[go: up one dir, main page]

WO2008059883A1 - Hydrogen purification/collection method and hydrogen purification/collection facility - Google Patents

Hydrogen purification/collection method and hydrogen purification/collection facility Download PDF

Info

Publication number
WO2008059883A1
WO2008059883A1 PCT/JP2007/072107 JP2007072107W WO2008059883A1 WO 2008059883 A1 WO2008059883 A1 WO 2008059883A1 JP 2007072107 W JP2007072107 W JP 2007072107W WO 2008059883 A1 WO2008059883 A1 WO 2008059883A1
Authority
WO
WIPO (PCT)
Prior art keywords
hydrogen
activated carbon
chlorosilanes
packed bed
hydrogen chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/072107
Other languages
French (fr)
Japanese (ja)
Inventor
Mitsutoshi Narukawa
Toshihide Endoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007276565A external-priority patent/JP5344114B2/en
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of WO2008059883A1 publication Critical patent/WO2008059883A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/56Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/1071Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/102Carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2256/00Main component in the product gas stream after treatment
    • B01D2256/16Hydrogen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/204Inorganic halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/204Inorganic halogen compounds
    • B01D2257/2045Hydrochloric acid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/40Further details for adsorption processes and devices
    • B01D2259/41Further details for adsorption processes and devices using plural beds of the same adsorbent in series
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/042Purification by adsorption on solids
    • C01B2203/043Regenerative adsorption process in two or more beds, one for adsorption, the other for regeneration
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/0465Composition of the impurity

Definitions

  • An adsorption device having an activated carbon packed bed that adsorbs chlorosilanes and hydrogen chloride, and a pipe for introducing a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen to the adsorption device. Hydrogen purification and recovery equipment.
  • [6] Contact with a conversion facility that reacts tetrachlorosilane with hydrogen to produce trichlorosilane.
  • a product gas having the components shown in Table 1 was used as the product gas flowing out of the converter 1.
  • an adsorption tower having a tower diameter of 1600 mm ⁇ and a packing height of lOOOOmmh in the second embodiment, a pre-stage activated carbon packed bed 8A and a post-stage activated carbon packed bed 8B was used.
  • an adsorption tower 9 with three activated carbon packed beds 8 provided in parallel is used.Each activated carbon packed bed 8 is (adsorption) ⁇ (heat desorption) ⁇ (cooling) ⁇ (adsorption). ) ⁇
  • the operation was switched in this order, and the mixed gas that passed through the cooler 7 was continuously introduced into the activated carbon packed bed 8 in the adsorption use state.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Combustion & Propulsion (AREA)
  • Silicon Compounds (AREA)
  • Treating Waste Gases (AREA)

Abstract

Disclosed are a hydrogen purification/collection method and a facility for the method, which can be connected to a conversion facility for producing trichlorosilane and can purify and collect hydrogen contained in a gas generated by a conversion reaction with efficiency and enables to reuse the hydrogen. Specifically disclosed are a method and a facility for purification/collection of hydrogen, which are characterized in that a mixed gas produced by a conversion reaction for producing trichlorosilane is passed through an active carbon-filled layer to cause the adsorption of a chlorosilane and hydrogen chloride onto the active carbon, thereby separating the chlorosilane and hydrogen chloride from the gas. Preferably, the active carbon-filled layer is formed in a two stage structure composed of a first-stage active carbon-filled layer for adsorbing primarily a chlorosilane thereon and a second-stage active carbon-filled layer for adsorbing primarily hydrogen chloride, and the mixed gas is passed through the first-stage active carbon-filled layer and the second-stage active carbon-filled layer successively, thereby separating the chlorosilane and hydrogen chloride stepwisely.

Description

明 細 書  Specification

水素精製回収方法および水素精製回収設備  Hydrogen purification recovery method and hydrogen purification recovery equipment

技術分野  Technical field

[0001] 本発明は、例えば、トリクロロシランを生成する転換設備に接続され、転換反応の生 成ガスに含まれる水素を効率よく精製回収して再利用することができる水素精製回 収方法およびその設備に関する。  [0001] The present invention relates to, for example, a hydrogen purification and recovery method that is connected to a conversion facility that generates trichlorosilane, and that can efficiently purify and recover hydrogen contained in the product gas of the conversion reaction and reuse it. Regarding equipment.

本願 (ま、 2006年 11月 14曰 ίこ、 曰本 ίこ出願された特願 2006— 308476号、 2007 年 10月 24日に、 日本に出願された特願 2007— 276565号に基づき優先権を主張 し、その内容をここに援用する。  This application (May 2006, November 14, 2006, Japanese Patent Application No. 2006—308476, filed in Japan, October 24, 2007, Japanese Patent Application No. 2007—276565, filed in Japan The content of this is incorporated herein by reference.

背景技術  Background art

[0002] 高純度多結晶シリコンは、例えばトリクロロシラン(SiHCl: TCSと略称)および水素  High-purity polycrystalline silicon includes, for example, trichlorosilane (SiHCl: TCS) and hydrogen

3  Three

を原料とし、次式 (1)に示されるトリクロロシランの水素還元反応、次式 (2)に示されるト リクロロシランの熱分解反応によって生成されている。  Is produced by the hydrogen reduction reaction of trichlorosilane represented by the following formula (1) and the thermal decomposition reaction of trichlorosilane represented by the following formula (2).

SiHCl +H → Si+ 3HC1…ひ)  SiHCl + H → Si + 3HC1… hi)

3 2  3 2

4SiHCl → Si + 3SiCl + 2H (2)  4SiHCl → Si + 3SiCl + 2H (2)

3 4 2…  3 4 2…

[0003] 多結晶シリコンの上記生成反応から排出されるガスには未反応のトリクロロシランお よび水素と共に、副生した塩化水素およびテトラクロロシラン、ジクロロシラン、へキサ クロロジシランなどのクロロシラン類が含まれる。これらのクロロシラン類は沸点に応じ て段階的に蒸留分離され、必要に応じて再利用される。  [0003] Gases discharged from the above-mentioned formation reaction of polycrystalline silicon include unreacted trichlorosilane and hydrogen, as well as by-produced hydrogen chloride and chlorosilanes such as tetrachlorosilane, dichlorosilane, and hexachlorodisilane. . These chlorosilanes are separated by distillation stepwise according to the boiling point and reused as necessary.

[0004] 例えば、上記生成反応の排ガスから蒸留分離して回収したテトラクロロシランを原料 とし、次式 (3)に示す水素付加の転換反応によってトリクロロシランを得ることができる[0004] For example, trichlorosilane can be obtained by a hydrogenation conversion reaction represented by the following formula (3) using tetrachlorosilane recovered by distillation separation from the exhaust gas of the production reaction as a raw material

。転換反応において生成したガスに含まれるトリクロロシランゃテトラクロロシランなど のクロロシラン類は冷却凝集して回収し、トリクロロシランは上記多結晶シリコンの製 造原料として再利用される。 . Chlorosilanes such as trichlorosilane and tetrachlorosilane contained in the gas produced in the conversion reaction are recovered by cooling and aggregation, and the trichlorosilane is reused as a raw material for producing the polycrystalline silicon.

SiCl +H → SiHCl +HC1 · · · (3)  SiCl + H → SiHCl + HC1 (3)

4 2 3  4 2 3

[0005] また、上記生成ガスには未反応の水素が多量に含まれているので、クロロシラン類 を凝縮分離した後に、混合ガス中の水素を回収して上記転換反応の原料として転換 炉に戻して再利用すれば、水素の使用効率を高め大幅なコスト低減を図ることができ [0005] Since the product gas contains a large amount of unreacted hydrogen, after the chlorosilanes are condensed and separated, the hydrogen in the mixed gas is recovered and converted as a raw material for the conversion reaction. If it is returned to the furnace and reused, the use efficiency of hydrogen can be increased and the cost can be greatly reduced.

[0006] しかし、上記生成ガスには塩化水素が含まれており、塩化水素が含まれている状態 で転換反応の原料として使用すると、転換反応が阻害されると云う問題があり、上記 生成ガスから水素を回収して再利用するには、生成ガスに含まれる塩化水素を効率 よく取り除くことが必要である。 [0006] However, the product gas contains hydrogen chloride, and when used as a raw material for the conversion reaction in a state containing hydrogen chloride, there is a problem that the conversion reaction is hindered. In order to recover and reuse hydrogen from wastewater, it is necessary to efficiently remove hydrogen chloride contained in the product gas.

[0007] 従来の塩化水素の除去方法としては、例えば、図 3に示す処理方法が知られてい る。この方法は、まず転換炉 1の反応生成ガスを冷却器 2に導いて冷却し、クロロシラ ン類を凝縮させて捕集し、上記生成ガスから取り除!/、て塩化水素と水素の混合ガス にする。次に、塩化水素と水素の混合ガスを苛性ソーダの水溶液が循環する中和塔 3に通して塩化水素を取り除く。混合ガスに含まれている塩化水素と未凝縮のクロ口 シラン類は中和塔 3において苛性ソーダと反応し、塩化ナトリウム、珪酸ナトリウムを生 じて塔底に沈積するので、これを抜き出して系外に除去する。  [0007] As a conventional method for removing hydrogen chloride, for example, a treatment method shown in FIG. 3 is known. In this method, first, the reaction product gas of the converter 1 is led to the cooler 2 to be cooled, the chlorosilans are condensed and collected, and removed from the product gas! /, A mixed gas of hydrogen chloride and hydrogen To. Next, hydrogen chloride is removed by passing a mixed gas of hydrogen chloride and hydrogen through a neutralization tower 3 in which an aqueous solution of caustic soda circulates. Hydrogen chloride and uncondensed silanes contained in the mixed gas react with caustic soda in the neutralization tower 3 to produce sodium chloride and sodium silicate and deposit on the bottom of the tower. To remove.

[0008] 一方、水素が残った混合ガスは中和塔 3を通過して乾燥塔 4に導入される。該乾燥 塔 4にはゼオライトが充填されており、水素含有ガスが塔内を通過する間に乾燥され る。乾燥された水素は蒸発器 5に戻され、供給水素および供給 STCと混合されて転 換炉 1に導入され、循環使用される(特許文献 1参照)。  On the other hand, the mixed gas in which hydrogen remains passes through the neutralization tower 3 and is introduced into the drying tower 4. The drying tower 4 is filled with zeolite, and is dried while the hydrogen-containing gas passes through the tower. The dried hydrogen is returned to the evaporator 5, mixed with the supplied hydrogen and the supplied STC, introduced into the conversion furnace 1, and recycled (see Patent Document 1).

特許文献 1 :特開昭 48— 40625号公報 (第 4頁右上欄、図 1)  Patent Document 1: Japanese Patent Laid-Open No. 48-40625 (Page 4, upper right column, Fig. 1)

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0009] 図 3に示す従来の水素回収技術では、反応生成ガス中の塩化水素は塩化ナトリウ ム等に転換して除去されるので、有効利用されることなく廃棄物として処理されており 、廃棄処理のコストが嵩む。また、転換装置から抜き出した生成ガスを極低温まで冷 却し、凝縮液化したクロロシラン類を分離する力 極低温まで冷却しても未凝縮クロ口 シラン類が生成ガスに残留するので、塩化水素除去のためにこれを中和処理すると 、未凝縮クロロシラン類も中和処理されて廃棄物となるので、クロロシラン類を有効に 利用できない問題があった。さらに、中和剤として多くの苛性ソーダを消費してしまう 不都合もあった。 [0010] 本発明は、従来の水素回収技術における上記問題を解決するものであり、水素と 共にクロロシラン類および塩化水素を含むガス、例えば、転換炉の生成ガスから効率 よく塩化水素およびクロロシラン類を分離除去して、転換反応に再利用できる精製水 素ガスを回収し、かつ塩化水素およびクロロシラン類を有効利用できる形態で分離し て廃棄ロスを防止した水素精製回収方法とその設備を提供する。 In the conventional hydrogen recovery technology shown in FIG. 3, hydrogen chloride in the reaction product gas is converted to sodium chloride and removed, so that it is treated as waste without being effectively used. Processing costs increase. Also, the product gas extracted from the converter is cooled to a very low temperature, and the ability to separate condensed chlorosilanes. Even if cooled to a very low temperature, uncondensed black silanes remain in the product gas, thus removing hydrogen chloride. For this reason, when this is neutralized, the uncondensed chlorosilanes are also neutralized and become waste, which poses a problem that chlorosilanes cannot be used effectively. Furthermore, there is a disadvantage that a lot of caustic soda is consumed as a neutralizing agent. [0010] The present invention solves the above-described problems in conventional hydrogen recovery technology, and efficiently removes hydrogen chloride and chlorosilanes from a gas containing chlorosilanes and hydrogen chloride together with hydrogen, for example, a product gas of a converter. Provide a hydrogen purification and recovery method and equipment that separates and removes and recovers purified hydrogen gas that can be reused for the conversion reaction, and separates hydrogen chloride and chlorosilanes in a form that can be effectively used to prevent waste loss.

課題を解決するための手段  Means for solving the problem

[0011] 本発明は、以下の〔1〕〜〔5〕に示す構成を有することによって上記課題を解決した 水素精製回収方法に関する。  [0011] The present invention relates to a method for purifying and recovering hydrogen that has solved the above problems by having the configuration shown in the following [1] to [5].

〔1〕水素と共にクロロシラン類および塩化水素を含む混合ガスを活性炭充填層に通 じ、クロロシラン類および塩化水素を活性炭に吸着させてガス中から分離する水素精 製回収方法。  [1] A hydrogen purification method in which a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen is passed through an activated carbon packed bed, and the chlorosilanes and hydrogen chloride are adsorbed on the activated carbon and separated from the gas.

〔2〕テトラクロロシランと水素を反応させてトリクロロシランを生成させる転換反応にお いて生成した混合ガスを活性炭充填層に通じ、クロロシラン類および塩化水素を活 性炭に吸着させてガス中から分離する上記 [1]の水素精製回収方法。  [2] The mixed gas generated in the conversion reaction in which tetrachlorosilane reacts with hydrogen to produce trichlorosilane is passed through the activated carbon packed bed, and chlorosilanes and hydrogen chloride are adsorbed on the activated carbon and separated from the gas. [1] The hydrogen purification and recovery method of [1].

〔3〕クロロシラン類を主に吸着する前段活性炭充填層と、塩化水素を主に吸着する 後段活性炭充填層の二段に形成し、上記混合ガスを上記前段活性炭充填層および 上記後段活性炭充填層に連続して通過させてクロロシラン類と塩化水素を段階的に 分離する上記 [1]または上記 [2]の水素精製回収方法。  [3] It is formed in two stages: a pre-stage activated carbon packed bed that mainly adsorbs chlorosilanes and a post-stage activated carbon packed bed that mainly adsorbs hydrogen chloride, and the mixed gas is applied to the pre-stage activated carbon packed bed and the post-stage activated carbon packed bed. The method for purifying and recovering hydrogen according to the above [1] or [2], wherein the chlorosilanes and hydrogen chloride are separated stepwise by passing continuously.

[0012] 本発明は、以下の〔4〕〜〔6〕に示す構成を有することによって上記課題を解決した 水素精製回収設備に関する。 [0012] The present invention relates to a hydrogen purification and recovery facility that has solved the above-described problems by having the configurations shown in the following [4] to [6].

〔4〕クロロシラン類および塩化水素を吸着する活性炭充填層を有する吸着装置、水 素と共にクロロシラン類および塩化水素を含む混合ガスを上記吸着装置に導く管路 を備えてレ、ることを特徴とする水素精製回収設備。  [4] An adsorption device having an activated carbon packed bed that adsorbs chlorosilanes and hydrogen chloride, and a pipe for introducing a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen to the adsorption device. Hydrogen purification and recovery equipment.

〔5〕クロロシラン類を主に吸着する前段活性炭充填層と、塩化水素を主に吸着する 後段活性炭充填層とを有する吸着装置、水素と共にクロロシラン類および塩化水素 を含む混合ガスを該吸着装置に導き、前段活性炭充填層および後段活性炭充填層 を経由して流す管路を備えている上記 [4]に記載する水素精製回収設備。  [5] An adsorption device having a pre-stage activated carbon packed bed mainly adsorbing chlorosilanes and a post-stage activated carbon packed bed mainly adsorbing hydrogen chloride, and introducing a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen to the adsorber The hydrogen purification and recovery equipment according to [4] above, further comprising a pipe line that flows through the pre-stage activated carbon packed bed and the post-stage activated carbon packed bed.

〔6〕テトラクロロシランと水素を反応させてトリクロロシランを生成させる転換設備に接 続され、該転換反応において生成した混合ガスを吸着装置に導き、該吸着装置を経 由して精製された水素を上記転換設備に戻す循環管を有する上記 [4]または上記 [5 ]に記載する水素精製回収設備。 [6] Contact with a conversion facility that reacts tetrachlorosilane with hydrogen to produce trichlorosilane. The above-mentioned [4] or [5], further comprising a circulation pipe for introducing the mixed gas generated in the conversion reaction to the adsorption device and returning the purified hydrogen via the adsorption device to the conversion equipment. Hydrogen purification and recovery equipment.

発明の効果  The invention's effect

[0013] 上記 [1]の方法および上記 [4]の設備によれば、水素と共にクロロシラン類および塩 化水素を含む混合ガスを活性炭充填層に通じ、クロロシラン類および塩化水素を活 性炭に吸着させてガス中から分離し、クロロシラン類および塩化水素をほとんど含ま ない精製された水素ガスを回収することができる。また、活性炭に吸着されたクロロシ ラン類および塩化水素は活性炭に加熱下で水素ガスを通じるなどの脱着方法によつ て回収することができるので、廃棄ロスを生じない。  [0013] According to the method of [1] and the equipment of [4] above, a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen is passed through the activated carbon packed bed, and the chlorosilanes and hydrogen chloride are adsorbed on the activated carbon. And purified hydrogen gas containing almost no chlorosilanes and hydrogen chloride can be recovered. In addition, chlorosilanes and hydrogen chloride adsorbed on activated carbon can be recovered by a desorption method such as passing hydrogen gas under heating to activated carbon, so there is no waste loss.

[0014] 上記 [3]の方法および上記 [5]の設備によれば、活性炭充填層を二段階に形成し、 クロロシラン類を主に前段で吸着分離し、塩化水素を主に後段で吸着分離するので [0014] According to the method of [3] and the equipment of [5] above, the activated carbon packed bed is formed in two stages, chlorosilanes are mainly adsorbed and separated in the former stage, and hydrogen chloride is mainly adsorbed and separated in the latter stage. Because

、クロロシラン類と塩化水素の分離効果に優れており、クロロシラン類および塩化水素 を実質的に含まない精製した水素ガスを得ることができる。 It is excellent in the separation effect of chlorosilanes and hydrogen chloride, and a purified hydrogen gas substantially free of chlorosilanes and hydrogen chloride can be obtained.

[0015] 上記 [2]の方法および上記 [6]の設備によれば、テトラクロロシランと水素を反応させ てトリクロロシランを生成させる転換反応において生成した混合ガスからクロロシラン 類および塩化水素を除去した精製水素ガスを効率よく回収し、転換反応の原料の一 部として循環使用することができる。これにより原料コストを低減することができる。 [0015] According to the method of [2] and the equipment of [6], the purification is performed by removing chlorosilanes and hydrogen chloride from the mixed gas generated in the conversion reaction in which tetrachlorosilane and hydrogen are reacted to generate trichlorosilane. Hydrogen gas can be recovered efficiently and recycled as part of the raw material for the conversion reaction. Thereby, raw material cost can be reduced.

[0016] 以上のように、本発明に係る水素精製回収方法および水素精製回収設備によれば 、トリクロロシランへの転換反応で生じた反応生成ガスを、活性炭に通して塩化水素 およびクロロシラン類を吸着させて分離するので、吸着後にこれを脱着して回収する ことができ、従来は廃棄されていた塩化水素を有効に再利用することができる。また、 従来は中和剤として用いてレ、たカセイソーダを用いる必要がなレ、。  [0016] As described above, according to the hydrogen purification and recovery method and the hydrogen purification and recovery facility according to the present invention, the reaction product gas generated in the conversion reaction to trichlorosilane is passed through activated carbon to adsorb hydrogen chloride and chlorosilanes. Therefore, after adsorption, it can be desorbed and recovered, and hydrogen chloride that has been discarded in the past can be effectively reused. In addition, traditionally used as a neutralizing agent, it has been necessary to use caustic soda.

[0017] さらに、従来は混合ガスを極低温まで冷却してクロロシラン類を凝縮分離して中和 処理しているが、未分離のクロロシラン類が残るので、これが廃棄ロスになるのを避け ること力 Sできない。一方、本発明の方法および設備では、活性炭に吸着したクロロシ ラン類は脱着して回収することができるので、混合ガスを極低温まで冷却して凝縮分 離する必要がなぐし力、もクロロシラン類の廃棄ロスを生じない。 図面の簡単な説明 [0017] Further, conventionally, the mixed gas is cooled to a very low temperature to condense and separate chlorosilanes and neutralize them. However, since unseparated chlorosilanes remain, avoid this loss of waste. Force S can not. On the other hand, since the chlorosilanes adsorbed on the activated carbon can be desorbed and recovered in the method and equipment of the present invention, it is necessary to cool the mixed gas to a very low temperature and to separate it by condensation, No disposal loss occurs. Brief Description of Drawings

[0018] [図 1]本発明に係る水素精製回収の方法'設備の第 1実施形態を示す配管構成を含 む全体の設備構成図。  FIG. 1 is an overall equipment configuration diagram including a piping configuration showing a first embodiment of the method for hydrogen purification and recovery according to the present invention.

[図 2]本発明に係る水素精製回収の方法 ·設備の第 2実施形態を示す配管構成を含 む全体の設備構成図。  FIG. 2 is an overall equipment configuration diagram including a piping configuration showing a second embodiment of the method and equipment for hydrogen purification and recovery according to the present invention.

[図 3]水素精製回収の方法'設備の従来例を示す配管構成を含む全体の設備構成 図。  FIG. 3 is a diagram of the entire equipment configuration including piping configuration showing a conventional example of equipment for hydrogen purification and recovery.

符号の説明  Explanation of symbols

[0019] 1 · · ·転換炉、 7· · ·冷却器、 8· · ·活性炭充填層、 8Α· · ·前段活性炭充填層、 8Β· · ·後段 活性炭充填層、 9、 29· · ·吸着塔 (吸着装置)、 10· · ·第 2冷却器、 11 · · ·循環管。  [0019] 1 · · · Conversion furnace, 7 · · Cooler, 8 · · · Activated carbon packed bed, 8Α · · · Previous activated carbon packed bed, 8Β · · · Post activated carbon packed bed, 9, 29 · · Adsorption Tower (adsorber), 10 ··· second cooler, 11 ··· circulation pipe.

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0020] 以下、本発明を実施形態に基づいて具体的に説明する。本発明に係る水素精製 回収システム(方法ないし設備)の一例を図 1および図 2に示す。図示する実施形態 は、テトラクロロシランと水素との反応によってトリクロロシランを生成させる転換設備 に本発明の水素精製回収システムを適用した例である。 Hereinafter, the present invention will be specifically described based on embodiments. An example of a hydrogen purification / recovery system (method or facility) according to the present invention is shown in FIGS. The illustrated embodiment is an example in which the hydrogen purification and recovery system of the present invention is applied to a conversion facility for generating trichlorosilane by reaction of tetrachlorosilane and hydrogen.

[0021] 〔転換設備〕 [0021] [Conversion equipment]

図示する例において、トリクロロシランを生成する転換設備には、テトラクロロシラン の蒸発器 5と、転換炉 1とが設けられている。原料の水素および四塩化珪素 (STC)は 蒸発器 5に導入され、これらが混合した原料ガスが転換炉 1に導入される。転換炉 1 は約 800°C〜約 1300°Cの炉内温度に設定され、水素と四塩化珪素が反応してトリク ロロシランおよび微量のジクロロシラン、へキサクロロジシランなどが生成し、これらの 混合ガスが転換炉 1から流出する。この混合ガスには、例えば、生成したトリクロロシラ ン約 2%〜約 13%、副生した塩化水素約 2%〜約 13%、未反応の四塩化珪素約 14 %〜約 60 %、水素約 20 %〜約 78 %が含まれて!/、る。  In the illustrated example, a tetrachlorosilane evaporator 5 and a conversion furnace 1 are provided in a conversion facility for generating trichlorosilane. Raw material hydrogen and silicon tetrachloride (STC) are introduced into an evaporator 5, and a raw material gas mixed with these is introduced into a converter 1. Converter 1 is set to an in-furnace temperature of about 800 ° C to about 1300 ° C, and hydrogen and silicon tetrachloride react to produce trichlorosilane, a small amount of dichlorosilane, hexachlorodisilane, etc., and these are mixed. Gas flows out of converter 1. This mixed gas includes, for example, about 2% to about 13% of produced trichlorosilane, about 2% to about 13% of by-produced hydrogen chloride, about 14% to about 60% of unreacted silicon tetrachloride, about hydrogen 20% to about 78% included!

[0022] 〔凝縮工程〕 [0022] [Condensation step]

転換炉 1には冷却器 7が接続しており、転換炉 1で生じた混合ガス(約 600°C〜約 11 00°C)は冷却器 7に導入され、約一 50°C〜約 50°Cに冷却され、ガス中のクロロシラ ン類が凝縮液化して捕集され、クロロシラン類を回収する蒸留工程(図示省略)に送 られる。 A cooler 7 is connected to the converter 1, and a mixed gas (about 600 ° C. to about 1100 ° C.) generated in the converter 1 is introduced into the cooler 7, and about 50 ° C. to about 50 ° C. After cooling to ° C, chlorosilanes in the gas are condensed and collected, and sent to a distillation process (not shown) to collect chlorosilanes. It is done.

[0023] 上記凝縮工程でクロロシラン類の大部分は混合ガスから分離されるが、まだ混合ガ スには、未凝縮のクロロシラン類、塩化水素および多量の水素が含まれている。この 混合ガスを水素精製回収設備に導入し、ここで塩化水素および未凝縮のクロロシラ ン類を分離し、精製した水素ガスを回収する。  [0023] Although most of the chlorosilanes are separated from the mixed gas in the condensation step, the mixed gas still contains uncondensed chlorosilanes, hydrogen chloride, and a large amount of hydrogen. This mixed gas is introduced into a hydrogen purification and recovery facility, where hydrogen chloride and uncondensed chlorosilan are separated and the purified hydrogen gas is recovered.

[0024] 〔水素精製回収設備〕  [Hydrogen purification and recovery equipment]

水素精製回収設備は、活性炭充填層 8を有する吸着装置 (吸着塔) 9、および吸着 塔 9から転換設備の蒸発器 5に至る循環路 11を備えている。さらに、図示する水素精 製回収設備には、吸着塔 9に脱着ガスを導入する管路、第 2冷却器 10、上記吸着塔 9から第 2冷却器 10を経由する管路、および吸着塔 9の加熱手段(図示省略)からな る脱着手段が設けられてレ、る。  The hydrogen purification and recovery equipment includes an adsorption device (adsorption tower) 9 having an activated carbon packed bed 8 and a circulation path 11 from the adsorption tower 9 to the evaporator 5 of the conversion equipment. Further, the hydrogen purification and recovery equipment shown in the figure includes a pipe for introducing desorption gas into the adsorption tower 9, a second cooler 10, a pipe from the adsorption tower 9 through the second cooler 10, and an adsorption tower 9 Desorption means comprising heating means (not shown) is provided.

[0025] 〔吸着工程〕  [Adsorption process]

水素精製回収設備の吸着塔 9は冷却器 7に接続しており、冷却器 7を経た混合ガス は吸着塔 9に導入される。該吸着塔 9の内部には活性炭充填層 8が形成されている。 この活性炭は一般に使用されているものでよい。活性炭に対するクロロシラン類、塩 化水素、水素の吸着率はクロロシラン類 >塩化水素〉水素の順であり、水素の吸 着率は低い。  The adsorption tower 9 of the hydrogen purification and recovery facility is connected to the cooler 7, and the mixed gas that has passed through the cooler 7 is introduced into the adsorption tower 9. An activated carbon packed bed 8 is formed inside the adsorption tower 9. This activated carbon may be a commonly used one. The adsorption rates of chlorosilanes, hydrogen chloride, and hydrogen on activated carbon are in the order of chlorosilanes> hydrogen chloride> hydrogen, and the adsorption rate of hydrogen is low.

[0026] 従って、上記混合ガスを吸着塔 9に通じると、混合ガスが活性炭充填層 8を通過す る間に、混合ガス中のクロロシラン類および塩化水素は活性炭に吸着され、ガス中か ら分離される。一方、水素の吸着率は低いので僅かに活性炭に吸着される力 大部 分は活性炭充填層 8を通過するので、クロロシラン類および塩化水素を含まない精製 された水素ガスを得ることができる。  [0026] Therefore, when the mixed gas is passed through the adsorption tower 9, the chlorosilanes and hydrogen chloride in the mixed gas are adsorbed on the activated carbon and separated from the gas while the mixed gas passes through the activated carbon packed bed 8. Is done. On the other hand, since the adsorption rate of hydrogen is low, most of the force adsorbed on the activated carbon passes through the activated carbon packed bed 8, so that purified hydrogen gas containing no chlorosilanes and hydrogen chloride can be obtained.

[0027] 一般の活性炭は、高濃度飽和状態で、クロロシラン類の吸着量は活性炭 100gあた りクロロシラン類約 50gであり、塩化水素の吸着量は活性炭 100gあたり塩化水素約 6 gであるので、混合ガスに含まれるクロロシラン類および塩化水素の量および混合ガ スの導入量に応じて、上記吸着量に見合うように活性炭充填層 8の容量を定めれば 良い。なお、吸着塔 9の活性炭充填層 8は常温で使用すればよい。  [0027] Since general activated carbon is in a high concentration saturated state, the adsorption amount of chlorosilanes is about 50 g of chlorosilanes per 100 g of activated carbon, and the adsorption amount of hydrogen chloride is about 6 g of hydrogen chloride per 100 g of activated carbon. According to the amount of chlorosilanes and hydrogen chloride contained in the mixed gas and the amount of mixed gas introduced, the capacity of the activated carbon packed bed 8 may be determined so as to meet the above adsorption amount. The activated carbon packed bed 8 of the adsorption tower 9 may be used at room temperature.

[0028] 〔脱着工程〕 吸着された塩化水素およびクロロシラン類は、吸着した活性炭充填層 8 (吸着塔 9)を 約 150°C〜約 170°Cに加熱し、この加熱下で水素を活性炭充填層 8に通過させるこ とによって脱着すること力 Sできる。加熱した吸着塔 9は脱着ガスを通じた後に約 35°C に冷却して吸着使用の状態に戻す。 [0028] [Desorption process] The adsorbed hydrogen chloride and chlorosilanes heat the adsorbed activated carbon packed bed 8 (adsorption tower 9) to about 150 ° C to about 170 ° C, and pass hydrogen through the activated carbon packed bed 8 under this heating. Desorption power by S The heated adsorption tower 9 is passed through desorption gas, cooled to about 35 ° C, and returned to the state of adsorption.

[0029] 〔分離工程〕 [Separation step]

一方、脱着ガスは第 2冷却器 10に導入され、クロロシラン類と塩化水素とを分離して 回収すること力 Sできる。具体的には、吸着塔 9から流出した脱着ガスを第 2冷却器 10 に導入し、ここで約一 50°C〜約一 30°Cに冷却してクロロシラン類を凝縮して回収す る。回収したクロロシラン類は、塩化水素と金属シリコンとを反応させてトリクロロシラン を製造する工程に送り、再使用すること力できる。一方、塩化水素は未凝縮ガスとし て第 2冷却器 10から流出するので、これを塩酸水溶液に吸収させて回収することが できる。  On the other hand, the desorption gas can be introduced into the second cooler 10 to separate and recover chlorosilanes and hydrogen chloride. Specifically, the desorption gas flowing out from the adsorption tower 9 is introduced into the second cooler 10, where it is cooled to about 150 ° C. to about 30 ° C. to condense and recover the chlorosilanes. The recovered chlorosilanes can be sent to the process of producing trichlorosilane by reacting hydrogen chloride with metallic silicon and can be reused. On the other hand, since hydrogen chloride flows out from the second cooler 10 as an uncondensed gas, it can be recovered by absorbing it in an aqueous hydrochloric acid solution.

[0030] 以上のように、吸着塔 9は、混合ガスの導入(クロロシラン類および塩化水素の吸着 )→加熱下で水素ガスの導入(クロロシラン類および塩化水素の脱着)→冷却 (使用 状態に復帰)のサイクルに従って使用される。従って、連続して吸着操作を行うため には、複数の吸着塔 9 (活性炭充填層 8)を並列に設け、各吸着塔 9が一定の吸着時 間帯を有するように、混合ガスを導入する吸着塔 9を切り替えて使用するとよい。  [0030] As described above, the adsorption tower 9 introduces a mixed gas (adsorption of chlorosilanes and hydrogen chloride) → introduces hydrogen gas under heating (desorption of chlorosilanes and hydrogen chloride) → cools (returns to use) ) Is used according to the cycle. Therefore, in order to perform the adsorption operation continuously, a plurality of adsorption towers 9 (activated carbon packed bed 8) are provided in parallel, and a mixed gas is introduced so that each adsorption tower 9 has a certain adsorption time zone. It is recommended to switch the adsorption tower 9 for use.

[0031] このように、本発明の水素精製回収システムによれば、転換設備のトリクロロシラン 生成反応で生じた反応ガスを吸着塔 9に導いて活性炭に通じ、塩化水素およびクロ ロシラン類を吸着させて水素を分離するので、活性炭を吸着剤として塩化水素およ びクロロシラン類を上記反応生成ガスから効率的に取り除くことができ、精製された水 素ガスを得ること力 Sできる。  [0031] Thus, according to the hydrogen purification and recovery system of the present invention, the reaction gas generated in the trichlorosilane production reaction of the conversion facility is led to the adsorption tower 9 and passed through the activated carbon to adsorb hydrogen chloride and chlorosilanes. Therefore, hydrogen chloride and chlorosilanes can be efficiently removed from the reaction product gas using activated carbon as an adsorbent, and it is possible to obtain purified hydrogen gas.

[0032] 活性炭に吸着した塩化水素は脱着して回収することができ、従来は廃棄されてい た塩化水素を有効に回収することができる。また、活性炭に吸着したクロロシラン類も 脱着して回収することができるので、従来は未凝縮のクロロシラン類は廃棄されてい た力 本発明によれば従来のような廃棄ロスを大幅に低減することができる。また、従 来はクロロシラン類を出来るだけ凝縮捕集するために極低温にまで冷却している力 本発明によれば未凝縮のクロロシラン類は分離した後に回収することができるので、 クロロシラン類を凝縮するのに極低温まで冷却する必要がない。 [0032] The hydrogen chloride adsorbed on the activated carbon can be desorbed and recovered, and the hydrogen chloride that has conventionally been discarded can be recovered effectively. In addition, since chlorosilanes adsorbed on the activated carbon can be desorbed and recovered, the power of previously disposing of uncondensed chlorosilanes can be greatly reduced according to the present invention. it can. In addition, conventionally, the ability to cool chlorosilanes to cryogenic temperatures in order to condense and collect chlorosilanes as much as possible. According to the present invention, uncondensed chlorosilanes can be recovered after being separated. There is no need to cool to very low temperatures to condense chlorosilanes.

[0033] 本発明によれば、水素を乾燥させる工程が不要であり、また中和処理を行わないの で、従来、中和剤として用いていたカセイソーダが不要である。さらに本発明によれ ば、吸着塔 9から回収した水素ガスには塩化水素が含まれておらず、従って、この水 素ガスを循環管 11を通じて転換設備に戻し、トリクロロシランを生成する転換反応の 原料ガスの少なくとも一部として利用することができるので、原料コストを削減すること ができる。 [0033] According to the present invention, the step of drying hydrogen is unnecessary, and no neutralization treatment is performed, so that the caustic soda conventionally used as a neutralizing agent is unnecessary. Furthermore, according to the present invention, the hydrogen gas recovered from the adsorption tower 9 does not contain hydrogen chloride. Therefore, this hydrogen gas is returned to the conversion facility through the circulation pipe 11 to generate a trichlorosilane. Since it can be used as at least part of the raw material gas, the raw material cost can be reduced.

[0034] 〔第 2実施形態:活性炭充填層の二段構成〕  [Second Embodiment: Two-stage structure of activated carbon packed bed]

次に、本発明に係る水素精製回収システムの第 2実施形態について説明する。第 2 実施形態を図 2に示す。なお、以下の説明において、図 1の第 1実施形態と同一の構 成は同一の符号を付し、その説明は省略する。  Next, a second embodiment of the hydrogen purification and recovery system according to the present invention will be described. A second embodiment is shown in FIG. In the following description, the same components as those in the first embodiment in FIG. 1 are denoted by the same reference numerals, and the description thereof is omitted.

[0035] 第 2実施形態が第 1実施形態と異なる点は、第 1実施形態では、一つの活性炭充 填層 8を有する吸着塔 9が用いられている力 第 2実施形態では、図 2に示すように、 吸着塔 29が前段活性炭充填層 8Aと後段活性炭充填層 8Bとの二段に構成されてい る点、である。  [0035] The second embodiment differs from the first embodiment in that in the first embodiment, a force using an adsorption tower 9 having one activated carbon packed layer 8 is used. In the second embodiment, FIG. As shown, the adsorption tower 29 is configured in two stages, that is, a front-stage activated carbon packed bed 8A and a back-stage activated carbon packed bed 8B.

[0036] 図 2に示す水素精製設備において、吸着塔 29は主としてクロロシラン類を吸着させ る前段活性炭充填層 8Aと、主として塩化水素を吸着させる後段活性炭充填層 8Bと を備えており、前段活性炭充填層 8Aと後段活性炭充填層 8Bとは直列に接続されて いる。吸着塔 29に導入された混合ガスは、最初の前段活性炭充填層 8Aに導かれ、 この前段活性炭充填層 8Aを経由した後に次の後段活性炭充填層 8Bに導かれる。  [0036] In the hydrogen purification facility shown in Fig. 2, the adsorption tower 29 includes a first-stage activated carbon packed bed 8A that mainly adsorbs chlorosilanes and a second-stage activated carbon packed bed 8B that mainly absorbs hydrogen chloride. Layer 8A and post-stage activated carbon packed bed 8B are connected in series. The mixed gas introduced into the adsorption tower 29 is guided to the first preceding activated carbon packed bed 8A, and after passing through this preceding activated carbon packed bed 8A, is guided to the next succeeding activated carbon packed bed 8B.

[0037] 〔クロロシラン類の吸着〕  [Adsorption of chlorosilanes]

水素と共にクロロシラン類および塩化水素を含有する混合ガスを活性炭に通じた場 合、クロロシラン類は塩化水素よりも吸着されやすいので、クロロシランの吸着が進み 、クロロシランの大部分が吸着された後にも塩化水素がガス中に残留している。そこ で、活性炭充填層を二段に形成し、混合ガスを前段活性炭充填層 8Aに導入して主 にクロロシラン類を吸着させる。  When a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen is passed through activated carbon, chlorosilanes are more easily adsorbed than hydrogen chloride, so that the adsorption of chlorosilane proceeds and hydrogen chloride is absorbed even after most of the chlorosilane is adsorbed. Remains in the gas. Therefore, the activated carbon packed bed is formed in two stages, and the mixed gas is introduced into the preceding activated carbon packed bed 8A to mainly adsorb chlorosilanes.

[0038] 〔塩素水素の吸着〕  [0038] [Adsorption of chlorine and hydrogen]

前段活性炭充填層 8Aを経由した混合ガスを後段活性炭充填層 8Bに導入し、混合 ガスに残留して!/、る塩化水素を後段活性炭充填層 8Bに吸着させる。後段活性炭充 填層 8Bの活性炭はクロロシラン類によって吸着飽和しておらず、新鮮な活性炭に塩 化水素を吸着させることができるので、塩化水素の吸着効果を高めることができる。 Introduce the mixed gas via the pre-stage activated carbon packed bed 8A into the post-stage activated carbon packed bed 8B and mix Hydrogen chloride remaining in the gas is adsorbed on the activated carbon packed bed 8B. The activated carbon in the latter-stage activated carbon filling layer 8B is not adsorbed and saturated by chlorosilanes, and hydrogen chloride can be adsorbed to fresh activated carbon, so that the adsorption effect of hydrogen chloride can be enhanced.

[0039] 活性炭充填層を二段に形成する場合、前段の活性炭充填層 8Aの容量は混合ガス に含まれるクロロシラン類を主に吸着するのに必要十分な容量に定めればよぐ後段 の活性炭充填層 8Bの容量は混合ガスに含まれる塩化水素を主に吸着するのに必 要充分な容量に定めればょレ、。  [0039] When the activated carbon packed bed is formed in two stages, the capacity of the activated carbon packed bed 8A in the preceding stage should be set to a capacity sufficient to mainly adsorb the chlorosilanes contained in the mixed gas. The capacity of the packed bed 8B should be set to a capacity sufficient to mainly adsorb hydrogen chloride contained in the mixed gas.

[0040] 前段活性炭充填層 8Aおよび後段活性炭充填層 8Bには、加熱手段(図示省略)が おのおの設けられており、さらにこれら充填層 8A、 8Bに脱着ガスを導入して抜き出 すための管路が設けられている。また、前段活性炭充填層 8Aには脱着ガスに含ま れるクロロシラン類を凝縮して回収するための第 2冷却器 10が接続されている。  [0040] Each of the upstream activated carbon packed bed 8A and the latter activated carbon packed bed 8B is provided with heating means (not shown), and tubes for introducing and removing a desorption gas from these packed beds 8A and 8B. There is a road. A second cooler 10 for condensing and recovering chlorosilanes contained in the desorption gas is connected to the pre-stage activated carbon packed bed 8A.

[0041] 〔クロロシラン類の脱着回収〕  [0041] [Desorption recovery of chlorosilanes]

主にクロロシラン類を吸着した前段活性炭充填層 8Aは約 150°C〜約 170°Cに加熱 され、この加熱下で水素ガスを前段活性炭充填層 8Aに通過させることによってクロ口 シラン類が脱着される。このクロロシラン類を含む脱着ガスは第 2冷却器 10に導入さ れ約— 50°C〜約— 30°Cに冷却されてクロロシラン類が凝縮回収される。加熱した前 段活性炭充填層 8Aは脱着ガスを通じた後に約 35°Cに冷却して吸着使用の状態に 戻す。  The pre-stage activated carbon packed bed 8A mainly adsorbing chlorosilanes is heated to about 150 ° C to about 170 ° C, and under this heating, the black silanes are desorbed by passing hydrogen gas through the pre-stage activated carbon packed bed 8A. The The desorption gas containing chlorosilanes is introduced into the second cooler 10 and cooled to about −50 ° C. to about −30 ° C., and the chlorosilanes are condensed and recovered. The heated pre-stage activated carbon packed bed 8A is passed through the desorption gas, then cooled to about 35 ° C and returned to the state of adsorption.

[0042] 〔塩化水素の脱着回収〕  [0042] [Desorption recovery of hydrogen chloride]

一方、主に塩化水素を吸着した後段活性炭充填層 8Bは約 150°C〜約 170°Cに加 熱され、この加熱下で水素ガスを後段活性炭充填層 8Bに通過させることによって塩 化水素が脱着される。この塩化水素を含む脱着ガスは後段活性炭充填層 8Bから抜 き出される。この脱着ガスにはクロロシラン類が含まれていないので、第 2冷却器 10を 経由せずに抜き出せば良い。脱着ガスに含まれる塩素水素はこれを回収して再利用 すること力 Sでさる。  On the other hand, the latter-stage activated carbon packed bed 8B mainly adsorbing hydrogen chloride is heated to about 150 ° C. to about 170 ° C. Under this heating, hydrogen chloride is passed through the latter-stage activated carbon packed bed 8B, so that hydrogen chloride is formed. Desorbed. This desorption gas containing hydrogen chloride is withdrawn from the latter activated carbon packed bed 8B. Since this desorption gas does not contain chlorosilanes, it can be extracted without going through the second cooler 10. Chlorine hydrogen contained in the desorption gas can be recovered and reused.

[0043] 活性炭に対する水素の吸着率は小さいので、吸着塔 29に導入された混合ガス中 の水素は活性炭に殆ど吸着されずに、前段活性炭充填層 8Aおよび後段活性炭充 填層 8Bを通過して流出する。一方、混合ガス中のクロロシラン類および塩化水素は 活性炭に吸着されるので、後段活性炭充填層 8Bから抜き出されたガスにはクロロシ ラン類および塩化水素が含まれておらず、精製された水素ガスが得られる。後段活 性炭充填層 8Bから抜き出された精製水素ガスは循環路 11を通じて転換設備の蒸発 器 5に戻され、転換反応の原料ガスの一部として再利用される。 [0043] Since the adsorption rate of hydrogen on the activated carbon is small, the hydrogen in the mixed gas introduced into the adsorption tower 29 is hardly adsorbed by the activated carbon and passes through the pre-stage activated carbon packed bed 8A and the post-stage activated carbon packed bed 8B. leak. On the other hand, chlorosilanes and hydrogen chloride in the mixed gas Since it is adsorbed by the activated carbon, the gas extracted from the subsequent activated carbon packed bed 8B does not contain chlorosilanes and hydrogen chloride, and purified hydrogen gas is obtained. The refined hydrogen gas extracted from the post-stage activated charcoal packed bed 8B is returned to the evaporator 5 of the conversion facility through the circulation path 11 and reused as part of the raw material gas for the conversion reaction.

[0044] このように図 2に示す第 2実施形態では、転換反応において生成した反応ガスを前 段活性炭充填層 8Aに通して主としてクロロシラン類を吸着させ、さらに前段活性炭 充填層 8Aを通過した反応ガスを後段活性炭充填層 8Bに通して主として塩化水素を 吸着させる二段構成の吸着塔 29を用いることによって、クロロシラン類および塩化水 素を効果的に活性炭に吸着させて混合ガスから分離し、クロロシラン類および塩化水 素を含まない精製された水素ガスを得ることができる。  Thus, in the second embodiment shown in FIG. 2, the reaction gas generated in the conversion reaction is passed through the pre-stage activated carbon packed bed 8A to mainly adsorb chlorosilanes, and further passes through the pre-stage activated carbon packed bed 8A. The chlorosilanes and hydrogen chloride are effectively adsorbed on the activated carbon and separated from the mixed gas by using a two-stage adsorption tower 29 in which the gas is passed through the latter-stage activated carbon packed bed 8B to mainly adsorb hydrogen chloride. And purified hydrogen gas free of hydrogen chloride.

[0045] また、前段活性炭充填層 8Aからクロロシラン類を脱着して回収することができ、さら に、後段活性炭充填層 8Bからクロロシラン類を殆ど含まない純粋な塩化水素を脱着 して回収すること力でさる。  [0045] Further, chlorosilanes can be desorbed and recovered from the preceding activated carbon packed bed 8A, and further, pure hydrogen chloride containing almost no chlorosilanes can be desorbed and recovered from the subsequent activated carbon packed bed 8B. I'll do it.

[0046] 以上のように、吸着塔 29は、混合ガスの導入(クロロシラン類の吸着→塩化水素 の吸着)→加熱下で水素ガスの導入(クロロシラン類の脱着→塩化水素の脱着)→ 冷却 (使用状態に復帰)のサイクルに従って使用される。従って、連続して吸着操作 を行うためには、複数の吸着塔 29を並列に設け、各吸着塔 29が一定の吸着時間帯 を有するように、混合ガスを導入する吸着塔 29を切り替えて使用するとよい。  [0046] As described above, the adsorption tower 29 introduces a mixed gas (adsorption of chlorosilanes → adsorption of hydrogen chloride) → introduction of hydrogen gas under heating (desorption of chlorosilanes → desorption of hydrogen chloride) → cooling ( It is used according to the cycle of returning to the use state. Therefore, in order to perform the adsorption operation continuously, a plurality of adsorption towers 29 are provided in parallel, and the adsorption towers 29 for introducing the mixed gas are switched and used so that each adsorption tower 29 has a fixed adsorption time zone. Good.

実施例  Example

[0047] 本発明の実施例を比較例と共に以下に示す。なお、本発明の技術範囲は下記の 実施形態に限定されるものではなぐ本発明の趣旨を逸脱しない範囲において種々 の変更を加えることが可能である。  [0047] Examples of the present invention are shown below together with comparative examples. The technical scope of the present invention is not limited to the following embodiments, and various modifications can be made without departing from the spirit of the present invention.

[0048] 各例において、転換炉 1から流出した生成ガスとして表 1に示す成分を有する生成 ガスを用いた。また、塔径 1600mm φ、充填高さ lOOOOmmhの吸着塔(第 2実施態 様では前段活性炭充填層 8Aおよび後段活性炭充填層 8B)を用いた。  [0048] In each example, a product gas having the components shown in Table 1 was used as the product gas flowing out of the converter 1. In addition, an adsorption tower having a tower diameter of 1600 mmφ and a packing height of lOOOOmmh (in the second embodiment, a pre-stage activated carbon packed bed 8A and a post-stage activated carbon packed bed 8B) was used.

[0049] [表 1] 〔生成ガス成分]

Figure imgf000013_0001
[0049] [Table 1] [Producted gas components]
Figure imgf000013_0001

[0050] 〔実施例 1:図 1の実施形態〕 [Example 1: Embodiment of FIG. 1]

図 1に示す水素精製回収システムに従い、 3基の活性炭充填層 8を並列に設けた吸 着塔 9を用い、各活性炭充填層 8を (吸着)→ (加熱脱着)→ (冷却)→ (吸着)→· · ·の順 に操作を切り替え、冷却器 7を経由した混合ガスを吸着使用状態の活性炭充填層 8 に連続的に導入する構成とした。  In accordance with the hydrogen purification and recovery system shown in Fig. 1, an adsorption tower 9 with three activated carbon packed beds 8 provided in parallel is used.Each activated carbon packed bed 8 is (adsorption) → (heat desorption) → (cooling) → (adsorption). ) → The operation was switched in this order, and the mixed gas that passed through the cooler 7 was continuously introduced into the activated carbon packed bed 8 in the adsorption use state.

[0051] 〔実施例 Al〕  [Example Al]

(A1)表 1の反応生成ガスを冷却器 7に導入し、 0.05MPaGの圧力で— 30°Cに冷 却し、凝縮したクロロシラン類を捕集した。冷却器 7を経由したガスを活性炭充填層 8 (吸着塔 9)に導入した。ガス導入開始後、 4時間経過した後に活性炭充填層 8の出 口ガス中のクロロシラン類、塩化水素を測定したところ、これらのガスは検出されず全 量が活性炭に吸着された。なお 4時間ごとに流路を切り替えて、生成ガスを他の活性 炭充填層 8に導入した。またクロロシラン類、塩化水素ガスを吸着した活性炭充填層 8について加熱脱着操作を行い、吸着したクロロシラン類および塩化水素を回収した 。この結果を表 2に示した。  (A1) The reaction product gas shown in Table 1 was introduced into the cooler 7 and cooled to −30 ° C. at a pressure of 0.05 MPaG to collect condensed chlorosilanes. The gas passed through the cooler 7 was introduced into the activated carbon packed bed 8 (adsorption tower 9). After 4 hours from the start of gas introduction, chlorosilanes and hydrogen chloride in the exit gas of the activated carbon packed bed 8 were measured, and these gases were not detected and all were adsorbed on the activated carbon. The flow path was switched every 4 hours, and the product gas was introduced into another activated charcoal packed bed 8. The activated carbon packed bed 8 adsorbing chlorosilanes and hydrogen chloride gas was subjected to a heat desorption operation, and the adsorbed chlorosilanes and hydrogen chloride were recovered. The results are shown in Table 2.

[0052] 上記 (A1)において、クロロシラン類、塩化水素ガスを吸着した活性炭充填層 8を 16 0°Cまで加熱し、 0.5m3/minの流量で水素ガスを活性炭充填層 8に導入した。活性炭 充填層 8から抜き出した脱着ガスを第 2冷却器 10で— 40°Cまで冷却し、 4kmolのクロ ロシラン類を回収した。第 2冷却器 10を通過したガスは、塩化水素ガスと金属シリコン を反応させてトリクロロシランを製造する塩化炉に原料として供給した。 [0052] In (A1) above, the activated carbon packed bed 8 adsorbing chlorosilanes and hydrogen chloride gas was heated to 160 ° C, and hydrogen gas was introduced into the activated carbon packed bed 8 at a flow rate of 0.5 m 3 / min. The desorption gas extracted from the activated carbon packed bed 8 was cooled to −40 ° C. with the second cooler 10 to recover 4 kmol of chlorosilanes. The gas that passed through the second cooler 10 was supplied as a raw material to a chlorination furnace in which hydrogen chloride gas and metal silicon were reacted to produce trichlorosilane.

[0053] 〔実施例 A2〜A3〕  [Examples A2 to A3]

凝縮工程 (冷却器 7)の条件を以下のように設定した以外は上記 (A1)と同様にして実 施した。この結果を表 2に示した。  The same procedure as in (A1) above was performed, except that the conditions for the condensation process (cooler 7) were set as follows. The results are shown in Table 2.

(A2)操作圧: 0.4MPaG、ガス温度: 0°Cまで冷却した生成ガスを活性炭吸着塔 9 の活性炭充填層 8に供給した。活性炭充填層 8の出口ガス中のクロロシラン、塩化水 素ガスは検出されず、全量が活性炭に吸着された。 (A2) Operating pressure: 0.4 MPaG, gas temperature: The product gas cooled to 0 ° C. was supplied to the activated carbon packed bed 8 of the activated carbon adsorption tower 9. Chlorosilane and chloride water in outlet gas of activated carbon packed bed 8 No elementary gas was detected and the entire amount was adsorbed on the activated carbon.

(A3)操作圧: l.OMPaG,ガス温度: 20°Cまで冷却した生成ガスを活性炭吸着塔 9の活性炭充填層 8に供給した。活性炭充填層 8の出口ガス中のクロロシラン、塩化 水素ガスは検出されず、全量が活性炭に吸着された。  (A3) Operating pressure: l.OMPaG, gas temperature: The product gas cooled to 20 ° C. was supplied to the activated carbon packed bed 8 of the activated carbon adsorption tower 9. Chlorosilane and hydrogen chloride gas in the outlet gas of the activated carbon packed bed 8 were not detected, and the entire amount was adsorbed on the activated carbon.

[0054] [表 2] [0054] [Table 2]

Figure imgf000014_0001
Figure imgf000014_0001

(法).導入ガスの缚入 ¾は何れも SOkmol/hr^ 吸着時簡は何れも 4hr  (Method) Introducing the introduced gas ¾ is SOkmol / hr ^

SiCUまク ロシラン類  SiCU macrosilanes

[0055] 〔比較例〕 [0055] [Comparative Example]

図 3に示す従来の方法によって水素を回収した。具体的には、表 1の生成ガスを冷 却器 2に導入し、操作圧力 0.05MPaGで生成ガスを— 50°Cまで冷却してクロロシラ ン  Hydrogen was recovered by the conventional method shown in Fig. 3. Specifically, the product gas shown in Table 1 is introduced into the cooler 2, and the product gas is cooled to -50 ° C at an operating pressure of 0.05 MPaG and chlorosilane is used.

類を凝縮捕集し、次!、でカセイソーダ水溶液が循環する中和塔に導入して塩化水素 ガスと未凝縮クロルシラン類を取り除!/、た後、ゼォライトを充填した乾燥塔に通じて乾 燥し、転換炉 1に戻して循環使用した。この結果、 TCS = 2.4kmol/hr、 STC = 15.4k mol/hrが凝縮捕集された力 トリクロロシランの一部を回収できなかった。なお、中和 塔では 6.1kmol/hrのカセイソーダが消費された。  Next, the sample is introduced into the neutralization tower where the caustic soda aqueous solution circulates to remove hydrogen chloride gas and uncondensed chlorosilanes! /, And then dried through a drying tower filled with zeolite. It was dried and returned to the converter 1 for recycling. As a result, it was not possible to recover a part of the force trichlorosilane in which TCS = 2.4 kmol / hr and STC = 15.4 kmol / hr were condensed and collected. The neutralization tower consumed 6.1kmol / hr of caustic soda.

[0056] 〔実施例 2:図 2の実施形態〕 [Example 2: Embodiment of FIG. 2]

図 2に示す水素精製回収システムに従い、前段活性炭充填層 8Aと後段活性炭充填 層 8Bとが直列に接続された一組の活性炭充填層を 2基並列に接続した吸着塔 29を 用い、各活性炭充填層 8 A、 8Bを (吸着)→ (加熱脱着)→ (冷却)→ (吸着)→· · ·の順に 操作を切り替え、冷却器 7を経由した混合ガスを吸着使用状態の活性炭充填層 8A、 8Bに連続的に導入する構成とした。 [0057] 〔実施例 Bl〕 In accordance with the hydrogen purification and recovery system shown in Fig. 2, each activated carbon is packed using an adsorption tower 29 in which a pair of activated carbon packed beds in which the former activated carbon packed bed 8A and the latter activated carbon packed layer 8B are connected in series are connected in parallel. Switch the operation of layers 8A and 8B in the order of (Adsorption) → (Heat desorption) → (Cooling) → (Adsorption) → ... and the activated carbon packed bed 8A, It was configured to be continuously introduced into 8B. [Example Bl]

(Bl)表 1の生成ガスを冷却器 7に導入し、 0.05MPaGの圧力で 10°Cまで冷却し てクロロシラン類を凝縮捕集した。冷却器 7を経由したガスを、前段活性炭充填層 8A および後段活性炭充填層 8Bを 2基シリーズに連結した吸着塔 29の前段活性炭充填 層 8Aに導入した後に、さらに後段活性炭充填層 8Bに導入した。  (Bl) The product gas shown in Table 1 was introduced into the cooler 7 and cooled to 10 ° C at a pressure of 0.05 MPaG to condense and collect chlorosilanes. The gas that passed through the cooler 7 was introduced into the pre-stage activated carbon packed bed 8A of the adsorption tower 29 in which the pre-stage activated carbon packed bed 8A and the post-stage activated carbon packed bed 8B were connected in a 2-series series, and then further introduced into the post-stage activated carbon packed bed 8B. .

[0058] ガス導入を開始して 2.5時間後に、前段活性炭充填層 8A出口のガス中に塩化水 素ガ  [0058] 2.5 hours after the start of gas introduction, hydrogen chloride gas is contained in the gas at the outlet of the pre-stage activated carbon packed bed 8A.

スが検出されたがクロロシラン類は検出されなかった。 4時間後にも前段活性炭充填 層 8A出口のガス中にクロロシラン類は検出されず、ガス中のクロロシラン類は全量が 前段活性炭充填層 8Aに吸着捕集された。また 4時間経過後の後段活性炭充填層 8 B出口のガスには塩化水素ガスが検出されず、前段 8Aを出た塩化水素ガスは全量 が後段活性炭充填層 8Bに吸着捕集された。なお、 4時間で流路を切り替えてガスを 別の吸着塔 29に導入した。また、クロロシラン類、塩化水素ガスを吸着した活性炭充 填層 8A、 8Bについて加熱脱着操作を行った。この結果を表 3、表 4に示した。  However, chlorosilanes were not detected. Even after 4 hours, chlorosilanes were not detected in the gas at the outlet of the pre-stage activated carbon packed bed 8A, and all the chlorosilanes in the gas were adsorbed and collected in the pre-stage activated carbon packed bed 8A. After 4 hours, hydrogen chloride gas was not detected in the gas at the outlet of the latter-stage activated carbon packed bed 8B, and all the hydrogen chloride gas exiting the former stage 8A was adsorbed and collected in the latter-stage activated carbon packed bed 8B. Note that the gas was introduced into another adsorption tower 29 by switching the flow path in 4 hours. The activated carbon packed layers 8A and 8B adsorbing chlorosilanes and hydrogen chloride gas were subjected to a heat desorption operation. The results are shown in Tables 3 and 4.

[0059] 上記 (B1)において、クロロシラン類、塩化水素を吸着した活性炭充填層 8A、 8Bを 1 60°Cまで加熱し、各々 0.5m3/minの流量で水素ガスを導入し、クロロシラン類、塩化 水素を脱着した。前段活性炭充填層 8Aの脱着ガスを第 2冷却器 10で— 40°Cまで 冷却して 30kmolのクロロシラン類を回収した。第 2冷却器 10を通過したガスは、塩化 水素ガスと金属シリコンを反応させてトリクロロシランを製造する塩化炉の原料として 供給した。また、後段活性炭充填層 8Bの脱着ガスを 21 %の塩酸水溶液に吸収させ て 35%の濃塩酸を製造した。なお、塩酸水溶液に吸収した塩化水素ガス量は 10km olであり、また、シリカ等の発生による設備の閉塞は見られなかった。 [0059] In (B1) above, the activated carbon packed beds 8A and 8B adsorbing chlorosilanes and hydrogen chloride are heated to 160 ° C, hydrogen gas is introduced at a flow rate of 0.5 m 3 / min, and chlorosilanes, Hydrogen chloride was desorbed. The desorption gas of the pre-stage activated carbon packed bed 8A was cooled to −40 ° C. by the second cooler 10 to recover 30 kmol of chlorosilanes. The gas that passed through the second cooler 10 was supplied as a raw material for a chlorination furnace for producing trichlorosilane by reacting hydrogen chloride gas with metallic silicon. In addition, the desorption gas from the latter-stage activated carbon packed bed 8B was absorbed into a 21% aqueous hydrochloric acid solution to produce 35% concentrated hydrochloric acid. The amount of hydrogen chloride gas absorbed in the aqueous hydrochloric acid solution was 10 kmol, and no blockage of the equipment due to generation of silica or the like was observed.

[0060] 〔実施例 B2〕  [Example B2]

凝縮工程 (冷却器 7)の条件を以下のように設定した以外は上記 (Bl)と同様にして 実施した。この結果を表 3、表 4に示した。  The same procedure as in (Bl) above was performed, except that the conditions for the condensation process (cooler 7) were set as follows. The results are shown in Tables 3 and 4.

(B2)生成ガスを冷却器 7に導入し、 0.05MPaGの圧力で— 30°Cまで冷却してク ロロシラン類を凝縮捕集した。冷却器 7を経由したガスを前段活性炭充填層 8 Aに導 入し、さらに後段活性炭充填層 8Bに導入した。 [0061] ガス導入開始して 4.0時間以上後に、前段活性炭充填層 8A出口のガス中に塩化 水素 (B2) The product gas was introduced into the cooler 7 and cooled to -30 ° C at a pressure of 0.05 MPaG to condense and collect chlorosilanes. The gas that passed through the cooler 7 was introduced into the pre-stage activated carbon packed bed 8A and further introduced into the post-stage activated carbon packed bed 8B. [0061] At least 4.0 hours after the start of gas introduction, hydrogen chloride is present in the gas at the outlet of the pre-stage activated carbon packed bed 8A.

ガスが検出されたがクロロシラン類は検出されなかった。 8時間後にも前段活性炭充 填層 8A出口のガス中にクロロシラン類は検出されず、ガス中のクロロシラン類は全量 が前段活性炭充填層 8Aに吸着捕集された。また、 8時間後には後段活性炭充填層 8B出口のガス中に塩化水素ガスが検出されず、前段を出た塩化水素ガスは全量が 後段活性炭充填層 8Bに吸着捕集された。なお、 8時間で流路を切り替えガスを別の 吸収塔 29に導入した。また、クロロシラン類、塩化水素ガスを吸着した活性炭充填層 8A、 8Bについて加熱脱着操作を行った。  Gas was detected, but chlorosilanes were not detected. Even after 8 hours, chlorosilanes were not detected in the gas at the outlet of the pre-stage activated carbon packed bed 8A, and all the chlorosilanes in the gas were adsorbed and collected in the pre-stage activated carbon packed bed 8A. After 8 hours, hydrogen chloride gas was not detected in the gas at the outlet of the latter-stage activated carbon packed bed 8B, and all the hydrogen chloride gas exiting the former stage was adsorbed and collected in the latter-stage activated carbon packed bed 8B. In 8 hours, the flow path was switched and the gas was introduced into another absorption tower 29. In addition, the activated carbon packed beds 8A and 8B adsorbing chlorosilanes and hydrogen chloride gas were subjected to a heat desorption operation.

[0062] 〔実施例 B3〕 [Example B3]

凝縮工程 (冷却器 7)の条件を以下のように設定した以外は上記 (B1)と同様にして 実施した。この結果を表 3、表 4に示した。  The condensing step (cooler 7) was carried out in the same manner as (B1) except that the conditions were set as follows. The results are shown in Tables 3 and 4.

(B3)生成ガスを冷却器 7に導入し、 l.OOMPaGの圧力で 10°Cまで冷却してクロ ロシラン類を凝縮捕集した。冷却器 7を経由したガスを前段活性炭充填層 8Aに導入 し、さらに後段活性炭充填層 8Bに導入した。  (B3) The produced gas was introduced into the cooler 7 and cooled to 10 ° C with l.OOMPaG pressure to condense and collect chlorosilanes. The gas passed through the cooler 7 was introduced into the pre-stage activated carbon packed bed 8A, and further introduced into the post-stage activated carbon packed bed 8B.

[0063] ガス導入開始して 4.0時間以上後に、前段活性炭充填層 8A出口のガス中に塩化 水素 [0063] At least 4.0 hours after the start of gas introduction, hydrogen chloride is contained in the gas at the outlet of the pre-stage activated carbon packed bed 8A

ガスが検出されたがクロロシラン類は検出されなかった。 8時間後にも前段活性炭充 填層 8A出口のガス中にクロロシラン類は検出されず、ガス中のクロロシラン類は全量 が前段活性炭充填層 8Aに吸着捕集された。 8時間後には後段活性炭充填層 8B出 口のガス中に塩化水素ガスが検出されず、前段を出た塩化水素ガスは全量が後段 活性炭充填層 8Bに吸着捕集された。なお、 8時間で流路を切り替え、ガスを別の吸 着塔 29に導入した。また、クロロシラン類、塩化水素ガスを吸着した活性炭充填層 8 につ!/、て加熱脱着操作を行った。  Gas was detected, but chlorosilanes were not detected. Even after 8 hours, chlorosilanes were not detected in the gas at the outlet of the pre-stage activated carbon packed bed 8A, and all the chlorosilanes in the gas were adsorbed and collected in the pre-stage activated carbon packed bed 8A. After 8 hours, hydrogen chloride gas was not detected in the gas at the outlet of the latter-stage activated carbon packed bed 8B, and all of the hydrogen chloride gas exited from the former stage was adsorbed and collected in the latter-stage activated carbon packed bed 8B. The flow path was switched in 8 hours, and the gas was introduced into another adsorption tower 29. The activated carbon packed bed 8 adsorbing chlorosilanes and hydrogen chloride gas was heated and desorbed.

[0064] 後段活性炭充填層 8Bの入口でクロロシラン類を含まな!/、塩化水素ガスと水素ガス の混合ガスを得るには、前段活性炭充填層 8Aでクロロシラン類を破瓜させな!/、こと が必要であり、上記 (B2XB3)の例では 8時間の吸着操作が可能であった力 クロロシ ラン負荷の大きい上記 (B1)の条件では 4時間の吸着操作であった。 [0065] [表 3] [0064] The chlorosilanes are not included at the inlet of the latter-stage activated carbon packed bed 8B! / To obtain a mixed gas of hydrogen chloride gas and hydrogen gas, do not destroy the chlorosilanes in the first-stage activated carbon packed bed 8A! / It was necessary, and the force that could be adsorbed for 8 hours in the above example (B2XB3) The adsorbing operation was 4 hours under the condition (B1) with a large chlorosilane load. [0065] [Table 3]

Figure imgf000017_0001
Figure imgf000017_0001

(法)尊入ガスの導入量は何れも fiOtoiiol lir, SiClはタ《口シラン類  (Law) The amount of precious gas introduced is fiOtoiiol lir, SiCl

産業上の利用可能性  Industrial applicability

[0066] 上記 [1]の方法および上記 [4]の設備によれば、水素と共にクロロシラン類および塩 化水素を含む混合ガスを活性炭充填層に通じ、クロロシラン類および塩化水素を活 性炭に吸着させてガス中から分離し、クロロシラン類および塩化水素をほとんど含ま ない精製された水素ガスを回収することができる。また、活性炭に吸着されたクロロシ ラン類および塩化水素は活性炭に加熱下で水素ガスを通じるなどの脱着方法によつ て回収することができるので、廃棄ロスを生じない。  [0066] According to the method of [1] above and the equipment of [4] above, a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen is passed through the activated carbon packed bed, and the chlorosilanes and hydrogen chloride are adsorbed to the activated carbon. And purified hydrogen gas containing almost no chlorosilanes and hydrogen chloride can be recovered. In addition, chlorosilanes and hydrogen chloride adsorbed on activated carbon can be recovered by a desorption method such as passing hydrogen gas under heating to activated carbon, so there is no waste loss.

[0067] 上記 [3]の方法および上記 [5]の設備によれば、活性炭充填層を二段階に形成し、 クロロシラン類を主に前段で吸着分離し、塩化水素を主に後段で吸着分離するので [0067] According to the method of [3] and the equipment of [5] above, the activated carbon packed bed is formed in two stages, chlorosilanes are mainly adsorbed and separated in the former stage, and hydrogen chloride is mainly adsorbed and separated in the latter stage. Because

、クロロシラン類と塩化水素の分離効果に優れており、クロロシラン類および塩化水素 を実質的に含まない精製した水素ガスを得ることができる。 It is excellent in the separation effect of chlorosilanes and hydrogen chloride, and a purified hydrogen gas substantially free of chlorosilanes and hydrogen chloride can be obtained.

[0068] 上記 [2]の方法および上記 [6]の設備によれば、テトラクロロシランと水素を反応させ てトリクロロシランを生成させる転換反応において生成した混合ガスからクロロシラン 類および塩化水素を除去した精製水素ガスを効率よく回収し、転換反応の原料の一 部として循環使用することができる。これにより原料コストを低減することができる。 [0068] According to the method of [2] and the equipment of [6], the purification is carried out by removing chlorosilanes and hydrogen chloride from the mixed gas produced in the conversion reaction in which tetrachlorosilane and hydrogen are reacted to produce trichlorosilane. Hydrogen gas can be recovered efficiently and recycled as part of the raw material for the conversion reaction. Thereby, raw material cost can be reduced.

[0069] 以上のように、本発明に係る水素精製回収方法および水素精製回収設備によれば 、トリクロロシランへの転換反応で生じた反応生成ガスを、活性炭に通して塩化水素 およびクロロシラン類を吸着させて分離するので、吸着後にこれを脱着して回収する ことができ、従来は廃棄されていた塩化水素を有効に再利用することができる。また、 従来は中和剤として用いてレ、たカセイソーダを用いる必要がなレ、。 [0069] As described above, according to the hydrogen purification and recovery method and the hydrogen purification and recovery facility according to the present invention, The reaction product gas generated by the conversion reaction to trichlorosilane is separated by adsorbing hydrogen chloride and chlorosilanes through activated carbon, which can be desorbed and recovered after adsorption. Hydrogen chloride can be reused effectively. In addition, traditionally used as a neutralizing agent, it has been necessary to use caustic soda.

さらに、従来は混合ガスを極低温まで冷却してクロロシラン類を凝縮分離して中和 処理しているが、未分離のクロロシラン類が残るので、これが廃棄ロスになるのを避け ること力 Sできない。一方、本発明の方法および設備では、活性炭に吸着したクロロシ ラン類は脱着して回収することができるので、混合ガスを極低温まで冷却して凝縮分 離する必要がなぐし力、もクロロシラン類の廃棄ロスを生じない。  Furthermore, conventionally, the mixed gas is cooled to an extremely low temperature to condense and separate chlorosilanes and neutralize them. However, unseparated chlorosilanes remain, so it is impossible to avoid waste loss. . On the other hand, since the chlorosilanes adsorbed on the activated carbon can be desorbed and recovered in the method and equipment of the present invention, it is necessary to cool the mixed gas to a very low temperature and to separate the condensed gas, and also to reduce the chlorosilanes. No disposal loss occurs.

Claims

請求の範囲 The scope of the claims [1] 水素と共にクロロシラン類および塩化水素を含む混合ガスを活性炭充填層に通じ、ク ロロシラン類および塩化水素を活性炭に吸着させてガス中から分離する水素精製回 収方法。  [1] A hydrogen purification and recovery method in which a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen is passed through an activated carbon packed bed, and the chlorosilanes and hydrogen chloride are adsorbed on the activated carbon and separated from the gas. [2] テトラクロロシランと水素を反応させてトリクロロシランを生成させる転換反応において 生成した混合ガスを活性炭充填層に通じ、クロロシラン類および塩化水素を活性炭 に吸着させてガス中から分離する請求項 1の水素精製回収方法。  [2] The mixed gas produced in the conversion reaction in which tetrachlorosilane and hydrogen are reacted to form trichlorosilane is passed through the activated carbon packed bed, and chlorosilanes and hydrogen chloride are adsorbed on the activated carbon and separated from the gas. Hydrogen purification and recovery method. [3] クロロシラン類を主に吸着する前段活性炭充填層と、塩化水素を主に吸着する後段 活性炭充填層の二段に形成し、上記混合ガスを上記前段活性炭充填層および上記 後段活性炭充填層に連続して通過させてクロロシラン類と塩化水素を段階的に分離 する請求項 1または請求項 2の水素精製回収方法。  [3] A two-stage activated carbon packed bed that mainly adsorbs chlorosilanes and a second activated carbon packed bed that mainly adsorbs hydrogen chloride are formed in two stages, and the mixed gas is mixed into the first activated carbon packed bed and the second activated carbon packed bed. The method for purifying and recovering hydrogen according to claim 1 or claim 2, wherein the chlorosilanes and hydrogen chloride are separated stepwise by passing continuously. [4] クロロシラン類および塩化水素を吸着する活性炭充填層を有する吸着装置、水素と 共にクロロシラン類および塩化水素を含む混合ガスを上記吸着装置に導く管路を備 えて!/、る水素精製回収設備。  [4] Adsorption device with an activated carbon packed bed that adsorbs chlorosilanes and hydrogen chloride, and a pipe for introducing a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen to the adsorption device! . [5] クロロシラン類を主に吸着する前段活性炭充填層と、塩化水素を主に吸着する後段 活性炭充填層とを有する吸着装置、水素と共にクロロシラン類および塩化水素を含 む混合ガスを該吸着装置に導き、前段活性炭充填層および後段活性炭充填層を経 由して流す管路を備えている請求項 4に記載する水素精製回収設備。  [5] An adsorber having a pre-stage activated carbon packed bed that mainly adsorbs chlorosilanes and a post-stage activated charcoal packed bed that mainly adsorbs hydrogen chloride, and a mixed gas containing chlorosilanes and hydrogen chloride together with hydrogen into the adsorber. 5. The hydrogen purification and recovery facility according to claim 4, further comprising a conduit for guiding and flowing through the pre-stage activated carbon packed bed and the post-stage activated carbon packed bed. [6] テトラクロロシランと水素を反応させてトリクロロシランを生成させる転換設備に接続さ れ、該転換反応において生成した混合ガスを吸着装置に導き、該吸着装置を経由し て精製された水素を上記転換設備に戻す循環管を有する請求項 4または請求項 5に 記載する水素精製回収設備。  [6] It is connected to a conversion facility that reacts tetrachlorosilane with hydrogen to generate trichlorosilane, and the mixed gas generated in the conversion reaction is led to an adsorption device, and the purified hydrogen is passed through the adsorption device to the above-described hydrogen. The hydrogen purification / recovery facility according to claim 4 or 5, further comprising a circulation pipe for returning to the conversion facility.
PCT/JP2007/072107 2006-11-14 2007-11-14 Hydrogen purification/collection method and hydrogen purification/collection facility Ceased WO2008059883A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006-308476 2006-11-14
JP2006308476 2006-11-14
JP2007276565A JP5344114B2 (en) 2006-11-14 2007-10-24 Hydrogen purification recovery method and hydrogen purification recovery equipment
JP2007-276565 2007-10-24

Publications (1)

Publication Number Publication Date
WO2008059883A1 true WO2008059883A1 (en) 2008-05-22

Family

ID=39401687

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/072107 Ceased WO2008059883A1 (en) 2006-11-14 2007-11-14 Hydrogen purification/collection method and hydrogen purification/collection facility

Country Status (1)

Country Link
WO (1) WO2008059883A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102030312A (en) * 2010-12-23 2011-04-27 江西嘉柏新材料有限公司 Method for recovering hydrogen gas from trichlorosilane tail gas
CN102100998B (en) * 2009-12-21 2013-03-20 重庆大全新能源有限公司 Method and device for processing trichlorosilane synthesis tail gas

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006131491A (en) * 2004-10-05 2006-05-25 Tokuyama Corp Method for producing silicon

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006131491A (en) * 2004-10-05 2006-05-25 Tokuyama Corp Method for producing silicon

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102100998B (en) * 2009-12-21 2013-03-20 重庆大全新能源有限公司 Method and device for processing trichlorosilane synthesis tail gas
CN102030312A (en) * 2010-12-23 2011-04-27 江西嘉柏新材料有限公司 Method for recovering hydrogen gas from trichlorosilane tail gas

Similar Documents

Publication Publication Date Title
JP6433867B2 (en) Hydrogen gas recovery system and hydrogen gas separation and recovery method
JP5344114B2 (en) Hydrogen purification recovery method and hydrogen purification recovery equipment
US8778061B2 (en) Hydrogen gas recovery system and hydrogen gas separation and recovery method
JP5734861B2 (en) How to reuse hydrogen
JP2011139987A (en) Method for treating purged exhaust gas and use as hydrogen source
JP5339948B2 (en) High purity polycrystalline silicon manufacturing method
JP6179246B2 (en) Polycrystalline silicon manufacturing method and manufacturing apparatus
JP5344113B2 (en) Hydrogen separation and recovery method and hydrogen separation and recovery equipment
CN114620731B (en) Method and device for recovering reduction tail gas of polycrystalline silicon
CN113247862A (en) High-purity electronic-grade hydrogen chloride production device and process
JP3756018B2 (en) Exhaust gas treatment method in polycrystalline silicon manufacturing process
JP6698762B2 (en) Hydrogen gas recovery system and method for separating and recovering hydrogen gas
CN107352510B (en) Polycrystalline silicon reduction exhaust recovery method and recovery system
WO2008059887A1 (en) Hydrogen separation/collection method and hydrogen separation/collection facility
EP0518553B1 (en) Method and apparatus for industrially preparing chlorine
CN215101986U (en) High-purity electronic grade chlorine purification apparatus for producing
WO2008059883A1 (en) Hydrogen purification/collection method and hydrogen purification/collection facility
US20120080304A1 (en) Processes for Recovering Silane From Heavy-Ends Separation Operations
RU2274602C1 (en) Trichlorosilane production process
CN117263141B (en) Method for purifying circulating hydrogen in polysilicon production
CN215101984U (en) High-purity electronic-grade hydrogen chloride production device
US8524045B2 (en) Systems for purifying silane
JP5321252B2 (en) Polycrystalline silicon manufacturing method and manufacturing apparatus
CN109843800A (en) Manufacturing method of polysilicon
CN111991978A (en) Water removal device and method for hydrogen fluoride gas

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07831837

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07831837

Country of ref document: EP

Kind code of ref document: A1