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WO2008143118A1 - トンネル型磁気検出素子 - Google Patents

トンネル型磁気検出素子 Download PDF

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Publication number
WO2008143118A1
WO2008143118A1 PCT/JP2008/058907 JP2008058907W WO2008143118A1 WO 2008143118 A1 WO2008143118 A1 WO 2008143118A1 JP 2008058907 W JP2008058907 W JP 2008058907W WO 2008143118 A1 WO2008143118 A1 WO 2008143118A1
Authority
WO
WIPO (PCT)
Prior art keywords
magnetic layer
detection element
layer
tunnel type
magnetic detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/058907
Other languages
English (en)
French (fr)
Inventor
Yoshihiro Nishiyama
Naoya Hasegawa
Masamichi Saito
Yosuke Ide
Kazumasa Nishimura
Ryo Nakabayashi
Hidekazu Kobayashi
Akio Hanada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP2009515182A priority Critical patent/JP4914495B2/ja
Publication of WO2008143118A1 publication Critical patent/WO2008143118A1/ja
Priority to US12/617,199 priority patent/US8208231B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3909—Arrangements using a magnetic tunnel junction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/098—Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y10T428/1107—Magnetoresistive
    • Y10T428/1114—Magnetoresistive having tunnel junction effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Hall/Mr Elements (AREA)
  • Magnetic Heads (AREA)
  • Mram Or Spin Memory Techniques (AREA)

Abstract

【課題】　特に、フリー磁性層の構成を改良して、抵抗変化率（ΔＲ／Ｒ）を増大させることができ、且つフリー磁性層の保磁力Ｈｃを低減することが可能なトンネル型磁気検出素子を提供することを目的としている。 【解決手段】　絶縁障壁層５は、Ｍｇ－Ｏで形成され、前記フリー磁性層６は、下からエンハンス層１２、第１軟磁性層１３、挿入磁性層１４及び第２軟磁性層１５の順に積層されている。前記挿入磁性層１４は、例えばＣｏ－Ｆｅ－Ｂで形成される。このように軟磁性層１３，１５間にＣｏ―Ｆｅ―Ｂから成る挿入磁性層１４を挿入した構成とすることで、従来に比べて効果的に抵抗変化率（ΔＲ／Ｒ）を増大させることができるとともに、フリー磁性層６の保磁力Ｈｃを低減できる。
PCT/JP2008/058907 2007-05-22 2008-05-15 トンネル型磁気検出素子 Ceased WO2008143118A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009515182A JP4914495B2 (ja) 2007-05-22 2008-05-15 トンネル型磁気検出素子
US12/617,199 US8208231B2 (en) 2007-05-22 2009-11-12 Tunneling magnetic sensing element with insertion magnetic layer inspired into soft magnetic layer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-134975 2007-05-22
JP2007134975 2007-05-22

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/617,199 Continuation US8208231B2 (en) 2007-05-22 2009-11-12 Tunneling magnetic sensing element with insertion magnetic layer inspired into soft magnetic layer

Publications (1)

Publication Number Publication Date
WO2008143118A1 true WO2008143118A1 (ja) 2008-11-27

Family

ID=40031826

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/058907 Ceased WO2008143118A1 (ja) 2007-05-22 2008-05-15 トンネル型磁気検出素子

Country Status (3)

Country Link
US (1) US8208231B2 (ja)
JP (1) JP4914495B2 (ja)
WO (1) WO2008143118A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009164579A (ja) * 2008-01-03 2009-07-23 Tdk Corp Ｃｐｐ型磁気抵抗効果素子
CN116973379A (zh) * 2023-09-25 2023-10-31 常州市武进红东电子有限公司 一种钕铁硼磁钢用翻面检测生产线

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9082872B2 (en) 2013-01-02 2015-07-14 Headway Technologies, Inc. Magnetic read head with MR enhancements
KR20160073782A (ko) 2014-12-17 2016-06-27 에스케이하이닉스 주식회사 전자 장치 및 그 제조 방법
KR20150102302A (ko) 2014-02-28 2015-09-07 에스케이하이닉스 주식회사 전자 장치 및 그 제조 방법
US9733317B2 (en) * 2014-03-10 2017-08-15 Dmg Mori Seiki Co., Ltd. Position detecting device
KR20160073859A (ko) * 2014-12-17 2016-06-27 에스케이하이닉스 주식회사 전자 장치 및 그 제조 방법
US10367137B2 (en) 2014-12-17 2019-07-30 SK Hynix Inc. Electronic device including a semiconductor memory having a variable resistance element including two free layers
US9825217B1 (en) * 2016-05-18 2017-11-21 Samsung Electronics Co., Ltd. Magnetic memory device having cobalt-iron-beryllium magnetic layers
US9761793B1 (en) 2016-05-18 2017-09-12 Samsung Electronics Co., Ltd. Magnetic memory device and method for manufacturing the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001006130A (ja) * 1999-06-24 2001-01-12 Tdk Corp トンネル磁気抵抗効果型ヘッド
JP2002208744A (ja) * 2000-10-20 2002-07-26 Toshiba Corp 磁気抵抗効果素子、磁気ヘッド及び磁気記録再生装置
JP2002359412A (ja) * 2001-05-30 2002-12-13 Sony Corp 磁気抵抗効果素子、磁気抵抗効果型磁気センサ、磁気抵抗効果型磁気ヘッド、および磁気メモリ
JP2003008102A (ja) * 2001-06-22 2003-01-10 Toshiba Corp 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6937446B2 (en) * 2000-10-20 2005-08-30 Kabushiki Kaisha Toshiba Magnetoresistance effect element, magnetic head and magnetic recording and/or reproducing system
JP3683577B1 (ja) * 2004-05-13 2005-08-17 Ｔｄｋ株式会社 磁気抵抗効果素子、薄膜磁気ヘッド、ヘッドジンバルアセンブリおよび磁気ディスク装置
JP2006344728A (ja) 2005-06-08 2006-12-21 Alps Electric Co Ltd 磁気検出素子及びその製造方法
JP5096702B2 (ja) 2005-07-28 2012-12-12 株式会社日立製作所 磁気抵抗効果素子及びそれを搭載した不揮発性磁気メモリ
US7764471B2 (en) * 2007-03-12 2010-07-27 Tdk Corporation Magneto-resistance effect element having diffusion blocking layer and thin-film magnetic head

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001006130A (ja) * 1999-06-24 2001-01-12 Tdk Corp トンネル磁気抵抗効果型ヘッド
JP2002208744A (ja) * 2000-10-20 2002-07-26 Toshiba Corp 磁気抵抗効果素子、磁気ヘッド及び磁気記録再生装置
JP2002359412A (ja) * 2001-05-30 2002-12-13 Sony Corp 磁気抵抗効果素子、磁気抵抗効果型磁気センサ、磁気抵抗効果型磁気ヘッド、および磁気メモリ
JP2003008102A (ja) * 2001-06-22 2003-01-10 Toshiba Corp 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009164579A (ja) * 2008-01-03 2009-07-23 Tdk Corp Ｃｐｐ型磁気抵抗効果素子
CN116973379A (zh) * 2023-09-25 2023-10-31 常州市武进红东电子有限公司 一种钕铁硼磁钢用翻面检测生产线
CN116973379B (zh) * 2023-09-25 2023-12-01 常州市武进红东电子有限公司 一种钕铁硼磁钢用翻面检测生产线

Also Published As

Publication number Publication date
US8208231B2 (en) 2012-06-26
JP4914495B2 (ja) 2012-04-11
US20100055501A1 (en) 2010-03-04
JPWO2008143118A1 (ja) 2010-08-05

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