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WO2008129901A1 - 疎水化酸化ケイ素被覆金属酸化物粒子の製造方法 - Google Patents

疎水化酸化ケイ素被覆金属酸化物粒子の製造方法 Download PDF

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Publication number
WO2008129901A1
WO2008129901A1 PCT/JP2008/053102 JP2008053102W WO2008129901A1 WO 2008129901 A1 WO2008129901 A1 WO 2008129901A1 JP 2008053102 W JP2008053102 W JP 2008053102W WO 2008129901 A1 WO2008129901 A1 WO 2008129901A1
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metal oxide
silicon oxide
dispersion
oxide particles
hydrophobized silicon
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French (fr)
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Hajime Katayama
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AGC Inc
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Asahi Glass Co Ltd
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Priority to JP2009510803A priority Critical patent/JP5158078B2/ja
Priority to AT08711866T priority patent/ATE507267T1/de
Priority to EP20080711866 priority patent/EP2141205B1/en
Priority to DE200860006541 priority patent/DE602008006541D1/de
Priority to CN200880011313XA priority patent/CN101652434B/zh
Publication of WO2008129901A1 publication Critical patent/WO2008129901A1/ja
Priority to US12/574,738 priority patent/US8282991B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12Treatment with organosilicon compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
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Abstract

 フッ素樹脂への分散性、フッ素化合物に対する耐性、および紫外線遮断性に優れる疎水化酸化ケイ素被覆金属酸化物粒子、さらに、透明性、耐候性、および紫外線遮断性に優れるフッ素樹脂フィルムを提供する。  (a)金属酸化物粒子の分散液に酸化ケイ素前駆体を加え、酸化ケイ素被覆金属酸化物粒子の分散液を得る工程と、(b)該分散液に化合物(1)あるいは(2)、および酸化ケイ素前駆体を加え、一次疎水化処理する工程と、(c)次いでシラノール保護剤を加え、二次疎水化処理する工程と、(d)該分散液を乾燥する工程と、を有する製造方法で得られた疎水化酸化ケイ素被覆金属酸化物粒子。さらに、該疎水化酸化ケイ素被覆金属酸化物粒子とフッ素樹脂とを含むフッ素樹脂フィルム。  R1 4-nSi(OR2)n ・・・(1)  R3 3Si-NH-SiR3 3 ・・・(2)  ただし、上記式(1)、(2)中、R1は炭素数1~9のアルキル基であり、R2、R3は、それぞれ独立に、アルキル基であり、nは1~3の整数である。
PCT/JP2008/053102 2007-04-13 2008-02-22 疎水化酸化ケイ素被覆金属酸化物粒子の製造方法 Ceased WO2008129901A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2009510803A JP5158078B2 (ja) 2007-04-13 2008-02-22 疎水化酸化ケイ素被覆金属酸化物粒子の製造方法
AT08711866T ATE507267T1 (de) 2007-04-13 2008-02-22 Verfahren zur herstellung einer mit hydrophobiertem siliziumoxid belegter metalloxidpartikel
EP20080711866 EP2141205B1 (en) 2007-04-13 2008-02-22 Process for producing metal oxide particle coated with hydrophobized silicon oxide
DE200860006541 DE602008006541D1 (de) 2007-04-13 2008-02-22 Verfahren zur herstellung einer mit hydrophobiertem siliziumoxid belegter metalloxidpartikel
CN200880011313XA CN101652434B (zh) 2007-04-13 2008-02-22 疏水化氧化硅被覆的金属氧化物粒子的制造方法
US12/574,738 US8282991B2 (en) 2007-04-13 2009-10-07 Process for producing hydrophobized silicon oxide-coated metal oxide particles comprising primary and secondary hydrophobizing steps

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JP2007105702 2007-04-13
JP2007-105702 2007-04-13

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US12/574,738 Continuation US8282991B2 (en) 2007-04-13 2009-10-07 Process for producing hydrophobized silicon oxide-coated metal oxide particles comprising primary and secondary hydrophobizing steps

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EP (1) EP2141205B1 (ja)
JP (1) JP5158078B2 (ja)
CN (1) CN101652434B (ja)
AT (1) ATE507267T1 (ja)
DE (1) DE602008006541D1 (ja)
WO (1) WO2008129901A1 (ja)

Cited By (15)

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JP2009096835A (ja) * 2007-10-13 2009-05-07 Konica Minolta Opto Inc 複合樹脂組成物の製造方法、及び光学素子
WO2009154124A1 (ja) * 2008-06-16 2009-12-23 旭硝子株式会社 フッ素樹脂フィルム
JP2010143948A (ja) * 2008-12-16 2010-07-01 Toray Advanced Film Co Ltd フッ素樹脂フィルム
EP2357674A4 (en) * 2008-12-08 2012-04-18 Asahi Glass Co Ltd FLUORESCENT FILM AND ITS USE
WO2012090674A1 (ja) * 2010-12-27 2012-07-05 旭硝子株式会社 太陽電池用表面材、太陽電池用被覆材及び太陽電池モジュール
JP2012530671A (ja) * 2009-06-24 2012-12-06 ビーエーエスエフ ソシエタス・ヨーロピア 変性ZnOナノ粒子
WO2012172733A1 (ja) * 2011-06-17 2012-12-20 パナソニック株式会社 シリカ多孔体の製造方法
JP2013241318A (ja) * 2012-04-27 2013-12-05 Kao Corp 疎水化処理した酸化亜鉛粒子の製造方法
JP2015182892A (ja) * 2014-03-20 2015-10-22 石原産業株式会社 酸化亜鉛及びその製造方法並びにその用途
JP6083780B1 (ja) * 2016-11-07 2017-02-22 エム・テクニック株式会社 色特性を制御されたケイ素化合物被覆酸化物粒子の製造方法、及びケイ素化合物被覆酸化物粒子、並びにそのケイ素化合物被覆酸化物粒子を含む塗布用組成物
WO2017135393A1 (ja) * 2016-02-02 2017-08-10 エム・テクニック株式会社 色特性を制御された酸化物粒子の製造方法、及び酸化物粒子、並びにその酸化物粒子を含む塗布用又はフィルム状組成物
WO2017209305A1 (ja) * 2016-06-02 2017-12-07 エム・テクニック株式会社 色特性を制御された酸化物粒子、並びにその酸化物粒子を含む塗布用又はフィルム状組成物
WO2018025610A1 (ja) * 2016-08-04 2018-02-08 日本板硝子株式会社 酸化亜鉛含有複合粒子、紫外線遮蔽用組成物、及び化粧料
US9949898B2 (en) 2015-10-05 2018-04-24 M. Technique Co., Ltd. Silicon oxide-coated iron oxide composition for coating comprising iron oxide particles coated with silicon oxide
JP2018076218A (ja) * 2017-01-06 2018-05-17 エム・テクニック株式会社 色特性を制御されたケイ素化合物被覆酸化物粒子の製造方法

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US9139737B1 (en) 2011-11-21 2015-09-22 Nanophase Technologies Corporation Multifunctional coated powders and high solids dispersions
WO2014142468A1 (en) * 2013-03-13 2014-09-18 Samsung Electronics Co., Ltd. Method of providing copy image and ultrasound apparatus therefor
CN103342902B (zh) * 2013-07-26 2015-03-11 资源县天盛新型材料开发有限公司 一种疏水性石英微粉及其一体化生产工艺和应用
EP3369785B1 (en) * 2015-07-27 2020-06-17 Nanophase Technologies Corporation Multifunctional coated powders and high solids dispersions
CN108463434B (zh) * 2015-12-25 2021-07-27 Agc株式会社 表面修饰金属氧化物粒子、制造方法、分散液、固化性组合物以及固化物
US10555892B1 (en) 2017-03-09 2020-02-11 Nanophase Technologies Corporation Functionalized siloxane or polysiloxane coated particles with enhanced light filtering properties
US10590278B2 (en) 2017-04-10 2020-03-17 Nanophase Technologies Corporation Coated powders having high photostability
WO2019026962A1 (ja) * 2017-08-04 2019-02-07 住友大阪セメント株式会社 分散液、組成物、封止部材、発光装置、照明器具、表示装置および発光装置の製造方法
WO2020213444A1 (ja) * 2019-04-15 2020-10-22 信越化学工業株式会社 シリカ被覆粒子及びその製造方法
JP6746025B1 (ja) * 2020-03-31 2020-08-26 株式会社アドマテックス 表面改質粒子材料及びスラリー組成物
WO2021220454A1 (ja) * 2020-04-30 2021-11-04 住友大阪セメント株式会社 表面改質酸化亜鉛粒子、分散液、化粧料

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