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WO2010150660A1 - Method for producing vibrating membrane unit - Google Patents

Method for producing vibrating membrane unit Download PDF

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Publication number
WO2010150660A1
WO2010150660A1 PCT/JP2010/059859 JP2010059859W WO2010150660A1 WO 2010150660 A1 WO2010150660 A1 WO 2010150660A1 JP 2010059859 W JP2010059859 W JP 2010059859W WO 2010150660 A1 WO2010150660 A1 WO 2010150660A1
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WO
WIPO (PCT)
Prior art keywords
support member
cylindrical support
end surface
vibrating membrane
tension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2010/059859
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French (fr)
Japanese (ja)
Inventor
誠 藤野
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GLOBAL BUSINESS SOLUTIONS Corp
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GLOBAL BUSINESS SOLUTIONS Corp
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Filing date
Publication date
Application filed by GLOBAL BUSINESS SOLUTIONS Corp filed Critical GLOBAL BUSINESS SOLUTIONS Corp
Publication of WO2010150660A1 publication Critical patent/WO2010150660A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/005Electrostatic transducers using semiconductor materials
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor

Definitions

  • the present invention provides a cylindrical support member made of resin having an opening in at least one side in the axial direction, and an opening peripheral portion of a first end face that is an end surface on the one side in the axial direction of the cylindrical support member. It belongs to the technical field regarding the manufacturing method of the diaphragm unit used for the microphone provided with the diaphragm fixed so as to cover the opening.
  • a tension is applied to a diaphragm used for a microphone so that a change in sound pressure can be faithfully converted into an electric signal.
  • a method of applying tension to the vibration membrane in this way a method of fixing the vibration membrane to the opening peripheral portion of the opening end surface of the cylindrical support member by bonding or the like while pulling the outer peripheral portion of the vibration membrane radially outward.
  • Patent Document 1 in a condenser microphone unit having a diaphragm and a fixed pole that is disposed opposite to the diaphragm and forms a capacitor with the diaphragm, the diaphragm is fixed to the support ring by bonding. Later, when a protrusion is thermoformed on the surface of the diaphragm opposite to the support ring, the diaphragm is installed in the case, and when the fixed pole is installed on the diaphragm, the protrusion is fixed to the diaphragm. It is disclosed that a tension is applied to the diaphragm while maintaining a distance from the pole.
  • Patent Document 2 a ring member in which a screw part is formed on an inner peripheral surface and a vibration film is fixed to an opening end is screwed to a housing member in which a screw part is formed on an outer peripheral part. It is disclosed that the membrane support portion abuts on the vibrating membrane and applies tension to the vibrating membrane.
  • Patent Document 3 includes a magnetically permeable or conductive diaphragm that vibrates in response to an acoustic signal, an LC oscillation circuit, a coil that constitutes the LC oscillation circuit, and a circuit that demodulates the oscillation wave.
  • a microphone is disclosed.
  • the vibrating membrane of the semiconductor microphone of this Patent Document 3 is held by two upper and lower cylindrical holding member portions. Usually, in order to apply tension to the vibrating membrane, a lower side of the lower holding member portion is used.
  • a method is adopted in which a tension adjusting ring is press-fitted into the holding member from the opening, and the outer peripheral portion of the vibration film is pushed up by the tension adjusting ring.
  • the magnitude of the tension applied to the vibration film is determined by the vertical position of the tension adjustment ring.
  • a grip allowance is required to pull the diaphragm, and the grip allowance is obtained by using a microphone.
  • the cutting is generally performed after the vibration membrane is fixed. For this reason, an extra work of cutting the vibration membrane after fixing it to the cylindrical support member is necessary, and after fixing to the cylindrical support member, the cylindrical support member exists, and thus the cylindrical support member is present. It becomes harder to cut than before fixing to the member.
  • the present invention has been made in view of such points, and the object of the present invention is as a method of manufacturing a diaphragm unit used for a microphone, which includes a resin cylindrical support member and a diaphragm. It is an object to enable tension to be applied to the vibrating membrane by a simple method so that the position of the vibrating membrane in the axial direction on the cylindrical support member does not change.
  • a cylindrical support member made of a resin having an opening in at least one side in the axial direction, and a first end face that is an end face on the one side in the axial direction of the cylindrical support member. Opening of the first end surface of the cylindrical support member for a method of manufacturing a vibrating membrane unit used in a microphone, comprising a vibrating membrane fixed to cover the opening of the first end surface at an opening periphery.
  • a fixing step in which the vibrating membrane is fixed to a peripheral portion, and a predetermined tension is applied to the vibrating membrane using the deformation of the cylindrical support member outward in the radial direction after the fixing step. And a tension applying step.
  • the vibrating membrane in the fixing step, the vibrating membrane is fixed to the opening peripheral edge portion of the first end surface of the cylindrical support member, and then the cylindrical support member is deformed radially outward in the tension applying step.
  • the vibrating membrane is pulled outward in the radial direction, and tension is applied.
  • a grip margin for pulling the diaphragm is not necessary, and an operation for cutting the grip margin after the diaphragm is fixed becomes unnecessary.
  • tension can be applied to the vibrating membrane so that the axial position of the vibrating membrane in the cylindrical support member does not change. it can.
  • the cylindrical support member has a plurality of grooves with a predetermined depth extending radially from the inner peripheral surface to the outer peripheral surface of the cylindrical support member.
  • the first end surface side portion of the cylindrical support member is divided into a plurality of divided portions arranged in the circumferential direction by being formed at intervals in the direction, and the fixing step includes the cylindrical shape.
  • the support member is formed so as to be integrated with the vibration film produced in advance, and the vibration film is fixed to the peripheral edge of the opening of the first end surface of the cylindrical support member.
  • a predetermined tension is applied to the vibrating membrane by deformation of the cylindrical support member in the radial direction that occurs as the temperature of the cylindrical support member after molding decreases. It is preferable that it is a process to perform.
  • the cylindrical support member is integrated with the vibration film in the process of molding, and therefore, an adhesive for fixing the vibration film to the cylindrical support member becomes unnecessary.
  • an adhesive for fixing the vibration film to the cylindrical support member becomes unnecessary.
  • the vibration film to the cylindrical support member with an adhesive it is necessary to manage the amount of adhesive applied from the viewpoint of preventing the adhesive from protruding while maintaining the adhesive strength,
  • the position of the vibrating membrane in the axial direction of the cylindrical support member changes due to the error in the amount of application. Therefore, in order to suppress this change as much as possible, it is necessary to strictly manage the amount of adhesive applied.
  • the cylindrical support member is integrated with the vibration film as described above, the vibration film can be firmly fixed to the cylindrical support member without using an adhesive. Therefore, management of the application amount of the adhesive is not necessary, and the axial position of the vibration film in the cylindrical support member is accurately determined.
  • the molded cylindrical support member is cooled from a high temperature immediately after molding to a normal temperature.
  • the portion on the first end face side of the cylindrical support member is a plurality of divided portions that are divided in the circumferential direction by a plurality of grooves, each divided portion is formed in the cooling process of the cylindrical support member. Trying to deform radially outward. Therefore, a predetermined tension is applied to the vibration film by utilizing this deformation in the tension applying step.
  • the divided portions of the cylindrical support member are deformed radially outward, whereby the vibrating membrane is pulled radially outward and a predetermined tension is applied to the vibrating membrane.
  • the magnitude of the tension applied to the vibration film is determined by the amount of deformation of the portion constituting the first end face in each divided portion of the cylindrical support member.
  • the amount of deformation is mainly determined by the thickness of each divided portion of the cylindrical support member, the number and depth of the grooves, and the resin material and molding conditions of the cylindrical support member. May be set in advance by experiments or the like so as to obtain the above. Therefore, an appropriate tension can be easily applied to the vibration film.
  • the cylindrical support member is arranged on the inner peripheral surface of each of the divided portions. It is preferable that the meat stealing part to be recessed is formed.
  • each divided portion is more easily deformed more radially outward in the cooling process of the cylindrical support member.
  • the amount of deformation of each divided portion can also be adjusted by the amount of depression on the inner peripheral surface by the meat stealing portion. Therefore, a predetermined tension can be more reliably and easily applied to the vibration film.
  • the fixing step includes the cylindrical support member in a state where at least an end portion on the first end face side of the cylindrical support member is elastically deformed radially inward by pressing.
  • the vibration film is fixed to the peripheral edge of the opening of the first end surface of the first end surface by welding or an adhesive, and the tension applying step releases the pressure and generates elasticity of the cylindrical support member. It is preferable that it is a step of applying a predetermined tension to the vibrating membrane by deformation outward in the radial direction by a restoring force.
  • the vibration film can be firmly fixed to the cylindrical support member without using an adhesive.
  • at least the end portion on the first end face side of the cylindrical support member is in a state of being elastically deformed radially inward by pressing (that is, the diameter of the opening peripheral edge portion of the first end face is reduced).
  • the pressing is released, at least the end portion on the first end face side of the cylindrical support member tends to be deformed radially outward by the elastic restoring force (the diameter of the opening peripheral edge portion of the first end face is to be increased).
  • the vibration film fixed to the cylindrical support member by welding or adhesive is pulled outward in the radial direction, and tension is applied. It will be. Therefore, in the tension application step, if the above-described pressure on the cylindrical support member is released, tension can be easily applied to the vibration film.
  • the magnitude of the tension applied to the vibration film is determined by the amount of elastic deformation (the elastic restoring force outward in the radial direction) of the end portion on the first end surface side of the cylindrical support member, and this amount of elastic deformation. May be set in advance by experiments or the like so as to obtain the predetermined tension. Therefore, an appropriate tension can be easily applied to the vibration film.
  • the cylindrical support member is opened on both axial sides thereof, and the fixing step is performed on the opening peripheral edge of the first end surface of the cylindrical support member.
  • the vibration film is a step of fixing by welding or an adhesive, and the tension applying step is such that the outer diameter is the cylindrical shape from the opening of the second end surface that is the end surface opposite to the first end surface of the cylindrical support member.
  • a tension ring larger than the inner diameter of the support member is inserted into the cylindrical support member, and at least a first end face side end portion of the cylindrical support member is deformed radially outward by the tension ring, It is preferable that the step of applying a predetermined tension to the vibrating membrane by deformation.
  • the vibration film in the fixing step, particularly when the vibration film is fixed to the cylindrical support member by welding, the vibration film can be firmly fixed to the cylindrical support member without using an adhesive.
  • the tension applying step if the end portion on the first end face side of the cylindrical support member is deformed radially outward by the tension ring, the vibration film fixed to the cylindrical support member by welding or adhesive is radial. The tension is applied by pulling outward.
  • the magnitude of the tension applied to the diaphragm is determined by the inner diameter of the cylindrical support member, the outer diameter of the tension ring, and the resin material, and these are set in advance by experiments to obtain an appropriate magnitude of tension. You just have to. Therefore, an appropriate tension can be easily applied to the vibration film.
  • the microphone includes the diaphragm unit, an LC oscillation circuit, a coil that constitutes the LC oscillation circuit, and a circuit that demodulates the oscillation wave, and the inductance of the coil changes as the diaphragm of the diaphragm unit vibrates.
  • the semiconductor microphone is preferably configured such that the vibration film and the coil are held at a predetermined interval, and the change in the oscillation frequency of the LC oscillation circuit that changes due to the change in the inductance is demodulated.
  • the shaft of the diaphragm in the cylindrical support member is used. Since a predetermined tension can be applied to the vibration film so that the position in the direction does not change, the distance between the vibration film and the coil can be determined accurately, so that an acoustic signal can be detected with high accuracy.
  • the LC oscillation circuit including the coil and the circuit for demodulating the oscillation wave are semiconductors disposed on the second end face side which is the end face opposite to the first end face in the cylindrical support member.
  • a plurality of conductive patterns to which a plurality of input / output terminals are respectively connected are formed concentrically so that the center of the cylindrical support member is the center of the conductive pattern. It is possible to connect each input / output terminal to each conductive pattern without aligning the cylindrical support member in the circumferential direction simply by attaching it to the main substrate so as to be positioned at the position.
  • the semiconductor portion is disposed on the second end surface side that is the end surface opposite to the first end surface of the cylindrical support member of the vibrating membrane unit. It fixes through a board
  • the diaphragm is fixed to the opening peripheral edge of the first end surface of the cylindrical support member, and then the cylindrical support member is Since a predetermined tension is applied to the vibrating membrane by utilizing the outward deformation in the radial direction, vibration can be performed in a simple manner so that the axial position of the vibrating membrane in the cylindrical support member does not change. Tension can be applied to the membrane, and therefore a microphone capable of detecting an acoustic signal with high accuracy can be produced at low cost using the vibrating membrane unit produced according to the present invention.
  • FIG. 1 It is sectional drawing which shows the semiconductor microphone provided with the diaphragm unit manufactured by the manufacturing method which concerns on Embodiment 1 of this invention. It is the figure which looked at the said semiconductor microphone from the diaphragm side. It is the schematic which shows the circuit structure in a semiconductor. It is a circuit diagram which shows the Hartley type
  • FIG. 6 is a cross-sectional view showing a semiconductor microphone according to a fourth embodiment.
  • FIG. 10 is a cross-sectional view illustrating a semiconductor microphone according to a fifth embodiment.
  • FIG. 10 is a cross-sectional view showing a semiconductor microphone according to a sixth embodiment.
  • (Embodiment 1) 1 and 2 show a semiconductor microphone M including a diaphragm unit 1 manufactured by the manufacturing method according to Embodiment 1 of the present invention.
  • the semiconductor microphone M includes a diaphragm unit 1, a substrate 2, a semiconductor unit 3 mounted on the substrate 2, and a plurality of input / output terminals 4 (two power supply terminals in the present embodiment). And one output signal terminal).
  • the vibrating membrane unit 1 includes a resin-made cylindrical support member 11 that is open on both sides in the axial direction, and a first end surface that is an end surface on one side (upper side in FIG. 1) of the cylindrical support member 11 in the axial direction.
  • the concave portion 13 formed at the peripheral edge of the opening 12 is provided with a vibration film 21 fixed so as to cover the opening of the first end face 12.
  • the vibrating membrane 21 is a permeable (or conductive) vibrating membrane that vibrates in response to an acoustic signal (sound pressure).
  • An outer peripheral edge portion of a base material 22 described later in the vibration film 21 is fixed to the concave portion 13 of the first end surface 12 of the cylindrical support member 11.
  • the depth of the recess 13 is substantially the same as the thickness of the base material 22.
  • the resin constituting the cylindrical support member 11 may be any resin as long as a predetermined tension can be applied to the vibration film 21 as will be described later.
  • the cylindrical support member 11 has a cylindrical shape, and the vibration film 21 has a circular shape correspondingly, but is not limited to this shape.
  • a concave portion 15 is formed on the peripheral edge of the opening of the second end surface 14 which is the end surface opposite to the first end surface 12 of the cylindrical support member 11 (the lower side in FIG. 1).
  • the substrate 2 is fitted and fixed by press-fitting.
  • the substrate 2 covers the opening of the second end face 14. Further, the depth of the recess 15 is substantially the same as the thickness of the substrate 2.
  • the substrate 2 may be fixed to the recess 15 by adhesion, or may be fixed by both press-fitting and adhesion. However, since it is necessary to manage the coating amount of the adhesive, it is preferable not to use it as much as possible.
  • the semiconductor portion 3 is disposed on the second end face 14 side of the cylindrical support member 11. That is, the semiconductor portion 3 is mounted on the surface (the upper surface in FIG. 1) of the substrate 2 that is fixed to the concave portion 15 of the second end surface 14 of the cylindrical support member 11.
  • the distance between the semiconductor part 3 and the vibration film 21 (specifically, the distance between a coil part 32 described later and the magnetically permeable material part 23 of the vibration film 21) is maintained at a predetermined distance.
  • the center of the semiconductor part 3 substantially coincides with the central axis of the cylindrical support member 11.
  • the plurality of (three) input / output terminals 4 are provided so as to protrude from the semiconductor portion 3 to the side opposite to the vibrating membrane 21.
  • each input / output terminal 4 is supported by a through hole 2a penetrating in the thickness direction of the substrate 2 and its front end surface is a surface opposite to the vibrating membrane 21 in the substrate 2 (in FIG. 1). Facing the bottom surface.
  • These input / output terminals 4 are respectively arranged at different positions from the central axis of the cylindrical support member 11 (which is also the central axis of the substrate 2 and the central axis of the semiconductor microphone M).
  • a plurality (three) of conductive patterns 26 to which the plurality of input / output terminals 4 are respectively connected are formed on the main substrate 25 (see FIG. 8) to which the semiconductor microphone M is attached.
  • the plurality of conductive patterns 26 are formed concentrically on the main substrate 25, and the diameter of each conductive pattern 26 is set to be the same as the distance from the central axis of each input / output terminal 4.
  • the cylindrical support member 11 is attached to the main substrate 25 so that the center thereof is located at the center of the conductive pattern 26, and each input / output is performed without aligning the cylindrical support member 11 in the circumferential direction.
  • the terminal 4 can be connected to each conductive pattern 26.
  • the semiconductor microphone M can be reduced in size as compared with wiring by wire bonding.
  • the plurality of input / output terminals 4 may be located anywhere in the circumferential direction of the cylindrical support member 11 as long as the distance from the central axis of the cylindrical support member 11 is different from each other. .
  • the semiconductor unit 3 includes a coil unit 32 and a capacitor 33, and an LC oscillation circuit 31 whose oscillation frequency is determined by the coil unit 32 and the capacitor 33, and an electrical audio signal from the oscillation wave.
  • An FM demodulating circuit 37 configured to extract and output the extracted electrical audio signal as an analog output signal via the output signal terminal of the plurality of input / output terminals 4 is configured.
  • the semiconductor part 3 is formed by sealing these circuits with a resin.
  • a modulation circuit 38 to be used may be added. In this case, an input signal terminal for a modulation reference input signal is added as the input / output terminal 4, and when outputting a digital output signal in addition to an analog output signal, an output signal terminal for a digital output signal is added. Will be.
  • the LC oscillation circuit 31 may be a variety of oscillation circuits such as a Hartley type, a Colpitts type, a base tuning type, and a collector tuning type.
  • a Hartley type oscillation circuit shown in FIG. 4 will be described as an example.
  • the LC oscillation circuit 31 includes a coil portion 32 and a capacitor 33 having an inductance value and a capacitance value, respectively, such that the oscillation frequency is about 100 MHz to several hundred MHz.
  • the coil part 32 is comprised by the 1st coil 32a and the 2nd coil 32b.
  • the transistor 34 used in the LC oscillation circuit 31 is also configured in the semiconductor unit 3 together with the coil unit 32 and the capacitor 33.
  • the capacitance value of the capacitor 33 is fixed.
  • the power source is usually disposed between point A (+ side) and point B ( ⁇ side) in FIG.
  • the distance between the first coil 32a and the vibration film 21 (specifically, the magnetically permeable material part 23) of the coil part 32 and the distance between the second coil 32b and the vibration film 21 (the magnetically permeable material part 23) are the same.
  • the predetermined interval is maintained.
  • This predetermined interval is within a distance (for example, 0.1 mm or more and 0.5 mm or less) that the magnetic flux 41 (see FIG. 7) generated when the resonance current flows through the coil unit 32 by the oscillation of the LC oscillation circuit 31 is reached. ).
  • the vibration film 21 includes a base material 22 and a magnetically permeable material portion 23 provided on the surface of the base material 22 on the semiconductor unit 3 side (the lower surface in FIG. 1) by sputtering.
  • the substrate 22 is a flat thin film having a thickness of several ⁇ m to several tens of ⁇ m, has an area of about 10 mm 2 to about 100 mm 2 , and 30 in an atmosphere of about 250 ° C. to 300 ° C. It is preferable to use a film material (for example, a polyimide film) having a heat resistance property that only causes deformation within a range that does not hinder practical use even if left for about 60 seconds or more for about 2 seconds or less.
  • a film material for example, a polyimide film
  • the magnetically permeable material portion 23 may be provided in a portion of the base material 22 facing the semiconductor portion 3 (coil portion 32) or a central portion of the base material 22 where bending due to vibration of the vibration film 21 hardly occurs. preferable.
  • the magnetically permeable material portion 23 is provided in the central portion of the base material 22, which is a portion facing the semiconductor portion 3 (coil portion 32) in the base material 22 (the center of the magnetic permeable material portion 23 and the semiconductor).
  • the center of the portion 3 substantially coincides with the central axis of the cylindrical support member 11).
  • the magnetically permeable material portion 23 has a thickness of several ⁇ m to several tens of ⁇ m and is made of a magnetically permeable material (for example, a ferrite material or a permalloy material) having a permeability much higher than air in the oscillation frequency band. Become.
  • the first end surface 12 of the cylindrical support member 11 has a plurality of grooves having a predetermined depth extending in the radial direction from the inner peripheral surface to the outer peripheral surface of the cylindrical support member 11. 16 are formed at intervals in the circumferential direction. With the formation of these groove portions 16, the portion on the first end face 12 side of the cylindrical support member 11 is divided into a plurality (the same number as the groove portions 16) of divided portions 17 arranged in the circumferential direction. It is preferable that a meat stealing portion 18 for recessing the inner peripheral surface is formed on the inner peripheral surface of each divided portion 17 as in the present embodiment.
  • the meat stealing portion 18 of each divided portion 17 has a semicircular cross section and extends in the axial direction of the cylindrical support member 11.
  • Each meat stealing portion 18 is formed in order to easily deform (easily warp) each divided portion 17 radially outward in a cooling process after molding of the cylindrical support member 11 described later.
  • the inner peripheral surface of each divided portion 17 may be recessed in any shape. Note that the meat stealing portion 18 is not always necessary, and even if the meat stealing portion 18 is not provided, each divided portion 17 is usually deformed radially outward in the cooling process after the cylindrical support member 11 is molded.
  • each divided portion 17 in the cylindrical support member 11, the number and depth of the groove portions 16, and the amount of depression of the inner peripheral surface by the meat stealing portion 18 are determined in the cooling process after the cylindrical support member 11 is molded. It is determined together with the resin material of the cylindrical support member 11 and the molding conditions so that a predetermined tension is applied to the vibration film 21.
  • the predetermined tension is a value that can faithfully convert a change in sound pressure into an electric signal, and is a value such that the maximum amplitude of the vibrating membrane 21 is several ⁇ m.
  • the number of groove portions 16 (that is, the number of divided portions 17) is preferably about 8 to 16, and when the meat stealing portions 18 are formed in each divided portion 17 as in the present embodiment, the number of groove portions 16 depends on the meat stealing portions 18 in each divided portion 17.
  • the amount of depression on the inner peripheral surface is preferably more than 0 and not more than half of the thickness of the divided portion 17. It is preferable that the width of the groove portion 16 (the interval between the adjacent divided portions 17) is as small as possible so that the groove portion 16 can be formed by molding. In this way, a predetermined tension is applied to the vibration film 21 so that a change in sound pressure can be faithfully converted into an electric signal.
  • the sound detection of the semiconductor microphone M utilizes the fact that the distance between the vibration film 21 and the semiconductor unit 3 is changed by the vibration of the vibration film 21 due to an acoustic signal (sound pressure) input to the vibration film 21.
  • the sound detection operation will be described with reference to FIG.
  • a resonance current flows through the coil portion 32 and a magnetic flux 41 is generated.
  • the magnetically permeable material portion 23 is disposed within the reach distance of the magnetic flux 41, a part of the magnetic flux 41 is generated. Will pass through the magnetically permeable material portion 23.
  • the inductance of the coil part 32 increases, and the oscillation frequency of the LC oscillation circuit 31 becomes lower than when the magnetically permeable material part 23 is not disposed.
  • the vibrating membrane 21 comes closer to the coil portion 32 than the fixed position when there is no sound, that is, when the distance between the vibrating membrane 21 and the coil portion 32 becomes smaller, the inside of the magnetically permeable material portion 23 As a result, the inductance of the coil portion 32 is increased and the oscillation frequency of the LC oscillation circuit 31 is further lowered as compared with the case where the vibrating membrane 21 is in a fixed position.
  • the magnetically permeable material portion 23 it is also possible to provide a conductive material portion made of a conductive material (for example, copper or the like) having a sufficiently low electric resistance in the oscillation frequency band.
  • a conductive material for example, copper or the like
  • the oscillation frequency of the LC oscillation circuit 31 is higher than when no conductive material portion is disposed.
  • the inductance of the coil section 32 decreases, and the oscillation frequency of the LC oscillation circuit 31 becomes higher.
  • the vibrating membrane 21 is further away from the coil portion 32 than the fixed position, the magnetic flux 41 passing through the conductive material portion is reduced, thereby reducing the eddy current generated in the conductive material portion, As a result, the consumption of the magnetic flux 41 is reduced, and as a result, the inductance of the coil section 32 is increased and the oscillation frequency of the LC oscillation circuit 31 is lowered.
  • the magnetically permeable material it is effective to select a material having as high an electrical resistance as possible from the viewpoint of preventing the influence of eddy current generated in the conductive material portion.
  • the magnetic permeable material portion 23 is too thin and magnetic saturation occurs, the change in inductance accompanying the change in the distance between the vibration film 21 and the coil portion 32 becomes small. It is preferable to use a material having a high saturation magnetic flux density and a thickness that does not cause the occurrence of magnetic field.
  • the conductive material As the conductive material, it is effective to select a material having the smallest possible magnetic permeability because the high magnetic permeability lowers the oscillation frequency and inhibits the frequency increase due to the eddy current generated in the conductive material portion. .
  • the thickness of the conductive material portion may be several ⁇ m to several tens of ⁇ m as in the case of the magnetically permeable material portion 23, but it is necessary to make the thickness such that an eddy current of about 100 MHz to about several 100 MHz flows. is there.
  • the depth at which the high frequency current of 100 MHz flows is about 7 ⁇ m
  • the depth at which the high frequency current of 500 MHz flows is about 3 ⁇ m
  • the minimum value of the thickness of the conductive material portion is It is about 7 ⁇ m.
  • a film for example, an imide film
  • This film has an area larger than the area predetermined as the vibration film 21.
  • a magnetically permeable material is sputtered on the entire film, and then unnecessary portions of the sputtered permeable material are removed by etching (dry etching or wet etching), thereby forming the permeable material portion 23.
  • etching dry etching or wet etching
  • the vibration film 21 including the base material 22 and the magnetically permeable material portion 23 provided at the approximate center of the base material 22 is completed.
  • the magnetic permeability material part 23 is provided also when providing a conductive material part in the approximate center of the base material 22.
  • the method of forming the magnetically permeable material portion 23 (or the conductive material portion) on the base material 22 is not limited to sputtering and etching, and a magnetically permeable material (or conductive material) is applied or a magnetically permeable material ( Alternatively, a sheet made of a conductive material) may be attached.
  • the vibrating membrane 21 is fixed to the concave portion 13 of the first end surface 12 of the cylindrical supporting member 11 by molding the cylindrical supporting member 11 so as to be integrated with the produced vibrating membrane 21.
  • the cavity is filled with a molten resin in a state where the vibration film 21 thus prepared is set in a portion corresponding to the first end face 12 in the cavity of the mold for molding the cylindrical support member 11.
  • the support member 11 is molded (injection molding).
  • the molten resin enters a minute concave portion on the surface of the base material 22 of the vibration film 21 that has become rough due to etching, so that the concave portion 13 of the first end surface 12 of the cylindrical support member 11 is vibrated after molding.
  • the film 21 is firmly fixed.
  • the molded cylindrical support member 11 (the cylindrical support member 11 integrated with the vibration film 21) is taken out from the mold.
  • the temperature of the cylindrical support member 11 immediately after being taken out from the mold is considerably higher than room temperature (for example, about 200 ° C.).
  • each divided portion 17 of the cylindrical support member 11 tends to be deformed radially outward by the meat stealing portion 18 formed on the inner peripheral surface thereof.
  • the amount of deformation of each divided portion 17 outward in the radial direction is larger toward the first end surface 12 side, and the amount of deformation of the portion constituting the first end surface 12 in each divided portion 17 of the cylindrical support member 11 outward in the radial direction is increased. Is the largest.
  • the amount of deformation of the portion constituting the first end face 12 in each divided portion 17 (the portion to which the vibration film 21 is fixed) radially outward is mainly the thickness of each divided portion 17 in the cylindrical support member 11,
  • the number and depth of the groove portions 16, the amount of recess in the inner peripheral surface by the meat stealing portion 18, and the resin material and molding conditions of the cylindrical support member 11 are determined, and these are given the predetermined tension to the vibration film 21. Therefore, when the temperature of the cylindrical support member 11 reaches room temperature, the predetermined tension is applied to the vibrating membrane 21. In this way, the diaphragm unit 1 including the diaphragm 21 to which a predetermined tension is applied is completed.
  • the semiconductor unit 3 is placed on the second end face 14 side of the cylindrical support member 11 of the diaphragm unit 1 with the substrate 2 interposed therebetween. And fix. Specifically, the substrate 2 on which the semiconductor unit 3 is mounted in advance is fitted and fixed in the recess 15 of the second end surface 14 of the cylindrical support member 11 in the diaphragm unit 1 by press fitting. When the substrate 2 is fixed to the recess 15 by bonding, the substrate 2 is fitted into the recess 15 after applying a predetermined amount of adhesive to the recess 15. Thus, the semiconductor microphone M is completed.
  • the cylindrical support member 11 of the semiconductor microphone M may be positioned at the center of the conductive pattern 26 on the main substrate 25.
  • a positioning hole may be formed at the center position of the conductive pattern 26 in the main substrate 25 and a positioning pin that fits into the positioning hole may be provided on the substrate 2.
  • the cylindrical support member 11 is molded so as to be integrated with the vibration film 21 produced in advance, so that the vibration film 21 is formed in the concave portion 13 of the first end surface 12 of the cylindrical support member 11. Is fixed, and then the diaphragm 21 is deformed outwardly in the radial direction of the divided portions 17 in the cylindrical support member 11 which occurs as the temperature of the cylindrical support member 11 after the molding decreases. Since the vibrating membrane unit 1 is manufactured so as to apply a predetermined tension, the predetermined tension can be easily applied to the vibrating membrane 21 by using the deformation of each divided portion 17 outward in the radial direction.
  • the vibrating membrane 21 is attached to the vibrating membrane 21 so that the position of the vibrating membrane 21 in the axial direction on the cylindrical support member 11 does not change. Deployment can be imparted.
  • the diaphragm unit 1 manufactured as described above can be suitably used for the semiconductor microphone M in which the distance between the semiconductor unit 3 and the diaphragm 21 is important for acoustic detection.
  • the cylindrical support member 11 is integrated with the vibration film 21 in the process of molding, an adhesive for fixing the vibration film 21 to the cylindrical support member 11 is not necessary. Thereby, the vibration film 21 can be firmly fixed to the cylindrical support member 11 without using an adhesive, and management of the application amount of the adhesive becomes unnecessary. In addition, since no adhesive is present, the position of the vibrating membrane 21 in the axial direction of the cylindrical support member 11 is determined more accurately. From this point also, the vibrating membrane unit 1 manufactured as described above is a semiconductor microphone. It can be suitably used for M. Therefore, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.
  • the manufacturing method of the diaphragm unit 1 is different from that of the first embodiment.
  • the meat stealing portion 18 as in the first embodiment is not formed on the inner peripheral surface of each divided portion 17 of the cylindrical support member 11.
  • Other configurations are the same as those of the first embodiment.
  • the vibrating membrane 21 is produced in the same manner as in the first embodiment.
  • the cylindrical support member 11 is molded separately from the production of the vibration film 21.
  • the cylindrical support member 11 is not limited to molding, and can be manufactured by cutting, for example. However, molding is advantageous in that many cylindrical support members 11 can be manufactured at low cost.
  • the cylindrical support member 11 is fitted into the annular jig 51.
  • the inner peripheral surface of the annular jig has an inner diameter that is substantially the same as the outer diameter of the cylindrical support member 11 (an inner diameter that is slightly larger than the outer diameter of the cylindrical support member 11), and in the axial direction of the annular jig 51.
  • the tapered portion 51b is configured to uniformly press all the divided portions 17 of the cylindrical support member 11 radially inward when the entire cylindrical support member 11 is fitted inside the annular jig 51.
  • the cylindrical support member 11 is inserted into the annular jig 51 from the opening on the straight portion 51a side of the annular jig 51 with the first end face 12 side being the front side, and finally the cylindrical support member. 11 is fitted inside the annular jig 51. Thereby, each division part 17 of the cylindrical support member 11 is pressed radially inward by the taper part 51b, and is in a state of being elastically deformed radially inward.
  • the produced vibration membrane 21 is fixed to the recess 13 of the first end face 12 of the produced cylindrical support member 11 by welding.
  • the vibration film 21 is firmly fixed to the recess 13 of the first end surface 12 of the cylindrical support member 11.
  • each divided portion 17 tries to deform outward (in an attempt to return to its original state) by its elastic restoring force.
  • a predetermined tension is applied to the vibrating membrane 21 by the deformation of each divided portion 17 outward in the radial direction by the elastic restoring force.
  • the magnitude of the tension applied to the vibrating membrane 21 is the amount of elastic deformation inward in the radial direction of the portion constituting the first end face 12 in each divided portion 17 (elastic restoring force outward in the radial direction).
  • the amount of elastic deformation (which varies depending on the thickness of each divided portion 17, the number and depth of the groove portions, and the resin material) can be set in advance by experiments or the like so as to obtain the predetermined tension. That's fine.
  • the groove part 16 (dividing part 17) may not be present.
  • the groove portion 16 also has a role of preventing the vibration characteristics of the vibration film 21 from deteriorating by communicating the inside and the outside of the cylindrical support member 11, when the groove portion 16 is eliminated,
  • the tubular support member 11 is preferably provided with a communication hole that communicates the inside and the outside.
  • any jig can be used as long as it can press at least the end portion on the first end face side of the cylindrical support member 11 and release the press. Also good.
  • the method of manufacturing the semiconductor microphone M using the manufactured diaphragm unit 1 is the same as that of the first embodiment.
  • the cylindrical support is performed with the annular jig 51 pressing each divided portion 17 of the cylindrical support member 11 radially inward to elastically deform each divided portion 17 radially inward.
  • the vibration film 21 is fixed to the concave portion 13 of the first end surface 12 of the member 11 by welding, and then the pressure is released, and the elastic restoring force of each divided portion 17 of the cylindrical support member 11 generated by the release. Since the diaphragm unit 1 is manufactured so as to apply a predetermined tension to the diaphragm 21 by deformation to the outside in the radial direction, as in the first embodiment, radially outward of each divided portion 17.
  • a predetermined tension can be easily applied to the vibration film 21 and tension is applied to the vibration film 21 so that the axial position of the vibration film 21 in the cylindrical support member 11 does not change. With It can be. Further, since the vibration film 21 is fixed to the cylindrical support member 11 by welding, an adhesive is not necessary, and the axial position of the vibration film 21 in the tubular support member 11 is determined more accurately. And the semiconductor microphone M which can detect an acoustic signal accurately can be manufactured cheaply using the vibration membrane unit 1 manufactured in this way.
  • the vibration film 21 is fixed to the cylindrical support member 11 by welding.
  • the vibration film 21 may be fixed to the cylindrical support member 11 with an adhesive. In this case, it is necessary to manage the application amount of the adhesive, but compared with the method of applying tension to the vibration film 21 by pressing the vibration film 21 in the thickness direction, the vibration film 21 in the cylindrical support member 11 is controlled. The axial position is determined accurately.
  • the manufacturing method of the diaphragm unit 1 is different from those of the first and second embodiments.
  • the meat stealing portion 18 as in the first embodiment is not formed on the inner peripheral surface of each divided portion 17 of the cylindrical support member 11, but is shown in FIG. 11.
  • the recessed groove portion 19 into which a tension ring 55 described later is fitted is formed so as to extend in the circumferential direction of the cylindrical support member 11.
  • the concave groove portion 19 of each divided portion 17 is arranged at the same position in the axial direction of the cylindrical support member 11 (the end portion on the first end surface 12 side on the inner peripheral surface of the cylindrical support member 11). It is formed to be continuous in the direction (however, it is interrupted at the groove 16).
  • Other configurations are the same as those of the first embodiment.
  • the vibrating membrane 21 and the cylindrical support member 11 are separately manufactured.
  • the cylindrical support member 11 is not limited to molding, and can be manufactured by, for example, cutting.
  • the produced vibration membrane 21 is fixed to the recess 13 of the first end surface 12 of the produced cylindrical support member 11 by welding. At the time of this welding, each divided portion 17 of the cylindrical support member 11 is prevented from being deformed in the radial direction. By this welding, the vibration film 21 is firmly fixed to the recess 13 of the first end surface 12 of the cylindrical support member 11.
  • the tension ring 55 is inserted from the opening of the second end face 14 of the cylindrical support member 11.
  • the outer diameter of the tension ring 55 is larger than the inner diameter of the cylindrical support member 11 including the concave groove portion 19.
  • the tension ring 55 has a substantially C shape with a part in the circumferential direction cut off, and thus the tension ring 55 is contracted to be smaller than the inner diameter of the cylindrical support member 11.
  • the tension ring 55 can be easily inserted into the cylindrical support member 11.
  • the tension ring 55 is inserted into the cylindrical support member 11 with the diameter reduced, and the tension ring 55 is fitted into the concave groove portion 19.
  • the magnitude of the tension applied to the vibration film 21 is determined by the inner diameter of the concave groove portion 19 in the cylindrical support member 11, the outer diameter of the tension ring 55, and the resin material. It may be set in advance by experiments or the like so as to obtain the tension.
  • the concave groove portion 19 is not necessarily required. If the concave groove portion 19 is not provided, the amount of diameter reduction of the tension ring 55 may be small. As a result, even if the tension ring 55 is a complete ring shape, the cylindrical support member 11 can be inserted. On the other hand, by providing the recessed groove portion 19, it is possible to prevent the tension ring 55 from being displaced in the axial direction of the cylindrical support member 11, and it is possible to prevent a change in the tension of the vibration film 21 due to this deviation.
  • any member can be used as long as at least the end portion on the first end face 12 side of the cylindrical support member 11 can be deformed radially outward. May be.
  • the method of manufacturing the semiconductor microphone M using the manufactured diaphragm unit 1 is the same as that of the first embodiment.
  • the diaphragm 21 is fixed to the recess 13 of the first end surface 12 of the cylindrical support member 11 by welding, and then the outer diameter is from the opening of the second end surface 14 of the cylindrical support member 11.
  • a tension ring 55 larger than the inner diameter of the cylindrical support member 11 (including the concave groove portion 19) is inserted into the cylindrical support member 11, and the first end surface 12 of the cylindrical support member 11 is inserted by the tension ring 55. Since the vibrating membrane unit 1 is manufactured by deforming the end portion on the side radially outward and applying a predetermined tension to the vibrating membrane 21 by the deformation, the same as in the first and second embodiments.
  • a predetermined tension can be easily applied to the vibrating membrane 21 by utilizing the deformation of each divided portion 17 in the radial direction, and the axial position of the vibrating membrane 21 in the cylindrical support member 11 is determined. Change It is possible to impart tension to the oddly vibrating membrane 21. Further, since the vibration film 21 is fixed to the cylindrical support member 11 by welding, an adhesive is not necessary, and the axial position of the vibration film 21 in the tubular support member 11 is determined more accurately. And the semiconductor microphone M which can detect an acoustic signal accurately can be manufactured cheaply using the vibration membrane unit 1 manufactured in this way.
  • the vibration film 21 is fixed to the cylindrical support member 11 by welding.
  • the vibration film 21 may be fixed to the cylindrical support member 11 with an adhesive. Good.
  • the semiconductor part 3 is directly fixed to the second end face 14 side of the cylindrical support member 11 without the substrate 2 interposed therebetween.
  • the substrate 2 does not exist, and the input / output terminal 4 is supported by the sealing resin of the semiconductor unit 3.
  • the shape of the cylindrical support member 11 on the second end face 14 side is different from that of the second embodiment.
  • Other configurations are the same as those of the second embodiment.
  • a recess 61 is formed in the opening peripheral edge of the second end face 14, and the semiconductor part 3 is fixed in the recess 61 to cover the opening of the second end face 14.
  • the depth of the recess 61 is substantially the same as the thickness of the semiconductor portion 3.
  • the semiconductor part 3 is fixed by press-fitting the semiconductor part 3 into the recess 61, but may be fixed by bonding or fixed by both press-fitting and bonding.
  • the manufacturing method of the diaphragm unit 1 of the present embodiment is the same as that of the second embodiment.
  • the area of the opening of the 2nd end surface 14 of the cylindrical support member 11 is smaller than the area of the opening of the 1st end surface 12, the method of the said Embodiment 1 and 3 is not practical.
  • the semiconductor unit 3 is directly fixed to the second end face 14 side of the tubular support member 11 of the diaphragm unit 1. Specifically, the semiconductor portion 3 is fitted and fixed in the recess 61 of the second end surface 14 of the cylindrical support member 11 in the vibration membrane unit 1 by press-fitting. In addition, when fixing the semiconductor part 3 to the recessed part 61 by adhesion
  • the semiconductor unit 3 is directly fixed to the second end face 14 side of the cylindrical support member 11 without using the substrate 2 as in the fourth embodiment. It is a thing. However, the shape of the cylindrical support member 11 on the second end face 14 side is different from that of the fourth embodiment. Other configurations are the same as those in the fourth embodiment.
  • the cylindrical support member 11 of the diaphragm unit 1 has a bottomed cylindrical shape in which only the first end face 12 side is open.
  • a recess 62 is formed at the center of the second end surface 14 where no opening exists in the cylindrical support member 11, and the semiconductor portion 3 is fixed in the recess 62.
  • the depth of the recess 62 is substantially the same as the thickness of the semiconductor portion 3.
  • the semiconductor part 3 is fixed by press-fitting the semiconductor part 3 into the recess 62, but may be fixed by adhesion or by both press-fitting and adhesion.
  • the semiconductor unit 3 is directly fixed to the second end face 14 side of the tubular support member 11 of the diaphragm unit 1.
  • This fixing method is the same as that in the fourth embodiment. In this way, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.
  • the semiconductor unit 3 is fixed to the second end surface 14 side of the cylindrical support member 11 via the auxiliary resin 65 instead of the substrate 2 of the first embodiment. It is a thing. Also in this embodiment, the input / output terminal 4 is supported by the sealing resin of the semiconductor unit 3 as in the fourth embodiment. Other configurations are the same as those of the first embodiment (however, no recess is formed in the opening peripheral edge of the second end surface 14 of the cylindrical support member 11).
  • the auxiliary resin 65 has a ring shape having a through hole 66 penetrating in the thickness direction of the auxiliary resin 65 in the center thereof, and is a cylindrical support that has the same shape as in the first embodiment.
  • the member 11 is fixed by being press-fitted into the opening of the second end surface 14 of the member 11.
  • the auxiliary resin 65 may be fixed by press-fitting into a recessed portion formed in the opening peripheral edge portion of the second end surface 14 of the cylindrical support member 11, similarly to the substrate 2 of the first embodiment.
  • the auxiliary resin 65 may be fixed to the cylindrical support member 11 by bonding, or by both press-fitting and bonding.
  • a concave portion 67 is formed in the opening peripheral edge portion of the through-hole 66 on the surface on one side in the thickness direction of the auxiliary resin 65 (the surface on the side opposite to the vibration film 21 when fixed to the cylindrical support member 11).
  • the semiconductor portion 3 is fixed in the recess 67 by press-fitting (or bonding, or both press-fitting and bonding), and covers the opening of the through-hole 66.
  • the auxiliary resin 65 may be the same material as the cylindrical support member 11 or a different material.
  • the manufacturing method of the diaphragm unit 1 of the present embodiment is the same as that of the first embodiment.
  • the diaphragm support unit 11 may be manufactured in the same manner as in the second or third embodiment, with the cylindrical support member 11 having the same shape as in the second or third embodiment. That is, before the auxiliary resin 65 is fixed, the area of the opening of the second end face 14 is the same as the area of the opening of the first end face 12, and therefore, unlike the fourth and fifth embodiments, only the method of the second embodiment.
  • the methods of Embodiments 1 and 3 can be performed, and the degree of freedom in manufacturing the diaphragm unit 1 is increased.
  • the semiconductor unit 3 is fixed to the second end face 14 side of the tubular support member 11 of the diaphragm unit 1 with an auxiliary resin 65.
  • the auxiliary resin 65 is produced separately from the manufacture of the diaphragm unit 1.
  • the auxiliary resin 65 is preferably produced by molding, but can also be produced by cutting.
  • the semiconductor part 3 is fixed to the concave part 67 of the auxiliary resin 65 by press-fitting.
  • the auxiliary resin 65 to which the semiconductor portion 3 is fixed is fixed to the opening of the second end surface 14 of the cylindrical support member 11 by press fitting. In this way, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.
  • the vibrating membrane 21 and the coil portion 32 are held at a predetermined interval so that the inductance of the coil portion 32 of the LC oscillation circuit 31 changes when the vibrating membrane 21 of the vibrating membrane unit 1 vibrates.
  • An example in which the present invention is applied to the method of manufacturing the vibrating membrane unit 1 used in the semiconductor microphone M that demodulates the change in the oscillation frequency of the LC oscillation circuit 31 that changes according to the change in the inductance is shown.
  • the present invention can also be applied to a method of manufacturing the diaphragm unit 1 used for other microphones (for example, condenser microphones).
  • the present invention is useful for a method of manufacturing a diaphragm unit used in a microphone, and in particular, the diaphragm and the coil so that the inductance of the coil of the LC oscillation circuit changes when the diaphragm of the diaphragm unit vibrates.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
  • Details Of Audible-Bandwidth Transducers (AREA)

Abstract

Provided is a method for producing a vibrating membrane unit (1) used for a microphone, the vibrating membrane unit being provided with: a tubular support member (11) made of resin, which opens in at least one side in an axial direction thereof; and a vibrating membrane (21) fixed to an opening peripheral portion of a first end face (12) in such a manner as to cover an opening of the first end face (12), the first end face (12) being an end face of the tubular support member (11) in the above one side thereof in the axial direction thereof. The method comprises: a fixing step in which the vibrating membrane (21) is brought into a state fixed to the opening peripheral portion of the first end face (12) of the tubular support member (11); and a tension providing step in which, after the foregoing fixing step, a predetermined tension is provided to the vibrating membrane (21) by utilizing radially outward deformation of the tubular support member (11).

Description

振動膜ユニットの製造方法Manufacturing method of diaphragm unit

 本発明は、軸方向の少なくとも一側が開口した樹脂製の筒状支持部材と、該筒状支持部材における軸方向の上記一側の端面である第1端面の開口周縁部に、該第1端面の開口を覆うように固定された振動膜とを備えた、マイクロホンに用いられる振動膜ユニットの製造方法に関する技術分野に属する。 The present invention provides a cylindrical support member made of resin having an opening in at least one side in the axial direction, and an opening peripheral portion of a first end face that is an end surface on the one side in the axial direction of the cylindrical support member. It belongs to the technical field regarding the manufacturing method of the diaphragm unit used for the microphone provided with the diaphragm fixed so as to cover the opening.

 一般に、マイクロホンに用いられる振動膜には、音圧の変化を電気信号に忠実に変換できるようにするためにテンションが付与される。このように振動膜にテンションを付与する方法としては、振動膜の外側周縁部を径方向外側へ引っ張りながら、該振動膜を筒状支持部材における開口端面の開口周縁部に接着等により固定する方法がある。 Generally, a tension is applied to a diaphragm used for a microphone so that a change in sound pressure can be faithfully converted into an electric signal. As a method of applying tension to the vibration membrane in this way, a method of fixing the vibration membrane to the opening peripheral portion of the opening end surface of the cylindrical support member by bonding or the like while pulling the outer peripheral portion of the vibration membrane radially outward. There is.

 また、例えば特許文献1には、振動板と、振動板に対向配置されかつ振動板との間でコンデンサを構成する固定極とを有するコンデンサマイクロホンユニットにおいて、振動板を支持リングに接着により固定した後に、振動板の支持リングとは反対側の面に突起を加熱成形し、この振動板をケース内に設置し、この振動板上に固定極を設置したときに、上記突起によって振動板と固定極との間隔を保つとともに、振動板にテンションを付与することが開示されている。 Further, for example, in Patent Document 1, in a condenser microphone unit having a diaphragm and a fixed pole that is disposed opposite to the diaphragm and forms a capacitor with the diaphragm, the diaphragm is fixed to the support ring by bonding. Later, when a protrusion is thermoformed on the surface of the diaphragm opposite to the support ring, the diaphragm is installed in the case, and when the fixed pole is installed on the diaphragm, the protrusion is fixed to the diaphragm. It is disclosed that a tension is applied to the diaphragm while maintaining a distance from the pole.

 さらに、例えば特許文献2には、外周部にネジ部を形成したハウジング部材に、内周面にネジ部を形成しかつ開口端部に振動膜を固定したリング部材を螺号し、ハウジング部材の振動膜支持部が振動膜と当接して振動膜にテンションを付与することが開示されている。 Further, for example, in Patent Document 2, a ring member in which a screw part is formed on an inner peripheral surface and a vibration film is fixed to an opening end is screwed to a housing member in which a screw part is formed on an outer peripheral part. It is disclosed that the membrane support portion abuts on the vibrating membrane and applies tension to the vibrating membrane.

 また、特許文献3には、音響信号を受けて振動する透磁性又は導電性の振動膜、LC発振回路、LC発振回路を構成するコイル、及び発振波を復調する回路で構成され、上記振動膜が振動することにより上記コイルのインダクタンスが変化するように上記振動膜と上記コイルとが所定の間隔で保持され、該インダクタンスの変化によって変わるLC発振回路の発振周波数の変化を復調するようにした半導体マイクロホンが開示されている。この特許文献3の半導体マイクロホンの振動膜は、上下2つの筒状の保持材部で保持されているが、この振動膜にテンションを付与するには、通常、下側の保持材部の下側開口からテンション調整リングを該保持材部内に圧入して、このテンション調整リングにより振動膜の外周部を押し上げるといった方法が採用される。この場合、テンション調整リングの上下位置によって、振動膜に付与されるテンションの大きさが決まる。 Patent Document 3 includes a magnetically permeable or conductive diaphragm that vibrates in response to an acoustic signal, an LC oscillation circuit, a coil that constitutes the LC oscillation circuit, and a circuit that demodulates the oscillation wave. A semiconductor in which the vibration film and the coil are held at a predetermined interval so that the inductance of the coil changes due to vibration, and the change in the oscillation frequency of the LC oscillation circuit that changes due to the change in the inductance is demodulated. A microphone is disclosed. The vibrating membrane of the semiconductor microphone of this Patent Document 3 is held by two upper and lower cylindrical holding member portions. Usually, in order to apply tension to the vibrating membrane, a lower side of the lower holding member portion is used. A method is adopted in which a tension adjusting ring is press-fitted into the holding member from the opening, and the outer peripheral portion of the vibration film is pushed up by the tension adjusting ring. In this case, the magnitude of the tension applied to the vibration film is determined by the vertical position of the tension adjustment ring.

特開2008-147743号公報JP 2008-147743 A 特開平11-69493号公報JP 11-69493 A 特開2005-143065号公報JP 2005-143065 A

 しかし、振動膜の外側周縁部を径方向外側へ引っ張りながら、該振動膜を筒状支持部材に固定する方法では、振動膜を引っ張るための掴み代が必要であり、その掴み代は、マイクロホンを径方向に小型化する観点から、振動膜の固定後にカットするのが一般的である。このため、振動膜を、筒状支持部材に固定した後にカットするという余分な作業が必要になるとともに、筒状支持部材への固定後では、筒状支持部材が存在するために、筒状支持部材への固定前に比べてカットし難くなる。 However, in the method of fixing the diaphragm to the cylindrical support member while pulling the outer peripheral edge of the diaphragm to the outside in the radial direction, a grip allowance is required to pull the diaphragm, and the grip allowance is obtained by using a microphone. From the viewpoint of downsizing in the radial direction, the cutting is generally performed after the vibration membrane is fixed. For this reason, an extra work of cutting the vibration membrane after fixing it to the cylindrical support member is necessary, and after fixing to the cylindrical support member, the cylindrical support member exists, and thus the cylindrical support member is present. It becomes harder to cut than before fixing to the member.

 そこで、上記特許文献1及び2に示されているように、振動膜を筒状支持部材に固定した後に、該振動膜をその厚み方向(筒状支持部材の軸方向)に押圧して振動膜にテンションを付与することが望ましい。 Therefore, as shown in Patent Documents 1 and 2, after the diaphragm is fixed to the cylindrical support member, the diaphragm is pressed in the thickness direction (the axial direction of the cylindrical support member). It is desirable to apply tension to the.

 しかし、このように振動膜を厚み方向に押圧して振動膜にテンションを付与する方法では、振動膜の押圧により、振動膜の、筒状支持部材における軸方向の位置が変化してしまう。特に、上記特許文献3に示されている半導体マイクロホンでは、振動膜とコイルとの間隔が音響検出精度に関係するため、その間隔を精度良く保持する必要があるが、振動膜を厚み方向に押圧する方法では、上記間隔を精度良く保持することが困難になる。 However, in such a method of applying tension to the vibrating membrane by pressing the vibrating membrane in the thickness direction, the axial position of the vibrating membrane in the cylindrical support member changes due to the pressing of the vibrating membrane. In particular, in the semiconductor microphone disclosed in Patent Document 3, since the distance between the vibration film and the coil is related to the acoustic detection accuracy, it is necessary to maintain the distance with high precision, but the vibration film is pressed in the thickness direction. In this method, it is difficult to maintain the above-mentioned interval with high accuracy.

 本発明は、斯かる点に鑑みてなされたものであり、その目的とするところは、樹脂製の筒状支持部材と振動膜とを備えた、マイクロホンに用いられる振動膜ユニットの製造方法として、簡単な方法で、振動膜の、筒状支持部材における軸方向の位置が変化しないように振動膜にテンションを付与することができるようにすることにある。 The present invention has been made in view of such points, and the object of the present invention is as a method of manufacturing a diaphragm unit used for a microphone, which includes a resin cylindrical support member and a diaphragm. It is an object to enable tension to be applied to the vibrating membrane by a simple method so that the position of the vibrating membrane in the axial direction on the cylindrical support member does not change.

 上記の目的を達成するために、この発明では、軸方向の少なくとも一側が開口した樹脂製の筒状支持部材と、該筒状支持部材における軸方向の上記一側の端面である第1端面の開口周縁部に、該第1端面の開口を覆うように固定された振動膜とを備えた、マイクロホンに用いられる振動膜ユニットの製造方法を対象として、上記筒状支持部材の第1端面の開口周縁部に、上記振動膜が固定された状態にする固定工程と、上記固定工程後に、上記筒状支持部材の径方向外側への変形を利用して、上記振動膜に所定のテンションを付与するテンション付与工程とを含むようにした。 In order to achieve the above object, according to the present invention, a cylindrical support member made of a resin having an opening in at least one side in the axial direction, and a first end face that is an end face on the one side in the axial direction of the cylindrical support member. Opening of the first end surface of the cylindrical support member for a method of manufacturing a vibrating membrane unit used in a microphone, comprising a vibrating membrane fixed to cover the opening of the first end surface at an opening periphery. A fixing step in which the vibrating membrane is fixed to a peripheral portion, and a predetermined tension is applied to the vibrating membrane using the deformation of the cylindrical support member outward in the radial direction after the fixing step. And a tension applying step.

 上記の方法により、固定工程において、筒状支持部材の第1端面の開口周縁部に振動膜が固定された状態となり、その後、テンション付与工程において、筒状支持部材が径方向外側へ変形することによって、振動膜が径方向外側へ引っ張られて、テンションが付与される。この結果、振動膜を引っ張るための掴み代は不要となり、振動膜の固定後にその掴み代をカットする作業は不要になる。また、振動膜を厚み方向に押圧して振動膜にテンションを付与する方法とは異なり、振動膜の、筒状支持部材における軸方向の位置が変化しないように振動膜にテンションを付与することができる。 By the above method, in the fixing step, the vibrating membrane is fixed to the opening peripheral edge portion of the first end surface of the cylindrical support member, and then the cylindrical support member is deformed radially outward in the tension applying step. Thus, the vibrating membrane is pulled outward in the radial direction, and tension is applied. As a result, a grip margin for pulling the diaphragm is not necessary, and an operation for cutting the grip margin after the diaphragm is fixed becomes unnecessary. Unlike the method of applying tension to the vibrating membrane by pressing the vibrating membrane in the thickness direction, tension can be applied to the vibrating membrane so that the axial position of the vibrating membrane in the cylindrical support member does not change. it can.

 上記振動膜ユニットの製造方法において、上記筒状支持部材は、その第1端面に、該筒状支持部材の内周面から外周面まで径方向に延びる所定の深さの複数の溝部が互いに周方向に間隔をあけて形成されていることで、該筒状支持部材の第1端面側の部分が周方向に並ぶ複数の分割部に分割されたものであり、上記固定工程は、上記筒状支持部材を、予め作製した振動膜と一体化されるように成型することで、上記筒状支持部材の第1端面の開口周縁部に、上記振動膜が固定された状態にする工程であり、上記テンション付与工程は、上記成型後の筒状支持部材の温度低下に伴って生じる、該筒状支持部材における上記各分割部の径方向外側への変形によって、上記振動膜に所定のテンションを付与する工程である、ことが好ましい。 In the method for manufacturing the diaphragm unit, the cylindrical support member has a plurality of grooves with a predetermined depth extending radially from the inner peripheral surface to the outer peripheral surface of the cylindrical support member. The first end surface side portion of the cylindrical support member is divided into a plurality of divided portions arranged in the circumferential direction by being formed at intervals in the direction, and the fixing step includes the cylindrical shape. The support member is formed so as to be integrated with the vibration film produced in advance, and the vibration film is fixed to the peripheral edge of the opening of the first end surface of the cylindrical support member. In the tension applying step, a predetermined tension is applied to the vibrating membrane by deformation of the cylindrical support member in the radial direction that occurs as the temperature of the cylindrical support member after molding decreases. It is preferable that it is a process to perform.

 このことにより、固定工程において、筒状支持部材が、その成型の過程で振動膜と一体化されるので、振動膜を筒状支持部材に固定するための接着剤は不要になる。ここで、接着剤により振動膜を筒状支持部材に固定する場合には、接着強度を維持しつつ接着剤のはみ出しを防止する観点から、接着剤の塗布量を管理する必要があり、また、その塗布量の誤差によって、振動膜の、筒状支持部材における軸方向の位置が変化するため、この変化を出来る限り抑えるためには、接着剤の塗布量を厳密に管理する必要がある。しかし、上記のように筒状支持部材を振動膜と一体化するようにすれば、振動膜を、接着剤を用いずに筒状支持部材に強固に固定することができる。したがって、接着剤の塗布量の管理が不要になるとともに、振動膜の、筒状支持部材における軸方向の位置が正確に決まる。 Thereby, in the fixing step, the cylindrical support member is integrated with the vibration film in the process of molding, and therefore, an adhesive for fixing the vibration film to the cylindrical support member becomes unnecessary. Here, when fixing the vibration film to the cylindrical support member with an adhesive, it is necessary to manage the amount of adhesive applied from the viewpoint of preventing the adhesive from protruding while maintaining the adhesive strength, The position of the vibrating membrane in the axial direction of the cylindrical support member changes due to the error in the amount of application. Therefore, in order to suppress this change as much as possible, it is necessary to strictly manage the amount of adhesive applied. However, if the cylindrical support member is integrated with the vibration film as described above, the vibration film can be firmly fixed to the cylindrical support member without using an adhesive. Therefore, management of the application amount of the adhesive is not necessary, and the axial position of the vibration film in the cylindrical support member is accurately determined.

 上記成型された筒状支持部材は、成型直後の高温から常温まで冷却されることになる。ここで、筒状支持部材における第1端面側の部分が複数の溝部によって互いに周方向に分割されてなる複数の分割部とされているので、筒状支持部材の冷却過程で、各分割部が径方向外側に変形しようとする。そこで、テンション付与工程において、この変形を利用することで、振動膜に所定のテンションを付与する。このように、筒状支持部材における各分割部が径方向外側に変形することによって、振動膜が径方向外側へ引っ張られて、振動膜に所定のテンションが付与される。振動膜に付与されるテンションの大きさは、筒状支持部材の各分割部における第1端面を構成する部分の変形量により決まる。この変形量は、主として、筒状支持部材における各分割部の肉厚、溝部の数及び深さ、並びに、筒状支持部材の樹脂材料及び成型条件により決まり、これらを、適切な大きさのテンションが得られるように、予め実験等により設定しておけばよい。したがって、振動膜に適切なテンションを容易に付与することができるようになる。 The molded cylindrical support member is cooled from a high temperature immediately after molding to a normal temperature. Here, since the portion on the first end face side of the cylindrical support member is a plurality of divided portions that are divided in the circumferential direction by a plurality of grooves, each divided portion is formed in the cooling process of the cylindrical support member. Trying to deform radially outward. Therefore, a predetermined tension is applied to the vibration film by utilizing this deformation in the tension applying step. As described above, the divided portions of the cylindrical support member are deformed radially outward, whereby the vibrating membrane is pulled radially outward and a predetermined tension is applied to the vibrating membrane. The magnitude of the tension applied to the vibration film is determined by the amount of deformation of the portion constituting the first end face in each divided portion of the cylindrical support member. The amount of deformation is mainly determined by the thickness of each divided portion of the cylindrical support member, the number and depth of the grooves, and the resin material and molding conditions of the cylindrical support member. May be set in advance by experiments or the like so as to obtain the above. Therefore, an appropriate tension can be easily applied to the vibration film.

 上記筒状支持部材の第1端面側の部分が周方向に並ぶ複数の分割部に分割されている場合、上記筒状支持部材は、上記各分割部の内周面に、該内周面を凹ませる肉盗み部が形成されたものである、ことが好ましい。 When the portion on the first end face side of the cylindrical support member is divided into a plurality of divided portions arranged in the circumferential direction, the cylindrical support member is arranged on the inner peripheral surface of each of the divided portions. It is preferable that the meat stealing part to be recessed is formed.

 このことで、各分割部の内周面に肉盗み部が形成されているので、筒状支持部材の冷却過程で、各分割部が径方向外側により一層変形し易くなる。各分割部の変形量は、肉盗み部による内周面の凹み量によっても調整することができる。よって、振動膜に所定のテンションをより確実にかつ容易に付与することができるようになる。 Thus, since the meat stealing portion is formed on the inner peripheral surface of each divided portion, each divided portion is more easily deformed more radially outward in the cooling process of the cylindrical support member. The amount of deformation of each divided portion can also be adjusted by the amount of depression on the inner peripheral surface by the meat stealing portion. Therefore, a predetermined tension can be more reliably and easily applied to the vibration film.

 或いは、上記振動膜ユニットの製造方法において、上記固定工程は、上記筒状支持部材における少なくとも第1端面側の端部を、押圧により径方向内側へ弾性変形させた状態で、該筒状支持部材の第1端面の開口周縁部に、上記振動膜を溶着又は接着剤により固定する工程であり、上記テンション付与工程は、上記押圧を解除して、該解除により生じる、上記筒状支持部材の弾性復元力による径方向外側への変形によって、上記振動膜に所定のテンションを付与する工程である、ことが好ましい。 Alternatively, in the method for manufacturing the vibration membrane unit, the fixing step includes the cylindrical support member in a state where at least an end portion on the first end face side of the cylindrical support member is elastically deformed radially inward by pressing. The vibration film is fixed to the peripheral edge of the opening of the first end surface of the first end surface by welding or an adhesive, and the tension applying step releases the pressure and generates elasticity of the cylindrical support member. It is preferable that it is a step of applying a predetermined tension to the vibrating membrane by deformation outward in the radial direction by a restoring force.

 このことにより、固定工程において、特に溶着により振動膜が筒状支持部材に固定される場合には、振動膜を、接着剤を用いずに筒状支持部材に強固に固定することができる。この固定時に、筒状支持部材における少なくとも第1端面側の端部が、押圧により径方向内側へ弾性変形した状態(つまり第1端面の開口周縁部の径が小さくなった状態)になっており、その押圧を解除すれば、筒状支持部材における少なくとも第1端面側の端部が弾性復元力によって径方向外側へ変形しようとする(第1端面の開口周縁部の径が拡大しようとする)。この筒状支持部材の弾性復元力による径方向外側への変形を利用すれば、筒状支持部材に溶着又は接着剤により固定された振動膜が径方向外側へ引っ張られて、テンションが付与されることになる。そこで、テンション付与工程において、筒状支持部材への上記押圧を解除すれば、振動膜にテンションを容易に付与することができる。振動膜に付与されるテンションの大きさは、筒状支持部材における第1端面側の端部の径方向内側への弾性変形量(径方向外側への弾性復元力)により決まり、この弾性変形量を、上記所定のテンションが得られるように、予め実験等により設定しておけばよい。したがって、振動膜に適切なテンションを容易に付与することができるようになる。 Thereby, in the fixing step, particularly when the vibration film is fixed to the cylindrical support member by welding, the vibration film can be firmly fixed to the cylindrical support member without using an adhesive. At the time of fixing, at least the end portion on the first end face side of the cylindrical support member is in a state of being elastically deformed radially inward by pressing (that is, the diameter of the opening peripheral edge portion of the first end face is reduced). When the pressing is released, at least the end portion on the first end face side of the cylindrical support member tends to be deformed radially outward by the elastic restoring force (the diameter of the opening peripheral edge portion of the first end face is to be increased). . If the deformation to the outside in the radial direction due to the elastic restoring force of the cylindrical support member is used, the vibration film fixed to the cylindrical support member by welding or adhesive is pulled outward in the radial direction, and tension is applied. It will be. Therefore, in the tension application step, if the above-described pressure on the cylindrical support member is released, tension can be easily applied to the vibration film. The magnitude of the tension applied to the vibration film is determined by the amount of elastic deformation (the elastic restoring force outward in the radial direction) of the end portion on the first end surface side of the cylindrical support member, and this amount of elastic deformation. May be set in advance by experiments or the like so as to obtain the predetermined tension. Therefore, an appropriate tension can be easily applied to the vibration film.

 或いは、上記振動膜ユニットの製造方法において、上記筒状支持部材は、その軸方向両側が開口したものであり、上記固定工程は、上記筒状支持部材の第1端面の開口周縁部に、上記振動膜を溶着又は接着剤により固定する工程であり、上記テンション付与工程は、上記筒状支持部材における第1端面とは反対側の端面である第2端面の開口から、外径が上記筒状支持部材の内径よりも大きいテンションリングを筒状支持部材内に挿入し、かつ、該テンションリングにより該筒状支持部材における少なくとも第1端面側の端部を、径方向外側へ変形させて、該変形によって、上記振動膜に所定のテンションを付与する工程である、ことが好ましい。 Alternatively, in the method of manufacturing the diaphragm unit, the cylindrical support member is opened on both axial sides thereof, and the fixing step is performed on the opening peripheral edge of the first end surface of the cylindrical support member. The vibration film is a step of fixing by welding or an adhesive, and the tension applying step is such that the outer diameter is the cylindrical shape from the opening of the second end surface that is the end surface opposite to the first end surface of the cylindrical support member. A tension ring larger than the inner diameter of the support member is inserted into the cylindrical support member, and at least a first end face side end portion of the cylindrical support member is deformed radially outward by the tension ring, It is preferable that the step of applying a predetermined tension to the vibrating membrane by deformation.

 このことにより、固定工程において、特に溶着により振動膜が筒状支持部材に固定される場合には、振動膜を、接着剤を用いずに筒状支持部材に強固に固定することができる。そして、テンション付与工程において、テンションリングにより筒状支持部材における第1端面側の端部を径方向外側へ変形させれば、筒状支持部材に溶着又は接着剤により固定された振動膜が径方向外側へ引っ張られて、テンションが付与される。振動膜に付与されるテンションの大きさは、筒状支持部材の内径、テンションリングの外径及び樹脂材料により決まり、これらを、適切な大きさのテンションが得られるように、予め実験等により設定しておけばよい。したがって、振動膜に適切なテンションを容易に付与することができるようになる。 Thereby, in the fixing step, particularly when the vibration film is fixed to the cylindrical support member by welding, the vibration film can be firmly fixed to the cylindrical support member without using an adhesive. Then, in the tension applying step, if the end portion on the first end face side of the cylindrical support member is deformed radially outward by the tension ring, the vibration film fixed to the cylindrical support member by welding or adhesive is radial. The tension is applied by pulling outward. The magnitude of the tension applied to the diaphragm is determined by the inner diameter of the cylindrical support member, the outer diameter of the tension ring, and the resin material, and these are set in advance by experiments to obtain an appropriate magnitude of tension. You just have to. Therefore, an appropriate tension can be easily applied to the vibration film.

 上記マイクロホンは、上記振動膜ユニット、LC発振回路、LC発振回路を構成するコイル、及び発振波を復調する回路で構成され、上記振動膜ユニットの振動膜が振動することにより上記コイルのインダクタンスが変化するように上記振動膜と上記コイルとが所定の間隔で保持され、該インダクタンスの変化によって変わるLC発振回路の発振周波数の変化を復調するようにした半導体マイクロホンであることが好ましい。 The microphone includes the diaphragm unit, an LC oscillation circuit, a coil that constitutes the LC oscillation circuit, and a circuit that demodulates the oscillation wave, and the inductance of the coil changes as the diaphragm of the diaphragm unit vibrates. Thus, the semiconductor microphone is preferably configured such that the vibration film and the coil are held at a predetermined interval, and the change in the oscillation frequency of the LC oscillation circuit that changes due to the change in the inductance is demodulated.

 このような半導体マイクロホンの場合には、振動膜とコイルとの間隔を正確に保持する必要があるが、本発明の振動膜ユニットの製造方法によれば、振動膜の、筒状支持部材における軸方向の位置が変化しないように振動膜に所定のテンションを付与することができるので、振動膜とコイルとの間隔を正確に決めることができ、よって、音響信号を精度良く検出することができる。 In the case of such a semiconductor microphone, it is necessary to accurately maintain the distance between the diaphragm and the coil. However, according to the method for manufacturing the diaphragm unit of the present invention, the shaft of the diaphragm in the cylindrical support member is used. Since a predetermined tension can be applied to the vibration film so that the position in the direction does not change, the distance between the vibration film and the coil can be determined accurately, so that an acoustic signal can be detected with high accuracy.

 上記半導体マイクロホンの場合、上記コイルを含むLC発振回路及び発振波を復調する回路は、上記筒状支持部材における第1端面とは反対側の端面である第2端面の側に配設された半導体部内に構成され、上記半導体部に対する複数の入出力端子が、該半導体部から上記振動膜とは反対側に突出して設けられ、該複数の入出力端子が、上記筒状支持部材の中心軸からの距離が互いに異なる位置にそれぞれ配設されていることが好ましい。 In the case of the semiconductor microphone, the LC oscillation circuit including the coil and the circuit for demodulating the oscillation wave are semiconductors disposed on the second end face side which is the end face opposite to the first end face in the cylindrical support member. A plurality of input / output terminals for the semiconductor portion projecting from the semiconductor portion on the opposite side to the vibrating membrane, and the plurality of input / output terminals extending from a central axis of the cylindrical support member. It is preferable that these distances are arranged at different positions.

 これにより、半導体マイクロホンが取り付けられる主基板において、複数の入出力端子がそれぞれ接続される複数の導電パターンを同心円状に形成しておくことで、筒状支持部材を、その中心が導電パターンの中心に位置するように主基板に取り付けるだけで、筒状支持部材の周方向の位置合わせを行うことなく、各入出力端子を各導電パターンにそれぞれ接続することが可能になる。 Thereby, in the main substrate to which the semiconductor microphone is attached, a plurality of conductive patterns to which a plurality of input / output terminals are respectively connected are formed concentrically so that the center of the cylindrical support member is the center of the conductive pattern. It is possible to connect each input / output terminal to each conductive pattern without aligning the cylindrical support member in the circumferential direction simply by attaching it to the main substrate so as to be positioned at the position.

 上記振動膜ユニットを用いて上記半導体マイクロホンを製造する方法においては、上記振動膜ユニットの筒状支持部材における第1端面とは反対側の端面である第2端面の側に、上記半導体部を、基板若しくは補助樹脂を介して、又は直接、固定する。 In the method of manufacturing the semiconductor microphone using the vibrating membrane unit, the semiconductor portion is disposed on the second end surface side that is the end surface opposite to the first end surface of the cylindrical support member of the vibrating membrane unit. It fixes through a board | substrate or auxiliary resin, or directly.

 以上説明したように、本発明の振動膜ユニットの製造方法によると、筒状支持部材の第1端面の開口周縁部に、振動膜が固定された状態にし、その後に、上記筒状支持部材の径方向外側への変形を利用して、上記振動膜に所定のテンションを付与するようにしたので、簡単な方法で、振動膜の、筒状支持部材における軸方向の位置が変化しないように振動膜にテンションを付与することができ、よって、本発明により製造した振動膜ユニットを用いて、音響信号を精度良く検出可能なマイクロホンを安価に製造することができるようになる。 As described above, according to the method for manufacturing the diaphragm unit of the present invention, the diaphragm is fixed to the opening peripheral edge of the first end surface of the cylindrical support member, and then the cylindrical support member is Since a predetermined tension is applied to the vibrating membrane by utilizing the outward deformation in the radial direction, vibration can be performed in a simple manner so that the axial position of the vibrating membrane in the cylindrical support member does not change. Tension can be applied to the membrane, and therefore a microphone capable of detecting an acoustic signal with high accuracy can be produced at low cost using the vibrating membrane unit produced according to the present invention.

本発明の実施形態1に係る製造方法により製造された振動膜ユニットを備えた半導体マイクロホンを示す断面図である。It is sectional drawing which shows the semiconductor microphone provided with the diaphragm unit manufactured by the manufacturing method which concerns on Embodiment 1 of this invention. 上記半導体マイクロホンを振動膜側から見た図である。It is the figure which looked at the said semiconductor microphone from the diaphragm side. 半導体内の回路構成を示す概略図である。It is the schematic which shows the circuit structure in a semiconductor. LC発振回路の一例であるハートレー型発振回路を示す回路図である。It is a circuit diagram which shows the Hartley type | mold oscillation circuit which is an example of LC oscillation circuit. 筒状支持部材を第1端面側から見た図である。It is the figure which looked at the cylindrical support member from the 1st end surface side. 筒状支持部材の側面図である。It is a side view of a cylindrical support member. LC発振回路のコイル部に共振電流が流れたときに発生する磁束と、振動膜の透磁性材料部との関係を示す概略図である。It is the schematic which shows the relationship between the magnetic flux which generate | occur | produces when the resonance current flows into the coil part of LC oscillation circuit, and the magnetic permeability material part of a diaphragm. 半導体マイクロホンが取り付けられる主基板上に形成された導電パターンを示す図である。It is a figure which shows the conductive pattern formed on the main board | substrate with which a semiconductor microphone is attached. 実施形態2において、筒状支持部材を環状治具の内部に嵌めた状態を示す断面図である。In Embodiment 2, it is sectional drawing which shows the state which fitted the cylindrical support member inside the annular jig. 上記環状治具の内部に嵌めた筒状支持部材を、第1端面側から見た図である。It is the figure which looked at the cylindrical support member fitted inside the said annular jig from the 1st end surface side. 実施形態3において、筒状支持部材の凹溝部にテンションリングを嵌めた状態を示す図である。In Embodiment 3, it is a figure which shows the state which fitted the tension ring in the ditch | groove part of the cylindrical support member. 実施形態4における半導体マイクロホンを示す断面図である。FIG. 6 is a cross-sectional view showing a semiconductor microphone according to a fourth embodiment. 実施形態5における半導体マイクロホンを示す断面図である。FIG. 10 is a cross-sectional view illustrating a semiconductor microphone according to a fifth embodiment. 実施形態6における半導体マイクロホンを示す断面図である。FIG. 10 is a cross-sectional view showing a semiconductor microphone according to a sixth embodiment.

 以下、本発明の実施形態を図面に基づいて詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

 (実施形態1)
 図1及び図2は、本発明の実施形態1に係る製造方法により製造された振動膜ユニット1を備えた半導体マイクロホンMを示す。この半導体マイクロホンMは、振動膜ユニット1と、基板2と、該基板2上に実装された半導体部3と、該半導体部3に対する複数の入出力端子4(本実施形態では、2つの電源端子と1つの出力信号端子とからなる)とを備えている。
(Embodiment 1)
1 and 2 show a semiconductor microphone M including a diaphragm unit 1 manufactured by the manufacturing method according to Embodiment 1 of the present invention. The semiconductor microphone M includes a diaphragm unit 1, a substrate 2, a semiconductor unit 3 mounted on the substrate 2, and a plurality of input / output terminals 4 (two power supply terminals in the present embodiment). And one output signal terminal).

 上記振動膜ユニット1は、軸方向の両側が開口した樹脂製の筒状支持部材11と、この筒状支持部材11の軸方向の一側(図1で、上側)の端面である第1端面12の開口周縁部に形成された凹部13に、該第1端面12の開口を覆うように固定された振動膜21とを備えている。振動膜21は、音響信号(音圧)を受けて振動する透磁性(又は導電性)の振動膜である。この振動膜21における後述の基材22の外周縁部が、筒状支持部材11の第1端面12の凹部13に固定されている。凹部13の深さは、基材22の厚みと略同じである。上記筒状支持部材11を構成する樹脂は、後述の如く振動膜21に所定のテンションを付与できれば、どのような樹脂であってもよい。また、本実施形態では、筒状支持部材11は円筒状であり、これに対応して、振動膜21は円形状であるが、このような形状には限られない。 The vibrating membrane unit 1 includes a resin-made cylindrical support member 11 that is open on both sides in the axial direction, and a first end surface that is an end surface on one side (upper side in FIG. 1) of the cylindrical support member 11 in the axial direction. The concave portion 13 formed at the peripheral edge of the opening 12 is provided with a vibration film 21 fixed so as to cover the opening of the first end face 12. The vibrating membrane 21 is a permeable (or conductive) vibrating membrane that vibrates in response to an acoustic signal (sound pressure). An outer peripheral edge portion of a base material 22 described later in the vibration film 21 is fixed to the concave portion 13 of the first end surface 12 of the cylindrical support member 11. The depth of the recess 13 is substantially the same as the thickness of the base material 22. The resin constituting the cylindrical support member 11 may be any resin as long as a predetermined tension can be applied to the vibration film 21 as will be described later. In the present embodiment, the cylindrical support member 11 has a cylindrical shape, and the vibration film 21 has a circular shape correspondingly, but is not limited to this shape.

 上記筒状支持部材11の第1端面12とは反対側(図1で、下側)の端面である第2端面14における開口周縁部には、凹部15が形成されており、この凹部15内に上記基板2が圧入により嵌め込まれて固定されている。この基板2により、第2端面14の開口が覆われている。また、凹部15の深さは、基板2の厚みと略同じである。尚、上記凹部15に、基板2を接着により固定してよく、圧入及び接着の両方により固定してよい。但し、接着剤は、その塗布量の管理が必要になるため、出来る限り使用しない方が好ましい。 A concave portion 15 is formed on the peripheral edge of the opening of the second end surface 14 which is the end surface opposite to the first end surface 12 of the cylindrical support member 11 (the lower side in FIG. 1). The substrate 2 is fitted and fixed by press-fitting. The substrate 2 covers the opening of the second end face 14. Further, the depth of the recess 15 is substantially the same as the thickness of the substrate 2. The substrate 2 may be fixed to the recess 15 by adhesion, or may be fixed by both press-fitting and adhesion. However, since it is necessary to manage the coating amount of the adhesive, it is preferable not to use it as much as possible.

 上記半導体部3は、筒状支持部材11の第2端面14の側に配設されている。すなわち、半導体部3は、筒状支持部材11の第2端面14の凹部15に固定された基板2の振動膜21側の面(図1で、上面)上に実装されている。この半導体部3と振動膜21との間隔(詳しくは、後述のコイル部32と振動膜21の透磁性材料部23との間隔)は、所定の間隔に保持されている。半導体部3の中心は、筒状支持部材11の中心軸と略一致する。 The semiconductor portion 3 is disposed on the second end face 14 side of the cylindrical support member 11. That is, the semiconductor portion 3 is mounted on the surface (the upper surface in FIG. 1) of the substrate 2 that is fixed to the concave portion 15 of the second end surface 14 of the cylindrical support member 11. The distance between the semiconductor part 3 and the vibration film 21 (specifically, the distance between a coil part 32 described later and the magnetically permeable material part 23 of the vibration film 21) is maintained at a predetermined distance. The center of the semiconductor part 3 substantially coincides with the central axis of the cylindrical support member 11.

 上記複数(3つ)の入出力端子4は、半導体部3から振動膜21とは反対側に突出して設けられている。本実施形態では、各入出力端子4は、基板2の厚み方向に貫通するスルーホール2aに支持されていて、その先端面が、基板2における振動膜21とは反対側の面(図1で、下面)に臨んでいる。これら入出力端子4は、筒状支持部材11の中心軸(基板2の中心軸でもあり、半導体マイクロホンMの中心軸でもある)からの距離が互いに異なる位置にそれぞれ配設されている。一方、半導体マイクロホンMが取り付けられる主基板25(図8参照)上には、複数の入出力端子4がそれぞれ接続される複数(3つ)の導電パターン26が形成されている。これら複数の導電パターン26は、主基板25において同心円状に形成されており、各導電パターン26の径が、各入出力端子4の上記中心軸からの距離とそれぞれ同じに設定されている。これにより、筒状支持部材11を、その中心が導電パターン26の中心に位置するように主基板25に取り付けるだけで、筒状支持部材11の周方向の位置合わせを行うことなく、各入出力端子4を各導電パターン26にそれぞれ接続することが可能になる。また、複数の入出力端子4を半導体部3から振動膜21とは反対側に突出させて主基板25に接続させることで、ワイヤボンディングによる配線に比べて半導体マイクロホンMの小型化が可能である。尚、複数の入出力端子4は、筒状支持部材11の中心軸からの距離が互いに異なる位置にそれぞれ配設されていれば、筒状支持部材11の周方向のどこに位置していてもよい。 The plurality of (three) input / output terminals 4 are provided so as to protrude from the semiconductor portion 3 to the side opposite to the vibrating membrane 21. In the present embodiment, each input / output terminal 4 is supported by a through hole 2a penetrating in the thickness direction of the substrate 2 and its front end surface is a surface opposite to the vibrating membrane 21 in the substrate 2 (in FIG. 1). Facing the bottom surface. These input / output terminals 4 are respectively arranged at different positions from the central axis of the cylindrical support member 11 (which is also the central axis of the substrate 2 and the central axis of the semiconductor microphone M). On the other hand, a plurality (three) of conductive patterns 26 to which the plurality of input / output terminals 4 are respectively connected are formed on the main substrate 25 (see FIG. 8) to which the semiconductor microphone M is attached. The plurality of conductive patterns 26 are formed concentrically on the main substrate 25, and the diameter of each conductive pattern 26 is set to be the same as the distance from the central axis of each input / output terminal 4. As a result, the cylindrical support member 11 is attached to the main substrate 25 so that the center thereof is located at the center of the conductive pattern 26, and each input / output is performed without aligning the cylindrical support member 11 in the circumferential direction. The terminal 4 can be connected to each conductive pattern 26. Further, by projecting the plurality of input / output terminals 4 from the semiconductor portion 3 to the opposite side of the vibration film 21 and connecting the input / output terminals 4 to the main substrate 25, the semiconductor microphone M can be reduced in size as compared with wiring by wire bonding. . The plurality of input / output terminals 4 may be located anywhere in the circumferential direction of the cylindrical support member 11 as long as the distance from the central axis of the cylindrical support member 11 is different from each other. .

 上記半導体部3内には、図3に示すように、コイル部32及びコンデンサ33を含みかつコイル部32及びコンデンサ33によって発振周波数が決まるLC発振回路31と、その発振波から電気的音声信号を抽出して、該抽出した電気的音声信号を、上記複数の入出力端子4のうちの出力信号端子を介して、アナログ出力信号として外部へ出力するFM復調回路37とが構成されている。半導体部3は、これらの回路を樹脂で封止してなるものである。尚、デジタル出力信号を必要とする場合には、図3に二点鎖線で示すように、外部から半導体部3に供給される変調基準入力信号によってアナログ出力信号を変調してデジタル出力信号として出力する変調回路38を追加すればよい。この場合、入出力端子4として、変調基準入力信号用の入力信号端子が追加され、アナログ出力信号に加えて、デジタル出力信号も出力させる場合には、デジタル出力信号用の出力信号端子が追加されることになる。 As shown in FIG. 3, the semiconductor unit 3 includes a coil unit 32 and a capacitor 33, and an LC oscillation circuit 31 whose oscillation frequency is determined by the coil unit 32 and the capacitor 33, and an electrical audio signal from the oscillation wave. An FM demodulating circuit 37 configured to extract and output the extracted electrical audio signal as an analog output signal via the output signal terminal of the plurality of input / output terminals 4 is configured. The semiconductor part 3 is formed by sealing these circuits with a resin. When a digital output signal is required, as shown by a two-dot chain line in FIG. 3, the analog output signal is modulated by a modulation reference input signal supplied to the semiconductor unit 3 from the outside and output as a digital output signal. A modulation circuit 38 to be used may be added. In this case, an input signal terminal for a modulation reference input signal is added as the input / output terminal 4, and when outputting a digital output signal in addition to an analog output signal, an output signal terminal for a digital output signal is added. Will be.

 上記LC発振回路31は、ハートレー型、コルピッツ型、ベース同調型、コレクタ同調型等の種々の発振回路を用いることができるが、ここでは、図4に示すハートレー型発振回路を例として説明する。 The LC oscillation circuit 31 may be a variety of oscillation circuits such as a Hartley type, a Colpitts type, a base tuning type, and a collector tuning type. Here, the Hartley type oscillation circuit shown in FIG. 4 will be described as an example.

 LC発振回路31には、その発振周波数が100MHz程度以上数100MHz程度以下となるようなインダクタンス値及びキャパシタンス値をそれぞれ持つコイル部32及びコンデンサ33が用いられる。ここで、図4では、コイル部32は、第1コイル32aと第2コイル32bとで構成される。 The LC oscillation circuit 31 includes a coil portion 32 and a capacitor 33 having an inductance value and a capacitance value, respectively, such that the oscillation frequency is about 100 MHz to several hundred MHz. Here, in FIG. 4, the coil part 32 is comprised by the 1st coil 32a and the 2nd coil 32b.

 LC発振回路31に使用するトランジスタ34も、コイル部32及びコンデンサ33と共に半導体部3内に構成される。コンデンサ33のキャパシタンス値は固定である。電源は、通常、図4のA点(+側)とB点(-側)との間に配設される。 The transistor 34 used in the LC oscillation circuit 31 is also configured in the semiconductor unit 3 together with the coil unit 32 and the capacitor 33. The capacitance value of the capacitor 33 is fixed. The power source is usually disposed between point A (+ side) and point B (− side) in FIG.

 コイル部32の第1コイル32aと振動膜21(詳しくは、透磁性材料部23)との間隔、及び、第2コイル32bと振動膜21(透磁性材料部23)との間隔は、同じであって、上記所定の間隔に保持されている。この所定の間隔は、LC発振回路31が発振することによりコイル部32に共振電流が流れたときに発生する磁束41(図7参照)が到達する距離以内(例えば0.1mm以上0.5mm以下)に設定される。 The distance between the first coil 32a and the vibration film 21 (specifically, the magnetically permeable material part 23) of the coil part 32 and the distance between the second coil 32b and the vibration film 21 (the magnetically permeable material part 23) are the same. Thus, the predetermined interval is maintained. This predetermined interval is within a distance (for example, 0.1 mm or more and 0.5 mm or less) that the magnetic flux 41 (see FIG. 7) generated when the resonance current flows through the coil unit 32 by the oscillation of the LC oscillation circuit 31 is reached. ).

 上記振動膜21は、基材22と、この基材22における半導体部3側の面(図1で、下面)にスパッタリングにより設けられた透磁性材料部23とからなる。基材22は、厚さ数μm以上数十μm以下の平板状の薄膜であって、10mm程度以上100mm程度以下の面積を有するとともに、約250℃以上300℃以下の雰囲気の中に30秒以上60秒程度以下の間放置しても実用に支障のない範囲の変形しか起こさない耐熱特性を持つフィルム材(例えばポリイミド系フィルム)で構成することが好ましい。上記透磁性材料部23は、基材22における半導体部3(コイル部32)と対向する部分、又は、基材22における、振動膜21の振動による曲がりが殆ど生じない中央部に設けられることが好ましい。本実施形態では、透磁性材料部23が、基材22における半導体部3(コイル部32)と対向する部分であって基材22の中央部に設けられる(透磁性材料部23の中心及び半導体部3の中心が筒状支持部材11の中心軸と略一致する)。 The vibration film 21 includes a base material 22 and a magnetically permeable material portion 23 provided on the surface of the base material 22 on the semiconductor unit 3 side (the lower surface in FIG. 1) by sputtering. The substrate 22 is a flat thin film having a thickness of several μm to several tens of μm, has an area of about 10 mm 2 to about 100 mm 2 , and 30 in an atmosphere of about 250 ° C. to 300 ° C. It is preferable to use a film material (for example, a polyimide film) having a heat resistance property that only causes deformation within a range that does not hinder practical use even if left for about 60 seconds or more for about 2 seconds or less. The magnetically permeable material portion 23 may be provided in a portion of the base material 22 facing the semiconductor portion 3 (coil portion 32) or a central portion of the base material 22 where bending due to vibration of the vibration film 21 hardly occurs. preferable. In the present embodiment, the magnetically permeable material portion 23 is provided in the central portion of the base material 22, which is a portion facing the semiconductor portion 3 (coil portion 32) in the base material 22 (the center of the magnetic permeable material portion 23 and the semiconductor). The center of the portion 3 substantially coincides with the central axis of the cylindrical support member 11).

 上記透磁性材料部23は、厚さ数μmから数十μmであって、上記発振周波数帯において空気よりも遥かに大きな透磁率を有する透磁性材料(例えばフェライト系材料やパーマロイ系材料等)からなる。 The magnetically permeable material portion 23 has a thickness of several μm to several tens of μm and is made of a magnetically permeable material (for example, a ferrite material or a permalloy material) having a permeability much higher than air in the oscillation frequency band. Become.

 図5及び図6に示すように、上記筒状支持部材11の第1端面12には、該筒状支持部材11の内周面から外周面まで径方向に延びる所定の深さの複数の溝部16が互いに周方向に間隔をあけて形成されている。これら溝部16の形成により、筒状支持部材11の第1端面12側の部分が、周方向に並ぶ複数(溝部16と同じ数)の分割部17に分割されることになる。各分割部17の内周面には、本実施形態のように、該内周面を凹ませる肉盗み部18が形成されていることが好ましい。本実施形態では、各分割部17の肉盗み部18は、断面半円形状で筒状支持部材11の軸方向に延びている。各肉盗み部18は、後に説明する筒状支持部材11の成型後の冷却過程で各分割部17を径方向外側に変形させ易く(反らせ易く)するために形成したものである。各分割部17を径方向外側に変形させ易くすることが可能であれば、各分割部17の内周面をどのような形状で凹ませてもよい。尚、肉盗み部18は必ずしも必要ではなく、肉盗み部18がなくても、通常は、筒状支持部材11の成型後の冷却過程で各分割部17が径方向外側に変形する。 As shown in FIGS. 5 and 6, the first end surface 12 of the cylindrical support member 11 has a plurality of grooves having a predetermined depth extending in the radial direction from the inner peripheral surface to the outer peripheral surface of the cylindrical support member 11. 16 are formed at intervals in the circumferential direction. With the formation of these groove portions 16, the portion on the first end face 12 side of the cylindrical support member 11 is divided into a plurality (the same number as the groove portions 16) of divided portions 17 arranged in the circumferential direction. It is preferable that a meat stealing portion 18 for recessing the inner peripheral surface is formed on the inner peripheral surface of each divided portion 17 as in the present embodiment. In the present embodiment, the meat stealing portion 18 of each divided portion 17 has a semicircular cross section and extends in the axial direction of the cylindrical support member 11. Each meat stealing portion 18 is formed in order to easily deform (easily warp) each divided portion 17 radially outward in a cooling process after molding of the cylindrical support member 11 described later. As long as it is possible to easily deform each divided portion 17 radially outward, the inner peripheral surface of each divided portion 17 may be recessed in any shape. Note that the meat stealing portion 18 is not always necessary, and even if the meat stealing portion 18 is not provided, each divided portion 17 is usually deformed radially outward in the cooling process after the cylindrical support member 11 is molded.

 上記筒状支持部材11における各分割部17の肉厚、溝部16の数及び深さ、並びに、肉盗み部18による内周面の凹み量は、筒状支持部材11の成型後の冷却過程で振動膜21に所定のテンションが付与されるように、筒状支持部材11の樹脂材料及び成型条件と合わせて、それぞれ決定される。上記所定のテンションは、音圧の変化を電気信号に忠実に変換できるような値であり、振動膜21の最大振幅が数μmとなるような値である。溝部16の数(つまり分割部17の数)は8~16程度が好ましく、本実施形態のように各分割部17に肉盗み部18を形成する場合、各分割部17における肉盗み部18による内周面の凹み量は、0を超えかつ分割部17の厚みの半分以下が好ましい。溝部16の幅(相隣接する分割部17の間隔)は、溝部16を成型で形成可能な幅でかつ出来る限り小さくすることが好ましい。このように振動膜21には、所定のテンションが付与されて、音圧の変化を電気信号に忠実に変換できるようになっている。 The thickness of each divided portion 17 in the cylindrical support member 11, the number and depth of the groove portions 16, and the amount of depression of the inner peripheral surface by the meat stealing portion 18 are determined in the cooling process after the cylindrical support member 11 is molded. It is determined together with the resin material of the cylindrical support member 11 and the molding conditions so that a predetermined tension is applied to the vibration film 21. The predetermined tension is a value that can faithfully convert a change in sound pressure into an electric signal, and is a value such that the maximum amplitude of the vibrating membrane 21 is several μm. The number of groove portions 16 (that is, the number of divided portions 17) is preferably about 8 to 16, and when the meat stealing portions 18 are formed in each divided portion 17 as in the present embodiment, the number of groove portions 16 depends on the meat stealing portions 18 in each divided portion 17. The amount of depression on the inner peripheral surface is preferably more than 0 and not more than half of the thickness of the divided portion 17. It is preferable that the width of the groove portion 16 (the interval between the adjacent divided portions 17) is as small as possible so that the groove portion 16 can be formed by molding. In this way, a predetermined tension is applied to the vibration film 21 so that a change in sound pressure can be faithfully converted into an electric signal.

 半導体マイクロホンMの音響検出は、振動膜21に入力される音響信号(音圧)により振動膜21が振動することによって振動膜21と半導体部3との間隔が変化することを利用する。 The sound detection of the semiconductor microphone M utilizes the fact that the distance between the vibration film 21 and the semiconductor unit 3 is changed by the vibration of the vibration film 21 due to an acoustic signal (sound pressure) input to the vibration film 21.

 図7を用いてその音響検出動作を説明する。LC発振回路31が発振することによりコイル部32に共振電流が流れて磁束41が発生するが、その磁束41の到達距離内に透磁性材料部23が配置されているので、磁束41の一部が透磁性材料部23内を通ることになる。 The sound detection operation will be described with reference to FIG. When the LC oscillation circuit 31 oscillates, a resonance current flows through the coil portion 32 and a magnetic flux 41 is generated. However, since the magnetically permeable material portion 23 is disposed within the reach distance of the magnetic flux 41, a part of the magnetic flux 41 is generated. Will pass through the magnetically permeable material portion 23.

 磁束41の一部が透磁性材料部23内を通ることによりコイル部32のインダクタンスが増加し、透磁性材料部23が配置されていない場合に比べLC発振回路31の発振周波数が低くなる。そして、振動膜21が無音響時の定位置よりもコイル部32に対して近付いた場合、つまり、振動膜21とコイル部32との間隔が小さくなった場合には、透磁性材料部23内を通る磁束41が多くなり、これにより、振動膜21が定位置にある場合に比べコイル部32のインダクタンスが増大して、LC発振回路31の発振周波数がより低くなる。一方、振動膜21が上記定位置よりもコイル部32に対して遠ざかった場合、つまり、振動膜21とコイル部32との間隔が大きくなった場合には、透磁性材料部23内を通る磁束41が少なくなり、この結果、振動膜21が定位置にある場合に比べコイル部32のインダクタンスが減少して、LC発振回路31の発振周波数が高くなる。 When part of the magnetic flux 41 passes through the magnetically permeable material part 23, the inductance of the coil part 32 increases, and the oscillation frequency of the LC oscillation circuit 31 becomes lower than when the magnetically permeable material part 23 is not disposed. When the vibrating membrane 21 comes closer to the coil portion 32 than the fixed position when there is no sound, that is, when the distance between the vibrating membrane 21 and the coil portion 32 becomes smaller, the inside of the magnetically permeable material portion 23 As a result, the inductance of the coil portion 32 is increased and the oscillation frequency of the LC oscillation circuit 31 is further lowered as compared with the case where the vibrating membrane 21 is in a fixed position. On the other hand, when the vibrating membrane 21 is further away from the coil portion 32 than the fixed position, that is, when the distance between the vibrating membrane 21 and the coil portion 32 is increased, the magnetic flux passing through the magnetically permeable material portion 23. As a result, the inductance of the coil portion 32 is reduced and the oscillation frequency of the LC oscillation circuit 31 is increased as compared with the case where the vibrating membrane 21 is in a fixed position.

 上記透磁性材料部23に代えて、上記発振周波数帯において電気抵抗が十分に低い導電性材料(例えば銅等)からなる導電性材料部を設けることも可能である。この場合には、磁束41の一部が導電性材料部に到達すると、導電性材料部に渦電流が発生して磁束41の一部が消費され、これにより、コイル部32のインダクタンスが減少し、導電性材料部が配置されていない場合に比べLC発振回路31の発振周波数が高くなる。そして、振動膜21が無音響時の定位置よりもコイル部32に対して近付いた場合には、導電性材料部に到達する磁束41が多くなり、これにより、導電性材料部に発生する渦電流が増加して、磁束41の消費が増加し、この結果、コイル部32のインダクタンスが減少して、LC発振回路31の発振周波数がより高くなる。一方、振動膜21が上記定位置よりもコイル部32に対して遠ざかった場合、導電性材料部内を通る磁束41が少なくなり、これにより、導電性材料部に発生する渦電流が減少して、磁束41の消費が減少し、この結果、コイル部32のインダクタンスが増加して、LC発振回路31の発振周波数が低くなる。 Instead of the magnetically permeable material portion 23, it is also possible to provide a conductive material portion made of a conductive material (for example, copper or the like) having a sufficiently low electric resistance in the oscillation frequency band. In this case, when a part of the magnetic flux 41 reaches the conductive material part, an eddy current is generated in the conductive material part and a part of the magnetic flux 41 is consumed, thereby reducing the inductance of the coil part 32. The oscillation frequency of the LC oscillation circuit 31 is higher than when no conductive material portion is disposed. When the vibrating membrane 21 comes closer to the coil portion 32 than the fixed position when there is no sound, the magnetic flux 41 that reaches the conductive material portion increases, and thereby the vortex generated in the conductive material portion. As the current increases, the consumption of the magnetic flux 41 increases. As a result, the inductance of the coil section 32 decreases, and the oscillation frequency of the LC oscillation circuit 31 becomes higher. On the other hand, when the vibrating membrane 21 is further away from the coil portion 32 than the fixed position, the magnetic flux 41 passing through the conductive material portion is reduced, thereby reducing the eddy current generated in the conductive material portion, As a result, the consumption of the magnetic flux 41 is reduced, and as a result, the inductance of the coil section 32 is increased and the oscillation frequency of the LC oscillation circuit 31 is lowered.

 上記透磁性材料としては、上記導電性材料部に発生するような渦電流の影響を防止する観点から、出来る限り電気抵抗が高い材料を選択することが有効である。また、透磁性材料部23の厚みが薄すぎて磁気飽和が起こると、振動膜21とコイル部32との間隔の変化に伴うインダクタンスの変化が小さくなるので、透磁性材料部23を、磁気飽和を起こさない程度の厚みにするとともに、飽和磁束密度が大きな材料で構成することが好ましい。 As the magnetically permeable material, it is effective to select a material having as high an electrical resistance as possible from the viewpoint of preventing the influence of eddy current generated in the conductive material portion. In addition, if the magnetic permeable material portion 23 is too thin and magnetic saturation occurs, the change in inductance accompanying the change in the distance between the vibration film 21 and the coil portion 32 becomes small. It is preferable to use a material having a high saturation magnetic flux density and a thickness that does not cause the occurrence of magnetic field.

 上記導電性材料としては、高透磁率が発振周波数を低下させて、導電性材料部に発生する渦電流による周波数上昇を阻害するので、透磁率が出来る限り小さい材料を選択することが有効である。また、導電性材料部の厚みは、透磁性材料部23と同様に、数μmから数十μmであればよいが、100MHz程度以上数100MHz程度以下の渦電流が流れるような厚みにする必要がある。導電性材料が銅である場合には、100MHzの高周波電流が流れる深さは約7μmであり、500MHzの高周波電流が流れる深さは約3μmであるので、導電性材料部の厚みの最小値は7μm程度である。 As the conductive material, it is effective to select a material having the smallest possible magnetic permeability because the high magnetic permeability lowers the oscillation frequency and inhibits the frequency increase due to the eddy current generated in the conductive material portion. . The thickness of the conductive material portion may be several μm to several tens of μm as in the case of the magnetically permeable material portion 23, but it is necessary to make the thickness such that an eddy current of about 100 MHz to about several 100 MHz flows. is there. When the conductive material is copper, the depth at which the high frequency current of 100 MHz flows is about 7 μm, and the depth at which the high frequency current of 500 MHz flows is about 3 μm, so the minimum value of the thickness of the conductive material portion is It is about 7 μm.

 次に、上記のような半導体マイクロホンMに用いられる振動膜ユニット1の製造方法を説明する。 Next, a method for manufacturing the diaphragm unit 1 used in the semiconductor microphone M as described above will be described.

 まず、振動膜21の基材22となるフィルム(例えばイミドフィルム)を用意する。このフィルムは、振動膜21として予め決められた面積よりも大きい面積を有する。そして、このフィルム上の全体に、透磁性材料をスパッタリングし、その後、そのスパッタリングした透磁性材料のうち不要部分をエッチング(ドライエッチング又はウェットエッチング)により取り除き、こうして、透磁性材料部23を形成する。続いて、上記フィルムを、予め決められた面積にカットすることで、基材22と、該基材22の略中央に設けられた透磁性材料部23とからなる振動膜21が完成する。尚、基材22の略中央に導電性材料部を設ける場合も、透磁性材料部23を設ける場合と同様にすればよい。 First, a film (for example, an imide film) to be the base material 22 of the vibration film 21 is prepared. This film has an area larger than the area predetermined as the vibration film 21. Then, a magnetically permeable material is sputtered on the entire film, and then unnecessary portions of the sputtered permeable material are removed by etching (dry etching or wet etching), thereby forming the permeable material portion 23. . Subsequently, by cutting the film into a predetermined area, the vibration film 21 including the base material 22 and the magnetically permeable material portion 23 provided at the approximate center of the base material 22 is completed. In addition, what is necessary is just to carry out similarly to the case where the magnetic permeability material part 23 is provided also when providing a conductive material part in the approximate center of the base material 22.

 尚、上記基材22に透磁性材料部23(又は導電性材料部)を形成する方法は、スパッタリング及びエッチングに限らず、透磁性材料(又は導電性材料)を塗布したり、透磁性材料(又は導電性材料)からなるシートを貼付したりするようにしてもよい。 Note that the method of forming the magnetically permeable material portion 23 (or the conductive material portion) on the base material 22 is not limited to sputtering and etching, and a magnetically permeable material (or conductive material) is applied or a magnetically permeable material ( Alternatively, a sheet made of a conductive material) may be attached.

 次いで、筒状支持部材11を、上記作製した振動膜21と一体化されるように成型することで、筒状支持部材11の第1端面12の凹部13に、振動膜21が固定された状態にする。すなわち、筒状支持部材11を成型するための金型のキャビティにおける第1端面12に対応する部位に、上記作製した振動膜21をセットした状態で、キャビティ内に溶融樹脂を充填して筒状支持部材11を成型(射出成形)する。この成型時に、振動膜21の基材22においてエッチングにより粗くなった表面の微少凹部内に、上記溶融樹脂が入り込むことによって、成型後における筒状支持部材11の第1端面12の凹部13に振動膜21が強固に固定された状態になる。 Next, the vibrating membrane 21 is fixed to the concave portion 13 of the first end surface 12 of the cylindrical supporting member 11 by molding the cylindrical supporting member 11 so as to be integrated with the produced vibrating membrane 21. To. That is, the cavity is filled with a molten resin in a state where the vibration film 21 thus prepared is set in a portion corresponding to the first end face 12 in the cavity of the mold for molding the cylindrical support member 11. The support member 11 is molded (injection molding). At the time of molding, the molten resin enters a minute concave portion on the surface of the base material 22 of the vibration film 21 that has become rough due to etching, so that the concave portion 13 of the first end surface 12 of the cylindrical support member 11 is vibrated after molding. The film 21 is firmly fixed.

 上記溶融樹脂が固化された後、成型された筒状支持部材11(振動膜21と一体化された筒状支持部材11)が上記金型から取り出される。この金型から取り出された直後の筒状支持部材11の温度は、常温よりもかなり高い温度(例えば200℃程度)にある。 After the molten resin is solidified, the molded cylindrical support member 11 (the cylindrical support member 11 integrated with the vibration film 21) is taken out from the mold. The temperature of the cylindrical support member 11 immediately after being taken out from the mold is considerably higher than room temperature (for example, about 200 ° C.).

 そして、筒状支持部材11の温度は、自然冷却により高温から常温へと低下していく。この温度低下に伴って、筒状支持部材11の各分割部17が、その内周面に形成された肉盗み部18によって、径方向外側に変形しようとする。この各分割部17の径方向外側への変形量は、第1端面12側ほど大きく、筒状支持部材11の各分割部17における第1端面12を構成する部分の径方向外側への変形量が最も大きくなる。この各分割部17における第1端面12を構成する部分(振動膜21が固定された部分)の径方向外側への変形量は、主として、筒状支持部材11における各分割部17の肉厚、溝部16の数及び深さ、肉盗み部18による内周面の凹み量、並びに、筒状支持部材11の樹脂材料及び成型条件により決まり、これらを、振動膜21に上記所定のテンションが付与されるように予め決定しているので、筒状支持部材11の温度が常温になったときには、振動膜21に上記所定のテンションが付与されていることになる。こうして、所定のテンションが付与された振動膜21を備えた振動膜ユニット1が完成する。 And the temperature of the cylindrical support member 11 decreases from high temperature to room temperature by natural cooling. Along with this temperature decrease, each divided portion 17 of the cylindrical support member 11 tends to be deformed radially outward by the meat stealing portion 18 formed on the inner peripheral surface thereof. The amount of deformation of each divided portion 17 outward in the radial direction is larger toward the first end surface 12 side, and the amount of deformation of the portion constituting the first end surface 12 in each divided portion 17 of the cylindrical support member 11 outward in the radial direction is increased. Is the largest. The amount of deformation of the portion constituting the first end face 12 in each divided portion 17 (the portion to which the vibration film 21 is fixed) radially outward is mainly the thickness of each divided portion 17 in the cylindrical support member 11, The number and depth of the groove portions 16, the amount of recess in the inner peripheral surface by the meat stealing portion 18, and the resin material and molding conditions of the cylindrical support member 11 are determined, and these are given the predetermined tension to the vibration film 21. Therefore, when the temperature of the cylindrical support member 11 reaches room temperature, the predetermined tension is applied to the vibrating membrane 21. In this way, the diaphragm unit 1 including the diaphragm 21 to which a predetermined tension is applied is completed.

 上記の如く製造した振動膜ユニット1を用いて半導体マイクロホンMを製造するには、上記振動膜ユニット1の筒状支持部材11における第2端面14の側に、上記半導体部3を基板2を介して固定する。具体的には、振動膜ユニット1における筒状支持部材11の第2端面14の凹部15内に、予め半導体部3を実装しておいた基板2を圧入により嵌め込んで固定する。尚、上記凹部15に、基板2を接着により固定する場合には、凹部15に接着剤を、予め決められた量だけ塗布した後に、凹部15に基板2を嵌め込む。こうして、半導体マイクロホンMが完成する。 In order to manufacture the semiconductor microphone M using the diaphragm unit 1 manufactured as described above, the semiconductor unit 3 is placed on the second end face 14 side of the cylindrical support member 11 of the diaphragm unit 1 with the substrate 2 interposed therebetween. And fix. Specifically, the substrate 2 on which the semiconductor unit 3 is mounted in advance is fitted and fixed in the recess 15 of the second end surface 14 of the cylindrical support member 11 in the diaphragm unit 1 by press fitting. When the substrate 2 is fixed to the recess 15 by bonding, the substrate 2 is fitted into the recess 15 after applying a predetermined amount of adhesive to the recess 15. Thus, the semiconductor microphone M is completed.

 上記半導体マイクロホンMを主基板25に取り付ける際、半導体マイクロホンMの筒状支持部材11を、その中心が主基板25上の導電パターン26の中心に位置するようにすればよい。このために、例えば、主基板25における導電パターン26の中心位置に位置決め用孔を形成するとともに、基板2に、その位置決め用孔に嵌合する位置決めピンを設けておけばよい。 When the semiconductor microphone M is attached to the main substrate 25, the cylindrical support member 11 of the semiconductor microphone M may be positioned at the center of the conductive pattern 26 on the main substrate 25. For this purpose, for example, a positioning hole may be formed at the center position of the conductive pattern 26 in the main substrate 25 and a positioning pin that fits into the positioning hole may be provided on the substrate 2.

 したがって、本実施形態では、筒状支持部材11を、予め作製した振動膜21と一体化されるように成型することで、筒状支持部材11の第1端面12の凹部13に、振動膜21が固定された状態にし、その後、その成型後の筒状支持部材11の温度低下に伴って生じる、該筒状支持部材11における各分割部17の径方向外側への変形によって、振動膜21に所定のテンションを付与するようにして、振動膜ユニット1を製造したので、各分割部17の径方向外側への変形を利用して、振動膜21に所定のテンションを容易に付与することができるとともに、振動膜21を厚み方向に押圧して振動膜21にテンションを付与する方法とは異なり、振動膜21の、筒状支持部材11における軸方向の位置が変化しないように振動膜21にテンションを付与することができる。この結果、上記のように製造した振動膜ユニット1は、半導体部3と振動膜21との間隔が音響検出に重要である半導体マイクロホンMに好適に用いることができる。 Therefore, in this embodiment, the cylindrical support member 11 is molded so as to be integrated with the vibration film 21 produced in advance, so that the vibration film 21 is formed in the concave portion 13 of the first end surface 12 of the cylindrical support member 11. Is fixed, and then the diaphragm 21 is deformed outwardly in the radial direction of the divided portions 17 in the cylindrical support member 11 which occurs as the temperature of the cylindrical support member 11 after the molding decreases. Since the vibrating membrane unit 1 is manufactured so as to apply a predetermined tension, the predetermined tension can be easily applied to the vibrating membrane 21 by using the deformation of each divided portion 17 outward in the radial direction. At the same time, unlike the method of applying tension to the vibrating membrane 21 by pressing the vibrating membrane 21 in the thickness direction, the vibrating membrane 21 is attached to the vibrating membrane 21 so that the position of the vibrating membrane 21 in the axial direction on the cylindrical support member 11 does not change. Deployment can be imparted. As a result, the diaphragm unit 1 manufactured as described above can be suitably used for the semiconductor microphone M in which the distance between the semiconductor unit 3 and the diaphragm 21 is important for acoustic detection.

 また、筒状支持部材11が、その成型の過程で振動膜21と一体化されるので、振動膜21を筒状支持部材11に固定するための接着剤は不要になる。これにより、振動膜21を、接着剤を用いずに筒状支持部材11に強固に固定することができるとともに、接着剤の塗布量の管理が不要になる。しかも、接着剤を介在しないので、振動膜21の、筒状支持部材11における軸方向の位置がより一層正確に決まり、この点からも、上記のように製造した振動膜ユニット1は、半導体マイクロホンMに好適に用いることができる。よって、音響信号を精度良く検出可能な半導体マイクロホンMを安価に製造することができる。 Further, since the cylindrical support member 11 is integrated with the vibration film 21 in the process of molding, an adhesive for fixing the vibration film 21 to the cylindrical support member 11 is not necessary. Thereby, the vibration film 21 can be firmly fixed to the cylindrical support member 11 without using an adhesive, and management of the application amount of the adhesive becomes unnecessary. In addition, since no adhesive is present, the position of the vibrating membrane 21 in the axial direction of the cylindrical support member 11 is determined more accurately. From this point also, the vibrating membrane unit 1 manufactured as described above is a semiconductor microphone. It can be suitably used for M. Therefore, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.

 (実施形態2)
 本実施形態では、振動膜ユニット1の製造方法が上記実施形態1とは異なる。これに関連して、本実施形態では、筒状支持部材11の各分割部17の内周面に、上記実施形態1のような肉盗み部18が形成されていない。その他の構成は、上記実施形態1と同様である。
(Embodiment 2)
In the present embodiment, the manufacturing method of the diaphragm unit 1 is different from that of the first embodiment. In this connection, in the present embodiment, the meat stealing portion 18 as in the first embodiment is not formed on the inner peripheral surface of each divided portion 17 of the cylindrical support member 11. Other configurations are the same as those of the first embodiment.

 本実施形態の振動膜ユニット1の製造方法を説明する。 A method for manufacturing the diaphragm unit 1 of the present embodiment will be described.

 上記実施形態1と同様にして、振動膜21を作製する。また、振動膜21の作製とは別個に、筒状支持部材11を成型する。尚、本実施形態では、筒状支持部材11は、成型に限らず、例えば切削により作製することも可能である。但し、多数の筒状支持部材11を低コストで作製できる点で、成型が有利である。 The vibrating membrane 21 is produced in the same manner as in the first embodiment. In addition, the cylindrical support member 11 is molded separately from the production of the vibration film 21. In the present embodiment, the cylindrical support member 11 is not limited to molding, and can be manufactured by cutting, for example. However, molding is advantageous in that many cylindrical support members 11 can be manufactured at low cost.

 続いて、図9及び図10に示すように、筒状支持部材11を環状治具51の内部に嵌める。この環状治具の内周面は、筒状支持部材11の外径と略同じ内径(筒状支持部材11の外径よりも僅かに大きい内径)を有しかつ環状治具51の軸方向において内径が一定であるストレート部51aと、このストレート部51aに対して環状治具51の軸方向一側に連続して位置しかつストレート部51aとは反対側に向かって径が小さくなるテーパ部51bとを有する。テーパ部51bは、筒状支持部材11全体を環状治具51の内部に嵌めたときに、筒状支持部材11の全分割部17を一様に径方向内側へ押圧するようになっている。 Subsequently, as shown in FIGS. 9 and 10, the cylindrical support member 11 is fitted into the annular jig 51. The inner peripheral surface of the annular jig has an inner diameter that is substantially the same as the outer diameter of the cylindrical support member 11 (an inner diameter that is slightly larger than the outer diameter of the cylindrical support member 11), and in the axial direction of the annular jig 51. A straight portion 51a having a constant inner diameter, and a tapered portion 51b that is continuously located on one side in the axial direction of the annular jig 51 with respect to the straight portion 51a and whose diameter decreases toward the opposite side of the straight portion 51a. And have. The tapered portion 51b is configured to uniformly press all the divided portions 17 of the cylindrical support member 11 radially inward when the entire cylindrical support member 11 is fitted inside the annular jig 51.

 上記環状治具51のストレート部51a側の開口から、筒状支持部材11を、その第1端面12の側を前側にして環状治具51の内部に挿入し、最終的に、筒状支持部材11全体を環状治具51の内部に嵌める。これにより、筒状支持部材11の各分割部17が、テーパ部51bによって径方向内側へ押圧されて、径方向内側へ弾性変形した状態となる。 The cylindrical support member 11 is inserted into the annular jig 51 from the opening on the straight portion 51a side of the annular jig 51 with the first end face 12 side being the front side, and finally the cylindrical support member. 11 is fitted inside the annular jig 51. Thereby, each division part 17 of the cylindrical support member 11 is pressed radially inward by the taper part 51b, and is in a state of being elastically deformed radially inward.

 次いで、上記弾性変形した状態で、上記作製した筒状支持部材11の第1端面12の凹部13に、上記作製した振動膜21を溶着により固定する。この溶着により、筒状支持部材11の第1端面12の凹部13に振動膜21が強固に固定される。 Next, in the state of elastic deformation, the produced vibration membrane 21 is fixed to the recess 13 of the first end face 12 of the produced cylindrical support member 11 by welding. By this welding, the vibration film 21 is firmly fixed to the recess 13 of the first end surface 12 of the cylindrical support member 11.

 次に、振動膜21を固定した筒状支持部材11を環状治具51から外して、各分割部17の径方向内側への押圧を解除する。この解除により、各分割部17は、その弾性復元力により径方向外側へ変形しようとする(元の状態に戻ろうとする)。この各分割部17の弾性復元力による径方向外側への変形によって、振動膜21に所定のテンションが付与されることになる。こうして、振動膜ユニット1が完成する。 Next, the cylindrical support member 11 to which the vibration film 21 is fixed is removed from the annular jig 51, and the pressure on the radially inner side of each divided portion 17 is released. By this release, each divided portion 17 tries to deform outward (in an attempt to return to its original state) by its elastic restoring force. A predetermined tension is applied to the vibrating membrane 21 by the deformation of each divided portion 17 outward in the radial direction by the elastic restoring force. Thus, the diaphragm unit 1 is completed.

 本実施形態では、振動膜21に付与されるテンションの大きさは、各分割部17における第1端面12を構成する部分の径方向内側への弾性変形量(径方向外側への弾性復元力)により決まり、この弾性変形量(各分割部17の肉厚、溝部の数及び深さ、並びに、樹脂材料によって変わる)を、上記所定のテンションが得られるように、予め実験等により設定しておけばよい。 In the present embodiment, the magnitude of the tension applied to the vibrating membrane 21 is the amount of elastic deformation inward in the radial direction of the portion constituting the first end face 12 in each divided portion 17 (elastic restoring force outward in the radial direction). The amount of elastic deformation (which varies depending on the thickness of each divided portion 17, the number and depth of the groove portions, and the resin material) can be set in advance by experiments or the like so as to obtain the predetermined tension. That's fine.

 尚、上記所定のテンションを付与できるような弾性復元力が得られるように、筒状支持部材11における少なくとも第1端面12側の端部を径方向内側へ弾性変形させることができるのであれば、溝部16(分割部17)がなくてもよい。但し、溝部16は、筒状支持部材11の内部と外部とを連通して振動膜21の振動特性が悪化するのを防止する役割も有しているため、溝部16をなくした場合には、筒状支持部材11に、その内部と外部とを連通する連通孔を設けることが好ましい。 In addition, as long as at least the end portion on the first end face 12 side of the cylindrical support member 11 can be elastically deformed radially inward so as to obtain an elastic restoring force capable of applying the predetermined tension, The groove part 16 (dividing part 17) may not be present. However, since the groove portion 16 also has a role of preventing the vibration characteristics of the vibration film 21 from deteriorating by communicating the inside and the outside of the cylindrical support member 11, when the groove portion 16 is eliminated, The tubular support member 11 is preferably provided with a communication hole that communicates the inside and the outside.

 また、上記のような環状治具51以外にも、筒状支持部材11における少なくとも第1端面側の端部を押圧しかつ該押圧を解除できるものであれば、どのような治具を用いてもよい。 In addition to the annular jig 51 as described above, any jig can be used as long as it can press at least the end portion on the first end face side of the cylindrical support member 11 and release the press. Also good.

 上記製造した振動膜ユニット1を用いて半導体マイクロホンMを製造する方法は、上記実施形態1と同様である。 The method of manufacturing the semiconductor microphone M using the manufactured diaphragm unit 1 is the same as that of the first embodiment.

 したがって、本実施形態では、環状治具51により、筒状支持部材11の各分割部17を径方向内側へ押圧して各分割部17を径方向内側へ弾性変形させた状態で、筒状支持部材11の第1端面12の凹部13に、振動膜21を溶着により固定し、その後、上記押圧を解除して、該解除により生じる、上記筒状支持部材11の各分割部17の弾性復元力による径方向外側への変形によって、上記振動膜21に所定のテンションを付与するようにして、振動膜ユニット1を製造したので、上記実施形態1と同様に、各分割部17の径方向外側への変形を利用して、振動膜21に所定のテンションを容易に付与することができるとともに、振動膜21の、筒状支持部材11における軸方向の位置が変化しないように振動膜21にテンションを付与することができる。また、溶着により振動膜21を筒状支持部材11に固定するので、接着剤が不要になり、振動膜21の、筒状支持部材11における軸方向の位置がより一層正確に決まる。そして、このように製造した振動膜ユニット1を用いて、音響信号を精度良く検出可能な半導体マイクロホンMを安価に製造することができる。 Therefore, in the present embodiment, the cylindrical support is performed with the annular jig 51 pressing each divided portion 17 of the cylindrical support member 11 radially inward to elastically deform each divided portion 17 radially inward. The vibration film 21 is fixed to the concave portion 13 of the first end surface 12 of the member 11 by welding, and then the pressure is released, and the elastic restoring force of each divided portion 17 of the cylindrical support member 11 generated by the release. Since the diaphragm unit 1 is manufactured so as to apply a predetermined tension to the diaphragm 21 by deformation to the outside in the radial direction, as in the first embodiment, radially outward of each divided portion 17. By utilizing this deformation, a predetermined tension can be easily applied to the vibration film 21 and tension is applied to the vibration film 21 so that the axial position of the vibration film 21 in the cylindrical support member 11 does not change. With It can be. Further, since the vibration film 21 is fixed to the cylindrical support member 11 by welding, an adhesive is not necessary, and the axial position of the vibration film 21 in the tubular support member 11 is determined more accurately. And the semiconductor microphone M which can detect an acoustic signal accurately can be manufactured cheaply using the vibration membrane unit 1 manufactured in this way.

 尚、本実施形態では、振動膜21を筒状支持部材11に溶着により固定したが、接着剤により振動膜21を筒状支持部材11に固定してもよい。この場合、接着剤の塗布量を管理する必要はあるが、振動膜21を厚み方向に押圧して振動膜21にテンションを付与する方法に比べて、振動膜21の、筒状支持部材11における軸方向の位置が正確に決まる。 In this embodiment, the vibration film 21 is fixed to the cylindrical support member 11 by welding. However, the vibration film 21 may be fixed to the cylindrical support member 11 with an adhesive. In this case, it is necessary to manage the application amount of the adhesive, but compared with the method of applying tension to the vibration film 21 by pressing the vibration film 21 in the thickness direction, the vibration film 21 in the cylindrical support member 11 is controlled. The axial position is determined accurately.

 (実施形態3)
 本実施形態では、振動膜ユニット1の製造方法が上記実施形態1及び2とは異なる。これに関連して、本実施形態では、筒状支持部材11の各分割部17の内周面に、上記実施形態1のような肉盗み部18が形成されてはいないが、図11に示すように、後述のテンションリング55が嵌められる凹溝部19が、筒状支持部材11の周方向に延びるように形成されている。各分割部17の凹溝部19は、筒状支持部材11の軸方向において同じ位置(筒状支持部材11の内周面における第1端面12側の端部)に、筒状支持部材11の周方向に連なるように形成されている(但し、溝部16で途切れている)。その他の構成は、上記実施形態1と同様である。
(Embodiment 3)
In the present embodiment, the manufacturing method of the diaphragm unit 1 is different from those of the first and second embodiments. In this regard, in the present embodiment, the meat stealing portion 18 as in the first embodiment is not formed on the inner peripheral surface of each divided portion 17 of the cylindrical support member 11, but is shown in FIG. 11. As described above, the recessed groove portion 19 into which a tension ring 55 described later is fitted is formed so as to extend in the circumferential direction of the cylindrical support member 11. The concave groove portion 19 of each divided portion 17 is arranged at the same position in the axial direction of the cylindrical support member 11 (the end portion on the first end surface 12 side on the inner peripheral surface of the cylindrical support member 11). It is formed to be continuous in the direction (however, it is interrupted at the groove 16). Other configurations are the same as those of the first embodiment.

 本実施形態の振動膜ユニット1の製造方法を説明する。 A method for manufacturing the diaphragm unit 1 of the present embodiment will be described.

 上記実施形態2と同様にして、振動膜21と筒状支持部材11とを別々に作製する。本実施形態においても、上記実施形態2と同様に、筒状支持部材11は、成型に限らず、例えば切削により作製することも可能である。 In the same manner as in the second embodiment, the vibrating membrane 21 and the cylindrical support member 11 are separately manufactured. Also in this embodiment, similarly to the second embodiment, the cylindrical support member 11 is not limited to molding, and can be manufactured by, for example, cutting.

 続いて、上記作製した筒状支持部材11の第1端面12の凹部13に、上記作製した振動膜21を溶着により固定する。この溶着時に、筒状支持部材11の各分割部17が径方向に変形しないようにする。この溶着により、筒状支持部材11の第1端面12の凹部13に振動膜21が強固に固定される。 Subsequently, the produced vibration membrane 21 is fixed to the recess 13 of the first end surface 12 of the produced cylindrical support member 11 by welding. At the time of this welding, each divided portion 17 of the cylindrical support member 11 is prevented from being deformed in the radial direction. By this welding, the vibration film 21 is firmly fixed to the recess 13 of the first end surface 12 of the cylindrical support member 11.

 次いで、筒状支持部材11の第2端面14の開口からテンションリング55を挿入する。このテンションリング55の外径は、凹溝部19の箇所を含めて筒状支持部材11の内径よりも大きい。本実施形態では、テンションリング55は、その周方向の一部が切り離された略C字状をなしており、これにより、テンションリング55を筒状支持部材11の内径よりも小さくなるように縮径することができて、テンションリング55の筒状支持部材11内への挿入が容易になる。そして、テンションリング55を、縮径した状態で筒状支持部材11内に挿入して、テンションリング55を凹溝部19に嵌める。すると、テンションリング55がその弾性復元力により拡径しようとするため、このテンションリング55により、筒状支持部材11の第1端面12側の端部が径方向外側へ変形させられる。この変形によって振動膜21に所定のテンションが付与されることになる。こうして、振動膜ユニット1が完成する。 Next, the tension ring 55 is inserted from the opening of the second end face 14 of the cylindrical support member 11. The outer diameter of the tension ring 55 is larger than the inner diameter of the cylindrical support member 11 including the concave groove portion 19. In the present embodiment, the tension ring 55 has a substantially C shape with a part in the circumferential direction cut off, and thus the tension ring 55 is contracted to be smaller than the inner diameter of the cylindrical support member 11. The tension ring 55 can be easily inserted into the cylindrical support member 11. Then, the tension ring 55 is inserted into the cylindrical support member 11 with the diameter reduced, and the tension ring 55 is fitted into the concave groove portion 19. Then, since the tension ring 55 tries to expand its diameter by its elastic restoring force, the end portion on the first end face 12 side of the cylindrical support member 11 is deformed radially outward by the tension ring 55. Due to this deformation, a predetermined tension is applied to the vibration film 21. Thus, the diaphragm unit 1 is completed.

 本実施形態では、振動膜21に付与されるテンションの大きさは、筒状支持部材11における凹溝部19の箇所の内径、テンションリング55の外径、及び樹脂材料により決まり、これらを、上記所定のテンションが得られるように、予め実験等により設定しておけばよい。 In the present embodiment, the magnitude of the tension applied to the vibration film 21 is determined by the inner diameter of the concave groove portion 19 in the cylindrical support member 11, the outer diameter of the tension ring 55, and the resin material. It may be set in advance by experiments or the like so as to obtain the tension.

 尚、凹溝部19は必ずしも必要ではなく、凹溝部19がなければ、テンションリング55の縮径量は少なくて済み、この結果、テンションリング55が完全なリング状であっても、筒状支持部材11内へ挿入することができるようになる。一方、凹溝部19を設けることで、テンションリング55が筒状支持部材11の軸方向にずれるのを防止することができ、このずれによる振動膜21のテンションの変化を防止することができる。 The concave groove portion 19 is not necessarily required. If the concave groove portion 19 is not provided, the amount of diameter reduction of the tension ring 55 may be small. As a result, even if the tension ring 55 is a complete ring shape, the cylindrical support member 11 can be inserted. On the other hand, by providing the recessed groove portion 19, it is possible to prevent the tension ring 55 from being displaced in the axial direction of the cylindrical support member 11, and it is possible to prevent a change in the tension of the vibration film 21 due to this deviation.

 また、上記のようなテンションリング55に限らず、筒状支持部材11における少なくとも第1端面12側の端部を径方向外側へ変形させることが可能なものであれば、どのようなものであってもよい。 Further, not limited to the tension ring 55 as described above, any member can be used as long as at least the end portion on the first end face 12 side of the cylindrical support member 11 can be deformed radially outward. May be.

 上記製造した振動膜ユニット1を用いて半導体マイクロホンMを製造する方法は、上記実施形態1と同様である。 The method of manufacturing the semiconductor microphone M using the manufactured diaphragm unit 1 is the same as that of the first embodiment.

 したがって、本実施形態では、筒状支持部材11の第1端面12の凹部13に、振動膜21を溶着により固定し、その後、筒状支持部材11の第2端面14の開口から、外径が筒状支持部材11(凹溝部19の箇所を含む)の内径よりも大きいテンションリング55を筒状支持部材11内に挿入し、かつ、該テンションリング55により筒状支持部材11の第1端面12側の端部を、径方向外側へ変形させて、該変形によって、振動膜21に所定のテンションを付与するようにして、振動膜ユニット1を製造したので、上記実施形態1及び2と同様に、各分割部17の径方向外側への変形を利用して、振動膜21に所定のテンションを容易に付与することができるとともに、振動膜21の、筒状支持部材11における軸方向の位置が変化しないように振動膜21にテンションを付与することができる。また、溶着により振動膜21を筒状支持部材11に固定するので、接着剤が不要になり、振動膜21の、筒状支持部材11における軸方向の位置がより一層正確に決まる。そして、このように製造した振動膜ユニット1を用いて、音響信号を精度良く検出可能な半導体マイクロホンMを安価に製造することができる。 Therefore, in this embodiment, the diaphragm 21 is fixed to the recess 13 of the first end surface 12 of the cylindrical support member 11 by welding, and then the outer diameter is from the opening of the second end surface 14 of the cylindrical support member 11. A tension ring 55 larger than the inner diameter of the cylindrical support member 11 (including the concave groove portion 19) is inserted into the cylindrical support member 11, and the first end surface 12 of the cylindrical support member 11 is inserted by the tension ring 55. Since the vibrating membrane unit 1 is manufactured by deforming the end portion on the side radially outward and applying a predetermined tension to the vibrating membrane 21 by the deformation, the same as in the first and second embodiments. A predetermined tension can be easily applied to the vibrating membrane 21 by utilizing the deformation of each divided portion 17 in the radial direction, and the axial position of the vibrating membrane 21 in the cylindrical support member 11 is determined. Change It is possible to impart tension to the oddly vibrating membrane 21. Further, since the vibration film 21 is fixed to the cylindrical support member 11 by welding, an adhesive is not necessary, and the axial position of the vibration film 21 in the tubular support member 11 is determined more accurately. And the semiconductor microphone M which can detect an acoustic signal accurately can be manufactured cheaply using the vibration membrane unit 1 manufactured in this way.

 尚、本実施形態では、振動膜21を筒状支持部材11に溶着により固定したが、上記実施形態2で説明したように、接着剤により振動膜21を筒状支持部材11に固定してもよい。 In the present embodiment, the vibration film 21 is fixed to the cylindrical support member 11 by welding. However, as described in the second embodiment, the vibration film 21 may be fixed to the cylindrical support member 11 with an adhesive. Good.

 (実施形態4)
 図12に示すように、本実施形態では、半導体部3を、基板2を介さずに直接、筒状支持部材11の第2端面14の側に固定するようにしたものであり、このため、基板2が存在せず、入出力端子4は、半導体部3の封止樹脂に支持されている。また、筒状支持部材11の第2端面14の側の形状が、上記実施形態2とは異なる。その他の構成は、上記実施形態2と同様である。
(Embodiment 4)
As shown in FIG. 12, in this embodiment, the semiconductor part 3 is directly fixed to the second end face 14 side of the cylindrical support member 11 without the substrate 2 interposed therebetween. The substrate 2 does not exist, and the input / output terminal 4 is supported by the sealing resin of the semiconductor unit 3. Further, the shape of the cylindrical support member 11 on the second end face 14 side is different from that of the second embodiment. Other configurations are the same as those of the second embodiment.

 すなわち、本実施形態では、振動膜ユニット1の筒状支持部材11の内周面における第2端面14側の端部が内側に張り出していて、第2端面14の開口の面積が、第1端面12の開口の面積よりも小さくなっている。第2端面14の開口周縁部には、凹部61が形成されており、この凹部61内に半導体部3が固定されて、第2端面14の開口を覆っている。凹部61の深さは、半導体部3の厚みと略同じである。半導体部3の固定は、半導体部3を凹部61内に圧入することにより行うが、接着による固定又は圧入及び接着の両方による固定であってもよい。 That is, in the present embodiment, the end portion on the second end surface 14 side of the inner peripheral surface of the cylindrical support member 11 of the vibration membrane unit 1 protrudes inward, and the area of the opening of the second end surface 14 is the first end surface. It is smaller than the area of 12 openings. A recess 61 is formed in the opening peripheral edge of the second end face 14, and the semiconductor part 3 is fixed in the recess 61 to cover the opening of the second end face 14. The depth of the recess 61 is substantially the same as the thickness of the semiconductor portion 3. The semiconductor part 3 is fixed by press-fitting the semiconductor part 3 into the recess 61, but may be fixed by bonding or fixed by both press-fitting and bonding.

 本実施形態の振動膜ユニット1の製造方法は、上記実施形態2と同様である。尚、筒状支持部材11の第2端面14の開口の面積が第1端面12の開口の面積よりも小さくなっていることから、上記実施形態1及び3の方法は、実用的ではない。 The manufacturing method of the diaphragm unit 1 of the present embodiment is the same as that of the second embodiment. In addition, since the area of the opening of the 2nd end surface 14 of the cylindrical support member 11 is smaller than the area of the opening of the 1st end surface 12, the method of the said Embodiment 1 and 3 is not practical.

 完成した振動膜ユニット1を用いて半導体マイクロホンMを製造するには、振動膜ユニット1の筒状支持部材11における第2端面14の側に、上記半導体部3を直接固定する。具体的には、振動膜ユニット1における筒状支持部材11の第2端面14の凹部61内に、半導体部3を圧入により嵌め込んで固定する。尚、凹部61に、半導体部3を接着により固定する場合には、凹部61に接着剤を、予め決められた量だけ塗布した後に、凹部61に半導体部3を嵌め込む。こうして、音響信号を精度良く検出可能な半導体マイクロホンMを安価に製造することができる。 To manufacture the semiconductor microphone M using the completed diaphragm unit 1, the semiconductor unit 3 is directly fixed to the second end face 14 side of the tubular support member 11 of the diaphragm unit 1. Specifically, the semiconductor portion 3 is fitted and fixed in the recess 61 of the second end surface 14 of the cylindrical support member 11 in the vibration membrane unit 1 by press-fitting. In addition, when fixing the semiconductor part 3 to the recessed part 61 by adhesion | attachment, after apply | coating the predetermined amount of adhesives to the recessed part 61, the semiconductor part 3 is engage | inserted in the recessed part 61. FIG. In this way, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.

 (実施形態5)
 図13に示すように、本実施形態においても、上記実施形態4と同様に、半導体部3を、基板2を介さずに直接、筒状支持部材11の第2端面14の側に固定するようにしたものである。但し、筒状支持部材11の第2端面14の側の形状が、上記実施形態4とは異なる。その他の構成は、上記実施形態4と同様である。
(Embodiment 5)
As shown in FIG. 13, also in the present embodiment, the semiconductor unit 3 is directly fixed to the second end face 14 side of the cylindrical support member 11 without using the substrate 2 as in the fourth embodiment. It is a thing. However, the shape of the cylindrical support member 11 on the second end face 14 side is different from that of the fourth embodiment. Other configurations are the same as those in the fourth embodiment.

 すなわち、本実施形態では、振動膜ユニット1の筒状支持部材11は、第1端面12の側のみが開口した有底筒状をなしている。この筒状支持部材11における開口が存在しない第2端面14の中心部に凹部62が形成されており、この凹部62内に半導体部3が固定されている。凹部62の深さは、半導体部3の厚みと略同じである。半導体部3の固定は、半導体部3を凹部62内に圧入することにより行うが、接着による固定又は圧入及び接着の両方による固定であってもよい。 That is, in the present embodiment, the cylindrical support member 11 of the diaphragm unit 1 has a bottomed cylindrical shape in which only the first end face 12 side is open. A recess 62 is formed at the center of the second end surface 14 where no opening exists in the cylindrical support member 11, and the semiconductor portion 3 is fixed in the recess 62. The depth of the recess 62 is substantially the same as the thickness of the semiconductor portion 3. The semiconductor part 3 is fixed by press-fitting the semiconductor part 3 into the recess 62, but may be fixed by adhesion or by both press-fitting and adhesion.

 本実施形態の振動膜ユニット1の製造方法は、上記実施形態2と同様である。尚、第2端面14に開口が存在しないことから、上記実施形態1及び3の方法を実行するのは不可能である。 The manufacturing method of the diaphragm unit 1 of the present embodiment is the same as that of the second embodiment. In addition, since there is no opening in the 2nd end surface 14, it is impossible to perform the method of the said Embodiment 1 and 3. FIG.

 完成した振動膜ユニット1を用いて半導体マイクロホンMを製造するには、振動膜ユニット1の筒状支持部材11における第2端面14の側に、上記半導体部3を直接固定する。この固定方法は、上記実施形態4と同様である。こうして、音響信号を精度良く検出可能な半導体マイクロホンMを安価に製造することができる。 To manufacture the semiconductor microphone M using the completed diaphragm unit 1, the semiconductor unit 3 is directly fixed to the second end face 14 side of the tubular support member 11 of the diaphragm unit 1. This fixing method is the same as that in the fourth embodiment. In this way, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.

 (実施形態6)
 図14に示すように、本実施形態では、半導体部3を、実施形態1の基板2に代えて、補助樹脂65を介して、筒状支持部材11の第2端面14の側に固定するようにしたものである。本実施形態においても、上記実施形態4と同様に、入出力端子4は、半導体部3の封止樹脂に支持されている。その他の構成は上記実施形態1と同様である(但し、筒状支持部材11の第2端面14の開口周縁部に凹部は形成されていない)。
(Embodiment 6)
As shown in FIG. 14, in the present embodiment, the semiconductor unit 3 is fixed to the second end surface 14 side of the cylindrical support member 11 via the auxiliary resin 65 instead of the substrate 2 of the first embodiment. It is a thing. Also in this embodiment, the input / output terminal 4 is supported by the sealing resin of the semiconductor unit 3 as in the fourth embodiment. Other configurations are the same as those of the first embodiment (however, no recess is formed in the opening peripheral edge of the second end surface 14 of the cylindrical support member 11).

 すなわち、本実施形態では、補助樹脂65は、その中央部に補助樹脂65の厚み方向に貫通する貫通孔66を有するリング状をなしていて、上記実施形態1と同様の形状をなす筒状支持部材11の第2端面14の開口に圧入されて固定されている。尚、補助樹脂65を、上記実施形態1の基板2と同様に、筒状支持部材11の第2端面14の開口周縁部に形成した凹部に圧入により固定するようにしてもよい。また、圧入に代えて、接着、又は、圧入及び接着の両方により補助樹脂65を筒状支持部材11に固定するようにしてもよい。 In other words, in the present embodiment, the auxiliary resin 65 has a ring shape having a through hole 66 penetrating in the thickness direction of the auxiliary resin 65 in the center thereof, and is a cylindrical support that has the same shape as in the first embodiment. The member 11 is fixed by being press-fitted into the opening of the second end surface 14 of the member 11. Note that the auxiliary resin 65 may be fixed by press-fitting into a recessed portion formed in the opening peripheral edge portion of the second end surface 14 of the cylindrical support member 11, similarly to the substrate 2 of the first embodiment. Further, instead of press-fitting, the auxiliary resin 65 may be fixed to the cylindrical support member 11 by bonding, or by both press-fitting and bonding.

 補助樹脂65の厚み方向一側の面(筒状支持部材11に固定されたときに、振動膜21とは反対側となる面)における貫通孔66の開口周縁部には、凹部67が形成され、この凹部67内に半導体部3が圧入(又は、接着、若しくは、圧入及び接着の両方)により固定されて、貫通孔66の開口を覆っている。尚、補助樹脂65は、筒状支持部材11と同じ材料であってもよく、異なる材料であってもよい。 A concave portion 67 is formed in the opening peripheral edge portion of the through-hole 66 on the surface on one side in the thickness direction of the auxiliary resin 65 (the surface on the side opposite to the vibration film 21 when fixed to the cylindrical support member 11). The semiconductor portion 3 is fixed in the recess 67 by press-fitting (or bonding, or both press-fitting and bonding), and covers the opening of the through-hole 66. The auxiliary resin 65 may be the same material as the cylindrical support member 11 or a different material.

 本実施形態の振動膜ユニット1の製造方法は、上記実施形態1と同様である。尚、筒状支持部材11を上記実施形態2又は3と同様の形状にして、実施形態2又は3と同様の方法で振動膜ユニット1を製造してもよい。すなわち、補助樹脂65の固定前では、第2端面14の開口の面積が第1端面12の開口の面積と同じであるので、上記実施形態4及び5とは異なり、実施形態2の方法だけでなく、実施形態1及び3の方法も実行可能であり、振動膜ユニット1の製造の自由度が増す。 The manufacturing method of the diaphragm unit 1 of the present embodiment is the same as that of the first embodiment. The diaphragm support unit 11 may be manufactured in the same manner as in the second or third embodiment, with the cylindrical support member 11 having the same shape as in the second or third embodiment. That is, before the auxiliary resin 65 is fixed, the area of the opening of the second end face 14 is the same as the area of the opening of the first end face 12, and therefore, unlike the fourth and fifth embodiments, only the method of the second embodiment. In addition, the methods of Embodiments 1 and 3 can be performed, and the degree of freedom in manufacturing the diaphragm unit 1 is increased.

 完成した振動膜ユニット1を用いて半導体マイクロホンMを製造するには、振動膜ユニット1の筒状支持部材11における第2端面14の側に、半導体部3を補助樹脂65を介して固定する。具体的には、振動膜ユニット1の製造とは別個に補助樹脂65を作製する。この補助樹脂65の作製は、成型により行うことが好ましいが、切削により作製することも可能である。続いて、補助樹脂65の凹部67に半導体部3を圧入により固定する。その後、この半導体部3を固定した補助樹脂65を、筒状支持部材11における第2端面14の開口に圧入により固定する。こうして、音響信号を精度良く検出可能な半導体マイクロホンMを安価に製造することができる。 To manufacture the semiconductor microphone M using the completed diaphragm unit 1, the semiconductor unit 3 is fixed to the second end face 14 side of the tubular support member 11 of the diaphragm unit 1 with an auxiliary resin 65. Specifically, the auxiliary resin 65 is produced separately from the manufacture of the diaphragm unit 1. The auxiliary resin 65 is preferably produced by molding, but can also be produced by cutting. Subsequently, the semiconductor part 3 is fixed to the concave part 67 of the auxiliary resin 65 by press-fitting. Thereafter, the auxiliary resin 65 to which the semiconductor portion 3 is fixed is fixed to the opening of the second end surface 14 of the cylindrical support member 11 by press fitting. In this way, the semiconductor microphone M that can accurately detect the acoustic signal can be manufactured at low cost.

 本発明は、上記実施形態に限られるものではなく、請求の範囲の主旨を逸脱しない範囲で代用が可能である。 The present invention is not limited to the above embodiment, and can be substituted without departing from the spirit of the claims.

 例えば、上記実施形態では、振動膜ユニット1の振動膜21が振動することによりLC発振回路31のコイル部32のインダクタンスが変化するように振動膜21とコイル部32とが所定の間隔で保持され、該インダクタンスの変化によって変わるLC発振回路31の発振周波数の変化を復調するようにした半導体マイクロホンMに用いる振動膜ユニット1の製造方法に本発明を適用した例を示したが、本発明は、他のマイクロホン(例えばコンデンサマイクロホン)に用いる振動膜ユニット1の製造方法にも適用することができる。 For example, in the above embodiment, the vibrating membrane 21 and the coil portion 32 are held at a predetermined interval so that the inductance of the coil portion 32 of the LC oscillation circuit 31 changes when the vibrating membrane 21 of the vibrating membrane unit 1 vibrates. An example in which the present invention is applied to the method of manufacturing the vibrating membrane unit 1 used in the semiconductor microphone M that demodulates the change in the oscillation frequency of the LC oscillation circuit 31 that changes according to the change in the inductance is shown. The present invention can also be applied to a method of manufacturing the diaphragm unit 1 used for other microphones (for example, condenser microphones).

 上述の実施形態は単なる例示に過ぎず、本発明の範囲を限定的に解釈してはならない。本発明の範囲は請求の範囲によって定義され、請求の範囲の均等範囲に属する変形や変更は、全て本発明の範囲内のものである。 The above-described embodiment is merely an example, and the scope of the present invention should not be interpreted in a limited manner. The scope of the present invention is defined by the scope of the claims, and all modifications and changes belonging to the equivalent scope of the claims are within the scope of the present invention.

 本発明は、マイクロホンに用いられる振動膜ユニットの製造方法に有用であり、特に、振動膜ユニットの振動膜が振動することによりLC発振回路のコイルのインダクタンスが変化するように上記振動膜と上記コイルとが所定の間隔で保持され、該インダクタンスの変化よって変わるLC発振回路の発振周波数の変化を復調するようにした半導体マイクロホンに用いる振動膜ユニットの製造方法に有用である。 The present invention is useful for a method of manufacturing a diaphragm unit used in a microphone, and in particular, the diaphragm and the coil so that the inductance of the coil of the LC oscillation circuit changes when the diaphragm of the diaphragm unit vibrates. Is useful for a method of manufacturing a diaphragm unit used in a semiconductor microphone that demodulates a change in oscillation frequency of an LC oscillation circuit that changes depending on the change in inductance.

  1   振動膜ユニット
  11  筒状支持部材
  12  第1端面
  14  第2端面
  16  溝部
  17  分割部
  18  肉盗み部
  21  振動膜
  51  環状治具
  55  テンションリング
  M   半導体マイクロホン
DESCRIPTION OF SYMBOLS 1 Vibration membrane unit 11 Cylindrical support member 12 1st end surface 14 2nd end surface 16 Groove part 17 Dividing part 18 Meat stealing part 21 Vibration film 51 Annular jig | tool 55 Tension ring M Semiconductor microphone

Claims (5)

 軸方向の少なくとも一側が開口した樹脂製の筒状支持部材と、該筒状支持部材における軸方向の上記一側の端面である第1端面の開口周縁部に、該第1端面の開口を覆うように固定された振動膜とを備えた、マイクロホンに用いられる振動膜ユニットの製造方法であって、
 上記筒状支持部材の第1端面の開口周縁部に、上記振動膜が固定された状態にする固定工程と、
 上記固定工程後に、上記筒状支持部材の径方向外側への変形を利用して、上記振動膜に所定のテンションを付与するテンション付与工程とを含む、振動膜ユニットの製造方法。
A resin-made cylindrical support member having at least one side opening in the axial direction and an opening peripheral edge of the first end surface that is the end surface on the one side in the axial direction of the cylindrical support member cover the opening of the first end surface. A vibration membrane unit for use in a microphone having a vibration membrane fixed as described above,
A fixing step in which the vibrating membrane is fixed to the opening peripheral edge of the first end surface of the cylindrical support member;
A method of manufacturing a diaphragm unit including a tension applying step of applying a predetermined tension to the diaphragm using the deformation of the cylindrical support member radially outward after the fixing step.
 請求項1記載の振動膜ユニットの製造方法において、
 上記筒状支持部材は、その第1端面に、該筒状支持部材の内周面から外周面まで径方向に延びる所定の深さの複数の溝部が互いに周方向に間隔をあけて形成されていることで、該筒状支持部材の第1端面側の部分が周方向に並ぶ複数の分割部に分割されたものであり、
 上記固定工程は、上記筒状支持部材を、予め作製した振動膜と一体化されるように成型することで、上記筒状支持部材の第1端面の開口周縁部に、上記振動膜が固定された状態にする工程であり、
 上記テンション付与工程は、上記成型後の筒状支持部材の温度低下に伴って生じる、該筒状支持部材における上記各分割部の径方向外側への変形によって、上記振動膜に所定のテンションを付与する工程である、振動膜ユニットの製造方法。
In the manufacturing method of the diaphragm unit according to claim 1,
The cylindrical support member has a plurality of grooves having a predetermined depth extending radially from the inner peripheral surface to the outer peripheral surface of the cylindrical support member at a first end surface thereof, spaced apart from each other in the circumferential direction. The portion on the first end face side of the cylindrical support member is divided into a plurality of divided portions arranged in the circumferential direction,
In the fixing step, the vibrating membrane is fixed to the opening peripheral portion of the first end surface of the cylindrical supporting member by molding the cylindrical supporting member so as to be integrated with the previously prepared vibrating membrane. Is the process
In the tension applying step, a predetermined tension is applied to the vibrating membrane by deformation of the cylindrical support member in the radial direction that occurs as the temperature of the cylindrical support member after molding decreases. A method of manufacturing a diaphragm unit, which is a step of
 請求項2記載の振動膜ユニットの製造方法において、
 上記筒状支持部材は、上記各分割部の内周面に、該内周面を凹ませる肉盗み部が形成されたものである、振動膜ユニットの製造方法。
In the manufacturing method of the diaphragm unit according to claim 2,
The said cylindrical support member is a manufacturing method of a diaphragm unit in which the meat stealing part which dents this internal peripheral surface is formed in the internal peripheral surface of each said division | segmentation part.
 請求項1記載の振動膜ユニットの製造方法において、
 上記固定工程は、上記筒状支持部材における少なくとも第1端面側の端部を、押圧により径方向内側へ弾性変形させた状態で、該筒状支持部材の第1端面の開口周縁部に、上記振動膜を溶着又は接着剤により固定する工程であり、
 上記テンション付与工程は、上記押圧を解除して、該解除により生じる、上記筒状支持部材の弾性復元力による径方向外側への変形によって、上記振動膜に所定のテンションを付与する工程である、振動膜ユニットの製造方法。
In the manufacturing method of the diaphragm unit according to claim 1,
In the fixing step, at least the first end surface side end portion of the cylindrical support member is elastically deformed radially inward by pressing, and the opening peripheral portion of the first end surface of the cylindrical support member is It is a step of fixing the vibration membrane by welding or adhesive,
The tension applying step is a step of applying a predetermined tension to the vibrating membrane by releasing the pressure and deforming the cylindrical support member radially outward due to an elastic restoring force generated by the release. Manufacturing method of vibration membrane unit.
 請求項1記載の振動膜ユニットの製造方法において、
 上記筒状支持部材は、その軸方向両側が開口したものであり、
 上記固定工程は、上記筒状支持部材の第1端面の開口周縁部に、上記振動膜を溶着又は接着剤により固定する工程であり、
 上記テンション付与工程は、上記筒状支持部材における第1端面とは反対側の端面である第2端面の開口から、外径が上記筒状支持部材の内径よりも大きいテンションリングを筒状支持部材内に挿入し、かつ、該テンションリングにより該筒状支持部材における少なくとも第1端面側の端部を、径方向外側へ変形させて、該変形によって、上記振動膜に所定のテンションを付与する工程である、振動膜ユニットの製造方法。
In the manufacturing method of the diaphragm unit according to claim 1,
The cylindrical support member is opened on both axial sides thereof,
The fixing step is a step of fixing the vibrating membrane to the opening peripheral edge portion of the first end surface of the cylindrical support member by welding or an adhesive,
In the tension applying step, a tension ring whose outer diameter is larger than the inner diameter of the cylindrical support member is formed from the opening of the second end surface that is the end surface opposite to the first end surface of the cylindrical support member. And inserting at least a first end face side end of the cylindrical support member with the tension ring so as to be deformed radially outward and applying a predetermined tension to the vibrating membrane by the deformation. A method for manufacturing a diaphragm unit.
PCT/JP2010/059859 2009-06-25 2010-06-10 Method for producing vibrating membrane unit Ceased WO2010150660A1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012114156A1 (en) * 2011-02-25 2012-08-30 Nokia Corporation A transducer apparatus with a tension actuator
WO2016080931A1 (en) * 2014-11-19 2016-05-26 Ozyegin Universitesi Vertical gap actuator for ultrasonic transducers and fabrication of the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH053600A (en) * 1991-06-25 1993-01-08 Ono Sokki Co Ltd Condenser microphone
JP2002213995A (en) * 2001-01-12 2002-07-31 Showa Denko Kk Optical sensor
JP2005143065A (en) * 2003-11-09 2005-06-02 Gbs:Kk Semiconductor microphone

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH053600A (en) * 1991-06-25 1993-01-08 Ono Sokki Co Ltd Condenser microphone
JP2002213995A (en) * 2001-01-12 2002-07-31 Showa Denko Kk Optical sensor
JP2005143065A (en) * 2003-11-09 2005-06-02 Gbs:Kk Semiconductor microphone

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012114156A1 (en) * 2011-02-25 2012-08-30 Nokia Corporation A transducer apparatus with a tension actuator
US9204222B2 (en) 2011-02-25 2015-12-01 Nokia Technologies Oy Transducer apparatus with a tension actuator
WO2016080931A1 (en) * 2014-11-19 2016-05-26 Ozyegin Universitesi Vertical gap actuator for ultrasonic transducers and fabrication of the same

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