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WO2008108216A1 - Minus ion producing source and method using fluid kinetic and thermal energies - Google Patents

Minus ion producing source and method using fluid kinetic and thermal energies Download PDF

Info

Publication number
WO2008108216A1
WO2008108216A1 PCT/JP2008/053264 JP2008053264W WO2008108216A1 WO 2008108216 A1 WO2008108216 A1 WO 2008108216A1 JP 2008053264 W JP2008053264 W JP 2008053264W WO 2008108216 A1 WO2008108216 A1 WO 2008108216A1
Authority
WO
WIPO (PCT)
Prior art keywords
minus
coating film
ion producing
minus ion
ferroelectric material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/053264
Other languages
French (fr)
Japanese (ja)
Inventor
Hiromi Hatanaka
Kazuhiko Ariji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INCREMENT CO Ltd
Original Assignee
INCREMENT CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INCREMENT CO Ltd filed Critical INCREMENT CO Ltd
Priority to JP2009502522A priority Critical patent/JP5309303B2/en
Publication of WO2008108216A1 publication Critical patent/WO2008108216A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Mushroom Cultivation (AREA)
  • Cultivation Of Plants (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)

Abstract

[PROBLEMS] Conventional minus ion producing apparatus involves a problem that minus ions cannot be produced without voltage or light application energy because the minus ion producing methods are kinetic energy applying method such as a method for applying a high voltage or a method for applying ultraviolet ray or radiation to a photoelectron material. [MEANS FOR SOLVING PROBLEMS] A minus ion producing source and method for producing minus ions by forming a coating film comprising a ferroelectric material and an additive for assisting and enhancing the action of the ferroelectric material or an additive for solidifying a constituent materialcontaining the ferroelectric material on the surface of a conductive base having a projection/recess shape, connecting the conductive base to the earth or an antenna, continuously producing negative charge by electrical polarization caused in crystals of the ferromagnetic material placed in the coating film because of a variation of the input amount of kinetic and thermal energies of the object fluid, concentrating the minus ions on the surface of the coating film, and thereby giving electrons to the object fluid in contact with the surface of the coating film.
PCT/JP2008/053264 2007-03-02 2008-02-26 Minus ion producing source and method using fluid kinetic and thermal energies Ceased WO2008108216A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009502522A JP5309303B2 (en) 2007-03-02 2008-02-26 Negative ion generation source and generation method using kinetic energy and thermal energy of fluid

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-052528 2007-03-02
JP2007052528 2007-03-02

Publications (1)

Publication Number Publication Date
WO2008108216A1 true WO2008108216A1 (en) 2008-09-12

Family

ID=39738108

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/053264 Ceased WO2008108216A1 (en) 2007-03-02 2008-02-26 Minus ion producing source and method using fluid kinetic and thermal energies

Country Status (2)

Country Link
JP (2) JP5309303B2 (en)
WO (1) WO2008108216A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010175129A (en) * 2009-01-29 2010-08-12 Doshisha Refrigerator
JP2014174087A (en) * 2013-03-12 2014-09-22 Junshaku Nakagawa Material activating material and method for manufacturing the same
CN106329318A (en) * 2015-06-30 2017-01-11 袁满雪 Vehicle-mounted tourmaline anion generator
CN107017558A (en) * 2017-06-14 2017-08-04 南京仯素生物科技有限公司 A kind of negative oxygen ion generating module and preparation method thereof
CN109746120A (en) * 2017-11-03 2019-05-14 北京中科艾加科技有限公司 Filter device including piezoelectric composite and its application in adsorption of atmospheric particles
CN114773058A (en) * 2022-03-24 2022-07-22 华南理工大学 Anion functional material and preparation method and application thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11865551B2 (en) * 2020-12-18 2024-01-09 Rainlons Corp. Methods and systems for negative ion-based pollution reduction

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001234819A (en) * 2000-02-24 2001-08-31 Nakaya Jidosha Kk Fuel reformer and inflow air reformer
JP2003042016A (en) * 2001-07-30 2003-02-13 Kiyou Yazumi Combustion efficiency improving device
JP2003139337A (en) * 2001-11-02 2003-05-14 Wako Seisakusho:Kk Panel heater that generates negative ions
JP2003235993A (en) * 2002-02-19 2003-08-26 Noda Medical Kk Pyroelectric body therapeutic device
JP2004084046A (en) * 2002-08-29 2004-03-18 Imae Kogyo Kk Negative ion generator and method for producing the same
JP2005119938A (en) * 2003-10-17 2005-05-12 Yoshio Kusakari Composite material having electret characteristic and its manufacturing method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03110799U (en) * 1990-02-26 1991-11-13
JP2001157816A (en) * 1999-12-02 2001-06-12 Mitsubishi Electric Corp Exhaust gas treatment equipment
JP2001232377A (en) * 1999-12-17 2001-08-28 Kousuto:Kk Water activating device
JP3660546B2 (en) * 1999-12-24 2005-06-15 シャープ株式会社 Negative ion generation source and generation method
JP2002353000A (en) * 2001-05-23 2002-12-06 Matsushita Electric Works Ltd Plasma treatment apparatus and plasma treatment method
JP2003168596A (en) * 2001-11-29 2003-06-13 Sekisui Chem Co Ltd Discharge plasma electrode and discharge plasma treatment apparatus using the same
JP2003164533A (en) * 2001-12-03 2003-06-10 Toshio Osono Minus ion-generating film and minus ion generation method
JP2004223344A (en) * 2003-01-21 2004-08-12 Sintokogio Ltd Exhaust gas treatment method and apparatus
JP4524100B2 (en) * 2003-12-19 2010-08-11 日本碍子株式会社 Method for forming molded body for plasma generating electrode, and method for manufacturing plasma generating electrode

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001234819A (en) * 2000-02-24 2001-08-31 Nakaya Jidosha Kk Fuel reformer and inflow air reformer
JP2003042016A (en) * 2001-07-30 2003-02-13 Kiyou Yazumi Combustion efficiency improving device
JP2003139337A (en) * 2001-11-02 2003-05-14 Wako Seisakusho:Kk Panel heater that generates negative ions
JP2003235993A (en) * 2002-02-19 2003-08-26 Noda Medical Kk Pyroelectric body therapeutic device
JP2004084046A (en) * 2002-08-29 2004-03-18 Imae Kogyo Kk Negative ion generator and method for producing the same
JP2005119938A (en) * 2003-10-17 2005-05-12 Yoshio Kusakari Composite material having electret characteristic and its manufacturing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010175129A (en) * 2009-01-29 2010-08-12 Doshisha Refrigerator
JP2014174087A (en) * 2013-03-12 2014-09-22 Junshaku Nakagawa Material activating material and method for manufacturing the same
CN106329318A (en) * 2015-06-30 2017-01-11 袁满雪 Vehicle-mounted tourmaline anion generator
CN107017558A (en) * 2017-06-14 2017-08-04 南京仯素生物科技有限公司 A kind of negative oxygen ion generating module and preparation method thereof
CN109746120A (en) * 2017-11-03 2019-05-14 北京中科艾加科技有限公司 Filter device including piezoelectric composite and its application in adsorption of atmospheric particles
CN109746120B (en) * 2017-11-03 2021-02-26 北京中科艾加科技有限公司 Filter device comprising piezoelectric composite material and application of filter device in adsorption of atmospheric particulates
CN114773058A (en) * 2022-03-24 2022-07-22 华南理工大学 Anion functional material and preparation method and application thereof

Also Published As

Publication number Publication date
JP2013252518A (en) 2013-12-19
JPWO2008108216A1 (en) 2010-06-10
JP5309303B2 (en) 2013-10-09

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