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WO2008105309A1 - ナノインプリント用樹脂組成物 - Google Patents

ナノインプリント用樹脂組成物 Download PDF

Info

Publication number
WO2008105309A1
WO2008105309A1 PCT/JP2008/052966 JP2008052966W WO2008105309A1 WO 2008105309 A1 WO2008105309 A1 WO 2008105309A1 JP 2008052966 W JP2008052966 W JP 2008052966W WO 2008105309 A1 WO2008105309 A1 WO 2008105309A1
Authority
WO
WIPO (PCT)
Prior art keywords
nanoimprinting
resin composition
magnetic disk
disk medium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/052966
Other languages
English (en)
French (fr)
Inventor
Yuko Sakata
Hiroshi Uchida
Katsumasa Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2009501203A priority Critical patent/JPWO2008105309A1/ja
Priority to US12/528,400 priority patent/US20100097715A1/en
Publication of WO2008105309A1 publication Critical patent/WO2008105309A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73923—Organic polymer substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Ceramic Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

　本発明は、硬化が速く、かつ均一に硬化し、パターンむらや抜けがなく転写できる、ＵＶナノインプリント法や熱ナノインプリント法に適したナノインプリント用樹脂組成物を提供することを目的とする。また、該組成物を用いた微細パターン付皮膜およびその製造方法、該皮膜を用いた磁気ディスク媒体およびその製造方法、磁気ディスク媒体に情報を記録するための、あるいは該磁気ディスク媒体から情報を再生するための、記録再生装置を提供することを目的とする。本発明のナノインプリント用性樹脂組成物は、（ａ）分子内に少なくとも１つの重合性基を持つ化合物、（ｂ）有機または無機微粒子を必須成分とすることを特徴としている。
PCT/JP2008/052966 2007-02-26 2008-02-21 ナノインプリント用樹脂組成物 Ceased WO2008105309A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009501203A JPWO2008105309A1 (ja) 2007-02-26 2008-02-21 ナノインプリント用樹脂組成物
US12/528,400 US20100097715A1 (en) 2007-02-26 2008-02-21 Nanoimprinting resin composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007046111 2007-02-26
JP2007-046111 2007-02-26

Publications (1)

Publication Number Publication Date
WO2008105309A1 true WO2008105309A1 (ja) 2008-09-04

Family

ID=39721144

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052966 Ceased WO2008105309A1 (ja) 2007-02-26 2008-02-21 ナノインプリント用樹脂組成物

Country Status (3)

Country Link
US (1) US20100097715A1 (ja)
JP (1) JPWO2008105309A1 (ja)
WO (1) WO2008105309A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010111055A (ja) * 2008-11-07 2010-05-20 Konica Minolta Opto Inc 金型部材、金型部材の製造方法、及び、金型
JP2011114309A (ja) * 2009-11-30 2011-06-09 Canon Inc インプリント装置
JP2014170814A (ja) * 2013-03-01 2014-09-18 Kyoritsu Kagaku Sangyo Kk インプリント成型用光硬化性樹脂組成物
WO2016148095A1 (ja) * 2015-03-18 2016-09-22 富士フイルム株式会社 下層膜形成用樹脂組成物、インプリント形成用キット、積層体、パターン形成方法およびデバイスの製造方法
WO2021015044A1 (ja) 2019-07-24 2021-01-28 ナガセケムテックス株式会社 インプリント用樹脂組成物
WO2025154743A1 (ja) * 2024-01-17 2025-07-24 Ｓｃｉｖａｘ株式会社 離型方法、インプリント方法、ウェーブガイド製造方法、メタレンズ製造方法、光学部品の製造方法、ウエハ、ウェーブガイドデバイス

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8344039B2 (en) * 2007-11-29 2013-01-01 Nissan Chemical Industries, Ltd. Three-dimensional pattern forming material
WO2016136240A1 (en) * 2015-02-27 2016-09-01 Canon Kabushiki Kaisha Nanonimprint liquid material, method for manufacturing nanoimprint liquid material, method for manufacturing cured product pattern, method for manufacturing optical component, and method for manufacturing circuit board

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006012216A (ja) * 2004-06-22 2006-01-12 Toshiba Corp 磁気記録媒体、その製造方法及び磁気記録再生装置
JP2006150741A (ja) * 2004-11-29 2006-06-15 Asahi Glass Co Ltd 転写層にパターンを形成する方法
JP2006286159A (ja) * 2005-04-05 2006-10-19 Canon Inc 磁気記録媒体及びその製造方法
JP2006344328A (ja) * 2005-06-10 2006-12-21 Toshiba Corp 磁気ディスク媒体およびレティクルならびに磁気記録再生装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
EP1606834B1 (en) * 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006012216A (ja) * 2004-06-22 2006-01-12 Toshiba Corp 磁気記録媒体、その製造方法及び磁気記録再生装置
JP2006150741A (ja) * 2004-11-29 2006-06-15 Asahi Glass Co Ltd 転写層にパターンを形成する方法
JP2006286159A (ja) * 2005-04-05 2006-10-19 Canon Inc 磁気記録媒体及びその製造方法
JP2006344328A (ja) * 2005-06-10 2006-12-21 Toshiba Corp 磁気ディスク媒体およびレティクルならびに磁気記録再生装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010111055A (ja) * 2008-11-07 2010-05-20 Konica Minolta Opto Inc 金型部材、金型部材の製造方法、及び、金型
JP2011114309A (ja) * 2009-11-30 2011-06-09 Canon Inc インプリント装置
JP2014170814A (ja) * 2013-03-01 2014-09-18 Kyoritsu Kagaku Sangyo Kk インプリント成型用光硬化性樹脂組成物
WO2016148095A1 (ja) * 2015-03-18 2016-09-22 富士フイルム株式会社 下層膜形成用樹脂組成物、インプリント形成用キット、積層体、パターン形成方法およびデバイスの製造方法
JPWO2016148095A1 (ja) * 2015-03-18 2018-03-22 富士フイルム株式会社 下層膜形成用樹脂組成物、インプリント形成用キット、積層体、パターン形成方法およびデバイスの製造方法
WO2021015044A1 (ja) 2019-07-24 2021-01-28 ナガセケムテックス株式会社 インプリント用樹脂組成物
JPWO2021015044A1 (ja) * 2019-07-24 2021-01-28
KR20220039703A (ko) 2019-07-24 2022-03-29 나가세케무텍쿠스가부시키가이샤 임프린트용 수지 조성물
US12129392B2 (en) 2019-07-24 2024-10-29 Nagase Chemtex Corporation Resin composition for imprinting
JP7598318B2 (ja) 2019-07-24 2024-12-11 ナガセケムテックス株式会社 インプリント用樹脂組成物
WO2025154743A1 (ja) * 2024-01-17 2025-07-24 Ｓｃｉｖａｘ株式会社 離型方法、インプリント方法、ウェーブガイド製造方法、メタレンズ製造方法、光学部品の製造方法、ウエハ、ウェーブガイドデバイス

Also Published As

Publication number Publication date
JPWO2008105309A1 (ja) 2010-06-03
US20100097715A1 (en) 2010-04-22

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