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WO2008014196A3 - Inductively coupled plasma system with internal coil - Google Patents

Inductively coupled plasma system with internal coil Download PDF

Info

Publication number
WO2008014196A3
WO2008014196A3 PCT/US2007/074073 US2007074073W WO2008014196A3 WO 2008014196 A3 WO2008014196 A3 WO 2008014196A3 US 2007074073 W US2007074073 W US 2007074073W WO 2008014196 A3 WO2008014196 A3 WO 2008014196A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma system
inductively coupled
coupled plasma
internal coil
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2007/074073
Other languages
French (fr)
Other versions
WO2008014196A2 (en
Inventor
Andrew Shabalin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Industries Inc
Original Assignee
Advanced Energy Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Industries Inc filed Critical Advanced Energy Industries Inc
Publication of WO2008014196A2 publication Critical patent/WO2008014196A2/en
Publication of WO2008014196A3 publication Critical patent/WO2008014196A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Embodiments of the inventive technology may be a plasma system that comprises a coil powered by a power source so as to generate or enhance a plasma in a process chamber; and a dielectric form that itself is established within the process chamber and that defines an internal volume in which at least a portion of a coil is established. In various embodiments, the dielectric form has two ends supported by at least one support member at two support sites and/or has a form centerline in a system with a substrate support adapted to support a substrate with a process surface that defines a process surface plane that is parallel the form centerline.
PCT/US2007/074073 2006-07-26 2007-07-23 Inductively coupled plasma system with internal coil Ceased WO2008014196A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/494,652 US20080023146A1 (en) 2006-07-26 2006-07-26 Inductively coupled plasma system with internal coil
US11/494,652 2006-07-26

Publications (2)

Publication Number Publication Date
WO2008014196A2 WO2008014196A2 (en) 2008-01-31
WO2008014196A3 true WO2008014196A3 (en) 2008-05-02

Family

ID=38982232

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/074073 Ceased WO2008014196A2 (en) 2006-07-26 2007-07-23 Inductively coupled plasma system with internal coil

Country Status (3)

Country Link
US (1) US20080023146A1 (en)
TW (1) TW200824507A (en)
WO (1) WO2008014196A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200845833A (en) * 2007-05-01 2008-11-16 Delta Electronics Inc Plasma generating device
CN101971715B (en) 2008-03-05 2016-09-28 Emd株式会社 High frequency antenna unit and plasma treatment appts
WO2010023878A1 (en) * 2008-08-28 2010-03-04 株式会社イー・エム・ディー Thin film-forming sputtering device
TW201105183A (en) * 2009-07-21 2011-02-01 Delta Electronics Inc Plasma generating apparatus
WO2013112302A1 (en) * 2012-01-27 2013-08-01 Applied Materials, Inc. Segmented antenna assembly
CN104103485B (en) * 2013-04-15 2016-09-07 中微半导体设备(上海)有限公司 Inductance coupled plasma device
US10293830B2 (en) * 2016-11-07 2019-05-21 Honeywell International Inc. Systems and methods for recognizing and analyzing emotional states of a vehicle operator
GB2588932B (en) 2019-11-15 2022-08-24 Dyson Technology Ltd Method and apparatus for sputter deposition of target material to a substrate
GB2588939B (en) 2019-11-15 2022-12-28 Dyson Technology Ltd Sputter deposition apparatus and method
GB2588947B (en) 2019-11-15 2024-02-21 Dyson Technology Ltd A method of manufacturing solid state battery cathodes for use in batteries
GB2588935B (en) 2019-11-15 2022-09-07 Dyson Technology Ltd Method and apparatus for sputter deposition of target material to a substrate
GB2588940B (en) 2019-11-15 2022-06-22 Dyson Technology Ltd Sputter deposition
GB2588937B (en) * 2019-11-15 2023-01-04 Dyson Technology Ltd Sputter deposition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6132566A (en) * 1998-07-30 2000-10-17 Applied Materials, Inc. Apparatus and method for sputtering ionized material in a plasma
US20020157793A1 (en) * 2000-05-25 2002-10-31 Applied Materials, Inc. Toroidal plasma source for plasma processing
US20040007326A1 (en) * 2002-07-12 2004-01-15 Roche Gregory A. Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments
US20050034811A1 (en) * 2003-08-14 2005-02-17 Mahoney Leonard J. Sensor array for measuring plasma characteristics in plasma processing enviroments

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6103070A (en) * 1997-05-14 2000-08-15 Applied Materials, Inc. Powered shield source for high density plasma
US6136165A (en) * 1997-11-26 2000-10-24 Cvc Products, Inc. Apparatus for inductively-coupled-plasma-enhanced ionized physical-vapor deposition
US6217718B1 (en) * 1999-02-17 2001-04-17 Applied Materials, Inc. Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma
US6237526B1 (en) * 1999-03-26 2001-05-29 Tokyo Electron Limited Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
JP2004055600A (en) * 2002-07-16 2004-02-19 Tokyo Electron Ltd Plasma processing apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6132566A (en) * 1998-07-30 2000-10-17 Applied Materials, Inc. Apparatus and method for sputtering ionized material in a plasma
US20020157793A1 (en) * 2000-05-25 2002-10-31 Applied Materials, Inc. Toroidal plasma source for plasma processing
US20040007326A1 (en) * 2002-07-12 2004-01-15 Roche Gregory A. Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments
US20050034811A1 (en) * 2003-08-14 2005-02-17 Mahoney Leonard J. Sensor array for measuring plasma characteristics in plasma processing enviroments

Also Published As

Publication number Publication date
WO2008014196A2 (en) 2008-01-31
TW200824507A (en) 2008-06-01
US20080023146A1 (en) 2008-01-31

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