WO2011028957A3 - Methods and devices for processing a precursor layer in a group via environment - Google Patents
Methods and devices for processing a precursor layer in a group via environment Download PDFInfo
- Publication number
- WO2011028957A3 WO2011028957A3 PCT/US2010/047748 US2010047748W WO2011028957A3 WO 2011028957 A3 WO2011028957 A3 WO 2011028957A3 US 2010047748 W US2010047748 W US 2010047748W WO 2011028957 A3 WO2011028957 A3 WO 2011028957A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- methods
- devices
- processing
- precursor layer
- group via
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02425—Conductive materials, e.g. metallic silicides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02614—Transformation of metal, e.g. oxidation, nitridation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Photovoltaic Devices (AREA)
- Chemically Coating (AREA)
Abstract
Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA- chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, the precursor is subsequently processed in a VIA environment.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10814527.7A EP2474044A4 (en) | 2009-09-02 | 2010-09-02 | METHODS AND DEVICES FOR PROCESSING A PRECURSOR LAYER IN A VIA GROUP ENVIRONMENT |
| JP2012528070A JP2013504215A (en) | 2009-09-02 | 2010-09-02 | Methods and devices for processing precursor layers in a Group VIA environment |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23941609P | 2009-09-02 | 2009-09-02 | |
| US61/239,416 | 2009-09-02 | ||
| US24101509P | 2009-09-09 | 2009-09-09 | |
| US61/241,015 | 2009-09-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2011028957A2 WO2011028957A2 (en) | 2011-03-10 |
| WO2011028957A3 true WO2011028957A3 (en) | 2011-07-14 |
Family
ID=43649971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2010/047748 Ceased WO2011028957A2 (en) | 2009-09-02 | 2010-09-02 | Methods and devices for processing a precursor layer in a group via environment |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP2474044A4 (en) |
| JP (1) | JP2013504215A (en) |
| WO (1) | WO2011028957A2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2469580A1 (en) * | 2010-12-27 | 2012-06-27 | Nexcis | Improved interface between a I-III-VI2 material layer and a molybdenum substrate |
| JP2014513413A (en) * | 2011-03-10 | 2014-05-29 | サン−ゴバン グラス フランス | Method for producing ternary compound semiconductor CZTSSe and thin film solar cell |
| JP5658112B2 (en) * | 2011-09-15 | 2015-01-21 | 本田技研工業株式会社 | Method for manufacturing chalcopyrite solar cell |
| WO2014002796A1 (en) * | 2012-06-25 | 2014-01-03 | 京セラ株式会社 | Photoelectric conversion apparatus and method for manufacturing photoelectric conversion apparatus |
| CN104885191B (en) * | 2012-12-20 | 2017-11-28 | 法国圣戈班玻璃厂 | Method for producing compound semiconductors and thin film solar cells |
| TWI449193B (en) * | 2012-12-21 | 2014-08-11 | 財團法人工業技術研究院 | Preparation method of solar cell absorption layer and heat treatment equipment thereof |
| FR3005371B1 (en) * | 2013-05-03 | 2015-05-29 | Nexcis | FORMATION OF A SEMICONDUCTOR LAYER I-III-VI2 BY THERMAL TREATMENT AND CHALCOGENISATION OF A METAL PRECURSOR I-III |
| NL2010809C2 (en) * | 2013-05-16 | 2014-11-24 | Smit Ovens Bv | DEVICE AND METHOD FOR APPLYING A MATERIAL TO A SUBSTRATE. |
| PT3016149T (en) * | 2013-08-01 | 2021-05-06 | Lg Chemical Ltd | Aggregate phase precursor for producing light absorbing layer of solar cell and method for producing same |
| CN107604340B (en) * | 2017-08-31 | 2023-09-01 | 安徽光智科技有限公司 | Chemical Vapor Deposition Furnace |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090050208A1 (en) * | 2006-10-19 | 2009-02-26 | Basol Bulent M | Method and structures for controlling the group iiia material profile through a group ibiiiavia compound layer |
| WO2009033674A2 (en) * | 2007-09-11 | 2009-03-19 | Centrotherm Photovoltaics Ag | Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module |
| US20090092744A1 (en) * | 2007-10-05 | 2009-04-09 | Mustafa Pinarbasi | Roll to Roll Evaporation Tool for Solar Absorber Precursor Formation |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090183675A1 (en) * | 2006-10-13 | 2009-07-23 | Mustafa Pinarbasi | Reactor to form solar cell absorbers |
-
2010
- 2010-09-02 WO PCT/US2010/047748 patent/WO2011028957A2/en not_active Ceased
- 2010-09-02 JP JP2012528070A patent/JP2013504215A/en active Pending
- 2010-09-02 EP EP10814527.7A patent/EP2474044A4/en not_active Withdrawn
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090050208A1 (en) * | 2006-10-19 | 2009-02-26 | Basol Bulent M | Method and structures for controlling the group iiia material profile through a group ibiiiavia compound layer |
| WO2009033674A2 (en) * | 2007-09-11 | 2009-03-19 | Centrotherm Photovoltaics Ag | Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module |
| US20090092744A1 (en) * | 2007-10-05 | 2009-04-09 | Mustafa Pinarbasi | Roll to Roll Evaporation Tool for Solar Absorber Precursor Formation |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011028957A2 (en) | 2011-03-10 |
| JP2013504215A (en) | 2013-02-04 |
| EP2474044A4 (en) | 2014-01-15 |
| EP2474044A2 (en) | 2012-07-11 |
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