WO2007097209A1 - Epoxy resin composition - Google Patents
Epoxy resin composition Download PDFInfo
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- WO2007097209A1 WO2007097209A1 PCT/JP2007/052325 JP2007052325W WO2007097209A1 WO 2007097209 A1 WO2007097209 A1 WO 2007097209A1 JP 2007052325 W JP2007052325 W JP 2007052325W WO 2007097209 A1 WO2007097209 A1 WO 2007097209A1
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- epoxy resin
- resin composition
- component
- insulating layer
- composition according
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/38—Epoxy compounds containing three or more epoxy groups together with di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/012—Flame-retardant; Preventing of inflammation
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
Definitions
- the present invention relates to an epoxy resin composition, and more particularly to an epoxy resin composition suitable for forming an insulating layer of a multilayer printed wiring board.
- Conductive layer formation methods suitable for forming high-density wiring include the additive method of forming a conductive layer by electroless plating after roughening the surface of the insulating layer, and conductive layers by electroless plating and electrolytic plating.
- the semi-additive method of forming is known. Therefore, the epoxy resin composition used for forming the insulating layer of the multilayer printed wiring board is required to have high adhesion with the plating conductor layer.
- Patent Document 1 discloses a method of using a phenol resin having a thioalkyl group as a curing agent in a resin sealing resin composition.
- Patent Document 1 Japanese Patent Laid-Open No. 2001-214037
- Patent Document 2 Japanese Patent No. 3108412
- Patent Document 3 Japanese Patent Laid-Open No. 2004-339277
- thioalkyl group-containing phenol resin has a tendency to reduce the storage stability of the resin composition. Furthermore, according to the knowledge of the present inventor, The flame retardant effect of thioalkyl group-containing phenol resin is not always sufficient, for example
- the content of inorganic fillers such as silica is 70 to 95% by mass.
- the reduction of flame retardancy becomes a significant problem.
- the present invention has been made in view of the above circumstances, and a problem to be solved is an epoxy resin composition suitable for use as an insulating layer of a multilayer printed wiring board, Epoxy that can achieve sufficient flame retardancy without depending on the rogen flame retardant and phosphorus flame retardant, and has excellent storage stability and adhesion strength of the insulating layer (interlayer insulating layer) to the plating conductor
- the object is to provide a fat composition.
- the present invention includes the following contents.
- An epoxy resin composition comprising a material.
- the naphthol-based curing agent of component (B) is represented by the following formula (1): [0008] [Chemical 1]
- R1 to R4 each independently represent a hydrogen atom or an alkyl group
- XI may be each substituted with an alkyl group
- Y may each be substituted with an alkyl group.
- j and k each represent an average value of 1 to 15.
- R5 represents a hydrogen atom or an alkyl group
- R6 represents a thioalkyl group
- X2 is each substituted with an alkyl group
- j and k are Each represents an average value of 1 to 15
- m represents an integer of 1 to 5.
- R1 to R4 each independently represent a hydrogen atom or an alkyl group
- XI may be each substituted with an alkyl group
- Y represents each substituted with an alkyl group.
- a thioalkyl group-containing phenolic curing agent of component (C) represented by the following formula (2 ') :
- R5 represents a hydrogen atom or an alkyl group
- R6 represents a thioalkyl group
- X2 is each substituted with an alkyl group, and represents a benzene ring or a naphthalene ring
- n represents an average value.
- the aromatic epoxy resin of component (A) is an aromatic epoxy resin that has two or more epoxy groups in the (Al) 1 molecule and is liquid at a temperature of 20 ° C. And (A2) a second epoxy resin that has 3 or more epoxy groups in one molecule and is a solid aromatic epoxy resin at a temperature of 20 ° C.
- the epoxy resin composition according to any one of [1] to [7] above.
- the epoxy equivalent of the second epoxy resin of component (A2) is 230 or less, [8] The epoxy resin composition described.
- the nonvolatile component of the epoxy resin composition is 100% by mass
- the content of the aromatic epoxy resin of component (A) is 10 to 50% by mass
- the epoxy resin composition contains
- the ratio of phenolic hydroxyl groups in the naphthol-based curing agent of component (B) and the thioalkyl group-containing phenolic curing agent of component (C) to the existing epoxy groups is 1: 0.5 to 1: 1.5.
- the epoxy resin composition according to any one of the above.
- a pre-preda wherein the epoxy resin composition according to any one of [1] to [14] is impregnated in a sheet-like reinforcing base material having a fiber strength.
- a method for producing a multilayer printed wiring board comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer comprises the above [1] to [ 14] It is formed by thermosetting the epoxy resin composition according to any one of the above, and the conductor layer is formed by copper plating on a rough surface obtained by roughing the surface of the insulating layer.
- a method for producing a multilayer printed wiring board comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer comprises the above [1] to [ 14] It is formed by thermosetting the epoxy resin composition according to any one of the above, and the conductor layer is formed by copper plating on a rough surface obtained by roughing the surface of the insulating layer.
- a method for producing a multilayer printed wiring board comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer is the above [15]
- the adhesive film is laminated on the inner circuit board, and the epoxy resin composition is heat-cured with or without peeling off the support film, and the support film is peeled off when the support film is present after curing.
- the method for producing a multilayer printed wiring board wherein the conductor layer is formed by copper plating on a rough surface obtained by roughening the surface of the insulating layer.
- a method for producing a multilayer printed wiring board comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer is the pre-preda
- the conductive layer is formed by copper plating on a roughened surface obtained by roughening the surface of the insulating layer.
- the “aromatic epoxy resin having two or more epoxy groups in one molecule” of the component (A) in the present invention is not particularly limited, and examples thereof include a cresol novolac type epoxy resin and a phenol novolac type.
- Epoxy resin, tert-butyl-catechol type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene type epoxy resin, glycidylamine type Examples include epoxy resin. Those containing a halogen atom are not preferred.
- the aromatic epoxy resin referred to in the present invention means an epoxy resin having an aromatic ring skeleton in the molecule.
- the epoxy resin of component (A) may be used alone or in combination of two or more.
- (Al) 1st epoxy resin that has 2 or more epoxy groups in one molecule and is liquid aromatic epoxy resin at a temperature of 20 ° C and (A2) 3 or more in 1 molecule
- An embodiment in which a “second epoxy resin” having an epoxy group and being a solid aromatic epoxy resin at a temperature of 20 ° C. is used in combination is preferable.
- the second epoxy resin has an epoxy equivalent of 230 or less Particularly preferred are those having a more preferred epoxy equivalent weight in the range of 150-230.
- the resin composition is used in the form of an adhesive film.
- an adhesive film exhibiting sufficient flexibility excellent in handling and properties
- the breaking strength of the cured resin composition is improved, and the durability of the multilayer printed wiring board is improved.
- examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, tert-butyl catechol type epoxy resin, naphthalene type epoxy resin, and glycidylamine type epoxy resin.
- the first epoxy resin (A1) may be used alone or in combination of two or more.
- the first epoxy resin (A1) may be liquid at a temperature of less than 20 ° C.
- epoxy resins include HP4032 (Dainippon Ink Chemical Co., Ltd.), HP4032D (Dainippon Ink Chemical Co., Ltd.), jER807 (Epicoat 807)
- HP4032 Dainippon Ink Chemical Co., Ltd.
- HP4032D Dainippon Ink Chemical Co., Ltd.
- jER807 Epicoat 807)
- Japan Epoxy Resin Co., Ltd. Japan Epoxy Resin Co., Ltd.
- jER828EL Epicoat 828EL
- jER152 Epicoat 152
- Japan Epoxy Resin Co., Ltd. Japanese Epoxy Resin Co., Ltd.
- (A2) “second epoxy resin having 3 or more epoxy groups in one molecule and being a solid aromatic epoxy resin at a temperature of 20 ° C.” includes, for example, naphthalene Type epoxy resin, epoxy resin (trisphenol type epoxy resin) of condensates of phenols and aromatic aldehydes having a phenolic hydroxyl group.
- the second epoxy resin (A2) has an epoxy equivalent of 150 to 230, preferably having an epoxy equivalent of 230 or less in order to improve physical properties such as glass transition temperature of the resin composition. Those in the range are more preferred.
- the second epoxy resin (A2) has the following meaning: “A molecule having 3 or more epoxy groups, an epoxy equivalent of 230 or less, and a solid aromatic compound at a temperature of 20 ° C. "Epoxy resin” that has 3 or more epoxy groups in one molecule, and has an epoxy equivalent of 150-230 and is a solid aromatic epoxy resin that is solid at a temperature of 20 ° C. It is more preferable that Even if one second epoxy resin (A2) is used, two or more A combination of the above may be used. The second epoxy resin (A2) may be in a solid state at a temperature exceeding 20 ° C.
- epoxy resins include HP 4700 (EXA4700) (tetrafunctional naphthalene type epoxy resin, epoxy equivalent 163, solid) manufactured by Dainippon Ink & Chemicals, Inc., N— 690 (Crezo novolac epoxy resin, epoxy equivalent 208, solid), N—695 (Crezo novolac epoxy resin, epoxy equivalent 208, solid), EPP N— 502H (Trisphenol) from Nippon Kayaku Co., Ltd. Epoxy resin, epoxy equivalent 168, solid), NC7000L (naphthol novolac epoxy resin, epoxy equivalent 228, solid), NC3000H (biphenyl epoxy resin, epoxy equivalent 290, solid), manufactured by Tohto Kasei Co., Ltd. ESN185 (naphtholene novolak type epoxy resin, epoxy equivalent 275, solid), ESN475 (naphthol nopolac type epoxy resin, epoxy equivalent 350, solid) and the like.
- the blend ratio (A1: A2) of the epoxy resin (A2) is preferably in the range of 1: 0.3 to 2 in terms of mass ratio, more preferably in the range of 1: 0.5 to 1. If the ratio of the first epoxy resin (A1) is too large beyond the range, it will increase the tackiness of the resin composition and, when used in the form of an adhesive film, deaeration during vacuum lamination Tends to decrease and voids tend to occur. In addition, the peelability of the protective film and the support film during vacuum lamination tends to decrease, and the heat resistance after curing tends to decrease.
- the epoxy resin content of the component (A) when the nonvolatile component of the epoxy resin composition is 100% by mass, the epoxy resin content of the component (A) is 10 to 50% by mass. More preferably, it is 20 to 40% by mass, and particularly preferably 20 to 35% by mass. Content power of epoxy resin (A) S If this range power is also removed, the curability of the resin composition tends to decrease. In addition, the epoxy resin composition of the present invention has a range in which the effect of the present invention is exhibited (usually 50% when the nonvolatile component of the epoxy resin composition is 100% by mass). In addition to component (A), other epoxy resins may be included.
- naphthol curing agent in the present invention means a compound having two or more naphthol structures in one molecule and acting as a curing agent for epoxy resin (A).
- the naphthol-based curing agent represented by the following formula (1 ') is particularly preferable, and the naphthol-based curing agent represented by the following formula (1) is particularly preferable.
- R1 to R4 each independently represents a hydrogen atom or an alkyl group
- XI may be each substituted with an alkyl group
- Y represents each substituted with an alkyl group.
- j and k each represent an average value of 1 to 15.
- R1 to R4 each independently represent a hydrogen atom or an alkyl group
- XI may be each substituted with an alkyl group
- Y represents each substituted with an alkyl group.
- the alkyl group in the formula is preferably an alkyl group having 1 to 3 carbon atoms, particularly preferably a methyl group.
- the “thioalkyl group-containing phenolic curing agent” in the present invention has one or more thioalkyl groups in one molecule and one or more phenol and / or naphthol structures in one molecule, and is a curing agent for epoxy resin (A).
- A curing agent for epoxy resin
- thioalkyl group-containing phenolic curing agent a thioalkyl group-containing phenolic agent represented by the following formula (2 '), which is preferably a thioalkyl group-containing phenolic curing agent represented by the following formula (2):
- a curing agent is particularly preferred.
- R5 represents a hydrogen atom or an alkyl group
- R6 represents a thioalkyl group
- X2 is each substituted with an alkyl group, and represents a benzene ring or a naphthalene ring
- j and k are Each represents an average value of 1 to 15, and m represents an integer of 1 to 5.
- R5 represents a hydrogen atom or an alkyl group
- R6 represents a thioalkyl group
- X2 is each substituted with an alkyl group, and may represent a benzene ring or a naphthalene ring
- n represents an average value.
- a plurality of R6 need not be the same, each independently selected from a hydrogen atom, an alkyl group, or a thioalkyl group. It may be a group.
- the alkyl group an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is particularly preferable.
- the thioalkyl group an alkyl group having 1 to 3 carbon atoms is preferred. In particular, a thiomethyl group is preferred.
- the average hydroxyl group content P ((total number of hydroxyl groups) in one molecule as represented by the above formula (1), formula (1 ′), formula (2) and formula (2 ′).
- a phenol-based curing agent having an average value of Z total benzene ring number) of 0 ⁇ P ⁇ 1 a coarse product obtained by subjecting the cured product of the epoxy resin composition of the present invention to a rough treatment.
- the surface can be made finer and more suitable for high-density wiring.
- the naphthol curing agent of component (B) is more preferably represented by the following formula (3).
- R7 represents a hydrogen atom or a methyl group
- Z represents a naphthalene ring
- n represents an average value of 1 to 15.
- naphthol-based curing agent represented by the powerful formula (3) examples include NHN (Z: naphthalene ring, R7: methyl group, average hydroxyl group content: 3Z5 to 2Z3 manufactured by Nippon Kayaku Co., Ltd. And CBN (Z: naphthalene ring, R7: methyl group, average hydroxyl group content: 3Z5 to 2Z3, see the figure below).
- the thioalkyl group-containing phenolic curing agent of component (C) is more preferably one represented by the following formula (4).
- thioalkyl group-containing phenolic curing agent represented by the formula (4) include YLH1110L (average hydroxyl group content: 1Z2 to 2Z3) manufactured by Japan Epoxy Resin Co., Ltd.
- the mixing ratio of the components) and (C) is preferably in the range of 1: 0.1 to 1: 1.5 in terms of mass ratio, in the range of 1: 0.1 to 1: 1. More preferably. If the proportion of the phenolic curing agent containing a thioalkyl group as the component (C) is too small, the adhesion between the insulating layer formed by the epoxy resin composition and the conductive conductor layer tends to decrease. There is a tendency for the storage stability of rosin to decrease.
- the epoxy resin composition of the present invention includes a phenol other than component (B) and component (C).
- a system curing agent may be blended.
- 50% by mass or more of the total phenolic hardener in the composition is the component (B) and the component (C) in order to sufficiently exhibit the effects of the present invention. More preferably, 70% by mass or more, particularly 90% by mass or more is preferably component (B) and component (C).
- the amount of the phenolic curing agent in the epoxy resin composition (the total amount when only the component (B) and the component (C) are used, or the component (B) and the component (C)
- the total amount of those used in combination with other phenolic curing agents is usually the total number of epoxy groups present in the epoxy resin composition and the phenolic hydroxyl groups of the phenolic curing agent. It is preferable to set the ratio so that the ratio of the total number is 1: 0.1 to 1: 1.5, and it is more preferable to set the ratio so that the ratio is 1: 0.3 to 1: 1.
- the total number of epoxy groups present in the epoxy resin composition is the total value of all epoxy resins obtained by dividing the solid mass of each epoxy resin by the epoxy equivalent.
- the total number of phenolic hydroxyl groups in the phenolic hardener is the total number of phenolic hardeners obtained by dividing the solid mass of each phenolic hardener by its phenolic hydroxyl group equivalent. Is the total value of. If the content of the phenol-based curing agent is outside the preferable range, the heat resistance of the cured product obtained by curing the resin composition may be insufficient.
- the inorganic filler of component (D) increases the flame retardancy of the epoxy resin composition and contributes to a decrease in the coefficient of thermal expansion.
- inorganic fillers include silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, and titanium.
- examples thereof include barium oxide, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, calcium zirconate, and among these, silica is particularly preferable.
- the average particle size of the inorganic filler is preferably 1 ⁇ m or less, more preferably 0.8 m or less, and particularly preferably 0.7 ⁇ m or less. When the average grain size exceeds 1 ⁇ m, it tends to be disadvantageous for the formation of fine wiring. If the average particle size force of the inorganic filler becomes too small, the viscosity of the varnish tends to increase and the handleability tends to decrease when the epoxy resin composition is made into a resin varnish.
- the diameter is preferably 0.05 m or more.
- Inorganic filler is moisture resistant In order to improve this, what is surface-treated with a surface treatment agent such as a silane coupling agent is preferable.
- the average particle size of the inorganic filler can be measured by a laser diffraction 'scattering method based on Mie scattering theory. Specifically, it can be measured by creating a particle size distribution of an inorganic filler on a volume basis with a laser diffraction particle size distribution measuring device and setting its median diameter as an average particle size.
- an inorganic filler dispersed in water by ultrasonic waves can be preferably used.
- LA-500 manufactured by Horiba, Ltd. can be used as a laser diffraction type particle size distribution measuring apparatus.
- the content ratio with respect to the resin composition (non-volatile content: 100% by mass) varies depending on the properties required for the resin composition.
- Formation of interlayer insulating layer of multilayer printed wiring board When used in the above, it is preferably 20 to 60% by mass, more preferably 25 to 50% by mass, and particularly preferably 30 to 45% by mass. If the amount of the inorganic filler is too large, the adhesion strength between the insulating layer and the conductive conductor layer tends to decrease, and the cured product of the epoxy resin composition tends to become brittle. On the other hand, if the amount is too small, the flame retardancy of the cured product tends to decrease and the coefficient of thermal expansion tends to increase.
- the epoxy resin composition of the present invention may contain poly (bullacetal) resin for the purpose of increasing the adhesion strength of the metallic conductor.
- the polyvinyl acetal resin is not particularly limited, but a polyvinyl butyral resin is preferable.
- Specific examples of polyvinylacetal resin include: Electric Chemical Industry Co., Ltd., Electric Butyral 4000-2, 5000—A, 600 0—C, 6000—EP, Sekisui Chemical Co., Ltd. ESREC BH series, BX Series, KS series, BL series, BM series etc.
- the polyvinyl acetal particularly preferably has a glass transition temperature of 80 ° C or higher.
- the “glass transition temperature” here is determined in accordance with the method described in IS K 7197. When the glass transition temperature is higher than the decomposition temperature and no glass transition temperature is actually observed, the decomposition temperature can be regarded as the glass transition temperature in the present invention.
- the decomposition temperature is defined as the temperature at which the mass reduction rate is 5% when measured according to the method described in JIS K 7120.
- the non-volatile component of the epoxy resin composition is 10%.
- the content ratio of polybutelacetal is preferably 2 to 20% by mass.
- the epoxy resin composition of the present invention may contain phenoxy resin for the purpose of improving the flexibility of the adhesive film.
- the phenoxy resin is not particularly limited, and a known phenoxy resin can be used.
- the content of the phenoxy resin is preferably in the range of 3 to 30% by mass.
- Specific examples of phenoxy resin include FX280 and FX293 manufactured by Toto Kasei Co., Ltd., YX8100, YL6954 and YL6974 manufactured by Japan Epoxy Resin Co., Ltd.
- the epoxy resin composition of the present invention may contain rubber particles for the purpose of increasing the mechanical strength of the cured product.
- the rubber particles include core-shell type rubber particles, cross-linked acrylonitrile butadiene rubber particles, cross-linked styrene butadiene rubber particles, acrylic rubber particles and the like.
- the core-shell type rubber particles are rubber particles having a core layer and a shell layer.
- the outer shell layer is a glassy polymer and the inner core layer is a rubbery polymer, or an outer layer.
- the glass layer is made of, for example, a polymer of methyl methacrylate
- the rubbery polymer layer is made of, for example, a butyl acrylate polymer (butyl rubber).
- core-shell type rubber particles include Staphyloid AC3832, AC3816N (Ganz Kasei Co., Ltd. trade name), Metaprene KW-4426 (Mitsubishi Rayon Co., Ltd. trade name).
- Specific examples of Atariguchi-tolyl butadiene rubber (NBR) particles include: ⁇ -91 (average particle size 0.5 ⁇ m, manufactured by JSR Corporation).
- SBR particles include XSK-500 (average particle size 0, manufactured by Co., Ltd.).
- acrylic rubber particles include Metapuren W300A (average particle size 0. 1 m), W450A (flat Hitoshitsubu ⁇ 0. 2 ⁇ ⁇ ⁇ ) (manufactured by Mitsubishi Rayon Co., Ltd.).
- the content ratio with respect to the resin composition is a force of 1 to 10% by mass, which varies depending on the properties required for the resin composition. Furthermore, 2 to 5% by mass is more preferable.
- the epoxy resin composition of the present invention may contain a curing accelerator for the purpose of adjusting the curing time.
- the curing accelerator include organic phosphine compounds and imidazoles. Compounds, amine adduct compounds, tertiary amine compounds and the like. Specific examples of organic phosphine compounds include TPP, ⁇ — ⁇ , ⁇ —S, TPTP—S (Hokuko Chemical Industries).
- imidazole compounds include cure azole
- the content of the curing accelerator is usually when the total amount of epoxy resin and phenolic curing agent contained in the epoxy resin composition is 100% by mass (solid content). 0.1 Used in the range of 1-5% by mass.
- the epoxy resin composition of the present invention may contain a flame retardant as long as the effects of the present invention are exhibited.
- a flame retardant As long as the effects of the present invention are exhibited.
- the use of halogen-based flame retardants is becoming difficult due to environmental problems such as dioxin in recent years, and the use of phosphorus-based flame retardants, such as the impact on the environment, is being suppressed. It is preferable to contain no flame retardant or as little as possible. Since the epoxy resin composition of the present invention can achieve sufficient flame retardancy without containing a halogen element and a phosphorus element, it can be an epoxy resin composition that is excellent in terms of environment.
- the epoxy resin composition of the present invention may contain other resin additives other than those described above as long as the effects of the present invention are exhibited.
- oil additives include silicone powders, organic fillers such as nylon powder and fluorine powder, thickeners such as olben and benton, silicone-based, fluorine-based and polymer-based antifoaming agents or leveling agents. , Imidazole series, thiazole series, triazole series, adhesion imparting agents such as silane coupling agents, and coloring pigments.
- the epoxy resin composition of the present invention is applied to a support film to form a resin composition layer to form an adhesive film for a multilayer printed wiring board, or a sheet-like reinforcing substrate that also has fiber strength.
- the resin composition can be impregnated into a prepreg for an interlayer insulating layer of a multilayer printed wiring board.
- the epoxy resin composition of the present invention is applied to a circuit board to form an insulating layer. However, industrially, it is generally used for forming an insulating layer in the form of an adhesive film or a pre-preda.
- the adhesive film of the present invention is prepared by a method known to those skilled in the art, for example, by preparing a resin varnish obtained by dissolving a resin composition in an organic solvent, and applying this resin varnish using the support film as a support. Further, the organic solvent can be dried by heating or blowing hot air to form a resin composition layer.
- Examples of the organic solvent include ketones such as acetone, methyl ethyl ketone, and cyclohexanone, and acetic acid esters such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate.
- Carbitols such as cellosolve and butyral carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. Two or more organic solvents may be used in combination.
- the drying conditions are not particularly limited, but the drying is performed so that the content of the organic solvent in the resin composition layer is usually 10% by mass or less, preferably 5% by mass or less.
- Different forces depending on the amount of organic solvent in the varnish For example, a varnish containing 30 to 60% by mass of an organic solvent can be dried at 50 to 150 ° C. for about 3 to 10 minutes.
- Those skilled in the art can appropriately set suitable drying conditions by simple experiments.
- the thickness of the resin composition layer formed in the adhesive film is usually not less than the thickness of the conductor layer. Since the thickness of the conductor layer of the circuit board is usually in the range of 5 to 70 m, the thickness of the resin composition layer is preferably 10 to: LOO m.
- the resin composition layer may be protected by a protective film described later. By protecting with a protective film, it is possible to prevent adhesion or scratches of dust or the like to the surface of the resin composition layer.
- Examples of the support film and protective film in the present invention include polyolefins such as polyethylene, polypropylene, and polychlorinated butyl, polyethylene terephthalate (hereinafter sometimes abbreviated as "PET"), polyesters such as polyethylene naphthalate, and polycarbonate. Examples thereof include polyimide, and metal foil such as release paper, copper foil, and aluminum foil.
- the support film and the protective film may be subjected to a release treatment in addition to the mud treatment and the corona treatment.
- the thickness of the support film is not particularly limited, but is usually 10 to 150 ⁇ m, and preferably 25 to 50 / ⁇ ⁇ .
- the thickness of the protective film is not particularly limited, but is usually 1 to 40 / ⁇ ⁇ , preferably 10 to 30 / ⁇ ⁇ .
- the support film used as the support in the production process of the adhesive film can also be used as a protective film for protecting the surface of the resin composition layer.
- the support film in the present invention is peeled off after being laminated on a circuit board or after forming an insulating layer by heat curing. If the support film is peeled after the adhesive film is heated and cured, adhesion of dust and the like in the curing process can be prevented, and the surface smoothness of the insulating layer after curing can be improved. In the case of peeling after curing, the support film is usually subjected to a release treatment in advance.
- the resin composition layer formed on the support film is preferably formed so that the area of the layer is smaller than the area of the support film.
- the adhesive film can be wound up in a roll shape and stored and stored.
- the resin composition layer is protected by a protective film, after peeling off, the resin composition layer is laminated on one or both sides of the circuit board so that the resin composition layer is in direct contact with the circuit board.
- a method of laminating on a circuit board under reduced pressure by a vacuum laminating method is preferably used.
- the laminating method may be batch or continuous with rolls.
- the adhesive film and circuit board may be heated (preheated) as necessary before lamination.
- the laminating conditions are such that the pressure bonding temperature (laminating temperature) is preferably 70 to 140 ° C, and the pressure bonding pressure is preferably 1 to: L lkgf / cm 2 (9.8 x 10 4 to 109.9 x 10 4 N / m 2 ) and laminating under reduced pressure with an air pressure of 20 mmHg (26.7 hPa) or less.
- Vacuum lamination can be performed using a commercially available vacuum laminator.
- commercially available vacuum laminators include: -Chigoichi 'Morton Co., Ltd. vacuum applicator 1; Meiki Seisakusho Co., Ltd. vacuum pressurizing laminator; Hitachi Industries roll dry coater; Hitachi Air Examples include vacuum laminators manufactured by EC Co., Ltd.
- the circuit board in the present invention is mainly glass epoxy, metal board, polyester. This refers to a substrate, polyimide substrate, BT resin substrate, thermosetting polyphenylene ether substrate or the like on which one or both surfaces of a patterned conductor layer (circuit) are formed.
- a multilayer printed wiring board having a conductor layer (circuit) in which conductor layers and insulating layers are alternately formed and patterned on one or both sides is also included in the circuit board referred to in the present invention.
- the surface of the conductor circuit layer is preferably roughened by blackening or the like in advance from the viewpoint of adhesion of the insulating layer to the circuit board.
- the insulating film can be formed on the circuit board by peeling off and thermosetting.
- Heat curing conditions are selected in the range of 150 ° C to 220 ° C for 20 minutes to 180 minutes, more preferably 160 ° C. C ⁇ 200. C for 30-120 minutes.
- Drilling force is a force that can be performed by a known method such as drilling, laser, or plasma, and a combination of these methods, if necessary, and is the most common method of drilling force by a laser such as a carbon dioxide laser or YAG laser.
- the roughening treatment in the present invention is usually preferably carried out by a wet roughening method using an oxidizing agent.
- Oxidizing agents include permanganate (potassium permanganate, sodium permanganate, etc.), dichromate, ozone, hydrogen peroxide
- an alkaline permanganic acid solution for example, potassium permanganate or sodium permanganate hydroxide
- potassium permanganate or sodium permanganate hydroxide an oxidant commonly used for the roughening of insulating layers in the production of multilayer printed wiring boards by the built-up method. It is preferable to perform roughening using (sodium aqueous solution).
- the roughness of the roughened surface obtained by roughening the surface of the insulating layer is usually Ra value force greater than or equal to ⁇ 0.01 ⁇ m, preferably 0. It is preferable that the roughness is 1 ⁇ m or more, especially 0.15 ⁇ m or more.
- the upper limit of the Ra value is preferably a force of 0.5 / zm or less from the viewpoint of the fine wiring formability, more preferably 0.5 or less, and particularly preferably 0.35 m or less.
- Surface roughness Ra value is a kind of numerical value representing surface roughness, and is called arithmetic average roughness. Specifically, the absolute value of the height changing in the measurement region is measured by the surface line as an average line and arithmetically averaged. For example, using WYK ON NT3300 manufactured by BEIKOTSU SUMENTSU Co., Ltd., the VSI contact mode can be obtained from the numerical value obtained with a 50 ⁇ lens with a measurement range of 121 ⁇ m ⁇ 92 ⁇ m.
- a conductor layer is formed on the surface of the resin composition layer on which uneven anchors have been formed by roughening treatment by a method combining electroless plating and electrolytic plating.
- a reverse resist pattern resist can be formed from the conductor layer, and the conductor layer can be formed only by electroless plating.
- the peel strength of the conductor layer can be further improved and stabilized by annealing at 150 to 200 ° C. for 20 to 90 minutes.
- a method of forming a circuit by patterning the conductor layer for example, a subtractive method or a semi-additive method known to those skilled in the art can be used.
- the pre-preda of the present invention can be produced by impregnating the resin composition of the present invention into a sheet-like reinforcing base material made of fiber by a hot melt method or a solvent method and semi-curing by heating. it can. That is, it can be set as the pre-predator which will be in the state which impregnated the resin composition of this invention in the sheet-like reinforcement base which consists of fibers.
- the sheet-like reinforcing substrate made of fiber fiber for example, a glass cloth garamide fiber, which is commonly used as a fiber for pre-predators, can be used.
- the resin without dissolving the resin in an organic solvent is coated on a coated paper having good releasability from the resin and laminated on a sheet-like reinforcing substrate, or by duplication.
- a pre-preda is manufactured by direct coating with an equator.
- the solvent method is a method in which a sheet-like reinforcing base material is soaked in a resinous varnish in which the resin is dissolved in an organic solvent, and then the resinous varnish is impregnated into the sheet-like reinforcing base material and then dried. It is.
- One or more of the pre-preders of the present invention are stacked on a circuit board, and a metal plate is sandwiched through a release film, and press-laminated under pressure and heating conditions.
- the pressure is preferably 5 to 40 kgf / cm 2 (49 ⁇ 10 4 to 392 ⁇ 10 4 N / m 2 ), and the temperature is preferably 120 to 200 ° C. Better!/,.
- same as adhesive film In this way, it can also be manufactured by laminating on a circuit board by a vacuum laminating method and then curing by heating. Thereafter, in the same manner as described above, the surface of the prepreg cured with an oxidizing agent is roughened, and then a conductor layer is formed by plating to produce a multilayer printed wiring board.
- Butyral resin (glass transition temperature 105 ° C, "KS-5ZJ” made by Sekisui Chemical Co., Ltd.) in a 1: 1 mixed solvent of ethanol and toluene at 60 ° C to a solid content of 15%
- a liquid bisphenol A type epoxy resin (epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.) 30 parts and a naphthalene type tetrafunctional epoxy resin 30 parts of fat (epoxy equivalent: 163, “HP-4700” manufactured by Dainippon Ink and Chemicals, Inc.) is dissolved in 15 parts of methyl ethyl ketone (hereinafter abbreviated as MEK) and 15 parts of cyclohexanone with stirring.
- MEK methyl ethyl ketone
- this varnished varnish was applied onto polyethylene terephthalate (thickness 38 ⁇ m, hereinafter abbreviated as PET) with a die coater so that the dried varnish thickness would be 40 ⁇ m. It was dried at ° C (average 100 ° C) for 6 minutes (residual solvent amount was about 1% by mass). Next, a 15 ⁇ m-thick polypropylene film was bonded to the surface of the greave composition and wound into a roll. The roll-like adhesive film was slit to a width of 507 mm, and from this, a sheet-like adhesive film having a size of 507 ⁇ 336 mm was obtained.
- PET polyethylene terephthalate
- a die coater so that the dried varnish thickness would be 40 ⁇ m. It was dried at ° C (average 100 ° C) for 6 minutes (residual solvent amount was about 1% by mass).
- a 15 ⁇ m-thick polypropylene film was bonded to the surface of the
- Liquid bisphenol A type epoxy resin epoxy equivalent 180, Japan epoxy resin
- Liquid bisphenol A type epoxy resin epoxy equivalent 180, Japan epoxy resin
- Liquid bisphenol A type epoxy resin epoxy equivalent 180, Japan epoxy resin
- MEK solution with 50% solid content of naphthalene-structured novolac resin (“CBN”, phenolic hydroxyl group equivalent: 139), a phenolic curing agent, containing thiomethyl group Novolak resin (“YLH-1110L” manufactured by Japan Epoxy Resin Co., Ltd., phenolic hydroxyl group equivalent weight 168), 18 parts of MEK solution with 60% solid content, curing catalyst (Shikoku Chemical Industries ( Co., Ltd., “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 m, aminosilane treatment, “SOC2” manufactured by Admatex) 70 parts, butyral resin solution prepared in Example 1 17 17 parts of phenoxy resin (Japan Epoxy Resin Co., Ltd.
- CBN naphthalene-structured novolac resin
- a phenolic curing agent containing thiomethyl group Novolak resin manufactured by Japan Epoxy Resin Co., Ltd., phenolic hydroxyl group equivalent
- Example 1 “YX8100 ⁇ 30”, 30% solids cyclohexanone and MEK mixing solution) were mixed and dispersed uniformly with a high-speed rotary mixer. A fat varnish was prepared (inorganic to the non-volatile content of rosin varnish. Hamazai content, 39 wt%). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1.
- liquid bisphenol A type epoxy resin epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.
- naphthalene type tetrafunctional epoxy resin epoxy equivalent 163, Dainippon Ink & Chemicals, Inc.
- HP-4700 methyl ethyl ketone
- a novolak resin a phenolic curing agent (“TD2 090-60M” manufactured by Dainippon Ink & Chemicals, Inc., MEK solution with a solid content of 1 ⁇ 20% by mass, phenolic hydroxyl group equivalent of solids 105) 50 parts, curing catalyst (Shikoku Kasei Kogyo Co., Ltd., “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 m, aminosilane treatment, “SOC2” manufactured by Admatechs) 60 parts, implementation 35 parts of the petital rosin solution prepared in Example 1 was mixed and uniformly dispersed with a high-speed rotary mixer to prepare a varnish varnish (inorganic filler content relative to the non-volatile content of the varnish varnish, 39 mass%).
- a sheet-like adhesive film was obtained in the same manner as in Example 1.
- liquid bisphenol A type epoxy resin epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.
- naphthalene type tetrafunctional epoxy resin epoxy equivalent 163, Dainippon Ink & Chemicals, Inc.
- HP-4700 methyl ethyl ketone
- liquid bisphenol A type epoxy resin epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.
- naphthalene type tetrafunctional epoxy resin epoxy equivalent 163, Dainippon Ink & Chemicals, Inc.
- HP-4700 methyl ethyl ketone
- a novolak rosin as a phenol curing agent (“TD20 90-60M” manufactured by Dainippon Ink & Chemicals, Inc., MEK solution with a solid content of 1 ⁇ 20 mass%, phenolic hydroxyl group equivalent 105) 41 parts, thiomethyl group Novolak resin, which is a hardener containing phenol (Japan Epoxy Resin Co., Ltd.
- Example 1 “ ⁇ 1 ⁇ 3 ⁇ 411101 ⁇ ”, phenolic hydroxyl group equivalent 168), 14 parts, curing catalyst (manufactured by Shikoku Chemicals Co., Ltd.) , “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 / ⁇ ⁇ , aminosilane treatment, “SOC2” manufactured by Admatechs Co., Ltd.) 65 parts, petital resin solution prepared in Example 1 35 parts Were mixed uniformly with a high-speed rotary mixer to prepare a resin varnish (inorganic filler content based on the non-volatile content of the resin grease, 40% by mass). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1.
- circuit board A circuit pattern is formed on both sides of a glass cloth base epoxy resin-coated double-sided copper-clad laminate [copper foil thickness 18 m, substrate thickness 0.8 mm, Matsushita Electric Works Ltd. R5715ES]. It was immersed in CZ8100 manufactured by Co., Ltd. and the copper surface was roughened to prepare a circuit board.
- the adhesive film prepared in Example 1 was laminated on both sides of the circuit board using a notch type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.). Lamination was performed by reducing the pressure for 30 seconds to a pressure of 13 hPa or less, and then pressing at a pressure of 0.74 MPa for 30 seconds.
- a notch type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.).
- the laminated adhesive film also peeled off the PET film and cured the resin composition at 180 ° C for 30 minutes.
- a via hole having a diameter of 60 ⁇ m on the surface of the insulating layer was formed by observing under conditions of a wave number of 100013 ⁇ 4, a pulse width of 13 seconds, and a shot number of 3.
- the circuit board is used for electroless plating containing PdCl.
- Double-sided copper-clad laminate with glass cloth substrate epoxy resin [copper foil thickness 18 m, substrate thickness 0.8 mm, R5715ES made by Matsushita Electric Works Ltd.] both sides immersed in MEC CZ8100 copper The surface was roughened.
- the adhesive films prepared in Examples, Comparative Examples, and Reference Examples were laminated on both surfaces of a laminate using a notch type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.). Lamination was performed by reducing the pressure for 30 seconds to a pressure of 13 hPa or less, and then pressing at a pressure of 0.74 MPa for 30 seconds.
- a notch type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.).
- the laminated adhesive film also peeled off the PET film and cured the resin composition at 180 ° C for 30 minutes.
- the laminate is immersed in a swelling dip Sekiyu ligand p containing diethylene glycol monopropyl ether from Atotech Japan Co., Ltd. for 5 minutes at 60 ° C. ) Concentrate 'Compact P (KMn04: 60 g ZL, NaOH: 40 g ZL aqueous solution) at 80 ° C for 20 minutes, and finally, as a neutralizing solution, Atotech Japan Co., Ltd. Immerse at 40 ° C for 5 minutes.
- the adhesive films obtained in Examples, Comparative Examples and Reference Examples were allowed to stand at room temperature (25 ° C.) for 72 hours, and were used with a model Rheoso G3000 manufactured by UBM Co., Ltd.
- the dynamic viscoelasticity of the fat composition layer was measured.
- a tablet with a diameter of 20 mm and a thickness of about 2.3 mm (weight: about lg) is used as a measurement sample, and a measurement start temperature is set to 60 ° C using a normal plate, and the rate of temperature rise is 5 ° C.
- the measurement was performed under the conditions of ° CZ min, measurement interval temperature 2.5 ° C, frequency lHzZdeg, 100 g static load constant.
- X was defined as X when the viscosity was not measurable at the start of measurement, and X was marked for viscosity measurement without overload.
- Table 1 shows the results of each test for the samples of Examples 1 to 4, Comparative Example 1 and Reference Examples 1 and 2. It can be seen that the example samples are excellent in all of flame retardancy, storage stability and peel strength.
- the epoxy resin composition of the present invention, the adhesive film prepared with the resin composition, and the pre-preda form an interlayer insulating layer of a multilayer printed wiring board, particularly a multilayer printed wiring board manufactured by a build-up method. It is suitably used as a material to be used.
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Abstract
Description
明 細 書 Specification
エポキシ樹脂組成物 Epoxy resin composition
技術分野 Technical field
[0001] 本発明はエポキシ榭脂組成物に関し、詳しくは、多層プリント配線板の絶縁層形成 に好適な、エポキシ榭脂組成物に関する。 TECHNICAL FIELD [0001] The present invention relates to an epoxy resin composition, and more particularly to an epoxy resin composition suitable for forming an insulating layer of a multilayer printed wiring board.
背景技術 Background art
[0002] 近年、電子機器の小型化、高性能化が進み、多層プリント配線板にぉ ヽても配線 の微細化、高密度化が進んでいる。高密度の配線を形成するのに適した導体層形 成方法として、絶縁層表面を粗化処理後、無電解メツキで導体層を形成するアディテ イブ法と、無電解メツキと電解メツキで導体層を形成するセミアディティブ法が知られ ている。従って、多層プリント配線板の絶縁層形成に用いられるエポキシ榭脂組成物 にお 、ても、メツキ導体層との高 、密着性が要求される。 In recent years, electronic devices have become smaller and higher in performance, and the miniaturization and higher density of wiring have progressed even on multilayer printed wiring boards. Conductive layer formation methods suitable for forming high-density wiring include the additive method of forming a conductive layer by electroless plating after roughening the surface of the insulating layer, and conductive layers by electroless plating and electrolytic plating. The semi-additive method of forming is known. Therefore, the epoxy resin composition used for forming the insulating layer of the multilayer printed wiring board is required to have high adhesion with the plating conductor layer.
[0003] 一方、エポキシ榭脂組成物の難燃ィ匕にぉ 、ては、従来臭素化エポキシ榭脂等のハ ロゲン系化合物が汎用されて 、たが、近年のダイォキシンに代表される環境問題な どから、使用が困難になりつつある。多層プリント配線板用のエポキシ榭脂組成物に おいて、ハロゲンィ匕合物を使用しない難燃ィ匕手法としては、例えば、特許文献 1、特 許文献 2などに見られるように、反応型リン系難燃剤を使用する方法が知られている 。また、特許文献 3には半導体封止用榭脂組成物において、チォアルキル基を有す るフエノール榭脂を硬化剤として用いる方法が開示されている。 [0003] On the other hand, halogen-based compounds such as brominated epoxy resins have been widely used for the flame retardancy of epoxy resin compositions. However, environmental problems represented by dioxin in recent years have been widely used. As such, it is becoming difficult to use. In the epoxy resin composition for multilayer printed wiring boards, as a flame retardant method that does not use a halogen compound, for example, as shown in Patent Document 1, Patent Document 2, etc. A method of using a flame retardant is known. Patent Document 3 discloses a method of using a phenol resin having a thioalkyl group as a curing agent in a resin sealing resin composition.
特許文献 1:特開 2001— 214037号公報 Patent Document 1: Japanese Patent Laid-Open No. 2001-214037
特許文献 2:特許第 3108412号公報 Patent Document 2: Japanese Patent No. 3108412
特許文献 3:特開 2004— 339277号公報 Patent Document 3: Japanese Patent Laid-Open No. 2004-339277
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0004] しかしながら、リン系難燃剤もまた、環境面等の問題から、その使用が抑制されつつ ある。また本願発明者の知見によれば、チォアルキル基含有フエノール榭脂は榭脂 組成物の保存安定性を低下させる傾向にある。さらに本願発明者の知見によれば、 チォアルキル基含有フエノール榭脂の難燃ィ匕効果は必ずしも十分ではなぐ例えば[0004] However, the use of phosphorus-based flame retardants is also being suppressed due to environmental problems and the like. Further, according to the knowledge of the present inventor, thioalkyl group-containing phenol resin has a tendency to reduce the storage stability of the resin composition. Furthermore, according to the knowledge of the present inventor, The flame retardant effect of thioalkyl group-containing phenol resin is not always sufficient, for example
、特許文献 3のようにシリカ等の無機充填材の含有量が 70〜95質量%におよぶ半 導体封止用エポキシ榭脂糸且成物に比べ、その含有量が比較的小さくなる多層プリン ト配線板用のエポキシ榭脂組成物においては、難燃性の低下が顕著な問題となる。 As in Patent Document 3, the content of inorganic fillers such as silica is 70 to 95% by mass. In the epoxy resin composition for wiring boards, the reduction of flame retardancy becomes a significant problem.
[0005] 本発明は、上記のような事情に鑑みなされたもので、その解決しょうとする課題は、 多層プリント配線板の絶縁層としての使用に好適なエポキシ榭脂組成物であって、 ノ、ロゲン系難燃剤及びリン系難燃剤によらずに十分な難燃ィ匕を達成することができ、 保存安定性及びメツキ導体に対する絶縁層(層間絶縁層)の密着強度に優れるェポ キシ榭脂組成物を提供することにある。 [0005] The present invention has been made in view of the above circumstances, and a problem to be solved is an epoxy resin composition suitable for use as an insulating layer of a multilayer printed wiring board, Epoxy that can achieve sufficient flame retardancy without depending on the rogen flame retardant and phosphorus flame retardant, and has excellent storage stability and adhesion strength of the insulating layer (interlayer insulating layer) to the plating conductor The object is to provide a fat composition.
課題を解決するための手段 Means for solving the problem
[0006] 本発明は、上記課題を解決すべく鋭意研究した結果、 (A) 1分子中に 2個以上の エポキシ基を有する芳香族系エポキシ榭脂、(B)ナフトール系硬化剤、(C)チォアル キル基含有フエノール系硬化剤及び (D)無機充填材を含有することを特徴とするェ ポキシ榭脂組成物が、難燃性、保存安定性及びメツキ導体に対する絶縁層 (層間絶 縁層)の密着強度に優れることを見出し、本発明を完成するに至った。 [0006] As a result of diligent research to solve the above problems, the present invention has the following results. (A) Aromatic epoxy resin having two or more epoxy groups in one molecule, (B) a naphthol curing agent, (C An epoxy resin composition comprising a phenolic curing agent containing a thioalkyl group and (D) an inorganic filler is an insulative layer (interlayer insulation layer) for flame retardancy, storage stability, and a metallic conductor. ), The present invention was completed.
[0007] すなわち、本発明は以下の内容を含むものである。 That is, the present invention includes the following contents.
[1] (A) l分子中に 2個以上のエポキシ基を有する芳香族系エポキシ榭脂、(B)ナ フトール系硬化剤、 (C)チォアルキル基含有フエノール系硬化剤及び (D)無機充填 材、を含有することを特徴とするエポキシ榭脂組成物。 [1] (A) Aromatic epoxy resin having two or more epoxy groups in the molecule, (B) naphthol curing agent, (C) thioalkyl group-containing phenol curing agent, and (D) inorganic filling An epoxy resin composition comprising a material.
[2] エポキシ榭脂組成物の不揮発成分を 100質量%とした場合、成分 (D)の無機 充填材を 20〜60質量%含有する、上記 [1]に記載のエポキシ榭脂組成物。 [2] The epoxy resin composition according to [1] above, containing 20 to 60% by mass of the inorganic filler of component (D) when the nonvolatile component of the epoxy resin composition is 100% by mass.
[3] エポキシ榭脂組成物の不揮発成分を 100質量%とした場合、成分 (D)の無機 充填材を 30〜50質量%含有する、上記 [1]に記載のエポキシ榭脂組成物。 [3] The epoxy resin composition according to [1] above, containing 30 to 50% by mass of the inorganic filler of component (D) when the nonvolatile component of the epoxy resin composition is 100% by mass.
[4] 成分 (D)の無機充填材がシリカである、上記 [1]〜[3]いずれかに記載のェポ キシ榭脂組成物。 [4] The epoxy resin composition according to any one of [1] to [3] above, wherein the inorganic filler of component (D) is silica.
[5] 成分 (B)と (C)の配合割合が、質量比で 1 : 0. 1〜1 : 1. 5である、上記 [1]〜[ [5] The above-mentioned [1] to [1], wherein the mixing ratio of components (B) and (C) is from 1: 0.1 to 1: 1.5 by mass ratio
4] V、ずれかに記載のエポキシ榭脂組成物。 4] V, epoxy resin composition according to any of the above.
[6] 成分 (B)のナフトール系硬化剤が、下式(1) : [0008] [化 1] [6] The naphthol-based curing agent of component (B) is represented by the following formula (1): [0008] [Chemical 1]
[0009] (式中、 R1〜R4は各々独立して、水素原子又はアルキル基を示し、 XIはそれぞれ アルキル基で置換されて 、てもよ 、ナフタレン環を示し、 Yはそれぞれアルキル基で 置換されていてもよい、ベンゼン環、ヒドロキシベンゼン環、ビフエ-ル環又はナフタ レン環を示し、 j及び kはそれぞれ平均値で 1〜15の数を示す。 ) [Wherein, R1 to R4 each independently represent a hydrogen atom or an alkyl group, XI may be each substituted with an alkyl group, may represent a naphthalene ring, and Y may each be substituted with an alkyl group. A benzene ring, a hydroxybenzene ring, a biphenyl ring or a naphthalene ring, each of which may be an integer, and j and k each represent an average value of 1 to 15.)
で表されるナフトール系硬ィ匕剤であり、成分 (C)のチォアルキル基含有フエノール系 硬化剤が、下式 (2) : A naphthol type hardener represented by the formula (2):
[0010] [化 2] [0010] [Chemical 2]
[0011] (式中、 R5は水素原子又はアルキル基を示し、 R6はチォアルキル基を示し、 X2は それぞれアルキル基で置換されて 、てもよ 、ベンゼン環又はナフタレン環を示し、 j 及び kはそれぞれ平均値で 1〜15の数を示し、 mは 1〜5の整数を示す。 ) で表されるチォアルキル基含有フエノール系硬ィ匕剤である上記 [ 1]〜 [5] 、ずれか に記載のエポキシ榭脂組成物。 [Wherein, R5 represents a hydrogen atom or an alkyl group, R6 represents a thioalkyl group, X2 is each substituted with an alkyl group, and represents a benzene ring or a naphthalene ring, and j and k are Each represents an average value of 1 to 15, and m represents an integer of 1 to 5. The above-mentioned [1] to [5], which is a thioalkyl group-containing phenolic hardener represented by The epoxy resin composition described.
[7] 成分 (B)のナフトール系硬化剤が、下式(1 ' ) : [7] The naphthol-based curing agent of component (B) is represented by the following formula (1 ') :
[0012] [化 3] ( 1,) [0012] [Chemical 3] (1,)
[0013] (式中、 R1〜R4は各々独立して、水素原子又はアルキル基を示し、 XIはそれぞれ アルキル基で置換されて 、てもよ 、ナフタレン環を示し、 Yはそれぞれアルキル基で 置換されていてもよい、ベンゼン環、ヒドロキシベンゼン環、ビフエ-ル環又はナフタ レン環を示し、 nは平均値で 1〜15の数を示す。 ) (Wherein R1 to R4 each independently represent a hydrogen atom or an alkyl group, XI may be each substituted with an alkyl group, may represent a naphthalene ring, and Y represents each substituted with an alkyl group. A benzene ring, a hydroxybenzene ring, a biphenyl ring or a naphthalene ring, which may be used, n represents an average value of 1 to 15.)
で表されるナフトール系硬ィ匕剤であり、成分 (C)のチォアルキル基含有フエノール系 硬化剤が、下式 (2' ) : A thioalkyl group-containing phenolic curing agent of component (C) represented by the following formula (2 ') :
[0014] [化 4] [0014] [Chemical 4]
[0015] (式中、 R5は水素原子又はアルキル基を示し、 R6はチォアルキル基を示し、 X2は それぞれアルキル基で置換されて 、てもよ 、ベンゼン環又はナフタレン環を示し、 n は平均値で 1〜15の数を示し、 mは 1〜5の整数を示す。 ) (In the formula, R5 represents a hydrogen atom or an alkyl group, R6 represents a thioalkyl group, X2 is each substituted with an alkyl group, and represents a benzene ring or a naphthalene ring, and n represents an average value. Represents a number from 1 to 15, and m represents an integer from 1 to 5.)
で表されるチォアルキル基含有フエノール系硬ィ匕剤である上記 [ 1]〜 [5] 、ずれか に記載のエポキシ榭脂組成物。 The epoxy resin composition according to any one of [1] to [5] above, which is a thioalkyl group-containing phenol hardener represented by the formula:
[8] 成分 (A)の芳香族系エポキシ榭脂が、(Al) l分子中に 2以上のエポキシ基を 有し、温度 20°Cで液状の芳香族系エポキシ榭脂である、第 1のエポキシ榭脂、およ び (A2) 1分子中に 3以上エポキシ基を有し、温度 20°Cで固体状の芳香族系ェポキ シ榭脂である、第 2のエポキシ榭脂を含有する、上記 [1]〜[7]いずれかに記載のェ ポキシ榭脂組成物。 [8] The aromatic epoxy resin of component (A) is an aromatic epoxy resin that has two or more epoxy groups in the (Al) 1 molecule and is liquid at a temperature of 20 ° C. And (A2) a second epoxy resin that has 3 or more epoxy groups in one molecule and is a solid aromatic epoxy resin at a temperature of 20 ° C. The epoxy resin composition according to any one of [1] to [7] above.
[9] 成分 (A2)の第 2のエポキシ榭脂のエポキシ当量が 230以下である、上記 [8] 記載のエポキシ榭脂組成物。 [9] The epoxy equivalent of the second epoxy resin of component (A2) is 230 or less, [8] The epoxy resin composition described.
[10] 成分 (A2)の第 2のエポキシ榭脂のエポキシ当量が 150〜230の範囲である 、上記 [8]記載のエポキシ榭脂組成物。 [10] The epoxy resin composition according to [8] above, wherein the epoxy equivalent of the second epoxy resin of component (A2) is in the range of 150 to 230.
[11] 第 1のエポキシ榭脂 (A1)と第 2のエポキシ榭脂 (A2)の配合割合 (A1: A2) 力 質量比で 1 : 0. 3〜1 : 2の範囲である、上記 [8]〜[10]のいずれかに記載のェ ポキシ榭脂組成物。 [11] Mixing ratio of the first epoxy resin (A1) and the second epoxy resin (A2) (A1: A2) force The mass ratio ranges from 1: 0.3 to 1: 2, The epoxy resin composition according to any one of 8] to [10].
[12] エポキシ榭脂組成物の不揮発成分を 100質量%とした場合、成分 (A)の芳 香族系エポキシ榭脂の含有量が 10〜50質量%であり、エポキシ榭脂組成物中に存 在するエポキシ基に対する、成分 (B)のナフトール系硬化剤及び成分 (C)のチオア ルキル基含有フ ノール系硬化剤のフ ノール性水酸基の割合が 1 : 0. 5〜1 : 1. 5 である、上記 [ 1 ]〜 [ 11 、ずれかに記載のエポキシ榭脂組成物。 [12] When the nonvolatile component of the epoxy resin composition is 100% by mass, the content of the aromatic epoxy resin of component (A) is 10 to 50% by mass, and the epoxy resin composition contains The ratio of phenolic hydroxyl groups in the naphthol-based curing agent of component (B) and the thioalkyl group-containing phenolic curing agent of component (C) to the existing epoxy groups is 1: 0.5 to 1: 1.5. [1] to [11], the epoxy resin composition according to any one of the above.
[13] エポキシ榭脂組成物が更に、ポリビニルァセタール榭脂を含有する、上記 [1] 〜 [ 12] 、ずれか〖こ記載のエポキシ榭脂組成物。 [13] The epoxy resin composition according to the above [1] to [12], wherein the epoxy resin composition further contains a polyvinyl acetal resin.
[14] エポキシ榭脂組成物の不揮発成分を 100質量%とした場合、ポリビュルァセ タール榭脂の含有量が 2〜20質量%である上記 [ 13]記載のエポキシ榭脂組成物。 [14] The epoxy resin composition according to the above [13], wherein the content of the polybulacetal resin is 2 to 20% by mass when the nonvolatile component of the epoxy resin composition is 100% by mass.
[15] 上記 [1]〜 [14]いずれかに記載のエポキシ榭脂組成物が支持フィルム上に 層形成されて 、る接着フィルム。 [15] An adhesive film in which the epoxy resin composition according to any one of [1] to [14] above is layered on a support film.
[16] 上記 [1]〜[14]いずれかに記載のエポキシ榭脂組成物が繊維力 なるシー ト状補強基材中に含浸されて 、ることを特徴とするプリプレダ。 [16] A pre-preda, wherein the epoxy resin composition according to any one of [1] to [14] is impregnated in a sheet-like reinforcing base material having a fiber strength.
[17] 上記 [ 1 ]〜 [ 14 、ずれかに記載のエポキシ榭脂組成物の硬化物により絶縁 層が形成されている、多層プリント配線板。 [17] A multilayer printed wiring board in which an insulating layer is formed of a cured product of the epoxy resin composition according to any one of [1] to [14] above.
[18] 内層回路基板上に絶縁層を形成する工程及び該絶縁層上に導体層を形成 する工程を含む多層プリント配線板の製造方法であって、該絶縁層が、上記 [1]〜[ 14]いずれかに記載のエポキシ榭脂組成物を熱硬化して形成され、該導体層が、該 絶縁層表面を粗ィ匕処理した粗ィ匕面に銅メツキにより形成されることを特徴とする、多 層プリント配線板の製造方法。 [18] A method for producing a multilayer printed wiring board, comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer comprises the above [1] to [ 14] It is formed by thermosetting the epoxy resin composition according to any one of the above, and the conductor layer is formed by copper plating on a rough surface obtained by roughing the surface of the insulating layer. A method for producing a multilayer printed wiring board.
[19] 内層回路基板上に絶縁層を形成する工程及び該絶縁層上に導体層を形成 する工程を含む多層プリント配線板の製造方法であって、絶縁層が、上記 [15]記載 の接着フィルムを内層回路基板上にラミネートし、支持フィルムを剥離するか又はし ないで、エポキシ榭脂組成物を熱硬化し、硬化後に支持フィルムが存在する場合に 支持フィルムを剥離して形成され、該導体層が、該絶縁層表面を粗化処理した粗ィ匕 面に銅メツキにより形成されることを特徴とする、多層プリント配線板の製造方法。 [19] A method for producing a multilayer printed wiring board, comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer is the above [15] The adhesive film is laminated on the inner circuit board, and the epoxy resin composition is heat-cured with or without peeling off the support film, and the support film is peeled off when the support film is present after curing. The method for producing a multilayer printed wiring board, wherein the conductor layer is formed by copper plating on a rough surface obtained by roughening the surface of the insulating layer.
[20] 内層回路基板上に絶縁層を形成する工程及び該絶縁層上に導体層を形成 する工程を含む多層プリント配線板の製造方法であって、絶縁層が、上記 [16]記載 のプリプレダを内層回路基板上にラミネートし、エポキシ榭脂組成物を熱硬化して形 成され、該導体層が、該絶縁層表面を粗化処理した粗化面に銅メツキにより形成され ることを特徴とする、多層プリント配線板の製造方法。 [20] A method for producing a multilayer printed wiring board, comprising a step of forming an insulating layer on an inner circuit board and a step of forming a conductor layer on the insulating layer, wherein the insulating layer is the pre-preda The conductive layer is formed by copper plating on a roughened surface obtained by roughening the surface of the insulating layer. The manufacturing method of a multilayer printed wiring board.
発明の効果 The invention's effect
[0016] 本発明によれば、ハロゲン系難燃剤及びリン系難燃剤によらずに十分な難燃ィ匕が 達成でき、保存安定性に優れ、さらにメツキで形成される導体層との密着強度に優れ る絶縁層が形成可能なエポキシ榭脂組成物を提供することができる。 [0016] According to the present invention, sufficient flame retardancy can be achieved regardless of the halogen-based flame retardant and the phosphorus-based flame retardant, the storage stability is excellent, and the adhesion strength with the conductive layer formed by plating An epoxy resin composition capable of forming an excellent insulating layer can be provided.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0017] 以下、本発明をより詳しく説明する。 [0017] Hereinafter, the present invention will be described in more detail.
[0018] [成分 (A)のエポキシ榭脂] [0018] [Epoxy resin of component (A)]
本発明における成分 (A)の「 1分子中に 2個以上のエポキシ基を有する芳香族系ェ ポキシ榭脂」は特に限定はされず、例えば、クレゾ一ルノボラック型エポキシ榭脂、フ エノールノボラック型エポキシ榭脂、 tert—ブチルーカテコール型エポキシ榭脂、ビフ ェ-ル型エポキシ榭脂、ビスフエノール A型エポキシ榭脂、ビスフエノール F型ェポキ シ榭脂、ナフタレン型エポキシ榭脂、グリシジルァミン型エポキシ榭脂などが挙げられ る。ハロゲン原子を含むものは好ましくない。なお、本発明でいう芳香族系エポキシ 榭脂とは、その分子内に芳香環骨格を有するエポキシ榭脂を意味する。 The “aromatic epoxy resin having two or more epoxy groups in one molecule” of the component (A) in the present invention is not particularly limited, and examples thereof include a cresol novolac type epoxy resin and a phenol novolac type. Epoxy resin, tert-butyl-catechol type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene type epoxy resin, glycidylamine type Examples include epoxy resin. Those containing a halogen atom are not preferred. In addition, the aromatic epoxy resin referred to in the present invention means an epoxy resin having an aromatic ring skeleton in the molecule.
[0019] 成分 (A)のエポキシ榭脂は 1種を単独で用いても、 2種以上を併用してもよいが、「 [0019] The epoxy resin of component (A) may be used alone or in combination of two or more.
(Al) 1分子中に 2以上のエポキシ基を有し、温度 20°Cで液状の芳香族系エポキシ 榭脂である、第 1のエポキシ榭脂」および「(A2) 1分子中に 3以上エポキシ基を有し、 温度 20°Cで固体状の芳香族系エポキシ榭脂である、第 2のエポキシ榭脂」を併用す る態様が好ましい。第 2のエポキシ榭脂としては、エポキシ当量が 230以下であるが の更に好ましぐエポキシ当量が 150〜230の範囲にあるものが特に好ましい。 (Al) 1st epoxy resin that has 2 or more epoxy groups in one molecule and is liquid aromatic epoxy resin at a temperature of 20 ° C and (A2) 3 or more in 1 molecule An embodiment in which a “second epoxy resin” having an epoxy group and being a solid aromatic epoxy resin at a temperature of 20 ° C. is used in combination is preferable. The second epoxy resin has an epoxy equivalent of 230 or less Particularly preferred are those having a more preferred epoxy equivalent weight in the range of 150-230.
[0020] エポキシ榭脂 (A)として、第 1のエポキシ榭脂 (A1)と第 2のエポキシ榭脂 (A2)を 使用することで、榭脂組成物を接着フィルムの形態で使用する場合に、十分な可撓 性を示す (取扱 、性に優れた)接着フィルムを形成できると同時に、榭脂組成物の硬 化物の破断強度が向上し、多層プリント配線板の耐久性が向上する。 [0020] When the first epoxy resin (A1) and the second epoxy resin (A2) are used as the epoxy resin (A), the resin composition is used in the form of an adhesive film. In addition, an adhesive film exhibiting sufficient flexibility (excellent in handling and properties) can be formed, and at the same time, the breaking strength of the cured resin composition is improved, and the durability of the multilayer printed wiring board is improved.
[0021] 本発明において、「(A1) 1分子中に 2以上のエポキシ基を有し、温度 20°Cで液状 の芳香族系エポキシ榭脂である、第 1のエポキシ榭脂」としては、ビスフエノール A型 エポキシ榭脂、ビスフエノール F型エポキシ榭脂、フエノールノボラック型エポキシ榭 脂、 tert—プチルーカテコール型エポキシ榭脂、ナフタレン型エポキシ榭脂、グリシ ジルァミン型エポキシ榭脂等が挙げられる。なお、本発明において、当該第 1のェポ キシ榭脂 (A1)は 1種を使用しても、 2種以上を組み合わせて使用してもよい。また、 当該第 1のエポキシ榭脂 (A1)は、 20°C未満の温度で液状であってもよい。 In the present invention, the “(A1) first epoxy resin having two or more epoxy groups in one molecule and being an aromatic epoxy resin that is liquid at a temperature of 20 ° C.” Examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, tert-butyl catechol type epoxy resin, naphthalene type epoxy resin, and glycidylamine type epoxy resin. In the present invention, the first epoxy resin (A1) may be used alone or in combination of two or more. The first epoxy resin (A1) may be liquid at a temperature of less than 20 ° C.
[0022] このようなエポキシ榭脂としては、具体的には、 HP4032 (大日本インキ化学工業( 株)製)、 HP4032D (大日本インキ化学工業 (株)製)、 jER807 (ェピコート 807) (ジ ャパンエポキシレジン (株)製)、 jER828EL (ェピコート 828EL) (ジャパンエポキシ レジン (株)製)、 jER152 (ェピコート 152) (ジャパンエポキシレジン (株)製)等が挙 げられる。 [0022] Specific examples of such epoxy resins include HP4032 (Dainippon Ink Chemical Co., Ltd.), HP4032D (Dainippon Ink Chemical Co., Ltd.), jER807 (Epicoat 807) For example, Japan Epoxy Resin Co., Ltd.), jER828EL (Epicoat 828EL) (Japan Epoxy Resin Co., Ltd.), jER152 (Epicoat 152) (Japan Epoxy Resin Co., Ltd.), and the like.
[0023] 一方、(A2) 1分子中に 3以上エポキシ基を有し、温度 20°Cで固体状の芳香族系 エポキシ榭脂である、第 2のエポキシ榭脂」としては、例えば、ナフタレン型エポキシ 榭脂、フエノール類とフエノール性水酸基を有する芳香族アルデヒドとの縮合物のェ ポキシィ匕物(トリスフエノール型エポキシ榭脂)等が挙げられる。また、当該第 2のェポ キシ榭脂 (A2)は、榭脂組成物のガラス転移温度等の物性向上のため、エポキシ当 量が 230以下のものが好ましぐエポキシ当量が 150〜230の範囲にあるものがさら に好ましい。従って、本発明において、当該第 2のエポキシ榭脂 (A2)は、「1分子中 に 3以上のエポキシ基を有し、エポキシ当量が 230以下であり、温度 20°Cで固体状 の芳香族系エポキシ榭脂」であるのが好ましぐ「1分子中に 3以上のエポキシ基を有 し、エポキシ当量が 150〜230であり、温度 20°Cで固体状の芳香族系エポキシ榭脂 」であるのがより好ましい。当該第 2のエポキシ榭脂 (A2)は 1種を使用しても、 2種以 上を組み合わせて使用してもよい。また、当該第 2のエポキシ榭脂 (A2)は、 20°Cを 超える温度で固体状であってもよ ヽ。 On the other hand, (A2) “second epoxy resin having 3 or more epoxy groups in one molecule and being a solid aromatic epoxy resin at a temperature of 20 ° C.” includes, for example, naphthalene Type epoxy resin, epoxy resin (trisphenol type epoxy resin) of condensates of phenols and aromatic aldehydes having a phenolic hydroxyl group. In addition, the second epoxy resin (A2) has an epoxy equivalent of 150 to 230, preferably having an epoxy equivalent of 230 or less in order to improve physical properties such as glass transition temperature of the resin composition. Those in the range are more preferred. Therefore, in the present invention, the second epoxy resin (A2) has the following meaning: “A molecule having 3 or more epoxy groups, an epoxy equivalent of 230 or less, and a solid aromatic compound at a temperature of 20 ° C. "Epoxy resin" that has 3 or more epoxy groups in one molecule, and has an epoxy equivalent of 150-230 and is a solid aromatic epoxy resin that is solid at a temperature of 20 ° C. It is more preferable that Even if one second epoxy resin (A2) is used, two or more A combination of the above may be used. The second epoxy resin (A2) may be in a solid state at a temperature exceeding 20 ° C.
[0024] このようなエポキシ榭脂としては、具体的には、大日本インキ化学工業 (株)製の HP 4700 (EXA4700) (4官能ナフタレン型エポキシ榭脂、エポキシ当量 163、固形)、 N— 690 (クレゾ一ルノボラックエポキシ榭脂、エポキシ当量 208、固形)、 N— 695 ( クレゾ一ルノボラックエポキシ榭脂、エポキシ当量 208、固形)、 日本化薬 (株)の EPP N— 502H (トリスフエノールエポキシ榭脂、エポキシ当量 168、固形)、 NC7000L ( ナフトールノボラックエポキシ榭脂、エポキシ当量 228、固形)、 NC3000H (ビフエ- ル型エポキシ榭脂、エポキシ当量 290、固形)、東都化成 (株)製の ESN185 (ナフト 一ルノボラック型エポキシ榭脂、エポキシ当量 275、固形)、 ESN475 (ナフトールノ ポラック型エポキシ榭脂、エポキシ当量 350、固形)等が挙げられる。 [0024] Specific examples of such epoxy resins include HP 4700 (EXA4700) (tetrafunctional naphthalene type epoxy resin, epoxy equivalent 163, solid) manufactured by Dainippon Ink & Chemicals, Inc., N— 690 (Crezo novolac epoxy resin, epoxy equivalent 208, solid), N—695 (Crezo novolac epoxy resin, epoxy equivalent 208, solid), EPP N— 502H (Trisphenol) from Nippon Kayaku Co., Ltd. Epoxy resin, epoxy equivalent 168, solid), NC7000L (naphthol novolac epoxy resin, epoxy equivalent 228, solid), NC3000H (biphenyl epoxy resin, epoxy equivalent 290, solid), manufactured by Tohto Kasei Co., Ltd. ESN185 (naphtholene novolak type epoxy resin, epoxy equivalent 275, solid), ESN475 (naphthol nopolac type epoxy resin, epoxy equivalent 350, solid) and the like.
[0025] また、エポキシ榭脂 (A)として、第 1のエポキシ榭脂 (A1)と第 2のエポキシ榭脂 (A 2)を併用する場合、第 1のエポキシ榭脂 (A1)と第 2のエポキシ榭脂 (A2)の配合割 合 (A1 :A2)は、質量比で 1 : 0. 3〜2の範囲が好ましぐ 1 : 0. 5〜1の範囲がより好 ましい。力かる範囲を超えて第 1のエポキシ榭脂 (A1)の割合が多すぎると、榭脂組 成物の粘着性が高くなり、接着フィルムの形態で使用する場合に、真空ラミネート時 の脱気性が低下しボイドが発生しやすくなる傾向にある。また真空ラミネート時に保 護フィルムや支持フィルムの剥離性の低下や、硬化後の耐熱性が低下する傾向にあ る。また、榭脂組成物の硬化物において十分な破断強度が得られにくい傾向にある 。一方、力かる範囲を超えて第 2のエポキシ榭脂 (A2)の割合が多すぎると、接着フィ ルムの形態で使用する場合に、十分な可撓性が得られず、取り扱い性が低下する、 ラミネートの際の十分な流動性が得られにくいなどの傾向がある。 [0025] When the first epoxy resin (A1) and the second epoxy resin (A 2) are used in combination as the epoxy resin (A), the first epoxy resin (A1) and the second epoxy resin (A1) The blend ratio (A1: A2) of the epoxy resin (A2) is preferably in the range of 1: 0.3 to 2 in terms of mass ratio, more preferably in the range of 1: 0.5 to 1. If the ratio of the first epoxy resin (A1) is too large beyond the range, it will increase the tackiness of the resin composition and, when used in the form of an adhesive film, deaeration during vacuum lamination Tends to decrease and voids tend to occur. In addition, the peelability of the protective film and the support film during vacuum lamination tends to decrease, and the heat resistance after curing tends to decrease. In addition, a sufficient breaking strength tends to be hardly obtained in the cured product of the resin composition. On the other hand, if the ratio of the second epoxy resin (A2) is too large beyond the range where force is applied, sufficient flexibility cannot be obtained when the adhesive film is used in the form of an adhesive film, resulting in poor handling. There is a tendency that it is difficult to obtain sufficient fluidity when laminating.
[0026] 本発明のエポキシ榭脂組成物において、エポキシ榭脂組成物の不揮発成分を 10 0質量%とした場合、成分 (A)のエポキシ榭脂含有量は 10〜50質量%であるのが 好ましぐより好ましくは 20〜40質量%であり、とりわけ好ましくは 20〜35質量%であ る。エポキシ榭脂 (A)の含有量力 Sこの範囲力も外れると、榭脂組成物の硬化性が低 下する傾向にある。また、本発明のエポキシ榭脂組成物は、本発明の効果が発揮さ れる範囲 (通常、エポキシ榭脂組成物の不揮発成分を 100質量%とした場合に 50質 量%以下)で、成分 (A)以外の、他のエポキシ榭脂を含んでいてもよい。 [0026] In the epoxy resin composition of the present invention, when the nonvolatile component of the epoxy resin composition is 100% by mass, the epoxy resin content of the component (A) is 10 to 50% by mass. More preferably, it is 20 to 40% by mass, and particularly preferably 20 to 35% by mass. Content power of epoxy resin (A) S If this range power is also removed, the curability of the resin composition tends to decrease. In addition, the epoxy resin composition of the present invention has a range in which the effect of the present invention is exhibited (usually 50% when the nonvolatile component of the epoxy resin composition is 100% by mass). In addition to component (A), other epoxy resins may be included.
[0027] [成分 (B)のナフトール系硬化剤] [0027] [Naphthol-based curing agent of component (B)]
本発明における「ナフトール系硬化剤」とは、 1分子中に 2以上のナフトール構造を 有し、エポキシ榭脂 (A)の硬化剤として作用する化合物を意味する。 The “naphthol curing agent” in the present invention means a compound having two or more naphthol structures in one molecule and acting as a curing agent for epoxy resin (A).
[0028] 当該ナフトール系硬化剤としては、下式(1)で表されるナフトール系硬化剤が好ま しぐ下式(1 ' )で表されるナフトール系硬化剤が特に好ま 、。 [0028] As the naphthol-based curing agent, the naphthol-based curing agent represented by the following formula (1 ') is particularly preferable, and the naphthol-based curing agent represented by the following formula (1) is particularly preferable.
[0029] [化 5] [0029] [Chemical 5]
[0030] (式中、 R1〜R4は各々独立して、水素原子又はアルキル基を示し、 XIはそれぞれ アルキル基で置換されて 、てもよ 、ナフタレン環を示し、 Yはそれぞれアルキル基で 置換されていてもよい、ベンゼン環、ヒドロキシベンゼン環、ビフエ-ル環又はナフタ レン環を示し、 j及び kはそれぞれ平均値で 1〜15の数を示す。 ) (Wherein R1 to R4 each independently represents a hydrogen atom or an alkyl group, XI may be each substituted with an alkyl group, may represent a naphthalene ring, and Y represents each substituted with an alkyl group. A benzene ring, a hydroxybenzene ring, a biphenyl ring or a naphthalene ring, each of which may be an integer, and j and k each represent an average value of 1 to 15.)
[0031] [化 6] [0031] [Chemical 6]
( 1,) (1,)
[0032] (式中、 R1〜R4は各々独立して、水素原子又はアルキル基を示し、 XIはそれぞれ アルキル基で置換されて 、てもよ 、ナフタレン環を示し、 Yはそれぞれアルキル基で 置換されていてもよい、ベンゼン環、ヒドロキシベンゼン環、ビフエ-ル環又はナフタ レン環を示し、 nは平均値で 1〜15の数を示す。 ) (Wherein R1 to R4 each independently represent a hydrogen atom or an alkyl group, XI may be each substituted with an alkyl group, may represent a naphthalene ring, and Y represents each substituted with an alkyl group. A benzene ring, a hydroxybenzene ring, a biphenyl ring or a naphthalene ring, which may be used, n represents an average value of 1 to 15.)
[0033] なお、式(1)及び式(1 ' )において、式中のアルキル基としては、炭素数 1〜3のァ ルキル基が好ましく、特にメチル基が好まし 、。 [0033] In the formula (1) and the formula (1 '), the alkyl group in the formula is preferably an alkyl group having 1 to 3 carbon atoms, particularly preferably a methyl group.
[0034] [成分 (C)のチォアルキル基含有フエノール系硬化剤] 本発明における「チォアルキル基含有フエノール系硬化剤」とは、 1分子中に 1以上 のチォアルキル基並びに 1分子中に 1以上のフエノール及び又はナフトール構造を 有し、エポキシ榭脂 (A)の硬化剤として作用する化合物を意味する。 [0034] [Thioalkyl group-containing phenolic curing agent of component (C)] The “thioalkyl group-containing phenolic curing agent” in the present invention has one or more thioalkyl groups in one molecule and one or more phenol and / or naphthol structures in one molecule, and is a curing agent for epoxy resin (A). Means a compound that acts as
[0035] 当該チォアルキル基含有フエノール系硬化剤としては、下式 (2)で表されるチオア ルキル基含有フエノール系硬化剤が好ましぐ下式(2' )で表されるチォアルキル基 含有フエノール系硬化剤が特に好まし 、。 [0035] As the thioalkyl group-containing phenolic curing agent, a thioalkyl group-containing phenolic agent represented by the following formula (2 '), which is preferably a thioalkyl group-containing phenolic curing agent represented by the following formula (2): A curing agent is particularly preferred.
[0036] [化 7] [0036] [Chemical 7]
[0037] (式中、 R5は水素原子又はアルキル基を示し、 R6はチォアルキル基を示し、 X2は それぞれアルキル基で置換されて 、てもよ 、ベンゼン環又はナフタレン環を示し、 j 及び kはそれぞれ平均値で 1〜15の数を示し、 mは 1〜5の整数を示す。 ) (In the formula, R5 represents a hydrogen atom or an alkyl group, R6 represents a thioalkyl group, X2 is each substituted with an alkyl group, and represents a benzene ring or a naphthalene ring, and j and k are Each represents an average value of 1 to 15, and m represents an integer of 1 to 5.)
[0038] [化 8] [0038] [Chemical 8]
( 2, ) (2,)
[0039] (式中、 R5は水素原子又はアルキル基を示し、 R6はチォアルキル基を示し、 X2は それぞれアルキル基で置換されて 、てもよ 、ベンゼン環又はナフタレン環を示し、 n は平均値で 1〜15の数を示し、 mは 1〜5の整数を示す。 ) (In the formula, R5 represents a hydrogen atom or an alkyl group, R6 represents a thioalkyl group, X2 is each substituted with an alkyl group, and may represent a benzene ring or a naphthalene ring, and n represents an average value. Represents a number from 1 to 15, and m represents an integer from 1 to 5.)
[0040] なお、式(2)及び式(2' )において、 mが 2〜5のとき、複数の R6は同一である必要 はなぐ各々独立して、水素原子、アルキル基又はチォアルキル基力 選択される基 であってよい。また、アルキル基としては炭素数 1〜3のアルキル基が好ましぐ特にメ チル基が好ましい。また、チォアルキル基としては、炭素数 1〜3のアルキル基が好ま しぐ特にチォメチル基が好ましい。 [0040] In the formulas (2) and (2 '), when m is 2 to 5, a plurality of R6 need not be the same, each independently selected from a hydrogen atom, an alkyl group, or a thioalkyl group. It may be a group. As the alkyl group, an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is particularly preferable. As the thioalkyl group, an alkyl group having 1 to 3 carbon atoms is preferred. In particular, a thiomethyl group is preferred.
[0041] 本発明では、上記式(1)、式(1 ' )、式 (2)及び式 (2' )で表されるような、 1分子中 の平均水酸基含有率 P ( (総水酸基数 Z総ベンゼン環数)の平均値)が 0< P< 1であ るフエノール系硬化剤を採用することにより、本発明のエポキシ榭脂組成物の硬化物 を粗ィ匕処理して得られる粗ィ匕面がより微細化され、更に高密度配線ィ匕に適したものと することができる。 In the present invention, the average hydroxyl group content P ((total number of hydroxyl groups) in one molecule as represented by the above formula (1), formula (1 ′), formula (2) and formula (2 ′). By employing a phenol-based curing agent having an average value of Z total benzene ring number) of 0 <P <1, a coarse product obtained by subjecting the cured product of the epoxy resin composition of the present invention to a rough treatment. The surface can be made finer and more suitable for high-density wiring.
[0042] なお、成分 (B)のナフトール系硬化剤としては、下式(3)で表されるものがより好ま しい。 [0042] The naphthol curing agent of component (B) is more preferably represented by the following formula (3).
[0043] [化 9] [0043] [Chemical 9]
[0044] (式中、 R7は水素原子又はメチル基を示し、 Zはナフタレン環を示し、 nは平均値で 1 〜 15の数を示す。 ) (In the formula, R7 represents a hydrogen atom or a methyl group, Z represents a naphthalene ring, and n represents an average value of 1 to 15.)
[0045] 力かる式(3)で表わされるナフトール系硬化剤の具体例としては、日本化薬 (株)製 の NHN (Z :ナフタレン環、 R7 :メチル基、平均水酸基含有率: 3Z5〜2Z3、下図参 照)、 CBN (Z :ナフタレン環、 R7 :メチル基、平均水酸基含有率: 3Z5〜2Z3、下図 参照)などが挙げられる。 [0045] Specific examples of the naphthol-based curing agent represented by the powerful formula (3) include NHN (Z: naphthalene ring, R7: methyl group, average hydroxyl group content: 3Z5 to 2Z3 manufactured by Nippon Kayaku Co., Ltd. And CBN (Z: naphthalene ring, R7: methyl group, average hydroxyl group content: 3Z5 to 2Z3, see the figure below).
[0046] [化 10] [0046] [Chemical 10]
[0047] また、成分 (C)のチォアルキル基含有フエノール系硬化剤としては、下式 (4)で表 されるものがより好ましい。 [0047] The thioalkyl group-containing phenolic curing agent of component (C) is more preferably one represented by the following formula (4).
[0048] [化 11] [0048] [Chemical 11]
[0049] (式中、 R11はチオメチル基を示し、 nは平均値で 1〜15の数を示す。) (Wherein R11 represents a thiomethyl group, and n represents an average value of 1 to 15)
かかる式 (4)で表わされるチォアルキル基含有フエノール系硬化剤の具体例として は、ジャパンエポキシレジン (株)製の YLH1110L (平均水酸基含有率: 1Z2〜2Z 3)などが挙げられる。 Specific examples of the thioalkyl group-containing phenolic curing agent represented by the formula (4) include YLH1110L (average hydroxyl group content: 1Z2 to 2Z3) manufactured by Japan Epoxy Resin Co., Ltd.
[0050] 成分 )と(C)の配合割合は、質量比で 1 : 0. 1〜1 : 1. 5の範囲であるのが好まし く、 1 : 0. 1〜1 : 1の範囲であるのが更に好ましい。成分(C)のチォアルキル基含有フ ェノール系硬化剤の割合が小さすぎると、エポキシ榭脂組成物により形成される絶縁 層とメツキ導体層との密着性が低下する傾向にあり、大きすぎると、榭脂の保存安定 性が低下する傾向にある。 [0050] The mixing ratio of the components) and (C) is preferably in the range of 1: 0.1 to 1: 1.5 in terms of mass ratio, in the range of 1: 0.1 to 1: 1. More preferably. If the proportion of the phenolic curing agent containing a thioalkyl group as the component (C) is too small, the adhesion between the insulating layer formed by the epoxy resin composition and the conductive conductor layer tends to decrease. There is a tendency for the storage stability of rosin to decrease.
[0051] 本発明のエポキシ榭脂組成物には、成分 (B)及び成分 (C)以外の他のフエノール 系硬化剤を配合してもよい。この場合、本発明の効果を十分発揮する上で、組成物 中の全フ ノール系硬ィ匕剤のうちの 50質量%以上が成分 (B)及び成分 (C)であるの が好ましぐより好ましくは 70質量%以上、特に 90質量%以上が成分 (B)及び成分( C)であるのが好ましい。 [0051] The epoxy resin composition of the present invention includes a phenol other than component (B) and component (C). A system curing agent may be blended. In this case, it is preferable that 50% by mass or more of the total phenolic hardener in the composition is the component (B) and the component (C) in order to sufficiently exhibit the effects of the present invention. More preferably, 70% by mass or more, particularly 90% by mass or more is preferably component (B) and component (C).
[0052] 本発明において、エポキシ榭脂組成物中のフ ノール系硬化剤の量 (成分 (B)及 び成分 (C)のみを使用する場合のこれらの全量、または、成分 (B)及び成分 (C)以 外の他のフエノール系硬化剤と併用する場合のそれらの合計量)は、通常、エポキシ 榭脂組成物中に存在するエポキシ基の合計数とフエノール系硬化剤のフエノール性 水酸基の合計数の比率が 1 : 0. 1〜1 : 1. 5となる量にするのが好ましぐ当該比率が 1 : 0. 3〜1 : 1となる量にするのがより好ましい。なおエポキシ榭脂組成物中に存在す るエポキシ基の合計数とは、各エポキシ榭脂の固形分質量をエポキシ当量で除した 値をすベてのエポキシ榭脂にっ 、て合計した値であり、フエノール系硬ィ匕剤のフエノ ール性水酸基の合計数とは、各フエノール系硬ィ匕剤の固形分質量をそのフエノール 性水酸基当量で除した値をすベてのフエノール系硬化剤について合計した値である 。フエノール系硬化剤の含有量力 Sかかる好ましい範囲を外れると、榭脂組成物を硬 化して得られる硬化物の耐熱性が不十分となる場合がある。 [0052] In the present invention, the amount of the phenolic curing agent in the epoxy resin composition (the total amount when only the component (B) and the component (C) are used, or the component (B) and the component (C) The total amount of those used in combination with other phenolic curing agents is usually the total number of epoxy groups present in the epoxy resin composition and the phenolic hydroxyl groups of the phenolic curing agent. It is preferable to set the ratio so that the ratio of the total number is 1: 0.1 to 1: 1.5, and it is more preferable to set the ratio so that the ratio is 1: 0.3 to 1: 1. The total number of epoxy groups present in the epoxy resin composition is the total value of all epoxy resins obtained by dividing the solid mass of each epoxy resin by the epoxy equivalent. Yes, the total number of phenolic hydroxyl groups in the phenolic hardener is the total number of phenolic hardeners obtained by dividing the solid mass of each phenolic hardener by its phenolic hydroxyl group equivalent. Is the total value of. If the content of the phenol-based curing agent is outside the preferable range, the heat resistance of the cured product obtained by curing the resin composition may be insufficient.
[0053] 本発明にお ヽて、成分 (D)の無機充填材は、エポキシ榭脂組成物の難燃性を高め るのと同時に熱膨張率の低下にも寄与する。無機充填材としては、例えば、シリカ、 アルミナ、硫酸バリウム、タルク、クレー、雲母粉、水酸ィ匕アルミニウム、水酸化マグネ シゥム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、窒化ホウ素、ホウ酸 アルミニウム、チタン酸バリウム、チタン酸ストロンチウム、チタン酸カルシウム、チタン 酸マグネシウム、チタン酸ビスマス、酸化チタン、ジルコン酸バリウム、ジルコン酸カル シゥムなどが挙げられ、これらの中でもシリカが特に好適である。無機充填材の平均 粒径は 1 μ m以下であるのが好ましぐ 0. 8 m以下がより好ましぐ 0. 7 μ m以下が とりわけ好ましい。平均粒径が 1 μ mを超える場合、微細配線の形成に不利となる傾 向にある。なお、無機充填材の平均粒径力 、さくなりすぎると、エポキシ榭脂組成物 を榭脂ワニスとした場合に、ワニスの粘度が上昇し、取り扱い性が低下する傾向にあ るため、平均粒径は 0. 05 m以上であるのが好ましい。なお、無機充填材は耐湿性 を向上させるため、シランカツプリング剤等の表面処理剤で表面処理してあるものが 好ましい。 [0053] In the present invention, the inorganic filler of component (D) increases the flame retardancy of the epoxy resin composition and contributes to a decrease in the coefficient of thermal expansion. Examples of inorganic fillers include silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, and titanium. Examples thereof include barium oxide, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, calcium zirconate, and among these, silica is particularly preferable. The average particle size of the inorganic filler is preferably 1 μm or less, more preferably 0.8 m or less, and particularly preferably 0.7 μm or less. When the average grain size exceeds 1 μm, it tends to be disadvantageous for the formation of fine wiring. If the average particle size force of the inorganic filler becomes too small, the viscosity of the varnish tends to increase and the handleability tends to decrease when the epoxy resin composition is made into a resin varnish. The diameter is preferably 0.05 m or more. Inorganic filler is moisture resistant In order to improve this, what is surface-treated with a surface treatment agent such as a silane coupling agent is preferable.
[0054] 上記無機充填材の平均粒径はミー (Mie)散乱理論に基づくレーザー回折'散乱法 により測定することができる。具体的にはレーザー回折式粒度分布測定装置により、 無機充填材の粒度分布を体積基準で作成し、そのメディアン径を平均粒径とすること で測定することができる。測定サンプルは、無機充填材を超音波により水中に分散さ せたものを好ましく使用することができる。レーザー回折式粒度分布測定装置として は、株式会社堀場製作所製 LA— 500等を使用することができる。 [0054] The average particle size of the inorganic filler can be measured by a laser diffraction 'scattering method based on Mie scattering theory. Specifically, it can be measured by creating a particle size distribution of an inorganic filler on a volume basis with a laser diffraction particle size distribution measuring device and setting its median diameter as an average particle size. As the measurement sample, an inorganic filler dispersed in water by ultrasonic waves can be preferably used. As a laser diffraction type particle size distribution measuring apparatus, LA-500 manufactured by Horiba, Ltd. can be used.
[0055] 当該無機充填材を配合する場合の、榭脂組成物 (不揮発分 100質量%)に対する 含有割合は榭脂組成物に要求される特性によっても異なる力 多層プリント配線板の 層間絶縁層形成に用いる上で、 20〜60質量%であるのが好ましぐ 25〜50質量% 力 り好ましぐ 30〜45質量%がとりわけ好ましい。無機充填材の配合量が多すぎる と絶縁層とメツキ導体層との密着強度の低下や、エポキシ榭脂組成物の硬化物が脆 くなる傾向にある。一方、配合量が少なすぎると、硬化物の難燃性低下や、熱膨張率 が増大する傾向にある。 [0055] When the inorganic filler is blended, the content ratio with respect to the resin composition (non-volatile content: 100% by mass) varies depending on the properties required for the resin composition. Formation of interlayer insulating layer of multilayer printed wiring board When used in the above, it is preferably 20 to 60% by mass, more preferably 25 to 50% by mass, and particularly preferably 30 to 45% by mass. If the amount of the inorganic filler is too large, the adhesion strength between the insulating layer and the conductive conductor layer tends to decrease, and the cured product of the epoxy resin composition tends to become brittle. On the other hand, if the amount is too small, the flame retardancy of the cured product tends to decrease and the coefficient of thermal expansion tends to increase.
[0056] 本発明のエポキシ榭脂組成物は、メツキ導体の密着強度を高める等の目的で、ポリ ビュルァセタール榭脂を含有してもよ ヽ。ポリビニルァセタール榭脂としては特に限 定されないが、ポリビニルブチラール樹脂が好ましい。ポリビニルァセタール榭脂の 具体例としては、電気化学工業 (株)製、電化ブチラール 4000— 2、 5000— A、 600 0— C、 6000— EP、積水化学工業 (株)製エスレック BHシリーズ、 BXシリーズ、 KS シリーズ、 BLシリーズ、 BMシリーズ等が挙げられる。 [0056] The epoxy resin composition of the present invention may contain poly (bullacetal) resin for the purpose of increasing the adhesion strength of the metallic conductor. The polyvinyl acetal resin is not particularly limited, but a polyvinyl butyral resin is preferable. Specific examples of polyvinylacetal resin include: Electric Chemical Industry Co., Ltd., Electric Butyral 4000-2, 5000—A, 600 0—C, 6000—EP, Sekisui Chemical Co., Ltd. ESREC BH series, BX Series, KS series, BL series, BM series etc.
[0057] 当該ポリビニルァセタールはガラス転移温度が 80°C以上のものが特に好ましい。こ こでいう「ガラス転移温度」 ίお IS K 7197に記載の方法に従って決定される。なお 、ガラス転移温度が分解温度よりも高ぐ実際にはガラス転移温度が観測されない場 合には、分解温度を本発明におけるガラス転移温度とみなすことができる。なお、分 解温度とは、 JIS K 7120に記載の方法に従って測定したときの質量減少率が 5% となる温度で定義される。 [0057] The polyvinyl acetal particularly preferably has a glass transition temperature of 80 ° C or higher. The “glass transition temperature” here is determined in accordance with the method described in IS K 7197. When the glass transition temperature is higher than the decomposition temperature and no glass transition temperature is actually observed, the decomposition temperature can be regarded as the glass transition temperature in the present invention. The decomposition temperature is defined as the temperature at which the mass reduction rate is 5% when measured according to the method described in JIS K 7120.
[0058] 本発明のエポキシ榭脂組成物において、エポキシ榭脂組成物の不揮発成分を 10 0質量%とした場合、ポリビュルァセタールの含有割合は 2〜20質量%が好まし 、。 [0058] In the epoxy resin composition of the present invention, the non-volatile component of the epoxy resin composition is 10%. When the content is 0% by mass, the content ratio of polybutelacetal is preferably 2 to 20% by mass.
[0059] 本発明のエポキシ榭脂組成物は、接着フィルムの可撓性向上等の目的で、フエノ キシ榭脂を含有してもよい。フエノキシ榭脂としては特に限定されず、公知のフエノキ シ榭脂等を用いることができる。エポキシ榭脂組成物の不揮発成分を 100質量%とし た場合、当該フエノキシ榭脂の含有割合は 3〜30質量%の範囲であることが好まし い。フエノキシ榭脂の具体例としては東都化成 (株)製 FX280、 FX293、ジャパンェ ポキシレジン (株)製 YX8100、 YL6954、 YL6974等が挙げられる。 [0059] The epoxy resin composition of the present invention may contain phenoxy resin for the purpose of improving the flexibility of the adhesive film. The phenoxy resin is not particularly limited, and a known phenoxy resin can be used. When the nonvolatile component of the epoxy resin composition is 100% by mass, the content of the phenoxy resin is preferably in the range of 3 to 30% by mass. Specific examples of phenoxy resin include FX280 and FX293 manufactured by Toto Kasei Co., Ltd., YX8100, YL6954 and YL6974 manufactured by Japan Epoxy Resin Co., Ltd.
[0060] 本発明のエポキシ榭脂組成物は、硬化物の機械強度を高める等の目的で、ゴム粒 子を含有してもよい。ゴム粒子の好ましい例としては、コアシェル型ゴム粒子、架橋ァ クリル二トリルブタジエンゴム粒子、架橋スチレンブタジエンゴム粒子、アクリルゴム粒 子などが挙げられる。コアシェル型ゴム粒子は、粒子がコア層とシェル層を有するゴ ム粒子であり、例えば、外層のシェル層がガラス状ポリマー、内層のコア層がゴム状 ポリマーで構成される 2層構造、または外層のシェル層がガラス状ポリマー、中間層 がゴム状ポリマー、コア層がガラス状ポリマーで構成される 3層構造のものなどが挙げ られる。ガラス層は例えば、メタクリル酸メチルの重合物などで構成され、ゴム状ポリマ 一層は例えば、ブチルアタリレート重合物(ブチルゴム)などで構成される。コアシェル 型ゴム粒子の具体例としては、スタフイロイド AC3832、 AC3816N、 (ガンツ化成( 株)商品名)、メタプレン KW— 4426 (三菱レイヨン (株)商品名)が挙げられる。アタリ 口-トリルブタジエンゴム(NBR)粒子の具体例としては、:^尺ー91 (平均粒径0. 5 μ m、 JSR (株)製)などが挙げられる。スチレンブタジエンゴム(SBR)粒子の具体例 としては、 XSK— 500 (平均粒径 0. (株)製)などが挙げられる。アクリル ゴム粒子の具体例としては、メタプレン W300A (平均粒径 0. 1 m)、 W450A (平 均粒径 0. 2 μ ΐη) (三菱レイヨン (株)製)を挙げることができる。 [0060] The epoxy resin composition of the present invention may contain rubber particles for the purpose of increasing the mechanical strength of the cured product. Preferable examples of the rubber particles include core-shell type rubber particles, cross-linked acrylonitrile butadiene rubber particles, cross-linked styrene butadiene rubber particles, acrylic rubber particles and the like. The core-shell type rubber particles are rubber particles having a core layer and a shell layer. For example, the outer shell layer is a glassy polymer and the inner core layer is a rubbery polymer, or an outer layer. And a three-layer structure in which the shell layer is made of a glassy polymer, the intermediate layer is made of a rubbery polymer, and the core layer is made of a glassy polymer. The glass layer is made of, for example, a polymer of methyl methacrylate, and the rubbery polymer layer is made of, for example, a butyl acrylate polymer (butyl rubber). Specific examples of the core-shell type rubber particles include Staphyloid AC3832, AC3816N (Ganz Kasei Co., Ltd. trade name), Metaprene KW-4426 (Mitsubishi Rayon Co., Ltd. trade name). Specific examples of Atariguchi-tolyl butadiene rubber (NBR) particles include: 尺 -91 (average particle size 0.5 μm, manufactured by JSR Corporation). Specific examples of styrene butadiene rubber (SBR) particles include XSK-500 (average particle size 0, manufactured by Co., Ltd.). Specific examples of the acrylic rubber particles include Metapuren W300A (average particle size 0. 1 m), W450A (flat Hitoshitsubu径0. 2 μ ΐ η) (manufactured by Mitsubishi Rayon Co., Ltd.).
[0061] 当該ゴム粒子を配合する場合の、榭脂組成物 (不揮発分 100質量%)に対する含 有割合は、榭脂組成物に要求される特性によっても異なる力 1〜10質量%である のが好ましぐ更には、 2〜5質量%がより好ましい。 [0061] When the rubber particles are blended, the content ratio with respect to the resin composition (non-volatile content: 100% by mass) is a force of 1 to 10% by mass, which varies depending on the properties required for the resin composition. Furthermore, 2 to 5% by mass is more preferable.
[0062] 本発明のエポキシ榭脂組成物は、硬化時間を調整する等の目的で硬化促進剤を 含有してもよい。硬化促進剤としては、例えば、有機フォスフィンィ匕合物、イミダゾー ル化合物、アミンァダクトィ匕合物、 3級アミンィ匕合物などが挙げられる。有機フォスフィ ン化合物の具体例としては、 TPP、 ΤΡΡ— Κ、 ΤΡΡ— S、 TPTP— S (北興化学工業[0062] The epoxy resin composition of the present invention may contain a curing accelerator for the purpose of adjusting the curing time. Examples of the curing accelerator include organic phosphine compounds and imidazoles. Compounds, amine adduct compounds, tertiary amine compounds and the like. Specific examples of organic phosphine compounds include TPP, ΤΡΡ—Κ, ΤΡΡ—S, TPTP—S (Hokuko Chemical Industries).
(株)商品名)などが挙げられる。イミダゾールイ匕合物の具体例としては、キュアゾール(Trade name)). Specific examples of imidazole compounds include cure azole
2MZ、 2E4MZ、 C11Z、 C11Z— CN、 C11Z— CNS、 C11Z— A、 2MZ— OK、 2 MA— OK、 2PHZ (四国化成工業 (株)商品名)などが挙げられる。アミンァダクトィ匕 合物の具体例としては、ノバキユア (旭化成工業 (株)商品名)、フジキュア(富士化成 工業 (株)商品名)などが挙げられる。 3級ァミン化合物の具体例としては、 DBU (1,8- diazabicyclo[5,4,0]undec- 7- ene)などが挙げられる。本発明のエポキシ榭脂組成物 において、硬化促進剤の含有量は、エポキシ榭脂組成物中に含まれるエポキシ榭脂 とフエノール性硬化剤の総量を 100質量%(固形分)とした場合、通常 0. 1〜5質量 %の範囲で使用される。 2MZ, 2E4MZ, C11Z, C11Z—CN, C11Z—CNS, C11Z—A, 2MZ—OK, 2 MA—OK, 2PHZ (trade names of Shikoku Kasei Kogyo Co., Ltd.). Specific examples of the amine amine compound include Novaki Yua (trade name of Asahi Kasei Kogyo Co., Ltd.) and Fuji Cure (trade name of Fuji Kasei Kogyo Co., Ltd.). Specific examples of the tertiary amine compound include DBU (1,8-diazabicyclo [5,4,0] undec-7-ene). In the epoxy resin composition of the present invention, the content of the curing accelerator is usually when the total amount of epoxy resin and phenolic curing agent contained in the epoxy resin composition is 100% by mass (solid content). 0.1 Used in the range of 1-5% by mass.
[0063] 本発明のエポキシ榭脂組成物は、本発明の効果が発揮される範囲で難燃剤を含 有してもょ 、。但しハロゲン系難燃剤は近年のダイォキシンに代表される環境問題な ど力 使用が困難になりつつあり、またリン系難燃剤も環境への影響など力もその使 用が抑制されつつあるため、これらの難燃剤は含有されないか、含有されたとしても できるだけ少量であるのが好まし、。本発明のエポキシ榭脂組成物はハロゲン元素 及びリン元素を含むことなく十分な難燃性を達成することができるため、環境面でも 優れたエポキシ榭脂組成物とすることができる。 [0063] The epoxy resin composition of the present invention may contain a flame retardant as long as the effects of the present invention are exhibited. However, the use of halogen-based flame retardants is becoming difficult due to environmental problems such as dioxin in recent years, and the use of phosphorus-based flame retardants, such as the impact on the environment, is being suppressed. It is preferable to contain no flame retardant or as little as possible. Since the epoxy resin composition of the present invention can achieve sufficient flame retardancy without containing a halogen element and a phosphorus element, it can be an epoxy resin composition that is excellent in terms of environment.
[0064] 本発明のエポキシ榭脂組成物は、本発明の効果が発揮される範囲で、上述した以 外の他の榭脂添加剤を含有しても良い。榭脂添加剤としては、例えばシリコンパウダ 一、ナイロンパウダー、フッ素パウダー等の有機充填剤、オルベン、ベントン等の増 粘剤、シリコーン系、フッ素系、高分子系の消泡剤又はレべリング剤、イミダゾール系 、チアゾール系、トリァゾール系、シランカップリング剤等の密着性付与剤、着色顔料 等を挙げることができる。 [0064] The epoxy resin composition of the present invention may contain other resin additives other than those described above as long as the effects of the present invention are exhibited. Examples of the oil additives include silicone powders, organic fillers such as nylon powder and fluorine powder, thickeners such as olben and benton, silicone-based, fluorine-based and polymer-based antifoaming agents or leveling agents. , Imidazole series, thiazole series, triazole series, adhesion imparting agents such as silane coupling agents, and coloring pigments.
[0065] 本発明のエポキシ榭脂組成物は、支持フィルム上に塗布し榭脂組成物層を形成さ せて多層プリント配線板用の接着フィルムとする力、または繊維力もなるシート状補強 基材中に該榭脂組成物を含浸させて多層プリント配線板の層間絶縁層用のプリプレ グとすることができる。本発明のエポキシ榭脂組成物は回路基板に塗布して絶縁層 を形成することもできるが、工業的には一般に、接着フィルムまたはプリプレダの形態 として絶縁層形成に用いられる。 [0065] The epoxy resin composition of the present invention is applied to a support film to form a resin composition layer to form an adhesive film for a multilayer printed wiring board, or a sheet-like reinforcing substrate that also has fiber strength. The resin composition can be impregnated into a prepreg for an interlayer insulating layer of a multilayer printed wiring board. The epoxy resin composition of the present invention is applied to a circuit board to form an insulating layer. However, industrially, it is generally used for forming an insulating layer in the form of an adhesive film or a pre-preda.
[0066] 本発明の接着フィルムは、当業者に公知の方法、例えば、有機溶剤に榭脂組成物 を溶解した榭脂ワニスを調製し、支持フィルムを支持体として、この榭脂ワニスを塗布 し、更に加熱、あるいは熱風吹きつけ等により有機溶剤を乾燥させて榭脂組成物層 を形成させること〖こより製造することができる。 [0066] The adhesive film of the present invention is prepared by a method known to those skilled in the art, for example, by preparing a resin varnish obtained by dissolving a resin composition in an organic solvent, and applying this resin varnish using the support film as a support. Further, the organic solvent can be dried by heating or blowing hot air to form a resin composition layer.
[0067] 有機溶剤としては、例えば、アセトン、メチルェチルケトン、シクロへキサノン等のケト ン類、酢酸ェチル、酢酸ブチル、セロソルブアセテート、プロピレングリコールモノメチ ルエーテルアセテート、カルビトールアセテート等の酢酸エステル類、セロソルブ、ブ チルカルビトール等のカルビトール類、トルエン、キシレン等の芳香族炭化水素類、 ジメチルホルムアミド、ジメチルァセトアミド、 N—メチルピロリドン等を挙げることができ る。有機溶剤は 2種以上を組み合わせて用いてもよい。 [0067] Examples of the organic solvent include ketones such as acetone, methyl ethyl ketone, and cyclohexanone, and acetic acid esters such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate. Carbitols such as cellosolve and butyral carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like. Two or more organic solvents may be used in combination.
[0068] 乾燥条件は特に限定されな ヽが、榭脂組成物層への有機溶剤の含有割合が通常 10質量%以下、好ましくは 5質量%以下となるように乾燥させる。ワニス中の有機溶 媒量によっても異なる力 例えば 30〜60質量%の有機溶剤を含むワニスを 50〜15 0°Cで 3〜10分程度乾燥させることができる。当業者は、簡単な実験により適宜、好 適な乾燥条件を設定することができる。 [0068] The drying conditions are not particularly limited, but the drying is performed so that the content of the organic solvent in the resin composition layer is usually 10% by mass or less, preferably 5% by mass or less. Different forces depending on the amount of organic solvent in the varnish For example, a varnish containing 30 to 60% by mass of an organic solvent can be dried at 50 to 150 ° C. for about 3 to 10 minutes. Those skilled in the art can appropriately set suitable drying conditions by simple experiments.
[0069] 接着フィルムにおいて形成される榭脂組成物層の厚さは、通常、導体層の厚さ以 上とする。回路基板が有する導体層の厚さは通常 5〜70 mの範囲であるので、榭 脂組成物層の厚さは 10〜: LOO mの厚みを有するのが好ましい。榭脂組成物層は 、後述する保護フィルムで保護されていてもよい。保護フィルムで保護することにより 、榭脂組成物層表面へのゴミ等の付着やキズを防止することができる。 [0069] The thickness of the resin composition layer formed in the adhesive film is usually not less than the thickness of the conductor layer. Since the thickness of the conductor layer of the circuit board is usually in the range of 5 to 70 m, the thickness of the resin composition layer is preferably 10 to: LOO m. The resin composition layer may be protected by a protective film described later. By protecting with a protective film, it is possible to prevent adhesion or scratches of dust or the like to the surface of the resin composition layer.
[0070] 本発明における支持フィルム及び保護フィルムとしては、ポリエチレン、ポリプロピレ ン、ポリ塩化ビュル等のポリオレフイン、ポリエチレンテレフタレート(以下「PET」と略 称することがある。)、ポリエチレンナフタレート等のポリエステル、ポリカーボネート、 ポリイミド、更には離型紙や銅箔、アルミニウム箔等の金属箔などを挙げることができ る。なお、支持フィルム及び保護フィルムはマッド処理、コロナ処理の他、離型処理を 施してあってもよい。 [0071] 支持フィルムの厚さは特に限定されないが、通常 10〜150 μ mであり、好ましくは 2 5〜50 /ζ πιの範囲で用いられる。また保護フィルムの厚さも特に制限されないが、通 常 1〜40 /ζ πι、好ましくは 10〜30 /ζ πιの範囲で用いられる。なお、後述するように、 接着フィルムの製造工程で支持体として用いる支持フィルムを、榭脂組成物層表面 を保護する保護フィルムとして使用することもできる。 [0070] Examples of the support film and protective film in the present invention include polyolefins such as polyethylene, polypropylene, and polychlorinated butyl, polyethylene terephthalate (hereinafter sometimes abbreviated as "PET"), polyesters such as polyethylene naphthalate, and polycarbonate. Examples thereof include polyimide, and metal foil such as release paper, copper foil, and aluminum foil. The support film and the protective film may be subjected to a release treatment in addition to the mud treatment and the corona treatment. [0071] The thickness of the support film is not particularly limited, but is usually 10 to 150 µm, and preferably 25 to 50 / ζ πι. The thickness of the protective film is not particularly limited, but is usually 1 to 40 / ζ πι, preferably 10 to 30 / ζ πι. As will be described later, the support film used as the support in the production process of the adhesive film can also be used as a protective film for protecting the surface of the resin composition layer.
[0072] 本発明における支持フィルムは、回路基板にラミネートした後に、或いは加熱硬化 することにより絶縁層を形成した後に、剥離される。接着フィルムを加熱硬化した後に 支持フィルムを剥離すれば、硬化工程でのゴミ等の付着を防ぐことができ、また硬化 後の絶縁層の表面平滑性を向上させることができる。硬化後に剥離する場合、通常 、支持フィルムには予め離型処理が施される。なお、支持フィルム上に形成される榭 脂組成物層は、層の面積が支持フィルムの面積より小さくなるように形成するのが好 ましい。また接着フィルムは、ロール状に巻き取って、保存、貯蔵することができる。 [0072] The support film in the present invention is peeled off after being laminated on a circuit board or after forming an insulating layer by heat curing. If the support film is peeled after the adhesive film is heated and cured, adhesion of dust and the like in the curing process can be prevented, and the surface smoothness of the insulating layer after curing can be improved. In the case of peeling after curing, the support film is usually subjected to a release treatment in advance. The resin composition layer formed on the support film is preferably formed so that the area of the layer is smaller than the area of the support film. The adhesive film can be wound up in a roll shape and stored and stored.
[0073] 次に、本発明の接着フィルムを用いて本発明の多層プリント配線板を製造する方法 について説明する。榭脂組成物層が保護フィルムで保護されている場合はこれらを 剥離した後、榭脂組成物層を回路基板に直接接するように、回路基板の片面又は両 面にラミネートする。本発明の接着フィルムにおいては真空ラミネート法により減圧下 で回路基板にラミネートする方法が好適に用いられる。ラミネートの方法はバッチ式 であってもロールでの連続式であってもよ 、。またラミネートを行う前に接着フィルム 及び回路基板を必要により加熱 (プレヒート)してお 、てもよ 、。 [0073] Next, a method for producing the multilayer printed wiring board of the present invention using the adhesive film of the present invention will be described. When the resin composition layer is protected by a protective film, after peeling off, the resin composition layer is laminated on one or both sides of the circuit board so that the resin composition layer is in direct contact with the circuit board. In the adhesive film of the present invention, a method of laminating on a circuit board under reduced pressure by a vacuum laminating method is preferably used. The laminating method may be batch or continuous with rolls. In addition, the adhesive film and circuit board may be heated (preheated) as necessary before lamination.
[0074] ラミネートの条件は、圧着温度 (ラミネート温度)を好ましくは 70〜140°C、圧着圧力 を好ましくは 1〜: L lkgf/cm2 (9. 8 X 104〜107. 9 X 104N/m2)とし、空気圧 20m mHg (26. 7hPa)以下の減圧下でラミネートするのが好ましい。 [0074] The laminating conditions are such that the pressure bonding temperature (laminating temperature) is preferably 70 to 140 ° C, and the pressure bonding pressure is preferably 1 to: L lkgf / cm 2 (9.8 x 10 4 to 109.9 x 10 4 N / m 2 ) and laminating under reduced pressure with an air pressure of 20 mmHg (26.7 hPa) or less.
[0075] 真空ラミネートは市販の真空ラミネーターを使用して行うことができる。市販の真空 ラミネーターとしては、例えば、 -チゴ一'モートン (株)製 バキュームアップリケータ 一、(株)名機製作所製 真空加圧式ラミネーター、(株)日立インダストリィズ製 ロー ル式ドライコータ、日立エーアイーシー (株)製真空ラミネーター等を挙げることができ る。 [0075] Vacuum lamination can be performed using a commercially available vacuum laminator. Examples of commercially available vacuum laminators include: -Chigoichi 'Morton Co., Ltd. vacuum applicator 1; Meiki Seisakusho Co., Ltd. vacuum pressurizing laminator; Hitachi Industries roll dry coater; Hitachi Air Examples include vacuum laminators manufactured by EC Co., Ltd.
[0076] 本発明における回路基板とは、主として、ガラスエポキシ、金属基板、ポリエステル 基板、ポリイミド基板、 BTレジン基板、熱硬化型ポリフエ-レンエーテル基板等の基 板の片面又は両面にパターン加工された導体層(回路)が形成されたものをいう。ま た導体層と絶縁層が交互に層形成され、片面又は両面がパターン加工された導体 層(回路)となっている多層プリント配線板も本発明にいう回路基板に含まれる。なお 導体回路層表面は黒化処理等により予め粗化処理が施されていた方が絶縁層の回 路基板への密着性の観点から好まし 、。 [0076] The circuit board in the present invention is mainly glass epoxy, metal board, polyester. This refers to a substrate, polyimide substrate, BT resin substrate, thermosetting polyphenylene ether substrate or the like on which one or both surfaces of a patterned conductor layer (circuit) are formed. A multilayer printed wiring board having a conductor layer (circuit) in which conductor layers and insulating layers are alternately formed and patterned on one or both sides is also included in the circuit board referred to in the present invention. The surface of the conductor circuit layer is preferably roughened by blackening or the like in advance from the viewpoint of adhesion of the insulating layer to the circuit board.
[0077] このように接着フィルムを回路基板にラミネートした後、支持フィルムを剥離する場 合は剥離し、熱硬化することにより回路基板に絶縁層を形成することができる。加熱 硬化の条件は 150°C〜220°Cで 20分〜 180分の範囲で選択され、より好ましくは 16 0。C〜200。Cで 30〜 120分である。 [0077] After laminating the adhesive film on the circuit board in this way, when the support film is peeled off, the insulating film can be formed on the circuit board by peeling off and thermosetting. Heat curing conditions are selected in the range of 150 ° C to 220 ° C for 20 minutes to 180 minutes, more preferably 160 ° C. C ~ 200. C for 30-120 minutes.
[0078] 絶縁層を形成した後、硬化前に支持フィルムを剥離しな力つた場合は、ここで剥離 する。次に回路基板上に形成された絶縁層に穴開けを行いビアホール、スルーホー ルを形成する。穴あけは例えば、ドリル、レーザー、プラズマ等の公知の方法により、 また必要によりこれらの方法を組み合わせて行うことができる力 炭酸ガスレーザー、 YAGレーザー等のレーザーによる穴あけ力もっとも一般的な方法である。 [0078] After the insulating layer is formed, if the support film is peeled off before being cured, it is peeled off here. Next, a hole is made in the insulating layer formed on the circuit board to form a via hole and a through hole. Drilling force is a force that can be performed by a known method such as drilling, laser, or plasma, and a combination of these methods, if necessary, and is the most common method of drilling force by a laser such as a carbon dioxide laser or YAG laser.
[0079] 次 、で、絶縁層表面に粗化処理を行う。本発明における粗化処理は通常、酸化剤 を使用した湿式粗ィ匕方法で行うのが好ましい。酸化剤としては、過マンガン酸塩 (過 マンガン酸カリウム、過マンガン酸ナトリウム等)、重クロム酸塩、オゾン、過酸化水素 Next, roughening treatment is performed on the surface of the insulating layer. The roughening treatment in the present invention is usually preferably carried out by a wet roughening method using an oxidizing agent. Oxidizing agents include permanganate (potassium permanganate, sodium permanganate, etc.), dichromate, ozone, hydrogen peroxide
Z硫酸、硝酸等が挙げられる。好ましくはビルトアップ工法による多層プリント配線板 の製造における絶縁層の粗ィ匕に汎用されている酸化剤である、アルカリ性過マンガ ン酸溶液 (例えば過マンガン酸カリウム、過マンガン酸ナトリウムの水酸ィ匕ナトリウム水 溶液)を用いて粗ィ匕を行うのが好ま ヽ。 Z sulfuric acid, nitric acid, etc. are mentioned. Preferably, an alkaline permanganic acid solution (for example, potassium permanganate or sodium permanganate hydroxide), which is an oxidant commonly used for the roughening of insulating layers in the production of multilayer printed wiring boards by the built-up method. It is preferable to perform roughening using (sodium aqueous solution).
[0080] 絶縁層表面を粗化処理した粗化面の粗さは、導体層との間のアンカー効果が得ら れるように、通常 Ra値力 ^0. 01 μ m以上、好ましくは 0. 1 μ m以上、とりわけ 0. 15 μ m以上となる粗さであるのが好ま 、。また Ra値の上限は微細配線の形成性の観点 力ら 0. 5 /z m以下であるの力好ましく、より好ましくは 0. 以下、とりわけ 0. 35 m以下であるのが好まし 、。 [0080] The roughness of the roughened surface obtained by roughening the surface of the insulating layer is usually Ra value force greater than or equal to ^ 0.01 μm, preferably 0. It is preferable that the roughness is 1 μm or more, especially 0.15 μm or more. The upper limit of the Ra value is preferably a force of 0.5 / zm or less from the viewpoint of the fine wiring formability, more preferably 0.5 or less, and particularly preferably 0.35 m or less.
[0081] 表面粗さ Ra値とは、表面粗さを表す数値の一種であり、算術平均粗さと呼ばれる ものであって、具体的には測定領域内で変化する高さの絶対値を平均ラインである 表面カゝら測定して算術平均したものである。例えばビーコインスツルメンッ社製 WYK O NT3300を用いて、 VSIコンタクトモード、 50倍レンズにより測定範囲を 121 μ m Χ 92 μ mとして得られる数値により求めることができる。 [0081] Surface roughness Ra value is a kind of numerical value representing surface roughness, and is called arithmetic average roughness. Specifically, the absolute value of the height changing in the measurement region is measured by the surface line as an average line and arithmetically averaged. For example, using WYK ON NT3300 manufactured by BEIKOTSU SUMENTSU Co., Ltd., the VSI contact mode can be obtained from the numerical value obtained with a 50 × lens with a measurement range of 121 μm Χ 92 μm.
[0082] 次に、粗ィ匕処理により凸凹のアンカーが形成された榭脂組成物層表面に、無電解 メツキと電解メツキを組み合わせた方法で導体層を形成する。また導体層とは逆バタ 一ンのメツキレジストを形成し、無電解メツキのみで導体層を形成することもできる。な お導体層形成後、 150〜200°Cで 20〜90分ァニール(anneal)処理することにより、 導体層のピール強度をさらに向上、安定化させることができる。 [0082] Next, a conductor layer is formed on the surface of the resin composition layer on which uneven anchors have been formed by roughening treatment by a method combining electroless plating and electrolytic plating. In addition, a reverse resist pattern resist can be formed from the conductor layer, and the conductor layer can be formed only by electroless plating. After forming the conductor layer, the peel strength of the conductor layer can be further improved and stabilized by annealing at 150 to 200 ° C. for 20 to 90 minutes.
[0083] また、導体層をパターン加工し回路形成する方法としては、例えば当業者に公知の サブトラクティブ法、セミアディティブ法などを用いることができる。 [0083] Further, as a method of forming a circuit by patterning the conductor layer, for example, a subtractive method or a semi-additive method known to those skilled in the art can be used.
[0084] 本発明のプリプレダは、本発明の榭脂組成物を繊維カゝらなるシート状補強基材に ホットメルト法又はソルベント法により含浸させ、加熱により半硬化させることにより製 造することができる。すなわち、本発明の榭脂組成物が繊維からなるシート状補強基 材に含浸した状態となるプリプレダとすることができる。 [0084] The pre-preda of the present invention can be produced by impregnating the resin composition of the present invention into a sheet-like reinforcing base material made of fiber by a hot melt method or a solvent method and semi-curing by heating. it can. That is, it can be set as the pre-predator which will be in the state which impregnated the resin composition of this invention in the sheet-like reinforcement base which consists of fibers.
[0085] 繊維カゝらなるシート状補強基材としては、例えばガラスクロスゃァラミド繊維等、プリ プレダ用繊維として常用されて 、るものを用いることができる。 [0085] As the sheet-like reinforcing substrate made of fiber fiber, for example, a glass cloth garamide fiber, which is commonly used as a fiber for pre-predators, can be used.
[0086] ホットメルト法は、榭脂を有機溶剤に溶解することなぐ榭脂を榭脂と剥離性の良い 塗工紙にー且コーティングし、それをシート状補強基材にラミネートする、あるいはダ イコーターにより直接塗工するなどして、プリプレダを製造する方法である。またソル ベント法は、接着フィルムと同様、榭脂を有機溶剤に溶解した榭脂ワニスにシート状 補強基材を浸潰し、榭脂ワニスをシート状補強基材に含浸させ、その後乾燥させる方 法である。 [0086] In the hot melt method, the resin without dissolving the resin in an organic solvent is coated on a coated paper having good releasability from the resin and laminated on a sheet-like reinforcing substrate, or by duplication. In this method, a pre-preda is manufactured by direct coating with an equator. Also, the solvent method is a method in which a sheet-like reinforcing base material is soaked in a resinous varnish in which the resin is dissolved in an organic solvent, and then the resinous varnish is impregnated into the sheet-like reinforcing base material and then dried. It is.
[0087] 次に本発明のプリプレダを用いて本発明の多層プリント配線板を製造する方法に ついて説明する。回路基板に本発明のプリプレダを 1枚あるいは必要により数枚重ね 、離型フィルムを介して金属プレートを挟み加圧'加熱条件下でプレス積層する。圧 力は好ましくは 5〜40kgf /cm2 (49 X 104〜392 X 104N/m2)、温度は好ましくは 120〜200°Cで 20〜: LOO分の範囲で成型するのが好まし!/、。また接着フィルムと同 様に真空ラミネート法により回路基板にラミネートした後、加熱硬化することによつても 製造可能である。その後、前に記載した方法と同様、酸化剤により硬化したプリプレ グ表面を粗ィ匕した後、導体層をメツキにより形成して多層プリント配線板を製造するこ とがでさる。 Next, a method for producing the multilayer printed wiring board of the present invention using the pre-preder of the present invention will be described. One or more of the pre-preders of the present invention are stacked on a circuit board, and a metal plate is sandwiched through a release film, and press-laminated under pressure and heating conditions. The pressure is preferably 5 to 40 kgf / cm 2 (49 × 10 4 to 392 × 10 4 N / m 2 ), and the temperature is preferably 120 to 200 ° C. Better!/,. Same as adhesive film In this way, it can also be manufactured by laminating on a circuit board by a vacuum laminating method and then curing by heating. Thereafter, in the same manner as described above, the surface of the prepreg cured with an oxidizing agent is roughened, and then a conductor layer is formed by plating to produce a multilayer printed wiring board.
[0088] 以下の実施例及び比較例を用いて本発明をより詳細に説明するが、これらは本発 明をいかなる意味においても制限するものではない。なお、以下の記載において、「 部」は「質量部」を意味する。 [0088] The present invention will be described in more detail with reference to the following examples and comparative examples, but these do not limit the present invention in any way. In the following description, “part” means “part by mass”.
実施例 1 Example 1
[0089] エタノールとトルエンの 1: 1の混合溶媒に、 60°Cにて、ブチラール榭脂(ガラス転移 温度 105°C、積水化学工業 (株)製「KS - 5ZJ )を固形分 15%になるように溶解し、 プチラール榭脂溶液を得た。液状ビスフエノール A型エポキシ榭脂(エポキシ当量 18 0、ジャパンエポキシレジン (株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能 エポキシ榭脂(エポキシ当量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30 部とをメチルェチルケトン(以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌し ながら加熱溶解させた。そこへ、ナフトール系硬化剤であるノボラック榭脂(日本ィ匕薬 (株)製「CBN」、フ ノール性水酸基当量 139)の固形分 50%の MEK溶液 60部、 チオメチル基含有のフエノール系硬ィ匕剤であるノボラック榭脂(ジャパンエポキシレジ ン(株)製「YLH— 1110LJ、フエノール性水酸基当量 168)の固形分 60%の MEK 溶液 18部、硬化触媒(四国化成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ(平均 粒径 0. 5 /ζ πι、アミノシラン処理、「SOC2」アドマテックス社製) 70部、上記ブチラー ル榭脂溶液 35部を混合し、高速回転ミキサーで均一に分散して、榭脂ワニスを作製 した (榭脂ワニスの不揮発分に対する無機充填材含有量、 40質量%)。次に、かかる 榭脂ワニスをポリエチレンテレフタレート (厚さ 38 μ m、以下 PETと略す)上に、乾燥 後の榭脂厚みが 40 μ mとなるようにダイコ一ターにて塗布し、 80〜 120°C (平均 100 °C)で 6分間乾燥した (残留溶媒量約 1質量%)。次いで榭脂組成物の表面に厚さ 15 μ mのポリプロピレンフィルムを貼り合わせながらロール状に巻き取った。ロール状の 接着フィルムを幅 507mmにスリット(slit)し、これより 507 X 336mmサイズのシート状 の接着フィルムを得た。 実施例 2 [0089] Butyral resin (glass transition temperature 105 ° C, "KS-5ZJ" made by Sekisui Chemical Co., Ltd.) in a 1: 1 mixed solvent of ethanol and toluene at 60 ° C to a solid content of 15% A liquid bisphenol A type epoxy resin (epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.) 30 parts and a naphthalene type tetrafunctional epoxy resin 30 parts of fat (epoxy equivalent: 163, “HP-4700” manufactured by Dainippon Ink and Chemicals, Inc.) is dissolved in 15 parts of methyl ethyl ketone (hereinafter abbreviated as MEK) and 15 parts of cyclohexanone with stirring. It was. Thereto, 60 parts of MEK solution with a solid content of 50% solids of naphthol-based novolak rosin (“CBN” manufactured by Nippon Kayaku Co., Ltd., phenolic hydroxyl group equivalent: 139), thiomethyl group-containing phenolic hardener 18 parts of MEK solution with 60% solid content of novolak resin (“YLH-1110LJ, phenolic hydroxyl group equivalent 168” manufactured by Japan Epoxy Resin Co., Ltd.), curing catalyst (manufactured by Shikoku Kasei Kogyo Co., Ltd., “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 / ζ πι, aminosilane treatment, “SOC2” manufactured by Admatechs) 70 parts, 35 parts of the above butyral resin solution are mixed and rotated at high speed Uniform dispersion was performed with a mixer to prepare a rosin varnish (inorganic filler content based on the non-volatile content of the varnish varnish, 40% by mass). Next, this varnished varnish was applied onto polyethylene terephthalate (thickness 38 μm, hereinafter abbreviated as PET) with a die coater so that the dried varnish thickness would be 40 μm. It was dried at ° C (average 100 ° C) for 6 minutes (residual solvent amount was about 1% by mass). Next, a 15 μm-thick polypropylene film was bonded to the surface of the greave composition and wound into a roll. The roll-like adhesive film was slit to a width of 507 mm, and from this, a sheet-like adhesive film having a size of 507 × 336 mm was obtained. Example 2
[0090] 液状ビスフエノール A型エポキシ榭脂(エポキシ当量 180、ジャパンエポキシレジン [0090] Liquid bisphenol A type epoxy resin (epoxy equivalent 180, Japan epoxy resin)
(株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能エポキシ榭脂(エポキシ当 量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30部とをメチルェチルケトン( 以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌しながら加熱溶解させた。そ こへ、ナフトール系硬化剤であるノボラック榭脂(日本ィ匕薬 (株)製「NHN」、フエノー ル性水酸基当量 143)の固形分 50%の MEK溶液 60部、チオメチル基含有のフエノ ール系硬化剤であるノボラック榭脂(ジャパンエポキシレジン (株)製「YLH— 1110L 」、フ ノール性水酸基当量 168)の固形分 60%の MEK溶液 18部、硬化触媒(四国 化成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ(平均粒径 0. 5 /ζ πι、アミノシラン 処理、「SOC2」アドマテックス社製) 70部、実施例 1で調製したプチラール榭脂溶液 35部を混合し、高速回転ミキサーで均一に分散して、榭脂ワニスを作製した (榭脂ヮ ニスの不揮発分に対する無機充填材含有量、 40質量%)。次に実施例 1と同様な方 法によりシート状の接着フィルムを得た。 30 parts of “Epicoat 828EL” (manufactured by Co., Ltd.) and 30 parts of naphthalene-type tetrafunctional epoxy resin (epoxy equivalent 163, “HP-4700” manufactured by Dainippon Ink & Chemicals, Inc.) (Hereinafter abbreviated as MEK) 15 parts and cyclohexanone 15 parts were heated and dissolved with stirring. To that end, 60 parts of a 50% solid MEK solution of novolak rosin (“NHN”, phenolic hydroxyl group equivalent: 143 manufactured by Nippon Kayaku Co., Ltd.), a naphthol-based curing agent, and thiomethyl group-containing phenol. 18 parts of MEK solution with a solid content of 60% solids of novolac rosin (“YLH-1110L” manufactured by Japan Epoxy Resin Co., Ltd., phenolic hydroxyl group equivalent 168), a curing catalyst (Shikoku Kasei Kogyo Co., Ltd.) Manufactured by “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 / ζ πι, treated with aminosilane, “SOC2” manufactured by Admatechs) 70 parts, 35 parts of petital resin solution prepared in Example 1 Were mixed uniformly with a high-speed rotary mixer to prepare a rosin varnish (inorganic filler content based on nonvolatile content of rosin varnish, 40% by mass). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1.
実施例 3 Example 3
[0091] 液状ビスフエノール A型エポキシ榭脂(エポキシ当量 180、ジャパンエポキシレジン [0091] Liquid bisphenol A type epoxy resin (epoxy equivalent 180, Japan epoxy resin
(株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能エポキシ榭脂(エポキシ当 量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30部とをメチルェチルケトン( 以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌しながら加熱溶解させた。そ こへ、ナフトール系硬化剤であるノボラック榭脂(日本ィ匕薬 (株)製「CBN」、フエノー ル性水酸基当量 139)の固形分 50%の MEK溶液 70部、チオメチル基含有のフエノ ール系硬化剤であるノボラック榭脂(ジャパンエポキシレジン (株)製「YLH— 1110L 」、フ ノール性水酸基当量 168)の固形分 60%の MEK溶液 9部、硬化触媒(四国 化成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ(平均粒径 0. 5 /ζ πι、アミノシラン 処理、「SOC2」アドマテックス社製) 70部、実施例 1で調製したプチラール榭脂溶液 35部を混合し、高速回転ミキサーで均一に分散して、榭脂ワニスを作製した (榭脂ヮ ニスの不揮発分に対する無機充填材含有量、 40質量%)。次に実施例 1と同様な方 法によりシート状の接着フィルムを得た。 実施例 4 30 parts of “Epicoat 828EL” manufactured by Co., Ltd. and 30 parts of naphthalene-type tetrafunctional epoxy resin (epoxy equivalent 163, “HP-4700” manufactured by Dainippon Ink and Chemicals, Inc.) (Hereinafter abbreviated as MEK) 15 parts and cyclohexanone 15 parts were heated and dissolved with stirring. To that end, 70 parts of a 50% solid MEK solution of naphthol-based novolak resin (“CBN” manufactured by Nippon Kayaku Co., Ltd., phenolic hydroxyl group equivalent: 139), thiomethyl group-containing phenol 9 parts of MEK solution of 60% solid content of novolac rosin (“YLH-1110L” manufactured by Japan Epoxy Resin Co., Ltd., phenolic hydroxyl group equivalent 168), a curing catalyst (Shikoku Kasei Kogyo Co., Ltd.) Manufactured by “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 / ζ πι, treated with aminosilane, “SOC2” manufactured by Admatechs) 70 parts, 35 parts of petital resin solution prepared in Example 1 Were mixed uniformly with a high-speed rotary mixer to prepare a rosin varnish (inorganic filler content based on nonvolatile content of rosin varnish, 40% by mass). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1. Example 4
[0092] 液状ビスフエノール A型エポキシ榭脂(エポキシ当量 180、ジャパンエポキシレジン [0092] Liquid bisphenol A type epoxy resin (epoxy equivalent 180, Japan epoxy resin)
(株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能エポキシ榭脂(エポキシ当 量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30部とをメチルェチルケトン( 以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌しながら加熱溶解させた。そ こへ、フエノール系硬化剤であるナフタレン構造のノボラック榭脂(日本ィ匕薬 (株)製「 CBN」、フエノール性水酸基当量 139)の固形分 50%の MEK溶液 60部、チオメチ ル基含有のフエノール系硬ィ匕剤であるノボラック榭脂(ジャパンエポキシレジン (株) 製「YLH— 1110L」、フエノール性水酸基当量 168)の固形分 60%の MEK溶液 18 部、硬化触媒(四国化成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ(平均粒径 0. 5 m、アミノシラン処理、「SOC2」アドマテックス社製) 70部、実施例 1で調製したブ チラール榭脂溶液 17部、フエノキシ榭脂(ジャパンエポキシレジン (株)製「YX8100 ΒΗ30」、固形分 30%のシクロへキサノンと MEKの混合用液) 17部を混合し、高速 回転ミキサーで均一に分散して、榭脂ワニスを作製した (榭脂ワニスの不揮発分に対 する無機充填材含有量、 39質量%)。次に実施例 1と同様な方法によりシート状の接 着フィルムを得た。 30 parts of “Epicoat 828EL” (manufactured by Co., Ltd.) and 30 parts of naphthalene-type tetrafunctional epoxy resin (epoxy equivalent 163, “HP-4700” manufactured by Dainippon Ink & Chemicals, Inc.) (Hereinafter abbreviated as MEK) 15 parts and cyclohexanone 15 parts were heated and dissolved with stirring. Thereto, 60 parts of MEK solution with 50% solid content of naphthalene-structured novolac resin (“CBN”, phenolic hydroxyl group equivalent: 139), a phenolic curing agent, containing thiomethyl group Novolak resin (“YLH-1110L” manufactured by Japan Epoxy Resin Co., Ltd., phenolic hydroxyl group equivalent weight 168), 18 parts of MEK solution with 60% solid content, curing catalyst (Shikoku Chemical Industries ( Co., Ltd., “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 m, aminosilane treatment, “SOC2” manufactured by Admatex) 70 parts, butyral resin solution prepared in Example 1 17 17 parts of phenoxy resin (Japan Epoxy Resin Co., Ltd. “YX8100 ΒΗ30”, 30% solids cyclohexanone and MEK mixing solution) were mixed and dispersed uniformly with a high-speed rotary mixer. A fat varnish was prepared (inorganic to the non-volatile content of rosin varnish. Hamazai content, 39 wt%). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1.
[0093] <比較例 1 > [0093] <Comparative Example 1>
液状ビスフエノール A型エポキシ榭脂(エポキシ当量 180、ジャパンエポキシレジン (株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能エポキシ榭脂(エポキシ当 量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30部とをメチルェチルケトン( 以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌しながら加熱溶解させた。そ こへ、フエノール系硬化剤であるノボラック榭脂(大日本インキ化学工業 (株)製「TD2 090— 60M」、固形分力 ½0質量%のMEK溶液、固形物のフ ノール性水酸基当量 105) 50部、硬化触媒(四国化成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ(平 均粒径 0. 5 m、アミノシラン処理、「SOC2」アドマテックス社製) 60部、実施例 1で 調製したプチラール榭脂溶液 35部を混合し、高速回転ミキサーで均一に分散して、 榭脂ワニスを作製した (榭脂ワニスの不揮発分に対する無機充填材含有量、 39質量 %)。次に実施例 1と同様な方法によりシート状の接着フィルムを得た。 [0094] <参考例 1 > 30 parts of liquid bisphenol A type epoxy resin (epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.) and naphthalene type tetrafunctional epoxy resin (epoxy equivalent 163, Dainippon Ink & Chemicals, Inc.) 30 parts of “HP-4700”) were dissolved in 15 parts of methyl ethyl ketone (hereinafter abbreviated as MEK) and 15 parts of cyclohexanone with stirring. To that end, a novolak resin, a phenolic curing agent (“TD2 090-60M” manufactured by Dainippon Ink & Chemicals, Inc., MEK solution with a solid content of ½0% by mass, phenolic hydroxyl group equivalent of solids 105) 50 parts, curing catalyst (Shikoku Kasei Kogyo Co., Ltd., “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 m, aminosilane treatment, “SOC2” manufactured by Admatechs) 60 parts, implementation 35 parts of the petital rosin solution prepared in Example 1 was mixed and uniformly dispersed with a high-speed rotary mixer to prepare a varnish varnish (inorganic filler content relative to the non-volatile content of the varnish varnish, 39 mass%). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1. [0094] <Reference Example 1>
液状ビスフエノール A型エポキシ榭脂(エポキシ当量 180、ジャパンエポキシレジン (株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能エポキシ榭脂(エポキシ当 量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30部とをメチルェチルケトン( 以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌しながら加熱溶解させた。そ こへ、チオメチル基含有のフエノール系硬ィ匕剤であるノボラック榭脂(ジャパンェポキ シレジン (株)製「YLH— 1110LJ、フエノール性水酸基当量 168)の固形分 60%の MEK溶液 80部、硬化触媒(四国化成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ (平均粒径 0. 5 /ζ πι、アミノシラン処理、「SOC2」アドマテックス社製) 70部、実施例 1で調製したプチラール榭脂溶液 35部を混合し、高速回転ミキサーで均一に分散し て、榭脂ワニスを作製した (榭脂ワニスの不揮発分に対する無機充填材含有量、 38 質量%)。次に実施例 1と同様な方法によりシート状の接着フィルムを得た。 30 parts of liquid bisphenol A type epoxy resin (epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.) and naphthalene type tetrafunctional epoxy resin (epoxy equivalent 163, Dainippon Ink & Chemicals, Inc.) 30 parts of “HP-4700”) were dissolved in 15 parts of methyl ethyl ketone (hereinafter abbreviated as MEK) and 15 parts of cyclohexanone with stirring. Then, 80 parts of MEK solution with a solid content of 60%, novolak resin, a thiomethyl group-containing phenolic hardener (“YLH-1110LJ, phenolic hydroxyl group equivalent 168” manufactured by Japan Epoxy Resin Co., Ltd.), curing catalyst (Shikoku Kasei Kogyo Co., Ltd., “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 / ζ πι, aminosilane treatment, “SOC2” manufactured by Admatechs) 70 parts, prepared in Example 1 35 parts of the petital rosin solution was mixed and uniformly dispersed with a high-speed rotary mixer to prepare a rosin varnish (inorganic filler content relative to the non-volatile content of the varnish varnish, 38% by mass). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1.
[0095] <参考例 2> [0095] <Reference Example 2>
液状ビスフエノール A型エポキシ榭脂(エポキシ当量 180、ジャパンエポキシレジン (株)製「ェピコート 828EL」) 30部と、ナフタレン型 4官能エポキシ榭脂(エポキシ当 量 163、大日本インキ化学工業 (株)製「HP— 4700」 ) 30部とをメチルェチルケトン( 以下 MEKと略す) 15部、シクロへキサノン 15部に攪拌しながら加熱溶解させた。そ こへ、フエノール硬化剤であるノボラック榭脂(大日本インキ化学工業 (株)製「TD20 90— 60M」、固形分力 ½0質量%のMEK溶液、フエノール性水酸基当量 105) 41部 、チオメチル基含有のフエノール硬ィ匕剤であるノボラック榭脂(ジャパンエポキシレジ ン(株)製「¥1^¾11101^」、フ ノール性水酸基当量168) 14部、硬化触媒(四国化 成工業 (株)製、「2E4MZ」)0. 1部、球形シリカ(平均粒径 0. 5 /ζ πι、アミノシラン処 理、「SOC2」アドマテックス社製) 65部、実施例 1で調整したプチラール榭脂溶液 35 部を混合し、高速回転ミキサーで均一に分散して、榭脂ワニスを作製した (榭脂ヮ- スの不揮発分に対する無機充填材含有量、 40質量%)。次に実施例 1と同様な方法 によりシート状の接着フィルムを得た。 30 parts of liquid bisphenol A type epoxy resin (epoxy equivalent 180, “Epicoat 828EL” manufactured by Japan Epoxy Resin Co., Ltd.) and naphthalene type tetrafunctional epoxy resin (epoxy equivalent 163, Dainippon Ink & Chemicals, Inc.) 30 parts of “HP-4700”) were dissolved in 15 parts of methyl ethyl ketone (hereinafter abbreviated as MEK) and 15 parts of cyclohexanone with stirring. To that end, a novolak rosin as a phenol curing agent (“TD20 90-60M” manufactured by Dainippon Ink & Chemicals, Inc., MEK solution with a solid content of ½0 mass%, phenolic hydroxyl group equivalent 105) 41 parts, thiomethyl group Novolak resin, which is a hardener containing phenol (Japan Epoxy Resin Co., Ltd. “¥ 1 ^ ¾11101 ^”, phenolic hydroxyl group equivalent 168), 14 parts, curing catalyst (manufactured by Shikoku Chemicals Co., Ltd.) , “2E4MZ”) 0.1 part, spherical silica (average particle size 0.5 / ζ πι, aminosilane treatment, “SOC2” manufactured by Admatechs Co., Ltd.) 65 parts, petital resin solution prepared in Example 1 35 parts Were mixed uniformly with a high-speed rotary mixer to prepare a resin varnish (inorganic filler content based on the non-volatile content of the resin grease, 40% by mass). Next, a sheet-like adhesive film was obtained in the same manner as in Example 1.
[0096] <多層プリント配線板の製造 > [0096] <Manufacture of multilayer printed wiring board>
[0097] (1)回路基板の作製 ガラス布基材エポキシ榭脂両面銅張積層板 [銅箔の厚さ 18 m、基板厚み 0. 8m m、松下電工 (株)製 R5715ES]の両面に回路パターンをエッチングにより形成し、 さらにメック (株)製 CZ8100に浸漬して銅表面の粗ィ匕処理をおこない、回路基板を 作製した。 [0097] (1) Fabrication of circuit board A circuit pattern is formed on both sides of a glass cloth base epoxy resin-coated double-sided copper-clad laminate [copper foil thickness 18 m, substrate thickness 0.8 mm, Matsushita Electric Works Ltd. R5715ES]. It was immersed in CZ8100 manufactured by Co., Ltd. and the copper surface was roughened to prepare a circuit board.
[0098] (2)接着フィルムのラミネート [0098] (2) Lamination of adhesive film
実施例 1で作成した接着フィルムを、ノ ツチ式真空加圧ラミネーター MVLP— 500 (名機 (株)製商品名)を用いて、回路基板の両面にラミネートした。ラミネートは、 30 秒間減圧して気圧を 13hPa以下とし、その後 30秒間、圧力 0. 74MPaでプレスする ことにより行った。 The adhesive film prepared in Example 1 was laminated on both sides of the circuit board using a notch type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.). Lamination was performed by reducing the pressure for 30 seconds to a pressure of 13 hPa or less, and then pressing at a pressure of 0.74 MPa for 30 seconds.
[0099] (3)榭脂組成物の硬化 [0099] (3) Curing of the resin composition
ラミネートされた接着フィルム力も PETフィルムを剥離し、 180°C、 30分の硬化条件 で榭脂組成物を硬化した。 The laminated adhesive film also peeled off the PET film and cured the resin composition at 180 ° C for 30 minutes.
[0100] (4)ビアホール形成 [0100] (4) Via hole formation
松下溶接システム (株)製 COレーザー加工機 (YB— HCS03T04)を使用し、周 Matsushita Welding System Co., Ltd. CO laser processing machine (YB— HCS03T04)
2 2
波数10001¾でパルス幅13 秒、ショット数 3の条件でカ卩ェして、絶縁層表面の直 径が 60 μ mのビアホールを形成した。 A via hole having a diameter of 60 μm on the surface of the insulating layer was formed by observing under conditions of a wave number of 10001¾, a pulse width of 13 seconds, and a shot number of 3.
[0101] (5)粗化処理 [0101] (5) Roughening treatment
回路基板を、膨潤液である、アトテックジャパン (株)のジエチレングリコールモノブ チルエーテル含有のスェリングディップ ·セキユリガンド Pに 60°Cで 5分間浸漬した。 次に粗ィ匕液である、アトテックジャパン (株)のコンセントレート'コンパクト P (KMnO : The circuit board was immersed for 5 minutes at 60 ° C in a swelling dip-sequel ligand P containing diethylene glycol monobutyl ether from Atotech Japan. Next, crude concentrate, Atotech Japan's Concentrate 'Compact P (KMnO:
4 Four
60gZL、 NaOH:40gZLの水溶液)に 80°Cで 20分間浸漬した。最後に中和液で ある、アトテックジャパン (株)のリダクションショリューシン 'セキユリガント Pに 40°Cで 5 分間浸潰した。 60 gZL, NaOH: 40 gZL aqueous solution) at 80 ° C. for 20 minutes. Finally, it was soaked at 40 ° C for 5 minutes in the neutralization solution, Reduction Sholyshin 'Sekiyuriganto P' from Atotech Japan.
[0102] (6)セミアディティブ工法によるメツキ [0102] (6) Meat with semi-additive method
絶縁層表面に回路を形成するために、回路基板を、 PdClを含む無電解メツキ用 In order to form a circuit on the insulating layer surface, the circuit board is used for electroless plating containing PdCl.
2 2
溶液に浸漬し、次に無電解銅メツキ液に浸漬した。 150°Cにて 30分間加熱してァ- ール処理を行った後に、硫酸銅電解メツキを行なった。ァニール処理を 180°Cにて 6 0分間行い、絶縁層表面に厚さ約 25 mの銅層を形成し、多層プリント配線板を得 た。 It was immersed in a solution and then immersed in an electroless copper plating solution. After heating for 30 minutes at 150 ° C. and carrying out a char treatment, copper sulfate electrolytic plating was performed. Annealing is performed at 180 ° C for 60 minutes to form a copper layer with a thickness of about 25 m on the surface of the insulating layer to obtain a multilayer printed wiring board. It was.
[0103] <ピール強度測定サンプルの調製 > [0103] <Preparation of peel strength measurement sample>
[0104] (1)積層板の下地処理 [0104] (1) Laminate surface treatment
ガラス布基材エポキシ榭脂両面銅張積層板 [銅箔の厚さ 18 m、基板厚み 0. 8m m、松下電工 (株)製 R5715ES]の両面をメック (株)製 CZ8100に浸漬して銅表面 の粗ィ匕処理をおこなった。 Double-sided copper-clad laminate with glass cloth substrate epoxy resin [copper foil thickness 18 m, substrate thickness 0.8 mm, R5715ES made by Matsushita Electric Works Ltd.] both sides immersed in MEC CZ8100 copper The surface was roughened.
[0105] (2)接着フィルムのラミネート [0105] (2) Lamination of adhesive film
実施例、比較例及び参考例で作成した接着フィルムを、ノ ツチ式真空加圧ラミネー ター MVLP— 500 (名機 (株)製商品名)を用いて、積層板の両面にラミネートした。 ラミネートは、 30秒間減圧して気圧を 13hPa以下とし、その後 30秒間、圧力 0. 74M Paでプレスすることにより行った。 The adhesive films prepared in Examples, Comparative Examples, and Reference Examples were laminated on both surfaces of a laminate using a notch type vacuum pressure laminator MVLP-500 (trade name, manufactured by Meiki Co., Ltd.). Lamination was performed by reducing the pressure for 30 seconds to a pressure of 13 hPa or less, and then pressing at a pressure of 0.74 MPa for 30 seconds.
[0106] (3)榭脂組成物の硬化 [0106] (3) Curing of the resin composition
ラミネートされた接着フィルム力も PETフィルムを剥離し、 180°C、 30分の硬化条件 で榭脂組成物を硬化した。 The laminated adhesive film also peeled off the PET film and cured the resin composition at 180 ° C for 30 minutes.
[0107] (4)粗化処理 [0107] (4) Roughening treatment
積層板を、膨潤液である、アトテックジャパン (株)のジエチレングリコールモノプチ ルエーテル含有のスェリングディップ.セキユリガンド pに 60°Cで 5分間浸漬し、次に 粗ィ匕液として、アトテックジャパン(株)のコンセントレート'コンパクト P (KMn04: 60g ZL、 NaOH :40gZLの水溶液)に 80°Cで 20分間浸漬、最後に中和液として、アト テックジャパン (株)のリダクションショリューシン'セキユリガント Pに 40°Cで 5分間浸漬 した。 The laminate is immersed in a swelling dip Sekiyu ligand p containing diethylene glycol monopropyl ether from Atotech Japan Co., Ltd. for 5 minutes at 60 ° C. ) Concentrate 'Compact P (KMn04: 60 g ZL, NaOH: 40 g ZL aqueous solution) at 80 ° C for 20 minutes, and finally, as a neutralizing solution, Atotech Japan Co., Ltd. Immerse at 40 ° C for 5 minutes.
[0108] (5)セミアディティブ工法によるメツキ [0108] (5) Meat with semi-additive method
積層板を、 PdClを含む無電解メツキ用溶液に浸漬し、次に無電解銅メツキ液に浸 Immerse the laminate in an electroless plating solution containing PdCl and then in an electroless copper plating solution.
2 2
漬した。 150°Cにて 30分間加熱してァニール処理を行った後に、硫酸銅電解メツキ を行い、 25 ± 10 mの厚さで銅層を形成した。次に、ァニール処理を 180°Cにて 60 分間行った。この積層板にっ ヽてメツキ銅のピール強度の測定を行った。 Pickled. After annealing for 30 minutes at 150 ° C, copper sulfate electrolytic plating was performed to form a copper layer with a thickness of 25 ± 10 m. Next, annealing was performed at 180 ° C for 60 minutes. The peel strength of the copper plating was measured using this laminate.
[0109] [メツキ銅層の引き剥がし強さ(ピール強度)試験] [0109] [Peel strength test of peeled copper layer]
積層板の銅層に、幅 10mm、長さ 100mmの部分の切込みをいれ、この一端を剥 がしてつかみ具で掴み、室温中にて、 50mmZ分の速度で垂直方向に 35mmを引 き剥がした時の荷重を測定した。 Make a notch of 10mm width and 100mm length in the copper layer of the laminate, and strip this end. The load was measured when 35mm was peeled off in the vertical direction at a speed of 50mmZ at room temperature.
[0110] [難燃性試験] [0110] [Flame retardancy test]
実施例、比較例及び参考例で得られた接着フィルムを 0. 2mm厚のガラスエポキシ 基材 (松下電工 (株)製の R1566)の両面にラミネートして、 180°Cにて 90分間榭脂 を硬化した。硬化物を UL— 94に従って、サンプルテストピースを作成し、難燃性試 験を実施した。 The adhesive films obtained in Examples, Comparative Examples, and Reference Examples were laminated on both sides of a 0.2 mm thick glass epoxy substrate (R1566 manufactured by Matsushita Electric Works) and regreased at 180 ° C for 90 minutes. Cured. Sample test pieces were prepared according to UL-94 for the cured product, and a flame retardancy test was conducted.
[0111] [保存安定性 (ポットライフ)試験] [0111] [Storage stability (pot life) test]
実施例、比較例及び参考例で得られた接着フィルムを、室温(25°C)にて、 72時間 放置し、(株)ユー 'ビー'ェム社製型式 Rheosoト G3000を用いて、榭脂組成物層の 動的粘弾性を測定した。榭脂組成物層を直径 20mm、厚さ 2. 3mm程度のタブレット (重量約 lg)としたものを測定サンプルとし、ノ ラレルプレートを使用して、測定開始 温度 60°Cとし、昇温速度 5°CZ分、測定間隔温度 2. 5°C、振動数 lHzZdeg、 100 g静荷重一定の条件で測定を行った。硬化が進行したために、測定開始時点で粘度 測定不能でオーバーロードしたものを Xとし、オーバーロードせず粘度測定可能なも のについて〇とした。 The adhesive films obtained in Examples, Comparative Examples and Reference Examples were allowed to stand at room temperature (25 ° C.) for 72 hours, and were used with a model Rheoso G3000 manufactured by UBM Co., Ltd. The dynamic viscoelasticity of the fat composition layer was measured. A tablet with a diameter of 20 mm and a thickness of about 2.3 mm (weight: about lg) is used as a measurement sample, and a measurement start temperature is set to 60 ° C using a normal plate, and the rate of temperature rise is 5 ° C. The measurement was performed under the conditions of ° CZ min, measurement interval temperature 2.5 ° C, frequency lHzZdeg, 100 g static load constant. As curing progressed, X was defined as X when the viscosity was not measurable at the start of measurement, and X was marked for viscosity measurement without overload.
[0112] 実施例 1〜4、比較例 1及び参考例 1、 2のサンプルについて、各試験の結果を表 1 に示す。実施例サンプルは難燃性、保存安定性及びピール強度のいずれにも優れ ていることが分かる。 [0112] Table 1 shows the results of each test for the samples of Examples 1 to 4, Comparative Example 1 and Reference Examples 1 and 2. It can be seen that the example samples are excellent in all of flame retardancy, storage stability and peel strength.
[0113] [表 1] [0113] [Table 1]
産業上の利用の可能性 Industrial applicability
本発明のエポキシ榭脂組成物、該榭脂組成物により調製される接着フィルムおよ びプリプレダは、多層プリント配線板、特にビルドアップ方式で製造される多層プリン ト配線板の層間絶縁層を形成する材料として好適に使用される。 The epoxy resin composition of the present invention, the adhesive film prepared with the resin composition, and the pre-preda form an interlayer insulating layer of a multilayer printed wiring board, particularly a multilayer printed wiring board manufactured by a build-up method. It is suitably used as a material to be used.
本願は日本で出願された特願 2006-045638を基礎としており、参照することによ つてその内容は本明細書に全て包含される。 This application is based on Japanese Patent Application No. 2006-045638 filed in Japan, the contents of which are incorporated herein by reference in their entirety.
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008501674A JPWO2007097209A1 (en) | 2006-02-22 | 2007-02-09 | Epoxy resin composition |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006045638 | 2006-02-22 | ||
| JP2006-045638 | 2006-02-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2007097209A1 true WO2007097209A1 (en) | 2007-08-30 |
Family
ID=38437249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2007/052325 Ceased WO2007097209A1 (en) | 2006-02-22 | 2007-02-09 | Epoxy resin composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2007097209A1 (en) |
| KR (1) | KR20080108469A (en) |
| TW (1) | TW200736292A (en) |
| WO (1) | WO2007097209A1 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010031275A (en) * | 2008-07-25 | 2010-02-12 | Sumitomo Bakelite Co Ltd | Liquid resin composition, semiconductor element with adhesive layer, method of producing the same and semiconductor device |
| JP2010037489A (en) * | 2008-08-07 | 2010-02-18 | Hitachi Chem Co Ltd | Adhesive film, and metal foil with resin |
| JP2010168470A (en) * | 2009-01-22 | 2010-08-05 | Ajinomoto Co Inc | Resin composition |
| JPWO2010061980A1 (en) * | 2008-11-28 | 2012-04-26 | 味の素株式会社 | Resin composition |
| JP2012255174A (en) * | 2012-09-21 | 2012-12-27 | Ajinomoto Co Inc | Resin composition |
| JP2013001807A (en) * | 2011-06-16 | 2013-01-07 | Panasonic Corp | Resin composition for electronic circuit board material, prepreg and laminated plate |
| JP2014108976A (en) * | 2012-11-30 | 2014-06-12 | Nippon Steel & Sumikin Chemical Co Ltd | Epoxy resin composition and cured article |
| JP5934823B1 (en) * | 2015-03-30 | 2016-06-15 | 株式会社フジクラ | Thermosetting adhesive resin composition, adhesive film, coverlay film, metal-clad laminate and flexible printed wiring board |
| JP5941181B1 (en) * | 2015-03-30 | 2016-06-29 | 株式会社フジクラ | Thermosetting adhesive resin composition, adhesive film, coverlay film, metal-clad laminate and flexible printed wiring board |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140138677A (en) * | 2012-03-23 | 2014-12-04 | 미츠비시 가스 가가쿠 가부시키가이샤 | Prepreg and laminated board |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001011160A (en) * | 1999-06-30 | 2001-01-16 | Nippon Kayaku Co Ltd | Epoxy resin composition, prepreg and printed wiring board |
| JP2001158817A (en) * | 2000-10-23 | 2001-06-12 | Nec Corp | Flame-retardant thermosetting resin composition |
| JP2001254001A (en) * | 2000-03-09 | 2001-09-18 | Sumitomo Bakelite Co Ltd | Flame-retardant resin composition, and prepreg and laminated board using the same |
| JP2004339277A (en) * | 2003-05-13 | 2004-12-02 | Japan Epoxy Resin Kk | Phenolic resin, curing agent for epoxy resin, and epoxy resin composition |
-
2007
- 2007-02-09 JP JP2008501674A patent/JPWO2007097209A1/en active Pending
- 2007-02-09 KR KR1020087022962A patent/KR20080108469A/en not_active Abandoned
- 2007-02-09 WO PCT/JP2007/052325 patent/WO2007097209A1/en not_active Ceased
- 2007-02-13 TW TW096105303A patent/TW200736292A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001011160A (en) * | 1999-06-30 | 2001-01-16 | Nippon Kayaku Co Ltd | Epoxy resin composition, prepreg and printed wiring board |
| JP2001254001A (en) * | 2000-03-09 | 2001-09-18 | Sumitomo Bakelite Co Ltd | Flame-retardant resin composition, and prepreg and laminated board using the same |
| JP2001158817A (en) * | 2000-10-23 | 2001-06-12 | Nec Corp | Flame-retardant thermosetting resin composition |
| JP2004339277A (en) * | 2003-05-13 | 2004-12-02 | Japan Epoxy Resin Kk | Phenolic resin, curing agent for epoxy resin, and epoxy resin composition |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010031275A (en) * | 2008-07-25 | 2010-02-12 | Sumitomo Bakelite Co Ltd | Liquid resin composition, semiconductor element with adhesive layer, method of producing the same and semiconductor device |
| JP2010037489A (en) * | 2008-08-07 | 2010-02-18 | Hitachi Chem Co Ltd | Adhesive film, and metal foil with resin |
| JPWO2010061980A1 (en) * | 2008-11-28 | 2012-04-26 | 味の素株式会社 | Resin composition |
| JP2010168470A (en) * | 2009-01-22 | 2010-08-05 | Ajinomoto Co Inc | Resin composition |
| JP2013001807A (en) * | 2011-06-16 | 2013-01-07 | Panasonic Corp | Resin composition for electronic circuit board material, prepreg and laminated plate |
| JP2012255174A (en) * | 2012-09-21 | 2012-12-27 | Ajinomoto Co Inc | Resin composition |
| JP2014108976A (en) * | 2012-11-30 | 2014-06-12 | Nippon Steel & Sumikin Chemical Co Ltd | Epoxy resin composition and cured article |
| JP5934823B1 (en) * | 2015-03-30 | 2016-06-15 | 株式会社フジクラ | Thermosetting adhesive resin composition, adhesive film, coverlay film, metal-clad laminate and flexible printed wiring board |
| JP5941181B1 (en) * | 2015-03-30 | 2016-06-29 | 株式会社フジクラ | Thermosetting adhesive resin composition, adhesive film, coverlay film, metal-clad laminate and flexible printed wiring board |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080108469A (en) | 2008-12-15 |
| TW200736292A (en) | 2007-10-01 |
| JPWO2007097209A1 (en) | 2009-07-09 |
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