WO2006046756A1 - Porous carbon nitride material and method for preparation thereof - Google Patents
Porous carbon nitride material and method for preparation thereof Download PDFInfo
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- WO2006046756A1 WO2006046756A1 PCT/JP2005/020149 JP2005020149W WO2006046756A1 WO 2006046756 A1 WO2006046756 A1 WO 2006046756A1 JP 2005020149 W JP2005020149 W JP 2005020149W WO 2006046756 A1 WO2006046756 A1 WO 2006046756A1
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- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/0828—Carbonitrides or oxycarbonitrides of metals, boron or silicon
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- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
Definitions
- the present invention relates to a carbon nitride porous body and a method for producing the same, and more specifically, a method for producing a carbon nitride porous body in which the ratio of carbon atoms to nitrogen atoms (CZN ratio) can be easily controlled, and The carbon nitride porous body obtained in this way.
- CZN ratio ratio of carbon atoms to nitrogen atoms
- FIG. 10 is a flowchart showing a method for producing a nitrogen-containing carbon-based material according to the prior art. Each process will be described.
- Step S 1 100 Nitrogen-containing porous metal oxides (for example, porous materials composed of metal oxides and composite metal oxides, such as silica mesoporous materials, zeolites, crosslinked clays, etc.) By introducing an organic compound (for example, an organic compound containing a nitrogen atom, a nitrogen-containing bicyclic compound, an amine, an imine, a nitrile, etc.) and thermally decomposing the nitrogen-containing organic compound, A nitrogen-containing carbon-based material whose skeleton is formed by carbon and nitrogen atoms is deposited in the pores.
- an organic compound for example, an organic compound containing a nitrogen atom, a nitrogen-containing bicyclic compound, an amine, an imine, a nitrile, etc.
- a metal oxide porous body is placed in the reaction tube, and heated to a predetermined temperature while introducing an inert gas such as nitrogen or argon into the reaction tube.
- an inert gas such as nitrogen or argon
- a nitrogen-containing organic compound in a gaseous state is introduced into the reaction tube while maintaining the heating state, thereby introducing the nitrogen-containing organic compound into the pores of the metal oxide porous body for a predetermined time.
- Perform the CVD reaction As a result, a nitrogen-containing carbon-based material having a skeleton formed of carbon atoms and nitrogen atoms is deposited in the pores of the metal oxide porous body.
- Step S 1 2 0 0 A porous body made of a nitrogen-containing carbon-based material is obtained by dissolving and removing the metal oxide porous body.
- the metal oxide porous body is chemically dissolved using hydrofluoric acid or alkali.
- a specific surface area of 600 m 2 / g or more, an average pore diameter of 1 to 5 nm, and carbon atoms A nitrogen-containing carbon-based porous material having an atomic ratio of C to N (CZN) of 3.3 3 to 12.5 is obtained.
- Patent Document 1 Japanese Unexamined Patent Application Publication No. 2004-1 68 58 7 Disclosure of Invention
- the nitrogen-containing carbon-based porous material described in Patent Document 1 has a higher nitrogen content than the conventional homogeneous porous material, there is a limit in trying to increase the nitrogen content further. It was. For this reason, there were limits to the adjustment of various derived characteristics such as adsorption performance. That is, the method for producing a nitrogen-containing carbon-based porous material described in Patent Document 1 uses a single compound containing both components as a nitrogen source and a carbon source as raw materials, and uses this as a starting material. Therefore, the C / N ratio of the resulting product was determined by the starting material compound, and there were limits to increasing the nitrogen ratio and adjusting the CZN ratio to an arbitrary value.
- an object of the present invention is to provide a method for easily producing a carbon nitride porous body having an intended nitrogen content.
- the “carbon nitride” referred to in the present specification is not limited to a material having the chemical formula C 3 N 4, and intends a material in which the ratio of nitrogen atoms to carbon atoms is represented by an arbitrary ratio. Means for solving the problem
- the method for producing a carbon nitride porous body (MCN) according to the present invention includes a step of mixing a silica porous body, a nitrogen source, and a carbon source, a step of heating a mixture obtained by the mixing step, and the heating A step of removing the porous silica from the reaction product obtained by the step of producing a porous carbon nitride as described above.
- the porous silica material functions as a template. Specifically, pores selected from the group consisting of MCM-48, SBA-15, KIT-5, and SBA-1 are provided. A porous silica material having a structure communicating with each other can be mentioned and used.
- the nitrogen source As the nitrogen source, it easily diffuses into the porous silica and is thermally decomposed to form nitride. Although it is not particularly limited as long as it can be produced, a nitrogen-containing compound such as amines or diaryls is preferable. More specifically, one or more selected from the group consisting of aliphatic amines, aromatic amines, ammonia, aliphatic nitriles, aromatic nitriles, nitrogen-containing heterocyclic compounds, and hydrazine are used.
- the carbon source is not particularly limited as long as it can easily diffuse into the porous silica and can be pyrolyzed to produce a carbide, and preferably includes a halogenated hydrocarbon or a derivative thereof.
- octalogated hydrocarbon one or more selected from the group consisting of chlorinated hydrocarbon, brominated hydrocarbon, and iodinated hydrocarbon are used.
- chlorinated hydrocarbon one or more selected from the group consisting of carbon tetrachloride, black mouth form, methylene chloride, chloroform, and dichloromethane are used.
- brominated hydrocarbon include carbon tetrabromide and bromoform.
- iodinated hydrocarbon include iodomethane and iodinated tan.
- the heating step may further include a step of polymerizing the mixture at a first temperature and a step of carbonizing the mixture at a second temperature higher than the first temperature.
- the polymerization step is preferably performed by heating the mixture at the first temperature for 1 hour to 6 hours, which is selected from a temperature range of 70 to 1550 in the atmosphere.
- the carbonizing step includes heating the mixture at a second temperature selected from a temperature range of 50.00 to 800 in a nitrogen atmosphere or an inert gas atmosphere for 4 to 8 hours. Is preferred.
- the removal process of the porous silica is performed by selectively dissolving the porous silica using hydrofluoric acid or an alkaline aqueous solution, and filtering and recovering the reaction product (nitrogen carbon porous body) as an insoluble residue. .
- a step of washing and drying the reaction product after the removing step may be further included.
- the ratio (C / N) of the carbon atoms (C) to the nitrogen atoms (N) has a relationship of 0.25 ⁇ C /N ⁇ 3.0 is satisfied, and the carbon atom and the nitrogen atom are a single bond or a double bond, thereby achieving the above object.
- the specific surface area of the MCN porous body is preferably 50 Om ⁇ / g or more from the viewpoint of improving adsorption characteristics.
- the pore diameter of the MCN porous body may be 4 nm or more and 10 nm or less.
- the method for producing a carbon nitride (MCN) porous body according to the present invention includes a step of mixing a silica porous body, a nitrogen source, and a carbon source, a step of heating a mixture obtained by the mixing step, and a step of heating Removing the porous silica from the reaction product obtained by the step. Since a nitrogen source and a carbon source are used separately as starting materials, the amount of nitrogen during charging can be easily controlled. As a result, the carbon nitride porous body obtained by the heating step can have an intended nitrogen content. In addition, a carbon nitride porous body having a desired shape, pore diameter, and specific surface area can be obtained by appropriately selecting a silica porous body as a replica. Since the carbon nitride porous body obtained in this way can contain a larger amount of nitrogen than before, the amount of adsorption can be improved.
- Fig. 1 Flow chart showing a method for producing a carbon nitride porous material (MCN) according to the present invention.
- Fig. 2 Schematic diagram of carbon nitride porous material (MCN) according to the present invention
- FIG. 4 Electron micrographs (a) and (b) and elemental mapping (c) and (d) of MCN obtained in Example 1
- Fig. 5 Electron energy loss spectrum of MCN obtained in Example 1
- Fig. 6 Nitrogen absorption of MCN complex (a) and SB A- 15 (b) obtained in Example 1 Diagram showing desorption isotherm
- Fig. 7 Diagram showing the pore size distribution of the MCN composite (a) and SBA-15 (b) obtained in Example 1
- Fig. 9 XPS wide spectrum (a) of MCN obtained in Example 1, C ls spectrum (b) of MCN, and N ls spectrum (c) of MCN Flow chart showing a method for producing a nitrogen-carbon material Explanation of symbols
- FIG. 1 is a flow chart showing a method for producing a carbon nitride porous material (M C N) according to the present invention. Each process will be described.
- Step S 1 1 0 A porous silica material, a nitrogen source and a carbon source are mixed.
- the silica porous body means an arbitrary structure made of silica in which pore structures are connected three-dimensionally or two-dimensionally.
- a structure may have a hexagonal structure, a cubic structure, or an irregular structure.
- the hexagonal structure is a hexagonal structure in which the pores in the porous silica material are arranged, and includes both a known two-dimensional hexagonal structure and a three-dimensional hexagonal structure.
- the cubic structure is a cubic structure in which the pores in the porous silica are arranged.
- Such a porous silica is preferably MCM-48 having a cubic structure, SBA-1, SBA-1 having a structure in which one-dimensional medium-sized pores are connected to fine pores, and pores.
- the silica porous body may be one kind or a combination of two or more kinds.
- the nitrogen source is a nitrogen-containing compound, and in particular, may be amines or nitriles.
- Such a nitrogen-containing compound is preferably at least one selected from the group consisting of aliphatic amines, aromatic amines, ammonia, aliphatic nitriles, aromatic nitriles, nitrogen-containing heterocyclic compounds, and hydrazine.
- the carbon source is a halogenated hydrocarbon or a derivative thereof.
- At least one such hydrogen halide is selected from the group consisting of chlorinated hydrocarbons, brominated hydrocarbons and iodinated hydrocarbons. Examples of the chlorohydrocarbon include, but are not limited to, carbon tetrachloride, black mouth form, methylene chloride, chloromethane, or dichloromethane.
- Brominated hydrocarbons include, but are not limited to, for example, carbon tetrabromide or promoform.
- the iodinated hydrocarbon can be, for example, iodomethane or iodinated tan, but is not limited thereto.
- Nitrogen and carbon sources can be adjusted so that the ratio of carbon atom (C) to nitrogen atom (N) (CZN) satisfies the relationship CZN ⁇ 0.25. When the C / N ratio was less than 0.25, a carbon nitride porous body could not be obtained.
- the CZN ratio can preferably be adjusted in the range of 0.2 5 ⁇ C / N ⁇ 3.0.
- Step S 1 20 The mixture obtained in Step S 1 10 is heated. As a result, the mixture reacts and a carbon nitride porous body can be obtained. More specifically, the mixture is polymerized at a first temperature and then the mixture is carbonized at a second temperature that is higher than the first temperature. Polymerization is carried out by heating in the atmosphere at a first temperature selected from a temperature range of 70 to 150 for 1 to 4 hours.
- any heating means such as a hot plate can be used for heating.
- the nitrogen source in the mixture is polymerized, and the mixture containing the polymerized nitrogen source is refluxed.
- the mixture is located in the pores of the porous silica material by stirring them. This gives a well-ordered carbon nitride porous body (MCN).
- Carbonization is performed by heating at a second temperature selected from a temperature range of 500 to 800 in a nitrogen atmosphere or an inert gas atmosphere for 4 to 8 hours.
- Any heating means such as an electric furnace can be used for heating.
- the polymerized nitriding source is carbonized by the carbon source (that is, the nitrogen atom and the carbon atom are bonded by a double bond or a double bond).
- the reaction product obtained in the pores of the porous silica material is a carbon nitride porous material (MCN).
- MCN carbon nitride porous material
- the polymer obtained by polymerization may be dried to form fine particles. Thereby, the carbonization time can be shortened.
- Step S 1 30 The obtained reaction product is removed from the porous silica material. By filtering the porous silica using hydrofluoric acid or alkaline aqueous solution, only the reactant MCN can be extracted. An arbitrary aqueous solution capable of dissolving the porous silica can be used. After step S 1 30, the extracted reactant may be washed and dried. For cleaning, pure water, distilled water, or ethanol is used.
- FIG. 2 is a schematic view of a carbon nitride porous body (MCN) according to the present invention.
- the carbon nitride porous body (MCN) 200 is an example when S B A- 15 is used as the porous silica body in the method described with reference to FIG.
- the MCN 200 includes a pillar portion (indicated by a cylindrical bar piece in FIG. 2) and a bridge portion (indicated by a cylindrical small piece in FIG. 2) made of carbon nitride. It should be understood that the structure of MCN 200 depends on the selected silica porous material.
- the pillars are regularly arranged in a hexagonal shape when S B A— 15 is used.
- the bridges are much smaller than the pillars and connect the pillars together. Both the column part and the bridge part are made of carbon nitride.
- the pore diameter is intended to be the distance between the pillars.
- the pore size of MC N 200 according to the present invention is 4: 1111 to 1 01111. Since such a pore diameter corresponds to the diameter of various biological substances such as proteins, these biological substances can be immobilized in the MCN 200 pores.
- the specific surface area of MCN 200 is more than 500 m 2 Zg, which can be advantageous for large-scale and delicate adsorption of external substances and substance sensing based thereon.
- the ratio (C / N) of carbon atom (C) to nitrogen atom (N) in MCN 20 0 is CZN ⁇ 0.25, preferably 0.225 ⁇ CZN ⁇ 3.0.
- MCN 200 obtained by the production method according to the present invention can increase the amount of nitrogen as compared with the conventional method, and thus has a large number of basic adsorption sites. As a result, excellent adsorptivity can be expected.
- the carbon nitride porous body having the chemical formula C 3 N 4 it can be used as a semiconductor or high-strength material, which is the original property of carbon nitride, as a substitute for semiconductor devices or industrial diamond.
- the reaction product thus obtained was subjected to structural analysis using an X-ray diffractometer (Siemens D5005, Brucker AX S, UK).
- the operating conditions of the X-ray diffraction apparatus were 40 kV / 50 mA, scanning speed of 0.5 ° 20 minutes using Cu— ⁇ rays.
- the X-ray diffraction pattern of MCN was compared with the X-ray diffraction pattern of the porous silica (SBA-1 5 in Example 1).
- the reactants were observed using a high-resolution transmission electron microscope (J EOL-3100 F and JEOL-3100 FEF, JEOL, Japan).
- the obtained reaction product was made into particles using a mortar and dispersed on a holey carbon film located on a grid made of Cu to prepare a sample.
- the operating conditions of the transmission electron microscope were an acceleration voltage of 300 kV and a resolution of 150,000 to 120,000 times.
- energy loss spectroscopy was performed using these high-resolution transmission electron microscopes.
- elemental matbing was also performed at a resolution of 5 A using a standard 3-window procedure with a slit width of 20 eV.
- the analysis region where energy loss and element mapping were performed was a region with a diameter of 100 to 200 nm.
- Nitrogen adsorption / desorption isotherms were measured using a specific surface area / pore distribution measuring device (Au tosorb 1, Quantachrom, USA). Samples were measured at the 5 2 3 K at pressure 1 0- 5 h P a following 3 hours degassed after 7 7 K. By measuring the adsorption / desorption isotherm, the presence or absence of pores and the shape and size of the pores can be determined. The pore structure was analyzed using the B arrett-Jayner-Halenda method. Here, the MCN complex before removing SBA-15 (ie, the state where MCN is located in SBA-15) is used as a sample.
- SBA-15 the state where MCN is located in SBA-15
- the adsorption / desorption isotherm of the MCN complex was compared with the adsorption / desorption isotherm of SBA-15.
- Infrared absorption spectra were measured using a Fourier transform infrared spectrophotometer (Nicolet Nexus 6700, Thermo Electron, USA). The measurement wavelength region was from 400 cm- 1 to 9500 cm- 1 .
- X-ray photoelectron spectroscopic analysis was performed using an X-ray photoelectron spectrometer (E s c a la ab 20 00, VG Sci entif i c, UK). The analysis area was about 30 m in diameter. The above results are shown in FIGS. 3 to 9 and described in detail.
- FIG. 3 is an X-ray diffraction pattern of MCN (a) and SBA-15 (b) obtained in Example 1.
- the MCN X-ray diffraction pattern (a) was not due to the diffraction of the remaining SBA-15 itself.
- the MCN showed a single broad diffraction peak at 25.8 °.
- the interlayer distance d of MCN was found to be 3.42A. This value almost coincided with the interlayer distance d obtained with the non-porous carbon nitride sphere.
- MCN is composed of dalaphen layers with carbon and nitrogen atoms arranged in an evening-bostratic (turbulent) form. From the above, it was shown that the obtained MCN reflects the periodically arranged pore structure of SBA_15.
- FIG. 4 shows electron micrographs (a) and (b) and element mappings (c) and (d) of the MCN obtained in Example 1.
- Fig. 4 (a) is a photograph observed from the [1 0 0] direction of MCN, and a striped pattern was confirmed.
- Fig. 4 (a) bright stripes indicate pore walls and dark stripes indicate pores.
- the inset in Fig. 4 (a) is a Fourier-transform light diffraction pattern obtained from the image, and shows a one-dimensional array of spots along the [1 0 0] direction. This indicates that there are no crystals arranged along the axis of the empty channel.
- Figure 4 (b) is a cross-sectional view of the MCN (ie, a photograph observed from the direction perpendicular to the [1 0 0] direction). From Fig. 4 (b), it can be seen that the MCN porous bodies are arranged in the form of hexagonal crystals (ie, honeycomb). The inset in Fig. 4 (b) is the Fourier transform light diffraction pattern. From these, it can be seen that this is a hexagonal arrangement peculiar to the space group p 6 mm.
- Figures 4 (c) and 4 (d) show the elemental mapping of carbon (C) and nitrogen (N), respectively. Other elements were not detected.
- FIG. 5 is a diagram showing an electron energy loss spectrum of MCN obtained in Example 1.
- the spectrum showed peaks at 2 84 eV and 40 1 eV. This These peaks suggest that there are carbon atoms (C k edge: absorption by carbon k-shell electrons) and nitrogen atoms (Nk edge: absorption by nitrogen k-shell electrons), respectively. Also, since the C k edge has a sharp peak shape, this indicates that the carbon k-shell electron (1 S electron) is excited into the empty antibonding 7 ⁇ electron orbit (ie, , I s—electronic transition).
- FIG. 6 is a graph showing nitrogen adsorption / desorption isotherms of the MCN complex (a) and SBA-15 (b) obtained in Example 1.
- the amount of nitrogen adsorbed by the MCN complex (a) decreased compared to the amount of nitrogen adsorbed by SBA-15 (b). This decrease corresponds to the deposited MCN.
- Hysteresis was confirmed in the isotherms of (a) and (b).
- the isotherm with such a shape was found to be type VI according to the IUP AC classification. That is, it suggests that mesopores (2-50 nm pores) exist in the MCN complex.
- the nitrogen adsorption due to capillary condensation observed at relative pressures of 0.65 to 0.8 in SBA-15 (b) is shifted to a lower relative pressure in MCN complex (a).
- FIG. 7 is a graph showing the pore size distribution of the MCN composite (a) and SBA-15 (b) obtained in Example 1.
- the pore size distributions of MCN and SBA-15 were determined.
- the pore diameter was determined from the pore volume distribution seen in the hysteresis of isotherms (a) and (b).
- MCN was found to have a center of pore size distribution at 4.2 nm.
- SBA-15 was found to have a pore size distribution stop at 7.1 nm. This indicates that the pore diameter of MCN is 1.2 nm larger than the wall thickness (3 nm) of SBA-15. This difference in pore diameter is due to the shrinkage of SBA-15 when the carbon nitride polymer filled in the pores of SBA-15 is treated at high temperature. Is caused by. Further, such a pore diameter can be changed according to the selected porous silica. Since the obtained pore size is similar to the size of high molecular weight biological molecules such as enzymes, it can be advantageous for selective immobilization of these substances.
- 2 e V is due to the sp 2 hybrid orbital carbon atom bonded to the nitrogen atom in the aromatic structure.
- the peak corresponding to 2 8 6. 8 e V is due to the sp 3 hybrid orbital, and the peak corresponding to 2 8 8. 7 e V is the highest energy in the aromatic ring bonded to the NH 2 group. due to carbon atoms in sp 2 hybrid orbitals.
- the spectrum (c) indicating N ls in the spectrum (a) was divided into two peaks with binding energies of 39.78 eV and 400.2 eV.
- the peak corresponding to 4 0. 2 e V is due to the nitrogen atom bonded to three carbon atoms in the amorphous C _N matrix.
- Example 3 The same treatment as in Example 1 was carried out except that 2.81 g of ethylenediamine was used as the nitrogen source and 4.43 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 3 The same treatment as in Example 1 was carried out except that 2.81 g of ethylenediamine was used as the nitrogen source and 4.43 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 3 Example 3;
- Example 4 The same treatment as in Example 1 was performed, except that 2.35 g of ethylenediamine was used as the nitrogen source and 2.36 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 4 The same treatment as in Example 1 was performed, except that 2.35 g of ethylenediamine was used as the nitrogen source and 2.36 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 4 The same treatment as in Example 1 was performed, except that 2.35 g of ethylenediamine was used as the nitrogen source and 2.36 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 4 The same treatment as in Example 1 was performed, except that 2.35 g of ethylenediamine was used as the nitrogen source and 2.36 g of carbon tetrachloride was used as the carbon source. Table 1
- Example 5 The same treatment as in Example 1 was carried out except that 3.48 g of ethylenediamine was used as the nitrogen source and 0.31 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 5 The same treatment as in Example 1 was carried out except that 3.48 g of ethylenediamine was used as the nitrogen source and 0.31 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 5 The same treatment as in Example 1 was carried out except that 3.48 g of ethylenediamine was used as the nitrogen source and 0.31 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 5 The same treatment as in Example 1 was carried out except that 3.48 g of ethylenediamine was used as the nitrogen source and 0.31 g of carbon tetrachloride was used as the carbon source. Table 1
- Example 6 The same treatment as in Example 1 was performed, except that 2.50 g of hydrazine was used as the nitrogen source and 3.33 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 6 The same treatment as in Example 1 was performed, except that 2.50 g of hydrazine was used as the nitrogen source and 3.33 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 6 The same treatment as in Example 1 was performed, except that 2.50 g of hydrazine was used as the nitrogen source and 3.33 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN.
- Example 6 The same treatment as in Example 1 was performed, except that 2.50 g of hydrazine was used as the nitrogen source and 3.33 g of carbon tetrachloride was used as the carbon source. Table 1
- Example 1 The same treatment as in Example 1 was performed, except that 3.50 g of hydrazine was used as the nitrogen source and 0.48 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN. table 1 :
- the carbon nitride porous body obtained in this way has an adsorptivity that surpasses the properties of the conventional porous body, and thus can replace the conventional porous body.
- the carbon nitride porous body produced by the method according to the present invention is applicable to an adsorbent, a separating agent, a single catalyst, a battery electrode, a capacitor, and an energy storage body.
- a carbon nitride porous body represented by the chemical formula C 3 N 4 having a hardness equal to or higher than that of diamond can be produced. This makes it possible to replace conventional industrial diamonds. Further, it may be used for a semiconductor device or a light emitting device utilizing the property of carbon nitride semiconductor.
- the pore structure is suitable for immobilization of biological materials, it can be applied to bioreactors with excellent mechanical strength and high durability, and various biosensors based on semiconducting properties.
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Abstract
Description
窒化炭素多孔体およびその製造方法 技術分野 Porous carbon nitride and method for producing the same
本発明は、 窒化炭素多孔体およびその製造方法に関し、 より詳細には、 炭素原 子と窒素原子との比(C Z N比) を容易に制御可能な窒化炭素多孔体の製造方法、 および、 それによつて得られる窒化炭素多孔体に関する。 背景技術 The present invention relates to a carbon nitride porous body and a method for producing the same, and more specifically, a method for producing a carbon nitride porous body in which the ratio of carbon atoms to nitrogen atoms (CZN ratio) can be easily controlled, and The carbon nitride porous body obtained in this way. Background art
近年、 種々のシリカレプリカを用いて製造されたナノスケールの細孔を有する 多孔体が注目されている。 中でも、 窒素を含有する炭素系多孔体は、 吸着剤、 分 離剤、 触媒単体、 バッテリ電極、 キャパシ夕、 エネルギー格納体等の種々の応用 が期待されており、 研究が盛んに行われている。 高比表面積および高窒素含有率によって吸着特性を向上させてなる多孔体の製 造方法が特許文献に提案されている (例えば、 特許文献 1を参照) 。 図 1 0は、 従来技術による含窒素炭素系材料の製造方法を示すフローチャート である。 工程ごとに説明する。 _ 工程 S 1 1 0 0 :金属酸化物多孔体 (例えば、 金属酸化物および複合金属酸化 物等からなる多孔体であり、 シリカメソ多孔体、 ゼォライ ト、 架橋粘土等) の細 孔内に含窒素有機化合物 (例えば、 窒素原子を含む有機化合物であり、 含窒素複 素環式化合物、 アミン類、 イミン類、 二トリル類等) を導入し、 含窒素有機化合 物を熱分解することによって、 細孔内に炭素原子および窒素原子により骨格が形 成される含窒素炭素系材料を析出させる。 具体的には、 反応管中に金属酸化物多孔体を設置し、 窒素またはアルゴン等の 不活性ガスを反応管内に導入しながら、 所定の温度まで加熱する。 次に、 加熱状 態を維持したまま、 気体状態の含窒素有機化合物を反応管内に導入することによ つて、 金属酸化物多孔体の細孔内に含窒素有機化合物を導入せしめながら、 所定 時間の C V D反応を行う。 これによつて、 金属酸化物多孔体の細孔内に炭素原子 および窒素原子により骨格が形成されている含窒素炭素系材料が析出される。 工程 S 1 2 0 0 :金属酸化物多孔体を溶解除去することによって含窒素炭素系 材料からなる多孔体を得る。 具体的には、 フッ酸またはアルカリ等を用いて化学 的に金属酸化物多孔体を溶解させる。 この結果、 比表面積 6 0 0 m2/ g以上、 平均細孔径 1〜 5 n m、 かつ、 炭素原子 と窒素原子との原子比 (CZN) 3. 3 3〜 1 2. 5である含窒素炭素系多孔体 が得られる。 参考文献 In recent years, porous bodies having nanoscale pores produced using various silica replicas have attracted attention. Among them, carbon-based porous materials containing nitrogen are expected to be used in various applications such as adsorbents, separating agents, single catalysts, battery electrodes, capacitors, and energy storage devices, and research is being actively conducted. . A method for producing a porous body in which adsorption characteristics are improved by a high specific surface area and a high nitrogen content has been proposed in patent literature (see, for example, patent literature 1). FIG. 10 is a flowchart showing a method for producing a nitrogen-containing carbon-based material according to the prior art. Each process will be described. _ Step S 1 100: Nitrogen-containing porous metal oxides (for example, porous materials composed of metal oxides and composite metal oxides, such as silica mesoporous materials, zeolites, crosslinked clays, etc.) By introducing an organic compound (for example, an organic compound containing a nitrogen atom, a nitrogen-containing bicyclic compound, an amine, an imine, a nitrile, etc.) and thermally decomposing the nitrogen-containing organic compound, A nitrogen-containing carbon-based material whose skeleton is formed by carbon and nitrogen atoms is deposited in the pores. Specifically, a metal oxide porous body is placed in the reaction tube, and heated to a predetermined temperature while introducing an inert gas such as nitrogen or argon into the reaction tube. Next, a nitrogen-containing organic compound in a gaseous state is introduced into the reaction tube while maintaining the heating state, thereby introducing the nitrogen-containing organic compound into the pores of the metal oxide porous body for a predetermined time. Perform the CVD reaction. As a result, a nitrogen-containing carbon-based material having a skeleton formed of carbon atoms and nitrogen atoms is deposited in the pores of the metal oxide porous body. Step S 1 2 0 0: A porous body made of a nitrogen-containing carbon-based material is obtained by dissolving and removing the metal oxide porous body. Specifically, the metal oxide porous body is chemically dissolved using hydrofluoric acid or alkali. As a result, a specific surface area of 600 m 2 / g or more, an average pore diameter of 1 to 5 nm, and carbon atoms A nitrogen-containing carbon-based porous material having an atomic ratio of C to N (CZN) of 3.3 3 to 12.5 is obtained. References
特許文献 1 :特開 2004— 1 68 58 7公報 発明の開示 Patent Document 1: Japanese Unexamined Patent Application Publication No. 2004-1 68 58 7 Disclosure of Invention
発明が解決しょうとする課題 Problems to be solved by the invention
しかしながら、 上記特許文献 1に記載された含窒素炭素系多孔体は、 従来の同 種多孔体に比し窒素含有量が多くなつたものの、 さらに窒素含有量を多くしょう とするにおいては限界があった。 そのため、 吸着性能等各種派生する諸特性の調 整にも限界があった。 すなわち、 特許文献 1に記載される含窒素炭素系多孔体の 製造方法は、 原料成分とする窒素源、 炭素源が、 これら両成分を含んだ単一化合 物を用い、 これを出発原料としているため、 得られる生成物の C/N比は出発原 料の化合物によって決定され、 窒素の割合を高くしたり、 CZN比を任意の値に 調整するには限界があった。 また、 特許文献 1に記載される含窒素炭素系多孔体の製造方法は、 CVD等の 大型な装置を必要とするため、 製造コストが高くつき、 制御も複雑である。 した がって、 このような製造手段に依存しない、 含窒素炭素系多孔体の安価、 かつ容 易な製造方法が望まれている。 以上より、 本発明の目的は、 意図した窒素含有量を有する窒化炭素多孔体を容 易に製造する方法を提供することである。 なお、 本明細書においていう 「窒化炭 素」 は C3N4なる化学式を有する材料に限定されず、 窒素原子と炭素原子の割合 が任意の割合の化学式で示される材料を意図している。 課題を解決するための手段 However, although the nitrogen-containing carbon-based porous material described in Patent Document 1 has a higher nitrogen content than the conventional homogeneous porous material, there is a limit in trying to increase the nitrogen content further. It was. For this reason, there were limits to the adjustment of various derived characteristics such as adsorption performance. That is, the method for producing a nitrogen-containing carbon-based porous material described in Patent Document 1 uses a single compound containing both components as a nitrogen source and a carbon source as raw materials, and uses this as a starting material. Therefore, the C / N ratio of the resulting product was determined by the starting material compound, and there were limits to increasing the nitrogen ratio and adjusting the CZN ratio to an arbitrary value. In addition, the method for producing a nitrogen-containing carbon-based porous material described in Patent Document 1 requires a large apparatus such as a CVD, so that the production cost is high and the control is complicated. Therefore, an inexpensive and easy production method for a nitrogen-containing carbon-based porous body that does not depend on such production means is desired. From the above, an object of the present invention is to provide a method for easily producing a carbon nitride porous body having an intended nitrogen content. The “carbon nitride” referred to in the present specification is not limited to a material having the chemical formula C 3 N 4, and intends a material in which the ratio of nitrogen atoms to carbon atoms is represented by an arbitrary ratio. Means for solving the problem
本発明による窒化炭素多孔体 (MCN) を製造する方法は、 シリカ多孔体と窒 素源と炭素源とを混合する工程と、 前記混合する工程によって得られた混合物を 加熱する工程と、 前記加熱する工程によって得られた反応物から前記シリカ多孔 体を除去する工程とを包含し、 これにより上記目的とする窒化炭素多孔体を生成 させる。 前記シリカ多孔体は、 テンプレートとして機能するもので、 具体的に例示する と MCM— 48、 S BA— 1 5、 K I T— 5、 および、 S BA— 1からなる群か ら選択される孔同士が互いに連通してなる構造のシリカ多孔体が挙げられ、 使用 される。 前記窒素源としては、 シリカ多孔体の中に容易に拡散し、 熱分解して窒化物を 生成しうるものならば特に制限はないが、 好ましくはァミン類または二卜リル類 の含窒素化合物が挙げられる。 さらに具体的には、 脂肪族ァミン、 芳香族ァミン、 アンモニア、 脂肪族二トリル、 芳香族二トリル、 含窒素複素環化合物、 および、 ヒドラジンからなる群から選択する 1種または 2種以上が使用される。 前記炭素源としては、 シリカ多孔体の中に容易に拡散し、 熱分解して炭化物を 生成しうるものならば特に制限はないが、 好ましくはハロゲン化炭化水素または その誘導体が挙げられる。 前記八ロゲン化炭化水素は、 塩化炭化水素、 臭化炭化水素、 および、 ヨウ化炭 化水素からなる群から選択される 1種または 2種以上が用いられる。 前記塩化炭化水素は、 四塩化炭素、 クロ口ホルム、 塩化メチレン、 クロロメ夕 ン、 および、 ジクロロメタンからなる群から選択される 1種または 2種以上が用 いられる。 前記臭化炭化水素は、具体的には四臭化炭素またはブロモホルムが挙げられる。 前記ヨウ化炭化水素は、 具体的にはヨウ化メタンまたはヨウ化工タンが挙げら れる。 前記混合する工程は、 炭素原子 (C ) と窒素原子 (N ) との比 (C Z N ) が、 関係 0 . 2 5≤C Z N≤3 . 0を満たすことが好ましい。 前記加熱する工程は、 第 1の温度で前記混合物を重合化する工程と、 前記第 1 の温度よりも高い第 2の温度で前記混合物を炭化する工程とをさらに包含しても よく、 好ましい。 前記重合化する工程は、 大気中、 7 0で〜 1 5 0での温度範囲から選択される 前記第 1の温度で 1時間〜 6時間、 前記混合物を加熱することが好ましい。 前記炭化する工程は、 窒素雰囲気下または不活性ガス雰囲気下、 5 0 0で〜 8 0 0での温度範囲から選択される前記第 2の温度で 4時間〜 8時間、 前記混合物 を加熱することが好ましい。 前記シリカ多孔体の除去工程は、 フッ酸またはアル力リ水溶液を用いてシリ力 多孔体を選択的に溶解し、 反応生成物 (窒素炭素多孔体) を不溶解残渣としてろ 過し、 回収する。 前記除去工程の後に、 前記反応生成物を洗浄し、 乾燥する工程をさらに包含し てもよい。 本発明による炭素原子と窒素原子とを含む窒化炭素多孔体 (MCN) は、 前記 炭素原子 (C) と前記窒素原子 (N) との比 (C/N) は、 関係 0. 2 5≤C/ N≤ 3. 0を満たし、 前記炭素原子と前記窒素原子とは、 一重結合または二重結 合であり、 これにより上記目的を達成する。 前記 MCN多孔体の比表面積は、 50 Om^/g以上とすることが吸着特性を向 上する等の観点から好ましい。 前記 MCN多孔体の孔径は、 4 nm以上 1 0 nm以下であってもよい。 発明の効果 The method for producing a carbon nitride porous body (MCN) according to the present invention includes a step of mixing a silica porous body, a nitrogen source, and a carbon source, a step of heating a mixture obtained by the mixing step, and the heating A step of removing the porous silica from the reaction product obtained by the step of producing a porous carbon nitride as described above. The porous silica material functions as a template. Specifically, pores selected from the group consisting of MCM-48, SBA-15, KIT-5, and SBA-1 are provided. A porous silica material having a structure communicating with each other can be mentioned and used. As the nitrogen source, it easily diffuses into the porous silica and is thermally decomposed to form nitride. Although it is not particularly limited as long as it can be produced, a nitrogen-containing compound such as amines or diaryls is preferable. More specifically, one or more selected from the group consisting of aliphatic amines, aromatic amines, ammonia, aliphatic nitriles, aromatic nitriles, nitrogen-containing heterocyclic compounds, and hydrazine are used. The The carbon source is not particularly limited as long as it can easily diffuse into the porous silica and can be pyrolyzed to produce a carbide, and preferably includes a halogenated hydrocarbon or a derivative thereof. As the octalogated hydrocarbon, one or more selected from the group consisting of chlorinated hydrocarbon, brominated hydrocarbon, and iodinated hydrocarbon are used. As the chlorinated hydrocarbon, one or more selected from the group consisting of carbon tetrachloride, black mouth form, methylene chloride, chloroform, and dichloromethane are used. Specific examples of the brominated hydrocarbon include carbon tetrabromide and bromoform. Specific examples of the iodinated hydrocarbon include iodomethane and iodinated tan. In the mixing step, the ratio (CZN) of carbon atoms (C) to nitrogen atoms (N) preferably satisfies the relationship 0.25≤CZN≤3.0. Preferably, the heating step may further include a step of polymerizing the mixture at a first temperature and a step of carbonizing the mixture at a second temperature higher than the first temperature. The polymerization step is preferably performed by heating the mixture at the first temperature for 1 hour to 6 hours, which is selected from a temperature range of 70 to 1550 in the atmosphere. The carbonizing step includes heating the mixture at a second temperature selected from a temperature range of 50.00 to 800 in a nitrogen atmosphere or an inert gas atmosphere for 4 to 8 hours. Is preferred. The removal process of the porous silica is performed by selectively dissolving the porous silica using hydrofluoric acid or an alkaline aqueous solution, and filtering and recovering the reaction product (nitrogen carbon porous body) as an insoluble residue. . A step of washing and drying the reaction product after the removing step may be further included. In the carbon nitride porous body (MCN) containing carbon atoms and nitrogen atoms according to the present invention, the ratio (C / N) of the carbon atoms (C) to the nitrogen atoms (N) has a relationship of 0.25≤C /N≤3.0 is satisfied, and the carbon atom and the nitrogen atom are a single bond or a double bond, thereby achieving the above object. The specific surface area of the MCN porous body is preferably 50 Om ^ / g or more from the viewpoint of improving adsorption characteristics. The pore diameter of the MCN porous body may be 4 nm or more and 10 nm or less. The invention's effect
本発明による窒化炭素 (MCN) 多孔体を製造する方法は、 シリカ多孔体と窒 素源と炭素源とを混合する工程と、 混合する工程によって得られた混合物を加熱 する工程と、 加熱する工程によって得られた反応物からシリカ多孔体を除去する 工程とを包含する。 開始材料として窒素源と炭素源とを別個に用いるため、 仕込 み時における窒素量を容易に制御することができる。 その結果、 加熱する工程に よって得られる窒化炭素多孔体は、 意図した窒素含有量を有し得る。 また、 レプリカであるシリカ多孔体を適宜選択することによって、所望の形状、 孔径、 比表面積を有する窒化炭素多孔体が得られ得る。 このようにして得られた 窒化炭素多孔体は、 従来よりも窒素量を多く含有させることができるため、 吸着 量が向上し得る。 図面の簡単な説明 The method for producing a carbon nitride (MCN) porous body according to the present invention includes a step of mixing a silica porous body, a nitrogen source, and a carbon source, a step of heating a mixture obtained by the mixing step, and a step of heating Removing the porous silica from the reaction product obtained by the step. Since a nitrogen source and a carbon source are used separately as starting materials, the amount of nitrogen during charging can be easily controlled. As a result, the carbon nitride porous body obtained by the heating step can have an intended nitrogen content. In addition, a carbon nitride porous body having a desired shape, pore diameter, and specific surface area can be obtained by appropriately selecting a silica porous body as a replica. Since the carbon nitride porous body obtained in this way can contain a larger amount of nitrogen than before, the amount of adsorption can be improved. Brief Description of Drawings
図 1 :本発明による窒化炭素多孔体 (MCN) の製造方法を示すフローチヤ一 卜 Fig. 1: Flow chart showing a method for producing a carbon nitride porous material (MCN) according to the present invention.
図 2 :本発明による窒化炭素多孔体 (MCN) の模式図 Fig. 2: Schematic diagram of carbon nitride porous material (MCN) according to the present invention
図 3 :実施例 1で得られた MCN (a) および S BA— 1 5 (b) の X線回折 パターンを示す図 Figure 3: X-ray diffraction pattern of MCN (a) and S BA-1 5 (b) obtained in Example 1
図 4 :実施例 1で得られた MCNの電子顕微鏡写真 (a) および (b) と元素 マッピング (c) および (d) とを示す図 Figure 4: Electron micrographs (a) and (b) and elemental mapping (c) and (d) of MCN obtained in Example 1
図 5 :実施例 1で得られた MCNの電子エネルギー損失スぺクトルを示す図 図 6 :実施例 1で得られた MCN複合体 (a) および S B A- 1 5 (b) の窒 素吸脱着等温線を示す図 Fig. 5: Electron energy loss spectrum of MCN obtained in Example 1 Fig. 6: Nitrogen absorption of MCN complex (a) and SB A- 15 (b) obtained in Example 1 Diagram showing desorption isotherm
図 7 :実施例 1で得られた MCN複合体 (a) および S BA— 1 5 (b) の細 孔径分布を示す図 Fig. 7: Diagram showing the pore size distribution of the MCN composite (a) and SBA-15 (b) obtained in Example 1
図 8 :実施例 1で得られた MCNの F T— I Rスぺクトルを示す図 Figure 8: MCN FT-IR spectrum obtained in Example 1
図 9 :実施例 1で得られた M C Nの X P Sワイドスペクトル ( a ) と、 M C N の C l sスペクトル (b) と、 MCNの N l sスペクトル (c) とを示す図 図 1 0 :従来技術による含窒素炭素系材料の製造方法を示すフローチャート 符号の説明 Fig. 9: XPS wide spectrum (a) of MCN obtained in Example 1, C ls spectrum (b) of MCN, and N ls spectrum (c) of MCN Flow chart showing a method for producing a nitrogen-carbon material Explanation of symbols
2 0 0 窒化炭素多孔体 (M C N ) 発明を実施するための最良の形態 2 0 0 Porous carbon nitride (M C N) Best mode for carrying out the invention
以下、 図面を参照しながら本発明の実施の形態を説明する。 Embodiments of the present invention will be described below with reference to the drawings.
図 1は、 本発明による窒化炭素多孔体 (M C N ) の製造方法を示すフローチヤ ートである。 工程ごとに説明する。 工程 S 1 1 0 : シリカ多孔体と窒素源と炭素源とを混合する。 FIG. 1 is a flow chart showing a method for producing a carbon nitride porous material (M C N) according to the present invention. Each process will be described. Step S 1 1 0: A porous silica material, a nitrogen source and a carbon source are mixed.
前記シリカ多孔体は、 孔構造が三次元的または二次元的に繋がったシリカから なる任意の構造体を意味する。 例えば、 このような構造体は、 へキサゴナル構造、 キュービック構造、 不規則構造を有し得る。 ここに、 へキサゴナル構造とは、 シリカ多孔体中の細孔の配置が六方構造であ り、 公知の二次元へキサゴナル構造および三次元へキサゴナル構造のいずれも含 む。 キュービック構造とは、 シリカ多孔体中の細孔の配置が立方構造である。 このようなシリカ多孔体は、 好ましくは、 立方構造を有する M C M— 4 8、 S B A— 1、 一次元中型細孔が微細孔に互いに連結された構造を有する S B A— 1 5、 および、 細孔が不規則に三次元的に連結された構造を有する K I T一 5から なる群から選択することが出来る。 得られる窒化炭素多孔体 (M C N ) の構造は、 選択されたシリカ多孔体の構造 に依存することに留意されたい。 したがって、 シリカ多孔体を適宜選択すること によって、 所望の形状、 孔径および比表面積を有する窒化炭素多孔体が得られ得 る。 なお、 シリカ多孔体は、 一種類であってもいいし、 二種類以上を組み合わせ て用いてもよい。 前記窒素源は、 含窒素化合物であり、 詳細には、 アミン類または二トリル類で あり得る。 このような含窒素化合物は、 好ましくは、 脂肪族ァミン、 芳香族アミ ン、 アンモニア、 脂肪族二トリル、 芳香族二トリル、 含窒素複素環式化合物、 お よび、 ヒドラジンからなる群から少なくとも 1つ選択される。 炭素源は、 ハロゲン化炭化水素またはその誘導体である。 このようなハロゲン 化水素は、 塩化炭化水素、 臭化炭化水素およびヨウ化炭化水素からなる群から少 なくとも 1つ選択される。 塩化炭化水素は、 例えば、 四塩化炭素、 クロ口ホルム、 塩化メチレン、 クロロメタン、 または、 ジクロロメタンが挙げられるが、 これら に限定されない。 臭化炭化水素は、 例えば、 四臭化炭素またはプロモホルムが挙 げられるが、 これらに限定されない。 さらに、 ヨウ化炭化水素は、 例えば、 ヨウ 化メタンまたはヨウ化工タンであり得るが、 これらに限定されない。 窒素源と炭素源とは、 炭素原子 (C) と窒素原子 (N) との比 (CZN) が、 関係 CZN≥0. 2 5を満たす範囲で調整され得る。 C/N比が 0. 2 5未満の 場合、 窒化炭素多孔体が得られなかった。 CZN比は、 好ましくは、 0. 2 5≤ C/N≤ 3. 0の範囲で調整され得る。 この範囲であれば、 C3N4型の窒化炭素 に極めて近い組成となるため、 得られた多孔性物質は超高硬度や半導体的な性質 などを有することになり得る。 このように開始材料として窒素源と炭素源とが別 個に用いられるので、 CZN比の制御を容易かつ高精度にできる。 工程 S 1 20 :工程 S 1 1 0で得られた混合物を加熱する。 これによつて、 混 合物が反応し、 窒化炭素多孔体が得られ得る。 より詳細には、 第 1の温度で混合 物を重合化し、 次いで、 第 1の温度よりも高い第 2の温度で混合物を炭化する。 重合化は、 大気中、 7 0で〜 1 50での温度範囲から選択される第 1の温度で 1時間〜 4時間加熱することによって行われる。 加熱には、 ホットプレート等の 任意の加熱手段が用いられ得る。 この加熱によつて混合物のうち窒素源が重合化 され、 重合化された窒素源を含む混合物が還流される。 次いで、 これらを攪拌す ることによってシリカ多孔体の細孔に混合物が位置することになる。 これにより 良好に配列した窒化炭素多孔体 (MCN) が得られる。 炭化は、 窒素雰囲気下または不活性ガス雰囲気下、 50 0 〜 80 0での温度 範囲から選択される第 2の温度で 4時間〜 8時間加熱することによって行われ る。 加熱には、 電気炉等の任意の加熱手段が用いられ得る。 この加熱によって、 重合化された窒化源が炭素源によって炭化される (すなわち、 窒素原子と炭素原 子とがー重結合または二重結合によって結合される) 。 このようにして、 シリカ 多孔体の細孔内に得られた反応物が、 窒化炭素多孔体 (MCN) である。 なお、 炭化する前に、 重合化によって得られた重合体を乾燥させ、 微粒子化し てもよい。 これによつて炭化時間を短縮させることができる。 工程 S 1 30 :得られた反応物をシリカ多孔体から除去する。 フッ酸またはァ ルカリ水溶液を用いてシリカ多孔体をろ過することによって、 反応物である MC Nのみを抽出することができる。 なお、 シリカ多孔体を溶解させることができる 任意のアル力リ水溶液を用いることができる。 工程 S 1 30の後、 抽出された反応物を洗浄し乾燥してもよい。 洗浄には、 純 水、 蒸留水、 または、 エタノールが用いられる。 乾燥は、 ホッ.トプレート等の任 意の加熱手段を用いて行われ得る。 本発明の窒化炭素多孔体の製造方法によれば、 工程 S 1 1 0において開始材料 として窒素源と炭素源とが別個に用いられる。 その結果、 仕込み時における窒素 量を広範囲 (CZN^ O . 2 5) に、 かつ、 より高精度に制御することができ、 容易に窒化炭素多孔体を製造することができる。 図 2は、 本発明による窒化炭素多孔体 (MCN) の模式図である。 The silica porous body means an arbitrary structure made of silica in which pore structures are connected three-dimensionally or two-dimensionally. For example, such a structure may have a hexagonal structure, a cubic structure, or an irregular structure. Here, the hexagonal structure is a hexagonal structure in which the pores in the porous silica material are arranged, and includes both a known two-dimensional hexagonal structure and a three-dimensional hexagonal structure. The cubic structure is a cubic structure in which the pores in the porous silica are arranged. Such a porous silica is preferably MCM-48 having a cubic structure, SBA-1, SBA-1 having a structure in which one-dimensional medium-sized pores are connected to fine pores, and pores. It can be selected from the group consisting of KITs with irregularly three-dimensionally connected structures. Note that the structure of the resulting carbon nitride porous body (MCN) depends on the structure of the selected silica porous body. Therefore, a carbon nitride porous body having a desired shape, pore diameter and specific surface area can be obtained by appropriately selecting a porous silica body. The silica porous body may be one kind or a combination of two or more kinds. The nitrogen source is a nitrogen-containing compound, and in particular, may be amines or nitriles. Such a nitrogen-containing compound is preferably at least one selected from the group consisting of aliphatic amines, aromatic amines, ammonia, aliphatic nitriles, aromatic nitriles, nitrogen-containing heterocyclic compounds, and hydrazine. Selected. The carbon source is a halogenated hydrocarbon or a derivative thereof. At least one such hydrogen halide is selected from the group consisting of chlorinated hydrocarbons, brominated hydrocarbons and iodinated hydrocarbons. Examples of the chlorohydrocarbon include, but are not limited to, carbon tetrachloride, black mouth form, methylene chloride, chloromethane, or dichloromethane. Brominated hydrocarbons include, but are not limited to, for example, carbon tetrabromide or promoform. Furthermore, the iodinated hydrocarbon can be, for example, iodomethane or iodinated tan, but is not limited thereto. Nitrogen and carbon sources can be adjusted so that the ratio of carbon atom (C) to nitrogen atom (N) (CZN) satisfies the relationship CZN≥0.25. When the C / N ratio was less than 0.25, a carbon nitride porous body could not be obtained. The CZN ratio can preferably be adjusted in the range of 0.2 5 ≤ C / N ≤ 3.0. Within this range, the composition is very close to that of C 3 N 4 type carbon nitride, and thus the obtained porous material can have ultra-high hardness and semiconducting properties. As described above, since the nitrogen source and the carbon source are used separately as starting materials, the CZN ratio can be controlled easily and with high accuracy. Step S 1 20: The mixture obtained in Step S 1 10 is heated. As a result, the mixture reacts and a carbon nitride porous body can be obtained. More specifically, the mixture is polymerized at a first temperature and then the mixture is carbonized at a second temperature that is higher than the first temperature. Polymerization is carried out by heating in the atmosphere at a first temperature selected from a temperature range of 70 to 150 for 1 to 4 hours. Any heating means such as a hot plate can be used for heating. By this heating, the nitrogen source in the mixture is polymerized, and the mixture containing the polymerized nitrogen source is refluxed. Next, the mixture is located in the pores of the porous silica material by stirring them. This gives a well-ordered carbon nitride porous body (MCN). Carbonization is performed by heating at a second temperature selected from a temperature range of 500 to 800 in a nitrogen atmosphere or an inert gas atmosphere for 4 to 8 hours. Any heating means such as an electric furnace can be used for heating. By this heating, the polymerized nitriding source is carbonized by the carbon source (that is, the nitrogen atom and the carbon atom are bonded by a double bond or a double bond). In this way, the reaction product obtained in the pores of the porous silica material is a carbon nitride porous material (MCN). Prior to carbonization, the polymer obtained by polymerization may be dried to form fine particles. Thereby, the carbonization time can be shortened. Step S 1 30: The obtained reaction product is removed from the porous silica material. By filtering the porous silica using hydrofluoric acid or alkaline aqueous solution, only the reactant MCN can be extracted. An arbitrary aqueous solution capable of dissolving the porous silica can be used. After step S 1 30, the extracted reactant may be washed and dried. For cleaning, pure water, distilled water, or ethanol is used. Drying can be done using any heating means such as a hot plate. According to the method for producing a carbon nitride porous body of the present invention, a nitrogen source and a carbon source are separately used as starting materials in step S 110. As a result, the amount of nitrogen at the time of charging can be controlled over a wide range (CZN ^ O. 2 5) and with higher accuracy. A carbon nitride porous body can be easily produced. FIG. 2 is a schematic view of a carbon nitride porous body (MCN) according to the present invention.
窒化炭素多孔体 (MCN) 200は、 図 1を参照して説明した方法において、 シリカ多孔体として S B A- 1 5を用いた場合の例示である。 MCN 200は、 窒化炭素からなる柱部 (図 2では円柱状の棒片で示される) と架橋部 (図 2では 円柱状の小片で示される) とを含む。 MCN 2 00の構造は、 選択されたシリカ 多孔体に依存することを理解されたい。 柱部は、 S B A— 1 5を用いた場合、 六角形状に規則的に配列している。 架橋 部は、 柱部に比べて極めて小さく、 柱部を互いに結合している。 これら柱部およ び架橋部は、 いずれも窒化炭素からなる。 The carbon nitride porous body (MCN) 200 is an example when S B A- 15 is used as the porous silica body in the method described with reference to FIG. The MCN 200 includes a pillar portion (indicated by a cylindrical bar piece in FIG. 2) and a bridge portion (indicated by a cylindrical small piece in FIG. 2) made of carbon nitride. It should be understood that the structure of MCN 200 depends on the selected silica porous material. The pillars are regularly arranged in a hexagonal shape when S B A— 15 is used. The bridges are much smaller than the pillars and connect the pillars together. Both the column part and the bridge part are made of carbon nitride.
MCN 200において細孔径は、 柱部間の距離を意図する。 本発明による MC N 200の細孔径は、 4:1111〜 1 01111 でぁる。 このような細孔径は、 種々のた んぱく質等の生体物質の直径に相当することから、 これら生体物質を MCN 20 0の細孔中に固定化することができる。 MCN 20 0の比表面積は、 外部物質の 多量かつ繊細な吸着やそれに基づく物質センシングに有利であり得る 5 0 0 m2 Zg以上である。 MCN 20 0における炭素原子 (C) と窒素原子 (N) との比 (C/N) は、 CZN≥ 0. 2 5であり、 好ましくは、 0. 2 5≤CZN≤ 3. 0である。 このように本発明による製造方法によって得られた MCN 2 0 0は、 従来に比 ベて窒素量を増大させることができるので、 塩基的吸着サイ トを多く有する。 そ の結果、 優れた吸着性が期待され得る。 化学式 C3N4を有する窒化炭素多孔体に おいては、 窒化炭素の本来の性質である半導体または高強度材料として、 半導体 デバイスまたは工業ダイヤモンドの代替に利用可能である。 次に具体的な実施例を用いて本発明を詳述する。 しかしながら、 本発明がこれ ら実施例に限定されないことに留意されたい。 実施例 1 ; In MCN 200, the pore diameter is intended to be the distance between the pillars. The pore size of MC N 200 according to the present invention is 4: 1111 to 1 01111. Since such a pore diameter corresponds to the diameter of various biological substances such as proteins, these biological substances can be immobilized in the MCN 200 pores. The specific surface area of MCN 200 is more than 500 m 2 Zg, which can be advantageous for large-scale and delicate adsorption of external substances and substance sensing based thereon. The ratio (C / N) of carbon atom (C) to nitrogen atom (N) in MCN 20 0 is CZN≥0.25, preferably 0.225≤CZN≤3.0. Thus, MCN 200 obtained by the production method according to the present invention can increase the amount of nitrogen as compared with the conventional method, and thus has a large number of basic adsorption sites. As a result, excellent adsorptivity can be expected. In the carbon nitride porous body having the chemical formula C 3 N 4 , it can be used as a semiconductor or high-strength material, which is the original property of carbon nitride, as a substitute for semiconductor devices or industrial diamond. Next, the present invention will be described in detail using specific examples. However, it should be noted that the present invention is not limited to these examples. Example 1;
シリカ多孔体として S B A— 1 5を 0. 5 g、 窒素源としてエチレンジァミン を 2. 2 2 g、 および、 炭素源として四塩化炭素を 5. 3 5 g準備し、 混合した。 混合物を大気中、 9 0で 6時間還流および攪拌し、 重合させた。 重合体は、 喑褐 色であった。 次いで、 得られた重合体を 1 2時間乾燥させ、 粉末化した。 粉末を 50m l /分で窒素フローしながら 3. 0 :Z分の加熱速度で 6 00 まで昇温 し、 60 0でで 5時間保持し、 炭化した。 5重量%フッ酸を用いて S B A— 1 5 をろ過した後、 反応物 (MCN) をエタノールで数回洗浄し、 1 0 で乾燥さ せた。 このようにして得られた反応物について、 X線回折装置 (S i eme n s D 5 0 0 5、 B r u c k e r AX S、 UK) を用いて構造解析を行った。 X線回 折装置の動作条件は、 C u— Κ α線を用いて、 4 0 kV/5 0mA、 0. 5 ° 2 0ノ分の走査速度であった。 MCNの X線回折パターンとシリカ多孔体 (実施例 1では S BA— 1 5 ) の X線回折パターンとを比較した。 高分解能透過型電子顕微鏡 (J EOL— 3 0 0 0 Fおよび J EOL— 3 1 0 0 F E F、 日本電子、 J a p a n) を用いて、 反応物の観察を行った。 得られた反 応物を、 乳鉢を用いて粒子状にし、 それを C u製格子上に位置する穴の開いた炭 素膜上に分散させて試料を調整した。 透過型電子顕微鏡の動作条件は、 加速電圧 3 0 0 k V、 分解能 1 5万〜 1 2 0万倍であった。 また、これら高分解能透過型電子顕微鏡を用いてエネルギー損失分光法を行った。 この際、 スリット幅 2 0 e Vの標準 3ウィンドウプロシージャを用いて、 解像度 5 Aで元素マツビングも行った。 エネルギー損失および元素マツピングを行った 分析領域は、 1 0 0〜 2 0 0 nm径の領域であった。 比表面積 ·細孔分布測定装置 (Au t o s o r b 1 , Q u a n t a c h r o me、 US A) を用いて窒素吸脱着等温線を測定した。 サンプルを 5 2 3 Kで圧 力 1 0—5h P a以下で 3時間脱気した後に 7 7 Kにて測定した。 吸脱着等温線を 測定することにより、 細孔の有無、 細孔の形状および大きさが分かる。 B a r r e t t - J a y n e r -H a l e n d a法を用いて細孔構造の解析を行った。 な お、 ここでは、 試料として S BA— 1 5を除去する前の MCN複合体 (すなわち、 S B A— 1 5内に MCNが位置する状態) を用いている。 MCN複合体の吸脱着 等温線と S B A— 1 5の吸脱着等温線とを比較した。 フーリェ変換赤外分光光度計 (N i c o l e t N e x u s 6 7 0 , T h e r mo E l e c t r o n, US A) を用いて赤外吸収スぺクトルを測定した。 測 定波長領域は、 40 0 0 c m -1〜 9 5 0 cm-1であった。 0.5 g of SBA-15 as a porous silica, 2.22 g of ethylenediamine as a nitrogen source, and 5.35 g of carbon tetrachloride as a carbon source were prepared and mixed. The mixture was refluxed and stirred in the atmosphere at 90 ° C. for 6 hours to polymerize. The polymer was dark brown. Next, the obtained polymer was dried for 12 hours to be powdered. The powder was heated to 6.00 at a heating rate of 3.0: Z while flowing nitrogen at 50 ml / min, and held at 600 at 5 hours for carbonization. After filtering SBA-15 using 5 wt% hydrofluoric acid, the reaction product (MCN) was washed several times with ethanol and dried at 10. The reaction product thus obtained was subjected to structural analysis using an X-ray diffractometer (Siemens D5005, Brucker AX S, UK). The operating conditions of the X-ray diffraction apparatus were 40 kV / 50 mA, scanning speed of 0.5 ° 20 minutes using Cu—Κα rays. The X-ray diffraction pattern of MCN was compared with the X-ray diffraction pattern of the porous silica (SBA-1 5 in Example 1). The reactants were observed using a high-resolution transmission electron microscope (J EOL-3100 F and JEOL-3100 FEF, JEOL, Japan). The obtained reaction product was made into particles using a mortar and dispersed on a holey carbon film located on a grid made of Cu to prepare a sample. The operating conditions of the transmission electron microscope were an acceleration voltage of 300 kV and a resolution of 150,000 to 120,000 times. In addition, energy loss spectroscopy was performed using these high-resolution transmission electron microscopes. At this time, elemental matbing was also performed at a resolution of 5 A using a standard 3-window procedure with a slit width of 20 eV. The analysis region where energy loss and element mapping were performed was a region with a diameter of 100 to 200 nm. Nitrogen adsorption / desorption isotherms were measured using a specific surface area / pore distribution measuring device (Au tosorb 1, Quantachrom, USA). Samples were measured at the 5 2 3 K at pressure 1 0- 5 h P a following 3 hours degassed after 7 7 K. By measuring the adsorption / desorption isotherm, the presence or absence of pores and the shape and size of the pores can be determined. The pore structure was analyzed using the B arrett-Jayner-Halenda method. Here, the MCN complex before removing SBA-15 (ie, the state where MCN is located in SBA-15) is used as a sample. The adsorption / desorption isotherm of the MCN complex was compared with the adsorption / desorption isotherm of SBA-15. Infrared absorption spectra were measured using a Fourier transform infrared spectrophotometer (Nicolet Nexus 6700, Thermo Electron, USA). The measurement wavelength region was from 400 cm- 1 to 9500 cm- 1 .
X線光電子分光装置 (E s c a l a b 2 0 0 0、 VG S c i e n t i f i c、 UK) を用いて X線光電子分光分析を行った。 分析領域は、 約 3 0 m径の 領域であった。 以上の結果を図 3〜図 9に示し詳述する。 X-ray photoelectron spectroscopic analysis was performed using an X-ray photoelectron spectrometer (E s c a la ab 20 00, VG Sci entif i c, UK). The analysis area was about 30 m in diameter. The above results are shown in FIGS. 3 to 9 and described in detail.
図 3は、 実施例 1で得られた MCN ( a) および S BA— 1 5 (b) の X線回 折パターンである。 FIG. 3 is an X-ray diffraction pattern of MCN (a) and SBA-15 (b) obtained in Example 1.
MCNの X線回折パターン (a) には、 二次元六方格子 (空間群 p 6mm) の ( 1 0 0) 、 ( 1 1 0) および (2 0 0 ) の回折に相当するピークが確認された。 回折ピーク ( 1 0 0) から格子定数 a100= 9. 5 2 nmを有していることが分か つた。 この MCNの X線回折パターン (a) は、 S B A_ 1 5の X線回折パター ン (b) と類似していた。 また、 酸素雰囲気中で MCNについて熱重量測定を行 つたところ、 残留 S BA— 1 5が 1重量%未満であることが確認された。 したが つて、 MCNのX線回折パ夕ーン (a) は、 残留した S B A— 1 5自身の回折に よるものではないことが分かった。 挿入図に示されるように、 MCNは、 2 5. 8 ° に単一のブロードな回折ピー クを示した。 この回折角より MCNの層間距離 dは、 3. 42Aであることが分 かった。 この値は、 無孔窒化炭素球体で得られる層間距離 dにほぼ一致した。 こ のことより、 MCNは、 炭素原子および窒素原子が配列したダラフェン層が、 夕 —ボストラティック (乱層) 状に配列して構成されていることが分かった。 以上より、 得られた MCNは、 S B A_ 1 5の周期的に配列した細孔構造を反 映していることが示された。 図 4は、 実施例 1で得られた MCNの電子顕微鏡写真 (a) および (b) と元 素マッピング (c) および (d) とを示している。 図 4 (a) は、 MCNの [1 0 0] 方向から観察した写真であり、 縞状のパ夕 ーンが確認された。 図 4 (a) において、 コントラストの明るい縞は細孔壁を示 し、 コントラストの暗い縞は細孔を示す。 なお、 図 4 (a) 中の挿入図は、 画像から得られたフーリエ変換光回折パター ンであり、 [ 1 0 0 ] 方向に沿って 1次元配列したスポットが示される。 このこ とは、 空のチャネルの軸に沿って配列した結晶が存在しないことを示している。 図 4 (b) は、 MCNの断面図 (すなわち、 [1 0 0] 方向に対して垂直な方 向から観察した写真) である。 図 4 (b) より、 MCN多孔体が六方晶 (すなわ ち、 蜂の巣) 状に並んでいることが分かる。 図 4 (b) 中の挿入図は、 フーリエ 変換光回折パターンである。 これらより、 空間群 p 6 mmに特有の六方晶配列で あることが分かる。 図 4 (c) および図 4 (d) は、 それぞれ炭素 (C) および窒素 (N) の元素 マッピングを示す。 その他の元素は検出されなかった。 これにより、 得られた M CNは、 残留 S BA— 1 5および不純物を含むことなく、 炭素原子および窒素原 子から構成されていることが分かった。 図 5は、 実施例 1で得られた MCNの電子エネルギー損失スぺクトルを示す図 である。 スペクトルには、 2 84 e Vおよび 40 1 e Vにピークが見られた。 こ れらピークは、 それぞれ、 炭素原子 (C kエッジ :炭素 k殻電子による吸収) お よび窒素原子 (Nkエッジ:窒素 k殻電子による吸収) が存在することを示唆し ている。 また、 C kエッジが鋭いピーク形状を有していることから、 炭素 k殻電 子 ( 1 S電子) が空の反結合性 7Γ電子軌道へ励起されることを表している (すな わち、 I s— 電子遷移) 。 このことは、 MCNは s ρ2混成軌道を有している ことを示唆しており、 図 3を参照して説明したダラフェン層が存在していること を示している。 また、 ピーク面積と各元素の弾性散乱確率とから炭素原子 (C) と窒素原子 (Ν) との比を求めたところ、 CZN=4. 3であった。 図 6は、 実施例 1で得られた MCN複合体 (a) および S BA— 1 5 (b) の 窒素吸脱着等温線を示す図である。 In the X-ray diffraction pattern (a) of MCN, peaks corresponding to diffraction of (1 0 0), (1 1 0) and (2 0 0) of the two-dimensional hexagonal lattice (space group p 6 mm) were confirmed. . It was found from the diffraction peak (1 0 0) that the lattice constant a 100 = 9.5 2 nm. The MCN X-ray diffraction pattern (a) was similar to the X-ray diffraction pattern (b) of SB A_15. In addition, when thermogravimetric measurement was performed on MCN in an oxygen atmosphere, it was confirmed that the residual SBA-15 was less than 1% by weight. Therefore, it was found that the MCN X-ray diffraction pattern (a) was not due to the diffraction of the remaining SBA-15 itself. As shown in the inset, the MCN showed a single broad diffraction peak at 25.8 °. From this diffraction angle, the interlayer distance d of MCN was found to be 3.42A. This value almost coincided with the interlayer distance d obtained with the non-porous carbon nitride sphere. This indicates that MCN is composed of dalaphen layers with carbon and nitrogen atoms arranged in an evening-bostratic (turbulent) form. From the above, it was shown that the obtained MCN reflects the periodically arranged pore structure of SBA_15. FIG. 4 shows electron micrographs (a) and (b) and element mappings (c) and (d) of the MCN obtained in Example 1. Fig. 4 (a) is a photograph observed from the [1 0 0] direction of MCN, and a striped pattern was confirmed. In Fig. 4 (a), bright stripes indicate pore walls and dark stripes indicate pores. The inset in Fig. 4 (a) is a Fourier-transform light diffraction pattern obtained from the image, and shows a one-dimensional array of spots along the [1 0 0] direction. This indicates that there are no crystals arranged along the axis of the empty channel. Figure 4 (b) is a cross-sectional view of the MCN (ie, a photograph observed from the direction perpendicular to the [1 0 0] direction). From Fig. 4 (b), it can be seen that the MCN porous bodies are arranged in the form of hexagonal crystals (ie, honeycomb). The inset in Fig. 4 (b) is the Fourier transform light diffraction pattern. From these, it can be seen that this is a hexagonal arrangement peculiar to the space group p 6 mm. Figures 4 (c) and 4 (d) show the elemental mapping of carbon (C) and nitrogen (N), respectively. Other elements were not detected. As a result, the obtained MCN was found to be composed of carbon atoms and nitrogen atoms without containing residual SBA-15 and impurities. FIG. 5 is a diagram showing an electron energy loss spectrum of MCN obtained in Example 1. The spectrum showed peaks at 2 84 eV and 40 1 eV. This These peaks suggest that there are carbon atoms (C k edge: absorption by carbon k-shell electrons) and nitrogen atoms (Nk edge: absorption by nitrogen k-shell electrons), respectively. Also, since the C k edge has a sharp peak shape, this indicates that the carbon k-shell electron (1 S electron) is excited into the empty antibonding 7Γ electron orbit (ie, , I s—electronic transition). This suggests that MCN has s ρ 2 hybrid orbitals, and that the dalaphen layer described with reference to Fig. 3 exists. The ratio of carbon atom (C) to nitrogen atom (Ν) was calculated from the peak area and the elastic scattering probability of each element, and CZN = 4.3. FIG. 6 is a graph showing nitrogen adsorption / desorption isotherms of the MCN complex (a) and SBA-15 (b) obtained in Example 1.
MCN複合体 (a) の窒素吸着量は、 S B A— 1 5 (b) の窒素吸着量に比べ て減少している。 この減少分が析出した MCNに相当する。 (a) および (b) の等温線にはヒステリシスが確認された。 このような形状を有する等温線は I U P AC分類によれば V I型であることが分かった。 すなわち、 MCN複合体中に メソポア (2〜50 nmの細孔) が存在することを示唆している。 しかしながら、 S BA— 1 5 (b) において相対圧力 0. 6 5〜0. 8で見ら れた毛管凝縮に起因する窒素吸着は、 MCN複合体 (a) ではより相対圧力の低 圧側にシフトしていた。 詳細には、 MCN複合体 (a) では、 相対圧力 0. 40 〜0. 85において毛管凝縮に起因する窒素吸着が見られた。 このことは、 MC N複合体の細孔径が、 S B A— 1 5の細孔径に比べて小さいことを示唆している。 得られた MCN複合体 (a) の等温線から B ETの式を用いて MCNの比表面 積を求めた。 この結果、 MCNの比表面積は、 50 5 m2Zgであった。 このよう に、 5 00m2Zg以上の比表面積を有する MCNは、 外部物質の多量かつ繊細な 吸着やそれに基づく物質センシングに有利であり得る。 図 7は、 実施例 1で得られた MCN複合体 (a) および S BA— 1 5 (b) の 細孔径分布を示す図である。 図 6で得られた等温線 (a) および (b) それぞれ に基づいて、 MCNおよび S BA— 1 5の細孔径分布を求めた。 細孔径は、 等温 線 (a) および (b) のヒステリシスに見られる細孔の容積の分布から求めた。 The amount of nitrogen adsorbed by the MCN complex (a) decreased compared to the amount of nitrogen adsorbed by SBA-15 (b). This decrease corresponds to the deposited MCN. Hysteresis was confirmed in the isotherms of (a) and (b). The isotherm with such a shape was found to be type VI according to the IUP AC classification. That is, it suggests that mesopores (2-50 nm pores) exist in the MCN complex. However, the nitrogen adsorption due to capillary condensation observed at relative pressures of 0.65 to 0.8 in SBA-15 (b) is shifted to a lower relative pressure in MCN complex (a). Was. Specifically, the MCN complex (a) showed nitrogen adsorption due to capillary condensation at relative pressures of 0.40 to 0.85. This suggests that the pore size of the MC N composite is smaller than that of SBA-15. The specific surface area of MCN was determined from the isotherm of the obtained MCN complex (a) using the BET equation. As a result, the specific surface area of MCN was 50 5 m 2 Zg. Thus, MCN having a specific surface area of 500 m 2 Zg or more can be advantageous for large-scale and delicate adsorption of external substances and substance sensing based thereon. FIG. 7 is a graph showing the pore size distribution of the MCN composite (a) and SBA-15 (b) obtained in Example 1. Based on the isotherms (a) and (b) obtained in Fig. 6, the pore size distributions of MCN and SBA-15 were determined. The pore diameter was determined from the pore volume distribution seen in the hysteresis of isotherms (a) and (b).
MCNは、 4. 2 nmに細孔径分布の中心を有することが分かった。 一方、 S B A— 1 5は 7. 1 nmに細孔径分布の中止を有することが分かった。 このことから、 MCNの細孔径は、 S B A— 1 5の壁厚 (3 nm) よりも 1. 2 nm大きいことが分かった。 このような細孔径の違いは、 S BA— 1 5の細孔内 に充填された窒化炭素重合材料を高温にて処理する際に、 S B A— 1 5が収縮す ることによって生じている。 また、 このような細孔径は、 選択されるシリカ多孔 体に応じて変更することができる。 なお、 得られた細孔径は、 酵素などの生体高 分子の大きさに類似するので、 これらの物質の選択的固定化に有利であり得る。 図 8は、 実施例 1で得られた MCNの F T— I Rスペクトルを示している。 スぺクトルには 1 2 5 7. 3 c m- 1 5 7 0. 7 c m'1, および、 3 4 1 2 c πΓ1に 3つの吸収が見られた。 1 2 5 7. 3 cm-1および 1 5 7 0. 7 cm-1の吸 収は、 それぞれ、 芳香族 C一 N伸縮振動による吸収、 および、 芳香環伸縮振動に よる吸収である。 一方、 3 4 1 2 c m—1 の吸収は、 芳香環中の N— H基の伸縮振 動による吸収である。 また、 2 2 0 0 c m—1付近に吸収ピークがないことから、 MCN中には C≡N要素が存在しないことが分かる。 以上の結果は、 無孔窒化炭 素において得られる FT— I Rスぺクトルと同様の結果であった。 図 9は、 実施例 1で得られた MCNの X P Sワイドスペクトル (a) と、 MC Nの C l sスペクトル (b) と、 MCNの N l sスペクトル (c ) とを示してい る。 スペクトル (a) は、 主に、 炭素、 窒素および微量な酸素が MCN中に存在す ることを示している。 スペクトル (a) 中の C l sを示すスぺクトル (b) は、 2 8 8. 7 e V、 2 8 6. 8 e V、 2 8 5. 2 e V、 および、 2 8 4. O e Vの 結合エネルギーを有する 4つのピークに分かれた。 最も低いエネルギーである 2 8 4. 0 e Vに相当するピークは、 非晶質 C— N マトリクス中の純グラフアイ 卜に起因する。 2 8 5. 2 e Vに相当するピークは、 芳香族構造中の窒素原子に結合された s p2混成軌道の炭素原子に起因している。 2 8 6. 8 e Vに相当するピークは、 s p 3混成軌道に起因し、 最も高いエネル ギーである 2 8 8. 7 e Vに相当するピークは、 NH2基に結合する芳香環中の s p2混成軌道の炭素原子に起因する。 一方、 スペクトル (a) 中の N l sを示すスぺクトル (c ) は、 3 9 7. 8 e Vおよび 40 0. 2 e Vの結合エネルギーを有する 2つのピークに分かれた。 4 0 0. 2 e Vに相当するピークは、 非晶質 C _Nマトリクス中の 3つの炭素原子 に結合された窒素原子に起因する。 3 9 7. 8 e Vに相当するピークは、 炭素原 子に s p2混成した窒素原子に起因する。 図 8および図 9の結果から、 MCNの表面における炭素原子および窒素原子の 結合状態は、 無孔窒化炭素材料とほぼ同様であることが分かった。 また、 図 9の X P Sスぺクトルのピーク面積値から得られる CZN比は、 図 3から得られる値 とほぼ一致した。 実施例 2 ; MCN was found to have a center of pore size distribution at 4.2 nm. On the other hand, SBA-15 was found to have a pore size distribution stop at 7.1 nm. This indicates that the pore diameter of MCN is 1.2 nm larger than the wall thickness (3 nm) of SBA-15. This difference in pore diameter is due to the shrinkage of SBA-15 when the carbon nitride polymer filled in the pores of SBA-15 is treated at high temperature. Is caused by. Further, such a pore diameter can be changed according to the selected porous silica. Since the obtained pore size is similar to the size of high molecular weight biological molecules such as enzymes, it can be advantageous for selective immobilization of these substances. FIG. 8 shows the FT-IR spectrum of MCN obtained in Example 1. The spectrum showed three absorptions at 1 2 5 7. 3 cm-1 5 7 0. 7 cm 1 and 3 4 1 2 c πΓ 1 . The absorptions at 1 2 5 7. 3 cm- 1 and 1 5 7 0.7.7 cm- 1 are absorption by aromatic C 1 N stretching vibration and absorption by aromatic ring stretching vibration, respectively. On the other hand, the absorption of 3 4 1 2 cm- 1 is due to the stretching vibration of the N—H group in the aromatic ring. Also, since there is no absorption peak in the vicinity of 2 200 cm- 1 , it can be seen that there is no C≡N element in MCN. The above results were similar to the FT-IR spectrum obtained with non-porous carbon nitride. FIG. 9 shows the XPS wide spectrum (a) of MCN obtained in Example 1, the C ls spectrum (b) of MC N, and the N ls spectrum (c) of MCN. Spectrum (a) shows that mainly carbon, nitrogen, and trace amounts of oxygen are present in MCN. The spectrum (b) indicating C ls in spectrum (a) is 2 8 8. 7 e V, 2 8 6. 8 e V, 2 8 5. 2 e V, and 2 8 4. O e Divided into 4 peaks with V binding energy. The peak corresponding to the lowest energy of 2 8 4.0 eV is due to the pure graph eye 非晶 質 in the amorphous C—N matrix. The peak corresponding to 2 8 5. 2 e V is due to the sp 2 hybrid orbital carbon atom bonded to the nitrogen atom in the aromatic structure. The peak corresponding to 2 8 6. 8 e V is due to the sp 3 hybrid orbital, and the peak corresponding to 2 8 8. 7 e V is the highest energy in the aromatic ring bonded to the NH 2 group. due to carbon atoms in sp 2 hybrid orbitals. On the other hand, the spectrum (c) indicating N ls in the spectrum (a) was divided into two peaks with binding energies of 39.78 eV and 400.2 eV. The peak corresponding to 4 0. 2 e V is due to the nitrogen atom bonded to three carbon atoms in the amorphous C _N matrix. The peak corresponding to 3 9 7. 8 e V is caused by the nitrogen atom sp 2 mixed with the carbon atom. From the results in Fig. 8 and Fig. 9, it was found that the bonding state of carbon and nitrogen atoms on the surface of MCN was almost the same as that of non-porous carbon nitride material. In addition, the CZN ratio obtained from the peak area value of the XPS spectrum in Fig. 9 almost coincided with the value obtained from Fig. 3. Example 2;
窒素源としてエチレンジァミンを 2. 81 g、 炭素源として四塩化炭素を 4. 43 g用いた以外は実施例 1と同様の処理を行った。 得られた MCNの CZN比 を表 1に示す。 実施例 3 ; The same treatment as in Example 1 was carried out except that 2.81 g of ethylenediamine was used as the nitrogen source and 4.43 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN. Example 3;
窒素源としてエチレンジァミンを 2. 35 g、 炭素源として四塩化炭素を 2. 36 g用いた以外は実施例 1と同様の処理を行った。 得られた MCNの CZN比 を表 1に示す。 実施例 4 ; The same treatment as in Example 1 was performed, except that 2.35 g of ethylenediamine was used as the nitrogen source and 2.36 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN. Example 4;
窒素源としてエチレンジァミンを 3. 48 g、 炭素源として四塩化炭素を 0. 31 g用いた以外は実施例 1と同様の処理を行った。 得られた MCNの CZN比 を表 1に示す。 実施例 5 ; The same treatment as in Example 1 was carried out except that 3.48 g of ethylenediamine was used as the nitrogen source and 0.31 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN. Example 5;
窒素源としてヒドラジンを 2. 50 g、 炭素源として四塩化炭素を 3. 33 g 用いた以外は実施例 1と同様の処理を行った。 得られた MCNの CZN比を表 1 に示す。 実施例 6 ; The same treatment as in Example 1 was performed, except that 2.50 g of hydrazine was used as the nitrogen source and 3.33 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN. Example 6;
窒素源としてヒドラジンを 3. 50 g、 炭素源として四塩化炭素を 0. 48 g 用いた以外は実施例 1と同様の処理を行った。 得られた MCNの CZN比を表 1 に示す。 表 1 : The same treatment as in Example 1 was performed, except that 3.50 g of hydrazine was used as the nitrogen source and 0.48 g of carbon tetrachloride was used as the carbon source. Table 1 shows the CZN ratio of the obtained MCN. table 1 :
実施例 . 窒素源 炭素源 MCNの C/N比 Example. Nitrogen source Carbon source MCN C / N ratio
1 エチレンジァミン (2.22g) 四塩化炭素 (5.35g) 4.3 1 Ethylenediamine (2.22 g) Carbon tetrachloride (5.35 g) 4.3
2 エチレンジァミン (2.81g) 四塩化炭素 (4.43g) 2.82 Ethylenediamine (2.81 g) Carbon tetrachloride (4.43 g) 2.8
3 エチレンジァミン (2.35g) 四塩化炭素 (2.36g) 1.9 3 Ethylenediamine (2.35 g) Carbon tetrachloride (2.36 g) 1.9
4 エチレンジァミン (3.48g) 四塩化炭素 (0.31g) 1.2 4 Ethylenediamine (3.48 g) Carbon tetrachloride (0.31 g) 1.2
5 ヒドラジン (2.50g) 四塩化炭素 (3.33g) 0.73 5 Hydrazine (2.50g) Carbon tetrachloride (3.33g) 0.73
6 ヒドラジン (3.50g) 四塩化炭素 (0.48g) 0.27 表 1に示されるように、 広範囲にわたって C / N比を制御することができた。 このようにして得られた M C Nの細孔径は、 いずれも、 種々のたんぱく質等の生 体物質の直径に相当することが分かった。 したがって、 本発明によって得られた M C Nを用いて、 所定の直径を有する生体物質を M C Nの細孔中に固定化するこ とができる。 産業上の利用可能性 6 Hydrazine (3.50g) Carbon tetrachloride (0.48g) 0.27 As shown in Table 1, the C / N ratio could be controlled over a wide range. It was found that the pore diameters of the MCN obtained in this way correspond to the diameters of biological substances such as various proteins. Therefore, using the MCN obtained by the present invention, a biological substance having a predetermined diameter can be immobilized in the pores of MCN. Industrial applicability
以上説明してきたように、 本発明による方法によれば、 開始材料として窒素源 および炭素源を別個に用いるため、 C Z N比を広範囲に、 かつ、 より高精度に制 御した窒化炭素多孔体を製造することができる。 このようにして得られた窒化炭 素多孔体は、 従来の多孔体の性質を凌ぐ吸着性を有しているため、 従来の多孔体 に取って代わることができる。 具体的には、本発明による方法によって製造された窒化炭素多孔体は、 吸着剤、 分離剤、 触媒単体、 バッテリ電極、 キャパシ夕、 エネルギー格納体に適用可能で ある。 また、 本発明による方法によれば、 ダイヤモンドと同等またはそれ以上の硬度 を有する化学式 C 3N4で表される窒化炭素多孔体を製造することができる。 これによつて、 従来の工業ダイヤモンドに取って代わることができる。 また、 窒化炭素の半導体の性質を利用した半導体デバイスまたは発光デバイスに用いて もよい。 また、 細孔構造が生体物質の固定化に適していることから、 力学的強度 にきわめて優れ耐久性に富むバイオリアクターや、 半導体的性質に基づく各種バ ィォセンサーへと応用することができる。 As described above, according to the method of the present invention, since a nitrogen source and a carbon source are separately used as starting materials, a carbon nitride porous body in which the CZN ratio is controlled in a wide range and with higher accuracy is manufactured. can do. The carbon nitride porous body obtained in this way has an adsorptivity that surpasses the properties of the conventional porous body, and thus can replace the conventional porous body. Specifically, the carbon nitride porous body produced by the method according to the present invention is applicable to an adsorbent, a separating agent, a single catalyst, a battery electrode, a capacitor, and an energy storage body. Further, according to the method of the present invention, a carbon nitride porous body represented by the chemical formula C 3 N 4 having a hardness equal to or higher than that of diamond can be produced. This makes it possible to replace conventional industrial diamonds. Further, it may be used for a semiconductor device or a light emitting device utilizing the property of carbon nitride semiconductor. In addition, since the pore structure is suitable for immobilization of biological materials, it can be applied to bioreactors with excellent mechanical strength and high durability, and various biosensors based on semiconducting properties.
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| JP2004316596A JP4941953B2 (en) | 2004-10-29 | 2004-10-29 | Carbon nitride porous body and method for producing the same |
| JP2004-316596 | 2004-10-29 |
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| WO2006046756A1 true WO2006046756A1 (en) | 2006-05-04 |
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Cited By (6)
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| JP2010030844A (en) * | 2008-07-30 | 2010-02-12 | National Institute For Materials Science | Method for manufacturing carbon nitride porous material (mcn) |
| CN104607231A (en) * | 2015-02-16 | 2015-05-13 | 江苏理工学院 | Carbon nitride photocatalyst with three-dimensional ordered macroporous structure and preparation method thereof |
| WO2018037322A1 (en) * | 2016-08-22 | 2018-03-01 | Sabic Global Technologies B.V. | Rod-shaped mesoporous carbon nitride materials and uses thereof |
| CN107934931A (en) * | 2017-11-16 | 2018-04-20 | 福州大学 | A kind of modified graphite phase carbon nitride and its preparation method and application |
| CN111054297A (en) * | 2019-12-19 | 2020-04-24 | 南华大学 | Preparation of manganese ferrite/porous graphite phase carbon nitride and method for treating low-concentration uranium-containing wastewater |
| CN111250138A (en) * | 2020-02-28 | 2020-06-09 | 韶关学院 | A kind of porous nano-flaky graphitic carbon nitride and its preparation method and application |
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| CN101277900B (en) | 2005-09-30 | 2013-01-23 | 旭化成化学株式会社 | Nitrogen-containing carbonaceous material and manufacturing method thereof |
| CN100389059C (en) * | 2006-07-12 | 2008-05-21 | 北京理工大学 | A method for preparing open carbon nitride hollow spheres |
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| JPH09110408A (en) * | 1995-10-18 | 1997-04-28 | Nippon Telegr & Teleph Corp <Ntt> | Amorphous film and method for producing amorphous film |
| JP2004115344A (en) * | 2002-09-27 | 2004-04-15 | Japan Fine Ceramics Center | Heat-resistant amorphous porous material, method for producing the same, and catalyst carrier |
| JP2004168587A (en) * | 2002-11-19 | 2004-06-17 | Toyota Central Res & Dev Lab Inc | Nitrogen-containing carbon-based porous material and method for producing the same |
| JP2004210583A (en) * | 2002-12-27 | 2004-07-29 | Japan Science & Technology Agency | Manufacturing method of new mesoporous carbon structure |
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| JPH09110408A (en) * | 1995-10-18 | 1997-04-28 | Nippon Telegr & Teleph Corp <Ntt> | Amorphous film and method for producing amorphous film |
| JP2004115344A (en) * | 2002-09-27 | 2004-04-15 | Japan Fine Ceramics Center | Heat-resistant amorphous porous material, method for producing the same, and catalyst carrier |
| JP2004168587A (en) * | 2002-11-19 | 2004-06-17 | Toyota Central Res & Dev Lab Inc | Nitrogen-containing carbon-based porous material and method for producing the same |
| JP2004210583A (en) * | 2002-12-27 | 2004-07-29 | Japan Science & Technology Agency | Manufacturing method of new mesoporous carbon structure |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010030844A (en) * | 2008-07-30 | 2010-02-12 | National Institute For Materials Science | Method for manufacturing carbon nitride porous material (mcn) |
| CN104607231A (en) * | 2015-02-16 | 2015-05-13 | 江苏理工学院 | Carbon nitride photocatalyst with three-dimensional ordered macroporous structure and preparation method thereof |
| WO2018037322A1 (en) * | 2016-08-22 | 2018-03-01 | Sabic Global Technologies B.V. | Rod-shaped mesoporous carbon nitride materials and uses thereof |
| CN109689568A (en) * | 2016-08-22 | 2019-04-26 | 沙特基础工业全球技术公司 | Rodlike mesoporous carbon nitride material and application thereof |
| CN107934931A (en) * | 2017-11-16 | 2018-04-20 | 福州大学 | A kind of modified graphite phase carbon nitride and its preparation method and application |
| CN111054297A (en) * | 2019-12-19 | 2020-04-24 | 南华大学 | Preparation of manganese ferrite/porous graphite phase carbon nitride and method for treating low-concentration uranium-containing wastewater |
| CN111250138A (en) * | 2020-02-28 | 2020-06-09 | 韶关学院 | A kind of porous nano-flaky graphitic carbon nitride and its preparation method and application |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4941953B2 (en) | 2012-05-30 |
| JP2006124250A (en) | 2006-05-18 |
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