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WO2011037438A3 - 드라이필름 포토레지스트 - Google Patents

드라이필름 포토레지스트 Download PDF

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Publication number
WO2011037438A3
WO2011037438A3 PCT/KR2010/006592 KR2010006592W WO2011037438A3 WO 2011037438 A3 WO2011037438 A3 WO 2011037438A3 KR 2010006592 W KR2010006592 W KR 2010006592W WO 2011037438 A3 WO2011037438 A3 WO 2011037438A3
Authority
WO
WIPO (PCT)
Prior art keywords
dry film
film photoresist
exposure
protection layer
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2010/006592
Other languages
English (en)
French (fr)
Other versions
WO2011037438A2 (ko
Inventor
석상훈
문희완
봉동훈
이병일
한국현
조승제
최종욱
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kolon Industries Inc
Original Assignee
Kolon Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020100060520A external-priority patent/KR101739730B1/ko
Application filed by Kolon Industries Inc filed Critical Kolon Industries Inc
Priority to JP2012530787A priority Critical patent/JP5551255B2/ja
Priority to CN201080043364.8A priority patent/CN102549500B/zh
Publication of WO2011037438A2 publication Critical patent/WO2011037438A2/ko
Publication of WO2011037438A3 publication Critical patent/WO2011037438A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)

Abstract

본 발명은 드라이필름 포토레지스트에 관한 것으로, 구체적으로 본 발명에 따른 드라이필름 포토레지스트는 지지체 필름을 제거한 상태로 노광공정이 실시가능하여, 지지체 필름에 의한 노광 효과의 악영향을 방지함으로써 해상도를 향상시킬 수 있다. 더욱이, 수지 보호층이 존재하는 상태로 노광을 실시하더라도 수지 보호층으로 인한 투명성 저하나 현상속도 저하가 발생하지 않아 고해상도를 달성할 수 있다.
PCT/KR2010/006592 2009-09-28 2010-09-28 드라이필름 포토레지스트 Ceased WO2011037438A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012530787A JP5551255B2 (ja) 2009-09-28 2010-09-28 ドライフィルムフォトレジスト
CN201080043364.8A CN102549500B (zh) 2009-09-28 2010-09-28 干膜光致抗蚀剂

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR20090092045 2009-09-28
KR10-2009-0092045 2009-09-28
KR20090112829 2009-11-20
KR10-2009-0112829 2009-11-20
KR10-2010-0060520 2010-06-25
KR1020100060520A KR101739730B1 (ko) 2010-06-25 2010-06-25 드라이필름 포토레지스트

Publications (2)

Publication Number Publication Date
WO2011037438A2 WO2011037438A2 (ko) 2011-03-31
WO2011037438A3 true WO2011037438A3 (ko) 2011-08-04

Family

ID=43796412

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/006592 Ceased WO2011037438A2 (ko) 2009-09-28 2010-09-28 드라이필름 포토레지스트

Country Status (3)

Country Link
JP (1) JP5551255B2 (ko)
CN (1) CN102549500B (ko)
WO (1) WO2011037438A2 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104714377A (zh) * 2013-12-11 2015-06-17 中国航空工业第六一八研究所 一种抗腐蚀修版液
JP5882510B2 (ja) * 2014-06-30 2016-03-09 太陽インキ製造株式会社 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法
CN104965390A (zh) * 2015-05-29 2015-10-07 王氏港建经销有限公司 一种运送多个基板依次通过曝光机的方法和系统
KR102611300B1 (ko) 2015-07-08 2023-12-08 가부시끼가이샤 레조낙 감광성 엘리먼트, 적층체, 레지스터 패턴의 형성 방법 및 프린트 배선판의 제조 방법
CN111279804B (zh) * 2017-12-20 2023-10-24 住友电气工业株式会社 制造印刷电路板和层压结构的方法
JP7025939B2 (ja) * 2018-01-23 2022-02-25 サカタインクス株式会社 カラーフィルター用顔料分散組成物及びカラーフィルター用レジスト組成物
WO2019215848A1 (ja) 2018-05-09 2019-11-14 日立化成株式会社 感光性エレメント、バリア層形成用樹脂組成物、レジストパターンの形成方法及びプリント配線板の製造方法
JP7780169B2 (ja) * 2021-04-06 2025-12-04 株式会社ムラカミ パターン形成用積層フィルムおよび未感光のスクリーン印刷版ならびにこれらの製造方法
WO2024075158A1 (ja) 2022-10-03 2024-04-11 株式会社レゾナック 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO2025116313A1 (ko) * 2023-11-29 2025-06-05 코오롱인더스트리 주식회사 감광성 수지 조성물을 이용한 드라이 필름 포토레지스트 및 그 제조방법, 레지스트 패턴 및 디스플레이 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030180635A1 (en) * 2002-02-12 2003-09-25 Harald Baumann Visible radiation sensitive composition
US20040023166A1 (en) * 2002-07-30 2004-02-05 Kevin Ray Method of manufacturing imaging compositions
KR20050056159A (ko) * 2003-12-09 2005-06-14 후지 샤신 필름 가부시기가이샤 드라이필름 포토레지스트
KR20080003948A (ko) * 2006-07-04 2008-01-09 주식회사 코오롱 4층 구조의 드라이 필름 포토레지스트

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007125992A1 (ja) * 2006-04-28 2007-11-08 Asahi Kasei Emd Corporation 感光性樹脂積層体
JP4979391B2 (ja) * 2007-01-17 2012-07-18 旭化成イーマテリアルズ株式会社 感光性樹脂積層体
WO2009054705A2 (en) * 2007-10-25 2009-04-30 Kolon Industries, Inc. Film type transfer material
JP4778588B2 (ja) * 2008-01-29 2011-09-21 旭化成イーマテリアルズ株式会社 感光性樹脂積層体

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030180635A1 (en) * 2002-02-12 2003-09-25 Harald Baumann Visible radiation sensitive composition
US20040023166A1 (en) * 2002-07-30 2004-02-05 Kevin Ray Method of manufacturing imaging compositions
KR20050056159A (ko) * 2003-12-09 2005-06-14 후지 샤신 필름 가부시기가이샤 드라이필름 포토레지스트
KR20080003948A (ko) * 2006-07-04 2008-01-09 주식회사 코오롱 4층 구조의 드라이 필름 포토레지스트

Also Published As

Publication number Publication date
CN102549500A (zh) 2012-07-04
WO2011037438A2 (ko) 2011-03-31
JP5551255B2 (ja) 2014-07-16
CN102549500B (zh) 2014-04-30
JP2013505483A (ja) 2013-02-14

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