WO2010147180A1 - Process for producing zinc sulfide-based blue fluorescent substance - Google Patents
Process for producing zinc sulfide-based blue fluorescent substance Download PDFInfo
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- WO2010147180A1 WO2010147180A1 PCT/JP2010/060295 JP2010060295W WO2010147180A1 WO 2010147180 A1 WO2010147180 A1 WO 2010147180A1 JP 2010060295 W JP2010060295 W JP 2010060295W WO 2010147180 A1 WO2010147180 A1 WO 2010147180A1
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- zinc sulfide
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/56—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing sulfur
- C09K11/562—Chalcogenides
- C09K11/565—Chalcogenides with zinc cadmium
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- the present invention relates to a method for producing a zinc sulfide blue phosphor.
- An inorganic composition mainly composed of a compound semiconductor is used in the fields of light emitting materials such as fluorescence and phosphorescence, and phosphorescent materials.
- light emitting materials such as fluorescence and phosphorescence, and phosphorescent materials.
- some zinc sulfide-based phosphors having EL characteristics that emit light by electric energy are partly used for display applications as light sources.
- Patent Document 1 is a technique relating to the production of a yellow-orange phosphor, and a blue phosphor is not obtained.
- the wavelength (color) of fluorescent color development depends on the type of activator added, and it is known that when copper is used as the activator, a blue-green color develops.
- a hydrothermal synthesis method for example, Patent Document 2
- a liquid phase method for example, Patent Document 3
- Patent Documents 2 and 3 differ from the method of introducing a metal that becomes an activator into the defects of the crystal structure proposed by Patent Document 1 and introduce metal ions that become the activator into the precursor before firing. Is the method.
- the solid-phase firing method is strongly influenced by the particle size of the precursor particles and the mixing method with the metal salt at the time of doping, and there is a problem that the emission color is not uniform due to the uneven distribution of the metal salt within and between the particles.
- the hydrothermal synthesis method has problems such as corrosion of reaction equipment and difficulty in scaling up for industrialization because hydrogen sulfide is generated.
- the liquid phase firing method has a problem that the deposition rate of the metal from the liquid phase is different and the homogeneity within the particles is lowered.
- an object of the present invention is to provide a method for producing a zinc sulfide-based blue phosphor that is industrially practical.
- the present inventors examined each process in detail, paying attention to the fact that each processing condition of the manufacturing process of the zinc sulfide-based phosphor significantly affects the physical properties of the obtained zinc sulfide-based phosphor.
- the present inventors have found that the introduction of defects into the crystal structure performed between the primary firing step and the secondary firing step, and the cooling conditions in the secondary firing step contribute to blue light emission. It came to complete.
- a method for producing a zinc sulfide-based blue phosphor by firing a zinc sulfide-based phosphor precursor (A) A flux is added to the zinc sulfide-based phosphor precursor, and the temperature is raised to a constant temperature within a range of 1000 ° C. or higher and 1200 ° C. or lower and maintained at that temperature, and then rapidly cooled to a temperature of 700 ° C. or lower.
- a primary firing step for forming a primary fired product having a hexagonal crystal structure introduced (B) an ultrasonic treatment step of irradiating the dispersion obtained by dispersing the primary fired product in an aqueous liquid with ultrasonic waves to transfer a part of the hexagonal crystal structure of the primary fired product into a cubic structure; (C) The primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed is heated to a constant temperature within a range of 650 ° C. or higher and 1000 ° C. or lower in an inert gas atmosphere, and then cooled.
- a method is provided that includes a secondary firing step.
- the present invention also provides the following aspects.
- the primary firing product is maintained at a constant temperature in the range of 100 ° C. or more and 500 ° C. or less in an inert atmosphere, and (c) 650 in the secondary firing step.
- At least one of cooling control for cooling the temperature range from 300 ° C. or less to room temperature at a cooling rate of 150 ° C./hr or less in the process of cooling to room temperature after maintaining a constant temperature in the range of °C to 1000 ° C.
- At least one of cooling control for cooling the temperature range from 300 ° C. or less to room temperature at a cooling rate of 150 ° C./hr or less in the process of cooling to room temperature after maintaining a constant temperature in the range of °C to 1000 ° C.
- ultrasonic waves having an output of 1000 kW / m 3 or more and 6000 kW / m 3 or less are irradiated.
- the (a) primary firing step includes a step of raising the temperature of the mixture of the zinc sulfide-based fluorescent precursor and the flux to a constant temperature within a range of 300 ° C. to 850 ° C. in an oxygen-containing atmosphere.
- the (c) secondary firing step includes a step of switching to an oxygen-containing atmosphere after reaching a temperature of 650 ° C. or higher.
- the (c) secondary firing step preferably includes adding a compound containing copper and a compound containing zinc to the primary fired product in which the hexagonal crystal structure and the cubic crystal structure are mixed to increase the temperature.
- the zinc sulfide-based phosphor precursor is an inorganic composition containing at least one selected from zinc sulfide, a compound containing copper, silver, iridium and a rare earth element, and a combination thereof.
- the zinc sulfide based phosphor precursor is obtained by adding a sulfurizing agent to an aqueous solution containing a zinc compound and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements, and reacting them. It is an inorganic composition.
- the zinc sulfide-based phosphor precursor is obtained by adding an aqueous solution containing a zinc compound, a sulfiding agent, and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements to an organic solvent. It is an inorganic composition obtained by heating the reaction mixture and removing water by azeotroping water and an organic solvent.
- the sulfurizing agent is thioacetamide and / or hydrogen sulfide.
- the production method of the present invention makes it possible to industrially advantageously produce a zinc sulfide-based blue phosphor having practical and high brightness.
- the method for producing the zinc sulfide blue phosphor of the present invention comprises: (A) A flux is added to the zinc sulfide-based phosphor precursor, and the temperature is raised to a constant temperature within a range of 1000 ° C. or higher and 1200 ° C. or lower and maintained, and then rapidly cooled to a temperature of 700 ° C. or lower. A primary firing step for forming a primary fired product containing hexagonal crystals, (B) The dispersion obtained by dispersing the primary fired product in an aqueous liquid is irradiated with ultrasonic waves, and a part of the hexagonal crystal of the primary fired product is converted into a cubic crystal so that a hexagonal structure and a cubic structure are mixed.
- An ultrasonic irradiation process for forming a primary fired product (C)
- the primary fired product in which the hexagonal crystal structure and the cubic crystal structure are mixed is heated to a constant temperature within a range of 650 ° C. or higher and 1000 ° C. or lower in an inert gas atmosphere, and then cooled. Including a secondary firing step.
- the zinc sulfide-based phosphor precursor (hereinafter sometimes referred to as “precursor”) that can be used in the present invention is an inorganic composition mainly composed of zinc sulfide that does not exhibit fluorescence when excited by light absorption. Although it does not restrict
- Zinc sulfide is not particularly limited, but zinc sulfide not containing different metals such as iron, nickel, and chromium is preferable, and the purity is usually 99% or more.
- the crystal system of zinc sulfide may be either cubic or hexagonal.
- the particle size of zinc sulfide is preferably in the range of 10 nm to 20 ⁇ m as the particle size of primary particles, and the particle size of the aggregate is preferably in the range of 1 ⁇ m to 20 ⁇ m.
- a compound containing copper, silver, iridium, and a rare earth element is doped into zinc sulfide, which is a base material, through a firing step described later, and acts as a light emission center of the zinc sulfide-based phosphor.
- the content of these metal elements is preferably in the range of 0.1 ppm to 150,000 ppm, more preferably in the range of 1 ppm to 50000 ppm, more preferably in the range of 2 ppm to 10,000 ppm, based on the weight of the obtained zinc sulfide-based phosphor precursor. A range is particularly preferred.
- Preferred examples of compounds containing copper, silver, iridium and rare earth elements include compounds containing elements such as copper, silver, iridium and rare earth elements that act as acceptors and elements such as aluminum, gallium, and indium that act as donors. Can do.
- the compounds are used in the form of mineral salts with hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc., organic acid salts with formic acid, acetic acid, butyric acid, oxalic acid, etc., and complex salts with acetylacetonate as a ligand. be able to.
- mineral acid salts and organic acid salts can be preferably used from the viewpoints of stability and persistence.
- the zinc sulfide-based phosphor precursor used in the present invention can be prepared by the following method.
- Zinc sulfide particles are mixed with a solid form compound containing copper, silver, iridium and a rare earth element while being crushed.
- a sulfurizing agent is added to an aqueous solution containing a zinc compound and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements, and reacted.
- An aqueous solution containing a zinc compound, a sulfiding agent, and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements is added to an organic solvent to form a reaction mixture, The reaction mixture is heated and water and organic solvent are azeotroped to remove water.
- the reactions (2) and (3) are methods for preparing a zinc sulfide-based phosphor precursor from a zinc compound and a sulfurizing agent.
- a sulfurizing agent is added to an aqueous solution containing a zinc compound, and in the reaction (3), an aqueous solution containing a zinc compound and a sulfurizing agent is used.
- the reaction (2) is particularly suitable when a sulfurizing agent is continuously added as a gas.
- Zinc compounds that can be used in the reactions (2) and (3) include mineral acid salts with hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc., organic acid salts with formic acid, acetic acid, butyric acid, oxalic acid, etc., acetyl
- organic acid salts can be preferably used from the viewpoint of stability and persistence.
- a zinc compound may be used individually by 1 type, or may be used in combination of multiple types.
- the concentration of the zinc compound in the aqueous solution is preferably 0.01 mol / L or more and 2 mol / L or less, and more preferably 0.1 mol / L or more and 1.5 mol / L or less. If the concentration of the zinc compound is too high, the reaction rate decreases with the precipitation of zinc sulfide produced by the reaction, and if the concentration is too low, the production amount per batch decreases and the volumetric efficiency decreases significantly.
- the sulfurizing agent that can be used in the reactions (2) and (3) is not particularly limited, but includes alkali metal sulfides such as hydrogen sulfide, sodium sulfide, and potassium sulfide, thioacetamide, thioformamide, and the like.
- alkali metal sulfides such as hydrogen sulfide, sodium sulfide, and potassium sulfide
- thioacetamide, thioformamide, and the like can be used.
- Hydrogen sulfide, thioacetamide, and thiourea can be preferably used from the viewpoints of decomposition temperature, stability, and persistence of decomposition products.
- thioacetamide and hydrogen sulfide can be particularly preferably used.
- the sulfurizing agent is preferably used in an amount of 0.5 to 5 times the molar ratio to the zinc element, more preferably 1.1 to 4 times, and more preferably 1.1 to 2 times. It is particularly preferred to use in Outside the above range, the zinc compound may remain unreacted and adversely affect the reaction, leading to a decrease in color purity as a phosphor.
- the concentration of the sulfiding agent in the aqueous solution is preferably 0.01 mol / L or more and 2 mol / L or less, and more preferably 0.1 mol / L or more and 1.5 mol / L or less. Outside the above range, the sulfide and the zinc compound may be precipitated and remain unreacted.
- the water used in the aqueous solution is preferably ion-exchanged water having an ash content of 100 ppm or less, preferably 10 ppm or less.
- Water containing metal ions as impurities is not preferable because it affects the emission color of the zinc sulfide phosphor.
- the organic solvent that can be used in the reaction (3) is not particularly limited as long as it can remove water by azeotropic dehydration.
- Preferable examples include hexane, cyclohexane, heptane, octane, cyclooctane, nonane, decane, dodecane, cyclododecane, undecane and other saturated hydrocarbons, toluene, xylene, mesitylene and other aromatic hydrocarbons, carbon tetrachloride, 1, Halogenated hydrocarbons such as 2-dichloroethane and 1,1,2,2-tetrachloroethylene, halogenated aromatic hydrocarbons such as chlorobenzene and dichlorobenzene, dibutyl ether, diisobutyl ether, amyl ether, diisoamyl ether, dihexyl ether, dicyclohexyl Ethers such as ether, dioctyl ether,
- saturated hydrocarbon-based and aromatic hydrocarbon-based organic solvents are preferable from the viewpoints of stability and safety of organic solvents, water removal efficiency, and loss due to dissolution of sulfides and raw material salts to be generated.
- decane, dodecane and xylene are preferred from the viewpoint of the azeotropic temperature and azeotropic ratio with water.
- the amount of the organic solvent used may be larger than the amount of the aqueous solution in which the zinc compound is dissolved, as long as the generated zinc sulfide can be retained.
- the temperature for heating the reaction mixture in the reaction of (3) is preferably in the range of 30 ° C. to 300 ° C., more preferably in the range of 40 ° C. to 230 ° C., and still more preferably in the range of 60 ° C. to 200 ° C.
- a range of 80 ° C. or higher and 180 ° C. or lower is particularly preferable. If it is a temperature range of 40 degreeC or more and 230 degrees C or less, since it is not necessary to use a special installation, it is advantageous practically.
- a temperature range of 60 ° C. or more and 200 ° C. or less is advantageous when thioacetamide is used as the sulfide.
- the reactions (2) and (3) may be performed in the presence of hydrogen sulfide gas and / or an inert gas such as nitrogen and argon because there is a possibility that the oxidation of zinc sulfide may not be completely suppressed due to the presence of oxygen. preferable.
- the deposited inorganic composition containing zinc sulfide and the metal element is subjected to washing such as water washing and drying under reduced pressure as necessary.
- the drying temperature can be 10 ° C. or more and 200 ° C. or less, but is preferably 10 ° C. or more and 150 ° C. or less, more preferably 50 ° C. or more and 120 ° C. or less in order to prevent oxidation due to the presence of moisture.
- a flux is added to the zinc sulfide-based phosphor precursor in the primary firing step.
- a halogen-containing flux particularly a chlorine-containing flux
- the chlorine-containing flux include alkali metal chlorides such as lithium chloride, sodium chloride, potassium chloride, and cesium chloride, alkaline earth metal chlorides such as calcium chloride, magnesium chloride, barium chloride, and strontium chloride, and ammonium chloride. And zinc chloride.
- the bromine-containing flux include alkali metal bromides such as lithium bromide, sodium bromide, potassium bromide and cesium bromide, alkaline earth such as calcium bromide, magnesium bromide, barium bromide and strontium bromide.
- Examples include metal bromides, ammonium bromides, zinc bromides and the like.
- the iodine-containing flux include alkali metal iodides such as lithium iodide, sodium iodide, potassium iodide and cesium iodide, alkalis such as calcium iodide, magnesium iodide, barium iodide and strontium iodide.
- alkali metal iodides such as lithium iodide, sodium iodide, potassium iodide and cesium iodide
- alkalis such as calcium iodide, magnesium iodide, barium iodide and strontium iodide.
- earth metal iodide, ammonium iodide, zinc iodide and the like It is preferable to mix a plurality of metal halides from the viewpoint of persistence and the melting temperature of the flux. More preferably, a mixture of potassium
- the amount of the flux used is not particularly limited, but usually the concentration in the zinc sulfide is preferably 0.1 wt% or more and 80 wt% or less. Considering the influence of the uniform dispersion of the flux, etc., 0.5 wt% or more and 60 wt% or less is more preferable, and 1 wt% or more and 40 wt% or less is particularly preferable.
- the method of adding the flux is not particularly limited, and is a solid mixing method in which a solid flux and a zinc sulfide-based phosphor precursor are mixed. After the flux is dissolved in water, the zinc sulfide-based phosphor precursor is mixed.
- the solid mixing method and the aqueous solution mixing method may be combined in consideration of the aqueous solution mixing method of mixing with the body and drying, and the chemical stability of the flux used.
- sulfur may be added together with the flux to the zinc sulfide-based phosphor precursor in the primary firing step.
- the atmosphere in the firing furnace during firing can be maintained in a reducing atmosphere, and the oxidation of zinc sulfide by water and oxygen that may be present can be suppressed.
- the amount of sulfur added for the purpose of suppressing oxidation of zinc sulfide is preferably 0.01 times or more and 2 times or less, more preferably 0.02 times or more and 1 time or less, based on the weight of zinc sulfide.
- a flux and preferably sulfur is added to the zinc sulfide-based phosphor precursor, and the temperature is raised from room temperature to a constant temperature in the range of 1000 ° C. to 1200 ° C. Then, it is rapidly cooled to a temperature of 700 ° C. or lower to form a primary fired product having a hexagonal crystal structure.
- the temperature is preferably 50 ° C./hr or more and 1000 ° C./hr or less, more preferably 60 ° C./hr or more and 900 ° C./hr or less. If the rate of temperature rise is too fast, the equipment used will be overloaded, reducing the life of the equipment as well as promoting rapid decomposition of the flux and shortening the melt time, resulting in non-uniform dispersion of the flux. Cheap. If the rate of temperature rise is too slow, it is not economical, and in the case of a low-melting flux, the flux is localized and causes coarsening of zinc sulfide, which is not preferable.
- the temperature After reaching a certain temperature in the range of 1000 ° C. or more and 1200 ° C. or less, the temperature is preferably maintained for about 1 hour or more and about 5 hours or less, and then rapidly cooled to a temperature of 700 ° C. or less.
- rapid cooling means cooling with a cooling rate greater than that of natural cooling.
- the cooling rate is not particularly limited, and it is preferable to cool as quickly as possible, but considering the heat shock of the container, 600 ° C./hr or more and 30000 ° C./hr (that is, 10 ° C./min or more and 500 ° C./min or less) ), Preferably 720 ° C./hr or more and 18000 ° C./hr (that is, 12 ° C./min or more and 300 ° C./min or less).
- a zinc sulfide-based phosphor precursor that has been transformed into a hexagonal crystal structure by raising the temperature to a constant temperature in the range of 1000 ° C. to 1200 ° C. in the primary firing step, maintaining the temperature, and rapidly cooling to a temperature of 700 ° C. or less.
- the crystal system can be stabilized.
- the temperature exceeds about 800 ° C. the crystal system of the zinc sulfide-based phosphor precursor starts to change, and at about 1020 ° C., the crystal structure completely changes from a cubic structure to a hexagonal structure. This transition of the crystal system can be confirmed by the appearance of a (100) plane diffraction pattern by X-ray diffraction.
- ⁇ Desalination treatment> The primary fired product obtained by the primary firing process is then desalted. Desalting can be performed by washing with an acidic aqueous solution and then washing with ion exchange water until the washing becomes neutral.
- an organic acid aqueous solution such as formic acid or acetic acid, or a mineral acid aqueous solution such as hydrochloric acid, sulfuric acid or phosphoric acid can be used.
- acetic acid and hydrochloric acid are preferably used.
- ⁇ Annealing treatment> In the production method of the present invention, ultrasonic treatment is performed after the primary firing step. However, prior to the ultrasonic treatment, it is more preferable to perform an annealing treatment immediately after the primary firing step or after the desalting treatment during the rapid cooling of the primary firing step.
- the annealing treatment in the present invention is a heat treatment performed for stabilizing the hexagonal crystal structure of the primary fired product formed in the primary firing process.
- the primary firing step after the transition to the hexagonal crystal structure at a constant temperature within the range of 1000 ° C. or higher and 1200 ° C. or lower, rapid cooling is performed to a temperature of 700 ° C. or lower in order to maintain the hexagonal crystal structure. Since the hexagonal crystal structure formed at a high temperature is maintained, the hexagonal crystal structure is distorted. If ultrasonic treatment is performed with this distortion, the degree of distortion becomes irregular. This irregular distortion is difficult to alleviate during the secondary firing step, and the reproducibility of color development by final electroluminescence is lowered. Furthermore, when ultrasonic treatment is performed in a state having a large strain, the yield is reduced due to simultaneous breakage of zinc sulfide particles.
- the temperature in the temperature range of 150 ° C. to 500 ° C. for 1 hour to 20 hours.
- the film is rapidly cooled to 700 ° C. in order to maintain the hexagonal crystal structure, and then maintained in the above temperature range.
- the zinc sulfide particles which are the primary fired product that has undergone the primary firing process and preferably the annealing treatment process, have a stabilized hexagonal crystal structure in a proportion of about 95% or more.
- a part of the hexagonal crystal structure of the primary fired product is transferred to the cubic structure, and the hexagonal crystal structure and the cubic crystal are obtained.
- the ratio of the hexagonal structure to the cubic structure is preferably in the range of 90:10 to 55:45 in the hexagonal structure: cubic structure.
- ultrasonic waves are applied to a dispersion obtained by dispersing a primary fired product in an aqueous liquid, and the primary fired product is mixed with a hexagonal crystal structure and a cubic crystal structure.
- the aqueous liquid include water and a mixture of water and a water-soluble organic solvent, but are not particularly limited as long as they do not affect the reaction.
- the water-soluble organic solvent may be a mixture of two or more compounds, for example, alcohols such as methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, 1,4-butanediol, methyl acetate, ethyl acetate, butyl acetate Esters such as methyl benzoate and dimethyl phthalate, and ethers such as tetrahydrofuran, tetrahydropyran, dipropyl ether, dibutyl ether, diethylene glycol, and tetraethylene glycol can be preferably used.
- alcohols are preferably used in consideration of low flammability and weak oxidizing power, and methanol and ethanol are particularly preferable.
- the concentration of the primary baked product in the dispersion is desirable to adjust to a range of 0.1 wt% to 50 wt%, preferably 0.5 wt% to 30 wt%, more preferably 0.7 wt% to 20 wt%. If the concentration is too high, it is not preferable because it promotes the polishing action between the particles, and if the concentration is too low, it is not preferable because the processing cost increases.
- the temperature of the dispersion during ultrasonic irradiation is in the range of 1 ° C. to 90 ° C., preferably in the range of 2 ° C. to 80 ° C., more preferably 3 ° C. A range of 60 ° C. or lower is desirable.
- the dispersion of the primary fired product 15kHz or 50kHz, preferably 15kHz or more 40kHz or less, more preferably ultrasonic waves of frequencies below 37kHz or 18 kHz 800 kW / cm 3 or more 10000kW / cm 3 or less, preferably Irradiation is performed at a strength of 1000 kW / cm 3 to 6000 kW / cm 3 for 0.01 minutes to 102 minutes, preferably 0.05 minutes to 30 minutes.
- the impact energy by ultrasonic irradiation is too strong, the crystal structure cannot be maintained and the particles are crushed, and when the impact energy is too weak, the transition to the cubic structure cannot be promoted.
- the primary fired product in which a hexagonal crystal structure and a cubic crystal structure obtained by ultrasonic treatment are mixed is heated in an inert gas atmosphere, and a constant temperature within a range of 650 ° C. to 1000 ° C. is maintained. Thereafter, it is subjected to secondary firing for cooling.
- a primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed, copper of 0.1 wt% or more and 5 wt% or less, zinc of 1 wt% or more and 45 wt% or less, and 0.1 wt% or more and 6 wt% or less of Contains sulfur.
- the copper compound In order to contain copper, it is preferably added as a solid or aqueous copper compound.
- Preferred examples of the copper compound include copper (I) chloride, copper (II) chloride, copper sulfate, and copper acetate. From the viewpoint of economy and operability, copper sulfate and copper acetate are preferred.
- the copper compound is added in the range of 0.01 wt% or more and 10 wt% or less, preferably 0.02 wt% or more and 5 wt% or less with respect to the primary fired product.
- the zinc compound In order to contain zinc, it is preferably added as a solid or aqueous zinc compound.
- Preferred examples of the zinc compound include zinc oxide, zinc sulfide, zinc chloride, zinc bromide, zinc sulfate, zinc nitrate, zinc acetate, and zinc formate. From the viewpoints of economy and operability, zinc sulfate and zinc oxide are preferred.
- the zinc compound is added in the range of 0.1 wt% or more and 50 wt% or less, preferably 0.2 wt% or more and 30 wt% or less with respect to the primary fired product.
- sulfur In order to contain sulfur, it is preferable to add sulfur or sulfur compounds such as thioacetamide and thiourea. From the viewpoint of economy and operability, use of sulfur is preferred. Sulfur is added in the range of 0.1 wt% or more and 40 wt% or less, preferably 0.5 wt% or more and 30 wt% or less with respect to the primary fired product.
- a mixture of a primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed, and copper, zinc and sulfur is 650 ° C. or higher and 1000 ° C. over 2 to 5 hours in an inert gas atmosphere such as nitrogen gas.
- the temperature is raised to a certain temperature within the following range, and after reaching that temperature, air is introduced to form an oxygen-containing atmosphere for 30 minutes to 2 hours, and a certain temperature within a range of 650 ° C. to 1000 ° C. And then cool.
- the oxygen concentration in the oxygen-containing atmosphere is not particularly limited, but is preferably 1 vol% or more and 30 vol% or less.
- the temperature from 300 ° C. to room temperature Cool at a cooling rate of 150 ° C./hr or less, preferably 10 ° C./hr or more and 150 ° C./hr or less (2) 0.5 hours or more to a constant temperature within a temperature range of 120 ° C. or more and 300 ° C. or less Preferably, it is maintained for 0.5 hours to 24 hours, more preferably 1 hour to 20 hours, and even more preferably 1.5 hours to 18 hours.
- room temperature means a temperature of 20 ° C. or more and 25 ° C. or less.
- the cooling after maintaining a constant temperature in the range of 650 ° C. to 1000 ° C. is preferably performed at a cooling rate up to 300 ° C. in the range of 50 ° C./hr to 800 ° C./hr, More preferably, it is in the range of hr to 600 ° C./hr.
- a cooling rate exceeds 800 ° C./hr, a container such as a crucible may be damaged or destroyed, and the broken pieces may become contaminated, resulting in deterioration of the phosphor quality.
- the cooling rate is less than 50 ° C./hr, the cooling time becomes remarkably long and productivity is lowered, which is not preferable.
- a neutral aqueous solution an acidic aqueous solution, an aqueous cyanide salt solution or the like can be used, but in any case, it is necessary to finally rinse thoroughly with ion-exchanged water.
- the acidic aqueous solution a mineral acid aqueous solution such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid, and an organic acid aqueous solution such as acetic acid, propionic acid, and butyric acid can be preferably used. Particularly preferred.
- the secondary fired product that is zinc sulfide particles may be decomposed when contacted with a high concentration acidic substance, in the case of an acidic aqueous solution, it is 0.1 wt% or more and 20 wt% or less, preferably 1 wt% or more and 10 wt%. The following concentration is desirable.
- the aqueous cyanide salt solution is suitable for removing excess copper, silver, iridium and rare earth elements remaining on the surface of the secondary fired product.
- a sodium cyanide aqueous solution and a potassium cyanide aqueous solution having a concentration of 0.1 wt% or more and 1 wt% or less can be preferably used.
- an aqueous cyanide salt solution it is used in an amount of 10 to 100 times by weight with respect to the secondary fired product.
- Quantum efficiency is defined in JIS as the ratio of the number of quanta, such as electrons or photons generated by reacting molecules or interactions, to the number of incident photons absorbed when light radiation acts on a substance. Has been. A larger quantum efficiency means a higher doping effect.
- the quantum efficiency in this specification is a value measured by a spectrofluorophotometer, and is used as a ratio between the number of photons emitted by excitation by incident light and the number of photons of incident light absorbed by a substance.
- the quantum efficiency in this specification is set to an excitation wavelength of 350 nm and an excitation bandwidth of 5 nm using a spectrophotometer FP-6500 manufactured by JASCO Corporation, and the supplied Spectra Manager for Windows (registered trademark) manufactured by JASCO Corporation. ) Determined using 95 / NT Ver. 1.00.00 2005.
- ⁇ Ratio between cubic structure and hexagonal structure> The ratio of the cubic crystal structure and the hexagonal crystal structure in this specification is based on X-ray diffraction data obtained using RINT-2400 manufactured by Rigaku Corporation as an X-ray diffractometer. Was used to determine.
- ⁇ Color analysis> The manufactured EL element is sandwiched between the spectrophotometer FP-6500 spectrophotometer manufactured by JASCO Corporation, the excitation light shutter is closed, and a black screen is applied so that external light does not enter the sample holder. Then, the element was measured to emit light. At that time, light emission was detected without correcting the luminance.
- the emission color analysis was converted into chromaticity (x value, y value) using the emission color analysis of Spectra Manager for Windows (registered trademark) 95 / NT Ver. .
- the temperature was raised to 90 ° C., and 113.0 g of thioacetamide was charged from the solid feeder to start the reaction.
- the reaction was continued for 2 hours and then cooled to room temperature.
- the precipitated sulfide was precipitated, the supernatant was removed by decantation, and further, washing was performed using 3 L of ion exchange water until the pH in the system showed a neutral range.
- the target product was collected and dried in a vacuum dryer at 100 ° C. for 12 hours. The recovered amount was 94.16 g, and the yield was 96.6% of the theoretical yield.
- Example 1 ⁇ Primary firing> To 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 1, 1.00 g of potassium chloride, 1.17 g of sodium chloride and 6.87 g of magnesium chloride hexahydrate were added and mixed with a ball mill. To the resulting mixture, 1.45 g of sulfur was added and placed in a crucible. The temperature of the crucible was increased at a rate of 400 ° C. per hour while introducing air into the firing furnace. When the furnace temperature reached 800 ° C., the air was switched to introduction of nitrogen, the temperature was raised to 1100 ° C. at a rate of 400 ° C. per hour, and held at 1100 ° C. for 3 hours. After holding for 3 hours, it was cooled to room temperature at 300 ° C. per hour.
- the obtained fired product was added to 200 g of a 15% acetic acid aqueous solution to disperse the fired product.
- the acetic acid aqueous solution was removed by decantation, and the mixture was washed with 500 g of ion exchange water until neutral, and a primary fired product was obtained. After removing the supernatant by decantation, it was dried at 100 ° C. for 12 hours in a vacuum dryer.
- the yield of the primary calcined product was 24 g, and the cubic / hexagonal ratio of the primary calcined product was determined by X-ray diffraction.
- an ultrasonic vibrator manufactured by BRANSON, Digital Sonifier, frequency 20 kHz
- a vibrator is set at a position of 25 mm from the dispersion, continuously irradiated for 5 minutes at 2000 kW / m 3 , and stopped for 5 minutes three times. Then, sonication was performed. Fine particles generated by crushing were removed using a 10 ⁇ m mesh. After removing the supernatant by decantation, it was dried at 100 ° C. for 12 hours in a vacuum dryer.
- the yield of the primary baked product after the ultrasonic treatment was 12.1 g, and the recovery rate was 60.5%.
- the cubic / hexagonal ratio of the primary fired product after sonication was determined by X-ray diffraction.
- ⁇ Secondary firing> 0.25 g of copper sulfate pentahydrate and 2.5 g of zinc sulfate heptahydrate were mixed with 10 g of the primary fired product that had been subjected to ultrasonic treatment, and the mixture was placed in a crucible.
- the crucible was placed in a firing furnace, heated at a rate of 400 ° C. per hour in a nitrogen atmosphere, and when the temperature in the firing furnace reached 850 ° C., switching from nitrogen to air was introduced for 1 hour. Thereafter, the air was switched again to the introduction of nitrogen, and after holding for another 2 hours, it was cooled to room temperature at 500 ° C. per hour.
- the obtained secondary fired product was washed with 100 g of 5% hydrochloric acid aqueous solution.
- the acidic aqueous solution was removed, and rinsing was repeated using 500 g of ion exchange water until neutrality was achieved.
- the supernatant was removed by decantation, and then washed with 200 g of a 1% aqueous sodium cyanide solution to remove excess sulfide.
- the yield of the secondary fired product was 9.2 g.
- the photoexcitation fluorescence spectrum was measured for the obtained secondary fired product (phosphor) to determine the quantum efficiency.
- a fluorine-based binder (DuPont 7155) was added, mixed and degassed to prepare a light emitting layer paste.
- This light emitting layer paste was applied on a PET film with ITO to a film thickness of 40 ⁇ m using a 20 mm square screen plate (200 mesh, 25 ⁇ m).
- a barium titanate paste (7153 manufactured by DuPont) was applied using a screen plate (150 mesh, 25 ⁇ m), dried at 100 ° C. for 10 minutes, and then a barium titanate paste was similarly applied. And dried at 100 ° C. for 10 minutes to form a 20 ⁇ m dielectric layer.
- a silver paste (461 SS manufactured by Atchison) was applied using a screen plate (150 mesh, 25 ⁇ m), dried at 100 ° C. for 10 minutes, and an electrode was formed to form a printing EL device.
- EL material evaluation was performed at 200 V and 1 kHz.
- Example 2 The same processes as in Example 1 were performed until the primary firing step and the desalting step.
- the cubic / hexagonal ratio of the primary fired product was determined by X-ray diffraction.
- the secondary firing step was performed in the same manner as in Example 1.
- the photoexcitation fluorescence spectrum of the obtained secondary fired product (phosphor) was measured to determine the quantum efficiency of the phosphor.
- EL element was produced in the same manner as in Example 1, and EL material evaluation was performed at 200 V and 1 kHz.
- Example 3 The same procedure as in Example 2 was performed except that the zinc sulfide-based phosphor precursor prepared in Production Example 2 was used.
- Example 4 The same operation as in Example 2 was performed except that the zinc sulfide-based phosphor precursor prepared in Production Example 3 was used.
- Example 5 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was set to 1000 kW / cm 3 .
- Example 6 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 1800 kW / cm 3 .
- Example 7 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 15800 kW / cm 3 .
- Example 8 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was set to 3000 kW / cm 3 .
- Example 9 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 6000 kW / cm 3 .
- Example 10 The same operation as in Example 2 was performed except that the annealing temperature was 350 ° C.
- Example 11 The same operation as in Example 2 was performed except that the annealing temperature was set to 300 ° C.
- Example 12 The same procedure as in Example 2 was performed, except that 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 1 was used, the rapid quenching in the primary firing step was set to 400 ° C., and annealing was performed while maintaining 400 ° C. for 8 hours.
- Example 13 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 1 was used, and after the primary firing step, immediately heated to 400 ° C., annealed, and then desalted, the same as in Example 2. It was.
- Example 1 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was changed to 830 kW / cm 3 .
- Example 2 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was set to 560 kW / cm 3 .
- Example 3 The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 10500 kW / cm 3 . Since the particles were broken, the target product could not be recovered.
- Example 14 To 27 g of the product obtained in Production Example 4, 1.00 g of potassium chloride, 1.17 g of sodium chloride and 6.87 g of magnesium chloride hexahydrate were added and mixed with a ball mill. To this mixture, 1.45 g of sulfur was added and placed in a crucible. This crucible was put in a firing furnace and heated in air at a rate of 400 ° C. per hour. When the furnace temperature reached 800 ° C, switching from introduction of air to introduction of nitrogen, raising the temperature to 1100 ° C at a rate of 400 ° C per hour, holding 1100 ° C for 3 hours, and then cooling to room temperature at 300 ° C per hour did.
- the obtained fired product was added to 200 g of a 15% acetic acid aqueous solution to disperse the fired product.
- the supernatant is removed by decantation, washed with 500 g of ion-exchanged water until neutral, and after removing the ion-exchanged water, dried at 100 ° C. for 12 hours in a vacuum dryer to obtain 24 g of a primary fired product. It was.
- ion-exchanged water 200 g was added to 20 g of the primary fired product to obtain a dispersion.
- an ultrasonic vibrator manufactured by BRANSON, Digital Sonifier, frequency 20 kHz
- a vibrator is set at a position of 25 mm from the dispersion, continuously irradiated for 5 minutes at 1000 KW / m 3 , and stopped for 5 minutes three times.
- Ultrasonic vibration was applied. Fine particles generated by crushing were removed using a 10 ⁇ m mesh. After removing the supernatant by decantation, it was dried at 100 ° C. for 12 hours in a vacuum dryer.
- 0.25 g of copper sulfate pentahydrate and 2.5 g of zinc sulfate heptahydrate were mixed with 10 g of the primary fired product after the ultrasonic treatment, and the mixture was put in a crucible.
- the crucible was placed in a firing furnace, heated at a rate of 400 ° C. per hour in a nitrogen atmosphere, and when the temperature in the firing furnace reached 850 ° C., switching from nitrogen introduction to air introduction was performed for 1 hour. . Thereafter, the introduction of air was switched again to the introduction of nitrogen, and the mixture was further maintained for 2 hours. After cooling to 300 ° C. at 500 ° C./hour, the cooling rate was changed to 50 ° C./hour to cool to room temperature.
- Example 2 After the obtained secondary fired product was washed in the same manner as in Example 1, the quantum efficiency was determined. Further, an EL element was produced in the same manner as in Example 1, and the EL material was evaluated.
- Example 15 The same operation as in Example 14 was performed except that 8.2 g of the secondary fired product was obtained using 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 2.
- Example 16 The same procedure as in Example 14 was performed, except that 7.7 g of the secondary fired product was obtained using 25 g of the zinc sulfide-based phosphor precursor prepared in Production Example 3.
- Example 17 Using 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 4, 24.5 g of a primary fired product was obtained in the same manner as in Example 14, and cooling after the secondary firing was cooled to 300 ° C. at 500 ° C. per hour. Then, it was carried out in the same manner as in Example 14 except that baked product 9.2 g was obtained by holding at 300 ° C. for 3 hours and cooling to room temperature at 50 ° C. per hour.
- Example 18 The cooling after the secondary firing was performed in the same manner as in Example 17 except that the cooling was performed at 500 ° C. per hour to 250 ° C., maintained at 250 ° C. for 3 hours, and cooled to 50 ° C. per hour to room temperature.
- Example 17 Except for cooling after secondary firing from 850 ° C to 300 ° C at 150 ° C per hour, from 300 ° C to 150 ° C at 20 ° C per hour, and from 150 ° C to 15 ° C per hour to room temperature. As well as.
- Example 5 The same procedure as in Example 15 was performed except that cooling after the secondary firing was performed from 850 ° C. to room temperature at 500 ° C. per hour.
- Example 6 It was carried out in the same manner as in Example 16 except that cooling after the secondary firing was performed from 850 ° C. to room temperature at 500 ° C. per hour.
- Example 7 The cooling after the secondary firing was performed in the same manner as in Example 14 except that the cooling was performed from 850 ° C. to 300 ° C. at 500 ° C. per hour and then at 200 ° C. per hour to room temperature.
- Example 8 The cooling after the secondary firing was performed in the same manner as in Example 14 except that the cooling was performed from 850 ° C. to 300 ° C. at 500 ° C. per hour, then maintained at 300 ° C. for 10 minutes, and further cooled to room temperature at 200 ° C. per hour.
- Example 9 The cooling after the secondary firing was performed in the same manner as in Example 14 except that the cooling was performed from 850 ° C. to 250 ° C. at 500 ° C. per hour and then cooled to 500 ° C. per hour to room temperature.
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Abstract
Description
本発明は、硫化亜鉛系青色蛍光体の製造方法に関する。 The present invention relates to a method for producing a zinc sulfide blue phosphor.
化合物半導体を主たる構成材料とする無機組成物は、蛍光、リン光などの発光材料、蓄光材料などの分野で用いられている。これらのうち、電気エネルギーによって光を発するEL特性を有する硫化亜鉛系蛍光体は、光源として表示用途などで一部用いられているものもある。さらにこれらEL特性を有する蛍光体をフルカラー表示用途などに活用するために、高輝度の硫化亜鉛系青色蛍光体の提供が要望されている。 An inorganic composition mainly composed of a compound semiconductor is used in the fields of light emitting materials such as fluorescence and phosphorescence, and phosphorescent materials. Among these, some zinc sulfide-based phosphors having EL characteristics that emit light by electric energy are partly used for display applications as light sources. Furthermore, in order to utilize these phosphors having EL characteristics for full-color display applications, it is desired to provide a high-luminance zinc sulfide-based blue phosphor.
硫化亜鉛系蛍光体の製造方法としては、硫化亜鉛に銅、マンガン、酸化亜鉛、硫黄および塩化物含有融剤を添加して、1100℃~1250℃で焼成させ、焼成物質を摩砕して結晶構造に欠陥を誘導した後、銅、マンガンおよび酸化亜鉛を添加して750℃~950℃で焼成し、その後1時間以内に200℃未満にまで急冷する方法が提案されている(特許文献1)。ただし、特許文献1は、黄橙色蛍光体の製造に関する技術であり、青色蛍光体は得られていない。 As a method for producing a zinc sulfide phosphor, copper, manganese, zinc oxide, sulfur and a chloride-containing flux are added to zinc sulfide and fired at 1100 ° C. to 1250 ° C., and the fired material is ground and crystallized. A method has been proposed in which after defects are introduced into the structure, copper, manganese, and zinc oxide are added and fired at 750 ° C. to 950 ° C., and then rapidly cooled to less than 200 ° C. within 1 hour (Patent Document 1). . However, Patent Document 1 is a technique relating to the production of a yellow-orange phosphor, and a blue phosphor is not obtained.
蛍光発色の波長(色)は添加される賦活剤の種類に依存し、銅を賦活剤として用いると青緑色の発色となることが知られている。高輝度のEL蛍光体素子を形成するために、母体となる硫化亜鉛に賦活剤をドープする方法としては、水熱合成法(例えば特許文献2)や液相法(例えば特許文献3)により形成した前駆体を焼成する方法が提案されている。しかし、特許文献2および3は、特許文献1により提案されている結晶構造の欠陥に賦活剤となる金属を導入する方法とは異なり、焼成前の前駆体に賦活剤となる金属イオンを導入する方法である。 The wavelength (color) of fluorescent color development depends on the type of activator added, and it is known that when copper is used as the activator, a blue-green color develops. In order to form a high-luminance EL phosphor element, as a method of doping an activator to zinc sulfide as a base material, a hydrothermal synthesis method (for example, Patent Document 2) or a liquid phase method (for example, Patent Document 3) is used. There has been proposed a method for firing the precursor. However, Patent Documents 2 and 3 differ from the method of introducing a metal that becomes an activator into the defects of the crystal structure proposed by Patent Document 1 and introduce metal ions that become the activator into the precursor before firing. Is the method.
固相焼成法は、前駆体粒子の粒径や、ドープ時の金属塩との混合方法の影響が強く、粒子内および粒子間での金属塩の偏在により発光色が均質とならない問題がある。 The solid-phase firing method is strongly influenced by the particle size of the precursor particles and the mixing method with the metal salt at the time of doping, and there is a problem that the emission color is not uniform due to the uneven distribution of the metal salt within and between the particles.
水熱合成法は、硫化水素が発生するため、反応設備の腐食や工業化のためのスケールアップが困難であるなどの問題がある。 The hydrothermal synthesis method has problems such as corrosion of reaction equipment and difficulty in scaling up for industrialization because hydrogen sulfide is generated.
液相焼成法は、液相からの金属の析出速度が異なり、粒子内での均質性が低くなるという問題がある。 The liquid phase firing method has a problem that the deposition rate of the metal from the liquid phase is different and the homogeneity within the particles is lowered.
したがって、本発明の目的は、工業的に実用可能な硫化亜鉛系青色蛍光体の製造方法を提供することにある。 Therefore, an object of the present invention is to provide a method for producing a zinc sulfide-based blue phosphor that is industrially practical.
本発明者らは、硫化亜鉛系蛍光体の製造工程の各々の処理条件が、得られる硫化亜鉛系蛍光体の物性に著しく影響することに着目して、各工程について詳細に検討した。本発明者らは、特に一次焼成工程と二次焼成工程との間で行う結晶構造への欠陥の導入、および二次焼成工程における冷却条件が、青色発光に寄与することを知見し、本発明を完成するに至った。 The present inventors examined each process in detail, paying attention to the fact that each processing condition of the manufacturing process of the zinc sulfide-based phosphor significantly affects the physical properties of the obtained zinc sulfide-based phosphor. The present inventors have found that the introduction of defects into the crystal structure performed between the primary firing step and the secondary firing step, and the cooling conditions in the secondary firing step contribute to blue light emission. It came to complete.
本発明によれば、硫化亜鉛系蛍光体前駆体を焼成して硫化亜鉛系青色蛍光体を製造する方法であって、
(a)硫化亜鉛系蛍光体前駆体に融剤を添加し、1000℃以上1200℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、700℃以下の温度に急冷して、六方晶構造を導入した一次焼成物を形成する一次焼成工程、
(b)当該一次焼成物を水性液に分散させてなる分散液に超音波を照射し、一次焼成物の六方晶構造の一部を立方晶構造に転移させる超音波処理工程、
(c)六方晶構造と立方晶構造とが混在する一次焼成物を不活性ガス雰囲気下で650℃以上1000℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、冷却する二次焼成工程
を含むことを特徴とする方法が提供される。
According to the present invention, a method for producing a zinc sulfide-based blue phosphor by firing a zinc sulfide-based phosphor precursor,
(A) A flux is added to the zinc sulfide-based phosphor precursor, and the temperature is raised to a constant temperature within a range of 1000 ° C. or higher and 1200 ° C. or lower and maintained at that temperature, and then rapidly cooled to a temperature of 700 ° C. or lower. A primary firing step for forming a primary fired product having a hexagonal crystal structure introduced;
(B) an ultrasonic treatment step of irradiating the dispersion obtained by dispersing the primary fired product in an aqueous liquid with ultrasonic waves to transfer a part of the hexagonal crystal structure of the primary fired product into a cubic structure;
(C) The primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed is heated to a constant temperature within a range of 650 ° C. or higher and 1000 ° C. or lower in an inert gas atmosphere, and then cooled. A method is provided that includes a secondary firing step.
また、本発明は以下の態様をも提供する。 The present invention also provides the following aspects.
前記(b)超音波処理工程の前に前記一次焼成物を不活性雰囲気下に100℃以上500℃以下の範囲内の一定温度に保持するアニール工程、および前記(c)二次焼成工程において650℃以上1000℃以下の範囲内の一定温度を保持した後に、室温まで冷却する過程において、300℃以下から室温までの温度範囲を150℃/hr以下の冷却速度で冷却する冷却制御の少なくとも一方をさらに含む。 Before the (b) ultrasonic treatment step, the primary firing product is maintained at a constant temperature in the range of 100 ° C. or more and 500 ° C. or less in an inert atmosphere, and (c) 650 in the secondary firing step. At least one of cooling control for cooling the temperature range from 300 ° C. or less to room temperature at a cooling rate of 150 ° C./hr or less in the process of cooling to room temperature after maintaining a constant temperature in the range of ℃ to 1000 ° C. In addition.
前記(b)超音波処理工程の前に前記一次焼成物を不活性雰囲気下に100℃以上500℃以下の範囲内の一定温度に保持するアニール工程、および前記(c)二次焼成工程において冷却制御の少なくとも一方をさらに含む。 (B) An annealing step for maintaining the primary fired product at a constant temperature within a range of 100 ° C. or higher and 500 ° C. or lower in an inert atmosphere before the ultrasonic treatment step, and (c) cooling in the secondary firing step. It further includes at least one of the controls.
前記(b)超音波照射工程において、1000kW/m3以上6000kW/m3以下の出力の超音波を照射する。 In the (b) ultrasonic irradiation step, ultrasonic waves having an output of 1000 kW / m 3 or more and 6000 kW / m 3 or less are irradiated.
前記(a)一次焼成工程は、前記硫化亜鉛系蛍光前駆体と融剤との混合物を300℃以上850℃以下の範囲内の一定温度まで酸素含有雰囲気下で昇温する工程を含む。 The (a) primary firing step includes a step of raising the temperature of the mixture of the zinc sulfide-based fluorescent precursor and the flux to a constant temperature within a range of 300 ° C. to 850 ° C. in an oxygen-containing atmosphere.
前記(c)二次焼成工程は、650℃以上の温度に達した後、酸素含有雰囲気に切り替える工程を含む。 The (c) secondary firing step includes a step of switching to an oxygen-containing atmosphere after reaching a temperature of 650 ° C. or higher.
前記(c)二次焼成工程は、前記六方晶構造と立方晶構造とが混在する一次焼成物に銅を含む化合物および亜鉛を含む化合物を添加して昇温することを含むことが好ましい。 The (c) secondary firing step preferably includes adding a compound containing copper and a compound containing zinc to the primary fired product in which the hexagonal crystal structure and the cubic crystal structure are mixed to increase the temperature.
前記硫化亜鉛系蛍光体前駆体は、硫化亜鉛と、銅、銀、イリジウムおよび希土類元素を含む化合物およびこれらの組み合わせと、から選ばれた少なくとも1種類を含む無機組成物である。 The zinc sulfide-based phosphor precursor is an inorganic composition containing at least one selected from zinc sulfide, a compound containing copper, silver, iridium and a rare earth element, and a combination thereof.
前記硫化亜鉛系蛍光体前駆体は、亜鉛化合物と、銅、銀、イリジウムおよび希土類元素を含む化合物から選ばれた少なくとも1種類の化合物と、を含む水溶液に硫化剤を添加し、反応させて得られる無機組成物である。 The zinc sulfide based phosphor precursor is obtained by adding a sulfurizing agent to an aqueous solution containing a zinc compound and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements, and reacting them. It is an inorganic composition.
前記硫化亜鉛系蛍光体前駆体は、亜鉛化合物と、硫化剤と、銅、銀、イリジウムおよび希土類元素を含む化合物から選ばれた少なくとも1種類の化合物と、を含む水溶液を有機溶媒中に添加して反応混合液とし、該反応混合液を加熱し、水と有機溶媒とを共沸させて水を除去することによって得られる無機組成物である。 The zinc sulfide-based phosphor precursor is obtained by adding an aqueous solution containing a zinc compound, a sulfiding agent, and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements to an organic solvent. It is an inorganic composition obtained by heating the reaction mixture and removing water by azeotroping water and an organic solvent.
前記硫化剤は、チオアセトアミドおよび/または硫化水素である。 The sulfurizing agent is thioacetamide and / or hydrogen sulfide.
また、本発明によれば、上記製造方法により得られる色度座標(x、y)=(≦0.2、≦0.2)である硫化亜鉛系青色蛍光体が提供される。 Moreover, according to the present invention, there is provided a zinc sulfide-based blue phosphor having chromaticity coordinates (x, y) = (≦ 0.2, ≦ 0.2) obtained by the above production method.
本発明の製造方法により、実用性のある高い輝度を有する硫化亜鉛系青色蛍光体を工業的に有利に製造することができる。 The production method of the present invention makes it possible to industrially advantageously produce a zinc sulfide-based blue phosphor having practical and high brightness.
本発明の硫化亜鉛系青色蛍光体の製造方法は、
(a)硫化亜鉛系蛍光体前駆体に融剤を添加し、1000℃以上1200℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、700℃以下の温度に急冷して、六方晶を含む一次焼成物を形成する一次焼成工程、
(b)当該一次焼成物を水性液に分散させてなる分散液に超音波を照射し、一次焼成物の六方晶の一部を立方晶に変換させて六方晶構造と立方晶構造とが混在する一次焼成物を形成する超音波照射工程、
(c)当該六方晶構造と立方晶構造とが混在する一次焼成物を不活性ガス雰囲気下で650℃以上1000℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、冷却する二次焼成工程
を含むことを特徴とする。
The method for producing the zinc sulfide blue phosphor of the present invention comprises:
(A) A flux is added to the zinc sulfide-based phosphor precursor, and the temperature is raised to a constant temperature within a range of 1000 ° C. or higher and 1200 ° C. or lower and maintained, and then rapidly cooled to a temperature of 700 ° C. or lower. A primary firing step for forming a primary fired product containing hexagonal crystals,
(B) The dispersion obtained by dispersing the primary fired product in an aqueous liquid is irradiated with ultrasonic waves, and a part of the hexagonal crystal of the primary fired product is converted into a cubic crystal so that a hexagonal structure and a cubic structure are mixed. An ultrasonic irradiation process for forming a primary fired product,
(C) The primary fired product in which the hexagonal crystal structure and the cubic crystal structure are mixed is heated to a constant temperature within a range of 650 ° C. or higher and 1000 ° C. or lower in an inert gas atmosphere, and then cooled. Including a secondary firing step.
なお、本願特許請求の範囲および明細書において「一定温度に保持する」とは、±5℃の誤差範囲内で一定温度に保持することを意味する。 In the claims and specification of the present application, “keep at a constant temperature” means to keep at a constant temperature within an error range of ± 5 ° C.
以下、処理手順に従って工程ごとに本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail for each process according to the processing procedure.
<硫化亜鉛系蛍光体前駆体>
本発明で用いることができる硫化亜鉛系蛍光体前駆体(以下「前駆体」と称することもある)としては、光吸収による励起で蛍光を示さない硫化亜鉛を主成分とする無機組成物であれば特に制限されないが、硫化亜鉛と、銅、銀、イリジウムおよび希土類元素を含む化合物およびこれらの組み合わせと、から選ばれた少なくとも1種類を含む無機組成物を好適例として挙げることができる。
<Zinc sulfide based phosphor precursor>
The zinc sulfide-based phosphor precursor (hereinafter sometimes referred to as “precursor”) that can be used in the present invention is an inorganic composition mainly composed of zinc sulfide that does not exhibit fluorescence when excited by light absorption. Although it does not restrict | limit in particular, The inorganic composition containing at least 1 sort (s) chosen from zinc sulfide, the compound containing copper, silver, iridium, and rare earth elements, and these combinations can be mentioned as a suitable example.
硫化亜鉛は、特に限定されないが、鉄、ニッケル、クロムなどの異種金属を含まない硫化亜鉛が好ましく、通常、99%以上の純度であればよい。硫化亜鉛の結晶系は、立方晶系および六方晶系の何れであってもよい。硫化亜鉛の粒径は、一次粒子の粒径として10nm以上20μm以下の範囲が好ましく、凝集体の粒径として1μm以上20μmの範囲が好ましい。 Zinc sulfide is not particularly limited, but zinc sulfide not containing different metals such as iron, nickel, and chromium is preferable, and the purity is usually 99% or more. The crystal system of zinc sulfide may be either cubic or hexagonal. The particle size of zinc sulfide is preferably in the range of 10 nm to 20 μm as the particle size of primary particles, and the particle size of the aggregate is preferably in the range of 1 μm to 20 μm.
銅、銀、イリジウムおよび希土類元素を含む化合物は、後述する焼成工程を経て、母体となる硫化亜鉛にドープされ、硫化亜鉛系蛍光体の発光中心として作用する。これらの金属元素の含有量は、得られる硫化亜鉛系蛍光体前駆体の重量を基準として、0.1ppm以上150000ppm以下の範囲が好ましく、1ppm以上50000ppm以下の範囲がより好ましく、2ppm以上10000ppm以下の範囲が特に好ましい。 A compound containing copper, silver, iridium, and a rare earth element is doped into zinc sulfide, which is a base material, through a firing step described later, and acts as a light emission center of the zinc sulfide-based phosphor. The content of these metal elements is preferably in the range of 0.1 ppm to 150,000 ppm, more preferably in the range of 1 ppm to 50000 ppm, more preferably in the range of 2 ppm to 10,000 ppm, based on the weight of the obtained zinc sulfide-based phosphor precursor. A range is particularly preferred.
銅、銀、イリジウムおよび希土類元素を含む化合物としては、アクセプターとして作用する銅、銀、イリジウムおよび希土類元素に対してドナーとして作用するアルミニウム、ガリウム、インジウムなどの元素を含む化合物を好適例として挙げることができる。当該化合物は、塩酸、硫酸、硝酸、リン酸などとの鉱酸塩、ギ酸、酢酸、酪酸、シュウ酸などとの有機酸塩、アセチルアセトネートなどを配位子とする錯塩の形態で使用することができる。中でも、安定性および残留性の点から、鉱酸塩および有機酸塩を好ましく使用することができる。 Preferred examples of compounds containing copper, silver, iridium and rare earth elements include compounds containing elements such as copper, silver, iridium and rare earth elements that act as acceptors and elements such as aluminum, gallium, and indium that act as donors. Can do. The compounds are used in the form of mineral salts with hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc., organic acid salts with formic acid, acetic acid, butyric acid, oxalic acid, etc., and complex salts with acetylacetonate as a ligand. be able to. Among these, mineral acid salts and organic acid salts can be preferably used from the viewpoints of stability and persistence.
本発明において用いる硫化亜鉛系蛍光体前駆体は、以下の方法で調製することができる。
(1)硫化亜鉛粒子と、固体形態の銅、銀、イリジウムおよび希土類元素を含む化合物と、を解砕しながら混合する。
(2)亜鉛化合物と、銅、銀、イリジウムおよび希土類元素を含む化合物から選ばれた少なくとも1種類の化合物と、を含む水溶液に硫化剤を添加して反応させる。
(3)亜鉛化合物と、硫化剤と、銅、銀、イリジウムおよび希土類元素を含む化合物から選ばれた少なくとも1種類の化合物と、を含む水溶液を有機溶媒中に添加して反応混合液とし、該反応混合液を加熱し、水と有機溶媒とを共沸させて水を除去する。
The zinc sulfide-based phosphor precursor used in the present invention can be prepared by the following method.
(1) Zinc sulfide particles are mixed with a solid form compound containing copper, silver, iridium and a rare earth element while being crushed.
(2) A sulfurizing agent is added to an aqueous solution containing a zinc compound and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements, and reacted.
(3) An aqueous solution containing a zinc compound, a sulfiding agent, and at least one compound selected from compounds containing copper, silver, iridium and rare earth elements is added to an organic solvent to form a reaction mixture, The reaction mixture is heated and water and organic solvent are azeotroped to remove water.
(1)の解砕および混合は、市販の解砕混合機を用いて行うことができる。 (1) Crushing and mixing can be performed using a commercially available crushing mixer.
(2)および(3)の反応は、亜鉛化合物と硫化剤とから硫化亜鉛系蛍光体前駆体を調製する方法である。(2)の反応では亜鉛化合物を含む水溶液に硫化剤を添加し、(3)の反応では亜鉛化合物と硫化剤とを含む水溶液を用いる。(2)の反応は、特に気体として硫化剤を連続的に添加する場合に適している。 The reactions (2) and (3) are methods for preparing a zinc sulfide-based phosphor precursor from a zinc compound and a sulfurizing agent. In the reaction (2), a sulfurizing agent is added to an aqueous solution containing a zinc compound, and in the reaction (3), an aqueous solution containing a zinc compound and a sulfurizing agent is used. The reaction (2) is particularly suitable when a sulfurizing agent is continuously added as a gas.
(2)および(3)の反応において用いることができる亜鉛化合物としては、塩酸、硫酸、硝酸、リン酸などとの鉱酸塩、ギ酸、酢酸、酪酸、シュウ酸などとの有機酸塩、アセチルアセトネートなどを配位子とする錯塩を挙げることができる。中でも、安定性および残留性の点から、有機酸塩を好ましく使用することができる。なお、亜鉛化合物は、1種類を単独で用いても複数種類を組み合わせて用いてもよい。亜鉛化合物の水溶液中の濃度は、0.01モル/L以上2モル/L以下が好ましく、0.1モル/L以上1.5モル/L以下がより好ましい。亜鉛化合物の濃度が高すぎると、反応により生成される硫化亜鉛の析出に伴い反応速度が低下し、濃度が低すぎると、バッチあたりの生産量が低下して容積効率が著しく低下する。 Zinc compounds that can be used in the reactions (2) and (3) include mineral acid salts with hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc., organic acid salts with formic acid, acetic acid, butyric acid, oxalic acid, etc., acetyl The complex salt which uses acetonate etc. as a ligand can be mentioned. Among these, organic acid salts can be preferably used from the viewpoint of stability and persistence. In addition, a zinc compound may be used individually by 1 type, or may be used in combination of multiple types. The concentration of the zinc compound in the aqueous solution is preferably 0.01 mol / L or more and 2 mol / L or less, and more preferably 0.1 mol / L or more and 1.5 mol / L or less. If the concentration of the zinc compound is too high, the reaction rate decreases with the precipitation of zinc sulfide produced by the reaction, and if the concentration is too low, the production amount per batch decreases and the volumetric efficiency decreases significantly.
(2)および(3)の反応において用いることができる硫化剤としては、特に限定されるものではないが、硫化水素、硫化ナトリウム、硫化カリウムなどのアルカリ金属硫化物、チオアセトアミド、チオホルムアミドなどのチオアミド類、チオ尿素などを使用することができる。分解温度、安定性、分解物の残留性の点から、硫化水素、チオアセトアミド、チオ尿素を好ましく用いることができる。中でも、チオアセトアミドおよび硫化水素を特に好ましく用いることができる。硫化剤は、亜鉛元素に対するモル比で0.5倍以上5倍以下の量で用いることが好ましく、1.1倍以上4倍以下の量がより好ましく、1.1倍以上2倍以下の量で用いることが特に好ましい。上記範囲外では、亜鉛化合物が未反応のまま残留して反応に好ましくない影響を与え、蛍光体としての色純度の低下を招くおそれがある。硫化剤の水溶液中における濃度は、0.01モル/L以上2モル/L以下が好ましく、0.1モル/L以上1.5モル/L以下であることがより好ましい。上記範囲外では、硫化物および亜鉛化合物が未反応のまま析出して残留してしまうおそれがある。 The sulfurizing agent that can be used in the reactions (2) and (3) is not particularly limited, but includes alkali metal sulfides such as hydrogen sulfide, sodium sulfide, and potassium sulfide, thioacetamide, thioformamide, and the like. Thiamides, thioureas and the like can be used. Hydrogen sulfide, thioacetamide, and thiourea can be preferably used from the viewpoints of decomposition temperature, stability, and persistence of decomposition products. Among these, thioacetamide and hydrogen sulfide can be particularly preferably used. The sulfurizing agent is preferably used in an amount of 0.5 to 5 times the molar ratio to the zinc element, more preferably 1.1 to 4 times, and more preferably 1.1 to 2 times. It is particularly preferred to use in Outside the above range, the zinc compound may remain unreacted and adversely affect the reaction, leading to a decrease in color purity as a phosphor. The concentration of the sulfiding agent in the aqueous solution is preferably 0.01 mol / L or more and 2 mol / L or less, and more preferably 0.1 mol / L or more and 1.5 mol / L or less. Outside the above range, the sulfide and the zinc compound may be precipitated and remain unreacted.
(2)および(3)の反応において、水溶液に用いる水は、灰分の含有量が100ppm以下、好ましくは10ppm以下のイオン交換水であることが望ましい。金属イオンを不純物として含む水は、硫化亜鉛系蛍光体の発光色に影響を与えるので好ましくない。 In the reactions (2) and (3), the water used in the aqueous solution is preferably ion-exchanged water having an ash content of 100 ppm or less, preferably 10 ppm or less. Water containing metal ions as impurities is not preferable because it affects the emission color of the zinc sulfide phosphor.
(3)の反応において用いることができる有機溶媒としては、共沸脱水により水を除去することができるものであれば特に限定されない。好適例としては、ヘキサン、シクロヘキサン、ヘプタン、オクタン、シクロオクタン、ノナン、デカン、ドデカン、シクロドデカン、ウンデカンなどの飽和炭化水素、トルエン、キシレン、メシチレンなどの芳香族炭化水素、四塩化炭素、1,2-ジクロロエタン、1,1,2,2-テトラクロロエチレンなどのハロゲン化炭化水素、クロロベンゼン、ジクロロベンゼンなどのハロゲン化芳香族炭化水素、ジブチルエーテル、ジイソブチルエーテル、アミルエーテル、ジイソアミルエーテル、ジヘキシルエーテル、ジシクロヘキシルエーテル、ジオクチルエーテル、ジシクロオクチルエーテル、アニソール、フェニルエチルエーテル、フェニルプロピルエーテル、フェニルブチルエーテルなどのエーテル類、ブチルアルコール、アミルアルコール、イソアミルアルコール、ヘキシルアルコール、ヘプチルアルコール、オクチルアルコール、シクロオクチルアルコールなどのアルコール類、酢酸ブチル、酢酸アミル、酢酸イソアミル、酪酸ブチル、酪酸アミル、酪酸イソアミル、安息香酸メチル、安息香酸エチルなどのエステル類などを挙げることができる。中でも、有機溶媒の安定性および安全性、水の除去効率、生成する硫化物および原料塩の溶解による損失の点から、飽和炭化水素系および芳香族炭化水素系有機溶媒が好ましい。特に、水との共沸温度および共沸割合の点から、デカン、ドデカンおよびキシレンが好ましい。有機溶媒の使用量は、亜鉛化合物を溶解させた水溶液の使用量よりも多く、生成する硫化亜鉛を保持できる量であればよい。 The organic solvent that can be used in the reaction (3) is not particularly limited as long as it can remove water by azeotropic dehydration. Preferable examples include hexane, cyclohexane, heptane, octane, cyclooctane, nonane, decane, dodecane, cyclododecane, undecane and other saturated hydrocarbons, toluene, xylene, mesitylene and other aromatic hydrocarbons, carbon tetrachloride, 1, Halogenated hydrocarbons such as 2-dichloroethane and 1,1,2,2-tetrachloroethylene, halogenated aromatic hydrocarbons such as chlorobenzene and dichlorobenzene, dibutyl ether, diisobutyl ether, amyl ether, diisoamyl ether, dihexyl ether, dicyclohexyl Ethers such as ether, dioctyl ether, dicyclooctyl ether, anisole, phenylethyl ether, phenylpropyl ether, phenylbutyl ether, butyl alcohol, amyl alcohol , Alcohols such as isoamyl alcohol, hexyl alcohol, heptyl alcohol, octyl alcohol, cyclooctyl alcohol, esters such as butyl acetate, amyl acetate, isoamyl acetate, butyl butyrate, amyl butyrate, isoamyl butyrate, methyl benzoate, ethyl benzoate And the like. Among these, saturated hydrocarbon-based and aromatic hydrocarbon-based organic solvents are preferable from the viewpoints of stability and safety of organic solvents, water removal efficiency, and loss due to dissolution of sulfides and raw material salts to be generated. In particular, decane, dodecane and xylene are preferred from the viewpoint of the azeotropic temperature and azeotropic ratio with water. The amount of the organic solvent used may be larger than the amount of the aqueous solution in which the zinc compound is dissolved, as long as the generated zinc sulfide can be retained.
(3)の反応において反応混合液を加熱する温度は、30℃以上300℃以下の範囲が好ましく、40℃以上230℃以下の範囲がより好ましく、60℃以上200℃以下の範囲がさらに好ましく、80℃以上180℃以下の範囲が特に好ましい。40℃以上230℃以下の温度範囲であれば、特殊な設備を使用する必要がないので実用上有利である。また、60℃以上200℃以下の温度範囲は、硫化物としてチオアセトアミドを用いる場合に有利である。 The temperature for heating the reaction mixture in the reaction of (3) is preferably in the range of 30 ° C. to 300 ° C., more preferably in the range of 40 ° C. to 230 ° C., and still more preferably in the range of 60 ° C. to 200 ° C. A range of 80 ° C. or higher and 180 ° C. or lower is particularly preferable. If it is a temperature range of 40 degreeC or more and 230 degrees C or less, since it is not necessary to use a special installation, it is advantageous practically. A temperature range of 60 ° C. or more and 200 ° C. or less is advantageous when thioacetamide is used as the sulfide.
(2)および(3)の反応は、酸素の存在により硫化亜鉛の酸化を完全に抑制できないおそれがあるため、硫化水素ガスおよび/または窒素およびアルゴンなどの不活性ガスの存在下で行うことが好ましい。 The reactions (2) and (3) may be performed in the presence of hydrogen sulfide gas and / or an inert gas such as nitrogen and argon because there is a possibility that the oxidation of zinc sulfide may not be completely suppressed due to the presence of oxygen. preferable.
(2)および(3)の反応において、析出した硫化亜鉛および金属元素を含む無機組成物は、必要に応じて、水洗などの洗浄を経て、加熱および減圧乾燥される。乾燥する際の温度は、10℃以上200℃以下で実施することができるが、水分の存在による酸化を防止するため、10℃以上150℃以下が好ましく、50℃以上120℃以下がより好ましい。 In the reactions (2) and (3), the deposited inorganic composition containing zinc sulfide and the metal element is subjected to washing such as water washing and drying under reduced pressure as necessary. The drying temperature can be 10 ° C. or more and 200 ° C. or less, but is preferably 10 ° C. or more and 150 ° C. or less, more preferably 50 ° C. or more and 120 ° C. or less in order to prevent oxidation due to the presence of moisture.
<融剤の添加>
本発明の製造方法では、一次焼成工程において、硫化亜鉛系蛍光体前駆体に融剤を添加する。
<Addition of flux>
In the production method of the present invention, a flux is added to the zinc sulfide-based phosphor precursor in the primary firing step.
融剤としては、ハロゲン含有融剤、特に塩素含有融剤を好ましく使用することができる。塩素含有融剤の好適例としては、塩化リチウム、塩化ナトリウム、塩化カリウム、塩化セシウムなどのアルカリ金属塩化物、塩化カルシウム、塩化マグネシウム、塩化バリウム、塩化ストロンチウムなどのアルカリ土類金属塩化物、塩化アンモニウム、塩化亜鉛などを挙げることができる。臭素含有融剤の好適例としては、臭化リチウム、臭化ナトリウム、臭化カリウム、臭化セシウムなどのアルカリ金属臭化物、臭化カルシウム、臭化マグネシウム、臭化バリウム、臭化ストロンチウムなどのアルカリ土類金属臭化物、臭化アンモニウム、臭化亜鉛などを挙げることができる。ヨウ素含有融剤の好適例としては、ヨウ化リチウム、ヨウ化ナトリウム、ヨウ化カリウム、ヨウ化セシウムなどのアルカリ金属ヨウ化物、ヨウ化カルシウム、ヨウ化マグネシウム、ヨウ化バリウム、ヨウ化ストロンチウムなどのアルカリ土類金属ヨウ化物、ヨウ化アンモニウム、ヨウ化亜鉛などを挙げることができる。残留性、融剤の融化温度の点から、複数の金属ハロゲン化物を混合することが好ましい。塩化カリウム、塩化ナトリウムおよび塩化マグネシウムの混合物を用いることがより好ましい。 As the flux, a halogen-containing flux, particularly a chlorine-containing flux can be preferably used. Preferable examples of the chlorine-containing flux include alkali metal chlorides such as lithium chloride, sodium chloride, potassium chloride, and cesium chloride, alkaline earth metal chlorides such as calcium chloride, magnesium chloride, barium chloride, and strontium chloride, and ammonium chloride. And zinc chloride. Preferable examples of the bromine-containing flux include alkali metal bromides such as lithium bromide, sodium bromide, potassium bromide and cesium bromide, alkaline earth such as calcium bromide, magnesium bromide, barium bromide and strontium bromide. Examples include metal bromides, ammonium bromides, zinc bromides and the like. Preferable examples of the iodine-containing flux include alkali metal iodides such as lithium iodide, sodium iodide, potassium iodide and cesium iodide, alkalis such as calcium iodide, magnesium iodide, barium iodide and strontium iodide. There may be mentioned earth metal iodide, ammonium iodide, zinc iodide and the like. It is preferable to mix a plurality of metal halides from the viewpoint of persistence and the melting temperature of the flux. More preferably, a mixture of potassium chloride, sodium chloride and magnesium chloride is used.
融剤の使用量としては、特に制限されるものではないが、通常、硫化亜鉛中の濃度として、0.1wt%以上80wt%以下が好ましい。融剤の均一分散などの影響を考慮して、0.5wt%以上60wt%以下がより好ましく、1wt%以上40wt%以下が特に好ましい。 The amount of the flux used is not particularly limited, but usually the concentration in the zinc sulfide is preferably 0.1 wt% or more and 80 wt% or less. Considering the influence of the uniform dispersion of the flux, etc., 0.5 wt% or more and 60 wt% or less is more preferable, and 1 wt% or more and 40 wt% or less is particularly preferable.
融剤の添加方法は、特に限定されるものではなく、固体の融剤と硫化亜鉛系蛍光体前駆体とを混合する固体混合法、融剤を水に溶解した後、硫化亜鉛系蛍光体前駆体と混合し乾燥する水溶液混合法、および使用する融剤の化学的安定性を考慮して、固体混合法と水溶液混合法とを組み合わせてもよい。 The method of adding the flux is not particularly limited, and is a solid mixing method in which a solid flux and a zinc sulfide-based phosphor precursor are mixed. After the flux is dissolved in water, the zinc sulfide-based phosphor precursor is mixed. The solid mixing method and the aqueous solution mixing method may be combined in consideration of the aqueous solution mixing method of mixing with the body and drying, and the chemical stability of the flux used.
<硫黄の添加>
本発明の製造方法では、一次焼成工程において、硫化亜鉛系蛍光体前駆体に融剤と共に硫黄を添加してもよい。硫黄の添加により、焼成時の焼成炉内雰囲気を還元雰囲気に維持して、存在するかもしれない水および酸素による硫化亜鉛の酸化を抑制することができる。硫化亜鉛の酸化を抑制することを目的とする硫黄の添加量は、硫化亜鉛の重量を基準として0.01倍以上2倍以下が好ましく、0.02倍以上1倍以下がより好ましい。
<Addition of sulfur>
In the production method of the present invention, sulfur may be added together with the flux to the zinc sulfide-based phosphor precursor in the primary firing step. By adding sulfur, the atmosphere in the firing furnace during firing can be maintained in a reducing atmosphere, and the oxidation of zinc sulfide by water and oxygen that may be present can be suppressed. The amount of sulfur added for the purpose of suppressing oxidation of zinc sulfide is preferably 0.01 times or more and 2 times or less, more preferably 0.02 times or more and 1 time or less, based on the weight of zinc sulfide.
<一次焼成>
本発明の製造方法の一次焼成工程では、硫化亜鉛系蛍光体前駆体に融剤および好ましくは硫黄を添加し、常温から1000℃以上1200℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、700℃以下の温度に急冷して、六方晶構造を導入した一次焼成物を形成する。
<Primary firing>
In the primary firing step of the production method of the present invention, a flux and preferably sulfur is added to the zinc sulfide-based phosphor precursor, and the temperature is raised from room temperature to a constant temperature in the range of 1000 ° C. to 1200 ° C. Then, it is rapidly cooled to a temperature of 700 ° C. or lower to form a primary fired product having a hexagonal crystal structure.
常温から硫化亜鉛の結晶の成長が始まる直前の温度まで、好ましくは300℃以上850℃以下の温度範囲、より好ましくは300℃以上600℃以下の温度範囲では、焼成炉内に空気を連続的に導入して、酸素存在下で昇温する。この昇温の間に、融剤が融化し、硫化亜鉛が造粒される。850℃を超える温度まで酸素存在下で昇温すると、硫化亜鉛粒子内部が酸化され、蛍光を示さない部分が生成されてしまうので好ましくない。 From normal temperature to a temperature just before the start of crystal growth of zinc sulfide, preferably in the temperature range of 300 ° C. or higher and 850 ° C. or lower, more preferably in the temperature range of 300 ° C. or higher and 600 ° C. or lower, air is continuously introduced into the firing furnace. The temperature is increased in the presence of oxygen. During this temperature increase, the flux is melted and zinc sulfide is granulated. If the temperature is increased in the presence of oxygen to a temperature exceeding 850 ° C., the inside of the zinc sulfide particles is oxidized, and a portion not showing fluorescence is generated, which is not preferable.
次いで、窒素などの不活性ガス雰囲気下で1000℃以上1200℃以下の範囲内の一定温度まで昇温することが好ましい。昇温速度は、50℃/hr以上1000℃/hr以下が好ましく、60℃/hr以上900℃/hr以下がより好ましい。昇温速度が速すぎると、使用する機器に負荷がかかり、機器の寿命を低下させるばかりでなく、融剤の急激な分解を促進し、融化時間を短縮するため融剤の分散が不均一化しやすい。昇温速度が遅すぎると、経済的でない上に、低温融解性の融剤の場合、融剤が局在化して硫化亜鉛の粗大化を引き起こすため好ましくない。 Next, it is preferable to raise the temperature to a certain temperature within a range of 1000 ° C. or more and 1200 ° C. or less under an inert gas atmosphere such as nitrogen. The heating rate is preferably 50 ° C./hr or more and 1000 ° C./hr or less, more preferably 60 ° C./hr or more and 900 ° C./hr or less. If the rate of temperature rise is too fast, the equipment used will be overloaded, reducing the life of the equipment as well as promoting rapid decomposition of the flux and shortening the melt time, resulting in non-uniform dispersion of the flux. Cheap. If the rate of temperature rise is too slow, it is not economical, and in the case of a low-melting flux, the flux is localized and causes coarsening of zinc sulfide, which is not preferable.
1000℃以上1200℃以下の範囲内の一定温度に到達した後、当該温度を好ましくは約1時間以上約5時間以下にわたり保持し、次いで700℃以下の温度まで急冷する。ここで、急冷とは、自然放冷より冷却速度が大きい冷却を意味する。冷却速度は特に限定されるものではなくできるだけ早く冷却することが好ましいが、容器のヒートショックを考慮すれば、600℃/hr以上30000℃/hr(すなわち、毎分10℃以上毎分500℃以下)が好ましく、720℃/hr以上18000℃/hr(すなわち、毎分12℃以上毎分300℃以下)がより好ましい。 After reaching a certain temperature in the range of 1000 ° C. or more and 1200 ° C. or less, the temperature is preferably maintained for about 1 hour or more and about 5 hours or less, and then rapidly cooled to a temperature of 700 ° C. or less. Here, rapid cooling means cooling with a cooling rate greater than that of natural cooling. The cooling rate is not particularly limited, and it is preferable to cool as quickly as possible, but considering the heat shock of the container, 600 ° C./hr or more and 30000 ° C./hr (that is, 10 ° C./min or more and 500 ° C./min or less) ), Preferably 720 ° C./hr or more and 18000 ° C./hr (that is, 12 ° C./min or more and 300 ° C./min or less).
一次焼成工程における1000℃以上1200℃以下の範囲内の一定温度までの昇温、当該温度の保持および700℃以下の温度までの急冷により、六方晶構造へと変化した硫化亜鉛系蛍光体前駆体の結晶系を安定化させることができる。なお、約800℃を超えると硫化亜鉛系蛍光体前駆体の結晶系が変化し始め、約1020℃で立方晶構造から六方晶構造へと完全に変化する。この結晶系の転移は、X線回折による(100)面の回折パターンの出現によって確認することができる。 A zinc sulfide-based phosphor precursor that has been transformed into a hexagonal crystal structure by raising the temperature to a constant temperature in the range of 1000 ° C. to 1200 ° C. in the primary firing step, maintaining the temperature, and rapidly cooling to a temperature of 700 ° C. or less. The crystal system can be stabilized. When the temperature exceeds about 800 ° C., the crystal system of the zinc sulfide-based phosphor precursor starts to change, and at about 1020 ° C., the crystal structure completely changes from a cubic structure to a hexagonal structure. This transition of the crystal system can be confirmed by the appearance of a (100) plane diffraction pattern by X-ray diffraction.
<脱塩処理>
一次焼成工程により得られた一次焼成物は、次いで、脱塩される。脱塩は、酸性水溶液で洗浄し、次いでイオン交換水で洗液が中性になるまで洗浄することにより行うことができる。酸性水溶液としては、蟻酸、酢酸などの有機酸水溶液、塩酸、硫酸、リン酸などの鉱酸水溶液を使用することができる。硫化亜鉛への浸透性、表面への残留性を考慮して、酢酸、塩酸の使用が好ましい。
<Desalination treatment>
The primary fired product obtained by the primary firing process is then desalted. Desalting can be performed by washing with an acidic aqueous solution and then washing with ion exchange water until the washing becomes neutral. As the acidic aqueous solution, an organic acid aqueous solution such as formic acid or acetic acid, or a mineral acid aqueous solution such as hydrochloric acid, sulfuric acid or phosphoric acid can be used. Considering the permeability to zinc sulfide and the persistence on the surface, acetic acid and hydrochloric acid are preferably used.
<アニール処理>
本発明の製造方法においては、一次焼成工程の後、超音波処理を行う。しかし、超音波処理に先立ち、一次焼成工程の急冷時、一次焼成工程の直後または脱塩処理の後に、アニール処理を行うことがより好ましい。
<Annealing treatment>
In the production method of the present invention, ultrasonic treatment is performed after the primary firing step. However, prior to the ultrasonic treatment, it is more preferable to perform an annealing treatment immediately after the primary firing step or after the desalting treatment during the rapid cooling of the primary firing step.
本発明におけるアニール処理は、一次焼成工程において形成した一次焼成物の六方晶構造を安定化させるために行う熱処理である。一次焼成工程では、1000℃以上1200℃以下の範囲内の一定温度で六方晶構造に転移させた後、六方晶構造を維持するために700℃以下の温度まで急冷する。高温で形成された六方晶構造を維持しているために、六方晶構造には歪みが生じている。この歪みを持った状態で超音波処理すると、歪みの程度が不規則となる。この不規則な歪みは、二次焼成工程時には緩和し難く、最終的なエレクトロルミネッセンスによる発色の再現性が低下する。さらに、大きな歪みを持った状態で超音波処理すると、硫化亜鉛粒子の破砕などを併発して収率が低下する。 The annealing treatment in the present invention is a heat treatment performed for stabilizing the hexagonal crystal structure of the primary fired product formed in the primary firing process. In the primary firing step, after the transition to the hexagonal crystal structure at a constant temperature within the range of 1000 ° C. or higher and 1200 ° C. or lower, rapid cooling is performed to a temperature of 700 ° C. or lower in order to maintain the hexagonal crystal structure. Since the hexagonal crystal structure formed at a high temperature is maintained, the hexagonal crystal structure is distorted. If ultrasonic treatment is performed with this distortion, the degree of distortion becomes irregular. This irregular distortion is difficult to alleviate during the secondary firing step, and the reproducibility of color development by final electroluminescence is lowered. Furthermore, when ultrasonic treatment is performed in a state having a large strain, the yield is reduced due to simultaneous breakage of zinc sulfide particles.
アニール処理としては、窒素ガス雰囲気などの不活性ガス雰囲気下、立方晶構造に再転移しない温度域である100℃以上500℃以下、好ましくは150℃以上500℃以下、より好ましくは200℃以上480℃以下の温度域内の一定温度に、0.1時間以上30時間以内、好ましくは1時間以上20時間以内にわたり、一次焼成物を保持することが好ましい。アニール処理を酸素含有雰囲気下で行うと、硫化亜鉛粒子が酸化され、粒子表面に非発光性の物質や非導電性の物質が形成されてしまうので好ましくない。六方晶構造を安定化させるための歪みの緩和効率および経済性を考慮すれば、1時間以上20時間以内にわたり、150℃以上500℃以下の温度域に保持することが好ましい。なお、第一処理工程の急冷時にアニール処理を行う場合には、六方晶構造を維持するために、700℃までは急冷し、その後、上述の温度域に保持することになる。 As the annealing treatment, a temperature range of 100 ° C. to 500 ° C., preferably 150 ° C. to 500 ° C., more preferably 200 ° C. to 480 ° C., which is a temperature range that does not re-transform into a cubic structure in an inert gas atmosphere such as a nitrogen gas atmosphere. It is preferable to hold the primary fired product at a constant temperature within a temperature range of 0 ° C. or lower for 0.1 hours to 30 hours, preferably 1 hour to 20 hours. Annealing treatment in an oxygen-containing atmosphere is not preferable because the zinc sulfide particles are oxidized and a non-light-emitting substance or a non-conductive substance is formed on the particle surface. In consideration of strain relaxation efficiency and economic efficiency for stabilizing the hexagonal crystal structure, it is preferable to maintain the temperature in the temperature range of 150 ° C. to 500 ° C. for 1 hour to 20 hours. In the case where the annealing process is performed during the rapid cooling in the first processing step, the film is rapidly cooled to 700 ° C. in order to maintain the hexagonal crystal structure, and then maintained in the above temperature range.
<超音波処理>
一次焼成工程および好ましくはアニール処理工程を経た一次焼成物である硫化亜鉛粒子は、安定化した六方晶系結晶構造を約95%以上の割合で有する。本発明では、一次焼成物である硫化亜鉛粒子に、発光中心となる金属元素をドープするために、一次焼成物の六方晶構造の一部を立方晶構造に転移させ、六方晶構造と立方晶構造とを混在させる。六方晶構造と立方晶構造との比率は、六方晶構造:立方晶構造で90:10~55:45の範囲となることが好ましい。
<Sonication>
The zinc sulfide particles, which are the primary fired product that has undergone the primary firing process and preferably the annealing treatment process, have a stabilized hexagonal crystal structure in a proportion of about 95% or more. In the present invention, in order to dope the zinc sulfide particles as the primary fired product with a metal element serving as a luminescent center, a part of the hexagonal crystal structure of the primary fired product is transferred to the cubic structure, and the hexagonal crystal structure and the cubic crystal are obtained. Mix with structure. The ratio of the hexagonal structure to the cubic structure is preferably in the range of 90:10 to 55:45 in the hexagonal structure: cubic structure.
本発明では、一次焼成物を水性液に分散させてなる分散液に超音波を照射して、一次焼成物に六方晶構造と立方晶構造とを混在させる。 In the present invention, ultrasonic waves are applied to a dispersion obtained by dispersing a primary fired product in an aqueous liquid, and the primary fired product is mixed with a hexagonal crystal structure and a cubic crystal structure.
水性液としては、水、水と水溶性有機溶媒との混合物などを好ましく挙げることができるが、反応に影響を与えないものであれば、特に制限されない。水溶性有機溶媒は2種以上の化合物の混合物でもよく、たとえば、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、プロピレングリコール、1,4-ブタンジオールなどのアルコール類、酢酸メチル、酢酸エチル、酢酸ブチル、安息香酸メチル、フタル酸ジメチルなどのエステル類、テトラヒドロフラン、テトラヒドロピラン、ジプロピルエーテル、ジブチルエーテル、ジエチレングリコール、テトラエチレングリコールなどのエーテル類を好ましく使用することができる。中でも、引火性の低さおよび酸化力の弱さなどを考慮して、アルコール類を使用することが好ましく、特にメタノールおよびエタノールが好ましい。 Preferred examples of the aqueous liquid include water and a mixture of water and a water-soluble organic solvent, but are not particularly limited as long as they do not affect the reaction. The water-soluble organic solvent may be a mixture of two or more compounds, for example, alcohols such as methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, 1,4-butanediol, methyl acetate, ethyl acetate, butyl acetate Esters such as methyl benzoate and dimethyl phthalate, and ethers such as tetrahydrofuran, tetrahydropyran, dipropyl ether, dibutyl ether, diethylene glycol, and tetraethylene glycol can be preferably used. Among these, alcohols are preferably used in consideration of low flammability and weak oxidizing power, and methanol and ethanol are particularly preferable.
一次焼成物の分散液中濃度は、0.1wt%以上50wt%以下、好ましくは0.5wt%以上30wt%以下、より好ましくは0.7wt%以上20wt%以下の範囲に調整することが望ましい。濃度が高すぎると、粒子同士の研磨作用を助長するため好ましくなく、濃度が低すぎると、処理コストが高くなるため好ましくない。なお、超音波照射時の分散液の温度は、揮発による分散液濃度変化を考慮して、1℃以上90℃以下の範囲、好ましくは2℃以上80℃以下の範囲、より好ましくは3℃以上60℃以下の範囲とすることが望ましい。 It is desirable to adjust the concentration of the primary baked product in the dispersion to a range of 0.1 wt% to 50 wt%, preferably 0.5 wt% to 30 wt%, more preferably 0.7 wt% to 20 wt%. If the concentration is too high, it is not preferable because it promotes the polishing action between the particles, and if the concentration is too low, it is not preferable because the processing cost increases. Note that the temperature of the dispersion during ultrasonic irradiation is in the range of 1 ° C. to 90 ° C., preferably in the range of 2 ° C. to 80 ° C., more preferably 3 ° C. A range of 60 ° C. or lower is desirable.
本発明では、一次焼成物の分散液に、15kHz以上50kHz以下、好ましくは15kHz以上40kHz以下、より好ましくは18kHz以上37kHz以下の周波数の超音波を800kW/cm3以上10000kW/cm3以下、好ましくは1000kW/cm3以上6000kW/cm3以下の強さで、0.01分以上102分以下、好ましくは0.05分以上30分以下にわたり、照射する。超音波照射による衝撃エネルギーが強すぎると結晶構造が維持できず粒子が破砕してしまい、衝撃エネルギーが弱すぎると立方晶構造への転移が促進できないため、上記範囲内の超音波照射が好ましい。 In the present invention, the dispersion of the primary fired product, 15kHz or 50kHz, preferably 15kHz or more 40kHz or less, more preferably ultrasonic waves of frequencies below 37kHz or 18 kHz 800 kW / cm 3 or more 10000kW / cm 3 or less, preferably Irradiation is performed at a strength of 1000 kW / cm 3 to 6000 kW / cm 3 for 0.01 minutes to 102 minutes, preferably 0.05 minutes to 30 minutes. When the impact energy by ultrasonic irradiation is too strong, the crystal structure cannot be maintained and the particles are crushed, and when the impact energy is too weak, the transition to the cubic structure cannot be promoted.
<二次焼成>
本発明では、超音波処理によって得た六方晶構造と立方晶構造とが混在する一次焼成物を不活性ガス雰囲気下で昇温し、650℃以上1000℃以下の範囲内の一定温度を保持した後、冷却する二次焼成に供する。
<Secondary firing>
In the present invention, the primary fired product in which a hexagonal crystal structure and a cubic crystal structure obtained by ultrasonic treatment are mixed is heated in an inert gas atmosphere, and a constant temperature within a range of 650 ° C. to 1000 ° C. is maintained. Thereafter, it is subjected to secondary firing for cooling.
昇温に先立ち、六方晶構造と立方晶構造とが混在する一次焼成物に、0.1wt%以上5wt%以下の銅、1wt%以上45wt%以下の亜鉛および0.1wt%以上6wt%以下の硫黄を含有させる。 Prior to temperature increase, a primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed, copper of 0.1 wt% or more and 5 wt% or less, zinc of 1 wt% or more and 45 wt% or less, and 0.1 wt% or more and 6 wt% or less of Contains sulfur.
銅を含有させるためには、固体または水溶液形態の銅化合物として添加することが好ましい。銅化合物としては、塩化銅(I)、塩化銅(II)、硫酸銅、酢酸銅などを好ましく挙げることができる。経済性および操作性の観点から、硫酸銅および酢酸銅が好ましい。銅化合物は、一次焼成物に対して、0.01wt%以上10wt%以下、好ましくは0.02wt%以上5wt%以下の範囲で添加する。 In order to contain copper, it is preferably added as a solid or aqueous copper compound. Preferred examples of the copper compound include copper (I) chloride, copper (II) chloride, copper sulfate, and copper acetate. From the viewpoint of economy and operability, copper sulfate and copper acetate are preferred. The copper compound is added in the range of 0.01 wt% or more and 10 wt% or less, preferably 0.02 wt% or more and 5 wt% or less with respect to the primary fired product.
亜鉛を含有させるためには、固体または水溶液形態の亜鉛化合物として添加することが好ましい。亜鉛化合物としては、酸化亜鉛、硫化亜鉛、塩化亜鉛、臭化亜鉛、硫酸亜鉛、硝酸亜鉛、酢酸亜鉛、蟻酸亜鉛などを好ましく挙げることができる。経済性および操作性の観点から、硫酸亜鉛および酸化亜鉛が好ましい。亜鉛化合物は、一次焼成物に対して、0.1wt%以上50wt%以下、好ましくは0.2wt%以上30wt%以下の範囲で添加する。 In order to contain zinc, it is preferably added as a solid or aqueous zinc compound. Preferred examples of the zinc compound include zinc oxide, zinc sulfide, zinc chloride, zinc bromide, zinc sulfate, zinc nitrate, zinc acetate, and zinc formate. From the viewpoints of economy and operability, zinc sulfate and zinc oxide are preferred. The zinc compound is added in the range of 0.1 wt% or more and 50 wt% or less, preferably 0.2 wt% or more and 30 wt% or less with respect to the primary fired product.
硫黄を含有させるためには、硫黄またはチオアセトアミドおよびチオ尿素などの硫黄化合物として添加することが好ましい。経済性および操作性の観点から、硫黄の使用が好ましい。硫黄は、一次焼成物に対して、0.1wt%以上40wt%以下、好ましくは0.5wt%以上30wt%以下の範囲で添加する。 In order to contain sulfur, it is preferable to add sulfur or sulfur compounds such as thioacetamide and thiourea. From the viewpoint of economy and operability, use of sulfur is preferred. Sulfur is added in the range of 0.1 wt% or more and 40 wt% or less, preferably 0.5 wt% or more and 30 wt% or less with respect to the primary fired product.
六方晶構造と立方晶構造とが混在する一次焼成物と、銅、亜鉛および硫黄との混合物を、窒素ガスなどの不活性ガス雰囲気下で、2時間以上5時間以下にわたり、650℃以上1000℃以下の範囲内の一定温度まで昇温し、当該温度に到達した後、空気を導入して酸素含有雰囲気下として、30分以上2時間以下にわたり、650℃以上1000℃以下の範囲内の一定温度を保持し、次いで冷却する。酸素含有雰囲気の酸素濃度は特に限定されないが、1vol%以上30vol%以下とすることが好ましい。 A mixture of a primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed, and copper, zinc and sulfur is 650 ° C. or higher and 1000 ° C. over 2 to 5 hours in an inert gas atmosphere such as nitrogen gas. The temperature is raised to a certain temperature within the following range, and after reaching that temperature, air is introduced to form an oxygen-containing atmosphere for 30 minutes to 2 hours, and a certain temperature within a range of 650 ° C. to 1000 ° C. And then cool. The oxygen concentration in the oxygen-containing atmosphere is not particularly limited, but is preferably 1 vol% or more and 30 vol% or less.
<二次焼成工程の冷却制御>
本発明では、六方晶構造と立方晶構造とが混在する一次焼成物を高温域で二次処理しているため、立方晶構造に歪みが生じている。この歪みを緩和して安定な立方晶構造とするために、二次焼成工程における冷却速度を制御することが特に好ましい。
<Cooling control of secondary firing process>
In the present invention, since the primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed is subjected to secondary treatment in a high temperature range, the cubic crystal structure is distorted. In order to alleviate this distortion and to obtain a stable cubic structure, it is particularly preferable to control the cooling rate in the secondary firing step.
本発明における二次焼成工程における冷却速度の制御としては、650℃以上1000℃以下の範囲内の一定温度を保持した後に、室温まで冷却する過程において、(1)300℃以下から室温までの温度範囲を150℃/hr以下、好ましくは10℃/hr以上150℃/hr以下の冷却速度で冷却するか、(2)120℃以上300℃以下の温度範囲内の一定温度に0.5時間以上、好ましくは0.5時間以上24時間以下、より好ましくは1時間以上20時間以下、さらに好ましくは1.5時間以上18時間以下、保持することが好ましい。なお、本願特許請求の範囲及び明細書において「室温」とは、20℃以上25℃以下の温度を意味する。 As a control of the cooling rate in the secondary firing step in the present invention, in the process of cooling to room temperature after maintaining a constant temperature in the range of 650 ° C. to 1000 ° C., (1) the temperature from 300 ° C. to room temperature Cool at a cooling rate of 150 ° C./hr or less, preferably 10 ° C./hr or more and 150 ° C./hr or less (2) 0.5 hours or more to a constant temperature within a temperature range of 120 ° C. or more and 300 ° C. or less Preferably, it is maintained for 0.5 hours to 24 hours, more preferably 1 hour to 20 hours, and even more preferably 1.5 hours to 18 hours. In the claims and specification of the present application, “room temperature” means a temperature of 20 ° C. or more and 25 ° C. or less.
また、650℃以上1000℃以下の範囲内の一定温度を保持した後の冷却は、300℃までの冷却速度を50℃/hr以上800℃/hr以下の範囲とすることが好ましく、100℃/hr以上600℃/hr以下の範囲とすることがより好ましい。冷却速度が800℃/hrを超えると、坩堝などの容器が破損したり破壊したりする場合があり、破損片がコンタミとなり蛍光体の品質低下を招くため好ましくない。一方、冷却速度が50℃/hr未満では、冷却時間が著しく長くなり、生産性が低下するため好ましくない。 The cooling after maintaining a constant temperature in the range of 650 ° C. to 1000 ° C. is preferably performed at a cooling rate up to 300 ° C. in the range of 50 ° C./hr to 800 ° C./hr, More preferably, it is in the range of hr to 600 ° C./hr. When the cooling rate exceeds 800 ° C./hr, a container such as a crucible may be damaged or destroyed, and the broken pieces may become contaminated, resulting in deterioration of the phosphor quality. On the other hand, if the cooling rate is less than 50 ° C./hr, the cooling time becomes remarkably long and productivity is lowered, which is not preferable.
<洗浄および乾燥>
冷却した二次焼成物には、未反応のまま残留する余分の亜鉛化合物、ドーピングされなかった余分の発行中心金属元素を含む化合物、黒色化した金属化合物などが付着しているため、これらを洗浄により除去する。
<Washing and drying>
The cooled secondary fired product is washed with extra zinc compounds that remain unreacted, compounds that contain extra unpublished central metal elements that have not been doped, and blackened metal compounds. To remove.
洗浄には、中性水溶液、酸性水溶液、シアン化塩水溶液などを用いることができるが、いずれの場合も最終的にはイオン交換水で十分にリンスすることが必要である。 In the cleaning, a neutral aqueous solution, an acidic aqueous solution, an aqueous cyanide salt solution or the like can be used, but in any case, it is necessary to finally rinse thoroughly with ion-exchanged water.
酸性水溶液としては、塩酸、硫酸、硝酸、リン酸などの鉱酸水溶液、酢酸、プロピオン酸、酪酸などの有機酸水溶液を好ましく用いることができ、表面へのイオン残留性の点から塩酸および酢酸が特に好ましい。ただし、硫化亜鉛粒子である二次焼成物は、高濃度の酸性物質と接触すると分解することがあるので、酸性水溶液の場合には0.1wt%以上20wt%以下、好ましくは1wt%以上10wt%以下の濃度とすることが望ましい。 As the acidic aqueous solution, a mineral acid aqueous solution such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid, and an organic acid aqueous solution such as acetic acid, propionic acid, and butyric acid can be preferably used. Particularly preferred. However, since the secondary fired product that is zinc sulfide particles may be decomposed when contacted with a high concentration acidic substance, in the case of an acidic aqueous solution, it is 0.1 wt% or more and 20 wt% or less, preferably 1 wt% or more and 10 wt%. The following concentration is desirable.
シアン化塩水溶液は、二次焼成物表面に残留する余分な銅、銀、イリジウムおよび希土類元素を除去するために適している。シアン化塩水溶液としては、0.1wt%以上1wt%以下の濃度のシアン化ナトリウム水溶液およびシアン化カリウム水溶液を好ましく用いることができる。シアン化塩水溶液を用いる場合には、二次焼成物に対して重量比で10倍以上100倍以下の量で使用する。 The aqueous cyanide salt solution is suitable for removing excess copper, silver, iridium and rare earth elements remaining on the surface of the secondary fired product. As the cyanide salt aqueous solution, a sodium cyanide aqueous solution and a potassium cyanide aqueous solution having a concentration of 0.1 wt% or more and 1 wt% or less can be preferably used. When an aqueous cyanide salt solution is used, it is used in an amount of 10 to 100 times by weight with respect to the secondary fired product.
洗浄後、真空乾燥や熱風乾燥などで乾燥して、硫化亜鉛系青色蛍光体を得る。 After washing, drying by vacuum drying or hot air drying to obtain a zinc sulfide blue phosphor.
硫化亜鉛系青色蛍光体が得られたことは、量子効率(quantum efficiency)を測定することによって確認することができる。量子効率とは、光放射が物質などに作用するとき、入射して吸収された光子の数に対する、反応した分子または相互作用によって発生した電子や光子などの量子の数の比として、JISでは定義されている。量子効率が大きいほど、ドーピング効果が高いことを意味する。本明細書における量子効率は、分光蛍光光度計によって測定した値であり、入射光による励起によって放出された光子の数と物質に吸収された入射光の光子の数との比として用いる。 The fact that a zinc sulfide-based blue phosphor has been obtained can be confirmed by measuring quantum efficiency. Quantum efficiency is defined in JIS as the ratio of the number of quanta, such as electrons or photons generated by reacting molecules or interactions, to the number of incident photons absorbed when light radiation acts on a substance. Has been. A larger quantum efficiency means a higher doping effect. The quantum efficiency in this specification is a value measured by a spectrofluorophotometer, and is used as a ratio between the number of photons emitted by excitation by incident light and the number of photons of incident light absorbed by a substance.
以下、実施例および比較例を参照しながら本発明をさらに詳細に説明するが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited thereto.
[測定項目]
本明細書における実施例および比較例における測定項目の測定条件は以下のとおりである。
[Measurement item]
The measurement conditions of the measurement items in the examples and comparative examples in this specification are as follows.
<量子効率の測定>
本明細書における量子効率は、日本分光株式会社製分光光度計FP-6500を用いて、励起波長350nmおよび励起バンド幅5nmに設定し、付属の日本分光株式会社製ソフトウェアSpectra Manager for Windows(登録商標)95/NT Ver. 1.00.00 2005を用いて決定した。
<Measurement of quantum efficiency>
The quantum efficiency in this specification is set to an excitation wavelength of 350 nm and an excitation bandwidth of 5 nm using a spectrophotometer FP-6500 manufactured by JASCO Corporation, and the supplied Spectra Manager for Windows (registered trademark) manufactured by JASCO Corporation. ) Determined using 95 / NT Ver. 1.00.00 2005.
<立方晶構造と六方晶構造との比率>
本明細書における立方晶構造と六方晶構造との比率は、X線回折装置として株式会社リガク製RINT-2400を用いて得たX線回折データから、BRUKER株式会社製ソフトウェアTOPAS3でリートベルト解析方法を用いて決定した。
<Ratio between cubic structure and hexagonal structure>
The ratio of the cubic crystal structure and the hexagonal crystal structure in this specification is based on X-ray diffraction data obtained using RINT-2400 manufactured by Rigaku Corporation as an X-ray diffractometer. Was used to determine.
<発色解析>
作製したEL素子を日本分光株式会社製分光光度計FP-6500の試料ホルダにはさみ、励起光シャッターを閉め、さらにサンプルホルダに外光が入らないように暗幕を張って200V、1kHzの電圧を印可し、素子を発光させて測定した。その際、輝度補正せずに発光を検出した。発光色解析は、付属の日本分光株式会社製ソフトウェアSpectra Manager for Windows(登録商標)95/NT Ver. 1.00.00 2005の発光色解析を使用して色度(x値、y値)に変換した。
<Color analysis>
The manufactured EL element is sandwiched between the spectrophotometer FP-6500 spectrophotometer manufactured by JASCO Corporation, the excitation light shutter is closed, and a black screen is applied so that external light does not enter the sample holder. Then, the element was measured to emit light. At that time, light emission was detected without correcting the luminance. The emission color analysis was converted into chromaticity (x value, y value) using the emission color analysis of Spectra Manager for Windows (registered trademark) 95 / NT Ver. .
[前駆体の製造]
本明細書における実施例および比較例で用いた硫化亜鉛系蛍光体前駆体は下記製造例1~3により製造した。
[Precursor production]
The zinc sulfide-based phosphor precursors used in the examples and comparative examples in this specification were produced according to the following Production Examples 1 to 3.
[製造例1]<硫化亜鉛系蛍光体前駆体1の製造>
酢酸亜鉛2水和物65.9g、硝酸銅・3水和物0.035g(銅500ppm相当)、硝酸ガリウム8水和物0.008g(ガリウム50ppm相当)、チオアセトアミド45.0g、酢酸5gをイオン交換水500gに溶解させた。一方、2L三つ口フラスコに、ジーンスターク、還流管、温度計および攪拌器を装着し、o-キシレン800mlを仕込み、系内を窒素置換した。オイル浴の浴温を150℃に調整し、反応器内のo-キシレンを130℃に昇温したのち、酢酸亜鉛を含有する溶液を毎時100mlで加えながら、留出する水をジーンスタークで除去しながら反応させた。約6時間で全ての水溶液をフィードし、さらに30分間系内の水分を除去した。室温まで冷却した後、析出した硫化物を沈殿させ、上澄み液を除去して、目的物を回収し、真空乾燥機にて100℃で12時間にわたり乾燥させた。回収量は28.9gであり、収率は理論収量の98%であった。
[Production Example 1] <Production of zinc sulfide-based phosphor precursor 1>
Zinc acetate dihydrate 65.9g, copper nitrate trihydrate 0.035g (equivalent to copper 500ppm), gallium nitrate octahydrate 0.008g (equivalent to gallium 50ppm), thioacetamide 45.0g, acetic acid 5g It was dissolved in 500 g of ion exchange water. Meanwhile, a 2 L three-necked flask was equipped with a Gene Stark, a reflux tube, a thermometer and a stirrer, charged with 800 ml of o-xylene, and the system was purged with nitrogen. Adjust the temperature of the oil bath to 150 ° C, raise the temperature of o-xylene in the reactor to 130 ° C, and then remove the distilled water with Gene Stark while adding a solution containing zinc acetate at 100 ml per hour. While reacting. All aqueous solutions were fed in about 6 hours, and water in the system was removed for another 30 minutes. After cooling to room temperature, the precipitated sulfide was precipitated, the supernatant was removed, and the target product was collected and dried at 100 ° C. for 12 hours in a vacuum dryer. The recovered amount was 28.9 g, and the yield was 98% of the theoretical yield.
[製造例2]<硫化亜鉛系蛍光体前駆体2の製造>
3L三口フラスコに、撹拌器、温度計、還流管および固体フィーダを装着し、硝酸亜鉛・6水和物297.6g、硝酸銅・3水和物0.18g(銅500ppm相当)、六塩化イリジウム二アンモニウム0.022g(イリジウム100ppm相当)を仕込み、イオン交換水1000gを加えて溶解させた。そこに、60%硝酸を添加し、系内をpH2に調整した。系内を窒素で置換した後、90℃まで昇温し、チオアセトアミド113.0gを固体フィーダより投入して反応を開始させた。反応をそのまま2時間継続した後、室温に冷却した。析出した硫化物を沈殿させ、デカンテーションにより上澄み液を除去し、さらに、イオン交換水3Lを使用して、系内のpHが中性域を示すまで洗浄を行った。目的物を回収し、真空乾燥機にて100℃で12時間にわたり乾燥させた。回収量は94.16gであり、収率は理論収量の96.6%であった。
[Production Example 2] <Production of zinc sulfide-based phosphor precursor 2>
A 3 L three-necked flask is equipped with a stirrer, thermometer, reflux tube and solid feeder, 297.6 g of zinc nitrate hexahydrate, 0.18 g of copper nitrate trihydrate (equivalent to 500 ppm copper), iridium hexachloride 0.022 g of diammonium (equivalent to 100 ppm of iridium) was charged, and 1000 g of ion-exchanged water was added and dissolved. 60% nitric acid was added thereto, and the inside of the system was adjusted to pH2. After replacing the system with nitrogen, the temperature was raised to 90 ° C., and 113.0 g of thioacetamide was charged from the solid feeder to start the reaction. The reaction was continued for 2 hours and then cooled to room temperature. The precipitated sulfide was precipitated, the supernatant was removed by decantation, and further, washing was performed using 3 L of ion exchange water until the pH in the system showed a neutral range. The target product was collected and dried in a vacuum dryer at 100 ° C. for 12 hours. The recovered amount was 94.16 g, and the yield was 96.6% of the theoretical yield.
[製造例3]<硫化亜鉛系蛍光体前駆体3の製造>
THINKEY製混合器(ARE-250)の100ml容器に、硫化亜鉛(堺化学工業(株)製RAK-N)100gと酢酸銅・3水和物0.20g(銅500ppm相当)を仕込み、30分間にわたり解砕混合した。
[Production Example 3] <Production of zinc sulfide-based phosphor precursor 3>
A 100 ml container of THINKEY mixer (ARE-250) is charged with 100 g of zinc sulfide (RAK-N made by Sakai Chemical Industry Co., Ltd.) and 0.20 g of copper acetate trihydrate (equivalent to 500 ppm of copper) for 30 minutes. Crushed and mixed.
[製造例4]<硫化亜鉛系蛍光体前駆体4の製造>
硝酸銅・3水和物の量を0.05g(銅700ppm相当)とした以外は製造例1と同様にして硫化亜鉛系蛍光体前駆体を調製した。
[Production Example 4] <Production of zinc sulfide-based phosphor precursor 4>
A zinc sulfide-based phosphor precursor was prepared in the same manner as in Production Example 1 except that the amount of copper nitrate trihydrate was 0.05 g (equivalent to 700 ppm of copper).
[実施例1]
<一次焼成>
製造例1で調製した硫化亜鉛系蛍光体前駆体27gに、塩化カリウム1.00g、塩化ナトリウム1.17g、塩化マグネシウム6水和物6.87gを加え、ボールミルで混合した。得られた混合物に、硫黄1.45gを添加し、坩堝に入れた。この坩堝を焼成炉内にて空気を導入しながら毎時400℃の速度で昇温した。炉内温度が800℃に到達したところで、空気から窒素の導入に切り替え、毎時400℃の速度で1100℃まで昇温し、1100℃に3時間保持した。3時間保持した後、毎時300℃で室温まで冷却した。
[Example 1]
<Primary firing>
To 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 1, 1.00 g of potassium chloride, 1.17 g of sodium chloride and 6.87 g of magnesium chloride hexahydrate were added and mixed with a ball mill. To the resulting mixture, 1.45 g of sulfur was added and placed in a crucible. The temperature of the crucible was increased at a rate of 400 ° C. per hour while introducing air into the firing furnace. When the furnace temperature reached 800 ° C., the air was switched to introduction of nitrogen, the temperature was raised to 1100 ° C. at a rate of 400 ° C. per hour, and held at 1100 ° C. for 3 hours. After holding for 3 hours, it was cooled to room temperature at 300 ° C. per hour.
<脱塩>
得られた焼成物を、15%酢酸水溶液200gに添加して焼成物を分散させた。酢酸水溶液をデカンテーションで除き、イオン交換水500gで中性になるまで洗浄し、一次焼成物を得た。デカンテーションで上澄み液を除去した後、真空乾燥機にて100℃で12時間にわたり乾燥させた。一次焼成物の収量は24g、一次焼成物の立方晶/六方晶の比率をX線回折により決定した。
<Desalination>
The obtained fired product was added to 200 g of a 15% acetic acid aqueous solution to disperse the fired product. The acetic acid aqueous solution was removed by decantation, and the mixture was washed with 500 g of ion exchange water until neutral, and a primary fired product was obtained. After removing the supernatant by decantation, it was dried at 100 ° C. for 12 hours in a vacuum dryer. The yield of the primary calcined product was 24 g, and the cubic / hexagonal ratio of the primary calcined product was determined by X-ray diffraction.
<超音波処理>
一次焼成物20gにイオン交換水200gを加えて分散液とした。超音波振動器(BRANSON製、DegitalSonifier、周波数20kHz)を用い、分散液から25mmの位置に振動子をセットし、2000kW/m3で5分間連続照射し、5分間停止するサイクルを3回行って、超音波処理を行った。破砕によって生じた微細粒子を、10μmメッシュを用いて除去した。デカンテーションで上澄み液を除去した後、真空乾燥機にて100℃で12時間にわたり乾燥させた。超音波処理後の一次焼成物の収量は12.1gであり、回収率は60.5%であった。超音波処理後の一次焼成物の立方晶/六方晶の比率をX線回折により決定した。
<Sonication>
200 g of ion-exchanged water was added to 20 g of the primary fired product to obtain a dispersion. Using an ultrasonic vibrator (manufactured by BRANSON, Digital Sonifier, frequency 20 kHz), a vibrator is set at a position of 25 mm from the dispersion, continuously irradiated for 5 minutes at 2000 kW / m 3 , and stopped for 5 minutes three times. Then, sonication was performed. Fine particles generated by crushing were removed using a 10 μm mesh. After removing the supernatant by decantation, it was dried at 100 ° C. for 12 hours in a vacuum dryer. The yield of the primary baked product after the ultrasonic treatment was 12.1 g, and the recovery rate was 60.5%. The cubic / hexagonal ratio of the primary fired product after sonication was determined by X-ray diffraction.
<二次焼成>
超音波処理した一次焼成物10gに、硫酸銅5水和物0.25g、硫酸亜鉛7水和物2.5gを混合し、坩堝に入れた。坩堝を焼成炉に入れ、窒素雰囲気下、毎時400℃の速度で昇温し、焼成炉内温度が850℃に到達したところで、窒素から空気の導入に切り替え、1時間空気を導入した。その後、再び、空気から窒素の導入に切り替え、さらに2時間保持した後、毎時500℃で室温まで冷却した。
<Secondary firing>
0.25 g of copper sulfate pentahydrate and 2.5 g of zinc sulfate heptahydrate were mixed with 10 g of the primary fired product that had been subjected to ultrasonic treatment, and the mixture was placed in a crucible. The crucible was placed in a firing furnace, heated at a rate of 400 ° C. per hour in a nitrogen atmosphere, and when the temperature in the firing furnace reached 850 ° C., switching from nitrogen to air was introduced for 1 hour. Thereafter, the air was switched again to the introduction of nitrogen, and after holding for another 2 hours, it was cooled to room temperature at 500 ° C. per hour.
得られた二次焼成物を、5%塩酸水溶液100gを用いて洗浄した。酸性水溶液を除去し、イオン交換水500gを用いて中性になるまでリンスを繰り返した。デカンテーションにより上澄み液を除去した後、1%シアン化ナトリウム水溶液200gで洗浄し、余分な硫化物を除去した。さらに、イオン交換水を用いて中性を示すまで繰り返しリンスした後、真空乾燥機にて100℃で12時間にわたり乾燥させた。二次焼成物の収量は9.2gであった。得られた二次焼成物(蛍光体)について光励起蛍光スペクトルを測定し、量子効率を求めた。 The obtained secondary fired product was washed with 100 g of 5% hydrochloric acid aqueous solution. The acidic aqueous solution was removed, and rinsing was repeated using 500 g of ion exchange water until neutrality was achieved. The supernatant was removed by decantation, and then washed with 200 g of a 1% aqueous sodium cyanide solution to remove excess sulfide. Furthermore, after rinsing repeatedly using ion-exchanged water until neutrality, it was dried in a vacuum dryer at 100 ° C. for 12 hours. The yield of the secondary fired product was 9.2 g. The photoexcitation fluorescence spectrum was measured for the obtained secondary fired product (phosphor) to determine the quantum efficiency.
<EL素子の作製>
得られた蛍光体1.5gに、フッ素系バインダー(DuPont製7155)1.0gを添加し、混合、脱泡して発光層ペーストを作製した。この発光層ペーストを、20mm角スクリーン版(200メッシュ、25μm)を用いて、ITO付きPETフィルム上に膜厚40μmとなるように塗布した。発光層ペースト層上に、チタン酸バリウムペースト(DuPont製7153)を、スクリーン版(150メッシュ、25μm)を用いて塗布し、100℃で10分間乾燥させ、さらにチタン酸バリウムペーストを同様に塗布して100℃で10分間乾燥させ、20μmの誘電層を製膜した。その上面に、銀ペースト(アチソン製461SS)を、スクリーン版(150メッシュ、25μm)を用いて塗布し、100℃で10分間乾燥させ、電極を製膜して、印刷型EL素子を構成した。得られた素子について、200V、1kHzでEL材料評価を行なった。
<Production of EL element>
To 1.5 g of the obtained phosphor, 1.0 g of a fluorine-based binder (DuPont 7155) was added, mixed and degassed to prepare a light emitting layer paste. This light emitting layer paste was applied on a PET film with ITO to a film thickness of 40 μm using a 20 mm square screen plate (200 mesh, 25 μm). On the light emitting layer paste layer, a barium titanate paste (7153 manufactured by DuPont) was applied using a screen plate (150 mesh, 25 μm), dried at 100 ° C. for 10 minutes, and then a barium titanate paste was similarly applied. And dried at 100 ° C. for 10 minutes to form a 20 μm dielectric layer. On the upper surface, a silver paste (461 SS manufactured by Atchison) was applied using a screen plate (150 mesh, 25 μm), dried at 100 ° C. for 10 minutes, and an electrode was formed to form a printing EL device. About the obtained element, EL material evaluation was performed at 200 V and 1 kHz.
[実施例2]
一次焼成工程および脱塩工程までは実施例1と同様に行った。一次焼成物の立方晶/六方晶の比率をX線回折により決定した。
[Example 2]
The same processes as in Example 1 were performed until the primary firing step and the desalting step. The cubic / hexagonal ratio of the primary fired product was determined by X-ray diffraction.
真空乾燥した一次焼成物24gを坩堝に入れ、窒素雰囲気下に400℃まで1時間かけて昇温し、窒素雰囲気下に400℃で8時間アニールし、この8時間が経過した後、窒素気流下にて400℃から毎時200℃の速度で室温まで冷却した。 24 g of vacuum-dried primary fired product was put in a crucible, heated to 400 ° C. over 1 hour in a nitrogen atmosphere, annealed at 400 ° C. for 8 hours in a nitrogen atmosphere, and after 8 hours had passed, At 400 ° C to 200 ° C per hour.
アニールされた一次焼成物20gにイオン交換水200gを加えて分散液とした。超音波振動器(BRANSON製、DegitalSonifier)を用いて、分散液から25mmの位置に振動子をセットし、2000KW/m3で5分間連続照射し、5分間停止するサイクルを3回行って超音波振動を加えた。破砕によって生じた微細粒子を、10μmメッシュを用いて除去した。得られた粒子からイオン交換水を除去した後、真空乾燥機にて100℃で12時間にわたり乾燥させた。超音波処理後の一次焼成物の収量は16.18gであり、回収率は80.9%であった。超音波処理後の一次焼成物の立方晶/六方晶比率をX線回折により決定した。 200 g of ion-exchanged water was added to 20 g of the annealed primary fired product to obtain a dispersion. Ultrasonic vibrator (BRANSON Ltd., DegitalSonifier) was used to set the oscillator from the dispersion at a position of 25 mm, continuously for 5 minutes irradiation at 2000 kW / m 3, ultrasonic performed 3 cycles of stopping 5 minutes Vibration was applied. Fine particles generated by crushing were removed using a 10 μm mesh. After removing ion-exchanged water from the obtained particles, the particles were dried in a vacuum dryer at 100 ° C. for 12 hours. The yield of the primary fired product after the ultrasonic treatment was 16.18 g, and the recovery rate was 80.9%. The cubic / hexagonal ratio of the primary fired product after ultrasonic treatment was determined by X-ray diffraction.
二次焼成工程を実施例1と同様に行った。得られた二次焼成物(蛍光体)について光励起蛍光スペクトルを測定し、蛍光体の量子効率を求めた。 The secondary firing step was performed in the same manner as in Example 1. The photoexcitation fluorescence spectrum of the obtained secondary fired product (phosphor) was measured to determine the quantum efficiency of the phosphor.
実施例1と同様に、EL素子を作製し、200V、1kHzでEL材料評価を行なった。 EL element was produced in the same manner as in Example 1, and EL material evaluation was performed at 200 V and 1 kHz.
[実施例3]
製造例2で調製した硫化亜鉛系蛍光体前駆体を用いた以外は、実施例2と同様に行った。
[Example 3]
The same procedure as in Example 2 was performed except that the zinc sulfide-based phosphor precursor prepared in Production Example 2 was used.
[実施例4]
製造例3で調製した硫化亜鉛系蛍光体前駆体を用いた以外は、実施例2と同様に行った。
[Example 4]
The same operation as in Example 2 was performed except that the zinc sulfide-based phosphor precursor prepared in Production Example 3 was used.
[実施例5]
超音波の出力を1000kW/cm3とした以外は、実施例2と同様に行った。
[Example 5]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was set to 1000 kW / cm 3 .
[実施例6]
超音波の出力を1800kW/cm3とした以外は、実施例2と同様に行った。
[Example 6]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 1800 kW / cm 3 .
[実施例7]
超音波の出力を15800kW/cm3とした以外は、実施例2と同様に行った。
[Example 7]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 15800 kW / cm 3 .
[実施例8]
超音波の出力を3000kW/cm3とした以外は、実施例2と同様に行った。
[Example 8]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was set to 3000 kW / cm 3 .
[実施例9]
超音波の出力を6000kW/cm3とした以外は、実施例2と同様に行った。
[Example 9]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 6000 kW / cm 3 .
[実施例10]
アニール温度を350℃とした以外は、実施例2と同様に行った。
[Example 10]
The same operation as in Example 2 was performed except that the annealing temperature was 350 ° C.
[実施例11]
アニール温度を300℃とした以外は、実施例2と同様に行った。
[Example 11]
The same operation as in Example 2 was performed except that the annealing temperature was set to 300 ° C.
[実施例12]
製造例1で調製した硫化亜鉛系蛍光体前駆体を27g用い、一次焼成工程の急冷を400℃までとして、400℃を8時間保持してアニールした以外は、実施例2と同様に行った。
[Example 12]
The same procedure as in Example 2 was performed, except that 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 1 was used, the rapid quenching in the primary firing step was set to 400 ° C., and annealing was performed while maintaining 400 ° C. for 8 hours.
[実施例13]
製造例1で調製した硫化亜鉛系蛍光体前駆体を27g用い、一次焼成工程の後、直ちに400℃まで昇温しアニールした後、脱塩処理を行った以外は、実施例2と同様に行った。
[Example 13]
27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 1 was used, and after the primary firing step, immediately heated to 400 ° C., annealed, and then desalted, the same as in Example 2. It was.
[比較例1]
超音波の出力を830kW/cm3とした以外は、実施例2と同様に行った。
[Comparative Example 1]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was changed to 830 kW / cm 3 .
[比較例2]
超音波の出力を560kW/cm3とした以外は、実施例2と同様に行った。
[Comparative Example 2]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was set to 560 kW / cm 3 .
[比較例3]
超音波の出力を10500kW/cm3とした以外は、実施例2と同様に行った。粒子が割れてしまったため、目的物を回収できなかった。
[Comparative Example 3]
The same operation as in Example 2 was performed except that the output of the ultrasonic wave was 10500 kW / cm 3 . Since the particles were broken, the target product could not be recovered.
[実施例14]
製造例4で得られた生成物27gに、塩化カリウム1.00g、塩化ナトリウム1.17g、塩化マグネシウム6水和物6.87gを加え、ボールミルで混合した。この混合物に、硫黄1.45gを添加し、坩堝に入れた。この坩堝を焼成炉に入れ、空気中、毎時400℃の速度で昇温した。炉内温度が800℃に到達したところで、空気の導入から窒素の導入に切り替え、毎時400℃の速度で1100℃まで昇温し、1100℃を3時間保持した後、毎時300℃で室温まで冷却した。
[Example 14]
To 27 g of the product obtained in Production Example 4, 1.00 g of potassium chloride, 1.17 g of sodium chloride and 6.87 g of magnesium chloride hexahydrate were added and mixed with a ball mill. To this mixture, 1.45 g of sulfur was added and placed in a crucible. This crucible was put in a firing furnace and heated in air at a rate of 400 ° C. per hour. When the furnace temperature reached 800 ° C, switching from introduction of air to introduction of nitrogen, raising the temperature to 1100 ° C at a rate of 400 ° C per hour, holding 1100 ° C for 3 hours, and then cooling to room temperature at 300 ° C per hour did.
得られた焼成物を、15%酢酸水溶液200gに添加し、焼成物を分散させた。上澄み液をデカンテーションで除き、イオン交換水500gで中性になるまで洗浄し、イオン交換水を除去した後、真空乾燥機にて100℃で12時間にわたり乾燥させて、一次焼成物24gを得た。 The obtained fired product was added to 200 g of a 15% acetic acid aqueous solution to disperse the fired product. The supernatant is removed by decantation, washed with 500 g of ion-exchanged water until neutral, and after removing the ion-exchanged water, dried at 100 ° C. for 12 hours in a vacuum dryer to obtain 24 g of a primary fired product. It was.
一次焼成物20gにイオン交換水200gを加えて分散液とした。超音波振動器(BRANSON製、DegitalSonifier、周波数20kHz)にて、分散液から25mmの位置に振動子をセットし、1000KW/m3で5分間連続照射し、5分間停止するサイクルを3回行って超音波振動を加えた。破砕によって生じた微細粒子を、10μmメッシュを用いて除去した。デカンテーションで上澄み液を除去した後、真空乾燥機にて100℃で12時間にわたり乾燥させた。 200 g of ion-exchanged water was added to 20 g of the primary fired product to obtain a dispersion. Using an ultrasonic vibrator (manufactured by BRANSON, Digital Sonifier, frequency 20 kHz), a vibrator is set at a position of 25 mm from the dispersion, continuously irradiated for 5 minutes at 1000 KW / m 3 , and stopped for 5 minutes three times. Ultrasonic vibration was applied. Fine particles generated by crushing were removed using a 10 μm mesh. After removing the supernatant by decantation, it was dried at 100 ° C. for 12 hours in a vacuum dryer.
超音波処理後の一次焼成物10gに、硫酸銅5水和物0.25g、硫酸亜鉛7水和物2.5gを混合し、坩堝に入れた。この坩堝を焼成炉に入れ、窒素雰囲気下、毎時400℃の速度で昇温し、焼成炉内温度が850℃に到達したところで、窒素の導入から空気の導入に切り替え、1時間空気を導入した。その後、再び、空気の導入から窒素の導入に切り替え、さらに2時間保持した後、毎時500℃で300℃まで冷却したところで、冷却速度を毎時50℃に変えて室温まで冷却させた。 0.25 g of copper sulfate pentahydrate and 2.5 g of zinc sulfate heptahydrate were mixed with 10 g of the primary fired product after the ultrasonic treatment, and the mixture was put in a crucible. The crucible was placed in a firing furnace, heated at a rate of 400 ° C. per hour in a nitrogen atmosphere, and when the temperature in the firing furnace reached 850 ° C., switching from nitrogen introduction to air introduction was performed for 1 hour. . Thereafter, the introduction of air was switched again to the introduction of nitrogen, and the mixture was further maintained for 2 hours. After cooling to 300 ° C. at 500 ° C./hour, the cooling rate was changed to 50 ° C./hour to cool to room temperature.
得られた二次焼成物を実施例1と同様にして洗浄した後、量子効率を求めた。さらに、実施例1と同様にEL素子を作製し、EL材料評価を行った。 After the obtained secondary fired product was washed in the same manner as in Example 1, the quantum efficiency was determined. Further, an EL element was produced in the same manner as in Example 1, and the EL material was evaluated.
[実施例15]
製造例2で調製した硫化亜鉛系蛍光体前駆体27gを用いて、二次焼成物8.2gを得た以外は、実施例14と同様に行った。
[Example 15]
The same operation as in Example 14 was performed except that 8.2 g of the secondary fired product was obtained using 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 2.
[実施例16]
製造例3で調製した硫化亜鉛系蛍光体前駆体25gを用いて、二次焼成物7.7gを得た以外は、実施例14と同様に行った。
[Example 16]
The same procedure as in Example 14 was performed, except that 7.7 g of the secondary fired product was obtained using 25 g of the zinc sulfide-based phosphor precursor prepared in Production Example 3.
[実施例17]
製造例4で調製した硫化亜鉛系蛍光体前駆体27gを用いて、実施例14と同様にして一次焼成物24.5gを得て、二次焼成後の冷却を300℃まで毎時500℃で冷却し、300℃で3時間保持し、室温まで毎時50℃で冷却して焼成物9.2gを得た以外は、実施例14と同様に行った。
[Example 17]
Using 27 g of the zinc sulfide-based phosphor precursor prepared in Production Example 4, 24.5 g of a primary fired product was obtained in the same manner as in Example 14, and cooling after the secondary firing was cooled to 300 ° C. at 500 ° C. per hour. Then, it was carried out in the same manner as in Example 14 except that baked product 9.2 g was obtained by holding at 300 ° C. for 3 hours and cooling to room temperature at 50 ° C. per hour.
[実施例18]
二次焼成後の冷却を250℃まで毎時500℃で冷却し、250℃で3時間保持し、室温まで毎時50℃で冷却した以外は、実施例17と同様に行った。
[Example 18]
The cooling after the secondary firing was performed in the same manner as in Example 17 except that the cooling was performed at 500 ° C. per hour to 250 ° C., maintained at 250 ° C. for 3 hours, and cooled to 50 ° C. per hour to room temperature.
[実施例19]
二次焼成後の冷却を850℃から300℃まで毎時150℃で冷却し、300℃から150℃まで毎時20℃で冷却し、150℃から毎時15℃で室温まで冷却した以外は、実施例17と同様に行った。
[Example 19]
Example 17 Except for cooling after secondary firing from 850 ° C to 300 ° C at 150 ° C per hour, from 300 ° C to 150 ° C at 20 ° C per hour, and from 150 ° C to 15 ° C per hour to room temperature. As well as.
[比較例4]
二次焼成後の冷却を850℃から室温まで毎時500℃で冷却した以外は、実施例14と同様に行った。
[Comparative Example 4]
It was carried out in the same manner as in Example 14 except that the cooling after the secondary baking was cooled from 850 ° C. to room temperature at 500 ° C. per hour.
[比較例5]
二次焼成後の冷却を850℃から室温まで毎時500℃で冷却した以外は、実施例15と同様に行った。
[Comparative Example 5]
The same procedure as in Example 15 was performed except that cooling after the secondary firing was performed from 850 ° C. to room temperature at 500 ° C. per hour.
[比較例6]
二次焼成後の冷却を850℃から室温まで毎時500℃で冷却した以外は、実施例16と同様に行った。
[Comparative Example 6]
It was carried out in the same manner as in Example 16 except that cooling after the secondary firing was performed from 850 ° C. to room temperature at 500 ° C. per hour.
[比較例7]
二次焼成後の冷却を850℃から300℃まで毎時500℃で冷却し、その後毎時200℃で室温まで冷却した以外は、実施例14と同様に行った。
[Comparative Example 7]
The cooling after the secondary firing was performed in the same manner as in Example 14 except that the cooling was performed from 850 ° C. to 300 ° C. at 500 ° C. per hour and then at 200 ° C. per hour to room temperature.
[比較例8]
二次焼成後の冷却を850℃から300℃まで毎時500℃で冷却し、その後300℃に10分間保持し、さらに毎時200℃で室温まで冷却した以外は、実施例14と同様に行った。
[Comparative Example 8]
The cooling after the secondary firing was performed in the same manner as in Example 14 except that the cooling was performed from 850 ° C. to 300 ° C. at 500 ° C. per hour, then maintained at 300 ° C. for 10 minutes, and further cooled to room temperature at 200 ° C. per hour.
[比較例9]
二次焼成後の冷却を850℃から250℃まで毎時500℃で冷却し、その後毎時500℃で室温まで冷却した以外は、実施例14と同様に行った。
[Comparative Example 9]
The cooling after the secondary firing was performed in the same manner as in Example 14 except that the cooling was performed from 850 ° C. to 250 ° C. at 500 ° C. per hour and then cooled to 500 ° C. per hour to room temperature.
[比較例10]
二次焼成後の冷却を850℃から350℃まで毎時500℃で冷却し、その後300℃に0.5時間保持し、さらに毎時200℃で室温まで冷却した以外は、実施例14と同様に行った。
[Comparative Example 10]
Except for cooling after secondary firing from 850 ° C. to 350 ° C. at 500 ° C./hour, then holding at 300 ° C. for 0.5 hour, and further cooling to 200 ° C./hour to room temperature, the same as in Example 14. It was.
<製造条件及び測定結果>
実施例1~19および比較例1~10について、製造条件としてアニール条件、超音波出力及び二次焼成時冷却条件を抽出し、測定結果としてEL素子のEL輝度および色度(x値、y値)ならびに蛍光体の立方晶と六方晶との比率および量子効率を表1に示す。本発明の製造方法により製造されたEL素子は色度(x値、y値)が共に0.2以下と青色発光を示したが、比較例ではy値が0.2を超えており青緑色発光を示した。
<Manufacturing conditions and measurement results>
For Examples 1 to 19 and Comparative Examples 1 to 10, annealing conditions, ultrasonic output, and cooling conditions during secondary firing were extracted as manufacturing conditions, and EL luminance and chromaticity (x value, y value) of EL elements were measured results. ) And the ratio of the cubic and hexagonal phosphors and the quantum efficiency are shown in Table 1. The EL device manufactured by the manufacturing method of the present invention showed blue light emission with both chromaticity (x value, y value) of 0.2 or less, but in the comparative example, the y value exceeded 0.2 and blue green Luminescence was shown.
本発明によれば、実用性のある輝度の高い硫化亜鉛系青色蛍光体を工業的に製造することができ、産業上の有用性が大きい。 According to the present invention, it is possible to industrially produce a high-luminance zinc sulfide-based blue phosphor that is practical and has great industrial utility.
Claims (12)
(a)硫化亜鉛系蛍光体前駆体に融剤を添加し、1000℃以上1200℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、700℃以下の温度に急冷して、六方晶構造を導入した一次焼成物を形成する一次焼成工程、
(b)当該一次焼成物を水性液に分散させてなる分散液に超音波を照射し、一次焼成物の六方晶構造の一部を立方晶構造に転移させる超音波処理工程、
(c)六方晶構造と立方晶構造とが混在する一次焼成物を不活性ガス雰囲気下で650℃以上1000℃以下の範囲内の一定温度まで昇温して当該温度を保持した後、冷却する二次焼成工程
を含むことを特徴とする方法。 A method for producing a zinc sulfide-based blue phosphor by firing a zinc sulfide-based phosphor precursor,
(A) A flux is added to the zinc sulfide-based phosphor precursor, and the temperature is raised to a constant temperature within a range of 1000 ° C. or higher and 1200 ° C. or lower and maintained at that temperature, and then rapidly cooled to a temperature of 700 ° C. or lower. A primary firing step for forming a primary fired product having a hexagonal crystal structure introduced;
(B) an ultrasonic treatment step of irradiating the dispersion obtained by dispersing the primary fired product in an aqueous liquid with ultrasonic waves to transfer a part of the hexagonal crystal structure of the primary fired product into a cubic structure;
(C) The primary fired product in which a hexagonal crystal structure and a cubic crystal structure are mixed is heated to a constant temperature within a range of 650 ° C. or higher and 1000 ° C. or lower in an inert gas atmosphere, and then cooled. A method comprising a secondary firing step.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004002867A (en) * | 2002-05-31 | 2004-01-08 | Osram Sylvania Inc | Method of producing electroluminescent phosphor using sonochemistry |
| WO2006025259A1 (en) * | 2004-09-03 | 2006-03-09 | Sumitomo Electric Industries, Ltd. | Phosphor, method for producing same, and light-emitting device using same |
| WO2009063857A1 (en) * | 2007-11-14 | 2009-05-22 | Kuraray Luminas Co., Ltd. | Processes for production of group ii metal sulfide phosphor precursors and phosphors |
| WO2010016419A1 (en) * | 2008-08-06 | 2010-02-11 | クラレルミナス株式会社 | Method for manufacturing zinc sulfide based phosphor |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004002867A (en) * | 2002-05-31 | 2004-01-08 | Osram Sylvania Inc | Method of producing electroluminescent phosphor using sonochemistry |
| WO2006025259A1 (en) * | 2004-09-03 | 2006-03-09 | Sumitomo Electric Industries, Ltd. | Phosphor, method for producing same, and light-emitting device using same |
| WO2009063857A1 (en) * | 2007-11-14 | 2009-05-22 | Kuraray Luminas Co., Ltd. | Processes for production of group ii metal sulfide phosphor precursors and phosphors |
| WO2010016419A1 (en) * | 2008-08-06 | 2010-02-11 | クラレルミナス株式会社 | Method for manufacturing zinc sulfide based phosphor |
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