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WO2008096696A1 - 超音波洗浄方法 - Google Patents

超音波洗浄方法 Download PDF

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Publication number
WO2008096696A1
WO2008096696A1 PCT/JP2008/051736 JP2008051736W WO2008096696A1 WO 2008096696 A1 WO2008096696 A1 WO 2008096696A1 JP 2008051736 W JP2008051736 W JP 2008051736W WO 2008096696 A1 WO2008096696 A1 WO 2008096696A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
ultrasonic wave
cleaning method
msec
cleaned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/051736
Other languages
English (en)
French (fr)
Inventor
Hiroshi Masaki
Nobuo Tsumaki
Terutaka Sahara
Yoshimitsu Kitada
Youichirou Matsumoto
Shin Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
University of Tokyo NUC
Original Assignee
Hitachi Plant Technologies Ltd
University of Tokyo NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Plant Technologies Ltd, University of Tokyo NUC filed Critical Hitachi Plant Technologies Ltd
Priority to KR1020097015019A priority Critical patent/KR101455614B1/ko
Priority to CN2008800040425A priority patent/CN101605615B/zh
Publication of WO2008096696A1 publication Critical patent/WO2008096696A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/003—Cleaning involving contact with foam
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)

Abstract

　本発明の一の態様にかかる超音波洗浄方法では、溶存ガスが存在する洗浄液に超音波を照射して被洗浄物を洗浄する場合において、少なくとも０．２ｍｓｅｃ以上連続的に超音波を照射する工程と、少なくとも０．１ｍｓｅｃ以上超音波の照射を停止する工程とを所定周期で繰り返す。これにより、超音波の透過を阻害する粗大気泡の発生を防止でき、洗浄に寄与するラジカルを効率よく発生させて、被洗浄物を効率よく洗浄することができる。
PCT/JP2008/051736 2007-02-07 2008-02-04 超音波洗浄方法 Ceased WO2008096696A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020097015019A KR101455614B1 (ko) 2007-02-07 2008-02-04 초음파 세정방법
CN2008800040425A CN101605615B (zh) 2007-02-07 2008-02-04 超声波洗涤方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007028438A JP5127257B2 (ja) 2007-02-07 2007-02-07 超音波洗浄方法
JP2007-028438 2007-10-17

Publications (1)

Publication Number Publication Date
WO2008096696A1 true WO2008096696A1 (ja) 2008-08-14

Family

ID=39681606

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051736 Ceased WO2008096696A1 (ja) 2007-02-07 2008-02-04 超音波洗浄方法

Country Status (5)

Country Link
JP (1) JP5127257B2 (ja)
KR (1) KR101455614B1 (ja)
CN (1) CN101605615B (ja)
TW (1) TWI422439B (ja)
WO (1) WO2008096696A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3515611A4 (en) * 2016-09-19 2020-05-13 ACM Research (Shanghai) Inc. METHOD AND DEVICE FOR CLEANING SUBSTRATES
CN113695307A (zh) * 2020-05-20 2021-11-26 天津嘉林科医有限公司 一种盛放阿托伐他汀钙的玻璃器皿的清洗方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101797567A (zh) * 2010-03-24 2010-08-11 北京泰克美科技有限公司 混合波长超声波处理器
US9151980B2 (en) 2012-04-25 2015-10-06 Shenzhen China Star Optoelectronics Technology Co., Ltd. Method for manufacturing liquid crystal panel
CN102662267A (zh) * 2012-04-25 2012-09-12 深圳市华星光电技术有限公司 液晶面板的制作方法
JP2015185813A (ja) * 2014-03-26 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
JP2016058665A (ja) * 2014-09-12 2016-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
CN108472558A (zh) * 2015-12-09 2018-08-31 盛美半导体设备（上海）有限公司 使用高温化学品和超声波装置清洗衬底的方法和装置
JP7059046B2 (ja) * 2018-02-27 2022-04-25 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、および物品の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2418967Y (zh) * 2000-04-12 2001-02-14 任蓬山 超声波管道除垢器
CN2520221Y (zh) * 2002-01-23 2002-11-13 陈胜军 超声波清洗油桶装置
US20040055621A1 (en) * 2002-09-24 2004-03-25 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
CN1712580A (zh) * 2004-06-22 2005-12-28 上海康维科技发展有限公司 一种沾有聚氨酯的过滤片或过滤芯的清洗方法
JP4442383B2 (ja) * 2004-10-12 2010-03-31 国立大学法人 東京大学 超音波洗浄装置
US7361231B2 (en) * 2005-07-01 2008-04-22 Ekc Technology, Inc. System and method for mid-pressure dense phase gas and ultrasonic cleaning

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3515611A4 (en) * 2016-09-19 2020-05-13 ACM Research (Shanghai) Inc. METHOD AND DEVICE FOR CLEANING SUBSTRATES
CN113695307A (zh) * 2020-05-20 2021-11-26 天津嘉林科医有限公司 一种盛放阿托伐他汀钙的玻璃器皿的清洗方法

Also Published As

Publication number Publication date
KR101455614B1 (ko) 2014-11-03
TWI422439B (zh) 2014-01-11
KR20090116708A (ko) 2009-11-11
JP2008188563A (ja) 2008-08-21
TW200904555A (en) 2009-02-01
CN101605615A (zh) 2009-12-16
JP5127257B2 (ja) 2013-01-23
CN101605615B (zh) 2010-12-08

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