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WO2008028981A3 - Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince - Google Patents

Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince Download PDF

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Publication number
WO2008028981A3
WO2008028981A3 PCT/EP2007/059487 EP2007059487W WO2008028981A3 WO 2008028981 A3 WO2008028981 A3 WO 2008028981A3 EP 2007059487 W EP2007059487 W EP 2007059487W WO 2008028981 A3 WO2008028981 A3 WO 2008028981A3
Authority
WO
WIPO (PCT)
Prior art keywords
metal alloy
thin
substrate
film
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2007/059487
Other languages
English (en)
Other versions
WO2008028981A2 (fr
WO2008028981B1 (fr
Inventor
Pascale Gillon
Anne-Lise Thomann
Pascal Brault
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite d Orleans UFR de Sciences
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite d Orleans UFR de Sciences
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite d Orleans UFR de Sciences filed Critical Centre National de la Recherche Scientifique CNRS
Priority to US12/440,259 priority Critical patent/US20090301610A1/en
Priority to EP07820102A priority patent/EP2082074A2/fr
Priority to CA2662734A priority patent/CA2662734C/fr
Publication of WO2008028981A2 publication Critical patent/WO2008028981A2/fr
Publication of WO2008028981A3 publication Critical patent/WO2008028981A3/fr
Publication of WO2008028981B1 publication Critical patent/WO2008028981B1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C16/00—Alloys based on zirconium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/52—Alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La présente invention concerne un procédé pour déposer sur un substrat une couche mince d'alliage métallique comprenant au moins quatre éléments, ledit alliage étant soit : un alliage amorphe contenant en pourcentage atomique au moins 50% des éléments Ti et Zr, soit un alliage à haute entropie dont les éléments sont choisis dans le groupe constitué par Al, Co, Cr, Cu, Fe, Ni, Si, Mn, Mo, V, Zr et Ti; par pulvérisation magnétron simultanée d'au moins deux cibles. La présente invention concerne également un alliage métallique sous forme de couche mince comprenant au moins quatre éléments, susceptibles d'être déposés sur un substrat par mise en oeuvre du procédé.
PCT/EP2007/059487 2006-09-08 2007-09-10 Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince Ceased WO2008028981A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/440,259 US20090301610A1 (en) 2006-09-08 2007-09-10 Process for depositing a thin film of metal alloy on a substrate and metal alloy in thin-film form
EP07820102A EP2082074A2 (fr) 2006-09-08 2007-09-10 Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince
CA2662734A CA2662734C (fr) 2006-09-08 2007-09-10 Procede pour deposer sur un substrat une couche mince d'alliage metallique et un alliage metallique sous forme de couche mince

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0607876A FR2905707B1 (fr) 2006-09-08 2006-09-08 Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince.
FR06/07876 2006-09-08

Publications (3)

Publication Number Publication Date
WO2008028981A2 WO2008028981A2 (fr) 2008-03-13
WO2008028981A3 true WO2008028981A3 (fr) 2008-07-31
WO2008028981B1 WO2008028981B1 (fr) 2008-09-25

Family

ID=37907982

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/059487 Ceased WO2008028981A2 (fr) 2006-09-08 2007-09-10 Procédé pour déposer sur un substrat une couche mince d'alliage métallique et un alliage métallique sous forme de couche mince

Country Status (5)

Country Link
US (1) US20090301610A1 (fr)
EP (1) EP2082074A2 (fr)
CA (1) CA2662734C (fr)
FR (1) FR2905707B1 (fr)
WO (1) WO2008028981A2 (fr)

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FR2943072B1 (fr) * 2009-03-12 2019-08-16 Centre National De La Recherche Scientifique Cnrs Decoration par pulverisation plasma magnetron sur des contenants en verre pour les secteurs de la cosmetique.
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CN103056352B (zh) * 2012-12-04 2015-09-09 中国人民解放军装甲兵工程学院 用于超音速喷涂的高熵合金粉末材料及其制备方法
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CA3016761A1 (fr) 2016-04-20 2017-10-26 Arconic Inc. Materiaux d'aluminium, cobalt fer et nickel a structure fcc et produits fabriques a partir de ceux-ci
WO2017184778A1 (fr) 2016-04-20 2017-10-26 Arconic Inc. Matériaux fcc d'aluminium, de cobalt et de nickel, et produits fabriqués à partir de ces derniers
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US11098403B2 (en) * 2017-02-07 2021-08-24 City University Of Hong Kong High entropy alloy thin film coating and method for preparing the same
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EP2082074A2 (fr) 2009-07-29
WO2008028981A2 (fr) 2008-03-13
CA2662734A1 (fr) 2008-03-13
WO2008028981B1 (fr) 2008-09-25

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