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WO2008143232A1 - 透明電極 - Google Patents

透明電極 Download PDF

Info

Publication number
WO2008143232A1
WO2008143232A1 PCT/JP2008/059179 JP2008059179W WO2008143232A1 WO 2008143232 A1 WO2008143232 A1 WO 2008143232A1 JP 2008059179 W JP2008059179 W JP 2008059179W WO 2008143232 A1 WO2008143232 A1 WO 2008143232A1
Authority
WO
WIPO (PCT)
Prior art keywords
transparent electrode
infrared light
disclosed
wavelength
conductive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/059179
Other languages
English (en)
French (fr)
Inventor
Masaaki Imura
Mamoru Kubosaka
Toshimasa Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to EP08752975.6A priority Critical patent/EP2148240B1/en
Priority to CN2008800156845A priority patent/CN101681069B/zh
Priority to US12/451,640 priority patent/US20100127611A1/en
Publication of WO2008143232A1 publication Critical patent/WO2008143232A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/08—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 light absorbing layer
    • G02F2201/083—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 light absorbing layer infrared absorbing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/30—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 grating
    • G02F2201/307—Reflective grating, i.e. Bragg grating
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/38—Anti-reflection arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/11—Function characteristic involving infrared radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Non-Insulated Conductors (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

　赤外線、特に１．５５μｍ近傍の赤外線を利用した光通信用デバイスに用いられる赤外光透過率の高い透明電極を提供することを目的とする。 　本発明の透明電極は、透明導電膜を有し、透明導電膜の波長１．５５μｍにおける消衰係数が０．５以下であることを特徴とする。
PCT/JP2008/059179 2007-05-22 2008-05-20 透明電極 Ceased WO2008143232A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08752975.6A EP2148240B1 (en) 2007-05-22 2008-05-20 Transparent electrode
CN2008800156845A CN101681069B (zh) 2007-05-22 2008-05-20 透明电极
US12/451,640 US20100127611A1 (en) 2007-05-22 2008-05-20 Transparent electrode

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-135336 2007-05-22
JP2007135336 2007-05-22

Publications (1)

Publication Number Publication Date
WO2008143232A1 true WO2008143232A1 (ja) 2008-11-27

Family

ID=40031929

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059179 Ceased WO2008143232A1 (ja) 2007-05-22 2008-05-20 透明電極

Country Status (5)

Country Link
US (1) US20100127611A1 (ja)
EP (1) EP2148240B1 (ja)
JP (1) JP5621184B2 (ja)
CN (1) CN101681069B (ja)
WO (1) WO2008143232A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2937798B1 (fr) * 2008-10-24 2010-12-24 Saint Gobain Substrat verrier avec electrode notamment destine a un dispositif a diode electroluminescente organique
US7999995B2 (en) 2009-09-28 2011-08-16 Sharp Laboratories Of America, Inc. Full color range interferometric modulation
CN102453868A (zh) * 2010-10-27 2012-05-16 鸿富锦精密工业（深圳）有限公司 镀膜件及其制备方法
KR101964945B1 (ko) * 2012-05-17 2019-04-02 가부시키가이샤 가네카 투명 전극 부착 기판 및 그 제조 방법, 및 터치 패널
KR101999706B1 (ko) * 2015-03-16 2019-07-12 주식회사 엘지화학 전도성 구조체 및 이를 포함하는 전자 소자
JP6700587B2 (ja) 2016-03-22 2020-05-27 凸版印刷株式会社 高透過ｉｔｏ膜付きガラス
US20190058081A1 (en) * 2017-08-18 2019-02-21 Khaled Ahmed Micro light-emitting diode (led) display and assembly apparatus
US10996541B1 (en) * 2019-10-11 2021-05-04 Toyota Motor Engineering & Manufacturing North America, Inc. Nonlinear optics enabled transparent display

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62227082A (ja) * 1986-03-28 1987-10-06 Nippon Sheet Glass Co Ltd 透明導電膜の形成方法
JPS63103060A (ja) * 1986-10-20 1988-05-07 Nippon Sheet Glass Co Ltd 透明電極付き基板の製造方法
JPH03504900A (ja) * 1988-06-03 1991-10-24 アンダス・コーポレイション 透明導電性被覆
JPH08188871A (ja) * 1994-11-10 1996-07-23 Hitachi Metals Ltd 透明導電膜形成用ｉｔｏ焼結体
JP2000514566A (ja) 1996-05-09 2000-10-31 イエダ リサーチ アンド ディベロップメント カンパニー リミテッド 共振装置にかかわる能動波長の選択
JP2001059157A (ja) * 1999-08-20 2001-03-06 Mitsubishi Heavy Ind Ltd 透明導電膜及びその製造方法
JP2005508569A (ja) * 2001-04-06 2005-03-31 ロックウェル・サイエンティフィック・ライセンシング・エルエルシー 薄膜赤外線透過性導体
GB2432222A (en) 2004-06-30 2007-05-16 Sumitomo Metal Mining Co Waveguide type light control element and manufacturing method thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6625378B2 (en) * 1999-02-01 2003-09-23 Jds Uniphase Corporation Variable optical attenuator device
JP2003016858A (ja) * 2001-06-29 2003-01-17 Sanyo Electric Co Ltd インジウムスズ酸化膜の製造方法
JP2003021850A (ja) * 2001-07-05 2003-01-24 Fuji Xerox Lightwave Technologies Co Ltd 導波路型光制御デバイスおよびその製造方法
JP4184706B2 (ja) * 2002-04-30 2008-11-19 浜松ホトニクス株式会社 反射防止膜の製造方法
TWI320804B (en) * 2002-12-18 2010-02-21 Sony Chemicals Corp Transparent electroconductive film and film forming method of the same
DE10336041A1 (de) * 2003-08-01 2005-02-17 Merck Patent Gmbh Optisches Schichtsystem mit Antireflexeigenschaften
JP2004356623A (ja) * 2003-05-08 2004-12-16 Canon Inc 積層型光起電力素子及びその製造方法
JP4712413B2 (ja) * 2004-04-19 2011-06-29 シチズンホールディングス株式会社 可変光減衰器およびそれを備えた光学フィルタ
JP4539181B2 (ja) * 2004-06-07 2010-09-08 住友金属鉱山株式会社 透明導電膜、透明導電膜製造用焼結体ターゲット、透明導電性基材及びそれを用いた表示デバイス
ATE517368T1 (de) * 2005-05-16 2011-08-15 Donnelly Corp Fahrzeugspiegelanordnung mit zeichen am reflektierenden teil

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62227082A (ja) * 1986-03-28 1987-10-06 Nippon Sheet Glass Co Ltd 透明導電膜の形成方法
JPS63103060A (ja) * 1986-10-20 1988-05-07 Nippon Sheet Glass Co Ltd 透明電極付き基板の製造方法
JPH03504900A (ja) * 1988-06-03 1991-10-24 アンダス・コーポレイション 透明導電性被覆
JPH08188871A (ja) * 1994-11-10 1996-07-23 Hitachi Metals Ltd 透明導電膜形成用ｉｔｏ焼結体
JP2000514566A (ja) 1996-05-09 2000-10-31 イエダ リサーチ アンド ディベロップメント カンパニー リミテッド 共振装置にかかわる能動波長の選択
JP2001059157A (ja) * 1999-08-20 2001-03-06 Mitsubishi Heavy Ind Ltd 透明導電膜及びその製造方法
JP2005508569A (ja) * 2001-04-06 2005-03-31 ロックウェル・サイエンティフィック・ライセンシング・エルエルシー 薄膜赤外線透過性導体
GB2432222A (en) 2004-06-30 2007-05-16 Sumitomo Metal Mining Co Waveguide type light control element and manufacturing method thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2148240A4

Also Published As

Publication number Publication date
CN101681069B (zh) 2011-08-31
JP2009003440A (ja) 2009-01-08
EP2148240A1 (en) 2010-01-27
CN101681069A (zh) 2010-03-24
JP5621184B2 (ja) 2014-11-05
EP2148240B1 (en) 2015-02-25
US20100127611A1 (en) 2010-05-27
EP2148240A4 (en) 2013-02-20

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