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WO2007003563A1 - Installation d'eclairage par projection comprenant une pluralite d'objectifs de projection - Google Patents

Installation d'eclairage par projection comprenant une pluralite d'objectifs de projection Download PDF

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Publication number
WO2007003563A1
WO2007003563A1 PCT/EP2006/063663 EP2006063663W WO2007003563A1 WO 2007003563 A1 WO2007003563 A1 WO 2007003563A1 EP 2006063663 W EP2006063663 W EP 2006063663W WO 2007003563 A1 WO2007003563 A1 WO 2007003563A1
Authority
WO
WIPO (PCT)
Prior art keywords
projection
subsystem
projection exposure
exposure apparatus
lenses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2006/063663
Other languages
German (de)
English (en)
Inventor
Aurelian Dodoc
Wilhelm Ulrich
Heiko Feldmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to JP2008518844A priority Critical patent/JP6116788B2/ja
Priority to KR1020127008773A priority patent/KR101407797B1/ko
Priority to KR20077030366A priority patent/KR101478832B1/ko
Publication of WO2007003563A1 publication Critical patent/WO2007003563A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Definitions

  • the invention relates to a projection exposure apparatus with a plurality of projection objectives.
  • the invention relates to a projection exposure apparatus in which a larger installation space is made possible for the individual projection objectives.
  • the known projection exposure apparatus 1 'shown in Figure 27, for example, has a plurality of illumination systems 2 and a plurality of projection lenses 3, between which a mask holder 4 holds a mask 5 arranged in a mask or reticle plane of the projection exposure apparatus 1 ', whose structures are projected through the projection objectives 3 onto a substrate or wafer plane held by a substrate holder 6 Substrate 7 are shown.
  • Object of the present invention is to provide a projection exposure system with a plurality of projection lenses, in which a larger space is made possible for the individual projection lenses.
  • a projection exposure apparatus has at least two projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate area in a substrate plane, the substrate area being movable in a predetermined scanning direction relative to the plurality of projection objectives, - Wherein at least one of these projection lenses has a portion of its optical axis, which is not perpendicular to the substrate plane, and
  • Substrate plane is not parallel to the scan direction.
  • the angle between at least one of these projections and the scanning direction is greater than 2 ° in absolute value, preferably greater than 3 °, and still more preferably greater than 4 °. In a further preferred embodiment, the angle between two such projections in terms of magnitude greater than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.
  • an arrangement of the projection objectives is selected in which not all of the projection lenses which follow each other transversely to the scan direction are arranged in a straight line (ie as is conventional on a straight line perpendicular to the scan direction), but rather a suitable arrangement of the projection objectives with respect to the scan direction or to each other is deviated from this which leads to the fact that in the individual projection objectives an enlarged space is available.
  • one or more of the projection lenses which follow each other transversely to the scan direction are arranged in a straight line (ie as is conventional on a straight line perpendicular to the scan direction), but rather a suitable arrangement of the projection objectives with respect to the scan direction or to each other is deviated from this which leads to the fact that in the individual projection objectives an enlarged space is available.
  • Projection lenses with folded beam path which have at least one not perpendicular to the substrate portion extending portion of the optical axis, with this portion of the optical axis obliquely to the scanning direction.
  • Such projection lenses with folded beam path often have at the end of the folded portion of the optical axis on a concave mirror, for which then an enlarged space is available due to the inventive arrangement.
  • the concave mirror may have a larger diameter compared to a conventional linear arrangement of the projection lenses, in which the folded portions of the optical axis each parallel to the scanning direction and in which the concave mirror of adjacent projection lenses would collide even at smaller diameters.
  • a projection exposure apparatus has at least two projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses, at least one of them Image fields is limited by a plurality of rectilinear side lines such that the normal on the longest of these side lines is not parallel to the scan direction.
  • the angle between at least one of these normals and the scanning direction is greater than 2 ° in absolute value, preferably greater than 3 °, and more preferably greater than 4 °. In a further preferred embodiment, the angle between two such normals is greater in absolute value than 2 °, preferably greater than 3 °, and more preferably greater than 4 °.
  • a projection exposure apparatus has at least two projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses, each of them of these picture fields has a plurality of corner points, and wherein the picture fields are arranged such that the longest connecting line between two corner points in one of these picture fields is not parallel to the longest connecting line between two corner points in the other of these picture fields.
  • the angle between these connecting straight lines is greater than 2 ° in absolute value, preferably greater than 3 °, and more preferably greater than 4 °.
  • a projection exposure apparatus has a plurality of projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses, and wherein at least three successive arranged transversely to the scanning direction image fields lie on a non-linear curve.
  • a projection exposure apparatus has a plurality of projection lenses, each of which images an object field into an image field, these image fields being arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection lenses during a scanning process wherein the image fields are arranged in at least two groups extending transversely to the scan direction such that image fields of one group are offset with respect to image fields of the other group transversely to the scan direction, and wherein the image fields are along at least one of the groups a non-linear curves are arranged.
  • the plurality of projection lenses further comprises a third group of projection lenses which generates a third group of image fields arranged with respect to the scanning direction between the first nonlinear curve and the second nonlinear curve.
  • the image fields generated by the individual projection lenses may be smaller than in a double-row arrangement, since more image fields are joined together during the scanning process or overlap to be brought.
  • the individual projection lenses can in turn have smaller optical elements, so that even better space utilization can be achieved.
  • adjacent projection lenses have an inverted arrangement of their optical elements. This results in an even more effective use of space, when relatively larger subsystems or their optical elements are arranged in addition to relatively smaller subsystems or their optical elements, resulting in a total of a space-saving Arrangement leads compared to a structure in which the respective largest optical elements (eg concave mirror) of adjacent lenses are arranged side by side.
  • the respective largest optical elements eg concave mirror
  • the projection objectives in preferred embodiments can e.g. generate an odd number of intermediate images and / or have, for example, a roof prism or a roof mirror image arrangement for image inversion without intermediate image.
  • the present invention also relates to a projection exposure apparatus having a plurality of projection objectives, each of which images an object field into an image field, wherein the image fields are arranged in a substrate region which is movable in a predetermined scanning direction relative to the plurality of projection objectives. and wherein at least some of the projection objectives comprise a first subsystem and at least a second subsystem, wherein the first subsystem is a catadioptric subsystem and the second subsystem is a purely refractive subsystem.
  • the optical axes of the two subsystems can be offset parallel to each other.
  • the intermediate image generated by the first subsystem is then arranged centrically to the optical axis of the second subsystem.
  • Such an arrangement is advantageous in terms of the dimensions of the second, purely refractive subsystem, since the lens groups of the second subsystem are designed to be smaller and also the field dependence of aberrations in the second subsystem is reduced.
  • a pattern to be imaged by the projection objectives is generated in the object fields by a microelectronic-mechanical system (MEMS), in particular one or more digital micromirror devices (DMD).
  • MEMS microelectronic-mechanical system
  • DMD digital micromirror devices
  • Object fields are dispensed relative to the projection lenses, resulting in a significant structural simplification and a reduced adjustment effort result. Furthermore, the complex process of mask production is avoided.
  • the present invention therefore also relates to a projection exposure apparatus having a plurality of projection lenses, each of which images an object field into an image field, wherein the
  • Image fields are arranged in a substrate region, which is movable in a predetermined scanning direction relative to the plurality of projection lenses, and wherein the object fields are arranged relative to the plurality of projection lenses at a fixed position.
  • the invention further relates to a method for the microlithographic production of microstructured components as well as to a microstructured component produced by means of such a method, in particular an LCD device or a Fiat Panel Display.
  • Figure 1 is a schematic perspective view of a structure of a projection exposure apparatus according to the invention with a plurality of projection lenses;
  • 2a-f are schematic representations of arrangements of image fields generated in each case by means of a projection exposure apparatus according to the invention in plan view;
  • FIG. 3 is a schematic representation of
  • FIGS. 5-14 show various embodiments of the individual projection lenses of a projection exposure apparatus according to the invention.
  • Figure 17 is a schematic representation of the arrangement of means of an inventive
  • Projection exposure system generated image fields in plan view according to another embodiment of the invention.
  • Figure 18 is a schematic representation of the structure of a
  • Figure 19a-b is a schematic representation of the structure of a projection exposure apparatus according to another
  • Figure 26 is a schematic perspective view of a structure of an inventive A projection exposure apparatus comprising a plurality of projection lenses according to another embodiment
  • Figure 27 is a schematic perspective view of a structure of a projection exposure apparatus with a plurality of projection lenses according to the prior art.
  • FIG. 28 shows a schematic illustration of the arrangement of image fields generated by means of the projection exposure apparatus of FIG. 27 in plan view.
  • FIG. 1 shows a projection exposure apparatus with a plurality of projection objectives in a schematic perspective view for explaining the principle of the present invention.
  • the projection exposure apparatus 1 has a plurality of illumination systems 10 and a plurality of
  • Dashed lines in Fig. 1 the arrangement of a plurality of object fields 50, which are imaged by the plurality of projection lenses 20 on a plurality of image fields 60.
  • Projection lenses 20 are parallel to each other.
  • Projection lenses and the object or image fields is arbitrary and typically much larger.
  • the arrangement of the projection objectives 20 is selected such that the object fields 50 and the generated image fields 60 (more precisely the respective centers of the object fields 50 and the generated image fields 60) along two mutually concave curves A and B are shown in FIG are arranged, as shown in Fig. 2a, which indicates a schematic plan view of the generated image fields, can be seen even better.
  • FIGS. 2b and 2c respective arrangements with different geometries of image fields 60 '(in FIG. 2b) and 60''(in FIG. 2c) are shown, the image fields 60' having a hexagonal geometry and the image fields 60 '' have a trapezoidal geometry, and wherein the object fields not shown here in each case have the corresponding geometry.
  • FIGS. 2a-c two directions x and y are also indicated in each case for each image field 60, 60 'or 60' ', specifically numbered as xl-x7 or yl-y7 for the different image fields drawn.
  • the directions xl-x7 and yl-y7 are respectively associated with the longest (or, as in FIGS. 2a and 2b, one of several equally long) rectilinear lateral lines, the x-direction being parallel to this lateral line and the y-direction Direction perpendicular to this.
  • the associated y-directions i.e., the directions of the normals on the longest sideline
  • the inventive arrangement of the image fields respectively generating projection lenses can thus also be defined by the criterion that the normal of the longest sideline (s) of the respective image field is at an angle to the scanning direction S, said angle preferably at least 2 ° , preferably at least 3 ° and more preferably at least 4 °.
  • FIG. 2d-f is in a further representation of the corresponding image fields 60, 60 'and 60''respectively the longest connecting line between two vertices designated dl to d7.
  • this connecting straight line corresponds in each case to the diagonal in the rectangular image field 60.
  • FIG. 2 e with hexagonal image fields 60 '
  • This connecting straight line corresponds in each case to the connection between the two outermost, mutually opposite corner points
  • FIG. 2f with trapezoidal image fields 60 " this connecting straight line corresponds to the longest side line of the trapezoid.
  • the associated connecting straight lines dl-d7 are also not parallel to the scanning direction S.
  • the inventive arrangement of the image fields respectively generating projection lenses can thus also be defined by the criterion that the longest connecting line between two vertices of the respective image field is at an angle to the scanning direction S, said angle preferably at least 2 °, preferably at least 3 ° and even more preferably at least 4 °.
  • the object or image fields 50 and 60 are rectangular (as arranged in the object or in an intermediate image plane) field diaphragms 70 and 71 according to FIG. 4, as in FIGS. 2a and 4a, trapezoidal 4b or in any other suitable form such that in the exposure process, in which both the mask holder 31 and the substrate holder 41 are moved in the scanning direction represented by the broad arrows "S", the image fields 60 are formed from the two curves " A "and” B "overlap, as can be seen from the respective dashed lines shown in Fig. 2a-c.
  • Image fields as shown in Fig. 3a or 3b are arranged, are each projection lenses with folded beam path, in Fig. 3b extend the longer center axes of the respective trapezoidal surfaces in the direction of the folded optical axis, these directions are designated pl-p7.
  • the projections of the respective subsections of the optical axis in the substrate plane which are not perpendicular to the substrate plane (but according to FIG. 3b in the direction of the arrows pl-p7), not parallel to the scanning direction but at an angle thereto, this angle is preferably at least 2 °, more preferably at least 3 ° and even more preferably at least 4 °.
  • the projection lenses 20 of the projection exposure system 1 optical elements (especially mirrors and lenses) of larger diameter and thus achieve higher apertures.
  • the arrangement of the projection lenses 20 or the image fields 60 generated thereby is not limited to the specific arrangement illustrated in FIGS. 2 and 3.
  • the desired gain in installation space also occurs on curved curves in another suitable arrangement.
  • the curves A and B, along which the image fields 60 of the projection lenses 20 are arranged are mutually concave curves, which are more preferably arranged mirror-symmetrically to a center axis extending between the curves A and B.
  • the curves A and B may, without the invention being limited thereto, be in particular circular segments, but e.g. also have the shape of other conic sections, such as parabolas or ellipses.
  • a single projection objective 110 can have approximately a purely refractive and unfolded beam path and can be constructed from two subsystems 110 a and 110 b each having two positive lens groups 111, 112 and 113, 114, between which an intermediate image is generated.
  • FIG. 5b a construction of a projection lens 120 with two subsystems 120a and 120b is shown, each with two positive lens groups 121, 122 and 123, 124 and one folding mirror 125 and 126, respectively, with convolution carried out close to the intermediate image.
  • 5c is another variant of a projection lens 130 with folded optical path having two double mirrors 131, 132 and an intermediate image, wherein between the double mirrors 131, 132 a first positive lens group 133, a second negative lens group 134, a third positive lens group 135 and a fourth positive lens group 136 is arranged.
  • a projection objective 140 can also have a roof prism 141 which has an inversion of the generated image and thus an overall positive
  • Image scale in the direction perpendicular to the scan direction is also generated without the presence of an intermediate image.
  • the projection lens 140 shown has a folding mirror 142, a positive lens group 143, a negative lens group 144 near a concave mirror 145, and the roof prism 141.
  • the projection lens 140 shown is of the Dyson type, which in the sense of the present application means objectives which have a system with a concave mirror (here: "145") and a positive lens group (here: "143").
  • the term “Dyson type” is also to be understood systems in which this concave mirror and the positive lens group are not necessarily arranged concentric with each other and in which (as shown here) also a negative lens group 144 arranged on the concave mirror 145 for correcting chromatic aberrations can be.
  • a projection objective 150 in a modification of the projection objective 140, may also have a plane mirror 155 instead of the concave mirror 145, wherein otherwise functionally identical parts are shown with reference numerals increased by "10".
  • a projection lens 160 can also be constructed as a catadioptric system of the offner type, which in the context of the present application means objectives which are constructed by a system having a concentric sequence in the beam path comprising a concave mirror, a convex mirror and the concave mirror.
  • the projection lens 160 shown includes a folding mirror 161, a concave mirror 162, a convex mirror 163 (at which the beams are reflected both before and after the concave mirror 162) and a roof prism 164.
  • the roof prism can also be replaced by corresponding mirror arrangements in which, in contrast to the prism, the reflective surfaces 171, 172 (in FIGS. 9a) and 173, 174 (in FIG. 9b) are on the outside, and analogously to Dachkantprisma image reversal in only one spatial direction (eg x-direction) is achieved, with reference to the thinner, continuous lines in each case the course of two beams sl, s2 (in Fig. 9a) or s3, s4 (in Fig. 9b) is indicated ,
  • each of the Dyson type in a projection lens 180, two partial systems 180a and 180b, each of the Dyson type, may be combined with each other, or between them, between which an intermediate image is formed.
  • Each of the subsystems 180a, 180b has a double-fold mirror 181a, 181b, a positive lens group 182a, 182b, a negative lens group 183a, 183b, and a concave mirror 184a, 184b, respectively.
  • two subsystems 190a and 190b, one of the Offner type and one of the Dyson type may be combined with each other, between which an intermediate image IMI is formed.
  • the Offner-type subsystem 190a includes a folding mirror 191, a concave mirror 192, a convex mirror 193, and a folding mirror 194.
  • the Dyson type subsystem 190b includes a folding mirror 195, a positive lens group 196, a negative lens group 197, a concave mirror 198, and a second folding mirror 199.
  • the optical axes of the two subsystems 190a and 190b do not have to match, which is advantageous in terms of the dimensions of the Dyson type subsystem S2.
  • two partial systems 200a and 200b each of which is of the offner type, may also be combined or arranged successively, between which an intermediate image is formed.
  • Each of the Offner-type subsystems 200a and 200b has a folding mirror 201a and 201b, a concave mirror 202a and 202b, a convex mirror 203a and 203b and a folding mirror 204a and 204b, respectively.
  • two subsystems 210a and 210b may also be combined or arranged successively, between which an intermediate image is formed.
  • the Dyson type subsystem 210a includes a folding mirror 211, a positive lens group 212, a negative lens group 213, a concave mirror 214, and a second folding mirror 215.
  • the purely refractive subsystem 210b has two positive lens groups 216 and 217 on. Again, the optical axes of the two subsystems 210a and 210b do not have to match, which is advantageous in terms of the dimensions of the purely refractive subsystem 210b.
  • the optical axes of the two subsystems have a parallel offset from one another, with the intermediate image, which is generated by the first subsystem 210a, being arranged centrically relative to the optical axis of the second subsystem 210b, as shown in FIG.
  • the second subsystem 210b may be centered to the intermediate image.
  • two subsystems S1 and S2 may also be combined or arranged successively, between which an intermediate image IMI is formed.
  • Offner type comprises a folding mirror 221, a concave mirror 222, a convex mirror 223 and a folding mirror 224.
  • the purely refractive subsystem S2 has two positive lens groups 225 and 226. Again, the optical axes of the two subsystems Sl and S2 do not have to match, which is advantageous in terms of the dimensions of the purely refractive subsystem S2, to which reference is made to the comments on Fig. 13.
  • Embodiments based thereon and explained below are based on the fact that in the above embodiments of the individual projection objective, in each case the installation space required by an offer-type subsystem is greater than the space required by a subsystem of the Dyson type, which in turn is greater than the space required by a purely refractive subsystem. This circumstance is taken into account in the following two exemplary embodiments by the choice of a relative arrangement of successive projection objectives which is favorable in each case with regard to the installation space.
  • a first projection lens 230 combines, successively, a first subsystem 230a of the offner type and a second subsystem 230b of the dyson type, which is thus shown in FIG.
  • Structure corresponds to the projection lens 190 of FIG. 11.
  • Adjacent to the first projection objective 230 is a second projection objective 240 which, in combination, has a first subsystem 240a of the Dyson type and a second subsystem 240b of the offner type.
  • a first projection lens 250 combines, respectively, a first subsystem 250a of the purely refractive type and a second subsystem 250b of the Dyson type.
  • Adjacent to the first projection lens 250 is a second projection lens 260, which is combined or successively having a first subsystem 260a of the Dyson type and a second purely refractive subsystem 260b, so that the second projection system 260 in construction corresponds to the projection objective 210 of FIG.
  • FIGS. 15 and 16 can each be continued analogously along a respective row of projection objectives 20 according to FIG. 1, so that a further saving in construction space results from relatively larger subsystems or their optical elements besides relatively smaller ones Subsystems or their optical elements are arranged, resulting in an overall space-saving arrangement or a larger space utilization (for example, compared to a structure in which, for example, the large concave mirrors from different Offner systems 230a, 240b are arranged in adjacent projection lenses side by side) ,
  • the projection objectives in a projection exposure apparatus can also be arranged in three (instead of two) rows, wherein in turn the projection objectives in the two outer rows are preferably arranged such that according to FIG 17 the generated image fields along two concave ones
  • Curves A and B are arranged, between which then lie the image fields generated by the projection lenses in the middle row, again according to FIG. 17 in a staggered arrangement such that the image fields 60 generated during the scanning process match and overlap one another.
  • the image fields generated by the individual projection lenses may be smaller than approximately in a double-row arrangement, as more image fields are joined or overlapped during the scanning process.
  • the individual projection lenses can in turn have smaller optical elements, so that better space utilization can be achieved, in particular in connection with the previously described arrangements (eg, according to FIGS. 15 and 16).
  • FIG. 18 A (merely exemplary and non-limiting) construction of three projection lenses (arranged along the dashed line as viewed from the direction "aa” of Fig. 17) is shown in Fig. 18.
  • the image fields are formed on the middle one Curve "C" purely refractive systems are used, which according to FIG. 18, for example a first subsystem 300a of a first positive group 301 and a second positive group 302, and a second subsystem 300bb of a first positive group 303 and a second positive group 304, between which an intermediate image is generated.
  • the projection lenses for generating the image fields on the outer (curved) curves "A" and "B” projection lenses come with the structure of explained in connection with FIG. 18
  • Projection lens 180 are used, in each of which two partial systems 180a and 180b, each of the Dyson type, are combined or arranged successively, between which an intermediate image is formed.
  • DMD deformable micromirror device
  • the light can be selectively coupled into or out of the beam path of the objective so that an electronically controlled modulation of the light coupled into the objective (which is otherwise achieved, for example, by chromium coating on a conventional reticle) is achieved ,
  • the use of DMD's in the projection exposure apparatuses according to the invention has the further advantage that for the production of the positive Ab Strukturs AnlagenStabes or The upright image orientation can be dispensed with the production of intermediate images, since the correct orientation of the images on the use of the DMD 's electronically controlled in the desired manner.
  • the plurality of projection lenses are arranged so that the generated image fields are arranged along a plurality of rows. This may in particular be both two rows (analogous to FIG. 2) and three rows (analogous to FIG. 17), these two rows (or, in the case of three rows according to FIG Fig. 17, the two outer rows) again preferably have the shape of concave curves in order to achieve the above-described advantageous enlargement of the available space.
  • this therefore also generally relates to a projection exposure apparatus having a
  • a plurality of projection objectives in which at least one MEMS ( “microelectromechanical system”), in particular a DMD, is used to generate an object field to be imaged by the projection objectives.
  • MEMS microelectromechanical system
  • DMD digital light detector
  • FIGS. 19-24 show different embodiments of imaging systems with the use of DMDs, which differ in particular with regard to the coupling of the illumination light.
  • the illumination light generated by a light source 401 with illumination optics 402 is coupled in via a beam splitter cube 403, which directs the light reflected at its partially transmissive layer 404 to the DMD 405, from where that on the DMD structure according to FIG electronic control reflected light after passing through the partially transparent layer 404 enters a lens 406.
  • the light coming from the light source 401 and the illumination optics 402 can also initially be deflected at a tilt mirror 407.
  • Beam splitter cube 413 with semitransparent layer 414 and DMD 415 is shown in FIG. 20, where the light coming from the DMD 415, after passing through the beam splitter cube 413, passes through a refractive group 416 and two plane mirror surfaces 417, 418, between which an intermediate image is produced.
  • a folding mirror 419 folds the beam path to the image plane.
  • Beam splitter cube 423 with semitransparent layer 424 and DMD 425 is shown in FIG. 21, wherein the beam path after the beam splitter cube 423 includes a positive lens group 424, a negative lens group 425 and a concave mirror 426 and a folding mirror 427.
  • FIG. 4 Another possible arrangement of an imaging system 430 with light source 431, illumination optics 432, beam splitter cube 433 with semitransparent layer 434, and DMD 435 is shown in FIG.
  • Lens group 436 between the beam splitter cube 433 and DMD 435 and another positive lens group 437 between the beam splitter cube 433 and the image plane are arranged.
  • the positive lens group 436 forms both a part of the illumination system and a part of the projection lens, since they are from both the DMD 435 and the DMD 435 coming rays is going through. The lighting is coupled close to the pupil in the lens.
  • FIGS. 23 and 24 show imaging systems 440 and 450 without beam splitter cube, in which the illumination light is coupled obliquely into the DMD (directly according to FIG. 23 or via a folding mirror 453 according to FIG. 24) before it has been reflected on the DMD 443 and 454 respectively passes through the respective projection objective 444 or 455.
  • the object to be imaged can also be composed of several DMDs.
  • an optical composition of the field segments by means of additional systems.
  • FIG. 25 schematically shows an arrangement 500 in which, for example, three segments can be combined which correspond to three different DMDs 501, 502 and 503.
  • the illumination of the DMDs 501, 502 and 503 occurs from a light source 508 via a common illumination optic 504 and is coupled by means of a beam splitter cube 505 into a positive lens group 506, after which the three segments are merged representing the three different DMDs 501 , 502 and 503 respectively.
  • the merged segments are mapped either directly or as shown in FIG. 25 via a projection objective 507 onto the substrate plane or the wafer.
  • the number of three DMD 's is merely exemplary, so that two or more than three DMD' s can be combined in an analogous manner.
  • Imaging systems or projection lenses arranged so the generated image fields are arranged along several rows.
  • Projection exposure apparatus 600 is shown in FIG. 26, wherein the illumination optics 601 with light sources 602 as well as the DMDs 603 and the projection objectives 604 have the relative arrangements shown in FIG.
  • the arrangement in rows can again in particular both in two rows (analogous to FIG. 2) and in three rows
  • these two rows (or, in the case of three rows according to FIG. 17, the two outer rows) again preferably having the shape of concave curves in order to achieve the advantageous enlargement of the available one described above To achieve space.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

La présente invention concerne une installation d'éclairage par projection (1) comprenant une pluralité d'objectifs de projection (10) qui représentent chacun un champ objet (50) dans un champ image (60). Les champs image (60) se trouvent dans une zone de substrat (40) dans un plan de substrat. La zone de substrat (40) peut se déplacer dans une direction de balayage prédéfinie (5) par rapport à la pluralité d'objectifs de projection. Au moins un de ces objectifs de projection présente une section partielle de son axe optique qui n'est pas perpendiculaire au plan du substrat et la projection de cette section partielle dans le plan du substrat n'est pas parallèle à la direction de balayage (5).
PCT/EP2006/063663 2005-07-01 2006-06-28 Installation d'eclairage par projection comprenant une pluralite d'objectifs de projection Ceased WO2007003563A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008518844A JP6116788B2 (ja) 2005-07-01 2006-06-28 複数の投影対物レンズを備えた投影露光装置
KR1020127008773A KR101407797B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치
KR20077030366A KR101478832B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005030839A DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
DE102005030839.2 2005-07-01

Publications (1)

Publication Number Publication Date
WO2007003563A1 true WO2007003563A1 (fr) 2007-01-11

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PCT/EP2006/063663 Ceased WO2007003563A1 (fr) 2005-07-01 2006-06-28 Installation d'eclairage par projection comprenant une pluralite d'objectifs de projection

Country Status (4)

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JP (2) JP6116788B2 (fr)
KR (2) KR101407797B1 (fr)
DE (1) DE102005030839A1 (fr)
WO (1) WO2007003563A1 (fr)

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JP5782336B2 (ja) 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
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JP7623915B2 (ja) * 2021-09-14 2025-01-29 株式会社アドテックエンジニアリング 直描式露光装置

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Also Published As

Publication number Publication date
KR101407797B1 (ko) 2014-06-17
DE102005030839A1 (de) 2007-01-11
JP6063637B2 (ja) 2017-01-18
JP6116788B2 (ja) 2017-04-19
KR20120040755A (ko) 2012-04-27
KR20080022125A (ko) 2008-03-10
JP2012168550A (ja) 2012-09-06
JP2008545153A (ja) 2008-12-11
KR101478832B1 (ko) 2015-01-02

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