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WO2006051835A1 - Curable resin composition, cured film formed therefrom and multilayer body - Google Patents

Curable resin composition, cured film formed therefrom and multilayer body Download PDF

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Publication number
WO2006051835A1
WO2006051835A1 PCT/JP2005/020572 JP2005020572W WO2006051835A1 WO 2006051835 A1 WO2006051835 A1 WO 2006051835A1 JP 2005020572 W JP2005020572 W JP 2005020572W WO 2006051835 A1 WO2006051835 A1 WO 2006051835A1
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WO
WIPO (PCT)
Prior art keywords
group
refractive index
metal oxide
curable resin
oxide particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2005/020572
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French (fr)
Japanese (ja)
Inventor
Hiroomi Shimomura
Mitsunobu Doimoto
Ryosuke Iinuma
Hideaki Takase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
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Filing date
Publication date
Priority claimed from JP2005197113A external-priority patent/JP2006231316A/en
Priority claimed from JP2005197111A external-priority patent/JP5011663B2/en
Application filed by JSR Corp filed Critical JSR Corp
Publication of WO2006051835A1 publication Critical patent/WO2006051835A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/10Esters; Ether-esters
    • C08K5/101Esters; Ether-esters of monocarboxylic acids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/34Applying different liquids or other fluent materials simultaneously
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2227Oxides; Hydroxides of metals of aluminium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2237Oxides; Hydroxides of metals of titanium
    • C08K2003/2241Titanium dioxide
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2244Oxides; Hydroxides of metals of zirconium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/005Additives being defined by their particle size in general

Definitions

  • Curable resin composition cured film and laminate comprising the same
  • the present invention relates to a curable resin composition, a cured film capable of producing the same, a method for producing a laminate, and a laminate obtained thereby, in particular, for example, an arbitrary layer such as a low refractive index layer and a high refractive index layer.
  • the present invention relates to a curable resin composition capable of forming a cured film composed of two or more continuous layers from one coating film, and a method for producing a laminate capable of forming two or more layers from one coating film. .
  • an antireflection film including a low refractive index layer made of a cured product having excellent durability in order to remove attached fingerprints, dust, and the like, the surface is often wiped with gauze impregnated with ethanol or the like, and scratch resistance is required.
  • the antireflection film is provided on the liquid crystal unit in a state of being bonded to a polarizing plate.
  • the base material for example, triacetyl cellulose is used, but in an antireflection film using such a base material, in order to increase the adhesion when pasted to the polarizing plate, It is necessary to saponify with an alkaline aqueous solution. Therefore, in applications of liquid crystal display panels, there is a demand for an antireflection film excellent in alkali resistance, particularly in durability.
  • an antireflection film made of a low refractive index material has been coated on the substrate of the display device, and thus antireflection is performed.
  • a method of forming a film for example, a method of forming a thin film of a fluorine compound by a vapor deposition method is known.
  • a technique capable of forming an antireflection film for a display device having a low cost and a large force mainly in a liquid crystal display device.
  • an antireflection film is formed by preparing a liquid composition by dissolving a fluorine-based polymer having a low refractive index in an organic solvent, and applying this to the surface of the substrate.
  • the law is being considered.
  • it has been proposed to apply a fluorinated alkylsilane to the surface of a substrate see, for example, Patent Document 1 and Patent Document 2.
  • a method of applying a fluoropolymer having a specific structure has been proposed (for example, see Patent Document 3).
  • a fluororesin-based paint containing a hydroxyl group-containing fluoropolymer As a material for a low refractive index layer of an antireflection film, for example, a fluororesin-based paint containing a hydroxyl group-containing fluoropolymer is known, which is disclosed in Patent Document 4, Patent Document 5, Patent Document 6, and the like. It is shown.
  • a fluororesin-based paint in order to cure the coating film, it is necessary to heat and bridge a hydroxyl group-containing fluoropolymer and a curing agent such as melamine resin under an acid catalyst. Depending on the heating conditions, there are problems that the curing time becomes excessively long and the types of substrates that can be used are limited.
  • the obtained coating film had a problem that it was excellent in weather resistance but poor in scratch resistance and durability.
  • Patent Document 7 discloses an isocyanate group-containing unsaturated compound having at least one isocyanate group and at least one addition-polymerizable unsaturated group, and a hydroxyl group-containing compound. Proposal of a coating composition containing an unsaturated group-containing fluorine-containing bull polymer obtained by reacting a fluorine polymer with a ratio of the number of isocyanate groups / number of hydroxyl groups of 0.01 to 1.0. It has been done.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 61-40845
  • Patent Document 2 Japanese Patent Publication No. 6-98703
  • Patent Document 3 Japanese Patent Laid-Open No. 6-115023
  • Patent Document 4 JP-A-57-34107
  • Patent Document 5 Japanese Patent Laid-Open No. 59-189108
  • Patent Document 6 JP-A-60-67518
  • Patent Document 7 Japanese Patent Publication No. 6-35559
  • each layer was repeated. That is, the conventional antireflective film made of a fluorine-based material needs to form a low-refractive index layer having a fluorine-based material force on a high-refractive index layer provided on a base material. It was necessary to provide a separate coating process.
  • the present invention has been made against the background of the above situation, and its purpose is to provide a curable resin composition that can be cured by ultraviolet rays that can efficiently produce a low refractive index layer and a high refractive index layer. Is to provide. Another object of the present invention is to provide a cured film having excellent scratch resistance and chemical resistance with high adhesion to a substrate with high transparency and excellent environmental resistance. It is in.
  • the present inventors have conducted intensive research and added two types of metal oxide particles having different particle sizes to an ethylenically unsaturated group-containing fluoropolymer that is cured by irradiation with ultraviolet rays.
  • the blended composition is applied to a substrate and dried, it is separated into two layers: a layer in which the metal oxide particles are present at a high density and a layer in which the metal oxide is scarcely present or at a low density. I found out.
  • a cured film obtained by curing by irradiating with ultraviolet rays Has found that it has excellent scratch resistance, chemical resistance and transparency, as well as excellent weather resistance, and has completed the present invention.
  • the following curable resin composition a cured film obtained by curing the composition, a method for producing a laminate, and a laminate obtained thereby can be provided.
  • Metal oxide particles having a number average particle diameter of 1 nm or more and less than 40 nm formed by bonding an organic compound (Ab) having a polymerizable unsaturated group hereinafter referred to as “metal oxide particles of (A1)”.
  • (A2) Metal oxide particles having a number average particle diameter of 40 nm to 200 nm (hereinafter referred to as “(A2) metal oxide particles”)
  • (C) (B) High solubility of fluorine-containing polymer containing ethylenically unsaturated groups, one or more solvents (hereinafter referred to as “(C) fast volatile solvent”)
  • (D) One or two or more solvents (hereinafter referred to as “(”) that have high dispersion stability of the metal oxide particles of (A1) and (A2) and are compatible with (C) the fast volatile solvent.
  • Fast volatile solvent is one or more solvents with low dispersion stability of metal oxide particles (A1) and (A2).
  • Slow volatile solvent is (B 2. The curable resin composition as described in 1 above, which is one or more solvents having low solubility of the ethylenically unsaturated group-containing fluoropolymer.
  • the metal oxide particle force of (A1) above is characterized in that it is an oxide particle of at least one element selected from the group consisting of ananolium, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium.
  • the organic compound (Ab) has a group represented by the following formula (A-1):
  • U represents NH, O (oxygen atom) or S (ion atom), and V represents ⁇ or S.
  • the (B) ethylenically unsaturated group-containing fluorine-containing polymer comprises a compound (B-1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group-containing fluorine-containing polymer.
  • the hydroxyl group-containing fluoropolymer (B_2) contains the following structural units (a) 20 to 70 mol%, (b) 10 to 70 mol% and (c) 5 to 70 mol%.
  • R 1 represents a fluorine atom, a fluoroalkyl group, or a group represented by OR 2 (R 2 represents an alkyl group) Or a fluoroalkyl group)]
  • R 3 is a hydrogen atom or a methyl group
  • R 4 is an alkyl group
  • R 6 represents a hydrogen atom or a methyl group
  • R 7 represents a hydrogen atom or a hydroxyalkyl group
  • V represents a number of 0 or 1
  • hydroxyl group-containing fluoropolymer (B-2) further comprises the following structural unit (d) 0.:! To 10 mol% derived from an azo group-containing polysiloxane compound. A curable resin composition.
  • R 8 and R 9 may be the same or different and each represents a hydrogen atom, an alkyl group, a halogenated alkyl group, or an aryl group]
  • the hydroxyl group-containing fluoropolymer (B-2) is the structural unit (d) shown below
  • R 1Q to R 13 represent a hydrogen atom, an alkyl group, or a cyano group
  • R 14 to R 17 represent a hydrogen atom or an alkyl group
  • p and q are numbers of:! To 6, s, t is a number from 0 to 6, y is a number from:! to 200.
  • R 18 represents an emulsifying group
  • component (E) a polyfunctional (meth) attareito to compound containing at least two (meth) attaroyl groups and Z or at least one (meth) attalyloyl group.
  • the curable resin composition according to any one of the above:! To 13, wherein the composition contains a fluorine-containing (meth) acrylate compound.
  • curable resin composition according to any one of 1 to 14 above, which further comprises a component (F) a radical polymerization initiator.
  • a cured film obtained by curing the curable resin composition according to any one of the above:! To 16, and having a multilayer structure of two or more layers. 18. From one or more layers in which (Al) and (A2) metal oxide particles are present in high density and from one or more layers in which (A1) and (A2) metal oxide particles are substantially absent 18. The cured film as described in 17 above, which has a layer structure of two or more layers.
  • a method of producing a laminate having a base material and a multilayer structure thereon comprising:
  • the curable resin composition according to any one of the above 1 to 16 is applied to form a coating film,
  • Each of the two or more layers is a layer in which the metal oxide particles (A1) and / or (A2) are present in high density or the metal oxide particles (A1) and (A2) are substantially present.
  • the laminate is an antireflection film in which at least a high refractive index layer and a low refractive index layer are laminated in this order from the side close to the substrate on the substrate, and the two layers according to 21 above Is a high refractive index layer and
  • the refractive index of the low refractive index layer at 589 nm is 1.20 to: 1.55,
  • the laminate is an antireflection film in which at least a medium refractive index layer, a high refractive index layer, and a low refractive index layer are laminated in this order from the side close to the substrate on the substrate, The two layers described in
  • the refractive index of the low refractive index layer at 589 nm is 1.20 to: 1.55,
  • the refractive index of the middle refractive index layer at 589 nm is 1.50 to: 1.90, which is higher than the refractive index of the low refractive index layer.
  • the cured film obtained by curing the curable resin composition of the present invention is, for example, a low refractive index layer, a high refractive index layer, or the like from one coating film obtained by applying the present composition. Since any two or more layers can be formed, the manufacturing process of a cured film having a multilayer structure can be simplified.
  • the curable resin composition of the present invention does not undergo a curing reaction due to heat involving hydrolysis, it can provide a cured film excellent in environmental resistance (such as resistance to moist heat).
  • a cured film obtained by curing the curable resin composition of the present invention is excellent in scratch resistance, chemical resistance, and transparency, and the curable resin composition of the present invention is particularly an antireflection film. It can be used advantageously in the formation of optical materials such as permeable membrane filters, and by utilizing the high fluorine content, it can be used for coating materials, weather resistant film materials, It can be suitably used as a material for coating.
  • the cured film since the cured film has excellent adhesion to the substrate and provides a good antireflection effect with high scratch resistance, it is extremely useful as an antireflection film and can be applied to various display devices. By The visibility can be improved.
  • the method for producing a laminate of the present invention can form two or more layers from one coating film obtained by applying the composition, thus simplifying the production process of a laminate having a multilayer structure. Can be used. Therefore, the method for producing a laminate of the present invention can be advantageously used particularly for the formation of optical materials such as antireflection films and optical filters. Further, the laminate of the present invention can be suitably used as a paint, weather resistant film, coating, etc. for a substrate requiring weather resistance by utilizing the high fluorine content. In addition, the laminated body provides a good antireflection effect by providing a low refractive index layer in the outermost layer (the layer farthest in base material strength).
  • the laminate of the present invention is extremely useful as an antireflection film, and its visibility can be improved by applying it to various types of display devices.
  • FIG. 1A is a diagram for explaining “two or more layers formed from one coating film”.
  • FIG. 1B is a diagram for explaining “two or more layers formed from one coating film”.
  • FIG. 1C is a diagram for explaining “two or more layers formed from one coating film”.
  • FIG. 1D is a diagram for explaining “two or more layers formed from one coating film”.
  • FIG. 2 is a cross-sectional view of an antireflection film according to an embodiment of the present invention.
  • FIG. 3 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 4 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 5 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 6 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 7 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 8 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 9 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 10 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.
  • FIG. 11 is an electron micrograph showing the concept of each state of two-layer separation, no separation (partial aggregation), and uniform structure.
  • the present invention relates to a substrate, a method for producing a laminate having a multilayer structure of two or more layers thereon, and a laminate obtained thereby.
  • the coating force of 1 obtained by applying a predetermined curable resin composition to be described later on a substrate or a layer formed on the substrate also has a solvent.
  • Two or more layers are formed by evaporating (hereinafter, evaporating the solvent is sometimes referred to as “drying”). It should be noted that the solvent may not remain completely after drying, and the solvent may remain as long as the cured film can be obtained.
  • two or more layers can be formed twice or more from one coating film.
  • the two or more layers are “a layer in which the metal oxide particles (A1) and / or (A2) are present in high density” and “the metal oxide particles (A1) and (A2) are substantially In some cases, it may be two or more layers including both “layers that are not present at all” and only “layers in which the metal oxide particles (A1) and / or (A2) are present at high density” 2 In some cases, these layers are used.
  • each of two or more layers is a layer in which (A1) and / or (A2) metal oxide particles are present in a high density or (A1) and (A2) metal oxide particles.
  • a layer that does not substantially exist and at least one layer is a layer in which the metal oxide particles (A1) and / or (A2) are present in high density will be described.
  • FIG. 1A shows a case where two or more layers are “layer 1, la in which metal oxide particles (A1) or (A2) are present at high density”.
  • Figure 1B shows that two or more layers are “layers 1, 1 aj in which metal oxide particles (A1) or (A2) are present in high density, and metal oxide particles (A1) and (A2) The case where there are three layers of “layer 3” which does not substantially exist is shown.
  • FIG. 1C shows that two or more layers are “layer 1, la in which metal oxide particles (A1) or (A2) are present in high density” and “metal oxide particles (A1) and (A2) are The case where there are three layers of “layer 3” which does not substantially exist is shown.
  • Fig. 1D shows that two or more layers are "layer lb in which metal oxide particles (A1) and (A2) exist in high density” and "metal oxide particles (A1) and (A2) are actual. This shows the case where there are two layers of layer 3 ”that do not exist.
  • the ultraviolet curable resin composition contains two or more kinds of metal oxide particles, as shown in FIGS. 1A, IB, and 1C, there are two or more types of “layers in which the metal oxide particles exist at high density”. Can be formed.
  • the “metal oxide particles” in the “layer in which metal oxide particles are present in high density” means at least one, ie, one or more “metal oxide particles”. Therefore, the “layer in which metal oxide particles are present in high density” may be composed of two or more kinds of metal oxide particles (for example, FIG. 1D).
  • “Layer lb with high density of metal oxide particles” consists of particles X and Y. Since the particle Y is thicker than the “layer lb where the metal oxide particles are present at high density”, the force that protrudes into the “layer 3 where the metal oxide particles are substantially absent” It is included in the layer “lb” in which the particles are present in high density.
  • the “layer 3 substantially free of metal oxide particles” usually contains no metal oxide particles, but is included in a range that does not impair the effects of the present invention. It may be.
  • “layer 1, la, lb in which metal oxide particles are present at high density” may also contain other substances other than metal oxide particles.
  • a coating method of the curable resin composition a known coating method can be used, and in particular, various methods such as a dipping method, a coater method, and a printing method can be applied.
  • Drying is usually performed for about 1 to 60 minutes by heating from room temperature to about 100 ° C. Specific curing conditions will be described later.
  • the curable resin composition can be applied to various substrates in the form of a solution, and the resulting coating film can be dried / cured to obtain a laminate.
  • the substrate is a transparent substrate
  • an excellent antireflection film can be formed by providing a low refractive index layer as the outermost layer.
  • the specific structure of the antireflection film is usually a base material and a low refractive index film, or a base material, a high refractive index film and a low refractive index film laminated in this order.
  • other layers may be interposed between the base material, the high refractive index film, and the low refractive index film.
  • a hard coat layer, an antistatic layer, a middle refractive index layer, a low refractive index layer, a high refractive index film, Layers such as a combination of refractive index layers can be provided.
  • FIG. 2 shows an antireflection film in which a high refractive index layer 40 and a low refractive index layer 50 are laminated in this order on a substrate 10.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • FIG. 3 shows an antireflection film in which a hard coat layer 20, an antistatic layer 30, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • FIG. 4 shows an antireflection film in which an antistatic layer 30, a hard coat layer 20, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • FIG. 5 shows an antireflection structure in which a hard coat layer 20, an antistatic layer 30, a middle refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a base material 10.
  • the membrane is shown.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the medium refractive index layer 60 and the high refractive index layer 40 each have a force equivalent to a layer in which metal oxide particles are present in a high density.
  • the high refractive index layer 40 corresponds to a layer having substantially no metal oxide particles
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.
  • FIG. 6 shows an antireflection structure in which an antistatic layer 30, a hard coat layer 20, a medium refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.
  • the membrane is shown.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the medium refractive index layer 60 and the high refractive index layer 40 both have a force equivalent to a layer in which metal oxide particles are present at a high density, or the medium refractive index layer 60 has metal oxide particles.
  • the high refractive index layer 40 corresponds to a layer having substantially no metal oxide particles.
  • the intermediate refractive index layer 60 and the high refractive index layer 40 or the high refractive index layer 40 is used.
  • the layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.
  • FIG. 7 shows an antireflection film in which a hard coat layer 20, a high refractive index layer 40 and a low refractive index layer 50 are laminated in this order on a substrate 10.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • FIG. 8 shows an antireflection film in which a hard coat layer 20, a medium refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated on the base material 10 in this order.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the medium refractive index layer 60 and the high refractive index layer 40 each have a force equivalent to a layer in which metal oxide particles are present in a high density.
  • the high refractive index layer 40 corresponds to a layer having substantially no metal oxide particles
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.
  • FIG. 9 shows an antireflection film in which an antistatic layer 30, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.
  • FIG. 10 shows an antireflection film in which an antistatic layer 30, a medium refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated on the base material 10 in this order.
  • the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density
  • the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.
  • the medium refractive index layer 60 and the high refractive index layer 40 both have a force equivalent to a layer in which metal oxide particles are present at a high density, or the medium refractive index layer 60 has metal oxide particles.
  • the high refractive index layer 40 corresponds to a layer in which the metal oxide particles are not substantially present in the high density layer.
  • the medium refractive index layer 60 and the high refractive index layer 40 can be formed from one coating film.
  • the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.
  • conductive particles such as antimony-doped tin oxide (ATO) particles and phosphorus-doped tin oxide (PTO) particles are used as metal oxides contained in the curable resin composition to be used. Is added, a layer containing the resulting metal oxide at a high density becomes a film having antistatic properties. Therefore, for example, if a high refractive index layer or a medium refractive index layer is formed as a layer containing a metal oxide having such an antistatic property at a high density, the high refractive index layer or the medium refractive index layer is charged. It can be set as the film
  • the type of the substrate used for the antireflection film of the present invention is not particularly limited, but specific examples of the substrate include, for example, triacetyl cellulose, polyethylene terephthalate resin
  • Methyl Metal examples include various transparent plastic plates and films such as rate / styrene copolymer resins and polyolefin resins.
  • Preferred examples include triacetyl cellulose, polyethylene terephthalate resin (Lumirror, etc. manufactured by Toray Industries, Inc.), norbornene-based resin CFSR, Arton, etc., and the like.
  • the low refractive index layer refers to a layer having a refractive index of 1.20-1.55 for light having a wavelength of 589 nm.
  • the material used for the low refractive index layer is not particularly limited as long as the desired properties are obtained.
  • a curable composition containing a fluoropolymer, an acrylic monomer, and a fluorine-containing acrylic monomer. And cured products such as epoxy group-containing compounds and fluorine-containing epoxy group-containing compounds.
  • silica fine particles and the like can be blended.
  • the high refractive index layer refers to a layer having a refractive index of 1.50-2.20 for light having a wavelength of 589 nm and a higher refractive index than the low refractive index layer.
  • inorganic particles with high refractive index for example, metal oxide particles.
  • metal oxide particles include antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, Zn ⁇ particles, antimony-doped ZnO, and A1-doped Zn ⁇ particles. , ZrO particles, TiO particles, silica-coated TiO particles, A1
  • ATO N-doped tin oxide
  • ITO tin-doped indium oxide
  • PTO phosphorus-doped tin oxide
  • A1-doped ZnO particles Al 2 O 3 / ZrO-coated TiO particles.
  • the metal oxide particles are a single type.
  • the function of a hard coat layer or an antistatic layer can be given to the high refractive index layer.
  • the refractive index of light with a wavelength of 589 nm is 1.50 to: 1.90, which is higher than the low refractive index layer and lower than the high refractive index layer.
  • This layer is referred to as a medium refractive index layer.
  • the refractive index of the middle refractive index layer is preferably 1.50 to: 1.80, more preferably 1.50 to: 1.75.
  • inorganic particles having a high refractive index for example, metal oxide particles.
  • metal oxide particles include antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, ZnO particles, antimony Doped ZnO, A1-doped ZnO particles, ZrO particles, TiO particles, silica-coated TiO particles, A1
  • Coated TiO particles, CeO particles, and the like Preferably, antimony doped acid
  • Tin oxide (ATO) particles Tin oxide particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide ( ⁇ ) particles, A1-doped ⁇ particles, and ZrO particles. These metal oxide particles may be used alone or in combination.
  • the medium refractive index layer can have a function of a hard coat layer or an antistatic layer.
  • the reflectance can be lowered by combining the low refractive index layer and the high refractive index layer, and the reflectance can be reduced by combining the low refractive index layer, the high refractive index layer, and the middle refractive index layer. Can be lowered and the color can be reduced.
  • the hard coat layer examples include Si0 , epoxy resin, acrylic resin, and melamine.
  • the material strength of the system resin or the like is also configured.
  • Silica particles may be blended with these resins.
  • the hard coat layer has the effect of increasing the mechanical strength of the laminate.
  • the antistatic layer include conductive oxides such as antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, and A1-doped ZnO particles.
  • Curable films to which organic particles or organic or inorganic conductive compounds are added metal oxide films obtained by vapor deposition or sputtering of the metal oxides, and films made of conductive organic polymers. it can.
  • the conductive organic polymer include polyacetylene conductive polymer, polyaniline conductive polymer, polythiophene conductive polymer, polypyrrole conductive polymer, and polyphenylene vinylene conductive polymer. It can be illustrated.
  • the metal oxide contained in the curable resin composition used in the present invention AT o particles, IT o particles, phosphorus-doped tin oxide ((o) particles, antimony-doped Zn o, A1 dope ⁇
  • conductive particles such as particles
  • the resulting layer containing the metal oxide at a high density becomes a film having antistatic properties.
  • the formation of a separate antistatic film can be omitted.
  • the antistatic layer imparts electrical conductivity to the laminate and prevents dust from adhering due to static electricity.
  • These layers may be formed in only one layer, or two or more different layers may be formed.
  • the film thickness of the low, medium and high refractive index layers is usually 60 to 150 nm
  • the film thickness of the antistatic layer is usually 0.05 to 3 ⁇ m
  • the film thickness of the hard coat layer is usually 1 to 20 ⁇ m. It is.
  • any two or more continuous layers of the laminate can be formed by the production method of the present invention, but the layer production method not based on the production method of the present invention is a known application and curing, It can be manufactured by methods such as vapor deposition and sputtering.
  • the layer made of the curable resin composition according to the present invention is preferably imparted with a heat history by heating in order to be cured to form a cured film having excellent optical properties and durability.
  • a heat history by heating in order to be cured to form a cured film having excellent optical properties and durability.
  • the curing reaction proceeds with the passage of time, and the desired cured film is formed.
  • heating and curing are effective in reducing the required time. Is.
  • the curing reaction can be further promoted by adding a thermal acid generator as a curing catalyst.
  • the curing catalyst is not particularly limited, and various acids and salts thereof used as curing agents for general urea resins and melamine resins can be used. In particular, ammonium salts are preferably used. it can.
  • the heating conditions for the curing reaction can be selected as appropriate, but the heating temperature needs to be equal to or lower than the heat resistant limit temperature of the substrate to be coated.
  • the laminate of the present invention can be used for optical parts such as a lens and a selective transmission film filter.
  • the curable resin composition of the present invention is
  • (A1) metal oxide particles Number average particle diameter formed by bonding an organic compound (Ab) having a polymerizable unsaturated group 1 Metal oxide particles with a diameter of at least nm and less than 40 nm (hereinafter referred to as “(A1) metal oxide particles”)
  • (A2) Metal oxide particles having a number average particle diameter of 40 nm to 200 nm (hereinafter referred to as “(A2) metal oxide particles”)
  • (C) (B) High solubility of fluorine-containing polymer containing ethylenically unsaturated groups, one or more solvents (hereinafter referred to as “(C) fast volatile solvent”)
  • (D) One or two or more solvents (hereinafter referred to as “(”) that have high dispersion stability of the metal oxide particles of (A1) and (A2) and are compatible with (C) the fast volatile solvent. D) slow volatile solvent ”).
  • Metal oxide particles (A1) and (A2) are Metal oxide particles (A1) and (A2)
  • metal oxide particles (A1) and (A2) having different particle diameters are used.
  • the metal oxide particles (A1) need to be bonded to an organic compound (Ab) having a polymerizable unsaturated group described later.
  • the metal oxide particles (A2) are preferably bonded to the organic compound (Ab) having a polymerizable unsaturated group, but are not essential.
  • the metal oxide particles (A1) and (A2) may be collectively referred to as “metal oxide particle component (A)”.
  • the metal oxide particles not bonded to the organic compound b) are referred to as “metal oxide particles (Aal)” and “metal oxide particles (Aa2)”, respectively.
  • metal oxide particles (Aa) are sometimes referred to as “reactive particles (Aabl)” and “reactive particles (Aab2)”, respectively.
  • both are collectively referred to as “reactive particles (Aab)”.
  • the number average particle sizes of the metal oxide particles (A1) and (A2) are in the range of 1 nm to less than 40 nm and in the range of 40 nm to 200 nm, respectively, as measured by electron microscopy.
  • the two types of metal oxide particles may be a combination of three or more types of metal oxide particles as long as each particle size is within the above range.
  • the substances constituting the plurality of types of metal oxide particles may be the same or different.
  • the metal oxide particles (A1) and (A2) used in the present invention are obtained from the viewpoint of hardness and colorlessness of the cured film, which is a curable resin composition, and can be obtained by using silicon, aluminum, dinoleconium, titanium, Metal oxide particles of at least one element selected from the group consisting of zinc, germanium, indium, tin, antimony and cerium are preferred.
  • the metal oxide particles (A1) are preferably oxide particles of at least one element selected from the group consisting of anoleminium, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium.
  • zirconium oxide particles are particularly preferable.
  • the refractive index of the metal oxide particle (A1) at a wavelength of 589 nm is 1. It is preferably 5 or more.
  • siri force (refractive index of about 1.45) particles are not preferred.
  • the metal oxide particles (A1) have a number average particle size in the range of 1 nm to less than 40 nm, preferably in the range of 1 nm to 30 nm.
  • the metal oxide particles (A2) are preferably particles mainly composed of silica from the viewpoint of improving the scratch resistance of the cured film.
  • the metal oxide particles (A2) have a number average particle size in the range of 40 nm to 200 nm, preferably in the range of 40 nm to lOOnm.
  • the particle diameters of the metal oxide particles (A1) and (A2) are number average particle diameters measured by electron microscopy.
  • the particle diameter in the case of a rod-shaped particle means a short axis.
  • Various surfactants and amines may be added to improve the dispersibility of the metal oxide particles (A1) and (A2).
  • the metal oxide particles (Aa) are preferably in the form of powder or dispersion.
  • an organic solvent is preferred as the dispersion medium from the viewpoint of compatibility with other components and dispersibility.
  • an organic solvent include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; ethyl acetate, butyl acetate, and lactate.
  • Estenoles such as chinole, ⁇ -butyla ratatone, propylene glycolenomonomethinoreethenoreacetate, propyleneglycolenomonoethylenoatenoreacetate; ethers such as ethyleneglycolenomonomethyl ether and diethylene glycol monobutyl ether; Aromatic hydrocarbons such as benzene, toluene and xylene; amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone.
  • methanol isopropanol, butanol, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate, toluene and xylene are preferred.
  • silica particles include, for example, colloidal silica manufactured by Nissan Chemical Industries, Ltd., trade names: methanol silica sol, IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-0, ST-50, ST-0.
  • silica powder Nippon Aerosil Co., Ltd. trade names: Aerosil 130, Aerosil 300, Aerogenore 380, Aerosil Nore TT600, Aerosilore 0X50, Asahi Glass Co., Ltd.
  • Product name Cellnax; Alumina , Titanium oxide, tin oxide, oxide For powder and solvent dispersions such as zinc and zinc oxide, manufactured by CIA Kasei Co., Ltd.
  • the metal oxide particles (A1) and (A2) have a spherical shape, a hollow shape, a porous shape, a rod shape (a shape having an aspect ratio of more than 1 and 10 or less), a plate shape. , Fibrous or indefinite shape, preferably (A1) is rod-shaped and (A2) is spherical.
  • metal oxide particles (A1) and (A2) can be used in a state of being dispersed in a dry powder, water or an organic solvent.
  • a dispersion of fine metal oxide particles known in the art as the dispersion can be used directly.
  • the metal oxide particles (A2) used in the present invention may be the metal oxide particles (Aa2) having a predetermined number average particle diameter as they are, but they are polymerized with the metal oxide particles (Aa2). It is preferably a particle formed by binding an organic compound (Ab) containing a reactive unsaturated group (hereinafter sometimes referred to as “reactive particle (Aab2)”).
  • Reactive particle (Aab2) a reactive unsaturated group
  • As the metal oxide particle component (A) a cured product obtained by using reactive particles (Aab2) in which metal oxide particles (Aa2) are combined with an organic compound (Ab) having a polymerizable unsaturated group.
  • the scratch resistance of the cured film made of the conductive resin composition is further improved.
  • the bond may be a covalent bond or a non-covalent bond such as physical adsorption.
  • the organic compound (Ab) is preferably a compound having a silanol group in the molecule or a compound that generates a silanol group by hydrolysis. [0062] [Chemical 8]
  • U represents NH, ⁇ (oxygen atom) or S (Y atom), and V represents ⁇ or S.
  • the polymerizable unsaturated group contained in the organic compound (Ab) is not particularly limited. Group and acrylamide group can be cited as preferred examples.
  • This polymerizable unsaturated group is a structural unit that undergoes addition polymerization with active radical species.
  • These groups can be used alone or in combination of two or more.
  • the organic compound (Ab) is preferably a compound having a silanol group in the molecule or a compound that generates a silanol group by hydrolysis.
  • the compound that generates such a silanol group include compounds in which an alkoxy group, an aryloxy group, an acetoxy group, an amino group, a halogen atom, and the like are bonded to a silicon atom.
  • a compound having an alkoxy group or an aryloxy group bonded thereto, that is, an alkoxysilyl group-containing compound or an aryloxysilyl group-containing compound is preferable.
  • the silanol group-generating site of the silanol group or the compound that generates the silanol group is a structural unit that is bonded to the oxide particles (Aa) by a condensation reaction or a condensation reaction that occurs after hydrolysis.
  • organic compound (Ab) As a preferred example of the organic compound (Ab), a specific example thereof includes a compound represented by the following formula (A_2).
  • R 24 and R 25 may be the same or different and each represents a hydrogen atom or an alkyl group or an aryl group having from 8 to 8 carbon atoms, such as methinole, ethyl, propyl, butyl, Examples include octanol, phenyl, xylyl groups and the like.
  • j is an integer between:!
  • Examples of the group represented by [(R 24 0) R 25 Si—] include, for example, a trimethoxysilyl group, a triethoxy group, and the like.
  • Examples thereof include a silyl group, a triphenoxysilyl group, a methyldimethoxysilyl group, and a dimethylmethoxysilyl group. Of these groups, a trimethoxysilyl group or a triethoxysilyl group is preferable.
  • R 26 is a divalent organic group having an aliphatic or aromatic structure having 1 to 12 carbon atoms, and may contain a chain, branched or cyclic structure. Specific examples include methylene, ethylene, propylene, butylene, hexamethylene, cyclohexylene, phenylene, xylylene, and dodecamethylene.
  • R 27 is a divalent organic group, and is usually selected from divalent organic groups having a molecular weight of 14 to 10,000, preferably a molecular weight of 76 to 500.
  • divalent organic groups having a molecular weight of 14 to 10,000, preferably a molecular weight of 76 to 500.
  • Specific examples include chain polyalkylene groups such as hexamethylene, otatamethylene and dodecamethylene; alicyclic or polycyclic divalent organic groups such as cyclohexylene and norbornylene; phenylene, naphthylene and biphenyl.
  • Divalent aromatic groups such as len and polyphenylene; and alkyl and substituted aryl groups thereof. That power S.
  • these divalent organic groups may contain a polyether bond, a polyester bond, a polyamide bond, or a polycarbonate bond, which may contain an atomic group containing an element other than carbon and hydrogen atoms.
  • R 28 is a (k + 1) -valent organic group, preferably selected from a chain, branched or cyclic saturated hydrocarbon group and unsaturated hydrocarbon group.
  • Z represents a monovalent organic group having a polymerizable unsaturated group in the molecule that undergoes an intermolecular crosslinking reaction in the presence of an active radical species.
  • K is preferably an integer of:! To 20, more preferably an integer of 1 to 10, and particularly preferably an integer of:! To 5.
  • Specific examples of the compound represented by the formula (A-2) include compounds represented by the following formulas (A-4) and (A-5).
  • a method described in JP-A-9-100111 can be used.
  • mercaptopropyltrimethoxysilane and isophorone diisocyanate are mixed in the presence of dibutyltin dilaurate and reacted at 60 to 70 ° C. for several hours, then pentaerythritol tritalylate is added, and further 60 to 70 It is produced by reacting for several hours at ° C.
  • Organic compounds having silanol groups or groups that generate silanol groups by hydrolysis The product (Ab) is mixed with the metal oxide particles (Aa), hydrolyzed, and bonded together.
  • the ratio of the organic polymer component, that is, hydrolyzable silane hydrolyzate and condensate in the resulting reactive particles (Aab) is usually reduced by mass when the dry powder is completely burned in air. As a constant value of%, it can be obtained, for example, by thermal mass spectrometry in air from room temperature to usually 800 ° C.
  • the amount of organic compound (Ab) bound to metal oxide particles (Aa) is 100% by mass of reactive particles (Aab) (total of metal oxide particles (Aa) and organic compounds (Ab)). Is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, and particularly preferably 1% by mass or more. When the amount of the organic compound (Ab) bonded to the metal oxide particle (Aa) is less than 0.01% by mass, the curing can be obtained with sufficient dispersibility of the reactive particle (Aab) in the composition. The transparency and scratch resistance of the object may not be sufficient.
  • the mixing ratio of the reactive particles (Aab) metal oxide particles in the raw material during manufacture (Aa) is preferably a 5 to 99 weight 0/0, more preferably, 10 to 98 weight 0/0 It is.
  • the amount of the metal oxide particles (A1) (that is, the reactive particles (Aabl)) in the curable resin composition is 100% by mass based on the total amount of the composition excluding the organic solvent.
  • a range of 10 to 90% by mass is preferable, and a range of 20 to 80% by mass is more preferable, and a range of 40 to 80% by mass is particularly preferable. If it is less than 10% by mass, a cured film with insufficient hardness or a high refractive index may not be obtained. If it exceeds 90% by mass, film formability may be insufficient.
  • the content of the metal oxide particles (Aal) constituting the reactive particles (Aabl) is preferably 65 to 95% by mass of the reactive particles (Aabl).
  • the amount (inclusive) of the metal oxide particles (A2) (even if the metal oxide particles (Aa2) and reactive particles (Aab2) are misaligned) in the curable resin composition is Excluding the organic solvent, the total amount of the composition is preferably 100% by mass, and preferably in the range of 1 to 30% by mass: more preferably in the range of 20 to 20% by mass.
  • the ethylenically unsaturated group-containing fluoropolymer used in the present invention comprises a compound (B-1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group-containing polymer. It is preferably obtained by reacting the fluorinated polymer (B-2) with an isocyanate group / hydroxyl molar ratio of 1.1 to 1.9.
  • the compound (B-1) is not particularly limited as long as the compound contains one isocyanate group and at least one ethylenically unsaturated group in the molecule. If two or more isocyanate groups are contained, gelling may occur when reacting with a hydroxyl group-containing fluoropolymer. In addition, as the ethylenically unsaturated group, a (meth) atalyloyl group is more preferable because the curable resin composition can be cured more easily.
  • Examples of such compounds include 2- (meth) ataloyloxychetyl isocyanate, 2— (meth) atallyloyloxypropyl isocyanate, 1,1-bis [(meth) atalylooxymethyl] ethyl
  • 2- (meth) ataloyloxychetyl isocyanate 2— (meth) atallyloyloxypropyl isocyanate
  • such a compound can also be synthesized by reacting diisocyanate and a hydroxyl group-containing (meth) acrylate.
  • diisocyanates include 2,4 tolylene diisocyanate, 2,6 tolylene diisocyanate, 1,3-xylylene diisocyanate, 1 isocyanate, p-phenylene diisocyanate, 3,3 ′ Dimethyl-4,4'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-Dimethylphenylene diisocyanate, 4,4'-biphenyldiisocyanate, 1, 6-hexanediisocyanate, isophorone diisocyanate, methylenebis (4-cyclohexylisocyanate), 2,2,4_trimethylhexamethylenediisocyanate, bis (2-isocyanate ethanolate) fumarate, 6_
  • 2,4_tolylene diisocyanate isophorone diisocyanate, xylylene diisocyanate, methyl Bis (4-cyclohexylisocyanate) and 1,3-bis (isocyanatemethyl) cyclohexane are particularly preferred.
  • Examples of the hydroxyl group-containing (meth) acrylate include 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, force Prolatataton (meth) acrylate, polypropylene glycol (meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol nortri (meth) acrylate, pentaerythritol di (meth) acrylate monostearate, isocyanuric acid E ⁇ Modified Examples include one kind alone or a combination of two or more kinds such as di (meth) acrylate.
  • 2-hydroxyethyl (meth) acrylate and pentaerythritol tri (meth) acrylate are particularly preferred.
  • a hydroxyl group-containing polyfunctional (meth) atalylate for example, Osaka Organic Chemical Co.
  • Product Name HEA Nippon Kayaku Co., Ltd.
  • Product Name KAYARAD DPHA PET-30, Toagosei Co., Ltd.
  • the addition amount of the hydroxyl group-containing polyfunctional (meth) acrylate is 1 to 1 with respect to 1 mol of diisocyanate.
  • the hydroxyl group-containing fluoropolymer (B-2) is preferably composed of the following structural units (a), (b), and (c). Furthermore, the structural units (d), (e), (f ) Is more preferable.
  • the structural unit (a) is represented by the following general formula (1).
  • R 1 represents a fluorine atom, a fluoroalkyl group, or a group represented by OR 2 (R 2 represents an alkyl group or a fluoroalkyl group)]
  • the fluoroalkyl group of R 1 and R 2 includes a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluorobutyl group, a perfluoro mouth
  • fluorinated alkyl groups having 1 to 6 carbon atoms such as xyl group and perfluorocyclohexyl group.
  • alkyl group for R 2 include alkyl groups having 1 to 6 carbon atoms such as a methinole group, an ethyl group, a propyl group, a butyl group, a hexyl group, and a cyclohexyl group.
  • the structural unit (a) can be introduced by using a fluorine-containing vinyl monomer as a polymerization component.
  • a fluorine-containing butyl monomer is not particularly limited as long as it is a compound having at least one polymerizable unsaturated double bond and at least one fluorine atom. Examples of this include fluoroolefins such as tetrafluoroethylene, hexafluoropropylene, 3, 3, 3-trifluoropropylene; alkyl perfluorovinyl ethers or alkoxyalkyl perfluorovinyl ethers.
  • Perfluoro (alkyl vinyl ether) such as perfluoro (methyl vinyl ether), perfluoro (ethyl vinyl ether), (propyl vinyl ether), perfluoro (butyl vinyl ether), perfluoro (isobutyl vinyl ether), etc .; perfluoro (propoxypropyl)
  • hexafluoropropylene and perfluoro (alkyl butyl ethereol) or perfluoro (alkoxyalkyl biether) are more preferred, and it is even more preferable to use these in combination.
  • the content of the structural unit (a), the total amount of the hydroxyl group-containing fluoropolymer (B- 2) is taken as 10 0 Monore 0/0, is 20 to 70 Monore 0/0 . This is because if the content is less than 20 mole 0/0, which is the optical characteristics of the fluorine-containing materials where the application is intended, the low refractive index On the other hand, when the content exceeds 70 mol%, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent, transparency, or group This is because the adhesion to the material may decrease. For this reason, it is more preferable that the content of the structural unit (a) is 25 to 65 mol% with respect to the total amount of the hydroxyl group-containing fluoropolymer (B_2). More preferably, it is 60 mol%.
  • the structural unit (b) is represented by the following general formula (2).
  • R 3 represents a hydrogen atom or a methyl group
  • R 4 represents an alkyl group
  • R 5 represents an alkyl group or a glycidyl group, X represents a number of 0 or 1), a carboxyl group, or an alkoxycarbonyl group
  • the alkyl group represented by R 4 or R 5 is a carbon number such as a methyl group, an ethyl group, a propynole group, a hexyl group, a cyclohexyl group, or a lauryl group.
  • the alkylcarbonyl group include a methoxycarbonyl group and an ethoxycarbonyl group.
  • the structural unit (b) can be introduced by using the above-mentioned butyl monomer having a substituent as a polymerization component.
  • Biel monomers include methyl vinyl ethere, ethino levinino le ethere, n- propino levinino ethere, isopropino levinino ether, n-butyl vinyl ether, isobutyl butyl ether, tert butyl butyl etherenore, n-pentinolevinoreethenore, n_hexinorevininoreethenore, n- octinorevininoreethenore, n- dodecinorevininoreethenore, 2-ethinorehexinorevininoreate nore Alkyl butyl etherols such as cyclohexyl butyl ether or cycloalkyl butyl
  • the content of the structural units (b), with respect to the total weight of the hydroxyl group-containing fluoropolymer (B- 2) preferably from force of 20 to 60 Monore 0/0, More preferably, it is 30-60 monole%.
  • the structural unit (c) is represented by the following general formula (3).
  • R 6 represents a hydrogen atom or a methyl group
  • R 7 represents a hydrogen atom or a hydroxyalkyl group
  • V represents a number of 0 or 1
  • the structural unit (c) can be introduced by using a hydroxyl group-containing vinyl monomer as a polymerization component.
  • hydroxyl-containing bur monomers include 2-hydroxyethylenovininoleetenore, 3-hydroxypropinorevininoleetenore, 2-hydroxypropinorevininoleetenore, 4-hydroxybutinolebi Ninoreetenore, 3-hydroxybutinorebininore Hydroxyl-containing vinyl ethers such as ether, 5-hydroxypentyl vinyl ether, 6-hydroxyhexyl vinyl ether, hydroxyl-containing vinyl ethers such as 2-hydroxyethyl aryl ether, 4-hydroxybutyl aryl ether, glycerol monoallyl ether, And aryl alcohol.
  • the hydroxyl group-containing butyl monomer includes 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and force prolatatone.
  • (Meth) acrylate, polypropylene glycol (meth) acrylate, etc. can be used.
  • the content of the structural unit (c) is preferably 5 to 70 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. ,.
  • the reason for this is that when the content is less than 5 mol%, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent may decrease, while the content is 70%. This is because if it exceeds mol%, the optical properties such as transparency and low reflectivity of the hydroxyl group-containing fluoropolymer (B-2) may deteriorate.
  • the hydroxyl group-containing fluoropolymer (B-2) preferably further comprises the following structural unit (d).
  • structural unit (d) will be described.
  • the structural unit (d) is represented by the following general formula (4).
  • R 8 and R 9 may be the same or different and each represents a hydrogen atom, an alkyl group, a halogenated alkyl group, or an aryl group]
  • the alkyl group represented by R 8 or R 9 is an alkyl group having 1 to 3 carbon atoms, such as a methinore group, an ethyl group, or a propyl group. Is trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluorobutyl group Examples of C1-4 fluoroalkyl group isotopes S and aryl groups include phenyl group, benzyl group, naphthyl group and the like.
  • the structural unit (d) can be introduced by using an azo group-containing polysiloxane compound having a polysiloxane segment represented by the general formula (4).
  • azo group-containing polysiloxane compounds include compounds represented by the following general formula (7).
  • R 1Q to R 13 , R ′′ to R 17 , p, q, s, t, and y are the same as those in the general formula (5), and z is a number of! ]
  • the structural unit (d) is included in the hydroxyl group-containing fluoropolymer as a part of the following structural unit (e).
  • the structural unit (e) is represented by the following general formula (5).
  • R 1Q to R 13 represent a hydrogen atom, an alkyl group, or a cyano group
  • R 14 to R 17 represent a hydrogen atom or an alkyl group
  • P and q are the numbers:! To 6, s, t Is a number from 0 to 6, y is 1 to 20
  • the alkyl groups represented by R 1 () to R 13 have 1 carbon atom such as a methinole group, an ethyl group, a propyl group, a hexyl group, and a cyclohexyl group.
  • alkyl groups of RM to R 17 include alkyl groups having 1 to 3 carbon atoms such as a methyl group, an ethyl group, and a propyl group.
  • the azo group-containing polysiloxane compound represented by the general formula (7) is used.
  • a compound represented by the following general formula (8) is particularly preferred.
  • the content of the structural unit (d) may be 0.1 to 10 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. I like it. The reason for this is that when the content is less than 0.1 mol%, the surface slipperiness of the cured coating film is lowered, and the scratch resistance of the coating film may be lowered. When the amount exceeds 10 mol%, the transparency of the hydroxyl group-containing fluoropolymer (B — 2) is inferior, and when used as a coating material, repelling and the like are likely to occur during coating. For this reason, the content of the structural unit (d) is more preferably set to 0.:!
  • Desirable 0 More preferably, it is set to 3 to 3 mol%. For the same reason, it is desirable that the content of the structural unit (e) is determined so that the content of the structural unit (d) contained therein falls within the above range.
  • the hydroxyl group-containing fluoropolymer (B-2) preferably further comprises the above structural unit (f).
  • the structural unit (f) will be described.
  • the structural unit (f) is represented by the following general formula (6).
  • R 18 represents an emulsifying group
  • the group having an emulsifying action for R 18 has both a hydrophobic group and a hydrophilic group, and the hydrophilic group is polyethylene oxide, polypropylene oxide, or the like.
  • a group having a polyether structure is preferred.
  • Examples of the group having an emulsifying action include a group represented by the following general formula (9).
  • n is a number from 1 to 20, m is a number from 0 to 4, and u is a number from 3 to 50]
  • the structural unit (f) can be introduced by using a reactive emulsifier as a polymerization component.
  • a reactive emulsifier examples include compounds represented by the following general formula (10).
  • the content of the structural unit (f), the entire amount of the hydroxyl group-containing fluoropolymer (B- 2) is 100 mol%, and 0.:! ⁇ 5 mole 0/0 It is preferable.
  • the reason for this is that when the content rate is 0.1 mol% or more, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in the solvent is improved, while if the content rate is within mol%, This is because the adhesiveness of the curable resin composition does not increase excessively, handling becomes easy, and moisture resistance does not decrease even when used as a coating material.
  • the content of the structural unit (f) is more preferably 0.:! To 3 mol% with respect to the total amount of the hydroxyl group-containing fluorine-containing polymer (B-2). More preferably, it is 0.2 to 3 mol%.
  • the hydroxyl group-containing fluoropolymer (B_2) has a polystyrene-reduced number average molecular weight of 5 as measured by gel permeation chromatography (hereinafter referred to as “GPC”) using tetrahydrofuran (hereinafter referred to as “THF”) as a solvent. , 000 to 500,000. This reason is that when the number average molecular weight is less than 5,000, the mechanical strength of the hydroxyl group-containing fluoropolymer (B-2) may decrease, while the number average molecular weight exceeds 500,000. This is because the viscosity of the curable resin composition becomes high and thin film coating may be difficult. For these reasons, the hydroxyl-containing fluoropolymer (B-2) has a polystyrene equivalent number average molecular weight of preferably 10,000 to 300,000, more preferably 10,000 to 100,000. Power S More preferred.
  • the ethylenically unsaturated group-containing fluoropolymer (B) used in the present invention comprises the above-described compound (B_ 1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group. It is preferably obtained by reacting the fluorine-containing polymer (B-2) with a molar ratio of isocyanate group Z hydroxyl group of 1.:! To 1.9. The reason for this is that if the molar ratio is less than 1.1, the scratch resistance and durability may be lowered. On the other hand, if the molar ratio exceeds 1.9, the coating film of the curable resin composition may be deteriorated.
  • the content of (i) the ethylenically unsaturated group-containing fluoropolymer in the curable resin composition is usually 3 to 70% by mass with respect to 100% by mass of the total composition excluding the organic solvent. is there .
  • the reason for this is that when the content is less than 3% by mass, the refractive index of the cured coating film of the curable resin composition increases, and a sufficient antireflection effect may not be obtained. This is because if the added amount exceeds 70% by mass, the scratch resistance of the cured coating film of the curable resin composition may not be obtained.
  • the (C) fast volatile solvent contained in the curable resin composition is one or two or more kinds of solvents which have high solubility of the above-mentioned (ii) ethylenically unsaturated group-containing fluoropolymer.
  • the high solubility of the ethylenically unsaturated group-containing fluoropolymer means that (i) the ethylenically unsaturated group-containing fluoropolymer is When a fluoropolymer is added to each solvent so as to be 50% by mass and stirred at room temperature for 8 hours, it means that the solution becomes visually uniform.
  • the relative evaporation rate of the (C) fast volatile solvent needs to be larger than the relative evaporation rate of the later-described (D) slow volatile solvent.
  • the “relative evaporation rate” is the relative value of the evaporation rate based on the time required for 90% by weight of butyl acetate to evaporate. For details, see TECHNIQUES OF CHEMISTRY VOL.2 ORG ANIC. SOLVENTS Physical Properties and methods of purification 4th ed. (Interscience Publishers, Inc. 1986 page 62).
  • the (C) fast volatile solvent preferably has low dispersion stability of the metal oxide particles (metal oxide particle component (A)) of (A1) and (A2).
  • the fast volatile solvent has a relative evaporation rate higher than that of (D), and (B) the high solubility of the fluorine-containing polymer containing ethylenically unsaturated groups allows the curable resin composition to be used as a base material.
  • the metal oxide particles 1) and (A2) can be unevenly distributed.
  • (A1) and (A2) can be unevenly distributed.
  • the solvent that can be used as the (C) fast volatile solvent in the present invention is a solvent having a relative evaporation rate of about 1.7 or more, specifically, methyl ethyl ketone (MEK; relative evaporation rate). 3.8), isopropanol (IPA; 1.7), methylisoptyl ketone (MIBK; relative evaporation rate 1.6), methyl amyl ketone ( ⁇ ; 0 ⁇ 3), acetone, methyl propyl ketone, etc. .
  • MEK methyl ethyl ketone
  • MIBK methylisoptyl ketone
  • the (D) slow volatile solvent contained in the curable resin composition is one or two or more kinds of solvents that have high dispersion stability of the metal oxide particles (A1) and ( ⁇ 2).
  • the high dispersion stability of the metal oxide particles (A1) and ( ⁇ 2) means that the glass plate is immersed in an isopropanol dispersion of the metal oxide particles (A1) and ( ⁇ 2) (A1) When (A1) and ( ⁇ 2) are attached to the glass wall, and the glass plate to which the metal oxide particles (A1) and ( ⁇ 2) are attached is immersed in each solvent. ) Is uniformly dispersed visually in the solvent.
  • the slow volatile solvent preferably has the low solubility of the above (ii) ethylenically unsaturated group-containing fluoropolymer.
  • the solvent that can be used as the (D) slow volatile solvent in the present invention includes methanol (relative evaporation rate 2 ⁇ 1), isopropanol ( ⁇ ; 1 ⁇ 7), ⁇ -butanol (n-BuOH; 0.5), tert-butanol, propylene glycol monomethyl ether, propylene glycol monoethylenoateolene, propyleneglycolmonopropinoleethenole, ethinorescerosolev, propylcellosolve, butylcetosolve and the like.
  • the solvent used in the production of the (B) ethylenically unsaturated group-containing fluoropolymer is usually used as it is. be able to.
  • the (C) fast volatile solvent and (D) slow volatile solvent used in the present invention must be compatible.
  • the compatibility is sufficient if the specific composition of the composition has such a degree of compatibility that (C) fast volatile solvent and (D) slow volatile solvent do not separate.
  • the total amount of the solvent (C) and the solvent (D) is usually 300 parts by mass with respect to 100 parts by mass of the components other than the solvent (including the components (C) and (D)) in the curable resin composition. To 5000 parts by mass, preferably 300 to 4000 parts by mass, more preferably 300 to 3000 parts by mass.
  • the mixing ratio of the solvent (C) and the solvent (D) can be arbitrarily selected within the range of 1:99 to 99: 1.
  • a polyfunctional (meth) attareito toy compound (E-1) containing at least two (meth) attaroyl groups is a cured product obtained by curing a curable resin composition and a reflection using the same. It can be used to increase the scratch resistance of the protective film.
  • the fluorine-containing (meth) ataretoy compound (E_2) containing at least one (meth) ataryloyl group is used to lower the refractive index of the curable resin composition.
  • At least two (meth) atalyloyl groups are present in the molecule. If it is a compound to contain, it will not restrict
  • neopentyl glycol di (meth) acrylate dipentaerythritol hexa (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate and force prolatathone modification
  • Dipentaerythritol hexa (meth) acrylate a compound represented by the following formula (11) is particularly preferred.
  • the compound (E-2) is not particularly limited as long as it is a fluorine-containing (meth) ataretoy compound containing at least one (meth) ataryloyl group.
  • fluorine-containing (meth) ataretoy compound containing at least one (meth) ataryloyl group.
  • examples thereof include perfluorooctylethyl (meth) acrylate, octafluoropentyl (meth) acrylate, trifluoroethyl (meth) acrylate, and the like alone or in combination. The combination of the above is mentioned.
  • the content of component (E) in the curable resin composition is not particularly limited, but is usually 3 to 80% by mass with respect to 100% by mass of the total composition excluding the organic solvent. is there.
  • the reason for this is that if the addition amount is less than 3% by mass, the scratch resistance of the cured coating film of the curable resin composition may not be obtained, while if the addition amount exceeds 80% by mass, This is because the refractive index of the cured coating film of the curable resin composition becomes high and a sufficient antireflection effect may not be obtained.
  • the curable resin composition if necessary, it is possible to add (F) a radical photopolymerization initiator (radiation (photo) polymerization initiator) that generates active radical species by radiation (light) irradiation. .
  • a radical photopolymerization initiator radiation (photo) polymerization initiator
  • the radiation (photo) polymerization initiator is not particularly limited as long as it can be decomposed by light irradiation to generate radicals to initiate polymerization.
  • acetophenone acetophenone benzil ketal, 1-hydroxycyclohexyl.
  • Radial (photo) polymerization initiators include, for example, Ciba 'Specialty' Chemicals Co., Ltd. trade names: Inoregacure 184, 369, 651, 500, 819, 907, 784, 2959, CGI1700, CGI1750, CGI1850, CG24-61, Darocur 1116, 1173, manufactured by BAS F Product name: Lucirin TPO, manufactured by UCB Product name: Nubekril P36, Fratelli 'manufactured by Lamberti Company Name: Ezacure KIP150, KIP65LT, KIP100F, KT37, KT55, ⁇ 046, ⁇ 75 / ⁇ etc.
  • the amount of the radical photopolymerization initiator (F) used as necessary in the present invention may be 0.01 to 10% by mass, with the total amount of the composition excluding the organic solvent being 100% by mass. Preferred 0.1 to 10% by mass is more preferred. If the content is less than 0.01% by mass, the hardness of the cured product may be insufficient, and if it exceeds 10% by mass, the cured product may not be cured to the inside (lower layer).
  • a photosensitizer for the purposes of the present invention, a photosensitizer, a polymerization inhibitor, a polymerization initiation assistant, a leveling agent, a wettability improver, a surfactant, a plasticizer are used as necessary.
  • An agent, an absorbent, an antioxidant, an antistatic agent, an inorganic filler, a pigment, a dye, a solvent other than the solvents (C) and (D), and the like can be appropriately blended.
  • the curable resin composition of the present invention is produced as follows.
  • Dispersion of two types of metal oxide particles (A1) and ( ⁇ 2) and ethylenically unsaturated group-containing fluoropolymer (component (B)), if necessary, polyfunctional (meth) acrylate ((E) Component), radiation (light) polymerization initiator (component (F)), etc. are placed in a reaction vessel equipped with a stirrer and stirred at 35 ° C. to 45 ° C. for 2 hours to obtain a curable resin composition.
  • the curable resin composition of the present invention is suitable for use as an antireflection film or a coating material.
  • the base material to be antireflection or coated include plastics (polycarbonate, polymethacrylate, polystyrene, polyester, polyolefin). , Epoxy, melamine, triaceti Cellulose, ABS, AS, norbornene resin, etc.), metal, wood, paper, glass, and slate.
  • These base materials may be plate-like, film-like or three-dimensionally formed by a usual coating method such as date coating, spray coating, flow coating, shower coating, ronore coating, spin coating, brush. The ability to raise paints etc.
  • the thickness of the coating film by these coatings is usually from 0.:! To 400 xm after drying and curing, and preferably from :! to 200 ⁇ .
  • the curable resin composition of the present invention can be cured by radiation (light).
  • the radiation source is not particularly limited as long as the composition can be cured in a short time after coating.
  • a lamp for example, as an infrared radiation source, a lamp, a resistance heating plate, a laser, etc.
  • sources of visible light such as sunlight, lamps, fluorescent lamps, and lasers, as sources of ultraviolet rays, mercury lamps, lamps, laser lamps, lasers, etc., and as sources of electron beams
  • a method using thermal electrons generated from tungsten filaments, a cold cathode method that generates high-voltage pulses in metals, and a secondary electron method that uses secondary electrons generated by collisions between ionized gaseous molecules and metal electrodes. Can be mentioned.
  • a fission material such as 6 ° Co
  • a gamma ray or a vacuum tube that collides accelerated electrons with the anode should be used. Can do.
  • These radiations can be used alone or in combination of two or more simultaneously or at regular intervals.
  • the curable resin composition of the present invention is preferably ultraviolet curable.
  • the curing reaction of the curable resin composition must be performed under anaerobic conditions such as nitrogen. The reason is that in the presence of oxygen, radical polymerization is inhibited, so that the curing reaction is not sufficient. Because it becomes minutes.
  • the cured film of the present invention can be obtained by coating the curable resin composition on various substrates, for example, a plastic substrate and curing it. Specifically, it is possible to obtain a coated molded body by coating the composition, and preferably drying the volatile component at 0 to 200 ° C. and then performing the above-described curing treatment with radiation.
  • the curing treatment with radiation it is preferable to use ultraviolet rays or electron beams. In such a case, the preferable irradiation amount of ultraviolet rays is 0.01 to 10 j / cm 2 , and more preferably is 0.:! To 2 j / cm 2 .
  • preferable electron beam irradiation conditions are a pressurization voltage of 10 to 300 KV, an electron density of 0.02 to 0.30 mA / cm 2 , and an electron beam irradiation amount of:! To 1 OMrad.
  • the metal oxide particles (A1) and (A2) metal oxide
  • the substance particle component (A)) is unevenly distributed on the coated base side (near the boundary with the adjacent layer) or on the opposite side. Therefore, the metal oxide particle component (A) is present in high density near one interface of the cured film, and the metal oxide particle component (A) is substantially absent near the other interface of the cured film.
  • a resin layer having a low refractive index is formed. Therefore, a cured film having a layer structure of two or more layers can be obtained by curing one coating film made of the curable resin composition.
  • the layer in which the metal oxide particle component (A) is present at a high density is a concept indicating a portion where the metal oxide particle component (A) is aggregated. Although the layer is configured as the main component, component (B) may coexist in the layer.
  • the layer in which the metal oxide particle component (A) does not substantially exist is a concept indicating a portion in which the metal oxide particle component (A) does not exist, but does not impair the effects of the present invention.
  • the layer may contain a slight amount of the metal oxide particle component (A), and this layer is substantially a component other than the metal oxide particle component (A) such as a cured product of the components (B) and (E).
  • the cured film includes a layer in which the metal oxide particle component (A) is present at a high density and a layer in which the metal oxide particle component (A) is substantially absent.
  • Each has a two-layer structure with a continuous layer of PET resin (PET resin with an easy-adhesion layer)
  • PET resin PET resin with an easy-adhesion layer
  • a layer that is a base material, a layer in which the metal oxide particle component (A) is present at a high density, and a layer in which the metal oxide particle component (A) is not substantially present are formed adjacent to each other in this order.
  • the layer structure of two or more layers means “a layer in which metal oxide particles (A1) and (A2) are present at high density” and “metal oxide (A1) and (A2)”. It may consist of two or more layers including both of the particles and layers that are substantially free of particles, and two or more “(A1) or (A2) metal oxide particles exist in high density. In some cases, it consists only of “layers”.
  • two or more “layers in which the metal oxide particles exist at high density” may be formed.
  • the “metal oxide particles” in the “layer in which metal oxide particles are present at high density” means at least one, that is, one or more “metal oxide particles”.
  • one “layer in which metal oxide particles exist at high density” may be composed of two or more kinds of metal oxide particles.
  • the (B) ethylenically unsaturated group-containing fluorine-containing polymer in the curable resin composition has a lower refractive index than that of a thermosetting resin (for example, a melamine compound).
  • the layer has preferable optical characteristics. Further, by using metal oxide particles (Aa) having a high refractive index as a constituent material of the metal oxide particle component (A), a further excellent antireflection film can be formed.
  • the cured film of the present invention obtained by coating the curable resin composition of the present invention on a substrate and UV-curing the same is excellent in transparency, high hardness, scratch resistance, substrate, and
  • the base material has a feature capable of forming a coating film (coating film) excellent in adhesion to an adjacent layer such as a low refractive index layer.
  • the cured film is particularly suitably used for an antireflection film for film-type liquid crystal elements, touch panels, plastic optical components and the like.
  • NK Ester A _TMM_ 3LM_N pentaerythritol tri Atari rate 60 mass 0/0 and pentaerythritol Atari rate 40% by weight in the reaction solution.
  • NK Ester A _TMM_ 3LM_N pentaerythritol tri Atari rate 60 mass 0/0 and pentaerythritol Atari rate 40% by weight in the reaction solution.
  • participating in the reaction (Only pentaerythritol triatallylate having a hydroxyl group.) 549 parts were added dropwise at 30 ° C over 1 hour, and then stirred at 60 ° C for 10 hours to obtain a reaction solution.
  • the product in this reaction solution that is, the amount of residual isocyanate in the organic compound having a polymerizable unsaturated group was measured by FT-IR, and it was 0.1% by mass or less, and each reaction was performed almost quantitatively. I confirmed that.
  • the absorption peak of 2550 Kaiser characteristic of the mercapto group in the raw material
  • the absorption peak of 2260 Kaiser characteristic of the raw isocyanate compound, disappeared.
  • a 1660-membered peak characteristic of urethane bonds and S (C ⁇ ) NH-groups and a 1720-force peak characteristic of attaryloxy groups were observed as polymerizable unsaturated groups.
  • alkoxysilane (1) A composition of 220 parts of pentaerythritol tetratalylate that was not involved in the reaction (hereinafter, this composition may be referred to as “alkoxysilane (1)”) (A # l) was obtained.
  • NK ester A—TMM—3LM—N made by Shin-Nakamura Chemical Co., Ltd. for a solution consisting of 18.8 parts of isophorone diisocyanate and 0.2 part of dibutyltin dilaurate in a vessel equipped with a stirrer (Only the pentaerythritol triatalylate having a hydroxyl group is involved in the reaction.) 93 parts were added dropwise at 10 ° C for 1 hour, and then stirred at 60 ° C for 6 hours. The reaction solution was used.
  • the product in this reaction solution that is, the amount of residual isocyanate was measured by FT-IR in the same manner as in Production Example 1, and was 0.1% by mass or less, confirming that the reaction was carried out almost quantitatively. I confirmed. In addition, it was confirmed that the molecule contains a urethane bond and an taliloyl group (polymerizable unsaturated group).
  • composition containing polymerizable unsaturated groups produced in Production Example 1 (A # 1) 2. 32 parts, silica particle sol (methylethylketone silica sol, MEK-ST, Nissan Chemical Industries, Ltd., number average particle) (Diameter 0.022 ⁇ 0 ⁇ , silica concentration 30%) 91. 3 parts (27 parts as silica particles), 0 ⁇ 1 2 parts of ion-exchanged water, and 0.01 part of ⁇ -hydroxyphenyl monomethyl ether After stirring at 60 ° C for 4 hours, 1.36 parts of orthoformate methyl ester was added, and the mixture was further heated and stirred at the same temperature for 1 hour to obtain reactive particles (dispersion liquid (A # 3)).
  • silica particle sol methylethylketone silica sol, MEK-ST, Nissan Chemical Industries, Ltd., number average particle
  • 91. 3 parts 27 parts as silica particles
  • 0 ⁇ 1 2 parts of ion-exchanged water 0 ⁇ 1 2 parts of
  • This dispersion (A # 3) 98.6 g, composition (A # 2) 3.4 g, 1-hydroxy cyclohexyl phenyl ketone 2. lg, 11 ⁇ 80 111 £ 907 (2 _methyl_ 1 _ [4_ (Methylthio) phenyl] —2-morpholinopropane 1-one, manufactured by Chinoku Specialty Chemicals) 1.2 g, dipentaerythritol hexatatalylate (DPHA) 33.2 g, cyclohexanone 7 g Mixing and stirring were carried out to obtain 145 g of a silica particle-containing composition for hard coat layer (solid content concentration: 50%).
  • composition (A # 2) 1.34 g, 1-hydroxycyclohexenolephenoloketone 1.26 g, IRGACURE907 (2-methyl-1- [4- (methylthio) phenyl] _ 2_morpholino Propane 1_one, Ciba Specialty Chemicals) 0 ⁇ 76 g and MEK2846 g were mixed and stirred to obtain 2964 g of a zirconia particle-containing composition (solid content concentration 4%).
  • ITO sol (10wt% IPA sol) made by Fuji Chemical Co., Ltd. 700g, DPHA 29.5g, 2 methyl 1 [4 (methylthio) phenyl] 2-morpholinopropane 1on lg, isopropyl alcohol (IP A) 1769. 5g An ITO particle-containing composition having a solid content concentration of 4% was obtained.
  • ATO particles Ishihara Techno Co., Ltd., SN-100P, primary particle size 10-30nm
  • dispersant Adekapulu Knick TR-701
  • methanol methanol
  • 78/21 1 weight ratio was mixed (total solid content 31%, total inorganic content 29.6%).
  • a 50ml plastic bottle of Pain Tossier put 40g of glass beads (manufactured by T ⁇ SHINRIK ⁇ , BZ-01) (bead diameter: 0.1mm) (volume: about 16ml) and the above mixture (30g) for 3 hours. Dispersion and a dispersion sol having a median diameter of 80 nm were obtained.
  • this sol has a composition (A # l) 5.7 g, p-methoxyphenol After stirring a mixed solution of 0.1 g of diol and 0.12 g of ion-exchanged water at 60 ° C for 3 hours, add 1.3 g of orthoformate methyl ester and heat and stir at the same temperature for 1 hour. 311 g of ATO particle dispersion was obtained.
  • Zinc oxide particles (A1-doped ZnO particles manufactured by Sakai Chemical, primary particle size 10-20 nm), dispersant (manufactured by Takamoto Kasei Co., Ltd., High Blood ED151) and propylene glycol monomethyl ether, 27.6 / 4.8 / 67.6 (weight ratio) was mixed (total solid content 30%, total inorganic content 27.6%).
  • Zirconia beads 40 g (bead diameter 0.1 mm) and the above mixed solution (30 g) were placed in a 50 ml plastic bottle of paint cheer, and dispersed for 8 hours to obtain a dispersion zone with a median diameter of 40 nm.
  • the number average particle diameter of the TiO particles was 20 nm.
  • the average particle size is transmission type Measured with an electron microscope.
  • Olg and MIBK374g were charged, and the mixture was stirred until the hydroxyl group-containing fluoropolymer (B-2) was dissolved in MIBK at 20 ° C until the solution became clear and uniform.
  • the average particle diameter of the silica-based particles was 50 nm.
  • the average particle diameter was measured with a transmission electron microscope.
  • Alkoxysilane (1) 1 part 1 as in Production Example 11, Methyl ethyl ketone silica sol (manufactured by Nissan Chemical Industries, Ltd., trade name: MEK-ST (number average particle size 0.020 / m, silica concentration) 30%) 91.3 parts (solid content 27.4 parts), ion-exchanged water 0.1 parts, orthoformate methyl ester 1.4 parts were used to obtain a particle dispersion (A2-2). The solid content of the dispersion (A1-2) was determined to be 36% by mass.
  • the average particle diameter of the silica-based particles was 20 nm.
  • the average particle diameter was measured with a transmission electron microscope.
  • cured films were prepared using the curable resin compositions:! To 5 produced in the above Examples:! To 3 and Comparative Examples 1 and 2, and properties of the cured films were evaluated.
  • the method for producing the cured film is as follows.
  • Silica particle sol (Methyl ethyl ketone silica sol, MEK_ST, Nissan Chemical Industries, Ltd., number average particle size 0.022 ⁇ , silica concentration 30 ⁇ / ⁇ ) 98.6 g, 1-hydroxycyclohexenoyl phenyl ketone 2 ⁇ Lg, IRGACURE907 (2—Methyl— 1— [4— (Methylthio) phenol 2-NO] — 2-morpholinopropane 1-one, manufactured by Chinoku “Specialty Chemicals” 1 • 2 g, Dipentaerythritol Hexaatalylate (DPHA) 3 ⁇ 2 g and cyclohexanone 7 g were mixed and stirred to obtain a silica particle-containing composition for hard coat layer.
  • DPHA Dipentaerythritol Hexaatalylate
  • This silica particle-containing hard coat layer composition was applied to a triacetyl cellulose film (LOFO, film thickness 80 ⁇ m) using a wire bar coater (# 12), and then heated in an oven at 80 ° C. Dried for a minute. Subsequently, a hard coat layer was formed by irradiating with ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in air. When the film thickness of the hard coat layer was measured with a stylus type film thickness meter, it was 5 am.
  • the steel wool resistance test of the cured film was performed by the following method.
  • steel wool (Bonster No. 0000, manufactured by Nippon Steel Wool Co., Ltd.) is attached to a Gakushin type friction fastness tester (AB_ 301, manufactured by Tester Sangyo Co., Ltd.), and the surface of the cured film is loaded to 1 kg. Under these conditions, rubbing was repeated 10 times, and the presence or absence of scratches on the surface of the cured film was visually confirmed according to the following criteria.
  • The cured film is almost free from peeling and scratches.
  • Turbidity (Haze value) in the obtained laminate was measured using a Haze meter and evaluated according to the following criteria.
  • Haze value is 1% or less.
  • Haze value is 3% or less.
  • the ethanol resistance test of the cured film was performed by the following method. That is, a non-woven fabric soaked with ethanol (BEMCOT S-2, manufactured by Asahi Kasei Kogyo Co., Ltd.) is attached to a Gakushin type friction fastness tester (AB-301, manufactured by Tester Sangyo Co., Ltd.), and the surface of the cured film was repeatedly rubbed 20 times under the condition of a load of 500 g, and the presence or absence of scratches on the surface of the cured film was visually confirmed according to the following criteria.
  • BEMCOT S-2 non-woven fabric soaked with ethanol
  • AB-301 manufactured by Tester Sangyo Co., Ltd.
  • The cured film is almost free from peeling and scratches.
  • Fig. 2 shows an electron micrograph showing typical examples of each state as a concept.
  • DPPA Dipentaerythritol pentaatarylate
  • UV curable crosslinking agent penentafunctional
  • Inoregacure 369 2-Benzyl-2-dimethylamino-1- (4-morpholinophenol) 1-butanone
  • Comparative Example 1 In contrast, in Comparative Example 1 in which only one type of metal oxide particles (A1) was blended, the scratch resistance and chemical resistance were lowered. Further, in Comparative Example 2 in which two types of particles corresponding to the metal oxide particles (A1) were blended, the layer separability was lowered, and the scratch resistance and transparency were inferior.
  • the silica particle-containing hard coat layer composition prepared in Production Example 3 is applied to a triacetyl cellulose film (LOFO, film thickness 80 / m). After coating, it was dried in an oven at 80 ° C for 1 minute. Subsequently, a cured film layer was formed by irradiating ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in the air. When the film thickness of the cured film layer was measured with a stylus type film thickness meter, it was 5 / m.
  • the curable resin compositions 1 to 3 obtained in Examples 1 to 3 were each coated on the medium refractive index layer prepared in (2) using a wire bar coater (# 3), and then the oven. Medium Dry for 2 minutes at 140 ° C, use a conveyor-type mercury lamp manufactured by Oak Manufacturing Co., Ltd., 0.6j / cm 2 By irradiating with ultraviolet rays, a cured film layer having a film thickness of 0.2 ⁇ was formed.
  • Example 4 It was produced in the same manner as (2).
  • soot particle-containing composition solid content concentration 5%
  • A1-doped ⁇ particle-containing composition solid content concentration 4%) prepared in Production Example 6 or 7 is used.
  • LOFO triacetyl cellulose film
  • a cured film layer was formed by irradiating ultraviolet rays under a light irradiation condition of 0.6 jZcm 2 using a high-pressure mercury lamp in a nitrogen atmosphere.
  • the thickness of the cured film layer was calculated with a reflection spectrometer, it was 7 at 65 nm.
  • the silica particle-containing hard coat layer composition (solid content concentration 50%) prepared in Production Example 3 was applied using a wire bar coater (# 12) and then dried in an oven at 80 ° C for 1 minute. Subsequently, a cured film layer was formed by irradiating with ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in air.
  • Example 4 It was produced in the same manner as (2).
  • the low refractive index layer and the high refractive index layer were separated into two layers in any laminate. It was confirmed. At this time, the low refractive index layer was a layer in which metal oxide particles were not substantially present, and the high refractive index layer was a layer in which metal oxide particles were present at high density.
  • Figure 11 shows the concept of two-layer separation, no separation (partially agglomerated) and uniform structure.
  • the anti-reflection properties of the resulting anti-reflection laminate were measured using a spectral reflectance measurement device (self-recording spectrophotometer U— 3410 incorporating Hitachi Integrating Sphere 150-09090, manufactured by Hitachi, Ltd.).
  • the reflectance at a wavelength of 550 nm was measured and evaluated.
  • the reflectance of the antireflection laminate (antireflection film) was measured using the reflectance of the deposited aluminum film as a reference (100%). As a result, all the laminates had a reflectance of 1% or less at a wavelength of 550 nm.
  • the curable resin composition of the present invention can form a cured film composed of two or more layers on a substrate from one coating film, and can simplify the manufacturing process. .
  • the curable resin composition of the present invention and the cured film thereof are scratched (scratched) such as plastic optical parts, touch panels, film-type liquid crystal elements, plastic containers, floor materials as building interior materials, wall materials, and artificial marble.
  • the method for producing a laminate of the present invention can form two or more layers from one coating film, the production process of a laminate having a multilayer structure of two or more layers can be simplified. Therefore, the method for producing a laminate of the present invention can be advantageously used particularly for the formation of optical materials such as antireflection films, lenses, and selective transmission film filters. Further, the obtained laminate can be suitably used as a paint, weather resistant film, coating, etc. for a substrate requiring weather resistance by utilizing the fact that a layer having a high fluorine content can be included. In addition, the laminate is excellent in adhesion to the base material and imparts a good antireflection effect with high scratch resistance. Therefore, the laminate is extremely useful as an antireflection film and is applied to various display devices. Therefore, the visibility can be improved.

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Abstract

Disclosed is a method for producing a multilayer body comprising a base (30) and a multilayer structure (40, 50) formed thereon. Specifically disclosed is a method for producing a multilayer body which is characterized in that a coating film is formed by applying a curable resin composition containing metal oxide particles (A1) having a number average particle diameter of not less than 1 nm and less than 40 nm, metal oxide particles (A2) having a number average particle diameter of not less than 40 nm and not more than 200 nm, an ethylenically unsaturated group-containing fluorine polymer (B), a highly volatile solvent (C) and a low volatile solvent (D) to a base (30) or a layer formed on the base, and two or more layers (40, 50) are formed by evaporating the solvents from this single coating film.

Description

明 細 書  Specification

硬化性樹脂組成物、それからなる硬化膜及び積層体  Curable resin composition, cured film and laminate comprising the same

技術分野  Technical field

[0001] 本発明は、硬化性樹脂組成物、それ力 なる硬化膜、積層体の製造方法及びそれ により得られる積層体に関し、特に、例えば、低屈折率層と高屈折率層等の、任意の 連続する二層以上の層からなる硬化膜を一の塗膜から形成することができる硬化性 樹脂組成物及び 2以上の層を一の塗膜から形成することができる積層体の製造方法 に関する。  TECHNICAL FIELD [0001] The present invention relates to a curable resin composition, a cured film capable of producing the same, a method for producing a laminate, and a laminate obtained thereby, in particular, for example, an arbitrary layer such as a low refractive index layer and a high refractive index layer. The present invention relates to a curable resin composition capable of forming a cured film composed of two or more continuous layers from one coating film, and a method for producing a laminate capable of forming two or more layers from one coating film. .

背景技術  Background art

[0002] 現在、マルチメディアの発達に伴い、各種の表示装置(ディスプレイ装置)において 種々の発展が見られている。そして、各種の表示装置のうち、特に、携帯用を中心に 屋外で使用されるものでは、その視認性の向上がますます重要となってきており、大 型表示装置においても、より見易くすることが需要者に要求されており、この事項がそ のまま技術課題となっている。  [0002] Currently, with the development of multimedia, various developments have been seen in various display devices (display devices). And among various types of display devices, especially those used outdoors, mainly for portable use, the improvement of visibility has become increasingly important, and even for large display devices, making it easier to see. This is a technical issue as it is.

[0003] 液晶表示パネル、冷陰極線管パネル、プラズマディスプレー等の各種表示パネル において、外光の映りを防止し、画質を向上させるために、低屈折率性、耐擦傷性、 塗工性、及び耐久性に優れた硬化物からなる低屈折率層を含む反射防止膜が求め られている。これら表示パネルにおいては、付着した指紋、埃等を除去するため、そ の表面を、エタノール等を含侵したガーゼで拭くことが多ぐ耐擦傷性が求められて いる。特に、液晶表示パネルにおいては、反射防止膜は、偏光板と貼り合わせた状 態で液晶ユニット上に設けられている。また、基材としては、例えば、トリァセチルセル ロース等が用レ、られているが、このような基材を用いた反射防止膜では、偏光板と貼 り合わせる際の密着性を増すために、通常、アルカリ水溶液でケン化を行う必要があ る。従って、液晶表示パネルの用途においては、耐久性において、特に、耐アルカリ 性に優れた反射防止膜が求められている。  In various display panels such as liquid crystal display panels, cold cathode ray tube panels, plasma displays, etc., in order to prevent reflection of external light and improve image quality, low refractive index properties, scratch resistance, coating properties, and There is a demand for an antireflection film including a low refractive index layer made of a cured product having excellent durability. In these display panels, in order to remove attached fingerprints, dust, and the like, the surface is often wiped with gauze impregnated with ethanol or the like, and scratch resistance is required. In particular, in a liquid crystal display panel, the antireflection film is provided on the liquid crystal unit in a state of being bonded to a polarizing plate. In addition, as the base material, for example, triacetyl cellulose is used, but in an antireflection film using such a base material, in order to increase the adhesion when pasted to the polarizing plate, It is necessary to saponify with an alkaline aqueous solution. Therefore, in applications of liquid crystal display panels, there is a demand for an antireflection film excellent in alkali resistance, particularly in durability.

[0004] 従来、表示装置の視認性を向上させるための一手段として、低屈折率材料から構 成される反射防止膜を、表示装置の基板に被覆することが行われており、反射防止 膜を形成する方法としては、例えば、フッ素化合物の薄膜を蒸着法により形成する方 法が知られている。然るに、近年では、液晶表示装置を中心として、低いコストで、し 力も大型の表示装置に対しても、反射防止膜を形成することのできる技術が求められ ている。し力 ながら、蒸着法による場合には、大面積の基板に対して、高い効率で 均一な反射防止膜を形成することが困難であり、しかも真空装置を必要とするために 、コストを低くすることが困難である。 Conventionally, as a means for improving the visibility of a display device, an antireflection film made of a low refractive index material has been coated on the substrate of the display device, and thus antireflection is performed. As a method of forming a film, for example, a method of forming a thin film of a fluorine compound by a vapor deposition method is known. However, in recent years, there has been a demand for a technique capable of forming an antireflection film for a display device having a low cost and a large force, mainly in a liquid crystal display device. However, in the case of the vapor deposition method, it is difficult to form a uniform and high-efficiency antireflection film on a large-area substrate, and a vacuum apparatus is required, which reduces the cost. Is difficult.

[0005] このような事情から、屈折率の低いフッ素系重合体を有機溶剤に溶解して液状の組 成物を調製し、これを基板の表面に塗布することによって反射防止膜を形成する方 法が検討されている。例えば、基板の表面にフッ素化アルキルシランを塗布すること が提案されている(例えば、特許文献 1及び特許文献 2参照)。また、特定の構造を 有するフッ素系重合体を塗布する方法が提案されている(例えば、特許文献 3参照)  [0005] Under these circumstances, an antireflection film is formed by preparing a liquid composition by dissolving a fluorine-based polymer having a low refractive index in an organic solvent, and applying this to the surface of the substrate. The law is being considered. For example, it has been proposed to apply a fluorinated alkylsilane to the surface of a substrate (see, for example, Patent Document 1 and Patent Document 2). In addition, a method of applying a fluoropolymer having a specific structure has been proposed (for example, see Patent Document 3).

[0006] 反射防止膜の低屈折率層用材料として、例えば、水酸基含有含フッ素重合体を含 むフッ素樹脂系塗料が知られており、特許文献 4、特許文献 5及び特許文献 6等に開 示されている。しかし、このようなフッ素樹脂系塗料では、塗膜を硬化させるために、 水酸基含有含フッ素重合体と、メラミン樹脂等の硬化剤とを、酸触媒下、加熱して架 橋させる必要があり、加熱条件によっては、硬化時間が過度に長くなつたり、使用で きる基材の種類が限定されてしまったりという問題があった。また、得られた塗膜につ レ、ても、耐候性には優れているものの、耐擦傷性や耐久性に乏しいという問題があつ た。 [0006] As a material for a low refractive index layer of an antireflection film, for example, a fluororesin-based paint containing a hydroxyl group-containing fluoropolymer is known, which is disclosed in Patent Document 4, Patent Document 5, Patent Document 6, and the like. It is shown. However, in such a fluororesin-based paint, in order to cure the coating film, it is necessary to heat and bridge a hydroxyl group-containing fluoropolymer and a curing agent such as melamine resin under an acid catalyst. Depending on the heating conditions, there are problems that the curing time becomes excessively long and the types of substrates that can be used are limited. In addition, the obtained coating film had a problem that it was excellent in weather resistance but poor in scratch resistance and durability.

[0007] そこで、上記の問題点を解決するため、特許文献 7では、少なくとも 1個のイソシァ ネート基と少なくとも 1個の付加重合性不飽和基とを有するイソシァネート基含有不 飽和化合物と水酸基含有含フッ素重合体とを、イソシァネート基の数/水酸基の数 の比が 0. 01〜: 1. 0の割合で反応させて得られる不飽和基含有含フッ素ビュル重合 体を含む塗料用組成物が提案されてレヽる。  [0007] In order to solve the above problems, Patent Document 7 discloses an isocyanate group-containing unsaturated compound having at least one isocyanate group and at least one addition-polymerizable unsaturated group, and a hydroxyl group-containing compound. Proposal of a coating composition containing an unsaturated group-containing fluorine-containing bull polymer obtained by reacting a fluorine polymer with a ratio of the number of isocyanate groups / number of hydroxyl groups of 0.01 to 1.0. It has been done.

[0008] 特許文献 1 :特開昭 61— 40845号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 61-40845

特許文献 2:特公平 6 - 98703号公報  Patent Document 2: Japanese Patent Publication No. 6-98703

特許文献 3:特開平 6— 115023号公報 特許文献 4 :特開昭 57— 34107号公報 Patent Document 3: Japanese Patent Laid-Open No. 6-115023 Patent Document 4: JP-A-57-34107

特許文献 5 :特開昭 59— 189108号公報  Patent Document 5: Japanese Patent Laid-Open No. 59-189108

特許文献 6 :特開昭 60— 67518号公報  Patent Document 6: JP-A-60-67518

特許文献 7:特公平 6— 35559号公報  Patent Document 7: Japanese Patent Publication No. 6-35559

[0009] これら従来の反射防止膜は、基材上に、異なった屈折率の層、帯電防止層、ハー ドコート層等が形成された積層体であることが多い。従来の製造方法では、基材上に[0009] These conventional antireflection films are often laminates in which layers having different refractive indexes, antistatic layers, hard coat layers and the like are formed on a substrate. In the conventional manufacturing method, on the substrate

、各層をそれぞれ塗布する工程を繰り返していた。即ち、従来のフッ素系材料による 反射防止膜は、基材上に設けられた高屈折率層に、フッ素系材料力 なる低屈折率 層を形成する必要があり、これらの層を形成するための塗布工程を別々に設ける必 要があった。 The process of applying each layer was repeated. That is, the conventional antireflective film made of a fluorine-based material needs to form a low-refractive index layer having a fluorine-based material force on a high-refractive index layer provided on a base material. It was necessary to provide a separate coating process.

また、表層である低屈折率層の耐擦傷性が十分ではなかった。  Further, the scratch resistance of the low refractive index layer as the surface layer was not sufficient.

本発明は、以上のような状況を背景としてなされたものであって、その目的は、低屈 折率層と高屈折率層を効率的に製造できる紫外線によって硬化しうる硬化性樹脂組 成物を提供することにある。また、本発明の他の目的は、透明性が高ぐ基材に対す る密着性が大きぐ優れた耐擦傷性及び耐薬品性を有し、しかも環境耐性に優れた 硬化膜を提供することにある。  The present invention has been made against the background of the above situation, and its purpose is to provide a curable resin composition that can be cured by ultraviolet rays that can efficiently produce a low refractive index layer and a high refractive index layer. Is to provide. Another object of the present invention is to provide a cured film having excellent scratch resistance and chemical resistance with high adhesion to a substrate with high transparency and excellent environmental resistance. It is in.

[0010] さらに、組成物を塗布して得られる 1の塗膜から 2以上の層を形成できる積層体の 製造方法及びそれにより得られる積層体を提供することにある。また、本発明の他の 目的は、良好な反射防止効果を有する積層体の製造方法及びそれにより得られる積 層体を提供することにある。さらに、本発明の他の目的は、基材に対する密着性に優 れ、耐擦傷性が高い積層体の製造方法及びそれにより得られる積層体を提供するこ とにある。 [0010] Furthermore, another object of the present invention is to provide a method for producing a laminate capable of forming two or more layers from one coating film obtained by applying the composition, and a laminate obtained thereby. Another object of the present invention is to provide a method for producing a laminate having a good antireflection effect and a laminate obtained thereby. Furthermore, another object of the present invention is to provide a method for producing a laminate having excellent adhesion to a substrate and high scratch resistance, and a laminate obtained thereby.

発明の開示  Disclosure of the invention

[0011] 上記目的を達成するため、本発明者らは鋭意研究を行い、紫外線の照射によって 硬化するエチレン性不飽和基含有含フッ素重合体に、粒径の異なる 2種類の金属酸 化物粒子を配合した組成物を基材に塗布し乾燥させると、当該金属酸化物粒子が 高密度に存在する層と、金属酸化物が殆ど存在しないか又は低密度に存在する層と の二層に分離することを見出した。さらに、紫外線を照射して硬化させて得た硬化膜 は、耐擦傷性、耐薬品性、透明性に優れ、さらに耐候性に優れることを見出し、本発 明を完成させた。 [0011] In order to achieve the above object, the present inventors have conducted intensive research and added two types of metal oxide particles having different particle sizes to an ethylenically unsaturated group-containing fluoropolymer that is cured by irradiation with ultraviolet rays. When the blended composition is applied to a substrate and dried, it is separated into two layers: a layer in which the metal oxide particles are present at a high density and a layer in which the metal oxide is scarcely present or at a low density. I found out. Furthermore, a cured film obtained by curing by irradiating with ultraviolet rays Has found that it has excellent scratch resistance, chemical resistance and transparency, as well as excellent weather resistance, and has completed the present invention.

本発明によれば、以下の硬化性樹脂組成物、それを硬化させてなる硬化膜、積層 体の製造方法及びそれにより得られる積層体を提供できる。  According to the present invention, the following curable resin composition, a cured film obtained by curing the composition, a method for producing a laminate, and a laminate obtained thereby can be provided.

1.下記成分:  1. The following ingredients:

(A1)重合性不飽和基を有する有機化合物 (Ab)を結合させてなる数平均粒子径 1 nm以上 40nm未満の金属酸化物粒子(以下、「(A1)の金属酸化物粒子」という) (A1) Metal oxide particles having a number average particle diameter of 1 nm or more and less than 40 nm formed by bonding an organic compound (Ab) having a polymerizable unsaturated group (hereinafter referred to as “metal oxide particles of (A1)”)

(A2)数平均粒子径 40nm以上 200nm以下の金属酸化物粒子(以下、「(A2)の 金属酸化物粒子」という) (A2) Metal oxide particles having a number average particle diameter of 40 nm to 200 nm (hereinafter referred to as “(A2) metal oxide particles”)

(B)エチレン性不飽和基含有含フッ素重合体  (B) Ethylenically unsaturated group-containing fluoropolymer

(C) (B)エチレン性不飽和基含有含フッ素重合体の溶解性が高レ、、 1種又は 2種 以上の溶剤(以下、「(C)速揮発溶剤」という)  (C) (B) High solubility of fluorine-containing polymer containing ethylenically unsaturated groups, one or more solvents (hereinafter referred to as “(C) fast volatile solvent”)

(D) (A1)及び (A2)の金属酸化物粒子の分散安定性が高ぐかつ、(C)速揮発溶 剤と相溶性である、 1種又は 2種以上の溶剤(以下、「(D)遅揮発溶剤」という) を含み、かつ、(C)速揮発溶剤の相対蒸発速度が、(D)遅揮発溶剤の相対蒸発速 度よりも大きいことを特徴とする硬化性樹脂組成物。  (D) One or two or more solvents (hereinafter referred to as “(”) that have high dispersion stability of the metal oxide particles of (A1) and (A2) and are compatible with (C) the fast volatile solvent. D) a slow volatile solvent ”, and (C) the relative evaporation rate of the fast volatile solvent is higher than (D) the relative evaporation rate of the slow volatile solvent.

2. (C)速揮発溶剤は、 (A1)及び (A2)の金属酸化物粒子の分散安定性が低い、 1 種又は 2種以上の溶剤であり、(D)遅揮発溶剤は、(B)エチレン性不飽和基含有含 フッ素重合体の溶解性が低い、 1種又は 2種以上の溶剤であることを特徴とする上記 1に記載の硬化性樹脂組成物。  2. (C) Fast volatile solvent is one or more solvents with low dispersion stability of metal oxide particles (A1) and (A2). (D) Slow volatile solvent is (B 2. The curable resin composition as described in 1 above, which is one or more solvents having low solubility of the ethylenically unsaturated group-containing fluoropolymer.

3.前記 (A1)の金属酸化物粒子力 ァノレミニゥム、ジルコニウム、チタニウム、亜鉛、 ゲルマニウム、インジウム、スズ、アンチモン及びセリウムよりなる群から選ばれる少な くとも一つの元素の酸化物粒子であることを特徴とする上記 1又は 2に記載の硬化性 樹脂組成物。  3. The metal oxide particle force of (A1) above is characterized in that it is an oxide particle of at least one element selected from the group consisting of ananolium, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium. The curable resin composition according to 1 or 2 above.

4.前記 (A2)の金属酸化物粒子が、シリカを主成分とする粒子であることを特徴とす る上記 1〜3のいずれかに記載の硬化性樹脂組成物。  4. The curable resin composition as described in any one of 1 to 3 above, wherein the metal oxide particles (A2) are particles mainly composed of silica.

5.前記 (A2)の金属酸化物粒子が、前記重合性不飽和基を有する有機化合物 (Ab )と結合されていることを特徴とする上記 1〜4のいずれかに記載の硬化性樹脂組成 物。 5. The curable resin composition according to any one of 1 to 4 above, wherein the metal oxide particles (A2) are bonded to the organic compound (Ab) having the polymerizable unsaturated group. object.

[0013] 6.前記有機化合物 (Ab)が、重合性不飽和基に加えて、下記式 (A— 1)に示す基を  [0013] 6. In addition to the polymerizable unsaturated group, the organic compound (Ab) has a group represented by the following formula (A-1):

F F  F F

有する c I Iことを特徴とする上記 1〜5のいずれかに記載の硬化性樹脂組成物。  The curable resin composition according to any one of 1 to 5 above, which has cI I.

RCFII  RCFII

[化 1] 1  [Chemical 1] 1

—— U— C一 N— (A - 1) —— U— C One N— (A-1)

II  II

V  V

[式中、 Uは、 NH、 O (酸素原子)又は S (ィォゥ原子)を示し、 Vは、〇又は Sを示す。 [In the formula, U represents NH, O (oxygen atom) or S (ion atom), and V represents ◯ or S.

] ]

7.前記有機化合物 (Ab)が、分子内にシラノール基を有する化合物又は加水分解 によってシラノール基を生成する化合物であることを特徴とする上記 1〜6のいずれ かに記載の硬化性樹脂組成物。  7. The curable resin composition according to any one of 1 to 6 above, wherein the organic compound (Ab) is a compound having a silanol group in the molecule or a compound that generates a silanol group by hydrolysis. .

8.前記 (B)エチレン性不飽和基含有含フッ素重合体が、 1個のイソシァネート基と、 少なくとも 1個のエチレン性不飽和基とを含有する化合物(B— 1)と、水酸基含有含 フッ素重合体 (B— 2)と、を反応させて得られることを特徴とする上記 1〜7のいずれ かに記載の硬化性樹脂組成物。  8. The (B) ethylenically unsaturated group-containing fluorine-containing polymer comprises a compound (B-1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group-containing fluorine-containing polymer. 8. The curable resin composition according to any one of 1 to 7 above, which is obtained by reacting the polymer (B-2).

[0014] 9.前記水酸基含有含フッ素重合体 (B_ 2)が、下記構造単位(a) 20〜70モル%、 ( b) 10〜70モル%及び(c) 5〜70モル%を含んでなり、かつ、ゲルパーミエーシヨンク 口マトグラフィ一で測定したポリスチレン換算数平均分子量が 5, 000〜500, 000で ある上記 8に記載の硬化性樹脂組成物。  [0014] 9. The hydroxyl group-containing fluoropolymer (B_2) contains the following structural units (a) 20 to 70 mol%, (b) 10 to 70 mol% and (c) 5 to 70 mol%. The curable resin composition according to 8 above, wherein the number average molecular weight in terms of polystyrene measured by gel permeation chromatography is 5,000 to 500,000.

(a)下記一般式(1)で表される構造単位。  (a) A structural unit represented by the following general formula (1).

(b)下記一般式 (2)で表される構造単位。  (b) A structural unit represented by the following general formula (2).

(c)下記一般式 (3)で表される構造単位。  (c) A structural unit represented by the following general formula (3).

[化 2]

Figure imgf000006_0001
[Chemical 2]
Figure imgf000006_0001

[式中、 R1はフッ素原子、フルォロアルキル基、又は OR2で表される基(R2はアルキ ル基、又はフルォロアルキル基を示す)を示す] [Wherein R 1 represents a fluorine atom, a fluoroalkyl group, or a group represented by OR 2 (R 2 represents an alkyl group) Or a fluoroalkyl group)]

[化 3]  [Chemical 3]

Figure imgf000007_0001
Figure imgf000007_0001

[式中、 R3は水素原子又はメチル基を、 R4はアルキル基、 _(CH ) _〇R5若しくは— Wherein the R 3 is a hydrogen atom or a methyl group, R 4 is an alkyl group, _ (CH) _〇_R 5 or -

2  2

OC〇R5で表される基(R5はアルキル基、又はグリシジル基を、 Xは 0又は 1の数を示 す)、カルボキシル基、又はアルコキシカルボ二ル基を示す] OC_〇_R 5 a group represented by (R 5 is an alkyl group, or a glycidyl group, X is shows the number 0 or 1), shows a carboxyl group, or alkoxycarbonyl two le radical

[化 4] [Chemical 4]

H R6 HR 6

— C— C—— (3)  — C— C—— (3)

H (CH2)vOR7 H (CH 2 ) v OR 7

[式中、 R6は水素原子、又はメチル基を、 R7は水素原子、又はヒドロキシアルキル基 を、 Vは 0又は 1の数を示す] [Wherein R 6 represents a hydrogen atom or a methyl group, R 7 represents a hydrogen atom or a hydroxyalkyl group, and V represents a number of 0 or 1]

10.さらに、前記水酸基含有含フッ素重合体 (B— 2)が、ァゾ基含有ポリシロキサン 化合物に由来する下記構造単位(d) 0.:!〜 10モル%を含む上記 8又は 9に記載の 硬化性樹脂組成物。 10. The above 8 or 9, wherein the hydroxyl group-containing fluoropolymer (B-2) further comprises the following structural unit (d) 0.:! To 10 mol% derived from an azo group-containing polysiloxane compound. A curable resin composition.

(d)下記一般式 (4)で表される構造単位。  (d) A structural unit represented by the following general formula (4).

[化 5] [Chemical 5]

R8 R 8

— Si-O— (  — Si-O— (

R9 R 9

[式中、 R8及び R9は、同一でも異なっていてもよぐ水素原子、アルキル基、ハロゲン 化アルキル基、又はァリール基を示す] [Wherein R 8 and R 9 may be the same or different and each represents a hydrogen atom, an alkyl group, a halogenated alkyl group, or an aryl group]

11.前記水酸基含有含フッ素重合体 (B— 2)が、前記構造単位 (d)を下記構造単位 11. The hydroxyl group-containing fluoropolymer (B-2) is the structural unit (d) shown below

(e)の一部として含むことを特徴とする上記 10に記載の硬化性樹脂組成物。 11. The curable resin composition as described in 10 above, which is contained as part of (e).

(e)下記一般式 (5)で表される構造単位。 [化 6] (e) A structural unit represented by the following general formula (5). [Chemical 6]

Figure imgf000008_0001
Figure imgf000008_0001

[式中、 R1Q〜R13は水素原子、アルキル基、又はシァノ基を示し、 R14〜R17は水素原 子又はアルキル基を示し、 p、 qは:!〜 6の数、 s、 tは 0〜6の数、 yは:!〜 200の数を示 す。 ] [Wherein R 1Q to R 13 represent a hydrogen atom, an alkyl group, or a cyano group, R 14 to R 17 represent a hydrogen atom or an alkyl group, and p and q are numbers of:! To 6, s, t is a number from 0 to 6, y is a number from:! to 200. ]

[0016] 12.さらに、前記水酸基含有含フッ素重合体 (B— 2)が、下記構造単位 (f) 0. :!〜 5 モル%を含む上記 8〜: 11のいずれかに記載の硬化性樹脂組成物。  [0016] 12. The curability according to any one of 8 to 11 above, wherein the hydroxyl group-containing fluoropolymer (B-2) further comprises the following structural unit (f) 0.:! To 5 mol%. Resin composition.

(f )下記一般式 (6)で表される構造単位。  (f) A structural unit represented by the following general formula (6).

[化 7]  [Chemical 7]

H R18 HR 18

C一 C (6) C one C ( 6 )

H H  H H

[式中、 R18は乳化作用を有する基を示す] [Wherein R 18 represents an emulsifying group]

13.前記化合物(B— 1)が、 2_ (メタ)アタリロイルォキシェチルイソシァネートである 上記 8〜: 12のいずれかに記載の硬化性樹脂組成物。  13. The curable resin composition according to any one of 8 to 12 above, wherein the compound (B-1) is 2_ (meth) atalylooxychetyl isocyanate.

14.さらに、成分 (E)少なくとも 2個以上の(メタ)アタリロイル基を含有する多官能 (メ タ)アタリレートイ匕合物及び Z又は少なくとも 1個以上の(メタ)アタリロイル基を含有す る含フッ素 (メタ)アタリレート化合物を含有することを特徴とする上記:!〜 13のレ、ずれ かに記載の硬化性樹脂組成物。  14. In addition, it contains component (E) a polyfunctional (meth) attareito to compound containing at least two (meth) attaroyl groups and Z or at least one (meth) attalyloyl group. The curable resin composition according to any one of the above:! To 13, wherein the composition contains a fluorine-containing (meth) acrylate compound.

15.さらに、成分 (F)ラジカル重合開始剤を含むことを特徴とする上記 1〜: 14のいず れかに記載の硬化性樹脂組成物。  15. The curable resin composition according to any one of 1 to 14 above, which further comprises a component (F) a radical polymerization initiator.

16.紫外線硬化性であることを特徴とする上記:!〜 15のいずれかに記載の硬化性樹 脂組成物。  16. The curable resin composition according to any one of the above:! To 15, which is ultraviolet curable.

[0017] 17.上記:!〜 16のいずれかに記載の硬化性樹脂組成物を硬化させて得られ、 2層 以上の多層構造を有することを特徴とする硬化膜。 18. (Al)及び (A2)の金属酸化物粒子が高密度に存在する 1以上の層と、(A1)及 び (A2)の金属酸化物粒子が実質的に存在しない 1以下の層からなる二層以上の層 構造を有することを特徴とする上記 17に記載の硬化膜。 [0017] 17. A cured film obtained by curing the curable resin composition according to any one of the above:! To 16, and having a multilayer structure of two or more layers. 18. From one or more layers in which (Al) and (A2) metal oxide particles are present in high density and from one or more layers in which (A1) and (A2) metal oxide particles are substantially absent 18. The cured film as described in 17 above, which has a layer structure of two or more layers.

19.基材と、その上に多層構造を有する積層体の製造方法であって、  19. A method of producing a laminate having a base material and a multilayer structure thereon, comprising:

前記基材上又は基材上に形成された層の上に、上記 1〜: 16のいずれかに記載の 硬化性樹脂組成物を塗布して塗膜を形成し、  On the base material or a layer formed on the base material, the curable resin composition according to any one of the above 1 to 16 is applied to form a coating film,

この 1の塗膜から溶媒を蒸発させることにより、 2以上の層を形成することを特徴とす る積層体の製造方法。  A method for producing a laminate, wherein two or more layers are formed by evaporating a solvent from the coating film of 1.

20.前記 2以上の層の各層が、 (A1)及び/又は (A2)の金属酸化物粒子が高密度 に存在する層又は (A1)及び (A2)の金属酸化物粒子が実質的に存在しない層であ つて、少なくとも 1層は (A1)及び/又は (A2)の金属酸化物粒子が高密度に存在す る層であることを特徴とする上記 19に記載の積層体の製造方法。  20. Each of the two or more layers is a layer in which the metal oxide particles (A1) and / or (A2) are present in high density or the metal oxide particles (A1) and (A2) are substantially present. 20. The method for producing a laminate according to the above 19, wherein at least one layer is a layer in which the metal oxide particles (A1) and / or (A2) are present at a high density.

21.前記 2以上の層が、 2層であることを特徴とする上記 20に記載の積層体の製造 方法。  21. The method for producing a laminate according to the above 20, wherein the two or more layers are two layers.

22.さらに、前記 2以上の層を放射線照射することにより硬化させることを特徴とする 上記 19〜21のいずれかに記載の積層体の製造方法。  22. The method for producing a laminate according to any one of 19 to 21, further comprising curing the two or more layers by irradiation with radiation.

23.積層体が光学用部品であることを特徴とする上記 19〜22のいずれかに記載の 積層体の製造方法。  23. The method for producing a laminate according to any one of the above 19 to 22, wherein the laminate is an optical component.

24.積層体が反射防止膜であることを特徴とする上記 19〜22のいずれかに記載の 積層体の製造方法。  24. The method for producing a laminate according to any one of the above 19 to 22, wherein the laminate is an antireflection film.

25.前記積層体が、基材上に、少なくとも、高屈折率層及び低屈折率層が、基材に 近い側からこの順に積層されている反射防止膜であり、上記 21に記載の 2層が、 高屈折率層及び 25. The laminate is an antireflection film in which at least a high refractive index layer and a low refractive index layer are laminated in this order from the side close to the substrate on the substrate, and the two layers according to 21 above Is a high refractive index layer and

低屈折率層からなる  Consists of low refractive index layer

ことを特徴とする上記 21に記載の積層体の製造方法。 22. The method for producing a laminate as described in 21 above, wherein

26.低屈折率層の 589nmにおける屈折率が 1. 20〜: 1. 55であり、 26. The refractive index of the low refractive index layer at 589 nm is 1.20 to: 1.55,

高屈折率層の 589nmにおける屈折率が 1. 50-2. 20であって、低屈折率層の屈 折率より高いことを特徴とする上記 25に記載の積層体の製造方法。 27.前記積層体が、基材上に、少なくとも、中屈折率層、高屈折率層及び低屈折率 層が、基材に近い側からこの順に積層されている反射防止膜であり、上記 21に記載 の 2層が 26. The method for producing a laminate as described in 25 above, wherein the refractive index at 589 nm of the high refractive index layer is 1.50-2.20, which is higher than the refractive index of the low refractive index layer. 27. The laminate is an antireflection film in which at least a medium refractive index layer, a high refractive index layer, and a low refractive index layer are laminated in this order from the side close to the substrate on the substrate, The two layers described in

高屈折率層及び  High refractive index layer and

低屈折率層からなる  Consists of low refractive index layer

ことを特徴とする上記 21に記載の積層体の製造方法。  22. The method for producing a laminate as described in 21 above, wherein

28.低屈折率層の 589nmにおける屈折率が 1. 20〜: 1. 55であり、  28. The refractive index of the low refractive index layer at 589 nm is 1.20 to: 1.55,

中屈折率層の 589nmにおける屈折率が 1. 50〜: 1. 90であって、低屈折率層の屈 折率より高ぐ  The refractive index of the middle refractive index layer at 589 nm is 1.50 to: 1.90, which is higher than the refractive index of the low refractive index layer.

高屈折率層の 589nmにおける屈折率が 1. 51〜2. 20であって、中屈折率層の屈 折率より高いことを特徴とする上記 27に記載の積層体の製造方法。  28. The method for producing a laminate as described in 27 above, wherein the refractive index at 589 nm of the high refractive index layer is 1.51 to 2.20, which is higher than the refractive index of the medium refractive index layer.

29.さらに、基材上に、ハードコート層及び Z又は帯電防止層を形成することを特徴 とする上記 25〜28のいずれかに記載の積層体の製造方法。  29. The method for producing a laminate according to any one of 25 to 28, further comprising forming a hard coat layer and Z or an antistatic layer on a substrate.

30.上記 19〜29のいずれかに記載された積層体の製造方法により、製造された積 層体。  30. A laminate produced by the method for producing a laminate described in any one of 19 to 29 above.

[0019] 本発明の硬化性樹脂組成物を硬化させることによって得られる硬化膜は、例えば、 本組成物を塗布して得られる一の塗膜から、低屈折率層及び高屈折率層等の、任 意の二層以上を形成することができるため、多層構造を有する硬化膜の製造工程を 簡略化できる。  [0019] The cured film obtained by curing the curable resin composition of the present invention is, for example, a low refractive index layer, a high refractive index layer, or the like from one coating film obtained by applying the present composition. Since any two or more layers can be formed, the manufacturing process of a cured film having a multilayer structure can be simplified.

本発明の硬化性樹脂組成物は、加水分解が関与する熱による硬化反応を行わな いため、環境耐性 (耐湿熱性等)に優れた硬化膜を提供することができる。  Since the curable resin composition of the present invention does not undergo a curing reaction due to heat involving hydrolysis, it can provide a cured film excellent in environmental resistance (such as resistance to moist heat).

[0020] 本発明の硬化性樹脂組成物を硬化させてなる硬化膜は、耐擦傷性、耐薬品性、透 明性に優れ、本発明の硬化性樹脂組成物は特に、反射防止膜、選択透過膜フィル ター等の光学材料の形成に有利に用いることができ、また、フッ素含量が高いことを 利用して、耐候性が要求される基材に対する塗料用材料、耐候フィルム用材料、コ 一ティング用材料、その他として好適に使用することができる。しかも、当該硬化膜は 、基材に対する密着性に優れ、耐擦傷性が高ぐ良好な反射防止効果を付与するこ とから、反射防止膜として極めて有用であり、各種の表示装置に適用することにより、 その視認性を向上させることができる。 [0020] A cured film obtained by curing the curable resin composition of the present invention is excellent in scratch resistance, chemical resistance, and transparency, and the curable resin composition of the present invention is particularly an antireflection film. It can be used advantageously in the formation of optical materials such as permeable membrane filters, and by utilizing the high fluorine content, it can be used for coating materials, weather resistant film materials, It can be suitably used as a material for coating. In addition, since the cured film has excellent adhesion to the substrate and provides a good antireflection effect with high scratch resistance, it is extremely useful as an antireflection film and can be applied to various display devices. By The visibility can be improved.

[0021] 本発明の積層体の製造方法は、組成物を塗布して得られる 1の塗膜から、 2以上の 層を形成することができるため、多層構造を有する積層体の製造工程を簡略化でき る。従って、本発明の積層体の製造方法は、特に、反射防止膜、光学フィルタ等の光 学材料の形成に有利に用いることができる。また、本発明の積層体は、フッ素含量が 高いことを利用して、耐候性が要求される基材に対する塗料、耐候フィルム、コーティ ング、その他として好適に使用することができる。しかも、当該積層体は、最外層(基 材力 最も遠い層)に低屈折率層を設けることにより良好な反射防止効果を付与する 。また、本発明によれば、基材に対する密着性に優れ、耐擦傷性が高い積層体が得 られる。これらのこと力 、本発明の積層体は反射防止膜として極めて有用であり、各 種の表示装置に適用することにより、その視認性を向上させることができる。  [0021] The method for producing a laminate of the present invention can form two or more layers from one coating film obtained by applying the composition, thus simplifying the production process of a laminate having a multilayer structure. Can be used. Therefore, the method for producing a laminate of the present invention can be advantageously used particularly for the formation of optical materials such as antireflection films and optical filters. Further, the laminate of the present invention can be suitably used as a paint, weather resistant film, coating, etc. for a substrate requiring weather resistance by utilizing the high fluorine content. In addition, the laminated body provides a good antireflection effect by providing a low refractive index layer in the outermost layer (the layer farthest in base material strength). Moreover, according to the present invention, a laminate having excellent adhesion to a substrate and high scratch resistance can be obtained. Because of these forces, the laminate of the present invention is extremely useful as an antireflection film, and its visibility can be improved by applying it to various types of display devices.

図面の簡単な説明  Brief Description of Drawings

[0022] [図 1A]「1の塗膜から形成される 2以上の層」を説明するための図である。  FIG. 1A is a diagram for explaining “two or more layers formed from one coating film”.

[図 1B]「1の塗膜から形成される 2以上の層」を説明するための図である。  FIG. 1B is a diagram for explaining “two or more layers formed from one coating film”.

[図 1C]「1の塗膜から形成される 2以上の層」を説明するための図である。  FIG. 1C is a diagram for explaining “two or more layers formed from one coating film”.

[図 1D]「1の塗膜から形成される 2以上の層」を説明するための図である。  FIG. 1D is a diagram for explaining “two or more layers formed from one coating film”.

[図 2]本発明に係る一実施形態である反射防止膜の断面図である。  FIG. 2 is a cross-sectional view of an antireflection film according to an embodiment of the present invention.

[図 3]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 3 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 4]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 4 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 5]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 5 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 6]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 6 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 7]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 7 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 8]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 8 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 9]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 9 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 10]本発明に係る他の実施形態である反射防止膜の断面図である。  FIG. 10 is a cross-sectional view of an antireflection film according to another embodiment of the present invention.

[図 11]二層分離、分離せず (一部凝集)及び均一構造の各状態の概念を示す電子 顕微鏡写真である。  FIG. 11 is an electron micrograph showing the concept of each state of two-layer separation, no separation (partial aggregation), and uniform structure.

発明を実施するための最良の形態 [0023] I.積層体及びその製造方法 BEST MODE FOR CARRYING OUT THE INVENTION [0023] I. Laminate and production method thereof

本発明は、基材と、その上に 2層以上の多層構造を有する積層体の製造方法及び それにより得られる積層体に関する。具体的には、本発明の製造方法では、基材上 又は基材上に形成された層の上に、後述する所定の硬化性樹脂組成物を塗布して 得られる 1の塗膜力も溶媒を蒸発させる (以下、溶媒を蒸発させることを「乾燥」と言う こともある。)ことにより、 2以上の層を形成する。なお、乾燥後は溶媒が完全に無くな つた状態でなくてもよぐ硬化膜としての特性が得られる範囲で溶媒が残存していて もよレ、。また、本発明では、 1の塗膜から 2以上の層の形成を、 2回以上実施すること ができる。  The present invention relates to a substrate, a method for producing a laminate having a multilayer structure of two or more layers thereon, and a laminate obtained thereby. Specifically, in the production method of the present invention, the coating force of 1 obtained by applying a predetermined curable resin composition to be described later on a substrate or a layer formed on the substrate also has a solvent. Two or more layers are formed by evaporating (hereinafter, evaporating the solvent is sometimes referred to as “drying”). It should be noted that the solvent may not remain completely after drying, and the solvent may remain as long as the cured film can be obtained. In the present invention, two or more layers can be formed twice or more from one coating film.

[0024] 特定の硬化性樹脂組成物を通常の方法で塗布し、その後乾燥させると、 2以上の 層に分離する。ここで、 2以上の層とは、「(A1)及び/又は (A2)の金属酸化物粒子 が高密度に存在する層」と、「(A1)及び (A2)の金属酸化物粒子が実質的に存在し ない層」を共に含む 2以上の層である場合もあり、また、「(A1)及び/又は (A2)の金 属酸化物粒子が高密度に存在する層」だけからなる 2以上の層である場合もある。 以下、図面を用いて「2以上の層の各層が、(A1)及び/又は (A2)の金属酸化物 粒子が高密度に存在する層又は (A1)及び (A2)の金属酸化物粒子が実質的に存 在しない層であって、少なくとも 1層は (A1)及び/又は (A2)の金属酸化物粒子が 高密度に存在する層」について説明する。図 1Aは、 2以上の層が、「(A1)又は (A2 )の金属酸化物粒子が高密度に存在する層 1 , la」の 2層である場合を示す。図 1B は、 2以上の層が、「(A1)又は (A2)の金属酸化物粒子が高密度に存在する層 1, 1 ajと、「 (A1)及び (A2)の金属酸化物粒子が実質的に存在しなレ、層 3」の 3層である 場合を示す。図 1Cは、 2以上の層が、「(A1)又は (A2)の金属酸化物粒子が高密度 に存在する層 1 , la」と、「(A1)及び (A2)の金属酸化物粒子が実質的に存在しない 層 3」の 3層である場合を示す。図 1Dは、 2以上の層が、「(A1)及び (A2)の金属酸 化物粒子が高密度に存在する層 lb」と、「(A1)及び (A2)の金属酸化物粒子が実 質的に存在しない層 3」の 2層である場合を示す。  [0024] When a specific curable resin composition is applied by a usual method and then dried, it is separated into two or more layers. Here, the two or more layers are “a layer in which the metal oxide particles (A1) and / or (A2) are present in high density” and “the metal oxide particles (A1) and (A2) are substantially In some cases, it may be two or more layers including both “layers that are not present at all” and only “layers in which the metal oxide particles (A1) and / or (A2) are present at high density” 2 In some cases, these layers are used. Hereinafter, using the drawings, “each of two or more layers is a layer in which (A1) and / or (A2) metal oxide particles are present in a high density or (A1) and (A2) metal oxide particles. A layer that does not substantially exist and at least one layer is a layer in which the metal oxide particles (A1) and / or (A2) are present in high density will be described. FIG. 1A shows a case where two or more layers are “layer 1, la in which metal oxide particles (A1) or (A2) are present at high density”. Figure 1B shows that two or more layers are “layers 1, 1 aj in which metal oxide particles (A1) or (A2) are present in high density, and metal oxide particles (A1) and (A2) The case where there are three layers of “layer 3” which does not substantially exist is shown. FIG. 1C shows that two or more layers are “layer 1, la in which metal oxide particles (A1) or (A2) are present in high density” and “metal oxide particles (A1) and (A2) are The case where there are three layers of “layer 3” which does not substantially exist is shown. Fig. 1D shows that two or more layers are "layer lb in which metal oxide particles (A1) and (A2) exist in high density" and "metal oxide particles (A1) and (A2) are actual. This shows the case where there are two layers of layer 3 ”that do not exist.

紫外線硬化性樹脂組成物は 2種以上の金属酸化物粒子を含んでいるので、図 1A ,図 IB, 1Cに示すように、「金属酸化物粒子が高密度に存在する層」が 2種類以上 形成され得る。 Since the ultraviolet curable resin composition contains two or more kinds of metal oxide particles, as shown in FIGS. 1A, IB, and 1C, there are two or more types of “layers in which the metal oxide particles exist at high density”. Can be formed.

[0025] 「金属酸化物粒子が高密度に存在する層」の「金属酸化物粒子」は、少なくとも 1種 、即ち、 1種又は 2種以上の「金属酸化物粒子」を意味する。従って、「金属酸化物粒 子が高密度に存在する層」が、 2種以上の金属酸化物粒子から構成されていてよい( 例えば、図 1D)。図 IDでは、「金属酸化物粒子が高密度に存在する層 lb」が、粒子 Xと粒子 Yから構成されている。粒子 Yが、「金属酸化物粒子が高密度に存在する層 lb」の厚さより大きいため、「金属酸化物粒子が実質的に存在しない層 3」に突出して いる力 この突出部分も「金属酸化物粒子が高密度に存在する層 lb」に含まれる。  The “metal oxide particles” in the “layer in which metal oxide particles are present in high density” means at least one, ie, one or more “metal oxide particles”. Therefore, the “layer in which metal oxide particles are present in high density” may be composed of two or more kinds of metal oxide particles (for example, FIG. 1D). In Figure ID, “Layer lb with high density of metal oxide particles” consists of particles X and Y. Since the particle Y is thicker than the “layer lb where the metal oxide particles are present at high density”, the force that protrudes into the “layer 3 where the metal oxide particles are substantially absent” It is included in the layer “lb” in which the particles are present in high density.

[0026] 尚、図 1A〜1Dでは、「金属酸化物粒子が実質的に存在しない層 3」には通常金属 酸化物粒子が存在していないが、本発明の効果を損なわない範囲で若干含まれて いてもよい。また、「金属酸化物粒子が高密度に存在する層 1 , la, lb」も同様に金 属酸化物粒子以外の他の物質が含まれてレ、てもよレ、。  [0026] In FIGS. 1A to 1D, the “layer 3 substantially free of metal oxide particles” usually contains no metal oxide particles, but is included in a range that does not impair the effects of the present invention. It may be. Similarly, “layer 1, la, lb in which metal oxide particles are present at high density” may also contain other substances other than metal oxide particles.

[0027] 硬化性樹脂組成物の塗布法としては、公知の塗布方法を使用することができ、特 に、ディップ法、コーター法、印刷法等各種の方法を適用することができる。  [0027] As a coating method of the curable resin composition, a known coating method can be used, and in particular, various methods such as a dipping method, a coater method, and a printing method can be applied.

乾燥は、通常、室温から 100°C程度の加熱で、 1〜60分程度実施される。 具体的な硬化条件は後述する。  Drying is usually performed for about 1 to 60 minutes by heating from room temperature to about 100 ° C. Specific curing conditions will be described later.

[0028] 本発明では、硬化性樹脂組成物を溶液状で各種の基材に塗布し、得られた塗膜を 乾燥/硬化させて積層体を得ることができる。例えば、基材が透明基材の場合には、 最外層に低屈折率層を設けることにより優れた反射防止膜が形成される。  [0028] In the present invention, the curable resin composition can be applied to various substrates in the form of a solution, and the resulting coating film can be dried / cured to obtain a laminate. For example, when the substrate is a transparent substrate, an excellent antireflection film can be formed by providing a low refractive index layer as the outermost layer.

反射防止膜の具体的構造は、通常、基材及び低屈折率膜、又は基材、高屈折率 膜及び低屈折率膜をこの順に積層したものである。この他、基材、高屈折率膜及び 低屈折率膜の間に、他の層を介在させてもよぐ例えば、ハードコート層、帯電防止 層、中屈折率層、低屈折率層、高屈折率層の組み合わせ等の層を設けることができ る。  The specific structure of the antireflection film is usually a base material and a low refractive index film, or a base material, a high refractive index film and a low refractive index film laminated in this order. In addition, other layers may be interposed between the base material, the high refractive index film, and the low refractive index film.For example, a hard coat layer, an antistatic layer, a middle refractive index layer, a low refractive index layer, a high refractive index film, Layers such as a combination of refractive index layers can be provided.

[0029] 図 2は、基材 10上に、高屈折率層 40及び低屈折率層 50が、この順に積層されて いる反射防止膜を示す。  FIG. 2 shows an antireflection film in which a high refractive index layer 40 and a low refractive index layer 50 are laminated in this order on a substrate 10.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しなレ、層に相当する。 本発明によれば、高屈折率層 40と低屈折率層 50を、 1の塗膜から、形成できる。 In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. . According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.

[0030] 図 3は、基材 10上に、ハードコート層 20、帯電防止層 30、高屈折率層 40及び低屈 折率層 50が、この順に積層されている反射防止膜を示す。 FIG. 3 shows an antireflection film in which a hard coat layer 20, an antistatic layer 30, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しなレ、層に相当する。 本発明によれば、高屈折率層 40と低屈折率層 50を、 1の塗膜から、形成できる。  In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. . According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.

[0031] 図 4は、基材 10上に、帯電防止層 30、ハードコート層 20、高屈折率層 40及び低屈 折率層 50が、この順に積層されている反射防止膜を示す。 FIG. 4 shows an antireflection film in which an antistatic layer 30, a hard coat layer 20, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しなレ、層に相当する。 本発明によれば、高屈折率層 40と低屈折率層 50を、 1の塗膜から、形成できる。  In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. . According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.

[0032] 図 5は、基材 10上に、ハードコート層 20、帯電防止層 30、中屈折率層 60、高屈折 率層 40及び低屈折率層 50が、この順に積層されている反射防止膜を示す。 FIG. 5 shows an antireflection structure in which a hard coat layer 20, an antistatic layer 30, a middle refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a base material 10. The membrane is shown.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しない層に相当する。或 レ、は、中屈折率層 60、及び高屈折率層 40が何れも金属酸化物粒子が高密度に存 在する層に相当する力 \または、中屈折率層 60が、金属酸化物粒子が高密度に存 在する層に、高屈折率層 40が金属酸化物粒子が実質的に存在しなレヽ層に相当する 本発明によれば、中屈折率層 60と高屈折率層 40、又は、高屈折率層 40と低屈折 率層 50を、 1の塗膜から、形成できる。好ましくは、高屈折率層 40と低屈折率層 50を 1の塗膜から形成する。  In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. In other words, the medium refractive index layer 60 and the high refractive index layer 40 each have a force equivalent to a layer in which metal oxide particles are present in a high density. In the present invention, the high refractive index layer 40 corresponds to a layer having substantially no metal oxide particles, and the medium refractive index layer 60 and the high refractive index layer 40, Alternatively, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film. Preferably, the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.

[0033] 図 6は、基材 10上に、帯電防止層 30、ハードコート層 20、中屈折率層 60、高屈折 率層 40及び低屈折率層 50が、この順に積層されている反射防止膜を示す。  [0033] FIG. 6 shows an antireflection structure in which an antistatic layer 30, a hard coat layer 20, a medium refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10. The membrane is shown.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しない層に相当する。或 レ、は、中屈折率層 60、及び高屈折率層 40が何れも金属酸化物粒子が高密度に存 在する層に相当する力 または、中屈折率層 60が、金属酸化物粒子が高密度に存 在する層に、高屈折率層 40が金属酸化物粒子が実質的に存在しなレヽ層に相当する 本発明によれば、中屈折率層 60と高屈折率層 40、又は、高屈折率層 40と低屈折 率層 50を、 1の塗膜から、形成できる。好ましくは、高屈折率層 40と低屈折率層 50を 1の塗膜から形成する。 In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. On the other hand, the medium refractive index layer 60 and the high refractive index layer 40 both have a force equivalent to a layer in which metal oxide particles are present at a high density, or the medium refractive index layer 60 has metal oxide particles. High density In the present invention, the high refractive index layer 40 corresponds to a layer having substantially no metal oxide particles. According to the present invention, the intermediate refractive index layer 60 and the high refractive index layer 40 or the high refractive index layer 40 is used. The layer 40 and the low refractive index layer 50 can be formed from one coating film. Preferably, the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.

[0034] 図 7は、基材 10上に、ハードコート層 20、高屈折率層 40及び低屈折率層 50が、こ の順に積層されている反射防止膜を示す。  FIG. 7 shows an antireflection film in which a hard coat layer 20, a high refractive index layer 40 and a low refractive index layer 50 are laminated in this order on a substrate 10.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しなレ、層に相当する。 本発明によれば、高屈折率層 40と低屈折率層 50を、 1の塗膜から、形成できる。  In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. . According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.

[0035] 図 8は、基材 10上に、ハードコート層 20、中屈折率層 60、高屈折率層 40及び低屈 折率層 50が、この順に積層されている反射防止膜を示す。 FIG. 8 shows an antireflection film in which a hard coat layer 20, a medium refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated on the base material 10 in this order.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しない層に相当する。或 レ、は、中屈折率層 60、及び高屈折率層 40が何れも金属酸化物粒子が高密度に存 在する層に相当する力 \または、中屈折率層 60が、金属酸化物粒子が高密度に存 在する層に、高屈折率層 40が金属酸化物粒子が実質的に存在しなレヽ層に相当する 本発明によれば、中屈折率層 60と高屈折率層 40、又は、高屈折率層 40と低屈折 率層 50を、 1の塗膜から、形成できる。好ましくは、高屈折率層 40と低屈折率層 50を 1の塗膜から形成する。  In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. In other words, the medium refractive index layer 60 and the high refractive index layer 40 each have a force equivalent to a layer in which metal oxide particles are present in a high density. In the present invention, the high refractive index layer 40 corresponds to a layer having substantially no metal oxide particles, and the medium refractive index layer 60 and the high refractive index layer 40, Alternatively, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film. Preferably, the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.

[0036] 図 9は、基材 10上に、帯電防止層 30、高屈折率層 40及び低屈折率層 50が、この 順に積層されてレ、る反射防止膜を示す。  FIG. 9 shows an antireflection film in which an antistatic layer 30, a high refractive index layer 40, and a low refractive index layer 50 are laminated in this order on a substrate 10.

この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しなレ、層に相当する。 本発明によれば、高屈折率層 40と低屈折率層 50を、 1の塗膜から、形成できる。  In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. . According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film.

[0037] 図 10は、基材 10上に、帯電防止層 30、中屈折率層 60、高屈折率層 40及び低屈 折率層 50が、この順に積層されている反射防止膜を示す。 この反射防止膜において、高屈折率層 40が、金属酸化物粒子が高密度に存在す る層に、低屈折率層 50が金属酸化物粒子が実質的に存在しない層に相当する。或 レ、は、中屈折率層 60、及び高屈折率層 40が何れも金属酸化物粒子が高密度に存 在する層に相当する力 または、中屈折率層 60が、金属酸化物粒子が高密度に存 在する層に、高屈折率層 40が金属酸化物粒子が実質的に存在しなレ、層に相当する 本発明によれば、中屈折率層 60と高屈折率層 40、又は、高屈折率層 40と低屈折 率層 50を、 1の塗膜から、形成できる。好ましくは、高屈折率層 40と低屈折率層 50を 1の塗膜から形成する。 FIG. 10 shows an antireflection film in which an antistatic layer 30, a medium refractive index layer 60, a high refractive index layer 40, and a low refractive index layer 50 are laminated on the base material 10 in this order. In this antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present in high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. On the other hand, the medium refractive index layer 60 and the high refractive index layer 40 both have a force equivalent to a layer in which metal oxide particles are present at a high density, or the medium refractive index layer 60 has metal oxide particles. According to the present invention, the high refractive index layer 40 corresponds to a layer in which the metal oxide particles are not substantially present in the high density layer. According to the present invention, the medium refractive index layer 60 and the high refractive index layer 40, Alternatively, the high refractive index layer 40 and the low refractive index layer 50 can be formed from one coating film. Preferably, the high refractive index layer 40 and the low refractive index layer 50 are formed from one coating film.

[0038] 尚、上記の反射防止膜において、使用する硬化性樹脂組成物に含まれる金属酸 化物として、アンチモンドープ酸化錫 (ATO)粒子、リンドープ酸化錫(PT〇)粒子、 等の導電性粒子を添加すれば、得られる金属酸化物を高密度に含む層が帯電防止 性を有する膜となる。従って、例えば、高屈折率層又は中屈折率層を、このような帯 電防止性を有する金属酸化物を高密度に含む層として形成すれば、高屈折率層又 は中屈折率層は帯電防止性を兼ねた膜とすることができる。この場合、帯電防止膜 の形成を省略できる。  [0038] In the antireflection film, conductive particles such as antimony-doped tin oxide (ATO) particles and phosphorus-doped tin oxide (PTO) particles are used as metal oxides contained in the curable resin composition to be used. Is added, a layer containing the resulting metal oxide at a high density becomes a film having antistatic properties. Therefore, for example, if a high refractive index layer or a medium refractive index layer is formed as a layer containing a metal oxide having such an antistatic property at a high density, the high refractive index layer or the medium refractive index layer is charged. It can be set as the film | membrane which served as prevention property. In this case, the formation of the antistatic film can be omitted.

[0039] 次に、上記の反射防止膜の各層について説明する。 Next, each layer of the antireflection film will be described.

(1)基材  (1) Base material

本発明の反射防止膜に用いる基材の種類は特に制限されるものではないが、基材 の具体例としては、例えば、トリァセチルセルロース、ポリエチレンテレフタレート樹脂 The type of the substrate used for the antireflection film of the present invention is not particularly limited, but specific examples of the substrate include, for example, triacetyl cellulose, polyethylene terephthalate resin

(東レ (株)製ルミラー等)、ガラス、ポリカーボネート樹脂、アクリル樹脂、スチリル樹脂 、ァリレート樹脂、ノルボルネン系樹脂 (JSR (株)製アートン、 日本ゼオン (株)製ゼォ ネックス等)、メチルメタタリレート/スチレン共重合体樹脂、ポリオレフイン樹脂等の 各種透明プラスチック板、フィルム等を挙げることができる。好ましくは、トリァセチル セルロース、ポリエチレンテレフタレート樹脂(東レ(株)製ルミラー等)、ノルボルネン 系樹脂 CFSR (株)製アートン等)等が挙げられる。 (Toray Co., Ltd. Lumirror, etc.), glass, polycarbonate resin, acrylic resin, styryl resin, arylate resin, norbornene resin (JSR Co., Ltd. Arton, Nippon Zeon Co., Ltd. Zenex, etc.), Methyl Metal Examples include various transparent plastic plates and films such as rate / styrene copolymer resins and polyolefin resins. Preferred examples include triacetyl cellulose, polyethylene terephthalate resin (Lumirror, etc. manufactured by Toray Industries, Inc.), norbornene-based resin CFSR, Arton, etc., and the like.

[0040] (2)低屈折率層 [0040] (2) Low refractive index layer

低屈折率層とは、波長 589nmの光の屈折率が 1. 20-1. 55である層を表す。 低屈折率層に使用される材料としては、 目的とする特性が得られれば特に限定さ れるものではないが、例えば、含フッ素重合体を含有する硬化性組成物、アクリルモ ノマー、含フッ素アクリルモノマー、エポキシ基含有化合物、含フッ素エポキシ基含有 化合物等の硬化物を挙げることがでる。また、低屈折率層の強度を上げるために、シ リカ微粒子等を配合することもできる。 The low refractive index layer refers to a layer having a refractive index of 1.20-1.55 for light having a wavelength of 589 nm. The material used for the low refractive index layer is not particularly limited as long as the desired properties are obtained. For example, a curable composition containing a fluoropolymer, an acrylic monomer, and a fluorine-containing acrylic monomer. And cured products such as epoxy group-containing compounds and fluorine-containing epoxy group-containing compounds. In order to increase the strength of the low refractive index layer, silica fine particles and the like can be blended.

[0041] (3)高屈折率層 [0041] (3) High refractive index layer

高屈折率層とは、波長 589nmの光の屈折率が 1. 50- 2. 20であって、低屈折率 層より高い屈折率を有する層を表す。  The high refractive index layer refers to a layer having a refractive index of 1.50-2.20 for light having a wavelength of 589 nm and a higher refractive index than the low refractive index layer.

高屈折率層を形成するために、高屈折率の無機粒子、例えば金属酸化物粒子を 酉己合すること力 Sできる。  In order to form a high refractive index layer, it is possible to combine inorganic particles with high refractive index, for example, metal oxide particles.

金属酸化物粒子の具体例としては、アンチモンドープ酸化錫 (ATO)粒子、錫ドー プ酸化インジウム(ITO)粒子、リンドープ酸化錫(PTO)粒子、 Zn〇粒子、アンチモ ンドープ ZnO、 A1ドープ Zn〇粒子、 ZrO粒子、 Ti〇粒子、シリカ被覆 TiO粒子、 A1  Specific examples of metal oxide particles include antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, Zn ○ particles, antimony-doped ZnO, and A1-doped Zn ○ particles. , ZrO particles, TiO particles, silica-coated TiO particles, A1

2 2 2  2 2 2

O /ZrO被覆 Ti〇粒子、 Ce〇粒子等を挙げることができる。好ましくは、アンチモ O / ZrO-coated TiO particles, CeO particles, and the like. Preferably, antimo

2 3 2 2 2 2 3 2 2 2

ンドープ酸化錫 (ATO)粒子、錫ドープ酸化インジウム(ITO)粒子、リンドープ酸化 錫(PTO)粒子、 A1ドープ Zn〇粒子、 Al O /ZrO被覆 TiO粒子である。これらの金  N-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, A1-doped ZnO particles, Al 2 O 3 / ZrO-coated TiO particles. These gold

2 3 2 2  2 3 2 2

属酸化物粒子は、一種単  The metal oxide particles are a single type.

独又は二種以上の組み合わせで使用することができる。  It can be used alone or in combination of two or more.

また、高屈折率層にハードコート層や帯電防止層の機能を持たせることもできる。  Moreover, the function of a hard coat layer or an antistatic layer can be given to the high refractive index layer.

[0042] (4)中屈折率層  [0042] (4) Medium refractive index layer

3種以上の屈折率を有する層を組み合わせる場合に、波長 589nmの光の屈折率 が 1. 50〜: 1. 90であって、低屈折率層より高ぐ高屈折率層より低い屈折率を有す る層を中屈折率層と表す。中屈折率層の屈折率は、好ましくは、 1. 50〜: 1. 80、より 好ましくは、 1. 50〜: 1. 75である。  When combining layers with three or more refractive indexes, the refractive index of light with a wavelength of 589 nm is 1.50 to: 1.90, which is higher than the low refractive index layer and lower than the high refractive index layer. This layer is referred to as a medium refractive index layer. The refractive index of the middle refractive index layer is preferably 1.50 to: 1.80, more preferably 1.50 to: 1.75.

中屈折率層を形成するために、高屈折率の無機粒子、例えば金属酸化物粒子を 酉己合すること力 Sできる。  In order to form a medium refractive index layer, it is possible to combine inorganic particles having a high refractive index, for example, metal oxide particles.

金属酸化物粒子の具体例としては、アンチモンドープ酸化錫 (ATO)粒子、錫ドー プ酸化インジウム(ITO)粒子、リンドープ酸化錫(PTO)粒子、 Zn〇粒子、アンチモ ンドープ ZnO、 A1ドープ Zn〇粒子、 ZrO粒子、 TiO粒子、シリカ被覆 TiO粒子、 A1 Specific examples of metal oxide particles include antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, ZnO particles, antimony Doped ZnO, A1-doped ZnO particles, ZrO particles, TiO particles, silica-coated TiO particles, A1

2 2 2  2 2 2

O /ZrO  O / ZrO

2 3 2  2 3 2

被覆 Ti〇粒子、 Ce〇粒子等を挙げることができる。好ましくは、アンチモンドープ酸  Coated TiO particles, CeO particles, and the like. Preferably, antimony doped acid

2 2  twenty two

化錫 (ATO)粒子、錫ドープ酸化インジウム(IT〇)粒子、リンドープ酸化錫 (ΡΤΟ)粒 子、 A1ドープ ΖηΟ粒子、 ZrO粒子である。これらの金属酸化物粒子は、一種単独又  Tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (ΡΤΟ) particles, A1-doped ΖηΟ particles, and ZrO particles. These metal oxide particles may be used alone or in combination.

2  2

は二種以上の組み合わせで使用することができる。  Can be used in combinations of two or more.

また、中屈折率層にハードコート層や帯電防止層の機能を持たせることもできる。  Further, the medium refractive index layer can have a function of a hard coat layer or an antistatic layer.

[0043] 低屈折率層と高屈折率層を組み合わせることにより反射率を低くすることができ、さ らに、低屈折率層、高屈折率層、中屈折率層を組み合わせることにより、反射率を低 くすることができるとともに色目を減らすことができる。 [0043] The reflectance can be lowered by combining the low refractive index layer and the high refractive index layer, and the reflectance can be reduced by combining the low refractive index layer, the high refractive index layer, and the middle refractive index layer. Can be lowered and the color can be reduced.

[0044] (5)ハードコート層 [0044] (5) Hard coat layer

ハードコート層の具体例としては、 Si0、エポキシ系樹脂、アクリル系樹脂、メラミン Specific examples of the hard coat layer include Si0 , epoxy resin, acrylic resin, and melamine.

2  2

系樹脂等の材料力も構成するのが好ましい。また、これらの樹脂にシリカ粒子を配合 しても良い。  It is also preferable that the material strength of the system resin or the like is also configured. Silica particles may be blended with these resins.

ハードコート層は積層体の機械的強度を高める効果がある。  The hard coat layer has the effect of increasing the mechanical strength of the laminate.

[0045] (6)帯電防止層 [0045] (6) Antistatic layer

帯電防止層の具体例としては、アンチモンドープ酸化錫 (ATO)粒子、錫ドープ酸 化インジウム(ITO)粒子、リンドープ酸化錫(PTO)粒子、 A1ドープ Zn〇粒子等の導 電性を有する金属酸化物粒子、あるいは有機、又は無機の導電性化合物を添加し た硬化性膜、前記金属酸化物を蒸着あるいはスパッタリングすることで得られる金属 酸化物膜、導電性有機高分子からなる膜を挙げることができる。導電性有機高分子 としては、ポリアセチレン系導電性高分子、ポリア二リン系導電性高分子、ポリチオフ ヱン系導電性高分子、ポリピロール系導電性高分子、ポリフエ二レンビニレン系導電 性高分子等を例示することができる。尚、上述したように、本発明で使用する硬化性 樹脂組成物に含まれる金属酸化物として、 AT〇粒子、 IT〇粒子、リンドープ酸化錫( ΡΤ〇)粒子、アンチモンドープ Zn〇、 A1ドープ ΖηΟ粒子等の導電性粒子を添加す れば、得られる金属酸化物を高密度に含む層が帯電防止性を有する膜となる。この 場合、別途の帯電防止膜の形成を省略できる。 帯電防止層は、積層体に導電性を付与し、静電気が生じて埃等が付着するのを防 止する。 Specific examples of the antistatic layer include conductive oxides such as antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, and A1-doped ZnO particles. Curable films to which organic particles or organic or inorganic conductive compounds are added, metal oxide films obtained by vapor deposition or sputtering of the metal oxides, and films made of conductive organic polymers. it can. Examples of the conductive organic polymer include polyacetylene conductive polymer, polyaniline conductive polymer, polythiophene conductive polymer, polypyrrole conductive polymer, and polyphenylene vinylene conductive polymer. It can be illustrated. As described above, as the metal oxide contained in the curable resin composition used in the present invention, AT o particles, IT o particles, phosphorus-doped tin oxide ((o) particles, antimony-doped Zn o, A1 dope ΖηΟ When conductive particles such as particles are added, the resulting layer containing the metal oxide at a high density becomes a film having antistatic properties. In this case, the formation of a separate antistatic film can be omitted. The antistatic layer imparts electrical conductivity to the laminate and prevents dust from adhering due to static electricity.

[0046] これらの層は一層のみ形成してもよぐまた、異なる層を二層以上形成してもよい。  [0046] These layers may be formed in only one layer, or two or more different layers may be formed.

また、低、中、高屈折率層の膜厚は、それぞれ通常 60〜150nm、帯電防止層の 膜厚は通常 0. 05〜3 β m、ハードコート層の膜厚は通常 1〜20 μ mである。 The film thickness of the low, medium and high refractive index layers is usually 60 to 150 nm, the film thickness of the antistatic layer is usually 0.05 to 3 β m, and the film thickness of the hard coat layer is usually 1 to 20 μm. It is.

[0047] 本発明では、積層体の任意の連続する 2以上の層を本発明の製造方法で形成で きるが、本発明の製造方法によらない層の製造方法は、公知の塗布と硬化、蒸着、ス パッタリング等の方法により製造できる。  [0047] In the present invention, any two or more continuous layers of the laminate can be formed by the production method of the present invention, but the layer production method not based on the production method of the present invention is a known application and curing, It can be manufactured by methods such as vapor deposition and sputtering.

[0048] また、本発明による硬化性樹脂組成物からなる層は、硬化させて優れた光学特性と 耐久性を有する硬化膜を形成させるために、特に、加熱による熱履歴を与えることが 好ましい。もちろん、常温で放置した場合にも、時間の経過と共に硬化反応が進み、 目的とする硬化膜が形成されるが、実際上は、加熱して硬化させることが、所要時間 を短縮する上で効果的である。また、熱酸発生剤を硬化触媒として添加しておくこと により、さらに硬化反応を促進させることができる。この硬化触媒としては特に制限は 無ぐ一般のゥレア樹脂、メラミン樹脂等のための硬化剤として使用されている各種酸 類やその塩類を利用することができ、特に、アンモニゥム塩を好ましく用いることがで きる。硬化反応のための加熱条件は適宜選択することができるが、加熱温度は、塗布 の対象である基材の耐熱限界温度以下であることが必要である。  [0048] In addition, the layer made of the curable resin composition according to the present invention is preferably imparted with a heat history by heating in order to be cured to form a cured film having excellent optical properties and durability. Of course, even when left at room temperature, the curing reaction proceeds with the passage of time, and the desired cured film is formed. However, in practice, heating and curing are effective in reducing the required time. Is. Moreover, the curing reaction can be further promoted by adding a thermal acid generator as a curing catalyst. The curing catalyst is not particularly limited, and various acids and salts thereof used as curing agents for general urea resins and melamine resins can be used. In particular, ammonium salts are preferably used. it can. The heating conditions for the curing reaction can be selected as appropriate, but the heating temperature needs to be equal to or lower than the heat resistant limit temperature of the substrate to be coated.

[0049] 本発明によれば、 1の塗膜から、 2以上の層を形成することができるため、積層体の 製造工程が簡略化できる。  [0049] According to the present invention, since two or more layers can be formed from one coating film, the production process of the laminate can be simplified.

また、金属酸化物粒子を偏在化させることによって、積層体の耐擦傷性を向上する こと力 Sできる。  Further, by making the metal oxide particles unevenly distributed, it is possible to improve the scratch resistance of the laminate.

本発明の積層体は、反射防止膜の他にも、例えば、レンズ、選択透過膜フィルタ等 の光学用部品に使用できる。  In addition to the antireflection film, the laminate of the present invention can be used for optical parts such as a lens and a selective transmission film filter.

[0050] II.硬化性樹脂組成物 [0050] II. Curable resin composition

次に、本発明の硬化性樹脂組成物について説明する。  Next, the curable resin composition of the present invention will be described.

本発明の硬化性樹脂組成物は、  The curable resin composition of the present invention is

(A1)重合性不飽和基を有する有機化合物 (Ab)を結合させてなる数平均粒子径 1 nm以上 40nm未満の金属酸化物粒子(以下、「(A1)の金属酸化物粒子」という)(A1) Number average particle diameter formed by bonding an organic compound (Ab) having a polymerizable unsaturated group 1 Metal oxide particles with a diameter of at least nm and less than 40 nm (hereinafter referred to as “(A1) metal oxide particles”)

(A2)数平均粒子径 40nm以上 200nm以下の金属酸化物粒子(以下、「(A2)の 金属酸化物粒子」という) (A2) Metal oxide particles having a number average particle diameter of 40 nm to 200 nm (hereinafter referred to as “(A2) metal oxide particles”)

(B)エチレン性不飽和基含有含フッ素重合体  (B) Ethylenically unsaturated group-containing fluoropolymer

(C) (B)エチレン性不飽和基含有含フッ素重合体の溶解性が高レ、、 1種又は 2種 以上の溶剤(以下、「(C)速揮発溶剤」という)  (C) (B) High solubility of fluorine-containing polymer containing ethylenically unsaturated groups, one or more solvents (hereinafter referred to as “(C) fast volatile solvent”)

(D) (A1)及び (A2)の金属酸化物粒子の分散安定性が高ぐかつ、(C)速揮発溶 剤と相溶性である、 1種又は 2種以上の溶剤(以下、「(D)遅揮発溶剤」という)を含有 することを特徴とする。  (D) One or two or more solvents (hereinafter referred to as “(”) that have high dispersion stability of the metal oxide particles of (A1) and (A2) and are compatible with (C) the fast volatile solvent. D) slow volatile solvent ”).

[0051] 1.硬化性樹脂組成物の各構成成分について具体的に説明する。  [0051] 1. Each component of the curable resin composition will be specifically described.

金属酸化物粒子 (A1)及び (A2)  Metal oxide particles (A1) and (A2)

本発明においては、粒径の異なる 2種類の金属酸化物粒子 (A1)及び (A2)を用 いる。このうち、金属酸化物粒子 (A1)は、後述の重合性不飽和基を有する有機化合 物 (Ab)と結合していることが必要である。金属酸化物粒子 (A2)については、重合 性不飽和基を有する有機化合物 (Ab)と結合していることが好ましいが、必須ではな レ、。  In the present invention, two types of metal oxide particles (A1) and (A2) having different particle diameters are used. Among these, the metal oxide particles (A1) need to be bonded to an organic compound (Ab) having a polymerizable unsaturated group described later. The metal oxide particles (A2) are preferably bonded to the organic compound (Ab) having a polymerizable unsaturated group, but are not essential.

本明細書にぉレ、て、金属酸化物粒子 (A1)及び (A2)をまとめて「金属酸ィ匕物粒子 成分 (A)」ということがある。金属酸化物粒子 (Al)、(A2)において、有機化合物お b)と結合していない金属酸化物粒子を、それぞれ「金属酸化物粒子 (Aal)」、「金属 酸化物粒子 (Aa2)」とレ、うことがあり、両者をまとめて「金属酸化物粒子 (Aa)」というこ ともある。また、有機化合物 (Ab)と結合している金属酸化物粒子 (Al)、(A2)を、そ れぞれ「反応性粒子 (Aabl)」、「反応性粒子 (Aab2)」ということがあり、両者をまとめ て「反応性粒子 (Aab)」とレ、うことがある。  In the present specification, the metal oxide particles (A1) and (A2) may be collectively referred to as “metal oxide particle component (A)”. In the metal oxide particles (Al) and (A2), the metal oxide particles not bonded to the organic compound b) are referred to as “metal oxide particles (Aal)” and “metal oxide particles (Aa2)”, respectively. Sometimes they are collectively referred to as “metal oxide particles (Aa)”. In addition, the metal oxide particles (Al) and (A2) bonded to the organic compound (Ab) are sometimes referred to as “reactive particles (Aabl)” and “reactive particles (Aab2)”, respectively. Sometimes, both are collectively referred to as “reactive particles (Aab)”.

[0052] 金属酸化物粒子 (A1)及び (A2)の数平均粒子径は、電子顕微鏡法による測定で 、それぞれ lnm以上 40nm未満の範囲内及び 40nm以上 200nm以下の範囲内で ある。このように粒径の異なる 2種類の粒子を用いることにより、 1種類の金属酸化物 粒子を含む硬化性樹脂組成物から得られる硬化膜に比べて、耐擦傷性が向上する 尚、 2種類の金属酸化物粒子は、それぞれの粒径が上記範囲内の複数種類のもの を用いればよぐ金属酸化物粒子は 3種類以上を組み合わせてもよい。また、複数種 類の金属酸化物粒子を構成する物質は同一であっても異なっていてもよい。 [0052] The number average particle sizes of the metal oxide particles (A1) and (A2) are in the range of 1 nm to less than 40 nm and in the range of 40 nm to 200 nm, respectively, as measured by electron microscopy. By using two types of particles having different particle diameters in this way, the scratch resistance is improved compared to a cured film obtained from a curable resin composition containing one type of metal oxide particles. The two types of metal oxide particles may be a combination of three or more types of metal oxide particles as long as each particle size is within the above range. Further, the substances constituting the plurality of types of metal oxide particles may be the same or different.

[0053] 本発明で用いる金属酸化物粒子 (A1)及び (A2)は、得られる硬化性樹脂組成物 力 なる硬化膜の硬度と無色性の観点から、ケィ素、アルミニウム、ジノレコニゥム、チ タニゥム、亜鉛、ゲルマニウム、インジウム、スズ、アンチモン及びセリウムよりなる群か ら選ばれる少なくとも一つの元素の金属酸化物粒子であることが好ましい。  [0053] The metal oxide particles (A1) and (A2) used in the present invention are obtained from the viewpoint of hardness and colorlessness of the cured film, which is a curable resin composition, and can be obtained by using silicon, aluminum, dinoleconium, titanium, Metal oxide particles of at least one element selected from the group consisting of zinc, germanium, indium, tin, antimony and cerium are preferred.

[0054] 特に、金属酸化物粒子(A1)としては、ァノレミニゥム、ジルコニウム、チタニウム、亜 鉛、ゲルマニウム、インジウム、スズ、アンチモン及びセリウムよりなる群から選ばれる 少なくとも一つの元素の酸化物粒子が好ましぐ中でもジルコニウムの酸化物粒子が 特に好ましい。また、硬化膜を構成する金属酸化物粒子成分 (A)が高密度に存在す る層の屈折率を高くする目的においては、金属酸化物粒子 (A1)の波長 589nmに おける屈折率が 1. 5以上であることが好ましい。このため、この目的においては、シリ 力(屈折率約 1. 45)粒子は好ましくない。  [0054] In particular, the metal oxide particles (A1) are preferably oxide particles of at least one element selected from the group consisting of anoleminium, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium. Among these, zirconium oxide particles are particularly preferable. For the purpose of increasing the refractive index of the layer in which the metal oxide particle component (A) constituting the cured film is present at a high density, the refractive index of the metal oxide particle (A1) at a wavelength of 589 nm is 1. It is preferably 5 or more. For this purpose, siri force (refractive index of about 1.45) particles are not preferred.

金属酸化物粒子 (A1)は、数平均粒子径が lnm以上 40nm未満の範囲内であり、 好ましくは lnm以上 30nm以下の範囲内である。  The metal oxide particles (A1) have a number average particle size in the range of 1 nm to less than 40 nm, preferably in the range of 1 nm to 30 nm.

[0055] 金属酸化物粒子 (A2)としては、硬化膜の耐擦傷性改善の観点からは、シリカを主 成分とする粒子が好ましい。  [0055] The metal oxide particles (A2) are preferably particles mainly composed of silica from the viewpoint of improving the scratch resistance of the cured film.

金属酸化物粒子 (A2)は、数平均粒子径が 40nm以上 200nm以下の範囲内であ り、好ましくは 40nm以上 lOOnm以下の範囲内である。ここで、金属酸化物粒子(A1 )及び (A2)の粒径は、電子顕微鏡法で測定した数平均粒子径である。また、棒状粒 子である場合の粒径は、短径をいう。  The metal oxide particles (A2) have a number average particle size in the range of 40 nm to 200 nm, preferably in the range of 40 nm to lOOnm. Here, the particle diameters of the metal oxide particles (A1) and (A2) are number average particle diameters measured by electron microscopy. Moreover, the particle diameter in the case of a rod-shaped particle means a short axis.

また、金属酸化物粒子 (A1)及び (A2)の分散性を改良するために各種の界面活 性剤やアミン類を添加してもよい。  Various surfactants and amines may be added to improve the dispersibility of the metal oxide particles (A1) and (A2).

[0056] 中でも、高硬度の観点から、シリカ、ァノレミナ、ジルコユア及び酸化アンチモンの粒 子が好ましぐ特にジルコユア粒子が好ましレ、。また、ジルコニウムやチタニウム等の 酸化物粒子を用いることにより高屈折率の硬化被膜を得ることができるし、 AT〇粒子 リンドープ酸化錫 (PTO)粒子、等を用レ、ることにより、硬化被膜に導電性を付与する こともできる。これらは 1種単独で又は 2種以上を組み合わせて用いることができる。さ らには、金属酸化物粒子 (Aa)は、粉体状又は分散液であることが好ましい。分散液 である場合、他の成分との相溶性、分散性の観点から、分散媒は、有機溶剤が好ま しレ、。このような有機溶剤としては、例えば、メタノーノレ、エタノール、イソプロパノール 、ブタノール、ォクタノール等のアルコール類;アセトン、メチルェチルケトン、メチルイ ソブチルケトン、シクロへキサノン等のケトン類;酢酸ェチル、酢酸ブチル、乳酸ェチ ノレ、 Ί—ブチ口ラタトン、プロピレングリコーノレモノメチノレエーテノレアセテート、プロピレ ングリコーノレモノェチノレエーテノレアセテート等のエステノレ類;エチレングリコーノレモノ メチルエーテル、ジエチレングリコールモノブチルエーテル等のエーテル類;ベンゼ ン、トルエン、キシレン等の芳香族炭化水素類;ジメチルフオルムアミド、ジメチルァセ トアミド、 N—メチルピロリドン等のアミド類を挙げることができる。中でも、メタノール、 イソプロパノール、ブタノール、メチルェチルケトン、メチルイソブチルケトン、酢酸ェ チル、酢酸ブチル、トルエン、キシレンが好ましレ、。 [0056] Among them, from the viewpoint of high hardness, particles of silica, anoremina, zircoua and antimony oxide are preferred, and zircoua particles are particularly preferred. Moreover, it is possible to obtain a cured film having a high refractive index by using oxide particles such as zirconium and titanium, and by using AT particles, phosphorus-doped tin oxide (PTO) particles, etc., a cured film can be obtained. Add conductivity You can also. These can be used alone or in combination of two or more. Furthermore, the metal oxide particles (Aa) are preferably in the form of powder or dispersion. In the case of a dispersion, an organic solvent is preferred as the dispersion medium from the viewpoint of compatibility with other components and dispersibility. Examples of such an organic solvent include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; ethyl acetate, butyl acetate, and lactate. Estenoles such as chinole, ブ -butyla ratatone, propylene glycolenomonomethinoreethenoreacetate, propyleneglycolenomonoethylenoatenoreacetate; ethers such as ethyleneglycolenomonomethyl ether and diethylene glycol monobutyl ether; Aromatic hydrocarbons such as benzene, toluene and xylene; amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone. Of these, methanol, isopropanol, butanol, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate, toluene and xylene are preferred.

[0057] シリカ粒子の市販品としては、例えば、コロイダルシリカとして、 日産化学工業 (株) 製 商品名:メタノールシリカゾル、 IPA— ST、 MEK— ST、 NBA- ST, XBA— ST 、 DMAC— ST、 ST— UP、 ST— OUP、 ST— 20、 ST— 40、 ST— C、 ST— N、 ST — 0、 ST— 50、 ST—〇L等を挙げることができる。また粉体シリカとしては、 日本ァェ ロジル(株)製 商品名:ァエロジル 130、ァエロジル 300、ァエロジノレ 380、ァエロジ ノレ TT600、ァェロジノレ 0X50、旭硝子(株)製 商品名:シルデックス Η31、 Η32、 Η 51、 Η52、 Η121、 Η122、 曰本シリカ工業(株)製 商品名: Ε220Α、 Ε220、富士 シリシァ (株)製 商品名: SYLYSIA470、 日本板硝子 (株)製 商品名: SGフレーク 等を挙げることができる。  [0057] Commercially available silica particles include, for example, colloidal silica manufactured by Nissan Chemical Industries, Ltd., trade names: methanol silica sol, IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-0, ST-50, ST-0. In addition, as the silica powder, Nippon Aerosil Co., Ltd. trade names: Aerosil 130, Aerosil 300, Aerogenore 380, Aerosil Nore TT600, Aerosilore 0X50, Asahi Glass Co., Ltd. Trade names: Sildex Η31, Η32, Η51 , Η52, Η121, Η122, manufactured by Enomoto Silica Industry Co., Ltd. Product name: Ε220Α, Ε220, manufactured by Fuji Silysia Co., Ltd. Product name: SYLYSIA470, manufactured by Nippon Sheet Glass Co., Ltd. Product name: SG Flakes .

[0058] また、アルミナの水分散品としては、 日産化学工業 (株)製 商品名:アルミナゾル—  [0058] As an aqueous dispersion of alumina, product name: Alumina sol manufactured by Nissan Chemical Industries, Ltd.

100、一 200、一520 ;アルミナのイソプロパノール分散品としては、住友大阪セメント (株)製 商品名: AS— 150I ;アルミナのトノレェン分散品としては、住友大阪セメント( 株)製 商品名: AS— 150T;ジノレコユアのトノレエン分散品としては、住友大阪セメン ト (株)製 商品名: HXU_ 110JC;アンチモン酸亜鉛粉末の水分散品としては、 日 産化学工業 (株)製 商品名:セルナックス;アルミナ、酸化チタン、酸化スズ、酸化ィ ンジゥム、酸化亜鉛等の粉末及び溶剤分散品としては、シーアィ化成 (株)製 商品 名:ナノテック;アンチモンドープ酸化スズの水分散ゾルとしては、石原産業 (株)製 商品名: SN— 100D ; IT〇粉末としては、三菱マテリアル (株)製の製品;酸化セリウ ム水分散液としては、多木化学 (株)製 商品名:ニードラール等を挙げることができる 100, 200, 520; Asalumina isopropanol dispersion, manufactured by Sumitomo Osaka Cement Co., Ltd. Product name: AS—150I; As alumina tonolene dispersion, manufactured by Sumitomo Osaka Cement Co., Ltd. Product name: AS— 150T; Ginolecoyu's tonoleene dispersion is manufactured by Sumitomo Osaka Cement Co., Ltd. Product name: HXU_ 110JC; Zinc antimonate powder is dispersed in water by Nissan Chemical Industries, Ltd. Product name: Cellnax; Alumina , Titanium oxide, tin oxide, oxide For powder and solvent dispersions such as zinc and zinc oxide, manufactured by CIA Kasei Co., Ltd. Product name: Nanotech; for antimony-doped tin oxide aqueous dispersion sol, manufactured by Ishihara Sangyo Co., Ltd. Product name: SN-100D; IT 〇 As powder, product made by Mitsubishi Materials Co., Ltd .; As cerium oxide aqueous dispersion, Taki Chemical Co., Ltd. trade name: Niedral etc.

[0059] 金属酸化物粒子 (A1)及び (A2)の形状は球状、中空状、多孔質状、棒状 (ァスぺ タト比が、 1を超えて 10以下の形状をいう。)、板状、繊維状、又は不定形状であり、 好ましくは、(A1)については、棒状であり、(A2)については、球状である。 [0059] The metal oxide particles (A1) and (A2) have a spherical shape, a hollow shape, a porous shape, a rod shape (a shape having an aspect ratio of more than 1 and 10 or less), a plate shape. , Fibrous or indefinite shape, preferably (A1) is rod-shaped and (A2) is spherical.

これら金属酸化物粒子 (A1)及び (A2)の使用形態は、乾燥状態の粉末、又は水も しくは有機溶剤で分散した状態で用いることができる。例えば、分散液として当業界 に知られている微粒子状の金属酸化物粒子の分散液を直接用いることができる。特 に、硬化物に優れた透明性を要求する用途においては金属酸化物粒子の分散液の 利用が好ましい。  These metal oxide particles (A1) and (A2) can be used in a state of being dispersed in a dry powder, water or an organic solvent. For example, a dispersion of fine metal oxide particles known in the art as the dispersion can be used directly. In particular, it is preferable to use a dispersion of metal oxide particles in applications that require excellent transparency in the cured product.

[0060] 本発明に用いられる金属酸化物粒子 (A2)は、所定の数平均粒子径を有する金属 酸化物粒子 (Aa2)そのままであってもよいが、金属酸化物粒子 (Aa2)と、重合性不 飽和基を含む有機化合物 (Ab)とを結合させてなる粒子 (以下、「反応性粒子 (Aab2 )」ということがある)であることが好ましい。金属酸化物粒子成分 (A)として、金属酸化 物粒子 (Aa2)を、重合性不飽和基を有する有機化合物 (Ab)と結合させた反応性粒 子 (Aab2)を用いることにより、得られる硬化性樹脂組成物からなる硬化膜の耐擦傷 性がさらに向上する。ここで、結合とは、共有結合であってもよいし、物理吸着等の非 共有結合であってもよい。  [0060] The metal oxide particles (A2) used in the present invention may be the metal oxide particles (Aa2) having a predetermined number average particle diameter as they are, but they are polymerized with the metal oxide particles (Aa2). It is preferably a particle formed by binding an organic compound (Ab) containing a reactive unsaturated group (hereinafter sometimes referred to as “reactive particle (Aab2)”). As the metal oxide particle component (A), a cured product obtained by using reactive particles (Aab2) in which metal oxide particles (Aa2) are combined with an organic compound (Ab) having a polymerizable unsaturated group. The scratch resistance of the cured film made of the conductive resin composition is further improved. Here, the bond may be a covalent bond or a non-covalent bond such as physical adsorption.

[0061] 重合性不飽和基を有する有機化合物 (Ab)  [0061] Organic compound having a polymerizable unsaturated group (Ab)

本発明に用いられる有機化合物 (Ab)は、重合性不飽和基を有する化合物であり、 さらに、下記式 (A—1)に示す基を含む有機化合物であることが好ましい。また、 [ - 0_C ( =〇) _NH_]基を含み、さらに、 [ _〇_C ( = S) _NH_]基及び [_ S _ C ( = 0) _NH_]基の少なくとも 1を含むものであることが好ましレ、。また、この有機 化合物 (Ab)は、分子内にシラノール基を有する化合物又は加水分解によってシラノ 一ル基を生成する化合物であることが好ましレ、。 [0062] [化 8] The organic compound (Ab) used in the present invention is a compound having a polymerizable unsaturated group, and is preferably an organic compound containing a group represented by the following formula (A-1). In addition, it includes a [−0_C (= 〇) _NH_] group, and further includes at least one of a [_〇_C (= S) _NH_] group and a [_S_C (= 0) _NH_] group. I like it. In addition, the organic compound (Ab) is preferably a compound having a silanol group in the molecule or a compound that generates a silanol group by hydrolysis. [0062] [Chemical 8]

― U— C— N― (A - l) ― U— C— N— (A-l)

II  II

V  V

[式中、 Uは、 NH、〇(酸素原子)又は S (ィォゥ原子)を示し、 Vは、〇又は Sを示す。 [In the formula, U represents NH, ◯ (oxygen atom) or S (Y atom), and V represents ◯ or S.

] ]

[0063] (i)重合性不飽和基  [0063] (i) polymerizable unsaturated group

有機化合物 (Ab)に含まれる重合性不飽和基としては特に制限はないが、例えば、 アタリロイル基、メタクリロイル基、ビニル基、プロぺニル基、ブタジェニル基、スチリル 基、ェチュル基、シンナモイル基、マレエート基、アクリルアミド基を好適例として挙げ ること力 Sできる。  The polymerizable unsaturated group contained in the organic compound (Ab) is not particularly limited. Group and acrylamide group can be cited as preferred examples.

この重合性不飽和基は、活性ラジカル種により付加重合をする構成単位である。  This polymerizable unsaturated group is a structural unit that undergoes addition polymerization with active radical species.

[0064] (ii)前記式 (A— 1)に示す基 [0064] (ii) a group represented by the formula (A-1)

有機化合物に含まれる前記式 (A— 1)に示す基 [― U— C (=V)— NH ]は、具 体的には、 [— 0— C ( =〇)一NH— ]、 [ 0— C ( = S)—NH— ]、 [- S-C ( = 0) 一 NH ]、 [一 NH— C ( =〇)一 NH ]、 [一 NH— C ( = S)— NH ]、及び [一 S C ( = S)—NH ]の 6種である。これらの基は、 1種単独で又は 2種以上を組合わ せて用いることができる。中でも、熱安定性の観点から、 [_0_C ( = 0) _NH_] 基と、 [_0_C ( = S) _NH_]基及び [_ S_C ( =〇)_NH_]基の少なくとも 1つ とを併用することが好ましい。  The group [—U—C (= V) —NH] represented by the above formula (A-1) contained in the organic compound is specifically represented by [—0—C (= 〇) one NH—], [ 0—C (= S) —NH—], [-SC (= 0) One NH], [One NH—C (= 〇) One NH], [One NH—C (= S) —NH], and [One SC (= S) -NH]. These groups can be used alone or in combination of two or more. In particular, from the viewpoint of thermal stability, the [_0_C (= 0) _NH_] group and at least one of the [_0_C (= S) _NH_] group and the [_ S_C (= 〇) _NH_] group may be used in combination. preferable.

前記式 (A_ 1 )に示す基 [ _ U _ C ( = V) _ NH _ ]は、分子間におレ、て水素結合 による適度の凝集力を発生させ、硬化物にした場合、優れた機械的強度、基材ゃ高 屈折率層等の隣接層との密着性及び耐熱性等の特性を付与せしめるものと考えら れる。  The group [_U_C (= V) _NH_] shown in the above formula (A_1) is excellent when it is made into a cured product by generating moderate cohesive force due to hydrogen bonding between molecules. It is considered that the mechanical strength, the substrate, and the properties such as adhesion to adjacent layers such as a high refractive index layer and heat resistance are imparted.

[0065] (iii)シラノール基又は加水分解によってシラノール基を生成する基  (Iii) a silanol group or a group that generates a silanol group by hydrolysis

有機化合物 (Ab)は、分子内にシラノール基を有する化合物又は加水分解によつ てシラノール基を生成する化合物であることが好ましレ、。このようなシラノール基を生 成する化合物としては、ケィ素原子にアルコキシ基、ァリールォキシ基、ァセトキシ基 、アミノ基、ハロゲン原子等が結合した化合物を挙げることができるが、ケィ素原子に アルコキシ基又はァリールォキシ基が結合した化合物、即ち、アルコキシシリル基含 有化合物又はァリールォキシシリル基含有化合物が好ましい。 The organic compound (Ab) is preferably a compound having a silanol group in the molecule or a compound that generates a silanol group by hydrolysis. Examples of the compound that generates such a silanol group include compounds in which an alkoxy group, an aryloxy group, an acetoxy group, an amino group, a halogen atom, and the like are bonded to a silicon atom. A compound having an alkoxy group or an aryloxy group bonded thereto, that is, an alkoxysilyl group-containing compound or an aryloxysilyl group-containing compound is preferable.

シラノール基又はシラノール基を生成する化合物のシラノール基生成部位は、縮合 反応又は加水分解に続いて生じる縮合反応によって、酸化物粒子 (Aa)と結合する 構成単位である。  The silanol group-generating site of the silanol group or the compound that generates the silanol group is a structural unit that is bonded to the oxide particles (Aa) by a condensation reaction or a condensation reaction that occurs after hydrolysis.

[0066] (iv)好ましい態様  [0066] (iv) Preferred embodiment

有機化合物 (Ab)の好ましレ、具体例としては、例えば、下記式 (A_ 2)に示す化合 物を挙げることができる。  As a preferred example of the organic compound (Ab), a specific example thereof includes a compound represented by the following formula (A_2).

[0067] [化 9] [0067] [Chemical 9]

(A - 2)(A-2)

Figure imgf000025_0001
Figure imgf000025_0001

[0068] 式中、 R24、 R25は、同一でも異なっていてもよぐ水素原子又は炭素数:!〜 8のアル キル基若しくはァリール基であり、例えば、メチノレ、ェチル、プロピル、ブチル、ォクチ ノレ、フエニル、キシリル基等を挙げることができる。ここで、 jは、:!〜 3の整数である。 [0068] In the formula, R 24 and R 25 may be the same or different and each represents a hydrogen atom or an alkyl group or an aryl group having from 8 to 8 carbon atoms, such as methinole, ethyl, propyl, butyl, Examples include octanol, phenyl, xylyl groups and the like. Where j is an integer between:!

[0069] [ (R240) R25 Si—]で示される基としては、例えば、トリメトキシシリル基、トリェトキ [0069] Examples of the group represented by [(R 24 0) R 25 Si—] include, for example, a trimethoxysilyl group, a triethoxy group, and the like.

j 3-j  j 3-j

シシリル基、トリフエノキシシリル基、メチルジメトキシシリル基、ジメチルメトキシシリル 基等を挙げることができる。このような基のうち、トリメトキシシリル基又はトリエトキシシ リル基等が好ましい。  Examples thereof include a silyl group, a triphenoxysilyl group, a methyldimethoxysilyl group, and a dimethylmethoxysilyl group. Of these groups, a trimethoxysilyl group or a triethoxysilyl group is preferable.

R26は、炭素数 1〜: 12の脂肪族又は芳香族構造を有する 2価の有機基であり、鎖状 、分岐状又は環状の構造を含んでいてもよい。具体例として、メチレン、エチレン、プ ロピレン、ブチレン、へキサメチレン、シクロへキシレン、フエ二レン、キシリレン、ドデカ メチレン等を挙げることができる。 R 26 is a divalent organic group having an aliphatic or aromatic structure having 1 to 12 carbon atoms, and may contain a chain, branched or cyclic structure. Specific examples include methylene, ethylene, propylene, butylene, hexamethylene, cyclohexylene, phenylene, xylylene, and dodecamethylene.

R27は、 2価の有機基であり、通常、分子量 14から 1万、好ましくは、分子量 76から 5 00の 2価の有機基の中から選ばれる。具体例として、へキサメチレン、オタタメチレン 、ドデカメチレン等の鎖状ポリアルキレン基;シクロへキシレン、ノルボル二レン等の脂 環式又は多環式の 2価の有機基;フエ二レン、ナフチレン、ビフエ二レン、ポリフエユレ ン等の 2価の芳香族基;及びこれらのアルキル基置換体、ァリール基置換体を挙げる こと力 Sできる。また、これら 2価の有機基は炭素及び水素原子以外の元素を含む原子 団を含んでいてもよぐポリエーテル結合、ポリエステル結合、ポリアミド結合、ポリ力 ーボネート結合を含むこともできる。 R 27 is a divalent organic group, and is usually selected from divalent organic groups having a molecular weight of 14 to 10,000, preferably a molecular weight of 76 to 500. Specific examples include chain polyalkylene groups such as hexamethylene, otatamethylene and dodecamethylene; alicyclic or polycyclic divalent organic groups such as cyclohexylene and norbornylene; phenylene, naphthylene and biphenyl. Divalent aromatic groups such as len and polyphenylene; and alkyl and substituted aryl groups thereof. That power S. In addition, these divalent organic groups may contain a polyether bond, a polyester bond, a polyamide bond, or a polycarbonate bond, which may contain an atomic group containing an element other than carbon and hydrogen atoms.

R28は、(k+ 1)価の有機基であり、好ましくは、鎖状、分岐状又は環状の飽和炭化 水素基、不飽和炭化水素基の中から選ばれる。 R 28 is a (k + 1) -valent organic group, preferably selected from a chain, branched or cyclic saturated hydrocarbon group and unsaturated hydrocarbon group.

Zは、活性ラジカル種の存在下、分子間架橋反応をする重合性不飽和基を分子中 に有する 1価の有機基を示す。また、 kは、好ましくは、:!〜 20の整数であり、さらに好 ましくは、 1〜10の整数、特に好ましくは、:!〜 5の整数である。  Z represents a monovalent organic group having a polymerizable unsaturated group in the molecule that undergoes an intermolecular crosslinking reaction in the presence of an active radical species. K is preferably an integer of:! To 20, more preferably an integer of 1 to 10, and particularly preferably an integer of:! To 5.

[0070] 式 (A— 2)で示される化合物の具体例として、下記式 (A— 4)及び (A— 5)で示さ れる化合物が挙げられる。 [0070] Specific examples of the compound represented by the formula (A-2) include compounds represented by the following formulas (A-4) and (A-5).

[0071] [化 10] [0071] [Chemical 10]

Figure imgf000026_0001
Figure imgf000026_0001

[式中、「Acryl」は、アタリロイル基を示す。 「Me」は、メチル基を示す。」  [In the formula, “Acryl” represents an taliloyl group. “Me” represents a methyl group. "

[0072] 本発明で用いられる有機化合物 (Ab)の合成は、例えば、特開平 9— 100111号 公報に記載された方法を用いることができる。好ましくは、メルカプトプロピルトリメトキ シシランとイソホロンジイソシァネートをジブチルスズジラウレート存在下で混合し、 60 〜70°C数時間程度反応させた後に、ペンタエリスリトールトリアタリレートを添加して、 さらに 60〜70°C数時間程度反応させることにより製造される。 [0072] For the synthesis of the organic compound (Ab) used in the present invention, for example, a method described in JP-A-9-100111 can be used. Preferably, mercaptopropyltrimethoxysilane and isophorone diisocyanate are mixed in the presence of dibutyltin dilaurate and reacted at 60 to 70 ° C. for several hours, then pentaerythritol tritalylate is added, and further 60 to 70 It is produced by reacting for several hours at ° C.

[0073] 反応性粒子 (Aabl)及び (Aab2) [0073] Reactive particles (Aabl) and (Aab2)

シラノール基又は加水分解によってシラノール基を生成する基を有する有機化合 物 (Ab)を金属酸化物粒子 (Aa)と混合し、加水分解させ、両者を結合させる。得られ る反応性粒子 (Aab)中の有機重合体成分即ち加水分解性シランの加水分解物及 び縮合物の割合は、通常、乾燥粉体を空気中で完全に燃焼させた場合の質量減少 %の恒量値として、例えば空気中で室温から通常 800°Cまでの熱質量分析により求 めること力できる。 Organic compounds having silanol groups or groups that generate silanol groups by hydrolysis The product (Ab) is mixed with the metal oxide particles (Aa), hydrolyzed, and bonded together. The ratio of the organic polymer component, that is, hydrolyzable silane hydrolyzate and condensate in the resulting reactive particles (Aab) is usually reduced by mass when the dry powder is completely burned in air. As a constant value of%, it can be obtained, for example, by thermal mass spectrometry in air from room temperature to usually 800 ° C.

[0074] 金属酸化物粒子 (Aa)への有機化合物 (Ab)の結合量は、反応性粒子 (Aab) (金 属酸化物粒子 (Aa)及び有機化合物 (Ab)の合計)を 100質量%として、好ましくは、 0. 01質量%以上であり、さらに好ましくは、 0. 1質量%以上、特に好ましくは、 1質 量%以上である。金属酸化物粒子 (Aa)に結合した有機化合物 (Ab)の結合量が 0. 01質量%未満であると、組成物中における反応性粒子 (Aab)の分散性が十分でな ぐ得られる硬化物の透明性、耐擦傷性が十分でなくなる場合がある。また、反応性 粒子 (Aab)製造時の原料中の金属酸化物粒子 (Aa)の配合割合は、好ましくは、 5 〜99質量0 /0であり、さらに好ましくは、 10〜98質量0 /0である。 [0074] The amount of organic compound (Ab) bound to metal oxide particles (Aa) is 100% by mass of reactive particles (Aab) (total of metal oxide particles (Aa) and organic compounds (Ab)). Is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, and particularly preferably 1% by mass or more. When the amount of the organic compound (Ab) bonded to the metal oxide particle (Aa) is less than 0.01% by mass, the curing can be obtained with sufficient dispersibility of the reactive particle (Aab) in the composition. The transparency and scratch resistance of the object may not be sufficient. The mixing ratio of the reactive particles (Aab) metal oxide particles in the raw material during manufacture (Aa) is preferably a 5 to 99 weight 0/0, more preferably, 10 to 98 weight 0/0 It is.

[0075] 金属酸化物粒子 (A1) (即ち、反応性粒子 (Aabl) )の硬化性樹脂組成物中にお ける配合 (含有)量は、有機溶剤を除く組成物全量を 100質量%として、 10〜90質 量%の範囲内であることが好ましぐ 20〜80質量%の範囲であることがより好ましぐ 40〜80質量%の範囲であることが特に好ましい。 10質量%未満であると、硬化膜の 硬度が不十分であるカ 又は高屈折率のものが得られないことがある。 90質量%を 超えると、成膜性が不十分となることがある。この場合、反応性粒子 (Aabl)を構成す る金属酸化物粒子 (Aal)の含有量は、反応性粒子 (Aabl)の 65〜95質量%である ことが好ましい。  [0075] The amount of the metal oxide particles (A1) (that is, the reactive particles (Aabl)) in the curable resin composition is 100% by mass based on the total amount of the composition excluding the organic solvent. A range of 10 to 90% by mass is preferable, and a range of 20 to 80% by mass is more preferable, and a range of 40 to 80% by mass is particularly preferable. If it is less than 10% by mass, a cured film with insufficient hardness or a high refractive index may not be obtained. If it exceeds 90% by mass, film formability may be insufficient. In this case, the content of the metal oxide particles (Aal) constituting the reactive particles (Aabl) is preferably 65 to 95% by mass of the reactive particles (Aabl).

[0076] また、金属酸化物粒子 (A2) (金属酸化物粒子 (Aa2)、反応性粒子 (Aab2)のレ、 ずれであっても)の硬化性樹脂組成物中における配合 (含有)量は、有機溶剤を除く 組成物全量を 100質量%として、 1〜30質量%の範囲内であることが好ましぐ:!〜 2 0質量%の範囲であることがより好ましレ、。  [0076] The amount (inclusive) of the metal oxide particles (A2) (even if the metal oxide particles (Aa2) and reactive particles (Aab2) are misaligned) in the curable resin composition is Excluding the organic solvent, the total amount of the composition is preferably 100% by mass, and preferably in the range of 1 to 30% by mass: more preferably in the range of 20 to 20% by mass.

[0077] (B)エチレン性不飽和基含有含フッ素重合体  [0077] (B) Ethylenically unsaturated group-containing fluoropolymer

本発明で用いるエチレン性不飽和基含有含フッ素重合体は、 1個のイソシァネート 基と、少なくとも 1個のエチレン性不飽和基とを含有する化合物 (B— 1)と、水酸基含 有含フッ素重合体 (B— 2)とを反応させて得られ、イソシァネート基/水酸基のモル 比が 1. 1〜: 1. 9の割合で反応させて得られるものが好ましい。 The ethylenically unsaturated group-containing fluoropolymer used in the present invention comprises a compound (B-1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group-containing polymer. It is preferably obtained by reacting the fluorinated polymer (B-2) with an isocyanate group / hydroxyl molar ratio of 1.1 to 1.9.

[0078] (B - 1) 1個のイソシァネート基と、少なくとも 1個のエチレン性不飽和基とを含有する 化合物 [0078] (B-1) Compound containing one isocyanate group and at least one ethylenically unsaturated group

化合物(B— 1)としては、分子内に、 1個のイソシァネート基と、少なくとも 1個のェチ レン性不飽和基を含有している化合物であれば特に制限されるものではなレ、。尚、ィ ソシァネート基を 2個以上含有すると、水酸基含有含フッ素重合体と反応させる際に ゲルィ匕を起こす可能性がある。また、上記エチレン性不飽和基としては、硬化性樹脂 組成物をより容易に硬化させることができることから、(メタ)アタリロイル基がより好まし レ、。このような化合物としては、 2— (メタ)アタリロイルォキシェチルイソシァネート、 2 —(メタ)アタリロイルォキシプロピルイソシァネート、 1 , 1—ビス [ (メタ)アタリロイルォ キシメチル]ェチルイソシァネートの一種単独又は二種以上の組み合わせが挙げら れる。  The compound (B-1) is not particularly limited as long as the compound contains one isocyanate group and at least one ethylenically unsaturated group in the molecule. If two or more isocyanate groups are contained, gelling may occur when reacting with a hydroxyl group-containing fluoropolymer. In addition, as the ethylenically unsaturated group, a (meth) atalyloyl group is more preferable because the curable resin composition can be cured more easily. Examples of such compounds include 2- (meth) ataloyloxychetyl isocyanate, 2— (meth) atallyloyloxypropyl isocyanate, 1,1-bis [(meth) atalylooxymethyl] ethyl One type of isocyanate or a combination of two or more types may be mentioned.

[0079] 尚、このような化合物は、ジイソシァネート及び水酸基含有 (メタ)アタリレートを反応 させて合成することもできる。この場合、ジイソシァネートの例としては、 2,4 トリレン ジイソシァネート、 2,6 トリレンジイソシァネート、 1 , 3—キシリレンジイソシァネート、 1 イソシァネート、 p—フエ二レンジイソシァネート、 3,3 ' ジメチルー 4,4 'ージフエニル メタンジイソシァネート、 4,4'ージフエニルメタンジイソシァネート、 3,3 'ージメチルフ ェニレンジイソシァネート、 4,4 'ービフエ二レンジイソシァネート、 1 , 6—へキサンジィ ソシァネート、イソホロンジイソシァネート、メチレンビス(4ーシクロへキシルイソシァネ ―ト)、 2, 2,4_トリメチルへキサメチレンジイソシァネ一ト、ビス(2—イソシァネートェ チノレ)フマレート、 6 _イソプロピノレ _ 1,3 _フエニノレジイソシァネート、 4—ジフエ二ノレ プロパンジイソシァネート、リジンジイソシァネート、水添ジフヱニルメタンジイソシァネ —ト、 1, 3 _ビス(イソシァネートメチル)シクロへキサン、テトラメチルキシリレンジイソ シァネ一ト、 2, 5 (又は 6) _ビス(イソシァネートメチル)一ビシクロ [2. 2. 1]ヘプタン 等の一種単独又は二種以上の組み合わせが挙げられる。これらの中では、 2,4_トリ レンジイソシァネート、イソホロンジイソシァネート、キシリレンジイソシァネート、メチレ ンビス(4—シクロへキシルイソシァネア一ト)、 1 , 3—ビス(イソシァネートメチル)シク 口へキサンが特に好ましい。 [0079] Incidentally, such a compound can also be synthesized by reacting diisocyanate and a hydroxyl group-containing (meth) acrylate. In this case, examples of diisocyanates include 2,4 tolylene diisocyanate, 2,6 tolylene diisocyanate, 1,3-xylylene diisocyanate, 1 isocyanate, p-phenylene diisocyanate, 3,3 ′ Dimethyl-4,4'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-Dimethylphenylene diisocyanate, 4,4'-biphenyldiisocyanate, 1, 6-hexanediisocyanate, isophorone diisocyanate, methylenebis (4-cyclohexylisocyanate), 2,2,4_trimethylhexamethylenediisocyanate, bis (2-isocyanate ethanolate) fumarate, 6_ Isopropinole _ 1,3 _Pheninoresiocyanate, 4-Diphenol propane diisocyanate, lysine diiso Hydrogenate, hydrogenated diphenylmethane diisocyanate, 1,3_bis (isocyanatemethyl) cyclohexane, tetramethylxylylene diisocyanate, 2, 5 (or 6) _bis (iso Cyanatemethyl) monobicyclo [2.2.1] heptane, etc., may be used singly or in combination of two or more. Among these, 2,4_tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, methyl Bis (4-cyclohexylisocyanate) and 1,3-bis (isocyanatemethyl) cyclohexane are particularly preferred.

[0080] また、水酸基含有 (メタ)アタリレートの例としては、 2—ヒドロキシェチル (メタ)アタリ レート、 2—ヒドロキシブチル(メタ)アタリレート、 2—ヒドロキシプロピル(メタ)アタリレ ート、力プロラタトン(メタ)アタリレート、ポリプロピレングリコール(メタ)アタリレート、ジ ペンタエリスリトールペンタ(メタ)アタリレート、ペンタエリスリトーノレトリ(メタ)アタリレー ト、ペンタエリスリトールジ(メタ)アタリレートモノステアレート、イソシァヌル酸 E〇変性 ジ (メタ)アタリレート等一種単独又は二種以上の組み合わせが挙げられる。これらの 中では、 2—ヒドロキシェチル(メタ)アタリレート、ペンタエリスリトールトリ(メタ)アタリレ ートが特に好ましい。尚、水酸基含有多官能 (メタ)アタリレートの市販品としては、例 えば、大阪有機化学 (株)製  [0080] Examples of the hydroxyl group-containing (meth) acrylate include 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, force Prolatataton (meth) acrylate, polypropylene glycol (meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol nortri (meth) acrylate, pentaerythritol di (meth) acrylate monostearate, isocyanuric acid E〇 Modified Examples include one kind alone or a combination of two or more kinds such as di (meth) acrylate. Of these, 2-hydroxyethyl (meth) acrylate and pentaerythritol tri (meth) acrylate are particularly preferred. In addition, as a commercial item of a hydroxyl group-containing polyfunctional (meth) atalylate, for example, Osaka Organic Chemical Co.

商品名 HEA、 日本化薬(株)製 商品名 KAYARAD DPHA、 PET— 30、東 亞合成(株)製 商品名 ァロニックス M— 215、 M— 233、 M— 305、 M— 40 Product Name HEA, Nippon Kayaku Co., Ltd. Product Name KAYARAD DPHA, PET-30, Toagosei Co., Ltd. Product Name ALONIX M-215, M-233, M-305, M-40

0等として入手することができる。 It can be obtained as 0.

[0081] ジイソシァネート及び水酸基含有多官能 (メタ)アタリレートから合成する場合には、 ジイソシァネート 1モルに対し、水酸基含有多官能 (メタ)アタリレートの添加量を 1〜1[0081] When synthesizing from diisocyanate and a hydroxyl group-containing polyfunctional (meth) acrylate, the addition amount of the hydroxyl group-containing polyfunctional (meth) acrylate is 1 to 1 with respect to 1 mol of diisocyanate.

. 2モルとするのが好ましい。 2 mol is preferred.

[0082] このような化合物の合成方法としては、ジイソシァネート及び水酸基含有 (メタ)ァク リレートを一括で仕込んで反応させる方法、水酸基含有 (メタ)アタリレート中にジイソ シァネートを滴下して反応させる方法等を挙げることができる。 [0082] As a method for synthesizing such a compound, a method in which diisocyanate and a hydroxyl group-containing (meth) acrylate are charged together and reacted, a method in which diisocyanate is dropped and reacted in a hydroxyl group-containing (meth) acrylate Etc.

[0083] (B— 2)水酸基含有含フッ素重合体 [0083] (B-2) Hydrofluoric polymer containing hydroxyl group

水酸基含有含フッ素重合体 (B— 2)は、下記構造単位 (a)、(b)、 (c)から構成され ていることが好ましぐさらに構造単位 (d)、(e)、(f)を含むことがより好ましい。  The hydroxyl group-containing fluoropolymer (B-2) is preferably composed of the following structural units (a), (b), and (c). Furthermore, the structural units (d), (e), (f ) Is more preferable.

[0084] 構造単位(a) [0084] Structural unit (a)

構造単位 (a)は、下記一般式(1)で表される。  The structural unit (a) is represented by the following general formula (1).

[化 11]

Figure imgf000030_0001
[Chemical 11]
Figure imgf000030_0001

[式中、 R1はフッ素原子、フルォロアルキル基、又は OR2で表される基(R2はアルキ ル基、又はフルォロアルキル基を示す)を示す] [Wherein R 1 represents a fluorine atom, a fluoroalkyl group, or a group represented by OR 2 (R 2 represents an alkyl group or a fluoroalkyl group)]

[0085] 上記一般式(1)において、 R1及び R2のフルォロアルキル基としては、トリフルォロメ チル基、パーフルォロェチル基、パーフルォロプロピル基、パーフルォロブチル基、 パーフルォ口へキシル基、パーフルォロシクロへキシル基等の炭素数 1〜6のフルォ 口アルキル基が挙げられる。また、 R2のアルキル基としては、メチノレ基、ェチル基、プ 口ピル基、ブチル基、へキシル基、シクロへキシル基等の炭素数 1〜6のアルキル基 が挙げられる。 In the above general formula (1), the fluoroalkyl group of R 1 and R 2 includes a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluorobutyl group, a perfluoro mouth Examples thereof include fluorinated alkyl groups having 1 to 6 carbon atoms such as xyl group and perfluorocyclohexyl group. Examples of the alkyl group for R 2 include alkyl groups having 1 to 6 carbon atoms such as a methinole group, an ethyl group, a propyl group, a butyl group, a hexyl group, and a cyclohexyl group.

[0086] 構造単位(a)は、含フッ素ビニル単量体を重合成分として用いることにより導入する こと力 Sできる。このような含フッ素ビュル単量体としては、少なくとも 1個の重合性不飽 和二重結合と、少なくとも 1個のフッ素原子とを有する化合物であれば特に制限され るものではない。このような例としてはテトラフルォロエチレン、へキサフルォロプロピ レン、 3, 3, 3—トリフルォロプロピレン等のフルォロレフィン類;アルキルパーフルォ ロビニルエーテル又はアルコキシアルキルパーフルォロビニルエーテル類;パーフノレ ォロ(メチルビニルエーテル)、パーフルォロ(ェチルビニルエーテノレ)、 (プロピルビ ニルエーテル)、パーフルォロ(ブチルビニルエーテル)、パーフルォロ(イソブチルビ ニルエーテル)等のパーフルォロ(アルキルビュルエーテノレ)類;パーフルォロ(プロ ポキシプロピルビエルエーテノレ)等のパーフルォロ(アルコキシアルキルビエルエー テル)類の一種単独又は二種以上の組み合わせが挙げられる。これらの中でも、へ キサフルォロプロピレンとパーフルォロ(アルキルビュルエーテノレ)又はパーフルォロ (アルコキシアルキルビエルエーテル)がより好ましぐこれらを組み合わせて用いるこ とがさらに好ましレ、。  [0086] The structural unit (a) can be introduced by using a fluorine-containing vinyl monomer as a polymerization component. Such a fluorine-containing butyl monomer is not particularly limited as long as it is a compound having at least one polymerizable unsaturated double bond and at least one fluorine atom. Examples of this include fluoroolefins such as tetrafluoroethylene, hexafluoropropylene, 3, 3, 3-trifluoropropylene; alkyl perfluorovinyl ethers or alkoxyalkyl perfluorovinyl ethers. Perfluoro (alkyl vinyl ether), such as perfluoro (methyl vinyl ether), perfluoro (ethyl vinyl ether), (propyl vinyl ether), perfluoro (butyl vinyl ether), perfluoro (isobutyl vinyl ether), etc .; perfluoro (propoxypropyl) One perfluoro (alkoxyalkyl biether) or a combination of two or more perfluoro (bialkylene). Of these, hexafluoropropylene and perfluoro (alkyl butyl ethereol) or perfluoro (alkoxyalkyl biether) are more preferred, and it is even more preferable to use these in combination.

[0087] 尚、構造単位 (a)の含有率は、水酸基含有含フッ素重合体 (B— 2)の全体量を 10 0モノレ0 /0としたときに、 20〜70モノレ0 /0である。この理由は、含有率が 20モル0 /0未満 になると、本願が意図するところのフッ素含有材料の光学的特徴である、低屈折率の 発現が困難となる場合があるためであり、一方、含有率が 70モル%を超えると、水酸 基含有含フッ素重合体 (B— 2)の有機溶剤への溶解性、透明性、又は基材への密 着性が低下する場合があるためである。また、このような理由により、構造単位(a)の 含有率を、水酸基含有含フッ素重合体 (B_ 2)の全体量に対して、 25〜65モル%と するのがより好ましぐ 30〜60モル%とするのがさらに好ましい。 [0087] The content of the structural unit (a), the total amount of the hydroxyl group-containing fluoropolymer (B- 2) is taken as 10 0 Monore 0/0, is 20 to 70 Monore 0/0 . This is because if the content is less than 20 mole 0/0, which is the optical characteristics of the fluorine-containing materials where the application is intended, the low refractive index On the other hand, when the content exceeds 70 mol%, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent, transparency, or group This is because the adhesion to the material may decrease. For this reason, it is more preferable that the content of the structural unit (a) is 25 to 65 mol% with respect to the total amount of the hydroxyl group-containing fluoropolymer (B_2). More preferably, it is 60 mol%.

[0088] 構造単位 (b) [0088] Structural unit (b)

構造単位 (b)は、下記一般式 (2)で表される。  The structural unit (b) is represented by the following general formula (2).

[化 12]  [Chemical 12]

H R3 HR 3

— C— C (2)  — C— C (2)

H R4 HR 4

[式中、 R3は水素原子又はメチル基を、 R4はアルキル基、 _(CH ) -OR5 [Wherein R 3 represents a hydrogen atom or a methyl group, R 4 represents an alkyl group, _ (CH 2) 2 -OR 5

2 x  2 x

若しくは OCOR5で表される基(R5はアルキル基、又はグリシジル基を、 Xは 0又は 1 の数を示す)、カルボキシル基、又はアルコキシカルボ二ル基を示す] Or a group represented by OCOR 5 (R 5 represents an alkyl group or a glycidyl group, X represents a number of 0 or 1), a carboxyl group, or an alkoxycarbonyl group]

[0089] 一般式(2)におレ、て、 R4又は R5のアルキル基としては、メチル基、ェチル基、プロ ピノレ基、へキシル基、シクロへキシル基、ラウリル基等の炭素数 1〜 12のアルキル基 が挙げられ、アルコキシカルボニル基としては、メトキシカルボニル基、エトキシカルボ ニル基等が挙げられる。 In the general formula (2), the alkyl group represented by R 4 or R 5 is a carbon number such as a methyl group, an ethyl group, a propynole group, a hexyl group, a cyclohexyl group, or a lauryl group. Examples of the alkylcarbonyl group include a methoxycarbonyl group and an ethoxycarbonyl group.

[0090] 構造単位 (b)は、上述の置換基を有するビュル単量体を重合成分として用いること により導入すること力 Sできる。このようなビエル単量体の例としては、メチルビニルエー テノレ、ェチノレビニノレエーテノレ、 n—プロピノレビニノレエーテノレ、イソプロピノレビニノレエ一 テル、 n—ブチルビニルエーテル、イソブチルビュルエーテル、 tert ブチルビュル エーテノレ、 n—ペンチノレビニノレエーテノレ、 n_へキシノレビニノレエーテノレ、 n—ォクチ ノレビニノレエーテノレ、 n—ドデシノレビニノレエーテノレ、 2—ェチノレへキシノレビニノレエーテ ノレ、シクロへキシルビュルエーテル等のアルキルビュルエーテノレもしくはシクロアル キルビュルエーテル類;ェチルァリルエーテル、ブチルァリルエーテル等のァリルェ 一テル類;酢酸ビニル、プロピオン酸ビュル、酪酸ビニル、ビバリン酸ビュル、力プロ ン酸ビュル、バーサチック酸ビュル、ステアリン酸ビュル等のカルボン酸ビュルエステ ル類;メチル (メタ)アタリレート、ェチル (メタ)アタリレート、 n—ブチル (メタ)アタリレー ト、イソブチル (メタ)アタリレート、 2—メトキシェチル (メタ)アタリレート、 2—エトキシェ チル (メタ)アタリレート、 2- (n—プロボキシ)ェチル (メタ)アタリレート等の(メタ)ァク リル酸エステル類;(メタ)アクリル酸、クロトン酸、マレイン酸、フマル酸、ィタコン酸等 の不飽和カルボン酸類等の一種単独又は二種以上の組み合わせが挙げられる。 [0090] The structural unit (b) can be introduced by using the above-mentioned butyl monomer having a substituent as a polymerization component. Examples of such Biel monomers include methyl vinyl ethere, ethino levinino le ethere, n- propino levinino ethere, isopropino levinino ether, n-butyl vinyl ether, isobutyl butyl ether, tert butyl butyl etherenore, n-pentinolevinoreethenore, n_hexinorevininoreethenore, n- octinorevininoreethenore, n- dodecinorevininoreethenore, 2-ethinorehexinorevininoreate nore Alkyl butyl etherols such as cyclohexyl butyl ether or cycloalkyl butyl ethers; aralkyl ethers such as ethyl allyl ether, butyl allyl ether; vinyl acetate, butyl propionate, vinyl butyrate, butyl valerate, Power Pro Acid Bull, Versatic Acid Carboxylic acid bull esthetics such as bull and stearic acid bull Methyl (meth) acrylate, ethyl (meth) acrylate, n -butyl (meth) acrylate, isobutyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-ethoxy ethyl (meth) acrylate (Meth) acrylic acid esters such as 2- (n-propoxy) ethyl (meth) acrylate; unsaturated carboxylic acids such as (meth) acrylic acid, crotonic acid, maleic acid, fumaric acid, itaconic acid Or a combination of two or more.

[0091] 尚、構造単位 (b)の含有率は、水酸基含有含フッ素重合体 (B— 2)の全体量を 10 0モノレ0 /0としたときに、 10〜70モル0 /0である。この理由は、含有率が 10モル0 /0未満 になると、水酸基含有含フッ素重合体 (B— 2)の有機溶剤への溶解性が低下する場 合があるためであり、一方、含有率が 70モル%を超えると、水酸基含有含フッ素重合 体 (B— 2)の透明性、及び低反射率性等の光学特性が低下する場合があるためであ る。また、このような理由により、構造単位 (b)の含有率を、水酸基含有含フッ素重合 体(B— 2)の全体量に対して、 20〜60モノレ0 /0とするの力より好ましく、 30〜60モノレ %とするのがさらに好ましい。 [0091] The content of the structural unit (b), the total amount of the hydroxyl group-containing fluoropolymer (B- 2) is taken as 10 0 Monore 0/0, is 10 to 70 mole 0/0 . This is because if the content is less than 10 mole 0/0, is because there are cases in which the hydroxyl group-containing fluoropolymer solubility in organic solvents (B- 2) is decreased, whereas, the content of This is because if it exceeds 70 mol%, the optical properties such as transparency and low reflectivity of the hydroxyl group-containing fluoropolymer (B-2) may deteriorate. Moreover, such a reason, the content of the structural units (b), with respect to the total weight of the hydroxyl group-containing fluoropolymer (B- 2), preferably from force of 20 to 60 Monore 0/0, More preferably, it is 30-60 monole%.

[0092] 構造単位(c)  [0092] Structural unit (c)

構造単位 (c)は、下記一般式(3)で表される。  The structural unit (c) is represented by the following general formula (3).

[化 13]  [Chemical 13]

H R6 HR 6

— C— C—— (3)  — C— C—— (3)

H (CH2)vOR7 H (CH 2 ) v OR 7

[式中、 R6は水素原子、又はメチル基を、 R7は水素原子、又はヒドロキシアルキル基 を、 Vは 0又は 1の数を示す] [Wherein R 6 represents a hydrogen atom or a methyl group, R 7 represents a hydrogen atom or a hydroxyalkyl group, and V represents a number of 0 or 1]

[0093] 一般式(3)において、 R7のヒドロキシアルキル基としては、 2—ヒドロキシェチル基、 2—ヒドロキシプロピル基、 3—ヒドロキシプロピル基、 4—ヒドロキシブチル基、 3—ヒド ロキシブチル基、 5—ヒドロキシペンチル基、 6—ヒドロキシへキシル基が挙げられる。 [0093] In the general formula (3), as the hydroxyalkyl group of R 7 , 2-hydroxyethyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 4-hydroxybutyl group, 3-hydroxybutyl group, Examples include 5-hydroxypentyl group and 6-hydroxyhexyl group.

[0094] 構造単位(c)は、水酸基含有ビニル単量体を重合成分として用いることにより導入 すること力 Sできる。このような水酸基含有ビュル単量体の例としては、 2—ヒドロキシェ チノレビニノレエーテノレ、 3—ヒドロキシプロピノレビニノレエーテノレ、 2—ヒドロキシプロピノレ ビニノレエーテノレ、 4—ヒドロキシブチノレビニノレエーテノレ、 3—ヒドロキシブチノレビ二ノレ エーテル、 5—ヒドロキシペンチルビニルエーテル、 6—ヒドロキシへキシルビニルェ 一テル等の水酸基含有ビニルエーテル類、 2—ヒドロキシェチルァリルエーテル、 4 ーヒドロキシブチルァリルエーテル、グリセロールモノアリルエーテル等の水酸基含有 ァリルエーテル類、ァリルアルコール等が挙げられる。また、水酸基含有ビュル単量 体としては、上記以外にも、 2—ヒドロキシェチル (メタ)アタリレート、 2—ヒドロキシブ チル (メタ)アタリレート、 2—ヒドロキシプロピル (メタ)アタリレート、力プロラタトン (メタ) アタリレート、ポリプロピレングリコール (メタ)アタリレート等を用いることができる。 [0094] The structural unit (c) can be introduced by using a hydroxyl group-containing vinyl monomer as a polymerization component. Examples of such hydroxyl-containing bur monomers include 2-hydroxyethylenovininoleetenore, 3-hydroxypropinorevininoleetenore, 2-hydroxypropinorevininoleetenore, 4-hydroxybutinolebi Ninoreetenore, 3-hydroxybutinorebininore Hydroxyl-containing vinyl ethers such as ether, 5-hydroxypentyl vinyl ether, 6-hydroxyhexyl vinyl ether, hydroxyl-containing vinyl ethers such as 2-hydroxyethyl aryl ether, 4-hydroxybutyl aryl ether, glycerol monoallyl ether, And aryl alcohol. In addition to the above, the hydroxyl group-containing butyl monomer includes 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and force prolatatone. (Meth) acrylate, polypropylene glycol (meth) acrylate, etc. can be used.

[0095] 尚、構造単位(c)の含有率を、水酸基含有含フッ素重合体 (B— 2)の全体量を 100 モル%としたときに、 5〜70モル%とすることが好ましレ、。この理由は、含有率が 5モ ル%未満になると、水酸基含有含フッ素重合体 (B— 2)の有機溶剤への溶解性が低 下する場合があるためであり、一方、含有率が 70モル%を超えると、水酸基含有含フ ッ素重合体 (B— 2)の透明性、及び低反射率性等の光学特性が低下する場合があ るためである。また、このような理由により、構造単位 (c)の含有率を、水酸基含有含 フッ素重合体(B— 2)の全体量に対して、 5〜40モル0 /0とするの力 Sより好ましく、 5〜3 0モル0 /0とするのがさらに好ましい。 [0095] The content of the structural unit (c) is preferably 5 to 70 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. ,. The reason for this is that when the content is less than 5 mol%, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent may decrease, while the content is 70%. This is because if it exceeds mol%, the optical properties such as transparency and low reflectivity of the hydroxyl group-containing fluoropolymer (B-2) may deteriorate. Moreover, this reason, the content of the structural unit (c), relative to the total weight of the hydroxyl group-containing fluoropolymer (B- 2), preferably from the force S 5 to 40 mole 0/0 , further preferably set to 5 to 3 0 mol 0/0.

[0096] 構造単位 (d)及び構造単位 (e)  [0096] Structural unit (d) and structural unit (e)

また、水酸基含有含フッ素重合体 (B— 2)は、さらに下記構造単位 (d)を含んで構 成することも好ましい。以下、構造単位 (d)について説明する。  The hydroxyl group-containing fluoropolymer (B-2) preferably further comprises the following structural unit (d). Hereinafter, the structural unit (d) will be described.

構造単位 (d)は、下記一般式 (4)で表される。  The structural unit (d) is represented by the following general formula (4).

[化 14]  [Chemical 14]

R8 R 8

— Si— 0— (4) — Si— 0— ( 4 )

R9 R 9

[式中、 R8及び R9は、同一でも異なっていてもよぐ水素原子、アルキル基、ハロゲン 化アルキル基、又はァリール基を示す] [Wherein R 8 and R 9 may be the same or different and each represents a hydrogen atom, an alkyl group, a halogenated alkyl group, or an aryl group]

[0097] 一般式(4)におレ、て、 R8又は R9のアルキル基としては、メチノレ基、ェチル基、プロ ピル基等の炭素数 1〜3のアルキル基力 ハロゲン化アルキル基としてはトリフルォロ メチル基、パーフルォロェチル基、パーフルォロプロピル基、パーフルォロブチル基 等の炭素数 1〜4のフルォロアルキル基等力 S、ァリール基としてはフエニル基、ベンジ ル基、ナフチル基等がそれぞれ挙げられる。 [0097] In the general formula (4), the alkyl group represented by R 8 or R 9 is an alkyl group having 1 to 3 carbon atoms, such as a methinore group, an ethyl group, or a propyl group. Is trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluorobutyl group Examples of C1-4 fluoroalkyl group isotopes S and aryl groups include phenyl group, benzyl group, naphthyl group and the like.

[0098] 構造単位(d)は、前記一般式 (4)で表されるポリシロキサンセグメントを有するァゾ 基含有ポリシロキサン化合物を用いることにより導入することができる。このようなァゾ 基含有ポリシロキサン化合物の例としては、下記一般式(7)で表される化合物が挙げ られる。 The structural unit (d) can be introduced by using an azo group-containing polysiloxane compound having a polysiloxane segment represented by the general formula (4). Examples of such azo group-containing polysiloxane compounds include compounds represented by the following general formula (7).

[0099] [化 15]

Figure imgf000034_0001
[0099] [Chemical 15]
Figure imgf000034_0001

(7)  (7)

[式中、 R1Q〜R13、 R"〜R17、 p、 q、 s、 t、及び yは、上記一般式(5)と同じであり、 zは :!〜 20の数である。 ] [Wherein, R 1Q to R 13 , R ″ to R 17 , p, q, s, t, and y are the same as those in the general formula (5), and z is a number of! ]

[0100] 一般式(7)で表される化合物を用いた場合には、構造単位(d)は、下記構造単位( e)の一部として水酸基含有含フッ素重合体に含まれる。  [0100] When the compound represented by the general formula (7) is used, the structural unit (d) is included in the hydroxyl group-containing fluoropolymer as a part of the following structural unit (e).

構造単位 (e)は、下記一般式(5)で表される。  The structural unit (e) is represented by the following general formula (5).

[化 16]  [Chemical 16]

{5)

Figure imgf000034_0002
{ 5)
Figure imgf000034_0002

[式中、 R1Q〜R13は水素原子、アルキル基、又はシァノ基を示し、 R14〜R17 は水素原子又はアルキル基を示し、 P、 qは:!〜 6の数、 s、 tは 0〜6の数、 yは 1〜20[Wherein R 1Q to R 13 represent a hydrogen atom, an alkyl group, or a cyano group, R 14 to R 17 represent a hydrogen atom or an alkyl group, and P and q are the numbers:! To 6, s, t Is a number from 0 to 6, y is 1 to 20

0の数を示す。 ] Indicates the number 0. ]

[0101] 一般式(5)におレ、て、 R1()〜R13のアルキル基としては、メチノレ基、ェチル基、プロピ ル基、へキシル基、シクロへキシル基等の炭素数 1〜 12のアルキル基が挙げられ、 R M〜R17のアルキル基としてはメチル基、ェチル基、プロピル基等の炭素数 1〜3のァ ルキル基が挙げられる。 [0101] In general formula (5), the alkyl groups represented by R 1 () to R 13 have 1 carbon atom such as a methinole group, an ethyl group, a propyl group, a hexyl group, and a cyclohexyl group. And alkyl groups of RM to R 17 include alkyl groups having 1 to 3 carbon atoms such as a methyl group, an ethyl group, and a propyl group.

[0102] 本発明において、上記一般式(7)で表されるァゾ基含有ポリシロキサン化合物とし ては、下記一般式 (8)で表される化合物が特に好ましレ、。 [0102] In the present invention, the azo group-containing polysiloxane compound represented by the general formula (7) is used. In particular, a compound represented by the following general formula (8) is particularly preferred.

[0103] [化 17]

Figure imgf000035_0001
[0103] [Chemical 17]
Figure imgf000035_0001

(8)  (8)

[式中、 y及び zは、上記一般式(7)と同じである。 ]  [Wherein y and z are the same as those in the general formula (7). ]

[0104] 尚、構造単位(d)の含有率を、水酸基含有含フッ素重合体 (B— 2)の全体量を 100 モル%としたときに、 0. 1〜: 10モル%とすることが好ましレ、。この理由は、含有率が 0 . 1モル%未満になると、硬化後の塗膜の表面滑り性が低下し、塗膜の耐擦傷性が 低下する場合があるためであり、一方、含有率が 10モル%を超えると、水酸基含有 含フッ素重合体 (B_ 2)の透明性に劣り、コート材として使用する際に、塗布時にハ ジキ等が発生し易くなる場合があるためである。また、このような理由により、構造単 位(d)の含有率を、水酸基含有含フッ素重合体 (B— 2)の全体量に対して、 0. :!〜 5 モル%とするのがより好ましぐ 0. :!〜 3モル%とするのがさらに好ましい。同じ理由に より、構造単位(e)の含有率は、その中に含まれる構造単位(d)の含有率を上記範 囲にするよう決定することが望ましい。  [0104] The content of the structural unit (d) may be 0.1 to 10 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. I like it. The reason for this is that when the content is less than 0.1 mol%, the surface slipperiness of the cured coating film is lowered, and the scratch resistance of the coating film may be lowered. When the amount exceeds 10 mol%, the transparency of the hydroxyl group-containing fluoropolymer (B — 2) is inferior, and when used as a coating material, repelling and the like are likely to occur during coating. For this reason, the content of the structural unit (d) is more preferably set to 0.:! To 5 mol% with respect to the total amount of the hydroxyl group-containing fluoropolymer (B-2). Desirable 0: More preferably, it is set to 3 to 3 mol%. For the same reason, it is desirable that the content of the structural unit (e) is determined so that the content of the structural unit (d) contained therein falls within the above range.

[0105] 構造単位 (f)  [0105] Structural unit (f)

また、水酸基含有含フッ素重合体 (B— 2)は、さらに上記構造単位 (f)を含んで構 成することも好ましい。以下、構造単位 (f)について説明する。  The hydroxyl group-containing fluoropolymer (B-2) preferably further comprises the above structural unit (f). Hereinafter, the structural unit (f) will be described.

[0106] 構造単位 (f)は、下記一般式 (6)で表される。  [0106] The structural unit (f) is represented by the following general formula (6).

[化 18]  [Chemical 18]

Figure imgf000035_0002
Figure imgf000035_0002

[式中、 R18は乳化作用を有する基を示す] [Wherein R 18 represents an emulsifying group]

[0107] 一般式 (6)において、 R18の乳化作用を有する基としては、疎水性基及び親水性基 の双方を有し、かつ、親水性基がポリエチレンオキサイド、ポリプロピレンオキサイド等 のポリエーテル構造である基が好ましい。 [0107] In the general formula (6), the group having an emulsifying action for R 18 has both a hydrophobic group and a hydrophilic group, and the hydrophilic group is polyethylene oxide, polypropylene oxide, or the like. A group having a polyether structure is preferred.

[0108] このような乳化作用を有する基の例としては下記一般式(9)で表される基が挙げら れる。  [0108] Examples of the group having an emulsifying action include a group represented by the following general formula (9).

[0109] [化 19] [0109] [Chemical 19]

<9) < 9)

Figure imgf000036_0001
Figure imgf000036_0001

[式中、 nは 1〜20の数、 mは 0〜4の数、 uは 3〜50の数を示す]  [Where n is a number from 1 to 20, m is a number from 0 to 4, and u is a number from 3 to 50]

[0110] 構造単位 (f)は、反応性乳化剤を重合成分として用いることにより導入することがで きる。このような反応性乳化剤としては、下記一般式(10)で表される化合物が挙げら れる。 [0110] The structural unit (f) can be introduced by using a reactive emulsifier as a polymerization component. Examples of such reactive emulsifiers include compounds represented by the following general formula (10).

[0111] [化 20]

Figure imgf000036_0002
[0111] [Chemical 20]
Figure imgf000036_0002

[式中、 n、 m、及び uは、上記一般式(9)と同様である]  [Wherein, n, m, and u are the same as those in the general formula (9)]

[0112] 尚、構造単位 (f)の含有率を、水酸基含有含フッ素重合体 (B— 2)の全体量を 100 モル%としたときに、 0.:!〜 5モル0 /0とすることが好ましい。この理由は、含有率が 0· 1モル%以上になると、水酸基含有含フッ素重合体 (B— 2)の溶剤への溶解性が向 上し、一方、含有率力 モル%以内であれば、硬化性樹脂組成物の粘着性が過度に 増加せず、取り扱いが容易になり、コート材等に用いても耐湿性が低下しないためで ある。また、このような理由により、構造単位 (f)の含有率を、水酸基含有含フッ素重 合体(B— 2)の全体量に対して、 0.:!〜 3モル%とするのがより好ましぐ 0. 2〜3モ ル%とするのがさらに好ましい。 [0112] Incidentally, the content of the structural unit (f), the entire amount of the hydroxyl group-containing fluoropolymer (B- 2) is 100 mol%, and 0.:!~ 5 mole 0/0 It is preferable. The reason for this is that when the content rate is 0.1 mol% or more, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in the solvent is improved, while if the content rate is within mol%, This is because the adhesiveness of the curable resin composition does not increase excessively, handling becomes easy, and moisture resistance does not decrease even when used as a coating material. For these reasons, the content of the structural unit (f) is more preferably 0.:! To 3 mol% with respect to the total amount of the hydroxyl group-containing fluorine-containing polymer (B-2). More preferably, it is 0.2 to 3 mol%.

[0113] 水酸基含有含フッ素重合体 (B— 2)の分子量  [0113] Molecular weight of hydroxyl-containing fluoropolymer (B-2)

水酸基含有含フッ素重合体 (B_ 2)は、ゲルパーミエーシヨンクロマトグラフィー(以 下「GPC」という。)で、テトラヒドロフラン(以下「THF」という。)を溶剤として測定した ポリスチレン換算数平均分子量が 5, 000〜500, 000であることが好ましい。この理 由は、数平均分子量が 5, 000未満になると、水酸基含有含フッ素重合体 (B— 2)の 機械的強度が低下する場合があるためであり、一方、数平均分子量が 500, 000を 超えると、硬化性樹脂組成物の粘度が高くなり、薄膜コーティングが困難となる場合 がるためである。また、このような理由により、水酸基含有含フッ素重合体 (B— 2)の ポリスチレン換算数平均分子量を 10, 000〜300, 000とするの力より好ましく、 10, 000〜100, 000とするの力 Sさらに好ましレヽ。 The hydroxyl group-containing fluoropolymer (B_2) has a polystyrene-reduced number average molecular weight of 5 as measured by gel permeation chromatography (hereinafter referred to as “GPC”) using tetrahydrofuran (hereinafter referred to as “THF”) as a solvent. , 000 to 500,000. This reason The reason is that when the number average molecular weight is less than 5,000, the mechanical strength of the hydroxyl group-containing fluoropolymer (B-2) may decrease, while the number average molecular weight exceeds 500,000. This is because the viscosity of the curable resin composition becomes high and thin film coating may be difficult. For these reasons, the hydroxyl-containing fluoropolymer (B-2) has a polystyrene equivalent number average molecular weight of preferably 10,000 to 300,000, more preferably 10,000 to 100,000. Power S More preferred.

[0114] 化合物(B— 1)と水酸基含有フッ素重合体 (B— 2)との反応モル比 [0114] Reaction molar ratio of compound (B-1) to hydroxyl group-containing fluoropolymer (B-2)

本発明で用いるエチレン性不飽和基含有含フッ素重合体 (B)は、上述した、 1個の イソシァネート基と、少なくとも 1個のエチレン性不飽和基とを含有する化合物(B_ 1 )と、水酸基含有含フッ素重合体 (B— 2)とを、イソシァネート基 Z水酸基のモル比が 1.:!〜 1. 9の割合で反応させて得られることが好ましい。この理由は、モル比が 1. 1 未満になると耐擦傷性及び耐久性が低下する場合があるためであり、一方、モル比 が 1. 9を超えると、硬化性樹脂組成物の塗膜のアルカリ水溶液浸漬後の耐擦傷性が 低下する場合があるためである。また、このような理由により、イソシァネート基/水酸 基のモル比を、 1. 1〜: L 5とするのがより好ましぐ 1. 2〜1·5とするのがさらに好 ましい。  The ethylenically unsaturated group-containing fluoropolymer (B) used in the present invention comprises the above-described compound (B_ 1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group. It is preferably obtained by reacting the fluorine-containing polymer (B-2) with a molar ratio of isocyanate group Z hydroxyl group of 1.:! To 1.9. The reason for this is that if the molar ratio is less than 1.1, the scratch resistance and durability may be lowered. On the other hand, if the molar ratio exceeds 1.9, the coating film of the curable resin composition may be deteriorated. This is because the scratch resistance after immersion in an alkaline aqueous solution may be reduced. For this reason, it is more preferable to set the molar ratio of isocyanate group / hydroxyl group to 1.1 to L5, more preferably 1.2 to 1.5.

[0115] 硬化性樹脂組成物中における(Β)エチレン性不飽和基含有含フッ素重合体の含 有量は、有機溶剤を除く組成物全量 100質量%に対して、通常 3〜 70質量%である 。この理由は、含有量が 3質量%未満となると、硬化性樹脂組成物の硬化塗膜の屈 折率が高くなり、十分な反射防止効果が得られない場合があるためであり、一方、添 加量が 70質量%を超えると、硬化性樹脂組成物の硬化塗膜の耐擦傷性が得られな い場合があるためである。また、このような理由力 、(Β)成分の添加量を 10〜50質 量%とするのがより好ましぐ 25〜50質量%の範囲内の値とするのがさらに好ましい  [0115] The content of (i) the ethylenically unsaturated group-containing fluoropolymer in the curable resin composition is usually 3 to 70% by mass with respect to 100% by mass of the total composition excluding the organic solvent. is there . The reason for this is that when the content is less than 3% by mass, the refractive index of the cured coating film of the curable resin composition increases, and a sufficient antireflection effect may not be obtained. This is because if the added amount exceeds 70% by mass, the scratch resistance of the cured coating film of the curable resin composition may not be obtained. In addition, it is more preferable to set the addition amount of the component (ii) to 10 to 50% by mass, and more preferably to a value within the range of 25 to 50% by mass.

[0116] (C)速揮発溶剤 [0116] (C) Fast volatile solvent

硬化性樹脂組成物に含まれる(C)速揮発溶剤は、上記 (Β)エチレン性不飽和基含 有含フッ素重合体の溶解性が高レ、 1種又は 2種以上の溶剤である。ここで、エチレン 性不飽和基含有含フッ素重合体の溶解性が高いとは、 (Β)エチレン性不飽和基含 有含フッ素重合体を 50質量%となるよう各溶剤に添加して、室温 8時間攪拌したとき に、 目視で均一な溶液となることをいう。そして、 (C)速揮発溶剤の相対蒸発速度は 、後述の(D)遅揮発溶剤の相対蒸発速度よりも大きいことが必要である。ここで、「相 対蒸発速度」とは、酢酸ブチルが 90重量%蒸発するのに要する時間を基準とする蒸 発速度の相対値をレ、い、詳細は、 TECHNIQUES OF CHEMISTRY VOL.2 ORG ANIC SOLVENTS Physical Properties and methods of purification 4th ed. (I nterscience Publishers, Inc. 1986 page62)に記載されているとおりである。また、( C)速揮発溶剤は、上記 (A1)及び (A2)の金属酸化物粒子(金属酸化物粒子成分( A) )の分散安定性が低レ、ことが好ましい。 (C)速揮発溶剤は、相対蒸発速度が (D) よりも大きぐ(B)エチレン性不飽和基含有含フッ素重合体の溶解性が高いことにより 、硬化性樹脂組成物を、基材に塗布し、溶剤(C)及び (D)を蒸発させる過程で、(AThe (C) fast volatile solvent contained in the curable resin composition is one or two or more kinds of solvents which have high solubility of the above-mentioned (ii) ethylenically unsaturated group-containing fluoropolymer. Here, the high solubility of the ethylenically unsaturated group-containing fluoropolymer means that (i) the ethylenically unsaturated group-containing fluoropolymer is When a fluoropolymer is added to each solvent so as to be 50% by mass and stirred at room temperature for 8 hours, it means that the solution becomes visually uniform. The relative evaporation rate of the (C) fast volatile solvent needs to be larger than the relative evaporation rate of the later-described (D) slow volatile solvent. Here, the “relative evaporation rate” is the relative value of the evaporation rate based on the time required for 90% by weight of butyl acetate to evaporate. For details, see TECHNIQUES OF CHEMISTRY VOL.2 ORG ANIC. SOLVENTS Physical Properties and methods of purification 4th ed. (Interscience Publishers, Inc. 1986 page 62). The (C) fast volatile solvent preferably has low dispersion stability of the metal oxide particles (metal oxide particle component (A)) of (A1) and (A2). (C) The fast volatile solvent has a relative evaporation rate higher than that of (D), and (B) the high solubility of the fluorine-containing polymer containing ethylenically unsaturated groups allows the curable resin composition to be used as a base material. In the process of applying and evaporating the solvents (C) and (D), (A

1)及び (A2)の金属酸化物粒子を偏在化させることができる。さらに、 (A1)及び (AThe metal oxide particles 1) and (A2) can be unevenly distributed. In addition, (A1) and (A

2)の金属酸化物粒子の分散安定性が低いことにより、(A1)及び (A2)の金属酸化 物粒子の偏在化をより確実なものとすることができる。 Due to the low dispersion stability of the metal oxide particles of 2), the uneven distribution of the metal oxide particles of (A1) and (A2) can be made more reliable.

[0117] 本発明で (C)速揮発溶剤として用いることができる溶剤としては、相対蒸発速度が 概ね 1. 7以上の溶剤であり、具体的には、メチルェチルケトン (MEK ;相対蒸発速度 3. 8)、イソプロパノール (IPA; 1. 7)、メチルイソプチルケトン(MIBK ;相対蒸発速 度 1. 6)、メチルアミルケトン(ΜΑΚ ; 0· 3)、アセトン、メチルプロピルケトン等が挙げ られる。  [0117] The solvent that can be used as the (C) fast volatile solvent in the present invention is a solvent having a relative evaporation rate of about 1.7 or more, specifically, methyl ethyl ketone (MEK; relative evaporation rate). 3.8), isopropanol (IPA; 1.7), methylisoptyl ketone (MIBK; relative evaporation rate 1.6), methyl amyl ketone (ΜΑΚ; 0 · 3), acetone, methyl propyl ketone, etc. .

[0118] (D)遅揮発溶剤  [0118] (D) Slow volatile solvent

硬化性樹脂組成物に含まれる(D)遅揮発溶剤は、上記 (A1)及び (Α2)の金属酸 化物粒子の分散安定性が高レ、、 1種又は 2種以上の溶剤である。ここで、 (A1)及び (Α2)の金属酸化物粒子の分散安定性が高いとは、 (A1)及び (Α2)の金属酸化物 粒子のイソプロパノール分散液にガラス板を浸漬して (A1)及び (Α2)の金属酸化物 粒子をガラス壁に付着させ、その (A1)及び (Α2)の金属酸化物粒子が付着したガラ ス板を各溶剤に浸漬した場合に、 (A1)及び (Α2)の金属酸化物粒子が該溶剤中に 目視で均一に分散することをいう。また、 (D)遅揮発溶剤は、上記 (Β)エチレン性不 飽和基含有含フッ素重合体の溶解性が低レ、ことが好ましレ、。 [0119] 本発明で(D)遅揮発溶剤として用いることができる溶剤としては、メタノール (相対 蒸発速度 2· 1)、イソプロパノール(ΙΡΑ; 1 · 7)、 η—ブタノール(n—Bu〇H ; 0. 5)、 tert—ブタノール、プロピレングリコールモノメチルエーテル、プロピレングリコールモ ノエチノレエーテノレ、プロピレングリコーノレモノプロピノレエーテノレ、ェチノレセロソノレブ、 プロピルセロソルブ、ブチルセ口ソルブ等が挙げられる。 The (D) slow volatile solvent contained in the curable resin composition is one or two or more kinds of solvents that have high dispersion stability of the metal oxide particles (A1) and (Α2). Here, the high dispersion stability of the metal oxide particles (A1) and (Α2) means that the glass plate is immersed in an isopropanol dispersion of the metal oxide particles (A1) and (Α2) (A1) When (A1) and (粒子 2) are attached to the glass wall, and the glass plate to which the metal oxide particles (A1) and (Α2) are attached is immersed in each solvent. ) Is uniformly dispersed visually in the solvent. In addition, (D) the slow volatile solvent preferably has the low solubility of the above (ii) ethylenically unsaturated group-containing fluoropolymer. [0119] The solvent that can be used as the (D) slow volatile solvent in the present invention includes methanol (relative evaporation rate 2 · 1), isopropanol (ΙΡΑ; 1 · 7), η-butanol (n-BuOH; 0.5), tert-butanol, propylene glycol monomethyl ether, propylene glycol monoethylenoateolene, propyleneglycolmonopropinoleethenole, ethinorescerosolev, propylcellosolve, butylcetosolve and the like.

[0120] 本発明で用いる(C)速揮発溶剤及び Z又は (D)遅揮発溶剤は、通常、上記 (B)ェ チレン性不飽和基含有含フッ素重合体の製造に用いた溶剤をそのまま用いることが できる。  [0120] As the (C) fast volatile solvent and Z or (D) slow volatile solvent used in the present invention, the solvent used in the production of the (B) ethylenically unsaturated group-containing fluoropolymer is usually used as it is. be able to.

本発明で用いる(C)速揮発溶剤と(D)遅揮発溶剤は、相溶性であることが必要で ある。相溶性は、組成物の具体的構成において、(C)速揮発溶剤と(D)遅揮発溶剤 が分離しない程度の相溶性があれば足りる。  The (C) fast volatile solvent and (D) slow volatile solvent used in the present invention must be compatible. The compatibility is sufficient if the specific composition of the composition has such a degree of compatibility that (C) fast volatile solvent and (D) slow volatile solvent do not separate.

[0121] ここで、選択された溶剤が、本発明で用いる(C)速揮発溶剤又は (D)遅揮発溶剤 のいずれに該当するかは、選択された複数の溶剤種の間で相対的に決まるものであ り、それ故、相対蒸発速度が 1. 7のイソプロパノールは、(C)速揮発溶剤として用い られることもあれば、(D)遅揮発溶剤として用いられることもある。  [0121] Here, whether the selected solvent corresponds to (C) fast volatile solvent or (D) slow volatile solvent used in the present invention is relatively determined among a plurality of selected solvent types. Therefore, isopropanol with a relative evaporation rate of 1.7 may be used as either (C) a fast volatile solvent or (D) a slow volatile solvent.

[0122] 硬化性樹脂組成物中の溶剤((C)成分及び (D)成分を含む)以外の成分総量 100 質量部に対し、溶剤(C)及び溶剤(D)の合計量は、通常 300〜5000質量部、好ま しくは 300〜4000質量部、より好ましくは 300〜3000質量部を用いる。溶剤(C)と 溶剤 (D)の配合比は、 1: 99〜99: 1の範囲で任意に選択することができる。  [0122] The total amount of the solvent (C) and the solvent (D) is usually 300 parts by mass with respect to 100 parts by mass of the components other than the solvent (including the components (C) and (D)) in the curable resin composition. To 5000 parts by mass, preferably 300 to 4000 parts by mass, more preferably 300 to 3000 parts by mass. The mixing ratio of the solvent (C) and the solvent (D) can be arbitrarily selected within the range of 1:99 to 99: 1.

[0123] (E)少なくとも 2個以上の(メタ)アタリロイル基を含有する多官能 (メタ)アタリレートイ匕 合物、及び/又は、少なくとも 1個以上の(メタ)アタリロイル基を含有する含フッ素 (メ タ)アタリレートイ匕合物  [0123] (E) a polyfunctional (meth) ateryl toy compound containing at least two or more (meth) attalyloyl groups, and / or a fluorine-containing product containing at least one or more (meth) attalyloyl groups (Metal) Atre relay toy compound

少なくとも 2個以上の(メタ)アタリロイル基を含有する多官能 (メタ)アタリレートイ匕合 物(E— 1)は、硬化性樹脂組成物を硬化して得られる硬化物及びそれを用いた反射 防止膜の耐擦傷性を高めるために用いることができる。  A polyfunctional (meth) attareito toy compound (E-1) containing at least two (meth) attaroyl groups is a cured product obtained by curing a curable resin composition and a reflection using the same. It can be used to increase the scratch resistance of the protective film.

少なくとも 1個以上の(メタ)アタリロイル基を含有する含フッ素 (メタ)アタリレートイ匕合 物(E_ 2)は、硬化性樹脂組成物の屈折率を低下させるために用いられる。  The fluorine-containing (meth) ataretoy compound (E_2) containing at least one (meth) ataryloyl group is used to lower the refractive index of the curable resin composition.

[0124] 化合物(E—1)については、分子内に少なくとも 2個以上の(メタ)アタリロイル基を 含有する化合物であれば特に制限されるものではない。このような例としては、ネオ ペンチルグリコールジ(メタ)アタリレート、トリメチロールプロパントリ(メタ)アタリレート、 ペンタエリスリトールトリ(メタ)アタリレート、トリメチロールェタントリ(メタ)アタリレート、 ペンタエリスリトールテトラ(メタ)アタリレート、ジペンタエリスリトールテトラ(メタ)アタリ レート、アルキル変性ジペンタエリスリトールテトラ(メタ)アタリレート、ジペンタエリスリ トールペンタ(メタ)アタリレート、アルキル変性ジペンタエリスリトールペンタ(メタ)ァク リレート、ジペンタエリスリトールへキサ(メタ)アタリレート、力プロラタトン変性ジペンタ エリスリトールへキサ(メタ)アタリレート、ジトリメチロールプロパンテトラ(メタ)アタリレ ート、「U_ 15HA」(商品名、新中村化学社製)の他、下記式(11)で示される化合 物等の一種単独又は二種以上の組み合わせが挙げられる。尚、これらのうち、ネオ ペンチルグリコールジ(メタ)アタリレート、ジペンタエリスリトールへキサ(メタ)アタリレ ート、ペンタエリスリトールテトラ(メタ)アタリレート、ジペンタエリスリトールペンタ(メタ) アタリレート及び力プロラタトン変性ジペンタエリスリトールへキサ(メタ)アタリレート、 下記式(11)で示される化合物が特に好ましレ、。 [0124] With regard to compound (E-1), at least two (meth) atalyloyl groups are present in the molecule. If it is a compound to contain, it will not restrict | limit in particular. Examples include neopentyl glycol di (meth) acrylate, trimethylol propane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, trimethylol ethane tri (meth) acrylate, penta erythritol tetra (Meth) acrylate, dipentaerythritol tetra (meth) acrylate, alkyl-modified dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, alkyl-modified dipentaerythritol penta (meth) acrylate, Dipentaerythritol hexa (meth) acrylate, force prolatatatone modified dipenta erythritol hex (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, “U_ 15HA” ( Name, manufactured by Shin-Nakamura Chemical Co., Ltd.) Other include alone or in combinations of two or more such compounds represented by the following formula (11). Of these, neopentyl glycol di (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate and force prolatathone modification Dipentaerythritol hexa (meth) acrylate, a compound represented by the following formula (11) is particularly preferred.

[化 21]  [Chemical 21]

Figure imgf000040_0001
Figure imgf000040_0001

[式中、「Acryl」は、アタリロイル基である。 ] [In the formula, “Acryl” is an taliloyl group. ]

[0125] 化合物(E— 2)については、少なくとも 1個以上の(メタ)アタリロイル基を含有する含 フッ素(メタ)アタリレートイ匕合物であれば特に制限されるものではなレ、。このような例と して、パーフルォロォクチルェチル(メタ)アタリレート、ォクタフルォロペンチル(メタ) アタリレート、トリフルォロェチル (メタ)アタリレート、等の一種単独又は二種以上の組 み合わせが挙げられる。 [0125] The compound (E-2) is not particularly limited as long as it is a fluorine-containing (meth) ataretoy compound containing at least one (meth) ataryloyl group. Examples thereof include perfluorooctylethyl (meth) acrylate, octafluoropentyl (meth) acrylate, trifluoroethyl (meth) acrylate, and the like alone or in combination. The combination of the above is mentioned.

[0126] 硬化性樹脂組成物中における成分 (E)の含有量については、特に制限されるもの ではないが、有機溶剤を除く組成物全量 100質量%に対して、通常 3〜80質量%で ある。この理由は、添加量が 3質量%未満となると、硬化性樹脂組成物の硬化塗膜の 耐擦傷性が得られない場合があるためであり、一方、添加量が 80質量%を超えると、 硬化性樹脂組成物の硬化塗膜の屈折率が高くなり、十分な反射防止効果が得られ ない場合があるためである。また、このような理由から、成分 (E)の添加量を 5〜70質 量%とするのがより好ましぐ 5〜50質量%の範囲内の値とするのがさらに好ましい。 [0126] The content of component (E) in the curable resin composition is not particularly limited, but is usually 3 to 80% by mass with respect to 100% by mass of the total composition excluding the organic solvent. is there. The reason for this is that if the addition amount is less than 3% by mass, the scratch resistance of the cured coating film of the curable resin composition may not be obtained, while if the addition amount exceeds 80% by mass, This is because the refractive index of the cured coating film of the curable resin composition becomes high and a sufficient antireflection effect may not be obtained. For this reason, it is more preferable to set the added amount of component (E) to a value in the range of 5 to 50% by mass, more preferably 5 to 70% by mass.

[0127] (F)光ラジカル重合開始剤 [0127] (F) Photoradical polymerization initiator

硬化性樹脂組成物においては、必要に応じて、放射線(光)照射により活性ラジカ ル種を発生させる (F)光ラジカル重合開始剤 (放射線 (光)重合開始剤)を配合する こと力 Sできる。  In the curable resin composition, if necessary, it is possible to add (F) a radical photopolymerization initiator (radiation (photo) polymerization initiator) that generates active radical species by radiation (light) irradiation. .

[0128] 放射線 (光)重合開始剤としては、光照射により分解してラジカルを発生して重合を 開始せしめるものであれば特に制限はなぐ例えば、ァセトフヱノン、ァセトフヱノンべ ンジルケタール、 1—ヒドロキシシクロへキシルフェニルケトン、 2, 2—ジメトキシ一 1, 2—ジフエニルェタン一 1—オン、キサントン、フルォレノン、ベンズアルデヒド、フルォ レン、アントラキノン、トリフエニルァミン、カルバゾール、 3—メチルァセトフエノン、 4 クロ口べンゾフエノン、 4, 4'ージメトキシベンゾフエノン、 4, 4'ージァミノべンゾフエノ ン、ベンゾインプロピルエーテル、ベンゾインェチルエーテル、ベンジルジメチルケタ ール、 1— (4—イソプロピルフエ二ル)一 2—ヒドロキシ一 2—メチルプロパン一 1—ォ ン、 2—ヒドロキシー2—メチルー 1 フエニルプロパンー1 オン、チォキサントン、ジ ェチルチオキサントン、 2—イソプロピルチォキサントン、 2—クロ口チォキサントン、 2 —メチノレ一 1 [4— (メチルチオ)フエニル]— 2—モルホリノ一プロパン一 1—オン、 2 —ベンジル 2—ジメチルァミノ一 1 (4—モルフォリノフエ二ル)一ブタノン一 1 , 4— (2 ヒドロキシエトキシ)フエニル一(2 ヒドロキシ一 2 プロピル)ケトン、 2, 4, 6 ト リメチルベンゾィルジフヱニルフォスフィンオキサイド、ビス _ (2, 6—ジメトキシベンゾ ィノレ)一 2, 4, 4 トリメチルペンチルフォスフィンォキシド、オリゴ(2 ヒドロキシ一 2 —メチル一 1 _ (4— (1 _メチルビュル)フエニル)プロパノン)等を挙げることができる  [0128] The radiation (photo) polymerization initiator is not particularly limited as long as it can be decomposed by light irradiation to generate radicals to initiate polymerization. For example, acetophenone, acetophenone benzil ketal, 1-hydroxycyclohexyl. Phenyl ketone, 2,2-dimethoxy-1,1,2-diphenylethane 1-one, xanthone, fluorenone, benzaldehyde, fluorene, anthraquinone, triphenylamine, carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4, 4'-dimethoxybenzophenone, 4, 4'-diaminobenzophenone, benzoin propyl ether, benzoin ethyl ether, benzyl dimethyl ketal, 1- (4-isopropylphenyl) 1 2-hydroxy 1 2 —Methylpropane-1-one, 2-hydroxy-2-methyl 1- (4- (methylthio) phenyl) -2-morpholinopropane 1 1—Tiluone 1-phenylpropane 1-one, thixanthone, dimethylthioxanthone, 2-isopropylthixanthone, 2-chlorothixanthone, 2 —methylolone ON, 2—Benzyl 2-dimethylamino 1 1 (4-morpholinophenyl) 1 Butanone 1 1, 4 — (2 Hydroxyethoxy) phenyl 1 (2 hydroxy 1 2 propyl) ketone, 2, 4, 6 Trimethyl Benzyldiphenylphosphine oxide, bis _ (2, 6-dimethoxybenzoinole) -1, 2, 4, 4 Trimethylpentylphosphine oxide, oligo (2 hydroxy-1- 2-methyl-1- 1 _ (4— (1 _Methylbule) phenyl) propanone)

[0129] 放射線 (光)重合開始剤の市販品としては、例えば、チバ'スペシャルティ'ケミカル ズ(株)製 商品名:イノレガキュア 184, 369, 651, 500、 819, 907, 784, 2959, CGI1700、 CGI1750、 CGI1850、 CG24— 61、ダロキュア 1116、 1173、 BAS F社製 商品名:ルシリン TPO、UCB社製 商品名:ュべクリル P36、フラテツリ' ランべルティ社製 商品名:ェザキュア一 KIP150、 KIP65LT、 KIP100F、 KT37 、 KT55、 ΚΤ〇46、 ΚΙΡ75/Β等を挙げることができる。 [0129] Commercially available radiation (photo) polymerization initiators include, for example, Ciba 'Specialty' Chemicals Co., Ltd. trade names: Inoregacure 184, 369, 651, 500, 819, 907, 784, 2959, CGI1700, CGI1750, CGI1850, CG24-61, Darocur 1116, 1173, manufactured by BAS F Product name: Lucirin TPO, manufactured by UCB Product name: Nubekril P36, Fratelli 'manufactured by Lamberti Company Name: Ezacure KIP150, KIP65LT, KIP100F, KT37, KT55, ΚΤ046, ΚΙΡ75 / Β etc.

[0130] 本発明において必要に応じて用いられる光ラジカル重合開始剤(F)の配合量は、 有機溶剤を除く組成物全量を 100質量%として、 0. 01〜: 10質量%配合することが 好ましぐ 0. 1〜: 10質量%が、さらに好ましい。 0. 01質量%未満であると、硬化物と したときの硬度が不十分となることがあり、 10質量%を超えると、硬化物としたときに 内部(下層)まで硬化しないことがある。  [0130] The amount of the radical photopolymerization initiator (F) used as necessary in the present invention may be 0.01 to 10% by mass, with the total amount of the composition excluding the organic solvent being 100% by mass. Preferred 0.1 to 10% by mass is more preferred. If the content is less than 0.01% by mass, the hardness of the cured product may be insufficient, and if it exceeds 10% by mass, the cured product may not be cured to the inside (lower layer).

[0131] (G)その他の成分  [0131] (G) Other ingredients

硬化性組成物には、本発明の効果を損なわない限り、必要に応じて、光増感剤、 重合禁止剤、重合開始助剤、レべリング剤、濡れ性改良剤、界面活性剤、可塑剤、 吸収剤、酸化防止剤、帯電防止剤、無機充填剤、顔料、染料、溶剤 (C)及び (D)以 外の溶剤等を適宜配合できる。  In the curable composition, as long as the effects of the present invention are not impaired, a photosensitizer, a polymerization inhibitor, a polymerization initiation assistant, a leveling agent, a wettability improver, a surfactant, a plasticizer are used as necessary. An agent, an absorbent, an antioxidant, an antistatic agent, an inorganic filler, a pigment, a dye, a solvent other than the solvents (C) and (D), and the like can be appropriately blended.

[0132] 2.硬化性樹脂組成物の製造方法  [0132] 2. Method for producing curable resin composition

本発明の硬化性樹脂組成物は、次のようにして製造する。  The curable resin composition of the present invention is produced as follows.

2種類の金属酸化物粒子 (A1)及び (Α2)の分散液及びエチレン性不飽和基含有 フッ素重合体((B)成分)、必要に応じて、多官能 (メタ)アタリレート((E)成分)、放射 線 (光)重合開始剤 ( (F)成分)等を攪拌機付きの反応容器に入れ 35°C〜45°Cで 2 時間攪拌し硬化性樹脂組成物とする。  Dispersion of two types of metal oxide particles (A1) and (Α2) and ethylenically unsaturated group-containing fluoropolymer (component (B)), if necessary, polyfunctional (meth) acrylate ((E) Component), radiation (light) polymerization initiator (component (F)), etc. are placed in a reaction vessel equipped with a stirrer and stirred at 35 ° C. to 45 ° C. for 2 hours to obtain a curable resin composition.

溶剤を最初の反応性粒子分散液に使用した溶剤 ( a )と異なる種類の溶剤 ( β )に 置換する場合は、反応性粒子分散液の溶剤( a )の質量に対して 1. 0倍の溶剤 ( β ) も加え同様の条件で攪拌する。次にこの組成液を、ロータリーエバポレーターを用い て固形分濃度 50%となる質量まで減圧濃縮し組成物とする。  When replacing the solvent with a different type of solvent (β) from the solvent (a) used in the first reactive particle dispersion, it is 1.0 times the mass of the solvent (a) in the reactive particle dispersion. Add solvent (β) and stir under the same conditions. Next, this composition solution is concentrated under reduced pressure to a mass of 50% solid content using a rotary evaporator to obtain a composition.

[0133] 3.硬化性樹脂組成物の塗布(コーティング)方法 [0133] 3. Method of applying (coating) curable resin composition

本発明の硬化性樹脂組成物は反射防止膜や被覆材の用途に好適であり、反射防 止や被覆の対象となる基材としては、例えば、プラスチック(ポリカーボネート、ポリメタ タリレート、ポリスチレン、ポリエステル、ポリオレフイン、エポキシ、メラミン、トリァセチ ルセルロース、 ABS、 AS、ノルボルネン系樹脂等)、金属、木材、紙、ガラス、スレー ト等を挙げることができる。これら基材の形状は板状、フィルム状又は 3次元成形体で もよぐコーティング方法は、通常のコーティング方法、例えばデイツビングコート、ス プレーコート、フローコート、シャワーコート、ローノレコート、スピンコート、刷毛塗り等を 挙げること力 sできる。これらのコーティングによる塗膜の厚さは、乾燥、硬化後、通常 0 .:!〜 400 x mであり、好ましくは、:!〜 200 μ πιである。 The curable resin composition of the present invention is suitable for use as an antireflection film or a coating material. Examples of the base material to be antireflection or coated include plastics (polycarbonate, polymethacrylate, polystyrene, polyester, polyolefin). , Epoxy, melamine, triaceti Cellulose, ABS, AS, norbornene resin, etc.), metal, wood, paper, glass, and slate. These base materials may be plate-like, film-like or three-dimensionally formed by a usual coating method such as date coating, spray coating, flow coating, shower coating, ronore coating, spin coating, brush. The ability to raise paints etc. The thickness of the coating film by these coatings is usually from 0.:! To 400 xm after drying and curing, and preferably from :! to 200 μπι.

[0134] 4.硬化性樹脂組成物の硬化方法  [0134] 4. Curing method of curable resin composition

本発明の硬化性樹脂組成物は、放射線 (光)によって硬化させることができる。その 線源としては、組成物をコーティング後短時間で硬化させることができるものである限 り特に制限はなレ、が、例えば、赤外線の線源として、ランプ、抵抗加熱板、レーザー 等を、また可視光線の線源として、 日光、ランプ、蛍光灯、レーザー等を、また紫外線 の線源として、水銀ランプ、ノ、ライドランプ、レーザー等を、また電子線の線源として、 市販されているタングステンフィラメントから発生する熱電子を利用する方式、金属に 高電圧パルスを通じて発生させる冷陰極方式及びイオン化したガス状分子と金属電 極との衝突により発生する 2次電子を利用する 2次電子方式を挙げることができる。ま た、アルファ線、ベータ線及びガンマ線の線源として、例えば、 6°Co等の核分裂物質 を挙げることができ、ガンマ線にっレ、ては加速電子を陽極へ衝突させる真空管等を 利用することができる。これら放射線は 1種単独で又は 2種以上を同時に又は一定期 間をおいて照射することができる。尚、本発明の硬化性樹脂組成物は、紫外線硬化 性であることが好ましい。 The curable resin composition of the present invention can be cured by radiation (light). The radiation source is not particularly limited as long as the composition can be cured in a short time after coating. For example, as an infrared radiation source, a lamp, a resistance heating plate, a laser, etc. Commercially available as sources of visible light, such as sunlight, lamps, fluorescent lamps, and lasers, as sources of ultraviolet rays, mercury lamps, lamps, laser lamps, lasers, etc., and as sources of electron beams A method using thermal electrons generated from tungsten filaments, a cold cathode method that generates high-voltage pulses in metals, and a secondary electron method that uses secondary electrons generated by collisions between ionized gaseous molecules and metal electrodes. Can be mentioned. In addition, as a source of alpha rays, beta rays, and gamma rays, for example, a fission material such as 6 ° Co can be cited, and a gamma ray or a vacuum tube that collides accelerated electrons with the anode should be used. Can do. These radiations can be used alone or in combination of two or more simultaneously or at regular intervals. The curable resin composition of the present invention is preferably ultraviolet curable.

[0135] 活性エネルギー線を用いた場合、露光量を 0. 01〜10j/cm2の範囲内の値とする のが好ましい。この理由は、露光量が 0. 01j/cm2未満となると、硬化不良が生 じる場合があるためであり、一方、露光量が lOjZcm2を超えると、硬化時間が過度 に長くなる場合があるためである。また、このような理由により、露光量を 0.:!〜 5j/c m2の範囲内の値とするのがより好ましぐ 0. 3〜3jZcm2の範囲内の値とするのがよ り好ましい。 [0135] When using the active energy ray, preferably a value within the range of exposure amount of 0. 01~10j / cm 2. This is because when the exposure dose is less than 0.01 j / cm 2 , a curing failure may occur. On the other hand, when the exposure dose exceeds lOjZcm 2 , the curing time may become excessively long. Because there is. For these reasons, it is more preferable to set the exposure value within the range of 0.:! To 5j / cm 2. It is more preferable to set the exposure value within the range of 0.3 to 3jZcm 2 . preferable.

[0136] 硬化性樹脂組成物の硬化反応は、窒素等の嫌気的条件下において行う必要があ る。その理由は酸素が存在するとラジカル重合が阻害されるため、硬化反応が不十 分となるからである。 [0136] The curing reaction of the curable resin composition must be performed under anaerobic conditions such as nitrogen. The reason is that in the presence of oxygen, radical polymerization is inhibited, so that the curing reaction is not sufficient. Because it becomes minutes.

[0137] III.硬化膜 [0137] III. Cured film

本発明の硬化膜は、前記硬化性樹脂組成物を種々の基材、例えば、プラスチック 基材にコーティングして硬化させることにより得ることができる。具体的には、組成物を コーティングし、好ましくは、 0〜200°Cで揮発成分を乾燥させた後、上述の、放射線 で硬化処理を行うことにより被覆成形体として得ることができる。放射線による硬化処 理は、紫外線又は電子線を用いることが好ましい。そのような場合、好ましい紫外線 の照射光量は 0. 01〜10j/cm2であり、より好ましくは、 0.:!〜 2j/cm2である。また 、好ましい電子線の照射条件は、加圧電圧は 10〜300KV、電子密度は 0. 02-0. 30mA/cm2であり、電子線照射量は:!〜 1 OMradである。 The cured film of the present invention can be obtained by coating the curable resin composition on various substrates, for example, a plastic substrate and curing it. Specifically, it is possible to obtain a coated molded body by coating the composition, and preferably drying the volatile component at 0 to 200 ° C. and then performing the above-described curing treatment with radiation. For the curing treatment with radiation, it is preferable to use ultraviolet rays or electron beams. In such a case, the preferable irradiation amount of ultraviolet rays is 0.01 to 10 j / cm 2 , and more preferably is 0.:! To 2 j / cm 2 . Moreover, preferable electron beam irradiation conditions are a pressurization voltage of 10 to 300 KV, an electron density of 0.02 to 0.30 mA / cm 2 , and an electron beam irradiation amount of:! To 1 OMrad.

[0138] 硬化性樹脂組成物を塗布後、組成物中の溶剤(C)及び溶剤(D)が蒸発する過程 におレ、て、 (A1)及び (A2)の金属酸化物粒子 (金属酸化物粒子成分 (A) )が塗布 下地側(隣接層との境界付近)又はその反対側に偏在化する。そのため、硬化膜の 一方の界面付近では、金属酸化物粒子成分 (A)が高密度で存在し、硬化膜の他方 の界面付近では、金属酸化物粒子成分 (A)が実質的に存在しないため、低屈折率 の樹脂層が形成される。従って、硬化性樹脂組成物からなる一の塗膜を硬化させる ことにより、実質的に二層以上の層構造を有する硬化膜が得られる。これらの分離し て形成される各層は、例えば、得られた膜の断面を電子顕微鏡で観察することにより 確認することができる。金属酸化物粒子成分 (A)が高密度に存在する層とは、金属 酸化物粒子成分 (A)が集合している部分を指す概念であり、実質的に金属酸化物 粒子成分 (A)を主成分として構成された層であるが、層内部に (B)成分等が共存す る場合がある。他方、(金属酸化物粒子成分 (A)が実質的に存在しない層とは、金属 酸化物粒子成分 (A)が存在しない部分を指す概念であるが、本発明の効果を損な わない範囲で金属酸化物粒子成分 (A)が若干含まれていてもよい。この層は、実質 的に(B)成分と(E)成分の硬化物等の金属酸化物粒子成分 (A)以外の成分から構 成された層である。硬化膜は、多くの場合、金属酸化物粒子成分 (A)が高密度に存 在する層と金属酸化物粒子成分 (A)が実質的に存在しない層がそれぞれ連続した 層を形成した二層構造を有する。基材に PET樹脂 (易接着層を有する PET樹脂を 含む)等を用いた場合、通常は、基材である層、金属酸化物粒子成分 (A)が高密度 に存在する層、金属酸化物粒子成分 (A)が実質的に存在しない層が、この順番に 隣接して形成される。 [0138] After applying the curable resin composition, in the process of evaporating the solvent (C) and solvent (D) in the composition, the metal oxide particles (A1) and (A2) (metal oxide The substance particle component (A)) is unevenly distributed on the coated base side (near the boundary with the adjacent layer) or on the opposite side. Therefore, the metal oxide particle component (A) is present in high density near one interface of the cured film, and the metal oxide particle component (A) is substantially absent near the other interface of the cured film. A resin layer having a low refractive index is formed. Therefore, a cured film having a layer structure of two or more layers can be obtained by curing one coating film made of the curable resin composition. Each layer formed by separation can be confirmed, for example, by observing a cross section of the obtained film with an electron microscope. The layer in which the metal oxide particle component (A) is present at a high density is a concept indicating a portion where the metal oxide particle component (A) is aggregated. Although the layer is configured as the main component, component (B) may coexist in the layer. On the other hand, (the layer in which the metal oxide particle component (A) does not substantially exist is a concept indicating a portion in which the metal oxide particle component (A) does not exist, but does not impair the effects of the present invention. The layer may contain a slight amount of the metal oxide particle component (A), and this layer is substantially a component other than the metal oxide particle component (A) such as a cured product of the components (B) and (E). In many cases, the cured film includes a layer in which the metal oxide particle component (A) is present at a high density and a layer in which the metal oxide particle component (A) is substantially absent. Each has a two-layer structure with a continuous layer of PET resin (PET resin with an easy-adhesion layer) In general, a layer that is a base material, a layer in which the metal oxide particle component (A) is present at a high density, and a layer in which the metal oxide particle component (A) is not substantially present They are formed adjacent to each other in this order.

[0139] ここで、二層以上の層構造とは、「(A1)及び (A2)の金属酸化物粒子が高密度に 存在する層」と、「 (A1)及び (A2)の金属酸化物粒子が実質的に存在しなレ、層」の両 者を共に含む 2以上の層からなる場合もあり、また、二以上の「(A1)又は (A2)金属 酸化物粒子が高密度に存在する層」のみからなる場合がある。  Here, the layer structure of two or more layers means “a layer in which metal oxide particles (A1) and (A2) are present at high density” and “metal oxide (A1) and (A2)”. It may consist of two or more layers including both of the particles and layers that are substantially free of particles, and two or more “(A1) or (A2) metal oxide particles exist in high density. In some cases, it consists only of “layers”.

硬化性樹脂組成物が含有する 2種以上の金属酸化物粒子の組み合わせによって は、「金属酸化物粒子が高密度に存在する層」が 2層以上形成され得る。さらに、「金 属酸化物粒子が高密度に存在する層」の「金属酸化物粒子」は、少なくとも 1種、即 ち、 1種又は 2種以上の「金属酸化物粒子」を意味する。また、一つの「金属酸化物粒 子が高密度に存在する層」が、 2種以上の金属酸化物粒子から構成されていてもよ レ、。  Depending on the combination of two or more kinds of metal oxide particles contained in the curable resin composition, two or more “layers in which the metal oxide particles exist at high density” may be formed. Furthermore, the “metal oxide particles” in the “layer in which metal oxide particles are present at high density” means at least one, that is, one or more “metal oxide particles”. In addition, one “layer in which metal oxide particles exist at high density” may be composed of two or more kinds of metal oxide particles.

[0140] 硬化性樹脂組成物中の(B)エチレン性不飽和基含有含フッ素重合体は、熱硬化 性樹脂 (例えば、メラミン化合物)に比べて屈折率が低ぐ反射防止膜の低屈折率層 として好ましい光学的特性を有している。そして、金属酸化物粒子成分 (A)の構成材 料として、屈折率の高い金属酸化物粒子 (Aa)を用いることにより、さらに良好な反射 防止膜を形成することができる。  [0140] The (B) ethylenically unsaturated group-containing fluorine-containing polymer in the curable resin composition has a lower refractive index than that of a thermosetting resin (for example, a melamine compound). The layer has preferable optical characteristics. Further, by using metal oxide particles (Aa) having a high refractive index as a constituent material of the metal oxide particle component (A), a further excellent antireflection film can be formed.

[0141] 上記本発明の硬化性樹脂組成物を基材上に塗布し、 UV硬化させた本発明の硬 化膜は、透明性に優れ、高硬度であるとともに、耐擦傷性並びに基材及び基材ゃ低 屈折率層等の隣接層との密着性に優れた塗膜 (被膜)を形成し得る特徴を有してい る。また、硬化反応に熱を用いないため、熱硬化反応で生じる加水分解反応を伴わ ないので、得られる硬化膜の耐湿熱性に優れている。従って、硬化膜は、フィルム型 液晶素子、タツチパネル、プラスチック光学部品等の反射防止膜等に特に好適に用 いられる。  [0141] The cured film of the present invention obtained by coating the curable resin composition of the present invention on a substrate and UV-curing the same is excellent in transparency, high hardness, scratch resistance, substrate, and The base material has a feature capable of forming a coating film (coating film) excellent in adhesion to an adjacent layer such as a low refractive index layer. In addition, since no heat is used for the curing reaction, it does not involve a hydrolysis reaction caused by the thermosetting reaction, and thus the resulting cured film has excellent heat and heat resistance. Accordingly, the cured film is particularly suitably used for an antireflection film for film-type liquid crystal elements, touch panels, plastic optical components and the like.

[実施例]  [Example]

[0142] 以下、実施例を示して本発明をさらに詳細に説明するが、本発明の範囲はこれら実 施例の記載に限定されるものではない。また、実施例中、各成分の配合量は特に記 載のない限り、「部」は質量部を、「%」は質量%を意味している。 [0142] Hereinafter, the present invention will be described in more detail with reference to examples. However, the scope of the present invention is not limited to the description of these examples. In the examples, the amount of each component is Unless otherwise indicated, “part” means mass part and “%” means mass%.

[0143] 製造例 1  [0143] Production Example 1

(1)重合性不飽和基を有する有機化合物 (Ab)の合成  (1) Synthesis of organic compound (Ab) having polymerizable unsaturated group

攪拌機付きの容器内のメルカプトプロピルトリメトキシシラン 221部及びジブチルス ズジラウレート 1部の混合溶液に、イソホロンジイソシァネート 222部を、乾燥空気中、 50°Cで 1時間かけて滴下した後、さらに 70°Cで 3時間攪拌した。  To a mixed solution of 221 parts of mercaptopropyltrimethoxysilane and 1 part of dibutyl suddilaurate in a vessel equipped with a stirrer, 222 parts of isophorone diisocyanate was added dropwise in dry air at 50 ° C over 1 hour. The mixture was stirred at 70 ° C for 3 hours.

続いて、この反応溶液中に新中村ィ匕学製 NKエステル A _TMM_ 3LM_N (ぺ ンタエリスリトールトリアタリレート 60質量0 /0とペンタエリスリトールテトラアタリレート 40 質量%からなる。このうち、反応に関与するのは、水酸基を有するペンタエリスリトー ルトリアタリレートのみである。) 549部を 30°Cで 1時間かけて滴下した後、さらに 60°C で 10時間攪拌して反応液を得た。 Subsequently, consisting Shin Nakamura I匕学Ltd. NK Ester A _TMM_ 3LM_N (pentaerythritol tri Atari rate 60 mass 0/0 and pentaerythritol Atari rate 40% by weight in the reaction solution. Of these, participating in the reaction (Only pentaerythritol triatallylate having a hydroxyl group.) 549 parts were added dropwise at 30 ° C over 1 hour, and then stirred at 60 ° C for 10 hours to obtain a reaction solution.

この反応液中の生成物、すなわち、重合性不飽和基を有する有機化合物における 残存イソシァネート量を FT— IRで測定したところ、 0. 1質量%以下であり、各反応が ほぼ定量的に行われたことを確認した。生成物の赤外吸収スペクトルは原料中のメ ルカプト基に特徴的な 2550カイザ—の吸収ピ―ク及び原料イソシァネ—ト化合物に 特徴的な 2260カイザ—の吸収ピ―クが消失し、新たにウレタン結合及び S (C =〇) NH—基に特徴的な 1660カイザ—のピ―ク及びアタリロキシ基に特徴的な 1720力 ィザ一のピ一クが観察され、重合性不飽和基としてのアタリロキシ基と一 S (C =〇)N H—、ウレタン結合を共に有するアタリ口キシ基修飾アルコキシシランが生成している ことを示した。以上により、チォウレタン結合と、ウレタン結合と、アルコキシシリル基と 、重合性不飽和基とを有する化合物(前記式 (A— 4)及び (A— 5)で示される化合物 (Ab) ) 773部と反応に関与しなかったペンタエリスリトールテトラアタリレート 220部の 組成物(以下、この組成物を、「アルコキシシラン(1)」ということがある。 ) (A # l)を得 た。  The product in this reaction solution, that is, the amount of residual isocyanate in the organic compound having a polymerizable unsaturated group was measured by FT-IR, and it was 0.1% by mass or less, and each reaction was performed almost quantitatively. I confirmed that. In the infrared absorption spectrum of the product, the absorption peak of 2550 Kaiser, characteristic of the mercapto group in the raw material, and the absorption peak of 2260 Kaiser, characteristic of the raw isocyanate compound, disappeared. A 1660-membered peak characteristic of urethane bonds and S (C = 〇) NH-groups and a 1720-force peak characteristic of attaryloxy groups were observed as polymerizable unsaturated groups. It was shown that attaxyloxy group-modified alkoxysilanes that have both an talyloxy group, 1 S (C = 〇) NH—, and a urethane bond were formed. As described above, 773 parts of a compound having a thiourethane bond, a urethane bond, an alkoxysilyl group, and a polymerizable unsaturated group (compounds represented by the above formulas (A-4) and (A-5) (Ab)) A composition of 220 parts of pentaerythritol tetratalylate that was not involved in the reaction (hereinafter, this composition may be referred to as “alkoxysilane (1)”) (A # l) was obtained.

[0144] 製造例 2  [0144] Production Example 2

(2)ウレタンアタリレート(式(11)で示される化合物)の合成  (2) Synthesis of urethane acrylate (compound represented by formula (11))

攪拌機付きの容器内のイソホロンジイソシァネート 18. 8部と、ジブチル錫ジラウレ ート 0. 2部とからなる溶液に対し、新中村ィ匕学製 NKエステル A—TMM— 3LM— N (反応に関与するのは、水酸基を有するペンタエリスリトールトリアタリレートのみであ る。) 93部を、 10°C、 1時間の条件で滴下した後、 60°C、 6時間の条件で攪拌し、反 応液とした。 NK ester A—TMM—3LM—N made by Shin-Nakamura Chemical Co., Ltd. for a solution consisting of 18.8 parts of isophorone diisocyanate and 0.2 part of dibutyltin dilaurate in a vessel equipped with a stirrer (Only the pentaerythritol triatalylate having a hydroxyl group is involved in the reaction.) 93 parts were added dropwise at 10 ° C for 1 hour, and then stirred at 60 ° C for 6 hours. The reaction solution was used.

この反応液中の生成物、即ち、製造例 1と同様にして残存イソシァネート量を FT—I Rで測定したところ、 0. 1質量%以下であり、反応がほぼ定量的に行われたことを確 認した。また、分子内に、ウレタン結合、及びアタリロイル基(重合性不飽和基)とを含 むことを確認した。  The product in this reaction solution, that is, the amount of residual isocyanate was measured by FT-IR in the same manner as in Production Example 1, and was 0.1% by mass or less, confirming that the reaction was carried out almost quantitatively. I confirmed. In addition, it was confirmed that the molecule contains a urethane bond and an taliloyl group (polymerizable unsaturated group).

以上により、ウレタンへキサアタリレートイヒ合物(前記式(11)で示される化合物)が 7 5部得られたほか、反応に関与しな力、つたペンタエリスリトールテトラアタリレート 37部 が混在してレ、る組成物 (A # 2)を得た。  As a result, 75 parts of urethane hexatatereitohi compound (compound represented by the above formula (11)) was obtained, as well as 37 parts of pentaerythritol tetraatalylate that was not involved in the reaction. I got a composition (A # 2).

[0145] 製造例 3  [0145] Production Example 3

[シリカ粒子含有ハードコート層用組成物の調製]  [Preparation of composition for silica particle-containing hard coat layer]

製造例 1で製造した重合性不飽和基を含む組成物 (A # 1) 2. 32部、シリカ粒子ゾ ル (メチルェチルケトンシリカゾル、 日産化学工業 (株)製 MEK— ST、数平均粒子径 0. 022 μ ΐη、シリカ濃度 30%) 91. 3部(シリカ粒子として 27部)、イオン交換水 0· 1 2部、及び ρ—ヒドロキシフエニルモノメチルエーテル 0. 01部の混合液を、 60°C、 4時 間攪拌後、オルト蟻酸メチルエステル 1. 36部を添加し、さらに 1時間同一温度で加 熱攪拌することで反応性粒子 (分散液 (A # 3) )を得た。この分散液 (A # 3)をアルミ 皿に 2g秤量後、 175°Cのホットプレート上で 1時間乾燥、秤量して固形分含量を求め たところ、 30. 7%であった。また、分散液 (A # 3)を磁性るつぼに 2g秤量後、 80°C のホットプレート上で 30分予備乾燥し、 750°Cのマツフル炉中で 1時間焼成した後の 無機残渣より、固形分中の無機含量を求めたところ、 90%であった。  Composition containing polymerizable unsaturated groups produced in Production Example 1 (A # 1) 2. 32 parts, silica particle sol (methylethylketone silica sol, MEK-ST, Nissan Chemical Industries, Ltd., number average particle) (Diameter 0.022 μ 0η, silica concentration 30%) 91. 3 parts (27 parts as silica particles), 0 · 1 2 parts of ion-exchanged water, and 0.01 part of ρ-hydroxyphenyl monomethyl ether After stirring at 60 ° C for 4 hours, 1.36 parts of orthoformate methyl ester was added, and the mixture was further heated and stirred at the same temperature for 1 hour to obtain reactive particles (dispersion liquid (A # 3)). 2 g of this dispersion (A # 3) was weighed on an aluminum pan, dried on a hot plate at 175 ° C for 1 hour and weighed to obtain a solid content of 30.7%. Also, weigh 2g of the dispersion (A # 3) in a magnetic crucible, pre-dry on a hot plate at 80 ° C for 30 minutes, and calcinate in a 750 ° C pine furnace for 1 hour. The inorganic content in the minute was determined to be 90%.

[0146] この分散液(A # 3) 98. 6g、組成物(A # 2) 3. 4g、 1—ヒドロキシシクロへキシルフ ェニルケトン 2. lg、 11^^八〇111 £907 (2 _メチル_ 1 _ [4_ (メチルチォ)フヱニル] —2—モルホリノプロパン一 1—オン、チノく'スペシャルティ'ケミカルズ製) 1. 2g、ジ ペンタエリスリトールへキサアタリレート(DPHA) 33. 2g、シクロへキサノン 7gを混合 攪拌し、シリカ粒子含有ハードコート層用組成物(固形分濃度 50%)を 145g得た。  [0146] This dispersion (A # 3) 98.6 g, composition (A # 2) 3.4 g, 1-hydroxy cyclohexyl phenyl ketone 2. lg, 11 ^^ 80 111 £ 907 (2 _methyl_ 1 _ [4_ (Methylthio) phenyl] —2-morpholinopropane 1-one, manufactured by Chinoku Specialty Chemicals) 1.2 g, dipentaerythritol hexatatalylate (DPHA) 33.2 g, cyclohexanone 7 g Mixing and stirring were carried out to obtain 145 g of a silica particle-containing composition for hard coat layer (solid content concentration: 50%).

[0147] 製造例 4 [ジルコニァ粒子含有組成物の調製] [0147] Production Example 4 [Preparation of a composition containing zirconia particles]

第一稀元素化学工業 (株)製、 UEP— 100 (—次粒径 10〜30nm) 300部をメチル ェチルケトン(MEK) 700部に添加し、ガラスビーズにて 168時間分散を行レ、、ガラス ビーズを除去してジルコユア分散ゾル 950部を得た。ジルコユア分散ゾルをアルミ皿 に 2g秤量後、 120°Cのホットプレート上で 1時間乾燥、秤量して固形分含量を求めた ところ 30%であった。このジルコユア分散ゾル 100gに、製造例 1で合成した組成物( A # 1) 0. 86g、ジペンタエリスリトーノレへキサアタリレート(DPHA) 13. 4g、 p メトキ シフエノーノレ 0. 016g、ィ才ン交換水 0. 033gの?昆合 f夜を 60°C、 3日寺 撹拌後、才ノレ ト蟻酸メチルエステル 0. 332gを添加してさらに 1時間同一温度で加熱撹拌すること で、表面変性ジノレコニァ粒子の分散液 116gを得た。この分散液 116g、組成物 (A # 2) 1. 34g、 1—ヒドロキシシクロへキシノレフエニノレケトン 1. 26g, IRGACURE907 (2—メチル一 1 - [4- (メチルチオ)フエニル] _ 2_モルホリノプロパン一 1 _オン、 チバ.スペシャルティ.ケミカルズ製) 0· 76g、 MEK2846gを混合攪拌し、ジルコニァ 粒子含有組成物(固形分濃度 4%)を 2964g得た。  Made by Daiichi Elemental Chemical Co., Ltd., 300 parts of UEP-100 (—next particle size 10-30 nm) is added to 700 parts of methyl ethyl ketone (MEK), and dispersed for 168 hours with glass beads. The beads were removed to obtain 950 parts of a zircouore dispersed sol. After weighing 2g of the zircoyu dispersed sol in an aluminum dish, drying on a hot plate at 120 ° C for 1 hour and weighing, the solid content was determined to be 30%. To 100 g of this zircouore dispersed sol, the composition synthesized in Production Example 1 (A # 1) 0.86 g, dipentaerythritol hexahexarate (DPHA) 13.4 g, p methoxy sifenore 0.016 g, Exchange water 0.03g? Kunming f After stirring at 60 ° C for 3 days, add 0.332 g of methyl noreformic acid methyl ester and heat and stir at the same temperature for 1 hour to obtain 116 g of a dispersion of surface-modified dinoleconia particles. It was. 116 g of this dispersion, composition (A # 2) 1.34 g, 1-hydroxycyclohexenolephenoloketone 1.26 g, IRGACURE907 (2-methyl-1- [4- (methylthio) phenyl] _ 2_morpholino Propane 1_one, Ciba Specialty Chemicals) 0 · 76 g and MEK2846 g were mixed and stirred to obtain 2964 g of a zirconia particle-containing composition (solid content concentration 4%).

[0148] 製造例 5  [0148] Production Example 5

[錫ドープ酸化インジウム (ITO)粒子含有組成物の調製]  [Preparation of composition containing tin-doped indium oxide (ITO) particles]

富士化学株式会社製 ITOゾル(10wt% IPAゾル) 700g、 DPHA29. 5g、 2 メ チルー 1 [4 (メチルチオ)フエニル] 2—モルホリノプロパン 1 オン lg、イソ プロピルアルコール (IP A) 1769. 5gを混合し固形分濃度 4%の ITO粒子含有組成 物を得た。  ITO sol (10wt% IPA sol) made by Fuji Chemical Co., Ltd. 700g, DPHA 29.5g, 2 methyl 1 [4 (methylthio) phenyl] 2-morpholinopropane 1on lg, isopropyl alcohol (IP A) 1769. 5g An ITO particle-containing composition having a solid content concentration of 4% was obtained.

[0149] 製造例 6  [0149] Production Example 6

[アンチモンドープ酸化錫 (AT〇)粒子含有組成物の調製]  [Preparation of antimony-doped tin oxide (AT〇) particle-containing composition]

ATO粒子(石原テクノ (株)製、 SN— 100P、一次粒径 10〜30nm)、分散剤(旭電 化工業(株)製、アデカプル口ニック TR— 701)、及びメタノールを、 90/2. 78/21 1 (重量比)の配合量で混合した (全固形分含量 31%、全無機含量 29. 6%)。ペイン トシエ一力の 50mlポリ瓶に、ガラスビーズ 40g (T〇SHINRIK〇製、 BZ— 01) (ビー ズ径 0. lmm) (体積約 16ml)と上記混合液(30g)を入れて、 3時間分散しメジアン 径 80nmの分散ゾルを得た。このゾル 304gに組成物(A # l) 5. 7g、 p—メトキシフエ ノール 0. 01g、イオン交換水 0. 12gの混合液を 60°C、 3時間撹拌後、オルト蟻酸メ チルエステル 1. 3gを添加してさらに 1時間同一温度で加熱撹拌することで、表面変 性 ATO粒子の分散液を 311g得た。この分散液 278. 3g、組成物 (A # 2) 1. 7g、ぺ ンタエリスリトーノレトリアタリレート 8. 59g、 2_メチル _ 1 _ [4_ (メチルチオ)フヱニル ]— 2 モルホリノプロパン一 1—オン 0. 88g、メタノーノレ 33g、プロピレングリコーノレ モノメチルエーテル 1675を混合攪拌し、 ATO粒子含有組成物(固形分濃度 5%)を 2000g得た。 ATO particles (Ishihara Techno Co., Ltd., SN-100P, primary particle size 10-30nm), dispersant (Asahi Denka Kogyo Co., Ltd., Adekapulu Knick TR-701), and methanol were mixed in 90/2. 78/21 1 (weight ratio) was mixed (total solid content 31%, total inorganic content 29.6%). In a 50ml plastic bottle of Pain Tossier, put 40g of glass beads (manufactured by T ○ SHINRIK〇, BZ-01) (bead diameter: 0.1mm) (volume: about 16ml) and the above mixture (30g) for 3 hours. Dispersion and a dispersion sol having a median diameter of 80 nm were obtained. 304 g of this sol has a composition (A # l) 5.7 g, p-methoxyphenol After stirring a mixed solution of 0.1 g of diol and 0.12 g of ion-exchanged water at 60 ° C for 3 hours, add 1.3 g of orthoformate methyl ester and heat and stir at the same temperature for 1 hour. 311 g of ATO particle dispersion was obtained. 278.3 g of this dispersion, 1.7 g of composition (A # 2), 1.7 g of pentaerythritol retriate acrylate, 2_methyl _ 1 _ [4_ (methylthio) phenyl] — 2 morpholinopropane 1 1— 0.88 g of ON, 33 g of methanol, and 1675 of propylene glycolanol monomethyl ether were mixed and stirred to obtain 2000 g of an ATO particle-containing composition (solid content concentration 5%).

[0150] 製造例 7  [0150] Production Example 7

[A1ドープ Zn〇粒子含有組成物の調製]  [Preparation of composition containing A1-doped ZnO particles]

酸化亜鉛粒子 (堺化学製 A1ドープ ZnO粒子、一次粒径 10〜20nm)、分散剤 (楠 本化成(株)製、ハイブラッド ED151)及びプロピレングリコールモノメチルエーテルを 、 27. 6/4. 8/67. 6 (重量比)の配合量で混合した (全固形分含量 30%、全無機 含量 27. 6%)。ペイントシエ一力の 50mlポリ瓶に、ジルコニァビーズ 40g (ビーズ径 0 . 1mm)と上記混合液(30g)を入れて、 8時間分散しメジアン径 40nmの分散ゾノレを 得た。このゾノレ 290gにペンタエリスリトーノレトリアタリレート 10g、 2—メチノレー 1 [4 - (メチルチオ)フエ二ル]— 2—モルホリノプロパン一 1—オン 0· 5g、プロピレングリ コールモノメチルエーテル 2138gをカ卩ぇ混合攪拌し、酸化亜鉛粒子含有組成物(固 形分濃度 4%)を 2438g得た。  Zinc oxide particles (A1-doped ZnO particles manufactured by Sakai Chemical, primary particle size 10-20 nm), dispersant (manufactured by Takamoto Kasei Co., Ltd., High Blood ED151) and propylene glycol monomethyl ether, 27.6 / 4.8 / 67.6 (weight ratio) was mixed (total solid content 30%, total inorganic content 27.6%). Zirconia beads 40 g (bead diameter 0.1 mm) and the above mixed solution (30 g) were placed in a 50 ml plastic bottle of paint cheer, and dispersed for 8 hours to obtain a dispersion zone with a median diameter of 40 nm. Add 290 g of this Zonole to 10 g of Pentaerythritol Retriate Talilate, 2-Methylenole 1 [4- (Methylthio) phenyl] — 2-morpholinopropane 1-one 0.5 g, and 2138 g of propylene glycol monomethyl ether. After mixing and stirring, 2438 g of a zinc oxide particle-containing composition (solid content concentration 4%) was obtained.

[0151] 製造例 8  [0151] Production Example 8

[重合性不飽和基を有する有機化合物 (Ab)が結合した反応性アルミナ、ジルコニァ 被覆 TiO粒子ゾル (A1— 1)の製造]  [Production of reactive alumina and zirconia-coated TiO particle sol (A1-1) bonded with organic compound (Ab) having polymerizable unsaturated groups]

2  2

アルミナ、ジノレコニァ被覆 TiO粒子分散液 (ティカ株式会社製 全固形分濃度 28  Alumina, Ginoleconia-coated TiO particle dispersion (Tika Co., Ltd., total solids concentration 28

2  2

%、粒子濃度 24%) 333. 7部、製造例 1で製造したアルコキシシラン(1)の溶液 5. 4 咅 ^蒸留水 0. 20咅 ^ p ヒドロキノンモノメチノレエーテノレ 0. 03咅を?昆合し、 65°Cで 加熱攪拌した。 4時間後、オルト蟻酸メチルエステル 2. 2部添カ卩し、さらに 1時間加熱 することで、固形分 31. 6%の反応性アルミナ、ジルコユア被覆 TiO粒子ゾル (Al _  33, 7 parts, solution of alkoxysilane (1) produced in Production Example 1 5.4 製造 ^ Distilled water 0.20 咅 ^ p Hydroquinone monomethylenoateolate 0.03 ?? Keen and stirred at 65 ° C. After 4 hours, add 2.2 parts of orthoformate methyl ester and heat for another 1 hour. Reactive alumina with a solid content of 31.6%, zirconia-coated TiO particle sol (Al _

2  2

1)を得た。  1) was obtained.

この Ti〇粒子の数平均粒子径は、 20nmであった。ここで、平均粒子径は透過型 電子顕微鏡により測定した。 The number average particle diameter of the TiO particles was 20 nm. Here, the average particle size is transmission type Measured with an electron microscope.

[0152] 製造例 9  [0152] Production Example 9

[水酸基含有含フッ素重合体 (B— 2)の製造]  [Production of hydroxyl-containing fluoropolymer (B-2)]

内容積 1. 5Lの電磁攪拌機付きステンレス製オートクレープを窒素ガスで十分置換 した後、酢酸ェチノレ 500g、パーフルォロ(プロピルビュルエーテル) 43. 2g、ェチル ビニノレエーテノレ 41. 2g、ヒドロキシェチルビニルエーテル 21. 5g、ノニオン性反応性 乳化剤として「アデカリアソープ NE_ 30」(旭電化工業株式会社製) 40. 5g、ァゾ基 含有ポリジメチルシロキサンとして「VPS— 1001」(和光純薬工業株式会社製) 6. Og 及び過酸化ラウロイル 1. 25gをカロえ、ドライアイス一メタノールで _ 50°Cまで冷却し た後、再度窒素ガスで系内の酸素を除去した。  After replacing the stainless steel autoclave with a 1.5 L magnetic stirrer with nitrogen gas sufficiently, 500 g of ethynole acetate, 43.2 g of perfluoro (propyl butyl ether), 41.2 g of ethyl vinylenoleethenole, 21% hydroxyethyl vinyl ether 21 .5g, "Adekaria soap NE_ 30" (made by Asahi Denka Kogyo Co., Ltd.) as nonionic reactive emulsifier 40.5g, "VPS-1001" (made by Wako Pure Chemical Industries, Ltd.) as polydimethylsiloxane containing azo group 6. Og and lauroyl peroxide 1. 25 g was calorie, cooled to _50 ° C with dry ice and methanol, and then the oxygen in the system was removed again with nitrogen gas.

次いでへキサフルォロプロピレン 97. 4gをカロえ、昇温を開始した。オートクレーブ 内の温度が 60°Cに達した時点での圧力は 5. 3 X 105Paを示した。その後、 70°Cで 2 0時間攪拌下に反応を継続し、圧力が 1. 7 X 105Paに低下した時点でオートクレー ブを水冷し、反応を停止させた。室温に達した後、未反応モノマーを放出しオートク レーブを開放し、固形分濃度 26. 4%のポリマー溶液を得た。得られたポリマー溶液 をメタノールに投入しポリマーを析出させた後、メタノールにて洗浄し、 50°Cにて真空 乾燥を行い 220gの含フッ素重合体 (B— 2)を得た。 Next, 97.4 g of hexafluoropropylene was added and the temperature was raised. The pressure when the temperature in the autoclave reached 60 ° C was 5.3 X 10 5 Pa. Thereafter, the reaction was continued with stirring at 70 ° C. for 20 hours, and when the pressure dropped to 1.7 × 10 5 Pa, the autoclave was cooled with water to stop the reaction. After reaching room temperature, the unreacted monomer was released and the autoclave was released to obtain a polymer solution having a solid content concentration of 26.4%. The obtained polymer solution was put into methanol to precipitate a polymer, washed with methanol, and vacuum dried at 50 ° C. to obtain 220 g of a fluoropolymer (B-2).

[0153] 製造例 10 [0153] Production Example 10

[エチレン性不飽和基含有含フッ素重合体 (B1)の製造]  [Production of ethylenically unsaturated group-containing fluoropolymer (B1)]

電磁攪拌機、ガラス製冷却管及び温度計を備えた容量 1リットルのセパラブルフラ スコに、製造例 9で得られた水酸基含有含フッ素重合体 (B— 2)を 50.0g、重合禁止 剤として 2, 6—ジ _t_ブチルメチルフエノール 0. Olg及び MIBK374gを仕込み、 20°Cで水酸基含有含フッ素重合体 (B— 2)が MIBKに溶解して、溶液が透明、均一 になるまで攪拌を行った。次いで、この系に、 2—アタリロイルォキシェチルイソシァネ ート(B— 1) 16. Ogを添カ卩し、溶液が均一になるまで攪拌した後、ジブチルチンジラ ゥレート 0. lgを添加して反応を開始し、系の温度を 55〜65°Cに保持し 5時間攪拌 を継続することにより、エチレン性不飽和基含有含フッ素重合体 (B1)の MIBK溶液 を得た。この溶液をアルミ皿に 2g秤量後、 150°Cのホットプレート上で 5分間乾燥、秤 量して固形分含量を求めたところ、 15. 0%であった。 A separable flask with a capacity of 1 liter equipped with a magnetic stirrer, a glass cooling tube and a thermometer, 50.0 g of the hydroxyl group-containing fluoropolymer (B-2) obtained in Production Example 9 was used as a polymerization inhibitor. — Di_t_butylmethylphenol 0. Olg and MIBK374g were charged, and the mixture was stirred until the hydroxyl group-containing fluoropolymer (B-2) was dissolved in MIBK at 20 ° C until the solution became clear and uniform. Next, 2-atallyloyloxetyl isocyanate (B-1) 16. Og was added to this system, and the mixture was stirred until the solution became homogeneous, and then dibutyltin dilaurate 0. lg Was added to start the reaction, and the system temperature was maintained at 55 to 65 ° C. and stirring was continued for 5 hours to obtain a MIBK solution of the ethylenically unsaturated group-containing fluoropolymer (B1). Weigh 2g of this solution in an aluminum dish, dry on a hot plate at 150 ° C for 5 minutes, and weigh. The solid content was determined to be 15.0%.

[0154] 製造例 11 [0154] Production Example 11

[重合性不飽和基を有する化合物が結合したシリカを主成分とする粒子 (A2— 1)の 製造]  [Production of silica-based particles (A2-1) bonded with a compound having a polymerizable unsaturated group]

製造例 8と同様に、アルコキシシラン(1) 1. 1部、メチルェチルケトンシリカゾル(日 産化学工業 (株)製、商品名: MEK— ST— L (数平均粒子径 0. 050 x m、シリカ濃 度 30。/。) 91. 3部(固形分 27. 4部)、イオン交換水 0. 1部、オルト蟻酸メチルエステ ル 1. 4部を用いて粒子分散液 (A2— 1)を得た。粒子分散液 (A2— 1)の固形分含 量を求めたところ、 36質量%であった。  As in Production Example 8, 1. 1 part of alkoxysilane (1), methyl ethyl ketone silica sol (manufactured by Nissan Chemical Industries, Ltd., trade name: MEK—ST—L (number average particle size of 0.050 xm, Silica concentration 30./.) 91. 3 parts (solid content 27.4 parts), ion-exchanged water 0.1 parts, orthoformate methyl ester 1. 4 parts were added to the particle dispersion (A2-1). The solid content of the particle dispersion (A2-1) was determined to be 36% by mass.

このシリカ系粒子の平均粒子径は、 50nmであった。ここで、平均粒子径は透過型 電子顕微鏡により測定した。  The average particle diameter of the silica-based particles was 50 nm. Here, the average particle diameter was measured with a transmission electron microscope.

[0155] 製造例 12 [0155] Production Example 12

[重合性不飽和基を有する化合物が結合したシリカを主成分とする粒子 (A1— 2)の 製造]  [Manufacture of silica-based particles (A1-2) bonded with a compound having a polymerizable unsaturated group]

製造例 11と同様にアルコキシシラン(1) 1 · 1部、メチルェチルケトンシリカゾル(日 産化学工業 (株)製、商品名: MEK— ST (数平均粒子径 0. 020 / m、シリカ濃度 30 %) 91. 3部(固形分 27. 4部)、イオン交換水 0. 1部、オルト蟻酸メチルエステル 1. 4部を用レ、て粒子分散液 (A2 - 2)を得た。粒子分散液 (A1 - 2)の固形分含量を求 めたところ、 36質量%であった。  Alkoxysilane (1) 1 part 1 as in Production Example 11, Methyl ethyl ketone silica sol (manufactured by Nissan Chemical Industries, Ltd., trade name: MEK-ST (number average particle size 0.020 / m, silica concentration) 30%) 91.3 parts (solid content 27.4 parts), ion-exchanged water 0.1 parts, orthoformate methyl ester 1.4 parts were used to obtain a particle dispersion (A2-2). The solid content of the dispersion (A1-2) was determined to be 36% by mass.

このシリカ系粒子の平均粒子径は、 20nmであった。ここで、平均粒子径は透過型 電子顕微鏡により測定した。  The average particle diameter of the silica-based particles was 20 nm. Here, the average particle diameter was measured with a transmission electron microscope.

[0156] 実施例 1 [0156] Example 1

[硬化性樹脂組成物 1の調製]  [Preparation of Curable Resin Composition 1]

製造例 8で得られたアルミナ、ジルコユア被覆 TiO粒子ゾル (A) 110g (反応性粒  Alumina, Zircoure coated TiO particle sol obtained in Production Example 8 (A) 110 g (reactive particles

2  2

子として 34. 8g)、製造例 10で得られたエチレン性不飽和基含有含フッ素重合体 (B l) 285g (エチレン性不飽和基含有フッ素重合体として 42. 7g)、ジペンタエリスリト 一ルペンタアタリレート(DPPA) 15. 4g、 2_ベンジル _ 2—ジメチルァミノ _ 1 _ (4 —モルフォリノフエ二ル)一 1—ブタノン(ィルガキュア 369、チノく'スペシャルティ'ケミ カルズ社製光ラジカル重合開始剤) 3. 9g、製造例 2で得られた式(11)で示される化 合物 3. 2g、メチノレエチルケトン 530g、メチルイソブチルケトン 150g、ノルマルブタノ ール 100gをカ卩ぇ攪拌した。得られた硬化性樹脂組成物の固形分濃度は 8. 4%であ つた。 34.8 g) as a polymer, 285 g of an ethylenically unsaturated group-containing fluoropolymer (Bl) obtained in Production Example 10 (42.7 g as an ethylenically unsaturated group-containing fluoropolymer), dipentaerythritol Rupentatalylate (DPPA) 15. 4 g, 2_benzyl _ 2 -dimethylamino _ 1 _ (4 —morpholinophenyl) 1 1-butanone (Irgacure 369, Chinoku 'Specialty' Chemi 3.9 g, a compound represented by the formula (11) obtained in Production Example 2 3.2 g, methylol ethyl ketone 530 g, methyl isobutyl ketone 150 g, and normal butanol 100 g. Stirring. The resulting curable resin composition had a solid content concentration of 8.4%.

[0157] 実施例 2, 3、及び比較例 1, 2 [硬化性樹脂組成物 2, 3の調製]  [0157] Examples 2 and 3 and Comparative Examples 1 and 2 [Preparation of Curable Resin Compositions 2 and 3]

用いた金属酸化物粒子成分の組み合わせを表 1に記載の通りに変更し、各成分を 表 1に示す割合で配合した以外は実施例 1と同様にして硬化性樹脂組成物 2〜5を 得た。  The combinations of the metal oxide particle components used were changed as shown in Table 1, and curable resin compositions 2 to 5 were obtained in the same manner as in Example 1 except that the respective components were blended in the proportions shown in Table 1. It was.

[0158] また、上記実施例:!〜 3及び比較例 1、 2で製造した硬化性樹脂組成物:!〜 5を用い て、硬化膜を作製し、硬化膜の特性を評価した。硬化膜の製造方法は、下記のとおり である。  [0158] Further, cured films were prepared using the curable resin compositions:! To 5 produced in the above Examples:! To 3 and Comparative Examples 1 and 2, and properties of the cured films were evaluated. The method for producing the cured film is as follows.

シリカ粒子ゾル (メチルェチルケトンシリカゾル、 日産化学工業 (株)製 MEK_ST、 数平均粒子径 0. 022 μ ΐη,シリカ濃度 30ο/ο) 98. 6g、 1ーヒドロキシシクロへキシノレ フエ二ルケトン 2· lg、 IRGACURE907 (2—メチル— 1— [4— (メチルチオ)フエ二 ノレ]— 2—モルホリノプロパン一 1—オン、チノく'スペシャルティ'ケミカルズ製) 1 · 2g、 ジペンタエリスリトールへキサアタリレート(DPHA) 33· 2g、シクロへキサノン 7gを混 合攪拌し、シリカ粒子含有ハードコート層用組成物を得た。このシリカ粒子含有ハー ドコート層用組成物を、ワイヤーバーコータ(# 12)を用いて、トリァセチルセルロース フィルム (LOFO製、膜厚 80 β m)に塗工した後、オーブン中 80°Cで 1分間乾燥した 。続いて、空気下、高圧水銀ランプを用いて、 0. 6j/cm2の光照射条件で紫外線を 照射することにより、ハードコート層を形成した。ハードコート層の膜厚を触針式膜厚 計にて測定したところ 5 a mであった。 Silica particle sol (Methyl ethyl ketone silica sol, MEK_ST, Nissan Chemical Industries, Ltd., number average particle size 0.022 μΐη, silica concentration 30 ο / ο ) 98.6 g, 1-hydroxycyclohexenoyl phenyl ketone 2 · Lg, IRGACURE907 (2—Methyl— 1— [4— (Methylthio) phenol 2-NO] — 2-morpholinopropane 1-one, manufactured by Chinoku “Specialty Chemicals” 1 • 2 g, Dipentaerythritol Hexaatalylate (DPHA) 3 · 2 g and cyclohexanone 7 g were mixed and stirred to obtain a silica particle-containing composition for hard coat layer. This silica particle-containing hard coat layer composition was applied to a triacetyl cellulose film (LOFO, film thickness 80 β m) using a wire bar coater (# 12), and then heated in an oven at 80 ° C. Dried for a minute. Subsequently, a hard coat layer was formed by irradiating with ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in air. When the film thickness of the hard coat layer was measured with a stylus type film thickness meter, it was 5 am.

得られたハードコート層の上に、ワイヤーバーコータ(# 3)を用いて、上記実施例 1 〜3及び比較例 1、 2で得られた硬化性樹脂組成物を塗工した後、オーブン中 80°C で 1分間乾燥した。続いて、窒素雰囲気下、高圧水銀ランプを用いて、 0. 9j/cm2 の光照射条件で紫外線を照射することにより、膜厚が 0. 2 z mの硬化膜層を形成し た。 On the obtained hard coat layer, using a wire bar coater (# 3), the curable resin compositions obtained in Examples 1 to 3 and Comparative Examples 1 and 2 were applied, and then in an oven. Dry at 80 ° C for 1 minute. Subsequently, a cured film layer having a thickness of 0.2 zm was formed by irradiating ultraviolet rays under a light irradiation condition of 0.9 j / cm 2 using a high-pressure mercury lamp in a nitrogen atmosphere.

[0159] ぐ硬化膜の評価 > (1)スチールウール耐性 [0159] Evaluation of cured films> (1) Steel wool resistance

硬化膜のスチールウール耐性テストを次に示す方法で実施した。即ち、スチールゥ ール(ボンスター No. 0000、 日本スチールウール (株)社製)を学振型摩擦堅牢度 試験機 (AB_ 301、テスター産業 (株)製)に取りつけ、硬化膜の表面を荷重 lkgの 条件で 10回繰り返し擦過し、当該硬化膜の表面における傷の発生の有無を目視で 、以下の基準で確認した。  The steel wool resistance test of the cured film was performed by the following method. In other words, steel wool (Bonster No. 0000, manufactured by Nippon Steel Wool Co., Ltd.) is attached to a Gakushin type friction fastness tester (AB_ 301, manufactured by Tester Sangyo Co., Ltd.), and the surface of the cured film is loaded to 1 kg. Under these conditions, rubbing was repeated 10 times, and the presence or absence of scratches on the surface of the cured film was visually confirmed according to the following criteria.

〇:硬化膜の剥離や傷の発生がほとんど認められなレ、。  ◯: The cured film is almost free from peeling and scratches.

△:硬化膜に細い傷が認められる。  (Triangle | delta): A thin crack is recognized by the cured film.

X:硬化膜の一部に剥離が生じ、又は硬化膜の表面に筋状の傷が発生した。  X: Peeling occurred on a part of the cured film, or streak scratches occurred on the surface of the cured film.

[0160] (2)ヘイズ(%) [0160] (2) Haze (%)

得られた積層体における濁度(Haze値)を、 Haze計を用いて測定し、以下の基準 で評価した。  Turbidity (Haze value) in the obtained laminate was measured using a Haze meter and evaluated according to the following criteria.

〇: Haze値が 1 %以下である。  ○: Haze value is 1% or less.

△: Haze値が 3%以下である。  Δ: Haze value is 3% or less.

X: Haze値が 3%を超える。  X: Haze value exceeds 3%.

[0161] (3)エタノール耐性 [0161] (3) Ethanol tolerance

硬化膜のエタノール耐性テストを次に示す方法で実施した。即ち、エタノールを染 み込ませた不織布 (BEMCOT S— 2、旭化成工業社製)を学振型摩擦堅牢度試 験機 (AB— 301、テスター産業 (株)製)に取りつけ、硬化膜の表面を荷重 500gの条 件で 20回繰り返し擦過し、当該硬化膜の表面における傷の発生の有無を目視で、 以下の基準で確認した。  The ethanol resistance test of the cured film was performed by the following method. That is, a non-woven fabric soaked with ethanol (BEMCOT S-2, manufactured by Asahi Kasei Kogyo Co., Ltd.) is attached to a Gakushin type friction fastness tester (AB-301, manufactured by Tester Sangyo Co., Ltd.), and the surface of the cured film Was repeatedly rubbed 20 times under the condition of a load of 500 g, and the presence or absence of scratches on the surface of the cured film was visually confirmed according to the following criteria.

〇:硬化膜の剥離や傷の発生がほとんど認められなレ、。  ◯: The cured film is almost free from peeling and scratches.

△:硬化膜に細い傷が認められる。  (Triangle | delta): A thin crack is recognized by the cured film.

X:硬化膜の一部に剥離が生じ、又は硬化膜の表面に筋状の傷が発生した。  X: Peeling occurred on a part of the cured film, or streak scratches occurred on the surface of the cured film.

[0162] (4)層分離性 [0162] (4) Layer separation

得られた硬化膜の断面を顕微鏡で観察し、二層に分離しているか否力、を評価した 。評価基準は次のとおりである。各々の状態の典型例を概念として示す電子顕微鏡 写真を図 2に示す。

Figure imgf000054_0001
The cross section of the obtained cured film was observed with a microscope, and the ability to separate into two layers was evaluated. The evaluation criteria are as follows. Fig. 2 shows an electron micrograph showing typical examples of each state as a concept.
Figure imgf000054_0001

窗¥《附> DPPA:ジペンタエリスリトールペンタアタリレート; UV硬化性架橋剤(5官能) イノレガキュア 369: 2—ベンジル一 2 -ジメチルアミノー 1— (4—モルフォリノフエ二 ノレ)一 1—ブタノン;チバ ·スペシャルティ ·ケミカルズ社製光重合開始剤 《¥ 《Appendix》 DPPA: Dipentaerythritol pentaatarylate; UV curable crosslinking agent (pentafunctional) Inoregacure 369: 2-Benzyl-2-dimethylamino-1- (4-morpholinophenol) 1-butanone; Ciba Specialty Chemicals photopolymerization initiator

[0165] 表 1の結果から、金属酸化物粒子 (A1)と (A2)の両者を配合した実施例:!〜 3は、 層分離性が良好で、かつ、耐擦傷性、ヘイズ及び耐薬品性にも優れていることがわ かる。 [0165] From the results in Table 1, Examples in which both metal oxide particles (A1) and (A2) were blended:! To 3 had good layer separation and scratch resistance, haze and chemical resistance. It can be seen that it has excellent properties.

これに対し、金属酸化物粒子 (A1)を 1種のみ配合した比較例 1では、耐擦傷性が 及び耐薬品性が低下している。また、金属酸化物粒子 (A1)に相当する粒子を 2種 類配合した比較例 2では層分離性も低下し、耐擦傷性、透明性が劣っていた。  In contrast, in Comparative Example 1 in which only one type of metal oxide particles (A1) was blended, the scratch resistance and chemical resistance were lowered. Further, in Comparative Example 2 in which two types of particles corresponding to the metal oxide particles (A1) were blended, the layer separability was lowered, and the scratch resistance and transparency were inferior.

[0166] 実施例 4 [0166] Example 4

[積層体の作製]  [Production of laminate]

(1)ハードコート層の作製  (1) Preparation of hard coat layer

製造例 3で調製したシリカ粒子含有ハードコート層用組成物(固形分濃度 50%)を 、ワイヤーバーコータ(# 12)を用いて、トリァセチルセルロースフィルム(LOFO製、 膜厚 80 / m)に塗工した後、オーブン中 80°Cで 1分間乾燥した。続いて、空気下、 高圧水銀ランプを用いて、 0. 6j/cm2の光照射条件で紫外線を照射することにより 、硬化膜層を形成した。硬化膜層の膜厚を触針式膜厚計にて測定したところ 5 / mで あった。 Using a wire bar coater (# 12), the silica particle-containing hard coat layer composition prepared in Production Example 3 is applied to a triacetyl cellulose film (LOFO, film thickness 80 / m). After coating, it was dried in an oven at 80 ° C for 1 minute. Subsequently, a cured film layer was formed by irradiating ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in the air. When the film thickness of the cured film layer was measured with a stylus type film thickness meter, it was 5 / m.

[0167] (2)中屈折率層の作製  [0167] (2) Preparation of medium refractive index layer

製造例 4で調製したジルコニァ粒子含有組成物(固形分濃度 4%)を、ワイヤーバ ーコーター(# 3)を用いて、(1)で作製したハードコート層上に塗工した後、オーブン 中 80°Cで 1分間乾燥した。続いて、窒素雰囲気下、高圧水銀ランプを用いて、 0. 6J /cm2の光照射条件で紫外線を照射することにより、硬化膜層を形成した。硬化膜 層の膜厚を反射分光計にて算出したところ 65nmであった。 After coating the zirconia particle-containing composition prepared in Production Example 4 (solid content concentration 4%) on the hard coat layer prepared in (1) using a wire bar coater (# 3), in the oven 80 ° Dry at C for 1 minute. Subsequently, a cured film layer was formed by irradiating ultraviolet rays under a light irradiation condition of 0.6 J / cm 2 using a high-pressure mercury lamp in a nitrogen atmosphere. The thickness of the cured film layer was calculated with a reflection spectrometer to be 65 nm.

[0168] (3)高屈折率層と低屈折率層の作製  [0168] (3) Preparation of high refractive index layer and low refractive index layer

実施例 1〜 3で得られた硬化性樹脂組成物 1〜 3を、それぞれ、ワイヤーバーコータ ( # 3)を用いて、(2)で作製した中屈折率層上に塗工した後、オーブン中 140°Cで 2 分間乾燥し、大気下、オーク製作所製コンベア式水銀ランプを用レ、、 0. 6j/cm2の 紫外線を照射することにより、膜厚が 0. 2 μ ΐηの硬化膜層を形成した。 The curable resin compositions 1 to 3 obtained in Examples 1 to 3 were each coated on the medium refractive index layer prepared in (2) using a wire bar coater (# 3), and then the oven. Medium Dry for 2 minutes at 140 ° C, use a conveyor-type mercury lamp manufactured by Oak Manufacturing Co., Ltd., 0.6j / cm 2 By irradiating with ultraviolet rays, a cured film layer having a film thickness of 0.2 μΐη was formed.

[0169] 実施例 5 [0169] Example 5

[積層体の作製]  [Production of laminate]

(1)ハードコート層の作製  (1) Preparation of hard coat layer

実施例 4 ( 1 )と同様にして作製した。  It was produced in the same manner as in Example 4 (1).

(2)帯電防止層の作製  (2) Preparation of antistatic layer

製造例 5で調製した ΙΤΟ粒子含有組成物(固形分濃度 4%)を、ワイヤーバーコ一 ター(# 3)を用いて、 (1)で作製したハードコート層上に塗工した後、オーブン中 80 °Cで 1分間乾燥した。続いて、窒素雰囲気下、高圧水銀ランプを用いて、 0. 6j/cm 2の光照射条件で紫外線を照射することにより、硬化膜層を形成した。硬化膜層の膜 厚を反射分光計にて算出したところ 65nmであった。  After coating the soot particle-containing composition (solid content concentration 4%) prepared in Production Example 5 on the hard coat layer prepared in (1) using a wire bar coater (# 3), Dry at 80 ° C for 1 minute. Subsequently, a cured film layer was formed by irradiating ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in a nitrogen atmosphere. The thickness of the cured film layer was calculated with a reflection spectrometer to be 65 nm.

(3)中屈折率層の作製  (3) Preparation of medium refractive index layer

実施例 4 (2)と同様にして作製した。  Example 4 It was produced in the same manner as (2).

(4)高屈折率層と低屈折率層の作製  (4) Preparation of high refractive index layer and low refractive index layer

実施例 1〜 3で得られた硬化性樹脂組成物 1〜 3を、それぞれ、ワイヤーバーコータ ( # 3)を用いて、(3)で作製した中屈折率層上に塗工した後、オーブン中 140°Cで 2 分間乾燥し、大気下、オーク製作所製コンベア式水銀ランプを用レ、、 0. 6j/cm2の 紫外線を照射することにより、膜厚が 0. 2 μ ΐηの硬化膜層を形成した。 After coating the curable resin compositions 1 to 3 obtained in Examples 1 to 3 on the medium refractive index layer prepared in (3) using a wire bar coater (# 3), respectively, Medium Dry at 140 ° C for 2 minutes, use a conveyor type mercury lamp manufactured by Oak Manufacturing Co., Ltd. in the air, and cure the film with a thickness of 0.2 μΐη by irradiating with 0.6 j / cm 2 of ultraviolet light. A layer was formed.

[0170] 実施例 6, 7 [0170] Examples 6, 7

[積層体の作製]  [Production of laminate]

(1)帯電防止層の作製  (1) Preparation of antistatic layer

製造例 5で調製した ΙΤΟ粒子の代わりに、製造例 6又は 7で調製した ΑΤΟ粒子含 有組成物(固形分濃度 5%)又は A1ドープ ΖηΟ粒子含有組成物(固形分濃度 4%)を 、ワイヤーバーコ一ター(# 3)を用いて、トリァセチルセルロースフィルム(LOFO製、 膜厚 80 z m)上に塗工した後、オーブン中 80°Cで 1分間乾燥した。続いて、窒素雰 囲気下、高圧水銀ランプを用いて、 0. 6jZcm2の光照射条件で紫外線を照射するこ とにより、硬化膜層を形成した。硬化膜層の膜厚を反射分光計にて算出したところ 65 nmであつ 7こ。 (2)ハードコート層の作製 Instead of the soot particles prepared in Production Example 5, the soot particle-containing composition (solid content concentration 5%) or A1-doped ΖηΟ particle-containing composition (solid content concentration 4%) prepared in Production Example 6 or 7 is used. Using a wire bar coater (# 3), it was coated on a triacetyl cellulose film (LOFO, film thickness 80 zm), and then dried in an oven at 80 ° C for 1 minute. Subsequently, a cured film layer was formed by irradiating ultraviolet rays under a light irradiation condition of 0.6 jZcm 2 using a high-pressure mercury lamp in a nitrogen atmosphere. When the thickness of the cured film layer was calculated with a reflection spectrometer, it was 7 at 65 nm. (2) Preparation of hard coat layer

製造例 3で調製したシリカ粒子含有ハードコート層用組成物(固形分濃度 50%)を 、ワイヤーバーコータ(# 12)を用いて、塗工した後、オーブン中 80°Cで 1分間乾燥 した。続いて、空気下、高圧水銀ランプを用いて、 0. 6j/cm2の光照射条件で紫外 線を照射することにより、硬化膜層を形成した。 The silica particle-containing hard coat layer composition (solid content concentration 50%) prepared in Production Example 3 was applied using a wire bar coater (# 12) and then dried in an oven at 80 ° C for 1 minute. . Subsequently, a cured film layer was formed by irradiating with ultraviolet rays under a light irradiation condition of 0.6 j / cm 2 using a high-pressure mercury lamp in air.

(3)中屈折率層の作製  (3) Preparation of medium refractive index layer

実施例 4 (2)と同様にして作製した。  Example 4 It was produced in the same manner as (2).

(4)高屈折率層と低屈折率層の作製  (4) Preparation of high refractive index layer and low refractive index layer

実施例 1〜 3で得られた硬化性樹脂組成物 1〜 3を、それぞれ、ワイヤーバーコータ ( # 3)を用いて、(3)で作製した中屈折率層上に塗工した後、オーブン中 140°Cで 2 分間乾燥し、大気下、オーク製作所製コンベア式水銀ランプを用レ、、 0. 6j/cm2の 紫外線を照射することにより、膜厚が 0. 2 mの硬化膜層を形成した。 After coating the curable resin compositions 1 to 3 obtained in Examples 1 to 3 on the medium refractive index layer prepared in (3) using a wire bar coater (# 3), respectively, Medium Dry at 140 ° C for 2 minutes, use a conveyor-type mercury lamp manufactured by Oak Manufacturing Co., Ltd., and irradiate with 0.6j / cm 2 of ultraviolet rays to form a cured film layer with a thickness of 0.2m Formed.

[0171] 実施例 8 [0171] Example 8

[積層体の作製]  [Production of laminate]

(1)ハードコート層の作製  (1) Preparation of hard coat layer

実施例 4 ( 1 )と同様にして作製した。  It was produced in the same manner as in Example 4 (1).

(2)高屈折率層と低屈折率層の作製  (2) Preparation of high refractive index layer and low refractive index layer

実施例 1〜 3で得られた硬化性樹脂組成物 1〜 3を、それぞれ、ワイヤーバーコータ ( # 3)を用いて、(1)で作製したハードコート層上に塗工した後、オーブン中 140°C で 2分間乾燥し、大気下、オーク製作所製コンベア式水銀ランプを用レ、、 0. 6j/cm 2の紫外線を照射することにより、膜厚が 0. 2 / mの硬化膜層を形成した。  After coating the curable resin compositions 1 to 3 obtained in Examples 1 to 3 on the hard coat layer prepared in (1) using a wire bar coater (# 3), respectively, Dry for 2 minutes at 140 ° C, and use a conveyor type mercury lamp manufactured by Oak Manufacturing Co., Ltd. Formed.

[0172] 評価例 1 [0172] Evaluation Example 1

[積層体の評価]  [Evaluation of laminate]

実施例 4〜8で得られた積層体の断面を、透過型電子顕微鏡で観察したところ、何 れの積層体においても、低屈折率層と高屈折率層が 2層に層分離していることが確 認された。このとき、低屈折率層が金属酸化物粒子が実質的に存在しない層であり、 高屈折率層が金属酸化物粒子が高密度に存在する層であった。  When the cross sections of the laminates obtained in Examples 4 to 8 were observed with a transmission electron microscope, the low refractive index layer and the high refractive index layer were separated into two layers in any laminate. It was confirmed. At this time, the low refractive index layer was a layer in which metal oxide particles were not substantially present, and the high refractive index layer was a layer in which metal oxide particles were present at high density.

図 11は、二層分離、分離せず (一部凝集)及び均一構造の各状態の概念を示す。 得られた反射防止用積層体の反射防止性を、分光反射率測定装置 (大型試料室 積分球付属装置 150— 09090を組み込んだ自記分光光度計 U— 3410、 日立製作 所 (株)製)により、波長 550nmの反射率を測定して評価した。具体的には、アルミの 蒸着膜における反射率を基準(100%)として、反射防止用積層体 (反射防止膜)の 反射率を測定した。その結果、何れの積層体も波長 550nmにおける反射率が 1 % 以下であった。 Figure 11 shows the concept of two-layer separation, no separation (partially agglomerated) and uniform structure. The anti-reflection properties of the resulting anti-reflection laminate were measured using a spectral reflectance measurement device (self-recording spectrophotometer U— 3410 incorporating Hitachi Integrating Sphere 150-09090, manufactured by Hitachi, Ltd.). The reflectance at a wavelength of 550 nm was measured and evaluated. Specifically, the reflectance of the antireflection laminate (antireflection film) was measured using the reflectance of the deposited aluminum film as a reference (100%). As a result, all the laminates had a reflectance of 1% or less at a wavelength of 550 nm.

産業上の利用可能性  Industrial applicability

[0173] 本発明の硬化性樹脂組成物は、一の塗膜から、基材上に 2層以上の層からなる硬 化膜を形成することができ、製造工程の簡素化を図ることができる。 [0173] The curable resin composition of the present invention can form a cured film composed of two or more layers on a substrate from one coating film, and can simplify the manufacturing process. .

本発明の硬化性樹脂組成物、その硬化膜は、例えば、プラスチック光学部品、タツ チパネル、フィルム型液晶素子、プラスチック容器、建築内装材としての床材、壁材、 人工大理石等の傷付き (擦傷)防止や汚染防止のための保護コーティング材;フィル ム型液晶素子、タツチパネル、プラスチック光学部品等の反射防止膜;各種基材の接 着剤、シーリング材;印刷インクのバインダー材等として、特に反射防止膜として好適 に用いることができる。  The curable resin composition of the present invention and the cured film thereof are scratched (scratched) such as plastic optical parts, touch panels, film-type liquid crystal elements, plastic containers, floor materials as building interior materials, wall materials, and artificial marble. ) Protective coating materials for prevention and contamination prevention; antireflection films for film-type liquid crystal elements, touch panels, plastic optical parts, etc .; adhesives for various substrates, sealing materials; It can be suitably used as a prevention film.

[0174] 本発明の積層体の製造方法は、 1の塗膜から、 2以上の層を形成することができる ため、二層以上の多層構造を有する積層体の製造工程を簡略化できる。従って、本 発明の積層体の製造方法は、特に、反射防止膜、レンズ、選択透過膜フィルタ等の 光学材料の形成に有利に用いることができる。また、得られる積層体は、フッ素含量 が高い層を含むことができることを利用して、耐候性が要求される基材に対する塗料 、耐候フィルム、コーティング、その他として好適に使用することができる。しかも、当 該積層体は、基材に対する密着性に優れ、耐擦傷性が高ぐ良好な反射防止効果 を付与することから、反射防止膜として極めて有用であり、各種の表示装置に適用す ることにより、その視認性を向上させることができる。  [0174] Since the method for producing a laminate of the present invention can form two or more layers from one coating film, the production process of a laminate having a multilayer structure of two or more layers can be simplified. Therefore, the method for producing a laminate of the present invention can be advantageously used particularly for the formation of optical materials such as antireflection films, lenses, and selective transmission film filters. Further, the obtained laminate can be suitably used as a paint, weather resistant film, coating, etc. for a substrate requiring weather resistance by utilizing the fact that a layer having a high fluorine content can be included. In addition, the laminate is excellent in adhesion to the base material and imparts a good antireflection effect with high scratch resistance. Therefore, the laminate is extremely useful as an antireflection film and is applied to various display devices. Therefore, the visibility can be improved.

Claims

請求の範囲 [1] 下記成分: Claims [1] The following ingredients: (A1)重合性不飽和基を有する有機化合物 (Ab)を結合させてなる数平均粒子径 1 nm以上 40nm未満の金属酸化物粒子(以下、「(A1)の金属酸化物粒子」という) (A1) Metal oxide particles having a number average particle diameter of 1 nm or more and less than 40 nm formed by bonding an organic compound (Ab) having a polymerizable unsaturated group (hereinafter referred to as “metal oxide particles of (A1)”) (A2)数平均粒子径 40nm以上 200nm以下の金属酸化物粒子(以下、「(A2)の 金属酸化物粒子」という) (A2) Metal oxide particles having a number average particle diameter of 40 nm to 200 nm (hereinafter referred to as “(A2) metal oxide particles”) (B)エチレン性不飽和基含有含フッ素重合体  (B) Ethylenically unsaturated group-containing fluoropolymer (C) (B)エチレン性不飽和基含有含フッ素重合体の溶解性が高い、 1種又は 2種 以上の溶剤(以下、「(C)速揮発溶剤」という)  (C) (B) One or more solvents with high solubility of the ethylenically unsaturated group-containing fluoropolymer (hereinafter referred to as “(C) fast volatile solvent”) (D) (A1)及び (A2)の金属酸化物粒子の分散安定性が高ぐかつ、(C)速揮発溶 剤と相溶性である、 1種又は 2種以上の溶剤(以下、「(D)遅揮発溶剤」という) を含み、かつ、(C)速揮発溶剤の相対蒸発速度が、(D)遅揮発溶剤の相対蒸発速 度よりも大きいことを特徴とする硬化性樹脂組成物。  (D) One or two or more solvents (hereinafter referred to as “(”) that have high dispersion stability of the metal oxide particles of (A1) and (A2) and are compatible with (C) the fast volatile solvent. D) a slow volatile solvent ”, and (C) the relative evaporation rate of the fast volatile solvent is higher than (D) the relative evaporation rate of the slow volatile solvent. [2] (C)速揮発溶剤は、(A1)及び (A2)の金属酸化物粒子の分散安定性が低い、 1 種又は 2種以上の溶剤であり、(D)遅揮発溶剤は、(B)エチレン性不飽和基含有含 フッ素重合体の溶解性が低い、 1種又は 2種以上の溶剤であることを特徴とする請求 項 1に記載の硬化性樹脂組成物。 [2] (C) The fast volatile solvent is one or more solvents having low dispersion stability of the metal oxide particles (A1) and (A2), and (D) the slow volatile solvent is ( 2. The curable resin composition according to claim 1, wherein the curable resin composition is one or more solvents having low solubility of the ethylenically unsaturated group-containing fluoropolymer. [3] 前記 (A1)の金属酸化物粒子が、アルミニウム、ジルコニウム、チタニウム、亜鉛、ゲ ノレマニウム、インジウム、スズ、アンチモン及びセリウムよりなる群力、ら選ばれる少なく とも一つの元素の酸化物粒子であることを特徴とする請求項 1又は 2に記載の硬化性 樹脂組成物。 [3] The metal oxide particles of (A1) are oxide particles of at least one element selected from the group force consisting of aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony and cerium. The curable resin composition according to claim 1, wherein the curable resin composition is provided. [4] 前記 (A2)の金属酸化物粒子が、シリカを主成分とする粒子であることを特徴とする 請求項 1〜3のいずれ力 4項に記載の硬化性樹脂組成物。  [4] The curable resin composition according to any one of claims 1 to 3, wherein the metal oxide particles (A2) are particles mainly composed of silica. [5] 前記 (A2)の金属酸化物粒子が、前記重合性不飽和基を有する有機化合物 (Ab) と結合されていることを特徴とする請求項 1〜4のいずれ力 1項に記載の硬化性樹脂 組成物。 [5] The force of any one of [1] to [4], wherein the metal oxide particles (A2) are bonded to the organic compound (Ab) having the polymerizable unsaturated group. Curable resin composition. [6] 前記有機化合物 (Ab)が、重合性不飽和基に加えて、下記式 (A— 1)に示す基を 有することを特徴とする請求項 1〜5のいずれ力 1項に記載の硬化性樹脂組成物。 [化 22] [6] The force of any one of claims 1 to 5, wherein the organic compound (Ab) has a group represented by the following formula (A-1) in addition to the polymerizable unsaturated group: Curable resin composition. [Chemical 22] |_|  | _ | —— U— C— N— (A— 1)  —— U— C— N— (A— 1) li  li V  V [式中、 Uは、 NH、〇(酸素原子)又は S (ィォゥ原子)を示し、 Vは、〇又は Sを示す。 [In the formula, U represents NH, ◯ (oxygen atom) or S (Y atom), and V represents ◯ or S. ] ] [7] 前記有機化合物 (Ab)力 S、分子内にシラノール基を有する化合物又は加水分解に よってシラノール基を生成する化合物であることを特徴とする請求項 1〜6のいずれ 力 1項に記載の硬化性樹脂組成物。  7. The organic compound (Ab) force S, a compound having a silanol group in the molecule, or a compound that generates a silanol group by hydrolysis, according to any one of claims 1 to 6, Curable resin composition. [8] 前記 (B)エチレン性不飽和基含有含フッ素重合体が、 1個のイソシァネート基と、少 なくとも 1個のエチレン性不飽和基とを含有する化合物(B— 1)と、水酸基含有含フッ 素重合体 (B— 2)と、を反応させて得られることを特徴とする請求項 1〜7のいずれか 1項に記載の硬化性樹脂組成物。  [8] The (B) ethylenically unsaturated group-containing fluoropolymer comprises a compound (B-1) containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group. 8. The curable resin composition according to claim 1, which is obtained by reacting the containing fluorine-containing polymer (B-2). [9] 前記水酸基含有含フッ素重合体 (B— 2)力 下記構造単位(a) 20〜70モル%、 (b ) 10〜70モノレ%及び((:)5〜70モノレ%を含んでなり、かつ、ゲルパーミエーシヨンク 口マトグラフィ一で測定したポリスチレン換算数平均分子量が 5, 000〜500, 000で ある請求項 8に記載の硬化性樹脂組成物。  [9] Hydroxyl-containing fluorine-containing polymer (B-2) force comprising the following structural units (a) 20 to 70 mol%, (b) 10 to 70 monole% and ((:) 5 to 70 monole% The curable resin composition according to claim 8, wherein the number average molecular weight in terms of polystyrene measured by gel permeation chromatography is 5,000 to 500,000. (a)下記一般式(1)で表される構造単位。  (a) A structural unit represented by the following general formula (1). (b)下記一般式 (2)で表される構造単位。  (b) A structural unit represented by the following general formula (2). (c)下記一般式 (3)で表される構造単位。  (c) A structural unit represented by the following general formula (3). [化 23]  [Chemical 23]
Figure imgf000060_0001
Figure imgf000060_0001
[式中、 R1はフッ素原子、フルォロアルキル基、又は— OR2で表される基(R2はアルキ ル基、又はフルォロアルキル基を示す)を示す] [Wherein R 1 represents a fluorine atom, a fluoroalkyl group, or a group represented by —OR 2 (R 2 represents an alkyl group or a fluoroalkyl group)] [化 24] H R3 [Chemical 24] HR 3 — C-C― (2)  — C-C― (2) H R4 HR 4 [式中、 R3は水素原子又はメチル基を、 R4はアルキル基、—(CH ) OR5若しくは [Wherein R 3 represents a hydrogen atom or a methyl group, R 4 represents an alkyl group, — (CH 3) OR 5 or 2  2 OCOR5で表される基(R5はアルキル基、又はグリシジル基を、 Xは 0又は 1の数を示 す)、カルボキシル基、又はアルコキシカルボ二ル基を示す] A group represented by OCOR 5 (R 5 represents an alkyl group or a glycidyl group, X represents a number of 0 or 1), a carboxyl group, or an alkoxycarbonyl group] [化 25]  [Chemical 25] H R6 HR 6 — C— C (3) — C— C ( 3 ) H (CH2)vOR7 H (CH 2 ) v OR 7 [式中、 R6は水素原子、又はメチル基を、 R7は水素原子、又はヒドロキシアルキル基 を、 Vは 0又は 1の数を示す] [Wherein R 6 represents a hydrogen atom or a methyl group, R 7 represents a hydrogen atom or a hydroxyalkyl group, and V represents a number of 0 or 1]
[10] さらに、前記水酸基含有含フッ素重合体 (B— 2)が、ァゾ基含有ポリシロキサンィ匕 合物に由来する下記構造単位(d) 0.:!〜 10モル%を含む請求項 8又は 9に記載の 硬化性樹脂組成物。 [10] The hydroxyl group-containing fluoropolymer (B-2) further comprises the following structural unit (d) derived from an azo group-containing polysiloxane compound: 0.:! To 10 mol%. The curable resin composition according to 8 or 9. (d)下記一般式 (4)で表される構造単位。  (d) A structural unit represented by the following general formula (4). [化 26]  [Chemical 26]
Figure imgf000061_0001
Figure imgf000061_0001
[式中、 R8及び R9は、同一でも異なっていてもよぐ水素原子、アルキル基、ハロゲン 化アルキル基、又はァリール基を示す] [Wherein R 8 and R 9 may be the same or different and each represents a hydrogen atom, an alkyl group, a halogenated alkyl group, or an aryl group]
[11] 前記水酸基含有含フッ素重合体 (B— 2)力 S、前記構造単位 (d)を下記構造単位 (e )の一部として含むことを特徴とする請求項 10に記載の硬化性樹脂組成物。 [11] The curable resin according to claim 10, comprising the hydroxyl group-containing fluoropolymer (B-2) force S and the structural unit (d) as a part of the following structural unit (e). Composition. (e)下記一般式 (5)で表される構造単位。  (e) A structural unit represented by the following general formula (5). [化 27] HCHII[Chemical 27] HCHII
Figure imgf000062_0001
Figure imgf000062_0001
RCHII  RCHII [式中、 R1Q〜R13は水素原子、アルキル基、又はシァノ基を示し、 R14〜R17は水素原 子又はアルキル基を示し、 p、 qは:!〜 6の数、 s、 tは 0〜6の数、 yは:!〜 200の数を示 す。 ] [Wherein R 1Q to R 13 represent a hydrogen atom, an alkyl group, or a cyano group, R 14 to R 17 represent a hydrogen atom or an alkyl group, and p and q are numbers of:! To 6, s, t is a number from 0 to 6, y is a number from:! to 200. ]
[12] さらに、前記水酸基含有含フッ素重合体 (B— 2)が、下記構造単位 (f) 0. :!〜 5モ ル%を含む請求項 8〜: 11のいずれ力、 1項に記載の硬化性樹脂組成物。  [12] Furthermore, the hydroxyl group-containing fluoropolymer (B-2) contains the following structural unit (f) 0.:! To 5 mol%, any one of claims 8 to 11: Curable resin composition. (f )下記一般式 (6)で表される構造単位。  (f) A structural unit represented by the following general formula (6). [化 28]
Figure imgf000062_0002
[Chemical 28]
Figure imgf000062_0002
[式中、 R1Sは乳化作用を有する基を示す] [Wherein R 1S represents an emulsifying group]
[13] 前記化合物(B— 1)が、 2—(メタ)アタリロイルォキシェチルイソシァネートである請 求項 8〜: 12のいずれ力 1項に記載の硬化性樹脂組成物。 [13] The curable resin composition according to any one of Claims 8 to 12, wherein the compound (B-1) is 2- (meth) atalylooxychetyl isocyanate. [14] さらに、成分 (E)少なくとも 2個以上の(メタ)アタリロイル基を含有する多官能 (メタ) アタリレートイ匕合物及び/又は少なくとも 1個以上の(メタ)アタリロイル基を含有する 含フッ素 (メタ)アタリレートイ匕合物を含有することを特徴とする請求項 1〜: 13のいずれ 力、 1項に記載の硬化性樹脂組成物。 [14] In addition, the component (E) contains at least two (meth) atalyloyl groups, and / or contains at least one (meth) atalyloyl group. 14. The curable resin composition according to any one of claims 1 to 13, wherein the curable resin composition comprises a fluorine (meth) attale toy compound. [15] さらに、成分 (F)ラジカル重合開始剤を含むことを特徴とする請求項 1〜: 14のいず れか 1項に記載の硬化性樹脂組成物。 [15] The curable resin composition according to any one of [1] to [14], further comprising a component (F) a radical polymerization initiator. [16] 紫外線硬化性であることを特徴とする請求項:!〜 15のいずれか 1項に記載の硬化 性樹脂組成物。 [16] The curable resin composition according to any one of [15] to [15], which is ultraviolet curable. [17] 請求項:!〜 16のいずれか 1項に記載の硬化性樹脂組成物を硬化させて得られ、 2 層以上の多層構造を有することを特徴とする硬化膜。  [17] Claims: A cured film obtained by curing the curable resin composition according to any one of! To 16, and having a multilayer structure of two or more layers. [18] (A1)及び (A2)の金属酸化物粒子が高密度に存在する 1以上の層と、(A1)及び (A2)の金属酸化物粒子が実質的に存在しない 1以下の層からなる二層以上の層構 造を有することを特徴とする請求項 17に記載の硬化膜。 [18] One or more layers in which the metal oxide particles of (A1) and (A2) are present at high density, and (A1) and 18. The cured film according to claim 17, having a layer structure of two or more layers composed of one or less layers substantially free of metal oxide particles (A2). [19] 基材と、その上に多層構造を有する積層体の製造方法であって、 [19] A method for producing a substrate and a laminate having a multilayer structure thereon, 前記基材上又は基材上に形成された層の上に、請求項 1〜: 16のいずれ力 4項に 記載の硬化性樹脂組成物を塗布して塗膜を形成し、  A coating film is formed by applying the curable resin composition according to any one of claims 1 to 16 on the substrate or a layer formed on the substrate, この 1の塗膜から溶媒を蒸発させることにより、 2以上の層を形成することを特徴とす る積層体の製造方法。  A method for producing a laminate, wherein two or more layers are formed by evaporating a solvent from the coating film of 1. [20] 前記 2以上の層の各層が、(A1)及び/又は (A2)の金属酸化物粒子が高密度に 存在する層又は (A1)及び (A2)の金属酸化物粒子が実質的に存在しなレ、層であつ て、少なくとも 1層は (A1)及び/又は (A2)の金属酸化物粒子が高密度に存在する 層であることを特徴とする請求項 19に記載の積層体の製造方法。  [20] Each of the two or more layers is substantially composed of a layer in which the metal oxide particles (A1) and / or (A2) are present in high density or the metal oxide particles (A1) and (A2). 20. The laminate according to claim 19, wherein at least one layer is a layer in which the metal oxide particles (A1) and / or (A2) are present at a high density. Manufacturing method. [21] 前記 2以上の層が、 2層であることを特徴とする請求項 20に記載の積層体の製造 方法。  21. The method for manufacturing a laminate according to claim 20, wherein the two or more layers are two layers. [22] さらに、前記 2以上の層を放射線照射することにより硬化させることを特徴とする請 求項 19〜21のいずれ力 1項に記載の積層体の製造方法。  [22] The method for producing a laminate according to any one of claims 19 to 21, wherein the two or more layers are cured by irradiation with radiation. [23] 積層体が光学用部品であることを特徴とする請求項 19〜22のいずれ力 1項に記載 の積層体の製造方法。 [23] The method for producing a laminate according to any one of [19] to [22], wherein the laminate is an optical component. [24] 積層体が反射防止膜であることを特徴とする請求項 19〜22のいずれ力 1項に記載 の積層体の製造方法。  [24] The method for producing a laminate according to any one of [19] to [22], wherein the laminate is an antireflection film. [25] 前記積層体が、基材上に、少なくとも、高屈折率層及び低屈折率層が、基材に近 い側からこの順に積層されている反射防止膜であり、請求項 21に記載の 2層が、 高屈折率層及び  [25] The antireflection film according to claim 21, wherein the laminate is an antireflection film in which at least a high refractive index layer and a low refractive index layer are laminated in this order from the side close to the substrate. The two layers are a high refractive index layer and 低屈折率層からなる  Consists of low refractive index layer ことを特徴とする請求項 21に記載の積層体の製造方法。  The method for producing a laminate according to claim 21, wherein [26] 低屈折率層の 589nmにおける屈折率が 1. 20〜: 1. 55であり、 [26] The refractive index of the low refractive index layer at 589 nm is 1.20 to: 1.55, 高屈折率層の 589nmにおける屈折率が 1. 50-2. 20であって、低屈折率層の屈 折率より高いことを特徴とする請求項 25に記載の積層体の製造方法。  26. The method for producing a laminate according to claim 25, wherein the refractive index at 589 nm of the high refractive index layer is 1.50-2.20, which is higher than the refractive index of the low refractive index layer. [27] 前記積層体が、基材上に、少なくとも、中屈折率層、高屈折率層及び低屈折率層 力 基材に近い側からこの順に積層されている反射防止膜であり、請求項 21に記載 の 2層が [27] The laminate is at least a medium refractive index layer, a high refractive index layer, and a low refractive index layer on a substrate. The antireflection film is laminated in this order from the side close to the force base material, and the two layers according to claim 21 高屈折率層及び  High refractive index layer and 低屈折率層からなる  Consists of low refractive index layer ことを特徴とする請求項 21に記載の積層体の製造方法。  The method for producing a laminate according to claim 21, wherein [28] 低屈折率層の 589nmにおける屈折率が 1. 20〜: 1. 55であり、 [28] The refractive index of the low refractive index layer at 589 nm is 1.20 to: 1.55, 中屈折率層の 589nmにおける屈折率が 1. 50〜: 1. 90であって、低屈折率層の屈 折率より高ぐ  The refractive index of the middle refractive index layer at 589 nm is 1.50 to: 1.90, which is higher than the refractive index of the low refractive index layer. 高屈折率層の 589nmにおける屈折率が 1. 51〜2. 20であって、中屈折率層の屈 折率より高いことを特徴とする請求項 27に記載の積層体の製造方法。  28. The method for producing a laminate according to claim 27, wherein the refractive index at 589 nm of the high refractive index layer is 1.51 to 2.20, which is higher than the refractive index of the medium refractive index layer. [29] さらに、基材上に、ハードコート層及び Z又は帯電防止層を形成することを特徴と する請求項 25〜28のいずれか 1項に記載の積層体の製造方法。  [29] The method for producing a laminate according to any one of [25] to [28], further comprising forming a hard coat layer and Z or an antistatic layer on a substrate. [30] 請求項 19〜29のいずれ力 1項に記載された積層体の製造方法により、製造された 積層体。  [30] A laminate produced by the laminate production method according to any one of [19] to [29].
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