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WO2010027184A3 - Waste gas removal system using low-pressure and atmospheric pressure plasma - Google Patents

Waste gas removal system using low-pressure and atmospheric pressure plasma Download PDF

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Publication number
WO2010027184A3
WO2010027184A3 PCT/KR2009/004928 KR2009004928W WO2010027184A3 WO 2010027184 A3 WO2010027184 A3 WO 2010027184A3 KR 2009004928 W KR2009004928 W KR 2009004928W WO 2010027184 A3 WO2010027184 A3 WO 2010027184A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
low
pressure
waste gas
removal system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2009/004928
Other languages
French (fr)
Korean (ko)
Other versions
WO2010027184A2 (en
Inventor
김익년
김홍진
장홍기
지영연
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Triple Cores Korea
Original Assignee
Triple Cores Korea
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triple Cores Korea filed Critical Triple Cores Korea
Publication of WO2010027184A2 publication Critical patent/WO2010027184A2/en
Publication of WO2010027184A3 publication Critical patent/WO2010027184A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4622—Microwave discharges using waveguides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Treating Waste Gases (AREA)
  • Plasma Technology (AREA)

Abstract

The present invention relates to a waste gas removal system for removal of harmful atmosphere-polluting gases emitted by various electronics industries including the semiconductor industry. More particularly, it provides a waste gas removal system using low-pressure plasma and plasma at atmospheric pressure whereby harmful gas emitted from a vacuum chamber is first treated with low-pressure hollow-cathode discharge plasma. The harmful gas thus treated is passed one more time through electromagnetic plasma at atmospheric pressure, thereby completely removing it.
PCT/KR2009/004928 2008-09-02 2009-09-02 Waste gas removal system using low-pressure and atmospheric pressure plasma Ceased WO2010027184A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0086283 2008-09-02
KR1020080086283A KR101026457B1 (en) 2008-09-02 2008-09-02 Waste gas removal system using low pressure and atmospheric pressure plasma

Publications (2)

Publication Number Publication Date
WO2010027184A2 WO2010027184A2 (en) 2010-03-11
WO2010027184A3 true WO2010027184A3 (en) 2010-07-08

Family

ID=41797641

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/004928 Ceased WO2010027184A2 (en) 2008-09-02 2009-09-02 Waste gas removal system using low-pressure and atmospheric pressure plasma

Country Status (3)

Country Link
KR (1) KR101026457B1 (en)
TW (1) TWI372653B (en)
WO (1) WO2010027184A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120032204A (en) * 2010-09-28 2012-04-05 (주)트리플코어스코리아 Microwave generator and driving method thereof, and system for eliminating waste gases
KR101230513B1 (en) * 2010-12-27 2013-02-06 (주)엘오티베큠 Treatment apparatus for discharging fluid
GB2513300B (en) * 2013-04-04 2017-10-11 Edwards Ltd Vacuum pumping and abatement system
CN106170845A (en) * 2014-04-16 2016-11-30 清洁要素技术有限公司 Process the plasma reactor of the waste gas betiding process apparatus
WO2015160058A1 (en) * 2014-04-16 2015-10-22 주식회사 클린팩터스 Plasma reactor for treating exhaust gas generated from processing facility
KR101609474B1 (en) 2014-10-14 2016-04-05 (주)트리플코어스코리아 System and method for treating gas from chemical vapor deposition apparatus
WO2018221067A1 (en) * 2017-05-29 2018-12-06 カンケンテクノ株式会社 Exhaust gas decompression detoxification method and device therefor
TWI852825B (en) * 2023-11-03 2024-08-11 姜文興 Environmental protection treatment system and control method for recombined substances based on plasma technology

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001149741A (en) * 1999-11-30 2001-06-05 Japan Organo Co Ltd Device and method for treating waste gas containing volatile organic substance
KR20030043404A (en) * 2001-11-28 2003-06-02 주식회사 성광엔비텍 Method for removal of volatile organic compounds and odor using non-thermal plasma and apparatus thereof
KR20060095594A (en) * 2005-02-28 2006-09-01 엄환섭 Plasma Scrubber for Semiconductor Cleaning Waste Gas Removal
KR20080032089A (en) * 2005-07-12 2008-04-14 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 Plasma treatment method of gaseous waste
WO2008093442A1 (en) * 2007-01-30 2008-08-07 Kanken Techno Co., Ltd. Gas processing apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070035565A (en) * 2004-07-13 2007-03-30 레르 리뀌드, 소시에떼 아노님 아 디렉또와르 에 꽁세예 드 쉬르베양스 뿌르 레뛰드 에 렉스쁠로아따시옹 데 프로세데 죠르쥬 끌로드 Atmospheric plasma treatment of gaseous hazardous emissions

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001149741A (en) * 1999-11-30 2001-06-05 Japan Organo Co Ltd Device and method for treating waste gas containing volatile organic substance
KR20030043404A (en) * 2001-11-28 2003-06-02 주식회사 성광엔비텍 Method for removal of volatile organic compounds and odor using non-thermal plasma and apparatus thereof
KR20060095594A (en) * 2005-02-28 2006-09-01 엄환섭 Plasma Scrubber for Semiconductor Cleaning Waste Gas Removal
KR20080032089A (en) * 2005-07-12 2008-04-14 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 Plasma treatment method of gaseous waste
WO2008093442A1 (en) * 2007-01-30 2008-08-07 Kanken Techno Co., Ltd. Gas processing apparatus

Also Published As

Publication number Publication date
KR20100027383A (en) 2010-03-11
TW201021902A (en) 2010-06-16
TWI372653B (en) 2012-09-21
WO2010027184A2 (en) 2010-03-11
KR101026457B1 (en) 2011-03-31

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