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WO2008096866A1 - 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品 - Google Patents

光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品 Download PDF

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Publication number
WO2008096866A1
WO2008096866A1 PCT/JP2008/052180 JP2008052180W WO2008096866A1 WO 2008096866 A1 WO2008096866 A1 WO 2008096866A1 JP 2008052180 W JP2008052180 W JP 2008052180W WO 2008096866 A1 WO2008096866 A1 WO 2008096866A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
photocatalyst thin
forming
photocatalyst
coated product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/052180
Other languages
English (en)
French (fr)
Inventor
Christopher Cordonier
Tetsuya Shichi
Kenichi Katsumata
Yasuhiro Katsumata
Akira Fujishima
Takafumi Numata
Takayoshi Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute for Materials Science
Central Japan Railway Co
Original Assignee
National Institute for Materials Science
Central Japan Railway Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute for Materials Science, Central Japan Railway Co filed Critical National Institute for Materials Science
Priority to KR1020097017794A priority Critical patent/KR101078948B1/ko
Priority to CNA2008800045908A priority patent/CN101605606A/zh
Priority to JP2008557174A priority patent/JP5118067B2/ja
Priority to US12/526,150 priority patent/US9012354B2/en
Priority to EP08711059.9A priority patent/EP2133146A4/en
Priority to CN2008800045984A priority patent/CN101605607B/zh
Publication of WO2008096866A1 publication Critical patent/WO2008096866A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/20—Vanadium, niobium or tantalum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/08—Heat treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/218—V2O5, Nb2O5, Ta2O5
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Catalysts (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

　本発明にかかる光触媒薄膜の形成方法は、アルカリ金属を含む基体の表面にニオビアナノシートを含む層を形成して焼成することにより、ニオブ－アルカリ金属複合酸化物を含む光触媒薄膜を形成することを特徴とする。
PCT/JP2008/052180 2007-02-08 2008-02-08 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品 Ceased WO2008096866A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020097017794A KR101078948B1 (ko) 2007-02-08 2008-02-08 광촉매 박막, 광촉매 박막의 형성방법 및 광촉매 박막 피복 제품
CNA2008800045908A CN101605606A (zh) 2007-02-08 2008-02-08 光催化薄膜、形成光催化薄膜的方法以及覆盖有光催化薄膜的制品
JP2008557174A JP5118067B2 (ja) 2007-02-08 2008-02-08 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品
US12/526,150 US9012354B2 (en) 2007-02-08 2008-02-08 Photocatalytic film, method for forming photocatalytic film and photocatalytic film coated product
EP08711059.9A EP2133146A4 (en) 2007-02-08 2008-02-08 THIN PHOTO CATALYST FILM, METHOD FOR FORMING A THIN PHOTO CATALYST FILM AND PRODUCT COATED WITH A THIN PHOTOCATALYZER FILM
CN2008800045984A CN101605607B (zh) 2007-02-08 2008-02-08 光催化薄膜、形成光催化薄膜的方法以及覆盖有光催化薄膜的制品

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007029318 2007-02-08
JP2007-029318 2007-02-08
JPPCT/JP2007/058870 2007-04-24
PCT/JP2007/058870 WO2008096456A1 (ja) 2007-02-08 2007-04-24 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品

Publications (1)

Publication Number Publication Date
WO2008096866A1 true WO2008096866A1 (ja) 2008-08-14

Family

ID=39681375

Family Applications (3)

Application Number Title Priority Date Filing Date
PCT/JP2007/058870 Ceased WO2008096456A1 (ja) 2007-02-08 2007-04-24 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品
PCT/JP2008/052190 Ceased WO2008096871A1 (ja) 2007-02-08 2008-02-08 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品
PCT/JP2008/052180 Ceased WO2008096866A1 (ja) 2007-02-08 2008-02-08 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品

Family Applications Before (2)

Application Number Title Priority Date Filing Date
PCT/JP2007/058870 Ceased WO2008096456A1 (ja) 2007-02-08 2007-04-24 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品
PCT/JP2008/052190 Ceased WO2008096871A1 (ja) 2007-02-08 2008-02-08 光触媒薄膜、光触媒薄膜の形成方法及び光触媒薄膜被覆製品

Country Status (6)

Country Link
US (2) US9126193B2 (ja)
EP (2) EP2133146A4 (ja)
JP (2) JP5118067B2 (ja)
KR (2) KR101078946B1 (ja)
CN (2) CN101605607B (ja)
WO (3) WO2008096456A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110147060A1 (en) * 2008-05-23 2011-06-23 Minoru Osada Dielectric film, dielectric element, and process for producing the dielectric element
JP2013253009A (ja) * 2011-10-25 2013-12-19 National Institute For Materials Science スピンコート法によりナノシート単層膜からなる薄膜を製造する方法、それによる超親水化材料、酸化物薄膜用基板、および、誘電体材料

Families Citing this family (6)

* Cited by examiner, † Cited by third party
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JPH0723860Y2 (ja) 1991-02-18 1995-05-31 第一電装部品株式会社 自己復帰プルスイッチ
EP2308947B1 (en) * 2008-07-11 2016-06-08 National Institute for Materials Science Luminescent nanosheet, fluorescent device, solar cell and color display using the same, and nanosheet coating
CN104043468A (zh) * 2013-03-13 2014-09-17 江南大学 一种具有表面台阶的铌系光催化材料制备
US9450636B2 (en) 2014-12-30 2016-09-20 Motorola Solutions, Inc. Intrinsically safe audio power current circuit and device using same
CN108424114B (zh) * 2018-05-23 2022-08-26 佛山市合新创展陶瓷有限公司 一种室内装饰环保陶瓷砖及其制造方法
CN117088672B (zh) * 2023-07-26 2024-06-04 桂阳县舂陵江镇柏贵陶业有限公司 一种高亮型生态釉瓷器及其制备方法

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JPH07168001A (ja) * 1993-12-15 1995-07-04 Nikon Corp 黴の発生が抑制された光学機器
JPH1053439A (ja) 1996-08-02 1998-02-24 Asahi Kagaku Kogyo Co Ltd 酸化チタン光触媒皮膜のアンダーコート層形成用塗布剤およびアンダーコート層形成方法
JPH10273319A (ja) * 1997-03-27 1998-10-13 Taki Chem Co Ltd 金属酸化物ゾル用結合剤
JP2001150586A (ja) 1995-03-20 2001-06-05 Toto Ltd 光触媒性親水性表面を備えた防曇性部材
JP2003003113A (ja) * 2001-06-19 2003-01-08 Lion Corp 光触媒含有コーティング剤
JP2005290369A (ja) * 2004-03-10 2005-10-20 Central Japan Railway Co 酸化チタンコーティング剤、及び酸化チタン塗膜形成方法
JP2006247652A (ja) * 1995-09-15 2006-09-21 Saint-Gobain Glass France 光触媒コーティングを備えた基材

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JPH06104089A (ja) * 1992-09-24 1994-04-15 Fuji Electric Co Ltd 薄膜発光素子
FR2730990B1 (fr) * 1995-02-23 1997-04-04 Saint Gobain Vitrage Substrat transparent a revetement anti-reflets
US7096692B2 (en) * 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
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JP3622585B2 (ja) 1999-08-05 2005-02-23 日本板硝子株式会社 光触媒活性を有する物品
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JP4030045B2 (ja) 2002-03-08 2008-01-09 株式会社村上開明堂 親水性複合材
CN1248780C (zh) * 2004-02-16 2006-04-05 武汉理工大学 铌钾复合氧化物光催化剂及其制备方法
JP2005259389A (ja) * 2004-03-09 2005-09-22 Toshiba Home Lighting Kk 照明器具
CN1311902C (zh) 2005-11-25 2007-04-25 北京工业大学 一种铌酸钾K4Nb6O17薄膜的制备方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07168001A (ja) * 1993-12-15 1995-07-04 Nikon Corp 黴の発生が抑制された光学機器
JP2001150586A (ja) 1995-03-20 2001-06-05 Toto Ltd 光触媒性親水性表面を備えた防曇性部材
JP2006247652A (ja) * 1995-09-15 2006-09-21 Saint-Gobain Glass France 光触媒コーティングを備えた基材
JPH1053439A (ja) 1996-08-02 1998-02-24 Asahi Kagaku Kogyo Co Ltd 酸化チタン光触媒皮膜のアンダーコート層形成用塗布剤およびアンダーコート層形成方法
JPH10273319A (ja) * 1997-03-27 1998-10-13 Taki Chem Co Ltd 金属酸化物ゾル用結合剤
JP2003003113A (ja) * 2001-06-19 2003-01-08 Lion Corp 光触媒含有コーティング剤
JP2005290369A (ja) * 2004-03-10 2005-10-20 Central Japan Railway Co 酸化チタンコーティング剤、及び酸化チタン塗膜形成方法

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Title
See also references of EP2133146A4

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110147060A1 (en) * 2008-05-23 2011-06-23 Minoru Osada Dielectric film, dielectric element, and process for producing the dielectric element
JP2013253009A (ja) * 2011-10-25 2013-12-19 National Institute For Materials Science スピンコート法によりナノシート単層膜からなる薄膜を製造する方法、それによる超親水化材料、酸化物薄膜用基板、および、誘電体材料

Also Published As

Publication number Publication date
KR101078946B1 (ko) 2011-11-01
JP5118067B2 (ja) 2013-01-16
EP2133146A1 (en) 2009-12-16
US20100279149A1 (en) 2010-11-04
CN101605607A (zh) 2009-12-16
JP5118068B2 (ja) 2013-01-16
KR101078948B1 (ko) 2011-11-01
EP2133146A4 (en) 2014-06-18
US9126193B2 (en) 2015-09-08
KR20090114418A (ko) 2009-11-03
US9012354B2 (en) 2015-04-21
WO2008096456A1 (ja) 2008-08-14
KR20090113850A (ko) 2009-11-02
CN101605606A (zh) 2009-12-16
JPWO2008096871A1 (ja) 2010-05-27
EP2133147A1 (en) 2009-12-16
CN101605607B (zh) 2012-09-19
US20100317512A1 (en) 2010-12-16
EP2133147A4 (en) 2014-06-18
JPWO2008096866A1 (ja) 2010-05-27
WO2008096871A1 (ja) 2008-08-14

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