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WO2009002644A8 - Methods of making hierarchical articles - Google Patents

Methods of making hierarchical articles Download PDF

Info

Publication number
WO2009002644A8
WO2009002644A8 PCT/US2008/064631 US2008064631W WO2009002644A8 WO 2009002644 A8 WO2009002644 A8 WO 2009002644A8 US 2008064631 W US2008064631 W US 2008064631W WO 2009002644 A8 WO2009002644 A8 WO 2009002644A8
Authority
WO
WIPO (PCT)
Prior art keywords
methods
microstructures
articles
making
nanofeatures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2008/064631
Other languages
French (fr)
Other versions
WO2009002644A2 (en
WO2009002644A3 (en
Inventor
Jun-Ying Zhang
Jerome C. Porque
Jennifer J. Sahlin
Terry L. Smith
Ding Wang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Priority to EP08769665A priority Critical patent/EP2170764A4/en
Priority to CN200880103985A priority patent/CN101827783A/en
Publication of WO2009002644A2 publication Critical patent/WO2009002644A2/en
Publication of WO2009002644A3 publication Critical patent/WO2009002644A3/en
Anticipated expiration legal-status Critical
Publication of WO2009002644A8 publication Critical patent/WO2009002644A8/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0361—Tips, pillars

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Micromachines (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Provided is a method of fabricating hierarchical articles that contain nano features and microstructures. The method includes providing a substrate that includes nano features and then creating microstructures adding a layer, removing at least a portion of the layer to reveal at least a portion of the substrate. Also provided is a method of making hierarchical structures that contain nanofeatures and microstructures wherein the method includes adding the nanofeatures to existing microstuctures using nanoparticles as an etch mask.
PCT/US2008/064631 2007-06-21 2008-05-23 Methods of making hierarchical articles Ceased WO2009002644A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP08769665A EP2170764A4 (en) 2007-06-21 2008-05-23 Methods of making hierarchical articles
CN200880103985A CN101827783A (en) 2007-06-21 2008-05-23 Methods of making hierarchical articles

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US99975307P 2007-06-21 2007-06-21
US99975207P 2007-06-21 2007-06-21
US60/999,752 2007-06-21
US60/999,753 2007-06-21

Publications (3)

Publication Number Publication Date
WO2009002644A2 WO2009002644A2 (en) 2008-12-31
WO2009002644A3 WO2009002644A3 (en) 2009-02-19
WO2009002644A8 true WO2009002644A8 (en) 2011-12-22

Family

ID=40186234

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/064631 Ceased WO2009002644A2 (en) 2007-06-21 2008-05-23 Methods of making hierarchical articles

Country Status (3)

Country Link
EP (1) EP2170764A4 (en)
CN (1) CN101827783A (en)
WO (1) WO2009002644A2 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR9610557A (en) * 1995-09-20 1999-12-21 Uponor Bv Oriented polymeric products
US9061892B2 (en) 2008-03-17 2015-06-23 Avery Dennison Corporation Functional micro- and/or nano-structure bearing constructions and/or methods for fabricating same
DE102010023490A1 (en) * 2010-06-11 2011-12-15 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Three-dimensional metal-covered nanostructures on substrate surfaces, methods for their production and their use
DE102010026490A1 (en) 2010-07-07 2012-01-12 Basf Se Process for the production of finely structured surfaces
WO2012058605A1 (en) * 2010-10-28 2012-05-03 3M Innovative Properties Company Engineered surfaces for reducing bacterial adhesion
US9085019B2 (en) 2010-10-28 2015-07-21 3M Innovative Properties Company Superhydrophobic films
CN102480001B (en) * 2011-03-25 2013-07-03 深圳光启高等理工研究院 Preparation method of metamaterial
CN102810504A (en) * 2011-05-31 2012-12-05 无锡华润上华半导体有限公司 Process for growing thick aluminium
US8877072B2 (en) 2011-10-10 2014-11-04 Ranjana Sahai Three-dimensional fractal graduated-branching hierarchical structures and fabrication method thereof
CN102381679A (en) * 2011-10-28 2012-03-21 华中科技大学 Manufacturing method of gecko hair-imitating dry adhesive
CA2787584A1 (en) 2012-08-22 2014-02-22 Hy-Power Nano Inc. Method for continuous preparation of indium-tin coprecipitates and indium-tin-oxide nanopowders with substantially homogeneous indium/tin composition, controllable shape and particle size
CN103204460B (en) * 2013-03-21 2016-03-02 北京工业大学 Based on the preparation method of the metal micro-nanostructure of laser interference induction cross-linking reaction
CN105374907B (en) * 2014-08-29 2018-08-14 展晶科技(深圳)有限公司 The substrate and its manufacturing method of light-emitting diode chip for backlight unit
US10384432B2 (en) 2016-02-19 2019-08-20 Palo Alto Research Center Incorporated Hierarchical laminates fabricated from micro-scale, digitally patterned films
KR101921670B1 (en) 2016-04-08 2018-11-26 재단법인 멀티스케일 에너지시스템 연구단 Hierarchial fine structures, a mold for forming same, and a method for manufacturing the mold
CN108821229B (en) * 2018-06-15 2023-05-02 西北工业大学 A preparation method of ZnS infrared window anti-reflection microstructure surface
CN111830614A (en) * 2020-05-13 2020-10-27 华南师范大学 A solution for nanograting imprinting using laser polarization state
CN115028140B (en) * 2022-05-19 2025-05-16 南方科技大学 A method for batch transfer of micro-nano structures

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10282635A (en) * 1997-04-09 1998-10-23 Sony Corp Pattern data correction method, electron beam drawing method, photomask and its manufacturing method, exposure method, semiconductor device and its manufacturing method, and pattern data correction apparatus
KR100480772B1 (en) * 2000-01-05 2005-04-06 삼성에스디아이 주식회사 Forming method of micro structure with surface roughness of nano scale
US6960327B2 (en) * 2003-01-30 2005-11-01 The Regents Of The University Of California Methods for removing organic compounds from nano-composite materials
US20050129844A1 (en) * 2003-06-06 2005-06-16 Colleen Legzdins Method of deposition of nano-particles onto micro and nano-structured materials
US7229936B2 (en) * 2004-05-03 2007-06-12 International Business Machines Corporation Method to reduce photoresist pattern collapse by controlled surface microroughening

Also Published As

Publication number Publication date
WO2009002644A2 (en) 2008-12-31
EP2170764A2 (en) 2010-04-07
WO2009002644A3 (en) 2009-02-19
EP2170764A4 (en) 2011-06-22
CN101827783A (en) 2010-09-08

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