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WO2010033267A2 - Structures, procédés de fabrication de structures, puces à spectroscopie raman exalté de surface (sers) à matrice multi-puits, procédés de fabrication et procédés d'utilisation - Google Patents

Structures, procédés de fabrication de structures, puces à spectroscopie raman exalté de surface (sers) à matrice multi-puits, procédés de fabrication et procédés d'utilisation Download PDF

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Publication number
WO2010033267A2
WO2010033267A2 PCT/US2009/042966 US2009042966W WO2010033267A2 WO 2010033267 A2 WO2010033267 A2 WO 2010033267A2 US 2009042966 W US2009042966 W US 2009042966W WO 2010033267 A2 WO2010033267 A2 WO 2010033267A2
Authority
WO
WIPO (PCT)
Prior art keywords
well
substrate
nanorod
sers
wells
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2009/042966
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English (en)
Other versions
WO2010033267A3 (fr
Inventor
Yiping Zhao
Ralph A. Tripp
Richard A. Dluhy
Jeremy Driskell
Lawrence Bottomley
Jabulani Barber
Nicole Marotta
Justin Abell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Georgia
University of Georgia Research Foundation Inc UGARF
Original Assignee
University of Georgia
University of Georgia Research Foundation Inc UGARF
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Georgia, University of Georgia Research Foundation Inc UGARF filed Critical University of Georgia
Publication of WO2010033267A2 publication Critical patent/WO2010033267A2/fr
Publication of WO2010033267A3 publication Critical patent/WO2010033267A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors

Definitions

  • Embodiments of the present disclosure can include wells that can each contain up to about 14 ⁇ l volume of sample.
  • the wells can each contain up to about 12.6 ⁇ l volume of sample.
  • the wells can each contain about 1 to 12.6 ⁇ l volume of sample for the cylindrical wells.
  • the wells can each contain about 1 to 7.3 ⁇ l volume of sample for the conical wells.
  • the volume of the well can be tailored based on the configuration of the structure, uses of the structure, method of making the structure, materials used to make the structure and/or nanorods, and the like.
  • the present disclosure includes a method of fabricating a microwell-arrayed SERS chip on a standard glass microscope slide using OAD to produce a SERS-active surface, followed by use of a well-array patterning mold in which liquid PDMS is added and cured by low temperature heating.
  • a mold allows for casting of the microwell pattern on the nanorod surface.
  • Each positive well relief on the mold has a negative relief imprinted in its center, so as not to destroy the nanorod array of the substrate in the central portion of the bottom surface of the well during union of the substrate and mold. Consequently, there is a ring of inactivated substrate between the polymer wall of the well and the intact nanorod array on the bottom surface of each well.
  • a titanium adhesion layer was first deposited at a rate of 0.2 nm/s to a total QCM thickness reading of 20 nm.
  • a silver thin film was deposited at a rate of 0.3 nm/s to a total QCM thickness reading of 500 nm.
  • the substrate was then rotated so that the surface normal was offset by 86° relative to the incident vapor.
  • Silver was then deposited at a constant rate of 0.3 nm/s to a final QCM thickness reading of 2000 nm, to form a tilted Ag nanorod array.
  • the substrates in the chamber were allowed to cool to room temperature in vacuum before they were removed from the chamber.
  • the portion of the base plate to be in contact with the substrate/well-pattering plate was lined with a piece of wax paper to help the release of the substrate/PDMS/well-patterning plate from the bottom plate after curing.
  • the PDMS base and the curing agent (10:1 wt/wt) were mixed together using a glass rod. Before the liquid PDMS was added to the mold/substrate assembly, the assembly was first preheated in an oven at 100 0 C for 20 minutes. The PDMS was also preheated for 5 minutes and then poured into the opening of the substrate/mold assembly and allowed to cure at 100 0 C for approximately 20 minutes. After the substrate had cooled to room temperature, the well patterning plate was pulled off of the PDMS, leaving a uniform 4 x 10 well PDMS-pattemed SERS-active microwell arrayed substrate as shown in FIG. 3B. SERS chip characterization
  • a high resolution SERS mapping was performed on well B5.
  • the well was scanned at over 6000 spots with a step size of 50 microns.
  • the acquisition time was 2.5 s per spectral acquisition.
  • Influenza-positive and negative allantoic fluid samples were diluted 100-fold prior to application to the SERS substrate. Allantoic fluid is a rather complex and concentrated background matrix, and when applied without dilution, multilayers formed on the nanorod substrate, quenching the SERS signal.
  • PCA reduces the dimensionality of the data, and while tightly clustered data in a PC scores plot suggests minimal signal variation, it does not implicitly confirm minimal variation among samples.
  • the information not captured by the PCs could potentially vary significantly and would not be observed in a PC scores plot. Therefore, the spectral information not included in the PCA model must be evaluated.
  • Q residual quantifies the information not described by the model. In other words, even if the data cluster tightly in the 2-D PC scores plots, large Q residual values suggest the data are not as similar as perceived.
  • the Q residual for the AIV and AF spectra is shown in FIG. 7D. This plot reveals much larger Q residual values for the spectra collected from the unpatterned substrates compared to the patterned wells.

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  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Molecular Biology (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

Les modes de réalisation de la présente invention portent sur des structures ayant un ou plusieurs puits qui comprennent des nanotiges et sur des procédés de fabrication des structures.
PCT/US2009/042966 2008-05-06 2009-05-06 Structures, procédés de fabrication de structures, puces à spectroscopie raman exalté de surface (sers) à matrice multi-puits, procédés de fabrication et procédés d'utilisation Ceased WO2010033267A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5064508P 2008-05-06 2008-05-06
US61/050,645 2008-05-06

Publications (2)

Publication Number Publication Date
WO2010033267A2 true WO2010033267A2 (fr) 2010-03-25
WO2010033267A3 WO2010033267A3 (fr) 2010-05-20

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PCT/US2009/042966 Ceased WO2010033267A2 (fr) 2008-05-06 2009-05-06 Structures, procédés de fabrication de structures, puces à spectroscopie raman exalté de surface (sers) à matrice multi-puits, procédés de fabrication et procédés d'utilisation

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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103604797A (zh) * 2013-11-29 2014-02-26 重庆绿色智能技术研究院 一种具有表面增强拉曼活性的微流控芯片及其制备方法
EP2771658A4 (fr) * 2011-10-26 2015-04-15 Hewlett Packard Development Co Appareil pour utilisation dans une application de détection ayant une couverture destructible
EP2884266A4 (fr) * 2012-08-10 2016-08-10 Hamamatsu Photonics Kk Procédé de fabrication d'élément de diffusion raman exaltée de surface
EP2985594A4 (fr) * 2013-03-29 2016-12-14 Hamamatsu Photonics Kk Unité de diffusion raman à surface améliorée et procédé d'analyse spectroscopique raman
US9863884B2 (en) 2012-08-10 2018-01-09 Hamamatsu Photonics K.K. Surface-enhanced Raman scattering element, and method for producing same
US9863883B2 (en) 2012-08-10 2018-01-09 Hamamatsu Photonics K.K. Surface-enhanced raman scattering element
US10670459B2 (en) 2016-02-29 2020-06-02 Hewlett-Packard Development Company, L.P. Surface enhanced raman spectroscopy sample carrier
US10888866B2 (en) 2016-02-29 2021-01-12 Hewlett-Packard Development Company, L.P. Liquid directing sample container
US20210102899A1 (en) * 2018-08-28 2021-04-08 Lloyd Ploof Chemically and Biologically Reactive Microplate Assembly and Manufacture Thereof for Raman Spectroscopy and Other Applications
CN113376140A (zh) * 2021-05-26 2021-09-10 深圳网联光仪科技有限公司 一种蜂蜜中抗生素的检测方法和装置
CN114599959A (zh) * 2019-08-22 2022-06-07 卡普顿大学 修饰含有分析物的液体样品以增加分析物的sers信号强度的方法，以及使用sers检测远距离分析物的探针
CN115194147A (zh) * 2022-07-18 2022-10-18 中国计量大学 一种SERS基底材料Au@ZnAl-LDHs及其制备方法与应用
CN116818741A (zh) * 2023-04-21 2023-09-29 河南省计量科学研究院 一种联合pdms微孔芯片和sers用于功能单细胞筛选的方法
CN116879257A (zh) * 2023-05-12 2023-10-13 重庆工商大学 用于病原微生物定量检测的sers芯片及其制备方法和应用

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0324456D0 (en) * 2003-10-20 2003-11-19 Isis Innovation Parallel DNA sequencing methods
US7158219B2 (en) * 2004-09-16 2007-01-02 Hewlett-Packard Development Company, L.P. SERS-active structures including nanowires
US7245370B2 (en) * 2005-01-06 2007-07-17 Hewlett-Packard Development Company, L.P. Nanowires for surface-enhanced Raman scattering molecular sensors
US20070155020A1 (en) * 2005-12-19 2007-07-05 Intel Corporation Detection of chemical analytes by array of surface enhanced Raman scattering reactions
US7453565B2 (en) * 2006-06-13 2008-11-18 Academia Sinica Substrate for surface-enhanced raman spectroscopy, sers sensors, and method for preparing same

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2771658A4 (fr) * 2011-10-26 2015-04-15 Hewlett Packard Development Co Appareil pour utilisation dans une application de détection ayant une couverture destructible
US9863884B2 (en) 2012-08-10 2018-01-09 Hamamatsu Photonics K.K. Surface-enhanced Raman scattering element, and method for producing same
EP2884266A4 (fr) * 2012-08-10 2016-08-10 Hamamatsu Photonics Kk Procédé de fabrication d'élément de diffusion raman exaltée de surface
US9863883B2 (en) 2012-08-10 2018-01-09 Hamamatsu Photonics K.K. Surface-enhanced raman scattering element
US9696202B2 (en) 2012-08-10 2017-07-04 Hamamatsu Photonics K.K. Method for making surface enhanced Raman scattering device
EP4198499A1 (fr) * 2013-03-29 2023-06-21 Hamamatsu Photonics K.K. Unité de diffusion raman exaltée de surface
EP2985594A4 (fr) * 2013-03-29 2016-12-14 Hamamatsu Photonics Kk Unité de diffusion raman à surface améliorée et procédé d'analyse spectroscopique raman
EP4202418A1 (fr) * 2013-03-29 2023-06-28 Hamamatsu Photonics K.K. Unité de diffusion raman exaltée de surface
US9851305B2 (en) 2013-03-29 2017-12-26 Hamamatsu Photonics K.K. Surface-enhanced Raman scattering unit and Raman spectroscopic analysis method
CN103604797A (zh) * 2013-11-29 2014-02-26 重庆绿色智能技术研究院 一种具有表面增强拉曼活性的微流控芯片及其制备方法
US10888866B2 (en) 2016-02-29 2021-01-12 Hewlett-Packard Development Company, L.P. Liquid directing sample container
US10670459B2 (en) 2016-02-29 2020-06-02 Hewlett-Packard Development Company, L.P. Surface enhanced raman spectroscopy sample carrier
US20210102899A1 (en) * 2018-08-28 2021-04-08 Lloyd Ploof Chemically and Biologically Reactive Microplate Assembly and Manufacture Thereof for Raman Spectroscopy and Other Applications
CN114599959A (zh) * 2019-08-22 2022-06-07 卡普顿大学 修饰含有分析物的液体样品以增加分析物的sers信号强度的方法，以及使用sers检测远距离分析物的探针
CN113376140A (zh) * 2021-05-26 2021-09-10 深圳网联光仪科技有限公司 一种蜂蜜中抗生素的检测方法和装置
CN113376140B (zh) * 2021-05-26 2022-12-20 深圳网联光仪科技有限公司 一种蜂蜜中抗生素的检测方法和装置
CN115194147A (zh) * 2022-07-18 2022-10-18 中国计量大学 一种SERS基底材料Au@ZnAl-LDHs及其制备方法与应用
CN116818741A (zh) * 2023-04-21 2023-09-29 河南省计量科学研究院 一种联合pdms微孔芯片和sers用于功能单细胞筛选的方法
CN116818741B (zh) * 2023-04-21 2024-07-12 河南省计量测试科学研究院 一种联合pdms微孔芯片和sers用于功能单细胞筛选的方法
CN116879257A (zh) * 2023-05-12 2023-10-13 重庆工商大学 用于病原微生物定量检测的sers芯片及其制备方法和应用
CN116879257B (zh) * 2023-05-12 2024-06-18 重庆工商大学 用于病原微生物定量检测的sers芯片及其制备方法和应用

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