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WO2009072496A1 - Novel tricyclodecane derivative and process for production thereof - Google Patents

Novel tricyclodecane derivative and process for production thereof Download PDF

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Publication number
WO2009072496A1
WO2009072496A1 PCT/JP2008/071894 JP2008071894W WO2009072496A1 WO 2009072496 A1 WO2009072496 A1 WO 2009072496A1 JP 2008071894 W JP2008071894 W JP 2008071894W WO 2009072496 A1 WO2009072496 A1 WO 2009072496A1
Authority
WO
WIPO (PCT)
Prior art keywords
useful
excimer laser
optical
derivative compound
tricyclodecane derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/071894
Other languages
French (fr)
Japanese (ja)
Inventor
Dai Oguro
Masatoshi Echigo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP2009544678A priority Critical patent/JP5504892B2/en
Publication of WO2009072496A1 publication Critical patent/WO2009072496A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/13—Monohydroxylic alcohols containing saturated rings
    • C07C31/133—Monohydroxylic alcohols containing saturated rings monocyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/24—Halogenated derivatives
    • C07C39/367—Halogenated derivatives polycyclic non-condensed, containing only six-membered aromatic rings as cyclic parts, e.g. halogenated poly-hydroxyphenylalkanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/12—Saturated ethers containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/58—Unsaturated compounds containing ether groups, groups, groups, or groups
    • C07C59/64—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings
    • C07C59/66—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings
    • C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/675—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids of saturated hydroxy-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/60—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members
    • C07C2603/66—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
    • C07C2603/68—Dicyclopentadienes; Hydrogenated dicyclopentadienes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)

Abstract

Disclosed are the following items (1) to (3). (1) A novel tricyclodecane derivative compound which is useful as a modifier for a photoresist resin used in the field of photolithography, a dry etching resistance improver or an agricultural or pharmaceutical intermediate, or which is useful for use in various industrial products; and a process for producing the tricyclodecane derivative compound. (2) A tricyclodecane derivative compound which is useful for use in a crosslinked resin, an optical material for an optical fiber, an optical waveguide, an optical disk substrate, a photoresist or the like, a raw material for the optical material, a pharmaceutical or agricultural intermediate, or which is useful for use in various industrial products. (3) A functional resin having excellent alkali developing properties and excellent adhesion to a substrate, which can be used as a chemically amplified resist responsive to far ultraviolet ray exemplified by a KrF excimer laser, an ArF excimer laser, an F2 excimer laser or an EUV, and which can achieve the improvement in resolution or line edge roughness without deteriorating the basic physical properties required for a resist, such as pattern forming properties, dry-etching resistance and heat resistance; a functional resin composition; and a raw material compound for the functional resin composition.
PCT/JP2008/071894 2007-12-05 2008-12-02 Novel tricyclodecane derivative and process for production thereof Ceased WO2009072496A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009544678A JP5504892B2 (en) 2007-12-05 2008-12-02 Novel tricyclodecane derivative and process for producing the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007314688 2007-12-05
JP2007-314688 2007-12-05
JP2007316352 2007-12-06
JP2007-316352 2007-12-06

Publications (1)

Publication Number Publication Date
WO2009072496A1 true WO2009072496A1 (en) 2009-06-11

Family

ID=40717674

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/071894 Ceased WO2009072496A1 (en) 2007-12-05 2008-12-02 Novel tricyclodecane derivative and process for production thereof

Country Status (3)

Country Link
JP (1) JP5504892B2 (en)
TW (1) TW200940493A (en)
WO (1) WO2009072496A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016106083A (en) * 2010-07-30 2016-06-16 三菱瓦斯化学株式会社 Compound, radiation-sensitive composition, and resist pattern forming method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006028071A1 (en) * 2004-09-10 2006-03-16 Mitsubishi Rayon Co., Ltd. Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon
JP2006113140A (en) * 2004-10-12 2006-04-27 Tokyo Ohka Kogyo Co Ltd Positive resist composition for immersion exposure and resist pattern forming method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58121207A (en) * 1982-01-14 1983-07-19 Kao Corp Ester or ether compound of tricyclic type methylol and perfume or flavor composition containing it
JP2776273B2 (en) * 1994-01-31 1998-07-16 日本電気株式会社 Monomer having vinyl group
JP3736817B2 (en) * 1996-07-12 2006-01-18 日本化薬株式会社 Polyfunctional vinyl ether, polymerizable composition and cured product thereof
JP2002371115A (en) * 2001-06-15 2002-12-26 Toagosei Co Ltd Active energy ray-curable resin sheet-forming agent
JP3783670B2 (en) * 2002-09-09 2006-06-07 日本電気株式会社 Negative photoresist composition and pattern forming method
JP5396738B2 (en) * 2007-05-09 2014-01-22 三菱瓦斯化学株式会社 Radiation-sensitive composition, compound, method for producing compound, and method for forming resist pattern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006028071A1 (en) * 2004-09-10 2006-03-16 Mitsubishi Rayon Co., Ltd. Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon
JP2006113140A (en) * 2004-10-12 2006-04-27 Tokyo Ohka Kogyo Co Ltd Positive resist composition for immersion exposure and resist pattern forming method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016106083A (en) * 2010-07-30 2016-06-16 三菱瓦斯化学株式会社 Compound, radiation-sensitive composition, and resist pattern forming method

Also Published As

Publication number Publication date
JPWO2009072496A1 (en) 2011-04-21
TW200940493A (en) 2009-10-01
JP5504892B2 (en) 2014-05-28

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