WO2006118088A1 - Paste application device and paste application method - Google Patents
Paste application device and paste application method Download PDFInfo
- Publication number
- WO2006118088A1 WO2006118088A1 PCT/JP2006/308593 JP2006308593W WO2006118088A1 WO 2006118088 A1 WO2006118088 A1 WO 2006118088A1 JP 2006308593 W JP2006308593 W JP 2006308593W WO 2006118088 A1 WO2006118088 A1 WO 2006118088A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- paste
- substrate
- nozzle
- screw
- motor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1034—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves specially designed for conducting intermittent application of small quantities, e.g. drops, of coating material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
- B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
- B05C5/0216—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles by relative movement of article and outlet according to a predetermined path
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
Definitions
- the present invention relates to a paste coating apparatus and a paste coating method for applying a paste for sealing a liquid substance such as liquid crystal between glass substrates such as a liquid crystal display panel.
- a pattern is drawn by moving one of the substrate and the nozzle in a horizontal plane parallel to the other while discharging nozzle force paste.
- the method is known.
- the conventional paced coating apparatus discharges a paste-like sealant from a nozzle (needle) by applying a gas pressure of a preset pressure in a syringe as disclosed in Patent Document 1. And apply onto the substrate. At this time, the stage holding the substrate on the upper surface is moved in parallel with the nozzle.
- Patent Document 1 Japanese Patent Laid-Open No. 11-119232
- An object of the present invention is to apply a paste in a necessary amount to a target portion on a substrate.
- the present invention relates to a cylinder having a nozzle in a paste coating apparatus that discharges a paste for sealing a liquid substance between two substrates from a nozzle and applies the paste to at least one substrate, and the cylinder
- a pump means having a screw which is rotatably provided in the nozzle and discharges a paste of an amount corresponding to the rotation amount from the nozzle, a motor for rotating the screw, and the nozzle and the substrate on the substrate surface.
- a moving device that relatively moves along the motor, a motor of the pump means, and a control device that controls the moving device.
- the present invention relates to a paste application method in which a paste for sealing a liquid substance between two substrates is ejected from a nozzle and applied to at least one of the substrates, depending on the amount of rotation of the screw.
- a paste for sealing a liquid substance between two substrates is ejected from a nozzle and applied to at least one of the substrates, depending on the amount of rotation of the screw.
- FIG. 1 is an overall view showing a paced coating apparatus.
- FIG. 2 is an enlarged schematic view of the discharge pump of FIG.
- FIG. 3 is a schematic diagram for explaining a coating operation.
- FIG. 4 is a diagram showing the relationship between the application position and the speed of the motor of the discharge pump.
- FIG. 5 is a schematic diagram for explaining a coating pattern of a sealing agent in a concave portion of a conventional example.
- FIG. 6 is a schematic diagram showing an application pattern of a sealing agent of a conventional example.
- FIG. 7 is a schematic view showing a coating pattern of a conventional sealing agent.
- FIG. 8 is a schematic view showing another example of a cylinder and a screw in the discharge pump.
- a paste coating apparatus 10 according to the present invention shown in FIG. 1 has a square plate-like base 11, and the base 11 is fixed on four legs 12.
- a feed table 13 in the X-axis direction (left-right direction in FIG. 1) is provided on the upper surface of the base 11 so as to be movable in the left-right direction via the feed mechanism 14.
- the Y-axis is placed on the feed table 13 in the X-axis direction.
- a feed table 15 in the direction (front-rear direction in FIG. 1) is provided so as to be movable in the front-rear direction via a feed mechanism 16.
- a gate-shaped column 20 is fixed on the base 11, and two heads 22 are arranged in the left-right direction on a linear guide 21 fixed to the front portion of the horizontal beam portion 20A extending in the X-axis direction of the column 20.
- the two heads 22 are provided so as to be movable in the X-axis direction (left-right direction) via the feed mechanism 23.
- the distance in the X-axis direction between the two heads 22 can be matched to the arrangement distance in the X-axis direction of a plurality of patterns formed on the substrate 31 described later.
- the feed mechanisms 14, 16, and 23 each include a feed screw and a nut (not shown), and servo motors 24, 25, and 26 for driving that rotate the feed screw.
- the feeding mechanism may be a linear stator and a linear motor having a mover force that moves on the stator.
- a square plate-like stage 30 is fixed on the feed table 15 in the Y-axis direction, and a glass substrate 31 of a liquid crystal display panel is held on the stage 30.
- Each of the two heads 22 has a discharge pump 32 (pump means) not shown in the Z-axis direction.
- the moving device Z-axis moving device
- the discharge pump 32 is provided in parallel with a hollow cylinder 34 having a nozzle 33 at the tip and a screw 36 and a cylinder 34 that are rotatably provided in the cylinder 34 via a connecting member 35. 40 storage container.
- the screw 36 has a screw portion 36A on the outer periphery, and is connected to a servo motor 41 for driving fixed to the base end portion of the cylinder 34.
- a liquid sealing agent 44 (paste) is stored in the storage container 40, and a pressure gas chamber 45 is provided above the sealing agent 44.
- the pressure gas chamber 45 is connected to a gas pressure source (not shown) via a hose 46. Connected.
- the supply of the pressure gas from the gas pressure source is started at a timing earlier than the timing at which the rotation of the screw 36 is started, and the rotation of the screw 36 is stopped. It stops at the timing.
- the bottom of the storage container 40 is connected to an opening 43 in the upper part of the cylinder 34 via a noise 42, and the opening 43 in the upper part of the cylinder 34 opens toward the outer periphery of the upper end of the screw part 36A of the screw 36.
- a spiral liquid chamber filled with a sealant is formed between the inner periphery of the cylinder 34 and the upper and lower screw portions 36A.
- the following is performed as a preliminary discharge operation.
- the pressure gas is supplied into the pressure gas chamber 45, and the screw 36 is rotated in this state.
- the screw 36 continues to rotate until the liquid chamber is filled with the sealant and the sealant is discharged from the nozzle 33.
- it is preferable that the screw 36 is continuously rotated for a set time after the sealant is discharged from the nozzle, so that the sealant can be filled in the liquid chamber without leaving air in the liquid chamber.
- the discharge pump 32 has a distance measuring device such as a laser displacement meter (not shown) provided integrally with the nozzle 33.
- the control device described later controls the gap between the nozzle 33 and the surface of the substrate 31 so as to keep a predetermined gap by feedback control based on the measured value of the distance to the surface of the substrate 31 by the distance measuring device (gap Control.
- the screw 36 does not push out the sealing agent by the pressure gas as in the prior art, and the screw part 36A directly mechanically pushes out the liquid sealing agent. A proportional discharge rate is obtained.
- the moving devices 17 and 18 including the feed tables 13 and 15 and the feeding mechanisms 14 and 16 in the X-axis direction and the Y-axis direction of the stage 30 and the moving device 19 including the two heads 22 and the feeding mechanism 23
- the nozzle 33 of the pump 32 and the substrate 31 on the stage 30 are relatively moved in parallel along the substrate 31 surface.
- the paste coating apparatus 10 includes a control device (not shown), and the control device has a relative movement speed in the direction along the substrate surface between the nozzle 33 and the substrate 31, that is, a relative movement speed in the X-axis direction, a Y-axis
- the rotation speed of the motor 41 of the discharge pump 32 is controlled according to the relative movement speed in the direction and the relative movement speed obtained by combining the relative movement speed in the X-axis direction and the relative movement speed in the Y-axis direction.
- the coating apparatus 10 draws a rectangular coating pattern P by coating a sealing agent along the peripheral edge of the rectangular glass substrate 31 in a clockwise direction in FIG.
- the control device moves the nozzle 33 directly above the application start point O.
- the gap between the nozzle 33 and the surface of the substrate 31 becomes a preset gap by feedback control based on the measured value of the distance measuring device while lowering the nozzle 33 by controlling the Z-axis moving device.
- the control device rotates the motor 24 of the X-axis direction moving device 17 composed of the feed table 13, and moves the substrate 31 to the right of the X-axis in FIG. .
- control device rotates the motor 41 of the discharge pump 32 in synchronization with the motor 24 of the moving device 17 in the X-axis direction (hereinafter described as moving the feed table 13 in the X-axis direction), and the nozzle 33 The sealant is discharged from.
- FIG. 4 shows the application position on the substrate in the process of reaching the application start point O force application end point F on the horizontal axis, and the rotational speed of the motor 41 of the discharge pump 32 on the vertical axis.
- the motor 24 of the moving device 17 in the X-axis direction accelerates the stop state force to the rotational speed Vs set corresponding to the straight line portion S, so that the control device moves in the X-axis direction.
- the rotation of the motor 41 of the discharge pump 32 is accelerated from the stop state to the first rotation speed V 1 corresponding to the rotation speed Vs in synchronization with the change in the rotation speed of the motor 24 of the moving device 17.
- the moving speed of the moving device 17 is lower than the moving speed of the linear portion S (shown in FIG. 4) of the coating pattern P. .
- the discharge amount per unit time of the sealant is made smaller than the discharge amount in the high-speed movement area corresponding to the straight line portion S, so that the application amount per unit length is high. It should be the same as the application amount in the moving area. As a result, the application amount is prevented from increasing near the application start point O, and the expansion of the line width and thickness of the application pattern is prevented.
- the control device sets the motor 24 of the X-axis direction moving device 17 corresponding to the low speed moving area near corner C1 (indicated by W2 in FIG. 4). Decelerate to the specified rotation speed Vw. Synchronizing with the deceleration of the motor 24 of the movement device 17 in the X-axis, the control device rotates the rotation of the motor 41 of the discharge pump 32 from the first rotation speed VI to the second rotation speed V2 corresponding to the rotation speed Vw. To slow down.
- the control device decelerates and stops the motor 24 of the moving device 17 in the X-axis direction.
- the controller starts the rotation of the motor 25 of the moving device 18 in the Y-axis direction simultaneously with the start of the deceleration, and the relative movement of the substrate 31 and the nozzle 33 in the direction along the substrate 31 surface during the drawing of the corner C1 portion.
- the rotation speed is controlled so that the speed is constant.
- the control device operates during this period with the motor 41 of the discharge pump 32. Is maintained at the second rotation speed V2.
- the moving speed of the moving device 17 is lower than the moving speed of the linear portion S of the coating pattern P.
- the amount of sealant dispensed per unit time is less than the amount discharged in the high-speed moving area, and the amount applied per unit length is the same as the amount applied in the high-speed moving area.
- the application amount is prevented from increasing in the vicinity of corner C1, W2, and the expansion of the line width and thickness of the application pattern is prevented.
- the relative movement speed between the substrate 31 and the nozzle 33 is lower than the movement speed of the linear part S near the corner C1, the head 22 caused by the acceleration / deceleration of the moving devices 17 and 18 at the corner C1.
- By preventing vertical vibrations it is possible to prevent the occurrence of pattern breakage and variation in coating amount at corner C1 and near W2.
- the control device gradually slows down the rotation of the motor 41 of the discharge pump 32 in synchronism with the deceleration of the motor 24 of the moving device 17 in the X-axis direction, and the sealing agent. Reduce the discharge amount. As a result, the application amount is prevented from increasing in the vicinity of the application end point F, and the expansion of the coating pattern in the line width direction and thickness is prevented.
- the nozzle 33 is moved to the application start point O of the next pattern.
- this pattern is the last pattern to be formed on the substrate 31, it is not necessary to move the application end point F force to the application start point O. Thus, one cycle of applying the sealing agent on the glass substrate 31 is completed.
- the motor 41 for discharging the sealing agent from the nozzle 33 Increase the rotational speed and partially increase the amount of sealant applied from other parts I than the recesses G.
- the sealant When the sealant is applied to the substrate 31A with the rectangular coating pattern P so that the coating amount per unit length is constant, if there is a recess G on the surface of the substrate 31A, the recess G will The application height becomes low. In this case, the rotational speed of the motor 41 is increased so that the discharge amount per unit time of the sealing agent from the nozzle 33 is increased in the recess G. In this way, the height of the applied sealant (not the relative height of the surface force of the substrate 31A but the absolute height) is controlled to be constant.
- the position of the concave portion or the convex portion formed on the surface of the substrate 31A can be obtained by using design data of the substrate 31A or by measuring height data of the surface of the substrate 31A in advance. .
- the discharge pump 32 mechanically pushes out an amount (volume) of the sealant proportional to the amount of rotation of the motor 41 by rotating the screw 36 with the motor 41. Even if the viscosity of the agent changes or the remaining amount of the sealant in the cylinder 34 of the discharge pump 32 decreases, the rotational speed of the motor 41 of the discharge pump 32 is kept constant so that the sealant from the nozzle 33 The discharge amount per unit time can be kept constant.
- the amount of the sealing agent extruded by the mechanical extrusion by the screw portion 36A of the screw 36 accompanying the rotation of the screw 36 is set to the nozzle. Since it is discharged from the nozzle 33, the amount of the sealing agent pushed out by the threaded portion 36A can be discharged from the nozzle 33, and the discharge amount of the sealing agent at the nozzle 33 force of the discharge pump 32 is less susceptible to fluctuations in the gap. Always mechanically extrude a certain amount of sealant.
- the sealing agent can be applied on the substrate 31 in a uniform application amount, and the application accuracy of the sealing agent to the substrate 31 can be improved. Therefore, it is possible to manufacture a high quality liquid crystal display panel in which liquid crystal leakage and air intrusion are prevented.
- control for maintaining a constant gap between the nozzle 33 and the substrate 31, which is essential when the nozzle force is also discharged by the gas pressure, is unnecessary, or the frequency is increased. It is possible to reduce the number and simplify the control. This also eliminates or reduces the time required for the gap control process, thereby reducing the time required for applying the sealant and improving the efficiency.
- the discharge amount of the sealant from the nozzle 33 per unit time is controlled with good responsiveness by mechanical extrusion by the rotation of the screw 36.
- a coating pattern having a uniform coating amount force can be drawn on the substrate 31.
- the timing at which the stage 30 or the head 22 stops and the timing at which the sealing agent is stopped from being discharged from the nozzle 33 can be made the same each time. As a result, it is possible to draw with good reproducibility as the shapes of the sealing agent application start point O and the application end point F are set.
- the rotational speed of the motor 41 that discharges the sealant from the nozzle 33 according to the step or the recess G By changing the gas pressure applied to the cylinder 34 by changing the gas pressure applied to the cylinder 34, it is easier to change the amount of the sealant applied.
- the coating pattern P can be drawn with good reproducibility by the coating amount.
- the sealing agent can be discharged stably from the nozzle cover, preventing problems such as variations in the amount of the sealing agent applied and disconnection of the drawn sealing agent application pattern P. can do. This is particularly effective when the viscosity of the sealant is high or when the rotational speed of the screw 36 is high.
- the application of the pressing force to the sealant by the pressure gas is stopped while the screw 36 is stopped. Prevents the sealant from leaking out of the nozzle 33
- the relative movement speed of the straight line portion S may be left as it is.
- the screw 36 Since the sealing agent extruded by the mechanical extruding by the thread portion 36A is discharged from the nozzle 33, it is possible to prevent the paste discharge amount from the nozzle from changing.
- the paste can be applied to the substrate with the required application amount, and even in the vicinity of the corner C, the paste can be applied linearly with a uniform application amount, with high accuracy.
- a coating pattern can be formed.
- the force gap control described in the example of performing the gap control may be omitted.
- the gap control may not be performed at all, or the gap control may be performed only when the nozzle 33 is positioned at the coating start point O, and the gap control may be omitted during pattern drawing.
- the screw 36 is provided with a nozzle 33 having a cylinder 34 at its lower end.
- the example has been described so as to reach the bottom (tip) formed, but it may be arranged so as to provide a space 47 between its lower end and the bottom of the cylinder 34 as shown in FIG.
- the screw 48 is provided in the cylinder 34, the upper end portion is connected to the rotating shaft of the motor 41 via the connecting member 35, and the lower end portion is a free end.
- the screw 48 has a larger gap between its free end and the bottom of the cylinder 34 where the nozzle 33 is provided, than the distance between the free end of the screw 36 and the cylinder 34 shown in FIG. In the meantime, the sealant can be stored.
- the screw portion 36A of the screw 34 may be a plurality of strips having a force of two or more as described in the example of one strip.
- the number of rotations of the motor 41 required for this is 1 / n.
- the rotational speed of the motor 41 that drives the screw 36 to rotate is only lZn. It is possible to suppress the curing and deterioration of the agent due to heat generation, and it is possible to prevent the loss caused by discarding the expensive sealant.
- the paste can be applied to a target location on the substrate in a necessary amount, and the accuracy of applying the paste to the substrate can be further improved. Therefore, when the two substrates are glass substrates for manufacturing a liquid crystal display panel and the liquid material is liquid crystal, the liquid crystal display panel is manufactured with good quality in which liquid crystal leakage and air intrusion are prevented. It can be done.
Landscapes
- Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Die Bonding (AREA)
Abstract
Description
明 細 書 Specification
ペースト塗布装置及びペースト塗布方法 Paste coating apparatus and paste coating method
技術分野 Technical field
[0001] 本発明は、液晶表示パネル等のガラス基板の間に液晶等の液状物質を封止する ためのペーストを塗布するペースト塗布装置及びペースト塗布方法に関する。 TECHNICAL FIELD [0001] The present invention relates to a paste coating apparatus and a paste coating method for applying a paste for sealing a liquid substance such as liquid crystal between glass substrates such as a liquid crystal display panel.
背景技術 Background art
[0002] ガラス基板上にペーストでパターンを描画する技術としては、ノズル力 ペーストを 吐出させつつ、基板とノズルのいずれか一方を他方に対して平行な水平面内で移動 させることによりパターンを描画する方法が知られている。 As a technique for drawing a pattern with a paste on a glass substrate, a pattern is drawn by moving one of the substrate and the nozzle in a horizontal plane parallel to the other while discharging nozzle force paste. The method is known.
[0003] 上記方法において、従来のペースド塗布装置では、特許文献 1に開示の如ぐシリ ンジ内に予め設定された圧力の気体圧力をかけることにより、ノズル (ニードル)から ペースト状シール剤を吐出させて基板上に塗布する。このとき、ノズルに対して、基板 を上面に保持するステージを平行に移動させるようにして 、る。 [0003] In the above method, the conventional paced coating apparatus discharges a paste-like sealant from a nozzle (needle) by applying a gas pressure of a preset pressure in a syringe as disclosed in Patent Document 1. And apply onto the substrate. At this time, the stage holding the substrate on the upper surface is moved in parallel with the nozzle.
特許文献 1:特開平 11― 119232号公報 Patent Document 1: Japanese Patent Laid-Open No. 11-119232
発明の開示 Disclosure of the invention
[0004] し力しながら、気体圧力によりペースト状シール剤をノズルから吐出させる方式では 、基板上面とノズルとの間のギャップが変動すると、ノズルからのシール剤の吐出抵 抗が変動してシール剤の吐出量が変化する。また、周囲温度の変化によりシール剤 の粘度が変化するとノズルからの吐出量が変化する。その結果、 目的の箇所にベー ストを必要な塗布量で塗布することができな 、と 、う問題がある。 [0004] In the method in which the paste-like sealant is discharged from the nozzle by gas pressure while the force is applied, if the gap between the upper surface of the substrate and the nozzle fluctuates, the discharge resistance of the sealant from the nozzle fluctuates and seals. The discharge amount of the agent changes. Also, when the viscosity of the sealant changes due to changes in ambient temperature, the discharge rate from the nozzle changes. As a result, there is a problem that the base cannot be applied to the target portion with the necessary amount.
[0005] また、図 6に示すように、パターン 109の描画速度、つまり、ステージ又はヘッドの移 動速度が高速になると、コーナー付近でのステージ又はヘッドの急加減速に起因し てヘッドに上下振動が生じ、これにより、基板とノズル間のギャップが変動し、パター ン切れ 110や塗布量のバラツキ 111が発生する。 [0005] Also, as shown in FIG. 6, when the drawing speed of the pattern 109, that is, the moving speed of the stage or the head becomes high, the head or the head moves up and down due to the sudden acceleration / deceleration of the stage or the head near the corner. Vibration occurs, which causes a gap between the substrate and the nozzle to fluctuate, resulting in a pattern cut 110 and a coating amount variation 111.
[0006] そのため、コーナー手前で描画速度を予め減速させることでコーナー付近でのへッ ドの振動を低減し、パターン切れや塗布量のバラツキ 111を防ぐことが考えられる。し 力しながら、単位時間当たりに吐出するシール剤の量が一定になるように、シリンジ 内に圧力気体を供給しているので描画速度を遅くすると、図 7に示すように、遅くした 部分 112の塗布量が多くなる。 [0006] For this reason, it is conceivable to reduce the head vibration near the corner by reducing the drawing speed in front of the corner in advance, thereby preventing pattern cuts and coating amount variation 111. However, in order to keep the amount of sealant discharged per unit time constant, If the drawing speed is slowed because the pressure gas is supplied inside, the coating amount of the slowed portion 112 increases as shown in FIG.
[0007] そのため、 2枚の基板を貼り合わせて液晶表示パネルを作る際、パターン 109のう ち部分的に塗布量が多い部分 112のシール剤が十分に潰れず、 2枚の基板の間隔 が不均一になったり、又はその部分で潰れたシール剤の幅が他の部分に比べて広く なり、所定の場所以外にはみ出す等の不具合が生ずる。 [0007] Therefore, when a liquid crystal display panel is made by bonding two substrates together, the sealant of the portion 112 of the pattern 109 where the coating amount is partly large is not sufficiently crushed, and the interval between the two substrates is not sufficient. The width of the sealant that becomes non-uniform or is crushed in that part becomes wider than in other parts, causing problems such as protruding beyond a predetermined location.
[0008] これらの不具合を防ぐために、パターン 109のコーナー付近で描画速度を減速す ると同時にシリンジ内の気体圧力を低減させることが考えられる。し力しながら、一般 に気体は大きな圧縮性 (圧力を加えることによって体積が減少しやす 、性質)を有す るので、気体圧力が変更されてから吐出量が変化するまでの応答性が悪ぐまた応 答時間はシリンジ内のシール剤の残量の多少によっても変化する。また、応答性の 悪さから塗布開始点 113では塗布量が過少となり、塗布終了点 114では塗布量が過 多となるという問題が生じる。 In order to prevent these problems, it is conceivable to reduce the gas pressure in the syringe at the same time as reducing the drawing speed near the corner of the pattern 109. In general, however, gas has a large compressibility (the volume is likely to decrease when pressure is applied, which is a property), and therefore the responsiveness from when the gas pressure is changed until the discharge rate changes is poor. The response time also varies depending on the remaining amount of sealant in the syringe. In addition, due to poor responsiveness, there is a problem that the application amount becomes too small at the application start point 113 and the application amount becomes excessive at the application end point 114.
[0009] 本発明の課題は、基板上の目的の箇所にペーストを必要な量で塗布することであ る。 [0009] An object of the present invention is to apply a paste in a necessary amount to a target portion on a substrate.
[0010] この発明は、 2枚の基板間に液状物質を封止するためのペーストをノズルから吐出 させ、少なくとも一方の基板にペーストを塗布するペースト塗布装置において、ノズル を有するシリンダと、このシリンダ内に回転自在に設けられ回転量に応じた量のぺー ストを前記ノズルから吐出させるスクリューと、このスクリューを回転させるモータとを有 するポンプ手段と、該ノズルと前記基板とを該基板面に沿って相対的に移動させる移 動装置と、前記ポンプ手段のモータと該移動装置を制御する制御装置を備えたもの である。 [0010] The present invention relates to a cylinder having a nozzle in a paste coating apparatus that discharges a paste for sealing a liquid substance between two substrates from a nozzle and applies the paste to at least one substrate, and the cylinder A pump means having a screw which is rotatably provided in the nozzle and discharges a paste of an amount corresponding to the rotation amount from the nozzle, a motor for rotating the screw, and the nozzle and the substrate on the substrate surface. A moving device that relatively moves along the motor, a motor of the pump means, and a control device that controls the moving device.
[0011] この発明は、 2枚の基板間に液状物質を封止するためのペーストをノズルから吐出 させて、少なくとも一方の基板にペーストを塗布するペースト塗布方法において、スク リューの回転量に応じた量のペーストを前記ノズルから吐出させるポンプ手段にて該 ペーストを該ノズルから吐出させて、前記基板にペーストを塗布する際に、該基板に 所定の塗布量で前記ペーストが塗布されるように前記スクリューの回転を制御するよ うにしたものである。 図面の簡単な説明 [0011] The present invention relates to a paste application method in which a paste for sealing a liquid substance between two substrates is ejected from a nozzle and applied to at least one of the substrates, depending on the amount of rotation of the screw. When the paste is applied to the substrate by discharging the paste from the nozzle by a pumping means for discharging a predetermined amount of paste from the nozzle, the paste is applied to the substrate with a predetermined application amount. The rotation of the screw is controlled. Brief Description of Drawings
[0012] [図 1]図 1は、ペースド塗布装置を示す全体図である。 FIG. 1 is an overall view showing a paced coating apparatus.
[図 2]図 2は、図 1の吐出ポンプを拡大して示す模式図である。 FIG. 2 is an enlarged schematic view of the discharge pump of FIG.
[図 3]図 3は、塗布動作を説明するための模式図である。 FIG. 3 is a schematic diagram for explaining a coating operation.
[図 4]図 4は、塗布位置と吐出ポンプのモータの速度との関係を示す図である。 FIG. 4 is a diagram showing the relationship between the application position and the speed of the motor of the discharge pump.
[図 5]図 5は、従来例の凹部でのシール剤の塗布パターンを説明するための模式図 である。 FIG. 5 is a schematic diagram for explaining a coating pattern of a sealing agent in a concave portion of a conventional example.
[図 6]図 6は、従来例のシール剤の塗布パターンを示す模式図である。 FIG. 6 is a schematic diagram showing an application pattern of a sealing agent of a conventional example.
[図 7]図 7は、従来例のシール剤の塗布パターンを示す模式図である。 FIG. 7 is a schematic view showing a coating pattern of a conventional sealing agent.
[図 8]図 8は、吐出ポンプにおけるシリンダとスクリューの他の例を示す模式図である。 発明を実施するための最良の形態 FIG. 8 is a schematic view showing another example of a cylinder and a screw in the discharge pump. BEST MODE FOR CARRYING OUT THE INVENTION
[0013] 図 1に示すこの発明のペースト塗布装置 10は四角平板状のベース 11を有し、ベー ス 11は 4つの脚 12上に固定されている。ベース 11の上面には X軸方向(図 1中の左 右方向)の送りテーブル 13が送り機構 14を介して左右方向に移動自在に設けられ、 X軸方向の送りテーブル 13上には Y軸方向(図 1中の前後方向)の送りテーブル 15 が送り機構 16を介して前後方向に移動自在に設けられている。 A paste coating apparatus 10 according to the present invention shown in FIG. 1 has a square plate-like base 11, and the base 11 is fixed on four legs 12. A feed table 13 in the X-axis direction (left-right direction in FIG. 1) is provided on the upper surface of the base 11 so as to be movable in the left-right direction via the feed mechanism 14. The Y-axis is placed on the feed table 13 in the X-axis direction. A feed table 15 in the direction (front-rear direction in FIG. 1) is provided so as to be movable in the front-rear direction via a feed mechanism 16.
[0014] また、ベース 11上には門型のコラム 20が固定され、コラム 20の X軸方向に延びる 水平桁部 20Aの前面部に固定した直線ガイド 21上に 2つのヘッド 22が左右方向に 所定の間隔をおいて設けられ、 2つのヘッド 22は送り機構 23を介して X軸方向(左右 方向)に移動自在に設けられる。これにより、 2つのヘッド 22の X軸方向の間隔を、後 述する基板 31上に形成する複数のパターンの X軸方向における配置間隔に合わせ ることができるようになって!/、る。 [0014] A gate-shaped column 20 is fixed on the base 11, and two heads 22 are arranged in the left-right direction on a linear guide 21 fixed to the front portion of the horizontal beam portion 20A extending in the X-axis direction of the column 20. The two heads 22 are provided so as to be movable in the X-axis direction (left-right direction) via the feed mechanism 23. As a result, the distance in the X-axis direction between the two heads 22 can be matched to the arrangement distance in the X-axis direction of a plurality of patterns formed on the substrate 31 described later.
[0015] 送り機構 14、 16、 23は、それぞれ図示しない送りねじとナットと、送りねじを回動す る駆動用のサーボモータ 24、 25、 26とからなる。尚、送り機構としては直線状の固定 子とこの固定子上を移動する可動子力 なるリニアモータでも良い。 [0015] The feed mechanisms 14, 16, and 23 each include a feed screw and a nut (not shown), and servo motors 24, 25, and 26 for driving that rotate the feed screw. The feeding mechanism may be a linear stator and a linear motor having a mover force that moves on the stator.
[0016] Y軸方向の送りテーブル 15上には四角平板状のステージ 30が固定され、ステージ 30上には液晶表示パネルのガラス基板 31が保持される。 A square plate-like stage 30 is fixed on the feed table 15 in the Y-axis direction, and a glass substrate 31 of a liquid crystal display panel is held on the stage 30.
[0017] 2つのヘッド 22には、それぞれ吐出ポンプ 32 (ポンプ手段)が図示しない Z軸方向 の移動装置 (Z軸移動装置)を介して設けられる。吐出ポンプ 32は、図 2に示すように 、先端部にノズル 33を有する中空のシリンダ 34とシリンダ 34内に連結部材 35を介し て回転自在に設けられたスクリュー 36とシリンダ 34と並列に設けられた貯留容器 40 からなる。 [0017] Each of the two heads 22 has a discharge pump 32 (pump means) not shown in the Z-axis direction. The moving device (Z-axis moving device) is provided. As shown in FIG. 2, the discharge pump 32 is provided in parallel with a hollow cylinder 34 having a nozzle 33 at the tip and a screw 36 and a cylinder 34 that are rotatably provided in the cylinder 34 via a connecting member 35. 40 storage container.
[0018] スクリュー 36は外周にねじ部 36Aを有し、シリンダ 34の基端部に固定された駆動 用のサーボモータ 41に連結される。貯留容器 40内には液状のシール剤 44 (ペース ト)が貯留され、シール剤 44の上部には圧力気体室 45が設けられ、圧力気体室 45 はホース 46を介して図示しない気体圧力源に連結される。 [0018] The screw 36 has a screw portion 36A on the outer periphery, and is connected to a servo motor 41 for driving fixed to the base end portion of the cylinder 34. A liquid sealing agent 44 (paste) is stored in the storage container 40, and a pressure gas chamber 45 is provided above the sealing agent 44. The pressure gas chamber 45 is connected to a gas pressure source (not shown) via a hose 46. Connected.
[0019] 圧力気体室 45には、気体圧力源から圧力気体の供給がスクリュー 36の回転が開 始されるタイミングよりも予め設定された時間早 ヽタイミングで開始され、スクリュー 36 の回転が停止されるタイミングで停止される。 [0019] In the pressure gas chamber 45, the supply of the pressure gas from the gas pressure source is started at a timing earlier than the timing at which the rotation of the screw 36 is started, and the rotation of the screw 36 is stopped. It stops at the timing.
[0020] 貯留容器 40の底部はノイブ 42を介してシリンダ 34上部の開口 43に連結され、シリ ンダ 34上部の開口 43はスクリュー 36のねじ部 36Aの上端外周に向けて開口する。 シリンダ 34の内周と上下のねじ部 36Aとの間はシール剤で充満される螺旋状の液室 が形成される。ここで、液室内をシール剤で満たすには、予備吐出動作として下記を 行なう。 [0020] The bottom of the storage container 40 is connected to an opening 43 in the upper part of the cylinder 34 via a noise 42, and the opening 43 in the upper part of the cylinder 34 opens toward the outer periphery of the upper end of the screw part 36A of the screw 36. A spiral liquid chamber filled with a sealant is formed between the inner periphery of the cylinder 34 and the upper and lower screw portions 36A. Here, in order to fill the liquid chamber with the sealant, the following is performed as a preliminary discharge operation.
[0021] 即ち、圧力気体室 45内に圧力気体を供給し、この状態でスクリュー 36を回転させ る。液室内がシール剤で満たされ、シール剤がノズル 33から吐出されるまでスクリュ 一 36の回転を継続させる。このとき、スクリュー 36をシール剤がノズルから吐出された 後も設定時間回転させ続けた方が、液室内に空気を残留させることなくシール剤を 液室内に充満させることができ好ましい。 That is, the pressure gas is supplied into the pressure gas chamber 45, and the screw 36 is rotated in this state. The screw 36 continues to rotate until the liquid chamber is filled with the sealant and the sealant is discharged from the nozzle 33. At this time, it is preferable that the screw 36 is continuously rotated for a set time after the sealant is discharged from the nozzle, so that the sealant can be filled in the liquid chamber without leaving air in the liquid chamber.
[0022] 吐出ポンプ 32は、ノズル 33と一体的に設けられた図示しないレーザ変位計等の距 離測定器を有する。後述の制御装置は、この距離測定器による基板 31面までの距 離の測定値によるフィードバック制御により、ノズル 33と基板 31面との間のギャップを 予め設定されたギャップに保つように制御(ギャップ制御)する。 The discharge pump 32 has a distance measuring device such as a laser displacement meter (not shown) provided integrally with the nozzle 33. The control device described later controls the gap between the nozzle 33 and the surface of the substrate 31 so as to keep a predetermined gap by feedback control based on the measured value of the distance to the surface of the substrate 31 by the distance measuring device (gap Control.
[0023] 吐出ポンプ 32のモータ 41を回転させるとスクリュー 36が回転し、シリンダ 34の内周 とスクリュー 36外周のねじ部 36Aとの間のシール剤がノズル 33から吐出され、モータ 41の回転量に応じた量のシール剤がノズル 33から吐出される。 [0024] 例えば、スクリュー 36がー回転すると、ねじ部 36Aのピッチ相当分のシール剤がノ ズル 33から吐出される。そして、ノズル 33からのシール剤の単位時間当たりの吐出 量は、モータ 41の回転速度(単位時間当たりの回転量)に比例するので、モータ 41 の回転速度を変えることでノズル 33からのシール剤の単位時間当たりの吐出量を変 えることができる。 [0023] When the motor 41 of the discharge pump 32 is rotated, the screw 36 rotates, and the sealant between the inner periphery of the cylinder 34 and the screw portion 36A on the outer periphery of the screw 36 is discharged from the nozzle 33, and the rotation amount of the motor 41 An amount of the sealing agent corresponding to the amount is discharged from the nozzle 33. [0024] For example, when the screw 36 rotates, a sealant corresponding to the pitch of the screw portion 36A is discharged from the nozzle 33. Since the discharge amount per unit time of the sealant from the nozzle 33 is proportional to the rotation speed of the motor 41 (rotation amount per unit time), the sealant from the nozzle 33 can be changed by changing the rotation speed of the motor 41. The amount of discharge per unit time can be changed.
[0025] 吐出ポンプ 32は、従来技術の如ぐ圧力気体がシール剤を押し出すのではなぐス クリュー 36がそのねじ部 36Aにより直接機械的に液状のシール剤を押し出すので、 モータ 41の回転量に比例した吐出量が得られる。 [0025] In the discharge pump 32, the screw 36 does not push out the sealing agent by the pressure gas as in the prior art, and the screw part 36A directly mechanically pushes out the liquid sealing agent. A proportional discharge rate is obtained.
[0026] ステージ 30の X軸方向と Y軸方向の送りテーブル 13、 15及び送り機構 14、 16から なる移動装置 17、 18並びに、 2つのヘッド 22及び送り機構 23からなる移動装置 19 は、吐出ポンプ 32のノズル 33とステージ 30上の基板 31とを基板 31面に沿って平行 に相対的に移動させる。 [0026] The moving devices 17 and 18 including the feed tables 13 and 15 and the feeding mechanisms 14 and 16 in the X-axis direction and the Y-axis direction of the stage 30 and the moving device 19 including the two heads 22 and the feeding mechanism 23 The nozzle 33 of the pump 32 and the substrate 31 on the stage 30 are relatively moved in parallel along the substrate 31 surface.
[0027] また、ペースト塗布装置 10は、図示しない制御装置を備え、制御装置はノズル 33と 基板 31との基板面に沿う方向の相対移動速度、つまり、 X軸方向の相対移動速度、 Y軸方向の相対移動速度、及び X軸方向の相対移動速度と Y軸方向の相対移動速 度を合成した相対移動速度に応じて吐出ポンプ 32のモータ 41の回転速度を制御す る。 [0027] The paste coating apparatus 10 includes a control device (not shown), and the control device has a relative movement speed in the direction along the substrate surface between the nozzle 33 and the substrate 31, that is, a relative movement speed in the X-axis direction, a Y-axis The rotation speed of the motor 41 of the discharge pump 32 is controlled according to the relative movement speed in the direction and the relative movement speed obtained by combining the relative movement speed in the X-axis direction and the relative movement speed in the Y-axis direction.
[0028] 次に、上記構成の塗布装置 10によって、ステージ 30上に保持された液晶表示パ ネル用のガラス基板 31の周縁部にシール剤を塗布する動作について、図 1、図 3、 図 4を参照しながら説明する。尚、ここでは、 2つのヘッド 22は、同じ塗布パターン Pを 並行して描画することから、説明を簡単にするために、 2つのヘッド 22のうち 1つのへ ッド 22による塗布動作についてのみ説明する。 Next, the operation of applying the sealing agent to the peripheral edge of the glass substrate 31 for the liquid crystal display panel held on the stage 30 by the coating apparatus 10 having the above configuration will be described with reference to FIGS. Will be described with reference to FIG. Note that here, since the two heads 22 draw the same coating pattern P in parallel, only the coating operation by one head 22 of the two heads 22 will be described for the sake of simplicity. To do.
[0029] 塗布装置 10は矩形のガラス基板 31の周縁部に沿ってシール剤を、図 3中、時計方 向に線状に塗布して、矩形状の塗布パターン Pを描画する。 The coating apparatus 10 draws a rectangular coating pattern P by coating a sealing agent along the peripheral edge of the rectangular glass substrate 31 in a clockwise direction in FIG.
[0030] まず、制御装置は、ノズル 33を塗布開始点 Oの真上に移動させる。そして、 Z軸移 動装置を制御してノズル 33を下降させつつ、距離測定器の測定値によるフィードバ ック制御により、ノズル 33と基板 31面との間のギャップが予め設定されたギャップとな るように制御する。 [0031] この後、制御装置は送りテーブル 13からなる X軸方向の移動装置 17のモータ 24を 回転させ、基板 31をノズル 33〖こ対して、図 3中、 X軸の右方向に移動させる。同時に 、制御装置は X軸方向の移動装置 17 (以下、 X軸方向の送りテーブル 13を移動する ものとして説明する)のモータ 24に同期させて吐出ポンプ 32のモータ 41を回転させ て、ノズル 33からシール剤を吐出する。 First, the control device moves the nozzle 33 directly above the application start point O. The gap between the nozzle 33 and the surface of the substrate 31 becomes a preset gap by feedback control based on the measured value of the distance measuring device while lowering the nozzle 33 by controlling the Z-axis moving device. To control. [0031] After that, the control device rotates the motor 24 of the X-axis direction moving device 17 composed of the feed table 13, and moves the substrate 31 to the right of the X-axis in FIG. . At the same time, the control device rotates the motor 41 of the discharge pump 32 in synchronization with the motor 24 of the moving device 17 in the X-axis direction (hereinafter described as moving the feed table 13 in the X-axis direction), and the nozzle 33 The sealant is discharged from.
[0032] 図 4は横軸に塗布開始点 O力 塗布終了点 Fに至る過程における基板上の塗布位 置を示し、縦軸に吐出ポンプ 32のモータ 41の回転速度を示す。 FIG. 4 shows the application position on the substrate in the process of reaching the application start point O force application end point F on the horizontal axis, and the rotational speed of the motor 41 of the discharge pump 32 on the vertical axis.
[0033] 塗布開始点 Oにおいては、 X軸方向の移動装置 17のモータ 24は停止状態力も直 線部分 Sに対応して設定された回転速度 Vsまで加速するので、制御装置は X軸方 向の移動装置 17のモータ 24の回転速度の変化に同期させて、吐出ポンプ 32のモ ータ 41の回転を停止状態から回転速度 Vsに対応する第 1の回転速度 V 1まで加速 する。 [0033] At the application start point O, the motor 24 of the moving device 17 in the X-axis direction accelerates the stop state force to the rotational speed Vs set corresponding to the straight line portion S, so that the control device moves in the X-axis direction. The rotation of the motor 41 of the discharge pump 32 is accelerated from the stop state to the first rotation speed V 1 corresponding to the rotation speed Vs in synchronization with the change in the rotation speed of the motor 24 of the moving device 17.
[0034] この塗布開始点 O付近(図 4に W1で示す)では、移動装置 17の移動速度は、塗布 パターン Pの直線部分 S (図 4に示す)の移動速度に比較して低速である。この塗布 開始点 O付近の低速移動域においては、シール剤の単位時間当たりの吐出量を直 線部分 Sに対応する高速移動域の吐出量より少なくして、単位長さ当たりの塗布量が 高速移動域の塗布量と同一となるようにする。その結果、塗布開始点 O付近で塗布 量が多くなることを防止して、塗布パターンの線幅や厚みの膨らみを阻止する。 [0034] In the vicinity of the coating start point O (indicated by W1 in FIG. 4), the moving speed of the moving device 17 is lower than the moving speed of the linear portion S (shown in FIG. 4) of the coating pattern P. . In the low-speed movement area near the application start point O, the discharge amount per unit time of the sealant is made smaller than the discharge amount in the high-speed movement area corresponding to the straight line portion S, so that the application amount per unit length is high. It should be the same as the application amount in the moving area. As a result, the application amount is prevented from increasing near the application start point O, and the expansion of the line width and thickness of the application pattern is prevented.
[0035] 次いで、左前方のコーナー C1手前に近づくと、制御装置は X軸方向の移動装置 1 7のモータ 24をコーナー C1付近(図 4に W2で示す)の低速移動域に対応して設定 された回転速度 Vwまで減速させる。 X軸方向の移動装置 17のモータ 24の減速に同 期させて、制御装置は吐出ポンプ 32のモータ 41の回転を第 1の回転速度 VIから回 転速度 Vwに対応する第 2の回転速度 V2まで減速させる。 [0035] Next, when approaching the left front corner C1, the control device sets the motor 24 of the X-axis direction moving device 17 corresponding to the low speed moving area near corner C1 (indicated by W2 in FIG. 4). Decelerate to the specified rotation speed Vw. Synchronizing with the deceleration of the motor 24 of the movement device 17 in the X-axis, the control device rotates the rotation of the motor 41 of the discharge pump 32 from the first rotation speed VI to the second rotation speed V2 corresponding to the rotation speed Vw. To slow down.
[0036] 次いで、左前方のコーナー C1に至ると、制御装置は X軸方向の移動装置 17のモ ータ 24を減速させて停止させる。制御装置は、この減速の開始と同時に Y軸方向の 移動装置 18のモータ 25の回転を開始させ、コーナー C1部分の描画中に基板 31と ノズル 33との基板 31面に沿う方向での相対移動速度が一定になるようにその回転 速度を制御する。制御装置は、図 4に示すように、この間、吐出ポンプ 32のモータ 41 の回転を第 2の回転速度 V2に維持する。 [0036] Next, when reaching the left front corner C1, the control device decelerates and stops the motor 24 of the moving device 17 in the X-axis direction. The controller starts the rotation of the motor 25 of the moving device 18 in the Y-axis direction simultaneously with the start of the deceleration, and the relative movement of the substrate 31 and the nozzle 33 in the direction along the substrate 31 surface during the drawing of the corner C1 portion. The rotation speed is controlled so that the speed is constant. As shown in FIG. 4, the control device operates during this period with the motor 41 of the discharge pump 32. Is maintained at the second rotation speed V2.
[0037] このコーナー C1付近(図 4に W2で示す)では、移動装置 17の移動速度は、塗布 パターン Pの直線部分 Sの移動速度に比較して低速で移動する。このコーナー C1付 近 W2の低速移動域においては、シール剤の単位時間当たりの吐出量を高速移動 域の吐出量より少なくして単位長さ当たりの塗布量が高速移動域の塗布量と同一と なるようにする。 [0037] In the vicinity of this corner C1 (indicated by W2 in FIG. 4), the moving speed of the moving device 17 is lower than the moving speed of the linear portion S of the coating pattern P. In the low-speed moving area near W1 at corner C1, the amount of sealant dispensed per unit time is less than the amount discharged in the high-speed moving area, and the amount applied per unit length is the same as the amount applied in the high-speed moving area. To be.
[0038] その結果、コーナー C1付近 W2で塗布量が多くなることを防止して、塗布パターン の線幅や厚みの膨らみを阻止する。また、コーナー C1付近 W2で基板 31とノズル 33 との相対移動速度を直線部分 Sの移動速度よりも低速度とするので、コーナー C1で の移動装置 17、 18の加減速に起因するヘッド 22の上下振動を防止して、コーナー C1付近 W2でのパターン切れや塗布量のバラツキの発生を防止することができる。 [0038] As a result, the application amount is prevented from increasing in the vicinity of corner C1, W2, and the expansion of the line width and thickness of the application pattern is prevented. In addition, since the relative movement speed between the substrate 31 and the nozzle 33 is lower than the movement speed of the linear part S near the corner C1, the head 22 caused by the acceleration / deceleration of the moving devices 17 and 18 at the corner C1. By preventing vertical vibrations, it is possible to prevent the occurrence of pattern breakage and variation in coating amount at corner C1 and near W2.
[0039] 次いで、上記左前方のコーナー C1と同様に、左後方のコーナー C2、右後方のコ ーナー C3、右前方のコーナー C4を経て、塗布終了点 Fの手前に至る。コーナー C2 、 C3、 C4付近の低速移動域では、上記コーナー C1と同様に単位時間当たりの吐出 量を少なくして単位長さ当たりの塗布量を高速移動域と同一となるようにする。 [0039] Next, in the same manner as the left front corner C1, the left end corner C2, the right rear corner C3, and the right front corner C4 are reached before the application end point F. In the low-speed moving area near corners C2, C3, and C4, the discharge rate per unit time is reduced so that the coating amount per unit length is the same as the high-speed moving area, as in the case of corner C1 above.
[0040] 塗布終了点 F付近では、制御装置は X軸方向の移動装置 17のモータ 24を減速さ せるのに同期して、吐出ポンプ 32のモータ 41の回転を徐々に遅くして、シール剤の 吐出量を減らす。その結果、塗布終了点 F付近で塗布量が多くなることを防止して、 塗布パターンの線幅方向及び厚みの膨らみを阻止する。 [0040] In the vicinity of the application end point F, the control device gradually slows down the rotation of the motor 41 of the discharge pump 32 in synchronism with the deceleration of the motor 24 of the moving device 17 in the X-axis direction, and the sealing agent. Reduce the discharge amount. As a result, the application amount is prevented from increasing in the vicinity of the application end point F, and the expansion of the coating pattern in the line width direction and thickness is prevented.
[0041] 次いで、ノズル 33を、塗布終了点 F力 次のパターンの塗布開始点 Oに移動させる 。今回のパターンが基板 31上に形成すべき最後のパターンの場合は、塗布終了点 F力も塗布開始点 Oへの移動は不要である。以上でガラス基板 31上にシール剤を塗 布する 1サイクルが終了する。 [0041] Next, the nozzle 33 is moved to the application start point O of the next pattern. When this pattern is the last pattern to be formed on the substrate 31, it is not necessary to move the application end point F force to the application start point O. Thus, one cycle of applying the sealing agent on the glass substrate 31 is completed.
[0042] 以上の如ぐ矩形状の塗布パターン Pでシール剤を基板 31に塗布するとき、塗布 開始点 O付近、コーナー C1〜C4 (以下コーナー Cで表す)の塗布中、塗布終了点 F 付近では、直線部分 Sに比べてノズル 33と基板 31との相対移動速度が遅くなるので 、モータ 41の回転速度を遅くしてノズル 33からのシール剤の吐出量を少なくする。そ の結果、基板 31上に均一な塗布量力もなる塗布パターン Pを描画することができる。 [0043] また、図 5に示すように基板 31A表面の膜厚や回路等の構成により平らな基板 31 Aに段差又は凹部 Gがある場合には、ノズル 33からシール剤を吐出させるモータ 41 の回転速度を上げて部分的にシール剤の塗布量を凹部 G以外の他の部分 Iより増加 させる。 [0042] When the sealant is applied to the substrate 31 with the rectangular application pattern P as described above, in the vicinity of the application start point O, during application of corners C1 to C4 (hereinafter referred to as corner C), and in the vicinity of the application end point F Then, since the relative moving speed of the nozzle 33 and the substrate 31 is slower than that of the straight line portion S, the rotational speed of the motor 41 is slowed down to reduce the discharge amount of the sealant from the nozzle 33. As a result, a coating pattern P having a uniform coating amount power can be drawn on the substrate 31. Further, as shown in FIG. 5, when there is a step or a recess G on the flat substrate 31 A due to the film thickness of the surface of the substrate 31 A, the configuration of the circuit, etc., the motor 41 for discharging the sealing agent from the nozzle 33 Increase the rotational speed and partially increase the amount of sealant applied from other parts I than the recesses G.
[0044] 矩形状の塗布パターン Pでシール剤を基板 31Aに単位長さ当たりの塗布量が一定 になるように塗布するとき、基板 31A表面に凹部 Gが存在すると、凹部 Gでシール剤 の絶対的な塗布高さが低くなる。この場合、凹部 Gでノズル 33からのシール剤の単 位時間当たりの吐出量を増大させるように、モータ 41の回転速度を速くする。これに よって、塗布されたシール剤の高さ (基板 31A表面力もの相対的な高さではなく絶対 的高さ)が一定になるように制御する。 [0044] When the sealant is applied to the substrate 31A with the rectangular coating pattern P so that the coating amount per unit length is constant, if there is a recess G on the surface of the substrate 31A, the recess G will The application height becomes low. In this case, the rotational speed of the motor 41 is increased so that the discharge amount per unit time of the sealing agent from the nozzle 33 is increased in the recess G. In this way, the height of the applied sealant (not the relative height of the surface force of the substrate 31A but the absolute height) is controlled to be constant.
[0045] その結果、基板 A31面上に均一な高さの塗布パターンが描画され、 2枚の基板 31 A、 31Bを貼り合わせたときに、基板 31A、 31Bの間に隙間 Hが生じることがなくなり 、貼り合わされた 2枚の基板 31 A、 31B間からシール剤によって封入された液晶が漏 れたり、シール剤で囲まれた領域内に空気が侵入することが防止できる。これにより、 製造される液晶表示パネルの品質を向上させることができる。 As a result, a coating pattern having a uniform height is drawn on the surface of the substrate A31, and when the two substrates 31A and 31B are bonded together, a gap H is generated between the substrates 31A and 31B. As a result, it is possible to prevent the liquid crystal sealed by the sealing agent from leaking between the two substrates 31A and 31B that are bonded together, or the air from entering the region surrounded by the sealing agent. Thereby, the quality of the manufactured liquid crystal display panel can be improved.
[0046] 尚、基板 31A表面に凹部が形成されていた例で説明したが、凸部が形成されてい る場合にも、凸部に対応する位置でノズル 33からのシール剤の吐出量を減少させる ように、モータ 41の回転速度を遅くすることで対応することができる。 [0046] Although the example in which the concave portion is formed on the surface of the substrate 31A has been described, even when the convex portion is formed, the discharge amount of the sealing agent from the nozzle 33 is reduced at the position corresponding to the convex portion. It is possible to cope with this by reducing the rotation speed of the motor 41.
[0047] また、基板 31A表面に形成される凹部ゃ凸部の位置は、基板 31Aの設計データを 用いたり、予め基板 31A表面の高さデータを測定しておくことにより取得することがで きる。 [0047] Further, the position of the concave portion or the convex portion formed on the surface of the substrate 31A can be obtained by using design data of the substrate 31A or by measuring height data of the surface of the substrate 31A in advance. .
[0048] 本実施例によれば、以下の作用効果を奏する。 [0048] According to the present embodiment, the following operational effects are obtained.
[0049] (a)吐出ポンプ 32はスクリュー 36をモータ 41で回転させることによりモータ 41の回 転量に比例した量 (体積)のシール剤を機械的に押し出すので、周囲温度の変化に よりシール剤の粘度が変化したり、吐出ポンプ 32のシリンダ 34内のシール剤の残量 が減少したとしても、吐出ポンプ 32のモータ 41の回転速度を一定に保つことでノズ ル 33からのシール剤の単位時間当たりの吐出量を一定に保つことができる。 [0049] (a) The discharge pump 32 mechanically pushes out an amount (volume) of the sealant proportional to the amount of rotation of the motor 41 by rotating the screw 36 with the motor 41. Even if the viscosity of the agent changes or the remaining amount of the sealant in the cylinder 34 of the discharge pump 32 decreases, the rotational speed of the motor 41 of the discharge pump 32 is kept constant so that the sealant from the nozzle 33 The discharge amount per unit time can be kept constant.
[0050] また、気体圧力による吐出の場合、ノズル 33と基板 31との間のギャップが変動する とノズル 33からのシール剤の吐出抵抗が変動し、この影響でシール剤の吐出量が変 ィ匕してしまう。 [0050] Further, in the case of discharge by gas pressure, the gap between the nozzle 33 and the substrate 31 varies. And the discharge resistance of the sealant from the nozzle 33 fluctuates, and this influences the discharge amount of the sealant.
[0051] し力しながら、本実施例の塗布装置 10又は塗布方法によれば、スクリュー 36の回 転に伴うスクリュー 36のねじ部 36Aによる機械的な押し出しによって押し出された分 のシール剤をノズル 33から吐出させるものであるから、ねじ部 36Aによって押し出さ れた分のシール剤をノズル 33から吐出させることができ、吐出ポンプ 32のノズル 33 力 のシール剤の吐出量がギャップの変動を受け難ぐ機械的に常に一定量のシー ル剤を押し出す。 [0051] While applying the force, according to the coating apparatus 10 or the coating method of the present embodiment, the amount of the sealing agent extruded by the mechanical extrusion by the screw portion 36A of the screw 36 accompanying the rotation of the screw 36 is set to the nozzle. Since it is discharged from the nozzle 33, the amount of the sealing agent pushed out by the threaded portion 36A can be discharged from the nozzle 33, and the discharge amount of the sealing agent at the nozzle 33 force of the discharge pump 32 is less susceptible to fluctuations in the gap. Always mechanically extrude a certain amount of sealant.
[0052] その結果、シール剤を基板 31上に均一な塗布量で塗布することができ、基板 31に 対するシール剤の塗布精度を向上させることができる。従って、液晶漏れや空気の 侵入が防止された品質の良い液晶表示パネルを製造することができる。 As a result, the sealing agent can be applied on the substrate 31 in a uniform application amount, and the application accuracy of the sealing agent to the substrate 31 can be improved. Therefore, it is possible to manufacture a high quality liquid crystal display panel in which liquid crystal leakage and air intrusion are prevented.
[0053] また、上述により、気体圧力によりノズル力もシール剤を吐出させる場合に必須であ つた、ノズル 33と基板 31との間のギャップを一定に保つ制御(ギャップ制御)を不要、 或いは頻度を少なくすることができ、制御の簡素化を図ることができる。また、これに より、ギャップ制御の処理に要する時間を不要、或いは減少させることができるので、 シール剤の塗布に要する時間が短縮でき、効率を向上させることができる。 [0053] Further, as described above, control (gap control) for maintaining a constant gap between the nozzle 33 and the substrate 31, which is essential when the nozzle force is also discharged by the gas pressure, is unnecessary, or the frequency is increased. It is possible to reduce the number and simplify the control. This also eliminates or reduces the time required for the gap control process, thereby reducing the time required for applying the sealant and improving the efficiency.
[0054] (b)矩形状の塗布パターン Pでシール剤を基板 31に塗布するとき、塗布開始点 O 付近、コーナー C付近、塗布終了点 F付近では、直線部分 Sに比べてノズル 33と基 板 31との相対移動速度が遅くなるので、吐出ポンプ 32のモータ 41の回転速度を遅 くして、ノズル 33からのシール剤の単位時間当たりの吐出量を少なくする。 [0054] (b) When the sealing agent is applied to the substrate 31 with the rectangular application pattern P, the nozzle 33 and the base are compared in the vicinity of the application start point O, in the vicinity of the corner C, and in the application end point F as compared with the straight line portion S. Since the relative movement speed with respect to the plate 31 becomes slow, the rotational speed of the motor 41 of the discharge pump 32 is slowed down, and the discharge amount of the sealant from the nozzle 33 per unit time is reduced.
[0055] このとき、ノズル 33からのシール剤の単位時間当たりの吐出量は、スクリュー 36の 回転による機械的な押し出しにより応答性良く制御される。その結果、基板 31上に均 一な塗布量力もなる塗布パターンを描画することができる。 At this time, the discharge amount of the sealant from the nozzle 33 per unit time is controlled with good responsiveness by mechanical extrusion by the rotation of the screw 36. As a result, a coating pattern having a uniform coating amount force can be drawn on the substrate 31.
[0056] (c)塗布開始点 O付近、コーナー C付近の塗布中、塗布終了点 F付近で吐出ボン プ 32のノズル 33と基板 31との相対移動速度が減速する場合、基板 31の移動装置 1 7、 18のモータ 24、 25の回転速度に吐出ポンプ 32のスクリュー 36のモータ 41の回 転速度を同期させて減速した。 [0056] (c) When the relative movement speed between the nozzle 33 of the discharge pump 32 and the substrate 31 is reduced near the application end point F during application near the application start point O and corner C, the substrate 31 moving device 1 Decreased by synchronizing the rotation speed of the motor 41 of the screw 36 of the discharge pump 32 with the rotation speed of the motor 24, 25 of the motors 7 and 18.
[0057] その結果、従来の如く塗布開始点 O付近やコーナー C付近の塗布中や塗布終了 点 F付近でシール剤の塗布量が多くなることが防止でき、基板 31上に均一な塗布量 で塗布パターンを描画することができる。 [0057] As a result, as before, during application near the coating start point O and corner C, and at the end of coating It is possible to prevent the application amount of the sealant from increasing near the point F, and to draw an application pattern on the substrate 31 with a uniform application amount.
[0058] (d) X軸の移動装置 17のモータ 24又は Y軸方向の移動装置 18のモータ 25と吐出 ポンプ 32のモータ 41の回転速度を同期制御することで、塗布開始点 Oにおいて、シ 一ル剤をノズル 33から吐出させるタイミングとステージ 30又はヘッド 22が動き始める タイミングを、設定したとおりに毎回同じにすることができる。 (D) By synchronously controlling the rotational speeds of the motor 24 of the X-axis moving device 17 or the motor 25 of the Y-axis direction moving device 18 and the motor 41 of the discharge pump 32, the coating start point O The timing at which a single agent is discharged from the nozzle 33 and the timing at which the stage 30 or the head 22 starts to move can be made the same each time as set.
[0059] 同様に、塗布終了点 Fにおいても、ステージ 30又はヘッド 22が停止するタイミング とシール剤をノズル 33から吐出させるのを止めるタイミングを、毎回同じにすることが できる。これにより、シール剤の塗布開始点 Oと塗布終了点 Fの形状を設定したとおり に再現性良く描画することができる。 Similarly, at the application end point F, the timing at which the stage 30 or the head 22 stops and the timing at which the sealing agent is stopped from being discharged from the nozzle 33 can be made the same each time. As a result, it is possible to draw with good reproducibility as the shapes of the sealing agent application start point O and the application end point F are set.
[0060] (e)シール剤をノズル 33からスクリュー 36の回転により機械的に押し出すので、スク リュー 36を回転させるモータ 41の回転速度を変化させることで、シール剤の単位時 間当たりの吐出量を応答性良く増減させることができる。 [0060] (e) Since the sealing agent is mechanically pushed out from the nozzle 33 by the rotation of the screw 36, the amount of discharge of the sealing agent per unit time can be changed by changing the rotation speed of the motor 41 that rotates the screw 36. Can be increased or decreased with good responsiveness.
[0061] そのため、基板 31表面の膜厚や回路等の構成により基板 31に段差又は凹部 Gが ある場合、その段差又は凹部 Gに合わせてシール剤をノズル 33から吐出させるモー タ 41の回転速度を変化させてシール剤の塗布量を増減させることで、従来のシリン ダ 34に加える気体圧力を変化させて塗布量を制御する方式よりも容易に、 目的の箇 所に必要とするシール剤の塗布量で再現性良く塗布パターン Pを描画することができ る。 Therefore, when the substrate 31 has a step or a recess G due to the film thickness of the surface of the substrate 31 or a circuit configuration, the rotational speed of the motor 41 that discharges the sealant from the nozzle 33 according to the step or the recess G. By changing the gas pressure applied to the cylinder 34 by changing the gas pressure applied to the cylinder 34, it is easier to change the amount of the sealant applied. The coating pattern P can be drawn with good reproducibility by the coating amount.
[0062] (Dスクリュー 36を回転させているときに貯留容器 40の圧力気体室 45内に圧力気 体を供給し、スクリュー 36の回転を停止させるタイミングで圧力気体の供給を停止す る。圧力気体は、スクリュー 36が回転している間、貯留容器 40内のシール剤を開口 4 3へ向かって押圧するので、開口 43部分でのシール剤の吸い込み不足が生じること なぐシリンダ 34内に確実にシール剤を供給することができる。 (0062) (D) The pressure gas is supplied into the pressure gas chamber 45 of the storage container 40 while the screw 36 is rotating, and the supply of the pressure gas is stopped at the timing when the rotation of the screw 36 is stopped. Since the gas presses the sealant in the storage container 40 toward the opening 43 while the screw 36 is rotating, the gas is surely inserted into the cylinder 34 without causing insufficient suction of the sealant at the opening 43 part. A sealing agent can be supplied.
[0063] その結果、シール剤をノズルカゝら安定して吐出させることができ、シール剤の塗布 量がばらついたり、描画されたシール剤の塗布パターン Pが断線したりする等の不具 合を防止することができる。特に、シール剤の粘度が高い場合や、スクリュー 36の回 転速度が速 、場合に有効である。 [0064] また、スクリュー 36の回転を停止させるタイミングで圧力気体の供給を停止させるこ とで、スクリュー 36の停止中は、圧力気体によるシール剤に対する押圧力の付与を 停止させるので、シリンダ 34内のシール剤がノズル 33から漏れ出すことが防止できる [0063] As a result, the sealing agent can be discharged stably from the nozzle cover, preventing problems such as variations in the amount of the sealing agent applied and disconnection of the drawn sealing agent application pattern P. can do. This is particularly effective when the viscosity of the sealant is high or when the rotational speed of the screw 36 is high. [0064] Further, by stopping the supply of the pressure gas at the timing of stopping the rotation of the screw 36, the application of the pressing force to the sealant by the pressure gas is stopped while the screw 36 is stopped. Prevents the sealant from leaking out of the nozzle 33
[0065] これにより、次回の基板 31上へのシール剤の塗布時に、ノズル 33から漏れ出してノ ズル 33の先端に溜まったシール剤が基板 31上の塗布開始位置に付着して、その部 分で塗布量が過多になることを防止することができる。これによつても、シール剤を均 一な塗布量で品質良く塗布することができる。 [0065] As a result, at the next application of the sealant onto the substrate 31, the sealant that leaks from the nozzle 33 and accumulates at the tip of the nozzle 33 adheres to the application start position on the substrate 31, and that portion. It is possible to prevent the application amount from becoming excessive in minutes. This also makes it possible to apply the sealing agent with a uniform application amount and high quality.
[0066] 以上、本発明の実施例を図面により詳述したが、本発明の具体的な構成はこの実 施例に限られるものではなぐ本発明の要旨を逸脱しない範囲の設計の変更等があ つても本発明に含まれる。例えば、実施例では、ノズル 33と基板 31との相対移動速 度に応じて吐出ポンプ 32のモータ 41の回転速度を制御した力 シール剤の単位長 さ当たりの塗布量が一定となるように吐出ポンプ 32のモータ 41の回転速度を制御す ることちでさる。 As described above, the embodiments of the present invention have been described in detail with reference to the drawings. However, the specific configuration of the present invention is not limited to these embodiments, and design changes and the like within a scope not departing from the gist of the present invention are possible. Any case is included in the present invention. For example, in the embodiment, a force in which the rotational speed of the motor 41 of the discharge pump 32 is controlled according to the relative moving speed between the nozzle 33 and the substrate 31 is discharged so that the coating amount per unit length of the sealant is constant. It is possible to control the rotation speed of the motor 41 of the pump 32.
[0067] また、コーナー C付近で基板 31とノズル 33との相対移動速度を減速させる例で説 明したが、直線部分 Sの相対移動速度のままとしても良い。この場合、コーナー C部 での移動装置 17、 18の加減速に起因してヘッド 22に上下振動が生じ、これによりノ ズル 33からのシール剤の吐出抵抗が変動したとしても、スクリュー 36がそのねじ部 3 6Aによる機械的な押し出しによって押し出した分のシール剤をノズル 33から吐出さ せるので、ノズルからのペーストの吐出量が変化することが防止できる。 Further, although an example in which the relative movement speed between the substrate 31 and the nozzle 33 is decelerated in the vicinity of the corner C has been described, the relative movement speed of the straight line portion S may be left as it is. In this case, even if the head 22 oscillates vertically due to acceleration / deceleration of the moving devices 17 and 18 at the corner C, and the discharge resistance of the sealant from the nozzle 33 fluctuates, the screw 36 Since the sealing agent extruded by the mechanical extruding by the thread portion 36A is discharged from the nozzle 33, it is possible to prevent the paste discharge amount from the nozzle from changing.
[0068] そのため、基板に対して必要とする塗布量でペーストを塗布することができ、コーナ 一 C付近にぉ 、てもペーストを均一な塗布量で線状に塗布することができ、精度良く 塗布パターンを形成することができる。 [0068] Therefore, the paste can be applied to the substrate with the required application amount, and even in the vicinity of the corner C, the paste can be applied linearly with a uniform application amount, with high accuracy. A coating pattern can be formed.
[0069] また、ギャップ制御を行なう例で説明した力 ギャップ制御を省 、ても良!、。この場 合、ギャップ制御を全く行なわないようにしても良いし、ノズル 33を塗布開始点 Oに位 置付けるときのみギャップ制御を行ない、パターンの描画中はギャップ制御を省くよう にしても良い。 [0069] The force gap control described in the example of performing the gap control may be omitted. In this case, the gap control may not be performed at all, or the gap control may be performed only when the nozzle 33 is positioned at the coating start point O, and the gap control may be omitted during pattern drawing.
[0070] また、スクリュー 36を、図 2に示すように、その下端がシリンダ 34のノズル 33が設け られた底部 (先端部)に達するように配置した例で説明したが、図 8に示すように、そ の下端とシリンダ 34の底部との間に空間 47を設けるように配置しても良い。 [0070] Further, as shown in FIG. 2, the screw 36 is provided with a nozzle 33 having a cylinder 34 at its lower end. The example has been described so as to reach the bottom (tip) formed, but it may be arranged so as to provide a space 47 between its lower end and the bottom of the cylinder 34 as shown in FIG.
[0071] 即ち、スクリュー 48は、シリンダ 34内に設けられており、上端部がモータ 41の回転 軸に連結部材 35を介して連結され、下端部が自由端とされる。そして、スクリュー 48 は、その自由端とシリンダ 34のノズル 33が設けられた底部との間に、図 2に示すスク リュー 36の自由端とシリンダ 34底部との間隔よりも大きな間隔を有し、その間にシー ル剤を貯留可能とする。 That is, the screw 48 is provided in the cylinder 34, the upper end portion is connected to the rotating shaft of the motor 41 via the connecting member 35, and the lower end portion is a free end. The screw 48 has a larger gap between its free end and the bottom of the cylinder 34 where the nozzle 33 is provided, than the distance between the free end of the screw 36 and the cylinder 34 shown in FIG. In the meantime, the sealant can be stored.
[0072] また、スクリュー 34のねじ部 36Aが一条の例で説明した力 ニ条以上の複数条とし ても良い。このように、ピッチ Pを有するねじ部 36Aを複数条 (n条)設けた場合、リード Lは、 L=nPとなる。そして、一条のねじ部 36Aを有するスクリュー 36と同一ピッチ P の等ピッチで n条のねじ部 36Aを有するスクリュー 36の場合、一条のねじ部 36Aを有 するスクリュー 36と同一の吐出量を得るために必要なモータ 41の回転数は 1/nとな る。 [0072] In addition, the screw portion 36A of the screw 34 may be a plurality of strips having a force of two or more as described in the example of one strip. As described above, when a plurality of thread portions 36A having the pitch P are provided (n-row), the lead L is L = nP. In the case of the screw 36 having the n- thread thread 36A at the same pitch P as the screw 36 having the single thread 36A, in order to obtain the same discharge amount as that of the screw 36 having the single thread 36A. The number of rotations of the motor 41 required for this is 1 / n.
[0073] そのため、スクリュー 36を回転駆動するモータ 41の回転数は lZnで済むので、ス クリュー 36とシール剤又はシール剤同士の摩擦、又は、モータ 41の発熱がシール剤 に伝わる等によって、シール剤が発熱して硬化したり劣化したりすることを抑えること ができ、高価なシール剤を廃棄することによる損失の発生を防止できる。 [0073] For this reason, the rotational speed of the motor 41 that drives the screw 36 to rotate is only lZn. It is possible to suppress the curing and deterioration of the agent due to heat generation, and it is possible to prevent the loss caused by discarding the expensive sealant.
産業上の利用可能性 Industrial applicability
[0074] 本発明によれば、ペーストを基板上の目的の箇所に必要な塗布量で塗布すること ができ、基板に対するペーストの塗布精度をより向上させることができる。従って、 2枚 の基板が液晶表示パネルを製造するためのガラス基板で、液状物質が液晶である場 合には、液晶漏れや空気の侵入が防止された品質の良 、液晶表示パネルを製造す ることがでさる。 [0074] According to the present invention, the paste can be applied to a target location on the substrate in a necessary amount, and the accuracy of applying the paste to the substrate can be further improved. Therefore, when the two substrates are glass substrates for manufacturing a liquid crystal display panel and the liquid material is liquid crystal, the liquid crystal display panel is manufactured with good quality in which liquid crystal leakage and air intrusion are prevented. It can be done.
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006536962A JPWO2006118088A1 (en) | 2005-04-26 | 2006-04-25 | Paste coating apparatus and paste coating method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005128691 | 2005-04-26 | ||
| JP2005-128691 | 2005-04-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2006118088A1 true WO2006118088A1 (en) | 2006-11-09 |
Family
ID=37307888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2006/308593 Ceased WO2006118088A1 (en) | 2005-04-26 | 2006-04-25 | Paste application device and paste application method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2006118088A1 (en) |
| KR (1) | KR20070061772A (en) |
| CN (1) | CN1976760A (en) |
| TW (1) | TWI291901B (en) |
| WO (1) | WO2006118088A1 (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009044524A1 (en) * | 2007-10-01 | 2009-04-09 | Musashi Engineering, Inc. | Liquid material applicator, application method, and program |
| JP2009098273A (en) * | 2007-10-15 | 2009-05-07 | Shibaura Mechatronics Corp | Paste applicator |
| JP2009148732A (en) * | 2007-12-21 | 2009-07-09 | Hitachi Plant Technologies Ltd | Paste applicator and its application method |
| JP2011125855A (en) * | 2009-12-17 | 2011-06-30 | Ap Systems Inc | Coating device and operation method of the same |
| CN103537404A (en) * | 2012-07-10 | 2014-01-29 | 株式会社日立制作所 | Apparatus for spreading paste |
| JP2014108414A (en) * | 2012-12-04 | 2014-06-12 | Nidec Machinery Corp | Solution discharge device and solution discharge method |
| WO2014092199A1 (en) * | 2012-12-14 | 2014-06-19 | デクセリアルズ株式会社 | Method for producing image display device, resin dispenser |
| JP2015139725A (en) * | 2014-01-27 | 2015-08-03 | 兵神装備株式会社 | Fluid application system and fluid application method |
| WO2019013208A1 (en) * | 2017-07-11 | 2019-01-17 | シャープ株式会社 | Application apparatus and application method |
| WO2021032521A1 (en) * | 2019-08-19 | 2021-02-25 | Rampf Holding Gmbh & Co. Kg | Dosing system |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103801789A (en) * | 2012-11-06 | 2014-05-21 | 宁夏小牛自动化设备有限公司 | Device for storing, supplying and spraying solar cell scaling powder |
| KR101685081B1 (en) * | 2014-02-28 | 2016-12-09 | 주식회사 에스제이이노테크 | Dispenser unit for screen printer |
| CN103869526B (en) * | 2014-03-11 | 2017-01-18 | 京东方科技集团股份有限公司 | Display substrate, manufacturing method thereof, display panel and display device |
| CN104181732B (en) * | 2014-08-11 | 2017-06-23 | 深圳市华星光电技术有限公司 | Liquid crystal dripping device |
| CN104624439A (en) * | 2015-01-19 | 2015-05-20 | 东莞市高顿塑胶制品有限公司 | Rotary oil-painting device |
| CN106140558B (en) * | 2015-04-20 | 2019-01-18 | 上海通用汽车有限公司 | Integrated form servo gluing system and gluing control method |
| CN107182895B (en) * | 2017-06-20 | 2020-03-10 | 塔里木大学 | Medicine adding device for plateau loach cultivation |
| US20200009602A1 (en) * | 2018-07-03 | 2020-01-09 | Sharp Kabushiki Kaisha | Method of producing display panel |
| CN110420807A (en) * | 2019-08-06 | 2019-11-08 | 深圳市中孚能电气设备有限公司 | A kind of equipment and glue-pouring device |
| TWI852434B (en) * | 2023-03-25 | 2024-08-11 | 睿洋綠能科技股份有限公司 | Spraying production line and spray booth thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6086482U (en) * | 1983-11-18 | 1985-06-14 | トキコ株式会社 | coating gun |
| JPH0449108A (en) * | 1990-06-18 | 1992-02-18 | Iwashita Eng Kk | Screw type discharge device |
| JPH04346867A (en) * | 1991-05-24 | 1992-12-02 | Hitachi Ltd | Liquid coating device with dispenser |
| JP2000301042A (en) * | 1999-04-19 | 2000-10-31 | Nec Corp | Resin coating device |
| JP2003033708A (en) * | 2001-07-25 | 2003-02-04 | Hitachi Industries Co Ltd | Paste coating machine and control method |
| JP2003047898A (en) * | 2001-08-03 | 2003-02-18 | Matsushita Electric Ind Co Ltd | Fluid coating device and method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6418469A (en) * | 1987-07-13 | 1989-01-23 | Honda Motor Co Ltd | Coating method for sealant |
| JP2620882B2 (en) * | 1989-06-14 | 1997-06-18 | ファナック株式会社 | Sealant application method |
| JPH05231546A (en) * | 1991-03-07 | 1993-09-07 | Fanuc Ltd | Method for controlling flow of sealant in sealing by industrial robot |
| US5979794A (en) * | 1997-05-13 | 1999-11-09 | Ingersoll-Rand Company | Two-part stream dispensing for high viscosity materials |
| JP2000246780A (en) * | 1999-02-26 | 2000-09-12 | Asahi Glass Co Ltd | Resin extrusion apparatus and resin extrusion molding method |
| KR20060012028A (en) * | 2003-06-25 | 2006-02-06 | 요코하마 고무 가부시키가이샤 | Spacer formation method of multilayer glass |
-
2006
- 2006-04-24 TW TW95114530A patent/TWI291901B/en not_active IP Right Cessation
- 2006-04-25 WO PCT/JP2006/308593 patent/WO2006118088A1/en not_active Ceased
- 2006-04-25 CN CNA2006800004133A patent/CN1976760A/en active Pending
- 2006-04-25 JP JP2006536962A patent/JPWO2006118088A1/en active Pending
- 2006-04-25 KR KR1020067026977A patent/KR20070061772A/en not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6086482U (en) * | 1983-11-18 | 1985-06-14 | トキコ株式会社 | coating gun |
| JPH0449108A (en) * | 1990-06-18 | 1992-02-18 | Iwashita Eng Kk | Screw type discharge device |
| JPH04346867A (en) * | 1991-05-24 | 1992-12-02 | Hitachi Ltd | Liquid coating device with dispenser |
| JP2000301042A (en) * | 1999-04-19 | 2000-10-31 | Nec Corp | Resin coating device |
| JP2003033708A (en) * | 2001-07-25 | 2003-02-04 | Hitachi Industries Co Ltd | Paste coating machine and control method |
| JP2003047898A (en) * | 2001-08-03 | 2003-02-18 | Matsushita Electric Ind Co Ltd | Fluid coating device and method |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101523294B1 (en) * | 2007-10-01 | 2015-05-27 | 무사시 엔지니어링 가부시키가이샤 | Liquid material applicator, application method, and storge medium recording program |
| JP2009082859A (en) * | 2007-10-01 | 2009-04-23 | Musashi Eng Co Ltd | Liquid material coating apparatus, coating method and program |
| WO2009044524A1 (en) * | 2007-10-01 | 2009-04-09 | Musashi Engineering, Inc. | Liquid material applicator, application method, and program |
| EP2202005A4 (en) * | 2007-10-01 | 2018-03-07 | Musashi Engineering, Inc. | Liquid material applicator, application method, and program |
| JP2009098273A (en) * | 2007-10-15 | 2009-05-07 | Shibaura Mechatronics Corp | Paste applicator |
| JP2009148732A (en) * | 2007-12-21 | 2009-07-09 | Hitachi Plant Technologies Ltd | Paste applicator and its application method |
| JP2011125855A (en) * | 2009-12-17 | 2011-06-30 | Ap Systems Inc | Coating device and operation method of the same |
| CN103537404A (en) * | 2012-07-10 | 2014-01-29 | 株式会社日立制作所 | Apparatus for spreading paste |
| JP2014108414A (en) * | 2012-12-04 | 2014-06-12 | Nidec Machinery Corp | Solution discharge device and solution discharge method |
| WO2014092199A1 (en) * | 2012-12-14 | 2014-06-19 | デクセリアルズ株式会社 | Method for producing image display device, resin dispenser |
| US9651807B2 (en) | 2012-12-14 | 2017-05-16 | Dexerials Corporation | Method of producing image display device and resin dispenser |
| US10703081B2 (en) | 2012-12-14 | 2020-07-07 | Dexerials Corporation | Method of producing image display device and resin dispenser |
| US11137630B2 (en) | 2012-12-14 | 2021-10-05 | Dexerials Corporation | Method of producing image display device and resin dispenser |
| JP2015139725A (en) * | 2014-01-27 | 2015-08-03 | 兵神装備株式会社 | Fluid application system and fluid application method |
| WO2019013208A1 (en) * | 2017-07-11 | 2019-01-17 | シャープ株式会社 | Application apparatus and application method |
| WO2021032521A1 (en) * | 2019-08-19 | 2021-02-25 | Rampf Holding Gmbh & Co. Kg | Dosing system |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI291901B (en) | 2008-01-01 |
| KR20070061772A (en) | 2007-06-14 |
| TW200706259A (en) | 2007-02-16 |
| JPWO2006118088A1 (en) | 2008-12-18 |
| CN1976760A (en) | 2007-06-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2006118088A1 (en) | Paste application device and paste application method | |
| KR101523294B1 (en) | Liquid material applicator, application method, and storge medium recording program | |
| CN101658833A (en) | Coating machine and a method for coating mash thereby | |
| WO2015033535A1 (en) | Fluid application system and fluid application method | |
| JP2012196600A (en) | Paste application head, paste application device, and paste application method | |
| JP5278843B2 (en) | Coating apparatus and coating method using the same | |
| JP2004109448A (en) | Dispenser, electro-optical device manufacturing apparatus, and electro-optical device manufacturing method | |
| WO2007058258A1 (en) | Paste applying apparatus, method for manufacturing display panel using same and paste applying method | |
| JP5558743B2 (en) | Paste coating apparatus and paste coating method | |
| JP5142477B2 (en) | Paste coating apparatus and paste coating method | |
| KR100553275B1 (en) | Liquid crystal dropping apparatus and method | |
| TWI686242B (en) | Applying apparatus | |
| JP2007152261A (en) | Paste coating apparatus, paste coating method, and display panel manufacturing apparatus using the same | |
| CN218742788U (en) | Vibration gluing device for bonding bare chips in chip packaging | |
| JP2011125779A (en) | Coating method and coating apparatus | |
| KR20110069431A (en) | Coating device and its operation method | |
| JP2010221186A (en) | Coating apparatus and coating body manufacturing method | |
| JP2000042467A (en) | Method and apparatus for supplying liquid material | |
| JP2000237664A (en) | Ultrasonic coating head and ultrasonic coating apparatus using the same | |
| JP4589267B2 (en) | Liquid substance dropping device | |
| JP2506491B2 (en) | Method and apparatus for applying viscous liquid | |
| JP2000288452A (en) | Paste application device and paste application method | |
| KR20130060961A (en) | Nozzle | |
| KR102904747B1 (en) | Method and device for manufacturing laminated surface material | |
| JP2004008871A (en) | Paste coating machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 2006536962 Country of ref document: JP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 1020067026977 Country of ref document: KR |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 200680000413.3 Country of ref document: CN |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| NENP | Non-entry into the national phase |
Ref country code: RU |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 06732303 Country of ref document: EP Kind code of ref document: A1 |