[go: up one dir, main page]

WO2007103812A1 - Procédé de production à basse température de revêtements d'oxyde de fer nanostructurés - Google Patents

Procédé de production à basse température de revêtements d'oxyde de fer nanostructurés Download PDF

Info

Publication number
WO2007103812A1
WO2007103812A1 PCT/US2007/063213 US2007063213W WO2007103812A1 WO 2007103812 A1 WO2007103812 A1 WO 2007103812A1 US 2007063213 W US2007063213 W US 2007063213W WO 2007103812 A1 WO2007103812 A1 WO 2007103812A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
iron oxide
plasma source
chamber
iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2007/063213
Other languages
English (en)
Inventor
Fred Ratel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altairnano Inc
Original Assignee
Altair Nanomaterials Inc
Altairnano Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Altair Nanomaterials Inc, Altairnano Inc filed Critical Altair Nanomaterials Inc
Publication of WO2007103812A1 publication Critical patent/WO2007103812A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/406—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Definitions

  • the present invention provides a method for forming nano-structured iron oxide coatings on a substrate.
  • the present invention provides a method for forming nano-structured iron oxide coatings on a substrate.
  • the method includes the steps of: (a) subjecting a chamber containing a plasma source to vacuum; (b) feeding iron pentacarbonyl and O 2 into a chamber containing a plasma source, wherein the O 2 is fed into the chamber at a rate greater than that of the iron pentacarbonyl; (c) subjecting the substrate to the chamber, wherein the substrate is at a temperature less than 250 0 C, thereby forming an iron oxide coating on the substrate, wherein the iron oxide is greater than 90 percent in the ⁇ -hematite form.
  • the iron oxide coating formed by the method of the present invention is typically greater than 90 percent ⁇ -hematite. Oftentimes, at least 95 percent or 97.5 percent of the material is ⁇ -hematite.
  • the iron oxide materials do not include a significant amount of either magnetite or maghemite forms of iron oxide. They typically contain less than 10 pecent magnetite and/or maghemite, and oftentimes they contain less than 5 percent magnetite and/or maghemite.
  • the surface of the coatings of the iron oxide materials typically exhibit individual structures (e.g., disc-like structures, box-like structures, diamond- like structures, etc.) that lie in a non-parallel orientation (e.g., vertical) with respect to the substrate plane.
  • Such structures typically have a ratio of long dimension to short dimension of at least 2:1. Oftentimes the ratio is at least 3:1 or 4:1. In certain cases, the ratio is at least 5:1 or 6:1.
  • the iron oxide coatings typically contain at least 10 individual structures on their surface within a 0.25 ⁇ m 2 area. Oftentimes, the coatings contain at least 25 or 50 disc-like structures on their surface within a 0.25 ⁇ m 2 area.
  • Iron pentacarbonyl and O 2 are fed into a chamber, containing a plasma source, through two separate feed lines.
  • the O 2 is fed in at a rate at least 4 times greater than that of the iron pentacarbonyl.
  • the chamber is subjected to vacuum prior to deposition and maintained under vacuum throughout the procedure.
  • a substrate is subjected to the chamber, resulting in the production of an iron oxide coating on the substrate. During the deposition, the substrate is at a temperature less than 250 0 C.
  • the plasma source is typically a high density plasma source, and it is oftentimes an argon plasma source.
  • O 2 is fed into the chamber at a rate at least 8 times greater than that of the iron pentacarbonyl, and oftentimes it is fed at a rate at least 12 times greater.
  • the chamber is typically subjected to a vacuum of at least 0.10 torr, and, in some cases, to a vacuum of at least 0.01 torr or even 0.005 torr.
  • Substrates may be of any suitable composition. Nonlimiting examples include a spectrally transparent cyclic-olefin copolymer, pure poly(norbornene), and a conducting glass plate having an F-doped SnO 2 overlayer.
  • the substrate temperature during the deposition is usually less than 200 0 C. In certain cases it may be less than 175 0 C, 150 0 C, or 125 0 C.
  • Substrates are usually passed through the chamber during the coating process at a rate of at least lmm/s. Oftentimes, the substrates are passed through at a rate of at least 3 mm/s, 5 mm/s, or even 7 mm/s. Iron oxide coatings on the substrate are typically greater than 90 percent in the ⁇ -hematite form. In certain cases, the coatings are greater than 95 percent or even 97.5 percent in the ⁇ -hematite form. Coating thicknesses on the substrate usually exceed 500 A, and can exceed 750 A or even 1000 A.
  • Plasma Source High density.
  • O 2 Feed Rate At least 50 seem.
  • Iron Pentacarbonyl Feed Rate At least 10 seem.
  • Chamber Pressure Less than 0.1 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer.
  • Substrate Temperature Less than 250 0 C.
  • Iron Oxide Form Greater than 90 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 500 A.
  • Plasma Source High density.
  • O 2 Feed Rate At least 75 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.1 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer. Substrate Temperature: Less than 250 0 C. Iron Oxide Form: Greater than 90 percent ⁇ -hematite. Iron Oxide Coating Thickness: Greater than 500 A. 3. Plasma Source: High density. O 2 Feed Rate: At least 75 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.1 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer.
  • Substrate Temperature Less than 200 0 C.
  • Iron Oxide Form Greater than 90 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 500 A.
  • Plasma Source High density.
  • O 2 Feed Rate At least 75 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.1 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer.
  • Substrate Temperature Less than 175 0 C.
  • Iron Oxide Form Greater than 90 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 500 A.
  • Plasma Source High density argon.
  • O 2 Feed Rate At least 100 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.01 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer. Substrate Temperature: Less than 175 0 C. Iron Oxide Form: Greater than 95 percent ⁇ -hematite. Iron Oxide Coating Thickness: Greater than 500 A. Substrate Pass-Through Rate: At least 3 mm/s. . Plasma Source: High density argon. O 2 Feed Rate: At least 150 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.01 torr.
  • Substrate Composition Spectrally transparent cyclic-olefm polymer.
  • Substrate Temperature Less than 150 0 C.
  • Iron Oxide Form Greater than 95 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 750 A.
  • Substrate Pass-Through Rate At least 3 mm/s.
  • Plasma Source High density argon.
  • O 2 Feed Rate At least 150 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.01 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer.
  • Substrate Temperature Less than 150 0 C.
  • Iron Oxide Form Greater than 95 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 1000 A.
  • Substrate Pass-Through Rate At least 3 mm/s.
  • Plasma Source High density argon.
  • O 2 Feed Rate At least 150 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.01 torr.
  • Substrate Composition Spectrally transparent cyclic-olefin polymer.
  • Substrate Temperature Less than 150 0 C.
  • Iron Oxide Form Greater than 95 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 1000 A.
  • Substrate Pass-Through Rate At least 5 mm/s.
  • Plasma Source High density argon.
  • O 2 Feed Rate At least 150 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.01 torr.
  • Substrate Composition Poly(norbornene).
  • Substrate Temperature Less than 150 0 C.
  • Iron Oxide Form Greater than 95 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 1000 A.
  • Substrate Pass-Through Rate At least 5 mm/s.
  • Plasma Source High density argon.
  • O 2 Feed Rate At least 150 seem.
  • Iron Pentacarbonyl Feed Rate At least 15 seem.
  • Chamber Pressure Less than 0.01 torr.
  • Substrate Composition Conducting glass plate having an F-doped SnO 2 overlayer
  • Substrate Temperature Less than 150 0 C.
  • Iron Oxide Form Greater than 95 percent ⁇ -hematite.
  • Iron Oxide Coating Thickness Greater than 1000 A.
  • Substrate Pass-Through Rate At least 5 mm/s.
  • a sheet of Topas cyclic olefin copolymer was coated with iron oxide in the following manner.
  • Iron pentacarbonyl and O 2 were fed into a chamber, containing a high density argon plasma source operating at 3000 W (Sencera, Charlotte, NC), at a rate of 20 seem and 240 seem respectively through two separate feed lines.
  • the chamber was pumped down to 0.005 Torr prior to deposition and maintained at that pressure throughout the process.
  • the sheet which was at a temperature of 140 0 C, was passed over the feed outlets on a moving carriage at a speed of 5 mm/s to achieve an iron oxide deposit thickness of 1500 A.
  • An XRD pattern of the film showed it was an exact match for ⁇ -hematite iron oxide.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Compounds Of Iron (AREA)

Abstract

La présente invention concerne un procédé de formation de revêtements d'oxyde de fer nanostructurés sur un substrat. Le procédé comprend les étapes consistant: (a) à soumettre une chambre contenant une source de plasma à un vide; (b) à alimenter du fer pentacarbonyle et de l'O2 dans une chambre contenant une source de plasma, l'O2 étant alimenté dans la chambre à un débit supérieur à celui du fer pentacarbonyle; (c) à placer le substrat dans la chambre, le substrat étant à une température inférieure à 250°C, permettant ainsi de former un revêtement d'oxyde de fer sur le substrat, l'oxyde de fer se présentant à plus de 90% sous la forme d'hématite alpha.
PCT/US2007/063213 2006-03-02 2007-03-02 Procédé de production à basse température de revêtements d'oxyde de fer nanostructurés Ceased WO2007103812A1 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US77873006P 2006-03-02 2006-03-02
US77872906P 2006-03-02 2006-03-02
US60/778,729 2006-03-02
US60/778,730 2006-03-02
US81140306P 2006-06-05 2006-06-05
US60/811,403 2006-06-05

Publications (1)

Publication Number Publication Date
WO2007103812A1 true WO2007103812A1 (fr) 2007-09-13

Family

ID=38475201

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/063213 Ceased WO2007103812A1 (fr) 2006-03-02 2007-03-02 Procédé de production à basse température de revêtements d'oxyde de fer nanostructurés

Country Status (2)

Country Link
US (1) US20080038482A1 (fr)
WO (1) WO2007103812A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014055750A1 (fr) 2012-10-05 2014-04-10 Basf Corporation Pigments à effet contenant de l'oxyde de fer, fabrication et utilisation associées

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101001610A (zh) * 2004-07-13 2007-07-18 爱尔达纳米公司 防止药物转向的陶瓷结构
CA2620167A1 (fr) * 2005-08-23 2007-03-01 Altairnano, Inc. Composition d'anatase-tio2 dopee au phosphore hautement catalytique et methodes de fabrication connexes
US20080044638A1 (en) * 2006-03-02 2008-02-21 Fred Ratel Nanostructured Metal Oxides
WO2007103820A1 (fr) * 2006-03-02 2007-09-13 Altairnano, Inc. Oxyde de fer dopé à l'indium nanostructuré
US20080254258A1 (en) * 2007-04-12 2008-10-16 Altairnano, Inc. Teflon® replacements and related production methods
ITPD20110285A1 (it) 2011-09-08 2013-03-09 Univ Padova Metodo per preparare nanomateriali supportati a base di ossido di ferro (iii) con tecnica cvd e metodo di sintesi di fe(hfa)2tmeda

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4422898A (en) * 1970-04-17 1983-12-27 Bell Telephone Laboratories, Incorporated Technique for the fabrication of an iron oxide mask
JPS62171926A (ja) * 1986-01-22 1987-07-28 Mitsubishi Gas Chem Co Inc マグネタイト微粒子の製造方法

Family Cites Families (97)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU416432B1 (en) * 1966-04-29 1971-08-20 WESTERN TITANIUN M. L. and COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANIZATION Production of anosovite from titaniferous minerals
US3967954A (en) * 1971-04-09 1976-07-06 Benilite Corporation Of America Pre-leaching or reduction treatment in the beneficiation of titaniferous iron ores
US3660029A (en) * 1971-04-09 1972-05-02 Edith W Carpenter Process for beneficiating ilmenite
CA949331A (en) * 1971-09-01 1974-06-18 National Research Council Of Canada Spherical agglomeration of ilmenite
NL7315931A (fr) * 1972-12-04 1974-06-06
JPS5080298A (fr) * 1973-11-20 1975-06-30
US3966455A (en) * 1974-02-19 1976-06-29 Paul Franklin Taylor Process for ilmenite ore reduction
GB1489927A (en) * 1974-08-10 1977-10-26 Tioxide Group Ltd Titanium dioxide carrier
US4009124A (en) * 1975-09-15 1977-02-22 Basf Aktiengesellschaft Basic mixed carbonate of copper and aluminum and process for manufacturing a copper-containing catalyst
US3935094A (en) * 1974-10-10 1976-01-27 Quebec Iron And Titanium Corporation - Fer Et Titane Du Quebec, Incorporated Magnetic separation of ilmenite
US4183768A (en) * 1975-03-03 1980-01-15 American Cyanamid Company Anatase pigment from ilmenite
US4085190A (en) * 1975-04-29 1978-04-18 Chyn Duog Shiah Production of rutile from ilmenite
US4082832A (en) * 1975-05-06 1978-04-04 Solex Research Corporation Treatment of raw materials containing titanium
US4269619A (en) * 1976-05-14 1981-05-26 Kerr-Mcgee Chemical Corporation Ilmenite beneficiation process and a digester method
US4097574A (en) * 1976-06-16 1978-06-27 United States Steel Corporation Process for producing a synthetic rutile from ilmentite
US4089675A (en) * 1976-10-05 1978-05-16 American Cyanamid Company Combination beneficiation ilmenite digestion liquor reduction process
US4158041A (en) * 1978-02-21 1979-06-12 Uop Inc. Separation of ilmenite and rutile
FR2418773A1 (fr) * 1978-03-02 1979-09-28 Thann & Mulhouse Procede d'utilisation de sulfate ferreux dans la fabrication de bioxyde de titane pigmentaire par la voix sulfurique
US4152252A (en) * 1978-05-04 1979-05-01 Uop Inc. Purification of rutile
US4199552A (en) * 1978-05-26 1980-04-22 Kerr-Mcgee Corporation Process for the production of synthetic rutile
US4269809A (en) * 1979-12-19 1981-05-26 Uop Inc. Recovery in titanium metal values by solvent extraction
DE2951799A1 (de) * 1979-12-21 1981-07-02 Bayer Ag, 5090 Leverkusen Verfahren zur herstellung einer hydrolysierbaren titanylsulfatloesung
US4312236A (en) * 1979-12-28 1982-01-26 J-Tec Associates, Inc. Vortex generating device
WO1982000663A1 (fr) * 1980-08-19 1982-03-04 Fensom D Reduction de materiau ferrotitanifere
US4390365A (en) * 1980-12-15 1983-06-28 Occidental Research Corporation Process for making titanium metal from titanium ore
US4389391A (en) * 1981-06-28 1983-06-21 Dunn Jr Wendell E Process for beneficiating titaniferous ores
JPS59203720A (ja) * 1983-05-04 1984-11-17 Tokuyama Soda Co Ltd 結晶性金属酸化物及びその製造方法
US5417986A (en) * 1984-03-16 1995-05-23 The United States Of America As Represented By The Secretary Of The Army Vaccines against diseases caused by enteropathogenic organisms using antigens encapsulated within biodegradable-biocompatible microspheres
JPS61166501A (ja) * 1985-01-18 1986-07-28 Yoshio Morita 水溶液反応による二酸化チタン光学薄膜の形成方法
WO1986005170A1 (fr) * 1985-03-05 1986-09-12 Idemitsu Kosan Company Limited Particules spheriques superfines d'oxyde metallique et procede de preparation
US4649037A (en) * 1985-03-29 1987-03-10 Allied Corporation Spray-dried inorganic oxides from non-aqueous gels or solutions
DE3524053A1 (de) * 1985-07-05 1987-01-08 Bayer Antwerpen Nv Verfahren zur herstellung von hochwertigem titandioxid nach dem sulfatverfahren
US4639356A (en) * 1985-11-05 1987-01-27 American Cyanamid Company High technology ceramics with partially stabilized zirconia
US4835123A (en) * 1986-02-03 1989-05-30 Didier-Werke Ag Magnesia partially-stabilized zirconia
US4751070A (en) * 1986-04-15 1988-06-14 Martin Marietta Corporation Low temperature synthesis
NZ221411A (en) * 1986-08-11 1989-10-27 Innovata Biomed Ltd Pharmaceutical compositions containing microcapsules and a surfactant
US5108739A (en) * 1986-08-25 1992-04-28 Titan Kogyo Kabushiki Kaisha White colored deodorizer and process for producing the same
US5192443A (en) * 1987-03-23 1993-03-09 Rhone-Poulenc Chimie Separation of rare earth values by liquid/liquid extraction
US4944936A (en) * 1987-04-10 1990-07-31 Kemira, Inc. Titanium dioxide with high purity and uniform particle size and method therefore
US5104445A (en) * 1987-07-31 1992-04-14 Chevron Research & Technology Co. Process for recovering metals from refractory ores
US5403513A (en) * 1987-10-07 1995-04-04 Catalyst & Chemical Industries, Co., Ltd. Titanium oxide sol and process for preparation thereof
US4913961A (en) * 1988-05-27 1990-04-03 The United States Of America As Represented By The Secretary Of The Navy Scandia-stabilized zirconia coating for composites
US4891343A (en) * 1988-08-10 1990-01-02 W. R. Grace & Co.-Conn. Stabilized zirconia
US5114702A (en) * 1988-08-30 1992-05-19 Battelle Memorial Institute Method of making metal oxide ceramic powders by using a combustible amino acid compound
NZ231769A (en) * 1988-12-20 1991-01-29 Univ Melbourne Production of tif 4 from ore containing tio 2
US4923682A (en) * 1989-03-30 1990-05-08 Kemira, Inc. Preparation of pure titanium dioxide with anatase crystal structure from titanium oxychloride solution
US5036037A (en) * 1989-05-09 1991-07-30 Maschinenfabrik Andritz Aktiengesellschaft Process of making catalysts and catalysts made by the process
US5505865A (en) * 1989-07-11 1996-04-09 Charles Stark Draper Laboratory, Inc. Synthesis process for advanced ceramics
US4997533A (en) * 1989-08-07 1991-03-05 Board Of Control Of Michigan Technological University Process for the extracting oxygen and iron from iron oxide-containing ores
US5023217A (en) * 1989-09-18 1991-06-11 Swiss Aluminum Ltd. Ceramic bodies formed from partially stabilized zirconia
RU2102510C1 (ru) * 1990-03-02 1998-01-20 Виммера Индастриал Минералз ПТИ. Лтд. Способ повышения содержания двуокиси титана в титансодержащей руде или концентрате
CA2047650C (fr) * 1990-07-25 1996-12-24 Gerhard Jacobus Mostert Procede de recuperation du titane
GB9016885D0 (en) * 1990-08-01 1990-09-12 Scras Sustained release pharmaceutical compositions
AU649441B2 (en) * 1990-08-30 1994-05-26 Almeth Pty Ltd Improved process for separating ilmenite
JPH06505306A (ja) * 1991-02-21 1994-06-16 ザ・ユニバーシティー・オブ・メルボルン 金属チタンならびにチタン鉄鉱および関連鉱物を処理する際に有用な中間体の製造方法
US5106489A (en) * 1991-08-08 1992-04-21 Sierra Rutile Limited Zircon-rutile-ilmenite froth flotation process
US5490976A (en) * 1991-08-26 1996-02-13 E. I. Du Pont De Nemours And Company Continuous ore reaction process by fluidizing
US5204141A (en) * 1991-09-18 1993-04-20 Air Products And Chemicals, Inc. Deposition of silicon dioxide films at temperatures as low as 100 degree c. by lpcvd using organodisilane sources
US5209816A (en) * 1992-06-04 1993-05-11 Micron Technology, Inc. Method of chemical mechanical polishing aluminum containing metal layers and slurry for chemical mechanical polishing
US5378438A (en) * 1992-11-30 1995-01-03 E. I. Du Pont De Nemours And Company Benefication of titaniferous ores
EP0612854B1 (fr) * 1993-02-23 1998-12-30 Boc Gases Australia Limited Procédé pour la préparation de rutile synthétique
JP2729176B2 (ja) * 1993-04-01 1998-03-18 富士化学工業株式会社 ＬｉＭ３＋Ｏ２ またはＬｉＭｎ２ Ｏ４ の製造方法及び２次電池正極材用ＬｉＮｉ３＋Ｏ２
CA2162266A1 (fr) * 1993-05-07 1994-11-24 Michael John Hollitt Methode pour valoriser des materiaux titaniferes
US5399751A (en) * 1993-11-05 1995-03-21 Glitsch, Inc. Method for recovering carboxylic acids from aqueous solutions
US5714260A (en) * 1993-12-13 1998-02-03 Ishihara Sangyo Kaisha, Ltd. Ultrafine iron-containing rutile titanium oxide and process for producing the same
US5536507A (en) * 1994-06-24 1996-07-16 Bristol-Myers Squibb Company Colonic drug delivery system
EP0703188B1 (fr) * 1994-09-22 1999-03-31 Asea Brown Boveri Ag Méthode de préparation d'une poudre mixte d'oxyde métallique et poudre mixte d'oxyde métallique obtenue selon cette méthode
JPH11512336A (ja) * 1995-09-15 1999-10-26 ロディア シミ 二酸化チタンを基とする光触媒コーティングを有する基材及び二酸化チタンを基とする有機分散体
EP0806397B1 (fr) * 1995-11-24 2002-03-27 Fuji Chemical Industry Co., Ltd. Oxyde composite lithium-nickel, son procede de preparation, et materiau actif positif destine a une batterie secondaire
JPH09272815A (ja) * 1996-04-02 1997-10-21 Merck Japan Kk 金属酸化物複合微粒子及びその製造方法
US5770018A (en) * 1996-04-10 1998-06-23 Valence Technology, Inc. Method for preparing lithium manganese oxide compounds
CA2182123C (fr) * 1996-07-26 1999-10-05 Graham F. Balderson Methode de production de rutile synthetique
US5730795A (en) * 1996-09-24 1998-03-24 E. I. Du Pont De Nemours And Company Process for manufacturing titanium dioxide pigment having a hydrous oxide coating using a media mill
US5994580A (en) * 1996-10-21 1999-11-30 Toagosei Co., Ltd. Process for producing acrylic acid
US6030914A (en) * 1996-11-12 2000-02-29 Tosoh Corporation Zirconia fine powder and method for its production
US6162530A (en) * 1996-11-18 2000-12-19 University Of Connecticut Nanostructured oxides and hydroxides and methods of synthesis therefor
US6177135B1 (en) * 1997-03-31 2001-01-23 Advanced Technology Materials, Inc. Low temperature CVD processes for preparing ferroelectric films using Bi amides
US6413489B1 (en) * 1997-04-15 2002-07-02 Massachusetts Institute Of Technology Synthesis of nanometer-sized particles by reverse micelle mediated techniques
US6068828A (en) * 1997-06-13 2000-05-30 Nippon Shokubai Co., Ltd. Zirconia powder, method for producing the same, and zirconia ceramics using the same
US6194083B1 (en) * 1997-07-28 2001-02-27 Kabushiki Kaisha Toshiba Ceramic composite material and its manufacturing method, and heat resistant member using thereof
US6383235B1 (en) * 1997-09-26 2002-05-07 Mitsubishi Denki Kabushiki Kaisha Cathode materials, process for the preparation thereof and secondary lithium ion battery using the cathode materials
US6010683A (en) * 1997-11-05 2000-01-04 Ultradent Products, Inc. Compositions and methods for reducing the quantity but not the concentration of active ingredients delivered by a dentifrice
US6375923B1 (en) * 1999-06-24 2002-04-23 Altair Nanomaterials Inc. Processing titaniferous ore to titanium dioxide pigment
US6548039B1 (en) * 1999-06-24 2003-04-15 Altair Nanomaterials Inc. Processing aqueous titanium solutions to titanium dioxide pigment
US6376590B2 (en) * 1999-10-28 2002-04-23 3M Innovative Properties Company Zirconia sol, process of making and composite material
US6461415B1 (en) * 2000-08-23 2002-10-08 Applied Thin Films, Inc. High temperature amorphous composition based on aluminum phosphate
US20020031622A1 (en) * 2000-09-08 2002-03-14 Ippel Scott C. Plastic substrate for information devices and method for making same
US6521562B1 (en) * 2000-09-28 2003-02-18 Exxonmobil Chemical Patents, Inc. Preparation of molecular sieve catalysts micro-filtration
WO2002032574A2 (fr) * 2000-10-17 2002-04-25 Altair Nanomaterials Inc. Procede de production de structures catalytiques
US7201940B1 (en) * 2001-06-12 2007-04-10 Advanced Cardiovascular Systems, Inc. Method and apparatus for thermal spray processing of medical devices
US6982073B2 (en) * 2001-11-02 2006-01-03 Altair Nanomaterials Inc. Process for making nano-sized stabilized zirconia
US6861101B1 (en) * 2002-01-08 2005-03-01 Flame Spray Industries, Inc. Plasma spray method for applying a coating utilizing particle kinetics
CN101001610A (zh) * 2004-07-13 2007-07-18 爱尔达纳米公司 防止药物转向的陶瓷结构
CA2620167A1 (fr) * 2005-08-23 2007-03-01 Altairnano, Inc. Composition d'anatase-tio2 dopee au phosphore hautement catalytique et methodes de fabrication connexes
US7601431B2 (en) * 2005-11-21 2009-10-13 General Electric Company Process for coating articles and articles made therefrom
US20080044638A1 (en) * 2006-03-02 2008-02-21 Fred Ratel Nanostructured Metal Oxides
WO2007103820A1 (fr) * 2006-03-02 2007-09-13 Altairnano, Inc. Oxyde de fer dopé à l'indium nanostructuré

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4422898A (en) * 1970-04-17 1983-12-27 Bell Telephone Laboratories, Incorporated Technique for the fabrication of an iron oxide mask
JPS62171926A (ja) * 1986-01-22 1987-07-28 Mitsubishi Gas Chem Co Inc マグネタイト微粒子の製造方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CHAO LIU ET AL.: "Oxidation of FePt Nanoparticles", JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, vol. 266, October 2003 (2003-10-01), pages 96 - 101 *
HODER T. ET AL.: "Microwave Plasma Used for -Fe Nanoparticles Synthesis", WDS'05 PROCEEDINGS OF CONTRIBUTED PAPERS, no. PART II, 2005, pages 300 - 305 *
LI S.-Z. ET AL.: "Synthesis of Nanocrystalline Iron Oxide Particles by Microwave Plasma Jet at Atmospheric Pressure", JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 43, no. 11A, November 2004 (2004-11-01), pages 7714 - 7717 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014055750A1 (fr) 2012-10-05 2014-04-10 Basf Corporation Pigments à effet contenant de l'oxyde de fer, fabrication et utilisation associées
EP2904053A4 (fr) * 2012-10-05 2016-05-04 Basf Corp Pigments à effet contenant de l'oxyde de fer, fabrication et utilisation associées
US9951194B2 (en) 2012-10-05 2018-04-24 Basf Corporation Iron oxide containing effect pigments, their manufacture and their use

Also Published As

Publication number Publication date
US20080038482A1 (en) 2008-02-14

Similar Documents

Publication Publication Date Title
US20080008843A1 (en) Method for Production of Metal Oxide Coatings
WO2007103812A1 (fr) Procédé de production à basse température de revêtements d'oxyde de fer nanostructurés
KR101697806B1 (ko) 적층 필름의 제조 방법
TW200605194A (en) Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
WO2010128572A1 (fr) Procédé de fabrication d'un film de zircone
CN106575172B (zh) 触控面板用导电性基板、触控面板用导电性基板的制造方法
TW201442884A (zh) 積層體及阻氣薄膜
CN108385066A (zh) 一种无氢金属掺杂类金刚石涂层制备方法及其制品
Pogrebnjak et al. Structural features of the formation of multicomponent and high-entropy transition metal nitride films
KR101019061B1 (ko) 복합필름 및 이의 제조방법
CN103290385A (zh) 卷对卷立式磁控镀膜装置
KR101736483B1 (ko) 배리어 필름을 제조하기 위한 방법 및 장치
CN101845610B (zh) 一种连续垂直热蒸发的金属镀膜方法
KR20120059255A (ko) 티타늄, 은, 및 질소를 포함하는 다성분계 코팅재 및 그의 코팅 방법
JP5649026B2 (ja) ジルコニア膜の成膜方法
CN101041889B (zh) 镀膜方法
US20120164418A1 (en) Article having hard film and method for making the article
CN208250415U (zh) 一种薄膜沉积系统
KR101637945B1 (ko) 질화 코팅층의 형성방법 및 그 방법에 의하여 형성된 질화코팅층
KR101105226B1 (ko) 투습 방지막을 갖는 디스플레이용 연성기판 및 그의 제조 방법
KR102732322B1 (ko) 가스 배리어성 금속산화물 증착 필름
CN106521443B (zh) 碳化硅硬质膜的制备方法及玻璃
KR20150107684A (ko) 투명 도전성 기판의 제조방법
JP5649028B2 (ja) ジルコニア膜の成膜方法
CN112334602B (zh) 透明导电膜

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07757827

Country of ref document: EP

Kind code of ref document: A1