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WO2008123270A1 - 半導体装置、半導体装置の製造方法及び表示装置 - Google Patents

半導体装置、半導体装置の製造方法及び表示装置 Download PDF

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Publication number
WO2008123270A1
WO2008123270A1 PCT/JP2008/055633 JP2008055633W WO2008123270A1 WO 2008123270 A1 WO2008123270 A1 WO 2008123270A1 JP 2008055633 W JP2008055633 W JP 2008055633W WO 2008123270 A1 WO2008123270 A1 WO 2008123270A1
Authority
WO
WIPO (PCT)
Prior art keywords
semiconductor device
display
manufacturing
manufacturing semiconductor
semiconductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/055633
Other languages
English (en)
French (fr)
Inventor
Koki Yano
Hajime Nakanotani
Chihaya Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyushu University NUC
Idemitsu Kosan Co Ltd
Original Assignee
Kyushu University NUC
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyushu University NUC, Idemitsu Kosan Co Ltd filed Critical Kyushu University NUC
Priority to US12/593,030 priority Critical patent/US20100140599A1/en
Publication of WO2008123270A1 publication Critical patent/WO2008123270A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • H10K10/486—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions the channel region comprising two or more active layers, e.g. forming pn heterojunctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/30—Organic light-emitting transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/82—Interconnections, e.g. terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/622—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing four rings, e.g. pyrene

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

　有機半導体層１０及び酸化物半導体層１１を備え発光する。
PCT/JP2008/055633 2007-03-26 2008-03-26 半導体装置、半導体装置の製造方法及び表示装置 Ceased WO2008123270A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/593,030 US20100140599A1 (en) 2007-03-26 2008-03-26 Semiconductor device, method for manufacturing semiconductor device, and display

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-078998 2007-03-26
JP2007078998A JP5465825B2 (ja) 2007-03-26 2007-03-26 半導体装置、半導体装置の製造方法及び表示装置

Publications (1)

Publication Number Publication Date
WO2008123270A1 true WO2008123270A1 (ja) 2008-10-16

Family

ID=39830760

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/055633 Ceased WO2008123270A1 (ja) 2007-03-26 2008-03-26 半導体装置、半導体装置の製造方法及び表示装置

Country Status (4)

Country Link
US (1) US20100140599A1 (ja)
JP (1) JP5465825B2 (ja)
TW (1) TWI463716B (ja)
WO (1) WO2008123270A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011109032A (ja) * 2009-11-20 2011-06-02 Semiconductor Energy Lab Co Ltd 薄膜トランジスタ
WO2011135987A1 (en) * 2010-04-28 2011-11-03 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US8945982B2 (en) 2010-04-23 2015-02-03 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of semiconductor device
JP2015062250A (ja) * 2014-11-27 2015-04-02 株式会社半導体エネルギー研究所 トランジスタ
CN113054117A (zh) * 2019-12-28 2021-06-29 Tcl集团股份有限公司 发光二极管及其制备方法
JP2023158042A (ja) * 2009-12-25 2023-10-26 株式会社半導体エネルギー研究所 記憶装置

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US7998372B2 (en) * 2005-11-18 2011-08-16 Idemitsu Kosan Co., Ltd. Semiconductor thin film, method for manufacturing the same, thin film transistor, and active-matrix-driven display panel
JP2009206508A (ja) 2008-01-31 2009-09-10 Canon Inc 薄膜トランジスタ及び表示装置
TWI567829B (zh) * 2008-10-31 2017-01-21 半導體能源研究所股份有限公司 半導體裝置及其製造方法
JP5607349B2 (ja) * 2008-12-26 2014-10-15 株式会社半導体エネルギー研究所 半導体装置の作製方法
TWI419328B (zh) * 2009-06-12 2013-12-11 Ind Tech Res Inst 主動層堆疊結構及其製造方法及其應用
JP5700626B2 (ja) * 2009-09-04 2015-04-15 株式会社半導体エネルギー研究所 Ｅｌ表示装置
KR101843558B1 (ko) * 2009-10-09 2018-03-30 가부시키가이샤 한도오따이 에네루기 켄큐쇼 시프트 레지스터, 표시 장치, 및 그 구동 방법
EP2486593B1 (en) 2009-10-09 2017-02-01 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
KR101930230B1 (ko) * 2009-11-06 2018-12-18 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치를 제작하기 위한 방법
KR101876473B1 (ko) 2009-11-06 2018-07-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 반도체 장치의 제작 방법
KR102304078B1 (ko) * 2009-11-28 2021-09-23 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
CN105609509A (zh) 2009-12-04 2016-05-25 株式会社半导体能源研究所 显示装置
WO2011068025A1 (en) * 2009-12-04 2011-06-09 Semiconductor Energy Laboratory Co., Ltd. Dc converter circuit and power supply circuit
WO2011074407A1 (en) 2009-12-18 2011-06-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
WO2011086812A1 (en) * 2010-01-15 2011-07-21 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US8617920B2 (en) * 2010-02-12 2013-12-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
WO2011108346A1 (en) * 2010-03-05 2011-09-09 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of oxide semiconductor film and manufacturing method of transistor
WO2012163464A1 (en) * 2011-06-01 2012-12-06 Merck Patent Gmbh Hybrid ambipolar tfts
US8901547B2 (en) * 2012-08-25 2014-12-02 Polyera Corporation Stacked structure organic light-emitting transistors
US20140062849A1 (en) * 2012-09-05 2014-03-06 Tagnetics, Inc. Cmos-compatible display system and method
KR102608954B1 (ko) * 2016-09-30 2023-12-05 삼성디스플레이 주식회사 표시 장치
WO2018163013A1 (ja) * 2017-03-07 2018-09-13 株式会社半導体エネルギー研究所 半導体装置、および半導体装置の作製方法
WO2020170925A1 (ja) * 2019-02-21 2020-08-27 東レ株式会社 電界効果型トランジスタ、その製造方法およびそれを用いた無線通信装置
CN116165817B (zh) * 2022-12-12 2025-08-19 广州华星光电半导体显示技术有限公司 一种显示面板及显示装置

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JP2006100857A (ja) * 2005-12-09 2006-04-13 Idemitsu Kosan Co Ltd 無機非縮退半導体層およびその製造方法
JP2006128139A (ja) * 2005-12-15 2006-05-18 Idemitsu Kosan Co Ltd 半導体薄膜、半導体薄膜の積層体、半導体薄膜の製造方法
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JP2005293980A (ja) * 2004-03-31 2005-10-20 Junji Kido 発光トランジスタ
WO2006025274A1 (ja) * 2004-08-30 2006-03-09 Kyoto University 有機半導体発光装置およびそれを用いた表示装置
JP2006324655A (ja) * 2005-04-22 2006-11-30 Semiconductor Energy Lab Co Ltd 半導体素子、有機トランジスタ、発光装置及び電気機器
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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011109032A (ja) * 2009-11-20 2011-06-02 Semiconductor Energy Lab Co Ltd 薄膜トランジスタ
US12283599B2 (en) 2009-12-25 2025-04-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP7657870B2 (ja) 2009-12-25 2025-04-07 株式会社半導体エネルギー研究所 記憶装置
JP2023158042A (ja) * 2009-12-25 2023-10-26 株式会社半導体エネルギー研究所 記憶装置
US9978878B2 (en) 2010-04-23 2018-05-22 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of semiconductor device
US8945982B2 (en) 2010-04-23 2015-02-03 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of semiconductor device
US9390918B2 (en) 2010-04-23 2016-07-12 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of semiconductor device
US9449852B2 (en) 2010-04-28 2016-09-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US8790960B2 (en) 2010-04-28 2014-07-29 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
WO2011135987A1 (en) * 2010-04-28 2011-11-03 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
JP2015062250A (ja) * 2014-11-27 2015-04-02 株式会社半導体エネルギー研究所 トランジスタ
CN113054117A (zh) * 2019-12-28 2021-06-29 Tcl集团股份有限公司 发光二极管及其制备方法
CN113054117B (zh) * 2019-12-28 2022-06-24 Tcl科技集团股份有限公司 发光二极管及其制备方法

Also Published As

Publication number Publication date
US20100140599A1 (en) 2010-06-10
TWI463716B (zh) 2014-12-01
JP2008243929A (ja) 2008-10-09
TW200908410A (en) 2009-02-16
JP5465825B2 (ja) 2014-04-09

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