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WO2009048051A1 - 照明光学装置、並びに露光方法及び装置 - Google Patents

照明光学装置、並びに露光方法及び装置 Download PDF

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Publication number
WO2009048051A1
WO2009048051A1 PCT/JP2008/068206 JP2008068206W WO2009048051A1 WO 2009048051 A1 WO2009048051 A1 WO 2009048051A1 JP 2008068206 W JP2008068206 W JP 2008068206W WO 2009048051 A1 WO2009048051 A1 WO 2009048051A1
Authority
WO
WIPO (PCT)
Prior art keywords
polarization
illuminating
optical apparatus
illuminating light
illuminating optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/068206
Other languages
English (en)
French (fr)
Inventor
Hirohisa Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to EP08837855A priority Critical patent/EP2200070A4/en
Priority to JP2009536994A priority patent/JPWO2009048051A1/ja
Publication of WO2009048051A1 publication Critical patent/WO2009048051A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/14—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters for producing polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　複数の偏光状態の制御を常に高精度に行うことができる照明光学装置である。照明光でマスク（Ｍ）のパターン面を照明する照明光学装置（ＩＬＳ）において、その照明光の光路中に配置されて、その照明光の偏光状態を所定方向の偏光方向を有する直線偏光状態に可変する１／２波長板（５）及びＰＢＳ（４）を含む偏光光学系と、その偏光光学系よりもマスク（Ｍ）側に配置され、その偏光光学系から射出された照明光の偏光状態を可変するデポラライザ（６）とを備える。
PCT/JP2008/068206 2007-10-12 2008-10-07 照明光学装置、並びに露光方法及び装置 Ceased WO2009048051A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP08837855A EP2200070A4 (en) 2007-10-12 2008-10-07 OPTICAL LIGHTING APPARATUS, AND EXPOSURE METHOD AND APPARATUS
JP2009536994A JPWO2009048051A1 (ja) 2007-10-12 2008-10-07 照明光学装置、並びに露光方法及び装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007267256 2007-10-12
JP2007-267256 2007-10-12

Publications (1)

Publication Number Publication Date
WO2009048051A1 true WO2009048051A1 (ja) 2009-04-16

Family

ID=40549195

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/068206 Ceased WO2009048051A1 (ja) 2007-10-12 2008-10-07 照明光学装置、並びに露光方法及び装置

Country Status (6)

Country Link
US (2) US8300213B2 (ja)
EP (1) EP2200070A4 (ja)
JP (1) JPWO2009048051A1 (ja)
KR (1) KR20100085974A (ja)
TW (1) TW200928607A (ja)
WO (1) WO2009048051A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101526755B (zh) * 2009-04-21 2011-01-05 清华大学 一种193nm浸没式光刻照明系统
WO2012046541A1 (ja) * 2010-10-06 2012-04-12 株式会社ブイ・テクノロジー 露光装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1910522B (zh) 2004-01-16 2010-05-26 卡尔蔡司Smt股份公司 偏振调制光学元件
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
JPWO2009048051A1 (ja) * 2007-10-12 2011-02-17 株式会社ニコン 照明光学装置、並びに露光方法及び装置
JP6858206B2 (ja) * 2017-02-17 2021-04-14 富士フイルム株式会社 液晶表示装置
DE102018218064B4 (de) * 2018-10-22 2024-01-18 Carl Zeiss Smt Gmbh Optisches System, insbesondere für die Mikrolithographie

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063751A (ja) * 1983-09-19 1985-04-12 Olympus Optical Co Ltd 光磁気ピツクアツプ装置
WO2004051717A1 (ja) * 2002-12-03 2004-06-17 Nikon Corporation 照明光学装置、露光装置および露光方法
WO2005076045A1 (ja) * 2004-02-06 2005-08-18 Nikon Corporation 偏光変換素子、照明光学装置、露光装置、および露光方法
JP2007263897A (ja) * 2006-03-29 2007-10-11 Nikon Corp 偏光計測装置の校正方法及び装置、偏光計測装置及び該装置を備えた露光装置、並びに位相遅れ量の計測方法及び波長板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP4666157B2 (ja) * 2003-07-10 2011-04-06 株式会社ニコン 人工水晶部材、露光装置、及び露光装置の製造方法
WO2005036619A1 (ja) * 2003-10-09 2005-04-21 Nikon Corporation 照明光学装置、露光装置および露光方法
US7345740B2 (en) * 2004-12-28 2008-03-18 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
TWI453795B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
JPWO2009048051A1 (ja) * 2007-10-12 2011-02-17 株式会社ニコン 照明光学装置、並びに露光方法及び装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063751A (ja) * 1983-09-19 1985-04-12 Olympus Optical Co Ltd 光磁気ピツクアツプ装置
WO2004051717A1 (ja) * 2002-12-03 2004-06-17 Nikon Corporation 照明光学装置、露光装置および露光方法
WO2005076045A1 (ja) * 2004-02-06 2005-08-18 Nikon Corporation 偏光変換素子、照明光学装置、露光装置、および露光方法
JP2007263897A (ja) * 2006-03-29 2007-10-11 Nikon Corp 偏光計測装置の校正方法及び装置、偏光計測装置及び該装置を備えた露光装置、並びに位相遅れ量の計測方法及び波長板

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2200070A4 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101526755B (zh) * 2009-04-21 2011-01-05 清华大学 一种193nm浸没式光刻照明系统
WO2012046541A1 (ja) * 2010-10-06 2012-04-12 株式会社ブイ・テクノロジー 露光装置
JP2012083383A (ja) * 2010-10-06 2012-04-26 V Technology Co Ltd 露光装置

Also Published As

Publication number Publication date
US20090128796A1 (en) 2009-05-21
EP2200070A1 (en) 2010-06-23
TW200928607A (en) 2009-07-01
KR20100085974A (ko) 2010-07-29
US20130114058A1 (en) 2013-05-09
EP2200070A4 (en) 2012-11-21
US8300213B2 (en) 2012-10-30
JPWO2009048051A1 (ja) 2011-02-17

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