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WO2009038326A3 - Scrubber using mesh filter and apparatus for exhaust gas treatment in semiconductor fabrication equipments using the same - Google Patents

Scrubber using mesh filter and apparatus for exhaust gas treatment in semiconductor fabrication equipments using the same Download PDF

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Publication number
WO2009038326A3
WO2009038326A3 PCT/KR2008/005466 KR2008005466W WO2009038326A3 WO 2009038326 A3 WO2009038326 A3 WO 2009038326A3 KR 2008005466 W KR2008005466 W KR 2008005466W WO 2009038326 A3 WO2009038326 A3 WO 2009038326A3
Authority
WO
WIPO (PCT)
Prior art keywords
exhaust gas
scrubber
mesh filter
powders
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2008/005466
Other languages
French (fr)
Other versions
WO2009038326A4 (en
WO2009038326A2 (en
Inventor
Chulsoo Byun
Mancheol Han
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Piezonics Co Ltd
Korea Institute of Industrial Technology KITECH
Original Assignee
Piezonics Co Ltd
Korea Institute of Industrial Technology KITECH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020080088346A external-priority patent/KR100987462B1/en
Application filed by Piezonics Co Ltd, Korea Institute of Industrial Technology KITECH filed Critical Piezonics Co Ltd
Publication of WO2009038326A2 publication Critical patent/WO2009038326A2/en
Publication of WO2009038326A3 publication Critical patent/WO2009038326A3/en
Publication of WO2009038326A4 publication Critical patent/WO2009038326A4/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/24—Particle separators, e.g. dust precipitators, using rigid hollow filter bodies
    • B01D46/2403—Particle separators, e.g. dust precipitators, using rigid hollow filter bodies characterised by the physical shape or structure of the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0052—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with filtering elements moving during filtering operation
    • B01D46/0056—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with filtering elements moving during filtering operation with rotational movement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/66—Regeneration of the filtering material or filter elements inside the filter
    • B01D46/69—Regeneration of the filtering material or filter elements inside the filter by means acting on the cake side without movement with respect to the filter elements, e.g. fixed nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/66—Regeneration of the filtering material or filter elements inside the filter
    • B01D46/70—Regeneration of the filtering material or filter elements inside the filter by acting counter-currently on the filtering surface, e.g. by flushing on the non-cake side of the filter
    • B01D46/72—Regeneration of the filtering material or filter elements inside the filter by acting counter-currently on the filtering surface, e.g. by flushing on the non-cake side of the filter with backwash arms, shoes or nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treating Waste Gases (AREA)

Abstract

The field of the present invention relates to a scrubber using mesh filter and an exhaust gas treatment system using the scrubber, which makes it possible to collect powders on-time with little need for maintenances or repairs of the scrubber. More particularly, in the field of semiconductor fabrication industries the main process such as deposition or etching is rarely interrupted for the maintenance of the scrubber, hence the productivity is enhanced and the environment is saved. The present invention comprises : a process chamber to perform a fabrication process of the semiconductor devices; a process vacuum pump to inhale the exhaust gas from the process chamber; a housing provided with an inlet port and outlet port for an exhaust gas; a mesh filter which is placed between the inlet and outlet port of the housing, which passes the exhaust gas through, and which captures powders contained the exhaust gas at a capturing surface thereof; a powder detaching means to detach powders from the capturing surface of the mesh filter; a discharge port which is provided at a side of the housing and connected to a vacuum suction means to release the powders detached from the housing; a by-pass line which connects the process chamber directly to the process vacuum pump; and on/off valves controlling the flow of the exhaust gas from the process chamber to either the scrubber or the process vacuum pump.
PCT/KR2008/005466 2007-09-21 2008-09-17 Scrubber using mesh filter and apparatus for exhaust gas treatment in semiconductor fabrication equipments using the same Ceased WO2009038326A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20070096583 2007-09-21
KR10-2007-0096583 2007-09-21
KR10-2008-0088346 2008-09-08
KR1020080088346A KR100987462B1 (en) 2007-09-21 2008-09-08 Scrubber using mesh filter and exhaust gas treatment device of semiconductor manufacturing device using same

Publications (3)

Publication Number Publication Date
WO2009038326A2 WO2009038326A2 (en) 2009-03-26
WO2009038326A3 true WO2009038326A3 (en) 2009-05-07
WO2009038326A4 WO2009038326A4 (en) 2009-07-02

Family

ID=40468585

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/005466 Ceased WO2009038326A2 (en) 2007-09-21 2008-09-17 Scrubber using mesh filter and apparatus for exhaust gas treatment in semiconductor fabrication equipments using the same

Country Status (1)

Country Link
WO (1) WO2009038326A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20115853A0 (en) * 2011-08-31 2011-08-31 Beneq Oy Filter pre-equipment and cleaning device
EP2614870B1 (en) * 2012-01-11 2014-03-19 ABB Oy Apparatus and method for removing dirt from gas flow
DE102014100092A1 (en) * 2013-01-25 2014-07-31 Aixtron Se CVD system with particle separator
CN109292931A (en) * 2018-11-05 2019-02-01 黑河学院 A wastewater discharge treatment device for solar cell preparation
CN109647069B (en) * 2019-01-31 2021-04-27 蔡德秀 Self-cleaning dust filtering device for filter screen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5150066A (en) * 1974-10-26 1976-05-01 Toyobo Eng Co Ltd
US4475934A (en) * 1980-02-12 1984-10-09 Intensiv-Filter Gmbh & Co. Kg Pressure-gas connection for dust-laden gas filters
EP0563154B1 (en) * 1990-12-13 1996-01-10 MEANS, Orville Donald, Jr. Filter cleaning apparatus
US5536298A (en) * 1995-02-24 1996-07-16 Awaji; Toshio Method of treating fine particle dust in manufacturing process of semiconductor elements and apparatus therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5150066A (en) * 1974-10-26 1976-05-01 Toyobo Eng Co Ltd
US4475934A (en) * 1980-02-12 1984-10-09 Intensiv-Filter Gmbh & Co. Kg Pressure-gas connection for dust-laden gas filters
EP0563154B1 (en) * 1990-12-13 1996-01-10 MEANS, Orville Donald, Jr. Filter cleaning apparatus
US5536298A (en) * 1995-02-24 1996-07-16 Awaji; Toshio Method of treating fine particle dust in manufacturing process of semiconductor elements and apparatus therefor

Also Published As

Publication number Publication date
WO2009038326A4 (en) 2009-07-02
WO2009038326A2 (en) 2009-03-26

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