WO2008013002A1 - Dispersion conatining metal fine particles, process for production of the dispersion, and articles having metal films - Google Patents
Dispersion conatining metal fine particles, process for production of the dispersion, and articles having metal films Download PDFInfo
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- WO2008013002A1 WO2008013002A1 PCT/JP2007/061936 JP2007061936W WO2008013002A1 WO 2008013002 A1 WO2008013002 A1 WO 2008013002A1 JP 2007061936 W JP2007061936 W JP 2007061936W WO 2008013002 A1 WO2008013002 A1 WO 2008013002A1
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- fine particles
- metal
- dispersion
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- metal hydride
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/0545—Dispersions or suspensions of nanosized particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1163—Chemical reaction, e.g. heating solder by exothermic reaction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the present invention relates to a dispersion containing metal fine particles, a method for producing the same, and an article having a metal film having a dispersion power containing the metal fine particles.
- a dispersion containing metal fine particles is applied and baked by ink jet printing to form and repair circuit patterns such as printed wiring, interlayer wiring in semiconductor packages, and bonding between printed wiring boards and electronic components.
- Method to perform (patent document 1).
- Patent Document 2 A method in which a dispersion containing metal fine particles is applied and baked instead of soldering to join metals.
- Patent Document 3 A method of forming a coating film in the field of electronic materials by applying and baking a dispersion containing fine metal particles.
- the methods (1) to (3) are methods utilizing the surface melting phenomenon of metal fine particles. It is known that the surface melting phenomenon of metal fine particles is caused by abnormal lattice vibration of particle surface atoms. In this phenomenon, the surface melting temperature increases as the particle diameter of metal fine particles is smaller and the surface atomic ratio is higher. descend. In the case of copper, the melting point of the Balta body is 1083 ° C, but it is known that surface melting occurs from about 150 ° C in the case of fine particles with a particle diameter of about 10 nm. Since this phenomenon depends on the particle size of the metal fine particles, as long as the fine particles are not completely fixed to each other, if each metal fine particle has a predetermined particle size, it occurs even in an associated state.
- Patent Document 1 Japanese Patent Laid-Open No. 2002-324966
- Patent Document 2 JP 2002-126869 A
- Patent Document 3 Japanese Patent Laid-Open No. 2002-334618
- the present invention is a dispersion containing metal fine particles capable of forming a metal film excellent in oxidation resistance and dispersion stability and excellent in conductivity (herein, also simply referred to as metal fine particle dispersion),
- the manufacturing method and an article having a metal film having excellent conductivity are provided.
- the method for producing a metal fine particle dispersion of the present invention comprises a dispersion medium, metal hydride fine particles having an average particle diameter of 50 nm or less dispersed in the dispersion medium, and an amino group-containing carbon number of 4 to:
- a dispersion containing metal hydride fine particles containing 100000 organic compounds (also referred to simply as metal hydride fine particle dispersion in this specification) is heated at 60 to 350 ° C. in an inert atmosphere, The metal hydride fine particles are made to be metal fine particles.
- the metal hydride fine particle dispersion is preferably obtained by a method having the following steps (a) to (e).
- the metal is preferably copper or nickel.
- the inert atmosphere preferably contains not more than lOOOppm oxygen.
- the metal fine particle dispersion preferably contains metal fine particles having an average particle size of 50 nm or less.
- the metal fine particle dispersion preferably contains 5 to 60% by mass of metal fine particles in 100% by mass of the metal fine particle dispersion.
- the metal hydride fine particle dispersion contains an organic compound having 4 to 1000 carbon atoms having an amino group:! To 50 parts by mass with respect to 100 parts by mass of the metal hydride fine particles. It is preferable that the metal hydride fine particle dispersion contains:! To 40% by mass of metal hydride fine particles in 100% by mass of the metal hydride fine particle dispersion.
- the metal fine particle dispersion of the present invention is obtained by the method for producing a metal fine particle dispersion of the present invention.
- the article of the present invention comprises a substrate and a metal film formed on the substrate by applying and firing the metal fine particle dispersion obtained by the method for producing a metal fine particle dispersion of the present invention. is there.
- the metal fine particle dispersion of the present invention is excellent in oxidation resistance and dispersion stability. Further, according to the metal fine particle dispersion of the present invention, a metal film having excellent conductivity can be formed.
- a metal fine particle dispersion capable of forming a metal film excellent in oxidation resistance and dispersion stability and excellent in conductivity can be produced.
- the article of the present invention has a metal film excellent in conductivity.
- the method for producing a metal fine particle dispersion of the present invention comprises a dispersion medium, metal hydride fine particles having an average particle diameter of 50 nm or less dispersed in the dispersion medium, and an amino group-containing carbon number of 4 to 100000.
- a metal hydride fine particle dispersion containing an organic compound hereinafter referred to as a protective agent
- a protective agent is heated at 60 to 350 ° C. in an inert atmosphere.
- Heating is performed after the metal hydride fine particle dispersion is placed in a container and the inside of the container is replaced with an inert atmosphere.
- Gases that form an inert atmosphere include gases containing nitrogen, argon, helium, and the like.
- the oxygen concentration in the gas is preferably 10 ppm or less, more preferably 200 ppm or less. If the oxygen concentration in the gas is lOOOppm or less, oxidation of the metal fine particles can be suppressed.
- the heating temperature is preferably 60 to 350 ° C force S, more preferably 80 to 200 ° C force S.
- the heating temperature is 60 ° C or higher, the metal hydride fine particles are efficiently decomposed.
- the heating temperature is 350 ° C. or lower, the aggregation of the metal fine particles without the protective agent being detached from the metal fine particles can be suppressed.
- the heating time may be appropriately determined according to the heating temperature. Usually, 5 to 180 minutes is preferable, and 30 to 60 minutes is more preferable. If the heating time is 5 minutes or longer, the entire dispersion can be heated sufficiently. If the heating time is 180 minutes or less, the treatment time can be shortened.
- a water-insoluble organic solvent (hereinafter, referred to as an organic solvent) can be prevented from dissolving water in the dispersion medium when mixed with an aqueous solution described later, and the characteristic change of the dispersion medium is small. .) Is preferred. Water-insoluble means that the solubility in 100 g of water at room temperature (20 ° C) is 0.5 g or less.
- organic solvent a thing with little polarity is preferable.
- Organic solvents with low polarity have good affinity with protective agents.
- the organic solvent those which are not thermally decomposed by heating at the time of producing a metal fine particle dispersion or forming a metal film are preferred.
- the boiling point of the organic solvent is preferably 60 to 350 ° C, more preferably 80 to 200 ° C. If the boiling point of the organic solvent is 60 ° C or more, the decomposition of the metal hydride fine particles proceeds sufficiently. If the boiling point of the organic solvent is 350 ° C or lower, the viscosity of the organic solvent does not become too high, and the dispersion can be heated uniformly.
- Organic solvents include octane (insoluble in water), decane (insoluble in water), dodecane (insoluble in water), tetradecane (insoluble in water), decene (insoluble in water), dodecene. (Insoluble in water), tetradecene (insoluble in water), dipentene (solubility in water 100 g 0.001 g (20 ° C)), terbinol (solubility in water 100 g 0.5 g (20 ° C) ), Toluene (insoluble in water), xylene (insoluble in water) and mesitylene (insoluble in water).
- octane insoluble in water
- decane insoluble in water
- dodecane insoluble in water
- tetradecane insoluble in water
- decene insoluble in water
- dodecene dodecene.
- dipentene solubility in water 100 g 0.001 g (20 ° C
- the protective agent suppresses aggregation of metal hydride fine particles and metal fine particles, and suppresses oxidation of metal hydride fine particles and metal fine particles.
- the protective agent is an organic compound having an amino group and having 4 to 1000 carbon atoms. If the number of carbon atoms is 4 or more, the steric hindrance effect due to the carbon chain is exhibited and the dispersion stability is improved. If the number of carbon atoms is 1000 or less, the entanglement between the protective agents can be suppressed without the molecular chain being too long, and the dispersion stability does not deteriorate.
- the carbon number is preferably 4 to 200, more preferably 4 to 20, and particularly preferably 4 to 18:
- the protective agent may be either saturated or unsaturated.
- the protective agent is preferably a linear one.
- the amino group in the protective agent is preferably present at the end in terms of thermal stability that may be present at any position in the molecule, moderate vapor pressure, and good handleability. .
- metal hydride fine particles or those having two or more amino groups are preferred from the viewpoint of strong coordination bonding with metal fine particles.
- the protective agent is preferably one that does not desorb from the metal hydride fine particles or the metal fine particles within the normal storage environment temperature range and heating temperature range.
- Examples of the organic compound having an amino group and having 4 to 20 carbon atoms include dodecylamine, octylamine, aminodecane, stearylamine, oleylamine, benzylamine, stearylamide, oleylamide, and the like.
- a polymer dispersant having an amino group and having 4 to 100 carbon atoms is preferable from the viewpoint of improving dispersion stability.
- polymer dispersant examples include the following commercially available products.
- Anti_Terra_U salt of long-chain polyaminoamide and acid polymer
- Anti_Terra_204 polycarboxylate of polyaminoamide
- Disperbyk— 101 salt of long-chain polyaminoamide and polar acid ester
- Disperbyk — 106 polymer salt having an acidic group
- Disperbyk—108 hydroxyl group-containing carboxylic acid ester
- Disperbyk—109 alkylolamino amide
- Disperbyk—112 (acrylic copolymer having affinity for pigment) Polymers
- Disperbyk—116 acrylic copolymer with affinity for pigment
- Disperby k—130 unsaturated polycarboxylic acid polyaminoamide
- Disperbyk—140 alkyl ammonium salt of acidic polymer
- Disperbyk — 142 phosphate ester salt of copolymer with affinity to pigment
- Disperbyk—145 phosphate ester salt of copolymer
- Hinoact KF1500 cationic surfactant single anchor type
- Hinoact KF1700 cationic surfactant single anchor type
- Ajinomoto Fine Technone Earth Ajisper PB821 (basic polymer dispersant), Ajisper PB822 (basic polymer dispersant), Ajisper PB711 (basic polymer dispersant).
- Disparon 1860 Salt of long-chain polyaminoamide and high-molecular polyester acid
- Disparon KS873N Ammonium salt of polyester
- Disparon DA703-50 Ammonium salt of high-molecular-weight polyester acid
- Disparon DA7400 High (Amidoamine salt of molecular weight polyesteroleic acid).
- Ciba Specialty Chemicals EFKA-4401 (modified polyacrylic polymer dispersant), EFKA-5044 (unsaturated polyester polyamide), EFKA-5207 (unsaturated carboxylic acid containing hydroxyl group), EFKA-6225 ( Fatty acid-modified polyester), EFKA-43 30 (acrylic block copolymer polymer dispersant), EFKA-4047 (modified polyurethane polymer dispersant), EFKA-4060 (modified polyurethane polymer dispersant).
- the protective agent one kind may be used alone, or two or more kinds may be used in combination.
- the amount of the protective agent may be appropriately selected depending on the use of the dispersion. 1 to 50 parts by mass is preferable with respect to 100 parts by mass of the particles, and 2 to 20 parts by mass is more preferable. When the amount of the protective agent is 1 part by mass or more, aggregation of metal hydride fine particles and metal fine particles can be sufficiently suppressed, and oxidation of metal hydride fine particles and metal fine particles can be sufficiently suppressed. When the amount of the protective agent is 50 parts by mass or less, a metal film having good conductivity can be formed.
- Metal hydride fine particles are metal hydride fine particles in which metal atoms and hydrogen atoms are bonded. Since metal hydride fine particles have the property of decomposing into metal and hydrogen at a temperature of 60 ° C. or higher, they become metal fine particles when heated in an inert atmosphere.
- Examples of the metal hydride fine particles include copper hydride fine particles, nickel hydride fine particles, and palladium hydride fine particles. From the viewpoint that a metal film having excellent conductivity can be formed, copper hydride fine particles or nickel hydride fine particles can be formed. More preferred are copper hydride fine particles which are preferred.
- the metal hydride fine particles are preferably produced by the wet reduction method described later.
- the metal hydride fine particles are preferably coated with a protective agent in the dispersion from the viewpoint of suppressing aggregation and oxidation of the metal hydride fine particles.
- the average particle size of the metal hydride fine particles is 50 nm or less, preferably 5 to 30 nm. When the average particle diameter of the metal hydride fine particles is 50 nm or less, a dispersion having excellent dispersion stability is obtained.
- the average particle size of the metal hydride fine particles was determined by measuring the particle size of 100 randomly extracted metal hydride fine particles using a transmission electron microscope (TEM) or scanning electron microscope (SEM). The average value of the diameters.
- the concentration of the metal hydride fine particles is preferably from 5 to 20% by mass, preferably from! To 40% by mass in 100% by mass of the dispersion. Productivity is good when the concentration of metal hydride fine particles is 1% by mass or more. When the concentration of metal hydride fine particles is 40% by mass or less, the fine particles are less likely to aggregate upon heating.
- the metal hydride fine particles can be produced, for example, by the method described in WO 2004Z110925 pamphlet.
- the metal hydride fine particle dispersion is produced through the following steps.
- water-soluble metal compounds examples include metal sulfates, nitrates, acetates, chlorides, bromides, iodides, and the like.
- the concentration of the water-soluble metal compound is preferably 0.:! To 30% by mass in 100% by mass of the aqueous solution. If the concentration of the water-soluble copper compound is 0.1% by mass or more, the amount of water can be suppressed, and the productivity of metal hydride fine particles can be improved. When the concentration of the water-soluble metal compound is 30% by mass or less, the dispersion stability of the metal hydride fine particles becomes good.
- acids include citrate, maleic acid, malonic acid, acetic acid, propionic acid, sulfuric acid, nitric acid, and hydrochloric acid, and form stable complexes with metal ions to prevent adsorption of hydrated water to metal ions. From this point, citrate, maleic acid and malonic acid are preferred.
- the pH of the aqueous solution is preferably adjusted to:! To 2 in that metal hydride fine particles can be generated in a short time.
- metal ions are reduced by the reducing agent under acidic conditions in the aqueous layer, and metal hydride fine particles grow gradually.
- Hydrogenated metal particles are immediately covered with a protective agent dissolved in the oil layer and taken into the oil layer and stabilized. That is, the protective agent is coordinated on the surface of the generated metal hydride fine particles, the metal hydride fine particles are coated with the protective agent, and aggregation of the metal hydride fine particles is suppressed.
- the reducing agent is preferably a metal hydride because it has a large reducing action.
- metal hydrides include lithium aluminum hydride, lithium borohydride, sodium borohydride, lithium hydride, potassium hydride, calcium hydride, etc., and lithium aluminum hydride, lithium borohydride, hydrogen Sodium borohydride is preferred.
- the amount of addition of the reducing agent is preferably 1.5 to 10 times the number of equivalents to the metal ion. If the amount of reducing agent added is 1.5 times the number of equivalents to metal ions, the reducing action is sufficient. When the amount of the reducing agent added is 10 times or less, the dispersion stability of the metal hydride fine particles will be good.
- the temperature at which the reducing agent is added to the suspension is preferably 5-60 ° C, particularly preferably 10-40 ° C. When the temperature is 60 ° C. or lower, decomposition of the metal hydride fine particles can be suppressed.
- the suspension After the metal hydride fine particles are generated, if the suspension is allowed to stand, it is separated into an aqueous layer and an oil layer. By collecting the oil layer, a dispersion liquid in which metal hydride fine particles are dispersed in an organic solvent is obtained. An organic solvent may be added to the dispersion as necessary.
- the metal fine particle dispersion of the present invention is a metal fine particle dispersion obtained by the method for producing a metal fine particle dispersion of the present invention.
- Examples of the metal fine particles include metal copper fine particles, metal nickel fine particles, and metal palladium fine particles. From the viewpoint that a metal film excellent in conductivity can be formed, metal copper fine particles or metal nickel fine particles are preferable, and metal copper fine particles are preferred. More preferred.
- the metal fine particles are kept in the dispersion from the viewpoint of suppressing aggregation and oxidation of the metal fine particles. It is preferably coated with a protective agent.
- the average particle size of the metal fine particles is preferably 50 nm or less, more preferably 5 to 30 nm. If the average particle diameter of the metal fine particles is 50 nm or less, a fine wiring pattern can be formed. Further, since the surface melting temperature is lowered, surface fusion is likely to occur. In addition, a dense metal film can be formed, and conductivity is improved.
- the average particle size of the metal fine particles was determined by measuring the particle size of 100 randomly extracted metal fine particles using a transmission electron microscope (TEM) or a scanning electron microscope (SEM). Is an average value.
- the concentration of the metal fine particles is preferably 5 to 60% by mass and more preferably 10 to 50% by mass in 100% by mass of the metal fine particle dispersion.
- concentration force of the metal fine particles is at least mass%, a metal film having a sufficient thickness can be formed, and the conductive film is improved. If the concentration of the metal fine particles is 60% by mass or less, the ink properties such as the viscosity and surface tension of the metal fine particle dispersion will be good, and the handleability will be improved.
- the amount of the protective agent in the metal fine particle dispersion is usually preferably 1 to 300 parts by mass and more preferably 100 parts by mass with respect to 100 parts by mass of the metal fine particles.
- the amount of the protective agent is 1 part by mass or more, aggregation of the metal fine particles can be sufficiently suppressed, and oxidation of the metal fine particles can be sufficiently suppressed.
- the amount of the protective agent is 300 parts by mass or less, a metal film with good conductivity can be formed.
- the metal fine particle dispersion may contain a known additive, an organic binder and the like as required.
- the article of the present invention has a substrate and a metal film formed by applying and firing the metal fine particle dispersion of the present invention on the substrate.
- Examples of the article include a printed wiring board, a semiconductor package, and a display panel.
- the substrate examples include a glass substrate, a plastic substrate, and a fiber reinforced composite material.
- a base material containing polyimide is preferred because of its excellent adhesion to the metal film.
- the substrate containing polyimide include a polyimide film, a laminated film having a polyimide layer as the outermost layer or a laminated substrate, a glass fiber reinforced composite material in which the matrix resin is polyimide, and a silica composite film in which the matrix resin is polyimide. It is done.
- Examples of the polyimide include a reaction product of an aromatic tetracarboxylic dianhydride and an aromatic diamine.
- Examples of the aromatic tetracarboxylic dianhydride include 3, 4, 3 ′, 4′_biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, and the like.
- Aromatic diamines include paraphenylenediamine, 4,4'-diaminodiphenyl ether, and the like.
- the polyimide may contain known additives such as inorganic fillers, inorganic phosphors, and organic phosphors.
- the metal film may be a continuous film covering the entire surface of the substrate or a film having a desired pattern.
- the volume resistivity of the metal film is preferably 100 ⁇ cm or less, more preferably 50 ⁇ cm or less.
- the thickness of the metal film is preferably 0.5 to 10 / im force S, and more preferably 0.5 to 5 / im.
- the article is manufactured through the following steps, for example.
- the metal fine particle dispersion of the present invention may be applied in a desired pattern on the surface of the substrate which is coated with the metal fine particle dispersion of the present invention so as to cover the entire surface of the substrate. Good.
- Coating methods include ink jet printing, dispensing, screen printing, roll coating, air knife coating, blade coating, bar coating, gravure coating, die coating, spray coating, slide coating, etc.
- a known method may be mentioned, and an inkjet printing method is preferable because it can be easily applied in a desired pattern.
- the ink jet printing method uses an ink jet printer.
- Inkjet The ink discharge holes in the linter are usually:! -50 ⁇ .
- the ink droplet diameter changes during space flight after being ejected from the ink ejection holes, and spreads on the surface of the substrate after adhering to the surface of the electrical insulator layer 12.
- the diameter of the ink immediately after ejection is about the same as the diameter of the ink ejection hole, and after adhering to the substrate, the diameter of the ink increases from 5 to: 100 x m.
- the fine metal particles in the fine metal particle dispersion may agglomerate as long as the ink viscosity is not affected, and the agglomerated diameter is preferably 2 ⁇ m or less.
- the base material on which the coating film is formed is placed in a firing furnace, and the temperature in the firing furnace is increased to the firing temperature at a rate of 10 ° C / min in an inert gas atmosphere such as nitrogen. Baking is performed for a predetermined time (hereinafter referred to as holding time). By the firing, fusion of the metal fine particles proceeds and a metal film is formed.
- the firing temperature is preferably 150 to 200 ° C, more preferably 200 to 400 ° C force S, and particularly preferably 250 to 350 ° C force S. If the firing temperature is 150 ° C or higher, the fusion of the metal fine particles proceeds, and the volume resistivity of the metal film becomes good.
- the holding time is preferably 30 to 240 minutes, more preferably 30 to 120 minutes. If the holding time is 30 minutes or more, the fusion of the metal fine particles proceeds and the volume resistivity of the metal film becomes good.
- the metal hydride fine particles are decomposed in the presence of a protective agent to produce metal fine particles.
- Metal fine particles are difficult to oxidize and hardly aggregate. Therefore, the obtained metal fine particle dispersion is excellent in oxidation resistance and dispersion stability.
- Example 1 is an example and examples 2-5 are comparative examples.
- the concentration of the solution or dispersion is a concentration in terms of mass.
- the copper hydride fine particles and metal copper fine particles were identified using an X-ray diffractometer (RINT2500, manufactured by Rigaku Kikai Co., Ltd.).
- the average particle size of copper hydride fine particles and metal copper fine particles is the particle size of 100 randomly extracted fine particles. Transmission electron microscope (Hitachi, H_9000) or scanning electron microscope (Hitachi, Ltd.) Measured using S-800), and the average particle size was determined.
- the thickness of the metal film was measured using a contact-type film thickness measuring device (Veeco, DekTak3).
- the volume resistivity of the metal film was calculated by multiplying the surface resistance value measured using a four-probe resistance meter (Mitsubishi Oil Chemical Co., Ltd., lorestalP MCP-T 250) by the thickness of the metal film.
- a solution in which 0.4 g of dodecinoleamine and 20 g of xylene was mixed with the aqueous solution was prepared and stirred vigorously to obtain a suspension.
- the suspension After completion of dropping, the suspension is allowed to stand for 1 hour to separate into an aqueous layer and an oil layer, and then only the oil layer was recovered. A black dispersion liquid in which fine particles were dispersed in xylene was obtained. Fine particles in the dispersion were recovered and identified by X-ray diffraction, and as a result, it was confirmed to be copper hydride fine particles.
- the average particle size of the fine particles dispersed in the dispersion was 10 nm.
- the concentration of the copper hydride fine particles in the dispersion was 10% by mass.
- the copper hydride fine particle dispersion was placed in a glass container and heated at 80 ° C for 60 minutes in nitrogen having an oxygen concentration of 200 PPm . After heating, the mixture was gradually cooled to room temperature in the same nitrogen.
- the average particle size of the fine particles dispersed in the dispersion was lOnm.
- the concentration of metallic copper fine particles in the dispersion was 8% by mass.
- the metal copper fine particle dispersion After leaving the metal copper fine particle dispersion in air for one day, it was coated on a polyimide substrate using a bar coater and dried, and then the formed coating film was coated with nitrogen having an oxygen concentration of 40 ppm. Baking at 200 ° C for 1 hour in an atmosphere. A shiny metallic copper-colored metal film was formed. The volume resistivity of the metal film was 15 / i ⁇ cm.
- Table 1 summarizes the differences in fine particles and volume resistivity when the protective agent in Table 1 was used instead of dodecylamine and the heating temperature, heating time, and firing temperature were changed.
- the adhesion of the metal film to the polyimide substrate was evaluated by the coating adhesion test method CFIS K5600). The results are shown in Table 1.
- Cu is copper metal and CuH is copper hydride.
- a fine particle dispersion was obtained in the same manner as in Example 1 except that dodecanethiol was used instead of dodecylamine.
- the average particle size of the copper hydride fine particles and the metal copper fine particles was 12 nm and m i ⁇ . However, in the metal copper fine particle dispersion, the metal copper fine particles agglomerated vigorously and the aggregates were precipitated.
- the metal copper fine particle dispersion in the air for one day After leaving the metal copper fine particle dispersion in the air for one day, it was coated on a polyimide substrate using a bar coater and dried, and then the formed coating film was coated with nitrogen having an oxygen concentration of 40 ppm. Baking at 200 ° C for 1 hour in an atmosphere. A metallic copper-colored film was formed, but many cracks occurred.
- the volume resistivity of the film was measured, but no conductivity was observed.
- a fine particle dispersion before heating was obtained in the same manner as in Example 1 except that 15 g of a 40% aqueous citrate solution was added.
- the pH of the aqueous solution immediately after adding the 40% aqueous citrate solution is 3.2.
- the fine particles in the dispersion were collected and identified by X-ray diffraction, it was confirmed to be metallic copper fine particles.
- the average particle size of the fine particles dispersed in the dispersion was 15 nm.
- the concentration of metallic copper fine particles in the dispersion was 10%.
- the metallic copper fine particle dispersion was placed in a glass container and heated at 80 ° C for 60 minutes in nitrogen having an oxygen concentration of 200 PPm . After heating, the mixture was gradually cooled to room temperature in the same nitrogen.
- the average particle size of the fine particles dispersed in the dispersion was 18 nm.
- the concentration of the metallic copper fine particles in the dispersion was 8%.
- the volume resistivity of the film was 10000 ⁇ cm.
- the film was identified by X-ray diffraction, it was confirmed to be a mixture of cuprous oxide and metallic copper.
- a fine particle dispersion before heating was obtained in the same manner as in Example 1 except that no aqueous citrate solution was added.
- the average particle size of the fine particles dispersed in the dispersion was 18 nm.
- the concentration of metallic copper fine particles in the dispersion was 10%.
- the metal copper fine particle dispersion was placed in a glass container and heated at 80 ° C for 60 minutes in nitrogen having an oxygen concentration of 200 PPm . After heating, the mixture was gradually cooled to room temperature in the same nitrogen.
- the average particle size of the fine particles dispersed in the dispersion was 18 nm.
- the concentration of the metallic copper fine particles in the dispersion was 8%.
- the metal copper fine particle dispersion was left in the air for 1 day, then applied onto a polyimide substrate using a bar coater, dried, and then the formed coating film was coated with nitrogen having an oxygen concentration of 40 ppm. Baking at 200 ° C for 1 hour in an atmosphere. A reddish brown film was formed.
- the volume resistivity of the film was 15000 ⁇ cm.
- the film was identified by X-ray diffraction, it was confirmed to be a mixture of cuprous oxide and metallic copper.
- the average particle diameter of the metal copper fine particles was 50 nm. However, in the metal copper fine particle dispersion, a part of the metal copper fine particles aggregated to form aggregates.
- the volume resistivity of the film was 25000 ⁇ cm.
- the film was identified by X-ray diffraction, it was confirmed to be a mixture of metallic copper and cuprous oxide.
- the metal fine particle dispersion produced by the production method of the present invention includes formation and restoration of circuit patterns such as printed wiring, inkjet wiring, and the like, interlayer wiring in a semiconductor package, printed wiring board and electronic components. It is useful for bonding of It should be noted that the entire contents of the Japanese Patent Application No. 2006-206454, Akitoda, filed on July 28, 2006, the claims and abstract are cited herein as the disclosure of the specification of the present invention. It is something that is incorporated.
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- Dispersion Chemistry (AREA)
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- Manufacturing & Machinery (AREA)
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Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008526698A JP5131191B2 (ja) | 2006-07-28 | 2007-06-13 | 金属微粒子を含有する分散液の製造方法 |
| EP07745203A EP2048205A4 (en) | 2006-07-28 | 2007-06-13 | DISPERSION WITH METAL FINE PARTICLES, METHOD FOR THE PRODUCTION OF THE DISPERSION AND ARTICLES WITH METAL FILMS |
| US12/360,427 US20090136770A1 (en) | 2006-07-28 | 2009-01-27 | Dispersion containing metal fine particles, process for producing it, and article having metal film |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006-206454 | 2006-07-28 | ||
| JP2006206454 | 2006-07-28 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US12/360,427 Continuation US20090136770A1 (en) | 2006-07-28 | 2009-01-27 | Dispersion containing metal fine particles, process for producing it, and article having metal film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008013002A1 true WO2008013002A1 (en) | 2008-01-31 |
Family
ID=38981317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2007/061936 Ceased WO2008013002A1 (en) | 2006-07-28 | 2007-06-13 | Dispersion conatining metal fine particles, process for production of the dispersion, and articles having metal films |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20090136770A1 (ja) |
| EP (1) | EP2048205A4 (ja) |
| JP (1) | JP5131191B2 (ja) |
| KR (1) | KR20090035524A (ja) |
| CN (1) | CN101495580A (ja) |
| TW (1) | TW200827412A (ja) |
| WO (1) | WO2008013002A1 (ja) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010189681A (ja) * | 2009-02-17 | 2010-09-02 | Hitachi Ltd | 耐酸化性銅微粒子の作製方法、及び、それを用いた接合方法 |
| US20110040014A1 (en) * | 2009-08-17 | 2011-02-17 | Samsung Electro-Mechanics Co., Ltd. | Inkjet ink composition |
| JP2013136577A (ja) * | 2011-12-27 | 2013-07-11 | Samsung Electro-Mechanics Co Ltd | 銅有機金属、銅有機金属の製造方法及び銅ペースト |
| WO2016104313A1 (ja) * | 2014-12-26 | 2016-06-30 | 御国色素株式会社 | 半導体電極層形成用分散液及び半導体電極層 |
| WO2016104347A1 (ja) * | 2014-12-22 | 2016-06-30 | 住友電気工業株式会社 | プリント配線板用基板及びプリント配線板用基板の製造方法 |
| WO2016117575A1 (ja) * | 2015-01-22 | 2016-07-28 | 住友電気工業株式会社 | プリント配線板用基材、プリント配線板及びプリント配線板の製造方法 |
| JPWO2020004624A1 (ja) * | 2018-06-29 | 2021-05-20 | 株式会社マテリアル・コンセプト | 配線基板及びその製造方法、並びに電子部品及びその製造方法 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011155134A1 (ja) * | 2010-06-11 | 2011-12-15 | 日本板硝子株式会社 | 貴金属微粒子、貴金属微粒子の回収方法、および回収した貴金属微粒子を用いる貴金属微粒子分散体の製造方法 |
| TWI422628B (zh) * | 2011-09-02 | 2014-01-11 | Univ Nat Taiwan | 奈米金屬-聚合物複合導電薄膜與其製備方法 |
| JP5088761B1 (ja) * | 2011-11-14 | 2012-12-05 | 石原薬品株式会社 | 銅微粒子分散液、導電膜形成方法及び回路基板 |
| KR101418276B1 (ko) * | 2012-03-30 | 2014-07-15 | 한국화학연구원 | 표면 산화막 형성이 제어된 금속 나노 입자 합성 방법 및 용액 공정을 통한 금속 전도성 박막의 제조방법 |
| WO2013147535A1 (en) * | 2012-03-30 | 2013-10-03 | Korea Research Institute Of Chemical Technology | Synthetic method of suppressing metal nano-particle from having oxidized film and method of manufacturing conductive metal thin film via solution-processed |
| JP5738464B1 (ja) * | 2013-12-10 | 2015-06-24 | Dowaエレクトロニクス株式会社 | 銀微粒子分散液 |
| US10030292B2 (en) * | 2014-05-26 | 2018-07-24 | Hrl Laboratories, Llc | Hydride-coated microparticles and methods for making the same |
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- 2007-06-13 JP JP2008526698A patent/JP5131191B2/ja not_active Expired - Fee Related
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Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010189681A (ja) * | 2009-02-17 | 2010-09-02 | Hitachi Ltd | 耐酸化性銅微粒子の作製方法、及び、それを用いた接合方法 |
| US20110040014A1 (en) * | 2009-08-17 | 2011-02-17 | Samsung Electro-Mechanics Co., Ltd. | Inkjet ink composition |
| US8389601B2 (en) * | 2009-08-17 | 2013-03-05 | Samsung Electro-Mechanics Co., Ltd. | Inkjet ink composition |
| JP2013136577A (ja) * | 2011-12-27 | 2013-07-11 | Samsung Electro-Mechanics Co Ltd | 銅有機金属、銅有機金属の製造方法及び銅ペースト |
| US9090635B2 (en) | 2011-12-27 | 2015-07-28 | Samsung Electro-Mechanics Co., Ltd. | Copper organic metal, method for preparing copper organic metal and copper paste |
| WO2016104347A1 (ja) * | 2014-12-22 | 2016-06-30 | 住友電気工業株式会社 | プリント配線板用基板及びプリント配線板用基板の製造方法 |
| JPWO2016104347A1 (ja) * | 2014-12-22 | 2017-10-05 | 住友電気工業株式会社 | プリント配線板用基板及びプリント配線板用基板の製造方法 |
| US10143083B2 (en) | 2014-12-22 | 2018-11-27 | Sumitomo Electric Industries, Ltd. | Substrate for printed circuit board and method for producing substrate for printed circuit board |
| WO2016104313A1 (ja) * | 2014-12-26 | 2016-06-30 | 御国色素株式会社 | 半導体電極層形成用分散液及び半導体電極層 |
| JPWO2016104313A1 (ja) * | 2014-12-26 | 2018-09-13 | 御国色素株式会社 | 半導体電極層形成用分散液及び半導体電極層 |
| WO2016117575A1 (ja) * | 2015-01-22 | 2016-07-28 | 住友電気工業株式会社 | プリント配線板用基材、プリント配線板及びプリント配線板の製造方法 |
| JPWO2016117575A1 (ja) * | 2015-01-22 | 2017-10-26 | 住友電気工業株式会社 | プリント配線板用基材、プリント配線板及びプリント配線板の製造方法 |
| JPWO2020004624A1 (ja) * | 2018-06-29 | 2021-05-20 | 株式会社マテリアル・コンセプト | 配線基板及びその製造方法、並びに電子部品及びその製造方法 |
| JP7070947B2 (ja) | 2018-06-29 | 2022-05-18 | 株式会社マテリアル・コンセプト | 配線基板及びその製造方法、並びに電子部品及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2008013002A1 (ja) | 2009-12-17 |
| KR20090035524A (ko) | 2009-04-09 |
| EP2048205A4 (en) | 2010-07-21 |
| US20090136770A1 (en) | 2009-05-28 |
| EP2048205A1 (en) | 2009-04-15 |
| CN101495580A (zh) | 2009-07-29 |
| JP5131191B2 (ja) | 2013-01-30 |
| TW200827412A (en) | 2008-07-01 |
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