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WO2010011076A3 - Dispositif de dépôt en phase vapeur continue de poudre solide et procédé de dépôt en phase vapeur continue de poudre solide - Google Patents

Dispositif de dépôt en phase vapeur continue de poudre solide et procédé de dépôt en phase vapeur continue de poudre solide Download PDF

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Publication number
WO2010011076A3
WO2010011076A3 PCT/KR2009/004041 KR2009004041W WO2010011076A3 WO 2010011076 A3 WO2010011076 A3 WO 2010011076A3 KR 2009004041 W KR2009004041 W KR 2009004041W WO 2010011076 A3 WO2010011076 A3 WO 2010011076A3
Authority
WO
WIPO (PCT)
Prior art keywords
solid powder
continuous solid
vapour
substrate
continuously
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2009/004041
Other languages
English (en)
Korean (ko)
Other versions
WO2010011076A2 (fr
Inventor
김옥률
김옥민
이근식
정승채
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEMVIX
Original Assignee
FEMVIX
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020080072119A external-priority patent/KR100916944B1/ko
Priority claimed from KR1020080090115A external-priority patent/KR100991723B1/ko
Priority claimed from KR1020080109254A external-priority patent/KR101038187B1/ko
Priority claimed from KR1020080111430A external-priority patent/KR101020042B1/ko
Priority claimed from KR1020090021959A external-priority patent/KR101023672B1/ko
Priority claimed from KR1020090032151A external-priority patent/KR101042554B1/ko
Application filed by FEMVIX filed Critical FEMVIX
Priority to US12/999,058 priority Critical patent/US9139912B2/en
Publication of WO2010011076A2 publication Critical patent/WO2010011076A2/fr
Publication of WO2010011076A3 publication Critical patent/WO2010011076A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/14—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas designed for spraying particulate materials
    • B05B7/1404—Arrangements for supplying particulate material
    • B05B7/144—Arrangements for supplying particulate material the means for supplying particulate material comprising moving mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/14—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas designed for spraying particulate materials
    • B05B7/1404—Arrangements for supplying particulate material
    • B05B7/1454—Arrangements for supplying particulate material comprising means for supplying collected oversprayed particulate material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Nozzles (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

La présente invention concerne un procédé et un dispositif dans lesquels une poudre solide est dispersée de manière homogène et est déposée en phase vapeur uniformément et en continu sur un substrat de telle manière qu'un film mince uniforme peut être formé. Plus spécifiquement, la présente invention concerne un procédé et un dispositif de formation d'un film mince, dans lesquels une poudre solide est déposée en phase vapeur à la fois de manière homogène et continue sur une surface entière d'un substrat, indépendamment du matériau ou de la taille du substrat, à l'aide d'une buse pour injecter en continu un aérosol de densité, vitesse et débit prédéterminés qui est produit par alimentation en une poudre solide dans une quantité prédéterminée par unité de temps et en un gaz porteur à un débit prédéterminé par unité de temps dans un tube de support indépendamment de la taille, de la consistance et de la gravité spécifique des particules de poudre solide.
PCT/KR2009/004041 2008-07-24 2009-07-21 Dispositif de dépôt en phase vapeur continue de poudre solide et procédé de dépôt en phase vapeur continue de poudre solide Ceased WO2010011076A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/999,058 US9139912B2 (en) 2008-07-24 2009-07-21 Apparatus and method for continuous powder coating

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
KR10-2008-0072119 2008-07-24
KR1020080072119A KR100916944B1 (ko) 2008-07-24 2008-07-24 고상파우더 연속 증착장치 및 고상파우더 연속 증착방법
KR1020080090115A KR100991723B1 (ko) 2008-09-12 2008-09-12 고상파우더 연속 증착 롤투롤 장치
KR10-2008-0090115 2008-09-12
KR1020080109254A KR101038187B1 (ko) 2008-11-05 2008-11-05 온도조절장치가 구비된 고상파우더 진공증착장치 및 고상파우더 진공증착방법
KR10-2008-0109254 2008-11-05
KR10-2008-0111430 2008-11-11
KR1020080111430A KR101020042B1 (ko) 2008-11-11 2008-11-11 기재 열충격 제어수단을 구비한 고상파우더 분사 증착 장치및 고상파우더 분사 증착 과정에서의 기재 열충격 제거를 위한 온도조절방법
KR10-2009-0021959 2009-03-16
KR1020090021959A KR101023672B1 (ko) 2009-03-16 2009-03-16 고상파우더 공급장치 및 압력관 내 고상파우더 공급 방법
KR10-2009-0032151 2009-04-14
KR1020090032151A KR101042554B1 (ko) 2009-04-14 2009-04-14 고상파우더 공급장치 및 압력관 내 고상파우더 공급 방법

Publications (2)

Publication Number Publication Date
WO2010011076A2 WO2010011076A2 (fr) 2010-01-28
WO2010011076A3 true WO2010011076A3 (fr) 2010-05-27

Family

ID=41570725

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/004041 Ceased WO2010011076A2 (fr) 2008-07-24 2009-07-21 Dispositif de dépôt en phase vapeur continue de poudre solide et procédé de dépôt en phase vapeur continue de poudre solide

Country Status (2)

Country Link
US (1) US9139912B2 (fr)
WO (1) WO2010011076A2 (fr)

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US20100233353A1 (en) * 2009-03-16 2010-09-16 Applied Materials, Inc. Evaporator, coating installation, and method for use thereof
US9023121B2 (en) * 2010-10-20 2015-05-05 Alliant Techsystems Inc. Solid feed systems for elevated pressure processes, gasification systems and related methods
WO2012108704A2 (fr) 2011-02-10 2012-08-16 고려대학교 산학협력단 Appareil de fabrication de cellule solaire à film fin minéral et procédé de commande
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DE102012107797A1 (de) * 2012-08-23 2014-02-27 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Licht emittierenden Halbleiterbauelements und Licht emittierendes Halbleiterbauelement
RU2508473C1 (ru) * 2012-09-18 2014-02-27 Асхат Абрарович Гарафутдинов Устройство для подачи пылеобразного рабочего тела в электроракетный двигатель
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JP6162333B2 (ja) * 2013-07-11 2017-07-12 ぺムヴィックス コーポレーションFemvix Corp. 固相パウダーコーティング装置及びコーティング方法
EP2832528B1 (fr) * 2013-07-31 2021-08-25 Limacorporate S.p.A. Procédé et appareil pour la récupération et la régénération de poudre métallique dans les applications ebm
KR101385950B1 (ko) * 2013-09-16 2014-04-16 주식회사 펨빅스 정전척 및 정전척 제조 방법
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JP6396123B2 (ja) * 2014-08-29 2018-09-26 日東電工株式会社 粉体コーティング装置
KR101592946B1 (ko) 2014-11-05 2016-02-11 서울대학교산학협력단 전기변색 윈도우 제작을 위한 삼산화 텅스텐 나노입자 분말 적층 장치 및 이것의 운용 방법
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JP6426647B2 (ja) * 2016-03-24 2018-11-21 タツタ電線株式会社 スプレーノズル、皮膜形成装置、及び皮膜の形成方法
JP6782087B2 (ja) * 2016-03-28 2020-11-11 株式会社日本マイクロニクス シート治具、ステージ、製造装置、及び二次電池の製造方法
US20170336431A1 (en) * 2016-05-19 2017-11-23 Purdue Research Foundation System and method for measuring exhaust flow velocity of supersonic nozzles
US10092926B2 (en) 2016-06-01 2018-10-09 Arizona Board Of Regents On Behalf Of Arizona State University System and methods for deposition spray of particulate coatings
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US10792703B2 (en) 2017-11-21 2020-10-06 New Mexico Tech University Research Park Corporation Aerosol method for coating
CN109225061A (zh) * 2018-11-08 2019-01-18 常州市星云润滑材料有限公司 润滑粉末生产线以及润滑粉末制备方法
US12091754B2 (en) * 2019-04-23 2024-09-17 Northeastern University Internally cooled aerodynamically centralizing nozzle (ICCN)
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Also Published As

Publication number Publication date
US9139912B2 (en) 2015-09-22
WO2010011076A2 (fr) 2010-01-28
US20110104369A1 (en) 2011-05-05

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