WO2011068207A1 - Phosphorus-containing polyimide and method for producing same - Google Patents
Phosphorus-containing polyimide and method for producing same Download PDFInfo
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- WO2011068207A1 WO2011068207A1 PCT/JP2010/071701 JP2010071701W WO2011068207A1 WO 2011068207 A1 WO2011068207 A1 WO 2011068207A1 JP 2010071701 W JP2010071701 W JP 2010071701W WO 2011068207 A1 WO2011068207 A1 WO 2011068207A1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6571—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
- C07F9/657163—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms the ring phosphorus atom being bound to at least one carbon atom
- C07F9/657172—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms the ring phosphorus atom being bound to at least one carbon atom the ring phosphorus atom and one oxygen atom being part of a (thio)phosphinic acid ester: (X = O, S)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/572—Five-membered rings
- C07F9/5728—Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/655—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms
- C07F9/65515—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms the oxygen atom being part of a five-membered ring
- C07F9/65517—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms the oxygen atom being part of a five-membered ring condensed with carbocyclic rings or carbocyclic ring systems
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/012—Flame-retardant; Preventing of inflammation
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
Definitions
- the present invention relates to a phosphorus-containing tetracarboxylic dianhydride, a phosphorus-containing polyimide produced using the same, and a method for producing the same. Furthermore, the present invention relates to various laminates produced using these phosphorus-containing polyimides or polyamic acid which is a precursor thereof, and electronic circuits such as flexible printed wiring boards produced using these laminates.
- polyimide is excellent in flame retardancy, heat resistance, mechanical properties, electrical properties, etc., so it is widely used as a substrate material for flexible printed wiring boards, protective films for wiring and semiconductor elements, heat resistant adhesives, interlayer insulation materials, etc. in use.
- Non-Patent Document 1 a method of adding a phosphorus compound to the resin composition is known (for example, Non-Patent Document 1).
- a method of adding a phosphorus compound to the resin composition is known (for example, Non-Patent Document 1).
- NTS non-halogen flame retardant materials
- the present invention provides a phosphorus-containing tetracarboxylic dianhydride; and a phosphorus-containing polyimide that is produced using the phosphorus-containing tetracarboxylic dianhydride and exhibits excellent flame retardancy, and a method for producing the same.
- a first aspect of the present invention is the following general formula (I):
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
- the phosphorus containing tetracarboxylic dianhydride represented by these.
- the second aspect of the present invention is the following general formula (II) produced using these phosphorus-containing tetracarboxylic dianhydrides:
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group) It relates to a phosphorus-containing polyimide having a repeating unit represented by:
- the third aspect of the present invention is the following general formula (III):
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group
- the present inventors have found that a phosphorus-containing polyimide can be obtained by imidizing a polyamic acid having a benzophenone skeleton in the presence of a phosphorus compound having a specific structure, thereby completing the present invention. Therefore, the fourth aspect of the present invention is the following general formula (I ′):
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond) It is related with the manufacturing method of the phosphorus containing polyimide characterized by imidating in presence of the phosphorus compound represented by these.
- the phosphorus-containing tetracarboxylic dianhydride according to the first aspect of the present invention is useful as a raw material for phosphorus-containing polyimide having flame retardancy, or as a curing agent or modifier for epoxy resins.
- the flame-retardant phosphorus-containing polyimide produced using this phosphorus-containing tetracarboxylic dianhydride exhibits excellent flame-retardant properties, has a flame-retardant heat-resistant adhesive, and a flame-retardant electronic circuit It is useful as an insulating material for a substrate.
- the method for producing a phosphorus-containing polyimide according to the fourth aspect of the present invention is a simple method of imidizing a polyamic acid having a benzophenone skeleton in the presence of a phosphorus compound. It is an excellent thing that can be done.
- the phosphorus-containing polyimide obtained by this production method also exhibits excellent flame retardancy and is useful as a heat-resistant adhesive having flame retardancy, an insulating material for electronic circuit boards having flame retardancy, and the like.
- 1 shows a 1 H-NMR chart of the compound obtained in Example 1 (in the general formula (I), R 1 and R 2 are both phenyl groups).
- 1 shows a 13 C-NMR chart of the compound obtained in Example 1 (in the general formula (I), R 1 and R 2 are both phenyl groups).
- 2 shows an FT-IR chart of the compound obtained in Example 1 (in the general formula (I), R 1 and R 2 are both phenyl groups).
- the phosphorus-containing tetracarboxylic dianhydride which is the first aspect of the present invention and is a raw material (acid component) of the phosphorus-containing polyimide of the present invention, and a method for producing the same To do.
- the phosphorus-containing tetracarboxylic dianhydride represented by the general formula (I) of the present invention includes benzophenone tetracarboxylic dianhydride and the following general formula (1):
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond) It can obtain by making it react with the phosphorus compound represented by these.
- benzophenone tetracarboxylic dianhydride used here include 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,3 ′, 3,4′-benzophenone tetracarboxylic dianhydride.
- Anhydrides and 2,2 ′, 3,3′-benzophenone tetracarboxylic dianhydride may be mentioned.
- R 1 and R 2 are both phenyl groups (wherein at least one of the hydrogen atoms on the benzene ring is an alkyl group or alkoxyl having 1 to 6 carbon atoms) (Which may be substituted with a group) is preferred, and specific examples include the following formula (1a):
- the diphenylphosphine oxide (DPO) represented by these is mentioned.
- one of R 1 and R 2 is a phenyl group, the other is a phenoxy group, and one of the carbon atoms on each benzene ring is bonded to each other.
- Those bonded by a single bond (wherein at least one hydrogen atom on the benzene ring may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms) are preferred, and specific examples include:
- HCA 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
- the phosphorus-containing tetracarboxylic dianhydride represented by this can be obtained. Specific examples include the following general formula (Ia):
- R 1 ′ and R 2 ′ may be the same or different and are hydrogen, an alkyl group having 1 to 6 carbon atoms or an alkoxyl group
- the phosphorus containing tetracarboxylic dianhydride represented by these can be mentioned.
- This reaction is performed at a temperature of 40 to 250 ° C., preferably 50 to 200 ° C., more preferably 70 to 180 ° C. for 1 minute to 12 hours, preferably 5 minutes to 6 hours, more preferably 10 minutes to 3 hours. Can be done.
- a solvent may be used.
- the solvent to be used is not particularly limited as long as it is an inert solvent for the reaction, and is appropriately selected according to the desired reaction temperature. You may use individually or in mixture of 2 or more types of solvents in arbitrary ratios.
- aromatic hydrocarbons such as toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene and trichlorobenzene, ether solvents such as tetrahydrofuran, diglyme and triglyme, N, N-dimethylformamide, N, N-dimethylacetamide
- aprotic polar solvent such as N-methyl-2-pyrrolidone (NMP) or dimethyl sulfoxide (DMSO) can be used.
- NMP N-methyl-2-pyrrolidone
- DMSO dimethyl sulfoxide
- the amount of the solvent used is 50 to 1000% by weight, preferably 100 to 500% by weight, based on benzophenonetetracarboxylic dianhydride.
- a crude product can be obtained by concentrating the reaction solution.
- the crude product can be purified by washing with a polar solvent such as acetonitrile, ethyl acetate, methyl isobutyl ketone.
- the washed crystal is separated by filtration and dried at a temperature of 40 to 250 ° C., preferably 80 to 200 ° C. under reduced pressure or normal pressure to obtain the desired product.
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group
- the phosphorus containing polyamic acid which has a repeating unit represented by these is manufactured.
- the phosphorus-containing polyamic acid is produced by polymerizing the phosphorus-containing tetracarboxylic dianhydride obtained by the above method and a diamine component represented by the formula: H 2 N—R 3 —NH 2 by a known method. Can be done by. Usually, the polymerization reaction is carried out in a solvent at a solute concentration of 5 to 80% by weight, preferably 10 to 50% by weight. After completion of the reaction, the reaction solution can be used as it is as a phosphorus-containing polyamic acid solution (varnish) in the subsequent imidization reaction. Alternatively, the phosphorus-containing polyamic acid solution may be prepared by isolating the phosphorus-containing polyamic acid from the reaction solution and then re-dissolving it in an appropriate solvent.
- the diamine component represented by the formula: H 2 N—R 3 —NH 2 may be an aromatic diamine, an aliphatic diamine or an alicyclic diamine, and as an example of R 3 , A divalent group of a cyclic or condensed polycyclic aromatic compound (eg, phenylene, indenylene, naphthylene, fluorenylene), a divalent group of an aliphatic compound having 2 to 12 carbon atoms (eg, having 2 to 12 carbon atoms) Alkanediyl, alkenylene or alkynylene) or a divalent group of an alicyclic compound having 3 to 10 carbon atoms (eg, cycloalkylene or cycloalkenylene having 3 to 10 carbon atoms), or may be the same or different , two or more of the divalent groups, the direct or bridge member (here a bridge member, -O -, - CO -, - COO -, - OCO -,
- aromatic diamines, aliphatic diamines or alicyclic diamines have one or more substituents selected from alkyl groups having 1 to 6 carbon atoms, alkenyl groups, alkynyl groups or alkoxyl groups, or halogen atoms. It may be.
- aromatic diamine component examples include those having one aromatic group: p-phenylenediamine, m-phenylenediamine, p-aminobenzylamine, m-aminobenzylamine, diaminotoluenes, diaminoxylene. , Diaminonaphthalenes, diaminoanthracenes, etc.
- 1,4-bis (4-aminophenoxy) benzene 1,4-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, , 3-bis (3-aminophenoxy) benzene, 1,4-bis (4-aminobenzoyl) benzene, 1,4-bis Aromatic groups such as 3-aminobenzoyl) benzene, 1,3-bis (4-aminobenzoyl) benzene, 1,3-bis (3-aminobenzoyl) benzene, 9,9-bis (4-aminophenyl) fluorene Having two or more of: 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-bis (3-aminophenoxy) ) Biphenyl, bis [4- (4-aminophenoxy) phenyl]
- the hydrogen atom on these aromatic rings may be substituted with one or more substituents selected from an alkyl group having 1 to 6 carbon atoms, an alkenyl group, an alkynyl group or an alkoxyl group, or a halogen atom. .
- aliphatic or alicyclic diamine components used herein include 1,2-diaminoethane, 1,2-diaminopropane, 1,3-diaminopropane, 1,4-diaminobutane, 1,3-diamino Pentane, 1,5-diaminopentane, 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1,9-diaminononane, 1,10-diaminodecane, 1,11-diaminoundecane, 1,12-diaminododecane, 2-methyl-1,5-diaminopentane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 1,3-diaminocyclohexane, 1,4 -Diaminocyclohe
- 1,6-diaminohexane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 1,4-diaminocyclohexane, 4 4,4'-diaminodicyclohexylmethane and isophoronediamine are preferably used.
- m is an integer mixed value of 0 to 20
- R 4 represents a methyl, isopropyl, phenyl or vinyl group
- R 5 represents a divalent group of a hydrocarbon having 1 to 7 carbon atoms, for example,
- a siloxane diamine represented by (trimethylene, tetramethylene, phenylene, etc.) may be used in an amount in the range of 1 to 50 mol% of the diamine component.
- a monoamine compound or a dicarboxylic acid anhydride may be added for the purpose of adjusting the molecular weight.
- the monoamine compounds used are aniline, 4-aminophenol, 3-aminophenol, 4-aminobiphenyl, 4-phenoxyaniline, 3-aminophenylacetylene, 4-aminophenylacetylene, etc.
- the amount of monoamine compound or dicarboxylic acid anhydride added varies depending on the molecular weight of the target phosphorus-containing polyimide, but it is usually 1.0 to several times the difference in the number of moles of all acid dianhydrides and diamine compounds used. The number of moles is preferably 1.5 to 4.0 times.
- a monoamine compound is added, and when there are many diamine compounds, a dicarboxylic acid anhydride is added.
- the solvent used in the production of the phosphorus-containing polyamic acid of the present invention is not particularly limited as long as it is an inert solvent.
- N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2- Pyrrolidone, dimethyl sulfoxide, tetramethylurea, tetrahydrofuran and the like can be used alone or in a mixed form.
- Particularly preferred are N, N-dimethylacetamide and N-methyl-2-pyrrolidone.
- these solvents may be used by mixing a solvent such as toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene, trichlorobenzene, diglyme and triglyme in an arbitrary ratio.
- solvents may also be used in preparing phosphorus-containing polyamic acid solutions by redissolving the isolated phosphorus-containing polyamic acid.
- the phosphorus-containing polyamic acid having a repeating unit represented by the general formula (III) and the phosphorus-containing polyimide having a repeating unit represented by the general formula (II) are represented by the general formula (III). It does not mean only phosphorus-containing polyamic acid consisting only of repeating units and phosphorus-containing polyimide consisting only of repeating units represented by the general formula (II), but also includes those containing such repeating units as main constituent units. Means that. Accordingly, the purpose of the phosphorus-containing polyimide of the present invention and the reactivity of the phosphorus-containing polyamic acid that is a precursor thereof are represented by the above general formula (I) in the production of the phosphorus-containing polyamic acid. Tetracarboxylic dianhydrides other than phosphorus-containing tetracarboxylic dianhydrides can be partially used.
- tetracarboxylic dianhydrides examples include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,3 ′, 3,4′-biphenyltetracarboxylic acid.
- a phosphorus-containing tetracarboxylic dianhydride represented by the general formula (I) in the tetracarboxylic dianhydride component used It is preferable to use 30 mol% or more of the product, more preferably 50 mol% or more.
- a benzophenonetetracarboxylic dianhydride and a phosphorus compound represented by the general formula (1) in a solvent at 40 to 250 ° C., preferably 50 to 200 ° C., more preferably 70 to 180 ° C. for 1 minute to 12 hours.
- the solution containing phosphorus-containing tetracarboxylic dianhydride obtained by heating preferably 5 minutes to 6 hours, more preferably 10 minutes to 3 hours, the desired diamine compound (the diamine compound is as described above) ) And a solvent such as N, N-dimethylacetamide or N-methyl-2-pyrrolidone as necessary, so that the solute concentration is 5 to 80% by weight, more preferably 10 to 50% by weight. Can be done by.
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group
- the phosphorus-containing polyamic acid having a repeating unit represented by the following general formula (II) of the present invention is thermally and / or chemically cyclized:
- the phosphorus-containing polyimide of the present invention is produced by thermally and / or chemically ring-closing (that is, dehydrating) a phosphorus-containing polyamic acid by a known method.
- a phosphorus-containing polyamic acid solution can be obtained by using a glass plate, a metal foil such as copper, aluminum, or stainless steel, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyimide, silicon resin, or fluorine.
- a substrate such as a resin film such as a resin so that the thickness after drying is 0.1 to 250 ⁇ m, more preferably 1.0 to 100 ⁇ m, and 40 to 500 ° C., more preferably 70 to 350 ° C.
- the phosphorus-containing polyimide can be obtained by drying for 1 minute to 5 hours, more preferably 3 minutes to 3 hours.
- the obtained polyimide can be peeled off from the substrate and used as a film or as a laminate.
- a solvent azeotropic with water such as toluene, xylene, ethylbenzene, chlorobenzene, dichlorobenzene, and trichlorobenzene is added to the phosphorus-containing polyamic acid solution, and the mixture is heated at 100 to 300 ° C, more preferably at 150 to 250 ° C.
- the phosphorus-containing polyimide can also be obtained by discharging water generated with imidization out of the system and performing thermal imidization.
- a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole, or a tri-lower alkylamine such as triethylamine may be used.
- a dehydrating agent such as acetic anhydride, trifluoroacetic anhydride, N, N-dicyclohexylcarbodiimide and a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole, or a tri-lower alkylamine such as triethylamine are added.
- Phosphorus-containing polyimide may be obtained by performing chemical imidation by dehydration at ⁇ 200 ° C. for 1 to 24 hours.
- the solution that has been imidized thermally or chemically as described above is poured into a single solvent such as water, methanol, ethanol, isopropanol, acetone, toluene, xylene or a mixed solution thereof to precipitate crystals and filter. Separately, it can be dried and pulverized to obtain a powder form.
- the obtained polyimide can be used for injection molding or compression molding as it is. Separately, it can be dissolved in a solvent and used as a varnish, or it can be applied on the aforementioned substrate and dried to obtain a film form.
- the polyamic acid represented by the formula (I ′) is obtained by reacting a benzophenone tetracarboxylic dianhydride with a diamine component represented by the formula: H 2 N—R 3 —NH 2 .
- This production method is not particularly limited and may be a known method, and is usually carried out in a solvent at a solute concentration of 5 to 80% by weight, preferably 10 to 50% by weight.
- the reaction solution can be used as it is as a polyamic acid solution (varnish) in the subsequent imidization reaction.
- the phosphoric acid-containing polyamic acid solution may be prepared by isolating the polyamic acid from the reaction solution and then re-dissolving it in a suitable solvent.
- the solvent used for the production of the polyamic acid is not particularly limited as long as it is inert to the reaction.
- N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide, Tetramethylurea, tetrahydrofuran and the like can be used alone or in a mixed form.
- Particularly preferred are N, N-dimethylacetamide and N-methyl-2-pyrrolidone.
- these solvents may be used by mixing a solvent such as toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene, trichlorobenzene, diglyme and triglyme in an arbitrary ratio.
- solvents may also be used in preparing the polyamic acid solution by redissolving the isolated polyamic acid.
- benzophenone tetracarboxylic dianhydride used here include 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,3 ′, 3,4′-benzophenone tetracarboxylic dianhydride.
- diamine component represented by H 2 N-R 3 -NH 2 is an aromatic diamine may be aliphatic diamine or alicyclic diamine, therefore as an example of R 3 is 6 carbon atoms
- a divalent group of a monocyclic or condensed polycyclic aromatic compound of ⁇ 14 for example, phenylene, indenylene, naphthylene, fluorenylene
- a divalent group of an aliphatic compound of 2 to 12 carbons for example, carbon number) 2 to 12 alkanediyl, alkenylene or alkynylene
- a divalent group of an alicyclic compound having 3 to 10 carbon atoms eg, cycloalkylene or cycloalkenylene having 3 to 10 carbon atoms
- the two or more divalent groups which may be present are directly or a cross-linking member (wherein the cross-linking member means —O—, —CO—, —COO—, —OCO—
- aromatic diamines, aliphatic diamines or alicyclic diamines have one or more substituents selected from alkyl groups having 1 to 6 carbon atoms, alkenyl groups, alkynyl groups or alkoxyl groups, or halogen atoms. It may be.
- aromatic diamine component examples include specific examples of the aromatic diamine component, aliphatic or alicyclic diamine component in the above section “II. Phosphorus-containing polyimide and production method thereof”. The same as each of the diamine compounds mentioned above.
- m is an integer mixed value of 0 to 20
- R 4 represents a methyl, isopropyl, phenyl or vinyl group
- R 5 represents a divalent group of a hydrocarbon having 1 to 7 carbon atoms, for example,
- a siloxane diamine represented by (trimethylene, tetramethylene, phenylene, etc.) may be used in an amount in the range of 1 to 50 mol% of the diamine component.
- the polyamic acid obtained by reacting the benzophenone tetracarboxylic dianhydride of the present invention with the diamine component does not mean only the polyamic acid consisting only of the repeating unit represented by the general formula (I ′). It is meant to include those containing a repeating unit as a main constituent unit. Therefore, in the production of the polyamic acid, the purpose of the phosphorus-containing polyimide of the present invention and the reactivity of the polyamic acid that is the precursor thereof are not affected. Things can be used in part.
- tetracarboxylic dianhydrides examples include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,3 ′, 3,4′-biphenyltetracarboxylic acid.
- Acid dianhydride 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 4,4′-oxydiphthalic dianhydride, 3,4′-oxydiphthalic dianhydride, 3,3′- Oxydiphthalic dianhydride, 4,4'-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-di Carboxyphenyl) hexafluoropropane dianhydride, 1,2,7,8-naphthalene tetracarboxylic dianhydride and the like.
- a monoamine compound or a dicarboxylic acid anhydride may be added for the purpose of adjusting the molecular weight.
- the monoamine compounds used are aniline, 4-aminophenol, 3-aminophenol, 4-aminobiphenyl, 4-phenoxyaniline, 3-aminophenylacetylene, 4-aminophenylacetylene, etc.
- the amount of monoamine compound or dicarboxylic anhydride added varies depending on the molecular weight of the target polyimide, but it is usually 1.0 to several times the molar difference between the number of moles of all acid dianhydrides used and the diamine compound. The number is preferably 1.5 to 4.0 times. When there are many acid dianhydrides, a monoamine compound is added, and when there are many diamine compounds, a dicarboxylic acid anhydride is added.
- R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
- the phosphorus compound represented by the general formula (1) is introduced into the polyimide skeleton to produce a phosphorus-containing polyimide.
- R 1 and R 2 are both phenyl groups (wherein at least one of the hydrogen atoms on the benzene ring is an alkyl group or alkoxyl having 1 to 6 carbon atoms) (Which may be substituted with a group) is preferred, and specific examples thereof include the following formula (1a):
- the diphenylphosphine oxide (DPO) represented by these is mentioned.
- one of R 1 and R 2 is a phenyl group, the other is a phenoxy group, and one of the carbon atoms on each benzene ring is bonded to each other.
- Those bonded by a single bond (wherein at least one hydrogen atom on the benzene ring may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms) are preferred, and specific examples include:
- HCA 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide
- the amount of the phosphorus compound represented by the general formula (1) is 0.5 to several times the number of moles of the benzophenonetetracarboxylic dianhydride used, preferably 0.8 to 4.0 times. Is a mole.
- a phosphorus-containing polyimide can be produced by imidizing the polyamic acid obtained as described above in the presence of the phosphorus compound represented by the general formula (1).
- imidation may be carried out after adding the phosphorus compound represented by the general formula (1) to the polyamic acid solution obtained as described above.
- a polyamic acid may be produced as described above from benzophenone tetracarboxylic dianhydride and a diamine component in a solvent to which a phosphorus compound represented by the general formula (1) has been added in advance, followed by imidization. Good.
- the phosphorus compound represented by the general formula (1) may be directly added to the polyamic acid solution or the reaction solvent, but is inert to the reaction, for example, N, N-dimethylformamide, N, N-dimethylacetamide, 5 to 90% by weight in a solvent such as N-methyl-2-pyrrolidone, dimethyl sulfoxide, tetramethylurea, tetrahydrofuran, toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene, trichlorobenzene, diglyme and triglyme, preferably 10 to It may be added after dissolving at a solute concentration of 80% by weight.
- a solvent such as N-methyl-2-pyrrolidone, dimethyl sulfoxide, tetramethylurea, tetrahydrofuran, toluene, xylene, ethylbenzene, anisole, chloro
- the mixed solution of the polyamic acid and the phosphorus compound is a glass plate, a metal foil such as copper, aluminum, or stainless steel, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyimide, It is applied on a substrate such as a resin film such as a silicon resin or a fluororesin so that the thickness after drying is 0.1 to 250 ⁇ m, more preferably 1.0 to 100 ⁇ m, and more preferably 40 to 500 ° C.
- the phosphorus-containing polyimide can be obtained by drying at 70 to 350 ° C. for 1 minute to 5 hours, more preferably 3 minutes to 3 hours.
- the obtained phosphorus-containing polyimide can be peeled off from the substrate and used as a film form or as it is as a laminate.
- a solvent that azeotropes with water such as toluene, xylene, ethylbenzene, chlorobenzene, dichlorobenzene, and trichlorobenzene, is added to the mixed solution of the polyamic acid and the phosphorus compound, and 100 to 300 ° C, more preferably 150 to 250 ° C. It is possible to obtain phosphorus-containing polyimide by heating with, discharging water generated by imidization out of the system and performing thermal imidization. At this time, a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole, or a tri-lower alkylamine such as triethylamine may be used.
- a dehydrating agent such as acetic anhydride, trifluoroacetic anhydride, N, N-dicyclohexylcarbodiimide and a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole or a tri-lower alkylamine such as triethylamine are added.
- Phosphorus-containing polyimide can also be obtained by performing chemical imidation by dehydrating at ⁇ 200 ° C. for 1 to 24 hours.
- the solution that has been imidized thermally or chemically as described above is poured into a single solvent such as water, methanol, ethanol, isopropanol, acetone, toluene, xylene or a mixed solution thereof to precipitate crystals and filter. Separately, it can be dried and pulverized to obtain a powder form.
- the obtained phosphorus-containing polyimide can be used for injection molding or compression molding as it is. Separately, it can be dissolved in a solvent and used as a varnish, or it can be applied on the aforementioned substrate and dried to obtain a film form.
- the metal laminate of the present invention is prepared by, for example, using a phosphorus-containing polyamic acid solution produced according to the description in the above section “II. Phosphorus-containing polyimide and its production method”, having a thickness of 0.5 to 400 ⁇ m, More preferably, it is applied to at least one surface of a metal foil such as copper, aluminum or stainless steel having a thickness of 1.0 to 200 ⁇ m so that the thickness after drying is 0.1 to 250 ⁇ m, more preferably 1.0 to 100 ⁇ m. , 40 to 500 ° C., more preferably 70 to 350 ° C., for 1 minute to 5 hours, more preferably 3 minutes to 3 hours.
- a metal foil such as copper, aluminum or stainless steel having a thickness of 1.0 to 200 ⁇ m so that the thickness after drying is 0.1 to 250 ⁇ m, more preferably 1.0 to 100 ⁇ m. , 40 to 500 ° C., more preferably 70 to 350 ° C., for 1 minute to 5 hours, more preferably 3 minutes to 3
- phosphorus-containing polyimide film obtained according to the description in the section of “II. Phosphorus-containing polyimide and production method thereof” or “III. Production method of phosphorus-containing polyimide”, an epoxy resin system, an acrylic resin system, It is laminated with a metal foil such as copper, aluminum, or stainless steel having a thickness of 0.5 to 400 ⁇ m, more preferably 1.0 to 200 ⁇ m through an adhesive such as a polyimide resin, and the layer is 100 under normal pressure or pressing conditions. It can be produced by processing at a temperature of ⁇ 500 ° C., preferably 150 ° C. to 350 ° C.
- the aromatic polymer laminate of the present invention has a thickness of 0.5 to 400 ⁇ m, more preferably 1 with a phosphorus-containing polyamic acid solution manufactured according to the description in the section “II.
- a thickness after drying of 0.1 to 200 ⁇ m on an aromatic polymer such as aromatic polyester, polyphenylene sulfide, aromatic polyimide, polyaryl ether ketone, aromatic polycarbonate, aromatic liquid crystal polymer, or polybenzoxazole is 0.1. It is manufactured by coating to a thickness of ⁇ 250 ⁇ m, more preferably 1.0 to 100 ⁇ m, and drying at 40 to 500 ° C., more preferably 70 to 350 ° C. for 1 minute to 5 hours, more preferably 3 minutes to 3 hours. can do.
- an aromatic polyester, polyphenylene sulfide, aromatic polyimide, polyaryletherketone, aromatic polycarbonate, aromatic liquid crystal polymer, or polybenzoxazole having a thickness of 0.5 to 400 ⁇ m, more preferably 1.0 to 200 ⁇ m, etc.
- an aromatic polymer or a metal foil such as copper, aluminum, or stainless steel having a thickness of 0.5 to 400 ⁇ m, more preferably 1.0 to 200 ⁇ m, for example, the above-mentioned “II.
- Phosphorus-containing polyimide and The phosphorus-containing polyamic acid solution produced in accordance with the description of the “Production method” is applied, the other is overlaid on the coated surface, and then laminated or hot pressed, whereby the aromatic polymer metal via the phosphorus-containing polyimide of the present invention is used.
- a composite laminate can be produced.
- a circuit pattern can be prepared by a known method on the metal laminate and aromatic polymer metal composite laminate produced as described above and used as an electronic circuit.
- the electronic circuit created using the phosphorus-containing polyimide of the present invention has excellent flame retardancy, and thus can provide a safe electrical / electronic device.
- the solution viscosity, purity, melting point or glass transition temperature, NMR and infrared absorption spectrum measurement methods, and flame retardancy evaluation methods of the compounds obtained in the examples are as follows.
- Solution viscosity Measured at a temperature of 25 ° C. using a B-type viscometer (manufactured by Tokyo Keiki).
- Melting point or glass transition temperature Measurement was carried out with a differential scanning calorimeter (manufactured by Shimadzu Corp. DSC-60) at a temperature of 10 ° C. per minute up to 40-400 ° C. The melting point or glass transition temperature was calculated from the extrapolation point of the DSCDSC curve by analysis software.
- NMR A solution in which a compound and heavy DMSO (containing DMSO-d 6 0.05% TMS manufactured by Cambrige Isotope Laboratories, Inc.) were mixed was prepared, and 1 H-NMR measurement was performed using NMR (JNM-AL400 manufactured by JEOL Ltd.). And 13 C-NMR measurement was performed.
- Infrared absorption spectrum IR measurement device (Spectrum 100 FT-IR Spectrometer manufactured by Perkin Elmer Co., Ltd.) using the KBr method; or IR measurement device (Shimadzu Prestage® 21) using the ATR method. It was measured.
- the film was cut into a size of 200 mm ⁇ 50 mm to obtain a test piece.
- the test piece was wound in a cylindrical shape, fixed vertically to the clamp, and subjected to indirect flame twice for 3 seconds with a burner at the bottom of the sample.
- Example 1 Synthesis of a phosphorus-containing tetracarboxylic dianhydride represented by the general formula (I) (both R 1 and R 2 are phenyl groups) in a four-necked flask equipped with a stirrer, thermometer, nitrogen introduction tube and cooling tube 2.8 g (0.014 mol) of diphenylphosphine oxide (Aldrich), 3.5 g (0.011 mol) of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride (manufactured by Daicel Chemical Industries) and 25 g of toluene And stirred at 110 ° C. for 4 hours under a nitrogen stream.
- diphenylphosphine oxide Aldrich
- 3.5 g 0.011 mol
- 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride manufactured by Daicel Chemical Industries
- FIG. 1 shows the 1 H-NMR of the purified product
- FIG. 2 shows the 13 C-NMR
- FIG. 3 shows the FT-IR chart (KBr method using Spectrum 100 FT-IR Spectrometer manufactured by Perkin Elmer).
- Example 2 Synthesis thermometer of phosphorus-containing polyimide represented by the general formula (II) (R 1 and R 2 are both phenyl groups and R 3 is diphenyl ether-4,4′-diyl),
- R 1 and R 2 are both phenyl groups and R 3 is diphenyl ether-4,4′-diyl
- R 3 is diphenyl ether-4,4′-diyl
- a one-necked flask 10.118 g (0.05 mol) of 4,4′-diaminodiphenyl ether (manufactured by Wakayama Seika Co., Ltd.), 26.2207 g (0.05 mol) of the phosphorus-containing tetracarboxylic dianhydride synthesized in Example 1 were used.
- 205 g of NMP was charged and stirred at room temperature for 12 hours under a nitrogen stream to synthesize phosphorus-containing polyamic acid.
- the reaction solution (solute concentration 15%, viscosity (B-type viscometer: manufactured by Tokyo Keiki) 5,500 mPa ⁇ s) was used as it was as a phosphorus-containing polyamic acid solution.
- the obtained phosphorus-containing polyamic acid solution is coated on a glass plate so that the thickness after drying is 25 ⁇ m, dried at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, and then peeled off from the glass plate. It fixed to the metal frame and heat-processed at 200 degreeC and 250 degreeC each temperature for 1 hour. A phosphorus-containing polyimide in the form of a film having a thickness of 25 ⁇ m was obtained.
- Example 3 Phosphorus-containing compounds represented by the general formula (II) (R 1 and R 2 are both phenyl groups, and R 3 is 1,4-phenyleneoxy-biphenyl-4,4′-diyloxy-1,4-phenylene)
- R 1 and R 2 are both phenyl groups, and R 3 is 1,4-phenyleneoxy-biphenyl-4,4′-diyloxy-1,4-phenylene
- DPO diphenylphosphine oxide
- Comparative Example 1 In a four-necked flask equipped with a thermometer and a nitrogen inlet tube, 16.1113 g (0.05 mol) of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride and 4,4′-diaminodiphenyl ether were used. 0118 g (0.05 mol) and 148 g of NMP were charged and stirred at room temperature for 12 hours under a nitrogen stream to synthesize phosphorus-containing polyamic acid. The reaction solution (solute concentration 15%, viscosity (B-type viscometer: manufactured by Tokyo Keiki) 12,000 mPa ⁇ s) was used as it was as the polyamic acid solution. Application to a glass plate, drying and heat treatment were carried out in the same manner as in Example 2 to obtain a polyimide containing no phosphorus in the form of a film having a thickness of 20 ⁇ m.
- Comparative Example 2 Except for changing the diamine compound to 4,4′-bis (4-aminophenoxy) biphenyl (BAPB) 18.4214 g (0.05 mol), the same operation as in Comparative Example 1 was performed, and phosphorus in the form of a film having a thickness of 20 ⁇ m was obtained. The polyimide which does not contain was obtained.
- BAPB 4,4′-bis (4-aminophenoxy) biphenyl
- Example 4 Production of Metal Laminate
- the phosphorus-containing polyamic acid solution produced in Example 2 was placed on a 18 ⁇ m thick copper foil (manufactured by Mitsui Kinzoku Co., Ltd., 3EC-VLP) so that the resin thickness after drying would be 25 ⁇ m. After applying and drying at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, heat treatment was performed at 250 ° C. for 1 hour in a vacuum dryer to obtain a phosphorus-containing polyimide / metal laminate.
- Example 5 Production of Aromatic Polymer Laminate
- the phosphorus-containing polyamic acid solution produced in Example 2 was dried on a 25 ⁇ m thick aromatic polyimide film (manufactured by DuPont, Kapton (registered trademark) H). Is applied at a temperature of 90 ° C, 130 ° C, 180 ° C for 30 minutes, and then heat-treated at 250 ° C for 1 hour in a dryer to form a phosphorus-containing polyimide / aromatic polymer laminate. Got the body.
- Example 6 Production of aromatic polymer metal composite laminate
- the phosphorus-containing polyamic acid solution produced in Example 2 was dried on a copper foil having a thickness of 18 ⁇ m (manufactured by Mitsui Kinzoku Co., Ltd., 3EC-VLP) with a resin thickness after drying of 5 ⁇ m. Then, the coating was performed and dried at a temperature of 160 ° C. for 3 minutes. Next, an aromatic polyimide film having a thickness of 40 ⁇ m (manufactured by DuPont, Kapton (registered trademark) EN) was stacked on the coated surface, and lamination was performed at a temperature of 200 ° C. The obtained laminate was heat-treated at a temperature of 350 ° C. to obtain a metal / phosphorus-containing polyimide / aromatic polymer composite laminate.
- Example 7 Synthesis of phosphorus-containing polyimide (production method according to the fourth aspect of the present invention) In a four-necked flask equipped with a thermometer and a nitrogen introduction tube, in a nitrogen stream, 4,4′-diaminodiphenyl ether (4-ODA) (manufactured by Wakayama Seika Co., Ltd.) 10.118 g (0.05 mol), 9,10 -Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (HCA (registered trademark)) (manufactured by Sanko Co., Ltd.) 10.8086 g (0.05 mol), N-methyl-2-pyrrolidone (NMP) 148. 0 g was charged and dissolved.
- 4-ODA 4,4′-diaminodiphenyl ether
- HCA 9,10 -Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide
- NMP N-methyl-2-pyrrol
- BTDA 4,4′-benzophenonetetracarboxylic dianhydride
- a polyamic acid solution having 500 mPa ⁇ s and a solute concentration of 15% was obtained.
- the obtained polyamic acid solution was coated on a glass plate so that the thickness after drying was 20 ⁇ m, dried at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, and then peeled off from the glass plate.
- the polyimide film containing no phosphorus was obtained by heat treatment at 200 ° C. and 250 ° C. for 1 hour.
- the glass transition temperature of the film was 263 ° C., and the flame retardancy evaluation was x.
- Comparative Example 4 A four-necked flask equipped with a thermometer and a nitrogen inlet tube was charged with 10.118 g (0.05 mol) of 4,4′-diaminodiphenyl ether (4-ODA), 9,10-dihydro-9-oxa-acid in a nitrogen stream. 21.6172 g (0.10 mol) of 10-phosphaphenanthrene-10-oxide (HCA (registered trademark)) (manufactured by Sanko Co., Ltd.) and 188.6 g of N-methyl-2-pyrrolidone (NMP) were charged and dissolved. .
- 4-ODA 4,4′-diaminodiphenyl ether
- HCA 10-phosphaphenanthrene-10-oxide
- NMP N-methyl-2-pyrrolidone
- BTDA 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride
- DSDA 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic dianhydride
- APB 1,3-bis (3-amino Phenoxy) benzene
- BAPP 2,2-bis [4- (4-aminophenoxy) phenyl] propane
- BAPS bis [4- (4-aminophenoxy) phenyl] sulfone HCA®: 9,10-dihydro-9 -Oxa-10-phosphaphenanthrene-10-oxide
- DPO Diphenylphosphine oxide (Aldrich)
- the phosphorus-containing polyimide produced by using the phosphorus-containing tetracarboxylic dianhydride of the present invention exhibits excellent flame resistance and physical properties equivalent to those of conventional polyimide, and also exhibits good heat resistance even when it becomes a thin film. It is possible to meet the needs for light, thin, and small devices such as electrical and electronic equipment. Moreover, since the use of the flame-retardant phosphorus-containing polyimide of the present invention can avoid or reduce the addition of a further flame retardant, it is a flame-retarding technique with higher safety in the natural environment and the human body.
- the phosphorus-containing polyimide can be produced by a simple method without requiring any special equipment or process.
- the phosphorus-containing polyimide produced by using this production method is very useful as a heat-resistant adhesive, an insulating material for an electronic circuit board, and the like that are required to be thinned and flame-retardant.
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Abstract
Description
本発明は、リン含有テトラカルボン酸二無水物、それを使用して製造されるリン含有ポリイミド、及びその製造方法に関する。さらに本発明は、これらのリン含有ポリイミド又はその前駆体であるポリアミド酸を用いて製造される各種積層体、及びこれらの積層体を用いて製造されるフレキシブルプリント配線板等の電子回路に関する。 The present invention relates to a phosphorus-containing tetracarboxylic dianhydride, a phosphorus-containing polyimide produced using the same, and a method for producing the same. Furthermore, the present invention relates to various laminates produced using these phosphorus-containing polyimides or polyamic acid which is a precursor thereof, and electronic circuits such as flexible printed wiring boards produced using these laminates.
一般にポリイミドは、難燃性、耐熱性、機械特性、電気特性等に優れている為、フレキシブルプリント配線板の基板材料、配線や半導体素子の保護膜、耐熱性接着剤、層間絶縁材料等として広く使用されている。 Generally, polyimide is excellent in flame retardancy, heat resistance, mechanical properties, electrical properties, etc., so it is widely used as a substrate material for flexible printed wiring boards, protective films for wiring and semiconductor elements, heat resistant adhesives, interlayer insulation materials, etc. in use.
近年、電気・電子機器等の軽薄短小化のニーズに応えるべく、電気・電子機器等に使用されるポリイミドの薄膜化が望まれている。しかしながら、ポリイミドの薄膜化に伴ってポリイミドの難燃性は低下する傾向がある。また、近年電子機器内の使用部品及び素子、CPUの高性能化に伴って、その発熱量が著しく増加し、機器内の平均温度も上昇する傾向にあり、より高度な難燃技術が望まれている。一方、環境問題の観点から電気・電子製品に要求される難燃性を付与する際にも、自然環境や人体に対する安全性を考慮した、より安全性の高い手段が求められている。 In recent years, in order to meet the needs for light, thin and small electrical and electronic devices, it is desired to make polyimide thin films used for electrical and electronic devices. However, the flame retardancy of polyimide tends to decrease with decreasing polyimide film thickness. In recent years, with higher performance of components and elements used in electronic devices and CPUs, the amount of generated heat has increased remarkably and the average temperature in the devices has also increased, so a more advanced flame retardant technology is desired. ing. On the other hand, in order to impart flame retardancy required for electric and electronic products from the viewpoint of environmental problems, there is a demand for safer means in consideration of safety to the natural environment and the human body.
ポリイミドに難燃性を付与する技術としては、シロキサン変性されたポリイミドに水酸化マグネシウムなどの金属水和物を混合する方法が提案されている(例えば、特許文献1参照)。しかしながらこの方法では、別途水酸化マグネシウムにリン酸系界面活性剤による表面処理を施さなければならず、工程が煩雑になる。加えてこの方法では、ベースポリマーに使用するジアミン成分として、分子内に水酸基を2個以上有するジアミンが推奨されているが、このようなジアミンは容易に入手できるとは言えないものもある。 As a technique for imparting flame retardancy to a polyimide, a method of mixing a metal hydrate such as magnesium hydroxide with a siloxane-modified polyimide has been proposed (for example, see Patent Document 1). However, in this method, magnesium hydroxide must be separately subjected to a surface treatment with a phosphoric acid surfactant, and the process becomes complicated. In addition, in this method, a diamine having two or more hydroxyl groups in the molecule is recommended as a diamine component to be used for the base polymer, but such a diamine cannot be said to be easily available.
また、シリコンユニットを含有する特定のポリイミド樹脂とリン元素を含有する特定のエポキシ樹脂とを使用することで難燃性を発現させる方法が提案されている(例えば、特許文献2参照)。この方法では、リン化合物とエポキシ樹脂とを反応させ、目的とするリン含有エポキシ樹脂が得られるが、エポキシ樹脂としての機能を有するためには、好ましくは2つのエポキシ基が残るように反応を行わなければならず、リン含有率の上限値は5重量%に過ぎない。シリコンユニットを導入したポリイミド樹脂は燃え易い性質を持つために、この方法で得られるポリイミド樹脂組成物に十分な難燃性を付与するためには、耐熱性の低いエポキシ樹脂を多く混合しなければならない。 In addition, a method of expressing flame retardancy by using a specific polyimide resin containing a silicon unit and a specific epoxy resin containing a phosphorus element has been proposed (for example, see Patent Document 2). In this method, a phosphorus compound and an epoxy resin are reacted to obtain a target phosphorus-containing epoxy resin, but in order to have a function as an epoxy resin, the reaction is preferably performed so that two epoxy groups remain. The upper limit of the phosphorus content is only 5% by weight. Since the polyimide resin introduced with the silicon unit is flammable, in order to give sufficient flame retardancy to the polyimide resin composition obtained by this method, a lot of epoxy resin with low heat resistance must be mixed. Don't be.
さらには、樹脂組成物に難燃性を付与する方法としては、樹脂組成物にリン化合物を添加する方法が知られている(例えば、非特許文献1)。しかしながら、従来公知の技術で難燃性を発現させるためには、リン化合物を大量に添加する必要があった。 Furthermore, as a method for imparting flame retardancy to a resin composition, a method of adding a phosphorus compound to the resin composition is known (for example, Non-Patent Document 1). However, in order to express flame retardancy with a conventionally known technique, it is necessary to add a large amount of a phosphorus compound.
本発明は、リン含有テトラカルボン酸二無水物;及びそれを原料として製造され、優れた難燃特性を発揮するリン含有ポリイミド、及びその製造方法を提供するものである。 DETAILED DESCRIPTION OF THE INVENTION The present invention provides a phosphorus-containing tetracarboxylic dianhydride; and a phosphorus-containing polyimide that is produced using the phosphorus-containing tetracarboxylic dianhydride and exhibits excellent flame retardancy, and a method for producing the same.
本発明者等は、特定の構造を有するリン化合物と特定の構造を有する酸二無水物とが反応すること、並びにその反応より得られる特定の構造を有するリン含有テトラカルボン酸二無水物を用いて製造されるリン含有ポリイミドが、従来のポリイミドの性質を損なうことなくさらに優れた難燃性を有することを見出し、本発明を完成させた。本発明の第一の態様は、下記一般式(I): The present inventors use a phosphorus-containing tetracarboxylic dianhydride having a specific structure obtained by the reaction of a phosphorus compound having a specific structure with an acid dianhydride having a specific structure. The present invention has been completed by finding that the phosphorus-containing polyimide produced in this way has further excellent flame retardancy without impairing the properties of conventional polyimide. A first aspect of the present invention is the following general formula (I):
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表わされるリン含有テトラカルボン酸二無水物に関する。
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
The phosphorus containing tetracarboxylic dianhydride represented by these.
本発明の第二の態様は、これらのリン含有テトラカルボン酸二無水物を用いて製造される下記一般式(II): The second aspect of the present invention is the following general formula (II) produced using these phosphorus-containing tetracarboxylic dianhydrides:
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよく、R3は二価の有機基である)
で表わされる繰り返し単位を有するリン含有ポリイミドに関する。
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group)
It relates to a phosphorus-containing polyimide having a repeating unit represented by:
本発明の第三の態様は、下記一般式(III): The third aspect of the present invention is the following general formula (III):
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよく、R3は、2価の有機基である)
で表わされる繰り返し単位を有するリン含有ポリアミド酸を、熱的及び/又は化学的に閉環させることを特徴とする、下記一般式(II):
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group)
A phosphorus-containing polyamic acid having a repeating unit represented by the following general formula (II):
(式中、R1、R2及びR3は、上記と同義である)
で表わされる繰り返し単位を有するリン含有ポリイミドの製造方法に関する。
(Wherein R 1 , R 2 and R 3 are as defined above)
The manufacturing method of the phosphorus containing polyimide which has a repeating unit represented by these.
さらに本発明者等は、特定の構造を有するリン化合物の存在下に、ベンゾフェノン骨格を有するポリアミド酸をイミド化することにより、リン含有ポリイミドが得られることを見出し、本発明を完成させた。したがって、本発明の第四の態様は、下記一般式(I′): Furthermore, the present inventors have found that a phosphorus-containing polyimide can be obtained by imidizing a polyamic acid having a benzophenone skeleton in the presence of a phosphorus compound having a specific structure, thereby completing the present invention. Therefore, the fourth aspect of the present invention is the following general formula (I ′):
(式中、R3は、二価の有機基である)
で表わされるポリアミド酸を、下記一般式(1):
(Wherein R 3 is a divalent organic group)
A polyamic acid represented by the following general formula (1):
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表わされるリン化合物の存在下、イミド化することを特徴とする、リン含有ポリイミドの製造方法に関する。
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
It is related with the manufacturing method of the phosphorus containing polyimide characterized by imidating in presence of the phosphorus compound represented by these.
本発明の第一の態様であるリン含有テトラカルボン酸二無水物は、難燃性を有するリン含有ポリイミドの原料として、又はエポキシ樹脂の硬化剤、改質剤として有用である。またこのリン含有テトラカルボン酸二無水物を用いて製造される難燃性のリン含有ポリイミドは、優れた難燃特性を示し、難燃性を有する耐熱性接着剤、難燃性を有する電子回路基板の絶縁材料として有用である。 The phosphorus-containing tetracarboxylic dianhydride according to the first aspect of the present invention is useful as a raw material for phosphorus-containing polyimide having flame retardancy, or as a curing agent or modifier for epoxy resins. In addition, the flame-retardant phosphorus-containing polyimide produced using this phosphorus-containing tetracarboxylic dianhydride exhibits excellent flame-retardant properties, has a flame-retardant heat-resistant adhesive, and a flame-retardant electronic circuit It is useful as an insulating material for a substrate.
また、本発明の第四の態様であるリン含有ポリイミドの製造方法は、リン化合物の存在下に、ベンゾフェノン骨格を有するポリアミド酸をイミド化するという簡便な方法で、ポリイミド骨格内にリン化合物を導入することができる、優れたものである。この製造方法により得られるリン含有ポリイミドもまた、優れた難燃特性を示し、難燃性を有する耐熱性接着剤、難燃性を有する電子回路基板の絶縁材料等として有用である。 The method for producing a phosphorus-containing polyimide according to the fourth aspect of the present invention is a simple method of imidizing a polyamic acid having a benzophenone skeleton in the presence of a phosphorus compound. It is an excellent thing that can be done. The phosphorus-containing polyimide obtained by this production method also exhibits excellent flame retardancy and is useful as a heat-resistant adhesive having flame retardancy, an insulating material for electronic circuit boards having flame retardancy, and the like.
以下に本発明の実施の形態について詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail.
I.リン含有テトラカルボン酸二無水物
まず、本発明の第一の態様であって、本発明のリン含有ポリイミドの原料(酸成分)である、リン含有テトラカルボン酸二無水物及びその製造方法について説明する。
I. Phosphorus-containing tetracarboxylic dianhydride First, the phosphorus-containing tetracarboxylic dianhydride, which is the first aspect of the present invention and is a raw material (acid component) of the phosphorus-containing polyimide of the present invention, and a method for producing the same To do.
「リン含有テトラカルボン酸二無水物及びその製造方法」
本発明の一般式(I)で表わされるリン含有テトラカルボン酸二無水物は、ベンゾフェノンテトラカルボン酸二無水物と下記一般式(1):
"Phosphorus-containing tetracarboxylic dianhydride and method for producing the same"
The phosphorus-containing tetracarboxylic dianhydride represented by the general formula (I) of the present invention includes benzophenone tetracarboxylic dianhydride and the following general formula (1):
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表わされるリン化合物とを反応させることにより得ることができる。
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
It can obtain by making it react with the phosphorus compound represented by these.
ここで用いられるベンゾフェノンテトラカルボン酸二無水物の具体例としては、3,3',4,4'-ベンゾフェノンテトラカルボン酸二無水物、2,3',3,4'-ベンゾフェノンテトラカルボン酸二無水物、2,2',3,3'-ベンゾフェノンテトラカルボン酸二無水物が挙げられる。 Specific examples of the benzophenone tetracarboxylic dianhydride used here include 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,3 ′, 3,4′-benzophenone tetracarboxylic dianhydride. Anhydrides and 2,2 ′, 3,3′-benzophenone tetracarboxylic dianhydride may be mentioned.
一般式(1)で表わされるリン化合物としては、R1及びR2が、共にフェニル基である(ここで、ベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基又はアルコキシル基で置換されていてもよい)ものが好ましく、具体例としては、下記式(1a): In the phosphorus compound represented by the general formula (1), R 1 and R 2 are both phenyl groups (wherein at least one of the hydrogen atoms on the benzene ring is an alkyl group or alkoxyl having 1 to 6 carbon atoms) (Which may be substituted with a group) is preferred, and specific examples include the following formula (1a):
同様に、一般式(1)で表わされるリン化合物としては、R1とR2の一方がフェニル基であり、他方がフェノキシ基であって、それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれている(ここで、ベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基又はアルコキシル基で置換されていてもよい)ものが好ましく、具体例としては、下記式(1b): Similarly, as the phosphorus compound represented by the general formula (1), one of R 1 and R 2 is a phenyl group, the other is a phenoxy group, and one of the carbon atoms on each benzene ring is bonded to each other. Those bonded by a single bond (wherein at least one hydrogen atom on the benzene ring may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms) are preferred, and specific examples include: The following formula (1b):
ベンゾフェノンテトラカルボン酸二無水物と一般式(1)で表わされるリン化合物との反応により、本発明の一般式(I): By the reaction of benzophenone tetracarboxylic dianhydride with the phosphorus compound represented by the general formula (1), the general formula (I) of the present invention:
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表わされるリン含有テトラカルボン酸二無水物を得ることができる。具体例としては、下記一般式(Ia):
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
The phosphorus-containing tetracarboxylic dianhydride represented by this can be obtained. Specific examples include the following general formula (Ia):
で表わされるリン含有テトラカルボン酸二無水物を挙げることができる。
The phosphorus containing tetracarboxylic dianhydride represented by these can be mentioned.
この反応は、40~250℃、好ましくは50~200℃、より好ましくは70~180℃の温度で、1分~12時間、好ましくは5分~6時間、より好ましくは10分~3時間加熱することによって行うことができる。 This reaction is performed at a temperature of 40 to 250 ° C., preferably 50 to 200 ° C., more preferably 70 to 180 ° C. for 1 minute to 12 hours, preferably 5 minutes to 6 hours, more preferably 10 minutes to 3 hours. Can be done.
この反応には、溶媒を使用してもよい。使用する溶媒は、反応に不活性な溶媒であれば特に限定されず、所望する反応温度に応じて適宜選択される。単独で、又は2種類以上の溶媒を任意の割合で混合して用いてもよい。例えば、トルエン、キシレン、エチルベンゼン、アニソール、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼンのような芳香族炭化水素、テトラヒドロフラン、ジグリム、トリグリムのようなエーテル系溶媒、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン(NMP)、ジメチルスルホキシド(DMSO)のような非プロトン性極性溶媒などが使用できる。溶媒の使用量は、ベンゾフェノンテトラカルボン酸二無水物に対して50~1000重量%、好ましくは100~500重量%である。 In this reaction, a solvent may be used. The solvent to be used is not particularly limited as long as it is an inert solvent for the reaction, and is appropriately selected according to the desired reaction temperature. You may use individually or in mixture of 2 or more types of solvents in arbitrary ratios. For example, aromatic hydrocarbons such as toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene and trichlorobenzene, ether solvents such as tetrahydrofuran, diglyme and triglyme, N, N-dimethylformamide, N, N-dimethylacetamide An aprotic polar solvent such as N-methyl-2-pyrrolidone (NMP) or dimethyl sulfoxide (DMSO) can be used. The amount of the solvent used is 50 to 1000% by weight, preferably 100 to 500% by weight, based on benzophenonetetracarboxylic dianhydride.
反応終了後、反応液を濃縮することによって粗生成物を得ることができる。粗生成物を極性溶媒、例えば、アセトニトリル、酢酸エチル、メチルイソブチルケトンのような溶媒で洗浄することによって精製することができる。洗浄した結晶を濾別し、減圧下又は常圧下にて40~250℃、好ましくは80~200℃の温度で乾燥させ目的物を得る。 After completion of the reaction, a crude product can be obtained by concentrating the reaction solution. The crude product can be purified by washing with a polar solvent such as acetonitrile, ethyl acetate, methyl isobutyl ketone. The washed crystal is separated by filtration and dried at a temperature of 40 to 250 ° C., preferably 80 to 200 ° C. under reduced pressure or normal pressure to obtain the desired product.
II.リン含有ポリイミド及びその製造方法
次いで、本発明の第二及び第三の態様である、リン含有ポリイミド及びその製造方法について説明する。
II. Phosphorus-containing polyimide and production method thereof Next, the phosphorus-containing polyimide and production method thereof, which are the second and third aspects of the present invention, will be described.
「リン含有ポリアミド酸及びその製造方法」
本発明のリン含有ポリイミドの製造は、まずその前駆体である下記一般式(III):
"Phosphorus-containing polyamic acid and method for producing the same"
The production of the phosphorus-containing polyimide of the present invention begins with the following general formula (III):
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよく、R3は二価の有機基である)
で表わされる繰り返し単位を有するリン含有ポリアミド酸を製造する。リン含有ポリアミド酸の製造は、上記の方法で得られたリン含有テトラカルボン酸二無水物と、式:H2N-R3-NH2で表わされるジアミン成分とを公知の方法で重合することによって行うことができる。通常、重合反応は溶媒中で5~80重量%、好ましくは10~50重量%の溶質濃度で行われる。反応終了後、反応溶液は、そのままリン含有ポリアミド酸溶液(ワニス)として、続くイミド化反応で使用することができる。また、反応溶液からリン含有ポリアミド酸を単離し、次いで適切な溶媒に再溶解し、リン含有ポリアミド酸溶液を調製してもよい。
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group)
The phosphorus containing polyamic acid which has a repeating unit represented by these is manufactured. The phosphorus-containing polyamic acid is produced by polymerizing the phosphorus-containing tetracarboxylic dianhydride obtained by the above method and a diamine component represented by the formula: H 2 N—R 3 —NH 2 by a known method. Can be done by. Usually, the polymerization reaction is carried out in a solvent at a solute concentration of 5 to 80% by weight, preferably 10 to 50% by weight. After completion of the reaction, the reaction solution can be used as it is as a phosphorus-containing polyamic acid solution (varnish) in the subsequent imidization reaction. Alternatively, the phosphorus-containing polyamic acid solution may be prepared by isolating the phosphorus-containing polyamic acid from the reaction solution and then re-dissolving it in an appropriate solvent.
式:H2N-R3-NH2で表わされるジアミン成分は、芳香族ジアミン、脂肪族ジアミン又は脂環式ジアミンであってよく、したがってR3の例としては、炭素数6~14の単環式若しくは縮合多環式芳香族化合物の二価の基(例えば、フェニレン、インデニレン、ナフチレン、フルオレニレン)、炭素数2~12の脂肪族化合物の二価の基(例えば、炭素数2~12のアルカンジイル、アルケニレン又はアルキニレン)又は炭素数3~10の脂環式化合物の二価の基(例えば、炭素数3~10のシクロアルキレン又はシクロアルケニレン)、あるいは同一であっても異なっていてもよい、2つ以上の前記二価の基が、直接もしくは架橋員(ここで架橋員とは、-O-、-CO-、-COO-、-OCO-、-SO2-、-S-、-CH2-、-C(CH3)2-及び-C(CF3)2-からなる群から選択される)により相互に連結されたもの(例えば、ビフェニル-4,4’-ジイル、ジフェニルエーテル-4,4’-ジイル、ジフェニルエーテル-3,4’-ジイル、ベンゾフェノン-4,4’-ジイル)を挙げることができる。これらの芳香族ジアミン、脂肪族ジアミン又は脂環式ジアミンは、炭素数1~6のアルキル基、アルケニル基、アルキニル基若しくはアルコキシル基、又はハロゲン原子から選択される1つ以上の置換基を有していてもよい。 The diamine component represented by the formula: H 2 N—R 3 —NH 2 may be an aromatic diamine, an aliphatic diamine or an alicyclic diamine, and as an example of R 3 , A divalent group of a cyclic or condensed polycyclic aromatic compound (eg, phenylene, indenylene, naphthylene, fluorenylene), a divalent group of an aliphatic compound having 2 to 12 carbon atoms (eg, having 2 to 12 carbon atoms) Alkanediyl, alkenylene or alkynylene) or a divalent group of an alicyclic compound having 3 to 10 carbon atoms (eg, cycloalkylene or cycloalkenylene having 3 to 10 carbon atoms), or may be the same or different , two or more of the divalent groups, the direct or bridge member (here a bridge member, -O -, - CO -, - COO -, - OCO -, - SO 2 -, - S -, - H 2 -, - C (CH 3) 2 - and -C (CF 3) 2 - is selected from the group consisting of) those which are connected to each other by (e.g., biphenyl-4,4'-diyl, diphenyl ether - 4,4'-diyl, diphenyl ether-3,4'-diyl, benzophenone-4,4'-diyl). These aromatic diamines, aliphatic diamines or alicyclic diamines have one or more substituents selected from alkyl groups having 1 to 6 carbon atoms, alkenyl groups, alkynyl groups or alkoxyl groups, or halogen atoms. It may be.
ここで用いられる芳香族ジアミン成分の例としては、芳香族基を1つ有するもの:p-フェニレンジアミン、m-フェニレンジアミン、p-アミノベンジルアミン、m-アミノベンジルアミン、ジアミノトルエン類、ジアミノキシレン類、ジアミノナフタレン類、ジアミノアントラセン類など、芳香族基を2つ有するもの:4,4’-ジアミノビフェニル、3,4’-ジアミノビフェニル、3,3’-ジアミノビフェニル、o-トリジン、m-トリジン、o-ジアニシジン、4,4’-ジアミノジフェニルメタン、3,4’-ジアミノジフェニルメタン、3,3’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、3,3’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルスルホン、3,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、4,4’-ジアミノジフェニルケトン、3,4’-ジアミノジフェニルケトン、3,3’-ジアミノジフェニルケトン、3,4-ジアミノベンゾフェノン、2,2-ビス(4-アミノフェノキシ)プロパン、2,2-ビス(3-アミノフェノキシ)プロパン、2-(3-アミノフェニル)-2-(4-アミノフェニル)プロパンなど、芳香族基を3つ有するもの:1,4-ビス(4-アミノフェノキシ)ベンゼン、1,4-ビス(3-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(3-アミノフェノキシ)ベンゼン、1,4-ビス(4-アミノベンゾイル)ベンゼン、1,4-ビス(3-アミノベンゾイル)ベンゼン、1,3-ビス(4-アミノベンゾイル)ベンゼン、1,3-ビス(3-アミノベンゾイル)ベンゼン、9,9-ビス(4-アミノフェニル)フルオレンなど、芳香族基を4つ以上有するもの:2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、4,4’-ビス(4-アミノフェノキシ)ビフェニル、4,4’-ビス(3-アミノフェノキシ)ビフェニル、ビス[4-(4-アミノフェノキシ)フェニル]スルホン、ビス[4-(3-アミノフェノキシ)フェニル]スルホン、ビス[4-(4-アミノフェノキシ)フェニル]エーテル、ビス[4-(3-アミノフェノキシ)フェニル]エーテル、4,4’-ビス(4-アミノフェノキシ)ベンゾフェノン、4,4’-ビス(3-アミノフェノキシ)ベンゾフェノン、1,4-ビス[4-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ベンゼン、1,3-ビス[4-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ベンゼン、1,4-ビス[3-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ベンゼン、1,3-ビス[3-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ベンゼン、4,4’-ビス[4-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ジフェニルエーテル、4,4’-ビス[3-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ジフェニルエーテル、4,4’-ビス[4-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ビフェニル、4,4’-ビス[3-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ビフェニル、4,4’-ビス[4-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ジフェニルスルホン、4,4’-ビス[3-(2-,3-若しくは4-アミノフェノキシ)ベンゾイル]ジフェニルスルホンなどが挙げられる。またこれらの芳香族環上の水素原子は、炭素数1~6のアルキル基、アルケニル基、アルキニル基若しくはアルコキシル基、又はハロゲン原子から選択される1つ以上の置換基で置換されていてもよい。入手の容易さを考慮に入れると、具体的に4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,4-ビス(3-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(3-アミノフェノキシ)ベンゼン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、4,4’-ビス(4-アミノフェノキシ)ビフェニル、4,4’-ビス(3-アミノフェノキシ)ビフェニル、ビス[4-(4-アミノフェノキシ)フェニル]スルホン、ビス[4-(3-アミノフェノキシ)フェニル]スルホン、9,9-ビス(4-アミノフェニル)フルオレンの使用が好ましい。 Examples of the aromatic diamine component used here include those having one aromatic group: p-phenylenediamine, m-phenylenediamine, p-aminobenzylamine, m-aminobenzylamine, diaminotoluenes, diaminoxylene. , Diaminonaphthalenes, diaminoanthracenes, etc. having two aromatic groups: 4,4′-diaminobiphenyl, 3,4′-diaminobiphenyl, 3,3′-diaminobiphenyl, o-tolidine, m- Tolidine, o-dianisidine, 4,4'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 3,3'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3 ' -Diaminodiphenyl ether, 4,4'-diamy Diphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl ketone, 3,4'-diaminodiphenyl ketone, 3,3'-diaminodiphenyl ketone, 3, 4-diaminobenzophenone, 2,2-bis (4-aminophenoxy) propane, 2,2-bis (3-aminophenoxy) propane, 2- (3-aminophenyl) -2- (4-aminophenyl) propane, etc. Having three aromatic groups: 1,4-bis (4-aminophenoxy) benzene, 1,4-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, , 3-bis (3-aminophenoxy) benzene, 1,4-bis (4-aminobenzoyl) benzene, 1,4-bis Aromatic groups such as 3-aminobenzoyl) benzene, 1,3-bis (4-aminobenzoyl) benzene, 1,3-bis (3-aminobenzoyl) benzene, 9,9-bis (4-aminophenyl) fluorene Having two or more of: 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-bis (3-aminophenoxy) ) Biphenyl, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, bis [4- (4-aminophenoxy) phenyl] ether, bis [4- ( 3-aminophenoxy) phenyl] ether, 4,4′-bis (4-aminophenoxy) benzophenone, 4,4′-bis (3-aminophen Noxy) benzophenone, 1,4-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] benzene, 1,3-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] Benzene, 1,4-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] benzene, 1,3-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] benzene, 4,4′-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] diphenyl ether, 4,4′-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] diphenyl ether, 4,4′-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] biphenyl, 4,4′-bis [3- (2-, 3- or -Aminophenoxy) benzoyl] biphenyl, 4,4'-bis [4- (2-, 3- or 4-aminophenoxy) benzoyl] diphenylsulfone, 4,4'-bis [3- (2-, 3- or 4-aminophenoxy) benzoyl] diphenylsulfone and the like. Further, the hydrogen atom on these aromatic rings may be substituted with one or more substituents selected from an alkyl group having 1 to 6 carbon atoms, an alkenyl group, an alkynyl group or an alkoxyl group, or a halogen atom. . In view of availability, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 1,4-bis (4-aminophenoxy) benzene, 1,4-bis (3- Aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 4 , 4′-bis (4-aminophenoxy) biphenyl, 4,4′-bis (3-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) ) Phenyl] sulfone, 9,9-bis (4-aminophenyl) fluorene is preferred.
ここで用いられる脂肪族又は脂環式ジアミン成分の例としては、1,2-ジアミノエタン、1,2-ジアミノプロパン、1,3-ジアミノプロパン、1,4-ジアミノブタン、1,3-ジアミノペンタン、1,5-ジアミノペンタン、1,6-ジアミノヘキサン、1,7-ジアミノヘプタン、1,8-ジアミノオクタン、1,9-ジアミノノナン、1,10-ジアミノデカン、1,11-ジアミノウンデカン、1,12-ジアミノドデカン、2-メチル-1,5-ジアミノペンタン、1,3-ビス(アミノメチル)シクロヘキサン、1,4-ビス(アミノメチル)シクロヘキサン、1,3-ジアミノシクロヘキサン、1,4-ジアミノシクロヘキサン、4,4’-ジアミノジシクロヘキシルメタン、イソホロンジアミンなどが挙げられる。入手の容易さを考慮に入れると、具体的に1,6-ジアミノヘキサン、1,3-ビス(アミノメチル)シクロヘキサン、1,4-ビス(アミノメチル)シクロヘキサン、1,4-ジアミノシクロヘキサン、4,4’-ジアミノジシクロヘキシルメタン、イソホロンジアミンの使用が好ましい。 Examples of aliphatic or alicyclic diamine components used herein include 1,2-diaminoethane, 1,2-diaminopropane, 1,3-diaminopropane, 1,4-diaminobutane, 1,3-diamino Pentane, 1,5-diaminopentane, 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1,9-diaminononane, 1,10-diaminodecane, 1,11-diaminoundecane, 1,12-diaminododecane, 2-methyl-1,5-diaminopentane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 1,3-diaminocyclohexane, 1,4 -Diaminocyclohexane, 4,4'-diaminodicyclohexylmethane, isophoronediamine and the like. Considering the availability, specifically, 1,6-diaminohexane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 1,4-diaminocyclohexane, 4 4,4'-diaminodicyclohexylmethane and isophoronediamine are preferably used.
上記のようなジアミン成分を単独又は2種類以上混合して使用してもよい。さらに下記一般式(IV): The above diamine components may be used alone or in combination of two or more. Furthermore, the following general formula (IV):
(式中、mは0~20の整数の混合値であり、R4はメチル、イソプロピル、フェニル、ビニル基を示し、R5は、炭素数1~7の炭化水素の二価の基、例えばトリメチレン、テトラメチレン、フェニレンなどを示す)で表されるシロキサンジアミンを、ジアミン成分の1~50モル%の範囲で用いて共重合させてもよい。 (In the formula, m is an integer mixed value of 0 to 20, R 4 represents a methyl, isopropyl, phenyl or vinyl group, R 5 represents a divalent group of a hydrocarbon having 1 to 7 carbon atoms, for example, A siloxane diamine represented by (trimethylene, tetramethylene, phenylene, etc.) may be used in an amount in the range of 1 to 50 mol% of the diamine component.
さらに分子量を調整する目的でモノアミン化合物やジカルボン酸無水物を添加してもよい。使用されるモノアミン化合物は、アニリン、4-アミノフェノール、3-アミノフェノール、4-アミノビフェニル、4-フェノキシアニリン、3-アミノフェニルアセチレン、4-アミノフェニルアセチレンなどであり、ジカルボン酸無水物は、マレイン酸無水物、無水フタル酸、4-フェニルエチニル無水フタル酸、4-エチニル無水フタル酸、トリメリト酸などである。モノアミン化合物やジカルボン酸無水物の添加量は、目的とするリン含有ポリイミドの分子量によって異なるが、通常は使用するすべての酸二無水物とジアミン化合物とのモル数の差の1.0~数倍のモル数であり、好ましくは1.5~4.0倍である。酸二無水物が多い場合にはモノアミン化合物、ジアミン化合物が多い場合にはジカルボン酸無水物を加える。 Further, a monoamine compound or a dicarboxylic acid anhydride may be added for the purpose of adjusting the molecular weight. The monoamine compounds used are aniline, 4-aminophenol, 3-aminophenol, 4-aminobiphenyl, 4-phenoxyaniline, 3-aminophenylacetylene, 4-aminophenylacetylene, etc. Maleic anhydride, phthalic anhydride, 4-phenylethynyl phthalic anhydride, 4-ethynyl phthalic anhydride, trimellitic acid and the like. The amount of monoamine compound or dicarboxylic acid anhydride added varies depending on the molecular weight of the target phosphorus-containing polyimide, but it is usually 1.0 to several times the difference in the number of moles of all acid dianhydrides and diamine compounds used. The number of moles is preferably 1.5 to 4.0 times. When there are many acid dianhydrides, a monoamine compound is added, and when there are many diamine compounds, a dicarboxylic acid anhydride is added.
本発明のリン含有ポリアミド酸の製造に使用される溶媒は、反応に不活性な溶媒なら特に限定されず、例えば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、ジメチルスルホキシド、テトラメチルウレア、テトラヒドロフランなどを単独又は混合形態で使用することができる。特に好ましいのは、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドンである。またこれらの溶媒にトルエン、キシレン、エチルベンゼン、アニソール、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼン、ジグリム、トリグリム等の溶媒を任意の割合で混合して用いてもよい。これらの溶媒はまた、単離したリン含有ポリアミド酸の再溶解によりリン含有ポリアミド酸溶液を調製する際に使用してもよい。 The solvent used in the production of the phosphorus-containing polyamic acid of the present invention is not particularly limited as long as it is an inert solvent. For example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2- Pyrrolidone, dimethyl sulfoxide, tetramethylurea, tetrahydrofuran and the like can be used alone or in a mixed form. Particularly preferred are N, N-dimethylacetamide and N-methyl-2-pyrrolidone. Further, these solvents may be used by mixing a solvent such as toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene, trichlorobenzene, diglyme and triglyme in an arbitrary ratio. These solvents may also be used in preparing phosphorus-containing polyamic acid solutions by redissolving the isolated phosphorus-containing polyamic acid.
本発明の一般式(III)で表される繰り返し単位を有するリン含有ポリアミド酸、及び一般式(II)で表される繰り返し単位を有するリン含有ポリイミドとは、一般式(III)で表される繰り返し単位のみからなるリン含有ポリアミド酸、及び一般式(II)で表される繰り返し単位のみからなるリン含有ポリイミドのみを意味するものではなく、それぞれかかる繰り返し単位を主要構成単位として含むものも包含することを意味する。したがって、本発明のリン含有ポリイミドの目的や、その前駆体であるリン含有ポリアミド酸の反応性を損なわない範囲で、リン含有ポリアミド酸の製造の際に、上記一般式(I)で表されるリン含有テトラカルボン酸二無水物以外のテトラカルボン酸二無水物を、部分的に使用することができる。 The phosphorus-containing polyamic acid having a repeating unit represented by the general formula (III) and the phosphorus-containing polyimide having a repeating unit represented by the general formula (II) are represented by the general formula (III). It does not mean only phosphorus-containing polyamic acid consisting only of repeating units and phosphorus-containing polyimide consisting only of repeating units represented by the general formula (II), but also includes those containing such repeating units as main constituent units. Means that. Accordingly, the purpose of the phosphorus-containing polyimide of the present invention and the reactivity of the phosphorus-containing polyamic acid that is a precursor thereof are represented by the above general formula (I) in the production of the phosphorus-containing polyamic acid. Tetracarboxylic dianhydrides other than phosphorus-containing tetracarboxylic dianhydrides can be partially used.
そのようなテトラカルボン酸二無水物としては、ピロメリト酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,3’,3,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、4,4’-オキシジフタル酸二無水物、3,4’-オキシジフタル酸二無水物、3,3’-オキシジフタル酸二無水物、4,4’-ベンゾフェノンテトラカルボン酸二無水物、4,4’-ジフェニルスルホンテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン二無水物、1,2,7,8-ナフタレンテトラカルボン酸二無水物等が挙げられる。本発明の目的である、優れた難燃特性を有するリン含有ポリイミドを提供するためには、用いるテトラカルボン酸二無水物成分中、一般式(I)で表されるリン含有テトラカルボン酸二無水物を30モル%以上使用することが好ましく、50モル%以上使用することがより好ましい。 Examples of such tetracarboxylic dianhydrides include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,3 ′, 3,4′-biphenyltetracarboxylic acid. Dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 4,4′-oxydiphthalic dianhydride, 3,4′-oxydiphthalic dianhydride, 3,3′-oxydiphthal Acid dianhydride, 4,4′-benzophenone tetracarboxylic dianhydride, 4,4′-diphenylsulfone tetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 1,2,7,8-naphthalenetetracarboxylic dianhydride, and the like. In order to provide a phosphorus-containing polyimide having excellent flame retardancy, which is an object of the present invention, a phosphorus-containing tetracarboxylic dianhydride represented by the general formula (I) in the tetracarboxylic dianhydride component used It is preferable to use 30 mol% or more of the product, more preferably 50 mol% or more.
さらに、リン含有ポリアミド酸の製造は、上記のような対応する酸二無水物の単離、精製工程を省略してもかまわない。すなわち、ベンゾフェノンテトラカルボン酸二無水物と一般式(1)で表わされるリン化合物とを溶媒中で40~250℃、好ましくは50~200℃、より好ましくは70~180℃で1分~12時間、好ましくは5分~6時間、より好ましくは10分から3時間加熱することによって得られたリン含有テトラカルボン酸二無水物を含む溶液を冷却したのち、所望するジアミン化合物(ジアミン化合物は前述の通り)と必要に応じてN,N-ジメチルアセトアミド、N-メチル-2-ピロリドンのような溶媒とを溶質濃度が5~80重量%、より好ましくは10~50重量%になるように投入することによって行うことができる。 Furthermore, in the production of phosphorus-containing polyamic acid, the corresponding acid dianhydride isolation and purification steps as described above may be omitted. That is, a benzophenonetetracarboxylic dianhydride and a phosphorus compound represented by the general formula (1) in a solvent at 40 to 250 ° C., preferably 50 to 200 ° C., more preferably 70 to 180 ° C. for 1 minute to 12 hours. After cooling the solution containing phosphorus-containing tetracarboxylic dianhydride obtained by heating, preferably 5 minutes to 6 hours, more preferably 10 minutes to 3 hours, the desired diamine compound (the diamine compound is as described above) ) And a solvent such as N, N-dimethylacetamide or N-methyl-2-pyrrolidone as necessary, so that the solute concentration is 5 to 80% by weight, more preferably 10 to 50% by weight. Can be done by.
「リン含有ポリイミドの製造方法」
上記のようにして得られた下記一般式(III):
"Production method of phosphorus-containing polyimide"
The following general formula (III) obtained as described above:
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよく、R3は、2価の有機基である)
で表わされる繰り返し単位を有するリン含有ポリアミド酸を、熱的及び/又は化学的に閉環させることにより、本発明の下記一般式(II):
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is May be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be bonded to each other by a single bond, R 3 is a divalent organic group)
The phosphorus-containing polyamic acid having a repeating unit represented by the following general formula (II) of the present invention is thermally and / or chemically cyclized:
(式中、R1、R2及びR3は、上記と同義である)
で表わされる繰り返し単位を有するリン含有ポリイミドを得ることができる。
(Wherein R 1 , R 2 and R 3 are as defined above)
The phosphorus containing polyimide which has a repeating unit represented by this can be obtained.
本発明のリン含有ポリイミドは、リン含有ポリアミド酸を公知の方法によって熱的及び/又は化学的に閉環させる(すなわち、脱水させる)ことにより製造される。例えば、リン含有ポリアミド酸溶液を、ガラス板、銅、アルミ、又はステンレス等の金属箔、あるいはポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリフェニレンサルファイド(PPS)、ポリイミド、シリコン樹脂、又はフッ素樹脂等の樹脂フィルムなどの基材上に、乾燥後の厚みが0.1~250μm、より好ましくは1.0~100μmになるように塗布し、40~500℃、より好ましくは70~350℃で1分~5時間、より好ましくは3分~3時間乾燥させることによって、リン含有ポリイミドを得ることができる。得られたポリイミドは、基材から剥がしてフィルム形態として、又はそのまま積層体として使用することができる。 The phosphorus-containing polyimide of the present invention is produced by thermally and / or chemically ring-closing (that is, dehydrating) a phosphorus-containing polyamic acid by a known method. For example, a phosphorus-containing polyamic acid solution can be obtained by using a glass plate, a metal foil such as copper, aluminum, or stainless steel, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyimide, silicon resin, or fluorine. It is applied on a substrate such as a resin film such as a resin so that the thickness after drying is 0.1 to 250 μm, more preferably 1.0 to 100 μm, and 40 to 500 ° C., more preferably 70 to 350 ° C. The phosphorus-containing polyimide can be obtained by drying for 1 minute to 5 hours, more preferably 3 minutes to 3 hours. The obtained polyimide can be peeled off from the substrate and used as a film or as a laminate.
また、リン含有ポリアミド酸溶液に、トルエン、キシレン、エチルベンゼン、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼンのような水と共沸する溶媒を加え、100~300℃、より好ましくは150~250℃で加熱を行い、イミド化に伴い発生する水を系外に排出し熱イミド化を行うことにより、リン含有ポリイミドを得ることもできる。この時、ピリジン、ピコリン、イミダゾールのような含窒素複素環化合物やトリエチルアミンのようなトリ低級アルキルアミンなどを用いてもよい。あるいは、無水酢酸、トリフルオロ無水酢酸、N,N-ジシクロヘキシルカルボジイミドのような脱水剤とピリジン、ピコリン、イミダゾールのような含窒素複素環化合物やトリエチルアミンのようなトリ低級アルキルアミンなどとを加え、0~200℃で1~24時間脱水することによって化学イミド化を行うことにより、リン含有ポリイミドを得てもよい。上記のように熱的あるいは化学的にイミド化が終了した溶液を、水、メタノール、エタノール、イソプロパノール、アセトン、トルエン、キシレンのような単独溶媒あるいはこれらの混合溶液に注入し、結晶を析出させ濾別し、乾燥、粉砕して粉状の形態として得ることができる。得られたポリイミドは、そのまま射出成型や圧縮成型に用いることができる。また別途、溶媒に溶解させ、ワニスとして使用することもでき、それを前述の基材上に塗布し、乾燥させフィルム形態として得ることもできる。 Further, a solvent azeotropic with water such as toluene, xylene, ethylbenzene, chlorobenzene, dichlorobenzene, and trichlorobenzene is added to the phosphorus-containing polyamic acid solution, and the mixture is heated at 100 to 300 ° C, more preferably at 150 to 250 ° C. The phosphorus-containing polyimide can also be obtained by discharging water generated with imidization out of the system and performing thermal imidization. At this time, a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole, or a tri-lower alkylamine such as triethylamine may be used. Alternatively, a dehydrating agent such as acetic anhydride, trifluoroacetic anhydride, N, N-dicyclohexylcarbodiimide and a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole, or a tri-lower alkylamine such as triethylamine are added. Phosphorus-containing polyimide may be obtained by performing chemical imidation by dehydration at ˜200 ° C. for 1 to 24 hours. The solution that has been imidized thermally or chemically as described above is poured into a single solvent such as water, methanol, ethanol, isopropanol, acetone, toluene, xylene or a mixed solution thereof to precipitate crystals and filter. Separately, it can be dried and pulverized to obtain a powder form. The obtained polyimide can be used for injection molding or compression molding as it is. Separately, it can be dissolved in a solvent and used as a varnish, or it can be applied on the aforementioned substrate and dried to obtain a film form.
III.リン含有ポリイミドの製造方法
本発明の第四の態様である、リン含有ポリイミドの製造方法について説明する。
III. Method for Producing Phosphorus-Containing Polyimide A method for producing phosphorus-containing polyimide, which is the fourth aspect of the present invention, will be described.
「ポリアミド酸の製造方法」
本発明のリン含有ポリイミドの製造は、まずその原料である一般式(I′):
"Production method of polyamic acid"
First, the phosphorus-containing polyimide of the present invention is produced by the general formula (I ′):
(式中、R3は二価の有機基を表す)
で表わされるポリアミド酸を製造する。
(Wherein R 3 represents a divalent organic group)
Is produced.
式(I′)で表されるポリアミド酸は、ベンゾフェノンテトラカルボン酸二無水物と式:H2N-R3-NH2で表わされるジアミン成分とを反応させることにより得られる。この製造方法は、特に制限はなく公知の方法でよく、通常は溶媒中で5~80重量%、好ましくは10~50重量%の溶質濃度で行われる。反応終了後、反応溶液は、そのままポリアミド酸溶液(ワニス)として、続くイミド化反応で使用することができる。また、反応溶液からポリアミド酸を単離し、次いで適切な溶媒に再溶解し、リン含有ポリアミド酸溶液を調製してもよい。 The polyamic acid represented by the formula (I ′) is obtained by reacting a benzophenone tetracarboxylic dianhydride with a diamine component represented by the formula: H 2 N—R 3 —NH 2 . This production method is not particularly limited and may be a known method, and is usually carried out in a solvent at a solute concentration of 5 to 80% by weight, preferably 10 to 50% by weight. After completion of the reaction, the reaction solution can be used as it is as a polyamic acid solution (varnish) in the subsequent imidization reaction. Alternatively, the phosphoric acid-containing polyamic acid solution may be prepared by isolating the polyamic acid from the reaction solution and then re-dissolving it in a suitable solvent.
ポリアミド酸の製造に使用される溶媒は、反応に不活性な溶媒なら特に限定されず、例えば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、ジメチルスルホキシド、テトラメチルウレア、テトラヒドロフランなどを単独又は混合形態で使用することができる。特に好ましいのは、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドンである。またこれらの溶媒にトルエン、キシレン、エチルベンゼン、アニソール、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼン、ジグリム、トリグリム等の溶媒を任意の割合で混合して用いてもよい。これらの溶媒はまた、単離したポリアミド酸の再溶解によりポリアミド酸溶液を調製する際に使用してもよい。 The solvent used for the production of the polyamic acid is not particularly limited as long as it is inert to the reaction. For example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide, Tetramethylurea, tetrahydrofuran and the like can be used alone or in a mixed form. Particularly preferred are N, N-dimethylacetamide and N-methyl-2-pyrrolidone. Further, these solvents may be used by mixing a solvent such as toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene, trichlorobenzene, diglyme and triglyme in an arbitrary ratio. These solvents may also be used in preparing the polyamic acid solution by redissolving the isolated polyamic acid.
ここで用いられるベンゾフェノンテトラカルボン酸二無水物の具体例としては、3,3'、4,4'-ベンゾフェノンテトラカルボン酸二無水物、2,3'、3,4'-ベンゾフェノンテトラカルボン酸二無水物、2,2'、3,3'-ベンゾフェノンテトラカルボン酸二無水物が挙げられる。 Specific examples of the benzophenone tetracarboxylic dianhydride used here include 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,3 ′, 3,4′-benzophenone tetracarboxylic dianhydride. Anhydrous, 2,2 ′, 3,3′-benzophenone tetracarboxylic dianhydride.
ここで用いられる式:H2N-R3-NH2で表わされるジアミン成分は、芳香族ジアミン、脂肪族ジアミン又は脂環式ジアミンであってよく、したがってR3の例としては、炭素数6~14の単環式若しくは縮合多環式芳香族化合物の二価の基(例えば、フェニレン、インデニレン、ナフチレン、フルオレニレン)、炭素数2~12の脂肪族化合物の二価の基(例えば、炭素数2~12のアルカンジイル、アルケニレン又はアルキニレン)又は炭素数3~10の脂環式化合物の二価の基(例えば、炭素数3~10のシクロアルキレン又はシクロアルケニレン)、あるいは同一であっても異なっていてもよい、2つ以上の前記二価の基が、直接もしくは架橋員(ここで架橋員とは、-O-、-CO-、-COO-、-OCO-、-SO2-、-S-、-CH2-、-C(CH3)2-及び-C(CF3)2-からなる群から選択される)により相互に連結されたもの(例えば、ビフェニル-4,4’-ジイル、ジフェニルエーテル-4,4’-ジイル、ジフェニルエーテル-3,4’-ジイル、ベンゾフェノン-4,4’-ジイル)を挙げることができる。これらの芳香族ジアミン、脂肪族ジアミン又は脂環式ジアミンは、炭素数1~6のアルキル基、アルケニル基、アルキニル基若しくはアルコキシル基、又はハロゲン原子から選択される1つ以上の置換基を有していてもよい。 Formula used herein: diamine component represented by H 2 N-R 3 -NH 2 is an aromatic diamine may be aliphatic diamine or alicyclic diamine, therefore as an example of R 3 is 6 carbon atoms A divalent group of a monocyclic or condensed polycyclic aromatic compound of ˜14 (for example, phenylene, indenylene, naphthylene, fluorenylene), a divalent group of an aliphatic compound of 2 to 12 carbons (for example, carbon number) 2 to 12 alkanediyl, alkenylene or alkynylene) or a divalent group of an alicyclic compound having 3 to 10 carbon atoms (eg, cycloalkylene or cycloalkenylene having 3 to 10 carbon atoms), or the same or different The two or more divalent groups which may be present are directly or a cross-linking member (wherein the cross-linking member means —O—, —CO—, —COO—, —OCO—, —SO 2). Selected from the group consisting of —, —S—, —CH 2 —, —C (CH 3 ) 2 —, and —C (CF 3 ) 2 — (eg, biphenyl-4, 4′-diyl, diphenyl ether-4,4′-diyl, diphenyl ether-3,4′-diyl, benzophenone-4,4′-diyl). These aromatic diamines, aliphatic diamines or alicyclic diamines have one or more substituents selected from alkyl groups having 1 to 6 carbon atoms, alkenyl groups, alkynyl groups or alkoxyl groups, or halogen atoms. It may be.
芳香族ジアミン成分、脂肪族又は脂環式ジアミン成分の例は、上記「II.リン含有ポリイミド及びその製造方法」の項で、芳香族ジアミン成分、脂肪族又は脂環式ジアミン成分の例として具体的に挙げられた各ジアミン化合物と同じである。 Examples of the aromatic diamine component, aliphatic or alicyclic diamine component are specific examples of the aromatic diamine component, aliphatic or alicyclic diamine component in the above section “II. Phosphorus-containing polyimide and production method thereof”. The same as each of the diamine compounds mentioned above.
上記のようなジアミン成分を単独又は2種類以上混合して使用してもよい。さらに下記一般式(IV): The above diamine components may be used alone or in combination of two or more. Furthermore, the following general formula (IV):
(式中、mは0~20の整数の混合値であり、R4はメチル、イソプロピル、フェニル、ビニル基を示し、R5は、炭素数1~7の炭化水素の二価の基、例えばトリメチレン、テトラメチレン、フェニレンなどを示す)で表されるシロキサンジアミンを、ジアミン成分の1~50モル%の範囲で用いて共重合させてもよい。 (In the formula, m is an integer mixed value of 0 to 20, R 4 represents a methyl, isopropyl, phenyl or vinyl group, R 5 represents a divalent group of a hydrocarbon having 1 to 7 carbon atoms, for example, A siloxane diamine represented by (trimethylene, tetramethylene, phenylene, etc.) may be used in an amount in the range of 1 to 50 mol% of the diamine component.
本発明のベンゾフェノンテトラカルボン酸二無水物とジアミン成分とを反応させることにより得られるポリアミド酸は、一般式(I′)で表わされる繰り返し単位のみからなるポリアミド酸のみを意味するものではなく、かかる繰り返し単位を主要構成単位として含むものも包含することを意味する。したがって、本発明のリン含有ポリイミドの目的や、その前駆体であるポリアミド酸の反応性を損なわない範囲で、ポリアミド酸の製造の際に、ベンゾフェノンテトラカルボン酸二無水物以外のテトラカルボン酸二無水物を、部分的に使用することができる。 The polyamic acid obtained by reacting the benzophenone tetracarboxylic dianhydride of the present invention with the diamine component does not mean only the polyamic acid consisting only of the repeating unit represented by the general formula (I ′). It is meant to include those containing a repeating unit as a main constituent unit. Therefore, in the production of the polyamic acid, the purpose of the phosphorus-containing polyimide of the present invention and the reactivity of the polyamic acid that is the precursor thereof are not affected. Things can be used in part.
そのようなテトラカルボン酸二酸無水物としては、ピロメリト酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,3’,3,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、4,4’-オキシジフタル酸二無水物、3,4’-オキシジフタル酸二無水物、3,3’-オキシジフタル酸二無水物、4,4’-ジフェニルスルホンテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン二無水物、1,2,7,8-ナフタレンテトラカルボン酸二無水物等が挙げられる。本発明の目的である、優れた難燃特性を有するリン含有ポリイミドを提供するためには、用いるテトラカルボン酸二無水物成分中、ベンゾフェノンテトラカルボン酸二無水物を30モル%以上使用することが好ましく、50モル%以上使用することがより好ましい。 Examples of such tetracarboxylic dianhydrides include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,3 ′, 3,4′-biphenyltetracarboxylic acid. Acid dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 4,4′-oxydiphthalic dianhydride, 3,4′-oxydiphthalic dianhydride, 3,3′- Oxydiphthalic dianhydride, 4,4'-diphenylsulfonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-di Carboxyphenyl) hexafluoropropane dianhydride, 1,2,7,8-naphthalene tetracarboxylic dianhydride and the like. In order to provide a phosphorus-containing polyimide having excellent flame retardancy, which is an object of the present invention, it is necessary to use 30 mol% or more of benzophenone tetracarboxylic dianhydride in the tetracarboxylic dianhydride component to be used. Preferably, it is more preferable to use 50 mol% or more.
さらに分子量を調整する目的でモノアミン化合物やジカルボン酸無水物を添加してもよい。使用されるモノアミン化合物は、アニリン、4-アミノフェノール、3-アミノフェノール、4-アミノビフェニル、4-フェノキシアニリン、3-アミノフェニルアセチレン、4-アミノフェニルアセチレンなどであり、ジカルボン酸無水物は、マレイン酸無水物、無水フタル酸、4-フェニルエチニル無水フタル酸、4-エチニル無水フタル酸、トリメリト酸などである。モノアミン化合物やジカルボン酸無水物の添加量は、目的とするポリイミドの分子量によって異なるが、通常は使用するすべての酸二無水物とジアミン化合物とのモル数の差の1.0~数倍のモル数であり、好ましくは1.5~4.0倍である。酸二無水物が多い場合にはモノアミン化合物、ジアミン化合物が多い場合にはジカルボン酸無水物を加える。 Further, a monoamine compound or a dicarboxylic acid anhydride may be added for the purpose of adjusting the molecular weight. The monoamine compounds used are aniline, 4-aminophenol, 3-aminophenol, 4-aminobiphenyl, 4-phenoxyaniline, 3-aminophenylacetylene, 4-aminophenylacetylene, etc. Maleic anhydride, phthalic anhydride, 4-phenylethynyl phthalic anhydride, 4-ethynyl phthalic anhydride, trimellitic acid and the like. The amount of monoamine compound or dicarboxylic anhydride added varies depending on the molecular weight of the target polyimide, but it is usually 1.0 to several times the molar difference between the number of moles of all acid dianhydrides used and the diamine compound. The number is preferably 1.5 to 4.0 times. When there are many acid dianhydrides, a monoamine compound is added, and when there are many diamine compounds, a dicarboxylic acid anhydride is added.
「リン含有ポリイミドの製造方法」
上記のようにして得られた下記一般式(I′):
"Production method of phosphorus-containing polyimide"
The following general formula (I ′) obtained as described above:
で表わされるポリアミド酸を、下記一般式(1):
A polyamic acid represented by the following general formula (1):
(式中、R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表わされるリン化合物の存在下、イミド化することによって製造される。イミド化と同時にポリイミド骨格中に一般式(1)で表わされるリン化合物が導入され、リン含有ポリイミドが製造される。
(Wherein R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group, wherein at least one hydrogen atom on each benzene ring of R 1 and R 2 is (It may be substituted with an alkyl group having 1 to 6 carbon atoms or an alkoxyl group, and / or one of carbon atoms on each benzene ring of R 1 and R 2 may be connected to each other by a single bond)
In the presence of a phosphorus compound represented by Simultaneously with the imidization, the phosphorus compound represented by the general formula (1) is introduced into the polyimide skeleton to produce a phosphorus-containing polyimide.
一般式(1)で表わされるリン化合物としては、R1及びR2が、共にフェニル基である(ここで、ベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基又はアルコキシル基で置換されていてもよい)ものが好ましく、その具体例としては、下記式(1a): In the phosphorus compound represented by the general formula (1), R 1 and R 2 are both phenyl groups (wherein at least one of the hydrogen atoms on the benzene ring is an alkyl group or alkoxyl having 1 to 6 carbon atoms) (Which may be substituted with a group) is preferred, and specific examples thereof include the following formula (1a):
同様に、一般式(1)で表わされるリン化合物としては、R1とR2の一方がフェニル基であり、他方がフェノキシ基であって、それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれている(ここで、ベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基又はアルコキシル基で置換されていてもよい)ものが好ましく、具体例としては、下記式(1b): Similarly, as the phosphorus compound represented by the general formula (1), one of R 1 and R 2 is a phenyl group, the other is a phenoxy group, and one of the carbon atoms on each benzene ring is bonded to each other. Those bonded by a single bond (wherein at least one hydrogen atom on the benzene ring may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms) are preferred, and specific examples include: The following formula (1b):
一般式(1)で表わされるリン化合物の使用量は、使用するベンゾフェノンテトラカルボン酸二無水物のモル数の0.5~数倍のモル数であり、好ましくは0.8~4.0倍モルである。 The amount of the phosphorus compound represented by the general formula (1) is 0.5 to several times the number of moles of the benzophenonetetracarboxylic dianhydride used, preferably 0.8 to 4.0 times. Is a mole.
一般式(1)で表わされるリン化合物の存在下、上記のようにして得られるポリアミド酸をイミド化することによって、リン含有ポリイミドを製造することができる。例えば、上記のようにして得られるポリアミド酸の溶液に、一般式(1)で表わされるリン化合物を添加した後、イミド化を実施してもよい。あるいは、あらかじめ一般式(1)で表わされるリン化合物を添加した溶媒中で、ベンゾフェノンテトラカルボン酸二無水物及びジアミン成分から上記のようにポリアミド酸を製造し、続いてイミド化を実施してもよい。 A phosphorus-containing polyimide can be produced by imidizing the polyamic acid obtained as described above in the presence of the phosphorus compound represented by the general formula (1). For example, imidation may be carried out after adding the phosphorus compound represented by the general formula (1) to the polyamic acid solution obtained as described above. Alternatively, a polyamic acid may be produced as described above from benzophenone tetracarboxylic dianhydride and a diamine component in a solvent to which a phosphorus compound represented by the general formula (1) has been added in advance, followed by imidization. Good.
一般式(1)で表わされるリン化合物は、ポリアミド酸の溶液又は反応溶媒に直接加えてもよいが、反応に不活性な溶媒、例えば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、ジメチルスルホキシド、テトラメチルウレア、テトラヒドロフラン、トルエン、キシレン、エチルベンゼン、アニソール、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼン、ジグリム、トリグリム等の溶媒に5~90重量%、好ましくは10~80重量%の溶質濃度で溶解させた後、加えてもよい。 The phosphorus compound represented by the general formula (1) may be directly added to the polyamic acid solution or the reaction solvent, but is inert to the reaction, for example, N, N-dimethylformamide, N, N-dimethylacetamide, 5 to 90% by weight in a solvent such as N-methyl-2-pyrrolidone, dimethyl sulfoxide, tetramethylurea, tetrahydrofuran, toluene, xylene, ethylbenzene, anisole, chlorobenzene, dichlorobenzene, trichlorobenzene, diglyme and triglyme, preferably 10 to It may be added after dissolving at a solute concentration of 80% by weight.
続いて、このポリアミド酸及びリン化合物の混合溶液を、ガラス板、銅、アルミ、又はステンレス等の金属箔、あるいはポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリフェニレンサルファイド(PPS)、ポリイミド、シリコン樹脂、又はフッ素樹脂等の樹脂フィルムなどの基材上に、乾燥後の厚みが0.1~250μm、より好ましくは1.0~100μmになるように塗布し、40~500℃、より好ましくは70~350℃で1分~5時間、より好ましくは3分~3時間乾燥させることによって、リン含有ポリイミドを得ることができる。得られたリン含有ポリイミドは、基材から剥がしてフィルム形態として、又はそのまま積層体として使用することができる。 Subsequently, the mixed solution of the polyamic acid and the phosphorus compound is a glass plate, a metal foil such as copper, aluminum, or stainless steel, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyimide, It is applied on a substrate such as a resin film such as a silicon resin or a fluororesin so that the thickness after drying is 0.1 to 250 μm, more preferably 1.0 to 100 μm, and more preferably 40 to 500 ° C. The phosphorus-containing polyimide can be obtained by drying at 70 to 350 ° C. for 1 minute to 5 hours, more preferably 3 minutes to 3 hours. The obtained phosphorus-containing polyimide can be peeled off from the substrate and used as a film form or as it is as a laminate.
また、このポリアミド酸及びリン化合物の混合溶液に、トルエン、キシレン、エチルベンゼン、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼンのような水と共沸する溶媒を加え、100~300℃、より好ましくは150~250℃で加熱を行い、イミド化に伴い発生する水を系外に排出し熱イミド化を行うことにより、リン含有ポリイミドを得ることもできる。この時、ピリジン、ピコリン、イミダゾールのような含窒素複素環化合物やトリエチルアミンのようなトリ低級アルキルアミンなどを用いてもよい。あるいは、無水酢酸、トリフルオロ無水酢酸、N,N-ジシクロヘキシルカルボジイミドのような脱水剤とピリジン、ピコリン、イミダゾールのような含窒素複素環化合物やトリエチルアミンのようなトリ低級アルキルアミンなどとを加え、0~200℃で1~24時間脱水することによって化学イミド化を行うことにより、リン含有ポリイミドを得ることもできる。上記のように熱的あるいは化学的にイミド化が終了した溶液を、水、メタノール、エタノール、イソプロパノール、アセトン、トルエン、キシレンのような単独溶媒あるいはこれらの混合溶液に注入し、結晶を析出させ濾別し、乾燥、粉砕して粉状の形態として得ることが出来る。得られたリン含有ポリイミドは、そのまま射出成型や圧縮成型に用いることができる。また別途、溶媒に溶解させ、ワニスとして使用することもでき、それを前述の基材上に塗布し、乾燥させフィルム形態として得ることもできる。 Further, a solvent that azeotropes with water, such as toluene, xylene, ethylbenzene, chlorobenzene, dichlorobenzene, and trichlorobenzene, is added to the mixed solution of the polyamic acid and the phosphorus compound, and 100 to 300 ° C, more preferably 150 to 250 ° C. It is possible to obtain phosphorus-containing polyimide by heating with, discharging water generated by imidization out of the system and performing thermal imidization. At this time, a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole, or a tri-lower alkylamine such as triethylamine may be used. Alternatively, a dehydrating agent such as acetic anhydride, trifluoroacetic anhydride, N, N-dicyclohexylcarbodiimide and a nitrogen-containing heterocyclic compound such as pyridine, picoline or imidazole or a tri-lower alkylamine such as triethylamine are added. Phosphorus-containing polyimide can also be obtained by performing chemical imidation by dehydrating at ˜200 ° C. for 1 to 24 hours. The solution that has been imidized thermally or chemically as described above is poured into a single solvent such as water, methanol, ethanol, isopropanol, acetone, toluene, xylene or a mixed solution thereof to precipitate crystals and filter. Separately, it can be dried and pulverized to obtain a powder form. The obtained phosphorus-containing polyimide can be used for injection molding or compression molding as it is. Separately, it can be dissolved in a solvent and used as a varnish, or it can be applied on the aforementioned substrate and dried to obtain a film form.
IV.各種積層体、電子回路
本発明の金属積層体は、例えば、上記「II.リン含有ポリイミド及びその製造方法」の項の記載に従い製造したリン含有ポリアミド酸溶液を、厚みが0.5~400μm、より好ましくは1.0~200μmの銅、アルミ、又はステンレス等の金属箔の少なくとも片面上に、乾燥後の厚みが0.1~250μm、より好ましくは1.0~100μmになるように塗布し、40~500℃、より好ましくは70~350℃で1分~5時間、より好ましくは3分~3時間乾燥させることによって製造することができる。
IV. Various laminates and electronic circuits The metal laminate of the present invention is prepared by, for example, using a phosphorus-containing polyamic acid solution produced according to the description in the above section “II. Phosphorus-containing polyimide and its production method”, having a thickness of 0.5 to 400 μm, More preferably, it is applied to at least one surface of a metal foil such as copper, aluminum or stainless steel having a thickness of 1.0 to 200 μm so that the thickness after drying is 0.1 to 250 μm, more preferably 1.0 to 100 μm. , 40 to 500 ° C., more preferably 70 to 350 ° C., for 1 minute to 5 hours, more preferably 3 minutes to 3 hours.
あるいは、上記「II.リン含有ポリイミド及びその製造方法」又は「III.リン含有ポリイミドの製造方法」の項の記載に従い得られたリン含有ポリイミドフィルムの少なくとも片面に、エポキシ樹脂系、アクリル樹脂系、ポリイミド樹脂系などの接着剤を介して、厚みが0.5~400μm、より好ましくは1.0~200μmの銅、アルミ、又はステンレス等の金属箔と積層し、常圧あるいはプレス条件下で100~500℃、好ましくは150~350℃で処理することによって製造することができる。 Alternatively, on at least one side of the phosphorus-containing polyimide film obtained according to the description in the section of “II. Phosphorus-containing polyimide and production method thereof” or “III. Production method of phosphorus-containing polyimide”, an epoxy resin system, an acrylic resin system, It is laminated with a metal foil such as copper, aluminum, or stainless steel having a thickness of 0.5 to 400 μm, more preferably 1.0 to 200 μm through an adhesive such as a polyimide resin, and the layer is 100 under normal pressure or pressing conditions. It can be produced by processing at a temperature of ˜500 ° C., preferably 150 ° C. to 350 ° C.
本発明の芳香族ポリマー積層体は、例えば、上記「II.リン含有ポリイミド及びその製造方法」の項の記載に従い製造したリン含有ポリアミド酸溶液を、厚みが0.5~400μm、より好ましくは1.0~200μmの芳香族ポリエステル、ポリフェニレンサルファイド、芳香族ポリイミド、ポリアリールエーテルケトン、芳香族ポリカーボネート、芳香族液晶ポリマー、又はポリベンゾオキサゾール等の芳香族ポリマー上に、乾燥後の厚みが0.1~250μm、より好ましくは1.0~100μmになるように塗布し、40~500℃、より好ましくは70~350℃で1分~5時間、より好ましくは3分~3時間乾燥させることによって製造することができる。 The aromatic polymer laminate of the present invention has a thickness of 0.5 to 400 μm, more preferably 1 with a phosphorus-containing polyamic acid solution manufactured according to the description in the section “II. A thickness after drying of 0.1 to 200 μm on an aromatic polymer such as aromatic polyester, polyphenylene sulfide, aromatic polyimide, polyaryl ether ketone, aromatic polycarbonate, aromatic liquid crystal polymer, or polybenzoxazole is 0.1. It is manufactured by coating to a thickness of ˜250 μm, more preferably 1.0 to 100 μm, and drying at 40 to 500 ° C., more preferably 70 to 350 ° C. for 1 minute to 5 hours, more preferably 3 minutes to 3 hours. can do.
また、厚みが0.5~400μm、より好ましくは1.0~200μmの芳香族ポリエステル、ポリフェニレンサルファイド、芳香族ポリイミド、ポリアリールエーテルケトン、芳香族ポリカーボネート、芳香族液晶ポリマー、又はポリベンゾオキサゾール等の芳香族ポリマー、あるいは厚みが0.5~400μm、より好ましくは1.0~200μmの銅、アルミ、又はステンレス等の金属箔のいずれか一方の片面に、例えば、上記「II.リン含有ポリイミド及びその製造方法」の項の記載に従い製造したリン含有ポリアミド酸溶液を塗布し、他方を塗布面に重ねた後、ラミネート又は熱プレスすることによって、本発明のリン含有ポリイミドを介した芳香族ポリマー金属複合積層体を製造することができる。 Also, an aromatic polyester, polyphenylene sulfide, aromatic polyimide, polyaryletherketone, aromatic polycarbonate, aromatic liquid crystal polymer, or polybenzoxazole having a thickness of 0.5 to 400 μm, more preferably 1.0 to 200 μm, etc. On one side of an aromatic polymer or a metal foil such as copper, aluminum, or stainless steel having a thickness of 0.5 to 400 μm, more preferably 1.0 to 200 μm, for example, the above-mentioned “II. Phosphorus-containing polyimide and The phosphorus-containing polyamic acid solution produced in accordance with the description of the “Production method” is applied, the other is overlaid on the coated surface, and then laminated or hot pressed, whereby the aromatic polymer metal via the phosphorus-containing polyimide of the present invention is used. A composite laminate can be produced.
上記のようにして製造した金属積層体及び芳香族ポリマー金属複合積層体に、公知の方法で回路パターンを作成し、電子回路として使用することができる。本発明のリン含有ポリイミドを用いて作成した電子回路は、優れた難燃性を有し、よって安全な電気・電子機器を提供することができる。 A circuit pattern can be prepared by a known method on the metal laminate and aromatic polymer metal composite laminate produced as described above and used as an electronic circuit. The electronic circuit created using the phosphorus-containing polyimide of the present invention has excellent flame retardancy, and thus can provide a safe electrical / electronic device.
以下に本発明の様態を明らかにするために、実施例と比較例とを示すが、本発明はここに示す実施例のみに限定されるわけではない。 In order to clarify aspects of the present invention, examples and comparative examples are shown below, but the present invention is not limited to the examples shown here.
実施例で得られた化合物の溶液粘度、純度、融点又はガラス転移温度、NMR及び赤外線吸収スペクトルの測定方法、並びに難燃性評価の方法は以下の通りである。 The solution viscosity, purity, melting point or glass transition temperature, NMR and infrared absorption spectrum measurement methods, and flame retardancy evaluation methods of the compounds obtained in the examples are as follows.
溶液粘度:B型粘度計(東京計器製)を用いて、25℃の温度で測定した。 Solution viscosity: Measured at a temperature of 25 ° C. using a B-type viscometer (manufactured by Tokyo Keiki).
純度:HPLC(島津製作所製)及びカラム(東ソー社製 TSKgel ODS-80TM)を用いて測定を行った。サンプル溶液は、アセトニトリル/水の混合液に試料を溶解もしくは分散させた後、溶液を60℃で15分間加熱することで調製した。溶離液は、アセトニトリル/水/リン酸系を用い、純度は面積百分率により算出した。 Purity: Measurement was performed using HPLC (manufactured by Shimadzu Corporation) and column (manufactured by Tosoh Corp. TSKgel ODS-80TM). The sample solution was prepared by dissolving or dispersing the sample in an acetonitrile / water mixture and then heating the solution at 60 ° C. for 15 minutes. The eluent used was an acetonitrile / water / phosphoric acid system, and the purity was calculated by area percentage.
融点又はガラス転移温度:示差走査熱量計(島津製作所製 DSC-60)にて、毎分10℃で40~400℃まで昇温し、測定を行った。解析ソフトによりDSCDSC曲線の外挿点から融点又はガラス転移温度を算出した。 Melting point or glass transition temperature: Measurement was carried out with a differential scanning calorimeter (manufactured by Shimadzu Corp. DSC-60) at a temperature of 10 ° C. per minute up to 40-400 ° C. The melting point or glass transition temperature was calculated from the extrapolation point of the DSCDSC curve by analysis software.
NMR:化合物と重DMSO(Cambrige Isotope Laboratories, Inc.製 DMSO-d6 0.05%TMS含有)とを混合した溶液を調製し、NMR(日本電子社製 JNM-AL400)にて、1H-NMR測定及び13C-NMR測定を行った。 NMR: A solution in which a compound and heavy DMSO (containing DMSO-d 6 0.05% TMS manufactured by Cambrige Isotope Laboratories, Inc.) were mixed was prepared, and 1 H-NMR measurement was performed using NMR (JNM-AL400 manufactured by JEOL Ltd.). And 13 C-NMR measurement was performed.
赤外線吸収スペクトル:IR測定装置(パーキンエルマー社製Spectrum 100 FT-IR Spectrometer)を用い、KBr法にて;あるいはIR測定装置(島津製作所製Prestage 21)を用い、ATR法にて赤外吸収スペクトルを測定した。
Infrared absorption spectrum: IR measurement device (
難燃性の評価:フィルムを200mm×50mmの大きさに切り、試験片とした。試験片を円筒状に巻き、クランプに垂直に固定し、サンプル下部にバーナーで3秒間接炎を2回行い、燃焼時間が10秒以内のものを○、10秒以上のものを×とした。 Evaluation of flame retardancy: The film was cut into a size of 200 mm × 50 mm to obtain a test piece. The test piece was wound in a cylindrical shape, fixed vertically to the clamp, and subjected to indirect flame twice for 3 seconds with a burner at the bottom of the sample.
実施例1
一般式(I)(R 1 及びR 2 が共にフェニル基である)で表わされるリン含有テトラカルボン酸二無水物の合成
攪拌機、温度計、窒素導入管及び冷却管を備えた四つ口フラスコに、ジフェニルホスフィンオキシド(アルドリッチ)2.8g(0.014mol)、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物(ダイセル化学社製)3.5g(0.011mol)及びトルエン25gを仕込み、窒素気流下、110℃で4時間攪拌した。反応終了後トルエンを全量留去し、80℃まで冷却した後、アセトニトリル10gを添加した。室温まで冷却後、析出した固体を濾別し、トルエン及びアセトニトリルで洗浄した。得られた固体を60℃で一晩乾燥することで、粗精製物2.8gを純度94.2%で得た。この粗精製物をアセトニトリルで加熱洗浄することで、精製物を純度97.5%、融点151℃で得た。精製物の1H-NMRを図1に、13C-NMRを図2に、FT-IRチャート(パーキンエルマー社製Spectrum 100 FT-IR Spectrometerによる、KBr法)を図3に示す。
Example 1
Synthesis of a phosphorus-containing tetracarboxylic dianhydride represented by the general formula (I) ( both R 1 and R 2 are phenyl groups) in a four-necked flask equipped with a stirrer, thermometer, nitrogen introduction tube and cooling tube 2.8 g (0.014 mol) of diphenylphosphine oxide (Aldrich), 3.5 g (0.011 mol) of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride (manufactured by Daicel Chemical Industries) and 25 g of toluene And stirred at 110 ° C. for 4 hours under a nitrogen stream. After completion of the reaction, all the toluene was distilled off, and after cooling to 80 ° C., 10 g of acetonitrile was added. After cooling to room temperature, the precipitated solid was filtered off and washed with toluene and acetonitrile. The obtained solid was dried at 60 ° C. overnight to obtain 2.8 g of a crude product with a purity of 94.2%. This crude product was heated and washed with acetonitrile to obtain a purified product having a purity of 97.5% and a melting point of 151 ° C. FIG. 1 shows the 1 H-NMR of the purified product, FIG. 2 shows the 13 C-NMR, and FIG. 3 shows the FT-IR chart (KBr
1H-NMR(400MHz,DMSO-d6):δ(ppm)=7.08(d,J=10Hz,1H),7.48(ddd,J=7.6,7.6,3.6Hz,4H),7.59(ddd,J=7.6,7.6,1.2Hz,2H),7.76(ddd,J=12.4,7.5,1.2Hz,4H),8.06(d,J=8.0Hz,2H),8.23(dd,J=8.0,1.2Hz,2H),8.29(s,2H).
13C-NMR(400MHz,DMSO-d6):δ(ppm)=75.0(d,J=16.4Hz),123.1,125.8,128.7(d,J=52.8Hz),130.7(d,J=537.6Hz),131.0,131.2(d,J=39.6Hz),131.9,132.5(d,J=13.2Hz),133.9,148.3(d,J=16.8Hz),162.5,162.6.
1 H-NMR (400 MHz, DMSO-d 6 ): δ (ppm) = 7.08 (d, J = 10 Hz, 1H), 7.48 (ddd, J = 7.6, 7.6, 3.6 Hz) , 4H), 7.59 (ddd, J = 7.6, 7.6, 1.2 Hz, 2H), 7.76 (ddd, J = 12.4, 7.5, 1.2 Hz, 4H), 8.06 (d, J = 8.0 Hz, 2H), 8.23 (dd, J = 8.0, 1.2 Hz, 2H), 8.29 (s, 2H).
13 C-NMR (400 MHz, DMSO-d 6 ): δ (ppm) = 75.0 (d, J = 16.4 Hz), 123.1, 125.8, 128.7 (d, J = 52.8 Hz) ), 130.7 (d, J = 537.6 Hz), 131.0, 131.2 (d, J = 39.6 Hz), 131.9, 132.5 (d, J = 13.2 Hz), 133 .9, 148.3 (d, J = 16.8 Hz), 162.5, 162.6.
実施例2
一般式(II)(R 1 及びR 2 が共にフェニル基であり、R 3 がジフェニルエーテル-4,4’-ジイルである)で表わされるリン含有ポリイミドの合成
温度計、窒素導入管を備えた四つ口フラスコに、4,4’-ジアミノジフェニルエーテル(和歌山精化社製)10.0118g(0.05mol)、実施例1で合成したリン含有テトラカルボン酸二無水物26.2207g(0.05mol)、NMP205gを仕込み、窒素気流下、室温で12時間撹拌を行い、リン含有ポリアミド酸を合成した。反応溶液(溶質濃度15%、粘度(B型粘度計:東京計器製)5,500mPa・s)をそのまま、リン含有ポリアミド酸溶液として使用した。得られたリン含有ポリアミド酸溶液をガラス板上に、乾燥後の厚みが25μmになるように塗布を行い、90℃、130℃、180℃各温度30分間乾燥を行ったのち、ガラス板から剥がし金属枠に固定して200℃、250℃各温度1時間熱処理を行った。厚み25μmのフィルム形態のリン含有ポリイミドを得た。
Example 2
Synthesis thermometer of phosphorus-containing polyimide represented by the general formula (II) (R 1 and R 2 are both phenyl groups and R 3 is diphenyl ether-4,4′-diyl), In a one-necked flask, 10.118 g (0.05 mol) of 4,4′-diaminodiphenyl ether (manufactured by Wakayama Seika Co., Ltd.), 26.2207 g (0.05 mol) of the phosphorus-containing tetracarboxylic dianhydride synthesized in Example 1 were used. Then, 205 g of NMP was charged and stirred at room temperature for 12 hours under a nitrogen stream to synthesize phosphorus-containing polyamic acid. The reaction solution (solute concentration 15%, viscosity (B-type viscometer: manufactured by Tokyo Keiki) 5,500 mPa · s) was used as it was as a phosphorus-containing polyamic acid solution. The obtained phosphorus-containing polyamic acid solution is coated on a glass plate so that the thickness after drying is 25 μm, dried at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, and then peeled off from the glass plate. It fixed to the metal frame and heat-processed at 200 degreeC and 250 degreeC each temperature for 1 hour. A phosphorus-containing polyimide in the form of a film having a thickness of 25 μm was obtained.
実施例3
一般式(II)(R 1 及びR 2 が共にフェニル基であり、R 3 が1,4-フェニレンオキシ-ビフェニル-4,4’-ジイルオキシ-1,4-フェニレンである)で表わされるリン含有ポリイミドの合成
温度計、窒素導入管を備えた四つ口フラスコに、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物8.5602g(0.027mol)、ジフェニルホスフィンオキシド(DPO)5.3713g(0.027mol)、ジグリム47.4gを仕込み、160℃で3時間加熱を行い、リン含有テトラカルボン酸二無水物を合成した。この酸二無水物を含む溶液を室温まで冷却し、4,4’-ビス(4-アミノフェノキシ)ビフェニル(BAPB)9.7876g(0.027mol)、NMP47.4gを仕込み、窒素気流下、室温で12時間撹拌を行い、リン含有ポリアミド酸を合成した。反応溶液(溶質濃度20%、粘度(B型粘度計:東京計器製)8,000mPa・s)をそのまま、リン含有ポリアミド酸溶液として使用した。実施例2と同様にガラス板への塗布、乾燥及び熱処理を行い、厚み20μmのフィルム形態のリン含有ポリイミドを得た。
Example 3
Phosphorus-containing compounds represented by the general formula (II) (R 1 and R 2 are both phenyl groups, and R 3 is 1,4-phenyleneoxy-biphenyl-4,4′-diyloxy-1,4-phenylene) In a four-necked flask equipped with a polyimide thermometer and a nitrogen inlet tube, 8.5602 g (0.027 mol) of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, diphenylphosphine oxide (DPO) 5.313 g (0.027 mol) and 47.4 g of diglyme were charged and heated at 160 ° C. for 3 hours to synthesize phosphorus-containing tetracarboxylic dianhydride. The solution containing the acid dianhydride was cooled to room temperature, charged with 9.7766 g (0.027 mol) of 4,4′-bis (4-aminophenoxy) biphenyl (BAPB) and 47.4 g of NMP, and under a nitrogen stream at room temperature. The mixture was stirred for 12 hours to synthesize phosphorus-containing polyamic acid. The reaction solution (solute concentration 20%, viscosity (B-type viscometer: manufactured by Tokyo Keiki Co., Ltd., 8,000 mPa · s)) was directly used as a phosphorus-containing polyamic acid solution. Application to a glass plate, drying and heat treatment were carried out in the same manner as in Example 2 to obtain a phosphorus-containing polyimide in the form of a film having a thickness of 20 μm.
比較例1
温度計、窒素導入管を備えた四つ口フラスコに、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物16.1113g(0.05mol)、4,4’-ジアミノジフェニルエーテル10.0118g(0.05mol)、NMP148gを仕込み、窒素気流下、室温で12時間撹拌を行い、リン含有ポリアミド酸を合成した。反応溶液(溶質濃度15%、粘度(B型粘度計:東京計器製)12,000mPa・s)をそのまま、ポリアミド酸溶液として使用した。実施例2と同様にガラス板への塗布、乾燥及び熱処理を行い、厚み20μmのフィルム形態のリンを含有しないポリイミドを得た。
Comparative Example 1
In a four-necked flask equipped with a thermometer and a nitrogen inlet tube, 16.1113 g (0.05 mol) of 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride and 4,4′-diaminodiphenyl ether were used. 0118 g (0.05 mol) and 148 g of NMP were charged and stirred at room temperature for 12 hours under a nitrogen stream to synthesize phosphorus-containing polyamic acid. The reaction solution (solute concentration 15%, viscosity (B-type viscometer: manufactured by Tokyo Keiki) 12,000 mPa · s) was used as it was as the polyamic acid solution. Application to a glass plate, drying and heat treatment were carried out in the same manner as in Example 2 to obtain a polyimide containing no phosphorus in the form of a film having a thickness of 20 μm.
比較例2
ジアミン化合物を4,4’-ビス(4-アミノフェノキシ)ビフェニル(BAPB)18.4214g(0.05mol)に変更する以外は比較例1と同様の操作を行い、厚み20μmのフィルム形態のリンを含有しないポリイミドを得た。
Comparative Example 2
Except for changing the diamine compound to 4,4′-bis (4-aminophenoxy) biphenyl (BAPB) 18.4214 g (0.05 mol), the same operation as in Comparative Example 1 was performed, and phosphorus in the form of a film having a thickness of 20 μm was obtained. The polyimide which does not contain was obtained.
難燃性評価
実施例2及び3、並びに比較例1及び2で得られたポリイミドの評価を行った。結果を表1に示す。
Evaluation of flame retardancy The polyimides obtained in Examples 2 and 3 and Comparative Examples 1 and 2 were evaluated. The results are shown in Table 1.
実施例4
金属積層体の製造
実施例2で製造したリン含有ポリアミド酸溶液を、厚み18μmの銅箔(三井金属(株)製、3EC-VLP)上に、乾燥後の樹脂の厚みが25μmになるように塗布を行い、90℃、130℃、180℃各温度30分間乾燥を行ったのち、真空乾燥機中で250℃、1時間の熱処理を行い、リン含有ポリイミド/金属積層体を得た。
Example 4
Production of Metal Laminate The phosphorus-containing polyamic acid solution produced in Example 2 was placed on a 18 μm thick copper foil (manufactured by Mitsui Kinzoku Co., Ltd., 3EC-VLP) so that the resin thickness after drying would be 25 μm. After applying and drying at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, heat treatment was performed at 250 ° C. for 1 hour in a vacuum dryer to obtain a phosphorus-containing polyimide / metal laminate.
実施例5
芳香族ポリマー積層体の製造
実施例2で製造したリン含有ポリアミド酸溶液を、厚み25μmの芳香族ポリイミドフィルム(デュポン(株)製、カプトン(登録商標)H)上に、乾燥後の樹脂の厚みが25μmになるように塗布を行い、90℃、130℃、180℃各温度30分間乾燥を行ったのち、乾燥機中で250℃、1時間の熱処理を行い、リン含有ポリイミド/芳香族ポリマー積層体を得た。
Example 5
Production of Aromatic Polymer Laminate The phosphorus-containing polyamic acid solution produced in Example 2 was dried on a 25 μm thick aromatic polyimide film (manufactured by DuPont, Kapton (registered trademark) H). Is applied at a temperature of 90 ° C, 130 ° C, 180 ° C for 30 minutes, and then heat-treated at 250 ° C for 1 hour in a dryer to form a phosphorus-containing polyimide / aromatic polymer laminate. Got the body.
実施例6
芳香族ポリマー金属複合積層体の製造
実施例2で製造したリン含有ポリアミド酸溶液を、厚み18μmの銅箔(三井金属(株)製、3EC-VLP)上に、乾燥後の樹脂の厚みが5μmになるように塗布を行い、160℃の温度で3分間乾燥を行った。次いで、塗布面に厚み40μmの芳香族ポリイミドフィルム(デュポン(株)製、カプトン(登録商標)EN)を重ね、200℃の温度でラミネートを行った。得られた積層体を350℃の温度で熱処理を行い、金属/リン含有ポリイミド/芳香族ポリマー複合積層体を得た。
Example 6
Production of aromatic polymer metal composite laminate The phosphorus-containing polyamic acid solution produced in Example 2 was dried on a copper foil having a thickness of 18 μm (manufactured by Mitsui Kinzoku Co., Ltd., 3EC-VLP) with a resin thickness after drying of 5 μm. Then, the coating was performed and dried at a temperature of 160 ° C. for 3 minutes. Next, an aromatic polyimide film having a thickness of 40 μm (manufactured by DuPont, Kapton (registered trademark) EN) was stacked on the coated surface, and lamination was performed at a temperature of 200 ° C. The obtained laminate was heat-treated at a temperature of 350 ° C. to obtain a metal / phosphorus-containing polyimide / aromatic polymer composite laminate.
実施例7
リン含有ポリイミドの合成(本発明の第四の態様による製造方法)
温度計、窒素導入管を備えた四つ口フラスコに、窒素気流中、4,4’-ジアミノジフェニルエーテル(4-ODA)(和歌山精化社製)10.0118g(0.05mol)、9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキシド(HCA(登録商標))(三光株式会社製)10.8086g(0.05mol)、N-メチル-2-ピロリドン(NMP)148.0gを仕込み、溶解させた。その後3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物(BTDA)(ダイセル化学社製)16.1113g(0.05mol)を仕込み、室温で12時間撹拌を行い、溶液粘度5,000mPa・s、溶質濃度20%のポリアミド酸とリン化合物との混合溶液を得た。得られた混合溶液をガラス板上に、乾燥後の厚みが20μmになるように塗布を行い、90℃、130℃、180℃各温度30分間乾燥を行ったのち、ガラス板から剥がし金属枠に固定して200℃、250℃各温度1時間熱処理を行い、繰り返し単位内にリン原子を4.4%(理論値)含有するポリイミドフィルムを得た。ポリイミドフィルムのIR(島津製作所製Prestage 21による、ATR法)を測定すると、1670cm-1のベンゾフェノンのカルボニル伸縮振動の吸収は消失していた。フィルムのガラス転移温度は255℃、難燃性評価は○であった。
Example 7
Synthesis of phosphorus-containing polyimide (production method according to the fourth aspect of the present invention)
In a four-necked flask equipped with a thermometer and a nitrogen introduction tube, in a nitrogen stream, 4,4′-diaminodiphenyl ether (4-ODA) (manufactured by Wakayama Seika Co., Ltd.) 10.118 g (0.05 mol), 9,10 -Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (HCA (registered trademark)) (manufactured by Sanko Co., Ltd.) 10.8086 g (0.05 mol), N-methyl-2-pyrrolidone (NMP) 148. 0 g was charged and dissolved. Then, 3,113 ′, 4,4′-benzophenonetetracarboxylic dianhydride (BTDA) (manufactured by Daicel Chemical) was charged with 16.11313 g (0.05 mol), stirred at room temperature for 12 hours, A mixed solution of polyamic acid and a phosphorus compound having a 000 mPa · s and a solute concentration of 20% was obtained. The obtained mixed solution is coated on a glass plate so that the thickness after drying is 20 μm, dried at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, and then peeled off from the glass plate to form a metal frame. After fixing, heat treatment was performed at 200 ° C. and 250 ° C. for 1 hour to obtain a polyimide film containing 4.4% (theoretical value) of phosphorus atoms in the repeating unit. When the IR of the polyimide film (ATR method by Prestage 21 manufactured by Shimadzu Corporation) was measured, the absorption of the carbonyl stretching vibration of benzophenone at 1670 cm −1 disappeared. The glass transition temperature of the film was 255 ° C., and the flame retardancy evaluation was ○.
比較例3
温度計、窒素導入管を備えた四つ口フラスコに、窒素気流中、4,4’-ジアミノジフェニルエーテル(4-ODA)(和歌山精化社製)10.0118g(0.05mol)、N-メチル-2-ピロリドン(NMP)148.0gを仕込み、溶解させた。その後3,3’,4,4’-ビフェニルテトラカルボン酸二無水物(BTDA)(ダイセル化学社製)16.1113g(0.05mol)を仕込み、室温で12時間撹拌を行い、溶液粘度12,500mPa・s、溶質濃度15%のポリアミド酸溶液を得た。得られたポリアミド酸溶液をガラス板上に、乾燥後の厚みが20μmになるように塗布を行い、90℃、130℃、180℃各温度30分間乾燥を行ったのち、ガラス板から剥がし金属枠に固定して200℃、250℃各温度1時間熱処理を行い、リンを含有しないポリイミドフィルムを得た。フィルムのガラス転移温度は263℃、難燃性評価は×であった。
Comparative Example 3
In a four-necked flask equipped with a thermometer and a nitrogen inlet tube, in a nitrogen stream, 4,4′-diaminodiphenyl ether (4-ODA) (manufactured by Wakayama Seika Co., Ltd.), 10.118 g (0.05 mol), N-methyl 148.0 g of -2-pyrrolidone (NMP) was charged and dissolved. Subsequently, 3,113 ′, 4,4′-biphenyltetracarboxylic dianhydride (BTDA) (manufactured by Daicel Chemical) was charged with 16.113 g (0.05 mol) and stirred at room temperature for 12 hours. A polyamic acid solution having 500 mPa · s and a solute concentration of 15% was obtained. The obtained polyamic acid solution was coated on a glass plate so that the thickness after drying was 20 μm, dried at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, and then peeled off from the glass plate. The polyimide film containing no phosphorus was obtained by heat treatment at 200 ° C. and 250 ° C. for 1 hour. The glass transition temperature of the film was 263 ° C., and the flame retardancy evaluation was x.
比較例4
温度計、窒素導入管を備えた四つ口フラスコに、窒素気流中、4,4’-ジアミノジフェニルエーテル(4-ODA)10.0118g(0.05mol)、9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキシド(HCA(登録商標))(三光株式会社製)21.6172g(0.10mol)、N-メチル-2-ピロリドン(NMP)188.6gを仕込み、溶解させた。その後4,4’-オキシジフタル酸二無水物15.5107g(0.05mol)(マナック株式会社製)を仕込み、室温で12時間撹拌を行い、溶液粘度7,800mPa・s、溶質濃度20%のポリアミド酸溶液とリン化合物との混合物を得た。得られた混合物をガラス板上に、乾燥後の厚みが20μmになるように塗布を行い、90℃、130℃、180℃各温度30分間乾燥を行ったのち、ガラス板から剥がし金属枠に固定して200℃、250℃各温度1時間熱処理を行い、ポリイミドフィルムを得た。ポリイミドフィルムのIR(島津製作所製Prestage 21による、ATR法)を測定すると、リンの存在は認められなかった。フィルムのガラス転移温度は228℃、難燃性評価は×であった。
Comparative Example 4
A four-necked flask equipped with a thermometer and a nitrogen inlet tube was charged with 10.118 g (0.05 mol) of 4,4′-diaminodiphenyl ether (4-ODA), 9,10-dihydro-9-oxa-acid in a nitrogen stream. 21.6172 g (0.10 mol) of 10-phosphaphenanthrene-10-oxide (HCA (registered trademark)) (manufactured by Sanko Co., Ltd.) and 188.6 g of N-methyl-2-pyrrolidone (NMP) were charged and dissolved. . Thereafter, 15.5107 g (0.05 mol) (manac Co., Ltd.) of 4,4′-oxydiphthalic dianhydride was charged and stirred at room temperature for 12 hours to give a polyamide having a solution viscosity of 7,800 mPa · s and a solute concentration of 20%. A mixture of an acid solution and a phosphorus compound was obtained. The obtained mixture is applied onto a glass plate so that the thickness after drying is 20 μm, dried at 90 ° C., 130 ° C., and 180 ° C. for 30 minutes, and then peeled off from the glass plate and fixed to a metal frame. Then, heat treatment was performed at 200 ° C. and 250 ° C. for 1 hour to obtain a polyimide film. When the IR of the polyimide film (ATR method by Prestage 21 manufactured by Shimadzu Corporation) was measured, the presence of phosphorus was not observed. The glass transition temperature of the film was 228 ° C., and the flame retardancy evaluation was x.
実施例8~10、比較例5
実施例7と同様に、各種成分を変更してポリイミドフィルムを作成した。その組成と結果を表2に示す。
Examples 8 to 10, Comparative Example 5
In the same manner as in Example 7, various components were changed to prepare a polyimide film. The composition and results are shown in Table 2.
表中の略号は、以下を示す。
BTDA:3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物
DSDA:3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物
APB:1,3-ビス(3-アミノフェノキシ)ベンゼン
BAPP:2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン
BAPS:ビス[4-(4-アミノフェノキシ)フェニル]スルホン
HCA(登録商標):9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキシド
DPO:ジフェニルホスフィンオキシド(アルドリッチ)
The abbreviations in the table indicate the following.
BTDA: 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride DSDA: 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic dianhydride APB: 1,3-bis (3-amino Phenoxy) benzene BAPP: 2,2-bis [4- (4-aminophenoxy) phenyl] propane BAPS: bis [4- (4-aminophenoxy) phenyl] sulfone HCA®: 9,10-dihydro-9 -Oxa-10-phosphaphenanthrene-10-oxide DPO: Diphenylphosphine oxide (Aldrich)
本発明のリン含有テトラカルボン酸二無水物を用いて製造したリン含有ポリイミドは、従来のポリイミドと同等の物性と共に、優れた難燃特性を示し、薄膜になっても良好な耐熱性を示すので、電気・電子機器等の軽薄短小化のニーズに応えることが可能である。また、本発明の難燃性のリン含有ポリイミドの使用は、更なる難燃剤の添加を回避又は減量することができるため、自然環境や人体により安全性の高い難燃化技術である。 The phosphorus-containing polyimide produced by using the phosphorus-containing tetracarboxylic dianhydride of the present invention exhibits excellent flame resistance and physical properties equivalent to those of conventional polyimide, and also exhibits good heat resistance even when it becomes a thin film. It is possible to meet the needs for light, thin, and small devices such as electrical and electronic equipment. Moreover, since the use of the flame-retardant phosphorus-containing polyimide of the present invention can avoid or reduce the addition of a further flame retardant, it is a flame-retarding technique with higher safety in the natural environment and the human body.
特に本発明の第四の態様で述べたリン含有ポリイミドの製造方法を用いることによって、リン含有ポリイミドを特別な装置、工程を必要とすることなく簡便な方法で製造することができる。この製造方法を用いて製造されたリン含有ポリイミドは、薄膜化及び難燃化が要求される耐熱性接着剤や電子回路基板の絶縁材料等として非常に有用である。 Particularly, by using the method for producing a phosphorus-containing polyimide described in the fourth aspect of the present invention, the phosphorus-containing polyimide can be produced by a simple method without requiring any special equipment or process. The phosphorus-containing polyimide produced by using this production method is very useful as a heat-resistant adhesive, an insulating material for an electronic circuit board, and the like that are required to be thinned and flame-retardant.
Claims (14)
R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、
ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよく、
R3は、2価の有機基である)
で表される繰り返し単位を有する、リン含有ポリイミド。 The following general formula (II):
R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group,
Here, at least one hydrogen atom on the benzene ring of each of R 1 and R 2 may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms, and / or benzene of each of R 1 and R 2 One of the carbon atoms on the ring may be connected to each other by a single bond,
R 3 is a divalent organic group)
The phosphorus containing polyimide which has a repeating unit represented by these.
R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、
ここで、R1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表されるリン含有テトラカルボン酸二無水物。 The following general formula (I):
R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group,
Here, at least one hydrogen atom on the benzene ring of each of R 1 and R 2 may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms, and / or each of R 1 and R 2 (One of the carbon atoms on the benzene ring may be connected to each other by a single bond)
The phosphorus containing tetracarboxylic dianhydride represented by these.
からなる群より選ばれる、請求項3又は4記載のリン含有テトラカルボン酸二無水物。 The following formula (Ia):
The phosphorus-containing tetracarboxylic dianhydride according to claim 3 or 4, which is selected from the group consisting of:
R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、
ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよく、
R3は、2価の有機基である)
で表わされる繰り返し単位を有するリン含有ポリアミド酸を、熱的及び/又は化学的に閉環させることを特徴とする、下記一般式(II):
で表される繰り返し単位を有する、リン含有ポリイミドの製造方法。 The following general formula (III):
R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group,
Here, at least one hydrogen atom on the benzene ring of each of R 1 and R 2 may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms, and / or benzene of each of R 1 and R 2 One of the carbon atoms on the ring may be connected to each other by a single bond,
R 3 is a divalent organic group)
A phosphorus-containing polyamic acid having a repeating unit represented by the following general formula (II):
The manufacturing method of a phosphorus containing polyimide which has a repeating unit represented by these.
で表わされるポリアミド酸を、下記一般式(1):
R1及びR2は、同一であっても異なっていてもよく、フェニル基又はフェノキシ基であり、
ここでR1とR2それぞれのベンゼン環上の水素原子の少なくとも一つが、炭素数1~6のアルキル基若しくはアルコキシル基で置換されていてもよく、及び/又はR1とR2それぞれのベンゼン環上の炭素原子の一つが、互いに単結合で結ばれていてもよい)
で表されるリン化合物の存在下、イミド化することを特徴とする、リン含有ポリイミドの製造方法。 Formula (I ′) below:
A polyamic acid represented by the following general formula (1):
R 1 and R 2 may be the same or different and are a phenyl group or a phenoxy group,
Here, at least one hydrogen atom on the benzene ring of each of R 1 and R 2 may be substituted with an alkyl group or alkoxyl group having 1 to 6 carbon atoms, and / or benzene of each of R 1 and R 2 One of the carbon atoms on the ring may be connected to each other by a single bond)
A method for producing a phosphorus-containing polyimide, wherein imidization is performed in the presence of a phosphorus compound represented by formula (1).
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| Title |
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| KOLESNIKOV ET AL.: "Synthesis of phosphorus- containing polyimide homo- and copolymers", VYSOKOMOLEKULYARNYE SOEDINENIYA, SERIYA B: KRATKIE SOOBSHCHENIYA, vol. 10, no. 10, 1968, pages 781 - 783 * |
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