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WO2008062730A1 - Process for producing plastic container coated with oxide thin film - Google Patents

Process for producing plastic container coated with oxide thin film Download PDF

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Publication number
WO2008062730A1
WO2008062730A1 PCT/JP2007/072296 JP2007072296W WO2008062730A1 WO 2008062730 A1 WO2008062730 A1 WO 2008062730A1 JP 2007072296 W JP2007072296 W JP 2007072296W WO 2008062730 A1 WO2008062730 A1 WO 2008062730A1
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WO
WIPO (PCT)
Prior art keywords
thin film
oxide thin
wire
plastic container
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/072296
Other languages
French (fr)
Japanese (ja)
Inventor
Masaki Nakaya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kirin Brewery Co Ltd
Original Assignee
Kirin Brewery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kirin Brewery Co Ltd filed Critical Kirin Brewery Co Ltd
Publication of WO2008062730A1 publication Critical patent/WO2008062730A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45572Cooled nozzles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45578Elongated nozzles, tubes with holes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Definitions

  • the present invention includes, as contents, for example, alcoholic beverages such as beer that dislike oxidation from the standpoint of quality and require no escape of carbon dioxide from the container wall, or soft drinks that similarly dislike oxidation. More particularly, the present invention relates to a beverage plastic container having a barrier property against oxygen gas and carbon dioxide gas. More specifically, as an oxygen gas and carbon dioxide gas barrier layer, at least one of the outer and inner surfaces is coated with an oxide thin film that can be deposited safely and at low cost in the food and beverage fields. It relates to a method of manufacturing plastic containers with excellent recyclability.
  • the present invention relates to a method for manufacturing a plastic container. Background art
  • This DLC film is a film having an amorphous three-dimensional structure composed of carbon atoms and hydrogen atoms, and is a hard carbon film having a hard and excellent insulating property, a high refractive index, and a very smooth morphology.
  • Patent Document 1 A general DLC film forming apparatus described in Patent Document 1 is as follows. That is, as shown in FIG. 1, a plastic container 5 is housed in an external electrode 2 disposed in a reaction chamber 1 having a carbon source gas introduction port 1A and an exhaust port 1B. After the carbon source gas is introduced from the introduction port 1A, a high frequency power is applied between the internal electrode 3 and the external electrode 2 from the high frequency power source 4 to excite the carbon source gas, thereby generating a plastic container 5 A DLC film is formed on the inner surface.
  • Patent Document 2 there is a technique for forming a silicon oxide thin film (SiOx) in a small plastic container instead of the DLC film (see, for example, Patent Document 2).
  • a silicon oxide thin film is formed by plasma CVD as in Patent Document 1.
  • a technique for forming a silicon nitride film on the surface of a plastic film by catalytic chemical vapor deposition which is a film formation method other than plasma CVD (see, for example, Patent Document 3).
  • Patent Document 3 when a silicon nitride film is formed, methylsilane, dimethylsilane, or trimethylsilane is used as a source gas (Patent Document 3, Paragraph 0004, Paragraph 0022).
  • Patent Document 1 Japanese Patent No. 2788412
  • Patent Document 2 Japanese Utility Model Publication No. 5-35660
  • Patent Document 3 Japanese Patent Application Laid-Open No. 2004-217966 (Paragraph 0004, Paragraph 0022)
  • the plasma CVD film forming apparatus uses relatively expensive equipment, it is not always possible to manufacture a plastic container having a gas barrier property at a low price.
  • the cost of the device itself is less than the cost of the plasma CVD film forming device.
  • the catalytic chemical vapor deposition method can form a film on a planar object such as a plastic sheet, there is no report that a film can be formed on a three-dimensional object such as a plastic container.
  • the present invention is mainly directed to plastic containers for beverages and foods.
  • plastic containers for beverages and foods In this area, there are significant cost constraints on products associated with handling beverages and food. It also features the use of highly safe methods and materials for the production process and product containers. Therefore, the use of pyrophoric raw materials represented by the above silanes and alkylaluminums is not practical from the viewpoint of safety management cost and safety awareness.
  • Such raw materials are, for example, designated as special high-pressure gas and hazardous material type 3 in Japan.
  • raw materials containing halogens are generally avoided and are not practical from the viewpoint of the present invention.
  • an object of the present invention is to provide a non-naturally-occurring container having a three-dimensional shape made of plastic at room temperature in a method for producing a gas-barrier thin film-coated plastic container that does not rely on these non-practical raw materials.
  • a method for producing a gas-barrier thin film-coated plastic container that does not rely on these non-practical raw materials.
  • Using an ignitable raw material and ozone it is possible to form a thin film with gas barrier properties at a low temperature safely and at high speed, and an inexpensive manufacturing method that can be operated in a manufacturing apparatus that does not require expensive equipment. Is to provide.
  • containers in the beverage / food field are required to have translucency / light-shielding properties and coloration in order to protect the contents, visually check the quality, and improve the appearance.
  • practical translucent / light-shielding properties and coloration without directly coloring the resin can be controlled easily with a relatively high degree of freedom. It is also an object of the present invention to provide a manufacturing method to be applied to the container.
  • the present inventor has intensively developed to solve the above-mentioned problems.
  • the wire is heated and energized, and a highly safe and non-pyrophoric raw material is heated together with ozone gas with this hot wire.
  • an oxide having a gas barrier property derived from a non-pyrophoric raw material can be formed with good adhesion, and the present invention was completed.
  • a wire means an object that can heat an electric resistor by energization to several hundred degrees or more using a general industrial power source. Typically, it is a metal wire, but a conductive metal compound or a carbon rod-like body is also included in this concept. Furthermore, an object having a carrier 'coating on these objects is also included in the concept.
  • the hot wire means a wire that is resistance-heated by energization.
  • the method for producing a plastic container coated with an oxide thin film includes a step of setting the inside of a vacuum chamber containing the plastic container to a predetermined pressure equal to or lower than atmospheric pressure, A process of energizing a wire disposed inside to generate heat above a predetermined temperature to form a hot wire, and a non-pyrophoric material containing a key element or metal element supplied as a constituent element to the inside of the vacuum chamber Heating the raw material and ozone gas with the hot wire, and then bringing the raw material and ozone gas into contact with at least one of the inner surface and the outer surface of the plastic container to form an oxide thin film derived from the non-pyrophoric raw material; It is characterized by having.
  • the plastic container includes a step of bringing the plastic container into the vacuum chamber via a differential pressure mechanism, and the plastic container includes the A step of transporting the plastic container so that the surface of the plastic container approaches a desired distance from the wire installed in the transport path in the vacuum chamber; and the plastic container is disposed outside the vacuum chamber. And a step of unloading via a differential pressure mechanism. It is also possible to mass-produce plastic containers coated with oxide thin films.
  • the distance between the inner surface or outer surface of the plastic container and the hot wire is 5 to 50 mm, and the inside of the vacuum chamber is The pressure is preferably 10 to 100 Pa.
  • an oxide thin film can be formed at high speed on the surface of a plastic container.
  • the plastic container coated with an oxide thin film it is preferable to irradiate the plastic container with ultraviolet rays in the step of forming the oxide thin film.
  • the surface of the plastic container can be sterilized.
  • UV irradiation promotes the decomposition of ozone to increase the oxidizing power and promotes the oxidation of non-pyrophoric raw materials.
  • the non-pyrophoric raw material and ozone gas are heated by the hot wire. The reaction can proceed.
  • a non-pyrophoric key organic compound is used as the non-self-igniting raw material, It is decomposed by catalytic reaction to form a SiO thin film as the oxide thin film, or a non-pyrophoric aluminum-containing organic compound is used as the non-pyrophoric raw material, and a thermal decomposition reaction is performed with the hot wire.
  • an AIO thin film is formed as the oxide thin film by being decomposed by a catalytic reaction.
  • non-pyrophoric raw materials such as non-pyrophoric key organic compounds or non-pyrophoric aluminum-containing organic compounds such as silane-based materials or trimethylaluminum
  • pyrophoric raw materials such as non-pyrophoric key organic compounds or non-pyrophoric aluminum-containing organic compounds such as silane-based materials or trimethylaluminum
  • a non-pyrophoric raw material and ozone gas are simultaneously supplied and heated with a hot wire, and then thermal decomposition and oxidation are sufficiently advanced to form a SiO thin film or an AIO thin film with good adhesion to the substrate.
  • the supply amount of the ozone gas is an amount such that carbon remaining in the oxide thin film is substantially zero. Is preferred. If the supply amount of ozone gas is small, carbon remains in the oxide thin film. If the supply amount is sufficient or more, carbon does not remain in the oxide thin film.
  • the gas nooricity becomes the best.
  • the fact that carbon is substantially zero means that in the case of a SiOx thin film as a specific example, the amount of carbon in the oxide thin film is 5 atom% or less.
  • the supply amount of the ozone gas is set so that carbon remains in the oxide thin film when the oxide thin film is formed.
  • the amount of carbon remaining in the oxide thin film is set so that the amount of carbon remaining in the oxide thin film becomes substantially zero after that, and the carbon content of the oxide thin film differs in the thickness direction. It is preferable to use a gradient composition thin film. If the supply amount of ozone gas is small! /, And carbon remains in the oxide thin film and the supply amount is sufficient or more, the oxide thin film No carbon remains in the film. If carbon remains in the oxide thin film, the adhesion to the substrate becomes strong.
  • the gas barrier property is the best. Therefore, carbon is left in the oxide thin film on the substrate surface side, and a gradient composition film is formed so that no carbon remains on the surface side of the oxide thin film, thereby providing excellent adhesion to the substrate and gas barrier properties. Can be a good oxide thin film.
  • the wire 1 is formed mainly of a metal or carbon that does not substantially volatilize when the hot wire is used. It is preferable to become. Regardless of the composition of the wire, a non-pyrophoric raw material is thermally decomposed to obtain an oxidized oxide thin film.
  • the wire is formed mainly of a metal, a conductive metal compound, or carbon, and carbon when used as the hot wire. It is preferable that volatilization of the key element or metal element and the addition of the carbon, key element or metal element into the oxide thin film become an additive component.
  • a component derived from a non-pyrophoric raw material as a main component
  • a component derived from a wire as an additive component, the types of functional thin films that can be formed can be easily diversified.
  • the metal element functioning as the color center is cobalt, manganese, copper, iron, chromium, antimony, force donium, sulfur, Examples include selenium, gold, nickel, uranium, vanadium, silver, molybdenum, tin, tungsten, bismuth or erbium.
  • the additive calorie component functions as a cross-linking material in the oxide thin film. This is because the physicochemical stability of the oxide thin film can be improved or the refractive index can be adjusted.
  • the additive component that functions as the cross-linking material is sodium, potassium, lithium, lead, carbon, or titanium. Is included.
  • a volatile substance is applied or supported on the surface of the wire, and the volatile substance is volatilized when the hot wire is formed. Therefore, it is possible to select an aspect that is taken into the oxide thin film and becomes an additive component. This is because it is possible to form an oxide thin film in which a component derived from a non-pyrophoric raw material is a main component and a component derived from a volatile substance supported on a wire is an additional component.
  • the wire 1 contains at least one component of carbon, silicon, or metal that volatilizes when the hot wire is used.
  • the non-pyrophoric raw material such as a pyrophoric key organic compound or a non-pyrophoric aluminum-containing organic compound, it becomes a non-pyrophoric raw material, and the vapor is oxidized to become one of the main components of the oxide thin film.
  • the non-pyrophoric raw material such as a pyrophoric key organic compound or a non-pyrophoric aluminum-containing organic compound, it becomes a non-pyrophoric raw material, and the vapor is oxidized to become one of the main components of the oxide thin film.
  • the wire contains at least one component of carbon, silicon, or metal that volatilizes when the hot wire is used.
  • the non-pyrophoric raw material is composed of at least one component of carbon, carbon or metal volatilized from the hot wire. It is possible to select an embodiment in which the vapor is an oxide thin film in which the vapor is oxidized. This is because an oxide thin film whose main component is a wire-derived component can be formed. If the steam is derived from wire, the safety will be further improved and the raw material introduction means will be simplified. Further, the composition of the thin film can be easily controlled by adjusting the composition of the wire.
  • the steam is saturated steam pressure 10- 4 Pa or more below 2000 ° C
  • it is a vapor of a simple substance of a metal or a compound containing the metal.
  • a sufficient film formation rate for example, a film formation rate of 2.5 nm / second or more can be obtained.
  • these additional vapors may be added.
  • a volatile substance is applied or supported on the surface of the wire, and the volatile substance is volatilized when the hot wire is formed.
  • the volatile substance volatilizes and the volatilization occurs.
  • the non-pyrophoric raw material can be selected as a main component of the oxide thin film.
  • the non-self-igniting raw material is a volatile substance applied or supported on the surface of the wire, In this case, it is possible to select a mode in which the volatile substance volatilizes and becomes the main component of the oxide thin film. This is because an oxide thin film whose main component is a component derived from a volatile substance can be formed. If it is derived from volatile substances, the safety will be high and the raw material introduction means will be simplified.
  • the volatile substance is molybdenum, copper, aluminum, palladium, tungsten, silver, or a compound containing these.
  • Oxide thin films with different colors depending on the metal species can be obtained. The invention's effect
  • a non-pyrophoric raw material and ozone are used in a container having a three-dimensional shape made of plastic at room temperature. It is possible to form a thin film having a low temperature.
  • This manufacturing method is an inexpensive manufacturing method that can be operated with manufacturing equipment that does not require expensive equipment.
  • FIG. 11 It is a configuration diagram of a conventional DDLLCC film forming apparatus. .
  • FIG. 22 is a schematic schematic diagram showing one form of the film deposition apparatus apparatus according to the eleventh form, and ((aa )) Is when the wire is in the shape of a straight line, ((bb)) is when the wire is in the shape of a spring if it is cocoyl, and ((cc)) is If the wire has a zigzag line shape, then .
  • FIG. 33 Another form of the positional relationship between the wireless wire and the raw material feed gas supply pipe is shown. .
  • FIG. 44 is a schematic schematic diagram showing one form of the film deposition apparatus according to the twenty-second form, and ((aa )) Is when the wire is linear, and ((bb)) is when the wire is of a spring-like shape. .
  • FIG. 55 A cross-sectional view of ⁇ -- ⁇ '' is shown. .
  • FIG. 2 is a schematic conceptual diagram of a device for sulling and laying down. .
  • FIG. 2 is a schematic conceptual diagram of an apparatus for laying down. .
  • FIG. 2 is a schematic conceptual diagram of a device for depositing a film. .
  • FIG. 1100 A schematic conceptual diagram for explaining the container cooling / cooling means, ((aa)) is When depositing a film on the inner surface of the container, ((bb)) is on the outer surface of the polypropylene container. In the case of depositing a film on a film, .
  • FIG. 1111 Another form of the thin film film forming chamber shown in FIG. 99 is shown. .
  • FIG. 2 is a schematic diagram showing the film forming apparatus according to the first embodiment, where (a) is a wire having a linear shape, (b) is a wire having a coil spring shape, and (c) is a zigzag wire. In the case of a line shape. However, FIGS. 2 (b) and 2 (c) are partially enlarged views of the source gas supply pipe 23. FIG. Unless otherwise specified, “FIG. 2” will be described as “FIG. 2 (a)”.
  • the film forming apparatus 100 shown in FIG. 2 includes a vacuum chamber 6 that accommodates a plastic container 11 and a vacuum chamber 6.
  • An evacuation pump (not shown) that evacuates the inside of the plastic container 11 is detachably disposed, and supplies a raw material gas (non-pyrophoric raw material) and ozone gas into the plastic container 11.
  • a raw material gas supply pipe 23 formed of the above material, a wire 18 supported by the raw material gas supply pipe 23, and a heater power source 20 that energizes the wire 18 to generate heat.
  • the vacuum chamber 6 includes a lower chamber 13 and an upper chamber 15 that is detachably attached to the upper portion of the lower chamber 13 and seals the inside of the lower chamber 13 with an O-ring 14. .
  • the upper chamber 15 has an upper and lower drive mechanism (not shown) and moves up and down as the plastic container 11 is carried in and out.
  • the internal space of the lower chamber 13 is formed to be slightly larger than the outer shape of the plastic container 11 accommodated therein.
  • the plastic container 11 is a beverage bottle, but may be a container used for other purposes.
  • the inside of the vacuum chamber 6, particularly the inside of the lower chamber 13, has an inner surface 28 that is a black inner wall or an inner surface that has a surface roughness in order to prevent reflection of light emitted as the wire 18 generates heat. (Rmax) O. It preferably has irregularities of 5 m or more.
  • the surface roughness (Rmax) is measured using, for example, a surface roughness measuring device (DEKTAK3 manufactured by ULVAC TECHNO CORPORATION).
  • plating treatment such as black nickel plating and black chrome plating
  • chemical film treatment such as Raydent's black dyeing, or applying black paint and coloring.
  • a cooling means 29 such as a cooling pipe through which the cooling water flows inside the vacuum channel 6 (not shown) or outside (FIG. 2) to prevent the temperature of the lower chamber 13 from rising.
  • a cooling means 29 such as a cooling pipe through which the cooling water flows inside the vacuum channel 6 (not shown) or outside (FIG. 2) to prevent the temperature of the lower chamber 13 from rising.
  • a chamber 30 made of a transparent material through which the radiated light generated from the energized wire 18 can pass for example, a glass chamber
  • the temperature of the glass chamber in contact with the plastic container 11 rises. Difficult to plastic The thermal effect on the container 11 can be further reduced.
  • the source gas supply pipe 23 is supported so as to hang downward at the center of the inner ceiling surface of the upper chamber 15.
  • the non-pyrophoric raw material and ozone gas flow into the raw material gas supply pipe 23 through the flow rate adjusters 24a to 24b and the valves 25a to 25c.
  • the source gas supply pipe 23 preferably has a cooling pipe and is integrally formed.
  • the inner pipe of the double pipe is a source gas channel 17, one end of which is connected to the gas supply port 16 provided in the upper chamber 15, and the other end is a gas.
  • the blowout hole is 17x.
  • the outer pipe line of the double pipe is a cooling water flow path 27 for cooling the raw material gas supply pipe 23, and serves as a cooling pipe.
  • the wire 18 is energized and generates heat to form a hot wire, the temperature of the source gas channel 17 rises.
  • cooling water circulates in the cooling water passage 27. That is, at one end of the cooling water flow path 27, cooling water is supplied from a cooling water supply means (not shown) connected to the upper chamber 15, and at the same time, the cooled cooling water is returned to the cooling water supply means.
  • the material of the source gas supply pipe 23 is preferably an insulator and has a high thermal conductivity.
  • a ceramic tube formed of a material mainly composed of aluminum nitride, silicon carbide, silicon nitride, or aluminum oxide, or a material mainly composed of aluminum nitride, silicon carbide, silicon nitride, or aluminum oxide.
  • a metal tube whose surface is coated is preferable. The wire can be stably energized, durable, and the heat generated by the wire can be heated by heat conduction.
  • the raw material gas supply pipe 23 may be configured as follows as another form (not shown). That is, the source gas supply pipe is a double pipe and the outer pipe is used as a source gas flow path, and a hole, preferably a plurality of holes, is formed in the side wall of the outer pipe.
  • the inner pipe of the double pipe of the source gas supply pipe is It is formed by a dense tube, and the cooling water flows as a cooling water flow path.
  • the wire is the force S that is routed along the side wall of the source gas supply pipe, and the source gas and ozone that have passed through the hole provided in the side wall of the outer pipe are in contact with the wire in the portion along the side wall, and the pyrolyzed source material is It can be oxidized efficiently.
  • the length of the source gas supply pipe 23 is preferably a force S so that the distance L1 from the gas blowing hole 17x to the bottom of the plastic container 11 is 5 to 50 mm. It is more preferable than forming force S to be 15 to 30 mm. The uniformity of the film thickness is improved. By setting the distance to 5 to 50 mm, a uniform thin film can be formed on the inner surface of the plastic container 11.
  • the distance is greater than 50 mm, it will be difficult to form a thin film on the bottom of the plastic container 11, and if the distance is less than 5 mm, it will be difficult to blow out the source gas, or the gas blowing holes on the inner surface of the plastic container 11 Film formation near 17x tends to be excessive.
  • the wire 18 is heated by energization to form a hot wire, thereby thermally decomposing the non-pyrophoric raw material and the ozone gas. Oxidation of non-pyrophoric raw materials is promoted by the pyrolyzed ozone, and an oxide thin film is formed on the inner surface of the plastic container 11.
  • the wire 18 is preferably made of a metal, particularly an oxidation-resistant metal.
  • a metal particularly an oxidation-resistant metal.
  • the wire 18 may be a carbon-based object such as carbon fiber.
  • the wire 18 is not only a hot wire as a heating means, but may also be a thermal catalyst by a catalytic chemical vapor deposition method. However, tungsten wire, which is normally used as a thermal catalyst for catalytic chemical vapor deposition, should be avoided in an atmosphere containing ozone gas because it deteriorates when oxidized.
  • the wire 18 is formed in a wiring shape, and one end of the wire 18 is connected to a connection portion 26a that is a connection portion between the wiring 19 and the wire 18 provided below the fixed portion in the upper chamber 15 of the source gas supply pipe 23. The And it is supported by the insulating ceramic member 35 provided in the gas blowing hole 17x which is the tip portion.
  • the wire 18 is the source gas Since it is supported along the side surface of the supply pipe 23, the supply pipe 23 is arranged so as to be positioned substantially on the main axis of the internal space of the lower chamber 13.
  • the wire 18 is shown arranged around the source gas supply pipe 23 so as to be parallel to the axis of the source gas supply pipe 23.
  • FIG. 2 (a) shows the case where the wire 18 is disposed outside the gas blowing hole 17x in the vicinity of the gas blowing hole 17x of the source gas supply pipe 23.
  • the non-pyrophoric raw material and ozone gas blown out from the gas blowing hole 17x are likely to come into contact with the wire 18, so that the non-pyrophoric raw material can be efficiently decomposed and oxidized.
  • the outer diameter of the source gas supply pipe 23 including the wire 18 needs to be smaller than the inner diameter of the mouth portion 21 of the plastic container. This is because the raw material gas supply pipe 23 including the wire 18 is inserted through the opening 21 of the plastic container. Therefore, if the wire 18 is separated from the surface of the raw material gas supply pipe 23 more than necessary, the raw material gas supply pipe 23 is easily contacted when inserted from the mouth portion 21 of the plastic container.
  • the width of the wire 18 is suitably 10 mm or more and (inner diameter of the mouth part-6) mm or less in consideration of the positional deviation when inserting from the mouth part 21 of the plastic container.
  • the inner diameter of the mouth 21 is approximately 21 ⁇ 7 ⁇ 39.8 mm.
  • the upper limit temperature when the wire 18 is heated is not higher than the temperature at which the wire softens.
  • the operating temperature of the hot wire varies depending on the material of the wire. If Ir, the force that can raise the temperature to the softening temperature is 300 to 1800 ° C, for example, S preferably 800 to 1100 ° C It is more preferable that
  • the reaction at a low temperature of 300 ° C. is possible as described above even with the hot wire method instead of the catalytic chemical vapor deposition method. Generally, wire If one and the substrate are heated to some extent, the film quality tends to be better.
  • the plastic substrate cannot be subjected to much heat load so as not to be thermally deformed. In this respect, if it is 800-1100 ° C, problems caused by heat load from the wire will occur for several hundred seconds or more compared to containers made of plastic materials such as PET resin, which are common in the beverage and food fields. This is the preferred setting.
  • the wire 18 has a portion obtained by processing a wire into a coil spring shape as shown in Fig. 2 (b) in order to increase the chance of contact with the non-pyrophoric raw material and ozone gas. It is preferable.
  • the coil spring shape includes not only a cylindrical shape but also a conical shape, a barrel shape or a zigzag shape, and an unequal pitch shape in which the pitch between these windings is changed.
  • Fig. 2 (c) it has a part processed into a zigzag line shape! Or! / Has a part of wire rod processed into a wavy line shape! /, But it is good (not shown). Even in these!
  • the wire 18 is preferably disposed along the blowing direction of the non-pyrophoric raw material and ozone gas. This increases the chance that non-pyrophoric raw materials and ozone gas 33 will come into contact with wire 18.
  • the method of fixing the source gas supply pipe 23 of the wire 18 may be as follows as another form (not shown). That is, the raw material gas supply pipe is a double pipe, and the outer pipe is formed of a porous pipe having a porosity of 10 to 40% using a raw material gas channel. A wire may be wound directly around the porous outer tube. In addition to improving the stability of fixing the wire, the non-pyrophoric raw material and ozone gas are also released from the side wall of the outer tube together with the gas blowing holes, so that the contact efficiency with the wire is improved.
  • the inner pipe of the double pipe of the source gas supply pipe is formed by a dense pipe, and the cooling water flows as a cooling water flow path.
  • FIG. 3 shows another form of the positional relationship between the wire 18 and the source gas supply pipe 23.
  • the wire 18 is disposed in the raw material gas supply pipe 23.
  • the wires 18 are arranged in two rows along the blowing direction of the non-pyrophoric raw material and the ozone gas 33. This increases the chances of non-pyrophoric raw materials and ozone gas 33 coming into contact with wire 18.
  • the wire 18 is disposed inside the source gas supply pipe, the distance between the wire and the surface of the plastic container can be increased, so that occurrence of thermal deformation of the plastic container can be suppressed.
  • the wires 18a and 18b It is preferable that the portions are arranged to face different directions. In Fig.
  • the wires are in a vertical and horizontal relationship.
  • the shape of the cross section of the source gas supply pipe 23 is a square in FIG. 3, but may be a circle, an ellipse or a rectangle.
  • the tube diameter is inserted through the mouth of the plastic container in order to form a film on the inner surface of the plastic container, it is necessary to make it smaller than the diameter of the part.
  • a heater power supply 20 is connected to the wire 18 via connection portions 26a and 26b and a wiring 19. By causing electricity to flow through the wire 18 by the heater power source 20, the wire 18 generates heat.
  • the draw ratio at the time of forming the plastic container 11 is small from the mouth portion 21 of the plastic container to the shoulder of the container, if the wire 18 that generates heat at a high temperature is placed nearby, the plastic container 11 is deformed by heat.
  • the shoulder force of the plastic container 11 is heated unless it is separated from the lower end of the plastic container mouth 21 by the positional force S of the connection parts 26a and 26b, which is the connection point between the wiring 19 and the wire 18.
  • the wire 18 is preferably arranged so that its upper end is located 5 to 50 mm below the lower end of the mouth 21 of the plastic container. That is, it is preferable that the distance L2 between the connecting portions 26a, 26b and the lower end of the mouth portion 21 is 5 to 50 mm! /. Thermal deformation of the shoulder portion of the container can be suppressed.
  • an exhaust pipe 22 is communicated with the internal space of the upper chamber 15 via a vacuum valve 8 so that air in the reaction chamber 12 inside the vacuum chamber 6 is exhausted by an exhaust pump (not shown). It has become.
  • FIG. 4A and 4B are schematic views showing one embodiment of a film forming apparatus according to the second embodiment.
  • FIG. 4A shows a case where the wire is linear
  • FIG. 4B shows a case where the wire has a coil spring shape.
  • Fig. 4 (b) is a schematic diagram of the wire. Unless otherwise specified, “Fig. 4” will be explained as “Fig. 4 (a)”.
  • the film deposition apparatus 200 shown in FIG. 4 includes a vacuum chamber 60 that accommodates the plastic container 11, an exhaust pump (not shown) that evacuates the vacuum chamber 60, and a plastic container.
  • Heat is generated by energizing the wire 18 disposed around the vessel 11, the raw gas pipe 31 for supplying the non-pyrophoric raw material and the ozone gas to the space outside the plastic container 11 in the vacuum chamber 60, and the wire 18. And a heater power source 20 to be operated.
  • the opening of the plastic container 11 is fixed by the bottle rotation mechanism 32, and the plastic container 11 is arranged so that the bottom does not contact inside the vacuum chamber 60! /
  • the vacuum chamber 60 has a space for accommodating the plastic container 11 therein, and this space serves as a reaction chamber 12 for forming a thin film.
  • the vacuum chamber 60 includes a lower chamber 63 and an upper chamber 65 which is detachably attached to the upper portion of the lower chamber 63 and seals the inside of the lower chamber 63 with an O-ring 14.
  • the upper chamber 65 has an upper and lower drive mechanism (not shown) and moves up and down as the plastic container 11 is carried in and out.
  • the inner space of the lower chamber 63 is formed larger than the outer shape of the plastic container 11 so that the wire 18 can be disposed around the plastic container 11 accommodated therein!
  • the wire 18 is connected at one end thereof to a connecting portion 79a which is a connecting portion between the wiring 19 and the wire 18.
  • the wire 18 is linearly arranged from the inner side surface of the lower chamber 63 to the side surface facing the bottom surface, starting from the connection portion 79a, and then folded back from there. Then, the other end is connected to the connecting portion 79b.
  • FIG. 5 shows an AA ′ cross-sectional view.
  • the wire 18 and the plastic container 11 are equally spaced on the left and right sides in the figure.
  • the wire 18 is arranged so that the distance from the outer surface of the plastic container 11 is constant!
  • FIG. 6 shows a cross-sectional view along AA ′.
  • the wire 18 and the plastic container 11 are arranged at equal intervals on the top, bottom, left and right in the figure.
  • the uniformity of film formation can be improved by forming the plastic container 11 while rotating the plastic container 11 around the main axis by the bottle rotating mechanism 32.
  • the wire 18 is a pair, the effect of improving the uniformity of film formation is high.
  • each is wound in parallel and a plurality of ring-shaped wires are arranged in parallel.
  • the uniformity of the film thickness can be improved.
  • the plastic container 11 may be formed by rotating the plastic container 11 around the main axis by the bottle rotating mechanism 32.
  • the wires 18 be arranged at a distance of 5 cm or more. It promotes the oxidation of non-pyrophoric raw materials without causing thermal damage to the plastic container, making it easy to obtain a uniform film thickness.
  • the material of the wire 18 may be the same as that of the first form.
  • the wire 18 preferably has a portion obtained by processing a wire into a coil spring shape as shown in Fig. 4 (b). That's right.
  • the coil spring shape includes not only a cylindrical shape but also a conical shape, a barrel shape, or a stitch shape, and an unequal pitch shape in which the pitch between these windings is changed.
  • the wire 18 is disposed along the blowing direction of the non-pyrophoric raw material and ozone gas.
  • a plurality of wires 18 are arranged, or the wires 18 are given a vector component in the non-pyrophoric raw material and ozone gas blowing direction. This increases the chances of non-pyrophoric raw materials and ozone gas coming into contact with the wire.
  • One end of the source gas pipe 31 is connected to a gas supply port 66 provided on the bottom surface of the lower chamber 63.
  • a source gas supply pipe 73 is connected to the other end of the source gas pipe 31 and a branch in the middle thereof.
  • a plurality of source gas supply pipes 73 are provided, and a gas blowing hole 77x is provided at the tip of each.
  • the non-pyrophoric raw material and the ozone gas 33 flow into the raw material gas supply pipe 73 through the raw material gas pipe 31, the gas supply port 66, the flow regulators 24a to 24b, and the valves 25a to 25c. This makes it non-pyrophoric
  • the raw material and ozone gas 33 are blown out from the gas blowing holes 77 ⁇ .
  • the gas blowing holes 77 ⁇ are all directed to the outer surface of the plastic container 11, and it is possible to spray the non-pyrophoric raw material and ozone gas on the outer surface!
  • a wire 18 is disposed on the outlet side of the gas blowing hole 77 ⁇ . As a result, the contact between the wire 18 and the non-pyrophoric raw material and ozone gas often occurs, so that the oxidation of the non-pyrophoric raw material can be promoted.
  • the source gas supply pipe 73 is a single metal pipe. As in the case of the first embodiment, a double pipe may be used for flowing cooling water. Further, the same ceramic tube as in the first embodiment or a metal tube whose surface is coated with a ceramic material may be used.
  • the length of the source gas supply pipe 73 is preferably formed such that the distance L3 from the gas blowing hole 77 ⁇ to the outer surface of the plastic container 11 is 5 to 50 mm.
  • a uniform thin film can be formed on the outer surface of the plastic container 11 at a distance of 5 to 50 mm. If the distance is larger than 50 mm, a thin film is formed on the outer surface of the plastic container 11, and if the distance is smaller than 5 mm, the raw material gas can be blown out.
  • a wire may be arranged in the source gas supply pipe as in the case of FIG.
  • the inner diameter of the source gas supply pipe is increased to, for example, 10 mm or more, the uniformity of the film distribution is improved.
  • the wire is arranged inside the raw material gas supply pipe, the distance between the wire and the surface of the plastic container can be increased, so that occurrence of thermal deformation of the plastic container can be suppressed.
  • a cooling means 29 such as a cooling pipe through which cooling water flows is provided inside or outside the vacuum chamber 60 to prevent the temperature of the lower chamber 63 from rising. preferable.
  • a heater power source 20 is connected to the wire 18 via connection portions 79a and 79b and a wiring 19. By causing electricity to flow through the wire 18 by the heater power source 20, the wire 18 generates heat. Also in this embodiment, the working temperature of the wire 18 is preferably 300 to 1800 ° C. 8 00 ⁇ ; 1100 ° C is more preferred! /
  • an exhaust pipe 22 is communicated with the internal space of the upper chamber 65 via a vacuum valve 8, so that air in the reaction chamber 12 inside the vacuum chamber 60 is exhausted by an exhaust pump (not shown). It has become.
  • the ozone gas silently discharges, for example, oxygen gas from an oxygen cylinder using a commercially available relatively inexpensive ozone generator. It can be obtained from a gas cylinder (manufactured by Iwatani Corporation) that contains ozone gas stably!
  • FIG. 7 is a conceptual diagram of a film forming apparatus for simultaneously forming an oxide thin film on the inner surfaces of a plurality of plastic containers.
  • a large number of plastic containers 11 are positioned and arranged in one lower chamber 13, and wires 18 and source gas supply pipes 23 similar to those in FIG. 2 are inserted into the respective mouths of the plastic containers 11 to oxidize them.
  • a thin film is formed.
  • FIG. 8 is a conceptual diagram of a film forming apparatus for simultaneously forming a gas barrier thin film on the outer surfaces of a plurality of plastic containers 11.
  • a large number of plastic containers 11 are positioned and arranged in one lower chamber 63, and wires 18 are arranged so as to surround each plastic container 1 1 and non-pyrophoric from the source gas supply pipe 73.
  • the raw material and ozone gas are brought into contact with the wire 18 and then sprayed onto the plastic container 11.
  • the mouth is fixed to the bottle rotating mechanism 32, and a thin film is formed on the outer surface of the plastic container 11 while rotating.
  • FIG. 9 is a conceptual diagram of a film forming apparatus for forming a gas barrier thin film simultaneously on the outer surfaces of a plurality of plastic containers in-line.
  • the plastic container is moved by the conveyor in the order of the bottle alignment chamber 40, the exhaust chamber 41, the thin film formation chamber 42, the atmospheric leak chamber 43, and the take-out chamber 44 in the vacuum chamber.
  • the outside of the vacuum chamber is under atmospheric pressure, but the thin film formation chamber 42 is kept at a constant pressure by the pressure difference mechanism.
  • the exhaust chamber 41 and the air leak chamber 43 are included in the differential pressure mechanism.
  • wires 18 are arranged along the side walls of the chamber.
  • the desired distance between the wire 18 and the surface of the plastic container for example, 5 to 50 mm is approached.
  • the source gas is blown out toward the wire 18 to fill the chamber with the non-pyrophoric raw material and ozone, and film formation is performed when the plastic container 11 passes through the thin film forming chamber 42.
  • the same vacuum chamber can be used regardless of the shape of the container, and no high frequency power source is required.
  • a film can be formed on the container. This makes the apparatus less expensive than a film forming apparatus using a high-frequency power source.
  • FIG. 10A shows a case where a film is formed on the inner surface of the plastic container
  • FIG. 10B shows a case where a film is formed on the outer surface of the plastic container. As shown in FIG.
  • the non-pyrophoric raw material, which is hot air, and ozone gas 33 are sprayed on the inside of the plastic container 11, and the film forming apparatus of the first form is cooled on the outer surface of the plastic container 11.
  • a container cooling means 51 for applying the liquid or gas 50.
  • the container cooling means 51 is a water tank when the plastic container 11 is immersed in a liquid such as water, and a shower when the plastic container 11 is showered with a liquid such as water.
  • a gas such as cooling nitrogen gas or cooling carbon dioxide gas is blown into the plastic container 11, it is a blower. Cooled nitrogen gas can be easily obtained by using liquid nitrogen and cooled carbon dioxide gas by using dry ice. As shown in FIG.
  • the non-pyrophoric raw material that becomes hot air and the ozone gas 33 are sprayed toward the outer surface of the plastic container 11, and the second embodiment of the film forming apparatus is an inner surface of the plastic container 11.
  • container cooling means 51 for applying the cooled liquid or gas 50 thereto.
  • the container cooling means 51 is a liquid filling device when filling a plastic container 11 into a liquid such as water, and when blowing a gas such as cooling nitrogen gas or cooling carbon dioxide gas to the inner surface of the plastic container 11.
  • a gas such as cooling nitrogen gas or cooling carbon dioxide gas
  • FIG. 11 shows another embodiment of the thin film forming chamber 42 shown in FIG.
  • the raw material gas supply pipes 23 and the container cooling means 51 are alternately arranged along the moving direction of the plastic container 11.
  • Plastic container 11 is moved by conveyor (conveyance path, not shown) It is made to rotate.
  • the source gas supply pipe 23 uses the type shown in FIG.
  • the container cooling means 51 uses a type in which cooled nitrogen gas is blown.
  • the method for producing a plastic container coated with an oxide thin film is a process of setting the inside of the vacuum chamber 6 containing the plastic container 11 to a predetermined pressure of atmospheric pressure or less (hereinafter referred to as a decompression process). And a process of supplying heat to a wire 18 disposed inside the vacuum chamber 6 to generate heat above a predetermined temperature to form a hot wire (hereinafter referred to as a hot wire process), and supplying to the inside of the vacuum chamber 6
  • non-pyrophoric raw material containing ozone or metal element as constituent element and ozone gas 33 are heated by hot wire 18 and then brought into contact with the inner surface of plastic container 11 to make non-pyrophoric raw material.
  • Forming an oxide thin film derived therefrom hereinafter referred to as a film forming step).
  • a vent (not shown) is opened to open the vacuum chamber 6 to the atmosphere.
  • the plastic container 11 is inserted and accommodated from the upper opening of the lower chamber 13.
  • the positioned upper chamber 15 is lowered, and the source gas supply pipe 23 attached to the upper chamber 15 and the wire 18 fixed thereto are inserted into the plastic container 11 from the mouth portion 21 of the plastic container.
  • the top When the chamber 15 contacts the lower chamber 13 via the O-ring 14, the reaction chamber 12 is closed. At this time, the distance between the inner wall surface of the lower chamber 13 and the outer wall surface of the plastic container 11 is kept substantially uniform, and the distance between the inner wall surface of the plastic container 11 and the wire 18 is also kept substantially uniform. Lean! /
  • the container according to the present invention includes a container that is used with a lid, a stopper, or a seal, or a container that is used without being used.
  • the size of the opening is determined according to the contents.
  • the plastic container includes a plastic container having a predetermined thickness having moderate rigidity and a plastic container formed by a sheet material having no rigidity.
  • Examples of the filling material in the plastic container according to the present invention include beverages such as beer, sparkling liquor, carbonated beverages, fruit juice beverages, and soft drinks.
  • a returnable container or a one-way container may be used.
  • the resin used in molding the plastic container 11 of the present invention is polyethylene terephthalate resin (PET), polybutylene terephthalate resin, polyethylene naphthalate resin, polyethylene resin, polypropylene resin (PP), cycloolefin copolymer.
  • PET polyethylene terephthalate resin
  • PP polypropylene resin
  • cycloolefin copolymer is polyethylene terephthalate resin (PET), polybutylene terephthalate resin, polyethylene naphthalate resin, polyethylene resin, polypropylene resin (PP), cycloolefin copolymer.
  • Resin (CO C, cyclic olefin copolymer), ionomer resin, poly-4-methylpentene 1 resin, polymethyl methacrylate resin, polystyrene resin, ethylene-butyl alcohol copolymer resin, acrylonitrile resin, polychlorinated bur resin, polychlorinated Examples include vinylidene resin, polyamide resin, polyamideimide resin, polyacetal resin, polycarbonate resin, polysulfone resin, or tetrafluoroethylene resin, acrylonitrile styrene resin, acrylonitrile-butadiene-styrene resin. Can do. Of these, PET is particularly preferred.
  • the exhaust pump (not shown) is operated to open the vacuum valve 8, whereby the air in the reaction chamber 12 is exhausted.
  • the entire reaction chamber 12 is exhausted.
  • the pressure in the reaction chamber 12 is reduced until a required pressure, for example, 1 to 100 Pa, preferably 10 to OOPa is reached.
  • higher pressure than lOOPa As a result, pyrolyzed and oxidized non-pyrophoric raw materials may become particles in the gas phase.
  • the wire 18 is energized to generate heat above a predetermined temperature to form a hot wire.
  • the predetermined temperature is a force depending on the type of non-pyrophoric raw material, for example, 300 to 1800 ° C. 800
  • the hot wire 18 is arrange
  • the gas flow rate regulator 24a supplies a non-pyrophoric raw material at a predetermined flow rate
  • the gas flow rate regulator 24b supplies a predetermined flow rate of ozone gas.
  • the non-pyrophoric raw material and ozone gas are passed through the raw material gas supply pipe 23 and placed in the plastic container 11 that has been depressurized to a predetermined pressure. It blows out toward the wire 18.
  • the non-pyrophoric raw material and ozone gas heated by the hot wire are immediately brought into contact with the inner surface of the plastic container 11. From the beginning of film formation, the hot wire 18 decomposes ozone into radical oxygen, which oxidizes the pyrolyzed non-pyrophoric material. Then, an oxide thin film derived from a non-pyrophoric raw material is formed on the inner surface of the plastic container 11.
  • the non-pyrophoric raw material is a raw material that does not ignite spontaneously, does not cause a violent reaction in the air, and generates an oxide when oxidized as described above.
  • the non-pyrophoric raw material may be solid, liquid, or gas.
  • a non-pyrophoric key organic compound is preferable.
  • examples of pyrophoric materials include silane-based materials such as monosilane, disilane, and trisilane.
  • non-pyrophoric key organic compound for example, trimethylsilane, hexamethyldisiloxane, phenylsilane, or hexamethylsilazane is preferable.
  • a raw material containing a metal element as a constituent element for example, a non-pyrophoric metal such as an organometallic compound or a metal alkoxide It may be an element-containing organic compound. If the metal element is, for example, an alcoholium, an alkoxide raw material that is preferably a non-pyrophoric aluminum-containing organic compound is more preferable. For example, tritertiary butoxy aluminum (Al (t-OC H)), triethoxy aluminum (Al (OC H)), triisopropoxy
  • Luminium Al (i-OC H)
  • trisecondary butoxy aluminum Al (sec- OC H)
  • chill aluminum For example, triisopropoxy aluminum is used as a non-pyrophoric raw material and is thermally decomposed with hot wire 18 to measure the power of forming an AIO thin film as an oxide thin film.
  • the reason why the non-pyrophoric raw material and ozone are supplied together is as follows. First of all, it is necessary to form a film in a plastic container having a three-dimensional shape, and since it must be formed at a low temperature as long as the plastic material is used, a highly efficient precipitation reaction can be performed at a low temperature even at a low temperature. Must be realized on the surface. Secondly, when an oxide thin film is produced by pyrolyzing and oxidizing non-pyrophoric raw materials with high safety! / Even if oxygen is supplied together, acid The force that did not cause the precipitation of the chemicals.
  • the hot wire 18 has at least two actions: (1) converting ozone into radical oxygen according to chemical formula 1, and (2) heating a non-pyrophoric raw material to thermally decompose or decompose by catalysis. do.
  • the hot wire 18 is not necessarily required to have a catalytic action in the catalytic chemical vapor deposition method.
  • the hot wire 18 only needs to be able to heat the non-pyrophoric raw material and ozone simultaneously.
  • a form in which the hot wire 18 having catalytic action is used to promote thermal decomposition of the non-pyrophoric raw material by the catalytic action is not excluded from the present invention.
  • ozone is supplied by a commercially available ozonizer or ozone cylinder.
  • a non-pyrophoric raw material and ozone may be mixed with a dilution gas! /.
  • a diluting gas for example, an inert gas such as argon or helium or a gas inert to a chemical reaction during film formation is used. Can be used to adjust the concentration of non-pyrophoric raw materials and the pressure in the vacuum chamber
  • the supply amount of ozone gas should be such that the carbon remaining in the oxide thin film is substantially zero.
  • the flow rate is 5 to 20 times that of non-pyrophoric substances. is there. If the supply amount of ozone gas is small, carbon remains in the oxide thin film. If the supply amount is sufficient or more, carbon does not remain in the oxide thin film.
  • the gas barrier property is best when the carbon remaining in the oxide thin film is substantially zero.
  • the supply amount of ozone gas is as follows.
  • the amount of carbon remaining in the oxide thin film (for example, a flow rate of 0.5 to 2.0 times that of non-pyrophoric substances) It may be set to an amount that substantially becomes the mouth (for example, 5 to 20 times the flow rate for non-pyrophoric substances).
  • the oxide thin film has a distribution in which the carbon content decreases toward the surface along the thickness direction, and becomes a gradient composition thin film.
  • the oxide thin film has good adhesion to the substrate when carbon remains in the oxide thin film, while the gas barrier property is best when carbon remaining in the oxide thin film is substantially zero. Shows physical properties.
  • the gradient composition film so that carbon remains in the oxide thin film on the substrate surface and carbon does not remain on the surface side of the oxide thin film, the adhesion to the substrate is good. And it can be set as an oxide thin film with favorable gas-barrier property.
  • the plastic container 11 it is preferable to irradiate the plastic container 11 with ultraviolet rays during film formation.
  • V ⁇ ultraviolet irradiation means is not shown.
  • the surface of the plastic container 11 can be sterilized.
  • the decomposition of ozone can be promoted by irradiation with ultraviolet rays to enhance the oxidizing power, and as a result, the oxidation of non-pyrophoric raw materials can be promoted.
  • the non-pyrophoric raw material and ozone gas are heated by the hot wire, but the reaction can proceed efficiently without hindering the irradiation of ultraviolet rays by the hot wire.
  • the wire 18 is a hot wire
  • the wire 18 is preferably formed using a metal or carbon that does not substantially volatilize as a main component.
  • the metal is preferably an oxidation resistant metal.
  • Ir, Re, Ni, Pt or Au an oxide thin film derived from a non-pyrophoric raw material with few impurities can be formed.
  • a volatile component derived from the wire may be incorporated into the oxide thin film as an additive component other than impurities.
  • the wire 18 is formed of a metal, a conductive metal compound, or carbon as a main component.
  • the wire 18 volatilizes carbon, silicon, or metal element, and the carbon, silicon, or metal element is oxidized. It may be incorporated into a thin film and become an additive component. This is an effective technique when an additive component is intentionally introduced into the oxide thin film.
  • the metal include molybdenum, copper, aluminum, and palladium.
  • These metal elements volatilize when they are used as hot wires, and are incorporated into the oxide thin film. Become an ingredient.
  • the conductive metal compound include, for example, FeC or FeCrC.
  • the carbon volatilizes and is incorporated into the oxide thin film to become an additive component.
  • the wire 18 is formed on the surface of a wire of a non-volatile metal such as Ir, Pt, or NiCr. There are wires sputtered and coated with Si.
  • the silicon volatilizes and is incorporated into the oxide thin film to become an additive component.
  • the wire 18 is a wire containing carbon as a main component, for example, carbon fiber
  • the carbon volatilizes when it is used as a hot wire, and is taken into the oxide thin film and becomes an additive component.
  • carbon, silicon, or a metal element is incorporated into the oxide thin film as an additive component, the physical properties of the oxide thin film are improved.
  • silicon is incorporated as an additive component in an oxide thin film, for example, an AIO thin film
  • flexibility is improved while maintaining gas noriality.
  • the volatilized metal element is preferably taken into an oxide thin film such as a SiO thin film or an AIO thin film to form a color center.
  • the oxide thin film can be colored.
  • metal elements that function as color centers include, for example, cobalt, manganese, copper, iron, chromium, antimony, force donium, sulfur, selenium, gold, nickel, uranium, vanadium, silver, molybdenum, tin, and tan Gusten, bismuth or enolebium.
  • the additive component preferably functions as a cross-linking material in the oxide thin film. It is possible to improve the physicochemical stability of the oxide thin film or adjust the refractive index.
  • Specific examples of the additive component that functions as a cross-linking material are, for example, sodium, potassium, lithium, lead, carbon, or titanium.
  • the oxide thin film is a SiO thin film, it can enter the network structure of SiO as a network decoration oxide or intermediate oxide by adding sodium, potassium or lithium, and the physicochemical properties such as thermal expansion coefficient and hardness You can adjust the properties.
  • the addition of lead can increase the refractive index.
  • titanium alkali resistance is improved.
  • adding carbon can add flexibility.
  • the oxide thin film is incorporated as an additive component, for example, the following is performed.
  • a volatile substance is applied or supported on the surface of the wire 18 to volatilize the volatile substance when it is used as a hot wire. It is a form. It is possible to form an oxide thin film in which a component derived from a non-pyrophoric raw material is a main component and a component derived from a volatile substance supported on a wire is an additional component.
  • the volatile substance include molybdenum, copper, aluminum, palladium, tungsten, silver, silicon, or a compound containing these.
  • the oxide thin film can be colored.
  • This form includes a form in which the constituent components of the wire 18 are not volatilized and a form in which the component is volatilized. In the latter case, both volatile materials and wire volatiles are incorporated into the oxide film as additive components.
  • an oxide thin film may be formed in which a component derived from a non-pyrophoric raw material is a main component, and a component derived from a layer is also a main component.
  • the wire 18 is mainly composed of a metal, a conductive metal compound, or carbon containing at least one of carbon, silicon, and metal that volatilizes when it is used as a hot wire.
  • Vapor that is formed and contains at least one component of carbon, silicon, or metal volatilized from the hot wire is a non-pyrophoric caged organic compound or a non-pyrophoric aluminum-containing organic compound.
  • non-pyrophoric raw material such as the above, it becomes a non-pyrophoric raw material, and the vapor oxidizes to form one of the main components of the oxide thin film.
  • the metal include molybdenum, copper, aluminum, and palladium. These metal elements volatilize when used as a hot wire, and steam containing these metal elements becomes non-pyrophoric raw materials that are oxidized and contain non-pyrophoric key organic compounds or non-pyrophoric aluminum.
  • non-pyrophoric materials such as organic compounds, it is one of the main components of oxide thin films.
  • Wire 18 1S A specific example of a mode in which the key is volatilized when it is formed as a main component and used as a hot wire, Si is applied to the surface of a wire of a non-volatile metal such as Ir, Pt or NiCr. Some wires are sputtered and coated. When hot wire is used, the volatilization of the vapor causes the vapor to become a non-pyrophoric raw material that is oxidized and non-pyrophoric key organic compounds or non-pyrophoric aluminum-containing organic compounds. Together with pyrophoric materials, it is one of the main components of oxide thin films.
  • a non-volatile metal such as Ir, Pt or NiCr.
  • Conductive metal compounds are not used alone, but together with the two non-pyrophoric raw materials (steam containing metal element and steam containing key element) Used together.
  • Specific examples of the conductive metal compound include, for example, FeC or FeCrC. Carbon is volatilized and oxidized when it is used as a hot wire, and is taken into the oxide thin film as an additional component.
  • the supply method of the non-pyrophoric raw material described above included a form in which the non-pyrophoric raw material is supplied via the raw material gas supply pipe 23.
  • Another mode 1 in which only ozone gas is allowed to flow through the raw material gas supply pipe 23 without being supplied through the supply pipe 23 will be described.
  • the wire 18 is a wire formed of a metal, a conductive metal compound, or carbon containing at least one of carbon, carbon, or metal that volatilizes when used as a hot wire as a main component. To do. Then, when it becomes a hot wire, a vapor containing at least one component of carbon, silicon, or metal volatilized from the hot wire becomes a non-pyrophoric raw material.
  • the metal include molybdenum, copper, aluminum, and palladium.
  • these metal elements When a hot wire is formed, these metal elements are volatilized, and the vapor containing these metal elements becomes a non-pyrophoric raw material, which is oxidized and becomes the main component of the oxide thin film of the metal element.
  • Si is applied to the surface of a non-volatile metal wire such as Ir, Pt or NiCr. Some wires are sputtered and coated.
  • the key volatilizes and this vapor becomes a non-pyrophoric raw material that is oxidized and becomes the main component of the SiO thin film.
  • Conductive metal compounds are not used alone, but are used in combination with the two non-pyrophoric raw materials (steam containing metal elements and steam containing key elements). Specific examples of the conductive metal compound include, for example, FeC or FeCrC. Carbon is volatilized and oxidized when it is used as a hot wire, and is taken into the oxide thin film as an additive component. If the steam is derived from wire, the safety is further improved and the means for introducing the raw material is simplified. Moreover, the composition of the thin film can be easily controlled by adjusting the composition of the wire.
  • the raw material introduction means is simplified.
  • Steam from the wire is preferably a vapor of a compound containing elemental or the metal of the metal saturated vapor pressure of more than 10_ 4 Pa below 2000 ° C.
  • a sufficient film formation rate for example, a film formation rate of 2.5 nm / second or more can be obtained.
  • Examples of the vapor include molybdenum, copper, aluminum, palladium, and tungsten. Vapor containing silver or silicon (1). At this time, the oxide thin film becomes an oxide thin film of molybdenum, copper, aluminum, palladium, tungsten, silver, or silicon by the oxidizing action of ozone. Also vapor containing carbon, sodium, potassium, lithium, lead or titanium
  • the vapor (1) is oxidized to form an oxide thin film, and the elements contained in the vapor (2) are taken into the oxide thin film as an additive component.
  • a volatile substance is applied or supported on the surface of the wire to form a hot wire.
  • Volatile substances may be volatilized and incorporated into the oxide thin film as an additive component. It is possible to form an oxide thin film in which a component derived from a wire is a main component and a component derived from a volatile substance carried on the wire is an added component.
  • a volatile substance is applied or supported on the surface of the wire to volatilize the volatile substance when used as a hot wire, and the volatile substance is oxidized as a non-pyrophoric raw material together with the vapor volatilized from the wire.
  • the volatile substance is a substance that becomes an oxide when oxidized, and is, for example, molybdenum, copper, aluminum, noradium, silicon, or a compound containing these, and these are preferably powders.
  • Non-pyrophoric raw material As a method for supplying the non-pyrophoric raw material, another embodiment 2 in which only ozone gas is allowed to flow through the raw material gas supply pipe 23 without being supplied through the raw material gas supply pipe 23 will be described.
  • Volatile substances coated or supported on the surface of wire 18 are used as non-pyrophoric materials. If it is this form, when the wire 18 is used as a hot wire, a volatile substance will volatilize.
  • the volatile substance is a substance that becomes an oxide when oxidized in the same manner as described above. For example, molybdenum, copper, aluminum, palladium, silicon, or a compound containing these is used. These are preferably powders. An oxide thin film of these elements is obtained.
  • the oxide thin film derived from volatile substances can be obtained safely by the oxidation action of ozone.
  • the raw material introduction means is simplified.
  • an oxide thin film exhibiting color can be obtained.
  • the thin film When the thin film reaches a predetermined thickness, the supply of the non-pyrophoric raw material and the ozone gas 33 is stopped, the reaction chamber 12 is evacuated again, a leak gas (not shown) is introduced, and the reaction chamber 12 is brought to atmospheric pressure. To do. Thereafter, the upper chamber 15 is opened and the plastic container 11 is taken out.
  • the thickness of the thin film depends on the type of wire 18, the pressure in the plastic container 11, the supply gas flow rate, the time that the non-pyrophoric raw material and ozone gas 33 are blown onto the wire 18, the type of non-pyrophoric raw material, etc. 5 ⁇ ;! OOnm is preferable.
  • the film formation rate is as high as 2.5 to 4. Onm / second, for example.
  • the film is formed in a state where the plastic container 11 is rotated by the bottle rotating mechanism 32 in order to improve the uniformity of the film. I'd prefer to do it.
  • the plastic container 11 is placed in the vacuum chamber 6 that is set to a predetermined pressure (for example, 10 to; In order to achieve this state, a process of adding the plastic container 11 into the vacuum chamber 6 through the differential pressure mechanism is added. Since the plastic containers 11 are continuously conveyed at predetermined intervals one after another in the conveyance path, it is preferable to use a type having a differential pressure mechanism shown in FIG. 9 for example as a vacuum chamber rather than a batch type.
  • the plastic container 11 is attached to the wire 18 installed in the transfer path in the vacuum chamber.
  • a process of transporting along the transport path is added so that the surface of the plastic container 11 approaches a desired distance (for example, 5 to 5 Omm).
  • a step of taking out the plastic container after film formation that is, a step of transporting the plastic container 11 out of the vacuum chamber via the differential pressure mechanism is further added.
  • Example 1 Film formation was performed on the inner surface of a round 500 ml PET bottle as a plastic container 11 using the film formation apparatus 100 shown in FIG.
  • the wall thickness of the container was about 0.3 mm.
  • Iridium wire was used as wire 18, and 1.5 sccm of trimethylsilane was supplied as a non-pyrophoric material.
  • Ozone was diluted to 10% with oxygen to obtain a mixed gas, and this mixed gas was supplied at 100 sccm.
  • the distance between the wire 18 and the bottom surface inside the bottle was 30 mm.
  • the distance between the wire 18 and the inner side of the bottle was about 30 mm.
  • a direct current was applied to the iridium wire to form a 800 ° C hot wire.
  • the pressure in the vacuum chamber 6 during film formation was 20 Pa.
  • the film formation time was 15 seconds.
  • the PET bottle coated with the obtained silicon oxide thin film was designated as Example 1.
  • Example 1 was evaluated as follows.
  • the oxygen permeability of this container was measured under the conditions of 23 ° C. and 90% RH using Oxtran 2/20 manufactured by Modern Control, and the measured value after 72 hours from the start of nitrogen gas replacement was described.
  • the film thickness of DLC was measured using Veeco DEKTAK3.
  • Example 1 the oxygen permeability was 0.002 cc / container / day. The film thickness was 51 nm. The adhesion was “Yes”. The manufacturing conditions and evaluation results are summarized in Table 1.
  • Ozone was diluted to 3% with oxygen to make a mixed gas, this mixed gas was supplied at lOOsccm, and a film was formed in the same manner as in Example 1 except that the chemical film time was 50 seconds.
  • Table 1 shows the deposition conditions and results.
  • Example 3 shows the deposition conditions and results.
  • Example 4 shows the deposition conditions and results.
  • Ozone is diluted to 3% with oxygen to make a mixed gas, and this mixed gas is supplied at lOOsccm for 7.5 seconds to form a film, and then ozone is diluted to 10% with oxygen to make a mixed gas.
  • Film formation was carried out in the same manner as in Example 1 except that the mixed gas was supplied for 7.5 seconds at lOOsccm, and the oxide thin film was changed to a gradient composition film having a different carbon concentration. .
  • Table 1 shows the deposition conditions and results.
  • the gradient composition film had a carbon concentration of about 5% on the plastic surface, and the carbon concentration was below the detection limit on the surface side of the thin film.
  • Example 6 was carried out in the same manner as in Example 1 except that hexamethyldisiloxane was used as a non-pyrophoric material. Table 1 shows the deposition conditions and results.
  • Example 7 A film was formed in the same manner as in Example 1 except that phenylsilane was used as a non-pyrophoric material, and Example 7 was obtained. Table 1 shows the deposition conditions and results.
  • Example 8 A film was formed in the same manner as in Example 1 except that hexamethyldisilazane was used as a non-pyrophoric raw material, and Example 8 was obtained. Table 1 shows the deposition conditions and results.
  • Triisopropoxy aluminum is used as a non-pyrophoric raw material, and aluminum oxide A film was formed in the same manner as in Example 1 except that a thin film was formed.
  • Table 1 shows the deposition conditions and results.
  • Example 10 Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1.
  • Molybdenum wire was used as wire 18, and non-pyrophoric raw material was molybdenum vapor generated from molybdenum wire.
  • Ozone was diluted to 10% with oxygen to make a mixed gas, and this mixed gas was supplied to lOOsccm.
  • the distance between the wire 18 and the bottom surface inside the bottle was 30 mm.
  • the distance between the wire 18 and the inner side of the bottle was about 30 mm.
  • a direct current was applied to the molybdenum wire to make a 800 ° C hot wire.
  • the pressure in the vacuum chamber 6 during film formation was 5 Pa.
  • the film formation time was 30 seconds.
  • the PET bottle coated with the obtained molybdenum oxide thin film was designated as Example 10.
  • Example 10 was evaluated in the same manner as Example 1. Table 1 shows the deposition conditions and results. The obtained molybdenum oxide thin film was colored
  • Example 11 was evaluated in the same manner as in Example 1.
  • Iridium wire was used as wire 18, and the non-pyrophoric material was aluminum powder, which is a volatile substance supported on the surface of iridium wire.
  • the ozone was diluted to 10% with oxygen to make a mixed gas, and this mixed gas was supplied by lOOsccm.
  • the distance between the wire 18 and the bottom surface inside the bottle was 30 mm.
  • the distance between the wire 18 and the inner side of the bottle was about 30 mm.
  • a direct current was applied to the iridium wire to obtain a 800 ° C hot wire.
  • the pressure in the vacuum chamber 6 during film formation was 5 Pa.
  • the film formation time was 60 seconds.
  • a PET bottle coated with the obtained aluminum oxide thin film was designated as Example 11.
  • Example 11 was evaluated in the same manner as in Example 1. Table 1 shows the deposition conditions and results.
  • a film was formed on the inner surface of the PET bottle as in Example 1.
  • Trimethylsilane as a non-pyrophoric material was supplied 1.5s CC m.
  • Molybdenum wire was used as the wire 18, and molybdenum wire generated from the molybdenum wire was incorporated into the silicon oxide thin film as an additive component. 20% ozone with nitrogen The mixed gas was diluted to 20 sccm and supplied.
  • the distance between the wire 18 and the bottom surface inside the bottle was set to 30 mm.
  • the distance between the wire 18 and the inner side of the bottle was about 3 Omm.
  • a direct current was applied to the molybdenum wire to make a 800 ° C hot wire.
  • Example 12 The pressure in the vacuum chamber 6 during film formation was lOPa.
  • the film formation time was 15 seconds.
  • a PET bottle coated with a thin film of silicon oxide in which molybdenum was incorporated as an additive was obtained as Example 12.
  • Example 12 the same evaluation as in Example 1 was performed. Table 1 shows the deposition conditions and results.
  • the silicon oxide thin film in which molybdenum was incorporated as an additive component was colored blue.
  • Film formation was performed on the outer surface of a round 500 ml PET bottle as a plastic container 11 using the film formation apparatus 200 shown in FIG.
  • the wall thickness of the container was about 0.3 mm.
  • Iridium wire was used as wire 18, and 1.5 sccm of trimethylsilane was supplied as a non-pyrophoric material.
  • Ozone was diluted to 10% with oxygen to obtain a mixed gas, and this mixed gas was supplied at 100 sccm.
  • the distance between the wire 18 and the bottom surface outside the bottle was 55 mm.
  • the distance between the wire 18 and the outer side of the bottle was about 55 mm.
  • a direct current was applied to the iridium wire to form a 800 ° C hot wire.
  • the pressure in the vacuum chamber 6 during film formation was 20 Pa.
  • the film formation time was 15 seconds.
  • the PET bottle coated with the obtained silicon oxide thin film was designated as Comparative Example 1.
  • Table 1 shows the deposition conditions and results. Since the distance between the wire 18 and the bottle surface was as long as 55 mm, the non-pyrophoric raw material and ozone gas were not efficiently in contact with the outer surface of the plastic container after being heated with the hot wire. For this reason, gas barrier properties with a small film forming speed and a small film thickness were not obtained.
  • Example 13 Perform film formation in the same manner as in Comparative Example 1 except that the distance between the wire 18 and the outer bottom surface of the bottle is 3 mm, and the distance between the wire 18 and the outer side surface of the bottle is about 3 mm.
  • Example 13 was used. Table 1 shows the deposition conditions and results. As the distance between the force wire 18 obtained and the bottle surface was as short as 3 mm, the film formation in the vicinity of the gas blowing hole 17x was excessive, resulting in unevenness.
  • Comparative Example 2 A film was formed in the same manner as in Example 1 except that the pressure during film formation was changed to lOPa, and Comparative Example 2 was obtained. Table 1 shows the deposition conditions and results. When trimethylsilane was used as a non-pyrophoric raw material, the pressure during film formation was too high, so the non-pyrophoric raw material was granulated before coming into contact with the surface of the plastic container. A powder was formed. As a result, particles were deposited on the surface of the bottle, which was not formed by film formation. The adhesion was “none”.
  • Example 14 Except that the pressure at the time of film formation was 8 Pa, film formation was carried out in the same manner as in Example 1 to obtain Example 14. Table 1 shows the deposition conditions and results. When trimethylsilane was used as a non-pyrophoric raw material, the pressure during film formation was too low, and although the gas barrier property was obtained, the film formation rate decreased.
  • a film was formed in the same manner as in Example 1 except that lOOsccm was supplied in place of ozone, and Comparative Example 3 was obtained. Table 1 shows the deposition conditions and results. No silicon oxide thin film was formed.
  • a film was formed in the same manner as in Example 1 except that a tungsten wire was used instead of the iridium wire.
  • Table 1 shows the deposition conditions and results. The force at which a silicon oxide thin film equivalent to that in Example 1 was formed and the deterioration of the tungsten wire were observed.
  • Example 16 Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1.
  • Tungsten wire was used as wire 18, and the non-pyrophoric material was tungsten vapor generated from the tungsten wire.
  • Ozone was diluted to 10% with oxygen to make a mixed gas, and this mixed gas was supplied by lOOsccm.
  • the distance between the wire 18 and the bottom surface inside the bottle was 30 mm.
  • the distance between the wire 18 and the inner side of the bottle was about 30 mm.
  • a direct current was applied to the tungsten wire to make a 2000 ° C hot wire.
  • the pressure in the vacuum chamber 6 during film formation was 5 Pa.
  • the film formation time was 30 seconds.
  • the PET bottle coated with the obtained tungsten oxide thin film was designated as Example 16.
  • Example 16 The same evaluation as in Example 1 was performed. Table 1 shows the deposition conditions and results. The obtained tungsten oxide thin film was formed, but deterioration of the tungs
  • a film was formed on the inner surface of the PET bottle as in Example 1.
  • Trimethylsilane as a non-pyrophoric material was supplied 1.5s CC m.
  • a tungsten wire was used as the wire 18, and tungsten vapor that also generates tungsten wire force was incorporated as an additive into the silicon oxide thin film.
  • Ozone was diluted to 20% with nitrogen to obtain a mixed gas, and this mixed gas was supplied at 20 sccm.
  • the distance between the wire 18 and the bottom inside the bottle was 30 mm.
  • the distance between the wire 18 and the inner side of the bottle was about 30 mm.
  • a direct current was applied to the tungsten wire to make a hot wire of 2000 ° C.
  • Example 17 was evaluated in the same manner as in Example 1. Table 1 shows the deposition conditions and results. The silicon oxide thin film in which tungsten was incorporated as an additive component was colored dark.
  • Example 1 composition analysis of depth-wise silicon, carbon, and oxygen was performed by X-ray photoelectron spectroscopy (XPS). The results are shown in FIG. Similarly, Example 2 is shown in FIG. In FIG. 12, there was no residual carbon in the silicon oxide thin film (below the detection limit), but in FIG. 13, 8 atom% residual carbon remained in the silicon oxide thin film. Therefore, ozone was found to contribute to reducing residual carbon in the silicon oxide thin film.
  • XPS X-ray photoelectron spectroscopy
  • the gas barrier plastic container obtained by the present invention is a plastic container for beverages having gas barrier properties suitable for alcoholic beverages such as beer or soft drinks.

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Abstract

An inexpensive process for producing a plastic container coated with a gas barrier thin film, in which a thin film with gas barrier property can be formed safely at high speed from low-cost raw materials, and in which use can be made of a production apparatus not requiring any expensive equipment. The process comprises the steps of adjusting the interior of vacuum chamber (6) accommodating plastic container (11) to a given pressure equal to atmospheric pressure or below; passing electric current through wire (18) disposed inside the vacuum chamber to thereby attain heating to a given temperature or higher so that the wire is converted to a hot wire; and heating by means of the hot wire ozone gas and a nonpyrophoric raw material containing silicon or a metal element as a constituent element, fed into the interior of the vacuum chamber and thereafter effecting contact with at least either the internal surface or the external surface of the plastic container to thereby form an oxide thin film derived from the nonpyrophoric raw material.

Description

明 細 書  Specification

酸化物薄膜を被膜したプラスチック容器の製造方法  Method for producing plastic container coated with oxide thin film

技術分野  Technical field

[0001] 本発明は、内容物として、例えば、品質面から酸化を嫌い且つ容器壁から炭酸ガス の逃散がないことを必要とするビール等のアルコール飲料又は同様に酸化を嫌う清 涼飲料を入れることに適した、酸素ガス及び炭酸ガスのバリア性を有する飲料用ブラ スチック容器に関する。より詳しくは酸素ガス及び炭酸ガスのバリア層として、外表面 と内表面の少なくとも一方に、食品'飲料分野でも安全かつ低コストで成膜可能な酸 化物薄膜を被覆した、 軽量で、耐衝撃性があり、リサイクル性に優れたプラスチック 容器の製造方法に関する。あるいはガスバリア性以外にも、呈色 ·光沢面から透光/ 遮光性 ·美粧性 ·識別性において機能性のある酸化物薄膜を比較的容易かつ低コス トで被覆するための、上記長所を有するプラスチック容器の製造方法に関する。 背景技術  [0001] The present invention includes, as contents, for example, alcoholic beverages such as beer that dislike oxidation from the standpoint of quality and require no escape of carbon dioxide from the container wall, or soft drinks that similarly dislike oxidation. More particularly, the present invention relates to a beverage plastic container having a barrier property against oxygen gas and carbon dioxide gas. More specifically, as an oxygen gas and carbon dioxide gas barrier layer, at least one of the outer and inner surfaces is coated with an oxide thin film that can be deposited safely and at low cost in the food and beverage fields. It relates to a method of manufacturing plastic containers with excellent recyclability. In addition to gas barrier properties, it has the above-mentioned advantages for covering oxide thin films that are functional in terms of color, glossy and translucent / light-shielding properties, cosmetics, and distinguishability relatively easily and at low cost. The present invention relates to a method for manufacturing a plastic container. Background art

[0002] 近年、 PETボトルにコートされた単層薄膜として DLC (Diamond Like Carbon) 膜が実用化されてきている。この DLC膜は、炭素原子及び水素原子による非晶性の 三次元構造からなる膜で、硬ぐ絶縁性に優れ、高屈折率で、非常に滑らかなモルフ ォロジを有する硬質炭素膜である。  In recent years, a DLC (Diamond Like Carbon) film has been put to practical use as a single-layer thin film coated on a PET bottle. This DLC film is a film having an amorphous three-dimensional structure composed of carbon atoms and hydrogen atoms, and is a hard carbon film having a hard and excellent insulating property, a high refractive index, and a very smooth morphology.

[0003] 従来、このような DLC膜の形成技術をプラスチック容器に適用した例がある(例え ば特許文献 1を参照。)。特許文献 1に記載された一般的な DLC膜の形成装置は、 次の通りである。すなわち、図 1に示すように、炭素源ガスの導入口 1Aと排気口 1Bを 有する反応室 1内に配置された外部電極 2の中に、プラスチック容器 5が収容される。 そして導入口 1Aから炭素源ガスが導入された後、内部電極 3と外部電極 2との間に 高周波電源 4から高周波が印加され、炭素源ガスが励起されて発生するプラズマに より、プラスチック容器 5の内面に DLC膜が形成される。  Conventionally, there is an example in which such a DLC film formation technique is applied to a plastic container (see, for example, Patent Document 1). A general DLC film forming apparatus described in Patent Document 1 is as follows. That is, as shown in FIG. 1, a plastic container 5 is housed in an external electrode 2 disposed in a reaction chamber 1 having a carbon source gas introduction port 1A and an exhaust port 1B. After the carbon source gas is introduced from the introduction port 1A, a high frequency power is applied between the internal electrode 3 and the external electrode 2 from the high frequency power source 4 to excite the carbon source gas, thereby generating a plastic container 5 A DLC film is formed on the inner surface.

[0004] また、 DLC膜の代わりに酸化ケィ素薄膜 (SiOx)を小型プラスチック容器に形成す る技術がある(例えば、特許文献 2を参照。)。特許文献 2では、特許文献 1と同様に プラズマ CVD法によって、酸化ケィ素薄膜を成膜する。 [0005] また、プラズマ CVD法以外の成膜方法である触媒化学蒸着法によって、プラスチッ クフィルムの表面に窒化シリコン膜を成膜する技術がある(例えば特許文献 3を参照 。)。特許文献 3にも記載されているとおり、窒化シリコン膜を成膜する場合、原料ガス としてメチルシラン、ジメチルシラン若しくはトリメチルシランを使用する(特許文献 3、 段落 0004、段落 0022)。 [0004] In addition, there is a technique for forming a silicon oxide thin film (SiOx) in a small plastic container instead of the DLC film (see, for example, Patent Document 2). In Patent Document 2, a silicon oxide thin film is formed by plasma CVD as in Patent Document 1. In addition, there is a technique for forming a silicon nitride film on the surface of a plastic film by catalytic chemical vapor deposition, which is a film formation method other than plasma CVD (see, for example, Patent Document 3). As described in Patent Document 3, when a silicon nitride film is formed, methylsilane, dimethylsilane, or trimethylsilane is used as a source gas (Patent Document 3, Paragraph 0004, Paragraph 0022).

[0006] 特許文献 1 :特許 2788412号公報  [0006] Patent Document 1: Japanese Patent No. 2788412

特許文献 2:実開平 5— 35660号公報  Patent Document 2: Japanese Utility Model Publication No. 5-35660

特許文献 3:特開 2004-217966号公報 (段落 0004、段落 0022)  Patent Document 3: Japanese Patent Application Laid-Open No. 2004-217966 (Paragraph 0004, Paragraph 0022)

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0007] しかし、プラズマ CVD成膜装置は、比較的高価な機材を使用するため、必ずしも安 価で、ガスバリア性を有するプラスチック容器を製造できるとは限らなレ、。  However, since the plasma CVD film forming apparatus uses relatively expensive equipment, it is not always possible to manufacture a plastic container having a gas barrier property at a low price.

[0008] 触媒化学蒸着法は、高周波電源等の高価な機材を使用する必要がないため、装 置自体のコストはプラズマ CVD成膜装置のコストよりも少なレ、。  [0008] Since the catalytic chemical vapor deposition method does not require the use of expensive equipment such as a high-frequency power source, the cost of the device itself is less than the cost of the plasma CVD film forming device.

[0009] しかし、触媒化学蒸着法によって、例えば酸化ケィ素薄膜を成膜する場合、本発明 者の検討によれば、原料ガスとしてメチルシラン、ジメチルシラン若しくはトリメチルシ ランを使用すると、酸素雰囲気下であっても充分な酸化反応を起こさせることができ ず、プラスチック基板上に密着する酸化ケィ素薄膜を成膜することができなかった。 一方、モノシラン、ジシラン又はトリシラン等の水素化ケィ素を原料ガスとすると、自然 発火性に代表される爆発性 ·危険性が高ぐ安全装置にコストがかかってしまい、ブラ ズマ CVD成膜装置に対してコストメリットが薄すれてしまう。さらに、酸化ケィ素薄膜 を成膜する場合、原料ガスと酸化ガスを一緒に供給する必要があるが、熱触媒体とし てタングステンワイヤーを使用すれば (特許文献 3、段落 0059)、タングステンが酸化 されて劣化するという問題がある。  However, when forming a silicon oxide thin film, for example, by catalytic chemical vapor deposition, according to the study of the present inventors, when methylsilane, dimethylsilane, or trimethylsilane is used as a source gas, the reaction is performed in an oxygen atmosphere. Even in such a case, it was not possible to cause a sufficient oxidation reaction, and it was not possible to form a silicon oxide thin film in close contact with the plastic substrate. On the other hand, if hydrogen hydride such as monosilane, disilane, or trisilane is used as the source gas, the cost of a safety device with high explosiveness and danger represented by pyrophoric properties is increased, and the plasma CVD film forming apparatus is used. On the other hand, the cost merit is diminished. Furthermore, when forming a silicon oxide thin film, it is necessary to supply the source gas and the oxidizing gas together. However, if tungsten wire is used as the thermal catalyst (Patent Document 3, paragraph 0059), tungsten is oxidized. There is a problem of being deteriorated.

[0010] また、触媒化学蒸着法は、プラスチックシートのような平面形状の対象に成膜できて も、プラスチック容器のような立体形状を対象に成膜できるという報告はない。  [0010] Further, even though the catalytic chemical vapor deposition method can form a film on a planar object such as a plastic sheet, there is no report that a film can be formed on a three-dimensional object such as a plastic container.

[0011] ここで、本発明は飲料'食品分野向けのプラスチック容器を主な対象とする。当該 分野では、飲料 ·食品をとり扱うことに関連して、製品にかけられるコストの制約が大き ぐまた生産工程及び製品容器に対して安全性の高い方法 ·材料を用いることを特 徴とする。 したがって、上記のシラン類やアルキルアルミ類に代表される自然発火 性の原料を用いることは、安全管理に対するコストや安全意識の観点から実用性が ない。このような原料は、例えば、我が国では特殊高圧ガスや危険物第三類に指定 されている。同様の理由及び環境への配慮から、当該分野では、ハロゲン類を含む 原料は、一般に使用が避けられ、本発明の観点からは実用性がない。 [0011] Here, the present invention is mainly directed to plastic containers for beverages and foods. In this area, there are significant cost constraints on products associated with handling beverages and food. It also features the use of highly safe methods and materials for the production process and product containers. Therefore, the use of pyrophoric raw materials represented by the above silanes and alkylaluminums is not practical from the viewpoint of safety management cost and safety awareness. Such raw materials are, for example, designated as special high-pressure gas and hazardous material type 3 in Japan. For the same reason and consideration for the environment, in this field, raw materials containing halogens are generally avoided and are not practical from the viewpoint of the present invention.

[0012] そこで本発明の目的は、これらの実用性がない原料に頼ることなぐガスバリア性薄 膜コーティングプラスチック容器の製造方法において、室温のプラスチック製の立体 形状を有している容器に、非自然発火性の原料とオゾンを使用し、安全かつ高速で ガスバリア性を有する薄膜を低温で成膜することが可能であって、しかも高価な機材 を必要としない製造装置で稼動しうる安価な製法を提供することである。 Therefore, an object of the present invention is to provide a non-naturally-occurring container having a three-dimensional shape made of plastic at room temperature in a method for producing a gas-barrier thin film-coated plastic container that does not rely on these non-practical raw materials. Using an ignitable raw material and ozone, it is possible to form a thin film with gas barrier properties at a low temperature safely and at high speed, and an inexpensive manufacturing method that can be operated in a manufacturing apparatus that does not require expensive equipment. Is to provide.

[0013] 加えて、飲料 ·食品分野の容器には、内容物の保護、品質の目視確認や、外観上 の美観向上のために透光/遮光性や呈色が求められる。このような課題に対し、直接 樹脂を着色することなぐ実用性のある透光/遮光性や呈色を、比較的自由度高く容 易に制御でき、安価で、かつリサイクル性高ぐ薄膜によってプラスチック容器に付与 する製法を提供することも、本発明の目的とするところである。 [0013] In addition, containers in the beverage / food field are required to have translucency / light-shielding properties and coloration in order to protect the contents, visually check the quality, and improve the appearance. In response to these problems, practical translucent / light-shielding properties and coloration without directly coloring the resin can be controlled easily with a relatively high degree of freedom. It is also an object of the present invention to provide a manufacturing method to be applied to the container.

課題を解決するための手段  Means for solving the problem

[0014] 本発明者が、上記課題を解決すべく鋭意開発したところ、ワイヤーを通電発熱させ 、安全性が高レ、非自然発火性原料をオゾンガスとともにこのホットワイヤーで加熱し た後、プラスチック容器の被成膜面に接触させたところ、非自然発火性原料に由来 するガスバリア性を有する酸化物が密着性よく成膜できることを見出し、本発明を完 成させた。 [0014] The present inventor has intensively developed to solve the above-mentioned problems. As a result, the wire is heated and energized, and a highly safe and non-pyrophoric raw material is heated together with ozone gas with this hot wire. As a result, it was found that an oxide having a gas barrier property derived from a non-pyrophoric raw material can be formed with good adhesion, and the present invention was completed.

[0015] ここで、本発明においては、ワイヤーとは、一般的な工業用電源を用いて電気抵抗 体を数百度以上に通電により加熱することができる物体を意味する。典型的には、金 属製の針金であるが、導電性の金属化合物や炭素の棒状体'繊維体も本概念に含 まれる。さらには、これらの物体に担持体'塗布物がある物体も、本概念に含まれる。 いずれも、プラスチック容器表面への成膜においては、複雑な立体形状に対して、容 器表面各箇所への熱負荷の大きさ'成膜物質の流れが成膜に適するように抵抗加熱 体を配置できる点で共通しているためである。関連して、本発明においては、ホットヮ ィヤーとは、これら通電によって抵抗加熱されたワイヤーを意味する。 [0015] Here, in the present invention, a wire means an object that can heat an electric resistor by energization to several hundred degrees or more using a general industrial power source. Typically, it is a metal wire, but a conductive metal compound or a carbon rod-like body is also included in this concept. Furthermore, an object having a carrier 'coating on these objects is also included in the concept. In any case, when forming a film on the surface of a plastic container, the heat load applied to each part of the container surface against a complicated three-dimensional shape 'resistance heating so that the flow of the film forming substance is suitable for film formation. It is because it is common in the point which can arrange a body. Relatedly, in the present invention, the hot wire means a wire that is resistance-heated by energization.

[0016] 具体的には、本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法は 、プラスチック容器を収容した真空チャンバの内部を大気圧以下の所定圧力とする 工程と、前記真空チャンバの内部に配置されているワイヤーに通電して所定温度以 上に発熱させてホットワイヤーとする工程と、前記真空チャンバの内部に供給された 、ケィ素若しくは金属元素を構成元素として含む非自然発火性原料及びオゾンガス を、前記ホットワイヤーで加熱し、その後、前記プラスチック容器の内表面又は外表 面の少なくともいずれか一方に接触させて、前記非自然発火性原料由来の酸化物 薄膜を形成させる工程と、を有することを特徴とする。  [0016] Specifically, the method for producing a plastic container coated with an oxide thin film according to the present invention includes a step of setting the inside of a vacuum chamber containing the plastic container to a predetermined pressure equal to or lower than atmospheric pressure, A process of energizing a wire disposed inside to generate heat above a predetermined temperature to form a hot wire, and a non-pyrophoric material containing a key element or metal element supplied as a constituent element to the inside of the vacuum chamber Heating the raw material and ozone gas with the hot wire, and then bringing the raw material and ozone gas into contact with at least one of the inner surface and the outer surface of the plastic container to form an oxide thin film derived from the non-pyrophoric raw material; It is characterized by having.

[0017] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ブラ スチック容器が、前記真空チャンバ内に差圧機構を介して搬入される工程と、前記プ ラスチック容器が、前記真空チャンバ内の搬送経路に設置された前記ワイヤーに対 して前記プラスチック容器の表面が所望の距離まで近づくように、前記搬送経路上を 搬送される工程と、前記プラスチック容器が、前記真空チャンバ外へ差圧機構を介し て搬出される工程と、をさらに有することが好ましい。酸化物薄膜を被膜したプラスチ ック容器を量産することも可能である。  [0017] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the plastic container includes a step of bringing the plastic container into the vacuum chamber via a differential pressure mechanism, and the plastic container includes the A step of transporting the plastic container so that the surface of the plastic container approaches a desired distance from the wire installed in the transport path in the vacuum chamber; and the plastic container is disposed outside the vacuum chamber. And a step of unloading via a differential pressure mechanism. It is also possible to mass-produce plastic containers coated with oxide thin films.

[0018] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ブラ スチック容器の内表面又は外表面と前記ホットワイヤーとの距離を 5〜50mmとし、か つ、真空チャンバ内の圧力を 10〜100Paとすることが好ましい。非自然発火性原料 の分解による気相中での粒子化を防止するとともに、プラスチック容器の表面に酸化 物薄膜を高速で成膜することができる。  [0018] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the distance between the inner surface or outer surface of the plastic container and the hot wire is 5 to 50 mm, and the inside of the vacuum chamber is The pressure is preferably 10 to 100 Pa. In addition to preventing particle formation in the gas phase due to decomposition of non-pyrophoric raw materials, an oxide thin film can be formed at high speed on the surface of a plastic container.

[0019] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法は、前記酸化物 薄膜を形成させる工程にお!/、て、前記プラスチック容器に紫外線を照射することが好 ましい。プラスチック容器の表面を殺菌処理することができる。また、紫外線の照射に よってオゾンの分解を促進して酸化力を高め、非自然発火性原料の酸化を促進させ ること力 Sできる。このとき、ホットワイヤーによって非自然発火性原料とオゾンガスを加 熱するが、ホットワイヤーによって紫外線の照射が妨げられることがないので、効率よ く反応を進めることができる。 In the method for producing a plastic container coated with an oxide thin film according to the present invention, it is preferable to irradiate the plastic container with ultraviolet rays in the step of forming the oxide thin film. The surface of the plastic container can be sterilized. In addition, UV irradiation promotes the decomposition of ozone to increase the oxidizing power and promotes the oxidation of non-pyrophoric raw materials. At this time, the non-pyrophoric raw material and ozone gas are heated by the hot wire. The reaction can proceed.

[0020] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記非自 然発火性原料として非自然発火性のケィ化有機化合物を使用し、前記ホットワイヤ 一で熱分解反応又は触媒反応によって分解させて、前記酸化物薄膜として SiO薄 膜を形成するか、或いは、前記非自然発火性原料として非自然発火性のアルミユウ ム含有有機化合物を使用し、前記ホットワイヤーで熱分解反応又は触媒反応によつ て分解させて、前記酸化物薄膜として AIO薄膜を形成することが好ましい。非自然 発火性のケィ化有機化合物若しくは非自然発火性のアルミニウム含有有機化合物 は、シラン系原料若しくはトリメチルアルミニウム等の自然発火性原料と異なり、安全 であるため安全装置に費用をかけなくて済み、結果として安価である。また、これらの 非自然発火性原料は、酸素と同時に供給してホットワイヤーで加熱しても、プラスチッ ク基板上に密着性のある SiO薄膜若しくは AIO薄膜は形成されない。本発明のよう に非自然発火性原料とオゾンガスを同時に供給してホットワイヤーで加熱してはじめ て、熱分解'酸化が十分に進み、基板との密着性のよい SiO薄膜若しくは AIO薄膜 が形成される。 [0020] In the method for producing a plastic container coated with an oxide thin film according to the present invention, a non-pyrophoric key organic compound is used as the non-self-igniting raw material, It is decomposed by catalytic reaction to form a SiO thin film as the oxide thin film, or a non-pyrophoric aluminum-containing organic compound is used as the non-pyrophoric raw material, and a thermal decomposition reaction is performed with the hot wire. Alternatively, it is preferable that an AIO thin film is formed as the oxide thin film by being decomposed by a catalytic reaction. Unlike pyrophoric raw materials such as non-pyrophoric key organic compounds or non-pyrophoric aluminum-containing organic compounds such as silane-based materials or trimethylaluminum, there is no need to spend on safety equipment. As a result, it is inexpensive. Furthermore, even if these non-pyrophoric materials are supplied simultaneously with oxygen and heated with a hot wire, an adherent SiO thin film or AIO thin film is not formed on the plastic substrate. As in the present invention, a non-pyrophoric raw material and ozone gas are simultaneously supplied and heated with a hot wire, and then thermal decomposition and oxidation are sufficiently advanced to form a SiO thin film or an AIO thin film with good adhesion to the substrate. The

[0021] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ォゾ ンガスの供給量は、前記酸化物薄膜中に残留する炭素が実質的にゼロとなる量であ ることが好ましい。オゾンガスの供給量が少ないと酸化物薄膜中に炭素が残留し、充 分若しくはそれ以上の供給量であれば、酸化物薄膜中に炭素は残留しない。  [0021] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the supply amount of the ozone gas is an amount such that carbon remaining in the oxide thin film is substantially zero. Is preferred. If the supply amount of ozone gas is small, carbon remains in the oxide thin film. If the supply amount is sufficient or more, carbon does not remain in the oxide thin film.

[0022] そして、酸化物薄膜中に残留する炭素が実質的にゼロであるとガスノ リア性が最も 良好となる。ここで、炭素が実質的にゼロであるとは、具体例として SiOx薄膜の場合 、酸化物薄膜中の炭素量が 5atom%以下をさす。  [0022] And, when the carbon remaining in the oxide thin film is substantially zero, the gas nooricity becomes the best. Here, the fact that carbon is substantially zero means that in the case of a SiOx thin film as a specific example, the amount of carbon in the oxide thin film is 5 atom% or less.

[0023] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ォゾ ンガスの供給量は、前記酸化物薄膜の成膜開始時には前記酸化物薄膜中に炭素が 残留する量に設定し、その後供給量を増加させて前記酸化物薄膜中に残留する炭 素が実質的にゼロとなる量に設定して、前記酸化物薄膜を、その厚さ方向に炭素含 有量が異なる傾斜組成薄膜とすることが好ましレ、。オゾンガスの供給量が少な!/、と酸 化物薄膜中に炭素が残留し、充分な若しくはそれ以上の供給量であれば、酸化物薄 膜中に炭素は残留しない。そして、酸化物薄膜中に炭素が残留すると基板との密着 性が強固となり、一方、酸化物薄膜中に残留する炭素が実質的にゼロであるとガスバ リア性が最も良好となる。したがって、基板表面側の酸化物薄膜に炭素を残留させ、 酸化物薄膜の表面側には炭素が残留しないように傾斜組成膜とすることで、基板に 対して密着性に優れ、かつ、ガスバリア性が良好な酸化物薄膜とすることができる。 [0023] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the supply amount of the ozone gas is set so that carbon remains in the oxide thin film when the oxide thin film is formed. The amount of carbon remaining in the oxide thin film is set so that the amount of carbon remaining in the oxide thin film becomes substantially zero after that, and the carbon content of the oxide thin film differs in the thickness direction. It is preferable to use a gradient composition thin film. If the supply amount of ozone gas is small! /, And carbon remains in the oxide thin film and the supply amount is sufficient or more, the oxide thin film No carbon remains in the film. If carbon remains in the oxide thin film, the adhesion to the substrate becomes strong. On the other hand, if the carbon remaining in the oxide thin film is substantially zero, the gas barrier property is the best. Therefore, carbon is left in the oxide thin film on the substrate surface side, and a gradient composition film is formed so that no carbon remains on the surface side of the oxide thin film, thereby providing excellent adhesion to the substrate and gas barrier properties. Can be a good oxide thin film.

[0024] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ワイヤ 一は、前記ホットワイヤーとしたときに、実質的に揮発しない金属又は炭素を主成分と して形成されてなることが好ましい。ワイヤーの組成に左右されず、非自然発火性原 料が熱分解 '酸化した酸化物薄膜が得られる。  [0024] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the wire 1 is formed mainly of a metal or carbon that does not substantially volatilize when the hot wire is used. It is preferable to become. Regardless of the composition of the wire, a non-pyrophoric raw material is thermally decomposed to obtain an oxidized oxide thin film.

[0025] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ワイヤ 一は、金属若しくは導電性金属化合物若しくは炭素を主成分として形成され、かつ、 前記ホットワイヤーとしたときに炭素、ケィ素又は金属元素を揮発させ、かつ、前記炭 素、ケィ素又は金属元素が前記酸化物薄膜に取り込まれて添加成分となることが好 ましい。非自然発火性原料由来の成分を主成分とし、ワイヤー由来の成分を添加成 分とすることで、形成可能な機能性薄膜の種類を容易に多様化できる。  [0025] In the method of manufacturing a plastic container coated with an oxide thin film according to the present invention, the wire is formed mainly of a metal, a conductive metal compound, or carbon, and carbon when used as the hot wire. It is preferable that volatilization of the key element or metal element and the addition of the carbon, key element or metal element into the oxide thin film become an additive component. By using a component derived from a non-pyrophoric raw material as a main component and a component derived from a wire as an additive component, the types of functional thin films that can be formed can be easily diversified.

[0026] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記添カロ 成分が、カラーセンターとして機能する態様を選択できる。酸化物薄膜に呈色を施す こと力 Sでさる力、らである。  [0026] In the method for producing a plastic container coated with an oxide thin film according to the present invention, a mode in which the additive calorie component functions as a color center can be selected. Applying color to oxide thin film.

[0027] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記カラ 一センターとして機能する前記金属元素が、コバルト、マンガン、銅、鉄、クロム、アン チモン、力ドニゥム、硫黄、セレン、金、ニッケル、ウラン、バナジウム、銀、モリブデン 、錫、タングステン、ビスマス又はエルビウムである場合が含まれる。  [0027] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the metal element functioning as the color center is cobalt, manganese, copper, iron, chromium, antimony, force donium, sulfur, Examples include selenium, gold, nickel, uranium, vanadium, silver, molybdenum, tin, tungsten, bismuth or erbium.

[0028] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記添カロ 成分が、前記酸化物薄膜において架橋材として機能する態様を選択できる。酸化物 薄膜の物理化学的安定性を向上させ、又は、屈折率の調整をすることができるから である。  [0028] In the method for producing a plastic container coated with an oxide thin film according to the present invention, it is possible to select an embodiment in which the additive calorie component functions as a cross-linking material in the oxide thin film. This is because the physicochemical stability of the oxide thin film can be improved or the refractive index can be adjusted.

[0029] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記架橋 材として機能する前記添加成分が、ナトリウム、カリウム、リチウム、鉛、炭素又はチタ ンである場合が含まれる。 [0029] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the additive component that functions as the cross-linking material is sodium, potassium, lithium, lead, carbon, or titanium. Is included.

[0030] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ワイヤ 一の表面に揮発性物質を塗布又は担持し、前記ホットワイヤーとしたときに前記揮発 性物質が揮発して、前記酸化物薄膜に取り込まれて添加成分となる態様を選択でき る。非自然発火性原料由来の成分が主成分となり、ワイヤーに担持させた揮発性物 質由来の成分が添加成分となる酸化物薄膜を成膜することができるからである。  [0030] In the method of manufacturing a plastic container coated with an oxide thin film according to the present invention, a volatile substance is applied or supported on the surface of the wire, and the volatile substance is volatilized when the hot wire is formed. Therefore, it is possible to select an aspect that is taken into the oxide thin film and becomes an additive component. This is because it is possible to form an oxide thin film in which a component derived from a non-pyrophoric raw material is a main component and a component derived from a volatile substance supported on a wire is an additional component.

[0031] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ワイヤ 一は、前記ホットワイヤーとしたときに揮発する炭素、ケィ素又は金属の少なくともい ずれか一種の成分を含有する金属、導電性金属化合物又は炭素を主成分として形 成されてなり、かつ、前記ホットワイヤーから揮発した炭素、ケィ素又は金属の少なく とも!/、ずれか一種の成分を含む蒸気が、非自然発火性のケィ化有機化合物又は非 自然発火性のアルミニウム含有有機化合物などの前記非自然発火性原料とともに、 非自然発火性原料となり、前記蒸気が酸化して前記酸化物薄膜の主成分の一つを 構成する態様を選択できる。非自然発火性原料由来の成分が主成分となり、また、ヮ ィヤー由来の成分も主成分となる酸化物薄膜を成膜することができるからである。  [0031] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the wire 1 contains at least one component of carbon, silicon, or metal that volatilizes when the hot wire is used. A vapor containing at least one of carbon, silicon, or metal volatilized from the hot wire and formed of a metal, a conductive metal compound, or carbon as a main component. Together with the non-pyrophoric raw material such as a pyrophoric key organic compound or a non-pyrophoric aluminum-containing organic compound, it becomes a non-pyrophoric raw material, and the vapor is oxidized to become one of the main components of the oxide thin film. Can be selected. This is because it is possible to form an oxide thin film in which a component derived from a non-pyrophoric raw material is a main component and a component derived from a flame is also a main component.

[0032] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ワイヤ 一は、前記ホットワイヤーとしたときに揮発する炭素、ケィ素又は金属の少なくともい ずれか一種の成分を含有する金属、導電性金属化合物又は炭素を主成分として形 成されてなり、かつ、前記非自然発火性原料が、前記ホットワイヤーから揮発した炭 素、ケィ素又は金属の少なくともいずれか一種の成分を含む蒸気であり、前記酸化 物薄膜は、前記蒸気が酸化した酸化物薄膜である態様を選択できる。ワイヤー由来 の成分が主成分となる酸化物薄膜を成膜することができるからである。ワイヤー由来 の蒸気であれば、安全性をさらに高め、また、原料導入手段が簡素となる。また、ワイ ヤーの組成を調整することで薄膜の組成を容易に制御することができる。  [0032] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the wire contains at least one component of carbon, silicon, or metal that volatilizes when the hot wire is used. And the non-pyrophoric raw material is composed of at least one component of carbon, carbon or metal volatilized from the hot wire. It is possible to select an embodiment in which the vapor is an oxide thin film in which the vapor is oxidized. This is because an oxide thin film whose main component is a wire-derived component can be formed. If the steam is derived from wire, the safety will be further improved and the raw material introduction means will be simplified. Further, the composition of the thin film can be easily controlled by adjusting the composition of the wire.

[0033] 本発明に係る、上述したワイヤー成分が添加された酸化物薄膜を被膜したプラスチ ック容器の製造方法では、前記蒸気は、 2000°C以下で飽和蒸気圧が 10— 4Pa以上 の金属の単体又は該金属を含む化合物の蒸気であることが好ましレ、。充分な成膜速 度、例えば 2. 5nm/秒以上の成膜速度を得ることができる。 [0034] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記蒸気 、モリブデン、銅、アルミニウム、パラジウム、タングステン、銀、ケィ素、炭素、ナトリ ゥム、カリウム、リチウム、鉛又はチタン或いはこれらを含む化合物であり、かつ、前記 酸化物薄膜はモリブデン、銅、アルミニウム、パラジウム、タングステン、銀又はケィ素 の酸化物が主成分であることが好ましレ、。金属種によって色の異なる酸化物薄膜が 得られる。また、主成分となる蒸気(モリブデン、銅、アルミユウム、パラジウム、タンダ ステン、銀又はケィ素を含む蒸気)のみのほか、これらの蒸気に添加成分となる蒸気 (ナトリウム、カリウム、リチウム、炭素、鉛又はチタンを含む蒸気)が加わっても良い。 [0033] According to the present invention, in the manufacturing method of the plastics container of the oxide thin film above the wire component is added to the coating, the steam is saturated steam pressure 10- 4 Pa or more below 2000 ° C Preferably, it is a vapor of a simple substance of a metal or a compound containing the metal. A sufficient film formation rate, for example, a film formation rate of 2.5 nm / second or more can be obtained. [0034] In the method for producing a plastic container coated with the oxide thin film according to the present invention, the vapor, molybdenum, copper, aluminum, palladium, tungsten, silver, silicon, carbon, sodium, potassium, lithium, lead or It is preferable that the oxide thin film is titanium or a compound containing these, and the oxide thin film is mainly composed of an oxide of molybdenum, copper, aluminum, palladium, tungsten, silver, or silicon. Oxide thin films with different colors depending on the metal species are obtained. In addition to the main component steam (molybdenum, copper, aluminum, palladium, tandastene, silver or silicon-containing steam), these additional vapors (sodium, potassium, lithium, carbon, lead) Alternatively, steam containing titanium) may be added.

[0035] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記ワイヤ 一の表面に揮発性物質を塗布又は担持し、前記ホットワイヤーとしたときに前記揮発 性物質が揮発して、前記酸化物薄膜に取り込まれて添加成分となるか、或いは、前 記ワイヤーの表面に揮発性物質を塗布又は担持し、前記ホットワイヤーとしたときに 前記揮発性物質が揮発して、該揮発性物質が前記ワイヤーから揮発した前記蒸気と ともに、前記非自然発火性原料として、前記酸化物薄膜の主成分となる態様を選択 できる。ワイヤー由来の成分が主成分となり、ワイヤーに担持させた揮発性物質由来 の成分が添加成分となる酸化物薄膜を成膜することができるからである。また、ワイヤ 一由来の成分が主成分となり、ワイヤーに担持させた揮発性物質由来の成分も主成 分となる酸化物薄膜を成膜することができるからである。  [0035] In the method for manufacturing a plastic container coated with an oxide thin film according to the present invention, a volatile substance is applied or supported on the surface of the wire, and the volatile substance is volatilized when the hot wire is formed. Incorporated into the oxide thin film to become an additive component, or when a volatile substance is applied or supported on the surface of the wire to form the hot wire, the volatile substance volatilizes and the volatilization occurs. In addition to the vapor from which the volatile substance has volatilized from the wire, the non-pyrophoric raw material can be selected as a main component of the oxide thin film. This is because it is possible to form an oxide thin film in which a component derived from a wire is a main component and a component derived from a volatile substance carried on the wire is an added component. In addition, it is possible to form an oxide thin film in which a component derived from one wire is a main component and a component derived from a volatile substance carried on the wire is also a main component.

[0036] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記非自 然発火性原料は、前記ワイヤーの表面に塗布又は担持された揮発性物質であり、前 記ホットワイヤーとしたときに前記揮発性物質が揮発して、前記酸化物薄膜の主成分 となるとなる態様を選択できる。揮発性物質由来の成分が主成分となる酸化物薄膜 を成膜することができるからである。揮発性物質に由来すれば安全性が高ぐまた、 原料導入手段が簡素となる。  [0036] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the non-self-igniting raw material is a volatile substance applied or supported on the surface of the wire, In this case, it is possible to select a mode in which the volatile substance volatilizes and becomes the main component of the oxide thin film. This is because an oxide thin film whose main component is a component derived from a volatile substance can be formed. If it is derived from volatile substances, the safety will be high and the raw material introduction means will be simplified.

[0037] 本発明に係る酸化物薄膜を被膜したプラスチック容器の製造方法では、前記揮発 性物質が、モリブデン、銅、アルミニウム、パラジウム、タングステン、銀又はケィ素或 いはこれらを含む化合物であることが好まし!/、。金属種によって色の異なる酸化物薄 膜が得られる。 発明の効果 [0037] In the method for producing a plastic container coated with an oxide thin film according to the present invention, the volatile substance is molybdenum, copper, aluminum, palladium, tungsten, silver, or a compound containing these. Is preferred! Oxide thin films with different colors depending on the metal species can be obtained. The invention's effect

本発明によって、ガスノ リア薄膜コーティングプラスチック容器の製造方法において 、室温のプラスチック製の立体形状を有している容器に、非自然発火性の原料とォゾ ンを使用し、安全かつ高速でガスバリア性を有する薄膜を低温で成膜することができ る。この製法は、高価な機材を必要としない製造装置で稼動しうる安価な製法である 図図面面のの簡簡単単なな説説明明  According to the present invention, in a method for producing a gas-noria thin film-coated plastic container, a non-pyrophoric raw material and ozone are used in a container having a three-dimensional shape made of plastic at room temperature. It is possible to form a thin film having a low temperature. This manufacturing method is an inexpensive manufacturing method that can be operated with manufacturing equipment that does not require expensive equipment.

[[図図 11]]従従来来のの DDLLCC膜膜のの形形成成装装置置のの構構成成図図ででああるる。。 [[FIG. 11]] It is a configuration diagram of a conventional DDLLCC film forming apparatus. .

[[図図 22]]第第 11形形態態にに係係るる成成膜膜装装置置のの一一形形態態をを示示すす概概略略図図でであありり、、 ((aa))ははワワイイヤヤーーがが直直線線 形形状状のの場場合合、、((bb))ははワワイイヤヤーーががココイイルルばばねね形形状状のの場場合合、、((cc))ははワワイイヤヤーーががジジググザザクク線線 形形状状のの場場合合、、ででああるる。。  [[FIG. 22] FIG. 22 is a schematic schematic diagram showing one form of the film deposition apparatus apparatus according to the eleventh form, and ((aa )) Is when the wire is in the shape of a straight line, ((bb)) is when the wire is in the shape of a spring if it is cocoyl, and ((cc)) is If the wire has a zigzag line shape, then .

[[図図 33]]ワワイイヤヤーーとと原原料料ガガスス供供給給管管ととのの位位置置関関係係のの他他形形態態をを示示ししたた。。  [[Fig. 33]] Another form of the positional relationship between the wireless wire and the raw material feed gas supply pipe is shown. .

[[図図 44]]第第 22形形態態にに係係るる成成膜膜装装置置のの一一形形態態をを示示すす概概略略図図でであありり、、 ((aa))ははワワイイヤヤーーがが線線状状 のの場場合合、、((bb))ははワワイイヤヤーーががココイイルルばばねね形形状状のの場場合合、、ででああるる。。 [[FIG. 44]] FIG. 44 is a schematic schematic diagram showing one form of the film deposition apparatus according to the twenty-second form, and ((aa )) Is when the wire is linear, and ((bb)) is when the wire is of a spring-like shape. .

[[図図 55]]ΑΑ--ΑΑ''断断面面図図をを示示ししたた。。 [[Fig. 55]] A cross-sectional view of ΑΑ--ΑΑ '' is shown. .

[[図図 66]]ΑΑ--ΑΑ''断断面面図図をを示示ししたた。。 [[Fig. 66]] ΑΑ--ΑΑ '' Cross section view is shown. .

[[図図 77]]複複数数ののププララススチチッックク容容器器のの内内表表面面にに同同時時ににガガススババリリアア薄薄膜膜をを成成膜膜すするるたためめのの装装 置置のの概概念念図図ででああるる。。  [[Fig. 77]] A thin gas film of Gagasubaria is formed on the inner surface of the plurality of plastic plastic containers at the same time. FIG. 2 is a schematic conceptual diagram of a device for sulling and laying down. .

[[図図 88]]複複数数ののププララススチチッックク容容器器のの外外表表面面にに同同時時ににガガススババリリアア薄薄膜膜をを成成膜膜すするるたためめのの装装 置置のの概概念念図図ででああるる。。  [[Fig. 88]] Form a thin film of Gagasubaria rear thin film on the outer and outer surface surfaces of multiple plastic plastic containers at the same time. FIG. 2 is a schematic conceptual diagram of an apparatus for laying down. .

[[図図 99]]イインンラライインンでで複複数数ののププララススチチッックク容容器器のの外外表表面面にに同同時時ににガガススババリリアア薄薄膜膜をを成成膜膜 すするるたためめのの装装置置のの概概念念図図ででああるる。。  [[Fig. 99]] A thin gas film of Gagasubaria rear is simultaneously applied to the outer and outer surface surfaces of multiple plastic plastic containers. FIG. 2 is a schematic conceptual diagram of a device for depositing a film. .

[[図図 1100]]容容器器冷冷却却手手段段をを説説明明すするるたためめのの概概念念図図でであありり、、 ((aa))ははププララススチチッックク容容器器のの内内表表 面面にに成成膜膜すするる場場合合、、((bb))ははププララススチチッックク容容器器のの外外表表面面にに成成膜膜すするる場場合合、、ででああるる。。  [[Figure 1100]] A schematic conceptual diagram for explaining the container cooling / cooling means, ((aa)) is When depositing a film on the inner surface of the container, ((bb)) is on the outer surface of the polypropylene container. In the case of depositing a film on a film, .

[[図図 1111]]図図 99のの薄薄膜膜形形成成室室のの他他形形態態をを示示ししたた。。 [[FIG. 1111]] Another form of the thin film film forming chamber shown in FIG. 99 is shown. .

[[図図 1122]]実実施施例例 11ににつついいてて、、 XX線線光光電電子子分分光光法法にによよるる深深ささ方方向向ののケケィィ素素、、炭炭素素及及びび酸酸

Figure imgf000011_0001
[[FIG. 1122]] In the actual working example 11, according to the XX-ray photoelectron spectroscopy spectrophotometry, the key element in the direction of depth, , Carbon and carbon and acid
Figure imgf000011_0001

[[図図 1133]]実実施施例例 22ににつついいてて、、 XX線線光光電電子子分分光光法法にによよるる深深ささ方方向向ののケケィィ素素、、炭炭素素及及びび酸酸 素の組成分析結果を示すグラフである。 符号の説明 [[FIG. 1133]] According to Example 22 of actual implementation, the key element in the direction of depth according to the XX-ray photoelectron spectroscopy method, , Carbon and carbon and acid It is a graph which shows a compositional analysis result of an element. Explanation of symbols

1 , 12,反応室 1, 12, reaction chamber

1A,炭素源ガスの導入口  1A, carbon source gas inlet

1B,排気口  1B, exhaust port

2,外部電極  2, external electrode

3, 内部電極  3, internal electrode

4,高周波電源  4, high frequency power supply

5, 11 ,プラスチック容器  5, 11, plastic container

6, 60,真空チャンバ  6, 60, vacuum chamber

8,真空バルブ  8, vacuum valve

13, 63,下部チャンバ  13, 63, lower chamber

14,〇リング  14, 〇 ring

15, 65,上部チャンノ  15, 65, upper channo

16 , 66,ガス供給口  16, 66, gas supply port

17,原料ガス流路  17, Raw material gas flow path

17x, 77x,ガス吹き出し孑し  17x, 77x, gas blower

18 ,ワイヤー  18, wire

19,配線19, wiring

0,ヒータ電源 0, heater power

1 ,プラスチック容器の口部 1, mouth of plastic container

2,排気管 2, exhaust pipe

3, 73,原料ガス供給管 3, 73, Raw material gas supply pipe

4a, 24b,流量調整器 4a, 24b, flow regulator

5a, 25b, 25c, /く/レフ、' 5a, 25b, 25c, / ku / ref, '

6a, 26b, 79a, 79b,接続部 6a, 26b, 79a, 79b, connection

7,冷却水流路 7, cooling water flow path

8,真空チャンバの内面 29,冷却手段 8, inner surface of vacuum chamber 29, cooling means

30,透明体からなるチャンバ  30, Transparent chamber

31 ,原料ガス配管  31, Raw material gas piping

32,ボトル回転機構  32, bottle rotation mechanism

33, 34,非自然発火性原料及びオゾンガス  33, 34, Non-pyrophoric raw materials and ozone gas

35,絶縁セラミックス部材  35, Insulating ceramic material

36 ,伸縮機構付の絶縁セラミックス製の内管  36, Insulating ceramics inner tube with expansion and contraction mechanism

40,ボトル整列室  40, Bottle alignment room

41 ,排気室  41, exhaust chamber

42,薄膜形成室  42, Thin film formation chamber

43,大気リーク室  43, air leak chamber

44,取出し室  44, take-out room

50,冷却された液体若しくは気体  50, cooled liquid or gas

51 ,容器冷却手段  51, container cooling means

100, 200,成膜装置  100, 200, deposition system

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0041] 添付の図面を参照して本発明の実施の形態を説明する。以下に説明する実施の 形態は本発明の構成の例であり、本発明は、以下の実施の形態に制限されるもので はない。まず、本実施形態に係る酸化物薄膜を被膜したプラスチック容器の製造方 法を説明する前に、使用する成膜装置について図 2〜図 11を参照しながら説明する 。なお、共通の部位 '部品には同一符号を付した。  [0041] Embodiments of the present invention will be described with reference to the accompanying drawings. The embodiment described below is an example of the configuration of the present invention, and the present invention is not limited to the following embodiment. First, before describing a method for manufacturing a plastic container coated with an oxide thin film according to the present embodiment, a film forming apparatus to be used will be described with reference to FIGS. In addition, the same code | symbol was attached | subjected to common site | part components.

[0042] (第 1形態:容器の内表面への成膜)  [0042] (First form: Film formation on the inner surface of the container)

まず、容器の内表面に酸化物薄膜を成膜できる第 1形態に係る成膜装置について 説明する。図 2は、第 1形態に係る成膜装置を示す概略図であり、(a)はワイヤーが 直線形状の場合、(b)はワイヤーがコイルばね形状の場合、(c)はワイヤーがジグザ ク線形状の場合、である。ただし、図 2 (b) (c)は、原料ガス供給管 23の部分拡大図 である。なお、以下特に断らない限り「図 2」は「図 2 (a)」として説明する。図 2に示した 成膜装置 100は、プラスチック容器 11を収容する真空チャンバ 6と、真空チャンバ 6 を真空引きする排気ポンプ (不図示)と、プラスチック容器 11の内部に揷脱可能に配 置され、プラスチック容器 11の内部へ原料ガス(非自然発火性原料)及びオゾンガス を供給する、絶縁且つ耐熱の材料で形成された原料ガス供給管 23と、原料ガス供給 管 23に支持されたワイヤー 18と、ワイヤー 18に通電して発熱させるヒータ電源 20と、 を有する。 First, a film forming apparatus according to a first embodiment capable of forming an oxide thin film on the inner surface of a container will be described. FIG. 2 is a schematic diagram showing the film forming apparatus according to the first embodiment, where (a) is a wire having a linear shape, (b) is a wire having a coil spring shape, and (c) is a zigzag wire. In the case of a line shape. However, FIGS. 2 (b) and 2 (c) are partially enlarged views of the source gas supply pipe 23. FIG. Unless otherwise specified, “FIG. 2” will be described as “FIG. 2 (a)”. The film forming apparatus 100 shown in FIG. 2 includes a vacuum chamber 6 that accommodates a plastic container 11 and a vacuum chamber 6. An evacuation pump (not shown) that evacuates the inside of the plastic container 11 is detachably disposed, and supplies a raw material gas (non-pyrophoric raw material) and ozone gas into the plastic container 11. A raw material gas supply pipe 23 formed of the above material, a wire 18 supported by the raw material gas supply pipe 23, and a heater power source 20 that energizes the wire 18 to generate heat.

[0043] 真空チャンバには、その内部にプラスチック容器 11を収容する空間が形成されて おり、この空間は薄膜形成のための反応室 12となる。真空チャンバ 6は、下部チャン ノ 13と、この下部チャンバ 13の上部に着脱自在に取り付けられて下部チャンバ 13の 内部を Oリング 14で密閉するようになっている上部チャンバ 15とから構成されている 。上部チャンバ 15には図示していない上下の駆動機構があり、プラスチック容器 11 の搬入'搬出に伴い上下する。下部チャンバ 13の内部空間は、そこに収容されるプ ラスチック容器 11の外形よりも僅かに大きくなるように形成されている。このプラスチッ ク容器 11は、飲料用ボトルであるが、他の用途に使用される容器であってもよい。  In the vacuum chamber, a space for accommodating the plastic container 11 is formed, and this space becomes a reaction chamber 12 for forming a thin film. The vacuum chamber 6 includes a lower chamber 13 and an upper chamber 15 that is detachably attached to the upper portion of the lower chamber 13 and seals the inside of the lower chamber 13 with an O-ring 14. . The upper chamber 15 has an upper and lower drive mechanism (not shown) and moves up and down as the plastic container 11 is carried in and out. The internal space of the lower chamber 13 is formed to be slightly larger than the outer shape of the plastic container 11 accommodated therein. The plastic container 11 is a beverage bottle, but may be a container used for other purposes.

[0044] 真空チャンバ 6の内側、特に下部チャンバ 13の内側は、ワイヤー 18の発熱に伴つ て放射される光の反射を防ぐために、内面 28が黒色内壁となっているか或いは内面 が表面粗さ(Rmax) O. 5 m以上の凹凸を有していることが好ましい。表面粗さ(Rm ax)は、例えば表面粗さ測定器 (アルバックテクノ (株)製、 DEKTAK3)を用いて測 定する。内面 28を黒色内壁とするためには、黒ニッケルメツキ ·黒クロームメツキなど のメツキ処理、レイデント'黒染などの化成皮膜処理、又は、黒色塗料を塗布して着 色する方法がある。さらに、冷却水が流される冷却管等の冷却手段 29を真空チャン ノ 6の内部(不図示)又は外部(図 2)に設けて、下部チャンバ 13の温度上昇を防止 することが好ましい。真空チャンバ 6のうち特に下部チャンバ 13を対象とするのはワイ ヤー 18がプラスチック容器 11に揷入されているときに、ちょうど下部チャンバ 13の内 部空間に収容された状態となるからである。光の反射の防止及び真空チャンバ 6の 冷却を行なうことで、プラスチック容器 11の温度上昇と、それに伴う熱変形を抑制で きる。さらに、通電されたワイヤー 18から発生した放射光が通過できる透明体からな るチャンバ 30、例えばガラス製チャンバを下部チャンバ 13の内側に配置すると、プラ スチック容器 11に接するガラス製チャンバの温度が上昇しにくいため、プラスチック 容器 11に与える熱的影響をさらに軽減させることができる。 [0044] The inside of the vacuum chamber 6, particularly the inside of the lower chamber 13, has an inner surface 28 that is a black inner wall or an inner surface that has a surface roughness in order to prevent reflection of light emitted as the wire 18 generates heat. (Rmax) O. It preferably has irregularities of 5 m or more. The surface roughness (Rmax) is measured using, for example, a surface roughness measuring device (DEKTAK3 manufactured by ULVAC TECHNO CORPORATION). In order to make the inner surface 28 a black inner wall, there are methods of plating treatment such as black nickel plating and black chrome plating, chemical film treatment such as Raydent's black dyeing, or applying black paint and coloring. Further, it is preferable to provide a cooling means 29 such as a cooling pipe through which the cooling water flows inside the vacuum channel 6 (not shown) or outside (FIG. 2) to prevent the temperature of the lower chamber 13 from rising. The reason why the lower chamber 13 of the vacuum chamber 6 is particularly targeted is that when the wire 18 is inserted into the plastic container 11, the vacuum chamber 6 is in a state of being accommodated in the inner space of the lower chamber 13. By preventing light reflection and cooling the vacuum chamber 6, the temperature rise of the plastic container 11 and the accompanying thermal deformation can be suppressed. Further, if a chamber 30 made of a transparent material through which the radiated light generated from the energized wire 18 can pass, for example, a glass chamber, is placed inside the lower chamber 13, the temperature of the glass chamber in contact with the plastic container 11 rises. Difficult to plastic The thermal effect on the container 11 can be further reduced.

[0045] 原料ガス供給管 23は、上部チャンバ 15の内側天井面の中央において下方に垂下 するように支持されている。原料ガス供給管 23には、流量調整器 24a〜24bとバルブ 25a〜25cを介して非自然発火性原料及びオゾンガスが流入される。原料ガス供給 管 23は、冷却管を有し、一体に形成されていることが好ましい。このような原料ガス供 給管 23の構造としては、例えば二重管構造がある。原料ガス供給管 23において、二 重管の内側管路は原料ガス流路 17となっており、その一端は上部チャンバ 15に設 けられたガス供給口 16に接続されていて、その他端はガス吹き出し孔 17xとなってい る。これにより原料ガス及びオゾンガスはガス供給口 16に接続された原料ガス流路 1 7の先端のガス吹き出し孔 17xから吹き出されるようになつている。一方、二重管の外 側管路は、原料ガス供給管 23を冷却するための冷却水流路 27であり、冷却管として 役割をなしている。そして、ワイヤー 18が通電され発熱してホットワイヤーとなってい るとき、原料ガス流路 17の温度が上昇する。これを防止するため、冷却水流路 27に 冷却水が循環している。すなわち、冷却水流路 27の一端では、上部チャンバ 15に 接続された不図示の冷却水供給手段から冷却水の供給がなされ、同時に冷却水供 給手段に冷却を終えた冷却水が戻される。一方、冷却水流路 27の他端は、ガス吹き 出し孔 17x付近において封止されていて、ここで冷却水が折り返して戻される。冷却 水流路 27によって、原料ガス供給管 23全体が冷却される。冷却することでプラスチッ ク容器 11に与える熱的影響を低減させることができる。したがって、原料ガス供給管 23の材質は絶縁体で熱伝導率が大きいものが良い。例えば、窒化アルミニウム、炭 化珪素、窒化珪素又は酸化アルミニウムを主成分とする材料で形成されたセラミック 管であるか、或いは、窒化アルミニウム、炭化珪素、窒化珪素又は酸化アルミニウム を主成分とする材料で表面が被覆された金属管であることが好ましい。ワイヤーに安 定して通電することができ、耐久性があり、且つ、ワイヤーで発生した熱を熱伝導によ つて ¾]串よくお熱させること力 Sできる。  The source gas supply pipe 23 is supported so as to hang downward at the center of the inner ceiling surface of the upper chamber 15. The non-pyrophoric raw material and ozone gas flow into the raw material gas supply pipe 23 through the flow rate adjusters 24a to 24b and the valves 25a to 25c. The source gas supply pipe 23 preferably has a cooling pipe and is integrally formed. As a structure of such a raw material gas supply pipe 23, for example, there is a double pipe structure. In the source gas supply pipe 23, the inner pipe of the double pipe is a source gas channel 17, one end of which is connected to the gas supply port 16 provided in the upper chamber 15, and the other end is a gas. The blowout hole is 17x. As a result, the raw material gas and the ozone gas are blown out from the gas blowing hole 17x at the tip of the raw material gas flow path 17 connected to the gas supply port 16. On the other hand, the outer pipe line of the double pipe is a cooling water flow path 27 for cooling the raw material gas supply pipe 23, and serves as a cooling pipe. When the wire 18 is energized and generates heat to form a hot wire, the temperature of the source gas channel 17 rises. In order to prevent this, cooling water circulates in the cooling water passage 27. That is, at one end of the cooling water flow path 27, cooling water is supplied from a cooling water supply means (not shown) connected to the upper chamber 15, and at the same time, the cooled cooling water is returned to the cooling water supply means. On the other hand, the other end of the cooling water passage 27 is sealed in the vicinity of the gas blowing hole 17x, and the cooling water is folded back and returned here. The entire raw material gas supply pipe 23 is cooled by the cooling water passage 27. Cooling can reduce the thermal effect on the plastic container 11. Therefore, the material of the source gas supply pipe 23 is preferably an insulator and has a high thermal conductivity. For example, a ceramic tube formed of a material mainly composed of aluminum nitride, silicon carbide, silicon nitride, or aluminum oxide, or a material mainly composed of aluminum nitride, silicon carbide, silicon nitride, or aluminum oxide. A metal tube whose surface is coated is preferable. The wire can be stably energized, durable, and the heat generated by the wire can be heated by heat conduction.

[0046] 原料ガス供給管 23について、不図示の他形態として、次のようにしても良い。すな わち、原料ガス供給管を二重管とし、その外側管を原料ガス流路として外側管の側 壁に孔、好ましくは複数の孔を開ける。一方、原料ガス供給管の二重管の内側管は、 緻密な管で形成し、冷却水流路として冷却水を流す。ワイヤーは原料ガス供給管の 側壁に沿って配線される力 S、側壁に沿った部分のワイヤーに、外側管の側壁に設け た孔を通った原料ガス及びオゾンが接触し、熱分解した原料を効率よく酸化させるこ と力 Sできる。 The raw material gas supply pipe 23 may be configured as follows as another form (not shown). That is, the source gas supply pipe is a double pipe and the outer pipe is used as a source gas flow path, and a hole, preferably a plurality of holes, is formed in the side wall of the outer pipe. On the other hand, the inner pipe of the double pipe of the source gas supply pipe is It is formed by a dense tube, and the cooling water flows as a cooling water flow path. The wire is the force S that is routed along the side wall of the source gas supply pipe, and the source gas and ozone that have passed through the hole provided in the side wall of the outer pipe are in contact with the wire in the portion along the side wall, and the pyrolyzed source material is It can be oxidized efficiently.

[0047] ガス吹き出し孔 17xは、プラスチック容器 11の底と離れすぎていると、プラスチック 容器 11の内部に薄膜を形成することが難しい。本実施形態では、原料ガス供給管 2 3の長さは、ガス吹き出し孔 17xからプラスチック容器 11の底までの距離 L1が 5〜50 mmとなるように形成すること力 S好ましい。 15〜30mmとなるように形成すること力 Sより 好ましい。膜厚の均一性が向上する。 5〜 50mmの距離とすることで均一な薄膜をプ ラスチック容器 11の内表面に成膜することができる。距離が 50mmより大きいとプラス チック容器 11の底に薄膜が形成しにくくなり、距離が 5mmより小さいと原料ガスの吹 き出しが困難になったり、プラスチック容器 11の内表面のうち、ガス吹き出し孔 17xの 近傍の成膜が過剰となりやすくなる。  [0047] If the gas blowing hole 17x is too far from the bottom of the plastic container 11, it is difficult to form a thin film inside the plastic container 11. In the present embodiment, the length of the source gas supply pipe 23 is preferably a force S so that the distance L1 from the gas blowing hole 17x to the bottom of the plastic container 11 is 5 to 50 mm. It is more preferable than forming force S to be 15 to 30 mm. The uniformity of the film thickness is improved. By setting the distance to 5 to 50 mm, a uniform thin film can be formed on the inner surface of the plastic container 11. If the distance is greater than 50 mm, it will be difficult to form a thin film on the bottom of the plastic container 11, and if the distance is less than 5 mm, it will be difficult to blow out the source gas, or the gas blowing holes on the inner surface of the plastic container 11 Film formation near 17x tends to be excessive.

[0048] ワイヤー 18は、通電発熱させてホットワイヤーとすることで、非自然発火性原料とォ ゾンガスとを熱分解する。熱分解したオゾンによって非自然発火性原料の酸化を促 進し、プラスチック容器 11の内表面に酸化物薄膜を成膜させる。本実施形態におい ては、ワイヤー 18は、金属、特に耐酸化性金属からなることが好ましぐ例えば、 Ir線 、 Re線、ニクロム線、 Pt線又は Au線、或いは、 Ir基合金線、 Re基合金線、 Pt基線又 は Au基線である。またワイヤー 18は炭素を主成分とする物体、例えば炭素繊維とし ても良い。導電性を有するので、通電によりそれ自体を発熱させることが可能となる。 ワイヤー 18は、単なる加熱手段のホットワイヤーであるのみならず、触媒化学蒸着法 による熱触媒体であっても良い。ただし、触媒化学蒸着法の熱触媒体として通常使 用されるタングステンワイヤーは、酸化されると劣化するため、オゾンガス含有雰囲気 下では避けるべきである。ワイヤー 18は配線形状に形成され、原料ガス供給管 23の 上部チャンバ 15における固定箇所の下方に設けた、配線 19とワイヤー 18との接続 箇所となる接続部 26aに、ワイヤー 18の一端が接続される。そして先端部分であるガ ス吹き出し孔 17xに設けた絶縁セラミックス部材 35で支持される。さらに、折り返して 、接続部 26bにワイヤー 18の他端が接続される。このように、ワイヤー 18は原料ガス 供給管 23の側面に沿って支持されているため、下部チャンバ 13の内部空間のほぼ 主軸上に位置するように配置されることとなる。図 2 (a)では、ワイヤー 18は、原料ガ ス供給管 23の軸と平行となるように原料ガス供給管 23の周囲に沿って配置された場 合を示したが、接続部 26aを起点として原料ガス供給管 23の側面に螺旋状に巻きつ け、ガス吹き出し孔 17x付近に固定された絶縁セラミックス 35で支持したあと、接続 部 26bに向けて折り返して戻しても良い。ここでワイヤー 18は、絶縁セラミックス 35に 引っ掛けることで原料ガス供給管 23に固定されている。図 2 (a)では、ワイヤー 18は 、原料ガス供給管 23のガス吹き出し孔 17x付近において、ガス吹き出し孔 17xの外 側に配置されている場合を示した。これによつて、ガス吹き出し孔 17xから吹き出た 非自然発火性原料及びオゾンガスはワイヤー 18と接触しやすくなるため、非自然発 火性原料を効率よく熱分解及び酸化させることができる。ここで、ワイヤー 18は、原料 ガス供給管 23の側面から僅かに離して配置することが好まし!/、。原料ガス供給管 23 の急激な温度上昇を防止するためである。また、ガス吹き出し孔 17xから吹き出た非 自然発火性原料及びオゾンガス並びに反応室 12にある非自然発火性原料及びォ ゾンガスとの接触機会を増やすことができる。このワイヤー 18を含む原料ガス供給管 23の外径は、プラスチック容器の口部 21の内径よりも小さいことが必要である。ワイ ヤー 18を含む原料ガス供給管 23をプラスチック容器の口部 21から揷入するためで ある。したがって、必要以上にワイヤー 18を原料ガス供給管 23の表面から離すと、原 料ガス供給管 23をプラスチック容器の口部 21から挿入するときに接触しやすくなつ てしまう。ワイヤー 18の横幅は、プラスチック容器の口部 21から揷入する時の位置ズ レを考慮すると、 10mm以上、(口部 21の内径— 6)mm以下が適当である。ここで口 部 21の内径はおおよそ 21 · 7—39. 8mmである。 [0048] The wire 18 is heated by energization to form a hot wire, thereby thermally decomposing the non-pyrophoric raw material and the ozone gas. Oxidation of non-pyrophoric raw materials is promoted by the pyrolyzed ozone, and an oxide thin film is formed on the inner surface of the plastic container 11. In the present embodiment, the wire 18 is preferably made of a metal, particularly an oxidation-resistant metal. For example, an Ir wire, a Re wire, a nichrome wire, a Pt wire or an Au wire, or an Ir-based alloy wire, Re Base alloy wire, Pt base wire or Au base wire. The wire 18 may be a carbon-based object such as carbon fiber. Since it has conductivity, it becomes possible to generate heat by energization. The wire 18 is not only a hot wire as a heating means, but may also be a thermal catalyst by a catalytic chemical vapor deposition method. However, tungsten wire, which is normally used as a thermal catalyst for catalytic chemical vapor deposition, should be avoided in an atmosphere containing ozone gas because it deteriorates when oxidized. The wire 18 is formed in a wiring shape, and one end of the wire 18 is connected to a connection portion 26a that is a connection portion between the wiring 19 and the wire 18 provided below the fixed portion in the upper chamber 15 of the source gas supply pipe 23. The And it is supported by the insulating ceramic member 35 provided in the gas blowing hole 17x which is the tip portion. Further, the other end of the wire 18 is connected to the connecting portion 26b by folding. Thus, the wire 18 is the source gas Since it is supported along the side surface of the supply pipe 23, the supply pipe 23 is arranged so as to be positioned substantially on the main axis of the internal space of the lower chamber 13. In FIG. 2 (a), the wire 18 is shown arranged around the source gas supply pipe 23 so as to be parallel to the axis of the source gas supply pipe 23. As a result, it is possible to wrap around the side surface of the source gas supply pipe 23 in a spiral shape, support it with the insulating ceramics 35 fixed in the vicinity of the gas blowing hole 17x, and then fold it back toward the connecting portion 26b. Here, the wire 18 is fixed to the source gas supply pipe 23 by being hooked on the insulating ceramic 35. FIG. 2 (a) shows the case where the wire 18 is disposed outside the gas blowing hole 17x in the vicinity of the gas blowing hole 17x of the source gas supply pipe 23. As a result, the non-pyrophoric raw material and ozone gas blown out from the gas blowing hole 17x are likely to come into contact with the wire 18, so that the non-pyrophoric raw material can be efficiently decomposed and oxidized. Here, it is preferable to arrange the wire 18 slightly away from the side surface of the raw material gas supply pipe 23! /. This is to prevent a rapid temperature rise of the raw material gas supply pipe 23. Further, it is possible to increase the chances of contact with the non-pyrophoric raw material and ozone gas blown from the gas blowing hole 17x and the non-pyrophoric raw material and ozone gas in the reaction chamber 12. The outer diameter of the source gas supply pipe 23 including the wire 18 needs to be smaller than the inner diameter of the mouth portion 21 of the plastic container. This is because the raw material gas supply pipe 23 including the wire 18 is inserted through the opening 21 of the plastic container. Therefore, if the wire 18 is separated from the surface of the raw material gas supply pipe 23 more than necessary, the raw material gas supply pipe 23 is easily contacted when inserted from the mouth portion 21 of the plastic container. The width of the wire 18 is suitably 10 mm or more and (inner diameter of the mouth part-6) mm or less in consideration of the positional deviation when inserting from the mouth part 21 of the plastic container. Here, the inner diameter of the mouth 21 is approximately 21 · 7−39.8 mm.

ワイヤー 18を発熱させたときの上限温度は、そのワイヤーが軟化する温度以下とす ることが好ましい。ホットワイヤーとして作動させる温度は、ワイヤーの材料によって異 なり、 Irであればその軟化する温度まで昇温可能である力 例えば 300〜; 1800°Cで あること力 S好ましく、 800〜; 1100°Cであることがより好ましい。なお、非自然発火性原 料とともにオゾンガスを供給することによって、触媒化学蒸着法でなくホットワイヤー 法であっても上述のとおり 300°Cという低温での反応が可能である。一般に、ワイヤ 一及び基板をある程度加熱した方が、膜質が良好になる傾向がある。しかし、プラス チック基板には、熱変形しないように、あまり熱負荷をかけられない。この点、 800〜1 100°Cであれば、 PET樹脂をはじめとする飲料 ·食品分野における一般的なプラス チック材料製の容器に対し、数百秒以上、ワイヤーからの熱負荷による問題が生じな いため、好ましい設定となる。 It is preferable that the upper limit temperature when the wire 18 is heated is not higher than the temperature at which the wire softens. The operating temperature of the hot wire varies depending on the material of the wire. If Ir, the force that can raise the temperature to the softening temperature is 300 to 1800 ° C, for example, S preferably 800 to 1100 ° C It is more preferable that In addition, by supplying ozone gas together with non-pyrophoric raw materials, the reaction at a low temperature of 300 ° C. is possible as described above even with the hot wire method instead of the catalytic chemical vapor deposition method. Generally, wire If one and the substrate are heated to some extent, the film quality tends to be better. However, the plastic substrate cannot be subjected to much heat load so as not to be thermally deformed. In this respect, if it is 800-1100 ° C, problems caused by heat load from the wire will occur for several hundred seconds or more compared to containers made of plastic materials such as PET resin, which are common in the beverage and food fields. This is the preferred setting.

[0050] また、ワイヤー 18は、非自然発火性原料及びオゾンガスとの接触機会を増やすた めに、図 2 (b)に示したように線材をコイルばね形状に加工した部分を有していること が好ましい。コイルばね形状には、円筒状のみならず、円錐形、たる形又はつづみ形 を含み、さらにこれらの巻線間のピッチを変えた不等ピッチ形を含む。また、図 2 (c) に示したように線材をジグザク線形状に加工した部分を有して!/、ても良レ、。或!/、は、 線材を波線形状に加工した部分を有して!/、ても良レ、(不図示)。これらの!/、ずれの形 態においても、ワイヤー 18は、非自然発火性原料及びオゾンガスの吹き出し方向に 沿って配置されていることが好ましい。これによつて、非自然発火性原料及びオゾン ガス 33はワイヤー 18と接触する機会が増加する。  [0050] Further, the wire 18 has a portion obtained by processing a wire into a coil spring shape as shown in Fig. 2 (b) in order to increase the chance of contact with the non-pyrophoric raw material and ozone gas. It is preferable. The coil spring shape includes not only a cylindrical shape but also a conical shape, a barrel shape or a zigzag shape, and an unequal pitch shape in which the pitch between these windings is changed. In addition, as shown in Fig. 2 (c), it has a part processed into a zigzag line shape! Or! / Has a part of wire rod processed into a wavy line shape! /, But it is good (not shown). Even in these! /, Misalignment forms, the wire 18 is preferably disposed along the blowing direction of the non-pyrophoric raw material and ozone gas. This increases the chance that non-pyrophoric raw materials and ozone gas 33 will come into contact with wire 18.

[0051] ワイヤー 18の原料ガス供給管 23の固定方法について、不図示の他形態として、次 のようにしても良い。すなわち、原料ガス供給管を二重管とし、その外側管を原料ガ ス流路として気孔率 10〜40%の多孔質からなる管で形成する。この多孔質の外側 管に直接ワイヤーを巻きつけても良い。ワイヤーの固定の安定性が向上するとともに 、非自然発火性原料及びオゾンガスがガス吹き出し孔と共に外側管の側壁からも放 出されるために、ワイヤーへの接触効率が向上する。この場合、原料ガス供給管の二 重管の内側管は、緻密な管で形成し、冷却水流路として冷却水を流す。  [0051] The method of fixing the source gas supply pipe 23 of the wire 18 may be as follows as another form (not shown). That is, the raw material gas supply pipe is a double pipe, and the outer pipe is formed of a porous pipe having a porosity of 10 to 40% using a raw material gas channel. A wire may be wound directly around the porous outer tube. In addition to improving the stability of fixing the wire, the non-pyrophoric raw material and ozone gas are also released from the side wall of the outer tube together with the gas blowing holes, so that the contact efficiency with the wire is improved. In this case, the inner pipe of the double pipe of the source gas supply pipe is formed by a dense pipe, and the cooling water flows as a cooling water flow path.

[0052] 図 3にワイヤー 18と原料ガス供給管 23との位置関係の他形態を示した。図 3では、 原料ガス供給管 23の管内にワイヤー 18が配置されている。ワイヤー 18は、非自然 発火性原料及びオゾンガス 33の吹き出し方向に沿って 2列に配置されている。これ によって、非自然発火性原料及びオゾンガス 33はワイヤー 18と接触する機会が増 加する。また、ワイヤー 18が原料ガス供給管の内部に配置されているため、ワイヤー とプラスチック容器の表面との距離を大きくとることができるので、プラスチック容器の 熱変形の発生を抑制できる。図 3で示したように、ワイヤー 18a, 18bはそれぞれ線材 部分が異なる方向を向くように配置されることが好ましい。図 3では、線材は縦横の互 い違いの関係にある。なお、原料ガス供給管 23の管の横断面の形状は、図 3では正 方形であるが、円形、楕円形又は長方形であっても良い。また、管径は、プラスチック 容器の内表面に成膜するためにプラスチック容器の口部から揷入するのであれば、 ロ部径よりも小さくする必要がある。一方、プラスチック容器の外表面に成膜する場 合には、管径を大きくとって、ガス流速を太くすることが好ましい。 FIG. 3 shows another form of the positional relationship between the wire 18 and the source gas supply pipe 23. In FIG. 3, the wire 18 is disposed in the raw material gas supply pipe 23. The wires 18 are arranged in two rows along the blowing direction of the non-pyrophoric raw material and the ozone gas 33. This increases the chances of non-pyrophoric raw materials and ozone gas 33 coming into contact with wire 18. In addition, since the wire 18 is disposed inside the source gas supply pipe, the distance between the wire and the surface of the plastic container can be increased, so that occurrence of thermal deformation of the plastic container can be suppressed. As shown in Fig. 3, the wires 18a and 18b It is preferable that the portions are arranged to face different directions. In Fig. 3, the wires are in a vertical and horizontal relationship. The shape of the cross section of the source gas supply pipe 23 is a square in FIG. 3, but may be a circle, an ellipse or a rectangle. In addition, if the tube diameter is inserted through the mouth of the plastic container in order to form a film on the inner surface of the plastic container, it is necessary to make it smaller than the diameter of the part. On the other hand, when forming a film on the outer surface of the plastic container, it is preferable to increase the gas flow rate by increasing the tube diameter.

[0053] ワイヤー 18には、接続部 26a, 26b及び配線 19を介して、ヒータ電源 20が接続さ れている。ヒータ電源 20によってワイヤー 18に電気を流すことで、ワイヤー 18が発熱 する。 [0053] A heater power supply 20 is connected to the wire 18 via connection portions 26a and 26b and a wiring 19. By causing electricity to flow through the wire 18 by the heater power source 20, the wire 18 generates heat.

[0054] また、プラスチック容器の口部 21から容器の肩にかけてはプラスチック容器 11の成 形時の延伸倍率が小さいため、高温に発熱するワイヤー 18が近くに配置されると、 熱による変形を起こしやすい。実験によれば、配線 19とワイヤー 18との接続箇所で ある接続部 26a, 26bの位置力 S、プラスチック容器の口部 21の下端から 5mm以上離 さないとプラスチック容器 11の肩の部分が熱変形を起こし、 50mmを超えて離すとプ ラスチック容器 11の肩の部分に薄膜が形成しに《なった。そこでワイヤー 18は、そ の上端がプラスチック容器の口部 21の下端から 5〜50mm下方に位置するように配 置されることが良い。すなわち、接続部 26a, 26bと口部 21の下端との距離 L2が 5〜 50mmとなるようにすることが好まし!/、。容器の肩部の熱変形を抑制できる。  [0054] Further, since the draw ratio at the time of forming the plastic container 11 is small from the mouth portion 21 of the plastic container to the shoulder of the container, if the wire 18 that generates heat at a high temperature is placed nearby, the plastic container 11 is deformed by heat. Cheap. According to the experiment, the shoulder force of the plastic container 11 is heated unless it is separated from the lower end of the plastic container mouth 21 by the positional force S of the connection parts 26a and 26b, which is the connection point between the wiring 19 and the wire 18. Deformation occurred, and when separated beyond 50 mm, a thin film formed on the shoulder of the plastic container 11. Therefore, the wire 18 is preferably arranged so that its upper end is located 5 to 50 mm below the lower end of the mouth 21 of the plastic container. That is, it is preferable that the distance L2 between the connecting portions 26a, 26b and the lower end of the mouth portion 21 is 5 to 50 mm! /. Thermal deformation of the shoulder portion of the container can be suppressed.

[0055] また上部チャンバ 15の内部空間には、排気管 22が真空バルブ 8を介して連通され ており、図示しない排気ポンプによって真空チャンバ 6の内部の反応室 12の空気が 排気されるようになっている。  Further, an exhaust pipe 22 is communicated with the internal space of the upper chamber 15 via a vacuum valve 8 so that air in the reaction chamber 12 inside the vacuum chamber 6 is exhausted by an exhaust pump (not shown). It has become.

[0056] (第 2形態:容器の外表面への成膜)  [0056] (Second form: film formation on the outer surface of the container)

次に、容器の外表面にガスバリア薄膜を成膜できる第 2形態に係る成膜装置につ いて説明する。図 4は第 2形態に係る成膜装置の一形態を示す概略図であり、(a)は ワイヤーが線状の場合、(b)はワイヤーがコイルばね形状の場合、である。ただし、図 4 (b)は、ワイヤーの概略図である。なお、以下特に断らない限り「図 4」は「図 4 (a)」と して説明する。図 4に示した成膜装置 200は、プラスチック容器 11を収容する真空チ ヤンバ 60と、真空チャンバ 60を真空引きする排気ポンプ (不図示)と、プラスチック容 器 11の周囲に配置されたワイヤー 18と、真空チャンバ 60の内部のうちプラスチック 容器 11の外部の空間に非自然発火性原料及びオゾンガスを供給する原料ガス配管 31と、ワイヤー 18に通電して発熱させるヒータ電源 20と、を有する。成膜装置 200で は、プラスチック容器 11の口部はボトル回転機構 32によって固定されていて、プラス チック容器 11は、真空チャンバ 60の内部で底が接触しな!/、ように配置されて!/、る。 Next, a film forming apparatus according to the second embodiment capable of forming a gas barrier thin film on the outer surface of the container will be described. 4A and 4B are schematic views showing one embodiment of a film forming apparatus according to the second embodiment. FIG. 4A shows a case where the wire is linear, and FIG. 4B shows a case where the wire has a coil spring shape. However, Fig. 4 (b) is a schematic diagram of the wire. Unless otherwise specified, “Fig. 4” will be explained as “Fig. 4 (a)”. The film deposition apparatus 200 shown in FIG. 4 includes a vacuum chamber 60 that accommodates the plastic container 11, an exhaust pump (not shown) that evacuates the vacuum chamber 60, and a plastic container. Heat is generated by energizing the wire 18 disposed around the vessel 11, the raw gas pipe 31 for supplying the non-pyrophoric raw material and the ozone gas to the space outside the plastic container 11 in the vacuum chamber 60, and the wire 18. And a heater power source 20 to be operated. In the film forming apparatus 200, the opening of the plastic container 11 is fixed by the bottle rotation mechanism 32, and the plastic container 11 is arranged so that the bottom does not contact inside the vacuum chamber 60! /

[0057] 真空チャンバ 60は、その内部にプラスチック容器 11を収容する空間が形成されて おり、この空間は薄膜形成のための反応室 12となる。真空チャンバ 60は、下部チヤ ンノ 63と、この下部チャンバ 63の上部に着脱自在に取り付けられて下部チャンバ 63 の内部を Oリング 14で密閉するようになっている上部チャンバ 65から構成されている 。上部チャンバ 65には図示していない上下の駆動機構があり、プラスチック容器 11 の搬入'搬出に伴い上下する。下部チャンバ 63の内部空間は、そこに収容されるプ ラスチック容器 11の周囲にワイヤー 18が配置できるように、プラスチック容器 11の外 形よりも大きく形成されて!/、る。  [0057] The vacuum chamber 60 has a space for accommodating the plastic container 11 therein, and this space serves as a reaction chamber 12 for forming a thin film. The vacuum chamber 60 includes a lower chamber 63 and an upper chamber 65 which is detachably attached to the upper portion of the lower chamber 63 and seals the inside of the lower chamber 63 with an O-ring 14. The upper chamber 65 has an upper and lower drive mechanism (not shown) and moves up and down as the plastic container 11 is carried in and out. The inner space of the lower chamber 63 is formed larger than the outer shape of the plastic container 11 so that the wire 18 can be disposed around the plastic container 11 accommodated therein!

[0058] ここでワイヤー 18は、配線 19とワイヤー 18との接続箇所である接続部 79aとその一 端が接続される。そして図 4の成膜装置では、ワイヤー 18は、接続部 79aを起点して 、下部チャンバ 63の内側の側面から底面へ渡り対向する側面へと直線状に配置され 、そこから折り返されて、対向する側面、底面、内側の側面へと再び直線状に配置さ れて、接続部 79bにその他端が接続される。このときのワイヤー 18とプラスチック容器 11との位置関係を示すため、図 5に A-A'断面図を示した。ワイヤー 18とプラスチッ ク容器 11は、図中、左右とも等間隔に配置されている。ワイヤー 18は、プラスチック 容器 11の外表面との距離が一定となるように配置されて!/、る。容器の底を含む外表 面における膜厚の均一性が向上する。さらに、ワイヤー 18を 2組以上配置しても良い 。この場合、ワイヤー 18は、プラスチック容器の主軸に対して回転対称の位置に複数 配置されて!/、ること力 S好まし!/、。ワイヤー 18を 2組配置した場合のワイヤー 18とプラス チック容器 11との位置関係を示すため、図 6に A-A'断面図を示した。ワイヤー 18と プラスチック容器 11は、図中、上下左右とも等間隔に配置されている。図 5又は図 6 に示したいずれの場合でも、ボトル回転機構 32によってプラスチック容器 11を、主軸 を中心に回転させながら成膜させることで、成膜の均一性を向上させることができる。 特に、図 5の場合では、ワイヤー 18がー組であるため、成膜の均一性向上の効果が 高い。不図示ではあるが、ワイヤー 18の配置の他形態として、プラスチック容器 11の 主軸を中心に、プラスチック容器 11の周囲において、螺旋状に巻く形態、或いは、プ ラスチック容器 11の主軸の複数の横断面上で、それぞれ並列に巻き、複数のリング 状のワイヤーを並列に配置するという形態がある。いずれの形態においても、膜厚の 均一性を向上させることができる。もちろん、この形態においても、ボトル回転機構 32 によってプラスチック容器 11を、主軸を中心に回転させながら成膜させても良い。ここ で、ワイヤー 18を複数組配置する場合は、互いに 5cm以上離して配置されているこ とが好ましい。プラスチック容器に熱的損傷を与えることなぐ非自然発火性原料の酸 化を促進し、膜厚の均一性が得られやすい。ワイヤー 18の材質は、第 1形態のものと 同じとして良い。 Here, the wire 18 is connected at one end thereof to a connecting portion 79a which is a connecting portion between the wiring 19 and the wire 18. In the film forming apparatus of FIG. 4, the wire 18 is linearly arranged from the inner side surface of the lower chamber 63 to the side surface facing the bottom surface, starting from the connection portion 79a, and then folded back from there. Then, the other end is connected to the connecting portion 79b. In order to show the positional relationship between the wire 18 and the plastic container 11 at this time, FIG. 5 shows an AA ′ cross-sectional view. The wire 18 and the plastic container 11 are equally spaced on the left and right sides in the figure. The wire 18 is arranged so that the distance from the outer surface of the plastic container 11 is constant! The film thickness uniformity on the outer surface including the bottom of the container is improved. Further, two or more sets of wires 18 may be arranged. In this case, a plurality of wires 18 are arranged at rotationally symmetric positions with respect to the main axis of the plastic container! To show the positional relationship between the wire 18 and the plastic container 11 when two sets of the wires 18 are arranged, FIG. 6 shows a cross-sectional view along AA ′. The wire 18 and the plastic container 11 are arranged at equal intervals on the top, bottom, left and right in the figure. In either case shown in FIG. 5 or FIG. 6, the uniformity of film formation can be improved by forming the plastic container 11 while rotating the plastic container 11 around the main axis by the bottle rotating mechanism 32. In particular, in the case of FIG. 5, since the wire 18 is a pair, the effect of improving the uniformity of film formation is high. Although not shown, as another form of the arrangement of the wires 18, a spirally wound form around the plastic container 11 around the main axis of the plastic container 11, or a plurality of cross sections of the main axis of the plastic container 11 Above, there is a form in which each is wound in parallel and a plurality of ring-shaped wires are arranged in parallel. In any form, the uniformity of the film thickness can be improved. Of course, in this embodiment as well, the plastic container 11 may be formed by rotating the plastic container 11 around the main axis by the bottle rotating mechanism 32. Here, when a plurality of sets of wires 18 are arranged, it is preferable that the wires 18 be arranged at a distance of 5 cm or more. It promotes the oxidation of non-pyrophoric raw materials without causing thermal damage to the plastic container, making it easy to obtain a uniform film thickness. The material of the wire 18 may be the same as that of the first form.

[0059] ワイヤー 18は、非自然発火性原料及びオゾンガスとの接触機会を増やすために、 図 4 (b)に示したように線材をコイルばね形状に加工した部分を有していることが好ま しい。コイルばね形状には、円筒状のみならず、円錐形、たる形又はつづみ形を含 み、さらにこれらの巻線間のピッチを変えた不等ピッチ形を含む。また、線材をジグザ ク線形状に加工した部分を有していても良い(不図示)。或いは、線材を波線形状に 加工した部分を有していても良い(不図示)。これらのいずれの形態においても、ワイ ヤー 18は、非自然発火性原料及びオゾンガスの吹き出し方向に沿って配置されて いることが好ましい。例えば、ワイヤー 18を複数配列することで、或いは、ワイヤー 18 を非自然発火性原料及びオゾンガスの吹き出し方向にベクトル成分を持たせる。こ れによって、非自然発火性原料及びオゾンガスはワイヤーと接触する機会が増加す  [0059] In order to increase the chance of contact with the non-pyrophoric raw material and ozone gas, the wire 18 preferably has a portion obtained by processing a wire into a coil spring shape as shown in Fig. 4 (b). That's right. The coil spring shape includes not only a cylindrical shape but also a conical shape, a barrel shape, or a stitch shape, and an unequal pitch shape in which the pitch between these windings is changed. Moreover, you may have the part which processed the wire into the zigzag line shape (not shown). Or you may have the part which processed the wire rod into the wavy line shape (not shown). In any of these forms, it is preferable that the wire 18 is disposed along the blowing direction of the non-pyrophoric raw material and ozone gas. For example, a plurality of wires 18 are arranged, or the wires 18 are given a vector component in the non-pyrophoric raw material and ozone gas blowing direction. This increases the chances of non-pyrophoric raw materials and ozone gas coming into contact with the wire.

[0060] 原料ガス配管 31の一端は、下部チャンバ 63の底面に設けられたガス供給口 66と 接続されている。原料ガス配管 31の他端及びその途中の分岐では、原料ガス供給 管 73が接続されている。図 4では、原料ガス供給管 73は複数設けられていて、いず れもその先端にはガス吹き出し孔 77xが設けられている。原料ガス供給管 73には、 原料ガス配管 31、ガス供給口 66、流量調整器 24a〜24b及びバルブ 25a〜25cを 介して非自然発火性原料及びオゾンガス 33が流入される。これにより非自然発火性 原料及びオゾンガス 33は、ガス吹き出し孔 77χから吹き出されるようになつている。ガ ス吹き出し孔 77χは、いずれも、プラスチック容器 11の外表面に向けられていて、そ の外表面の!/、ずれの箇所にも非自然発火性原料及びオゾンガスを吹き付けることが 可能である。そして、ガス吹き出し孔 77χの出口側に、ワイヤー 18が配置されている 。これにより、ワイヤー 18と非自然発火性原料及びオゾンガスとの接触が多く生じる ため、非自然発火性原料の酸化を促進させることができる。 [0060] One end of the source gas pipe 31 is connected to a gas supply port 66 provided on the bottom surface of the lower chamber 63. A source gas supply pipe 73 is connected to the other end of the source gas pipe 31 and a branch in the middle thereof. In FIG. 4, a plurality of source gas supply pipes 73 are provided, and a gas blowing hole 77x is provided at the tip of each. The non-pyrophoric raw material and the ozone gas 33 flow into the raw material gas supply pipe 73 through the raw material gas pipe 31, the gas supply port 66, the flow regulators 24a to 24b, and the valves 25a to 25c. This makes it non-pyrophoric The raw material and ozone gas 33 are blown out from the gas blowing holes 77χ. The gas blowing holes 77χ are all directed to the outer surface of the plastic container 11, and it is possible to spray the non-pyrophoric raw material and ozone gas on the outer surface! A wire 18 is disposed on the outlet side of the gas blowing hole 77χ. As a result, the contact between the wire 18 and the non-pyrophoric raw material and ozone gas often occurs, so that the oxidation of the non-pyrophoric raw material can be promoted.

[0061] 原料ガス供給管 73は金属製の単管としている。第 1形態の場合と同様に、冷却水 を流すために二重管としても良い。また、第 1形態の場合と同様のセラミック管或いは セラミック材料で表面が被覆された金属管としても良い。  [0061] The source gas supply pipe 73 is a single metal pipe. As in the case of the first embodiment, a double pipe may be used for flowing cooling water. Further, the same ceramic tube as in the first embodiment or a metal tube whose surface is coated with a ceramic material may be used.

[0062] 原料ガス供給管 73の長さは、ガス吹き出し孔 77χからプラスチック容器 11の外表 面までの距離 L3が 5〜50mmとなるように形成することが好ましい。 5〜50mmの距 離で均一な薄膜をプラスチック容器 11の外表面に成膜することができる。距離が 50 mmより大きいとプラスチック容器 11の外表面に薄膜が形成しに《なり、距離が 5m mより小さいと原料ガスの吹き出しができに《なる。  [0062] The length of the source gas supply pipe 73 is preferably formed such that the distance L3 from the gas blowing hole 77χ to the outer surface of the plastic container 11 is 5 to 50 mm. A uniform thin film can be formed on the outer surface of the plastic container 11 at a distance of 5 to 50 mm. If the distance is larger than 50 mm, a thin film is formed on the outer surface of the plastic container 11, and if the distance is smaller than 5 mm, the raw material gas can be blown out.

[0063] ワイヤー 18と原料ガス供給管 73との位置関係の他形態として、例えば、図 3の場合 と同様に、原料ガス供給管の管内にワイヤーを配置しても良い。このとき、原料ガス 供給管の内径を例えば 10mm以上に大きくすれば、膜の分布の均一性が向上する 。原料ガス供給管の管内においてワイヤーに非自然発火性原料及びオゾンガスを接 触させることで、原料ガス供給管から熱分解した非自然発火性原料を吹き出させるこ と力 Sできる。ワイヤーが原料ガス供給管の内部に配置されているため、ワイヤーとプラ スチック容器の表面との距離を大きくとることができるので、プラスチック容器の熱変 形の発生を抑制できる。  [0063] As another form of the positional relationship between the wire 18 and the source gas supply pipe 73, for example, a wire may be arranged in the source gas supply pipe as in the case of FIG. At this time, if the inner diameter of the source gas supply pipe is increased to, for example, 10 mm or more, the uniformity of the film distribution is improved. By bringing the non-pyrophoric raw material and ozone gas into contact with the wire in the pipe of the raw material gas supply pipe, it is possible to blow out the pyrolyzed non-pyrophoric raw material from the raw gas supply pipe. Since the wire is arranged inside the raw material gas supply pipe, the distance between the wire and the surface of the plastic container can be increased, so that occurrence of thermal deformation of the plastic container can be suppressed.

[0064] プラスチック容器 11の熱変形を防止するため、真空チャンバ 60の内部又は外部に 、冷却水が流される冷却管等の冷却手段 29を設けて、下部チャンバ 63の温度上昇 を防止することが好ましい。  [0064] In order to prevent thermal deformation of the plastic container 11, a cooling means 29 such as a cooling pipe through which cooling water flows is provided inside or outside the vacuum chamber 60 to prevent the temperature of the lower chamber 63 from rising. preferable.

[0065] ワイヤー 18には、接続部 79a, 79bと配線 19を介してヒータ電源 20が接続されてい る。ヒータ電源 20によってワイヤー 18に電気を流すことで、ワイヤー 18が発熱する。 本形態においてもワイヤー 18の作動温度は、 300〜; 1800°Cとすることが好ましぐ 8 00〜; 1100°Cであることがより好まし!/、。 [0065] A heater power source 20 is connected to the wire 18 via connection portions 79a and 79b and a wiring 19. By causing electricity to flow through the wire 18 by the heater power source 20, the wire 18 generates heat. Also in this embodiment, the working temperature of the wire 18 is preferably 300 to 1800 ° C. 8 00 ~; 1100 ° C is more preferred! /

[0066] また上部チャンバ 65の内部空間には、真空バルブ 8を介して排気管 22が連通され ており、図示しない排気ポンプによって真空チャンバ 60の内部の反応室 12の空気が 排気されるようになっている。なお、図示はしていないが、第 1形態及び第 2形態のい ずれにおいても、オゾンガスは、市販の比較的安価なオゾン発生器を用いて、例え ば酸素ボンベからの酸素ガスを無声放電して、得てもよいし、オゾンガスを安定的に 含有するガスボンベ (岩谷産業社製)から供給してもよ!/ヽ。 [0066] Further, an exhaust pipe 22 is communicated with the internal space of the upper chamber 65 via a vacuum valve 8, so that air in the reaction chamber 12 inside the vacuum chamber 60 is exhausted by an exhaust pump (not shown). It has become. Although not shown, in both the first and second embodiments, the ozone gas silently discharges, for example, oxygen gas from an oxygen cylinder using a commercially available relatively inexpensive ozone generator. It can be obtained from a gas cylinder (manufactured by Iwatani Corporation) that contains ozone gas stably!

[0067] 第 1形態及び第 2形態のいずれの成膜装置においても、ワイヤー 18は電流を流す だけでホットワイヤーとなり、オゾンによって熱分解した非自然発火性原料を酸化でき るため、ワイヤーを複数組用意すれば一度に大量のプラスチック容器に酸化物薄膜 を成膜させること力できる。図 7は、複数のプラスチック容器の内表面に同時に酸化 物薄膜を成膜するための成膜装置の概念図である。図 7では一つの下部チャンバ 1 3内で大量のプラスチック容器 11を位置決めして並べ、図 2と同様のワイヤー 18及び 原料ガス供給管 23をプラスチック容器 11のそれぞれの口部に挿入して、酸化物薄 膜を形成するものである。また、図 8は、複数のプラスチック容器 11の外表面に同時 にガスバリア薄膜を成膜するための成膜装置の概念図である。図 8では一つの下部 チャンバ 63内で大量のプラスチック容器 11を位置決めして並べ、プラスチック容器 1 1ごとにその周囲を囲むようにそれぞれワイヤー 18を配置し、原料ガス供給管 73から 非自然発火性原料及びオゾンガスをワイヤー 18に接触させた後、プラスチック容器 1 1に吹き付ける。ここで口部をボトル回転機構 32に固定して、プラスチック容器 11を 回転しながらその外表面に薄膜を形成するものである。さらに、図 9は、インラインで 複数のプラスチック容器の外表面に同時にガスバリア薄膜を成膜するための成膜装 置の概念図である。図 9では、コンベアでプラスチック容器を、真空チャンバ内である 、ボトル整列室 40、排気室 41、薄膜形成室 42、大気リーク室 43及び取出し室 44の 順に移動させる。真空チャンバの外は大気圧下であるが、差圧機構によって、薄膜 形成室 42が減圧された一定圧力に保たれている。排気室 41及び大気リーク室 43は 、差圧機構に含まれる。薄膜形成室 42には、部屋の側壁に沿ってワイヤー 18が配 置されている。プラスチック容器は、真空チャンバ内の搬送経路を通過する際に、ヮ ィヤー 18とプラスチック容器の表面とか所望の距離、例えば 5〜50mmまで近づく。 薄膜形成室 42において、ワイヤー 18に向かって原料ガスを吹き出させ、部屋内を非 自然発火性原料とオゾンで充満させ、プラスチック容器 11が薄膜形成室 42を通過 する際に成膜を行なう。第 1形態及び第 2形態のいずれの成膜装置においても、容 器の形状が異なっても同一の真空チャンバを使用することができ、高周波電源が不 要であり、一つの真空チャンバ内で複数の容器に成膜しうる。これにより、高周波電 源を用いた成膜装置よりも装置が安価となる。 [0067] In any of the film forming apparatuses of the first and second embodiments, the wire 18 becomes a hot wire only by passing an electric current, and the non-pyrophoric raw material thermally decomposed by ozone can be oxidized. If a set is prepared, an oxide thin film can be formed in a large amount of plastic containers at once. FIG. 7 is a conceptual diagram of a film forming apparatus for simultaneously forming an oxide thin film on the inner surfaces of a plurality of plastic containers. In FIG. 7, a large number of plastic containers 11 are positioned and arranged in one lower chamber 13, and wires 18 and source gas supply pipes 23 similar to those in FIG. 2 are inserted into the respective mouths of the plastic containers 11 to oxidize them. A thin film is formed. FIG. 8 is a conceptual diagram of a film forming apparatus for simultaneously forming a gas barrier thin film on the outer surfaces of a plurality of plastic containers 11. In FIG. 8, a large number of plastic containers 11 are positioned and arranged in one lower chamber 63, and wires 18 are arranged so as to surround each plastic container 1 1 and non-pyrophoric from the source gas supply pipe 73. The raw material and ozone gas are brought into contact with the wire 18 and then sprayed onto the plastic container 11. Here, the mouth is fixed to the bottle rotating mechanism 32, and a thin film is formed on the outer surface of the plastic container 11 while rotating. Further, FIG. 9 is a conceptual diagram of a film forming apparatus for forming a gas barrier thin film simultaneously on the outer surfaces of a plurality of plastic containers in-line. In FIG. 9, the plastic container is moved by the conveyor in the order of the bottle alignment chamber 40, the exhaust chamber 41, the thin film formation chamber 42, the atmospheric leak chamber 43, and the take-out chamber 44 in the vacuum chamber. The outside of the vacuum chamber is under atmospheric pressure, but the thin film formation chamber 42 is kept at a constant pressure by the pressure difference mechanism. The exhaust chamber 41 and the air leak chamber 43 are included in the differential pressure mechanism. In the thin film forming chamber 42, wires 18 are arranged along the side walls of the chamber. When the plastic container passes through the transfer path in the vacuum chamber, The desired distance between the wire 18 and the surface of the plastic container, for example, 5 to 50 mm is approached. In the thin film forming chamber 42, the source gas is blown out toward the wire 18 to fill the chamber with the non-pyrophoric raw material and ozone, and film formation is performed when the plastic container 11 passes through the thin film forming chamber 42. In any of the film forming apparatuses of the first and second embodiments, the same vacuum chamber can be used regardless of the shape of the container, and no high frequency power source is required. A film can be formed on the container. This makes the apparatus less expensive than a film forming apparatus using a high-frequency power source.

[0068] 第 1形態及び第 2形態のいずれの成膜装置においても、非自然発火性原料及びォ ゾンガス 33が熱風となるためにプラスチック容器 11が熱変形しやすいことから、容器 冷却手段を設けることが好ましい。図 10は容器冷却手段を説明するための概念図で あり、(a)はプラスチック容器の内表面に成膜する場合、(b)はプラスチック容器の外 表面に成膜する場合、である。図 10 (a)に示すように、熱風である非自然発火性原 料及びオゾンガス 33がプラスチック容器 11の内部に吹き付けられる第 1形態の成膜 装置は、プラスチック容器 11の外表面に、冷却された液体若しくは気体 50を当てる 容器冷却手段 51を有していることが好ましい。容器冷却手段 51は、水等の液体にプ ラスチック容器 11を浸漬する場合は水槽であり、水等の液体をプラスチック容器 11 にシャワリングをする場合はシャワーである。また冷却窒素ガス、あるいは冷却炭酸ガ ス等の気体をプラスチック容器 11にブローをする場合はブロワ一である。冷却窒素ガ スは液体窒素、冷却炭酸ガスはドライアイスをそれぞれ用いることによって容易に得 られる。図 10 (b)に示すように、熱風となる非自然発火性原料及びオゾンガス 33がプ ラスチック容器 11の外表面に向かって吹き付けられる第 2形態の成膜装置は、プラス チック容器 11の内表面に、冷却された液体若しくは気体 50を当てる容器冷却手段 5 1を有していることが好ましい。容器冷却手段 51は、水等の液体にプラスチック容器 1 1を充填する場合は液体充填器であり、冷却窒素ガス、あるいは冷却炭酸ガス等の 気体をプラスチック容器 11の内表面にブローをする場合はブロワ一である。  [0068] In any of the film forming apparatuses of the first and second embodiments, since the non-pyrophoric raw material and the ozone gas 33 become hot air, the plastic container 11 is likely to be thermally deformed, and therefore a container cooling means is provided. It is preferable. 10A and 10B are conceptual diagrams for explaining the container cooling means. FIG. 10A shows a case where a film is formed on the inner surface of the plastic container, and FIG. 10B shows a case where a film is formed on the outer surface of the plastic container. As shown in FIG. 10 (a), the non-pyrophoric raw material, which is hot air, and ozone gas 33 are sprayed on the inside of the plastic container 11, and the film forming apparatus of the first form is cooled on the outer surface of the plastic container 11. It is preferable to have a container cooling means 51 for applying the liquid or gas 50. The container cooling means 51 is a water tank when the plastic container 11 is immersed in a liquid such as water, and a shower when the plastic container 11 is showered with a liquid such as water. In addition, when a gas such as cooling nitrogen gas or cooling carbon dioxide gas is blown into the plastic container 11, it is a blower. Cooled nitrogen gas can be easily obtained by using liquid nitrogen and cooled carbon dioxide gas by using dry ice. As shown in FIG. 10 (b), the non-pyrophoric raw material that becomes hot air and the ozone gas 33 are sprayed toward the outer surface of the plastic container 11, and the second embodiment of the film forming apparatus is an inner surface of the plastic container 11. In addition, it is preferable to have container cooling means 51 for applying the cooled liquid or gas 50 thereto. The container cooling means 51 is a liquid filling device when filling a plastic container 11 into a liquid such as water, and when blowing a gas such as cooling nitrogen gas or cooling carbon dioxide gas to the inner surface of the plastic container 11. One blower.

[0069] 図 11に図 9の薄膜形成室 42の他形態を示した。薄膜成膜室 42の側壁には、ブラ スチック容器 11の移動方向に沿って、原料ガス供給管 23と容器冷却手段 51が交互 に配置されている。プラスチック容器 11はコンベア (搬送経路、不図示)によって移動 させられ、かつ、自転させられる。ここで、原料ガス供給管 23は図 3に示したタイプを 用いる。容器冷却手段 51は、冷却された窒素ガスを吹き付けるタイプを用いる。ブラ スチック容器 11は、コンベアによって自転しながら移動させられる際に、原料ガス供 給管 23からワイヤーで活性化された原料ガスを吹き付けられ、次いで、容器冷却手 段 51によって、冷却された窒素ガスを吹き付けられ、これらが交互に行なわれる。こ のとき薄膜形成が進行する。 FIG. 11 shows another embodiment of the thin film forming chamber 42 shown in FIG. On the side wall of the thin film deposition chamber 42, the raw material gas supply pipes 23 and the container cooling means 51 are alternately arranged along the moving direction of the plastic container 11. Plastic container 11 is moved by conveyor (conveyance path, not shown) It is made to rotate. Here, the source gas supply pipe 23 uses the type shown in FIG. The container cooling means 51 uses a type in which cooled nitrogen gas is blown. When the plastic container 11 is moved while being rotated by the conveyer, the raw material gas activated by the wire is blown from the raw material gas supply pipe 23, and then the cooled nitrogen gas is cooled by the container cooling means 51. These are performed alternately. At this time, thin film formation proceeds.

[0070] 次に、本実施形態に係る酸化物薄膜を被膜したプラスチック容器の製造方法につ いて説明する。図 2の成膜装置 100を用いれば、酸化物薄膜をプラスチック容器の 内表面に被膜することが可能であり、一方、図 4の成膜装置 200を用いれば、酸化物 薄膜をプラスチック容器の外表面に被膜することが可能である。これら 2つの成膜方 法は、工程が共通しているため、特に断りがない限り代表例として図 2の成膜装置 10 0を用いて、酸化物薄膜をプラスチック容器の内表面に被膜する成膜方法を説明す る。なお、成膜装置 100と成膜装置 200を用いてプラスチック容器の内表面及び外 表面の両方に酸化物薄膜を成膜してもょレ、。  [0070] Next, a method for producing a plastic container coated with an oxide thin film according to this embodiment will be described. If the film forming apparatus 100 in FIG. 2 is used, an oxide thin film can be coated on the inner surface of the plastic container. On the other hand, if the film forming apparatus 200 in FIG. 4 is used, the oxide thin film is applied to the outside of the plastic container. It is possible to coat the surface. Since these two film forming methods have the same process, unless otherwise specified, a film forming apparatus 100 shown in FIG. 2 is used as a representative example to form an oxide thin film on the inner surface of a plastic container. The membrane method will be described. Note that an oxide thin film can be formed on both the inner and outer surfaces of a plastic container using the film forming apparatus 100 and the film forming apparatus 200.

[0071] 本実施形態に係る酸化物薄膜を被膜したプラスチック容器の製造方法は、プラス チック容器 11を収容した真空チャンバ 6の内部を大気圧以下の所定圧力とする工程 (以下、減圧工程という)と、真空チャンバ 6の内部に配置されているワイヤー 18に通 電して所定温度以上に発熱させてホットワイヤーとする工程 (以下、ホットワイヤーェ 程という)と、真空チャンバ 6の内部に供給された、ケィ素若しくは金属元素を構成元 素として含む非自然発火性原料及びオゾンガス 33を、ホットワイヤー 18で加熱し、そ の後、プラスチック容器 11の内表面に接触させて、非自然発火性原料由来の酸化 物薄膜を形成させる工程 (以下、成膜工程という)と、を有する。  [0071] The method for producing a plastic container coated with an oxide thin film according to the present embodiment is a process of setting the inside of the vacuum chamber 6 containing the plastic container 11 to a predetermined pressure of atmospheric pressure or less (hereinafter referred to as a decompression process). And a process of supplying heat to a wire 18 disposed inside the vacuum chamber 6 to generate heat above a predetermined temperature to form a hot wire (hereinafter referred to as a hot wire process), and supplying to the inside of the vacuum chamber 6 In addition, non-pyrophoric raw material containing ozone or metal element as constituent element and ozone gas 33 are heated by hot wire 18 and then brought into contact with the inner surface of plastic container 11 to make non-pyrophoric raw material. Forming an oxide thin film derived therefrom (hereinafter referred to as a film forming step).

[0072] (成膜装置への容器の装着)  [0072] (Installation of container on film forming apparatus)

まず、ベント(不図示)を開いて真空チャンバ 6内を大気開放する。反応室 12には、 上部チャンバ 15を外した状態で、下部チャンバ 13の上部開口部からプラスチック容 器 11が差し込まれて、収容される。この後、位置決めされた上部チャンバ 15が降下 し、上部チャンバ 15につけられた原料ガス供給管 23とそれに固定されたワイヤー 18 がプラスチック容器の口部 21からプラスチック容器 11内に挿入される。そして、上部 チャンバ 15が下部チャンバ 13に Oリング 14を介して当接することで、反応室 12が密 閉空間とされる。このとき、下部チャンバ 13の内壁面とプラスチック容器 11の外壁面 との間隔は、ほぼ均一に保たれており、且つプラスチック容器 11の内壁面とワイヤー 18との間の間隔も、ほぼ均一に保たれて!/、る。 First, a vent (not shown) is opened to open the vacuum chamber 6 to the atmosphere. In the reaction chamber 12, with the upper chamber 15 removed, the plastic container 11 is inserted and accommodated from the upper opening of the lower chamber 13. Thereafter, the positioned upper chamber 15 is lowered, and the source gas supply pipe 23 attached to the upper chamber 15 and the wire 18 fixed thereto are inserted into the plastic container 11 from the mouth portion 21 of the plastic container. And the top When the chamber 15 contacts the lower chamber 13 via the O-ring 14, the reaction chamber 12 is closed. At this time, the distance between the inner wall surface of the lower chamber 13 and the outer wall surface of the plastic container 11 is kept substantially uniform, and the distance between the inner wall surface of the plastic container 11 and the wire 18 is also kept substantially uniform. Lean! /

[0073] 本発明に係る容器とは、蓋若しくは栓若しくはシールして使用する容器、またはそ れらを使用せず開口状態で使用する容器を含む。開口部の大きさは内容物に応じて 決める。プラスチック容器は、剛性を適度に有する所定の肉厚を有するプラスチック 容器と剛性を有さないシート材により形成されたプラスチック容器を含む。本発明に 係るプラスチック容器の充填物は、ビール若しくは発泡酒若しくは炭酸飲料若しくは 果汁飲料若しくは清涼飲料等の飲料を挙げることができる。また、リタ一ナブル容器 或いはワンウェイ容器のどちらであっても良い。  [0073] The container according to the present invention includes a container that is used with a lid, a stopper, or a seal, or a container that is used without being used. The size of the opening is determined according to the contents. The plastic container includes a plastic container having a predetermined thickness having moderate rigidity and a plastic container formed by a sheet material having no rigidity. Examples of the filling material in the plastic container according to the present invention include beverages such as beer, sparkling liquor, carbonated beverages, fruit juice beverages, and soft drinks. Moreover, either a returnable container or a one-way container may be used.

[0074] 本発明のプラスチック容器 11を成形する際に使用する樹脂は、ポリエチレンテレフ タレート樹脂(PET)、ポリブチレンテレフタレート樹脂、ポリエチレンナフタレート樹脂 、ポリエチレン樹脂、ポリプロピレン樹脂(PP)、シクロォレフィンコポリマー樹脂(CO C、環状ォレフィン共重合)、アイオノマ樹脂、ポリ- 4-メチルペンテン 1樹脂、ポリメ タクリル酸メチル樹脂、ポリスチレン樹脂、エチレン-ビュルアルコール共重合樹脂、 アクリロニトリル樹脂、ポリ塩化ビュル樹脂、ポリ塩化ビニリデン樹脂、ポリアミド樹脂、 ポリアミドイミド樹脂、ポリアセタール樹脂、ポリカーボネート樹脂、ポリスルホン樹脂、 又は、 4弗化工チレン樹脂、アクリロニトリル スチレン樹脂、アクリロニトリル-ブタジ ェン-スチレン樹脂を例示することができる。この中で、 PETが特に好ましい。  [0074] The resin used in molding the plastic container 11 of the present invention is polyethylene terephthalate resin (PET), polybutylene terephthalate resin, polyethylene naphthalate resin, polyethylene resin, polypropylene resin (PP), cycloolefin copolymer. Resin (CO C, cyclic olefin copolymer), ionomer resin, poly-4-methylpentene 1 resin, polymethyl methacrylate resin, polystyrene resin, ethylene-butyl alcohol copolymer resin, acrylonitrile resin, polychlorinated bur resin, polychlorinated Examples include vinylidene resin, polyamide resin, polyamideimide resin, polyacetal resin, polycarbonate resin, polysulfone resin, or tetrafluoroethylene resin, acrylonitrile styrene resin, acrylonitrile-butadiene-styrene resin. Can do. Of these, PET is particularly preferred.

[0075] (減圧工程)  [0075] (Decompression step)

次いでベント(不図示)を閉じたのち、排気ポンプ (不図示)を作動させ、真空バル ブ 8を開とすることにより、反応室 12内の空気が排気される。このとき、プラスチック容 器 11の内部空間のみならずプラスチック容器 11の外壁面と下部チャンバ 13の内壁 面との間の空間も排気されて、真空にされる。すなわち、反応室 12全体が排気される 。そして反応室 12内が必要な圧力、例えば 1〜; 100Pa、好ましくは 10〜; !OOPaに到 達するまで減圧される。これは lPa未満の圧力では排気時間がかかり、また、成膜速 度が低下する場合があり、成膜コストが増加する。また、 lOOPaより高い圧力で良い とすると熱分解 ·酸化された非自然発火性原料が気相中で粒子化する場合がある。 Next, after closing the vent (not shown), the exhaust pump (not shown) is operated to open the vacuum valve 8, whereby the air in the reaction chamber 12 is exhausted. At this time, not only the inner space of the plastic container 11 but also the space between the outer wall surface of the plastic container 11 and the inner wall surface of the lower chamber 13 is evacuated and evacuated. That is, the entire reaction chamber 12 is exhausted. The pressure in the reaction chamber 12 is reduced until a required pressure, for example, 1 to 100 Pa, preferably 10 to OOPa is reached. This requires an exhaust time at a pressure of less than lPa, and the film formation speed may decrease, resulting in an increase in film formation cost. Also, higher pressure than lOOPa As a result, pyrolyzed and oxidized non-pyrophoric raw materials may become particles in the gas phase.

[0076] (ホットワイヤー工程) [0076] (Hot wire process)

次にワイヤー 18に通電して所定温度以上に発熱させてホットワイヤーとする。所定 温度とは、非自然発火性原料の種類にもよる力 例えば 300〜; 1800°Cである。 800 Next, the wire 18 is energized to generate heat above a predetermined temperature to form a hot wire. The predetermined temperature is a force depending on the type of non-pyrophoric raw material, for example, 300 to 1800 ° C. 800

〜; 1100°Cであることがより好ましい。また、ホットワイヤー 18は、プラスチック容器 11 の内表面との距離が 5〜50mmとなるように配置されている。 ~; 1100 ° C is more preferred. Moreover, the hot wire 18 is arrange | positioned so that the distance with the inner surface of the plastic container 11 may be 5-50 mm.

[0077] (成膜工程) [0077] (Film formation process)

この後、ガス流量調整器 24aで非自然発火性原料を所定流量供給し、ガス流量調 整器 24bでオゾンガスを所定流量供給する。非自然発火性原料及びオゾンガスは、 原料ガス供給管 23を経て、所定の圧力に減圧されたプラスチック容器 11内におレヽ て、ガス吹き出し孔 17x力、ら 300〜; 1800°Cに発熱したホットワイヤー 18に向けて吹き 出される。そして、ホットワイヤーで加熱された非自然発火性原料及びオゾンガスは、 直ちにプラスチック容器 11の内表面に接触させられる。成膜初期から、ホットワイヤ 一 18によってオゾンが分解されてラジカル酸素となり、熱分解した非自然発火性原 料を酸化する。そして、プラスチック容器 11の内表面には、非自然発火性原料由来 の酸化物薄膜が形成させる。  Thereafter, the gas flow rate regulator 24a supplies a non-pyrophoric raw material at a predetermined flow rate, and the gas flow rate regulator 24b supplies a predetermined flow rate of ozone gas. The non-pyrophoric raw material and ozone gas are passed through the raw material gas supply pipe 23 and placed in the plastic container 11 that has been depressurized to a predetermined pressure. It blows out toward the wire 18. The non-pyrophoric raw material and ozone gas heated by the hot wire are immediately brought into contact with the inner surface of the plastic container 11. From the beginning of film formation, the hot wire 18 decomposes ozone into radical oxygen, which oxidizes the pyrolyzed non-pyrophoric material. Then, an oxide thin film derived from a non-pyrophoric raw material is formed on the inner surface of the plastic container 11.

[0078] 本発明において、非自然発火性原料とは、上述したように、 自然発火せず、かつ空 気中で激しい反応を起こさず、かつ酸化されると酸化物を生成する原料である。非自 然発火性原料は、固体、液体又は気体のいずれでもよい。ケィ素を構成元素として 含む原料であれば、非自然発火性のケィ化有機化合物が好ましい。一方、自然発火 性原料としては、モノシラン、ジシラン若しくはトリシラン等のシラン系原料がある。非 自然発火性原料として、例えばトリメチルシランなどのケィ化有機化合物を使用し、ホ ットワイヤー 18で熱分解させることで、酸化物薄膜として SiO薄膜を形成することが できる。 In the present invention, the non-pyrophoric raw material is a raw material that does not ignite spontaneously, does not cause a violent reaction in the air, and generates an oxide when oxidized as described above. The non-pyrophoric raw material may be solid, liquid, or gas. As long as it is a raw material containing a key element as a constituent element, a non-pyrophoric key organic compound is preferable. On the other hand, examples of pyrophoric materials include silane-based materials such as monosilane, disilane, and trisilane. By using a chelated organic compound such as trimethylsilane as a non-pyrophoric raw material and thermally decomposing with the hot wire 18, a SiO thin film can be formed as an oxide thin film.

[0079] 非自然発火性のケィ化有機化合物としては、例えば、トリメチルシラン、へキサメチ ルジシロキサン、フエニルシラン又はへキサメチルシラザンが好ましい。また、ジメトキ ノレシラン、テトラメトキシシラン、テトラメチノレシラン、ジメトキシメチノレシラン、エトキント リメチルシラン、ジエトキシメチルシラン、エトキシジメチルビニルシラン、ァリルトリメチ ノレシラン、ジェトキシジメチノレシラン、トリノレエチノレシラン、へキサメチノレジシラン、ジェ トキシメチルビニルシラン、トリエトキシメチルシラン、トリエトキシビュルシラン、ビス(ト リメチルシリル)アセチレン、テトラエトキシシラン、トリメトキシフエニルシラン、 Ί—ダリ [0079] As the non-pyrophoric key organic compound, for example, trimethylsilane, hexamethyldisiloxane, phenylsilane, or hexamethylsilazane is preferable. Dimethyoxy silane, tetramethoxy silane, tetra methino silane, dimethoxy methino silane, etokineto Limethylsilane, diethoxymethylsilane, ethoxydimethylvinylsilane, allyltrimethylenosilane, methoxydimethylenosilane, trinoethylenosilane, hexamethinoresinsilane, methoxymethylvinylsilane, triethoxymethylsilane, triethoxybutylsilane, bis (t Limethylsilyl) acetylene, tetraethoxysilane, trimethoxyphenylsilane, Ί —Dari

プロピル(トリメトキシ)シラン、ジヒドロキシジフエニルシラン、ジフエニルシラン、トリエト キシフエニルシラン、テトライソプロポキシシラン、ジメトキシジフエニルシラン、ジェトキ シジフエニルシラン、テトラー η—ブトキシシラン、テトラフエノキシシラン又はポリ (メチ ルハイドロジェンシロキサン)でもよレ、。 Propyl (trimethoxy) silane, dihydroxydiphenylsilane, diphenylsilane, triethoxyphenylsilane, tetraisopropoxysilane, dimethoxydiphenylsilane, methoxydiphenylsilane, tetra-η-butoxysilane, tetraphenoxysilane or poly (meth) Lehydrogensiloxane).

[0080] 非自然発火性原料としては、前記の非自然発火性のケィ化有機化合物の他、金属 元素を構成元素として含む原料、例えば、有機金属化合物、金属アルコキシドなど の非自然発火性の金属元素含有有機化合物であってもよい。金属元素が例えばァ ノレミニゥムであれば、非自然発火性のアルミニウム含有有機化合物であることが好ま しぐアルコキサイド系原料がより好ましい。例えばトリターシャリーブトキシアルミユウ ム(Al (t- OC H ) )、トリエトキシアルミニウム(Al (OC H ) )、トリイソプロポキシァ  [0080] As the non-pyrophoric raw material, in addition to the non-pyrophoric key organic compound, a raw material containing a metal element as a constituent element, for example, a non-pyrophoric metal such as an organometallic compound or a metal alkoxide It may be an element-containing organic compound. If the metal element is, for example, an alcoholium, an alkoxide raw material that is preferably a non-pyrophoric aluminum-containing organic compound is more preferable. For example, tritertiary butoxy aluminum (Al (t-OC H)), triethoxy aluminum (Al (OC H)), triisopropoxy

4 9 3 2 5 3  4 9 3 2 5 3

ルミニゥム(Al (i-OC H ) )、トリセカンダリーブトキシアルミニウム(Al (sec- OC H )  Luminium (Al (i-OC H)), trisecondary butoxy aluminum (Al (sec- OC H))

3 7 3 4 9 3 7 3 4 9

)、トリスァセチルァセトネートアルミニウム(A1 (C H O ) )又はトリスジピヴァロイルメ), Trisacetylacetonate aluminum (A1 (C H O)) or tris dipivaloilme

3 5 7 2 3 3 5 7 2 3

タネートアルミニウム (A1 (C H O ) )がある。一方、自然発火性原料としては、トリメ  There is tannate aluminum (A1 (C H O)). On the other hand, as a pyrophoric raw material,

11 19 2 3  11 19 2 3

チルアルミニウムがある。非自然発火性原料として、例えばトリイソプロポキシアルミ二 ゥムを使用し、ホットワイヤー 18で熱分解させることで、酸化物薄膜として AIO薄膜を 形成すること力でさる。  There is chill aluminum. For example, triisopropoxy aluminum is used as a non-pyrophoric raw material and is thermally decomposed with hot wire 18 to measure the power of forming an AIO thin film as an oxide thin film.

[0081] 本実施形態にお!/、て、非自然発火性原料とオゾンを一緒に供給する理由は次のと おりである。まず第 1に、立体形状を有するプラスチック容器に成膜しなければならず 、また、プラスチック材を使用する以上低温で成膜しなければならないため、低温でも 高効率の析出反応を立体的な形状の表面上で実現しなければならない。第 2に、安 全性の高!/、非自然発火性原料を熱分解及び酸化して酸化物薄膜を生成させようとし た場合、本発明者の検討によれば、非自然発火性原料と酸素を一緒に供給しても酸 化物の析出がなされな力、つた。そこで、極めて強い酸化力を有するオゾンを非自然 発火性原料と一緒に供給することで、非自然発火性原料を熱分解及び酸化して酸 化物薄膜を効率よく生成させることが可能であり、立体形状を有するプラスチック容 器に成膜することが可能であることを見出した。オゾンは紫外線や 200°C以上に加熱 されることで化 1のように分解すると考えられる。 [0081] In this embodiment, the reason why the non-pyrophoric raw material and ozone are supplied together is as follows. First of all, it is necessary to form a film in a plastic container having a three-dimensional shape, and since it must be formed at a low temperature as long as the plastic material is used, a highly efficient precipitation reaction can be performed at a low temperature even at a low temperature. Must be realized on the surface. Secondly, when an oxide thin film is produced by pyrolyzing and oxidizing non-pyrophoric raw materials with high safety! / Even if oxygen is supplied together, acid The force that did not cause the precipitation of the chemicals. Therefore, by supplying ozone with extremely strong oxidizing power together with non-pyrophoric raw materials, it is possible to thermally decompose and oxidize non-pyrophoric raw materials to efficiently produce oxide thin films. It has been found that it is possible to form a film on a plastic container having a shape. It is thought that ozone decomposes as shown in chemical formula 1 when heated to ultraviolet rays or above 200 ° C.

(化 1) 0 → O + ο·  (Chemical 1) 0 → O + ο

3 2  3 2

したがって、ホットワイヤー 18でオゾンを加熱すると、化 1にしたがって分解し、ラジカ ル酸素が強い酸化力を発揮する。同時にホットワイヤー 18で非自然発火性原料を加 熱して!/、るので、非自然発火性原料はワイヤーの熱による熱分解し或レ、はワイヤー の触媒作用によって分解し、かつ、ラジカル酸素によって酸化される。この結果、非 自然発火性原料由来の酸化物薄膜が生成する。ここでホットワイヤー 18は、(1)ォゾ ンを化 1にしたがってラジカル酸素にする、(2)非自然発火性原料を加熱し、熱分解 する或いは触媒作用によって分解する、という少なくとも 2つの作用をする。なお、ホ ットワイヤー 18が触媒化学蒸着法でいう触媒作用を必須で有している必要はなぐホ ットワイヤー 18は非自然発火性原料とオゾンを同時に加熱できればよい。もちろん、 触媒作用を奏するホットワイヤー 18を使用してその触媒作用によって非自然発火性 原料の熱分解を促す形態が、本発明から排除されるわけではなレ、。  Therefore, when ozone is heated with the hot wire 18, it decomposes according to chemical formula 1, and radical oxygen exhibits strong oxidizing power. At the same time, the non-pyrophoric raw material is heated with the hot wire 18! /, So the non-pyrophoric raw material is thermally decomposed by the heat of the wire, or is decomposed by the catalytic action of the wire, and also by radical oxygen. Oxidized. As a result, an oxide thin film derived from a non-pyrophoric raw material is formed. Here, the hot wire 18 has at least two actions: (1) converting ozone into radical oxygen according to chemical formula 1, and (2) heating a non-pyrophoric raw material to thermally decompose or decompose by catalysis. do. The hot wire 18 is not necessarily required to have a catalytic action in the catalytic chemical vapor deposition method. The hot wire 18 only needs to be able to heat the non-pyrophoric raw material and ozone simultaneously. Of course, a form in which the hot wire 18 having catalytic action is used to promote thermal decomposition of the non-pyrophoric raw material by the catalytic action is not excluded from the present invention.

[0082] オゾンは、上記のとおり、市販のォゾナイザー又はオゾンボンベで供給する。 [0082] As described above, ozone is supplied by a commercially available ozonizer or ozone cylinder.

[0083] 非自然発火性原料とオゾンに希釈ガスを混合しても良!/、。希釈ガスとしては、例え ば、アルゴンやヘリウム等の不活性ガス又は成膜時の化学反応に不活性なガスとす る。非自然発火性原料の濃度調整や真空チャンバ内の圧力調整に用いることができ [0083] A non-pyrophoric raw material and ozone may be mixed with a dilution gas! /. As the diluting gas, for example, an inert gas such as argon or helium or a gas inert to a chemical reaction during film formation is used. Can be used to adjust the concentration of non-pyrophoric raw materials and the pressure in the vacuum chamber

[0084] オゾンガスの供給量は、酸化物薄膜中に残留する炭素が実質的にゼロとなる量で あること力 S好ましく、例えば、非自然発火性物質に対して、 5〜20倍の流量である。ォ ゾンガスの供給量が少ないと酸化物薄膜中に炭素が残留し、充分若しくはそれ以上 の供給量であれば、酸化物薄膜中に炭素は残留しない。そして、酸化物薄膜中に残 留する炭素が実質的にゼロであるとガスバリア性が最も良好となる。 [0084] The supply amount of ozone gas should be such that the carbon remaining in the oxide thin film is substantially zero. For example, the flow rate is 5 to 20 times that of non-pyrophoric substances. is there. If the supply amount of ozone gas is small, carbon remains in the oxide thin film. If the supply amount is sufficient or more, carbon does not remain in the oxide thin film. The gas barrier property is best when the carbon remaining in the oxide thin film is substantially zero.

[0085] ここで、オゾンガスの供給量は、酸化物薄膜の成膜開始時には、まず、酸化物薄膜 中に炭素が残留する量に設定 (例えば、非自然発火性物質に対して、 0. 5〜2. 0倍 の流量)し、その後供給量を増加させて酸化物薄膜中に残留する炭素が実質的にゼ 口となる量に設定 (例えば、非自然発火性物質に対して、 5〜20倍の流量)してもよ い。このとき、酸化物薄膜は、その厚さ方向に沿って、表面に向かうにつれて、炭素 含有量が少なくなる分布となり、傾斜組成薄膜となる。そして、酸化物薄膜は、酸化 物薄膜中に炭素が残留すると基板との密着性が良好となり、一方、酸化物薄膜中に 残留する炭素が実質的にゼロであるとガスバリア性が最も良好となる物性を示す。そ のため、基板表面上の酸化物薄膜に炭素を残留させ、酸化物薄膜の表面側には炭 素が残留しないように傾斜組成膜とすることで、基板に対して密着性が良好で、かつ 、ガスバリア性が良好な酸化物薄膜とすることができる。 [0085] Here, the supply amount of ozone gas is as follows. The amount of carbon remaining in the oxide thin film (for example, a flow rate of 0.5 to 2.0 times that of non-pyrophoric substances) It may be set to an amount that substantially becomes the mouth (for example, 5 to 20 times the flow rate for non-pyrophoric substances). At this time, the oxide thin film has a distribution in which the carbon content decreases toward the surface along the thickness direction, and becomes a gradient composition thin film. The oxide thin film has good adhesion to the substrate when carbon remains in the oxide thin film, while the gas barrier property is best when carbon remaining in the oxide thin film is substantially zero. Shows physical properties. Therefore, by making the gradient composition film so that carbon remains in the oxide thin film on the substrate surface and carbon does not remain on the surface side of the oxide thin film, the adhesion to the substrate is good. And it can be set as an oxide thin film with favorable gas-barrier property.

[0086] 本実施形態では、成膜時に、プラスチック容器 11に紫外線を照射することが好まし Vヽ (紫外線照射手段は不図示)。プラスチック容器 11の表面を殺菌処理することがで きる。また、紫外線の照射によってオゾンの分解を促進して酸化力を高め、結果とし て、非自然発火性原料の酸化を促進させることができる。このとき、ホットワイヤーによ つて非自然発火性原料とオゾンガスを加熱するが、ホットワイヤーによって紫外線の 照射が妨げられることがなぐ効率よく反応を進めることができる。 In the present embodiment, it is preferable to irradiate the plastic container 11 with ultraviolet rays during film formation. V 成膜 (ultraviolet irradiation means is not shown). The surface of the plastic container 11 can be sterilized. Moreover, the decomposition of ozone can be promoted by irradiation with ultraviolet rays to enhance the oxidizing power, and as a result, the oxidation of non-pyrophoric raw materials can be promoted. At this time, the non-pyrophoric raw material and ozone gas are heated by the hot wire, but the reaction can proceed efficiently without hindering the irradiation of ultraviolet rays by the hot wire.

[0087] ワイヤー 18は、ホットワイヤーとしたときに、実質的に揮発しない金属又は炭素を主 成分として形成されてなることが好ましい。ここで金属は耐酸化性金属であることが好 ましい。例えば、 Ir, Re, Ni, Pt又は Auである。不純物の少ない非自然発火性原料 に由来する酸化物薄膜を成膜することができる。  [0087] When the wire 18 is a hot wire, the wire 18 is preferably formed using a metal or carbon that does not substantially volatilize as a main component. Here, the metal is preferably an oxidation resistant metal. For example, Ir, Re, Ni, Pt or Au. An oxide thin film derived from a non-pyrophoric raw material with few impurities can be formed.

[0088] 一方、ワイヤーに由来する揮発成分を不純物としてではなぐ添加成分として酸化 物薄膜に取り込ませても良い。このような形態の製造方法を行なうためには次のよう に行なう。ワイヤー 18は、金属若しくは導電性金属化合物若しくは炭素を主成分とし て形成され、かつ、ホットワイヤーとしたときに炭素、ケィ素又は金属元素を揮発させ 、かつ、炭素、ケィ素又は金属元素が酸化物薄膜に取り込まれて添加成分となっても よい。酸化物薄膜に、意図的に添加成分を導入する場合に有効な手法である。金属 の具体例としては、例えば、モリブデン、銅、アルミニウム又はパラジウムである。ホッ トワイヤーとしたときにこれらの金属元素が揮発し、酸化物薄膜に取り込まれて添カロ 成分となる。導電性金属化合物の具体例としては、例えば、 FeC又は FeCrCである 。ホットワイヤーとしたときに炭素が揮発し、酸化物薄膜に取り込まれて添加成分とな る。ワイヤー 18が、金属を主成分として形成され、かつ、ホットワイヤーとしたときにケ ィ素を揮発させる形態の具体例としては、 Ir、 Pt又は NiCr等の非揮発性金属のワイ ヤーの表面に Siをスパッタリングして被膜したワイヤーがある。ホットワイヤーとしたと きにケィ素が揮発し、酸化物薄膜に取り込まれて添加成分となる。ワイヤー 18が、炭 素を主成分とするワイヤー、例えば炭素繊維であれば、ホットワイヤーとしたときに炭 素が揮発し、酸化物薄膜に取り込まれて添加成分となる。酸化物薄膜に、炭素、ケィ 素又は金属元素が添加成分として取り込まれると、酸化物薄膜の物性が改良される 。例えば、酸化物薄膜、例えば AIO薄膜にケィ素が添加成分として取り込まれると、 ガスノ リア性を維持したまま、柔軟性が向上する。そして、揮発した金属元素は、 SiO 薄膜、 AIO薄膜等の酸化物薄膜の内部に取り込まれて、カラーセンターとなること が好ましい。酸化物薄膜に呈色を施すことができる。カラーセンターとして機能する金 属元素の具体例としては、例えば、コバルト、マンガン、銅、鉄、クロム、アンチモン、 力ドニゥム、硫黄、セレン、金、ニッケル、ウラン、バナジウム、銀、モリブデン、錫、タン グステン、ビスマス又はエノレビゥムである。 [0088] On the other hand, a volatile component derived from the wire may be incorporated into the oxide thin film as an additive component other than impurities. In order to carry out such a manufacturing method, the following steps are taken. The wire 18 is formed of a metal, a conductive metal compound, or carbon as a main component. When the wire 18 is used as a hot wire, the wire 18 volatilizes carbon, silicon, or metal element, and the carbon, silicon, or metal element is oxidized. It may be incorporated into a thin film and become an additive component. This is an effective technique when an additive component is intentionally introduced into the oxide thin film. Specific examples of the metal include molybdenum, copper, aluminum, and palladium. These metal elements volatilize when they are used as hot wires, and are incorporated into the oxide thin film. Become an ingredient. Specific examples of the conductive metal compound include, for example, FeC or FeCrC. When it is used as a hot wire, the carbon volatilizes and is incorporated into the oxide thin film to become an additive component. As a specific example of the form in which the wire 18 is formed of a metal as a main component and volatilizes the key when used as a hot wire, the wire 18 is formed on the surface of a wire of a non-volatile metal such as Ir, Pt, or NiCr. There are wires sputtered and coated with Si. When hot wire is used, the silicon volatilizes and is incorporated into the oxide thin film to become an additive component. If the wire 18 is a wire containing carbon as a main component, for example, carbon fiber, the carbon volatilizes when it is used as a hot wire, and is taken into the oxide thin film and becomes an additive component. When carbon, silicon, or a metal element is incorporated into the oxide thin film as an additive component, the physical properties of the oxide thin film are improved. For example, when silicon is incorporated as an additive component in an oxide thin film, for example, an AIO thin film, flexibility is improved while maintaining gas noriality. The volatilized metal element is preferably taken into an oxide thin film such as a SiO thin film or an AIO thin film to form a color center. The oxide thin film can be colored. Specific examples of metal elements that function as color centers include, for example, cobalt, manganese, copper, iron, chromium, antimony, force donium, sulfur, selenium, gold, nickel, uranium, vanadium, silver, molybdenum, tin, and tan Gusten, bismuth or enolebium.

[0089] 本実施形態では、前記の添加成分が、酸化物薄膜にお!/、て架橋材として機能する ことが好ましい。酸化物薄膜の物理化学的安定性を向上させ、又は、屈折率の調整 をすること力 Sできる。架橋材として機能する添加成分の具体例としては、例えばナトリ ゥム、カリウム、リチウム、鉛、炭素又はチタンである。例えば、酸化物薄膜が SiO薄 膜であれば、ナトリウム、カリウム又はリチウムを添加することによって網目装飾酸化物 若しくは中間酸化物として、 SiOのネットワーク構造に入り込み、熱膨張係数、硬度 などの物理化学的性質を調整できる。同様に鉛を添加すれば、屈折率を高めること 力できる。同様にチタンを添加すれば、耐アルカリ性が向上する。同様に炭素を添カロ すれば、柔軟性を付与できる。  [0089] In the present embodiment, the additive component preferably functions as a cross-linking material in the oxide thin film. It is possible to improve the physicochemical stability of the oxide thin film or adjust the refractive index. Specific examples of the additive component that functions as a cross-linking material are, for example, sodium, potassium, lithium, lead, carbon, or titanium. For example, if the oxide thin film is a SiO thin film, it can enter the network structure of SiO as a network decoration oxide or intermediate oxide by adding sodium, potassium or lithium, and the physicochemical properties such as thermal expansion coefficient and hardness You can adjust the properties. Similarly, the addition of lead can increase the refractive index. Similarly, when titanium is added, alkali resistance is improved. Similarly, adding carbon can add flexibility.

[0090] 添加成分として酸化物薄膜に取り込ませている別形態としては、例えば次のように 行なう。すなわち、ワイヤー 18の表面に揮発性物質を塗布又は担持し、ホットワイヤ 一としたときに揮発性物質を揮発させて、酸化物薄膜に取り込まれて添加成分とする 形態である。非自然発火性原料由来の成分が主成分となり、ワイヤーに担持させた 揮発性物質由来の成分が添加成分となる酸化物薄膜を成膜することができる。揮発 性物質の具体例としては、モリブデン、銅、アルミニウム、パラジウム、タングステン、 銀又はケィ素或レ、はこれらを含む化合物である。酸化物薄膜に呈色を施すことがで きる。また、 AIO薄膜にケィ素を添加成分として取り込ませることで、ガスバリア性を 維持したまま、柔軟性が向上する。なお、この形態には、ワイヤー 18の構成成分が揮 発しない形態と、揮発する形態とがある。後者の場合、揮発性物質とワイヤーからの 揮発物の両方が酸化物薄膜に添加成分として取り込まれる。 [0090] As another mode in which the oxide thin film is incorporated as an additive component, for example, the following is performed. In other words, a volatile substance is applied or supported on the surface of the wire 18 to volatilize the volatile substance when it is used as a hot wire. It is a form. It is possible to form an oxide thin film in which a component derived from a non-pyrophoric raw material is a main component and a component derived from a volatile substance supported on a wire is an additional component. Specific examples of the volatile substance include molybdenum, copper, aluminum, palladium, tungsten, silver, silicon, or a compound containing these. The oxide thin film can be colored. In addition, by incorporating Cay as an additive into the AIO thin film, flexibility is improved while maintaining gas barrier properties. This form includes a form in which the constituent components of the wire 18 are not volatilized and a form in which the component is volatilized. In the latter case, both volatile materials and wire volatiles are incorporated into the oxide film as additive components.

さらに、本実施形態では、非自然発火性原料由来の成分が主成分となり、また、ヮ ィヤー由来の成分も主成分となる酸化物薄膜を成膜する形態としてもよい。つまり、こ のような形態としては、ワイヤー 18は、ホットワイヤーとしたときに揮発する炭素、ケィ 素又は金属の少なくともいずれか一種の成分を含有する金属、導電性金属化合物 又は炭素を主成分として形成されてなり、かつ、ホットワイヤーから揮発した炭素、ケ ィ素又は金属の少なくともいずれか一種の成分を含む蒸気が、非自然発火性のケィ 化有機化合物又は非自然発火性のアルミニウム含有有機化合物などの前記非自然 発火性原料とともに、非自然発火性原料となり、前記蒸気が酸化して酸化物薄膜の 主成分の一つを構成する形態がある。金属の具体例としては、例えば、モリブデン、 銅、アルミニウム又はパラジウムである。ホットワイヤーとしたときにこれらの金属元素 が揮発し、これらの金属元素を含む蒸気が非自然発火性原料となり、酸化されて、非 自然発火性のケィ化有機化合物又は非自然発火性のアルミニウム含有有機化合物 などの非自然発火性原料とともに、酸化物薄膜の主成分の一つとなる。ワイヤー 18 1S 金属を主成分として形成され、かつ、ホットワイヤーとしたときにケィ素を揮発させ る形態の具体例としては、 Ir、 Pt又は NiCr等の非揮発性金属のワイヤーの表面に Si をスパッタリングして被膜したワイヤーがある。ホットワイヤーとしたときにケィ素が揮発 し、この蒸気が非自然発火性原料となり、酸化されて、非自然発火性のケィ化有機化 合物又は非自然発火性のアルミニウム含有有機化合物などの非自然発火性原料と ともに、酸化物薄膜の主成分の一つとなる。導電性金属化合物は、単独では使用せ ず、上記 2つの非自然発火性原料 (金属元素を含む蒸気とケィ素を含む蒸気)ととも に併用される。導電性金属化合物の具体例としては、例えば、 FeC又は FeCrCであ る。ホットワイヤーとしたときに炭素が揮発し、酸化されて、前記酸化物薄膜に添加成 分として取り込まれる。 Furthermore, in this embodiment, an oxide thin film may be formed in which a component derived from a non-pyrophoric raw material is a main component, and a component derived from a layer is also a main component. In other words, as such a form, the wire 18 is mainly composed of a metal, a conductive metal compound, or carbon containing at least one of carbon, silicon, and metal that volatilizes when it is used as a hot wire. Vapor that is formed and contains at least one component of carbon, silicon, or metal volatilized from the hot wire is a non-pyrophoric caged organic compound or a non-pyrophoric aluminum-containing organic compound. In addition to the non-pyrophoric raw material, such as the above, it becomes a non-pyrophoric raw material, and the vapor oxidizes to form one of the main components of the oxide thin film. Specific examples of the metal include molybdenum, copper, aluminum, and palladium. These metal elements volatilize when used as a hot wire, and steam containing these metal elements becomes non-pyrophoric raw materials that are oxidized and contain non-pyrophoric key organic compounds or non-pyrophoric aluminum. Along with non-pyrophoric materials such as organic compounds, it is one of the main components of oxide thin films. Wire 18 1S A specific example of a mode in which the key is volatilized when it is formed as a main component and used as a hot wire, Si is applied to the surface of a wire of a non-volatile metal such as Ir, Pt or NiCr. Some wires are sputtered and coated. When hot wire is used, the volatilization of the vapor causes the vapor to become a non-pyrophoric raw material that is oxidized and non-pyrophoric key organic compounds or non-pyrophoric aluminum-containing organic compounds. Together with pyrophoric materials, it is one of the main components of oxide thin films. Conductive metal compounds are not used alone, but together with the two non-pyrophoric raw materials (steam containing metal element and steam containing key element) Used together. Specific examples of the conductive metal compound include, for example, FeC or FeCrC. Carbon is volatilized and oxidized when it is used as a hot wire, and is taken into the oxide thin film as an additional component.

[0092] 以上述べた非自然発火性原料の供給方法は、原料ガス供給管 23を介して供給す る形態が含まれていたが、ここで、非自然発火性原料の供給方法として、原料ガス供 給管 23を介して供給せず、原料ガス供給管 23にはオゾンガスのみを流す別形態 1 について説明する。すなわち、ワイヤー 18は、ホットワイヤーとしたときに揮発する炭 素、ケィ素又は金属の少なくともいずれか一種の成分を含有する金属、導電性金属 化合物又は炭素を主成分として形成されてなるワイヤーを使用する。すると、ホットヮ ィヤーとなったとき、ホットワイヤーから揮発した炭素、ケィ素又は金属の少なくともい ずれか一種の成分を含む蒸気が非自然発火性原料となる。金属の具体例としては、 例えば、モリブデン、銅、アルミニウム又はパラジウムである。ホットワイヤーとしたとき にこれらの金属元素が揮発し、これらの金属元素を含む蒸気が非自然発火性原料と なり、酸化されて、その金属元素の酸化物薄膜の主成分となる。ワイヤー 18が、金属 を主成分として形成され、かつ、ホットワイヤーとしたときにケィ素を揮発させる形態の 具体例としては、 Ir、 Pt又は NiCr等の非揮発性金属のワイヤーの表面に Siをスパッ タリングして被膜したワイヤーがある。ホットワイヤーとしたときにケィ素が揮発し、この 蒸気が非自然発火性原料となり、酸化されて、 SiO薄膜の主成分となる。導電性金 属化合物は、単独では使用せず、上記 2つの非自然発火性原料 (金属元素を含む 蒸気とケィ素を含む蒸気)とともに併用される。導電性金属化合物の具体例としては 、例えば、 FeC又は FeCrCである。ホットワイヤーとしたときに炭素が揮発し、酸化さ れて、前記酸化物薄膜に添加成分として取り込まれる。ワイヤー由来の蒸気であれ ば、安全性をさらに高め、また、原料導入手段が簡素となる。また、ワイヤーの組成を 調整することで薄膜の組成を容易に制御することができる。また、原料導入手段が簡 素となる。ワイヤー由来の蒸気は、 2000°C以下で飽和蒸気圧が 10_4Pa以上の金属 の単体又は該金属を含む化合物の蒸気であることが好ましい。充分な成膜速度、例 えば 2. 5nm/秒以上の成膜速度を得ることができる。 [0092] The supply method of the non-pyrophoric raw material described above included a form in which the non-pyrophoric raw material is supplied via the raw material gas supply pipe 23. Another mode 1 in which only ozone gas is allowed to flow through the raw material gas supply pipe 23 without being supplied through the supply pipe 23 will be described. That is, the wire 18 is a wire formed of a metal, a conductive metal compound, or carbon containing at least one of carbon, carbon, or metal that volatilizes when used as a hot wire as a main component. To do. Then, when it becomes a hot wire, a vapor containing at least one component of carbon, silicon, or metal volatilized from the hot wire becomes a non-pyrophoric raw material. Specific examples of the metal include molybdenum, copper, aluminum, and palladium. When a hot wire is formed, these metal elements are volatilized, and the vapor containing these metal elements becomes a non-pyrophoric raw material, which is oxidized and becomes the main component of the oxide thin film of the metal element. As a specific example of the form in which the wire 18 is formed of a metal as a main component and volatilizes the key when used as a hot wire, Si is applied to the surface of a non-volatile metal wire such as Ir, Pt or NiCr. Some wires are sputtered and coated. When the hot wire is formed, the key volatilizes and this vapor becomes a non-pyrophoric raw material that is oxidized and becomes the main component of the SiO thin film. Conductive metal compounds are not used alone, but are used in combination with the two non-pyrophoric raw materials (steam containing metal elements and steam containing key elements). Specific examples of the conductive metal compound include, for example, FeC or FeCrC. Carbon is volatilized and oxidized when it is used as a hot wire, and is taken into the oxide thin film as an additive component. If the steam is derived from wire, the safety is further improved and the means for introducing the raw material is simplified. Moreover, the composition of the thin film can be easily controlled by adjusting the composition of the wire. In addition, the raw material introduction means is simplified. Steam from the wire is preferably a vapor of a compound containing elemental or the metal of the metal saturated vapor pressure of more than 10_ 4 Pa below 2000 ° C. A sufficient film formation rate, for example, a film formation rate of 2.5 nm / second or more can be obtained.

[0093] 上記蒸気としては、例えば、モリブデン、銅、アルミニウム、パラジウム、タングステン 、銀又はケィ素を含む蒸気(1)である。このとき、酸化物薄膜は、オゾンの酸化作用 によって、モリブデン、銅、アルミニウム、パラジウム、タングステン、銀又はケィ素の酸 化物薄膜となる。また、炭素、ナトリウム、カリウム、リチウム、鉛又はチタンを含む蒸気[0093] Examples of the vapor include molybdenum, copper, aluminum, palladium, and tungsten. Vapor containing silver or silicon (1). At this time, the oxide thin film becomes an oxide thin film of molybdenum, copper, aluminum, palladium, tungsten, silver, or silicon by the oxidizing action of ozone. Also vapor containing carbon, sodium, potassium, lithium, lead or titanium

(2)を、前記蒸気(1)と同時に存在させても良い。前記蒸気(1)が酸化されて、酸化 物薄膜が形成され、蒸気(2)に含まれる元素はこの酸化物薄膜に添加成分として取 り込まれる。 (2) may be present simultaneously with the steam (1). The vapor (1) is oxidized to form an oxide thin film, and the elements contained in the vapor (2) are taken into the oxide thin film as an additive component.

[0094] 原料ガス供給管 23を介して供給せず、原料ガス供給管 23にはオゾンガスのみを 流す別形態 1において、ワイヤーの表面に揮発性物質を塗布又は担持し、ホットワイ ヤーとしたときに揮発性物質を揮発させて、酸化物薄膜に取り込ませて添加成分とす ることとしても良い。ワイヤー由来の成分が主成分となり、ワイヤーに担持させた揮発 性物質由来の成分が添加成分となる酸化物薄膜を成膜することができる。或いは、ヮ ィヤーの表面に揮発性物質を塗布又は担持し、ホットワイヤーとしたときに揮発性物 質を揮発させて、揮発性物質がワイヤーから揮発した蒸気とともに非自然発火性原 料として、酸化物薄膜の主成分となるようにしてもよい。ワイヤー由来の成分が主成 分となり、ワイヤーに担持させた揮発性物質由来の成分も主成分となる酸化物薄膜 を成膜することができる。このとき酸化物薄膜を構成する酸化物は、非自然発火性原 料由来の主成分とワイヤー由来の主成分とが同じであれば SiO薄膜、 AIO薄膜等 の単一成分の酸化物薄膜となり、非自然発火性原料由来の主成分とワイヤー由来の 主成分とが異なれば、複酸化物の酸化物薄膜となる。複酸化物としては、例えば、 Si Mo Oがある。揮発性物質としては、酸化されると酸化物となる物質であり、例えば、 モリブデン、銅、アルミニウム、ノ ラジウム又はケィ素或いはこれらを含む化合物であ り、これらは粉体であることが好ましい。  [0094] In another embodiment 1 in which only the ozone gas is allowed to flow through the source gas supply pipe 23 without being supplied through the source gas supply pipe 23, a volatile substance is applied or supported on the surface of the wire to form a hot wire. Volatile substances may be volatilized and incorporated into the oxide thin film as an additive component. It is possible to form an oxide thin film in which a component derived from a wire is a main component and a component derived from a volatile substance carried on the wire is an added component. Alternatively, a volatile substance is applied or supported on the surface of the wire to volatilize the volatile substance when used as a hot wire, and the volatile substance is oxidized as a non-pyrophoric raw material together with the vapor volatilized from the wire. You may make it become a main component of a physical thin film. It is possible to form an oxide thin film in which the component derived from the wire is the main component and the component derived from the volatile substance carried on the wire is also the main component. If the main component derived from the non-pyrophoric raw material and the main component derived from the wire are the same, the oxide constituting the oxide thin film becomes a single component oxide thin film such as a SiO thin film or an AIO thin film. If the main component derived from non-pyrophoric raw material is different from the main component derived from wire, a double oxide oxide thin film is formed. An example of the double oxide is Si Mo 2 O. The volatile substance is a substance that becomes an oxide when oxidized, and is, for example, molybdenum, copper, aluminum, noradium, silicon, or a compound containing these, and these are preferably powders.

[0095] さらに、非自然発火性原料の供給方法として、原料ガス供給管 23を介して供給せ ず、原料ガス供給管 23にはオゾンガスのみを流す別形態 2について説明する。ワイ ヤー 18の表面に塗布又は担持された揮発性物質を非自然発火性原料とする。この 形態であれば、ワイヤー 18をホットワイヤーとしたときに揮発性物質が揮発する。揮 発性物質としては、上記と同様に酸化されると酸化物となる物質であり、例えば、モリ ブデン、銅、アルミニウム、パラジウム又はケィ素或いはこれらを含む化合物であり、こ れらは粉体であることが好ましい。これらの元素の酸化物薄膜が得られる。そして、ォ ゾンの酸化作用によって、揮発性物質に由来する酸化物薄膜が安全に得られる。ま た、原料導入手段が簡素となる。酸化ケィ素膜等の無色透明の酸化物薄膜の他、呈 色を示す酸化物薄膜も得られる。 [0095] Further, as a method for supplying the non-pyrophoric raw material, another embodiment 2 in which only ozone gas is allowed to flow through the raw material gas supply pipe 23 without being supplied through the raw material gas supply pipe 23 will be described. Volatile substances coated or supported on the surface of wire 18 are used as non-pyrophoric materials. If it is this form, when the wire 18 is used as a hot wire, a volatile substance will volatilize. The volatile substance is a substance that becomes an oxide when oxidized in the same manner as described above. For example, molybdenum, copper, aluminum, palladium, silicon, or a compound containing these is used. These are preferably powders. An oxide thin film of these elements is obtained. The oxide thin film derived from volatile substances can be obtained safely by the oxidation action of ozone. In addition, the raw material introduction means is simplified. In addition to a colorless and transparent oxide thin film such as a silicon oxide film, an oxide thin film exhibiting color can be obtained.

[0096] 揮発性物質としてナトリウム、カリウム又はリチウムを揮発させる場合には、単体では 不安定であるため、これらの炭酸塩、シユウ酸塩などの塩をワイヤーに担持させて使 用する。  [0096] When sodium, potassium, or lithium is volatilized as a volatile substance, it is unstable by itself, so these salts such as carbonates and oxalates are supported on wires.

[0097] (成膜の終了)  [0097] (Finished film formation)

薄膜が所定の厚さに達すると、非自然発火性原料及びオゾンガス 33の供給を止め 、反応室 12内を再度排気した後、図示していないリークガスを導入して、反応室 12 を大気圧にする。この後、上部チャンバ 15を開けてプラスチック容器 11を取り出す。 薄膜の膜厚は、ワイヤー 18の種類、プラスチック容器 11内の圧力、供給ガス流量、 非自然発火性原料及びオゾンガス 33がワイヤー 18に吹き付けられる時間、非自然 発火性原料の種類などに依存するが、 5〜; !OOnmとなるようにするのが好ましい。上 記実施形態によれば、成膜速度は、例えば、 2. 5〜4. Onm/秒と高速である。酸化 物薄膜を被膜したプラスチック容器の酸素透過度を測定したところ、未コートのプラス チック容器と比較して、 2分の 1〜 5分の 1に低下し、ノ リア性の向上が確認できた。  When the thin film reaches a predetermined thickness, the supply of the non-pyrophoric raw material and the ozone gas 33 is stopped, the reaction chamber 12 is evacuated again, a leak gas (not shown) is introduced, and the reaction chamber 12 is brought to atmospheric pressure. To do. Thereafter, the upper chamber 15 is opened and the plastic container 11 is taken out. The thickness of the thin film depends on the type of wire 18, the pressure in the plastic container 11, the supply gas flow rate, the time that the non-pyrophoric raw material and ozone gas 33 are blown onto the wire 18, the type of non-pyrophoric raw material, etc. 5 ~;! OOnm is preferable. According to the above embodiment, the film formation rate is as high as 2.5 to 4. Onm / second, for example. When the oxygen permeability of the plastic container coated with the oxide thin film was measured, it was reduced to one-half to one-fifth compared to an uncoated plastic container. .

[0098] なお、プラスチック容器 11の外表面に酸化物薄膜を成膜する場合には、膜の均一 性を高めるために、ボトル回転機構 32によってプラスチック容器 11を回転させた状 態で成膜を行なうことが好ましレ、。  [0098] When an oxide thin film is formed on the outer surface of the plastic container 11, the film is formed in a state where the plastic container 11 is rotated by the bottle rotating mechanism 32 in order to improve the uniformity of the film. I'd prefer to do it.

[0099] 次に、本実施形態に係る酸化物薄膜を被膜したプラスチック容器の製造方法にお いて、量産を行なう形態を説明する。本実施形態に係る酸化物薄膜を被膜したブラ スチック容器の製造方法では、減圧工程において、大気圧以下の所定圧力(例えば 10〜; !OOPa)とされた真空チャンバ 6の内部にプラスチック容器 11が収容された状 態となるが、この状態とするために、プラスチック容器 11が、真空チャンバ 6内に差圧 機構を介して搬入される工程を追加する。搬送経路にはプラスチック容器 11が次々 と所定間隔で連続的に搬送されるため、真空チャンバとしてはバッチタイプよりも、例 えば図 9に示される差圧機構を有するタイプを使用することが好ましい。そして、ホット ワイヤーで加熱された非自然発火性原料とオゾンをプラスチック容器 1 1の表面に効 率的に接触させるために、プラスチック容器 11が、真空チャンバ内の搬送経路に設 置されたワイヤー 18に対してプラスチック容器 11の表面が所望の距離 (例えば 5〜 5 Omm)まで近づくように、搬送経路上を搬送される工程を追加する。さらに、成膜を 終えたプラスチック容器を取り出す工程、つまり、プラスチック容器 11が、真空チャン バ外へ差圧機構を介して搬出される工程をさらに追加する。上記工程を追加すること によって、効率的に酸化物薄膜を被膜したプラスチック容器を量産することが可能と なる。 [0099] Next, an embodiment in which mass production is performed in the method for manufacturing a plastic container coated with an oxide thin film according to the present embodiment will be described. In the method for manufacturing a plastic container coated with an oxide thin film according to the present embodiment, the plastic container 11 is placed in the vacuum chamber 6 that is set to a predetermined pressure (for example, 10 to; In order to achieve this state, a process of adding the plastic container 11 into the vacuum chamber 6 through the differential pressure mechanism is added. Since the plastic containers 11 are continuously conveyed at predetermined intervals one after another in the conveyance path, it is preferable to use a type having a differential pressure mechanism shown in FIG. 9 for example as a vacuum chamber rather than a batch type. And hot In order to efficiently bring the non-pyrophoric raw material heated by the wire and ozone into contact with the surface of the plastic container 11, the plastic container 11 is attached to the wire 18 installed in the transfer path in the vacuum chamber. A process of transporting along the transport path is added so that the surface of the plastic container 11 approaches a desired distance (for example, 5 to 5 Omm). Further, a step of taking out the plastic container after film formation, that is, a step of transporting the plastic container 11 out of the vacuum chamber via the differential pressure mechanism is further added. By adding the above steps, it is possible to efficiently mass-produce plastic containers coated with an oxide thin film.

実施例  Example

[0100] (実施例 1) [0100] (Example 1)

図 2に示した成膜装置 100を用いて、プラスチック容器 11として、丸型 500mlの PE Tボトルの内表面に成膜を行なった。容器壁の肉厚は約 0. 3mmであった。ワイヤー 18としてイリジウムワイヤーを用い、非自然発火性原料としてトリメチルシランを 1.5sc cmを供給した。オゾンを酸素で 10%に希釈して混合ガスとし、この混合ガスを 100s ccm供給した。ワイヤー 18とボトルの内側の底面との距離を 30mmとした。ワイヤー 1 8とボトルの内側の側面との距離は約 30mmとした。イリジウムワイヤーに直流電流を 印加し、 800°Cのホットワイヤーとした。成膜時の真空チャンバ 6内の圧力を 20Paとし た。成膜時間は 15秒とした。得られた酸化ケィ素薄膜を被膜した PETボトルを実施 例 1とした。実施例 1について、次のとおり評価を行なった。  Film formation was performed on the inner surface of a round 500 ml PET bottle as a plastic container 11 using the film formation apparatus 100 shown in FIG. The wall thickness of the container was about 0.3 mm. Iridium wire was used as wire 18, and 1.5 sccm of trimethylsilane was supplied as a non-pyrophoric material. Ozone was diluted to 10% with oxygen to obtain a mixed gas, and this mixed gas was supplied at 100 sccm. The distance between the wire 18 and the bottom surface inside the bottle was 30 mm. The distance between the wire 18 and the inner side of the bottle was about 30 mm. A direct current was applied to the iridium wire to form a 800 ° C hot wire. The pressure in the vacuum chamber 6 during film formation was 20 Pa. The film formation time was 15 seconds. The PET bottle coated with the obtained silicon oxide thin film was designated as Example 1. Example 1 was evaluated as follows.

[0101] (評価方法) [0101] (Evaluation method)

(1)酸素透過度  (1) Oxygen permeability

この容器の酸素透過度は、 Modern Control社製 Oxtran 2/20を用いて、 23 °C、 90%RHの条件にて測定し、窒素ガス置換開始から 72時間後の測定値を記載 した。  The oxygen permeability of this container was measured under the conditions of 23 ° C. and 90% RH using Oxtran 2/20 manufactured by Modern Control, and the measured value after 72 hours from the start of nitrogen gas replacement was described.

(2)膜厚  (2) Film thickness

DLCの膜厚は、 Veeco社 DEKTAK3を用いて測定した。  The film thickness of DLC was measured using Veeco DEKTAK3.

(3)密着性  (3) Adhesion

PETボトル内表面上に形成された酸化物薄膜サンプルを、 25°Cの純粋に 1週間浸 漬した。 PETボトルのうち比較的平滑な一定部分について、マスキングを用いて、膜 厚が測定可能な箇所を設け、浸漬前後の膜厚を上述の方法で測定した。膜厚が、浸 漬前後で同等のサンプルは、密着性ありと、浸漬前後で膜厚が有意に減少したサン プルは、密着性なしと、判定した。 Immerse the oxide thin film sample formed on the inner surface of the PET bottle purely at 25 ° C for one week. Pickled. About the comparatively smooth fixed part of PET bottles, the location which can measure film thickness was provided using masking, and the film thickness before and behind immersion was measured by the above-mentioned method. The samples with the same film thickness before and after immersion were judged to have adhesion, and the samples with significantly reduced film thickness before and after immersion were judged to have no adhesion.

実施例 1について、酸素透過度は、 0. 002cc/容器/日であった。膜厚は 51nm であった。密着性は「あり」であった。製造条件と評価結果を表 1にまとめた。  For Example 1, the oxygen permeability was 0.002 cc / container / day. The film thickness was 51 nm. The adhesion was “Yes”. The manufacturing conditions and evaluation results are summarized in Table 1.

[表 1] [table 1]

Figure imgf000038_0001
Figure imgf000038_0001

[0103] (実施例 2) [0103] (Example 2)

オゾンを酸素で 3%に希釈して混合ガスとし、この混合ガスを lOOsccm供給し、性 膜時間を 50秒とした以外は実施例 1と同様に成膜を行ない、実施例 2とした。成膜条 件と結果を表 1に示した。  Ozone was diluted to 3% with oxygen to make a mixed gas, this mixed gas was supplied at lOOsccm, and a film was formed in the same manner as in Example 1 except that the chemical film time was 50 seconds. Table 1 shows the deposition conditions and results.

[0104] (実施例 3) [Example 3]

成膜時の圧力を lOPaとした以外は実施例 1と同様に成膜を行ない、実施例 3とした 。成膜条件と結果を表 1に示した。  Except that the pressure at the time of film formation was lOPa, film formation was performed in the same manner as in Example 1 to obtain Example 3. Table 1 shows the deposition conditions and results.

[0105] (実施例 4) [0105] (Example 4)

成膜時の圧力を lOOPaとした以外は実施例 1と同様に成膜を行ない、実施例 4とし た。成膜条件と結果を表 1に示した。  Except that the pressure at the time of film formation was lOOPa, film formation was performed in the same manner as in Example 1 to obtain Example 4. Table 1 shows the deposition conditions and results.

[0106] (実施例 5) [0106] (Example 5)

オゾンを酸素で 3%に希釈して混合ガスとし、この混合ガスを lOOsccmで 7. 5秒供 給して成膜を行ない、その後、オゾンを酸素で 10%に希釈して混合ガスとし、この混 合ガスを lOOsccmで 7. 5秒供給して成膜を行ない、酸化物薄膜を炭素濃度が異な る傾斜組成膜とした以外は実施例 1と同様に成膜を行ない、実施例 5とした。成膜条 件と結果を表 1に示した。この傾斜組成膜は、プラスチック表面上では炭素濃度が約 5%であり、薄膜の表面側では炭素濃度が検出限界以下であった。  Ozone is diluted to 3% with oxygen to make a mixed gas, and this mixed gas is supplied at lOOsccm for 7.5 seconds to form a film, and then ozone is diluted to 10% with oxygen to make a mixed gas. Film formation was carried out in the same manner as in Example 1 except that the mixed gas was supplied for 7.5 seconds at lOOsccm, and the oxide thin film was changed to a gradient composition film having a different carbon concentration. . Table 1 shows the deposition conditions and results. The gradient composition film had a carbon concentration of about 5% on the plastic surface, and the carbon concentration was below the detection limit on the surface side of the thin film.

[0107] (実施例 6) [Example 6]

非自然発火性原料として、へキサメチルジシロキサンを用いた以外は実施例 1と同 様に成膜を行ない、実施例 6とした。成膜条件と結果を表 1に示した。  Example 6 was carried out in the same manner as in Example 1 except that hexamethyldisiloxane was used as a non-pyrophoric material. Table 1 shows the deposition conditions and results.

[0108] (実施例 7) [Example 7]

非自然発火性原料として、フエニルシランを用いた以外は実施例 1と同様に成膜を 行ない、実施例 7とした。成膜条件と結果を表 1に示した。  A film was formed in the same manner as in Example 1 except that phenylsilane was used as a non-pyrophoric material, and Example 7 was obtained. Table 1 shows the deposition conditions and results.

[0109] (実施例 8) [Example 8]

非自然発火性原料として、へキサメチルジシラザンを用いた以外は実施例 1と同様 に成膜を行ない、実施例 8とした。成膜条件と結果を表 1に示した。  A film was formed in the same manner as in Example 1 except that hexamethyldisilazane was used as a non-pyrophoric raw material, and Example 8 was obtained. Table 1 shows the deposition conditions and results.

[0110] (実施例 9) [0110] (Example 9)

非自然発火性原料として、トリイソプロポキシアルミニウムを用い、酸化アルミニウム 薄膜を成膜した以外は実施例 1と同様に成膜を行ない、実施例 9とした。成膜条件と 結果を表 1に示した。 Triisopropoxy aluminum is used as a non-pyrophoric raw material, and aluminum oxide A film was formed in the same manner as in Example 1 except that a thin film was formed. Table 1 shows the deposition conditions and results.

[0111] (実施例 10)  [0111] (Example 10)

図 2に示した成膜装置 100を用いて、実施例 1と同様の PETボトルの内表面に成膜 を行なった。ワイヤー 18としてモリブデンワイヤーを用い、非自然発火性原料をモリ ブデンワイヤーから発生するモリブデン蒸気とした。オゾンを酸素で 10%に希釈して 混合ガスとし、この混合ガスを lOOsccm供給した。ワイヤー 18とボトルの内側の底面 との距離を 30mmとした。ワイヤー 18とボトルの内側の側面との距離は約 30mmとし た。モリブデンワイヤーに直流電流を印加し、 800°Cのホットワイヤーとした。成膜時 の真空チャンバ 6内の圧力を 5Paとした。成膜時間は 30秒とした。得られた酸化モリ ブデン薄膜を被膜した PETボトルを実施例 10とした。実施例 10について、実施例 1 と同様の評価を行なった。成膜条件と結果を表 1に示した。得られた酸化モリブデン 薄膜は青色に呈色していた。  Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1. Molybdenum wire was used as wire 18, and non-pyrophoric raw material was molybdenum vapor generated from molybdenum wire. Ozone was diluted to 10% with oxygen to make a mixed gas, and this mixed gas was supplied to lOOsccm. The distance between the wire 18 and the bottom surface inside the bottle was 30 mm. The distance between the wire 18 and the inner side of the bottle was about 30 mm. A direct current was applied to the molybdenum wire to make a 800 ° C hot wire. The pressure in the vacuum chamber 6 during film formation was 5 Pa. The film formation time was 30 seconds. The PET bottle coated with the obtained molybdenum oxide thin film was designated as Example 10. Example 10 was evaluated in the same manner as Example 1. Table 1 shows the deposition conditions and results. The obtained molybdenum oxide thin film was colored blue.

[0112] (実施例 11)  [0112] (Example 11)

図 2に示した成膜装置 100を用いて、実施例 1と同様の PETボトルの内表面に成膜 を行なった。ワイヤー 18としてイリジウムワイヤーを用い、非自然発火性原料は、イリ ジゥムワイヤーの表面に担持させた揮発性物質であるアルミニウム粉末とした。ォゾ ンを酸素で 10%に希釈して混合ガスとし、この混合ガスを lOOsccm供給した。ワイヤ 一 18とボトルの内側の底面との距離を 30mmとした。ワイヤー 18とボトルの内側の側 面との距離は約 30mmとした。イリジウムワイヤーに直流電流を印加し、 800°Cのホッ トワイヤーとした。成膜時の真空チャンバ 6内の圧力を 5Paとした。成膜時間は 60秒と した。得られた酸化アルミニウム薄膜を被膜した PETボトルを実施例 11とした。実施 例 11について、実施例 1と同様の評価を行なった。成膜条件と結果を表 1に示した。  Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1. Iridium wire was used as wire 18, and the non-pyrophoric material was aluminum powder, which is a volatile substance supported on the surface of iridium wire. The ozone was diluted to 10% with oxygen to make a mixed gas, and this mixed gas was supplied by lOOsccm. The distance between the wire 18 and the bottom surface inside the bottle was 30 mm. The distance between the wire 18 and the inner side of the bottle was about 30 mm. A direct current was applied to the iridium wire to obtain a 800 ° C hot wire. The pressure in the vacuum chamber 6 during film formation was 5 Pa. The film formation time was 60 seconds. A PET bottle coated with the obtained aluminum oxide thin film was designated as Example 11. Example 11 was evaluated in the same manner as in Example 1. Table 1 shows the deposition conditions and results.

[0113] (実施例 12)  [0113] (Example 12)

図 2に示した成膜装置 100を用いて、実施例 1と同様の PETボトルの内表面に成膜 を行なった。非自然発火性原料としてトリメチルシランを 1.5sCCmを供給した。また、 ワイヤー 18としてモリブデンワイヤーを用い、モリブデンワイヤー力、ら発生するモリブ デン蒸気を添加成分として、酸化ケィ素薄膜中に取り込んだ。オゾンを窒素で 20% に希釈して混合ガスとし、この混合ガスを 20sccm供給した。ワイヤー 18とボトルの内 側の底面との距離を 30mmとした。ワイヤー 18とボトルの内側の側面との距離は約 3 Ommとした。モリブデンワイヤーに直流電流を印加し、 800°Cのホットワイヤーとした 。成膜時の真空チャンバ 6内の圧力を lOPaとした。成膜時間は 15秒とした。このよう にして得られた、モリブデンが添加成分として取り込まれた酸化ケィ素薄膜を被膜し た PETボトルを実施例 12とした。実施例 12について、実施例 1と同様の評価を行な つた。成膜条件と結果を表 1に示した。モリブデンが添加成分として取り込まれた酸化 ケィ素薄膜は青色に呈色していた。 Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1. Trimethylsilane as a non-pyrophoric material was supplied 1.5s CC m. Molybdenum wire was used as the wire 18, and molybdenum wire generated from the molybdenum wire was incorporated into the silicon oxide thin film as an additive component. 20% ozone with nitrogen The mixed gas was diluted to 20 sccm and supplied. The distance between the wire 18 and the bottom surface inside the bottle was set to 30 mm. The distance between the wire 18 and the inner side of the bottle was about 3 Omm. A direct current was applied to the molybdenum wire to make a 800 ° C hot wire. The pressure in the vacuum chamber 6 during film formation was lOPa. The film formation time was 15 seconds. A PET bottle coated with a thin film of silicon oxide in which molybdenum was incorporated as an additive was obtained as Example 12. For Example 12, the same evaluation as in Example 1 was performed. Table 1 shows the deposition conditions and results. The silicon oxide thin film in which molybdenum was incorporated as an additive component was colored blue.

[0114] (比較例 1) [0114] (Comparative Example 1)

図 4に示した成膜装置 200を用いて、プラスチック容器 11として、丸型 500mlの PE Tボトルの外表面に成膜を行なった。容器壁の肉厚は約 0. 3mmであった。ワイヤー 18としてイリジウムワイヤーを用い、非自然発火性原料としてトリメチルシランを 1.5sc cmを供給した。オゾンを酸素で 10%に希釈して混合ガスとし、この混合ガスを 100s ccm供給した。ワイヤー 18とボトルの外側の底面との距離を 55mmとした。ワイヤー 1 8とボトルの外側の側面との距離は約 55mmとした。イリジウムワイヤーに直流電流を 印加し、 800°Cのホットワイヤーとした。成膜時の真空チャンバ 6内の圧力を 20Paとし た。成膜時間は 15秒とした。得られた酸化ケィ素薄膜を被膜した PETボトルを比較 例 1とした。成膜条件と結果を表 1に示した。ワイヤー 18とボトル表面との距離が 55m mと長かったため、非自然発火性原料及びオゾンガスは、ホットワイヤーで加熱され た後プラスチック容器の外表面に効率的に接触していなかった。そのため、成膜速 度及び膜厚が小さぐガスバリア性が得られなかった。  Film formation was performed on the outer surface of a round 500 ml PET bottle as a plastic container 11 using the film formation apparatus 200 shown in FIG. The wall thickness of the container was about 0.3 mm. Iridium wire was used as wire 18, and 1.5 sccm of trimethylsilane was supplied as a non-pyrophoric material. Ozone was diluted to 10% with oxygen to obtain a mixed gas, and this mixed gas was supplied at 100 sccm. The distance between the wire 18 and the bottom surface outside the bottle was 55 mm. The distance between the wire 18 and the outer side of the bottle was about 55 mm. A direct current was applied to the iridium wire to form a 800 ° C hot wire. The pressure in the vacuum chamber 6 during film formation was 20 Pa. The film formation time was 15 seconds. The PET bottle coated with the obtained silicon oxide thin film was designated as Comparative Example 1. Table 1 shows the deposition conditions and results. Since the distance between the wire 18 and the bottle surface was as long as 55 mm, the non-pyrophoric raw material and ozone gas were not efficiently in contact with the outer surface of the plastic container after being heated with the hot wire. For this reason, gas barrier properties with a small film forming speed and a small film thickness were not obtained.

[0115] (実施例 13)  [0115] (Example 13)

ワイヤー 18とボトルの外側の底面との距離を 3mmとし、ワイヤー 18とボトルの外側 の側面との距離は約 3mmとした以外は比較例 1と同様にして成膜を行な!/、、実施例 13とした。成膜条件と結果を表 1に示した。ガスバリア性は得られた力 ワイヤー 18と ボトル表面との距離が 3mmと短かったため、ガス吹き出し孔 17xの近傍の成膜が過 剰となり、ムラが生じた。  Perform film formation in the same manner as in Comparative Example 1 except that the distance between the wire 18 and the outer bottom surface of the bottle is 3 mm, and the distance between the wire 18 and the outer side surface of the bottle is about 3 mm. Example 13 was used. Table 1 shows the deposition conditions and results. As the distance between the force wire 18 obtained and the bottle surface was as short as 3 mm, the film formation in the vicinity of the gas blowing hole 17x was excessive, resulting in unevenness.

[0116] (比較例 2) 成膜時の圧力を l lOPaとした以外は実施例 1と同様に成膜を行ない、比較例 2とし た。成膜条件と結果を表 1に示した。非自然発火性原料としてトリメチルシランを用い た場合において、成膜時の圧力が高すぎたため、非自然発火性原料がプラスチック 容器の表面に接触する前に粒子化し、真空チャンバ内で、酸化ケィ素粉末が生成し た。その結果、ボトルの表面には成膜ではなぐ粒子の堆積が生じた。密着性は「な し」であった。 [0116] (Comparative Example 2) A film was formed in the same manner as in Example 1 except that the pressure during film formation was changed to lOPa, and Comparative Example 2 was obtained. Table 1 shows the deposition conditions and results. When trimethylsilane was used as a non-pyrophoric raw material, the pressure during film formation was too high, so the non-pyrophoric raw material was granulated before coming into contact with the surface of the plastic container. A powder was formed. As a result, particles were deposited on the surface of the bottle, which was not formed by film formation. The adhesion was “none”.

[0117] (実施例 14) [0117] (Example 14)

成膜時の圧力を 8Paとした以外は実施例 1と同様に成膜を行ない、実施例 14とした 。成膜条件と結果を表 1に示した。非自然発火性原料としてトリメチルシランを用いた 場合において成膜時の圧力が低すぎたため、ガスバリア性は得られたものの、成膜 速度が低下した。  Except that the pressure at the time of film formation was 8 Pa, film formation was carried out in the same manner as in Example 1 to obtain Example 14. Table 1 shows the deposition conditions and results. When trimethylsilane was used as a non-pyrophoric raw material, the pressure during film formation was too low, and although the gas barrier property was obtained, the film formation rate decreased.

[0118] (比較例 3) [0118] (Comparative Example 3)

オゾンの代わりに、酸素を lOOsccm供給した以外は実施例 1と同様に成膜を行な い、比較例 3とした。成膜条件と結果を表 1に示した。酸化ケィ素薄膜が成膜されなか つた。  A film was formed in the same manner as in Example 1 except that lOOsccm was supplied in place of ozone, and Comparative Example 3 was obtained. Table 1 shows the deposition conditions and results. No silicon oxide thin film was formed.

[0119] (実施例 15)  [Example 15]

イリジウムワイヤーの代わりにタングステンワイヤーを用いた以外は実施例 1と同様 に成膜を行ない、実施例 15とした。成膜条件と結果を表 1に示した。実施例 1と同等 の酸化ケィ素薄膜が成膜された力、タングステンワイヤーの劣化が見られた。  A film was formed in the same manner as in Example 1 except that a tungsten wire was used instead of the iridium wire. Table 1 shows the deposition conditions and results. The force at which a silicon oxide thin film equivalent to that in Example 1 was formed and the deterioration of the tungsten wire were observed.

[0120] (実施例 16)  [0120] (Example 16)

図 2に示した成膜装置 100を用いて、実施例 1と同様の PETボトルの内表面に成膜 を行なった。ワイヤー 18としてタングステンワイヤーを用い、非自然発火性原料をタン ダステンワイヤーから発生するタングステン蒸気とした。オゾンを酸素で 10%に希釈 して混合ガスとし、この混合ガスを lOOsccm供給した。ワイヤー 18とボトルの内側の 底面との距離を 30mmとした。ワイヤー 18とボトルの内側の側面との距離は約 30m mとした。タングステンワイヤーに直流電流を印加し、 2000°Cのホットワイヤーとした 。成膜時の真空チャンバ 6内の圧力を 5Paとした。成膜時間は 30秒とした。得られた 酸化タングステン薄膜を被膜した PETボトルを実施例 16とした。実施例 16について 、実施例 1と同様の評価を行なった。成膜条件と結果を表 1に示した。得られた酸化 タングステン薄膜が成膜されたが、タングステンワイヤーの劣化が見られた。 Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1. Tungsten wire was used as wire 18, and the non-pyrophoric material was tungsten vapor generated from the tungsten wire. Ozone was diluted to 10% with oxygen to make a mixed gas, and this mixed gas was supplied by lOOsccm. The distance between the wire 18 and the bottom surface inside the bottle was 30 mm. The distance between the wire 18 and the inner side of the bottle was about 30 mm. A direct current was applied to the tungsten wire to make a 2000 ° C hot wire. The pressure in the vacuum chamber 6 during film formation was 5 Pa. The film formation time was 30 seconds. The PET bottle coated with the obtained tungsten oxide thin film was designated as Example 16. About Example 16 The same evaluation as in Example 1 was performed. Table 1 shows the deposition conditions and results. The obtained tungsten oxide thin film was formed, but deterioration of the tungsten wire was observed.

[0121] (実施例 17)  [Example 17]

図 2に示した成膜装置 100を用いて、実施例 1と同様の PETボトルの内表面に成膜 を行なった。非自然発火性原料としてトリメチルシランを 1.5sCCmを供給した。また、 ワイヤー 18としてタングステンワイヤーを用い、タングステンワイヤー力も発生するタ ングステン蒸気を添加成分として、酸化ケィ素薄膜中に取り込んだ。オゾンを窒素で 20%に希釈して混合ガスとし、この混合ガスを 20sccm供給した。ワイヤー 18とボト ルの内側の底面との距離を 30mmとした。ワイヤー 18とボトルの内側の側面との距離 は約 30mmとした。タングステンワイヤーに直流電流を印加し、 2000°Cのホットワイ ヤーとした。成膜時の真空チャンバ 6内の圧力を l OPaとした。成膜時間は 15秒とし た。このようにして得られた、タングステンが添加成分として取り込まれた酸化ケィ素 薄膜を被膜した PETボトルを実施例 17とした。実施例 17について、実施例 1と同様 の評価を行なった。成膜条件と結果を表 1に示した。タングステンが添加成分として 取り込まれた酸化ケィ素薄膜は暗色に呈色していた。 Using the film forming apparatus 100 shown in FIG. 2, a film was formed on the inner surface of the PET bottle as in Example 1. Trimethylsilane as a non-pyrophoric material was supplied 1.5s CC m. In addition, a tungsten wire was used as the wire 18, and tungsten vapor that also generates tungsten wire force was incorporated as an additive into the silicon oxide thin film. Ozone was diluted to 20% with nitrogen to obtain a mixed gas, and this mixed gas was supplied at 20 sccm. The distance between the wire 18 and the bottom inside the bottle was 30 mm. The distance between the wire 18 and the inner side of the bottle was about 30 mm. A direct current was applied to the tungsten wire to make a hot wire of 2000 ° C. The pressure in the vacuum chamber 6 during film formation was l OPa. The film formation time was 15 seconds. A PET bottle coated with a thin film of silicon oxide in which tungsten was incorporated as an additive component was obtained as Example 17. Example 17 was evaluated in the same manner as in Example 1. Table 1 shows the deposition conditions and results. The silicon oxide thin film in which tungsten was incorporated as an additive component was colored dark.

[0122] (比較例 4)  [0122] (Comparative Example 4)

[0123] 実施例 1について、 X線光電子分光法 (XPS)による深さ方向のケィ素、炭素及び 酸素の組成分析を行なった。結果を図 12に示す。同様に実施例 2について図 13に 示した。図 12では、酸化ケィ素薄膜中に残留炭素が存在しなかった (検出限界以下 )が、図 13では、酸化ケィ素薄膜中に残留炭素が 8atom%残留していた。したがつ て、オゾンは、酸化ケィ素薄膜中に残留炭素を減らすように寄与していることがわか つた。 [0123] With respect to Example 1, composition analysis of depth-wise silicon, carbon, and oxygen was performed by X-ray photoelectron spectroscopy (XPS). The results are shown in FIG. Similarly, Example 2 is shown in FIG. In FIG. 12, there was no residual carbon in the silicon oxide thin film (below the detection limit), but in FIG. 13, 8 atom% residual carbon remained in the silicon oxide thin film. Therefore, ozone was found to contribute to reducing residual carbon in the silicon oxide thin film.

産業上の利用可能性  Industrial applicability

[0124] 本発明によって得られたガスバリア性プラスチック容器は、ビール等のアルコール 飲料又は清涼飲料などに適した、ガスバリア性を有する飲料用プラスチック容器であ [0124] The gas barrier plastic container obtained by the present invention is a plastic container for beverages having gas barrier properties suitable for alcoholic beverages such as beer or soft drinks.

Claims

請求の範囲 The scope of the claims [1] プラスチック容器を収容した真空チャンバの内部を大気圧以下の所定圧力とする 工程と、  [1] A step of setting the inside of the vacuum chamber containing the plastic container to a predetermined pressure below atmospheric pressure; 前記真空チャンバの内部に配置されているワイヤーに通電して所定温度以上に発 熱させてホットワイヤーとする工程と、  Energizing a wire disposed inside the vacuum chamber to generate a hot wire by generating heat above a predetermined temperature; 前記真空チャンバの内部に供給された、ケィ素若しくは金属元素を構成元素として 含む非自然発火性原料及びオゾンガスを、前記ホットワイヤーで加熱し、その後、前 記プラスチック容器の内表面又は外表面の少なくともいずれか一方に接触させて、 前記非自然発火性原料由来の酸化物薄膜を形成させる工程と、  The non-pyrophoric raw material containing ozone or a metal element as a constituent element and ozone gas supplied to the inside of the vacuum chamber are heated by the hot wire, and then at least the inner surface or the outer surface of the plastic container Contacting any one of them, and forming an oxide thin film derived from the non-pyrophoric raw material; を有することを特徴とする酸化物薄膜を被膜したプラスチック容器の製造方法。  A method for producing a plastic container coated with an oxide thin film, characterized by comprising: [2] 前記プラスチック容器が、前記真空チャンバ内に差圧機構を介して搬入される工程 と、  [2] The plastic container is carried into the vacuum chamber via a differential pressure mechanism; 前記プラスチック容器が、前記真空チャンバ内の搬送経路に設置された前記ワイヤ 一に対して前記プラスチック容器の表面が所望の距離まで近づくように、前記搬送経 路上を搬送される工程と、  The plastic container is transported on the transport path so that the surface of the plastic container approaches a desired distance from the wire installed in the transport path in the vacuum chamber; 前記プラスチック容器が、前記真空チャンバ外へ差圧機構を介して搬出される工程 と、をさらに有することを特徴とする請求項 1に記載の酸化物薄膜を被膜したプラスチ ック容器の製造方法。  The method for producing a plastic container coated with an oxide thin film according to claim 1, further comprising a step of unloading the plastic container to the outside of the vacuum chamber via a differential pressure mechanism. [3] 前記酸化物薄膜を形成させる工程において、前記プラスチック容器に紫外線を照 射することを特徴とする請求項 1又は 2に記載の酸化物薄膜を被膜したプラスチック 容器の製造方法。  [3] The method for producing a plastic container coated with an oxide thin film according to [1] or [2], wherein in the step of forming the oxide thin film, the plastic container is irradiated with ultraviolet rays. [4] 前記非自然発火性原料として非自然発火性のケィ化有機化合物を使用し、前記ホ ットワイヤーで熱分解反応又は触媒反応によって分解させて、前記酸化物薄膜として SiO薄膜を形成するか、或いは、前記非自然発火性原料として非自然発火性のァ ノレミニゥム含有有機化合物を使用し、前記ホットワイヤーで熱分解反応又は触媒反 応によって分解させて、前記酸化物薄膜として AIO薄膜を形成することを特徴とする 請求項 1、 2又は 3に記載の酸化物薄膜を被膜したプラスチック容器の製造方法。  [4] A non-pyrophoric key organic compound is used as the non-pyrophoric raw material and decomposed by a thermal decomposition reaction or catalytic reaction with the hot wire to form a SiO thin film as the oxide thin film. Alternatively, a non-pyrophoric ano-reductive organic compound is used as the non-pyrophoric raw material, and is decomposed by a thermal decomposition reaction or catalytic reaction with the hot wire to form an AIO thin film as the oxide thin film. A method for producing a plastic container coated with the oxide thin film according to claim 1, 2 or 3. [5] 前記オゾンガスの供給量は、前記酸化物薄膜中に残留する炭素が実質的にゼロと なる量であることを特徴とする請求項 4に記載の酸化物薄膜を被膜したプラスチック 容器の製造方法。 [5] The supply amount of the ozone gas is such that carbon remaining in the oxide thin film is substantially zero. The method for producing a plastic container coated with an oxide thin film according to claim 4, wherein [6] 前記オゾンガスの供給量は、前記酸化物薄膜の成膜開始時には前記酸化物薄膜 中に炭素が残留する量に設定し、その後供給量を増加させて前記酸化物薄膜中に 残留する炭素が実質的にゼロとなる量に設定して、前記酸化物薄膜を、その厚さ方 向に炭素含有量が異なる傾斜組成薄膜としたことを特徴とする請求項 4に記載の酸 化物薄膜を被膜したプラスチック容器の製造方法。  [6] The supply amount of the ozone gas is set so that carbon remains in the oxide thin film at the start of film formation of the oxide thin film, and then the supply amount is increased to increase the carbon remaining in the oxide thin film. 5. The oxide thin film according to claim 4, wherein the oxide thin film is a gradient composition thin film having a carbon content that varies in the thickness direction. Manufacturing method of coated plastic container. [7] 前記ワイヤーは、前記ホットワイヤーとしたときに、実質的に揮発しない金属又は炭 素を主成分として形成されてなることを特徴とする請求項 1、 2、 3、 4、 5又は 6に記載 の酸化物薄膜を被膜したプラスチック容器の製造方法。  [7] The wire according to claim 1, 2, 3, 4, 5 or 6, characterized in that, when the hot wire is used as a hot wire, the wire is formed mainly of a metal or carbon that does not substantially volatilize. The manufacturing method of the plastic container which coat | covered the oxide thin film of description. [8] 前記ワイヤーは、金属若しくは導電性金属化合物若しくは炭素を主成分として形成 され、かつ、前記ホットワイヤーとしたときに炭素、ケィ素又は金属元素を揮発させ、 かつ、前記炭素、ケィ素又は金属元素が前記酸化物薄膜に取り込まれて添加成分と なることを特徴とする請求項 1、 2、 3、 4、 5又は 6に記載の酸化物薄膜を被膜したプ ラスチック容器の製造方法。  [8] The wire is formed of a metal, a conductive metal compound, or carbon as a main component, and when the hot wire is used, volatilizes carbon, silicon, or a metal element, and the carbon, 7. The method for producing a plastic container coated with an oxide thin film according to claim 1, wherein a metal element is incorporated into the oxide thin film and becomes an additive component. [9] 前記添加成分が、カラーセンターとして機能することを特徴とする請求項 8に記載 の酸化物薄膜を被膜したプラスチック容器の製造方法。  [9] The method for producing a plastic container coated with an oxide thin film according to [8], wherein the additive component functions as a color center. [10] 前記カラーセンターとして機能する前記金属元素力 コバルト、マンガン、銅、鉄、 クロム、アンチモン、力ドニゥム、硫黄、セレン、金、ニッケル、ウラン、バナジウム、銀、 モリブデン、錫、タングステン、ビスマス又はエルビウムであることを特徴とする請求項 9に記載の酸化物薄膜を被膜したプラスチック容器の製造方法。  [10] The metal elemental force that functions as the color center Cobalt, manganese, copper, iron, chromium, antimony, force donium, sulfur, selenium, gold, nickel, uranium, vanadium, silver, molybdenum, tin, tungsten, bismuth or 10. The method for producing a plastic container coated with an oxide thin film according to claim 9, wherein the plastic container is erbium. [11] 前記添加成分が、前記酸化物薄膜において架橋材として機能することを特徴とす る請求項 8に記載の酸化物薄膜を被膜したプラスチック容器の製造方法。  11. The method for producing a plastic container coated with an oxide thin film according to claim 8, wherein the additive component functions as a cross-linking material in the oxide thin film. [12] 前記架橋材として機能する前記添加成分が、ナトリウム、カリウム、リチウム、鉛、炭 素又はチタンであることを特徴とする請求項 11に記載の酸化物薄膜を被膜したブラ スチック容器の製造方法。  12. The production of a plastic container coated with an oxide thin film according to claim 11, wherein the additive component that functions as the cross-linking material is sodium, potassium, lithium, lead, carbon, or titanium. Method. [13] 前記ワイヤーは、前記ホットワイヤーとしたときに揮発する炭素、ケィ素又は金属の 少なくともいずれか一種の成分を含有する金属、導電性金属化合物又は炭素を主 成分として形成されてなり、かつ、前記ホットワイヤーから揮発した炭素、ケィ素又は 金属の少なくともいずれか一種の成分を含む蒸気力 非自然発火性のケィ化有機化 合物又は非自然発火性のアルミニウム含有有機化合物などの前記非自然発火性原 料とともに、非自然発火性原料となり、前記蒸気が酸化して前記酸化物薄膜の主成 分の一つを構成することを特徴とする請求項 4に記載の酸化物薄膜を被膜したブラ スチック容器の製造方法。 [13] The wire is mainly composed of a metal, a conductive metal compound, or carbon containing at least one component of carbon, silicon, or metal that volatilizes when the hot wire is used. Vapor power that is formed as a component and contains at least one component of carbon, silicon, or metal volatilized from the hot wire Non-pyrophoric key organic compound or non-pyrophoric aluminum 5. The non-pyrophoric raw material together with the non-pyrophoric raw material such as a contained organic compound, and the vapor is oxidized to form one of the main components of the oxide thin film. A method for producing a plastic container coated with the oxide thin film described above. [14] 前記ワイヤーは、前記ホットワイヤーとしたときに揮発する炭素、ケィ素又は金属の 少なくともいずれか一種の成分を含有する金属、導電性金属化合物又は炭素を主 成分として形成されてなり、かつ、前記非自然発火性原料が、前記ホットワイヤーから 揮発した炭素、ケィ素又は金属の少なくともいずれか一種の成分を含む蒸気であり、 前記酸化物薄膜は、前記蒸気が酸化した酸化物薄膜であることを特徴とする請求項 1、 2又は 3に記載の酸化物薄膜を被膜したプラスチック容器の製造方法。  [14] The wire is formed of a metal, a conductive metal compound, or carbon containing at least one component of carbon, silicon, or metal that volatilizes when the hot wire is used as a main component, and The non-pyrophoric raw material is a vapor containing at least one component of carbon, silicon or metal volatilized from the hot wire, and the oxide thin film is an oxide thin film obtained by oxidizing the vapor. A method for producing a plastic container coated with the oxide thin film according to claim 1, 2 or 3. [15] 前記蒸気が、モリブデン、銅、アルミニウム、パラジウム、タングステン、銀、ケィ素、 炭素、ナトリウム、カリウム、リチウム、鉛又はチタン或いはこれらを含む化合物であり、 かつ、前記酸化物薄膜はモリブデン、銅、アルミニウム、パラジウム、タングステン、銀 又はケィ素の酸化物が主成分であることを特徴とする請求項 14に記載の酸化物薄 膜を被膜したプラスチック容器の製造方法。  [15] The vapor is molybdenum, copper, aluminum, palladium, tungsten, silver, silicon, carbon, sodium, potassium, lithium, lead, titanium, or a compound containing these, and the oxide thin film is molybdenum, 15. The method for producing a plastic container coated with an oxide thin film according to claim 14, wherein an oxide of copper, aluminum, palladium, tungsten, silver, or silicon is a main component.
PCT/JP2007/072296 2006-11-20 2007-11-16 Process for producing plastic container coated with oxide thin film Ceased WO2008062730A1 (en)

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