylate.

 アダマンタン系化合物は、昇華性物質として知られている。また、アルキルアダマンチル(メタ)アクリレートは、重合性官能基を有し、熱的に不安定な化合物でもある。従って、蒸留精製工程における蒸留操作は減圧下にできるだけ低温で行うのが好ましい。
 蒸留操作を減圧下で行う際の真空度は、通常は2kPa以下、好ましくは1kPa以下、さらに好ましくは100Pa以下である。また、下限は低すぎなければ特に問題はないが、通常は蒸留設備の気密性や真空ポンプの性能のため限界がある。真空度は、好ましくは、蒸留温度が以下の範囲内になるように制御することが好ましい。
An adamantane compound is known as a sublimable substance. Further, alkyladamantyl (meth) acrylate is a thermally unstable compound having a polymerizable functional group. Therefore, the distillation operation in the distillation purification process is preferably performed at a temperature as low as possible under reduced pressure.
The degree of vacuum when performing the distillation operation under reduced pressure is usually 2 kPa or less, preferably 1 kPa or less, and more preferably 100 Pa or less. Further, there is no particular problem if the lower limit is not too low, but there is usually a limit due to the tightness of the distillation equipment and the performance of the vacuum pump. The degree of vacuum is preferably controlled so that the distillation temperature is within the following range.

 蒸留温度は、通常は170℃以下、好ましくは150℃以下であり、特に130℃以下が好ましい。下限は通常20℃以上である。この温度が高すぎると、目的物の安定性に問題が発生する可能性がある。また、低すぎるとコンデンサーの温度設定を非常に低温にする必要があり、工業的に有利な操作にならない。
 コンデンサーの冷却温度は任意に選択することができるが、通常は40℃以下、好ましくは30℃以下である。冷却温度の下限は-20℃以上、好ましくは-10℃以上である。この冷却温度が高すぎると、留出液として捕集しきれずコールドトラップまで揮発する量が増加し、装置的に不利であり、低すぎると目的物の粘度が上昇するために留出液が流れないといったトラブルを生じる傾向がある。
The distillation temperature is usually 170 ° C. or lower, preferably 150 ° C. or lower, and particularly preferably 130 ° C. or lower. The lower limit is usually 20 ° C. or higher. If this temperature is too high, there may be a problem with the stability of the object. On the other hand, if the temperature is too low, the condenser must be set at a very low temperature, which is not an industrially advantageous operation.
The cooling temperature of the condenser can be arbitrarily selected, but is usually 40 ° C. or lower, preferably 30 ° C. or lower. The lower limit of the cooling temperature is −20 ° C. or higher, preferably −10 ° C. or higher. If the cooling temperature is too high, the amount of volatilization up to the cold trap will not be collected as the distillate, which is disadvantageous in terms of equipment, and if it is too low, the viscosity of the target product will increase and the distillate will flow There is a tendency to cause trouble.

 蒸留操作は、バッチ蒸留でも、連続蒸留でも実施可能である。本発明の目的化合物は熱的に不安定な化合物であり、連続蒸留は加熱部での滞留時間が短くなる点や、生産性の面で好ましい。連続蒸留としては、フラッシュ蒸留、分子蒸留等が例示される。
 工業的な装置としては、熱的に不安定な化合物の蒸留に一般的に使用される薄膜蒸留装置を使用することが好ましい。
The distillation operation can be carried out either batchwise or continuously. The target compound of the present invention is a thermally unstable compound, and continuous distillation is preferable from the viewpoint of shortening the residence time in the heating section and productivity. Examples of continuous distillation include flash distillation and molecular distillation.
As an industrial apparatus, it is preferable to use a thin film distillation apparatus generally used for distillation of thermally unstable compounds.

 次に、蒸留した2-アルキル-2-アダマンチル(メタ)アクリレートにアルコール系溶媒を添加し、晶析する。
 アルコール系溶剤は、上記重合禁止剤を溶解するものが好ましい。例えばメタノール、エタノール、n-プロパノール又はイソプロパノールであり、メタノールが好ましい。
Next, an alcoholic solvent is added to the distilled 2-alkyl-2-adamantyl (meth) acrylate to cause crystallization.
The alcohol solvent is preferably one that dissolves the polymerization inhibitor. For example, methanol, ethanol, n-propanol or isopropanol, with methanol being preferred.

 晶析は、アルコール系溶媒を添加した溶液を冷却して一定時間保持し、結晶を析出させて行う。晶析条件は用いる重合禁止剤、溶媒等によって異なるが、晶析の温度は例えば-20℃~20℃である。晶析時間は例えば0.5~24時間である。
 晶析後の液部を例えばデカンテーションにより抜き出して、晶析を複数回行ってもよい。また、溶液に少量の種晶を加えて晶析を行ってもよい。晶析は1回又は2回以上実施してもよい。
Crystallization is performed by cooling the solution to which the alcohol solvent has been added and holding it for a certain period of time to precipitate crystals. The crystallization conditions vary depending on the polymerization inhibitor, solvent, etc. used, but the crystallization temperature is, for example, -20 ° C to 20 ° C. The crystallization time is, for example, 0.5 to 24 hours.
The liquid part after crystallization may be extracted by, for example, decantation, and crystallization may be performed a plurality of times. Further, crystallization may be performed by adding a small amount of seed crystals to the solution. Crystallization may be performed once or twice or more.

合成例1
 窒素雰囲気下で2-アダマンタノン150g(1.0mol)にテトラヒドロフラン(THF)450gを加えて溶解した。ここに、メチルマグネシウムブロマイドのTHF溶液(1.0mol/l)1100ml(1.1mol)を反応液温度が40℃を超えないように滴下した。滴下終了後1時間攪拌し、臭化マグネシウム2-メチル-2-アダマンチルアルコラートのTHF溶液を得た。これにメタクリル酸クロライド125g(0.24mol)を反応液温度が40℃を超えないように滴下した。滴下終了後、4時間室温で攪拌した。次に、液温度を10℃以下に保ちながらメタノール50gと10%水酸化ナトリウム水溶液80gを加えて1時間攪拌し、その後有機層を分離した。有機層をさらに10%水酸化ナトリウム水溶液で洗浄した後、溶媒を減圧留去し、粗2-メチル-2-アダマンチルメタクリレートを115g得た(粗収率49%)(粗体モノマーA)。
Synthesis example 1
Under a nitrogen atmosphere, 450 g of tetrahydrofuran (THF) was added to 150 g (1.0 mol) of 2-adamantanone and dissolved. Here, 1100 ml (1.1 mol) of a THF solution (1.0 mol / l) of methylmagnesium bromide was added dropwise so that the reaction solution temperature did not exceed 40 ° C. After completion of the dropping, the mixture was stirred for 1 hour to obtain a THF solution of magnesium bromide 2-methyl-2-adamantyl alcoholate. To this was added dropwise 125 g (0.24 mol) of methacrylic acid chloride so that the reaction solution temperature did not exceed 40 ° C. After completion of dropping, the mixture was stirred at room temperature for 4 hours. Next, 50 g of methanol and 80 g of a 10% aqueous sodium hydroxide solution were added while maintaining the liquid temperature at 10 ° C. or lower and stirred for 1 hour, and then the organic layer was separated. The organic layer was further washed with a 10% aqueous sodium hydroxide solution, and the solvent was distilled off under reduced pressure to obtain 115 g of crude 2-methyl-2-adamantyl methacrylate (crude yield 49%) (crude monomer A).

実施例1
 合成例1で得た粗2-メチル-2-アダマンチルメタクリレートに重合禁止剤としてメトキノンを0.2%添加して、0.3mmHgの減圧下、85℃~90℃で単蒸留し、蒸留精製2-メチル-2-アダマンチルメタクリレート101g(回収率88%)(GC(ガスクロマトグラフィー)純度99.0%)を得た。
 上記の蒸留精製した2-メチル-2-アダマンチルメタクリレート200gに、メタノール200gを加えて溶液とした後、-10℃に冷却して、少量の種晶を加えて-10℃で2時間保持して晶析を行なった。デカンテーションして液部200gを抜き出し、これにメタノール200gを加えて20℃で溶解した後、-10℃に冷却して、少量の種晶を加えて-10℃で2時間保持して2度目の晶析を行なった。液部を抜き出した後、結晶を室温に戻して溶解させて、乾燥空気をキャピラリーよりバブリングしながら20℃で減圧濃縮を行ない、高純度2-メチル-2-アダマンチルメタクリレート134.0g(GC純度99.9%、回収率67%)を得た(精製モノマーA)。この高純度2-メチル-2-アダマンチルメタクリレートは融点12.6~13.1℃(示差走査熱量測定(DSC))であった。
Example 1
Add 0.2% of methoquinone as a polymerization inhibitor to the crude 2-methyl-2-adamantyl methacrylate obtained in Synthesis Example 1 and perform simple distillation under reduced pressure of 0.3 mmHg at 85 ° C. to 90 ° C. -101 g of methyl-2-adamantyl methacrylate (recovery rate 88%) (GC (gas chromatography) purity 99.0%) was obtained.
200 g of methanol is added to 200 g of the above-purified 2-methyl-2-adamantyl methacrylate to make a solution, then cooled to −10 ° C., a small amount of seed crystals are added, and the mixture is kept at −10 ° C. for 2 hours. Crystallization was performed. Decant and extract 200 g of liquid, add 200 g of methanol to this, dissolve at 20 ° C., cool to −10 ° C., add a small amount of seed crystals, and hold at −10 ° C. for 2 hours. Was crystallized. After extracting the liquid part, the crystal was returned to room temperature and dissolved, and concentrated under reduced pressure at 20 ° C. while bubbling dry air through a capillary to obtain 134.0 g of high-purity 2-methyl-2-adamantyl methacrylate (GC purity 99 9%, 67% recovery) (purified monomer A). The high purity 2-methyl-2-adamantyl methacrylate had a melting point of 12.6 to 13.1 ° C. (differential scanning calorimetry (DSC)).

合成例2
 窒素雰囲気下でTHF200ml中にLi3.05g(0.44mol)を加え、1時間攪拌した。この中に、2-アダマンタノン30g(0.2mol)、2-クロロプロパン25.8g(0.33mol)をTHF100mlに溶解した液を、20℃以下を保つように冷却しながら30分かけて滴下した。滴下後、20℃で90分間攪拌して、リチウム2-イソプロピル-2-アダマンチルアルコラートのTHF溶液を得た。これに無水メタクリル酸36.2g(0.24mol)を、20℃以下を保つように冷却しながら15分かけて滴下し、滴下後20℃で60分攪拌を行い、2-イソプロピル-2-アダマンチルメタクリレートを合成した。反応後、ジエチルエーテル400mlを添加後、0.2N NaOH200mlを加えて20℃で60分攪拌し、水相を除去した後、純水200mlで2回洗浄を行なった。これを25℃で溶媒を減圧留去し、粗体2-イソプロピル-2-アダマンチルメタクリレートを52.7g(粗収率101%,GC純度83.0%,GPC純度83.0%)を得た(粗体モノマーD)。
Synthesis example 2
Under nitrogen atmosphere, Li3.05g (0.44mol) was added in THF200ml, and it stirred for 1 hour. Into this, a solution prepared by dissolving 30 g (0.2 mol) of 2-adamantanone and 25.8 g (0.33 mol) of 2-chloropropane in 100 ml of THF was added dropwise over 30 minutes while maintaining the temperature to be 20 ° C. or lower. . After dropping, the mixture was stirred at 20 ° C. for 90 minutes to obtain a THF solution of lithium 2-isopropyl-2-adamantyl alcoholate. To this, 36.2 g (0.24 mol) of methacrylic anhydride was added dropwise over 15 minutes while cooling so as to keep the temperature at 20 ° C. or lower, and then stirred at 20 ° C. for 60 minutes to give 2-isopropyl-2-adamantyl. Methacrylate was synthesized. After the reaction, 400 ml of diethyl ether was added, 200 ml of 0.2N NaOH was added, and the mixture was stirred at 20 ° C. for 60 minutes to remove the aqueous phase, followed by washing with 200 ml of pure water twice. The solvent was distilled off under reduced pressure at 25 ° C. to obtain 52.7 g of crude 2-isopropyl-2-adamantyl methacrylate (crude yield 101%, GC purity 83.0%, GPC purity 83.0%). (Crude monomer D).

実施例2
 合成例2で得た粗2-イソプロピル-2-アダマンチルメタクリレートに重合禁止剤としてメトキノン0.07gを添加し、乾燥空気をキャピラリよりバブリングしながら0.1kPa,100~120℃で単蒸留し、蒸留精製2-イソプロピル-2-アダマンチルメタクリレートを36.9g(0.14mol、GC純度86.9%、GPC(ゲル浸透クロマトグラフィー)純度97.1%、メトキノン含有量0.2%)を得た。
Example 2
To the crude 2-isopropyl-2-adamantyl methacrylate obtained in Synthesis Example 2, 0.07 g of methoquinone was added as a polymerization inhibitor, and simple distillation was performed at 100 to 120 ° C. while bubbling dry air through a capillary. 36.9 g (0.14 mol, GC purity 86.9%, GPC (gel permeation chromatography) purity 97.1%, methoquinone content 0.2%) of purified 2-isopropyl-2-adamantyl methacrylate was obtained.

 上記の蒸留精製した2-イソプロピル-2-アダマンチルメタクリレート36.9gに、メタノール79mlを加えて溶解した後0℃に冷却して、少量の種晶を加えて0℃で12時間保持して晶析を行った。これをろ過、回収して25℃で減圧乾燥し、高純度2-イソプロピル-2-アダマンチルメタクリレート32.1g(0.12mol、晶析回収率87%、GC純度99.5%、GPC純度99.9%)を得た(精製モノマーD)。合成例2も含めたトータル収率は61%であった。この高純度2-イソプロピル-2-アダマンチルメタクリレートは融点37.7~40.6℃(DSC)であった。 To 36.9 g of the above-purified 2-isopropyl-2-adamantyl methacrylate, 79 ml of methanol was added and dissolved, cooled to 0 ° C., a small amount of seed crystals were added, and the mixture was kept at 0 ° C. for 12 hours for crystallization. Went. This was filtered, recovered and dried under reduced pressure at 25 ° C., and 32.1 g of high purity 2-isopropyl-2-adamantyl methacrylate (0.12 mol, crystallization recovery rate 87%, GC purity 99.5%, GPC purity 99. 9%) was obtained (purified monomer D). The total yield including synthesis example 2 was 61%. This high purity 2-isopropyl-2-adamantyl methacrylate had a melting point of 37.7 to 40.6 ° C. (DSC).

参考例1
 メチルイソブチルケトンに、2,2’-アゾビス(イソ酪酸)ジメチル/合成例1の粗体モノマーA/モノマーB/モノマーCを重量比0.1/1.0/1.0/1.0で仕込み、加熱還流下、2時間撹拌した。その後、反応液を大量のメタノールと水の混合溶媒に注いで沈殿させる動作を3回行い精製した。その結果、粗体モノマーA:モノマーB:モノマーCの共重合組成(mol)=23:44:33,重量平均分子量(Mw)が8800,分散度(Mw/Mn)2.47の共重合体P1を得た。結果を表1に示す。

Figure JPOXMLDOC01-appb-C000004
Reference example 1
In methyl isobutyl ketone, 2,2′-azobis (isobutyric acid) dimethyl / crude monomer A / monomer B / monomer C of Synthesis Example 1 at a weight ratio of 0.1 / 1.0 / 1.0 / 1.0 The mixture was stirred and stirred for 2 hours under reflux. After that, the reaction solution was purified by pouring it into a large amount of methanol / water mixed solvent and precipitating three times. As a result, copolymer composition (mol) = 23: 44: 33 of crude monomer A: monomer B: monomer C, a weight average molecular weight (Mw) of 8800, and a degree of dispersion (Mw / Mn) of 2.47 P1 was obtained. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-C000004

参考例2
 参考例1において、粗体モノマーAを実施例1の精製モノマーAに変更した以外は同様に反応を行った。その結果、精製モノマーA:モノマーB:モノマーCの共重合組成(mol)=25:46:29,重量平均分子量(Mw)が7900,分散度(Mw/Mn)2.41の共重合体P2を得た。結果を表1に示す。
Reference example 2
The reaction was performed in the same manner as in Reference Example 1 except that the crude monomer A was changed to the purified monomer A of Example 1. As a result, copolymer P2 of copolymerization composition (mol) of purified monomer A: monomer B: monomer C = 25: 46: 29, weight average molecular weight (Mw) is 7900, and dispersity (Mw / Mn) is 2.41. Got. The results are shown in Table 1.

参考例3
 参考例1において、粗体モノマーAを合成例2で合成した粗体モノマーDに変更した以外は同様に反応を行った。その結果、合成例2の粗体モノマーD:モノマーB:モノマーCの共重合組成(mol)=20:47:33,重量平均分子量(Mw)が8600,分散度(Mw/Mn)2.51の共重合体P3を得た。結果を表1に示す。

Figure JPOXMLDOC01-appb-C000005
Reference example 3
The reaction was performed in the same manner as in Reference Example 1 except that the crude monomer A was changed to the crude monomer D synthesized in Synthesis Example 2. As a result, the copolymer composition (mol) of the crude monomer D: monomer B: monomer C in Synthesis Example 2 = 20: 47: 33, the weight average molecular weight (Mw) is 8600, and the degree of dispersion (Mw / Mn) is 2.51. The copolymer P3 was obtained. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-C000005

参考例4
 参考例1において、粗体モノマーAを実施例2の精製モノマーDに変更した以外は同様に反応を行った。その結果、精製モノマーD:モノマーB:モノマーCの共重合組成(mol)=21:46:33、重量平均分子量(Mw)が7800、分散度(Mw/Mn)2.45の共重合体P4を得た。結果を表1に示す。
Reference example 4
The reaction was performed in the same manner as in Reference Example 1 except that the crude monomer A was changed to the purified monomer D of Example 2. As a result, copolymer P4 of purified monomer D: monomer B: monomer C copolymer composition (mol) = 21: 46: 33, weight average molecular weight (Mw) 7800, dispersity (Mw / Mn) 2.45 Got. The results are shown in Table 1.

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

評価例1
 上記の共重合体(P1)に対し、光酸発生剤としてトリフェニルスルホニウムノナフルオロブタンスルホネート 5wt%加え、これらが10wt%になるようにプロピレングリコールモノメチルエーテルアセテートで溶解し、レジスト組成物R1を調製した。シリコンウエハー上に、調製したレジスト組成物を塗布し、110℃で、60秒間ベークを行い、レジスト膜を形成した。同様の方法で、共重合体(P2)からレジスト組成物R2を、共重合体(P3)からレジスト組成物R3を、共重合体(P4)からレジスト組成物R4を調製し、それぞれのレジスト膜を形成した。
Evaluation Example 1
To the above copolymer (P1), 5 wt% of triphenylsulfonium nonafluorobutane sulfonate is added as a photoacid generator, and dissolved in propylene glycol monomethyl ether acetate so that these are 10 wt% to prepare a resist composition R1 did. The prepared resist composition was applied onto a silicon wafer and baked at 110 ° C. for 60 seconds to form a resist film. In the same manner, a resist composition R2 is prepared from the copolymer (P2), a resist composition R3 is prepared from the copolymer (P3), and a resist composition R4 is prepared from the copolymer (P4). Formed.

 これらのレジスト膜を、それぞれ、HMDS(ヘキサメチルジシラザン)処理を施したシリコンウェハ上にスピンコートし、100℃で180秒加熱することにより薄膜を形成させた。次いで、この薄膜を有する基板に対して電子線描画装置(加速電圧50kV)を用いて描画し、100℃で60秒ベークした後、濃度が2.38重量%のテトラブチルアンモニウム水溶液で60秒間現像処理し、純水にて60秒洗浄し、その後、窒素気流により乾燥することにより、いずれも100nmのラインアンドスペースパターンを作製した。得られたそれぞれのパターンを走査型電子顕微鏡にて観察したところ、レジスト組成物R2,R4においては、解け残り等の欠陥が一切観測できなかったが、レジスト組成物R1,R3においては、解け残り等の欠陥が観測された。 Each of these resist films was spin-coated on a silicon wafer subjected to HMDS (hexamethyldisilazane) treatment, and heated at 100 ° C. for 180 seconds to form a thin film. Next, the substrate having this thin film is drawn using an electron beam drawing apparatus (acceleration voltage 50 kV), baked at 100 ° C. for 60 seconds, and then developed with an aqueous tetrabutylammonium solution having a concentration of 2.38 wt% for 60 seconds. After processing, washing with pure water for 60 seconds, and then drying with a nitrogen stream, a 100 nm line and space pattern was produced. When the obtained patterns were observed with a scanning electron microscope, no defects such as unsolved residues could be observed in the resist compositions R2 and R4, but unsolved in the resist compositions R1 and R3. And other defects were observed.

 本発明の方法によって得られた2-アルキル-2-アダマンチル(メタ)アクリレートは、半導体用フォトレジスト、光半導体用封止剤、光学電子部材(光導波路、光通信用レンズ及び光学フィルム等)及びこれらの接着剤として使用できる。 The 2-alkyl-2-adamantyl (meth) acrylate obtained by the method of the present invention includes a photoresist for semiconductor, a sealing agent for optical semiconductor, an optical electronic member (optical waveguide, optical communication lens, optical film, etc.) and It can be used as these adhesives.

 上記に本発明の実施形態及び/又は実施例を幾つか詳細に説明したが、当業者は、本発明の新規な教示及び効果から実質的に離れることなく、これら例示である実施形態及び/又は実施例に多くの変更を加えることが容易である。従って、これらの多くの変更は本発明の範囲に含まれる。
 この明細書に記載の文献の内容を全てここに援用する。
Although several embodiments and / or examples of the present invention have been described in detail above, those skilled in the art will appreciate that these exemplary embodiments and / or embodiments are substantially without departing from the novel teachings and advantages of the present invention. It is easy to make many changes to the embodiment. Accordingly, many of these modifications are within the scope of the present invention.
The entire contents of the documents described in this specification are incorporated herein by reference.

Claims (4)

 2-アルキル-2-アダマンチル(メタ)アクリレートに、重合禁止剤を入れて蒸留し、
 前記蒸留した2-アルキル-2-アダマンチル(メタ)アクリレートに、アルコール系溶媒を添加して晶析する、
 2-アルキル-2-アダマンチル(メタ)アクリレートの精製方法。
2-alkyl-2-adamantyl (meth) acrylate, distilled with a polymerization inhibitor,
Crystallization by adding an alcohol solvent to the distilled 2-alkyl-2-adamantyl (meth) acrylate,
A method for purifying 2-alkyl-2-adamantyl (meth) acrylate.
 前記2-アルキル-2-アダマンチル(メタ)アクリレートのアルキルの炭素数が1~3である請求項1記載の精製方法。 The purification method according to claim 1, wherein the alkyl of the 2-alkyl-2-adamantyl (meth) acrylate has 1 to 3 carbon atoms.  前記重合禁止剤がメトキノンである請求項1又は2記載の精製方法。 The purification method according to claim 1 or 2, wherein the polymerization inhibitor is methoquinone.  前記アルコール系溶媒がメタノール、エタノール、n-プロパノール又はイソプロパノールである請求項1~3のいずれか記載の精製方法。 The purification method according to any one of claims 1 to 3, wherein the alcohol solvent is methanol, ethanol, n-propanol or isopropanol.
PCT/JP2011/002833 2010-05-21 2011-05-20 Method for purification of 2-alkyl-2-adamantyl (meth)acrylates Ceased WO2011145354A1 (en)

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JP2014198698A (en) * 2013-03-29 2014-10-23 大阪有機化学工業株式会社 Method for manufacturing adamantyl (meth)acrylate compound
JP2019034959A (en) * 2018-10-31 2019-03-07 大阪有機化学工業株式会社 Method for producing adamantyl (meth)acrylate compound

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JP2003073334A (en) * 2001-09-04 2003-03-12 Tokuyama Corp 2-ethyl-2-adamantyl methacrylate crystal powder
JP2004210745A (en) * 2003-01-08 2004-07-29 Takasago Internatl Corp Method for producing (meth) acrylate
JP2008297242A (en) * 2007-05-31 2008-12-11 Mitsubishi Chemicals Corp Method for producing high-purity alkyladamantyl (meth) acrylate

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JP2003073334A (en) * 2001-09-04 2003-03-12 Tokuyama Corp 2-ethyl-2-adamantyl methacrylate crystal powder
JP2004210745A (en) * 2003-01-08 2004-07-29 Takasago Internatl Corp Method for producing (meth) acrylate
JP2008297242A (en) * 2007-05-31 2008-12-11 Mitsubishi Chemicals Corp Method for producing high-purity alkyladamantyl (meth) acrylate

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JP2014198698A (en) * 2013-03-29 2014-10-23 大阪有機化学工業株式会社 Method for manufacturing adamantyl (meth)acrylate compound
JP2019034959A (en) * 2018-10-31 2019-03-07 大阪有機化学工業株式会社 Method for producing adamantyl (meth)acrylate compound

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