WO2008105431A1 - 撮像装置、撮像方法、並びに撮像装置の製造装置および製造方法 - Google Patents
撮像装置、撮像方法、並びに撮像装置の製造装置および製造方法 Download PDFInfo
- Publication number
- WO2008105431A1 WO2008105431A1 PCT/JP2008/053334 JP2008053334W WO2008105431A1 WO 2008105431 A1 WO2008105431 A1 WO 2008105431A1 JP 2008053334 W JP2008053334 W JP 2008053334W WO 2008105431 A1 WO2008105431 A1 WO 2008105431A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- image picking
- image
- optical system
- unit
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/009—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras having zoom function
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
深度拡張光学系において、解像性能ピーク位置を容易に検出可能で、また、復元画が良好となるようなボカシを実現でき、また、光学系を簡単化でき、コスト低減を図ることができ、適切な画質の、ノイズの影響が小さく、良好な復元画像を得ることが可能な撮像装置、撮像方法、並びに撮像装置の製造装置および製造方法であって、光学系保持部200の構造は、基本的に、鏡枠部210と、光波面変調素子または逆光波面変調素子を出し入れ可能なスリット状の素子出し入れ部220と、素子セット部230とを有する。素子セット部230に光波面変調素子が一旦非装着状態で光学系を通過する光が光源の距離によって光軸方向で異なる位置に結像するように形成されて素子セット部230に光波面変調素子がセットされている。
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-046084 | 2007-02-26 | ||
| JP2007046253 | 2007-02-26 | ||
| JP2007-046253 | 2007-02-26 | ||
| JP2007046084 | 2007-02-26 | ||
| JP2008044009A JP2008245265A (ja) | 2007-02-26 | 2008-02-26 | 撮像装置、並びにその製造装置および製造方法 |
| JP2008-044580 | 2008-02-26 | ||
| JP2008044580A JP2008245266A (ja) | 2007-02-26 | 2008-02-26 | 撮像装置および撮像方法 |
| JP2008-044009 | 2008-02-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008105431A1 true WO2008105431A1 (ja) | 2008-09-04 |
Family
ID=39721256
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2008/053334 Ceased WO2008105431A1 (ja) | 2007-02-26 | 2008-02-26 | 撮像装置、撮像方法、並びに撮像装置の製造装置および製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2008105431A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012132870A1 (ja) * | 2011-03-31 | 2012-10-04 | 富士フイルム株式会社 | 焦点拡張光学系及びEDoF撮像システム |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000275532A (ja) * | 1999-03-24 | 2000-10-06 | Olympus Optical Co Ltd | 対物レンズ及びその製造方法 |
| US20020195538A1 (en) * | 2001-06-06 | 2002-12-26 | Dowsk Edward Raymond | Wavefront coding phase contrast imaging systems |
| JP2004248832A (ja) * | 2003-02-19 | 2004-09-09 | Olympus Corp | 内視鏡装置 |
| WO2007013621A1 (ja) * | 2005-07-28 | 2007-02-01 | Kyocera Corporation | 撮像装置および画像処理方法 |
-
2008
- 2008-02-26 WO PCT/JP2008/053334 patent/WO2008105431A1/ja not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000275532A (ja) * | 1999-03-24 | 2000-10-06 | Olympus Optical Co Ltd | 対物レンズ及びその製造方法 |
| US20020195538A1 (en) * | 2001-06-06 | 2002-12-26 | Dowsk Edward Raymond | Wavefront coding phase contrast imaging systems |
| JP2004248832A (ja) * | 2003-02-19 | 2004-09-09 | Olympus Corp | 内視鏡装置 |
| WO2007013621A1 (ja) * | 2005-07-28 | 2007-02-01 | Kyocera Corporation | 撮像装置および画像処理方法 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012132870A1 (ja) * | 2011-03-31 | 2012-10-04 | 富士フイルム株式会社 | 焦点拡張光学系及びEDoF撮像システム |
| CN103460108A (zh) * | 2011-03-31 | 2013-12-18 | 富士胶片株式会社 | 焦点扩展光学系统以及EDoF摄像系统 |
| US8743266B2 (en) | 2011-03-31 | 2014-06-03 | Fujifilm Corporation | Focus extending optical system and EDOF imaging system |
| CN103460108B (zh) * | 2011-03-31 | 2015-08-12 | 富士胶片株式会社 | 焦点扩展光学系统以及EDoF摄像系统 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW200801628A (en) | Lens apparatus focus adjustment support device and focus adjusting method | |
| EP2811339A3 (en) | Lens display device, liquid crystal display device and display drive method | |
| TW200734800A (en) | Lithographic apparatus and device manufacturing method | |
| WO2009095481A3 (en) | Methods and apparatuses for eye gaze measurement | |
| WO2009063326A3 (en) | Auto - focus image system | |
| TW200627086A (en) | Lithographic apparatus and device manufacturing method | |
| TW200951646A (en) | Surface position detection device, exposure device, surface position detection method and device production method | |
| WO2011071958A3 (en) | Apparatus and method for compressive imaging and sensing through multiplexed modulation | |
| TW200741818A (en) | Exposure apparatus and device manufacturing method | |
| WO2008081430A3 (en) | Stencil printers and the like, optical systems therefor, and methods of printing and inspection | |
| WO2008087486A3 (en) | Imaging system with improved image quality and associated methods | |
| WO2008107105A8 (de) | Abbildungsvorrichtung mit einem adaptiven optischen element und holographische projektionseinrichtung | |
| ATE468568T1 (de) | System zur bilderfassung | |
| DE602004020018D1 (de) | Dispersionszusammensetzung mit feinen Partikeln, optische Komponente, optisches Filmlaminat, Polarisationsstrahlteilervorrichtung und Verfahren zur Herstellung der optischen Komponente | |
| JP2014515206A5 (ja) | ||
| EP4270941A4 (en) | IMAGING DEVICE AND OPTICAL ELEMENT | |
| TW200632400A (en) | Image capturing system and related auto focusing method and exposure parameter determining method | |
| JP2012078333A5 (ja) | ||
| WO2013034941A3 (en) | Method for measuring cloud-base distance and apparatus for measuring polarization | |
| WO2007031854A3 (en) | Lighting system for imaging a stent | |
| ATE546286T1 (de) | Erzeugung einer einheitlichen bildgebungsoberfläche | |
| WO2010059966A3 (en) | Imaging system with a dynamic optical low-pass filter | |
| WO2008105431A1 (ja) | 撮像装置、撮像方法、並びに撮像装置の製造装置および製造方法 | |
| WO2008142982A1 (ja) | 照明装置及び照明システム | |
| TW200717039A (en) | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08712018 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 08712018 Country of ref document: EP Kind code of ref document: A1 |