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WO2009001420A1 - Composition de résine polymérisable de moulage tridimensionnel optique - Google Patents

Composition de résine polymérisable de moulage tridimensionnel optique Download PDF

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Publication number
WO2009001420A1
WO2009001420A1 PCT/JP2007/062659 JP2007062659W WO2009001420A1 WO 2009001420 A1 WO2009001420 A1 WO 2009001420A1 JP 2007062659 W JP2007062659 W JP 2007062659W WO 2009001420 A1 WO2009001420 A1 WO 2009001420A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical
resin composition
polymerizable resin
molding
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/062659
Other languages
English (en)
Japanese (ja)
Inventor
Tsuneo Hagiwara
Takashi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CMET Inc
Original Assignee
CMET Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CMET Inc filed Critical CMET Inc
Priority to PCT/JP2007/062659 priority Critical patent/WO2009001420A1/fr
Publication of WO2009001420A1 publication Critical patent/WO2009001420A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

L'invention concerne une composition de résine polymérisable de moulage optique qui, à un rayonnement lumineux, présente une sensibilité de durcissement élevée, et qui, dans un temps de moulage raccourci, réalise la production d'un article moulé tridimensionnel ayant d'excellentes propriétés de précision de moulage, précision dimensionnelle, résistance à l'eau, résistance à l'humidité et d'excellentes propriétés mécaniques avec une productivité élevée, et qui possède une toxicité faible, qui est excellente en ce qui concerne la sécurité et qui ne provoquerait pas de pollution ou détérioration d'environnement de travail et d'environnement global. L'invention porte sur une composition de résine polymérisable de moulage tridimensionnel optique comprenant, en tant qu'initiateur cationique optique, l'un quelconque des composés de sulfonium aromatiques de la formule : [S+(R1)a(R2)b(R3)c][P-F6-n(Rf)n]m. Dans la formule, chacun de R1 et R2 représente phényle, chlorophényle, fluorophényle, 4-phénylthiophényle ou l'un quelconque des groupes de la formule: (dans laquelle X représente chlore ou fluor). R3 représente 4'-phénylsulfonio-4-phénylthiophényle. Rf représente un fluoroalkyle en C1-C8. Chacun parmi a, b et c vaut 0 à 3, à la condition que la somme de a, b et c soit de 3 ; m est un nombre égal à 1+c ; et n vaut 1 à 5.
PCT/JP2007/062659 2007-06-25 2007-06-25 Composition de résine polymérisable de moulage tridimensionnel optique Ceased WO2009001420A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/062659 WO2009001420A1 (fr) 2007-06-25 2007-06-25 Composition de résine polymérisable de moulage tridimensionnel optique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/062659 WO2009001420A1 (fr) 2007-06-25 2007-06-25 Composition de résine polymérisable de moulage tridimensionnel optique

Publications (1)

Publication Number Publication Date
WO2009001420A1 true WO2009001420A1 (fr) 2008-12-31

Family

ID=40185254

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/062659 Ceased WO2009001420A1 (fr) 2007-06-25 2007-06-25 Composition de résine polymérisable de moulage tridimensionnel optique

Country Status (1)

Country Link
WO (1) WO2009001420A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017179202A (ja) * 2016-03-31 2017-10-05 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268205A (ja) * 1996-03-29 1997-10-14 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物および光学的立体造形法
JPH11199647A (ja) * 1998-01-13 1999-07-27 Teijin Seiki Co Ltd 光学的造形用樹脂組成物
JP2000062030A (ja) * 1998-08-20 2000-02-29 Asahi Denka Kogyo Kk 光学的立体造形方法
WO2004029037A1 (fr) * 2002-09-25 2004-04-08 Asahi Denka Co.Ltd. Nouveau compose de sel de sulfonium aromatique, generateur photo-acide le comprenant et composition photopolymerisable le contenant, composition de resine pour la mise en forme tridimensionnelle optique et procede correspondant
WO2004113396A1 (fr) * 2003-06-25 2004-12-29 Cmet Inc. Composition de resine stereolithographique durcissable par rayons actiniques, presentant une stabilite amelioree
JP2005015739A (ja) * 2003-06-24 2005-01-20 Cmet Inc 靱性に優れた光学的立体造形用樹脂組成物
JP2005263796A (ja) * 2004-02-20 2005-09-29 Asahi Denka Kogyo Kk 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物ならびに光学的立体造形法
WO2007037434A1 (fr) * 2005-09-29 2007-04-05 Cmet Inc. Composition de résine pour objet optique moulé tridimensionnel

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268205A (ja) * 1996-03-29 1997-10-14 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物および光学的立体造形法
JPH11199647A (ja) * 1998-01-13 1999-07-27 Teijin Seiki Co Ltd 光学的造形用樹脂組成物
JP2000062030A (ja) * 1998-08-20 2000-02-29 Asahi Denka Kogyo Kk 光学的立体造形方法
WO2004029037A1 (fr) * 2002-09-25 2004-04-08 Asahi Denka Co.Ltd. Nouveau compose de sel de sulfonium aromatique, generateur photo-acide le comprenant et composition photopolymerisable le contenant, composition de resine pour la mise en forme tridimensionnelle optique et procede correspondant
JP2005015739A (ja) * 2003-06-24 2005-01-20 Cmet Inc 靱性に優れた光学的立体造形用樹脂組成物
WO2004113396A1 (fr) * 2003-06-25 2004-12-29 Cmet Inc. Composition de resine stereolithographique durcissable par rayons actiniques, presentant une stabilite amelioree
JP2005263796A (ja) * 2004-02-20 2005-09-29 Asahi Denka Kogyo Kk 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物ならびに光学的立体造形法
WO2007037434A1 (fr) * 2005-09-29 2007-04-05 Cmet Inc. Composition de résine pour objet optique moulé tridimensionnel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017179202A (ja) * 2016-03-31 2017-10-05 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物
JP7008398B2 (ja) 2016-03-31 2022-01-25 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物

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