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WO2008006976A8 - Circuit intégré réparti sur au moins deux plans non parallèles et son procédé de réalisation - Google Patents

Circuit intégré réparti sur au moins deux plans non parallèles et son procédé de réalisation Download PDF

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Publication number
WO2008006976A8
WO2008006976A8 PCT/FR2007/001188 FR2007001188W WO2008006976A8 WO 2008006976 A8 WO2008006976 A8 WO 2008006976A8 FR 2007001188 W FR2007001188 W FR 2007001188W WO 2008006976 A8 WO2008006976 A8 WO 2008006976A8
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WO
WIPO (PCT)
Prior art keywords
integrated circuit
production
distributed over
parallel planes
circuit distributed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2007/001188
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English (en)
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WO2008006976A1 (fr
Inventor
Jean-Baptiste Albertini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to US12/373,444 priority Critical patent/US20090315129A1/en
Priority to JP2009518927A priority patent/JP2009543086A/ja
Priority to EP07823279A priority patent/EP2041022A1/fr
Publication of WO2008006976A1 publication Critical patent/WO2008006976A1/fr
Anticipated expiration legal-status Critical
Publication of WO2008006976A8 publication Critical patent/WO2008006976A8/fr
Ceased legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0006Interconnects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032Packages or encapsulation
    • B81B7/00743D packaging, i.e. encapsulation containing one or several MEMS devices arranged in planes non-parallel to the mounting board
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/0206Three-component magnetometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
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    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/07Hall effect devices
    • GPHYSICS
    • G01MEASURING; TESTING
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    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/093Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
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  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Hall/Mr Elements (AREA)
  • Wire Bonding (AREA)
  • Structure Of Printed Boards (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Measuring Magnetic Variables (AREA)

Abstract

L'invention concerne un circuit intégré comprenant une première partie (30) en forme de plaque. Ce composant comprend également au moins une seconde partie (32) en forme de plaque distincte de la première partie (30), solidaire de la première partie (30) reliée à la première partie (30) par des moyens de liaison (22) déformables et formant un angle non nul avec la première partie (30).
PCT/FR2007/001188 2006-07-13 2007-07-11 Circuit intégré réparti sur au moins deux plans non parallèles et son procédé de réalisation Ceased WO2008006976A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/373,444 US20090315129A1 (en) 2006-07-13 2007-07-11 Integrated circuit distributed over at least two non-parallel planes and its method of production
JP2009518927A JP2009543086A (ja) 2006-07-13 2007-07-11 少なくとも2つの非平行平面上に分散配置された集積回路およびその製造方法
EP07823279A EP2041022A1 (fr) 2006-07-13 2007-07-11 Circuit intégré réparti sur au moins deux plans non parallèles et son procédé de réalisation

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0652966A FR2903812B1 (fr) 2006-07-13 2006-07-13 Circuit integre reparti sur au moins deux plans non paralleles et son procede de realisation
FR0652966 2006-07-13

Publications (2)

Publication Number Publication Date
WO2008006976A1 WO2008006976A1 (fr) 2008-01-17
WO2008006976A8 true WO2008006976A8 (fr) 2009-03-19

Family

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PCT/FR2007/001188 Ceased WO2008006976A1 (fr) 2006-07-13 2007-07-11 Circuit intégré réparti sur au moins deux plans non parallèles et son procédé de réalisation

Country Status (5)

Country Link
US (1) US20090315129A1 (fr)
EP (1) EP2041022A1 (fr)
JP (1) JP2009543086A (fr)
FR (1) FR2903812B1 (fr)
WO (1) WO2008006976A1 (fr)

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FR2928006B1 (fr) * 2008-02-26 2011-03-04 Univ Claude Bernard Lyon Procede de fabrication d'un capteur de champ magnetique et capteur de champ magnetique obtenu
DE102008042800A1 (de) * 2008-10-13 2010-04-15 Robert Bosch Gmbh Vorrichtung zur Messung von Richtung und/oder Stärke eines Magnetfeldes
DE102008062672A1 (de) * 2008-12-17 2010-07-15 Siemens Aktiengesellschaft Verfahren und Vorrichtung zur Durchführung eines Vergleichs zwischen einer linken und einer rechten Gehirnhälfte eines Patienten
US8525514B2 (en) * 2010-03-19 2013-09-03 Memsic, Inc. Magnetometer
KR101250559B1 (ko) * 2011-01-06 2013-04-03 한국표준과학연구원 누설자속 측정에 의한 압력용기의 비파괴 탐상장치
CN102426344B (zh) * 2011-08-30 2013-08-21 江苏多维科技有限公司 三轴磁场传感器
CN102385043B (zh) * 2011-08-30 2013-08-21 江苏多维科技有限公司 Mtj三轴磁场传感器及其封装方法
WO2013145284A1 (fr) * 2012-03-30 2013-10-03 株式会社フジクラ Capteur de courant
KR102847503B1 (ko) * 2016-12-21 2025-08-20 에스케이하이닉스 주식회사 커패시턴스 센싱 회로

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US5558091A (en) * 1993-10-06 1996-09-24 Biosense, Inc. Magnetic determination of position and orientation
US6169254B1 (en) * 1994-07-20 2001-01-02 Honeywell, Inc. Three axis sensor package on flexible substrate
US5446307A (en) * 1994-11-04 1995-08-29 The United States Of America As Represented By The Secretary Of The Army Microelectronic 3D bipolar magnetotransistor magnetometer
GB9507930D0 (en) * 1995-04-19 1995-06-14 Smiths Industries Plc Inertial sensor assemblies
US6201387B1 (en) * 1997-10-07 2001-03-13 Biosense, Inc. Miniaturized position sensor having photolithographic coils for tracking a medical probe
US6859577B2 (en) * 2001-06-25 2005-02-22 Analog Devices Inc. Self assembled micro anti-stiction structure
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FR2833106B1 (fr) * 2001-12-03 2005-02-25 St Microelectronics Sa Circuit integre comportant un composant auxiliaire, par exemple un composant passif ou un microsysteme electromecanique, dispose au-dessus d'une puce electronique, et procede de fabrication correspondant
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FR2880731B1 (fr) * 2005-01-11 2007-04-27 Commissariat Energie Atomique Composant, notamment avec des elements actifs, et procede de realisation d'un tel composant
DE102005023591A1 (de) * 2005-05-18 2006-11-30 Hl-Planar Technik Gmbh Feldmesseinrichtung, Messbaugruppe für eine Feldmesseinrichtung und Herstellungsmethode für eine Mehrzahl von Messbaugruppen

Also Published As

Publication number Publication date
WO2008006976A1 (fr) 2008-01-17
FR2903812B1 (fr) 2008-10-31
US20090315129A1 (en) 2009-12-24
FR2903812A1 (fr) 2008-01-18
EP2041022A1 (fr) 2009-04-01
JP2009543086A (ja) 2009-12-03

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