[go: up one dir, main page]

WO2006010451A3 - Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung - Google Patents

Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung Download PDF

Info

Publication number
WO2006010451A3
WO2006010451A3 PCT/EP2005/007418 EP2005007418W WO2006010451A3 WO 2006010451 A3 WO2006010451 A3 WO 2006010451A3 EP 2005007418 W EP2005007418 W EP 2005007418W WO 2006010451 A3 WO2006010451 A3 WO 2006010451A3
Authority
WO
WIPO (PCT)
Prior art keywords
coating
vacuum
vacuum chamber
installation
coating installation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2005/007418
Other languages
English (en)
French (fr)
Other versions
WO2006010451A2 (de
Inventor
Marten Walther
Tobias Kaelber
Stefan Bauer
Hartmut Bauch
Joern Gerban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott AG filed Critical Schott AG
Priority to JP2007522952A priority Critical patent/JP5224810B2/ja
Priority to US11/572,255 priority patent/US20080210550A1/en
Priority to EP05773105A priority patent/EP1771600A2/de
Publication of WO2006010451A2 publication Critical patent/WO2006010451A2/de
Publication of WO2006010451A3 publication Critical patent/WO2006010451A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Die Erfindung sieht eine Vorrichtung zur Vakuumbeschichtung von Substraten vor, welche eine Vakuumkammer, eine Einrichtung zur Halterung wenigstens eines Substrats, zumindest einem ersten Beschichtungsbereich der Vakuumkammer mit wenigstens einer Einrichtung zur plasmaimpuls-induzierten chemischen Dampfphasenabscheidung (PICVD) und zumindest einem zweiten Beschichtungsbereich der Vakuumkammer mit wenigstens einer Einrichtung zur Sputterbeschichtung, sowie eine Transporteinrichtung zum Transport des Substrats in die Beschichtungsbereiche umfasst.
PCT/EP2005/007418 2004-07-26 2005-07-08 Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung Ceased WO2006010451A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007522952A JP5224810B2 (ja) 2004-07-26 2005-07-08 真空コーティング設備及び方法
US11/572,255 US20080210550A1 (en) 2004-07-26 2005-07-08 Vacuum Coating System and Method for Vacuum Coating
EP05773105A EP1771600A2 (de) 2004-07-26 2005-07-08 Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004036170.3 2004-07-26
DE102004036170A DE102004036170B4 (de) 2004-07-26 2004-07-26 Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung

Publications (2)

Publication Number Publication Date
WO2006010451A2 WO2006010451A2 (de) 2006-02-02
WO2006010451A3 true WO2006010451A3 (de) 2006-04-20

Family

ID=35148995

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/007418 Ceased WO2006010451A2 (de) 2004-07-26 2005-07-08 Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung

Country Status (5)

Country Link
US (1) US20080210550A1 (de)
EP (1) EP1771600A2 (de)
JP (1) JP5224810B2 (de)
DE (1) DE102004036170B4 (de)
WO (1) WO2006010451A2 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4642891B2 (ja) * 2008-09-25 2011-03-02 株式会社シンクロン 光学フィルターの製造方法
US20100101937A1 (en) * 2008-10-29 2010-04-29 Applied Vacuum Coating Technologies Co., Ltd. Method of fabricating transparent conductive film
US8043981B2 (en) * 2009-04-21 2011-10-25 Applied Materials, Inc. Dual frequency low temperature oxidation of a semiconductor device
PL2251453T3 (pl) 2009-05-13 2014-05-30 Sio2 Medical Products Inc Uchwyt na pojemnik
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
TW201137143A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering system
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
EP2761643B1 (de) * 2011-09-28 2023-07-12 Bühler Alzenau GmbH Verfahren und vorrichtung zur erzeugung einer reflektionsmindernden schicht auf einem substrat
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2846755A1 (de) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharidschutzschicht für eine arzneimittelverpackung
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
WO2014071061A1 (en) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085346A1 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Hollow body with inside coating
EP2961858B1 (de) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Beschichtete spritze.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CA2904611C (en) 2013-03-11 2021-11-23 Sio2 Medical Products, Inc. Coated packaging
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
EP3122917B1 (de) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatische beschichtungen für kunststoffbehälter
EP3196337B1 (de) 2014-09-19 2019-11-20 Toppan Printing Co., Ltd. Filmformungsvorrichtung und filmformungsverfahren
JP6672595B2 (ja) 2015-03-17 2020-03-25 凸版印刷株式会社 成膜装置
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
US11383213B2 (en) 2016-03-15 2022-07-12 Honda Motor Co., Ltd. System and method of producing a composite product
US11171324B2 (en) 2016-03-15 2021-11-09 Honda Motor Co., Ltd. System and method of producing a composite product
JP2019529706A (ja) * 2016-09-13 2019-10-17 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ １つの酸化物金属堆積チャンバ
US11081684B2 (en) 2017-05-24 2021-08-03 Honda Motor Co., Ltd. Production of carbon nanotube modified battery electrode powders via single step dispersion
US20190036102A1 (en) * 2017-07-31 2019-01-31 Honda Motor Co., Ltd. Continuous production of binder and collector-less self-standing electrodes for li-ion batteries by using carbon nanotubes as an additive
US10658651B2 (en) 2017-07-31 2020-05-19 Honda Motor Co., Ltd. Self standing electrodes and methods for making thereof
US11201318B2 (en) 2017-09-15 2021-12-14 Honda Motor Co., Ltd. Method for battery tab attachment to a self-standing electrode
US11121358B2 (en) 2017-09-15 2021-09-14 Honda Motor Co., Ltd. Method for embedding a battery tab attachment in a self-standing electrode without current collector or binder
DE102018101090A1 (de) * 2018-01-18 2019-07-18 Osram Opto Semiconductors Gmbh Anzeigeelement, Anzeigevorrichtung und Verfahren zur Herstellung einer Kontaktstruktur bei einer Vielzahl von Anzeigeelementen
DE102019132526B4 (de) 2019-01-15 2025-10-02 Asus Resources Pte. Ltd. Beschichtungsmaschine
US11535517B2 (en) 2019-01-24 2022-12-27 Honda Motor Co., Ltd. Method of making self-standing electrodes supported by carbon nanostructured filaments
US12381275B2 (en) 2019-01-30 2025-08-05 Honda Motor Co., Ltd. Stretchable and flexible lithium ion battery
US12142771B2 (en) 2019-01-30 2024-11-12 Honda Motor Co., Ltd. Flexible battery as an integration platform for wearable sensors and processing/transmitting devices
US11325833B2 (en) 2019-03-04 2022-05-10 Honda Motor Co., Ltd. Composite yarn and method of making a carbon nanotube composite yarn
US11352258B2 (en) 2019-03-04 2022-06-07 Honda Motor Co., Ltd. Multifunctional conductive wire and method of making
US11539042B2 (en) 2019-07-19 2022-12-27 Honda Motor Co., Ltd. Flexible packaging with embedded electrode and method of making
CN111370265B (zh) * 2020-04-10 2022-02-01 常州天利智能控制股份有限公司 一种接触器结构

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0533044A1 (de) * 1991-09-20 1993-03-24 Balzers Aktiengesellschaft Verfahren zur Schutzbeschichtung von Substraten sowie Beschichtungsanlage
DE4335224A1 (de) * 1993-10-15 1995-04-20 Leybold Ag Vorrichtung für die Herstellung optischer Schichten
US6186090B1 (en) * 1999-03-04 2001-02-13 Energy Conversion Devices, Inc. Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
EP1245298A1 (de) * 2001-03-29 2002-10-02 Schott Glas Verfahren zum Herstellen eines beschichteten Kunststoffkörpers

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4763601A (en) * 1987-09-02 1988-08-16 Nippon Steel Corporation Continuous composite coating apparatus for coating strip
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US4992153A (en) * 1989-04-26 1991-02-12 Balzers Aktiengesellschaft Sputter-CVD process for at least partially coating a workpiece
DE4407909C3 (de) * 1994-03-09 2003-05-15 Unaxis Deutschland Holding Verfahren und Vorrichtung zum kontinuierlichen oder quasi-kontinuierlichen Beschichten von Brillengläsern
US5849162A (en) * 1995-04-25 1998-12-15 Deposition Sciences, Inc. Sputtering device and method for reactive for reactive sputtering
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance
US6372303B1 (en) * 1997-06-16 2002-04-16 Robert Bosch Gmbh Method and device for vacuum-coating a substrate
DE19824364A1 (de) * 1998-05-30 1999-12-02 Bosch Gmbh Robert Verfahren zum Aufbringen eines Verschleißschutz-Schichtsystems mit optischen Eigenschaften auf Oberflächen
JP2000017457A (ja) * 1998-07-03 2000-01-18 Shincron:Kk 薄膜形成装置および薄膜形成方法
EP1127381B1 (de) * 1998-11-02 2015-09-23 3M Innovative Properties Company Transparente leitfähige oxide für kunststoff-flachbildschirme
JP2001133613A (ja) * 1999-11-05 2001-05-18 Ichikoh Ind Ltd 反射基板
US20040101636A1 (en) * 2001-03-29 2004-05-27 Markus Kuhr Method for producing a coated synthetic body
JP2003098306A (ja) * 2001-09-19 2003-04-03 Sumitomo Metal Mining Co Ltd 反射防止フィルム
JP2003321773A (ja) * 2002-04-26 2003-11-14 Shimadzu Corp Ｅｃｒスパッタリング装置
JP3824993B2 (ja) * 2002-12-25 2006-09-20 株式会社シンクロン 薄膜の製造方法およびスパッタリング装置
US7264741B2 (en) * 2002-12-31 2007-09-04 Cardinal Cg Company Coater having substrate cleaning device and coating deposition methods employing such coater
JP5090911B2 (ja) * 2004-09-03 2012-12-05 カーディナル・シージー・カンパニー 断続的コンベヤシステムを有するコータ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0533044A1 (de) * 1991-09-20 1993-03-24 Balzers Aktiengesellschaft Verfahren zur Schutzbeschichtung von Substraten sowie Beschichtungsanlage
DE4335224A1 (de) * 1993-10-15 1995-04-20 Leybold Ag Vorrichtung für die Herstellung optischer Schichten
US6186090B1 (en) * 1999-03-04 2001-02-13 Energy Conversion Devices, Inc. Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
EP1245298A1 (de) * 2001-03-29 2002-10-02 Schott Glas Verfahren zum Herstellen eines beschichteten Kunststoffkörpers

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MILDE F ET AL: "Large-area production of solar absorbent multilayers by MF-pulsed plasma technology", VACUUM ELSEVIER UK, vol. 59, no. 2-3, November 2000 (2000-11-01), pages 825 - 835, XP002367414, ISSN: 0042-207X *

Also Published As

Publication number Publication date
US20080210550A1 (en) 2008-09-04
DE102004036170B4 (de) 2007-10-11
JP2008507629A (ja) 2008-03-13
WO2006010451A2 (de) 2006-02-02
JP5224810B2 (ja) 2013-07-03
DE102004036170A1 (de) 2006-03-23
EP1771600A2 (de) 2007-04-11

Similar Documents

Publication Publication Date Title
WO2006010451A3 (de) Vakuumbeschichtungsanlage und verfahren zur vakuumbeschichtung
WO2010123877A3 (en) Cvd apparatus for improved film thickness non-uniformity and particle performance
TW200644085A (en) A plasma enhanced atomic layer deposition system having reduced contamination
WO2008024566A3 (en) Overall defect reduction for pecvd films
WO2004064147A3 (en) Integration of ald/cvd barriers with porous low k materials
TW200617200A (en) Multilayer coatings by plasma enhanced chemical vapor deposition
WO2010032978A3 (en) Method for depositing amorphous silicon thin film by chemical vapor deposition
WO2006028573A3 (en) Deposition of ruthenium and/or ruthenium oxide films
WO2009085974A3 (en) Low wet etch rate silicon nitride film
WO2005087974A3 (en) Cvd processes for the deposition of amorphous carbon films
WO2006019438A3 (en) Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films
WO2006101886A3 (en) A plasma enhanced atomic layer deposition system and method
TW200606168A (en) Copper (I) compounds useful as deposition precursors of copper thin films
SG152183A1 (en) High quality silicon oxide films by remote plasma cvd from disilane precursors
WO2003065424A3 (en) Apparatus for cyclical deposition of thin films
WO2006101619A3 (en) A deposition system and method
WO2006017070A3 (en) Protective cotaing on a substrate and method of making thereof
TW200628619A (en) Vacuum coating system
WO2005021832A3 (en) Method and appartus for depositing materials with tunable properties
AU2003260448A1 (en) Titania coatings by plasma cvd at atmospheric pressure
TW200605196A (en) Improved deposition repeatability of PECVD films
WO2011034751A3 (en) Hot wire chemical vapor deposition (cvd) inline coating tool
WO2008078502A1 (ja) 成膜装置および成膜方法
WO2006020308A3 (en) Vapor deposited functional organic coatings
TW200624589A (en) High-throughput HDP-CVD processes for advanced gapfill applications

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

DPEN Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed from 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2005773105

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2007522952

Country of ref document: JP

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWP Wipo information: published in national office

Ref document number: 2005773105

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 11572255

Country of ref document: US