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WO2006031733A3 - Thin film interference filter and bootstrap method for interference filter thin film deposition process control - Google Patents

Thin film interference filter and bootstrap method for interference filter thin film deposition process control Download PDF

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Publication number
WO2006031733A3
WO2006031733A3 PCT/US2005/032420 US2005032420W WO2006031733A3 WO 2006031733 A3 WO2006031733 A3 WO 2006031733A3 US 2005032420 W US2005032420 W US 2005032420W WO 2006031733 A3 WO2006031733 A3 WO 2006031733A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
interference filter
process control
deposition process
bootstrap method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2005/032420
Other languages
French (fr)
Other versions
WO2006031733A2 (en
Inventor
Michael L Myrick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of South Carolina
Original Assignee
University of South Carolina
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of South Carolina filed Critical University of South Carolina
Priority to EP05816196A priority Critical patent/EP1789752A4/en
Priority to JP2007531424A priority patent/JP2008512730A/en
Publication of WO2006031733A2 publication Critical patent/WO2006031733A2/en
Publication of WO2006031733A3 publication Critical patent/WO2006031733A3/en
Priority to US11/684,779 priority patent/US20070201136A1/en
Anticipated expiration legal-status Critical
Priority to US12/819,560 priority patent/US8184371B2/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A thin film interference filter system includes a plurality of stacked films having a determined reflectance; a modeled monitor curve; and a topmost layer configured to exhibit a wavelength corresponding to one of the determined reflectance or the modeled monitor curve. The topmost layer is placed on the plurality of stacked films and can be a low-index film such as silica or a high index film such as niobia.
PCT/US2005/032420 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control Ceased WO2006031733A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP05816196A EP1789752A4 (en) 2004-09-13 2005-09-13 THIN-FILTER INTERFERENTIAL FILTER AND BOOTSTRAP METHOD OF CONTROLLING THE THIN FILM INTERFERENTIAL FILTER DEPOSITION PROCESS
JP2007531424A JP2008512730A (en) 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for controlling deposition process of interference filter
US11/684,779 US20070201136A1 (en) 2004-09-13 2007-03-12 Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
US12/819,560 US8184371B2 (en) 2005-09-13 2010-06-21 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60940604P 2004-09-13 2004-09-13
US60/609,406 2004-09-13

Publications (2)

Publication Number Publication Date
WO2006031733A2 WO2006031733A2 (en) 2006-03-23
WO2006031733A3 true WO2006031733A3 (en) 2007-02-22

Family

ID=36060610

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/032420 Ceased WO2006031733A2 (en) 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Country Status (3)

Country Link
EP (1) EP1789752A4 (en)
JP (1) JP2008512730A (en)
WO (1) WO2006031733A2 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1699422A4 (en) 2003-12-31 2009-04-29 Univ South Carolina POROUS OPTICAL SENSORS WITH A FINE LAYER FOR GASES AND OTHER FLUIDS
US20070201136A1 (en) 2004-09-13 2007-08-30 University Of South Carolina Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
US20070166245A1 (en) 2005-11-28 2007-07-19 Leonard Mackles Propellant free foamable toothpaste composition
EP1969326B1 (en) 2005-11-28 2020-06-10 Ometric Corporation Optical analysis system and method for real time multivariate optical computing
WO2007061436A1 (en) 2005-11-28 2007-05-31 University Of South Carolina Self calibration methods for optical analysis system
US8208147B2 (en) 2005-11-28 2012-06-26 Halliburton Energy Services, Inc. Method of high-speed monitoring based on the use of multivariate optical elements
EP2033196A2 (en) 2006-06-26 2009-03-11 University of South Carolina Data validation and classification in optical analysis systems
US9182282B2 (en) 2006-11-02 2015-11-10 Halliburton Energy Services, Inc. Multi-analyte optical computing system
EP2140238B1 (en) 2007-03-30 2020-11-11 Ometric Corporation In-line process measurement systems and methods
WO2008121692A1 (en) 2007-03-30 2008-10-09 University Of South Carolina Tablet analysis and measurement system
US8213006B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8283633B2 (en) 2007-11-30 2012-10-09 Halliburton Energy Services, Inc. Tuning D* with modified thermal detectors
US8212213B2 (en) 2008-04-07 2012-07-03 Halliburton Energy Services, Inc. Chemically-selective detector and methods relating thereto
BR112015029784A2 (en) 2013-07-09 2017-07-25 Halliburton Energy Services Inc system, measuring tool and method
WO2015005905A1 (en) 2013-07-09 2015-01-15 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
EP2909763A4 (en) 2013-12-24 2015-12-23 Halliburton Energy Services Inc ADJUSTING THE MANUFACTURE OF INTEGRATED COMPUTING ELEMENTS
WO2015099709A1 (en) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements
US10496776B2 (en) 2013-12-24 2019-12-03 Halliburton Energy Services, Inc. Fabrication of critical layers of integrated computational elements
MX359911B (en) 2013-12-24 2018-10-16 Halliburton Energy Services Inc In-situ monitoring of fabrication of integrated computational elements.
WO2015102586A1 (en) 2013-12-30 2015-07-09 Halliburton Energy Services, Inc. Determining temperature dependence of complex refractive indices of layer materials during fabrication of integrated computational elements
MX360943B (en) 2013-12-31 2018-11-13 Halliburton Energy Services Inc Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume.
WO2015122923A1 (en) 2014-02-14 2015-08-20 Halliburton Energy Services, Inc. In-situ spectroscopy for monitoring fabrication of integrated computational elements
MX358581B (en) 2014-03-21 2018-08-27 Halliburton Energy Services Inc Monolithic band-limited integrated computational elements.
WO2015191084A1 (en) 2014-06-13 2015-12-17 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces
US11726246B2 (en) * 2017-10-20 2023-08-15 3M Innovative Properties Company Optical film and polarizing beam splitter

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
JP3624476B2 (en) * 1995-07-17 2005-03-02 セイコーエプソン株式会社 Manufacturing method of semiconductor laser device
DE10227376B4 (en) * 2002-06-20 2005-03-31 Leica Microsystems Jena Gmbh Method for determining layer thickness ranges

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1789752A4 *

Also Published As

Publication number Publication date
JP2008512730A (en) 2008-04-24
EP1789752A2 (en) 2007-05-30
WO2006031733A2 (en) 2006-03-23
EP1789752A4 (en) 2009-11-04

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