[go: up one dir, main page]

WO2006137011A3 - Procedes et dispositif destines a la caracterisation de la polarisation de systemes d'eclairage - Google Patents

Procedes et dispositif destines a la caracterisation de la polarisation de systemes d'eclairage Download PDF

Info

Publication number
WO2006137011A3
WO2006137011A3 PCT/IB2006/051979 IB2006051979W WO2006137011A3 WO 2006137011 A3 WO2006137011 A3 WO 2006137011A3 IB 2006051979 W IB2006051979 W IB 2006051979W WO 2006137011 A3 WO2006137011 A3 WO 2006137011A3
Authority
WO
WIPO (PCT)
Prior art keywords
mask
image
illumination system
illumination
methods
Prior art date
Application number
PCT/IB2006/051979
Other languages
English (en)
Other versions
WO2006137011A2 (fr
Inventor
Yuri Aksenov
Peter Dirksen
Peter Zandbergen
Michael Benndorf
Steenwinckel David Van
Original Assignee
Koninkl Philips Electronics Nv
Yuri Aksenov
Peter Dirksen
Peter Zandbergen
Michael Benndorf
Steenwinckel David Van
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Yuri Aksenov, Peter Dirksen, Peter Zandbergen, Michael Benndorf, Steenwinckel David Van filed Critical Koninkl Philips Electronics Nv
Priority to US11/993,063 priority Critical patent/US20100215273A1/en
Priority to JP2008517672A priority patent/JP2008547015A/ja
Priority to EP06765790A priority patent/EP1896899A2/fr
Publication of WO2006137011A2 publication Critical patent/WO2006137011A2/fr
Publication of WO2006137011A3 publication Critical patent/WO2006137011A3/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

L'invention concerne un procédé destiné à l'évaluation de l'état de polarisation d'un système d'éclairage (52) d'un système optique (50). Ce système optique (50) comprend un masque (56) qui, lorsqu'un faisceau d'éclairage incident vient le frapper, réfléchit différemment les composants possédant différents états de polarisation du faisceau lumineux. Le procédé consiste à obtenir une image du masque (56) à l'aide d'un faisceau d'éclairage du système d'éclairage (52) du système optique (50). L'image obtenue, constituée d'une représentation de l'intensité ou d'une structure créée dans une couche de résine par exposition de la couche de résine à l'image produite par le masque (56), est ensuite utilisée pour extraire des informations liées à la polarisation concernant le système d'éclairage (52). L'image utilisée pour l'évaluation peut être une image de diffraction du masque.
PCT/IB2006/051979 2005-06-24 2006-06-20 Procedes et dispositif destines a la caracterisation de la polarisation de systemes d'eclairage WO2006137011A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US11/993,063 US20100215273A1 (en) 2005-06-24 2006-06-20 Methods and devices for characterizing polarization of illumination system
JP2008517672A JP2008547015A (ja) 2005-06-24 2006-06-20 照明システムの偏光を特定する方法及び装置
EP06765790A EP1896899A2 (fr) 2005-06-24 2006-06-20 Procedes et dispositif destines a la caracterisation de la polarisation de systemes d'eclairage

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05105679 2005-06-24
EP05105679.4 2005-06-24

Publications (2)

Publication Number Publication Date
WO2006137011A2 WO2006137011A2 (fr) 2006-12-28
WO2006137011A3 true WO2006137011A3 (fr) 2007-07-05

Family

ID=37461144

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2006/051979 WO2006137011A2 (fr) 2005-06-24 2006-06-20 Procedes et dispositif destines a la caracterisation de la polarisation de systemes d'eclairage

Country Status (7)

Country Link
US (1) US20100215273A1 (fr)
EP (1) EP1896899A2 (fr)
JP (1) JP2008547015A (fr)
KR (1) KR20080018203A (fr)
CN (1) CN101203806A (fr)
TW (1) TW200707121A (fr)
WO (1) WO2006137011A2 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007038056B4 (de) * 2007-08-10 2011-07-21 Carl Zeiss SMT GmbH, 73447 Verfahren zum Bestimmen einer polarisationsoptischen Eigenschaft eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage
TW200938957A (en) 2008-03-05 2009-09-16 Nanya Technology Corp Feedback system and feedback method for controlling power ratio of light source
US8368890B2 (en) * 2009-02-19 2013-02-05 International Business Machines Corporation Polarization monitoring reticle design for high numerical aperture lithography systems
US8234601B2 (en) * 2010-05-14 2012-07-31 International Business Machines Corporation Test pattern for contour calibration in OPC model build
NL2006773A (en) 2010-06-23 2011-12-27 Asml Netherlands Bv Lithographic apparatus.
US8352891B2 (en) * 2010-08-19 2013-01-08 Mentor Graphics Corporation Layout decomposition based on partial intensity distribution
DE102014223326B4 (de) * 2014-11-14 2018-08-16 Carl Zeiss Smt Gmbh Verfahren zur Vorhersage mindestens eines Beleuchtungsparameters zur Bewertung eines Beleuchtungssettings und Verfahren zur Optimierung eines Beleuchtungssettings
US10216096B2 (en) 2015-08-14 2019-02-26 Kla-Tencor Corporation Process-sensitive metrology systems and methods
US10337991B2 (en) * 2015-12-08 2019-07-02 Kla-Tencor Corporation Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination
JP2021531502A (ja) * 2018-07-17 2021-11-18 カール ツァイス エスエムエス リミテッド フォトリソグラフィマスクの基板に導入される１つまたは複数のピクセルの効果を決定するための方法および装置
DE102018124314B9 (de) 2018-10-02 2020-12-31 Carl Zeiss Smt Gmbh Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie
CN109143796B (zh) * 2018-10-26 2021-02-12 中国科学院微电子研究所 确定光刻光源的方法、装置及模型训练方法、装置
WO2022092165A1 (fr) * 2020-10-28 2022-05-05 学校法人関西学院 Procédé d'évaluation de substrats de carbure de silicium

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040263816A1 (en) * 2003-05-12 2004-12-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1496398A1 (fr) * 2003-07-05 2005-01-12 Carl Zeiss SMT AG Appareil d'inspection quant à la polarisation, système de projection optique et méthode d'étalonnage
US20050099613A1 (en) * 2003-10-07 2005-05-12 Kazuya Fukuhara Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus
US20050105087A1 (en) * 2003-10-07 2005-05-19 Hiroshi Nomura Exposure apparatus and method of measuring mueller matrix of optical system of exposure apparatus
WO2005057290A2 (fr) * 2003-12-09 2005-06-23 Asml Netherlands B.V. Capteur pour un appareil lithographique, et procede pour obtenir les mesures d'un appareil lithographique
US20050134822A1 (en) * 2003-12-19 2005-06-23 Asml Masktools B.V. Optimized polarization illumination

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5340992A (en) * 1988-02-16 1994-08-23 Canon Kabushiki Kaisha Apparatus and method of detecting positional relationship using a weighted coefficient
JP3689681B2 (ja) * 2002-05-10 2005-08-31 キヤノン株式会社 測定装置及びそれを有する装置群
JP3651676B2 (ja) * 2002-07-11 2005-05-25 株式会社東芝 検査方法及びフォトマスク
JP2004061515A (ja) * 2002-07-29 2004-02-26 Cark Zeiss Smt Ag 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
US7090964B2 (en) * 2003-02-21 2006-08-15 Asml Holding N.V. Lithographic printing with polarized light
US6784992B1 (en) * 2003-03-05 2004-08-31 Advanced Micro Devices, Inc. Polarization measurement device and method
JP2004348050A (ja) * 2003-05-26 2004-12-09 Toshiba Corp フォトマスク、検査方法及び半導体装置の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040263816A1 (en) * 2003-05-12 2004-12-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1496398A1 (fr) * 2003-07-05 2005-01-12 Carl Zeiss SMT AG Appareil d'inspection quant à la polarisation, système de projection optique et méthode d'étalonnage
US20050099613A1 (en) * 2003-10-07 2005-05-12 Kazuya Fukuhara Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus
US20050105087A1 (en) * 2003-10-07 2005-05-19 Hiroshi Nomura Exposure apparatus and method of measuring mueller matrix of optical system of exposure apparatus
WO2005057290A2 (fr) * 2003-12-09 2005-06-23 Asml Netherlands B.V. Capteur pour un appareil lithographique, et procede pour obtenir les mesures d'un appareil lithographique
US20050134822A1 (en) * 2003-12-19 2005-06-23 Asml Masktools B.V. Optimized polarization illumination

Also Published As

Publication number Publication date
US20100215273A1 (en) 2010-08-26
KR20080018203A (ko) 2008-02-27
TW200707121A (en) 2007-02-16
JP2008547015A (ja) 2008-12-25
WO2006137011A2 (fr) 2006-12-28
CN101203806A (zh) 2008-06-18
EP1896899A2 (fr) 2008-03-12

Similar Documents

Publication Publication Date Title
WO2006137011A3 (fr) Procedes et dispositif destines a la caracterisation de la polarisation de systemes d'eclairage
DE60321241D1 (de) Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des Verfahrens
DK1657072T3 (da) Fremgangsmåde til tilvejebringelse af et billede ved hjælp af laser
TW200710532A (en) Multi-bandpass filter for a projection device
WO2005050317A3 (fr) Reticule polarise, systeme de photolithographie, et procede de formation d'un motif au moyen d'un reticule polarise en combinaison avec de la lumiere polarisee
TW200628885A (en) Repairing device and repairing method for display device
ATE410719T1 (de) Projektionsvorrichtung und verfahren zur holographischen rekonstruktion von szenen
EP1130470A3 (fr) Illumination de projection microlithographique avec polarisation tangentielle
WO2008061681A3 (fr) Optique d'éclairage pour la microlithographie par projection et procédé de mesure et de contrôle pour une telle optique d'éclairage
WO2006113145A3 (fr) Systemes et procedes d'attenuation des variances sur une plaquette a motif au moyen d'un modele de prediction
WO2007027803A3 (fr) Systemes et procedes d'eclairage d'un specimen a inspecter
BR9907149A (pt) Método de verificação da autenticidade de um documento de segurança e documento para uso em tal método
WO2006138587A3 (fr) Lithographie a ecriture directe en trois dimensions
WO2007008727A3 (fr) Systeme et procede de traitement d'un laser de forte puissance
EP1601008A4 (fr) Liquide d'immersion pour procede d'exposition par immersion et procede de formation de motif de reserve au moyen d'un tel liquide d'immersion
TW200715372A (en) Exposure method
WO2005085955A3 (fr) Dispositif de filtre de transmission
WO2007076184A3 (fr) Procede et appareil pour la commande de l'intensite de multiples sources lumineuses
WO2008008223A3 (fr) Ellipsométrie, et génération et détection de contrainte optique en combinaison.
WO2008117719A1 (fr) Procédé de fabrication d'irrégularités de surface
WO2001090789A3 (fr) Inscription aux uv par commande de polarisation
TW200730801A (en) Apparatus and method for improving detected resolution and/or intensity of a sampled image
EP1622191A4 (fr) Systeme optique de projection et appareil et procede d'exposition
TW200745726A (en) Illumination apparatus, exposure apparatus having the same, and device manufacturing method
Wang et al. Angle‐Multiplexed 3D Photonic Superstructures with Multi‐Directional Switchable Structural Color for Information Transformation, Storage, and Encryption

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2006765790

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2008517672

Country of ref document: JP

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 06765790

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 11993063

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 1020077029794

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 200680022496.6

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

WWW Wipo information: withdrawn in national office

Ref document number: DE

WWP Wipo information: published in national office

Ref document number: 2006765790

Country of ref document: EP