WO2009003847A1 - Moldings with a superhydrophobic surface of high pressure and shear resistance - Google Patents
Moldings with a superhydrophobic surface of high pressure and shear resistance Download PDFInfo
- Publication number
- WO2009003847A1 WO2009003847A1 PCT/EP2008/057796 EP2008057796W WO2009003847A1 WO 2009003847 A1 WO2009003847 A1 WO 2009003847A1 EP 2008057796 W EP2008057796 W EP 2008057796W WO 2009003847 A1 WO2009003847 A1 WO 2009003847A1
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- polymeric material
- process according
- molding
- Prior art date
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- 238000000465 moulding Methods 0.000 title claims abstract description 19
- 230000003075 superhydrophobic effect Effects 0.000 title claims abstract description 13
- 239000002245 particle Substances 0.000 claims abstract description 47
- 239000000463 material Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 21
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 18
- 230000005855 radiation Effects 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000002105 nanoparticle Substances 0.000 claims abstract description 5
- -1 polyoxymethylenes Polymers 0.000 claims description 39
- 229910044991 metal oxide Inorganic materials 0.000 claims description 14
- 150000004706 metal oxides Chemical class 0.000 claims description 14
- 239000006185 dispersion Substances 0.000 claims description 11
- 229920000642 polymer Polymers 0.000 claims description 9
- 238000001746 injection moulding Methods 0.000 claims description 8
- 230000001698 pyrogenic effect Effects 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 5
- 229920001155 polypropylene Polymers 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 claims description 4
- 239000004743 Polypropylene Substances 0.000 claims description 4
- 125000004122 cyclic group Chemical group 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 229920000098 polyolefin Polymers 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 238000003490 calendering Methods 0.000 claims description 3
- 229920001971 elastomer Polymers 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 229920000915 polyvinyl chloride Polymers 0.000 claims description 3
- 239000004800 polyvinyl chloride Substances 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- 229920001169 thermoplastic Polymers 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 229920001774 Perfluoroether Polymers 0.000 claims description 2
- 229920001283 Polyalkylene terephthalate Polymers 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 239000004698 Polyethylene Substances 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims description 2
- 239000000806 elastomer Substances 0.000 claims description 2
- PGFXOWRDDHCDTE-UHFFFAOYSA-N hexafluoropropylene oxide Chemical compound FC(F)(F)C1(F)OC1(F)F PGFXOWRDDHCDTE-UHFFFAOYSA-N 0.000 claims description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 2
- 229920000636 poly(norbornene) polymer Polymers 0.000 claims description 2
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920006393 polyether sulfone Polymers 0.000 claims description 2
- 229920000573 polyethylene Polymers 0.000 claims description 2
- 229920000193 polymethacrylate Polymers 0.000 claims description 2
- 229920006324 polyoxymethylene Polymers 0.000 claims description 2
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- 239000004416 thermosoftening plastic Substances 0.000 claims description 2
- 229920000306 polymethylpentene Polymers 0.000 claims 1
- 239000011116 polymethylpentene Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 description 17
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 150000001282 organosilanes Chemical class 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 229920001707 polybutylene terephthalate Polymers 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 238000003917 TEM image Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229920001903 high density polyethylene Polymers 0.000 description 3
- 239000004700 high-density polyethylene Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 240000002853 Nelumbo nucifera Species 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 2
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 2
- 229960003493 octyltriethoxysilane Drugs 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 239000004705 High-molecular-weight polyethylene Substances 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 229920004482 WACKER® Polymers 0.000 description 1
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- BPCXHCSZMTWUBW-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,8,8,8-tridecafluorooctyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F BPCXHCSZMTWUBW-UHFFFAOYSA-N 0.000 description 1
- OYGYKEULCAINCL-UHFFFAOYSA-N triethoxy(hexadecyl)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC OYGYKEULCAINCL-UHFFFAOYSA-N 0.000 description 1
- IJROHELDTBDTPH-UHFFFAOYSA-N trimethoxy(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F IJROHELDTBDTPH-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
Definitions
- the invention relates to a process for producing a molding with a superhydrophobic surface of high pressure and shear resistance and to the molding itself.
- the wetting behaviour of plastics with respect to water and other highly polar liquids can be modified by coating with hydrophobic particles such that contact angles of more than 120 degrees up to the theoretically possible maximum of 180 degrees can occur in water droplets placed onto them.
- Such surfaces are referred to as
- micrometer-size raised structures which cover the surface consist of wax crystals which rest only loosely on one another and additionally do not have a high intrinsic strength.
- a significant improvement in the pressure and shear resistance is achieved in industrially produced super- hydrophobic surfaces by, instead of the wax crystals formed by the natural route, embedding synthetic particles into a matrix material such that the particles project partly out of the matrix.
- the process is preferably performed such that irradiation is effected first over short periods, for example 0.1 to 10 s, then the object is allowed to cool and irradiated again.
- the cooling times are guided by the material of the substrate, the particles and the type of radiation source.
- gamma radiation it is possible to carry out prolonged irradiation times without interruption.
- the polymeric material of the substrate is preferably selected from the group consisting of thermoplastics, thermosets and elastomers.
- the polymeric material used may more preferably be at least one selected from the group consisting of polycarbonates, polyoxymethylenes, poly (meth) acrylates, polyamides, polyvinyl chloride, polyethylenes, polypropylenes, aliphatic linear or branched polyalkenes, cyclic polyalkenes, polystyrenes, polyesters, polyether sulfones, polyacrylonitrile or polyalkylene terephthalates, poly (vinylidene fluoride), poly (hexafluoropropylene) , poly (perfluoropropylene oxide), poly (fluoroalkyl acrylate) , poly (fluoroalkyl methacrylate) , poly (vinyl perfluoroalkyl ether) or other polymers formed from perfluoroalkoxy compounds, poly (isobutene) , poly (4-methyl-l-pentene) and polynorbornene as a homo- or copolymer.
- poly (ethylene) poly (propylene) , polymethyl methacrylates, polystyrenes, polyesters, polyvinyl chloride, acrylonitrile-butadiene-sytrene terpolymers (ABS) , polyethylene terephthalate, polybutylene terephthalate or poly (vinylidene fluoride), material comprising a rubber, a synthetic rubber or a natural rubber .
- ABS acrylonitrile-butadiene-sytrene terpolymers
- the particles used in the process according to the invention are hydrophobic and nanoscale.
- Nanoscale is understood to mean particles having a mean diameter of 2 to 100 nm. In the case of aggregated particles, this term relates to the primary particles present in the aggregate.
- Hydrophobic particles are understood to mean those whose hydrophobic properties are attributable to the material properties of the materials themselves present on the surfaces of the particles or whose hydrophobic properties can be obtained by a treatment of the particles with a suitable compound. Before or after the application or binding to the surface of the molding, the particles may have been equipped with hydrophobic properties. To hydrophobize the particles before or after the application to the surface, they may be treated with a compound suitable for hydrophobization, for example from the group of the alkylsilanes, the fluoroalkylsilanes or the disilazanes.
- the hydrophobic nanoscale particles used may, for example, be silicates, minerals, metal oxides, metal powders, pigments and/or polymers.
- hydrophobic nanoscale metal oxide particles More preferably, it is possible to use metal oxide particles selected from the group consisting of aluminum oxide, cerium oxide, iron oxide, silicon dioxide, titanium dioxide, zinc oxide, zirconium dioxide and mixed oxides of the aforementioned oxides.
- Mixed oxides may preferably be binary mixed oxides, for example silicon titanium mixed oxides or silicon aluminum mixed oxides.
- pyrogenic metal oxide particles may have a BET surface area of 20 to 400 m 2 /g and especially of 35 to 300 m 2 /g.
- Pyrogenic metal oxide particles in the context of the invention include aluminum oxide, cerium oxide, iron oxide, silicon dioxide, titanium dioxide, zinc oxide, zirconium dioxide and mixed oxides of the aforementioned oxides.
- oxidizable and/or hydrolyzable starting materials are generally oxidized and hydrolyzed respectively in a hydrogen-oxygen flame.
- the starting materials used for pyrogenic processes may be organic and inorganic substances. Particularly suitable examples are the readily available chlorides, such as silicon tetrachloride, aluminum chloride or titanium tetrachloride.
- Suitable organic starting compounds may, for example, be alkoxides, such as Si(OC2H 5 ) 4 , Al(OiC 3 Hv) 3 or Ti(OiPr) 4 .
- the metal oxide particles thus obtained are very substantially pore-free and have free hydroxyl groups on the surface.
- the pyrogenic metal oxide particles are present at least partly in the form of aggregated primary particles.
- metalloid oxides for example silicon dioxide, are referred to as metal oxide.
- the particles can be hydrophobized by reaction with surface-modifying reagents which react with active groups on the particle surface.
- Haloorganosilanes RX 2 Si (CH 2 ) m R'
- polysiloxanes or silicone oils of type Y-O- [ (RR' SiO) m - (R" R' ' ' SiO) n J 11 -Y,
- n 0,1,2,3,... oo, preferably 0,1,2,3,... 100000
- n 0,1,2,3,... oo, preferably 0,1,2,3,... 100000
- u 0, 1,2,3, ....oo, preferably 0,1,2,3,... 100000
- R'' alkyl such as C n H 2n+I , n being 1 to 20, aryl such as phenyl radicals and substituted phenyl radicals, (CH 2 ) n -NH 2 , H
- R''' alkyl such as C n H 2n+I , n being 1 to 20, aryl such as phenyl radicals and substituted phenyl radicals, (CH 2 ) n -NH 2 , H.
- RHODORSIL ® OILS 47 V 50, 47 V 100, 47 V 300, 47 V 350, 47 V 500, 47 V 1000, Wacker Silicon Fluids AK 0,65, AK 10, AK 20, AK 35, AK 50, AK 100, AK 150, AK 200, AK 350, AK 500, AK 1000, AK 2000, AK 5000, AK 10000, AK 12500, AK 20000, AK 30000, AK 60000, AK 100000, AK 300000, AK 500000, AK 1000000 or Dow Corning ® 200 fluid.
- octyltrimethoxysilane octyltriethoxysilane, hexamethyldisilazane, 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, dimethylpolysiloxane, nonafluorohexyltrimethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooctyl- triethoxysilane .
- Suitable hydrophobic, pyrogenic metal oxides can be selected for example from the table of stated AEROSIL ® and AEROXIDE ® products (all from Degussa) .
- the nanoscale hydrophobic particles may be applied to the substrate as powder or in the form of a dispersion.
- the liquid phase of the dispersion is preferably volatile.
- the solvents used may especially be alcohols such as ethanol or isopropanol, ketones such as acetone or methyl ethyl ketone, ethers such as diisopropyl ether, or else hydrocarbons such as cyclohexane. Particular preference is given to alcohols. It may be advantageous when the dispersion contains 0.1 to 10% by weight, preferably 0.25 to 7.5% by weight and most preferably 0.5 to 5% by weight of particles based on the total weight of the dispersion. As a result of suitable selection of the dispersion apparatus, it is possible to obtain defined particle sizes.
- Suitable dispersion units may, for example, be rotor-stator machines, high-energy mills in which the particles are ground by collision with one another, planetary kneaders, stirred ball mills, vibratory ball mills, vibratory plates, ultrasound units or combinations of the aforementioned units.
- the dispersion is then applied to the polymeric material and the solvent is subsequently removed.
- the dispersion can be applied by means of spin-coating, dip-coating, painting, spraying or knife-coating.
- a particular type of application is that of injection- molding, in which the particles, preferably in the form of a dispersion, are first introduced into an injection mold, the solvent is allowed to evaporate and then an injection molding operation with a thermoplastic polymer is performed, in the course of which the particles are impressed into the surface of the polymeric material only for part of their diameter.
- a further type of application which is suitable especially for producing flat products, is the calendering process.
- the finely divided hydrophobic particles are forced by means of two contrarotatory rolls partly into the surface of a polymer material which has been made plastic by supplying heat, so as to give rise to, on the one hand, mechanical securing to the polymer, such that, on the other hand, the particles still project out of the polymer layer for part of their diameter.
- the surface of the material in question coated with particles is superhydrophobic .
- a layer of hydrophobic particles forms on the substrate in such a thickness that the substrate has been covered completely.
- the invention further provides a molding which is obtainable by the process according to the invention.
- the layer thickness of the superhydrophobic surface may vary within wide limits. It may preferably be 0.05 to 100 ⁇ m, in which case several layers of particles are present one on top of another which adhere to one another through the van der Waals forces for mechanical securing.
- the molding also has elevations on its surface, caused by the irregular shape of the hydrophobic nanoscale particles. These may preferably have a mean height in the range of 20 nm to 25 ⁇ m and a mean separation of 20 nm to 25 ⁇ m.
- the height and separation of the elevations can be estimated from TEM images. Owing to the distribution and the superimposition of the particle agglomerates formed, a specification is possible only within rough limits. It can be seen that the mean height is about equal to the mean separation between two corresponding agglomerates and that these dimensions are predominantly between 20 nanometers and 250 nanometers. In calendered plates or powder-coated areas, the abovementioned dimensions may be significantly greater and may be up to 25 micrometers, in which case smaller fine structures occur on the surface of these coarse structures .
- the molding may, for example, be a film, a plate, a tube, a lampshade, a bucket, a vat, a dish, a measuring cup, a funnel, a bath or a casing part.
- Feedstocks D-I: Dispersion of trimethylsilyl-coated silicon dioxide (AEROXIDE®LE2) , 1% by weight in ethanol;
- V-PTS Createc B3NM800/25 polybutylene terephthalate
- the radiation sources used may be customary electron accelerators.
- the accelerator voltage is generally 100 keV to 3 MeV.
- Number of strokes refers to the number of rubbing operations of the loaded felt on the surface of the specimen
- Contact angle measurement with water by the known methodology of measurement on a droplet at rest (Colloid & Polymer Science, Volume 55, Number 2, 169- 171) .
- Example 1 An aerosol of D-I is applied to an injection mold by means of a spray apparatus such that the surface of the mold cavity has been moistened uniformly. The evaporation of the carrier liquid (ethanol) is awaited for a few seconds.
- the injection mold thus prepared is used, with a mold surface temperature of 60 0 C and a pressure of 55 bar, by means of a standard injection-molding machine (Engel 150/50 S), to injection-mold rectangular platelets of dimensions 50> ⁇ 30 ⁇ 2 mm of roughness level 33 according to VDI from HDPE.
- the melting point is 300 0 C and the hold pressure is 50 bar.
- Example 2 As Example 1, except that the injection molding is irradiated with a radiation intensity of 25 kGy over a period of 0.25 second.
- Examples 3 to 5 Analogous to Example 2, except that the specimens pass through the radiation beam in a plurality of passes staggered in time and interrupted by cooling phases until the desired dose has been absorbed.
- Examples 6 to 10 Analogous to Example 2, except with variation of the polymer and of the radiation intensity.
- the index D relates to the evaluation by means of dry rubbing, the index W to the evaluation by means of wet rubbing. Feedstocks and experimental conditions are reproduced in Table 2 and 3.
- Figure 1 reproduces the values from Table 1.
- the contact angle in [°] is plotted against the number of strokes. It is clearly evident from the values measured for the contact angle that the superhydrophobic surfaces from inventive Examples 2-5 are more stable toward shearing forces than the surface which was obtained without irradiation (Example 1) .
- Figure 2 shows a TEM image (transmission electron microscopy) of the surface of the injection molding from Example 2.
- the surface of the HDPE plate has impressed particles of hydrophobized silicon dioxide which form a tightly packed, irregularly structured layer.
- the contact angle for a water droplet was determined.
- a contact angle of 157° was found.
- the carbon concentration increases with increasing distance from the sample surface; the oxygen and silicon concentration decreases (X axis: t in 10 3 *s; Y axis: intensity in 10 3 *cps) .
- the time t on the x axis corresponds to a particular penetration depth which, however, as a result of the system, cannot be converted to a length.
- the intensity is a measure of the concentration of the element in question.
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Abstract
Process for producing a molding which comprises a substrate of a polymeric material and particles which are present on the substrate, are bonded to it in a fixed manner and form a superhydrophobic layer having elevations and depressions, in which the hydrophobic nanoscale particles applied to the polymeric material and the support material are subjected to beta and/or gamma radiation over a period of 0.1 second to 5 hours such that a radiation dose of 10 to 1000 kGy is absorbed.
Description
Moldings with a superhydrophobic surface of high pressure and shear resistance
The invention relates to a process for producing a molding with a superhydrophobic surface of high pressure and shear resistance and to the molding itself.
According to the prior art, the wetting behaviour of plastics with respect to water and other highly polar liquids can be modified by coating with hydrophobic particles such that contact angles of more than 120 degrees up to the theoretically possible maximum of 180 degrees can occur in water droplets placed onto them. Such surfaces are referred to as
"superhydrophobic", and, in those cases where values of 140 degrees or higher are obtained, according to a definition of the Deutsche Bundesstiftung Umwelt [German Environment Foundation] (Bonn, 24 October 2000), it is also possible to use the term "Lotus Effect® surface".
The outstanding superhydrophobicity of a natural lotus leaf surface is achieved at the cost of great sensitivity to compressive and shearing (frictional) forces .
The cause is that the micrometer-size raised structures which cover the surface consist of wax crystals which rest only loosely on one another and additionally do not have a high intrinsic strength.
A significant improvement in the pressure and shear resistance is achieved in industrially produced super- hydrophobic surfaces by, instead of the wax crystals formed by the natural route, embedding synthetic
particles into a matrix material such that the particles project partly out of the matrix.
In spite of these measures, the shear resistance even of such surfaces is insufficient for many applications in which the superhydrophobic surfaces are, in an unforeseeable manner or in accordance with intended use, subjected to any wiping or frictional stresses.
It was therefore an object of the invention to provide moldings which have improved pressure and shear resistance over the prior art. It was a further object of the invention to provide a process for producing these moldings.
It has now been found that the superhydrophobicity of the surface of a molding has an enhanced resistance to pressure and shear forces once the molding has been irradiated with high-energy radiation.
The invention therefore provides a process for producing a molding which comprises a substrate of a polymeric material and particles which are present on the substrate, are bonded to it in a fixed manner and form a superhydrophobic layer having elevations and depressions, in which the hydrophobic nanoscale particles applied to the polymeric material and the support material are subjected to beta and/or gamma radiation over a period of 0.1 second to 5 hours such that a radiation dose of 10 to 1000 kGy, preferably 25 to 500 kGy is absorbed (1 Gy = 1 kJ/kg) .
In the case of irradiation with beta radiation, the process is preferably performed such that irradiation is effected first over short periods, for example 0.1 to 10 s, then the object is allowed to cool and
irradiated again. The cooling times are guided by the material of the substrate, the particles and the type of radiation source. In the case of use of gamma radiation, it is possible to carry out prolonged irradiation times without interruption.
The polymeric material of the substrate is preferably selected from the group consisting of thermoplastics, thermosets and elastomers.
The polymeric material used may more preferably be at least one selected from the group consisting of polycarbonates, polyoxymethylenes, poly (meth) acrylates, polyamides, polyvinyl chloride, polyethylenes, polypropylenes, aliphatic linear or branched polyalkenes, cyclic polyalkenes, polystyrenes, polyesters, polyether sulfones, polyacrylonitrile or polyalkylene terephthalates, poly (vinylidene fluoride), poly (hexafluoropropylene) , poly (perfluoropropylene oxide), poly (fluoroalkyl acrylate) , poly (fluoroalkyl methacrylate) , poly (vinyl perfluoroalkyl ether) or other polymers formed from perfluoroalkoxy compounds, poly (isobutene) , poly (4-methyl-l-pentene) and polynorbornene as a homo- or copolymer. With very particular preference, it is possible to use poly (ethylene) , poly (propylene) , polymethyl methacrylates, polystyrenes, polyesters, polyvinyl chloride, acrylonitrile-butadiene-sytrene terpolymers (ABS) , polyethylene terephthalate, polybutylene terephthalate or poly (vinylidene fluoride), material comprising a rubber, a synthetic rubber or a natural rubber .
The particles used in the process according to the invention are hydrophobic and nanoscale.
"Nanoscale" is understood to mean particles having a mean diameter of 2 to 100 nm. In the case of aggregated particles, this term relates to the primary particles present in the aggregate.
Hydrophobic particles are understood to mean those whose hydrophobic properties are attributable to the material properties of the materials themselves present on the surfaces of the particles or whose hydrophobic properties can be obtained by a treatment of the particles with a suitable compound. Before or after the application or binding to the surface of the molding, the particles may have been equipped with hydrophobic properties. To hydrophobize the particles before or after the application to the surface, they may be treated with a compound suitable for hydrophobization, for example from the group of the alkylsilanes, the fluoroalkylsilanes or the disilazanes.
The hydrophobic nanoscale particles used may, for example, be silicates, minerals, metal oxides, metal powders, pigments and/or polymers.
It is possible with preference to use hydrophobic nanoscale metal oxide particles. More preferably, it is possible to use metal oxide particles selected from the group consisting of aluminum oxide, cerium oxide, iron oxide, silicon dioxide, titanium dioxide, zinc oxide, zirconium dioxide and mixed oxides of the aforementioned oxides. Mixed oxides may preferably be binary mixed oxides, for example silicon titanium mixed oxides or silicon aluminum mixed oxides.
Most preferably, it is possible to use pyrogenic metal oxide particles. These may have a BET surface area of 20 to 400 m2/g and especially of 35 to 300 m2/g.
Pyrogenic metal oxide particles in the context of the invention include aluminum oxide, cerium oxide, iron oxide, silicon dioxide, titanium dioxide, zinc oxide, zirconium dioxide and mixed oxides of the aforementioned oxides.
"Pyrogenic" is understood to mean metal oxide particles obtained by flame oxidation and/or flame hydrolysis. In this case, oxidizable and/or hydrolyzable starting materials are generally oxidized and hydrolyzed respectively in a hydrogen-oxygen flame. The starting materials used for pyrogenic processes may be organic and inorganic substances. Particularly suitable examples are the readily available chlorides, such as silicon tetrachloride, aluminum chloride or titanium tetrachloride. Suitable organic starting compounds may, for example, be alkoxides, such as Si(OC2H5)4, Al(OiC3Hv)3 or Ti(OiPr)4. The metal oxide particles thus obtained are very substantially pore-free and have free hydroxyl groups on the surface. In general, the pyrogenic metal oxide particles are present at least partly in the form of aggregated primary particles. In the present invention, metalloid oxides, for example silicon dioxide, are referred to as metal oxide.
The particles can be hydrophobized by reaction with surface-modifying reagents which react with active groups on the particle surface.
To this end, it is possible with preference to use the following silanes, individually or as a mixture:
Organosilanes (RO) 3Si (CnH2n+I) and (RO) 3Si (CnH2n-I) where R = alkyl such as methyl, ethyl, n-propyl, isopropyl, butyl and n = 1-20.
Organosilanes R' x (RO) ySi (CnH2n+i) and R' x (RO) ySi (CnH2n-i) where R = alkyl such as methyl, ethyl, n-propyl, isopropyl, butyl; R' = alkyl such as methyl, ethyl, n-propyl, isopropyl, butyl; R' = cycloalkyl; n = 1-20; x+y = 3, x = l, 2; y = l, 2.
Haloorganosilanes XsSi (CnH2n+i) and XsSi (CnH2n-i) where X = Cl, Br; n = 1-20.
Haloorganosilanes X2(R1JSi(CnH2n+I) and X2 (R' ) Si (CnH2n-!) where X = Cl, Br, R' = alkyl such as methyl, ethyl, n-propyl, isopropyl, butyl; R' = cycloalkyl; n = 1-20.
Haloorganosilanes X (R' ) 2Si (CnH2n+1) and X (R' ) 2Si (CnH2n-!) where X = Cl, Br; R' = alkyl such as methyl, ethyl, n-propyl, isopropyl, butyl; R' = cycloalkyl; n = 1-20.
Organosilanes (RO) 3Si (CH2) m-R' where R = alkyl such as methyl, ethyl, propyl; m = 0.1-20; R' = methyl, aryl such as -CeH5, substituted phenyl radicals, C4F9, OCF2-CHF-CF3, C6F13, OCF2CHF2, Sx- (CH2) 3Si(OR)3.
Organosilanes (R")x(RO)ySi (CH2)m-R' where R" = alkyl, x+y = 3; cycloalkyl, x = 1, 2, y = 1, 2; m = 0.1 to 20; R' = methyl, aryl such as C6H5, substituted phenyl radicals, C4F9, OCF2-CHF-CF3, C6F13, OCF2CHF2, Sx- (CH2) 3Si (OR)3, SH, NR1R1 1R''' where R' = alkyl, aryl; R' ' = H, alkyl, aryl; R' ' ' = H, alkyl, aryl, benzyl, C2H4NR' ' ' 'R' ' ' ' ' where R' ' ' ' = H, alkyl and R' ' ' ' ' = H, alkyl.
Haloorganosilanes XsSi (CH2) m-R'
X = Cl, Br; m = 0.1-20; R' = methyl, aryl such as CeH5, substituted phenyl radicals, C4F9, OCF2-CHF-CF3, C6F13, 0-CF2-CHF2, Sx- (CH2) 3Si (OR)3, where R = methyl, ethyl, propyl, butyl and x = 1 or 2, SH.
Haloorganosilanes RX2Si (CH2) mR'
X = Cl, Br; m = 0.1-20; R' = methyl, aryl such as C6H5, substituted phenyl radicals, C4F9, OCF2-CHF-CF3, C6F13, 0-CF2-CHF2, -0OC(CH3)C=CH2, -Sx- (CH2) 3Si (OR) 3, where
R = methyl, ethyl, propyl, butyl and x = 1 or 2, SH.
Haloorganosilanes R2XSi (CH2) mR'
X = Cl, Br; m = 0.1-20; R' = methyl, aryl such as C6H5, substituted phenyl radicals, C4F9, OCF2-CHF-CF3, C6F13, 0-CF2-CHF2, -Sx- (CH2) 3Si (OR)3, where R = methyl, ethyl, propyl, butyl and x = 1 or 2, SH.
Silazanes R1R2SiNHSiR2R' where R, R' = alkyl, vinyl, aryl.
Cyclic polysiloxanes D3, D4, D5 and their homologs, where D3, D4 and D5 are each understood to mean cyclic polysiloxanes having 3, 4 or 5 units of the -O-Si (CH3) 2 type, e.g. octamethylcyclotetrasiloxane = D4.
polysiloxanes or silicone oils of type Y-O- [ (RR' SiO) m- (R" R' ' ' SiO)nJ11-Y,
m = 0,1,2,3,... oo, preferably 0,1,2,3,... 100000, n = 0,1,2,3,... oo, preferably 0,1,2,3,... 100000, u = 0, 1,2,3, ....oo, preferably 0,1,2,3,... 100000, Y = CH3, H, CnH2n+I, n=2-20; Si (CH3) 3, Si (CH3) 2H,
Si (CH3) 2OH, Si (CH3) 2 (OCH3) , Si (CH3) 2 (CnH2n+i) , n=2-20 R = alkyl such as CnH2n+I, n being 1 to 20, aryl such as phenyl radicals and substituted phenyl radicals, (CH2) n-NH2, H R' = alkyl such as CnH2n+l, n being 1 to 20, aryl such as phenyl radicals and substituted phenyl radicals, (CH2)n-NH2, H
R''= alkyl such as CnH2n+I, n being 1 to 20, aryl such as phenyl radicals and substituted phenyl radicals, (CH2) n-NH2, H
R'''= alkyl such as CnH2n+I, n being 1 to 20, aryl such as phenyl radicals and substituted phenyl radicals, (CH2) n-NH2, H.
Commercially available products that can be used are: RHODORSIL® OILS 47 V 50, 47 V 100, 47 V 300, 47 V 350, 47 V 500, 47 V 1000, Wacker Silicon Fluids AK 0,65, AK 10, AK 20, AK 35, AK 50, AK 100, AK 150, AK 200, AK 350, AK 500, AK 1000, AK 2000, AK 5000, AK 10000, AK 12500, AK 20000, AK 30000, AK 60000, AK 100000, AK 300000, AK 500000, AK 1000000 or Dow Corning® 200 fluid.
As surface modifiers it is possible with preference to use the following compounds: octyltrimethoxysilane, octyltriethoxysilane, hexamethyldisilazane,
3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, dimethylpolysiloxane, nonafluorohexyltrimethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooctyl- triethoxysilane .
With particular preference it is possible to use hexamethyldisilazane, octyltriethoxysilane and dimethylpolysiloxanes .
Suitable hydrophobic, pyrogenic metal oxides can be selected for example from the table of stated AEROSIL® and AEROXIDE® products (all from Degussa) .
Table: Hydrophobic metal oxides
The nanoscale hydrophobic particles may be applied to the substrate as powder or in the form of a dispersion.
The liquid phase of the dispersion is preferably volatile. The solvents used may especially be alcohols such as ethanol or isopropanol, ketones such as acetone or methyl ethyl ketone, ethers such as diisopropyl ether, or else hydrocarbons such as cyclohexane. Particular preference is given to alcohols. It may be
advantageous when the dispersion contains 0.1 to 10% by weight, preferably 0.25 to 7.5% by weight and most preferably 0.5 to 5% by weight of particles based on the total weight of the dispersion. As a result of suitable selection of the dispersion apparatus, it is possible to obtain defined particle sizes. Suitable dispersion units may, for example, be rotor-stator machines, high-energy mills in which the particles are ground by collision with one another, planetary kneaders, stirred ball mills, vibratory ball mills, vibratory plates, ultrasound units or combinations of the aforementioned units.
The dispersion is then applied to the polymeric material and the solvent is subsequently removed. The dispersion can be applied by means of spin-coating, dip-coating, painting, spraying or knife-coating.
A particular type of application is that of injection- molding, in which the particles, preferably in the form of a dispersion, are first introduced into an injection mold, the solvent is allowed to evaporate and then an injection molding operation with a thermoplastic polymer is performed, in the course of which the particles are impressed into the surface of the polymeric material only for part of their diameter.
A further type of application, which is suitable especially for producing flat products, is the calendering process. In this process, the finely divided hydrophobic particles are forced by means of two contrarotatory rolls partly into the surface of a polymer material which has been made plastic by supplying heat, so as to give rise to, on the one hand, mechanical securing to the polymer, such that, on the other hand, the particles still project out of the
polymer layer for part of their diameter. After the cooling, the surface of the material in question coated with particles is superhydrophobic .
In both of the processes outlined, a layer of hydrophobic particles forms on the substrate in such a thickness that the substrate has been covered completely.
The invention further provides a molding which is obtainable by the process according to the invention.
The layer thickness of the superhydrophobic surface may vary within wide limits. It may preferably be 0.05 to 100 μm, in which case several layers of particles are present one on top of another which adhere to one another through the van der Waals forces for mechanical securing.
The molding also has elevations on its surface, caused by the irregular shape of the hydrophobic nanoscale particles. These may preferably have a mean height in the range of 20 nm to 25 μm and a mean separation of 20 nm to 25 μm.
The height and separation of the elevations can be estimated from TEM images. Owing to the distribution and the superimposition of the particle agglomerates formed, a specification is possible only within rough limits. It can be seen that the mean height is about equal to the mean separation between two corresponding agglomerates and that these dimensions are predominantly between 20 nanometers and 250 nanometers. In calendered plates or powder-coated areas, the abovementioned dimensions may be significantly greater and may be up to 25 micrometers, in which case smaller
fine structures occur on the surface of these coarse structures .
The molding may, for example, be a film, a plate, a tube, a lampshade, a bucket, a vat, a dish, a measuring cup, a funnel, a bath or a casing part.
Examples
Feedstocks : D-I: Dispersion of trimethylsilyl-coated silicon dioxide (AEROXIDE®LE2) , 1% by weight in ethanol;
P-I: HDPE, high molecular weight polyethylene
P-2: Vestodur RS1777 polybutylene terephthalate
P-3: Vestodur CL2030 polybutylene terephthalate, filled with 30% glass fibers
P-4: V-PTS Createc B3NM800/25 polybutylene terephthalate
P-5: Polypropylene with 2.5% triallyl isocyanurate
P-6: Polypropylene with 3% PTS AOlOPO aging protectant
Radiation source: The radiation sources used may be customary electron accelerators. The accelerator voltage is generally 100 keV to 3 MeV. In the examples, an electron accelerator with a total power of
150 kilowatts and an accelerator voltage of 2.8 MeV was used.
Determination of the adhesion: Dry rubbing: dry felt, load: 1 N/cm2
Wet rubbing: water-wetted felt, load 1 N/cm2
Number of strokes: refers to the number of rubbing operations of the loaded felt on the surface of the specimen
Contact angle measurement: with water by the known methodology of measurement on a droplet at rest (Colloid & Polymer Science, Volume 55, Number 2, 169- 171) .
Example 1 : An aerosol of D-I is applied to an injection mold by means of a spray apparatus such that the surface of the mold cavity has been moistened uniformly. The evaporation of the carrier liquid (ethanol) is awaited for a few seconds. The injection mold thus prepared is used, with a mold surface temperature of 600C and a pressure of 55 bar, by means of a standard injection-molding machine (Engel 150/50 S), to injection-mold rectangular platelets of dimensions 50><30χ2 mm of roughness level 33 according to VDI from HDPE. The melting point is 3000C and the hold pressure is 50 bar.
Example 2: As Example 1, except that the injection molding is irradiated with a radiation intensity of 25 kGy over a period of 0.25 second.
Examples 3 to 5 : Analogous to Example 2, except that the specimens pass through the radiation beam in a plurality of passes staggered in time and interrupted by cooling phases until the desired dose has been absorbed.
Feedstocks and experimental conditions are reproduced in Table 1.
Examples 6 to 10: Analogous to Example 2, except with variation of the polymer and of the radiation intensity. The index D relates to the evaluation by means of dry rubbing, the index W to the evaluation by means of wet rubbing.
Feedstocks and experimental conditions are reproduced in Table 2 and 3.
Table 1 : Dry rubbing
* = Comparative Table 2 : Dry rubbing
Figure 1 reproduces the values from Table 1. In this plot, the contact angle in [°] is plotted against the number of strokes. It is clearly evident from the values measured for the contact angle that the superhydrophobic surfaces from inventive Examples 2-5 are more stable toward shearing forces than the surface which was obtained without irradiation (Example 1) .
This finding is surprising, since it was expected that the energy-rich radiation would lead to a loss of hydrophobicity, as observed, for example, in other experiments under the influence of UV radiation.
Figure 2 shows a TEM image (transmission electron microscopy) of the surface of the injection molding from Example 2. The surface of the HDPE plate has impressed particles of hydrophobized silicon dioxide which form a tightly packed, irregularly structured layer. At the surface of the injection molding, the contact angle for a water droplet was determined. For a 40 μl water droplet, a contact angle of 157° was found.
Figure 3 shows the result of an XPS analysis (X-ray photoelectron spectroscopy) of the injection molding from Example 2. 0 0 = Si, + + = 0, x x = C.
Thereafter, the carbon concentration increases with increasing distance from the sample surface; the oxygen and silicon concentration decreases (X axis: t in 103*s; Y axis: intensity in 103*cps) . The time t on the x axis corresponds to a particular penetration depth which, however, as a result of the system, cannot be converted to a length. The intensity is a measure of the concentration of the element in question.
This result supplements the finding from the TEM image; namely, it is found that the surface of the polymeric substrates is covered by Siθ2. The carbon content shown in the left-hand part of the diagram originates from the hydrophobized surface of the Siθ2 particles (up to an ion abrasion time of about 35 seconds) and, after this time, is converted to the significantly higher carbon level of the organic support polymer, while the silicon signal simultaneously decreases, since the support polymer does not contain any silicon in significant amounts.
Claims
1. Process for producing a molding which comprises a substrate of a polymeric material and particles which are present on the substrate, are bonded to it in a fixed manner and form a superhydrophobic layer having elevations and depressions, in which the hydrophobic nanoscale particles applied to the polymeric material and the support material are subjected to beta and/or gamma radiation over a period of 0.1 second to 5 hours such that a radiation dose of 10 to 1000 kGy is absorbed.
2. Process according to claim 1, characterized in that the polymeric material is selected from the group consisting of thermoplastics, thermosets and elastomers .
3. Process according to claim 2, characterized in that the polymeric material used is at least one selected from the group consisting of polycarbonates, polyoxymethylenes, poly(meth)- acrylates, polyamides, polyvinyl chloride, polyethylenes, polypropylenes, aliphatic linear or branched polyalkenes, cyclic polyalkenes, polystyrenes, polyesters, polyether sulfones, polyacrylonitrile or polyalkylene terephthalates, poly (vinylidene fluoride), poly (hexafluoro- propylene) , poly (perfluoropropylene oxide), poly- (fluoroalkyl acrylate) , poly (fluoroalkyl methacrylate) , poly (vinyl perfluoroalkyl ether) or other polymers formed from perfluoroalkoxy compounds, poly (isobutene) , poly ( 4-methyl-1- pentene) and polynorbornene as a homo- or copolymer.
4. Process according to claims 1 to 3, characterized in that the particles used are hydrophobic nanoscale metal oxide particles.
5. Process according to claim 4, characterized in that the metal oxide particles used are pyrogenic hydrophobized metal oxide particles having a BET surface area of 20 to 400 m2/g.
6. Process according to claims 1 to 5, characterized in that the particles are applied to the polymeric material in the form of a dispersion and the solvent is then removed.
7. Process according to claim 1 to 6, characterized in that the particles are introduced into an injection mold and then an injection molding operation is performed, in which the particles are impressed into the surface of the polymeric material .
8. Process according to claims 1 to 7, characterized in that the particles are applied to a polymeric material by means of a calendering apparatus such that the particles are impressed into the surface of the polymeric material.
9. Molding obtainable by the process according to claims 1 to 8.
10. Molding according to claim 9, characterized in that the layer thickness of the superhydrophobic surface is 0.05 to 100 μm.
11. Molding according to claim 9 or 10, characterized in that the elevations have a mean height of 20 nm to 25 μm.
12. Molding according to claims 9 to 11, characterized in that the elevations have a mean separation of 20 nm to 25 μm.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EPEP07111732 | 2007-07-04 | ||
| EP07111732A EP2011817B1 (en) | 2007-07-04 | 2007-07-04 | Moulded part with a super hydrophobic surface with high compressive and shearing resistance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009003847A1 true WO2009003847A1 (en) | 2009-01-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2008/057796 WO2009003847A1 (en) | 2007-07-04 | 2008-06-19 | Moldings with a superhydrophobic surface of high pressure and shear resistance |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP2011817B1 (en) |
| AT (1) | ATE449126T1 (en) |
| DE (1) | DE502007002052D1 (en) |
| WO (1) | WO2009003847A1 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011157657A1 (en) * | 2010-06-14 | 2011-12-22 | Solvay Solexis S.P.A. | Pvdf coating compositions |
| US8286561B2 (en) | 2008-06-27 | 2012-10-16 | Ssw Holding Company, Inc. | Spill containing refrigerator shelf assembly |
| US20140349061A1 (en) * | 2012-02-08 | 2014-11-27 | Ross Technology Corporation | Hydrophobic surfaces on injection molded or shaped articles |
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| US8741158B2 (en) | 2010-10-08 | 2014-06-03 | Ut-Battelle, Llc | Superhydrophobic transparent glass (STG) thin film articles |
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| US20150239773A1 (en) | 2014-02-21 | 2015-08-27 | Ut-Battelle, Llc | Transparent omniphobic thin film articles |
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| US9067821B2 (en) | 2008-10-07 | 2015-06-30 | Ross Technology Corporation | Highly durable superhydrophobic, oleophobic and anti-icing coatings and methods and compositions for their preparation |
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| WO2011157657A1 (en) * | 2010-06-14 | 2011-12-22 | Solvay Solexis S.P.A. | Pvdf coating compositions |
| CN103068940A (en) * | 2010-06-14 | 2013-04-24 | 索尔维特殊聚合物意大利有限公司 | Pvdf coating compositions |
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| US10317129B2 (en) | 2011-10-28 | 2019-06-11 | Schott Ag | Refrigerator shelf with overflow protection system including hydrophobic layer |
| US9139744B2 (en) | 2011-12-15 | 2015-09-22 | Ross Technology Corporation | Composition and coating for hydrophobic performance |
| US9528022B2 (en) | 2011-12-15 | 2016-12-27 | Ross Technology Corporation | Composition and coating for hydrophobic performance |
| US20140349061A1 (en) * | 2012-02-08 | 2014-11-27 | Ross Technology Corporation | Hydrophobic surfaces on injection molded or shaped articles |
| US9388325B2 (en) | 2012-06-25 | 2016-07-12 | Ross Technology Corporation | Elastomeric coatings having hydrophobic and/or oleophobic properties |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2011817B1 (en) | 2009-11-18 |
| DE502007002052D1 (en) | 2009-12-31 |
| ATE449126T1 (en) | 2009-12-15 |
| EP2011817A1 (en) | 2009-01-07 |
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