WO2010085764A3 - Method, apparatus, and compositions making anti-reflective coatings for substrates - Google Patents
Method, apparatus, and compositions making anti-reflective coatings for substrates Download PDFInfo
- Publication number
- WO2010085764A3 WO2010085764A3 PCT/US2010/022010 US2010022010W WO2010085764A3 WO 2010085764 A3 WO2010085764 A3 WO 2010085764A3 US 2010022010 W US2010022010 W US 2010022010W WO 2010085764 A3 WO2010085764 A3 WO 2010085764A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- deposition
- substrate
- films
- reflective coating
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/32—Radiation-absorbing paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/68—Particle size between 100-1000 nm
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
- G02B2207/101—Nanooptics
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate, such as aluminum, glass, silicon, or polycarbonate, to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The process can be used to tailor the composition and morphology of the material deposited on a substrate. The present process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/189,411 US8553333B2 (en) | 2009-01-23 | 2011-07-22 | Nanostructured anti-reflective coatings for substrates |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US20576609P | 2009-01-23 | 2009-01-23 | |
| US61/205,766 | 2009-01-23 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US13/189,411 Continuation-In-Part US8553333B2 (en) | 2009-01-23 | 2011-07-22 | Nanostructured anti-reflective coatings for substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2010085764A2 WO2010085764A2 (en) | 2010-07-29 |
| WO2010085764A3 true WO2010085764A3 (en) | 2010-11-18 |
Family
ID=42356423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2010/022010 Ceased WO2010085764A2 (en) | 2009-01-23 | 2010-01-25 | Method, apparatus, and compositions making anti-reflective coatings for substrates |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2010085764A2 (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8236599B2 (en) | 2009-04-09 | 2012-08-07 | State of Oregon acting by and through the State Board of Higher Education | Solution-based process for making inorganic materials |
| US8753515B2 (en) | 2009-12-05 | 2014-06-17 | Home Dialysis Plus, Ltd. | Dialysis system with ultrafiltration control |
| US8501009B2 (en) | 2010-06-07 | 2013-08-06 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Fluid purification system |
| US8801979B2 (en) | 2010-06-10 | 2014-08-12 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Apparatus and method for continuous production of materials |
| EP2763719B1 (en) | 2011-10-07 | 2017-08-09 | Outset Medical, Inc. | Heat exchange fluid purification for dialysis system |
| US20140009834A1 (en) * | 2012-07-05 | 2014-01-09 | Intermolecular, Inc. | Novel antireflective coatings with graded refractive index |
| JP6657186B2 (en) | 2014-04-29 | 2020-03-04 | アウトセット・メディカル・インコーポレイテッドOutset Medical, Inc. | Dialysis system and method |
| HUP1600384A1 (en) | 2016-06-15 | 2018-01-29 | Hungaro Lux Light Kft | Anti-reflection coating |
| EP3500317B1 (en) | 2016-08-19 | 2022-02-23 | Outset Medical, Inc. | Peritoneal dialysis system and methods |
| AU2019325668B2 (en) | 2018-08-23 | 2025-03-27 | Outset Medical, Inc. | Dialysis system and methods |
| CA3133332A1 (en) | 2019-04-30 | 2020-11-05 | Dean Hu | Dialysis system and methods |
| CN110981208A (en) * | 2019-12-17 | 2020-04-10 | 河南豫科光学科技股份有限公司 | Preparation process of ultra-white glass substrate |
| CN114163882A (en) * | 2021-12-06 | 2022-03-11 | 中科智清生态技术(苏州)有限公司 | Photovoltaic panel film layer and production process for river treatment |
| CN114524450B (en) * | 2022-03-21 | 2024-01-19 | 南京科技职业学院 | Preparation method of nano cerium oxide ultraviolet absorbent |
| CN114956592A (en) * | 2022-06-28 | 2022-08-30 | 河北光兴半导体技术有限公司 | Ultra-thin flexible glass manufacturing method and manufacturing system |
| CN118357136A (en) * | 2024-05-21 | 2024-07-19 | 广西大学 | A method for modifying the hydrophilicity of the inner surface of a microchannel reactor and its application |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001281411A (en) * | 2000-03-30 | 2001-10-10 | Fuji Photo Film Co Ltd | Glare proof antireflection film and image display device |
| KR20010106048A (en) * | 2000-05-20 | 2001-11-29 | 서정은 | The permanent live concert permanent live concert which Stars will be appeared and organized |
| US6343865B1 (en) * | 1998-02-17 | 2002-02-05 | Dai Nippon Printing Co., Ltd. | Non-glare film, polarizing device and display device |
-
2010
- 2010-01-25 WO PCT/US2010/022010 patent/WO2010085764A2/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6343865B1 (en) * | 1998-02-17 | 2002-02-05 | Dai Nippon Printing Co., Ltd. | Non-glare film, polarizing device and display device |
| JP2001281411A (en) * | 2000-03-30 | 2001-10-10 | Fuji Photo Film Co Ltd | Glare proof antireflection film and image display device |
| KR20010106048A (en) * | 2000-05-20 | 2001-11-29 | 서정은 | The permanent live concert permanent live concert which Stars will be appeared and organized |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010085764A2 (en) | 2010-07-29 |
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