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WO2009069450A1 - Novel bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same - Google Patents

Novel bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same Download PDF

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Publication number
WO2009069450A1
WO2009069450A1 PCT/JP2008/070324 JP2008070324W WO2009069450A1 WO 2009069450 A1 WO2009069450 A1 WO 2009069450A1 JP 2008070324 W JP2008070324 W JP 2008070324W WO 2009069450 A1 WO2009069450 A1 WO 2009069450A1
Authority
WO
WIPO (PCT)
Prior art keywords
novel
compound
formylphenyl
bis
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/070324
Other languages
French (fr)
Japanese (ja)
Inventor
Akira Yoshitomo
Tatsuya Iwai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honshu Chemical Industry Co Ltd
Original Assignee
Honshu Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008118798A external-priority patent/JP5276890B2/en
Application filed by Honshu Chemical Industry Co Ltd filed Critical Honshu Chemical Industry Co Ltd
Priority to US12/745,367 priority Critical patent/US20110028752A1/en
Publication of WO2009069450A1 publication Critical patent/WO2009069450A1/en
Anticipated expiration legal-status Critical
Priority to US13/555,023 priority patent/US8563770B2/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/708—Ethers
    • C07C69/712—Ethers the hydroxy group of the ester being etherified with a hydroxy compound having the hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C47/00—Compounds having —CHO groups
    • C07C47/52—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings
    • C07C47/56—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings containing hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/58—Unsaturated compounds containing ether groups, groups, groups, or groups
    • C07C59/64—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings
    • C07C59/66—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings
    • C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
    • C07C59/70—Ethers of hydroxy-acetic acid, e.g. substitutes on the ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A bis(formylphenyl) compound represented by the general formula (1) is produced, for example, by reacting a corresponding bis(hydroxy-formylphenyl) compound as a direct raw material with a halogenated alkoxycarbonyl hydrocarbon in the presence of a base by a publicly known phenyl ether production process.
PCT/JP2008/070324 2007-11-28 2008-11-07 Novel bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same Ceased WO2009069450A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/745,367 US20110028752A1 (en) 2007-11-28 2008-11-07 Novel bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same
US13/555,023 US8563770B2 (en) 2007-11-28 2012-07-20 Bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007306710 2007-11-28
JP2007-306710 2007-11-28
JP2008-118798 2008-04-30
JP2008118798A JP5276890B2 (en) 2007-11-28 2008-04-30 Novel bis (formylphenyl) compound and novel polynuclear polyphenol compound derived therefrom

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/745,367 A-371-Of-International US20110028752A1 (en) 2007-11-28 2008-11-07 Novel bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same
US13/555,023 Continuation US8563770B2 (en) 2007-11-28 2012-07-20 Bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same

Publications (1)

Publication Number Publication Date
WO2009069450A1 true WO2009069450A1 (en) 2009-06-04

Family

ID=40678352

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070324 Ceased WO2009069450A1 (en) 2007-11-28 2008-11-07 Novel bis(formylphenyl) compound and novel polynuclear polyphenol compound derived from the same

Country Status (1)

Country Link
WO (1) WO2009069450A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4163801A (en) * 1976-07-07 1979-08-07 Ici Australia Limited Treatment of animals with 2,6-bis(2-hydroxybenzyl)phenols to eradicate trematodes
JPH03200251A (en) * 1989-12-28 1991-09-02 Nippon Zeon Co Ltd Positive resist composition
JPH06130670A (en) * 1992-10-21 1994-05-13 Fuji Photo Film Co Ltd Positive photosensitive composition
JPH08193055A (en) * 1995-01-13 1996-07-30 Shin Etsu Chem Co Ltd 2,6-bis(2-t-butoxycarbonylmethyloxyphenylmethyl)-1-t-butoxycarbonylmethyloxy-4-methylbenzene and its derivative
JP2001142217A (en) * 1999-08-31 2001-05-25 Tokyo Ohka Kogyo Co Ltd Photosensitive base material, resist pattern forming method using same and positive resist composition
JP2005099683A (en) * 2003-09-05 2005-04-14 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition and method for forming resist pattern by using the same
WO2006090757A1 (en) * 2005-02-25 2006-08-31 Honshu Chemical Industry Co., Ltd. Novel bis(hydroxybenzaldehyde)compound and novel polynuclear polyphenol compound derived therefrom and method for production thereof

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4163801A (en) * 1976-07-07 1979-08-07 Ici Australia Limited Treatment of animals with 2,6-bis(2-hydroxybenzyl)phenols to eradicate trematodes
JPH03200251A (en) * 1989-12-28 1991-09-02 Nippon Zeon Co Ltd Positive resist composition
JPH06130670A (en) * 1992-10-21 1994-05-13 Fuji Photo Film Co Ltd Positive photosensitive composition
JPH08193055A (en) * 1995-01-13 1996-07-30 Shin Etsu Chem Co Ltd 2,6-bis(2-t-butoxycarbonylmethyloxyphenylmethyl)-1-t-butoxycarbonylmethyloxy-4-methylbenzene and its derivative
JP2001142217A (en) * 1999-08-31 2001-05-25 Tokyo Ohka Kogyo Co Ltd Photosensitive base material, resist pattern forming method using same and positive resist composition
JP2005099683A (en) * 2003-09-05 2005-04-14 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition and method for forming resist pattern by using the same
WO2006090757A1 (en) * 2005-02-25 2006-08-31 Honshu Chemical Industry Co., Ltd. Novel bis(hydroxybenzaldehyde)compound and novel polynuclear polyphenol compound derived therefrom and method for production thereof

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