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WO2009050993A1 - 非接触膜厚測定方法及び装置 - Google Patents

非接触膜厚測定方法及び装置 Download PDF

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Publication number
WO2009050993A1
WO2009050993A1 PCT/JP2008/067297 JP2008067297W WO2009050993A1 WO 2009050993 A1 WO2009050993 A1 WO 2009050993A1 JP 2008067297 W JP2008067297 W JP 2008067297W WO 2009050993 A1 WO2009050993 A1 WO 2009050993A1
Authority
WO
WIPO (PCT)
Prior art keywords
terahertz wave
film thickness
pump light
thickness measurement
lpu
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/067297
Other languages
English (en)
French (fr)
Inventor
Hideyuki Ohtake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aisin Corp
Original Assignee
Aisin Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aisin Seiki Co Ltd filed Critical Aisin Seiki Co Ltd
Priority to EP08840347A priority Critical patent/EP2202481A1/en
Priority to JP2009538027A priority patent/JPWO2009050993A1/ja
Priority to US12/669,927 priority patent/US20100195092A1/en
Publication of WO2009050993A1 publication Critical patent/WO2009050993A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0666—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using an exciting beam and a detection beam including surface acoustic waves [SAW]

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

光学系の調整が容易な非接触膜厚測定方法及び装置を提供することを目的とする。 ポンプ光Ｌpu が入射されてテラヘルツ波パルスＬt を発生するテラヘルツ波発生手段４は、ポンプ光Ｌpu の内テラヘルツ波パルスの発生に使われないでテラヘルツ波発生手段４から出射される残りのポンプ光ＬＡpu と同軸方向にテラヘルツ波パルスＬt を発生させる。そして、ポンプ光Ｌpu の波長が可視域～近赤外域にあるので、ポンプ光Ｌpu をガイド光としてテラヘルツ波パルス発生手段４から膜厚測定対象２０までの光路及び膜厚測定対象２０から検出手段７までの光路が容易に調整（入射光学系５、受光光学系６を容易にアライメント）され得る。 
PCT/JP2008/067297 2007-10-16 2008-09-25 非接触膜厚測定方法及び装置 Ceased WO2009050993A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08840347A EP2202481A1 (en) 2007-10-16 2008-09-25 Non-contact film thickness measurement method and device
JP2009538027A JPWO2009050993A1 (ja) 2007-10-16 2008-09-25 非接触膜厚測定方法及び装置
US12/669,927 US20100195092A1 (en) 2007-10-16 2008-09-25 Noncontact film thickness measurement method and device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007269171 2007-10-16
JP2007-269171 2007-10-16

Publications (1)

Publication Number Publication Date
WO2009050993A1 true WO2009050993A1 (ja) 2009-04-23

Family

ID=40567266

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/067297 Ceased WO2009050993A1 (ja) 2007-10-16 2008-09-25 非接触膜厚測定方法及び装置

Country Status (4)

Country Link
US (1) US20100195092A1 (ja)
EP (1) EP2202481A1 (ja)
JP (1) JPWO2009050993A1 (ja)
WO (1) WO2009050993A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2538200A4 (en) * 2010-02-26 2016-10-05 Aisin Seiki APPARATUS AND METHOD FOR INSPECTING COATING FILMS

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2887334B1 (fr) * 2005-06-20 2007-08-24 Centre Nat Rech Scient Dispositif et procede de caracterisation de structure par effet de longueur d'onde dans un systeme photo-acoustique
JP6078870B2 (ja) * 2012-06-28 2017-02-15 株式会社Ｓｃｒｅｅｎホールディングス 検査装置および検査方法
JP2014081285A (ja) * 2012-10-17 2014-05-08 Aisin Seiki Co Ltd 多層セラミックの膜厚測定方法
JP6091880B2 (ja) * 2012-12-19 2017-03-08 株式会社アドバンテスト 電磁波測定装置、測定方法、プログラム、記録媒体
JP6096725B2 (ja) * 2014-09-09 2017-03-15 アイシン精機株式会社 膜厚測定装置及び膜厚測定方法
US11060859B2 (en) 2016-04-04 2021-07-13 Tetechs Inc. Methods and systems for thickness measurement of multi-layer structures
CA3017393C (en) * 2016-04-04 2020-07-21 Tetechs Inc. Methods and systems for thickness measurement of multilayer structures
US10508985B2 (en) * 2017-06-05 2019-12-17 Northwestern University Systems and methods for pump-probe spectroscopy
US10323931B2 (en) 2017-10-27 2019-06-18 Ford Motor Company Method and system for aligning a terahertz sensor system
JP6955462B2 (ja) * 2018-03-02 2021-10-27 浜松ホトニクス株式会社 光学計測装置及び光学計測方法
TWI775152B (zh) * 2020-09-22 2022-08-21 萬潤科技股份有限公司 物件厚度量測方法及裝置
TWI781446B (zh) * 2020-09-22 2022-10-21 萬潤科技股份有限公司 物件厚度量測裝置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002303574A (ja) * 2001-04-04 2002-10-18 Tochigi Nikon Corp テラヘルツ光装置及びこれの調整方法
JP2004028618A (ja) 2002-06-21 2004-01-29 Osaka Industrial Promotion Organization 塗装膜測定方法及び装置
JP2004317573A (ja) * 2003-04-11 2004-11-11 Institute Of Physical & Chemical Research テラヘルツ波透過用光学部品、テラヘルツ波光学系、テラヘルツ帯波処理装置および同方法
JP2005129732A (ja) * 2003-10-23 2005-05-19 Tochigi Nikon Corp テラヘルツ光発生装置およびテラヘルツ光測定装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003058212A1 (fr) * 2001-12-28 2003-07-17 Nikon Corporation Dispositif de mesure spectrale
JP4147487B2 (ja) * 2004-04-28 2008-09-10 独立行政法人科学技術振興機構 テラヘルツ電磁波を用いた物性測定装置
JP4445325B2 (ja) * 2004-05-19 2010-04-07 アイシン精機株式会社 テラヘルツ波発生用半導体結晶、その結晶を用いたテラヘルツ波発生装置とその方法及びテラヘルツ波検出装置とその方法
JP2006091802A (ja) * 2004-09-21 2006-04-06 Semiconductor Res Found テラヘルツ電磁波発生装置及び方法
JP5328319B2 (ja) * 2008-01-29 2013-10-30 キヤノン株式会社 テラヘルツ波を用いた検査装置及び検査方法
US7919764B2 (en) * 2008-05-06 2011-04-05 The United States Of America As Represented By The Secretary Of The Army Method and apparatus for enhanced terahertz radiation from high stacking fault density

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002303574A (ja) * 2001-04-04 2002-10-18 Tochigi Nikon Corp テラヘルツ光装置及びこれの調整方法
JP2004028618A (ja) 2002-06-21 2004-01-29 Osaka Industrial Promotion Organization 塗装膜測定方法及び装置
JP2004317573A (ja) * 2003-04-11 2004-11-11 Institute Of Physical & Chemical Research テラヘルツ波透過用光学部品、テラヘルツ波光学系、テラヘルツ帯波処理装置および同方法
JP2005129732A (ja) * 2003-10-23 2005-05-19 Tochigi Nikon Corp テラヘルツ光発生装置およびテラヘルツ光測定装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2538200A4 (en) * 2010-02-26 2016-10-05 Aisin Seiki APPARATUS AND METHOD FOR INSPECTING COATING FILMS

Also Published As

Publication number Publication date
EP2202481A1 (en) 2010-06-30
JPWO2009050993A1 (ja) 2011-03-03
US20100195092A1 (en) 2010-08-05

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