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WO2010057853A1 - Procédé de revêtement à pression atmosphérique de nanosurfaces - Google Patents

Procédé de revêtement à pression atmosphérique de nanosurfaces Download PDF

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Publication number
WO2010057853A1
WO2010057853A1 PCT/EP2009/065234 EP2009065234W WO2010057853A1 WO 2010057853 A1 WO2010057853 A1 WO 2010057853A1 EP 2009065234 W EP2009065234 W EP 2009065234W WO 2010057853 A1 WO2010057853 A1 WO 2010057853A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
nano
workpiece
working gas
plasma jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2009/065234
Other languages
German (de)
English (en)
Inventor
Alexander Knospe
Thomas Beer
Michael KÜBLER
August Burr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasmatreat GmbH
Original Assignee
Plasmatreat GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasmatreat GmbH filed Critical Plasmatreat GmbH
Publication of WO2010057853A1 publication Critical patent/WO2010057853A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/58—Applying the releasing agents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Definitions

  • the invention relates to a method for applying a layer to a nano-surface of a workpiece, in which an atmospheric plasma jet is generated by electrical discharge in a working gas and a precursor material is supplied spatially separated from the working gas, wherein the precursor material is supplied directly to the plasma jet and the applied layer has a nano-surface corresponding to the nano-surface of the workpiece.
  • Plastic molding in particular as forms in compression or embossing processes in the processing of thermosets or multi-component injection molding, for example in
  • Two-component injection molding process used for the mass production of nano-surface plastic components.
  • a nano-surface is understood to mean a surface whose typical structure sizes are at least partially in the range between 10 and 10,000 nm, preferably in the sub-micron range, in particular in the nanometer range, at least in one spatial dimension. Such structures are also referred to below as nanostructures.
  • a nano-surface also means a surface whose flatness is at least partially in the range between 10 and 10,000 nm in at least one spatial direction, preferably in submicrometer, in particular in the nanometer range.
  • a nano-surface also means a surface with larger structures, for example in the millimeter or micrometer range, whose structural accuracy, in particular in edge regions, is in the range between 10 and 10,000 nm, preferably in the submicrometer, in particular in the nanometer range.
  • Nano-surfaced workpieces play an important role in the production of micro-optics, diffractive optical elements, holographic surface structures, lab-on-a-chip (microfluidic) applications, and surfaces with surface effects for hydrophobization
  • nano-surfaces with bioactive properties for diagnostic applications.
  • a nano-surface may have bioadhesive properties or influence the growth direction of cells applied thereto.
  • prostheses can by a
  • Nano-surface the ingrowth with the tissue can be improved.
  • nano-surfaces can improve the look or feel of materials.
  • a synthetic leather surface can be created by the overlapping of larger ones Narrow structures with micro and / or nanostructures can be improved.
  • a plastic for example, a low-viscosity two-component polyurethane plastic, an epoxy resin, silicone or other crosslinking polymers is placed in or on the mold.
  • a plastic for example, a low-viscosity two-component polyurethane plastic, an epoxy resin, silicone or other crosslinking polymers is placed in or on the mold.
  • These methods have the disadvantage when applied to molds with a nano-surface, that due to the increased surface of the mold due to the nanostructures and the resulting increased adhesion forces between mold and plastic, great forces have to be expended in order to separate mold and plastic from each other.
  • chemically crosslinked polymers are very high adhesion forces to overcome. Comparable disadvantages also occur
  • Reaction injection molding the so-called Reaction Injection Molding on.
  • Contouring here means the formation of a layer of substantially uniform thickness, so that the layer has a nano-surface that substantially corresponds to the nano-surface to which the layer is applied. Therefore, with a conventional release layer, no precise impression of the surface of the mold is possible. Furthermore, during demolding, i. when removing the Kunsschers from the mold, and a part of the release agent removed from the mold, so that it is necessary after only a few molding operations to apply new release agent on the mold. With repeated spraying of conventional release agents, there is also the formation of a deposit on the mold, so that the mold must be cleaned regularly.
  • EP 1301286 Bl discloses a method in which a gradient layer structure having a release layer in a plasma under low pressure conditions on a
  • a method and apparatus for generating an atmospheric plasma jet i.
  • a plasma jet with an ambient pressure which is of the order of magnitude of the atmospheric pressure is known from EP 1 335 641 A1.
  • a working gas especially air, nitrogen, forming gas (mixture of nitrogen and hydrogen) or a noble gas, in particular argon or helium, passed through a channel in which by high voltage a plasma jet via an electrical discharge, i. a corona discharge and / or an arc discharge is generated.
  • the effect of plasma polymerization is preferably used.
  • a precursor material is introduced in liquid form directly into the plasma jet, there excited chemically and / or electronically, so that before, during or after the deposition of the excited precursor to a surface polymerization of the precursor begins.
  • DE 10 2005 059 706 A1 discloses a method in which a separating layer with an atmospheric plasma jet is applied to a surface.
  • the layer thicknesses of the layers applied with this method are too large in order to be able to wet nanostructures in a contour-following manner.
  • the invention is therefore based on the technical problem of improving the method for applying a thin contour-following layer, in particular a release layer to improve demolding in impression processes, on a nano-surface.
  • the application of a contour-following layer to a workpiece can be improved by generating an atmospheric plasma jet by electrical discharge in a working gas and a precursor material for the layer separated from the working gas is introduced directly into the plasma jet and excited in the plasma jet precursor material by plasma deposition under atmospheric pressure is applied to the nano-surface of a workpiece in a thin layer.
  • electrical discharge here, as stated above, corona discharges and / or arc discharges understood.
  • the described method has the advantage that under atmospheric pressure a thin layer, preferably with a Layer thickness in the submicrometer range, so can be applied to a nano-surface, that the applied layer has one of the nano-surface of the workpiece substantially corresponding nano-surface.
  • the method therefore makes it possible to modify the properties, in particular physical, chemical and biological properties, of the workpiece surface while maintaining the structure as a nano-surface by applying a layer under atmospheric pressure. This method thus overcomes the technical prejudice that the great kinetic
  • the above-explained method for applying a layer to a nano-surface of a workpiece is particularly suitable for applying an anti-adhesive layer, in particular a release layer in an injection molding or pressing process.
  • An anti-adhesive layer in this context means a layer which is distinguished in that the force holding it together with a layer applied thereto is less than the force which would hold together the layer and the workpiece applied directly to the workpiece.
  • the described method therefore has the advantage that the separation of, for example, a molded part from a mold is facilitated by the applied anti-adhesive layer, since less effort is required.
  • the method is therefore particularly suitable for
  • the method is particularly suitable for materials which have very high adhesive forces due to the material, for example polyurethanes, epoxies, silicones, unsaturated polyesters, acrylates, melams or phenoplasts.
  • the method has the advantage that the facilitated detachment, for example of the molding of the mold, also causes a cleaner detachment, that is, that the molding and the mold is not damaged in the Ablose mixes.
  • This is particularly advantageous in the production of highly glossy or high gloss surfaces, since the erfmdungsge94 molded surface has hardly any surface flaws and not further treated, for example, polished, must be to obtain the highly glossy or high gloss property.
  • a further advantage of this method is that the formation of a coating on the mold surface is reduced by the very small layer thickness of the release agent layer applied in this method, so that the mold workpiece must be cleaned less frequently.
  • the method is particularly suitable for applying a layer using a fluoro-organic precursor, in particular decafluoropentane and hexafluoropropene oxide.
  • a layer deposited from a fluorine-organic precursor is suitable for contouring a nano-surface.
  • such a layer shows particularly good anti-adhesive properties. These properties are particularly advantageous in nanostructured workpieces, since these have a particularly large surface area due to the nanostructures.
  • a further advantageous embodiment of the method is achieved in that a further layer, a secondary layer, is applied to the applied layer.
  • the layer applied according to the invention has nanostructures on its surface corresponding to the nanostructures of the workpiece surface, these structures are also formed as an impression on the surface of the secondary layer which contacts the layer. Impression here means the formation of structures as a negative.
  • thin hidden layers can be produced which have a nanostructured shape corresponding to the workpiece surface.
  • two complementary layers in their nanostructures can be produced with a separating layer between them.
  • Another particularly advantageous embodiment of the method is achieved by the use of plastics for the secondary layer, which are particularly suitable for the molding of nanostructures.
  • the use of such a plastic leads to a particularly precise impression of the nanostructures of the layer in the secondary layer.
  • An advantageous embodiment of the method is achieved by removing the secondary layer after its application and, if necessary, curing.
  • the nanostructure introduced as an impression in the secondary layer is essentially retained in this method, so that the method is particularly suitable for the molding of nanostructured workpieces, for example, by injection molding, is suitable.
  • Another advantage of this method is that the deposited thin contour-following layer used as the release layer substantially remains on the workpiece in the peeling process of the secondary layer, so that the same release layer can be used for many molding processes without the need for re-deposition of a release layer. Due to the thinness of the separating layer, the formation of deposits on the workpiece is also limited even with multiple application of such a layer, so that the cleaning of the workpiece must also occur less frequently. Further, molded parts are not contaminated by adhering release agent residues after being released from the mold and therefore do not need to be cleaned separately.
  • Fig. 1 shows an embodiment of an inventive
  • FIG. 2 a shows a greatly enlarged section of the nanosurface from FIG. 2 with a layer applied thereto by the method according to the invention
  • FIG. 2b shows the section as in FIG. 2a with a secondary layer applied to the layer applied by the method according to the invention
  • Fig. 2c shows the section as in Fig. 2b after detachment of the secondary layer.
  • the method shown in Fig. 1 for plasma coating 1 has a plasma jet 2 generating plasma source 3, with the after introduction of a precursor in the
  • Plasma jet a nano-surface 4, for example, a nanostructured nano-surface is coated.
  • the plasma source 3 has a nozzle tube 5 made of metal, which tapers conically to a nozzle tube outlet 6. At the
  • An intermediate wall 12 of the twisting device 8 has a ring of inclined in the circumferential direction employed holes 14, through which the working gas is twisted.
  • the downstream, conically tapered part of the nozzle tube is therefore traversed by the working gas in the form of a vortex 16, whose core extends on the longitudinal axis of the nozzle tube.
  • an electrode 18 is arranged centrally, which protrudes coaxially in the direction of the tapered portion in the nozzle tube.
  • the electrode 18 is electrically connected to the intermediate wall 12 and the remaining parts of the twisting device 8.
  • Swirl device 8 is electrically insulated from the nozzle tube 5 by a ceramic tube 20. About the twisting device 8 is applied to the electrode 18 is a high-frequency high voltage, which is generated by a transformer 22.
  • the inlet 10 is connected via a hose, not shown, to a variable flow rate pressurized working gas source.
  • the nozzle tube 5 is grounded.
  • the applied voltage generates a high frequency charge in the form of an arc 24 between the electrode 18 and the nozzle tube 5.
  • arc is used here as a phenomenological description of the discharge, since the discharge occurs in the form of an arc. However, the term “arc” is understood in DC discharge with substantially constant voltage values.
  • Nozzle tube outlet 6 is a lance 26 is provided, to which a precursor source is connected via a hose, not shown.
  • Precursor material is introduced directly into the plasma jet 2 through the lance 26.
  • the precursor material is partially ionized in the plasma jet and transported by the plasma jet through the outlet opening 28.
  • the partially ionized precursor material arrives with the plasma jet on the nano-surface 4 and forms there under plasma polymerization from a layer.
  • FIG. 2 shows a molding process on a nanostructured nano-surface of a workpiece using a release layer applied by a method according to the invention.
  • FIG. 2 a shows a section of the nano-surface 4 from FIG. 2 in a high magnification.
  • a contour-following thin layer 32 was applied by a method according to the invention.
  • FIG. 2b shows a section as shown in FIG. 2a, wherein a secondary layer 34 has been applied to the contour-following layer 32.
  • Fig. 2c shows a section as shown in Fig. 2b, wherein the secondary layer 34 has been separated from the contour-following layer 32.
  • the contour-following layer is essentially left on the nano-surface 4.
  • the detached secondary layer has nanostructures 30 to 30 '' 'of the nano-surface 4 as impressing structures 36 to 36' '' on.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

L'invention concerne un procédé d'application d'une couche sur une nanosurface d'une pièce, selon lequel un jet de plasma est produit à la pression atmosphérique par une décharge électrique dans un gaz de travail et un matériau précurseur est amené en étant séparé du gaz de travail dans l'espace. Le matériau précurseur est directement amené au jet de plasma et la couche appliquée possède une nanosurface correspondant sensiblement à la nanosurface de la pièce. L'invention concerne en particulier un procédé d'application d'une couche de séparation dans les processus de formage, la pièce à former possédant une nanosurface.
PCT/EP2009/065234 2008-11-24 2009-11-16 Procédé de revêtement à pression atmosphérique de nanosurfaces Ceased WO2010057853A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008058783.4 2008-11-24
DE102008058783A DE102008058783A1 (de) 2008-11-24 2008-11-24 Verfahren zur atmosphärischen Beschichtung von Nanooberflächen

Publications (1)

Publication Number Publication Date
WO2010057853A1 true WO2010057853A1 (fr) 2010-05-27

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Application Number Title Priority Date Filing Date
PCT/EP2009/065234 Ceased WO2010057853A1 (fr) 2008-11-24 2009-11-16 Procédé de revêtement à pression atmosphérique de nanosurfaces

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DE (1) DE102008058783A1 (fr)
WO (1) WO2010057853A1 (fr)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
FR2984678B1 (fr) * 2011-12-15 2014-11-07 Renault Sa Dispositif robotise de preparation de surface par plasma d'une piece thermoplastique
DE102013106315B4 (de) 2013-06-18 2016-09-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines physikalischen Plasmas
DE102014100385A1 (de) * 2014-01-15 2015-07-16 Plasma Innovations GmbH Plasmabeschichtungsverfahren zum Abscheiden einer Funktionsschicht und Abscheidevorrichtung
CN106465488A (zh) 2015-03-19 2017-02-22 法国圣戈班玻璃厂 在具有加热功能的机动车‑塑料玻璃板上沉积汇流排的方法
AT517694B1 (de) * 2015-11-12 2017-04-15 Inocon Tech Ges M B H Vorrichtung und Verfahren zum Aufbringen einer Beschichtung
DE102017201559A1 (de) * 2017-01-31 2018-08-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Atmosphärendruckplasmaverfahren zur Herstellung von plasmapolymeren Beschichtungen
CN108611623B (zh) * 2018-06-28 2020-07-31 中国科学院电工研究所 抑制固体介质材料二次电子产额的喷涂镀膜装置及方法
DE102020119220A1 (de) * 2020-07-21 2022-01-27 Plasmatreat Gmbh Verfahren zur Herstellung einer pressgeschweißten Komponente

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EP1895818A1 (fr) * 2006-08-30 2008-03-05 Sulzer Metco AG Dispositif de pulvérisation par plasma et procédé d'introduction d'un précurseur liquide dans un système de gaz plasmagène
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Also Published As

Publication number Publication date
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