WO2006087996A1 - Process for production of carbapenem derivative and crystalline intermediate therefor - Google Patents
Process for production of carbapenem derivative and crystalline intermediate therefor Download PDFInfo
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- WO2006087996A1 WO2006087996A1 PCT/JP2006/302482 JP2006302482W WO2006087996A1 WO 2006087996 A1 WO2006087996 A1 WO 2006087996A1 JP 2006302482 W JP2006302482 W JP 2006302482W WO 2006087996 A1 WO2006087996 A1 WO 2006087996A1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D477/00—Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring
- C07D477/10—Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 4, and with a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2
- C07D477/12—Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 4, and with a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2 with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, attached in position 6
- C07D477/16—Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 4, and with a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2 with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, attached in position 6 with hetero atoms or carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 3
- C07D477/20—Sulfur atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/04—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D207/10—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/12—Oxygen or sulfur atoms
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
- A61P31/04—Antibacterial agents
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D477/00—Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring
Definitions
- the present invention relates to a method for producing a powerful rubapenem derivative and an intermediate crystal thereof.
- a pyrrolidylthio-powered rubapenem derivative (compound (II)) having a broad antibacterial spectrum is known as a useful antibiotic (Reference: Patent Document 1).
- the compound (I) of the present invention is a synthetic intermediate.
- R 1 is a carboxy protecting group: R 2 is an amino protecting group
- Patent Document 2 (Reference Example 1) describes the same reaction shown below, but the base used in the condensation reaction is also diisopropylethylamine (yield 54%).
- tertiary amines such as diisopropylpropylamine are generally used as bases for the second-position condensation reaction of force rubapenem. This is probably because tertiary amines are generally strongly basic and there is no hydrogen on the N atom, so side reactions are unlikely to occur! /.
- Patent Document 1 Japanese Patent Laid-Open No. 05-294970
- Patent Document 2 WO2004Z72073 Publication
- Patent Document 3 Japanese Patent Laid-Open No. 02-15080
- Patent Document 4 Japanese Patent Application Laid-Open No. 64-79180
- R is hydrogen or a hydroxy protecting group
- R 1 is a carboxy protecting group
- Ph is
- a compound (I), a pharmaceutically acceptable salt, a solvate or a crystal thereof is obtained by the method described in any one of 1 to 3 above, and then subjected to a deprotection reaction. And the formula:
- R 1 is a carboxy protecting group
- R 2 is an amino protecting group
- compound (I) can be produced in a short period of time based on yield. Also, a solvate crystal of compound (I) excellent in handling can be obtained.
- the present invention also provides a method for deprotection of Compound (I) in the presence of a Pd catalyst and an intermediate crystal. By using these production methods and crystals, a compound ( ⁇ ), a solvate thereof, or a crystal thereof, which is a carbapenem antibacterial agent, can be efficiently produced.
- FIG. 1 is a chart of a powder X-ray diffraction pattern of a benzyl alcohol solvate crystal of compound (I a) obtained in Example 1.
- FIG. 2 shows a peak value of a powder X-ray diffraction pattern of a benzyl alcohol solvate crystal of compound (Ia) obtained in Example 1.
- FIG. 3 is a chart of a powder X-ray diffraction pattern of a crystal of the compound (IV-a) obtained in Example 7.
- FIG. 4 is a chart of a powder X-ray diffraction pattern of a crystal of the compound (Va) obtained in Example 7.
- R is hydrogen or a hydroxy protecting group; R 1 is a carboxy protecting group; R 2 is an amino protecting group, Ph is a phenol
- R is hydrogen or a hydroxy protecting group
- R 1 is a carboxy protecting group
- R 2 is an amino protecting group
- Ph is a phenol
- the hydroxy protecting group is optionally deprotected to give compound (1), a pharmaceutically acceptable salt thereof, a solvate thereof or a crystal thereof.
- a secondary amine is used, more preferably a secondary amine having a relatively large steric hindrance.
- it is represented by NHR a R b , and R a and R b are each independently alkyl or phenol, and preferably R a and R b are the same.
- Alkyl is straight-chain or branched C1-C10, preferably C3-C7 alkyl, more preferably branched. More preferable examples of R a and R b include isopropyl, t-butyl, isobutyl, amyl, and file.
- diisopropylamine di-t-butylamine, diisobutylamine, diamylamine, and diphenylamine are more preferable, and dialkylamine (eg, diisopropylamine) is particularly preferable.
- reaction solvent examples include acetonitrile, dimethylformamide, methylene chloride, dimethyl sulfoxide, N dimethylacetamide and the like, and N dimethylacetamide is preferable.
- the reaction temperature is generally 40 ° C to room temperature, preferably about 20 to 0 ° C.
- the reaction time is usually several tens of minutes to several tens of hours, preferably 1 to 5 hours.
- an inorganic base salt eg, sodium
- Al metal salts such as salts and potassium salts; alkaline earth metal salts such as calcium salts and magnesium salts; ammonium salts; organic base salts (eg, triethylamine salt, pyridine salt, picoline salt, ethanolamine salt, triethanol salt) Amine salts, dicyclohexylamine, ⁇ , ⁇ '-dibenzylethylenediamine salts); inorganic acid addition salts such as hydrochloride, hydrobromide, sulfate, phosphate; formate, acetate, trifluoro Organic acid addition salts such as acetate, maleate, tartrate, methanesulfonate, benzenesulfonate; basic amino such as arginine, aspartic acid, glutamic acid And salts with acid or acidic
- hydroxy protecting group represented by R various hydroxy protecting groups that can be generally used in the field of ⁇ -ratata antibacterial agents can be used. Specific examples thereof include trialkylsilyl (the alkyl is preferably C1-C6, eg, trimethylsilyl, triethylsilyl, tert-butyldimethylsilyl, triisopropylpropylsilyl, dimethylhexylsilyl, tert-butyldiphenylsilyl), substituted.
- trialkylsilyl the alkyl is preferably C1-C6, eg, trimethylsilyl, triethylsilyl, tert-butyldimethylsilyl, triisopropylpropylsilyl, dimethylhexylsilyl, tert-butyldiphenylsilyl
- hydroxy protecting groups can be deprotected after the reaction, if desired, by methods well known to those skilled in the art. Further, it may be a protecting group that is automatically removed during the coupling reaction or in the post-treatment (eg, extraction, washing) stage. For example, trimethylsilyl and the like are eliminated by acid in the extraction operation after the reaction.
- the carboxy protecting group represented by R 1 includes lower alkyl (eg, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, pentyl, hexyl), lower alkanoyloxy (lower) alkyl (eg, Acetoxymethyl, propio-loxymethyl, butyryloxymethyl, valeryloxymethyl, bivalyloxymethyl, hexanoloxymethyl), lower alkanesulfo-loxy (lower) alkyl (eg 2-mesylethyl), mono (or di or Tri) halo (lower) alkyl (eg, 2-iodoethyl, 2,2,2-trichloroethyl), lower alkoxycarboxoxy (lower) alkyl (eg, methoxycarbonyloxymethyl, ethoxycarbonyloxymethyl, propoxycarbonyloxyme) Chill, tertiary butoxy Rub
- R 1 the advantage of using this production method in the case of a protective group of a relatively electrophilic type is great.
- lower alkyl eg, bur, aryl
- Lower alkyl eg, (substituted) aryl, (lower) alkyl, or (substituted) aryl.
- it is a protecting group that is difficult to be removed during the coupling reaction, and particularly preferred is aryl (one CH 2 CH ⁇ CH 2).
- Examples of the amino protecting group represented by R 2 include an aliphatic acyl group derived from carboxylic acid, carbonic acid, sulfonic acid and carbamic acid, and an aliphatic acyl group substituted with an aromatic group.
- Aliphatic acyl groups are saturated or unsaturated acyclic or cyclic acyl groups, such as, for example, lower alkanol groups such as formyl, acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, bivaloyl, hexanoyl and the like.
- Alkanoyl groups such as mesyl, ethylsulfol, propylsulfol, isopropylsulfol, butinolesnorehoninore, isobutinoresnorehoninore, pentinoresnorehoninore, hexinoresnorephonyl, etc.
- Alkylsulfol groups such as lower alkylsulfol groups, rubamoyl groups such as N-alkyl rubamoyl groups such as methylcarbamoyl, ethylcarbamoyl, etc., such as methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, butoxycarbonyl , Tertiary butoxy Alkoxycarbon groups such as lower alkoxy carbo groups such as rubols, for example, alkke groups such as lower alkoxy carboxy groups such as buroxy carboxy and aralkyl carboxylic groups.
- Alkoxyl groups such as alkoxyl groups such as lower alkenyl groups such as acryloyl, methacryloyl, crotonol, etc.
- Cyclo (lower) alkanecarbox such as cyclopropanecarbol, cyclopentanecarbol, cyclohexanecarbol etc.
- cycloalkane carbo yl group such as -l group.
- aliphatic acyl group substituted with an aromatic group examples include aralkoxycarbons such as vinyl (lower) alkoxycarbonyl groups such as benzyloxycarbol and phenoxycarboxyl. Group. These acyl groups may be further substituted with one or more suitable substituents such as -tro group. Preferred acyl groups having such a substituent include, for example, -troayloxycarbol and the like. Examples include a larcocarboxyl group.
- the amino protecting group is preferably a protecting group which is not easily eliminated during the coupling reaction, and particularly preferably an alkoxycarboxyl group (eg, COOCH CH ⁇ CH 3).
- Compound (Ia) can be crystallized from an alcohol solvent.
- the alcohol is preferably substituted and is benzyl alcohol, and the alcohol solvate crystals are obtained.
- substituent of the benzyl alcohol which may be substituted, lower alkyl, preferably C1-C4 alkyl (eg, methyl, ethyl, propyl), lower alkoxy (eg, methoxy, ethoxy, propoxy), Halogen (eg: F, Cl, Br), optionally substituted amino (example of substituent: lower alkyl), nitro, silane-containing OH, etc. are exemplified, and the substitution position is either ortho, meta or para. Good.
- a benzyl alcohol solvate crystal is preferably obtained.
- the content of benzyl alcohol in the benzyl alcohol solvate crystal is 0.1 to 5 molar equivalents, preferably 0.5 to 2 molar equivalents, more preferably 1 molar equivalent, relative to compound (Ia). .
- the benzyl alcohol solvate crystal preferably exhibits the pattern of FIG. 1 in powder X-ray diffraction.
- the benzyl alcohol solvate crystal preferably has a main peak at least in the vicinity shown below in the powder X-ray diffraction pattern.
- the interplanar spacing d value is selected from the main peaks having a high relative intensity among the X-ray peaks, and the crystal structure is not necessarily limited only by these values. That is, peaks other than these may be included. In general, when a crystal is measured by X-ray analysis, the peak may cause some measurement error due to the measuring instrument, measurement conditions, presence of attached solvent, and the like. For example, a measurement error of about ⁇ 0.2 occurs as the value of surface separation d In some cases, even if very precise equipment is used, a measurement error of about ⁇ 0.01 to 0.1 may occur. Therefore, some errors should be taken into account in identifying the crystal structure, and all crystals characterized by X-ray patterns substantially similar to those described above are within the scope of the present invention.
- the benzyl alcohol solvate crystal is prepared from the compound (I a)
- it is preferable to dissolve the compound (I a) or a solvate thereof in a soluble solvent It can be obtained by stirring for several hours at room temperature, allowing to stand at 0 ° C to room temperature for several hours to several days, and then filtering and drying by a conventional method. Also. After dissolving the compound (Ia) or its solvate in a large amount of solvent, the solvent is once distilled off to obtain a concentrated solution. To this, benzyl alcohol and other organic solvent as required are added, As described above, stirring, filtration, drying and the like may be performed.
- Examples of the solvent include the following soluble solvents, insoluble solvents and mixed solutions thereof.
- Soluble solvents include methanol, ethanol, ethylene glycol, methoxyethanol, glycerol, propylene glycol and other alcohols, dioxane, tetrahydrofuran, dimethoxyethane, and other ethers, acetone, methyl ethyl ketone, methyl isobutyl ketone, and other ketones.
- Esters such as methyl formate, ethyl acetate, propyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, ethyl propionate, dichloromethane, chloroform, Organic halogenated hydrocarbons such as carbon tetrachloride, 1,2-dichloroethane, trichloroethane, black benzene and dichlorobenzene, -tolyls such as acetonitrile and propio-tolyl, dimethyl Fuorumuamido, dimethyl sulfoxide, N- methylpyrrolidone, quinoline, pyridine, and the like can be used Toryechiruamin. These solvents may be used alone or in combination of two or more. It can also be used by mixing water. Preferred is ethyl acetate.
- insoluble solvents examples include alcohols such as 2-propanol, 2-pentanol, 1 pentanol, tamyl alcohol, 1 propanol, n propanol, t-butanol, isobutanol, n-butanol, cyclohexanol, and benzyl alcohol.
- Ethers such as ethinoreethenole, isopropinoleetenore, dibutinoleethenole, ethinoreisoaminolethele, ethylphenol ether, n pentane, n-hexane, n-heptane, n octane, n Hydrocarbons such as decane, cyclohexane, methylcyclohexane, toluene, benzene, ethylbenzene, tamen, cymene, and xylene can be used. These solvents may be used alone or in combination of two or more.
- the use ratio of the soluble solvent and the insoluble solvent is usually 1: 0 to 1: 1000, preferably 1: 0.1 to 1: 100, particularly preferably 1: 1 to 1:50 in weight ratio, or Usually, 0: 1 to 1000: 1, preferably 0.1: 1 to 100: 1, particularly preferably 1: 1 to 50: 1.
- ethyl acetate and benzyl alcohol are used in a ratio of 1: 1 to 5.
- the benzyl alcohol solvate crystal of compound (Ia) has very good crystallinity, as is clear from the clarity of its X-ray peak. Therefore, when compound (Ia) is synthesized by a 2-position condensation reaction and isolated as a benzyl alcohol hydrate crystal, the desired product is obtained with high yield and high purity. Moreover, the handleability is good and the storage stability is high. Therefore, it is very useful as an intermediate for the synthesis of compound (ii), a carbapenem antibacterial agent.
- the reaction extract is preferably washed, evaporated, and dried, as described above.
- Crystallization may be achieved by dissolving in a soluble solvent and calorifying benzyl alcohol and optionally other insoluble solvents.
- benzyl alcohol solvate crystals of the compound (Ia) separately prepared as required may be added as seed crystals.
- compound (1) a pharmaceutically acceptable salt thereof, a solvate thereof or a crystal thereof, preferably a benzyl alcohol solvate crystal of compound (Ia), to a deprotection reaction,
- the compound (ii), its pharmaceutically acceptable salt, its solvate, or crystal thereof, which is the antibacterial agent disclosed in Japanese Patent No. 294970, is obtained.
- the deprotection reaction is performed according to methods well known to those skilled in the art.
- a noble metal catalyst such as a nickel catalyst, a cobalt catalyst, an iron catalyst, a copper catalyst, a platinum catalyst and a palladium catalyst is used.
- Palladium catalyst and nickel catalyst are preferably used. More preferable are tetrakis (triphenylphosphine) palladium, acetic acid (triphenylphosphine) palladium, and acetic acid (triethylphosphite) palladium.
- An additive preferably triphenylphosphine or the like
- a reducing agent for reducing and removing the protecting group and a nucleophilic reagent are added to the palladium catalyst.
- the reducing agent include hydrogen, metal hydride, and the like, and preferably hydrogenated tri-n-butyltin.
- nucleophiles include carboxylates (eg, sodium 2-ethylhexanoate), 1,3-dicarboxyl compounds (eg, Meldrum's acid, dimedone and malonic acid esters), secondary amines (eg, Jetylamine, etc.) and aromatic amines.
- a combination of a palladium catalyst (eg, tetrakis (triphenylphosphine) palladium) and an aromatic amine (eg, Ryoji phosphorus derivative) is more preferable as a deprotection reagent.
- the ar phosphorus derivatives include: arline, N-methylarine, N-ethylaniline, ⁇ , ⁇ -dimethylaniline, 0—, m—or ⁇ —toluidine, 0—, m— or p-amino-idine.
- N-ethylaline is particularly preferable.
- N-ethylaline e.g., less than 0.01 molar equivalent to the compound (I), preferably 0.
- the deprotection reaction proceeds at a high yield even at 005 monorequivalents or less, more preferably from 003 to 0.001 monoequivalents.
- the generation rate of by-products derived from the protecting group and the aniline reagent is low, and the handling operation of the compound (II) deposited after deprotection is also good, which is suitable as a mass production method.
- the amount of the aromatic amine (eg, a phosphorus derivative) to be used is 1 to 20 mole equivalents, preferably 5 to 15 equivalents, relative to Compound (I).
- Compound (1) a pharmaceutically acceptable salt thereof, a solvate thereof or a crystal thereof
- a nuclear reagent is added to the solvent and the reaction system (eg, reaction mixture and vessel) is preferably filled with nitrogen.
- the reaction temperature is about 20-50 ° C, preferably in the range of 0-30 ° C.
- the reaction time is usually several minutes and several tens of hours, preferably in the range of 1 to 3 hours.
- the present invention further provides the crystals of compounds (IV-a) and (V-a), which are synthetic intermediates of compound (Ia).
- the crystals of compound (IV-a) may be solvates (eg, hydrates, alcohol solvates)!
- the crystals of compound (Va) may be solvates (eg hydrates, alcohol solvates).
- the crystals of compound (IV-a) are preferred as shown in Examples below.
- an acid more preferably with an inorganic acid (e.g. hydrochloric acid)
- the reaction solution is adjusted to pH with an alkali (preferably 2 to 3) and precipitated, then dried and concentrated by a conventional method, and organic It can be crystallized from a solvent (preferably an ethyl acetate-toluene system).
- H NSO NHBoc is added to the compound (VI-a).
- a radical trapping agent may be preferably used in combination.
- An example of the radical trapping agent is dibutylhydroxytoluene.
- a 2-propanol hydrate crystal (3.340 g, equivalent to 3.137 g in solvent-free equivalent) of the compound (Ia) described in WO2004Z72073 is dissolved in ethyl acetate (67 ml), and then ethyl acetate and isopropanol are dissolved.
- Ethyl acetate (3.14 ml), benzyl alcohol (3.14 ml), and toluene (12.55 ml) were added thereto, and the mixture was stirred at room temperature for 2 hours and then at 5 ° C for 1 hour.
- Powder X-ray diffraction The chart is shown in Fig. 1 and the peak value is shown in Fig. 2.
- Amorphous and powdery compound (I a) (100 mg) was dissolved in ethyl acetate (0.1 ml), benzyl alcohol (0.3 ml) was added and stirred at room temperature for 1 hour, then 5 ° C was left for 2 days. The precipitated crystals were separated by filtration and air-dried to obtain a benzyl alcohol solvate crystal (79 mg) of compound (Ia) showing substantially the same powder X-ray pattern as in Example 1.
- Compound (I a) (however, using isopropyl alcohol hydrate crystals) 500 mg is dissolved in 2 ml of tetrahydrofuran (THF), 10 equivalents of N-ethylaline, 2 ml of THF and 1 ml of H 0 in this order.
- THF tetrahydrofuran
- Example 6 The reaction of Example 6 was carried out in the same manner using aline instead of N-ethylaline (provided that the solvent used was THF (12V) monohydrate (2V)). As shown below, when the amount of Pd catalyst used was reduced, a large amount of by-products were generated and the production rate of compound (II) was significantly reduced.
- Fig. 4 shows the powder X-ray diffraction data.
- the peak with peak number 23 is the peak derived from the aluminum used in the measurement.
- Figure 3 shows the powder X-ray diffraction data.
- the peak with peak number 20 is the peak derived from the aluminum used in the measurement.
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Abstract
Description
力ルバぺネム誘導体の製法およびその中間体結晶 Preparation of strong rubapenem derivative and its intermediate crystals
技術分野 Technical field
[0001] 本発明は、力ルバぺネム誘導体の製法およびその中間体結晶に関する。 [0001] The present invention relates to a method for producing a powerful rubapenem derivative and an intermediate crystal thereof.
背景技術 Background art
[0002] 広範囲の抗菌スペクトルを有するピロリジルチオ力ルバぺネム誘導体 (化合物(II) ) は、有用な抗生物質として知られている (参照:特許文献 1)。本発明の化合物 (I)は その合成中間体である。 [0002] A pyrrolidylthio-powered rubapenem derivative (compound (II)) having a broad antibacterial spectrum is known as a useful antibiotic (Reference: Patent Document 1). The compound (I) of the present invention is a synthetic intermediate.
[化 1] [Chemical 1]
(式中、 R1はカルボキシ保護基: R2はァミノ保護基) (Wherein R 1 is a carboxy protecting group: R 2 is an amino protecting group)
化合物 (I)の製法例として、特許文献 1 (実施例 13、工程 3)に以下の方法が記載さ れて ヽるが、 2位側鎖を導入する縮合反応時に使用して ヽる塩基は、 As an example of the production method of compound (I), the following method is described in Patent Document 1 (Example 13, Step 3), but the base used in the condensation reaction for introducing the 2-position side chain is: ,
ェチルァミンである(収率 71%)。 Ethylamine (71% yield).
[化 2] [Chemical 2]
(l l l-a) (IV - a) (I -a) (l l l-a) (IV-a) (I -a)
また特許文献 2 (参考例 1)にも以下に示す同様の反応が記載されているが、縮合反 応時に使用している塩基は同じくジイソプロピルェチルァミンである(収率 54%)。 Also, Patent Document 2 (Reference Example 1) describes the same reaction shown below, but the base used in the condensation reaction is also diisopropylethylamine (yield 54%).
さらに 2位に別構造のピロリジニルチオ基を有する力ルバぺネム誘導体の合成法が 公知である力 2位の縮合反応時の塩基としてはやはりジイソプロピルェチルァミンが 使用されている (参照:特許文献 3,実施例 7等) Furthermore, the synthesis method of force rubapenem derivatives having a pyrrolidinylthio group of another structure at the 2-position is well known. Diisopropylethylamine is also used as the base for the condensation reaction at the force 2-position (see: Patent document 3, Example 7 etc.)
このように力ルバぺネムの 2位縮合反応時の塩基としては、一般的にはジイソプロピ ルェチルァミン等の 3級ァミンが使用されている。これは、一般に 3級ァミンが強塩基 性であり、また N原子上に水素がな 、ので副反応が起こりにく!/、と考えられて 、るた めと推測される。 As described above, tertiary amines such as diisopropylpropylamine are generally used as bases for the second-position condensation reaction of force rubapenem. This is probably because tertiary amines are generally strongly basic and there is no hydrogen on the N atom, so side reactions are unlikely to occur! /.
また、上記化合物(I a)の結晶化に関しては、種々のアルコール和物結晶(実施 例: 2—プロパノール、 2—ペンタノール、 1 ペンタノール、 tーァミルアルコール、 1 プロパノール)が公知である(参照:特許文献 2)。 Regarding the crystallization of the above compound (Ia), various alcohol solvate crystals (Examples: 2-propanol, 2-pentanol, 1 pentanol, tamyl alcohol, 1 propanol) are known. (Reference: Patent Document 2).
また化合物(I a)の合成中間体である上記化合物(IV— a)は、特許文献 1に記載 されて 、るが (参照:製造例 8)、その結晶は単離されて!/、な!/、。 The compound (IV-a), which is a synthetic intermediate of the compound (I a), is described in Patent Document 1 (see: Production Example 8), but the crystal is isolated! / ! /
さらに化合物 (I a)の脱保護法としては、 Sn試薬 (参照:特許文献 1)やメルドラム 酸 (参照:特許文献 2)が使用されて!ヽたが、環境への負荷や試薬自体の安定性の 面で工業的実施には好ましくな力つた。一方、その他の力ルバぺネム誘導体の脱保 護試薬として、ァミンと Pd触媒の組合せが公知である (参照:特許文献 4)。特許文献 4中、アミンは低級ァルケ-ル基に対する受容体として使用されている力 好ましいァ ミンとしては、ァ-リン、 N—メチルァ-リン等の芳香族ァミン類が例示されている。 特許文献 1:特開平 05— 294970号公報 Furthermore, as a deprotection method for compound (Ia), Sn reagent (Reference: Patent Document 1) and Meldrum's acid (Reference: Patent Document 2) were used! From the standpoint of sexuality, it was favorable for industrial implementation. On the other hand, a combination of an amine and a Pd catalyst is known as a deprotection reagent for other powerful rubapenem derivatives (see Patent Document 4). In Patent Document 4, amines are used as acceptors for lower alkyl groups. Examples of preferred amines include aromatic amines such as arrin and N-methylarin. Patent Document 1: Japanese Patent Laid-Open No. 05-294970
特許文献 2: WO2004Z72073号公報 Patent Document 2: WO2004Z72073 Publication
特許文献 3 :特開平 02— 15080号公報 Patent Document 3: Japanese Patent Laid-Open No. 02-15080
特許文献 4:特開昭 64 - 79180号公報 Patent Document 4: Japanese Patent Application Laid-Open No. 64-79180
発明の開示 発明が解決しょうとする課題 Disclosure of the invention Problems to be solved by the invention
[0003] 力ルバぺネム誘導体の中間体である化合物(I)のさらに好ましい工業的製法の開 発が要望されている。またィ匕合物 (I)のさらに好ましい結晶の開発が要望されている。 さらに化合物 (I)の工業的に好ましい脱保護法、および化合物 (I)の中間体であるィ匕 合物(IV— a)等の結晶の開発が要望されている。 [0003] Development of a more preferable industrial process for the compound (I), which is an intermediate of a powerful rubapenem derivative, has been demanded. There is also a demand for the development of a more preferable crystal of the compound (I). Further, there is a demand for industrially preferable deprotection methods for compound (I) and development of crystals such as compound (IV-a) which is an intermediate of compound (I).
課題を解決するための手段 Means for solving the problem
[0004] 本発明者は、上記課題に鑑み鋭意研究を重ねた結果、力ルバぺネムの 2位縮合反 応時に特定の塩基、好ましくは 2級ァミンを使用すれば反応収率が向上し、反応時 間が短縮されて、化合物 (I)を効率よく製造できることを見出した。また化合物 (I)をべ ンジルアルコール等力 結晶化すれば、中間体として取り扱いに優れた結晶が得ら れることも見出した。さらに化合物 (I)を Pd触媒および特定のァミン存在下で脱保護 する方法、およびィ匕合物 (IV— a)等の結晶を見出し、以下に示す本発明を完成した [0004] As a result of intensive studies in view of the above problems, the present inventor has improved the reaction yield by using a specific base, preferably a secondary amine, during the second-position condensation reaction of force rubapenem. It was found that the reaction time was shortened and compound (I) could be produced efficiently. It was also found that if compound (I) is crystallized with benzyl alcohol isotropic, crystals having excellent handling as an intermediate can be obtained. Furthermore, a method for deprotecting compound (I) in the presence of a Pd catalyst and a specific amine, and crystals such as compound (IV-a) were found, and the present invention shown below was completed.
(1)式: (1 set:
[化 4] [Chemical 4]
(式中、 Rは水素またはヒドロキシ保護基; R1はカルボキシ保護基; Phはフ Wherein R is hydrogen or a hydroxy protecting group; R 1 is a carboxy protecting group; Ph is
で示される化合物(III)と式: Compound (III) represented by the formula:
[化 5] [Chemical 5]
(式中、 R2はァミノ保護基) (Wherein R 2 is an amino protecting group)
で示される化合物 (IV)またはその製薬上許容される塩とを 2級ァミン存在下で反応さ せた後、所望によりヒドロキシ保護基を脱保護することを特徴とする、式: Is reacted with the compound (IV) or a pharmaceutically acceptable salt thereof in the presence of a secondary amine. And optionally deprotecting the hydroxy protecting group, wherein:
[化 [Chemical
(式中、 R1および R2は前記と同意義) (Wherein R 1 and R 2 are as defined above)
で示される化合物 (1)、その製薬上許容される塩、その溶媒和物またはそれらの結晶 の製造方法。 Or a pharmaceutically acceptable salt, solvate or crystal thereof.
(2) 2級ァミンがジイソプロピルァミンである、上記 1記載の製造方法。 (2) The production method according to the above (1), wherein the secondary amine is diisopropylamine.
(3) !?1が CH CH=CH; R2が COOCH CH=CHである、上記 1または 2記載の製造方法 !? (3) 1 CH CH = CH; is R 2 is COOCH CH = CH, a manufacturing method of the above 1 or 2, wherein
2 2 2 2 2 2 2 2
(4)上記 1〜3の 、ずれかに記載の方法により化合物 (I)、その製薬上許容される塩 、その溶媒和物またはそれらの結晶を得た後、脱保護反応に付すことを特徴とする、 式: (4) A compound (I), a pharmaceutically acceptable salt, a solvate or a crystal thereof is obtained by the method described in any one of 1 to 3 above, and then subjected to a deprotection reaction. And the formula:
[化 7] [Chemical 7]
で示される化合物 (11)、その製薬上許容される塩、またはそれらの溶媒和物の製造 方法。 Or a pharmaceutically acceptable salt thereof, or a solvate thereof.
(5)式: Equation (5):
で示される化合物 (I a)の溶媒和物結晶(但し、該溶媒は、置換されていてもよいべ ンジルアルコールである)。 A solvate crystal of the compound (Ia) represented by the formula (provided that the solvent is an optionally substituted benzyl alcohol).
(6)ベンジルアルコール和物結晶である、上記 5記載の結晶。 (6) The crystal as described in 5 above, which is a benzyl alcohol solvate crystal.
(7)ベンジルアルコールの含量力 化合物(I)に対して 1〜 10モル当量である、上記 3記載の結晶。 (7) Content of benzyl alcohol The crystal according to 3 above, which is 1 to 10 molar equivalents relative to compound (I).
(8)粉末 X線回折パターンにおいて、主なピークが回折角度 2 0 = 7.6、 17.7、 18.5 、 19.5、 19.9、 21.3、 23.8 (単位:度)付近に存在する、上記 6または 7記載の結晶。 (8) The crystal according to 6 or 7 above, wherein in the powder X-ray diffraction pattern, main peaks are present in the vicinity of diffraction angles 20 = 7.6, 17.7, 18.5, 19.5, 19.9, 21.3, 23.8 (unit: degree).
(9)上記 5〜8のいずれかに記載の結晶を脱保護することを特徴とする、式: (9) Deprotecting the crystal according to any one of 5 to 8 above,
[化 9] [Chemical 9]
で示される化合物 (11)、その製薬上許容される塩、またはそれらの溶媒和物の製造 方法。 Or a pharmaceutically acceptable salt thereof, or a solvate thereof.
(10)上記 1〜3の ヽずれかに記載の方法により化合物 (I)、その製薬上許容される塩 またはその溶媒和物を得た後、これを置換されて 、てもよ 、ベンジルアルコール中で 結晶化させて化合物(I)の置換されて 、てもよ 、ベンジルアルコール和物結晶を得、 これを脱保護することを特徴とする、上記 9記載の化合物 (Π)、その製薬上許容され る塩、またはその溶媒和物の製造方法。 (10) After obtaining Compound (I), a pharmaceutically acceptable salt thereof or a solvate thereof by the method described in any one of 1 to 3 above, this may be substituted, and benzyl alcohol The compound (I), wherein the compound (I) is substituted by crystallization to obtain a benzyl alcohol solvate crystal, which is deprotected. A method for producing an acceptable salt or a solvate thereof.
(11)式: Equation (11):
[化 15] [Chemical 15]
(式中、 R1はカルボキシ保護基; R2はァミノ保護基) (Wherein R 1 is a carboxy protecting group; R 2 is an amino protecting group)
で示される化合物、その溶媒和物またはそれらの結晶を、 Pd触媒および N ァニリン存在下で脱保護することを特徴とする、式: A compound represented by the formula: Characterized by deprotection in the presence of aniline, the formula:
[化 16] [Chemical 16]
で示される化合物 (11)、その製薬上許容される塩、またはそれらの溶媒和物の製造 方法。 Or a pharmaceutically acceptable salt thereof, or a solvate thereof.
(12) 1^が CH CH=CH; R2が COOCH CH=CHである、上記(11)記載の製造方法。 (12) The production method according to (11), wherein 1 ^ is CH 2 CH═CH; R 2 is COOCH CH═CH.
2 2 2 2 2 2 2 2
( 13) Pd触媒の使用量力 化合物(I)に対して 0. 01モル当量以下である、上記(11) 記載の製造方法。 (13) The amount of Pd catalyst used The production method according to the above (11), which is 0.01 molar equivalent or less with respect to the compound (I).
( 14) Pd触媒の使用量力 化合物(I)に対して 0. 005モル当量以下である、上記(11 )記載の製造方法。 (14) The amount of Pd catalyst used The production method according to (11) above, wherein the amount is 0.005 molar equivalent or less relative to compound (I).
(15)式: Equation (15):
[化 17] で示される化合物の結晶。 [Chemical 17] A crystal of the compound represented by
(16)粉末 X線回折パターンにおいて、主なピークが回折角度 2 0 =6. 26、 12. 50 、 18. 24、 18. 80、 23. 90、および 26. 86 (単位:度)付近に存在する、上記(15) 記載の結晶。 (16) In the powder X-ray diffraction pattern, the main peak is around diffraction angle 20 = 6.26, 12.50, 18.24, 18.80, 23.90, and 26.86 (unit: degree). The crystal according to (15), which is present.
(17)式: Equation (17):
(式中、 Acはァセチル; Bocは t ブトキシカルボ-ル) (In the formula, Ac is acetyl; Boc is t-butoxycarbol)
で示される化合物の結晶。 A crystal of the compound represented by
(18)粉末 X線回折パターンにおいて、主なピークが回折角度 2 0 = 10. 24、 12. 2 6、 13. 34、 17. 32、 20. 84、 21. 22、 21. 72、および 22. 28 (単位:度)付近に存 在する、上記(17)記載の結晶。 (18) In the powder X-ray diffraction pattern, the main peaks are diffraction angles 2 0 = 10. 24, 12. 2 6, 13. 34, 17. 32, 20. 84, 21. 22, 21. 72, and 22 28. The crystal according to (17) above, present in the vicinity of 28 (unit: degree).
発明の効果 The invention's effect
[0005] 本製法によって化合物(I)を収率よぐ短時間で製造できる。また取り扱いに優れた 化合物 (I)の溶媒和物結晶が得られる。また化合物 (I)の Pd触媒存在下での脱保護 法および中間体の結晶を提供する。これらの製法、結晶を利用することにより、カル バぺネム系抗菌剤である化合物 (Π)、その溶媒和物またはそれらの結晶が効率よく 製造できる。 [0005] According to this production method, compound (I) can be produced in a short period of time based on yield. Also, a solvate crystal of compound (I) excellent in handling can be obtained. The present invention also provides a method for deprotection of Compound (I) in the presence of a Pd catalyst and an intermediate crystal. By using these production methods and crystals, a compound (Π), a solvate thereof, or a crystal thereof, which is a carbapenem antibacterial agent, can be efficiently produced.
図面の簡単な説明 Brief Description of Drawings
[0006] [図 1]実施例 1で得られた化合物(I a)のべンジルアルコール和物結晶の粉末 X線 回折パターンのチャートである。 FIG. 1 is a chart of a powder X-ray diffraction pattern of a benzyl alcohol solvate crystal of compound (I a) obtained in Example 1.
[図 2]実施例 1で得られた化合物(I a)のべンジルアルコール和物結晶の粉末 X線 回折パターンのピーク値を示す。 FIG. 2 shows a peak value of a powder X-ray diffraction pattern of a benzyl alcohol solvate crystal of compound (Ia) obtained in Example 1.
[図 3]実施例 7で得られた化合物(IV— a)の結晶の粉末 X線回折パターンのチャート である。 FIG. 3 is a chart of a powder X-ray diffraction pattern of a crystal of the compound (IV-a) obtained in Example 7.
[図 4]実施例 7で得られた化合物 (V—a)の結晶の粉末 X線回折パターンのチャート である。 FIG. 4 is a chart of a powder X-ray diffraction pattern of a crystal of the compound (Va) obtained in Example 7.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0007] (1)化合物 (I)の製法 [0007] (1) Production method of compound (I)
[化 10] [Chemical 10]
(式中、 Rは水素またはヒドロキシ保護基; R1はカルボキシ保護基; R2はァミノ保護基 、 Phはフエ-ル) 化合物 (ΠΙ)と化合物 (IV)またはその製薬上許容される塩を塩基存在下に反応させ た後、所望によりヒドロキシ保護基を脱保護することにより、化合物 (1)、その製薬上許 容される塩、その溶媒和物またはそれらの結晶が得られる。 (Wherein R is hydrogen or a hydroxy protecting group; R 1 is a carboxy protecting group; R 2 is an amino protecting group, Ph is a phenol) Compound (ΠΙ) and Compound (IV) or a pharmaceutically acceptable salt thereof After the reaction in the presence of a base, the hydroxy protecting group is optionally deprotected to give compound (1), a pharmaceutically acceptable salt thereof, a solvate thereof or a crystal thereof.
塩基としては、 2級ァミンが使用され、より好ましくは比較的立体障害の大きな 2級ァ ミンである。具体的には、 NHRaRbで示され、 Raおよび Rbはそれぞれ独立してアルキ ルまたはフエ-ル等であり、好ましくは Raおよび Rbは同一である。アルキルは直鎖ま たは分枝状の C1〜C10、好ましくは C3〜C7アルキルであり、より好ましくは分枝状 である。 Raおよび Rbとしてさらに好ましくは、イソプロピル、 t-ブチル、イソブチル、アミ ル、およびフエ-ルが例示される。 2級ァミンとしてより好ましくは、ジイソプロピルアミ ン、ジ t-ブチルァミン、ジイソブチルァミン、ジアミルァミン、およびジフエニルァミンで あり、特に好ましくはジアルキルアミン(例:ジイソプロピルァミン)である。 As the base, a secondary amine is used, more preferably a secondary amine having a relatively large steric hindrance. Specifically, it is represented by NHR a R b , and R a and R b are each independently alkyl or phenol, and preferably R a and R b are the same. Alkyl is straight-chain or branched C1-C10, preferably C3-C7 alkyl, more preferably branched. More preferable examples of R a and R b include isopropyl, t-butyl, isobutyl, amyl, and file. As the secondary amine, diisopropylamine, di-t-butylamine, diisobutylamine, diamylamine, and diphenylamine are more preferable, and dialkylamine (eg, diisopropylamine) is particularly preferable.
反応溶媒としては、ァセトニトリル、ジメチルホルムアミド、メチレンクロリド、ジメチル スルホキサイド、 N ジメチルァセトアミド等が例示される力 好ましくは N ジメチル ァセトアミドである。 Examples of the reaction solvent include acetonitrile, dimethylformamide, methylene chloride, dimethyl sulfoxide, N dimethylacetamide and the like, and N dimethylacetamide is preferable.
反応温度は、通常 40°C〜室温、好ましくは 約 20〜0°Cである。 The reaction temperature is generally 40 ° C to room temperature, preferably about 20 to 0 ° C.
反応時間は、通常、数十分〜数十時間、好ましくは 1〜5時間である。 The reaction time is usually several tens of minutes to several tens of hours, preferably 1 to 5 hours.
化合物 (III)と化合物 (IV)の使用量は、 10 : 1〜1: 10、好ましくは 1: 1〜: L: 5である 製薬上許容される塩としては、無機塩基塩 (例:ナトリウム塩、カリウム塩等のアル力 リ金属塩;カルシウム塩、マグネシウム塩等のアルカリ土類金属塩;アンモニゥム塩); 有機塩基塩 (例:トリェチルァミン塩、ピリジン塩、ピコリン塩、エタノールアミン塩、トリ エタノールアミン塩、ジシクロへキシルァミン塩、 Ν,Ν' —ジベンジルエチレンジァミン 塩);塩酸塩、臭化水素酸塩、硫酸塩、燐酸塩等の無機酸付加塩;ギ酸塩、酢酸塩、 トリフルォロ酢酸塩、マレイン酸塩、酒石酸塩、メタンスルホン酸塩、ベンゼンスルホン 酸塩等の有機酸付加塩;アルギニン、ァスパラギン酸、グルタミン酸等の塩基性ァミノ 酸または酸性アミノ酸との塩が挙げられる。 The amount of compound (III) and compound (IV) used is 10: 1 to 1:10, preferably 1: 1 to L: 5. As the pharmaceutically acceptable salt, an inorganic base salt (eg, sodium) Al metal salts such as salts and potassium salts; alkaline earth metal salts such as calcium salts and magnesium salts; ammonium salts; organic base salts (eg, triethylamine salt, pyridine salt, picoline salt, ethanolamine salt, triethanol salt) Amine salts, dicyclohexylamine, Ν, Ν'-dibenzylethylenediamine salts); inorganic acid addition salts such as hydrochloride, hydrobromide, sulfate, phosphate; formate, acetate, trifluoro Organic acid addition salts such as acetate, maleate, tartrate, methanesulfonate, benzenesulfonate; basic amino such as arginine, aspartic acid, glutamic acid And salts with acid or acidic amino acids.
Rで示されるヒドロキシ保護基としては、 β—ラタタム系抗菌剤の分野で一般に使用 され得る種々のヒドロキシ保護基が使用できる。その具体例としては、トリアルキルシリ ル(該アルキルは好ましくは C1〜C6、例:トリメチルシリル、トリェチルシリル、 tーブチ ルジメチルシリル、トリイソプロビルシリル、ジメチルへキシルシリル、 t ブチルジフヱ -ルシリル)、置換されて!、てもよ 、ベンジル(置換基の例:ニトロ、低級アルコキシ)、 低級アルコキシカルボ-ル基(例:メトキシカルボ-ル、エトキシカルボ-ル)、ハロゲ ノ低級アルコキシカルボ-ル基、置換されて 、てもよ 、ベンジルォキシカルボ-ル( 置換基の例:ニトロ、低級アルコキシ)、ァシル(例:ァセチル、ベンゾィル)、ァラルキ ル (例:トリフエ-ルメチル)、テトラヒドロビラ-ル等が挙げられる。好ましくは、トリアル キルシリル、特にトリメチルシリルや tーブチルジメチルシリルである。 As the hydroxy protecting group represented by R, various hydroxy protecting groups that can be generally used in the field of β-ratata antibacterial agents can be used. Specific examples thereof include trialkylsilyl (the alkyl is preferably C1-C6, eg, trimethylsilyl, triethylsilyl, tert-butyldimethylsilyl, triisopropylpropylsilyl, dimethylhexylsilyl, tert-butyldiphenylsilyl), substituted. !, But benzyl (examples of substituents: nitro, lower alkoxy), lower alkoxy carbo groups (eg, methoxy carbo yl, ethoxy carbo ol), halogeno lower alkoxy carbo ol groups, substituted However, benzyloxycarbol (substituent examples: nitro, lower alkoxy), acyl (eg, acetyl, benzoyl), aralkyl (eg, trimethyl), tetrahydrobiral, etc. It is done. Trialkylsilyl, particularly trimethylsilyl and t-butyldimethylsilyl are preferred.
これらのヒドロキシ保護基は、反応後、所望により、当業者に周知の方法により脱保 護し得る。またカップリング反応中や後処理 (例:抽出、洗浄)段階で自動的にはずれ る保護基であってもよい。例えば、トリメチルシリル等は、反応後の抽出操作において 酸によって脱離する。 These hydroxy protecting groups can be deprotected after the reaction, if desired, by methods well known to those skilled in the art. Further, it may be a protecting group that is automatically removed during the coupling reaction or in the post-treatment (eg, extraction, washing) stage. For example, trimethylsilyl and the like are eliminated by acid in the extraction operation after the reaction.
R1で示されるカルボキシ保護基としては、低級アルキル(例:メチル、ェチル、プロピ ル、イソプロピル、ブチル、イソブチル、第三級ブチル、ペンチル、へキシル)、低級ァ ルカノィルォキシ(低級)アルキル(例:ァセトキシメチル、プロピオ-ルォキシメチル、 ブチリルォキシメチル、バレリルォキシメチル、ビバロイルォキシメチル、へキサノィル ォキシメチル)、低級アルカンスルホ-ルォキシ(低級)アルキル(例: 2—メシルェチ ル)、モノ(またはジまたはトリ)ハロ(低級)アルキル (例: 2—ョードエチル、 2,2,2—トリ クロロェチル)、低級アルコキシカルボ-ルォキシ(低級)アルキル(例:メトキシカルボ ニルォキシメチル、エトキシカルボニルォキシメチル、プロポキシカルボニルォキシメ チル、第三級ブトキシカルボ-ルォキシメチル、 1 (または 2—)メトキシカルボ-ル ォキシェチル、 1 (または 2—)エトキシカルボ-ルォキシェチル、 1 (または 2—) イソプロポキシカルボ-ルォキシェチル)、低級アルケニル(例:ビュル、ァリル)、低 級アルキ-ル(例:ェチュル、プロビュル)、(置換)ァリール (低級)アルキル(例:ベン ジル、 4—メトキシベンジル、 4— -トロベンジル、フエネチル、トリチル、ベンズヒドリル 、ビス(メトキシフエ-ル)メチル、 3,4—ジメトキシベンジル、 4ーヒドロキシ 3,5—ジ第 三級ブチルベンジル)、(置換)ァリール(例:フエ-ル、 4 クロ口フエ-ル、トリル、第 三級ブチルフエ-ル、キシリル)などが例示される。この内、 R1としては、比較的に電 子供与性型の保護基の場合に本製法を利用する利点が大きぐ好ましくは、低級ァ ルキル、低級ァルケ-ル (例:ビュル、ァリル)、低級アルキ-ル、(置換)ァリール (低 級)アルキル、または(置換)ァリールである。さらに好ましくは、カップリング反応中に 脱離しにくい保護基であり、特に好ましくはァリル(一 CH CH=CH )である。 The carboxy protecting group represented by R 1 includes lower alkyl (eg, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, pentyl, hexyl), lower alkanoyloxy (lower) alkyl (eg, Acetoxymethyl, propio-loxymethyl, butyryloxymethyl, valeryloxymethyl, bivalyloxymethyl, hexanoloxymethyl), lower alkanesulfo-loxy (lower) alkyl (eg 2-mesylethyl), mono (or di or Tri) halo (lower) alkyl (eg, 2-iodoethyl, 2,2,2-trichloroethyl), lower alkoxycarboxoxy (lower) alkyl (eg, methoxycarbonyloxymethyl, ethoxycarbonyloxymethyl, propoxycarbonyloxyme) Chill, tertiary butoxy Ruboxyloxymethyl, 1 (or 2-) methoxycarboxoxyl, 1 (or 2-) ethoxycarboxoxyl, 1 (or 2-) isopropoxycarboxoxyl), lower alkenyl (eg, bur, allyl), Low-grade alkyl (eg Etul, Probule), (Substituted) aryl (Lower) alkyl (eg Benzyl, 4-methoxybenzyl, 4-trobenzyl, phenethyl, trityl, benzhydryl) , Bis (methoxyphenyl) methyl, 3,4-dimethoxybenzyl, 4-hydroxy 3,5-ditertiary butylbenzyl), (substituted) aryl (eg, phenyl, 4-cylinder, tolyl, Tertiary butylphenol, xylyl) and the like. Among these, as R 1 , the advantage of using this production method in the case of a protective group of a relatively electrophilic type is great. Preferably, lower alkyl, lower alkyl (eg, bur, aryl), Lower alkyl, (substituted) aryl, (lower) alkyl, or (substituted) aryl. More preferably, it is a protecting group that is difficult to be removed during the coupling reaction, and particularly preferred is aryl (one CH 2 CH═CH 2).
2 2 twenty two
R2で示されるァミノ保護基としては、カルボン酸、炭酸、スルホン酸およびカルバミ ン酸から誘導された脂肪族ァシル基や、芳香族基で置換された脂肪族ァシル基等が 挙げられる。 Examples of the amino protecting group represented by R 2 include an aliphatic acyl group derived from carboxylic acid, carbonic acid, sulfonic acid and carbamic acid, and an aliphatic acyl group substituted with an aromatic group.
脂肪族ァシル基としては飽和または不飽和の非環式または環式ァシル基、その例 として、例えばホルミル、ァセチル、プロピオニル、ブチリル、イソブチリル、バレリル、 イソバレリル、ビバロイル、へキサノィル等の低級アルカノィル基のようなアルカノィル 基、例えばメシル、ェチルスルホ -ル、プロピルスルホ -ル、イソプロピルスルホ-ル 、ブチノレスノレホニノレ、イソブチノレスノレホニノレ、ペンチノレスノレホニノレ、へキシノレスノレホニ ル等の低級アルキルスルホ-ル基のようなアルキルスルホ-ル基、力ルバモイル基、 例えばメチルカルバモイル、ェチルカルバモイル等の N—アルキル力ルバモイル基、 例えばメトキシカルボニル、エトキシカルボニル、プロポキシカルボニル、ブトキシカル ボ -ル、第三級ブトキシカルボ-ル等の低級アルコキシカルボ-ル基のようなアルコ キシカルボ-ル基、例えばビュルォキシカルボ-ル、ァリルォキシカルボ-ル等の低 級ァルケ-ルォキシカルボ-ル基のようなァルケ-ルォキシカルボ-ル基、例えばァ クリロイル、メタクリロイル、クロトノィル等の低級アルケノィル基のようなアルケノィル基 、例えばシクロプロパンカルボ-ル、シクロペンタンカルボ-ル、シクロへキサンカル ボ-ル等のシクロ(低級)アルカンカルボ-ル基のようなシクロアルカンカルボ-ル基 等が挙げられる。 Aliphatic acyl groups are saturated or unsaturated acyclic or cyclic acyl groups, such as, for example, lower alkanol groups such as formyl, acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, bivaloyl, hexanoyl and the like. Alkanoyl groups such as mesyl, ethylsulfol, propylsulfol, isopropylsulfol, butinolesnorehoninore, isobutinoresnorehoninore, pentinoresnorehoninore, hexinoresnorephonyl, etc. Alkylsulfol groups such as lower alkylsulfol groups, rubamoyl groups such as N-alkyl rubamoyl groups such as methylcarbamoyl, ethylcarbamoyl, etc., such as methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, butoxycarbonyl , Tertiary butoxy Alkoxycarbon groups such as lower alkoxy carbo groups such as rubols, for example, alkke groups such as lower alkoxy carboxy groups such as buroxy carboxy and aralkyl carboxylic groups. Alkoxyl groups such as alkoxyl groups such as lower alkenyl groups such as acryloyl, methacryloyl, crotonol, etc. Cyclo (lower) alkanecarbox such as cyclopropanecarbol, cyclopentanecarbol, cyclohexanecarbol etc. And cycloalkane carbo yl group such as -l group.
芳香族基で置換された脂肪族ァシル基としては、例えばべンジルォキシカルボ- ル、フエネチルォキシカルボ-ル等のフエ-ル(低級)アルコキシカルボ-ル基のよう なァラルコキシカルボ-ル基が挙げられる。 これらのァシル基はさらに-トロ基のような適当な置換基 1個以上で置換されていて もよぐそのような置換基を有する好ましいァシル基としては、例えば-トロベンジルォ キシカルボ-ル等の-トロアラルコキシカルボ-ル基等が挙げられる。 Examples of the aliphatic acyl group substituted with an aromatic group include aralkoxycarbons such as vinyl (lower) alkoxycarbonyl groups such as benzyloxycarbol and phenoxycarboxyl. Group. These acyl groups may be further substituted with one or more suitable substituents such as -tro group. Preferred acyl groups having such a substituent include, for example, -troayloxycarbol and the like. Examples include a larcocarboxyl group.
ァミノ保護基として好ましくは、カップリング反応中に脱離しにくい保護基であり、特 に好ましくはァルケ-ルォキシカルボ-ル基(例: COOCH CH=CH )である。 The amino protecting group is preferably a protecting group which is not easily eliminated during the coupling reaction, and particularly preferably an alkoxycarboxyl group (eg, COOCH CH═CH 3).
2 2 twenty two
(2)化合物 (I a)の結晶 (2) Compound (I a) crystals
化合物(I— a)はアルコール溶媒中から結晶化され得る。該アルコールは、好ましく は置換されて 、てもよ 、ベンジルアルコールであり、該アルコール和物結晶が得られ る。置換されていてもよいべンジルアルコールの置換基としては、低級アルキル、好 ましくは C1〜C4アルキル(例:メチル、ェチル、プロピル)、低級アルコキシ(例:メトキ シ、エトキシ、プロポキシ)、ハロゲン(例: F、 Cl、 Br)、置換されていてもよいアミノ(置 換基の例:低級アルキル)、ニトロ、シァ入 OH等が例示され、置換位置はオルト、メタ 、パラのいずれでもよい。 Compound (Ia) can be crystallized from an alcohol solvent. The alcohol is preferably substituted and is benzyl alcohol, and the alcohol solvate crystals are obtained. As the substituent of the benzyl alcohol which may be substituted, lower alkyl, preferably C1-C4 alkyl (eg, methyl, ethyl, propyl), lower alkoxy (eg, methoxy, ethoxy, propoxy), Halogen (eg: F, Cl, Br), optionally substituted amino (example of substituent: lower alkyl), nitro, silane-containing OH, etc. are exemplified, and the substitution position is either ortho, meta or para. Good.
置換されていてもよいべンジルアルコール和物結晶としては、好ましくは、ベンジル アルコール和物結晶が得られる。ベンジルアルコール和物結晶中のベンジルアルコ ールの含量は、化合物(I a)に対して 0. 1〜5モル当量、好ましくは 0. 5〜2モル当 量、より好ましくは 1モル当量である。ベンジルアルコール和物結晶は好ましくは、粉 末 X線回折において、図 1のパターンを示す。 As an optionally substituted benzyl alcohol solvate crystal, a benzyl alcohol solvate crystal is preferably obtained. The content of benzyl alcohol in the benzyl alcohol solvate crystal is 0.1 to 5 molar equivalents, preferably 0.5 to 2 molar equivalents, more preferably 1 molar equivalent, relative to compound (Ia). . The benzyl alcohol solvate crystal preferably exhibits the pattern of FIG. 1 in powder X-ray diffraction.
ベンジルアルコール和物結晶は、粉末 X線回折パターンにおいて好ましくは、少な くとも以下に示す付近に主ピークを有する。 The benzyl alcohol solvate crystal preferably has a main peak at least in the vicinity shown below in the powder X-ray diffraction pattern.
2 Θ = 7.6、 17.7、 18.5、 19.5、 19.9、 21.3、 23.8 (単位:度) 2 Θ = 7.6, 17.7, 18.5, 19.5, 19.9, 21.3, 23.8 (unit: degree)
(X線回折測定条件:管球 CuK o;線、管電圧 30Kv、管電流 15mA、 dsin θ =η λ ( ηは整数、 θは回折角)) (X-ray diffraction measurement conditions: tube CuK o; line, tube voltage 30 Kv, tube current 15 mA, dsin θ = η λ (η is an integer, θ is the diffraction angle))
上記面間隔 d値は、 X線ピークのうち、相対強度の強い主なピークを選択したもので あり、結晶構造は必ずしもこれらの値だけによつて限定されるものではない。即ち、こ れら以外のピークが含まれていてもよい。また一般に結晶を X線解析により測定した 場合、そのピークは、測定機器、測定条件、付着溶媒の存在等により、多少の測定 誤差を生じることもある。例えば、面間隔 dの値として ± 0.2程度の測定誤差が生じる 場合があり、非常に精密な設備を使用した場合でも、 ±0.01〜士 0.1程度の測定誤 差が生じる場合がある。よって、結晶構造の同定に当たっては多少の誤差も考慮さ れるべきであり、実質的に上記と同様の X線パターンによって特徴付けられる結晶は すべて本発明の範囲内である。 The interplanar spacing d value is selected from the main peaks having a high relative intensity among the X-ray peaks, and the crystal structure is not necessarily limited only by these values. That is, peaks other than these may be included. In general, when a crystal is measured by X-ray analysis, the peak may cause some measurement error due to the measuring instrument, measurement conditions, presence of attached solvent, and the like. For example, a measurement error of about ± 0.2 occurs as the value of surface separation d In some cases, even if very precise equipment is used, a measurement error of about ± 0.01 to 0.1 may occur. Therefore, some errors should be taken into account in identifying the crystal structure, and all crystals characterized by X-ray patterns substantially similar to those described above are within the scope of the present invention.
上記べンジルアルコール和物結晶をィ匕合物(I a)から調製する場合は、好ましく は、化合物(I a)またはその溶媒和物を可溶性溶媒に溶解させた後、ベンジルアル コールをカ卩えて、室温で数時間攪拌し、所望により 0°C〜室温で数時間〜数日、静 置させた後、常法により濾取、乾燥することにより得られる。また。化合物(I— a)また はその溶媒和物を大量の溶媒に溶解させた後、一旦、溶媒を留去して濃縮液を得、 これに、ベンジルアルコールおよび所望によりその他の有機溶媒を加え、前記同様、 攪拌、濾取、乾燥等を行ってもよい。 When the benzyl alcohol solvate crystal is prepared from the compound (I a), it is preferable to dissolve the compound (I a) or a solvate thereof in a soluble solvent, It can be obtained by stirring for several hours at room temperature, allowing to stand at 0 ° C to room temperature for several hours to several days, and then filtering and drying by a conventional method. Also. After dissolving the compound (Ia) or its solvate in a large amount of solvent, the solvent is once distilled off to obtain a concentrated solution. To this, benzyl alcohol and other organic solvent as required are added, As described above, stirring, filtration, drying and the like may be performed.
上記溶媒としては、以下の可溶性溶媒、不溶性溶媒およびその混合液が例示され る。 Examples of the solvent include the following soluble solvents, insoluble solvents and mixed solutions thereof.
可溶性溶媒としては、メタノール、エタノール、エチレングリコール、メトキシエタノー ル、グリセリン、プロピレングリコールなどのアルコール類、ジォキサン、テトラヒドロフラ ン、ジメトキシェタンなどのエーテル類、アセトン、メチルェチルケトン、メチルイソブチ ルケトンなどのケトン類、メチルフオルメート、ェチルフオルメート、プロピルフォルメー ト、メチルアセテート、酢酸ェチル、プロピルアセテート、ブチルアセテート、メチルプ 口ピオネート、ェチルプロピオネートなどのエステル類、ジクロロメタン、クロ口ホルム、 四塩化炭素、 1, 2—ジクロ口エタン、トリクロロェタン、クロ口ベンゼン、ジクロロべンゼ ンなどの有機ハロゲンィ匕炭化水素類、ァセトニトリル、プロピオ-トリルなどの-トリル 類、ジメチルフオルムアミド、ジメチルスルホキサイド、 N—メチルピロリドン、キノリン、 ピリジン類、トリェチルァミンなどを用いることができる。これらの溶媒は単独で使用し ても、 2種以上を混合して使用してもよい。また水を混合しても使用できる。好ましくは 、酢酸ェチルである。 Soluble solvents include methanol, ethanol, ethylene glycol, methoxyethanol, glycerol, propylene glycol and other alcohols, dioxane, tetrahydrofuran, dimethoxyethane, and other ethers, acetone, methyl ethyl ketone, methyl isobutyl ketone, and other ketones. , Esters such as methyl formate, ethyl acetate, propyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, ethyl propionate, dichloromethane, chloroform, Organic halogenated hydrocarbons such as carbon tetrachloride, 1,2-dichloroethane, trichloroethane, black benzene and dichlorobenzene, -tolyls such as acetonitrile and propio-tolyl, dimethyl Fuorumuamido, dimethyl sulfoxide, N- methylpyrrolidone, quinoline, pyridine, and the like can be used Toryechiruamin. These solvents may be used alone or in combination of two or more. It can also be used by mixing water. Preferred is ethyl acetate.
不溶性溶媒としては、 2—プロパノール、 2—ペンタノール、 1 ペンタノール、 tーァ ミルアルコール、 1 プロパノール、 n プロパノール、 tーブタノール、イソブタノール 、 n—ブタノール、シクロへキサノール、ベンジルアルコールなどのアルコール類、ジ ェチノレエーテノレ、イソプロピノレエーテノレ、ジブチノレエーテノレ、ェチノレイソアミノレエーテ ル、ェチルフエ-ルエーテルなどのエーテル類、 n ペンタン、 n—へキサン、 n—へ プタン、 n オクタン、 n デカン、シクロへキサン、メチルシクロへキサン、トルエン、 ベンゼン、ェチルベンゼン、タメン、シメン、キシレンなどの炭化水素類などを用いるこ とができる。これらの溶媒は単独で使用しても、 2種以上を混合して使用してもよい。 可溶性溶媒と不溶性溶媒との使用割合は、重量比で通常 1 : 0〜1: 1000、好ましく は 1 : 0. 1〜1 : 100、特に好ましくは 1 : 1〜1: 50であるかまたは、通常 0 : 1〜1000: 1、好ましくは 0. 1 : 1〜100 : 1、特に好ましくは 1 : 1〜50 : 1である。好ましくは、酢酸 ェチルとべンジルアルコールを 1: 1〜5の比率で用いる。 Examples of insoluble solvents include alcohols such as 2-propanol, 2-pentanol, 1 pentanol, tamyl alcohol, 1 propanol, n propanol, t-butanol, isobutanol, n-butanol, cyclohexanol, and benzyl alcohol. The Ethers such as ethinoreethenole, isopropinoleetenore, dibutinoleethenole, ethinoreisoaminolethele, ethylphenol ether, n pentane, n-hexane, n-heptane, n octane, n Hydrocarbons such as decane, cyclohexane, methylcyclohexane, toluene, benzene, ethylbenzene, tamen, cymene, and xylene can be used. These solvents may be used alone or in combination of two or more. The use ratio of the soluble solvent and the insoluble solvent is usually 1: 0 to 1: 1000, preferably 1: 0.1 to 1: 100, particularly preferably 1: 1 to 1:50 in weight ratio, or Usually, 0: 1 to 1000: 1, preferably 0.1: 1 to 100: 1, particularly preferably 1: 1 to 50: 1. Preferably, ethyl acetate and benzyl alcohol are used in a ratio of 1: 1 to 5.
化合物(I a)のべンジルアルコール和物結晶は、その X線ピークの明瞭さからも明 らかなように、非常に結晶性がよい。よって 2位縮合反応によって化合物(I a)を合 成し、ベンジルアルコール和物結晶として単離した場合に、収率が良ぐ高純度で目 的物が得られる。また取り扱い性が良好であり、保存安定性も高い。よってカルバぺ ネム系抗菌剤である化合物 (Π)の合成中間体として非常に有用である。また 2位縮 合反応後の反応溶液から化合物(I a)をべンジルアルコール和物結晶として単離 する場合、好ましくは、反応抽出液を洗浄、溶媒留去、および乾燥後、前記のよう〖こ 可溶性溶媒に溶解させ、ベンジルアルコールおよび所望によりその他の不溶性溶媒 をカロえることにより、晶析させればよい。またべンジルアルコールを加える際に、所望 により別途調製したィ匕合物(I a)のべンジルアルコール和物結晶を種晶として添カロ してちよい。 The benzyl alcohol solvate crystal of compound (Ia) has very good crystallinity, as is clear from the clarity of its X-ray peak. Therefore, when compound (Ia) is synthesized by a 2-position condensation reaction and isolated as a benzyl alcohol hydrate crystal, the desired product is obtained with high yield and high purity. Moreover, the handleability is good and the storage stability is high. Therefore, it is very useful as an intermediate for the synthesis of compound (ii), a carbapenem antibacterial agent. When isolating compound (Ia) as a benzyl alcohol solvate crystal from the reaction solution after the 2-position condensation reaction, the reaction extract is preferably washed, evaporated, and dried, as described above. Crystallization may be achieved by dissolving in a soluble solvent and calorifying benzyl alcohol and optionally other insoluble solvents. In addition, when benzyl alcohol is added, benzyl alcohol solvate crystals of the compound (Ia) separately prepared as required may be added as seed crystals.
(3)化合物 (1)、その溶媒和物またはそれらの結晶を脱保護する工程 (3) Step of deprotecting compound (1), its solvate or crystals thereof
化合物 (1)、その製薬上許容される塩、その溶媒和物またはそれらの結晶、好ましく は化合物 (I a)のべンジルアルコール和物結晶を脱保護反応に付すことによって、 特開平 05— 294970号公報に開示された抗菌剤である化合物 (Π)、その製薬上許 容される塩、その溶媒和物、またはそれらの結晶が得られる。 By subjecting compound (1), a pharmaceutically acceptable salt thereof, a solvate thereof or a crystal thereof, preferably a benzyl alcohol solvate crystal of compound (Ia), to a deprotection reaction, The compound (ii), its pharmaceutically acceptable salt, its solvate, or crystal thereof, which is the antibacterial agent disclosed in Japanese Patent No. 294970, is obtained.
脱保護反応は、当事者に周知の方法に従って行われる。本反応は、ニッケル触媒 、コバルト触媒、鉄触媒、銅触媒、白金触媒およびパラジウム触媒等の貴金属系触 媒等が用いられる。好ましくは、パラジウム触媒およびニッケル触媒等が用いられ、よ り好ましくは、テトラキス(トリフエ-ルホスフィン)パラジウム、酢酸(トリフエ-ルホスフィ ン)パラジウムおよび酢酸(トリェチルホスファイト)パラジウム等である。ノ《ラジウムを加 えた混合溶液に添加物 (好ましくはトリフエ-ルホスフィン等)を加えても良い。さらに 好ましくは、パラジウム触媒に保護基を還元除去する還元剤や求核試薬 (ァリル基の トラップ剤)が添加される。還元剤として、水素、金属水素化物等であり、好ましくは水 素化トリ— n—プチルスズ等である。求核試薬として、カルボキシレート(例えば、ナト リウム 2—ェチルへキサノエート等)、 1, 3—ジカルボ-ルイ匕合物(例えば、メルドラム 酸、ジメドンおよびマロン酸エステル等)、 2級ァミン (例えば、ジェチルァミン等)、お よび芳香族ァミン等が例示される。 The deprotection reaction is performed according to methods well known to those skilled in the art. In this reaction, a noble metal catalyst such as a nickel catalyst, a cobalt catalyst, an iron catalyst, a copper catalyst, a platinum catalyst and a palladium catalyst is used. Palladium catalyst and nickel catalyst are preferably used. More preferable are tetrakis (triphenylphosphine) palladium, acetic acid (triphenylphosphine) palladium, and acetic acid (triethylphosphite) palladium. An additive (preferably triphenylphosphine or the like) may be added to the mixed solution containing radium. More preferably, a reducing agent for reducing and removing the protecting group and a nucleophilic reagent (aryl group trapping agent) are added to the palladium catalyst. Examples of the reducing agent include hydrogen, metal hydride, and the like, and preferably hydrogenated tri-n-butyltin. Examples of nucleophiles include carboxylates (eg, sodium 2-ethylhexanoate), 1,3-dicarboxyl compounds (eg, Meldrum's acid, dimedone and malonic acid esters), secondary amines (eg, Jetylamine, etc.) and aromatic amines.
環境面や反応収率等を考慮した場合、脱保護試薬としてより好ましくは、パラジウム 触媒 (例:テトラキス(トリフエ-ルホスフィン)パラジウム)および芳香族ァミン (例:了二 リン誘導体)の組合せである。ァ-リン誘導体としては、ァ-リン、 N—メチルァ-リン、 N—ェチルァニリン、 Ν,Ν—ジメチルァニリン、 0—、 m—または ρ—トルイジン、 0—、 m—または p—ァ-シジン等の電子供与性基置換ァ-リン類が例示される力 特に好 ましくは、 N—ェチルァ-リンである。 N—ェチルァ-リンを使用することにより、 Pd試 薬の使用量をかなり削減した場合 (例:ィ匕合物 (I)に対して、 0. 01モル当量以下、好 ましく ίま 0. 005モノレ当量以下、より好ましく ίま 0. 003〜0. 001モノレ当量)でも、高収 率で脱保護反応が進行する。また保護基ゃァニリン試薬由来の副生成物の発生率 が低ぐさらに脱保護後に析出する化合物 (II)のハンドリング操作も良好であり、大量 生産法として好適である。 In consideration of environmental aspects and reaction yield, a combination of a palladium catalyst (eg, tetrakis (triphenylphosphine) palladium) and an aromatic amine (eg, Ryoji phosphorus derivative) is more preferable as a deprotection reagent. . The ar phosphorus derivatives include: arline, N-methylarine, N-ethylaniline, Ν, Ν-dimethylaniline, 0—, m—or ρ—toluidine, 0—, m— or p-amino-idine. In particular, N-ethylaline is particularly preferable. When the amount of Pd reagent used is significantly reduced by using N-ethylaline (e.g., less than 0.01 molar equivalent to the compound (I), preferably 0. The deprotection reaction proceeds at a high yield even at 005 monorequivalents or less, more preferably from 003 to 0.001 monoequivalents. In addition, the generation rate of by-products derived from the protecting group and the aniline reagent is low, and the handling operation of the compound (II) deposited after deprotection is also good, which is suitable as a mass production method.
芳香族ァミン (例:ァ-リン誘導体)の使用量は、化合物 (I)に対して 1〜20モル当 量、好ましくは 5〜15当量である。 The amount of the aromatic amine (eg, a phosphorus derivative) to be used is 1 to 20 mole equivalents, preferably 5 to 15 equivalents, relative to Compound (I).
脱保護反応に用いられる溶媒は、通常の反応に使用される溶媒なら何でも良い。 好ましくは、アセトン、ァセトニトリル、酢酸ェチル、ジクロロメタン、テトラヒドロフラン、メ タノール、エタノール及び水等である。これらの溶媒は単独で使用しても、 2種以上を 混合して使用してもよい。特に好ましくはテトラヒドロフランと水の組合せであり、好まし くはテトラヒドロフラン:水 = 1: 1〜 10: 1の割合で使用される。 The solvent used in the deprotection reaction may be any solvent that is used in ordinary reactions. Acetone, acetonitrile, ethyl acetate, dichloromethane, tetrahydrofuran, methanol, ethanol, water and the like are preferable. These solvents may be used alone or in combination of two or more. Particularly preferred is a combination of tetrahydrofuran and water, preferably tetrahydrofuran: water = 1: 1 to 10: 1.
化合物 (1)、その製薬上許容される塩、その溶媒和物またはそれらの結晶および求 核試薬を溶媒に加え、反応系(例えば、反応混液および容器)を好ましくは窒素で満 たす。 Compound (1), a pharmaceutically acceptable salt thereof, a solvate thereof or a crystal thereof A nuclear reagent is added to the solvent and the reaction system (eg, reaction mixture and vessel) is preferably filled with nitrogen.
反応温度は約一 20〜50°Cであり、好ましくは 0〜30°Cの範囲である。 The reaction temperature is about 20-50 ° C, preferably in the range of 0-30 ° C.
反応時間は通常数分力 数十時間であり、好ましくは 1〜3時間の範囲である。 本発明はさらに化合物 (I a)の合成中間体である化合物(IV— a)、 (V-a)の各結 晶を提供する。 The reaction time is usually several minutes and several tens of hours, preferably in the range of 1 to 3 hours. The present invention further provides the crystals of compounds (IV-a) and (V-a), which are synthetic intermediates of compound (Ia).
[化 19] [Chemical 19]
(IV- a) (IV- a)
(Ac =ァセチル; Boc = t ブトキシカルボ-ル) (Ac = acetyl; Boc = t butoxycarbol)
(1)化合物 (IV— a)の結晶 (1) Compound (IV—a) crystals
本結晶は、粉末 X線回折パターンにおいて、主なピークが少なくとも回折角度 2 Θ =6. 26、 12. 50、 18. 24、 18. 80、 23. 90、および 26. 86 (単位:度)付近に存在 する。より詳細には、図 3に示すパターンを示す。化合物(IV— a)の結晶は、溶媒和 物(例:水和物、アルコール和物)であっても良!ヽ。 This crystal has a major peak in the powder X-ray diffraction pattern with diffraction angles of at least 2 Θ = 6.26, 12.50, 18.24, 18.80, 23.90, and 26.86 (unit: degree) It exists in the vicinity. More specifically, the pattern shown in FIG. 3 is shown. The crystals of compound (IV-a) may be solvates (eg, hydrates, alcohol solvates)!
(2)化合物 (V— a)の結晶 (2) Compound (V—a) crystals
本結晶は、粉末 X線回折パターンにおいて、主なピークが少なくとも 2 Θ = 10. 24 、 12. 26、 13. 34、 17. 32、 20. 84、 21. 22、 21. 72、および 22. 28 (単位:度) 付近に存在する。より詳細には、図 4に示すパターンを示す。化合物 (V— a)の結晶 は、溶媒和物(例:水和物、アルコール和物)であっても良い。 This crystal has at least 2 Θ = 10.24, 12.26, 13.34, 17.32, 20.84, 21.22, 21.72, and 22. 28 (Unit: degree) More specifically, the pattern shown in FIG. 4 is shown. The crystals of compound (Va) may be solvates (eg hydrates, alcohol solvates).
化合物(IV— a)の結晶は、後記実施例に示す通り、化合物 (V— a)の結晶を好まし くは酸、より好ましくは無機酸 (例:塩酸)で脱保護した後、反応液をアルカリで pH調 整 (好ましくは 2〜3)し析出させた後、常法により乾燥、濃縮し、有機溶媒 (好ましくは 酢酸ェチル—トルエン系)より結晶化できる。また化合物(VI— a)に H NSO NHBocを As the crystals of compound (IV-a), the crystals of compound (V-a) are preferred as shown in Examples below. After deprotecting with an acid, more preferably with an inorganic acid (e.g. hydrochloric acid), the reaction solution is adjusted to pH with an alkali (preferably 2 to 3) and precipitated, then dried and concentrated by a conventional method, and organic It can be crystallized from a solvent (preferably an ethyl acetate-toluene system). In addition, H NSO NHBoc is added to the compound (VI-a).
2 2 反応させて化合物 (V— a)を生成させた後、これを単離せずに引き続き上記同様に 脱保護反応に付してもよい。なお、脱保護反応時にアミノ保護基由来の副生物が発 生する恐れがある場合には、好ましくはラジカルトラップ剤を併用してもよい。該ラジ カルトラップ剤としては、ジブチルヒドロキシトルエンが例示される。 After reacting to produce compound (Va), it may be subjected to a deprotection reaction as described above without isolation. In addition, when there is a possibility that a by-product derived from the amino protecting group is generated during the deprotection reaction, a radical trapping agent may be preferably used in combination. An example of the radical trapping agent is dibutylhydroxytoluene.
本製法においては、上記で得られる高純度の化合物 (1)、その製薬上許容される塩 、その溶媒和物またはそれらの結晶を用いることにより、脱保護反応後の水と有機溶 媒、好ましくはジクロロメタンを用いた不純物抽出操作において、 目的化合物 (Π)を 高濃度に溶解させた水溶液の調製が可能となった。その結果、従来、後処理工程に おいて不可欠であった濃縮やカラムクロマトグラフィー処理等が必須操作でなくなり、 目的のピロリジルチオ力ルバぺネム誘導体 (II)、その製薬上許容される塩、その溶媒 和物またはそれらの結晶を容易に単離することが可能となった。よって工業的製法と しても有用である。 In this production method, by using the high-purity compound (1) obtained above, a pharmaceutically acceptable salt, a solvate thereof, or a crystal thereof, water and an organic solvent after the deprotection reaction, preferably In the impurity extraction operation using dichloromethane, it became possible to prepare an aqueous solution in which the target compound (Π) was dissolved at a high concentration. As a result, concentration and column chromatography, which have been indispensable in the post-treatment process, are no longer essential operations, and the target pyrrolidylthio strength rubapenem derivative (II), its pharmaceutically acceptable salt, its solvent It became possible to easily isolate hydrates or crystals thereof. Therefore, it is also useful as an industrial production method.
以下に実施例を示す。 Examples are shown below.
実施例 1 Example 1
[化 11] [Chemical 11]
WO2004Z72073号に記載のィ匕合物(I— a)の 2 プロパノール和物結晶(3.340g 、無溶媒換算 3.137g相当)を酢酸ェチル (67ml)にて溶解させた後、酢酸ェチルおよ びイソプロパノールを留去して酢酸ェチル濃縮液 (4.551g)を得た。これに酢酸ェチ ル (3.14ml)、ベンジルアルコール(3.14ml)、トルエン(12.55ml)をカ卩え、室温にて 2時 間攪拌後、 5°Cで 1時間攪拌した。析出した結晶を濾別しトルエン (6.26ml)で洗浄、 風乾して化合物(I a)のべンジルアルコール和物結晶(3.668 g,無溶媒換算 3.037g 相当,ベンジルアルコール (l.Omol)を含有)を得た。収率: 96.8% A 2-propanol hydrate crystal (3.340 g, equivalent to 3.137 g in solvent-free equivalent) of the compound (Ia) described in WO2004Z72073 is dissolved in ethyl acetate (67 ml), and then ethyl acetate and isopropanol are dissolved. Was distilled off to obtain an ethyl acetate concentrate (4.551 g). Ethyl acetate (3.14 ml), benzyl alcohol (3.14 ml), and toluene (12.55 ml) were added thereto, and the mixture was stirred at room temperature for 2 hours and then at 5 ° C for 1 hour. The precipitated crystals were separated by filtration, washed with toluene (6.26 ml), air-dried, and benzyl alcohol solvate crystals of compound (I a) (3.668 g, 3.037 g in solventless form) Corresponding benzyl alcohol (l.Omol) was obtained. Yield: 96.8%
Mp. 74.9°C Mp. 74.9 ° C
元素分析 for C H N 0 S - 1.0C H O -0.2 H 0 Elemental analysis for C H N 0 S-1.0C H O -0.2 H 0
22 31 4 8 2 7 8 2 22 31 4 8 2 7 8 2
Calcd: C:53.15, H:6.06, N:8.55, S:9.79 Calcd: C: 53.15, H: 6.06, N: 8.55, S: 9.79
Found : C: 53.19, H: 6.12, N: 8.65, S: 9.85 Found: C: 53.19, H: 6.12, N: 8.65, S: 9.85
粉末 X線回折:チャートを図 1、ピーク値を図 2に示す。 Powder X-ray diffraction: The chart is shown in Fig. 1 and the peak value is shown in Fig. 2.
なお化合物(I a)の他のアルコール溶媒和物結晶(溶媒例: 2—プロパノール、 2 —ペンタノール、 1—ペンタノール、 t—ァミルアルコール、 1—プロパノール)に関して は、 25°C、 1気圧の一般環境下で保管した場合、経時に伴ない風解し、含有溶媒量 が減少する現象が認められた。しかし、ベンジルアルコール和物結晶については数 日間の取扱いにおいてもそのような現象は認められず、安定性が高いことが分かつ た。 For other alcohol solvate crystals of compound (I a) (solvent examples: 2-propanol, 2-pentanol, 1-pentanol, t-amyl alcohol, 1-propanol), 25 ° C, 1 When stored in a general environment at atmospheric pressure, a phenomenon was observed in which the amount of solvent contained decreased due to deflation over time. However, benzyl alcohol hydrate crystals did not show such a phenomenon even when handled for several days, and it was found that the stability was high.
実施例 2 Example 2
非晶質で粉末状の化合物(I a) (100 mg)を酢酸ェチル (0.1 ml)に溶解さし、ベン ジルアルコール(0.3 ml)をカ卩え、室温にて 1時間攪拌後、 5°Cで 2日間放置した。析出 した結晶を濾別し、風乾して、実施例 1の場合と実質的に同一の粉末 X線パターンを 示す化合物(I a)のべンジルアルコール和物結晶(79mg)を得た。 Amorphous and powdery compound (I a) (100 mg) was dissolved in ethyl acetate (0.1 ml), benzyl alcohol (0.3 ml) was added and stirred at room temperature for 1 hour, then 5 ° C was left for 2 days. The precipitated crystals were separated by filtration and air-dried to obtain a benzyl alcohol solvate crystal (79 mg) of compound (Ia) showing substantially the same powder X-ray pattern as in Example 1.
実施例 3 Example 3
[化 12] e3Si Q H H Hs [Chemical 12] e 3 Si QHH H s
° 删 2關2 ° 删2關2
( I I卜 a) ( IV-a) (I -a) (I I 卜 a) (IV-a) (I -a)
(式中、 \16=メチル; Ph =フエ-ル) (Where, \ 16 = methyl; Ph = ferrule)
6位側鎖上のヒドロキシを保護したェノールフォスフエ -ト(III— a) 595 mg (1 mmol)と チオール体(IV— a) 345 mg (1.1 mmol)の N-ジメチルァセトアミド 2 ml溶液に、ジイソ プロピルアミン 0.168 ml (1.2 mmol)を 12から 8°Cにて滴下した後、同温度にて 1時 間 30分攪拌した。この時点で縮合反応が 92%進行したことを HPLCで確認。反応溶 液を希塩酸中に注ぎこみ、酢酸ェチルで抽出した。有機層は水、 5%重そう水、水で 順次洗浄した後、硫酸ナトリウムで乾燥し、溶媒を留去した。残渣を酢酸ェチル 2 ml に溶解させ、ベンジルアルコール 0.5 mlと実施例 2で得られた結晶を種晶としてカロえ 、室温下 2時間攪拌した。トルエン 5 mlをゆっくり加え、更に室温下 2時間攪拌した後、 5°Cに冷却した。濾過、乾燥後、実施例 1の場合と実質的に同一の粉末 X線パターン を示す化合物(I a)のべンジルアルコール和物結晶 554 mg (85%)を得た。 Hydroxyl-protected enol phosphite (III—a) 595 mg (1 mmol) and thiol compound (IV—a) 345 mg (1.1 mmol) in N-dimethylacetamide 2 ml solution After distilling 0.168 ml (1.2 mmol) of diisopropylamine at 12 to 8 ° C, the mixture was stirred at the same temperature for 1 hour and 30 minutes. At this point, it was confirmed by HPLC that the condensation reaction had progressed 92%. Reaction solution The solution was poured into dilute hydrochloric acid and extracted with ethyl acetate. The organic layer was washed successively with water, 5% sodium bicarbonate water and water, then dried over sodium sulfate, and the solvent was distilled off. The residue was dissolved in 2 ml of ethyl acetate, 0.5 ml of benzyl alcohol and the crystals obtained in Example 2 were seeded and stirred at room temperature for 2 hours. Toluene (5 ml) was slowly added, and the mixture was further stirred at room temperature for 2 hours, and then cooled to 5 ° C. After filtration and drying, 554 mg (85%) of benzyl alcohol solvate crystals of compound (Ia) showing substantially the same powder X-ray pattern as in Example 1 were obtained.
実施例 4 Example 4
[化 13] [Chemical 13]
(l l l -b) ( I V-a) (I -a) ェノールフォスフエ -Hill b) 500 mg (1 mmol)とチオール体(IV— a) 345 mg(l.l m mol)の N-ジメチルァセトアミド 2 ml溶液にジイソプロピルアミン 0.168 ml (1.2 mmol)を — 15°Cにて滴下し、同温度にて 3時間攪拌した。この時点でィ匕合物(I— a)の生成を 確認 (HP LC定量: 92%)。反応溶液を希塩酸中に注ぎこみ、酢酸ェチルで抽出した。 有機層は水、 5%重そう水、水で順次洗浄した後、硫酸ナトリウムで乾燥し、溶媒を留 去した。残渣を酢酸ェチル 2 mlに溶解させ、ベンジルアルコール 0.5 mlと実施例 2で 得られた結晶を種晶として加え、室温下 2時間攪拌した。トルエン 5 mlをゆっくり加え、 更に室温下 2時間攪拌した後、 5°Cに冷却した。濾過、乾燥後、実施例 1の場合と実 質的に同一の粉末 X線パターンを示すィ匕合物(I a)のべンジルアルコール和物結 晶 548 mg (84%)を得た。 (lll -b) (I Va) (I -a) Enolphosphe -Hill b) 500 mg (1 mmol) and thiol compound (IV—a) 345 mg (ll m mol) N-dimethylacetamide 2 Diisopropylamine 0.168 ml (1.2 mmol) was added dropwise to the ml solution at −15 ° C., and the mixture was stirred at the same temperature for 3 hours. At this point, the formation of compound (Ia) was confirmed (HP LC quantification: 92%). The reaction solution was poured into dilute hydrochloric acid and extracted with ethyl acetate. The organic layer was washed successively with water, 5% sodium bicarbonate water and water, then dried over sodium sulfate, and the solvent was distilled off. The residue was dissolved in 2 ml of ethyl acetate, 0.5 ml of benzyl alcohol and the crystals obtained in Example 2 were added as seed crystals, and the mixture was stirred at room temperature for 2 hours. Toluene (5 ml) was slowly added, and the mixture was further stirred at room temperature for 2 hours, and then cooled to 5 ° C. After filtration and drying, 548 mg (84%) of a benzyl alcohol hydrate crystal of the compound (Ia) showing substantially the same powder X-ray pattern as in Example 1 was obtained.
実施例 5 Example 5
[化 14] [Chemical 14]
化合物(I a)のべンジルアルコール和物結晶 2.0 g (3.06 mmol)をテトラヒドロフラ ン 12 mlに溶解させ、イソプロパノール 1 ml, N—ェチルァ-リン 3.71 ml (30.62 mmol ;),水 4 ml, Pd(PPh ) (Ph =フエ-ル) 7.1 mg (0.2 eq)を順次加え、窒素気流下 25°C Compound (Ia) benzyl alcohol solvate 2.0 g (3.06 mmol) is dissolved in tetrahydrofuran 12 ml, isopropanol 1 ml, N-ethylaline 3.71 ml (30.62 mmol;), water 4 ml, Pd (PPh) (Ph = fuel) 7.1 mg (0.2 eq) was added in succession and under nitrogen flow at 25 ° C
3 4 3 4
にて 3時間攪拌した。次いで同温度にて 1.5時間、 5°Cにて 16時間静置後、析出物を 濾過、乾燥して目的物 (11)を 1.26 g (94%)得た。 For 3 hours. Next, the mixture was allowed to stand at the same temperature for 1.5 hours and at 5 ° C for 16 hours, and then the precipitate was filtered and dried to obtain 1.26 g (94%) of the desired product (11).
実施例 6 Example 6
[化 20] [Chemical 20]
(卜 a) (I I ) 実施例 5と同様の反応を Pd触媒の使用量を削減して行った。 (Ii) a (I I) The same reaction as in Example 5 was carried out by reducing the amount of Pd catalyst used.
化合物(I a) (但し、イソプロピルアルコール和物結晶を使用) 500mgをテトラヒドロ フラン(THF) 2 mlに溶解させ、 N-ェチルァ-リン 10当量、 THF 2ml, H 0 1mlを順に Compound (I a) (however, using isopropyl alcohol hydrate crystals) 500 mg is dissolved in 2 ml of tetrahydrofuran (THF), 10 equivalents of N-ethylaline, 2 ml of THF and 1 ml of H 0 in this order.
2 2
加え、仕込液の減圧脱気と窒素置換を 3回繰返した。さらに Pd(PPh ) 0.002当量、 T In addition, vacuum degassing and nitrogen substitution were repeated 3 times. Pd (PPh) 0.002 equivalent, T
3 4 3 4
HF 2mlを順にカ卩え、仕込液の減圧脱気と窒素置換を更に 3回繰返した。室温、窒素 雰囲気、回転子攪拌条件下にて約 1.5時間、反応させたところ、化合物 (II)が晶析し 始めた。 HPLCにて原料、反応中間体の消失を確認し、その上で反応開始から 3時間 後にジメチルホルムアミド (DMF)を加えて反応液を均一化した。この反応液から算出 した化合物(II)の生成率は、 92%であった。 2 ml of HF was added in order, and the degassing of the charged solution and nitrogen replacement were repeated three more times. Compound (II) began to crystallize when reacted for about 1.5 hours at room temperature, in a nitrogen atmosphere and under rotor stirring conditions. The disappearance of the raw materials and reaction intermediates was confirmed by HPLC, and dimethylformamide (DMF) was added 3 hours after the start of the reaction to homogenize the reaction solution. The production rate of compound (II) calculated from this reaction solution was 92%.
比較例 1 Comparative Example 1
実施例 6の反応を、 N-ェチルァ-リンの代わりに N-メチルァ-リンを使用して行った ところ、化合物(II)の生成率は 89%であった。また析出した化合物(II)の性状は、 N- ェチルァ-リンを使用した場合に比べて粘ちよう質で、部分的には塊状となり、その 一部は反応容器壁にも付着した。 When the reaction of Example 6 was carried out using N-methylaline instead of N-ethylaline, the yield of compound (II) was 89%. The properties of the precipitated compound (II) were more viscous than those using N-ethylaline, partly agglomerated, and part of it adhered to the reaction vessel wall.
さらに、 N-ェチルァ-リンの代わりに、他の電子供与性基置換ァ-リン類 (例: Ν,Ν —ジメチルァ-リン、トルイジン、ァ-シジン)を使用して同様の反応を行った力 いず れの場合も Ν-ェチルァ-リンを使用した場合に比べて化合物(II)の生成率は低かつ た(収率 0〜86%)。 Furthermore, instead of N-ethylaline, other electron-donating group-substituted alines (eg, Ν, Ν -dimethylaline, toluidine, acidin) were used for the same reaction. In both cases, the production rate of compound (II) was lower than when Ν-ethylaline was used. (Yield 0-86%).
比較例 2 Comparative Example 2
実施例 6の反応を、 N-ェチルァ-リンの代わりにァ-リンを使用して同様に行った ( 但し、溶媒は、 THF(12V)一水(2V)を使用)。以下に示す通り、 Pd触媒の使用量を 削減すると、副生成物が多量に発生し化合物 (II)の生成率が著しく低下した。 The reaction of Example 6 was carried out in the same manner using aline instead of N-ethylaline (provided that the solvent used was THF (12V) monohydrate (2V)). As shown below, when the amount of Pd catalyst used was reduced, a large amount of by-products were generated and the production rate of compound (II) was significantly reduced.
[表 1] [table 1]
Pd(PPh3)4 反応時間 化合物 (11)の生成率 Pd (PPh 3 ) 4 reaction time Formation rate of compound (11)
(eq) (h) (%) (eq) (h) (%)
0.0200 0.5 86 0.0200 0.5 86
0.0100 0.5 84 0.0100 0.5 84
0.0050 1.5 83 0.0050 1.5 83
0.0025 5.0 70 実施例 7 0.0025 5.0 70 Example 7
[化 21] [Chemical 21]
NH2S02NHBoc (1.35 eq) NH 2 S0 2 NHBoc (1.35 eq)
1J∞" U HCI u ^NHS02NH2 1J∞ " U HCI u ^ NHS0 2 NH 2
2) NaOH aq ^ (8 eq) HS d 2) NaOH aq ^ (8 eq) HS d
3) conc.HCI (6 eq) Alloc 3) conc.HCI (6 eq) Alloc
^ · 8 Alloc= -COOCH2CH=CH2 ^ · 8 Alloc = -COOCH2CH = CH2
(1) 7の合成 (化合物 (V— a)の結晶) (1) Synthesis of 7 (Crystal of Compound (V—a))
特開平 5— 294970号に記載の方法または上記ルートで合成した化合物 6 26.7 g (0.1 mol, 97.1%純度)、 H NSO NHBoc (Boc= t—ブトキシカルボ-ル) 26.49 g (1.35Compound synthesized by the method described in JP-A-5-294970 or the above route 6 26.7 g (0.1 mol, 97.1% purity), H NSO NHBoc (Boc = t-butoxycarbol) 26.49 g (1.35
2 2 twenty two
eq)、および PPh (トリフエ-ルホスフィン) 32 g (1.22 eq)を含有する酢酸ェチル 400 ml eq), and 400 ml of ethyl acetate containing 32 g (1.22 eq) of PPh (triphenylphosphine)
3 Three
溶液に、 DIAD (ジェチルァゾジカルボキシレート) 23.63 g (1.2 eq)を室温下、 30分 間で滴下した。同温度にて 16時間攪拌後、酢酸ェチルを減圧下留去し、トルエン 10 0 mlに置換する。析出した DIADの還元体を濾別して、減圧濃縮した。残渣をシリカゲ ルクロマトに付し、 n—へキサン―酢酸ェチル 2:1の溶出部を濃縮して目的物 7 48.. 5 gを得た。ェチルエーテルより結晶化して、 27.12 g (62%)の結晶を得た。 To the solution, 23.63 g (1.2 eq) of DIAD (jetylazodicarboxylate) was added dropwise at room temperature over 30 minutes. After stirring at the same temperature for 16 hours, the ethyl acetate is distilled off under reduced pressure and replaced with 100 ml of toluene. The precipitated reduced form of DIAD was filtered off and concentrated under reduced pressure. The residue was subjected to silica gel chromatography, and the eluate of n- hexane-ethyl acetate 2: 1 was concentrated to obtain 48..5 g of the intended product. Crystallization from ethyl ether gave 27.12 g (62%) of crystals.
Mp. 115。 Mp. 115.
Anal for C H N O S (FW 437.53), Calcd.; C, 43.92, H, 6.22, N, 9.60, S, 14.66 Anal for C H N O S (FW 437.53), Calcd .; C, 43.92, H, 6.22, N, 9.60, S, 14.66
16 27 3 7 2 16 27 3 7 2
Found; C, 43.87, H, 6.20, N, 9.67, S, 14.37 Found; C, 43.87, H, 6.20, N, 9.67, S, 14.37
JH NMR(CDC1 ): δ 1.51 (s, 9H), 2.34 (s, 3H), 2.53 - 2.63 (m, 1H), 3.19-3.25 (m, 1 J H NMR (CDC1): δ 1.51 (s, 9H), 2.34 (s, 3H), 2.53-2.63 (m, 1H), 3.19-3.25 (m, 1
3 Three
H), 3.57-3.63 (m, 1H), 3.90—4.04 (m, 2H), 4.20-4.27 (m,3H), 4.52-4.54 (m, 3H), 5. 21-5.32 (m, 3H), 5.82—5.96 (m, 4H) H), 3.57-3.63 (m, 1H), 3.90—4.04 (m, 2H), 4.20-4.27 (m, 3H), 4.52-4.54 (m, 3H), 5.21-5.32 (m, 3H), 5.82—5.96 (m, 4H)
λ MeOH ε (nm); 4,310 (231) λ MeOH ε (nm); 4,310 (231)
max max
v Nuio1 3374, 3195, 1721, 1678 cm—1 v Nuio1 3374, 3195, 1721, 1678 cm— 1
max max
[ a ] 22° +4.6 + 0.5。 , [ a ] 22° +1.2 + 0.4。 (Me〇H, C = 1.001%) [a] 22 ° +4.6 + 0.5. , [A] 22 ° +1.2 + 0.4. (Me〇H, C = 1.001%)
365 436 365 436
粉末 X線回折データを図 4に示す。ピーク番号 23のピークは測定時に使用したアル ミ由来のピークである。 Fig. 4 shows the powder X-ray diffraction data. The peak with peak number 23 is the peak derived from the aluminum used in the measurement.
(2) 6から 8の合成 (化合物 (VI— a)の結晶) (2) Synthesis of 6 to 8 (crystal of compound (VI—a))
化合物 6 26.48 g (0.1 mol, 94%純度), H NSO NHBoc 24.89 g (1.35 eq), PPh 29. Compound 6 26.48 g (0.1 mol, 94% purity), H NSO NHBoc 24.89 g (1.35 eq), PPh 29.
2 2 3 2 2 3
57g (1.2 eq)との酢酸ェチル 244 ml溶液に、 DIAD 22.80 g (1.2 eq)を室温下、 30分 間で滴下した。同温度にて 16時間攪拌後、酢酸ェチルを減圧下留去し、メタノール 2 60 mlに溶解した。メタンスルホン酸 3.8 ml (1.0 eq)を加え、 65-70°Cで 4時間攪拌した 。冷却後、溶媒を留去して 0.5N NaOH溶液 260 ml (2.2 eq)に加え、酢酸ェチル 260 mlにて 2回洗浄する。各々の酢酸ェチル層より 0.5N NaOH溶液 234 ml (2 eq)にて逆 抽出した。水層を合併、塩酸で酸性として、酢酸ェチル 260 mlで 2回抽出した。水 13 0 mlで洗浄後、合併、 Na SOで乾燥後減圧下溶媒を濃縮し 8の結晶 6.61 g (66.1%)を なおメタンスルホン酸の代わりに塩酸水、塩酸/メタノール溶液を用いても同様の結 果が得られた。 To a 244 ml solution of 57 g (1.2 eq) of ethyl acetate, 22.80 g (1.2 eq) of DIAD was added dropwise at room temperature over 30 minutes. After stirring at the same temperature for 16 hours, ethyl acetate was distilled off under reduced pressure and dissolved in 260 ml of methanol. Methanesulfonic acid (3.8 ml, 1.0 eq) was added, and the mixture was stirred at 65-70 ° C for 4 hours. After cooling, distill off the solvent, add to 260 ml (2.2 eq) of 0.5N NaOH solution and wash twice with 260 ml of ethyl acetate. Back extraction was performed from each ethyl acetate layer with 234 ml (2 eq) of 0.5N NaOH solution. The aqueous layers were combined, acidified with hydrochloric acid, and extracted twice with 260 ml of ethyl acetate. After washing with 130 ml of water, merge, dry with Na 2 SO and concentrate the solvent under reduced pressure to obtain 6.61 g (66.1%) of 8 crystals. Similar results were obtained when hydrochloric acid water or hydrochloric acid / methanol solution was used instead of methanesulfonic acid.
Mp. 107-109°C Mp. 107-109 ° C
Anal for C H N O S (FW 295.38), Calcd.; C, 36.60, H, 5.80, N, 14.23, S, 21.71 Anal for C H N O S (FW 295.38), Calcd .; C, 36.60, H, 5.80, N, 14.23, S, 21.71
9 17 3 4 2 9 17 3 4 2
Found; C, 36.58, H, 5.75, N, 14.14, S, 21.82 Found; C, 36.58, H, 5.75, N, 14.14, S, 21.82
1H NMR(CDC1 ): δ 1.72-1.74 (m, 2H), 2.55 - 2.64 (m, 1H), 3.11-3.22 (m, 1H), 3.2 1H NMR (CDC1): δ 1.72-1.74 (m, 2H), 2.55-2.64 (m, 1H), 3.11-3.22 (m, 1H), 3.2
3 Three
4-3.35 (m, 2H), 3.41—3.49 (m, 1H), 4.02—4.09 (m,2H), 4.58—4.60 (m, 2H), 4.71 (3, 2H), 5.24-5.35 (m, 2H), 5.87—6.00 (m, 2H) 4-3.35 (m, 2H), 3.41—3.49 (m, 1H), 4.02—4.09 (m, 2H), 4.58—4.60 (m, 2H), 4.71 (3, 2H), 5.24-5.35 (m, 2H ), 5.87—6.00 (m, 2H)
[ a ] 23° -49.7 + 0.9。 (MeOH, C = 1.004%) [a] 23 ° -49.7 + 0.9. (MeOH, C = 1.004%)
D D
粉末 X線回折データを図 3に示す。ピーク番号 20のピークは測定時に使用したアル ミ由来のピークである。 Figure 3 shows the powder X-ray diffraction data. The peak with peak number 20 is the peak derived from the aluminum used in the measurement.
(3) 7から 8の合成 (3) Synthesis of 7 to 8
結晶体 7 7.5 g (17.14 mol)のメタノール 15 ml溶液に室温下、 2.26 N HC1 /メタノ ール溶液 30.34 ml (4 eq)を加え、 40°Cにて 4.5時間攪拌した。冷却後、 10% NaOH水 溶液で pH 2.5として塩祈し、酢酸ェチル 50 mlで 3回抽出した。各酢酸ェチル層は、 6 %食塩水 38 mlで 3回洗浄した。酢酸ェチル層を合併し、 NaSO乾燥後、溶媒を濃縮、 To a solution of 77.5 g (17.14 mol) of crystals in 15 ml of methanol was added 30.34 ml (4 eq) of a 2.26 N HC1 / methanol solution at room temperature, and the mixture was stirred at 40 ° C for 4.5 hours. After cooling, the mixture was salted with 10% NaOH aqueous solution to pH 2.5 and extracted three times with 50 ml of ethyl acetate. Each ethyl acetate layer was washed 3 times with 38 ml of 6% saline. Merged with ethyl acetate layer, dried NaSO, concentrated solvent,
4 Four
酢酸ェチル -トルエン系より結晶化し、 8 4.77 g (94.2%)を得た。 Crystallization from the ethyl acetate-toluene system gave 84.77 g (94.2%).
Claims
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| CA2596951A CA2596951C (en) | 2005-02-15 | 2006-02-14 | Process for production of carbapenem derivative and crystalline intermediate therefor |
| EP20060713624 EP1852436A4 (en) | 2005-02-15 | 2006-02-14 | Process for production of carbapenem derivative and crystalline intermediate therefor |
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| WO2010097686A1 (en) * | 2009-02-26 | 2010-09-02 | Orchid Chemicals & Pharmaceuticals Ltd | An improved process for the preparation of carbapenem antibiotic |
| US8822445B2 (en) * | 2010-06-03 | 2014-09-02 | Xuanzhu Pharma Co., Ltd. | Crystalline form of carbapenem derivative or its hydrates and preparation methods and uses thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05294970A (en) * | 1991-08-20 | 1993-11-09 | Shionogi & Co Ltd | Pyrrolidylthiocarbapenem derivative |
| JP2003026680A (en) * | 2001-05-10 | 2003-01-29 | Shionogi & Co Ltd | Method for producing acetylthiopyrrolidine derivative |
| WO2004072073A1 (en) * | 2003-02-14 | 2004-08-26 | Shionogi & Co., Ltd. | Crystal of intermediate for carbapenem |
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| US5539102A (en) * | 1992-02-21 | 1996-07-23 | Shionogi Seiyaku Kabushiki Kaisha | Production method for sulfamide |
| US5872250A (en) | 1997-07-30 | 1999-02-16 | Merck & Co., Inc. | Process for synthesizing carbapenem antibiotics |
-
2006
- 2006-02-14 WO PCT/JP2006/302482 patent/WO2006087996A1/en not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05294970A (en) * | 1991-08-20 | 1993-11-09 | Shionogi & Co Ltd | Pyrrolidylthiocarbapenem derivative |
| JP2003026680A (en) * | 2001-05-10 | 2003-01-29 | Shionogi & Co Ltd | Method for producing acetylthiopyrrolidine derivative |
| WO2004072073A1 (en) * | 2003-02-14 | 2004-08-26 | Shionogi & Co., Ltd. | Crystal of intermediate for carbapenem |
Non-Patent Citations (1)
| Title |
|---|
| NISHINO Y. ET AL.: "Practical Large-Scale Synthesis of Doripenem: A Novel 1beta-Methylcarbapenem Antibiotic", ORGANIC PROCESS RESEARCH & DEVELOPMENT, vol. 7, no. 6, 2003, pages 846 - 850, XP002396087 * |
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| EP1852436A4 (en) | 2010-02-24 |
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