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WO2006053705A1 - Procede pour proteger un miroir metallique contre la degradation et miroir metallique - Google Patents

Procede pour proteger un miroir metallique contre la degradation et miroir metallique Download PDF

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Publication number
WO2006053705A1
WO2006053705A1 PCT/EP2005/012197 EP2005012197W WO2006053705A1 WO 2006053705 A1 WO2006053705 A1 WO 2006053705A1 EP 2005012197 W EP2005012197 W EP 2005012197W WO 2006053705 A1 WO2006053705 A1 WO 2006053705A1
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Prior art keywords
layer
metal
mirror
protective layer
aluminum
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German (de)
English (en)
Inventor
Christoph Zaczek
Alexandra Pazidis
Jens Ullmann
Angelika MÜLLENDER
Markus Haidl
Horst Feldermann
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/283—Interference filters designed for the ultraviolet
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer

Definitions

  • the invention relates to a method for protecting a Metall ⁇ mirror for ultraviolet radiation having wavelengths 120 nm ⁇ ⁇ 260 nm against degradation of reflection properties by environmental influences and on a dielectrically protected by this method metal mirror.
  • mirrors are used that are as high as possible for the intended wavelength and angular range due to the principle of operation or space Reflectivity for the ultraviolet radiation used.
  • the reflectivity which is usually represented by the reflectance R, ie the ratio of reflected intensity to incident intensity, should not change significantly over the period of use of the optical system.
  • Such mirrors are often referred to as “broadband mirrors.” Widebandness in the angular space is desired, for example, for deflecting mirrors in optical systems for microlithography operated with high aperture, in order to avoid that the reflectivity for different beams of a high-aperture radiation beam differs significantly With deflecting mirrors in spectrophotometers the demand for a broadband in the wavelength range is in the foreground, where in certain applications mirrors with a high and constant reflectivity from about 120 nm to the near Infrared area needed at about 1 micron.
  • Metal mirrors can basically fulfill the requirement for broadband in wavelength and angular space.
  • a metal mirror in the sense of this application has a substrate and a mirror layer applied thereon with a reflective metal layer, which makes the essential contribution to the reflectivity of the metal mirror.
  • metal layers are used which essentially consist of aluminum. This material has the highest reflectivity in the ultraviolet range.
  • conventional metal mirrors are dielectrically protected with aluminum by applying to the aluminum layer a protective layer of a dielectric material transparent to the radiation to be reflected which is intended to protect the metal mirror against degradation.
  • DUV deep UV range
  • MgF 2 single layers of magnesium fluoride
  • EP 0 939 467 A2 proposes to construct a broadband ultraviolet metal mirror in angular space by providing a dielectric multilayer on an opaque aluminum layer ⁇ layer system is applied with alternating layers of low-refractive and high-refractive dielectric optical material in which the optical layer thicknesses of the individual layers meet certain Be ⁇ conditions.
  • lanthanum fluoride (LaF 3 ) or neodymium fluoride (NdF 3 ) are preferred, as low-refractive materials magnesium fluoride (MgF 2 ) or silicon dioxide (SiO 2 ).
  • metal mirrors with an aluminum layer and a dielectric single layer applied thereon are described whose layer thickness fulfills certain requirements.
  • Suitable materials for the single layer are magnesium fluoride (MgF 2 ), aluminum fluoride (AIF 3), chiolite (Na 5 Al 3 Fi 4 ), cryolite (Na 3 AIF 6 ), gadolinium fluoride (GdF 3 ), silicon dioxide (SiO 2 ), hafnium dioxide (HfO 2 ), alumina (Al 2 O 3 ), lanthanum fluoride (LaF 3 ) or erbium fluoride (ErF 3 ).
  • the invention also relates to a mirror for ultraviolet light having a wavelength ⁇ ⁇ 220 nm, in particular for use in a microlithography projection exposure apparatus, and to a method for producing such a mirror.
  • High-reflectance mirrors for the deep ultraviolet light region with wavelengths less than 220 nm are required, for example, in microlithography projection exposure equipment.
  • planar deflecting mirrors in the lighting system may be useful for space reasons.
  • projection lenses they can also be used as a folding mirror and / or in connection with a geometric beam splitter can be used.
  • concave mirrors are also required, which should have high reflectivities over a wide range of incidence angles. The ability of a mirror to provide a high reflectance over a wide angle of incidence range is referred to herein as broadband.
  • the optical components used provide their optical properties over a long life without significantly affecting their functionality. Since in the field of microlithography predominantly excimer lasers with operating wavelengths of 248 nm, 193 nm or 157 nm are used as light sources in the DUV range, the resistance to radiation-induced degradation is also referred to as "laser resistance”.
  • laser-resistant broadband mirrors are required for energy densities of up to about 10 mJ / cm 2 . It has been found that the necessary broadband capability can be achieved with mirrors in which a multilayer reflective coating is applied to a substrate which comprises an aluminum layer and a dielectric layer with one or more individual layers applied to the aluminum layer.
  • the reflectance of aluminum as a function of the angle of incidence shows a small variation due to a small sp splitting. This applies down to wavelengths of about 90 nm (plasma edge or plasma frequency of the electron gas).
  • the dielectric layer applied to the aluminum layer can serve as a reflection-enhancement layer and often also has a protective function in order to protect the aluminum against degradation by oxidation.
  • mirror substrate materials with low thermal expansion coefficient used such as glass, ceramic materials, such as the well-known under the brand name Zerodur ® glass ceramic of the company.
  • US Pat. No. 6,310,905 B1 discloses high-reflection mirrors for a wavelength of 193 nm, which have a substrate and a multilayer reflective coating applied to the substrate with an aluminum layer and a multi-layered dielectric layer arranged on the aluminum layer.
  • the layer following the aluminum layer in all embodiments consists of magnesium fluoride with a relatively small optical layer thickness between 0.125 ⁇ and 0.175 ⁇ , where ⁇ is the operating wavelength of the mirror.
  • a multilayer Matt Schweizer ⁇ system is arranged with individual layers of high refractive index lanthanum fluoride and low refractive index magnesium fluoride, wherein the optical layer thicknesses are each in the range between 0.25 ⁇ and 0.35 ⁇ .
  • the individual layers of the multilayer reflective coating should be able to be applied by any common coating method.
  • FIG. 7 Another conventional mirror is described in connection with FIG. 7, which has a substrate, an aluminum layer applied to the substrate and a dielectric layer of magnesium fluoride with a layer thickness of 15 nm, which is applied to the aluminum layer.
  • a mirror with a single layer of magnesium fluoride is a stronger polarization-dependent Splitting the reflectance and thus have a total gerin ⁇ cal reflectance and beyond lower laser resistance.
  • US Pat. No. 4,714,308 describes ultraviolet levels for wavelengths between 150 and 300 nm, in which an aluminum layer, a magnesium fluoride layer and, on this, a lanthanum fluoride / magnesium fluoride alternating layer system are applied.
  • the magnesium fluoride layer lying directly on the vapor-deposited aluminum layer is relatively thick with an optical layer thickness of 0.75 ⁇ and should act as a protective layer due to its thickness.
  • Patent EP 0 280 299 B1 (corresponding to US Pat. No. 4,856,019) describes ultraviolet light mirrors which should have sufficient laser resistance at wavelengths of about 308 nm, 248 nm or 193 nm.
  • a multilayer reflective coating applied to a substrate consists of an aluminum layer and a multilayer dielectric layer applied thereto which, with the exception of the outermost layer of quarter wavelength layers (optical layer thickness about 0.25 ⁇ ), consists of alternately high-refractive and low-refractive layers. consists of dielectric materials. The two outer layers are half-wavelength layers (optical layer thickness ⁇ / 2).
  • the alternate layer package is a 1 mm thick, single-crystal plate of calcium fluoride attached as a protective plate.
  • the mirrors are intended for use within an excimer laser and must ensure effective heat dissipation.
  • Preferred substrates of refractory metallic or ceramic materials have a high thermal conductivity and at the same time a relatively low thermal expansion coefficient.
  • a metal mirror for ultraviolet radiation having wavelengths of 120 nm ⁇ ⁇ 260 nm against degradation of environmental reflection properties
  • a metal mirror comprises a substrate and a mirror layer having a reflective layer deposited thereon
  • Metal layer comprises and the method comprises the following step: Coating the mirror layer with a protective layer consisting essentially of chiolite.
  • a dielectrically protected metal mirror for ultraviolet radiation having wavelengths 120 nm ⁇ ⁇ 260 nm comprising: a substrate; a mirror layer applied to the substrate with a reflective metal layer; and a protective layer applied on the mirror layer and consisting essentially of chiolite.
  • chiolite for producing a dielectric protective layer for protecting a metal mirror for ultraviolet radiation having wavelengths of 120 nm ⁇ ⁇ 260 nm against degradation of Reflexionseigenschaf ⁇ th by environmental influences is provided.
  • the invention comprises a method for protecting a metal mirror for ultraviolet radiation having wavelengths of 120 nm ⁇ ⁇ 260 nm against degradation of environmental reflection properties, wherein a metal mirror comprises a substrate and a mirror layer having a reflective metal layer deposited thereon, with the following Steps: coating the mirror layer with a protective layer, which consists essentially of a protective layer material having a melting point T m ⁇ 1100 ° C, wherein the protective layer is applied at a coating temperature between 20 ° C and 150 ° C.
  • a coating of the mirror layer is carried out with a protective layer consisting essentially of chiolite (Na 5 Al 3 Fi 4 ).
  • a protective layer consisting essentially of chiolite (Na 5 Al 3 Fi 4 ).
  • the chemical-physical properties are determined by this low-index fluoride material whose refractive index is slightly lower than the refractive index of magnesium fluoride.
  • the inventors have extensively determined that in conventional, dielectrically protected aluminum mirrors in which protective layers of magnesium fluoride or silicon dioxide were applied at typical coating temperatures below 100 ° C, the protective layer structure was relatively porous.
  • the porous protective layers prolonged storage resulted in a layer contamination of the porous protective layer, e.g. observed by absorption of water and / or hydrocarbons. This contamination is accounted for by the decrease in reflectivity observed at longer wavelengths at wavelengths below about 190 nm, with the extent of this degradation increasing with decreasing wavelength.
  • a partially irreversible fraction of the degradation is attributed to thermal or photoinduced (in particular at wavelengths ⁇ ⁇ 200 nm) oxidation of the aluminum at the interface between protective layer and aluminum-metal layer. Below about 180 nm wavelength, a relatively low reflectance was also observed for unpolarized light.
  • chiolite-protected aluminum mirrors with a thermally evaporated aluminum layer showed less incorporation of water and hydrocarbons even with layers applied at room temperature.
  • a significantly lower degradation was observed compared to conventional coatings of chiolite-protected metal mirrors, in particular those with an aluminum layer.
  • metal mirrors protected according to the invention have better stability against ultraviolet radiation at low energy densities of less than 0.1 mJ / cm 2 than the aforementioned conventional, dielectrically protected metal mirrors. This is attributed to the lower degree of contamination.
  • a “metal layer” is formed by a material having a predominantly metallic character, for example in terms of electrical conductivity
  • a metal layer may in particular consist of a pure metal (essentially only one type of metal atom), a metal alloy having at least two types of metal atom or a semimetal, eg Silicon, exist.
  • a metal layer is preferably applied, which consists essentially of aluminum.
  • Their layer thickness should be designed such that the metal layer is impermeable to the used ultraviolet radiation.
  • Typical layer thicknesses may be in the range of 50 nm or above, for example between 60 nm and 100 nm. At layer thicknesses ⁇ 60 nm, an increase in transparency was occasionally observed. Layer thicknesses> 100 nm tend to increase the proportion of scattered light, which is attributed to polycrystalline growth and associated layer roughness.
  • the protective layer protected mirror is additionally reinforced with a multilayer dielectric system of high refractive and relatively low refractive dielectric materials which may be alternately stacked.
  • the multilayer system lies on top of the protective layer and can be designed to increase the reflection optically. It can comprise more than two individual layers, for example more than 4 or more than 6 individual layers.
  • chiolite as Schutz Mrs ⁇ material for mirrors with metal layers, in particular of aluminum
  • protective layers can be produced with excellent protection even at a low cost feasible coating at room temperature. It has been found that it is possible to apply this protective layer to the mirror layer at coating temperatures of up to a maximum of 150 ° C. Higher Beschich ⁇ processing temperatures, for example between 100 0 C and 150 0 C can be advantageous to metal mirror with a particularly low Degra ⁇ dationsne Trent obtain. This is attributed to the fact that increasing the coating temperature can increase the density of the protective layer or reduce its porosity, resulting in a reduction in the susceptibility to contamination.
  • the layer thickness of the protective layer should be chosen so that the intended protective effect is reliably ensured.
  • geometric layer thicknesses d of more than 15 nm or more than 30 nm may be advantageous.
  • an ultraviolet light mirror having a wavelength of less than 220 nm has a substrate and a multi-layer reflective coating mounted on the substrate, comprising an aluminum layer and a dielectric layer disposed on the aluminum layer. Between the substrate and the aluminum layer, an intermediate layer is arranged.
  • the interlayer if properly designed, can have a reflection-enhancing effect. Investigations show that, at least for certain substrate materials, negative influences of the substrate material on the reflectivity, in particular of the aluminum layer, through the intermediate layer can be reduced or avoided.
  • the intermediate layer consists of a material which has a specific thermal conductivity which is greater than the specific thermal conductivity of the substrate.
  • the aluminum layer is applied by sputtering.
  • a target of the material to be deposited is subjected to strong bombardment of ions in order to knock out particles from the target material, which then precipitate on the suitably positioned substrate.
  • the intermediate layer consists of a material which has a lattice structure which has a slight mismatch with respect to the lattice structure of aluminum.
  • a suitably low mismatch possibly promotes an oriented growth, which has an advantageous effect on the reflection properties of the applied aluminum layer.
  • an intermediate layer of a metallic material is provided. It can be a pure metal layer or an alloy.
  • the intermediate layer may also contain or consist of a transition metal.
  • the intermediate layer consists of a single layer of suitable thickness.
  • the intermediate layer can also be constructed as a multilayer with at least two individual layers in order to achieve a stepwise adaptation between the properties of the substrate and a surface favorable for the application of the aluminum layer.
  • Favorable layer thicknesses of the intermediate layer may be in the range between approximately 2 and approximately 1000 nm, in particular between approximately 3 and approximately 100 nm.
  • the intermediate layer consists essentially of tantalum. This metallic material ensures i.a. a sufficiently good heat dissipation.
  • a barrier layer made of a dielectric barrier layer material is applied to the aluminum layer in accordance with a further development.
  • Material, layer thickness and morphology of the barrier layer are chosen so that a diffusion of O 2 - and H 2 O molecules through the barrier layer to the interface zwi ⁇ 's barrier layer and aluminum is effectively inhibited.
  • an oxidic material is particularly suitable as barrier layer material.
  • Particularly favorable is the use of silicon dioxide (SiO 2 ), since it can be used down to about 150 nm wavelength as a low refractive index material in interference layer systems.
  • the barrier layer consists essentially of ion-sputtered or ion-supported silicon dioxide. In the case of ion-supported deposition or ion sputtering of silicon dioxide, the packing density of the material deposited can be significantly increased, thereby promoting its suitability as a diffusion barrier.
  • geometric layer thicknesses of the barrier layer of more than 5 nm are usually necessary in order to allow sufficient diffusion inhibition.
  • silicon dioxide has an absorbing effect at this wavelength, so that the layer thickness can not be arbitrarily increased without impairing the optical properties and the susceptibility to heating.
  • the aluminum layer can be applied by any suitable coating method. However, it has been shown that when the aluminum layer is produced by means of ion beam sputtering, the susceptibility to oxidation is reduced and the reflectivity of the aluminum layer can be increased, at least for longer lifetimes.
  • the dielectric layer applied to the aluminum layer comprises a dielectric alternating-layer system with individual layers of alternatingly high-refractive and low-breaking dielectric material.
  • the dielectric materials should be selected to be at the intended operating wavelength are substantially free of absorption.
  • Each of the low-index layers may contain, depending on the operating wavelength, one of the following materials, exclusively or in combination with other materials of this group: magnesium fluoride (MgF 2 ), aluminum fluoride (AIF 3 ), chiolite, cryolite, silicon dioxide (SiO 2 ).
  • Each of the high-index layers can contain one of the following materials exclusively or in combination with other materials of this group: lanthanum fluoride (LaF 3 ), gadolinium fluoride (GdF 3 ), erbium fluoride (ErF 3 ), aluminum oxide (Al 2 O 3 ), Lead fluoride (PbF 3 ), neodymium fluoride (NdF 3 ).
  • LaF 3 lanthanum fluoride
  • GdF 3 gadolinium fluoride
  • ErF 3 erbium fluoride
  • Al 2 O 3 aluminum oxide
  • PbF 3 Lead fluoride
  • NdF 3 neodymium fluoride
  • a magnesium fluoride / lanthanum fluoride alternating layer system is provided.
  • an aperiodic layer sequence of the individual layers of the alternating layer system is provided.
  • layer materials with different absorption represented by the absorption coefficient k
  • At least three successive individual layers of more strongly absorbing material have optical layer thicknesses which decrease with the distance of the individual layer from the substrate. This preferably applies to all Single layers of the more absorbent material.
  • at least three successive individual layers of the less strongly absorbing material eg LaF 3
  • layer thicknesses which increase with increasing distance from the substrate It may be favorable if this again applies to all individual layers of the less strongly absorbing material.
  • the invention also relates to a method for producing a mirror for ultraviolet light having a wavelength ⁇ ⁇ 220 nm, which has a substrate and a multi-layer reflective coating applied to the substrate, which comprises an aluminum layer and a dielectric layer arranged on the aluminum layer.
  • an intermediate layer is first applied to the substrate before the aluminum layer is applied to the intermediate layer.
  • the aluminum layer can be applied by any PVD method.
  • any suitable method can be used, in particular sputtering or ion-assisted deposition.
  • a barrier layer made of a dielectric barrier layer material is applied to the aluminum layer in such a way that a diffusion of oxygen or water molecules to the substrate surface of the aluminum layer is effectively inhibited by the barrier layer.
  • the deposition may be by ion sputtering or ion assisted deposition. It is favorable to deposit an oxidic, dielectric material, in particular silicon dioxide.
  • FIG. 1 shows a schematic section through an embodiment of a metal mirror according to the invention with a substrate, an aluminum layer applied directly to the substrate and a protective layer of chiolite applied directly to the aluminum layer;
  • FIG. 2 shows a diagram of the wavelength dependence of the degree of reflection R for unpolarized radiation at an incidence angle of 7 ° for a mirror according to the invention and for a reference sample REF with a protective layer of magnesium fluoride;
  • FIG. 5 shows a diagram of the wavelength dependence of the degree of reflection of a mirror according to the invention directly after
  • Fig. 8 is a graph showing the wavelength dependency of the unpolarized reflectance of an aluminum mirror provided with a chiolite protective layer immediately after coating (dashed line) and after prolonged irradiation (solid line);
  • Fig. 9 shows an infrared spectrum of a chiolite protective layer-coated silicon dioxide substrate without measurable water incorporation
  • FIG. 10 shows a plot of the angle of incidence dependence of the unpolarized reflectance of an aluminum mirror comprising a protective layer of alumina and a magnesium fluoride / alumina alternating layer stack applied thereto, immediately after coating (dashed line) and after intense laser irradiation
  • FIG. 11 shows a schematic representation of a catadioptric projection objective with polarization-selective beam splitter and a deflecting mirror according to an embodiment of the invention
  • FIG. 12 shows a diagram for illustrating the laser resistance of a conventional aluminum broadband mirror protected with a single layer of magnesium fluoride as a function of the wavelength
  • Fig. 13 is a graph showing the reflectance for p-polarized light of a wide-area dielectric-reinforced aluminum broadband mirror depending on the substrate material;
  • FIG. 14 shows a schematic representation of a layer structure of an embodiment of the mirror according to the invention, which is designed for optimal reflection of p-polarized ultraviolet light with a wavelength of 157 nm;
  • Fig. 15 is a diagram for explaining the laser resistance of an aluminum mirror having an approximately 5 nm thick protective layer of silicon dioxide;
  • Fig. 16 is a diagram for explaining the laser resistance of an aluminum mirror having a thickness of about 15 nm
  • Fig. 17 is a diagram for explaining the reflectance of an aluminum broadband mirror with and without reflection-enhancing intermediate layer.
  • Fig. 18 shows for the embodiment in Fig. 14 the dependence of the reflectance for p-polarized light on the angle of incidence of the incident radiation.
  • a first aspect of the invention is explained below with reference to a broadband aluminum mirror, which serves as a deflection mirror in a UV spectrophotometer is provided and for a wavelength range from about 120 nm to about 400 nm, a sufficiently high, as constant as possible reflectance for unpolarized ultraviolet light should have.
  • FIG. 1 shows a schematic section through an embodiment of a metal mirror according to the invention, in which a reflective metal layer of aluminum (Al) is applied directly on a planar substrate surface of a substrate S.
  • a single layer of chiolite (Na 5 AbFi 4 ) is applied directly to the aluminum layer.
  • n and k are given for 155 nm and 198 nm for aluminum, the low refractive index fluoride material Chiolith and the low refractive index fluoride material magnesium fluoride used in reference systems REF.
  • a reference sample REF was prepared by applying instead of the single layer of chiolite a single layer of magnesium fluoride with a geometric layer thickness of 37 nm by thermal evaporation.
  • the optical properties of the reference system REF are practically identical above 160 nm. It turns out, however, that despite virtually identical optical parameters of the magnesium fluoride below 160 nm, there is a clear drop in the reflectance down to about 85% at 140 nm.
  • a first advantage of protective coatings of chiolite is thus that, in comparison to magnesium fluoride below about 160 nm, despite almost identical optical properties, significantly better degrees of reflection can be achieved, at least for unpolarized light.
  • This difference is attributed to the fact that the MgF 2 layer which has been thermally evaporated at relatively low coating temperatures has a relatively porous layer structure which renders the layer susceptible to contamination with water and hydrocarbons, the contamination again causing the degradation of the reflectance.
  • the chiolite protective layer grows much denser at the same absolute coating temperatures and thus less porous so that the susceptibility to contamination is much lower than with MgF 2 , which in turn leads to more stable and better reflecting levels.
  • FIGS. 3 and 4 show the results of storage experiments in which dielectrically protected aluminum mirrors according to the invention as well as reference mirrors with MgF 2 protective layer were exposed to the normal ambient atmosphere for many months.
  • FIG. 3 shows the results for two differently prepared, dielectrically protected aluminum mirrors according to one embodiment of the invention.
  • T 150 ° C.
  • reference sample REF showed a large decrease in unpolarized reflectance after 15 months storage, especially at wavelengths below 180 nm. It is assumed that the local minimum of unpolarized reflection for the magnesium fluoride-protected aluminum mirror is about 170 nm by absorption the radiation is caused in contaminations which have penetrated into the protective layer over the period of storage. Here, in particular the Kontamina ⁇ tions with water and hydrocarbons is considered critical. Also, the strong decrease of the reflectance below about 150 nm is attributed to this absorption of contaminants. The abovementioned absorption bands, the strength of which increases with storage, can already be recognized during the measurement directly after the coating in the course of the curve.
  • FIGS. 5-7 show the results of chiolite-protected aluminum mirrors and Figure 7 shows the results for a reference mirror with magnesium fluoride protective layer.
  • Fig. 5 shows the results for an intensive, high-energy irradiation, in which a mirror 202.5 hours with a continuous beam 172 nm ultraviolet lamp at a power density of about 0.031 W / cm 2 and pulsed with 10 million pulses at 157 nm was irradiated with 1 mJ / cm 2 per pulse.
  • a significant effect of this irradiation with relatively high energy densities there is a reflection decrease at wavelengths of less than about 160 nm. At higher wavelengths, however, virtually no degradation of the reflectivity is observed.
  • the layers are at relatively low energy densities of the radiation resistant to radiation-induced degradation. It turns out that no significant degradation of the reflectivity occurs over the entire wavelength range between 135 nm and 230 nm after irradiation with 48 million pulses at 0.02 mJ / cm 2 . The experiments show that only at high energy densities of 1 mJ / cm 2 per pulse a reflection decrease by UV irradiation occurs.
  • Metal mirrors protected according to the invention can therefore be used, for example, in optical systems for microlithography, for example within a projection objective, or within measuring devices.
  • FIG. 7 shows the results for the magnesium fluoride-protected reference sample at comparatively low energy densities of 0.02 mJ / cm 2 .
  • the sample was exposed to this energy density over 8 million pulses at 157 nm.
  • the magnesium fluoride-protected aluminum system below 180 nm exhibits much poorer laser resistance than a comparable system with a chiolite protective layer.
  • This demonstrates the superiority of chiolite protective coatings over conventional protective coatings, especially for applications at relatively low energy densities of less than 0.1 mJ / cm 2 .
  • the invention is not limited to the exemplary embodiments shown.
  • a dielectric alternating layer package comprising individual layers of alternating high refractive and relatively low refractive, transparent dielectric material by means of thermal evaporation and / or be applied by means of ion-supported coating or in another way.
  • low-dielectric materials such as magnesium fluoride (MgFa), aluminum fluoride (AIF 3 ), chiolite (Na 5 AIaFi 4 ), cryolite (Na 3 AIF 6 ), silicon dioxide (SiO 2 ) or lithium fluoride (LiF) in question.
  • MgFa magnesium fluoride
  • Al fluoride AIF 3
  • chiolite Na 5 AIaFi 4
  • cryolite Na 3 AIF 6
  • silicon dioxide SiO 2
  • LiF lithium fluoride
  • LaF 3 lanthanum fluoride
  • GadF 3 gadolinium fluoride
  • NdF 3 neodymium fluoride
  • alumina Al 2 O 3
  • ErF 3 erbium fluoride
  • Table 2 shows the layer parameters of a dielectrically reinforced aluminum mirror, in which a protective layer of chiolite with a geometric layer thickness of 24 nm was first applied to a 70 nm thick aluminum layer. Onto this protective layer, a dielectric alternating layer package having eight monolayers of high refractive index Al 2 O 3 and low refractive index chiolite was deposited such that the low refractive index chiolite layer (layer 2) is followed by the high refractive index alumina and the outermost layer adjacent to the surrounding area (layer 10). is formed by the low-refractive chiolite.
  • the parameters n and k for calculating the complex refractive index for 193 nm are also given.
  • the unpolarized reflection was used to characterize the laser resistance at an angle of incidence ⁇ of 10 ° for the wavelength range between 180 nm and 210 nm directly after coating (ie before laser irradiation) and after laser irradiation with 4.8 billion pulses at ca. 0.11 mJ / cm 2 corresponding to a laser dose of 0.54 MJ / cm 2 .
  • Fig. 8 shows the results.
  • the layer system has an unpolarized reflectance of approximately 94% at the useful wavelength 193 nm directly after coating, which increases to higher wavelengths up to approximately 96% and in Direction of lower wavelengths gradually falls.
  • the intense laser irradiation has led to a slight increase in the unpolarized reflectance of about 94% to about 97% (at 193 nm). This slight increase in reflectance is observed for the entire wavelength spectrum detected.
  • the dielectric reinforced protective layer system has thus not only prevented a degradation of the reflectance, but on the contrary allows a slight increase in the reflectance.
  • the increase in the reflectance is attributed to radiation-induced conditioning, especially of the alumina present in the layer system, as well as to a cleaning action by removal of residual hydrocarbons.
  • This conditioning manifests itself in a slight decrease in the absorption coefficient k and a slight increase in the refractive index and is attributed to the fact that the Al 2 O 3 , which is not yet stoichiometric in composition, under the influence of the high-energy laser radiation has a composition closer to the stoichiometric Composition receives.
  • laser irradiation induces chemical stabilization of the alumina in the direction of a more chemically stable compound. This effect can be used to stabilize the layer systems before their intended use by laser irradiation and to optimize their optical properties so that during normal use no significant changes in the optical properties more with aluminum oxide layers built-up layer systems (reflective layers or antireflection layers) occur.
  • a sample was prepared in which a 250 nm-thick single layer was applied to a synthetic quartz glass substrate (SiO 2 ) was applied from chiolite at a vaporization temperature of about 90 °. The sample was then checked for contamination by infrared spectroscopy. 9 shows an infrared spectrum in which the relative transmission (relative trans. [%]) Between the coated and uncoated substrate is plotted against the wavenumber WN [cm -1 ] The spectrum shows a pronounced minimum of the relative transmission at approx 3,670 cm "1 , which is caused by the silicon dioxide of the substrate.
  • this peak usually shows a peak caused by absorbed water in conventionally coated samples, whereas in the case of the chiolite-coated sample, no peak is observed at 3.350 cm -1 , so that a possibly in the Chiolith layer existing amount of water below the detection accuracy of infrared spectroscopy is. This indicates that any residual porosity in the chiolite layer is so slight that virtually no water is absorbed into the layer.
  • the exemplary embodiments show that a significant improvement in the long-term stability of dielectrically protected metal levels can be achieved by replacing the conventionally used protective layer material magnesium fluoride with chiolith.
  • a substantially better protective function of the protective layer can be achieved with substantially identical absolute coating temperatures, ie at the same substrate temperatures during the coating. This is attributed to the fact that chiolite layers compared to magnesium fluoride layers, which were deposited at substantially the same coating temperatures, a significantly higher material density (packing density) or have a significantly lower porosity, so that the susceptibility of the protective layer against contamination with water and hydrocarbons is reduced. This has been identified by the inventors as a major cause of the observed degradation in reflective properties of conventional magnesium fluoride-protected metal mirrors.
  • impurities are introduced during a coating process, it should be noted that large impurity concentrations tend to have the same effect as low substrate temperatures, so that the higher the impurity content in the layer material, the finer the real layer structure will be at a given coating temperature.
  • Protective layers for metal mirror can be produced by a
  • Protective layer material is used, which has a melting point, which is well below the melting point of magnesium fluoride. Particularly favorable expected protective layer materials having a melting point of less than 1100 0 C or less than 1050 ° C.
  • NaF sodium fluoride
  • T m 990 0 C 1 cryolite
  • T m 1000 0 C (according to the source above) or Thorium fluoride into consideration.
  • the invention thus also encompasses a method for protecting a metal mirror for ultraviolet radiation having wavelengths of 120 nm ⁇ ⁇ 260 nm against degradation of reflection properties by environmental influences, wherein a metal mirror surrounds a substrate and a mirror layer applied thereto with a reflective metal layer, with the following steps of coating the reflective layer is a protective layer, the loan in the materiality of a transparent dielectric protective layer material which has a melting point T m ⁇ 1100 has 0 C, wherein the protective layer is applied at a coating temperature between 20 0 C and 150 0 C.
  • a metal mirror with a substrate and a mirror layer having a reflective metal layer mounted thereon can also be protected against degradation of environmental reflection properties by coating the mirror layer with a protective layer and applying thereto a multilayer dielectric system of high refractive indexes relative low-dielectric materials is applied, which can be arranged alternately one above the other.
  • the multilayer system lies on top of the protective layer and can be designed to increase the reflection in terms of optics (reflection-enhancing).
  • protective layer materials may also include higher-melting layer materials, in particular aluminum oxide (Al 2 O 3 ) and silicon dioxide (SiO 2 ). It has been found that both materials are especially suitable for higher radiation loads, for example of 1 mJ / cm 2 or more.
  • aluminum oxide can therefore also be used as a protective layer on mirrors in an illumination system of a microlithography projection illumination system.
  • Table 3 shows the layer data of a dielectric-reinforced aluminum mirror for 193 nm.
  • a 70 nm-thick aluminum layer was applied as a mirror layer to a substrate made of calcium fluoride.
  • a substrate made of calcium fluoride.
  • an approximately 43.7 nm thick protective layer of aluminum oxide (Al 2 O 3 ) was vapor-deposited.
  • Al 2 O 3 aluminum oxide
  • MgF 2 / Al 2 O 3 interlayer package with a total of 18 alternating high-index and low-index single layers so that the outermost layer (layer 21) was formed by the low-refractive index magnesium fluoride.
  • the dashed curve shows the reflectance before irradiation and the solid curve the reflectance course after the irradiation.
  • the unpolarized reflectance immediately after coating was about 95%, while after irradiation it was over 98%.
  • this increase in the degree of reflection is attributed to the radiation-induced conditioning, in particular of the layer material aluminum oxide, and to a cleaning effect in which residual impurities, especially hydrocarbons, present in the layer due to the high-energy laser radiation are removed.
  • the problems with unprotected metal mirrors decrease in the reflectance could therefore not only prevented by the protective layer system, but on the contrary an improvement in the reflection properties can be achieved.
  • FIG. 11 shows in a highly schematic representation a catadioptric projection objective 10 for a microlithography projection exposure apparatus which operates with an F 2 excimer laser (operating wavelength about 157 nm) as the light source ,
  • the projection objective has a catadioptric objective part 13 with a polarization-selective beam splitter 14 and a concave mirror 15 and a dioptric objective part 16 behind the catadioptric objective part.
  • a flat deflecting mirror 20 for folding the beam path provided by about 90 °.
  • the ultraviolet light with which the reticle located in the object plane 11 is irradiated is initially s-polarized relative to the plane of the beam splitter surface 17 and is reflected by it in the direction of the concave mirror 15. After passing twice through a ⁇ / 4 retarder arranged between the beam splitter 14 and the concave mirror 15, the radiation is p-polarized relative to the beam splitter surface 17 and is p-polarized therefrom
  • Direction deflecting mirror 20 is transmitted.
  • the reflectance of the deflecting mirror 20 for p-polarized light should be relatively uniform and particularly high for the radiation incident from a certain angle of incidence range of approximately 45 °, in order to minimize light losses in the projection objective and to minimize an angle of incidence dependence of the transmission.
  • Such mirrors include a substrate and a multi-layer reflective coating disposed on the substrate comprising an aluminum layer and a dielectric layer disposed on the aluminum layer, which may have one or more discrete layers.
  • a known example is mirrors in which a protective layer of magnesium fluoride with an optical layer thickness of ⁇ / 2 is applied to the aluminum layer.
  • an aluminum layer was evaporated directly onto a substrate. Thereafter, the MgF 2 protective layer was evaporated.
  • the degree of reflection R was then measured on the one hand immediately after the coating and on the other hand after prolonged laser irradiation (8 million pulses with 0.02 mJ / cm 2 and wavelength 157 nm at 1 kHz pulse frequency).
  • FIG. 12 shows the measured reflectance R of the coating as a function of the wavelength ⁇ , the upper curve A showing the wavelength dependence immediately after the coating and the lower curve B the wavelength dependence after the irradiation. It can be seen that at wavelengths above 200 nm, the reflectance of the freshly coated mirror is only slightly (by about 1-2 percentage points) better than after the irradiation. At shorter wavelengths, however, a significant degradation (reduction of the Reflectance), for example, at 157 nm, the reflectance at freshly coated mirror is about 87%, after irradiation, however, only about 82%. This degradation limits the life of optical systems containing such mirrors.
  • mirror substrates are usually produced from substrate materials with a very low coefficient of thermal expansion.
  • substrate materials with a very low coefficient of thermal expansion Particularly suitable transparent glass-ceramic materials have been found that are available with typical thermal expansion coefficients in the range of 0 ⁇ 0.1 • 10 '6 / K (for the temperature range between 0 and about 50 0 C) and, for example, from the Fa Schott under the brand name ZERODUR ® .
  • Another suitable Substratmate ⁇ material with extremely low thermal expansion is sold under the name ULE TM Titanium silicate glass from.
  • Fig. 13 shows this example the dependence of the reflectivity R p for p-polarized light of wavelength ⁇ at an incidence angle I of 38 ° using a substrate of calcium fluoride (upper curve A) and in comparison with a substrate made of ZERODUR ® ( lower curve B). It can be seen that, for example, at 157 nm, differences in reflectance may be on the order of 10 percentage points or above.
  • the mirror 100 has a substrate 101 and a multi-layer reflective coating 102 mounted on the substrate.
  • This comprises an aluminum layer 103 and a dielectric layer 104 arranged on the aluminum layer, which in the example consists of 13 individual layers of different dielectric materials.
  • an intermediate layer 105 is arranged which, on the one hand, adjoins the substrate and, on the other hand, the aluminum layer.
  • the layer 106 closest to the substrate and applied directly to the aluminum layer is designed as a protective layer or barrier layer against diffusion of oxidizing molecules to the aluminum. Above this is a LaF 3 / MgF 2 interlayer package 107 with six layer pairs.
  • the mirror was fabricated without substrate cooling or substrate heating at ambient temperature.
  • the intermediate layer 105 is first applied to the optically microfabricated substrate surface.
  • the intermediate layer consists essentially borrowed from tantalum, which was applied by sputtering depending on the embodiment with layer thicknesses between about 3 nm and about 100 nm.
  • the aluminum layer 103 was also deposited by sputtering (ion beam assisted deposition). Typical layer thicknesses of preferred embodiments were between about 40 and about 100 nm, whereby larger and smaller layer thicknesses are also possible.
  • a single layer 106 of silicon dioxide was then applied, also by sputtering.
  • the layer 106 which serves as a barrier layer or protective layer against diffusion of oxidizing molecules, has a significantly higher packing density compared with vapor-deposited layers, so that a good inhibition of the diffusion of oxygen and water molecules is ensured.
  • the geometric layer thickness of the protective layer 106 is approximately 15 nm. The optimization of the layer thickness is explained in more detail in conjunction with FIGS. 15 and 16.
  • a alternating layer system 107 with six single-layer pairs of alternating high-refractive (H) and low-refractive (L) dielectric material was applied, with lanthanum fluoride (LaF 3 ) as the high-refractive index material and magnesium fluoride (MgF 2 ) as the low-breaking material ,
  • the layer materials absorb to different extents, the following applies for the absorption coefficient k: k (LaF 3 ) ⁇ k (MgF 2 ).
  • the next single layer of the protective layer consists of high refractive, less absorbent lanthanum fluoride, the outermost layer of the layer system of low refractive index, more strongly absorbing magnesium fluoride.
  • the optical layer thicknesses of the dielectric layers of the layer system 104 are given in Table 4 as multiples of the corresponding optical layer thickness of a quarter-wave optical wavelength (QWOT). It can be seen that the optical layer thicknesses of the dielectric layers are between approximately 0.7 and about 2.0 ⁇ QWOT.
  • QWOT quarter-wave optical wavelength
  • an aperiodic layer structure has proven to be particularly favorable, in which the (optical) layer thicknesses of the weaker absorbing single layers increase from the substrate side to the free surface of the coating, while the corresponding (optical) layer thicknesses of the more absorbent material of Remove the substrate side towards the free surface.
  • the weaker absorbing material LaF 3 dominates .
  • the desired broadband with high reflection for p-polarized light of the operating wavelength can be achieved particularly well (see Fig. 18).
  • Fig. 16 shows a corresponding diagram for a system in which the thickness of the SiO 2 protective layer was about 15 nm.
  • irradiation 1036 million pulses of 1 mJ / cm 2 at 2 kHz pulse frequency
  • lower curve B the reflectance of the mirror after intense laser irradiation
  • 157 nm for example, this only becomes noticeable by a decrease in the reflectance of about 2-3 percentage points.
  • protective layer thicknesses of 20 nm gave a comparably low degradation. It can be seen that for such mirrors the protective layer thickness should be more than 5 nm. In order to keep the absorption influence low, about 15 nm layer thickness have been found to be sufficient so that thicker layer thicknesses are not necessary.
  • one aspect of the invention also includes layer systems without interlayer having a sufficient dense dense layer of ion-sputtered silica or other oxide dielectric material of sufficient packing density.
  • the reflection-increasing effect of a tantalum intermediate layer on a glass-ceramic substrate becomes particularly clear.
  • 17 shows the wavelength dependence of the reflectance R p for p-polarized light at an incidence angle I of 38 ° on the one hand for a mirror with a sputtered tantalum intermediate layer (upper curve A) and on the other hand for an otherwise identically constructed mirror, in which the intermediate layer not made of tantalum but of silicon dioxide (lower curve B).
  • the lower curve B essentially also represents the wavelength dependence of the reflectance for an uncoated substrate of the glass ceramic. It turns out that the sputtered tantalum layer leads to a significant increase in the reflection, while a sputtered SiO 2 interlayer shows the same, poorer reflectivity as an uncoated glass-ceramic substrate.
  • a high level of reflection which is largely independent of the substrate, can be achieved if an intermediate layer of suitable layer thickness, for example between the substrate and the aluminum layer, is produced.
  • a suitable interlayer material is tantalum.
  • Rp is shown for p-polarized light of 157 nm wavelength from the angle of incidence of the incident radiation for the range between about 20 ° and about 55 °. It can be seen that the reflectance R p is largely independent of the angle of incidence and has a sufficient absolute value of approximately 87% -88%, so that the mirror can be used, for example, as a deflection mirror or concave mirror in a projection objective or can be used in the range of 0 ⁇ 0.1 - 10 "6 / K in a lighting system of a microlithography projection exposure apparatus.
  • thermally highly conductive for example of a metallic mMaterial existing intermediate layer between a mirror substrate and a metal layer of a mirror layer system may also be advantageous in the described in connection with Figures 1 to 7 embodiments of dielectrically protected metal mirrors.

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Abstract

L'invention concerne un procédé pour protéger un miroir métallique contre la dégradation des propriétés de réflexion sous l'effet de l'environnement, ce miroir métallique étant destiné à être exposé à un rayonnement ultraviolet présentant des longueurs d'ondes comprises entre 120 nm approximativement et 260 nm approximativement. Ce procédé consiste à appliquer une couche de protection sur le miroir métallique, lequel comprend une couche métallique d'aluminium selon un mode de réalisation préféré, ladite couche de protection étant composée de chiolite (Na<SUB>5</SUB>Al<SUB>3</SUB>F<SUB>14</SUB>) selon une variante préférée. Un tel miroir métallique à protection diélectrique présente par rapport aux miroirs métalliques à protection diélectrique classiques une moindre dégradation du pouvoir de réflexion sous l'effet de l'atmosphère ambiante. La résistance à la dégradation due au rayonnement ultraviolet est également améliorée comparativement aux miroirs métalliques à protection diélectrique classiques.
PCT/EP2005/012197 2004-11-17 2005-11-15 Procede pour proteger un miroir metallique contre la degradation et miroir metallique Ceased WO2006053705A1 (fr)

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DE102007032371A1 (de) * 2007-07-06 2009-01-15 Carl Zeiss Laser Optics Gmbh Verfahren zum Beschichten eines optischen Bauelements für eine Laseranordnung
DE102007054731A1 (de) 2007-11-14 2009-05-20 Carl Zeiss Smt Ag Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
CN102576196A (zh) * 2009-09-30 2012-07-11 卡尔蔡司Smt有限责任公司 反射光学元件和用于操作euv光刻设备的方法
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
WO2015193195A1 (fr) * 2014-06-20 2015-12-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Élément optique muni d'un revêtement réfléchissant
DE102006004835B4 (de) 2005-02-03 2019-01-03 Corning Incorporated Elemente für Excimerlaser mit höherer Lebensdauer und Verfahren zu deren Herstellung
DE102018211499A1 (de) * 2018-07-11 2020-01-16 Carl Zeiss Smt Gmbh Reflektives optisches Element und Verfahren zum Herstellen eines reflektiven optischen Elements
DE102021200490A1 (de) 2021-01-20 2021-12-16 Carl Zeiss Smt Gmbh Verfahren zum Bilden einer Schutzschicht, optisches Element und optische Anordnung
DE102022210514A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Herstellung einer fluoridischen Schutzbeschichtung für ein reflektives optisches Element
DE102022210512A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Nachbehandlung einer Fluoridschicht für ein optisches Element für den VUV-Wellenlängenbereich

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WO2004025370A1 (fr) * 2002-08-27 2004-03-25 Carl Zeiss Smt Ag Systeme de reproduction optique, en particulier objectif de projection catadioptrique
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EP1170602A1 (fr) * 2000-07-07 2002-01-09 Sola International Holdings Limited Elément optique à couche superficielle réfléchissante et méthode de fabrication de cette couche
WO2004025370A1 (fr) * 2002-08-27 2004-03-25 Carl Zeiss Smt Ag Systeme de reproduction optique, en particulier objectif de projection catadioptrique
DE10317287A1 (de) * 2003-04-09 2004-06-24 Carl Zeiss Laser Optics Gmbh Interferenzschichtsystem

Cited By (19)

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DE102006004835B4 (de) 2005-02-03 2019-01-03 Corning Incorporated Elemente für Excimerlaser mit höherer Lebensdauer und Verfahren zu deren Herstellung
DE102007032371A1 (de) * 2007-07-06 2009-01-15 Carl Zeiss Laser Optics Gmbh Verfahren zum Beschichten eines optischen Bauelements für eine Laseranordnung
DE102007054731A1 (de) 2007-11-14 2009-05-20 Carl Zeiss Smt Ag Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
JP2011503654A (ja) * 2007-11-14 2011-01-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 紫外線反射光学素子、紫外線反射光学素子を作製する方法、および紫外線反射光学素子を備える投影露光装置
US8488103B2 (en) 2007-11-14 2013-07-16 Carl Zeiss Smt Gmbh Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same
CN102576196A (zh) * 2009-09-30 2012-07-11 卡尔蔡司Smt有限责任公司 反射光学元件和用于操作euv光刻设备的方法
EP2483746A1 (fr) * 2009-09-30 2012-08-08 Carl Zeiss SMT GmbH Élément optique réfléchissant et procédé d'actionnement d'un appareil de lithographie par ultraviolets extrêmes (euv)
JP2013506308A (ja) * 2009-09-30 2013-02-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射光学素子及びｅｕｖリソグラフィ装置を作動させる方法
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
WO2015193195A1 (fr) * 2014-06-20 2015-12-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Élément optique muni d'un revêtement réfléchissant
US20170139085A1 (en) * 2014-06-20 2017-05-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optical Element Comprising a Reflective Coating
US10429549B2 (en) 2014-06-20 2019-10-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optical element comprising a reflective coating
DE102018211499A1 (de) * 2018-07-11 2020-01-16 Carl Zeiss Smt Gmbh Reflektives optisches Element und Verfahren zum Herstellen eines reflektiven optischen Elements
US11520087B2 (en) 2018-07-11 2022-12-06 Carl Zeiss Smt Gmbh Reflective optical element
DE102021200490A1 (de) 2021-01-20 2021-12-16 Carl Zeiss Smt Gmbh Verfahren zum Bilden einer Schutzschicht, optisches Element und optische Anordnung
DE102022210514A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Herstellung einer fluoridischen Schutzbeschichtung für ein reflektives optisches Element
WO2024074441A1 (fr) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Procédé et dispositif de fabrication d'un revêtement de protection fluoridique pour un élément optique réfléchissant
DE102022210512A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Nachbehandlung einer Fluoridschicht für ein optisches Element für den VUV-Wellenlängenbereich
WO2024074440A1 (fr) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Procédé et dispositif de post-traitement d'une couche de fluorure pour un élément optique pour la plage de longueurs d'onde vuv, élément optique comprenant la couche de fluorure

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