WO2007131330A1 - Procédé de fabrication d'une matrice de micro-hémisphères - Google Patents
Procédé de fabrication d'une matrice de micro-hémisphères Download PDFInfo
- Publication number
- WO2007131330A1 WO2007131330A1 PCT/CA2007/000801 CA2007000801W WO2007131330A1 WO 2007131330 A1 WO2007131330 A1 WO 2007131330A1 CA 2007000801 W CA2007000801 W CA 2007000801W WO 2007131330 A1 WO2007131330 A1 WO 2007131330A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- posts
- microlens array
- substrate
- seed structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
- G02B5/126—Reflex reflectors including curved refracting surface
- G02B5/128—Reflex reflectors including curved refracting surface transparent spheres being embedded in matrix
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
Definitions
- This disclosure pertains to the fabrication of micro-hemisphere arrays for use in reflective image displays of the type described in United States Patent Nos. 6,885,496 and 6,891,658; and in United States Patent Application Publication No. 2005/0248848A1 , all of which are incorporated herein by reference.
- FIG. 1A depicts a portion of a prior art reflective (i.e. front-lit) electrophoretically frustrated total internal reflection (TIR) modulated display 10 of the type described in United States Patent Nos. 6,885,496 and 6,891 ,658.
- Display 10 includes a transparent outward sheet 12 formed by partially embedding a large plurality of high refractive index (e.g. ⁇ x > ⁇ 1.90) transparent spherical or approximately spherical beads 14 in the inward surface of a high refractive index (e.g. ⁇ 2 > - 1.75) polymeric material 16 having a flat outward viewing surface 17 which viewer V observes through an angular range of viewing directions Y.
- high refractive index e.g. ⁇ x > ⁇ 1.90
- a high refractive index e.g. ⁇ 2 > - 1.75
- Beads 14 are packed closely together to form an inwardly projecting monolayer 18 having a thickness approximately equal to the diameter of one of beads 14. Ideally, each one of beads 14 touches all of the beads immediately adjacent to that one bead. Minimal interstitial gaps (ideally, no gaps) remain between adjacent beads.
- An electrophoresis medium 20 is maintained adjacent the portions of beads 14 which protrude inwardly from material 16 by containment of medium 20 within a reservoir 22 defined by lower sheet 24.
- An inert, low refractive index (i.e. less than about 1.35), low viscosity, electrically insulating liquid such as FluorinertTM perfluor- inated hydrocarbon liquid (77 3 - 1.27) available from 3M, St. Paul, MN is a suitable electrophoresis medium.
- a bead:liquid TIR interface is thus formed.
- Other liquids, or water can also be used as electrophoresis medium 20.
- Medium 20 contains a finely dispersed suspension of light scattering and/or absorptive particles 26 such as pigments, dyed or otherwise scattering/absorptive silica or latex particles, etc.
- Sheet 24 's optical characteristics are relatively unimportant: sheet 24 need only form a reservoir for containment of electrophoresis medium 20 and particles 26, and serve as a support for backplane electrode 48.
- the TIR interface between two media having different refractive indices is characterized by a critical angle ⁇ c . Light rays incident upon the interface at angles less than ⁇ c are transmitted through the interface. Light rays incident upon the interface at angles greater than ⁇ c undergo TIR at the interface.
- TIR interface A small critical angle is preferred at the TIR interface since this affords a large range of angles over which TIR may occur.
- a substantial fraction of the light rays passing through sheet 12 and beads 14 undergoes TIR at the inward side of beads 14.
- incident light rays 30, 32 are refracted through material 16 and beads 14.
- the rays undergo TIR two or more times at the bead: liquid TIR interface, as indicated at 34, 36 in the case of ray 30; and indicated at 38, 40 in the case of ray 32.
- a voltage can be applied across medium 20 via electrodes 46, 48 (shown as dashed lines) which can for example be applied by vapour-deposition to the inwardly protruding surface portion of beads 14 and to the outward surface of sheet 24. Electrode 46 is transparent and substantially thin to minimize its interference with light rays at the bead: liquid TIR interface. Backplane electrode 48 need not be transparent.
- electrophoresis medium 20 is activated by actuating voltage source 50 to apply a voltage between electrodes 46, 48 as illustrated to the left of dashed line 28, suspended particles 26 are electrophoretically moved into the region where the evanescent wave is relatively intense (i.e. within 0.25 micron of the inward surfaces of inwardly protruding beads 14, or closer).
- electrophoretically moved as aforesaid particles 26 scatter or absorb light, thus frustrating or modulating TIR by modifying the imaginary and possibly the real component of the effective refractive index at the bead: liquid TIR interface.
- the net optical characteristics of outward sheet 12 can be controlled by controlling the voltage applied across medium 20 via electrodes 46, 48.
- the electrodes can be segmented to control the electrophoretic activation of medium 20 across separate regions or pixels of sheet 12, thus forming an image.
- Ray 62 is refracted at the inward surface of hemi-bead 60 and passes into electrophoretic medium 20 as ray 64 at an angle ⁇ 2 relative to radial axis 66.
- incident light ray 68 which is perpendicularly
- Ray 68 encounters the inward surface of hemi-bead 60 at the critical angle ⁇ c (relative to radial axis 70), the minimum required angle for TIR to occur.
- Ray 68 is accordingly totally internally reflected, as ray 72, which again encounters the inward surface of hemi-bead 60 at the critical angle ⁇ c .
- Ray 72 is accordingly totally internally reflected, as ray 74, which also encounters the inward surface of hemi-bead 60 at the critical angle ⁇ c .
- Ray 74 is accordingly totally internally reflected, as ray 76, which passes perpendicularly through hemi-bead 60 into the embedded portion of bead 14 and into material 16.
- Ray 68 is thus reflected back as ray 76 in a direction approximately opposite that of incident ray 68.
- All light rays which are incident on hemi-bead 60 at distances a ⁇ a c from hemi-bead 60 's centre C are reflected back (but not exactly retro-reflected) toward the light source; which means that the reflection is enhanced when the light source is overhead and slightly behind the viewer, and that the reflected light has a diffuse characteristic giving it a white appearance, which is desirable in reflective display applications.
- Figures 3A, 3B and 3C depict three of hemi-bead 60's reflection modes. These and other modes coexist, but it is useful to discuss each mode separately.
- Tj 1 is the refractive index of hemi-bead 60 and ⁇ 2 is the refractive index of the medium adjacent the surface of hemi-bead 60 at which TIR occurs.
- hemi-bead 60 is formed of a lower refractive index material such as polycarbonate (Tj 1 - 1.59) and if the adjacent medium is Fluorinert ( ⁇ 3 ⁇ 1.27), a reflectance R of about 36% is attained, whereas if hemi-bead 60 is formed of a high refractive index nano-composite material (TJ 1 - 1.92) a reflectance R of about 56% is attained.
- illumination source S ( Figure IB) is positioned behind viewer Vs head, the apparent brightness of display 10 is further enhanced by the aforementioned semi-retro-reflective characteristic.
- FIG. 4 A shows hemi-bead 60 as seen from perpendicular incidence—that is, from an incidence angle offset 0° from the perpendicular.
- the annulus is depicted as white, corre- sponding to the fact that this is the region of hemi-bead 60 which reflects incident light rays by TIR, as aforesaid.
- the annulus surrounds a circular region 82 which is depicted as dark, corresponding to the fact that this is the non-reflective region of hemi-bead 60 within which incident rays are absorbed and do not undergo TIR.
- Figures 4B-4G show hemi-bead 60 as seen from incident angles which are respectively offset 15°, 30°, 45°, 60°, 75° and 90° from the perpendicular. Comparison of Figures 4B-4G with Figure 4A reveals that the observed area of reflective portion 80 of hemi-bead 60 for which a ⁇ a c decreases only gradually as the incidence angle increases. Even at near glancing incidence angles (e.g. Figure 4F) an observer will still see a substantial part of reflective portion 80, thus giving display 10 a wide angular viewing range over which high apparent brightness is maintained.
- Display lO's monolayer 18 may include a large number of non-uniform size "micro-hemispheres" (i.e. hemi-beads 60) having diameters within a range of about 1-50 ⁇ m.
- the shape of each hemi-bead 60 within the micro-hemisphere array comprising monolayer 18 is as close to a mathematically "perfect" hemispherical shape as possible. This disclosure pertains to fabrication of such micro-hemisphere arrays.
- the foregoing examples of the related art and limitations related thereto are intended to be illustrative and not exclusive. Other limitations of the related art will become apparent to those of skill in the art upon a reading of the specification and a study of the drawings.
- Figure IA is a greatly enlarged, not to scale, fragmented cross-sectional side elevation view of a portion of an electrophoretically frustrated or modulated prior art reflective image display.
- Figure IB schematically illustrates the wide angle viewing range a of the Figure IA display, and the angular range ⁇ of the illumination source.
- Figure 2 is a greatly enlarged cross-sectional side elevation view of a hemispherical ("hemi-bead") portion of one of the spherical beads of the Figure IA apparatus.
- Figures 3 A, 3B and 3C depict semi-retro-reflection of light rays perpendicularly incident on the Figure 2 hemi-bead at increasing off- axis distances at which the incident rays undergo TIR two, three and four times respectively.
- Figures 4A, 4B, 4C, 4D, 4E, 4F and 4G depict the Figure 2 hemi-bead, as seen from viewing angles which are offset 0°, 15°, 30°, 45°, 60°, 75° and 90° respectively from the perpendicular.
- Figures 5A, 5B, 5C, 5D, 5E and 5F are greatly enlarged, not to scale, front elevation views depicting sequential fabrication of a portion of a micro-hemisphere array.
- Figures 6A, 6B and 6C are electron photomicrographs respectively depicting a first sample array of silicone posts, parylene coating applied to the first sample array of silicone posts, and an enlarged view of some parylene coated silicone posts in the first sample array.
- Figures 7A, 7B and 7C are electron photomicrographs respectively depicting a second sample array of silicone posts, parylene coating applied to the second sample array of posts, and an enlarged view of some parylene coated silicone posts in the second sample array.
- Figure 5 A depicts a transparent substrate 100 on which a transparent seed structure 102 is formed from a moldable material.
- Seed structure 102 may include a plurality of transparent posts 104 uniformly distributed on substrate 100.
- Suitable moldable materials include poly- dimethylsilane, polycarbonate and acrylic.
- Substrate 100 and seed structure 102 may be a single unitary structure formed from a single moldable material. Alternatively, sub- strate 100 and seed structure 102 may each be molded from different materials.
- Seed structure 102 may be formed by perforating a layer of a sacrificial material. A moldable material can then be poured or forced into the perforations (depending on the viscosity of the moldable material) and cured. The perforated sacrificial layer is then removed, yielding seed structure 102.
- seed structure 102 may be formed by depositing a layer of high refractive index transparent material on a different transparent substrate material. Portions of the high refractive index material may then be etched away to form posts 104.
- An anisotropic etching technique is recommended, such that etching progresses more rapidly in directions generally perpendicular to substrate 100 and less rapidly in directions generally parallel to substrate 100, yielding high aspect ratio etched structures (e.g. posts 104).
- a variety of photolithographic etching techniques, such as deep reactive ion etching, may be used to produce high aspect ratio posts 104.
- Posts 104 may have any one of a variety of high aspect ratio shapes, including the tapered cylindrical shape depicted in Figure 6A, the tapered conical shape depicted in Figure 7A, and other generally cylindri- cal or generally conical shapes. Posts 104 may have flat tops as depicted in Figure 5A, or may have rounded tops as depicted in Figure 6A, or may have indented tops as depicted in Figure 7A. [0031] Posts 104 desirably have a relatively high aspect ratio.
- each post 104 may be about 0.5 microns wide and about 2.5 microns high, yielding an aspect ratio of 5: 1, although posts having aspect ratios as low as about 2: 1 (as depicted in Figures 6 A and 7A) are acceptable.
- Each adjacent pair of posts 104 is desirably separated by a distance approximately equal to twice the height of one post 104.
- H the height of each post 104
- H the height of each post 104
- each adjacent pair of posts 104 is separated by a distance approximately equal to 2H, as shown in Figure 5 A.
- a transparent coating 106 A is conformally applied to each post 104 and to substrate 100, as shown in Figure 5B.
- the transparent coating material should have a high refractive index, for example a refractive index greater than 1.7. Titanium dioxide, zirconium dioxide and zinc sulphide are examples of suitable coating materials.
- a variety of conformal coating techniques well known to persons skilled in the art, such as liquid phase deposition, chemical vapour deposition, or sol-gel techniques can be used to conformally coat posts 104 and substrate 100 with transparent coating 106A.
- Conformal coating of posts 104 and substrate 100 with a transparent high refractive index coating material is continued, as depicted in Figure 5C which depicts a thicker coating 106B atop coating 106A. Posts 104 are not shown in Figure 5C so that other details are not obscured.
- Comparison of Figures 5B and 5C reveals that the shape of coating 106B is more rounded than the underlying coating 106A.
- Conformal coating of posts 104 and substrate 100 with transparent high refractive index coating material is continued, as depicted in Figure 5D which depicts a thicker coating 106C atop coating 106B. Posts 104 are not shown in Figure 5D so that other details are not obscured. Comparison of Figures 5C and 5D reveals that the shape of coating 106C is more rounded than the underlying coating 106B.
- Conformal coating of posts 104 and substrate 100 with transparent high refractive index coating material is continued, as de- picted in Figure 5E which depicts a thicker coating 106D atop coating 106C.
- Posts 104 are not shown in Figure 5E so that other details are not obscured. Comparison of Figures 5D and 5E reveals that the shape of coating 106D is more rounded than the underlying coating 106C. [0036] Conformal coating of posts 104 and substrate 100 with transparent high refractive index coating material is continued, as depicted in Figure 5F which depicts a thicker coating 106E atop coating 106D. Posts 104 and coating 106D are not shown in Figure 5F so that other details are not obscured.
- Comparison of Figures 5E and 5F reveals that the shape of coating 106E is more rounded than the underlying coating 106D, with coating 106E constituting the desired final substantially hemispherical shape which hemispherically surrounds each post 104, to yield the desired microlens array 108.
- the radial thickness of the coating on each post 104, in a notional plane substantially coplanar with substrate 100, is approximately equal to the posts' height H.
- the transparent high refractive index coating material may be applied continuously to conformally coat posts 104 and substrate 100, rather than being applied in a series of discrete layers. The coating material may alternatively be applied in discrete layers to conformally coat posts 104 and substrate 100, if desired or convenient.
- a conformal coating process which produces sharp internal (i.e. concave) corners with a radius of curvature that becomes very small (approaching molecular dimensions) is recommended.
- the coating gradually and conformally accumulates, with the coating on each post forming a concave surface having a radius of curvature, r ( Figure 5E), at the intersection of the coating on each post 104 with the coating on substrate 100.
- r gradually decreases as the coating thickness increases.
- the internal (i.e. concave) corners of the coating on each post 104 initially have a finite but small radius of curvature, r, which "sharpens" such that r approaches zero as the coating thickness increases, as seen in Figures 6C nd 7C.
- the order of magnitude of r at the intersection of the coating on each post 104 with coated substrate 100 desirably equals the order of magnitude of the molecular size of the coating material.
- titanium dioxide has a molecular size of about 1-10 nm, implying an order of magnitude value for r of 1.
- the coating process can be calibrated by experimentally determining final time, temperature, pressure and other process parameters characteristic of acceptable microlens arrays.
- Such parameters, or suitable combina- tions thereof, can be monitored as the coating process progresses and the process can be stopped when the monitored parameters attain values acceptably close to values previously determined to characterize acceptable microlens arrays. It is intended that the following appended claims and claims hereafter introduced are interpreted to include all such modifi- cations, permutations, additions and sub-combinations as are within their true spirit and scope.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
L'invention concerne un procédé de fabrication d'une matrice de microlentilles sous forme de perles, consistant à former une structure de semence transparente (102) sur un substrat transparent (100), puis à enduire la structure de semence et le substrat d'un matériau de revêtement transparent (106A―106E) ayant un indice de réfraction élevé. La structure de semence peut consister en une pluralité de colonnes transparentes, d'un rapport longueur/diamètre élevé (104), réparties uniformément sur le substrat. Chaque colonne a une hauteur approximativement égale à une valeur de hauteur présélectionnée H. Des colonnes adjacentes sont séparées par une distance approximativement égale à 2H. Le matériau de revêtement est déposé sur les colonnes et le substrat jusqu'à ce que, pour pratiquement toutes les colonnes, l'ordre de grandeur du rayon de courbure, r, du revêtement, à une intersection du revêtement sur la colonne avec une partie enduite du substrat, soit égal à l'ordre de grandeur de la taille moléculaire du matériau de revêtement.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/433,494 | 2006-05-15 | ||
| US11/433,494 US20070263291A1 (en) | 2006-05-15 | 2006-05-15 | Micro-hemisphere array fabrication |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2007131330A1 true WO2007131330A1 (fr) | 2007-11-22 |
Family
ID=38684844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CA2007/000801 Ceased WO2007131330A1 (fr) | 2006-05-15 | 2007-05-07 | Procédé de fabrication d'une matrice de micro-hémisphères |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20070263291A1 (fr) |
| WO (1) | WO2007131330A1 (fr) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7879249B2 (en) * | 2007-08-03 | 2011-02-01 | Aptina Imaging Corporation | Methods of forming a lens master plate for wafer level lens replication |
| US7919230B2 (en) * | 2008-06-25 | 2011-04-05 | Aptina Imaging Corporation | Thermal embossing of resist reflowed lenses to make aspheric lens master wafer |
| US20110063725A1 (en) * | 2009-09-17 | 2011-03-17 | Eyesaver International | Lenticular Display |
| DE102010055689A1 (de) * | 2010-12-22 | 2012-06-28 | Giesecke & Devrient Gmbh | Mikrooptische Betrachtungsanordnung |
| US8922900B2 (en) * | 2013-01-22 | 2014-12-30 | Taiwan Semiconductor Manufacturing Company Ltd. | Optical element structure and optical element fabricating process for the same |
| WO2014189751A1 (fr) | 2013-05-22 | 2014-11-27 | Clearink Displays Llc | Procédé et appareil permettant une saturation améliorée des filtres colorés |
| US10705404B2 (en) | 2013-07-08 | 2020-07-07 | Concord (Hk) International Education Limited | TIR-modulated wide viewing angle display |
| CN105940344A (zh) * | 2014-01-31 | 2016-09-14 | 清墨显示股份有限公司 | 用于具有介电层的反射式图象显示器的装置和方法 |
| CN107111016B (zh) | 2014-10-08 | 2020-08-28 | 协和(香港)国际教育有限公司 | 滤色器对准反射式显示器 |
| US10386691B2 (en) | 2015-06-24 | 2019-08-20 | CLEARink Display, Inc. | Method and apparatus for a dry particle totally internally reflective image display |
| US10261221B2 (en) | 2015-12-06 | 2019-04-16 | Clearink Displays, Inc. | Corner reflector reflective image display |
| US10386547B2 (en) | 2015-12-06 | 2019-08-20 | Clearink Displays, Inc. | Textured high refractive index surface for reflective image displays |
| CN106200198A (zh) | 2016-09-29 | 2016-12-07 | 京东方科技集团股份有限公司 | 电子纸及其制备方法 |
| CN106154678A (zh) * | 2016-09-29 | 2016-11-23 | 京东方科技集团股份有限公司 | 一种显示器件 |
| JP2020030275A (ja) * | 2018-08-21 | 2020-02-27 | 株式会社リコー | 画像投射装置および拡散スクリーンおよびヘッドアップディスプレイおよび移動体 |
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| JP2002341108A (ja) * | 2001-05-15 | 2002-11-27 | Yamaha Corp | マイクロレンズアレイの製法 |
| US20050133688A1 (en) * | 2003-12-22 | 2005-06-23 | Jin Li | Layered lens structures and methods of production |
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| US3700305A (en) * | 1970-12-14 | 1972-10-24 | Minnesota Mining & Mfg | Retroreflective microspheres having a dielectric mirror on a portion of their surface and retroreflective constructions containing such microspheres |
| US5135590A (en) * | 1991-05-24 | 1992-08-04 | At&T Bell Laboratories | Optical fiber alignment method |
| US5384231A (en) * | 1993-08-24 | 1995-01-24 | Eastman Kodak Company | Fabricating lens array structures for imaging devices |
| US5536455A (en) * | 1994-01-03 | 1996-07-16 | Omron Corporation | Method of manufacturing lens array |
| WO2001071410A2 (fr) * | 2000-03-17 | 2001-09-27 | Zograph, Llc | Systeme de lentilles pour acuite elevee |
| JP2002122707A (ja) * | 2000-10-13 | 2002-04-26 | Canon Inc | 非球面マイクロ構造体、及びその作製方法 |
| US6695453B2 (en) * | 2001-02-09 | 2004-02-24 | Avery Dennison Corporation | Rear projection screens and light filters with conformable coatings and methods of making the same |
| US20030025227A1 (en) * | 2001-08-02 | 2003-02-06 | Zograph, Llc | Reproduction of relief patterns |
| US20030123827A1 (en) * | 2001-12-28 | 2003-07-03 | Xtalight, Inc. | Systems and methods of manufacturing integrated photonic circuit devices |
| US6891658B2 (en) * | 2002-03-04 | 2005-05-10 | The University Of British Columbia | Wide viewing angle reflective display |
| US6700708B2 (en) * | 2002-05-30 | 2004-03-02 | Agere Systems, Inc. | Micro-lens array and method of making micro-lens array |
| US7808706B2 (en) * | 2004-02-12 | 2010-10-05 | Tredegar Newco, Inc. | Light management films for displays |
| US7286280B2 (en) * | 2004-05-07 | 2007-10-23 | The University Of British Columbia | Brightness enhancement film for backlit image displays |
| US20070264424A1 (en) * | 2006-05-12 | 2007-11-15 | Nanoopto Corporation | Lens arrays and methods of making the same |
-
2006
- 2006-05-15 US US11/433,494 patent/US20070263291A1/en not_active Abandoned
-
2007
- 2007-05-07 WO PCT/CA2007/000801 patent/WO2007131330A1/fr not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4689291A (en) * | 1985-08-30 | 1987-08-25 | Xerox Corporation | Pedestal-type microlens fabrication process |
| JP2002341108A (ja) * | 2001-05-15 | 2002-11-27 | Yamaha Corp | マイクロレンズアレイの製法 |
| US20050133688A1 (en) * | 2003-12-22 | 2005-06-23 | Jin Li | Layered lens structures and methods of production |
Also Published As
| Publication number | Publication date |
|---|---|
| US20070263291A1 (en) | 2007-11-15 |
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