WO2006043462A1 - Reflector for led and method for producing the same - Google Patents
Reflector for led and method for producing the same Download PDFInfo
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- WO2006043462A1 WO2006043462A1 PCT/JP2005/018857 JP2005018857W WO2006043462A1 WO 2006043462 A1 WO2006043462 A1 WO 2006043462A1 JP 2005018857 W JP2005018857 W JP 2005018857W WO 2006043462 A1 WO2006043462 A1 WO 2006043462A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/855—Optical field-shaping means, e.g. lenses
- H10H20/856—Reflecting means
Definitions
- the present invention relates to a light reflector that is applied to a light-emitting device using an LED element and a method for manufacturing the light reflector.
- LEDs light-emitting diodes
- white LEDs are expected as next-generation light sources to replace conventional white light bulbs, halogen lamps, HID lamps, and so on.
- LEDs have been evaluated for their features such as long life, power saving, temperature stability, and low-voltage drive, and they are applied to displays, destination indicators, in-vehicle lighting, signal lights, emergency lights, mobile phones, video cameras, and so on.
- a reflector is used to extract light output from the LED as efficiently as possible.
- the light in the visible region is naturally high, and it is desirable that the reflectance be as high as possible for the light emitted from the LED.
- thermoplastic resin composition in which titanium oxide is blended with a thermoplastic resin such as polycarbonate is widely used as a reflector (for example, Patent Documents 1 and 2).
- the reflector has high reflection performance for light in the visible region, but it was applied to LEDs that have low reflectivity due to the absorption of light by titanium dioxide for light in the ultraviolet region even at forces near 400 nm. In some cases, the light extraction efficiency was low.
- Patent Document 4 a technique for producing a foam by allowing gas to penetrate into a polyester-based resin sheet at room temperature and then degassing by raising the temperature is disclosed.
- Patent Document 5 a technique for obtaining a foam by allowing a polysiloxane-based resin sheet to infiltrate a gas at a high temperature and then degassing it under reduced pressure.
- Patent Document 1 Japanese Patent Laid-Open No. 9 3211
- Patent Document 2 JP 2001-302899 A
- Patent Document 3 Japanese Unexamined Patent Publication No. 2003-195020
- Patent Document 4 International Publication No. 97Z01117 Pamphlet
- Patent Document 5 Japanese Unexamined Patent Publication No. 2003-49018
- an object of the present invention is to provide a reflector for an LED having high reflectivity from the visible region to the ultraviolet region and a method for manufacturing the same.
- Another object of the present invention is to provide a method for manufacturing an LED reflector that can stably manufacture the plurality of LED reflectors.
- the inventors of the present invention have been manufactured from a resin or a resin composition in which the light wavelength at which the light transmittance is reduced to 50% at an optical path length of 250 ⁇ m is 400 nm or less. If a foam with a number average cell diameter of 50 m or less is used, it is possible to obtain a reflector for an LED having an extremely high reflectivity in the visible ultraviolet region, in particular, a thermal decomposition temperature of 300 ° C or higher. It has been found that when the cocoa resin or rosin composition is foamed, a high reflectance can be maintained even after the heat treatment process during LED production.
- the foam obtained by the conventional technique has a different foaming state depending on the position in the foam sheet, and the reflectance is uneven within one sheet. We found that this was caused by the fact that the amount of gas permeation and the temperature during foaming varied greatly depending on the position in the sheet.
- the present inventors control the gas permeation temperature unevenness in foam molding to be within ⁇ 20 ° C between products, or set the temperature rise rate during heating foaming to 50 ° C. The present inventors have found that when the control is performed so that the temperature is higher than or equal to ° CZ, the reflectance can be increased and the variation in reflectance between products can be reduced.
- Preferred embodiments of the reflector for LED and the manufacturing method thereof according to the present invention are as follows.
- a foam is produced by infiltrating gas into a resin or resin composition layer comprising a resin or resin composition formed on a continuous metal plate in advance, and then degassing 3 to 7!
- FIG. 1 is a graph showing an example of a temperature rising pattern during heating by a surface heater.
- FIG. 2 (a) is a top view showing a copper plate used in Examples, and (b) is a cross-sectional view of a separated copper plate formed with a resin layer.
- FIG. 3 is a schematic sectional view of the autoclave used in the examples.
- the rosin or rosin composition used in the present invention (hereinafter, "the rosin or rosin composition” may be simply referred to as “fax”) are listed below. It is not limited to this. Wavelength of light that reduces light transmittance to 50% at an optical path length of 250 m ⁇ is 400 nm or less
- the reflectance particularly in the ultraviolet region can be increased.
- a resin whose reflectivity does not significantly decrease due to heat during LED manufacturing (especially sealing or solder reflow process).
- a resin should have a 5% weight loss temperature (thermal decomposition temperature) Td of 300 ° C or higher, preferably 330 ° C or higher, more preferably 380 ° C or higher.
- Td thermal decomposition temperature
- the glass transition temperature Tg is 140 ° C or higher, preferably 190 ° C or higher, more preferably 210 ° C or higher. If the Tg is less than 140 ° C, the melt viscosity will be reduced at the sealing temperature, cell coalescence will easily occur, and the reflectivity may be reduced.
- the Tg when a cross-linked type of resin is used, the Tg may be quite low because it has a melt viscosity that is the sealing temperature even if the Tg is less than 140 ° C. If the above thermal decomposition temperature condition is satisfied, the decrease in reflectance is small.
- Tm is desirably 220 ° C or higher, preferably 240 ° C or higher, and more preferably 260 ° C or higher.
- Such a resin include polycarbonates, acrylic polymers, silicone polymers, cycloolefin polymers, polyimides, siloxane polymers, styrene polymers, polyethers, polyesters, polyamides. , Liquid crystal polymers, and epoxy resins.
- examples thereof include copolymers, olefin-maleimide copolymers, polyethersulfones, polyarylates, polystyrenes, polyethylene terephthalates, polyetherolene ketones, polyetherolonitriles, polyethylene terephthalates, and polyethylene naphthalates.
- a composition in which two or more of these rosins are mixed can also be used.
- Various additives commonly used in ordinary polymer chemistry may be added to rosin.
- tackifiers, plasticizers, flame retardants, anti-aging agents, modifiers, heat stabilizers, UV stabilizers, colorants and the like can be exemplified.
- the thermally conductive filler is preferably added in an amount of 0.1 to 60% by weight, more preferably 1 to 40% by weight.
- the heat conduction filler include aluminum nitride, alumina, zinc oxide, silica, titer, and lithium titanate.
- the average cell diameter of the resin foam of the present invention is 50 ⁇ m or less, preferably 40 ⁇ m or less, more preferably 30 ⁇ m or less.
- the number average foamed cell diameter of the foamed molded product can be reduced to 50 m or less by selecting an appropriate foaming temperature according to the thermal properties of the resin to be foamed.
- the foaming method of the present invention is not particularly limited as long as it is produced by foaming rosin and satisfies the requirements of the present invention.
- the type of gas used for foaming is not limited as long as it penetrates the fat.
- an inert gas such as nitrogen, carbon dioxide, and helium is preferable.
- the gas state may be any of gas, liquid, and supercritical state. Further, foaming may be performed using a chemical foaming agent or the like.
- dinitrosopentamethylenetetramine, azodicarbonamide, p, p, monooxybisbenzenesulfur hydrazide, p-toluenesulfol hydrazide, p-toluenesulfol acetone hydrazone, hydrazodicarbonamide, etc. can be mentioned.
- An apparatus for producing a foam using an inert gas usually comprises a step of shaping a resin, and a step of infiltrating the gas into the molded body and then degassing and foaming.
- the resin molded body is placed in a pressure vessel such as an autoclave, and the gas is infiltrated into the resin by injecting the gas.
- the temperature at which the gas penetrates can be arbitrarily selected.
- the gas dissolved in It is preferable to select a temperature at which the solubility increases (for example, the solubility of carbon dioxide is increased at lower temperatures).
- a temperature at which the solubility increases for example, the solubility of carbon dioxide is increased at lower temperatures.
- the solubility of carbon dioxide is increased at lower temperatures.
- the gas permeation time is usually from 10 minutes to 2 days, preferably from 30 minutes to 3 hours. In the case of continuous injection foaming, since the penetration efficiency is high, it is usually 20 seconds or longer and 10 minutes or shorter.
- the amount of gas penetration is determined according to the target foaming ratio. In the present invention, it is usually from 0.1 to 20% by weight, preferably from 1 to 10% by weight, based on the weight of the resin.
- the pressure during gas permeation is usually 0.1 to 50 MPa, preferably 3 to 30 MPa.
- the temperature can be set arbitrarily.
- the characteristics of the polymer material into which the gas has permeated will be described.
- the inflection point of the chain motion for example, the glass transition temperature in the case of amorphous resin
- Foaming occurs when the pressure in the autoclave is reduced to normal pressure at temperatures above the inflection point.
- temperatures below the inflection point foaming does not occur even when the pressure in the autoclave is reduced to normal pressure.
- the foaming time is usually 10 seconds or more and 5 minutes or less.
- Tc is the crystallization temperature of the resin
- Tg is the glass transition temperature
- Tm is the melting temperature
- Td is the 5% weight loss temperature.
- foaming occurs in the depressurization process after gas permeation or in the heating process after depressurization.
- gas is permeated at a low temperature of ⁇ 30 to 60 ° C., depressurized, and further heated to a high temperature of 80 to 400 ° C. for foaming.
- the points to be noted when foaming in the latter heating process are described.
- time t it is necessary to control the time t until the pressure is heat treated at normal pressure.
- This time t should be as short as possible, but it is usually within 2 hours at room temperature. It is preferably within 1 hour, more preferably within 30 minutes. If t exceeds 2 hours, the gas naturally escapes from the inside of the polymer material, resulting in poor foaming effect and a high reflectivity material may not be obtained.
- t may be long. For example, if it is stored at ⁇ 30 ° C., it is possible to obtain a highly reflective material even if t is 24 hours or longer.
- the second point of caution is to control the rate of temperature rise during heating and foaming.
- the rate of temperature rise dTZ dt is preferably 50 ° CZ or more, more preferably 70 ° CZ or more, and even more preferably 100 ° CZ or more. If dTZdt is less than 50 ° CZ, the foaming effect is poor and a material with high reflectivity may not be obtained.
- Figure 1 shows an example of the temperature rise pattern. Temperature is (T f + T 0)
- T f is a set value of the foaming temperature
- T 0 is an initial temperature before heating.
- the gas is blown into the resin being kneaded in the extruder.
- Amorphous fats are usually infiltrated with gas near Tg, more specifically at a temperature of (Tg-20) ° C or higher. This makes it easier for the amorphous resin and gas to be compatible.
- the upper limit temperature can be freely set at a temperature that does not adversely affect the resin. However, it is desirable to infiltrate at a temperature of (Tg + 250) ° C or less. If this temperature is exceeded, the foamed cells may become large or the resin may be thermally deteriorated, which may reduce the strength of the foam.
- the gas permeation temperature unevenness As low as possible between products when performing foam molding. This is because the smaller the gas permeation temperature unevenness, the more uniform the gas solubility of the product, and the more uniform the foamed state, and the smaller the difference in physical properties (reflectance, etc.) for each product. Specifically, it is desirable to control within ⁇ 20 ° C, preferably within ⁇ 10 ° C. In the case of continuous foaming, since the gas is impregnated in the injection unit set at a constant temperature, it is possible to keep the foaming temperature unevenness between products relatively low.
- a large number of molded products are usually placed in a pressure-resistant container at one time to allow gas to permeate. At this time, it is preferable to keep the temperature in the container as constant as possible.
- a stirring mechanism is provided in the container, or the temperature of the installation position of the molded product is individually controlled.
- one of the causes of temperature unevenness during gas permeation is that the thermal conductivity of the resin is low.
- the use of a metal plate has the advantage of increasing the rate of temperature rise during heating and foaming. A large number of reflectors can be produced by foaming the resin layer on the metal plate and then cutting it into small units.
- the metal plate can be used as a heat sink as it is, or as a lead frame if it is electrically conductive.
- the method for forming the resin layer on the metal plate is not limited. For example, there are a solvent casting method, a compression molding method, etc., or a method of forming a resin sheet on the surface of a metal plate by thermoforming, a method of integrating the metal plate and the resin by injection molding, a curable resin There is a method of applying the composition to the surface of a metal plate.
- Foaming may be carried out as it is in the pressure vessel used in the gas infiltration process!
- an oven or an oil nose may be used separately.
- foaming it is necessary to devise a method for increasing the temperature rise rate of 50 ° CZ or more for the V-type deviation of multiple resin molded products.
- a planar heater can also be used without using an oven.
- the upper surface is relatively constant in temperature, and if a group of resin molded products is pressed against the heater surface, Any molded product can be similarly heated to a predetermined temperature at a high heating rate. In addition, the same effect can be obtained by simply bringing the resin molded product close to the sheet heater without contacting it. In this case, the distance between the resin molded product and the planar heater is within 20 cm, preferably within 10 cm, and more preferably within 5 cm. With the above-described devices, a uniform product group with high reflectivity can be obtained.
- PET Polyethylene terephthalate
- TR-4550BH Tg; 80 ° C., Tc 40. C, Tm; 255. C, Td; 390. C, ⁇ ; 320 nm).
- PESF Polyethersulfone sheet
- Curable silicone resin composition (SRC): Japanese Patent Application Laid-Open No. 2004-175887 'Synthesized in the same manner as in Example 1 (Tg; 130 ° C, Td; 335 ° C, ⁇ ; 288 nm) .
- Amorphous polyetheretherketone film (Amorphous PEEK): Victrex Emshiichi Sumilite FS—1100C was heated and dissolved, then put into a 25 ° C water bath and amorphous PEEK Films were obtained (Tg; 145 ° C, Tc; 176 ° C, Tm; 337 ° C, Td; 550 ° C, ⁇ ; 4
- PA Semi-aromatic polyamide
- Inorganic filler (1) Titanium acid: Ishihara Sangyo Co., Ltd., Typeter R680
- Pellets were obtained by kneading at a weight ratio of 70/30 using a 35 mm twin screw extruder at a temperature of 330 ° C. and a screw rotation speed of 30 Orpm.
- a tracing paper was placed on a scanning electron microscope (SEM) observation photograph, and the foamed cell that was visible through the trace was traced.
- the trace was binarized with an image processor, and the cross-sectional area of the foam cell was determined.
- the individual shape of the foam cell is often approximately elliptical, but there is distortion or the like for each cell. Therefore, each cell shape was converted to a circle with the same area, and the diameter was taken as the cell diameter. The number average cell diameter was determined from the individual cell diameters thus determined.
- a multi-purpose large sample chamber unit MPC-2200 manufactured by Shimadzu Corporation was attached to the above-mentioned self-recording spectrophotometer, and the reflectance (%) was measured in the wavelength range of 700 to 250 nm.
- magnesium oxide was used as a reference.
- DSC7 differential scanning calorimeter
- thermogravimetric analyzer manufactured by Perkin Elma Co., Ltd., measuring the temperature when nitrogen is heated to 40 to 650 ° C at a heating rate of 20 ° CZ for 5% of the total weight. And this is T defined as d.
- the temperature unevenness and the rate of temperature increase were measured by bringing a temperature sensor directly into contact with the resin molded product.
- Table 1 shows the used resin Z compositions, production conditions, and the like of Examples and Comparative Examples.
- Fig. 2 (a) Twenty-five pieces of the copper plate 1 shown in Fig. 2 (a) were prepared one by one, and a PET resin layer of about 250 m was formed on it by compression molding. A copper plate 1 with a PET layer is shown in Fig. 2 (b).
- the autoclave 3 shown in Fig. 3 was used as a gas infiltration container (batch type foaming).
- Copper plates 4 each having a resin layer formed therein were placed in the autoclave, and carbon dioxide with a pressure increased at room temperature was introduced. Furthermore, the pressure was increased to 15 MPa while maintaining the room temperature. Next, while maintaining the pressure at 15 MPa, the temperature at each sample position was raised to 160 ° C and left for 1 hour. The temperature variation between products in this process was ⁇ 3 ° C. Thereafter, the inside of the autoclave was depressurized to foam the PET resin layer. The obtained foam was carefully peeled from the high thermal conductor (copper plate), and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
- a foam was obtained in the same manner as in Example 1 except that the autoclave was installed in a thermostatic bath set at 160 ° C instead of adjusting the temperature of the heater in the sample place.
- the temperature variation between products in the carbon dioxide impregnation process was ⁇ 25 ° C. Table 2 shows the evaluation results.
- Example 2 In the same manner as in Example 1, without changing the copper plate 1 in FIG. 2 (a), 25 PET resin layers were formed on the entire surface of the copper plate and placed in an autoclave. Next, the autoclave was placed in a thermostatic layer, the temperature of the thermostat was raised to 160 ° C while maintaining the pressure of carbon dioxide and carbon dioxide at 15 MPa, and left for 1 hour (the autoclave heater was used during this time). Natsu ) In this process, the temperature variation between products is ⁇ 5. It was within C. After that, the pressure was quickly released to normal pressure, and the PET resin layer was foamed. The obtained foam was carefully peeled from the copper plate, and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
- the PESF film was thermoformed on the entire copper plate as it was without breaking apart the copper plate 1 in Fig. 2 (a), and 25 PESF resin layers were formed and installed in the autoclave (film thickness; approx. 250 m).
- the autoclave was placed in a thermostat set at 40 ° C., carbon dioxide was introduced, the pressure was increased to 15 MPa, and the mixture was allowed to stand for 2 hours. Thereafter, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a surface heater set at 190 ° C for 1 minute to foam PESF resin.
- the temperature rise rate of the resin layer when the copper plate was in contact with the heater on the surface was 100 ° CZ or more even at the lowest, depending on the location.
- the obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
- Fig. 2 (a) Copper plate 1 is not broken apart.
- the special PC is dissolved and applied in tetrahydrofuran at a concentration of about 20% by weight on the entire surface of the copper plate.
- a layer was formed (film thickness; about 200; ⁇ ⁇ ).
- it was placed in an autoclave, placed in a thermostatic chamber set at 40 ° C., carbon dioxide was introduced, and the pressure was increased to 15 MPa. After leaving for 2 hours, the pressure in the autoclave was released, and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 270 ° C for 1 minute to foam special PC resin.
- the temperature rise rate of the resin layer when the copper plate was in contact with the surface heater varied depending on the location, but at least 100 ° CZ min or more.
- the obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
- a foam was obtained in the same manner as in Example 5 except that the set temperature of the planar heater was 200 ° C. Table 2 shows the evaluation results.
- a foam was obtained in the same manner as in Example 5 except that the set temperature of the planar heater was 140 ° C. .
- Table 2 shows the evaluation results.
- a foam was obtained in the same manner as in Example 5 except that the set temperature of the planar heater was 330 ° C. Table 2 shows the evaluation results.
- Example 5 The same operation as in Example 5 was performed except that the set temperature of the planar heater was set to 100 ° C. However, there was almost no foaming power. The appearance was transparent and the reflectivity was judged to be very low, and no further evaluation was made.
- a foam was obtained in the same manner as in Example 6 except that the copper plate was placed in a thermostat set to 200 ° C. instead of contacting the sheet heater.
- Table 2 shows the evaluation results. The temperature rising rate of the resin layer in the thermostatic chamber varied depending on the location, and was 30 to 70 ° CZ.
- a foam was obtained in the same manner as in Example 6 except that the pressure after introduction of carbon dioxide was 5 MPa. The results are shown in Table 2.
- the copper plate 1 is not disassembled, but the special PI is dissolved in N-methyl 2-pyrrolidone at a concentration of about 15% by weight and applied to the entire surface of the copper plate.
- a special PI resin layer was formed (film thickness: approx. 200 m).
- it was placed in an autoclave and placed in a thermostatic chamber set at 40 ° C. Carbon dioxide was introduced and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized, and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 200 ° C for 1 minute to foam special PI resin.
- the temperature rise rate of the resin layer when the copper plate was brought into contact with the heater on the surface was at least 100 ° CZ min.
- the obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
- thermoset silicone resin layer was formed (film thickness; approximately 300 m).
- the temperature rise rate of the resin layer when the copper plate was in contact with the surface heater varied depending on the location, but it was at least 100 ° CZ min.
- the obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
- Fig. 2 (a) Copper plate 1 is not broken apart, and the PEEK film is thermoformed at 380 on the entire surface of the copper plate, and then placed in a 25 ° C water bath to form 25 amorphous PEEK resin layers. (Film thickness; about 150 m). Next, it was placed in an autoclave, placed in a constant temperature bath set at 40 ° C, and carbon dioxide was introduced and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 120 ° C for 1 minute to foam amorphous PEEK resin.
- the rate of temperature rise of the resin layer when the copper plate was brought into contact with the surface heater was at least 100 ° CZ min at least, although it varied depending on the location.
- the obtained foam was carefully peeled off from the copper plate, and the foam cell diameter and reflectivity were measured. The results are shown in Table 2.
- Fig. 2 (a) copper plate 1 is not disassembled, and PMMA is dissolved and applied in black mouth form at a concentration of about 15% by weight on the entire surface of the copper plate. (Film thickness; about 200 m). Next, it was placed in an autoclave, placed in a thermostatic chamber set at 40 ° C., carbon dioxide was introduced, and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 90 ° C for 1 minute to foam PMMA resin. The temperature rise rate of the resin layer when the copper plate was in contact with the surface heater was at least 100 ° CZ min. The obtained foam was carefully peeled off from the copper plate, and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
- Example 12 Prepare four copper plates as shown in Fig. 2 (a). Dissolve and apply special PC in tetrahydrofuran at a concentration of about 20% by weight on the entire surface of each copper plate, and then evaporate the solvent to form a special PC resin layer. (Film thickness; approx. 200 m). Next, the four resin layers were peeled off from each copper plate and placed in an autoclave. Then, carbon dioxide was introduced at room temperature and the pressure was increased to 5 MPa. After leaving it for 2 hours, the pressure inside the autoclave was released, and the four resin layers were taken out under atmospheric pressure. Due to gas impregnation at room temperature, the temperature unevenness at this time was extremely small ⁇ 1 ° C.
- a sheet of PAZTiO resin composition was prepared by compression molding at 360 ° C. Sheet reflectivity
- a sheet of PAZ potassium titanate resin composition was formed by compression molding at 360 ° C.
- Table 2 shows the measurement results of the sheet reflectivity.
- Type Td CC ⁇ 50 (nm) Temperature control Formation method Pressure (MPa) Temperature (in) Temperature unevenness (in) Temperature increase rate (in / min) S degree (C) Heating case
- PESF 481 336 Continuous None Thermoforming 15 40 ⁇ 2 ⁇ 100 190 Planar heater (contact)
- Example 5 Special PC 467 2 ⁇ 6 Continuous None Solvent cast 15 40 ⁇ 2 270 Planar heater (contact)
- Example 6 Special PC 467 2 ⁇ 6 Continuous None Solvent text 15 40 ⁇ 2> 100 200 Planar heater (contact)
- Example 7 Special PC 467 296 Continuous None Solvent cast 15 40 ⁇ 2> 100 140 Planar heater ( ⁇ 0 Comparative example 1 Special PC 467 296 1 ⁇ 2fe None
- the number average cell diameter ( ⁇ m) is 50 ⁇ m or less for a resin whose wavelength is 4 OOnm or less, which reduces the light transmittance to 50% at an optical path length of 250 m.
- the reflectivity at 380 nm was 80% or higher.
- a resin having a thermal decomposition temperature of 300 ° C or higher was used, a decrease in reflectance at 550 nm due to heat treatment could be suppressed.
- the permeation temperature unevenness is controlled to be within ⁇ 20 ° C between products, or when the heating rate during heating and foaming is controlled to 50 ° CZ or more, the reflectance between products at 380 nm The variation in the range was reduced to within ⁇ 5%.
- the LED reflector of the present invention can be used for various office automation equipment, electrical and electronic equipment and parts, automobile parts, and the like such as displays, destination display boards, in-vehicle lighting, signal lights, emergency lights, mobile phones, and video cameras.
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Abstract
Description
明 細 書 Specification
LED用反射体及びその製造方法 LED reflector and manufacturing method thereof
技術分野 Technical field
[0001] 本発明は、 LED素子を用いた発光器具に適用される光反射体及びその製造方法 に関する。 The present invention relates to a light reflector that is applied to a light-emitting device using an LED element and a method for manufacturing the light reflector.
背景技術 Background art
[0002] 1990年代以降、発光ダイオード (LED)の進歩は目覚しぐ高出力化とともに多色 化が進んでいる。なかでも白色 LEDは従来の白色電球、ハロゲンランプ、 HIDラン プ等を代替する次世代の光源として期待されている。実際、 LEDは長寿命、省電力 、温度安定性、低電圧駆動等の特長が評価され、ディスプレイ、行き先表示板、車載 照明、信号灯、非常灯、携帯電話、ビデオカメラ等に応用されている。白色光を出力 する方法としては、青色 LED (波長 460nm)と YAG蛍光体 (黄色発色)を組み合わ せる方法、 UV— LED (波長 380nm)と RZGZB蛍光体を組み合わせる方法が知ら れており、高輝度化、演色性の観点力 後者の方式が有望視されている。 [0002] Since the 1990s, light-emitting diodes (LEDs) have progressed in multi-color with a remarkable increase in output. In particular, white LEDs are expected as next-generation light sources to replace conventional white light bulbs, halogen lamps, HID lamps, and so on. In fact, LEDs have been evaluated for their features such as long life, power saving, temperature stability, and low-voltage drive, and they are applied to displays, destination indicators, in-vehicle lighting, signal lights, emergency lights, mobile phones, video cameras, and so on. As a method of outputting white light, a method of combining a blue LED (wavelength 460 nm) and a YAG phosphor (yellow color), and a method of combining a UV LED (wavelength 380 nm) and an RZGZB phosphor are known. Perspective of visualization and color rendering The latter method is considered promising.
[0003] LEDから出力される光をできるだけ効率よく取出すために反射体が用いられる。反 射体としては、可視領域の光は当然のこと、 LEDが発する光に対してもできるだけ反 射率が高!、ことが望まれて 、る。 [0003] A reflector is used to extract light output from the LED as efficiently as possible. As a reflector, the light in the visible region is naturally high, and it is desirable that the reflectance be as high as possible for the light emitted from the LED.
[0004] ポリカーボネート等の熱可塑性榭脂に酸化チタンを配合した熱可塑性榭脂組成物 力もなる反射体が汎用されている(例えば、特許文献 1, 2)。該反射体は可視領域の 光に対しては概ね高い反射性能を有するが、 400nm付近力も紫外領域の光に対し ては酸ィ匕チタンが光を吸収するため反射率が低ぐ LEDに適用した場合、光取出効 率が低いという問題があった。 [0004] A thermoplastic resin composition in which titanium oxide is blended with a thermoplastic resin such as polycarbonate is widely used as a reflector (for example, Patent Documents 1 and 2). The reflector has high reflection performance for light in the visible region, but it was applied to LEDs that have low reflectivity due to the absorption of light by titanium dioxide for light in the ultraviolet region even at forces near 400 nm. In some cases, the light extraction efficiency was low.
[0005] 上記問題を解決するため、紫外線をも反射する繊維状もしくは薄片状の無機化合 物(例えば、チタン酸カリウム繊維)を用いる方法が提案されている(例えば、特許文 献 3)。しかし、多少効果はあるものの 380nmでの反射率が 50〜70%と低ぐ光取出 効率は依然低いものであった。また、反射体は封止工程やはんだリフロー工程で高 温にさらされる力 この過程でさらに、可視領域の光に対する反射率も大きく低下して しまう問題があった。 [0005] In order to solve the above problem, a method using a fibrous or flaky inorganic compound (for example, potassium titanate fiber) that also reflects ultraviolet rays has been proposed (for example, Patent Document 3). However, although it is somewhat effective, the light extraction efficiency, which has a low reflectance at 380 nm of 50 to 70%, is still low. In addition, the reflector is exposed to high temperatures in the sealing process and solder reflow process. In this process, the reflectance to light in the visible region is also greatly reduced. There was a problem.
[0006] 一方、ポリエステル系榭脂のシートに室温でガスを浸透させ、その後昇温することに より脱ガスさせ、発泡体を製造する技術が開示されている (例えば、特許文献 4)。ま た、同様の技術として、ポリシロキサン系榭脂のシートに高温でガスを浸透させ、その 後減圧することにより脱ガスさせ、発泡体を得る技術がある(例えば、特許文献 5)。 [0006] On the other hand, a technique for producing a foam by allowing gas to penetrate into a polyester-based resin sheet at room temperature and then degassing by raising the temperature is disclosed (for example, Patent Document 4). Further, as a similar technique, there is a technique for obtaining a foam by allowing a polysiloxane-based resin sheet to infiltrate a gas at a high temperature and then degassing it under reduced pressure (for example, Patent Document 5).
[0007] 特許文献 1 :特開平 9 3211号公報 Patent Document 1: Japanese Patent Laid-Open No. 9 3211
特許文献 2:特開 2001— 302899号公報 Patent Document 2: JP 2001-302899 A
特許文献 3 :特開 2003— 195020号公報 Patent Document 3: Japanese Unexamined Patent Publication No. 2003-195020
特許文献 4:国際公開第 97Z01117号パンフレット Patent Document 4: International Publication No. 97Z01117 Pamphlet
特許文献 5 :特開 2003— 49018号公報 Patent Document 5: Japanese Unexamined Patent Publication No. 2003-49018
[0008] 本発明の目的は、上記問題に鑑み、可視領域から紫外領域にかけて高!、反射性 能を有する LED用反射体及びその製造方法を提供することである。 [0008] In view of the above problems, an object of the present invention is to provide a reflector for an LED having high reflectivity from the visible region to the ultraviolet region and a method for manufacturing the same.
また、本発明の他の目的は、上記の複数の LED用反射体を安定して製造できる L ED用反射体の製造方法を提供することである。 Another object of the present invention is to provide a method for manufacturing an LED reflector that can stably manufacture the plurality of LED reflectors.
発明の開示 Disclosure of the invention
[0009] 本発明者らは、鋭意研究の結果、光路長 250 μ mでの光線透過率が 50%に低下 する光の波長が 400nm以下である榭脂又は榭脂組成物から製造された、数平均セ ル径が 50 m以下の発泡体を用いれば、可視力 紫外領域にかけて極めて高い反 射率を有する LED用反射体を得ることができること、特に、熱分解温度が 300°C以 上の榭脂又は榭脂組成物を発泡させると、 LED製造時の熱処理工程を経ても尚、 高い反射率を維持できることを見出した。 [0009] As a result of intensive studies, the inventors of the present invention have been manufactured from a resin or a resin composition in which the light wavelength at which the light transmittance is reduced to 50% at an optical path length of 250 μm is 400 nm or less. If a foam with a number average cell diameter of 50 m or less is used, it is possible to obtain a reflector for an LED having an extremely high reflectivity in the visible ultraviolet region, in particular, a thermal decomposition temperature of 300 ° C or higher. It has been found that when the cocoa resin or rosin composition is foamed, a high reflectance can be maintained even after the heat treatment process during LED production.
[0010] さらに、前記従来技術で得られる発泡体は、発泡シート内の位置により発泡状態が 異なり、一つのシート内で反射率にムラがあった。これはガス浸透量や発泡時の温度 がシート内の位置により大きく異なることが原因であることを見い出した。 [0010] Further, the foam obtained by the conventional technique has a different foaming state depending on the position in the foam sheet, and the reflectance is uneven within one sheet. We found that this was caused by the fact that the amount of gas permeation and the temperature during foaming varied greatly depending on the position in the sheet.
本発明者らは予備検討として、 LED用反射体を一つずつ別々に製造したところ、 製品毎の反射率ムラが小さい製品群を得ることができた。ところが、これでは生産性 が低すぎて、 LED用反射体を安価に提供できない。生産性を上げるためには、一度 に多数の成形品を発泡処理する必要があった。 [0011] 上記の問題に対して、本発明者らは、発泡成形におけるガス浸透温度ムラが製品 間で ± 20°C以内となるように制御する、又は、加熱発泡時の昇温速度を 50°CZ分 以上となるように制御すると、反射率を高くでき、かつ、製品間における反射率のバラ ツキを小さくできることを見出し本発明を完成させた。 As a preliminary study, the inventors manufactured LED reflectors one by one, and were able to obtain a product group with small reflectance unevenness for each product. However, this makes the productivity too low to provide LED reflectors at low cost. In order to increase productivity, it was necessary to foam many molded products at once. [0011] In order to solve the above problems, the present inventors control the gas permeation temperature unevenness in foam molding to be within ± 20 ° C between products, or set the temperature rise rate during heating foaming to 50 ° C. The present inventors have found that when the control is performed so that the temperature is higher than or equal to ° CZ, the reflectance can be increased and the variation in reflectance between products can be reduced.
[0012] 本発明による LED用反射体及びその製造方法の好適な実施形態は以下の通りで ある。 [0012] Preferred embodiments of the reflector for LED and the manufacturing method thereof according to the present invention are as follows.
1.光路長 250 mでの光線透過率が 50%に低下する光の波長力 400nm以下で ある榭脂又は榭脂組成物カゝら製造された、数平均発泡セル径が 50 m以下の発泡 体からなる LED用反射体。 1. Foam with a number average foamed cell diameter of 50 m or less manufactured by a resin or a resin composition having a light wavelength power of 400 nm or less that reduces the light transmittance to 50% at an optical path length of 250 m. LED reflector made of body.
2. 5%重量減少温度が 300°C以上の榭脂または榭脂組成物力もなる 1記載の LED 用反射体。 2. The reflector for LED according to 1, wherein the 5% weight loss temperature is 300 ° C or higher, and the composition of the resin also has a resin composition strength.
3.前記榭脂又は榭脂組成物にガスを浸透させ、その後脱ガスすることにより発泡体 を製造する、 1又は 2—項記載の LED用反射体の製造方法。 3. The method for producing a reflector for an LED according to item 1 or 2, wherein a foam is produced by allowing gas to penetrate into the resin or the resin composition and then degassing.
4.加圧下榭脂又は榭脂組成物にガスを浸透させ、その後常圧に戻す過程で榭脂 又は榭脂組成物を発泡させる 3記載の LED用反射体の製造方法。 4. The method for producing a reflector for an LED according to 3, wherein gas is permeated into the resin or resin composition under pressure, and then the resin or resin composition is foamed in the process of returning to normal pressure.
5.ガスが含浸した榭脂又は榭脂組成物を、昇温速度を 50°CZ分以上で加熱する 過程で榭脂又は榭脂組成物を発泡させる 3記載の LED用反射体の製造方法。 5. The method for producing a reflector for an LED according to 3, wherein the resin or the resin composition impregnated with gas is foamed in the process of heating the resin or the resin composition at a temperature rising rate of 50 ° CZ or more.
6.ガスが含浸した榭脂又は榭脂組成物を面状ヒーターに 20cm以内に接近させるこ とにより昇温させる 5記載の LED用反射体の製造方法。 6. The method of producing a reflector for an LED according to 5, wherein the temperature is increased by bringing the gas-impregnated resin or resin composition close to a planar heater within 20 cm.
7.複数の榭脂又は榭脂組成物からなる成形体を耐圧容器に入れ、前記成形体間 の温度ムラを ± 20°C以内に制御しながら、前記成形体にガスを浸透させる 3〜6のい ずれか記載の LED用反射体の製造方法。 7. Put a molded body made of a plurality of greaves or greave compositions into a pressure vessel, and allow gas to penetrate into the molded body while controlling the temperature unevenness between the molded bodies within ± 20 ° C. A method for manufacturing a reflector for an LED according to any one of the above.
8.予め、連続する金属板上に形成された榭脂又は榭脂組成物からなる榭脂又は榭 脂組成物層に、ガスを浸透させ、その後脱ガスすることにより発泡体を製造する 3〜7 の!、ずれか記載の LED用反射体の製造方法。 8. A foam is produced by infiltrating gas into a resin or resin composition layer comprising a resin or resin composition formed on a continuous metal plate in advance, and then degassing 3 to 7! The manufacturing method of the reflector for LEDs as described in any of the above.
9.耐圧容器において、各成形体の温度をそれぞれ独立にヒータで制御する 7記載 の LED用反射体の製造方法。 9. The method for producing a reflector for an LED according to 7, wherein the temperature of each molded body is independently controlled by a heater in the pressure vessel.
10.榭脂又は榭脂組成物層を発泡させた後に、連続する金属板と榭脂又は榭脂組 成物層の積層体をより小さな単位に切断する 8記載の LED用反射体の製造方法。10. After foaming the greaves or greaves composition layer, continuous metal plate and greaves or greaves 9. The method for producing a reflector for an LED according to 8, wherein the laminate of the composition layer is cut into smaller units.
11.溶剤キャスト法により金属板上に榭脂又は榭脂組成物層を形成する 8又は 10記 載の LED用反射体の製造方法。 11. The method for producing a reflector for LED according to 8 or 10, wherein a resin or a resin composition layer is formed on a metal plate by a solvent casting method.
12.圧縮成形法により金属板板上に榭脂又は榭脂組成物層を形成する 8又は 10記 載の LED用反射体の製造方法。 12. The method for producing a reflector for LED according to 8 or 10, wherein a resin or resin composition layer is formed on a metal plate by a compression molding method.
13.榭脂又は榭脂組成物シートを熱成形することにより金属板板上に榭脂又は榭脂 組成物層を形成する 8又は 10記載の LED用反射体の製造方法。 13. The method for producing a reflector for LED according to 8 or 10, wherein the resin or resin composition layer is formed on the metal plate by thermoforming the resin or resin composition sheet.
14.射出成形により金属板上に榭脂又は榭脂組成物層を形成する 8又は 10記載の LED用反射体の製造方法。 14. The method for producing a reflector for LED according to 8 or 10, wherein a resin or a resin composition layer is formed on a metal plate by injection molding.
15.硬化性榭脂又は榭脂組成物組成物を金属板板上に塗布し、その後硬化させる ことにより榭脂又は榭脂組成物層を形成する 8又は 10記載の LED用反射体の製造 方法。 15. A method for producing a reflector for LED according to 8 or 10, wherein a curable resin or resin composition composition is applied on a metal plate and then cured to form a resin or resin composition layer. .
16.前記榭脂組成物が、熱伝導性フイラ一を含有する 1又は 2記載の LED用反射体 16. The LED reflector according to 1 or 2, wherein the resin composition contains a thermally conductive filler.
[0013] 本発明によれば、可視領域から紫外領域にかけて高!、反射性能を有する LED用 反射体及びその製造方法を提供できる。 [0013] According to the present invention, it is possible to provide a reflector for LED having high reflection performance from the visible region to the ultraviolet region and a method for manufacturing the same.
また、本発明によれば、上記の複数の LED用反射体を安定して製造できる LED用 反射体の製造方法を提供できる。 Furthermore, according to the present invention, it is possible to provide a method for manufacturing an LED reflector that can stably manufacture the plurality of LED reflectors.
図面の簡単な説明 Brief Description of Drawings
[0014] [図 1]面上ヒータによる加熱時の昇温パターンの一例を示すグラフである。 FIG. 1 is a graph showing an example of a temperature rising pattern during heating by a surface heater.
[図 2] (a)は実施例で使用した銅板を示す上面図であり、 (b)は分離した銅板に榭脂 層を形成したものの断面図である。 [FIG. 2] (a) is a top view showing a copper plate used in Examples, and (b) is a cross-sectional view of a separated copper plate formed with a resin layer.
[図 3]実施例で使用したオートクレープの概略断面図である。 FIG. 3 is a schematic sectional view of the autoclave used in the examples.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0015] 本発明に使用する好適な榭脂又は榭脂組成物 (以下、「榭脂又は榭脂組成物」を 単に「榭脂」と称する場合がある)を以下に挙げるが、本発明はこれに限定されない。 光路長 250 mでの光線透過率が 50%に低下する光の波長 λ が 400nm以下 [0015] Preferred examples of the rosin or rosin composition used in the present invention (hereinafter, "the rosin or rosin composition" may be simply referred to as "fax") are listed below. It is not limited to this. Wavelength of light that reduces light transmittance to 50% at an optical path length of 250 m λ is 400 nm or less
50 50
の榭脂を用いると、特に紫外領域での反射率を高めることができる。好ましくは、 λ が 380nm以下、さらに好ましくはえ 力 ¾50nm以下である。 When the coconut resin is used, the reflectance particularly in the ultraviolet region can be increased. Preferably, λ Is not more than 380 nm, more preferably not more than ¾50 nm.
50 50
[0016] また、 LED製造時 (特に封止やはんだリフロー工程)の熱で反射率が大きく低下し ない樹脂が望ましい。このような榭脂は、 5%重量減少温度 (熱分解温度) Tdが 300 °C以上、好ましくは 330°C以上、さらに好ましくは 380°C以上であることが望ましい。 T dが 300°C以上であれば、封止工程やはんだリフロー工程で榭脂劣化が起こりにくく 反射率が低下しにくい。 [0016] Further, it is desirable to use a resin whose reflectivity does not significantly decrease due to heat during LED manufacturing (especially sealing or solder reflow process). Such a resin should have a 5% weight loss temperature (thermal decomposition temperature) Td of 300 ° C or higher, preferably 330 ° C or higher, more preferably 380 ° C or higher. When Td is 300 ° C or higher, the deterioration of the grease is unlikely to occur during the sealing process and the solder reflow process, and the reflectance is unlikely to decrease.
[0017] さらに、非晶性榭脂を用いるときは、ガラス転移温度 Tgが 140°C以上、好ましくは 1 90°C以上、さらに好ましくは 210°C以上であることが望ましい。 Tgが 140°C未満であ ると、封止温度で溶融粘度が力なり低下し、セルの合一が起こりやすくなり、反射率 が低下する恐れがある。 [0017] Further, when using amorphous rosin, it is desirable that the glass transition temperature Tg is 140 ° C or higher, preferably 190 ° C or higher, more preferably 210 ° C or higher. If the Tg is less than 140 ° C, the melt viscosity will be reduced at the sealing temperature, cell coalescence will easily occur, and the reflectivity may be reduced.
ただし、架橋タイプの榭脂を用いる場合は、 Tgが 140°C未満でも封止温度である 程度の溶融粘度を有するので、 Tgはかなり低くても構わない。上述の熱分解温度条 件を満たせば、反射率の低下は小さい。 However, when a cross-linked type of resin is used, the Tg may be quite low because it has a melt viscosity that is the sealing temperature even if the Tg is less than 140 ° C. If the above thermal decomposition temperature condition is satisfied, the decrease in reflectance is small.
[0018] 結晶性榭脂を用いる場合は、融点 Tmが 200°C以上であれば、封止時に反射率が 低下することは少ない。しかし、結晶性榭脂は Tm以上で溶融粘度が急激に低下す るので、はんだリフロー時で発泡セルが合一し、反射率が低下してしまう恐れがある。 Tmは 220°C以上、好ましくは 240°C以上、さらに好ましくは 260°C以上であることが 望ましい。 [0018] In the case of using crystalline resin, if the melting point Tm is 200 ° C or higher, the reflectance is less likely to decrease during sealing. However, since the melt viscosity of crystalline rosin drastically decreases at Tm or higher, the foam cells may coalesce during solder reflow and the reflectivity may decrease. Tm is desirably 220 ° C or higher, preferably 240 ° C or higher, and more preferably 260 ° C or higher.
[0019] 以上のような榭脂の具体例としては、ポリカーボネート類、アクリル系ポリマー、シリ コーン系ポリマー、シクロォレフィン系ポリマー、ポリイミド類、シロキサン系ポリマー、 スチレン系ポリマー、ポリエーテル類、ポリエステル類、ポリアミド類、液晶ポリマー類 、エポキシ榭脂類等がある。例えば、ビスフエノール Aポリカーボネート、ビスフエノー ル Zポリカーボネート、ビスフエノール AFポリカーボネート、フラーレン含有ポリカーボ ネート、ポリメチノレメタタリレート、ポリアダマンチノレメタタリレート、ポリジシクロペンタジ ェ-ルメタタリレート、ノルボルネン Ζ α—ォレフイン共重合体、ォレフイン'マレイミド 共重合体、ポリエーテルスルホン、ポリアリレート、ポリスチレン、ポリエチレンテレフタ レート、ポリエーテノレエーテノレケトン、ポリエーテノレニトリル、ポリエチレンテレフタレー ト、ポリエチレンナフタレート等が挙げられる。 また、これらの榭脂を 2種以上混合した組成物も使用できる。 [0019] Specific examples of such a resin include polycarbonates, acrylic polymers, silicone polymers, cycloolefin polymers, polyimides, siloxane polymers, styrene polymers, polyethers, polyesters, polyamides. , Liquid crystal polymers, and epoxy resins. For example, bisphenol A polycarbonate, bisphenol Z polycarbonate, bisphenol AF polycarbonate, fullerene-containing polycarbonate, polymethylol methacrylate, polyadamantino methacrylate, polydicyclopentadiol methacrylate, norbornene Ζ α-olefin Examples thereof include copolymers, olefin-maleimide copolymers, polyethersulfones, polyarylates, polystyrenes, polyethylene terephthalates, polyetherolene ketones, polyetherolonitriles, polyethylene terephthalates, and polyethylene naphthalates. In addition, a composition in which two or more of these rosins are mixed can also be used.
[0020] 榭脂に通常の高分子化学で常用の各種添加剤を加えてもよい。例えば、粘着付与 剤、可塑剤、難燃剤、老化防止剤、改質剤、熱安定剤、紫外線安定剤、着色剤等を 例示できる。 LED用反射体に放熱性が要求される場合がある。そのときは熱伝導性 フィラーを、好ましくは 0. 1〜60重量%、より好ましくは 1〜40重量%加える。熱伝導 フイラ一としては、窒化アルミ、アルミナ、酸化亜鉛、シリカ、チタ-ァ、チタン酸力リウ ム等を例示できる。 [0020] Various additives commonly used in ordinary polymer chemistry may be added to rosin. For example, tackifiers, plasticizers, flame retardants, anti-aging agents, modifiers, heat stabilizers, UV stabilizers, colorants and the like can be exemplified. There is a case where heat dissipation is required for the reflector for LED. In that case, the thermally conductive filler is preferably added in an amount of 0.1 to 60% by weight, more preferably 1 to 40% by weight. Examples of the heat conduction filler include aluminum nitride, alumina, zinc oxide, silica, titer, and lithium titanate.
[0021] 本発明の榭脂発泡体の平均セル径は 50 μ m以下、好ましくは 40 μ m以下、より好 ましくは 30 μ m以下である。 [0021] The average cell diameter of the resin foam of the present invention is 50 μm or less, preferably 40 μm or less, more preferably 30 μm or less.
発泡成形体の数平均発泡セル径は、発泡させる榭脂の熱的性質に応じて、適切な 発泡温度を選択することにより、 50 m以下にできる。 The number average foamed cell diameter of the foamed molded product can be reduced to 50 m or less by selecting an appropriate foaming temperature according to the thermal properties of the resin to be foamed.
[0022] 本発明の発泡体は、榭脂を発泡させて製造し、本発明の要件を満たす限り発泡方 法は特に限定されない。発泡に用いるガスは、榭脂に浸透するものであれば種類は 問わない。例えば、窒素、二酸化炭素、ヘリウム等の不活性ガスが好適である。ガス の状態は、気体、液体、超臨界状態のいずれでもよい。また、化学発泡剤等を用い て発泡させてもよい。例えば、ジニトロソペンタメチレンテトラミン、ァゾジカルボンアミ ド、 p, p, 一ォキシビスベンゼンスルホ-ルヒドラジド、 p—トルエンスルホ-ルヒドラジ ド、 p—トルエンスルホ-ルアセトンヒドラゾーン、ヒドラゾジカルボンアミド等を挙げら れる。ただし、化学発泡剤は残存物が電子部品へ悪影響を及ぼす可能性があるの で、不活性ガスを用いる方がより好ましい。 [0022] The foaming method of the present invention is not particularly limited as long as it is produced by foaming rosin and satisfies the requirements of the present invention. The type of gas used for foaming is not limited as long as it penetrates the fat. For example, an inert gas such as nitrogen, carbon dioxide, and helium is preferable. The gas state may be any of gas, liquid, and supercritical state. Further, foaming may be performed using a chemical foaming agent or the like. For example, dinitrosopentamethylenetetramine, azodicarbonamide, p, p, monooxybisbenzenesulfur hydrazide, p-toluenesulfol hydrazide, p-toluenesulfol acetone hydrazone, hydrazodicarbonamide, etc. Can be mentioned. However, it is more preferable to use an inert gas because the chemical foaming agent may adversely affect the electronic components.
[0023] 不活性ガスを用いて発泡体を製造する装置は、通常、榭脂を賦形する工程と、ガス を成形体に浸透させた後、脱ガスさせて発泡させる工程を備えている。これら賦形ェ 程と発泡工程が別工程のバッチ式発泡法と、賦形と発泡を連続して行なう連続式発 泡法がある。 [0023] An apparatus for producing a foam using an inert gas usually comprises a step of shaping a resin, and a step of infiltrating the gas into the molded body and then degassing and foaming. There are a batch-type foaming method in which the shaping process and the foaming process are separate processes, and a continuous foaming method in which the shaping and foaming are performed continuously.
[0024] (1)バッチ式発泡 [0024] (1) Batch type foaming
オートクレープのような耐圧容器に樹脂成形体を設置し、ガスを注入することにより 榭脂にガスを浸透させる。 The resin molded body is placed in a pressure vessel such as an autoclave, and the gas is infiltrated into the resin by injecting the gas.
ガスを浸透させる温度は任意に選ぶことができる。一般には榭脂に対するガスの溶 解度が高くなる温度を選ぶことが好ましい (例えば、二酸ィ匕炭素では低温ほど溶解度 が高まる)。ただし、低温ではガスの拡散が遅ぐ飽和溶解度に達するまで長時間を 要する。溶解度とガス拡散速度のバランスを考慮してガス浸透温度を決めることが好 ましい。 The temperature at which the gas penetrates can be arbitrarily selected. In general, the gas dissolved in It is preferable to select a temperature at which the solubility increases (for example, the solubility of carbon dioxide is increased at lower temperatures). However, at low temperatures, it takes a long time to reach saturation solubility where gas diffusion is slow. It is preferable to determine the gas penetration temperature in consideration of the balance between solubility and gas diffusion rate.
[0025] ガス浸透時間は 10分以上 2日以内が通常であり、好ましくは 30分以上 3時間以内 である。連続式である射出発泡成形の場合は、浸透効率が高くなるため、通常 20秒 以上 10分以下でよい。 [0025] The gas permeation time is usually from 10 minutes to 2 days, preferably from 30 minutes to 3 hours. In the case of continuous injection foaming, since the penetration efficiency is high, it is usually 20 seconds or longer and 10 minutes or shorter.
ガスを浸透させる量は、目的とする発泡倍率に応じて決定する。本発明では、通常 、榭脂の重量の 0. 1〜20重量%、好ましくは 1〜10重量%である。 The amount of gas penetration is determined according to the target foaming ratio. In the present invention, it is usually from 0.1 to 20% by weight, preferably from 1 to 10% by weight, based on the weight of the resin.
また、ガス浸透時の圧力は、通常 0. l〜50MPa、好ましくは 3〜30MPaである。 温度は任意に設定できる。 Further, the pressure during gas permeation is usually 0.1 to 50 MPa, preferably 3 to 30 MPa. The temperature can be set arbitrarily.
[0026] ここで、ガスが浸透した高分子材料の特性にっ 、て説明する。高分子にガスが浸 透すると高分子鎖の運動が活発化する。そのため、鎖の運動の変曲点 (例えば、非 晶性榭脂の場合、ガラス転移温度)も低温側にシフトする。変曲点以上の温度でォー トクレーブ内の圧力を常圧まで低下させると発泡が起こる。一方、変曲点以下の温度 ではオートクレープ内の圧力を常圧まで低下させても発泡しない。この後、変曲点以 上に昇温すれば発泡する。いずれの場合においても、発泡時間は通常 10秒以上 5 分以内である。変曲点はガス溶解量ゃ榭脂の種類に大きく依存するので、発泡温度 を一概に決めることはできないが、通常、以下に示す温度で発泡させることが多い。 尚、 Tcは榭脂の結晶化温度、 Tgはガラス転移温度、 Tmは融解温度、 Tdは 5%重 量減温度である。 [0026] Here, the characteristics of the polymer material into which the gas has permeated will be described. When gas penetrates into the polymer, the movement of the polymer chain is activated. For this reason, the inflection point of the chain motion (for example, the glass transition temperature in the case of amorphous resin) also shifts to the low temperature side. Foaming occurs when the pressure in the autoclave is reduced to normal pressure at temperatures above the inflection point. On the other hand, at temperatures below the inflection point, foaming does not occur even when the pressure in the autoclave is reduced to normal pressure. After this, if the temperature rises above the inflection point, foaming occurs. In any case, the foaming time is usually 10 seconds or more and 5 minutes or less. The inflection point greatly depends on the amount of gas dissolved, and the foaming temperature cannot be determined unconditionally. However, foaming is usually performed at the following temperatures. Tc is the crystallization temperature of the resin, Tg is the glass transition temperature, Tm is the melting temperature, and Td is the 5% weight loss temperature.
[0027] (ァ)非晶性榭脂の場合:(Tg— 150°C)以上、(Tg + 50°C)以下 [0027] (a) In the case of amorphous resin: (Tg—150 ° C) or more, (Tg + 50 ° C) or less
(ィ)結晶性榭脂の場合:ガス浸透の温度はガスを浸透させるときの結晶状態に依存 する。完全に結晶化した材料にガスを浸透させる場合は、(Tm— 50) °C以上、(Tm + 50) °C以下である。一方、結晶性榭脂をメルトから急冷してかなり結晶性を低下さ せた材料にガスを浸透させる場合は、(Tg—150°C)以上、(Tg+ 100°C)以下であ る。この場合、発泡後、 Tc付近の温度で熱処理すれば結晶性を高めることができる。 (Ii) In the case of crystalline resin: The temperature of gas permeation depends on the crystalline state when the gas permeates. When the gas is allowed to penetrate into a completely crystallized material, the temperature is (Tm−50) ° C or more and (Tm + 50) ° C or less. On the other hand, when the gas is infiltrated into a material whose crystallinity is considerably lowered by quenching the crystalline resin from the melt, the temperature is (Tg−150 ° C) or more and (Tg + 100 ° C) or less. In this case, the crystallinity can be enhanced by heat treatment at a temperature near Tc after foaming.
[0028] それぞれにおいて下限温度未満であると、高分子鎖が動きにくく発泡効果が劣る 場合がある。上限温度を超えると、粗大な発泡構造となる場合がある。いずれの場合 も反射率の優れた材料が得られな ヽ。 [0028] When the temperature is lower than the minimum temperature in each, the polymer chain hardly moves and the foaming effect is poor. There is a case. When the upper limit temperature is exceeded, a coarse foam structure may be formed. In either case, a material with excellent reflectivity cannot be obtained.
[0029] 上述の通り、発泡はガス浸透後の脱圧過程、もしくは、脱圧後の加熱過程で起こる 。後者の場合は、例えば、— 30〜60°Cの低温でガスを浸透し、脱圧し、さらに、 80 〜400°Cの高温に昇温して発泡させる。ここで、後者の加熱過程で発泡させる場合 の注意点について述べる。 [0029] As described above, foaming occurs in the depressurization process after gas permeation or in the heating process after depressurization. In the latter case, for example, gas is permeated at a low temperature of −30 to 60 ° C., depressurized, and further heated to a high temperature of 80 to 400 ° C. for foaming. Here, the points to be noted when foaming in the latter heating process are described.
まず、常圧にして力も熱処理するまでの時間 tを制御することである。この時間 tは短 ければ短いほどよいが、通常は常温で 2時間以内である。好ましくは 1時間以内、さら に好ましくは 30分以内である。 tが 2時間を超えると高分子材料内からガスが自然と 抜けてしまい、発泡効果が劣り、高反射率の材料が得られない場合がある。一方、常 圧にした後、材料を冷蔵庫等に入れて保管すれば、 tは長くてもよい。例えば、 -30 °Cで保管するのであれば、 tを 24時間以上にしても高反射率の材料を得ることが可 能である。 First, it is necessary to control the time t until the pressure is heat treated at normal pressure. This time t should be as short as possible, but it is usually within 2 hours at room temperature. It is preferably within 1 hour, more preferably within 30 minutes. If t exceeds 2 hours, the gas naturally escapes from the inside of the polymer material, resulting in poor foaming effect and a high reflectivity material may not be obtained. On the other hand, if the material is stored in a refrigerator after normal pressure, t may be long. For example, if it is stored at −30 ° C., it is possible to obtain a highly reflective material even if t is 24 hours or longer.
[0030] 2つめの注意点は、加熱発泡時の昇温速度を制御することである。昇温速度 dTZ dtを、好ましくは 50°CZ分以上、より好ましくは 70°CZ分以上、さらに好ましくは 100 °CZ分以上とする。 dTZdtが 50°CZ分未満であると、発泡効果が劣り、高反射率の 材料が得られない場合がある。図 1に昇温パターンの一例を示す。温度が (T f +T 0 ) [0030] The second point of caution is to control the rate of temperature rise during heating and foaming. The rate of temperature rise dTZ dt is preferably 50 ° CZ or more, more preferably 70 ° CZ or more, and even more preferably 100 ° CZ or more. If dTZdt is less than 50 ° CZ, the foaming effect is poor and a material with high reflectivity may not be obtained. Figure 1 shows an example of the temperature rise pattern. Temperature is (T f + T 0)
Z2になるまでの経時変化を最小二乗法で直線近似し、その直線の傾きを dTZdtと 定義する。ここで、 T fは発泡温度の設定値、 T 0は加熱前の初期温度である。 The time course until Z2 is approximated by a straight line using the least squares method, and the slope of the straight line is defined as dTZdt. Here, T f is a set value of the foaming temperature, and T 0 is an initial temperature before heating.
[0031] (2)連続式発泡 [0031] (2) Continuous foaming
押出機内で榭脂にガスを浸透させる射出発泡方法又は押出発泡方法 (連続式)に おいては、ガスを押出機内で混練中の樹脂に吹き込む。非晶性榭脂では、通常 Tg 近傍、より具体的には (Tg— 20) °C以上の温度でガスを浸透させる。これにより非晶 性榭脂とガスが相溶しやすくなる。上限温度は榭脂に悪影響を与えない温度で自由 に設定できる。ただし、(Tg + 250) °C以下の温度で浸透させることが望ましい。この 温度を越えると、発泡セルが大きくなつたり、榭脂が熱劣化することで、発泡体の強度 が低下する恐れがある。結晶性榭脂の場合は、通常、 Τπ!〜 (Tm+50)°Cの範囲で ガスを浸透させる。 Tm未満であると成形が困難となる恐れがある。(Tm+50)°Cより 高!ヽと榭脂が分解する恐れがある。 In the injection foaming method or the extrusion foaming method (continuous type) in which gas penetrates the resin in the extruder, the gas is blown into the resin being kneaded in the extruder. Amorphous fats are usually infiltrated with gas near Tg, more specifically at a temperature of (Tg-20) ° C or higher. This makes it easier for the amorphous resin and gas to be compatible. The upper limit temperature can be freely set at a temperature that does not adversely affect the resin. However, it is desirable to infiltrate at a temperature of (Tg + 250) ° C or less. If this temperature is exceeded, the foamed cells may become large or the resin may be thermally deteriorated, which may reduce the strength of the foam. In the case of crystalline resin, it is usually Τπ! Infiltrate gas in the range of ~ (Tm + 50) ° C. If it is less than Tm, molding may be difficult. (Tm + 50) ° C High! There is a risk of decomposition of soot and sallow.
[0032] 複数の LED用反射体を製造するとき、発泡成形を行なう際に、ガス浸透温度ムラを 製品間でできるだけ低く抑えることが好ま 、。ガス浸透温度ムラが小さ 、ほど、製品 によるガス溶解度が均一になり、その結果、発泡状態も均一になり、製品毎の物性( 反射率等)の差が小さくなるからである。具体的には ± 20°C以内、好ましくは ± 10°C 以内に制御することが望ましい。連続式発泡の場合は、一定温度に設定した射出ュ ニット内でガスを含浸させるので、製品間の発泡温度ムラを比較的低く抑えることが 可能である。バッチ式発泡の場合は、通常、耐圧容器内に一度にたくさんの成形品 を配置してガスを浸透させるが、その際、容器内の温度をできるだけ一定に保つこと が好ましい。そのためには、例えば、容器内に攪拌機構を設けたり、成形品の設置位 置を個別に温調したりする。一方、ガス浸透時の温度ムラが生じる原因の一つに、榭 脂の熱伝導性が低いことが挙げられる。榭脂層を金属板上に形成することにより、温 度が伝わりやすくなり、温度ムラを少なくすることができる。さらに、金属板使用により 、加熱発泡時の昇温速度が増大するメリットもある。金属板上の榭脂層を発泡させ、 その後、小さなユニットに切断すれば、多数の反射体を製造できる。金属板はそのま まヒートシンクとしても使えるし、また、電気伝導性であればリードフレームとしても使え る。 [0032] When manufacturing a plurality of LED reflectors, it is preferable to suppress the gas permeation temperature unevenness as low as possible between products when performing foam molding. This is because the smaller the gas permeation temperature unevenness, the more uniform the gas solubility of the product, and the more uniform the foamed state, and the smaller the difference in physical properties (reflectance, etc.) for each product. Specifically, it is desirable to control within ± 20 ° C, preferably within ± 10 ° C. In the case of continuous foaming, since the gas is impregnated in the injection unit set at a constant temperature, it is possible to keep the foaming temperature unevenness between products relatively low. In the case of batch-type foaming, a large number of molded products are usually placed in a pressure-resistant container at one time to allow gas to permeate. At this time, it is preferable to keep the temperature in the container as constant as possible. For this purpose, for example, a stirring mechanism is provided in the container, or the temperature of the installation position of the molded product is individually controlled. On the other hand, one of the causes of temperature unevenness during gas permeation is that the thermal conductivity of the resin is low. By forming the resin layer on the metal plate, the temperature is easily transmitted and the temperature unevenness can be reduced. In addition, the use of a metal plate has the advantage of increasing the rate of temperature rise during heating and foaming. A large number of reflectors can be produced by foaming the resin layer on the metal plate and then cutting it into small units. The metal plate can be used as a heat sink as it is, or as a lead frame if it is electrically conductive.
[0033] 金属板上に榭脂層を形成する方法は限定されな 、。例えば、溶剤キャスト法、圧縮 成形法等があり、又は、榭脂シートを熱成形により金属板表面に賦形する方法、射出 成形により金属板と榭脂を一体化する方法、硬化性の榭脂組成物を金属板表面に 塗布する方法等がある。 [0033] The method for forming the resin layer on the metal plate is not limited. For example, there are a solvent casting method, a compression molding method, etc., or a method of forming a resin sheet on the surface of a metal plate by thermoforming, a method of integrating the metal plate and the resin by injection molding, a curable resin There is a method of applying the composition to the surface of a metal plate.
[0034] 発泡はガス浸透工程で用いた耐圧容器内でそのまま行ってもよ!ヽ。ガス浸透後、 耐圧容器内を一度常圧にしてから加熱発泡させる場合は、別途、オーブンやオイル ノ スを用いてもよい。ただし、加熱工程で発泡させる場合は、複数ある榭脂成形品の Vヽずれも 50°CZ分以上の昇温速度となるように工夫する必要がある。このためには、 加熱媒体内に攪拌機構を設けたり、榭脂成形品の設置位置を個別に温調したりする のが有効である。オーブンを使わずに面状ヒーターを用いることもできる。面状ヒータ 一上面は比較的温度一定であり、榭脂成形品の一群をヒーター面に押し付ければ、 いずれの成形品も同様に高い昇温速度で所定温度まで昇温できる。また、榭脂成形 品を面状ヒーターに接触させず、接近させるだけでも、同様な効果が得られる。この 場合、榭脂成形品と面状ヒータの距離は 20cm以内、好ましくは 10cm以内、さらに 好ましくは 5cm以内である。以上のような工夫により、反射率が高く均一な製品群を 得ることができる。 [0034] Foaming may be carried out as it is in the pressure vessel used in the gas infiltration process! In the case where after the gas permeation, the inside of the pressure vessel is once brought to normal pressure and then heated and foamed, an oven or an oil nose may be used separately. However, when foaming is performed in the heating process, it is necessary to devise a method for increasing the temperature rise rate of 50 ° CZ or more for the V-type deviation of multiple resin molded products. For this purpose, it is effective to provide a stirring mechanism in the heating medium or to individually control the temperature of the installation position of the resin molded product. A planar heater can also be used without using an oven. Surface heater The upper surface is relatively constant in temperature, and if a group of resin molded products is pressed against the heater surface, Any molded product can be similarly heated to a predetermined temperature at a high heating rate. In addition, the same effect can be obtained by simply bringing the resin molded product close to the sheet heater without contacting it. In this case, the distance between the resin molded product and the planar heater is within 20 cm, preferably within 10 cm, and more preferably within 5 cm. With the above-described devices, a uniform product group with high reflectivity can be obtained.
[実施例] [Example]
[0035] [使用材料] [0035] [Materials used]
実施例及び比較例で用いた榭脂、無機フィラー及び組成物は以下の通りであった 1.樹脂 The resin, inorganic filler and composition used in Examples and Comparative Examples were as follows: 1. Resin
(1)ポリエチレンテレフタレート (PET):帝人化成 (株)、 TR— 4550BH(Tg;80°C、 T c 40。C、Tm;255。C、Td;390。C、 λ ;320nm)。 (1) Polyethylene terephthalate (PET): Teijin Chemicals Ltd., TR-4550BH (Tg; 80 ° C., Tc 40. C, Tm; 255. C, Td; 390. C, λ; 320 nm).
50 50
(2)ポリエーテルスルホン.シート(PESF):住友ベークライト(株)、 FS— 1300 (Tg; 228。C、Td;481。C、 ;336nm)。 (2) Polyethersulfone sheet (PESF): Sumitomo Bakelite Co., Ltd., FS-1300 (Tg; 228. C, Td; 481, C,; 336 nm).
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(3)特殊ポリカーボネート (PC):出光興産 (株)、タフゼット HR— 27 (Tg; 267°C、 Td ;467。C、 λ ;296nm)。 (3) Special polycarbonate (PC): Idemitsu Kosan Co., Ltd., Toughzet HR-27 (Tg; 267 ° C., Td: 467. C, λ: 296 nm).
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(4)特殊ポリイミド (PI):特開 2002— 322280号公報 '実施例 1と同様に合成したも のを使用した(丁8;250°〇、丁(1;370°〇、 λ ;361nm)。 (4) Special polyimide (PI): Japanese Laid-Open Patent Publication No. 2002-322280 'Used synthesized in the same manner as in Example 1 (Ding 8 ; 250 ° 0, Ding (1; 370 ° 0, λ; 361nm) .
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(5)硬化性シリコーンレジン組成物(SRC):特開 2004— 175887号公報'実施例 1 と同様に合成したものを使用した(Tg;130°C、Td;335°C、 λ ;288nm)。 (5) Curable silicone resin composition (SRC): Japanese Patent Application Laid-Open No. 2004-175887 'Synthesized in the same manner as in Example 1 (Tg; 130 ° C, Td; 335 ° C, λ; 288 nm) .
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(6)非晶ポリエーテルエーテルケトン ·フィルム(非晶 PEEK):ビクトレックス ·ェムシ一 (株)製のスミライト FS— 1100Cを加熱'溶解後、 25°Cのウォーターバスに投入し、非 晶 PEEKフィルムを得た(Tg; 145°C、 Tc; 176°C、 Tm;337°C、 Td;550°C、 λ ;4 (6) Amorphous polyetheretherketone film (Amorphous PEEK): Victrex Emshiichi Sumilite FS—1100C was heated and dissolved, then put into a 25 ° C water bath and amorphous PEEK Films were obtained (Tg; 145 ° C, Tc; 176 ° C, Tm; 337 ° C, Td; 550 ° C, λ; 4
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12nm)0 12nm) 0
(7)ポリメチルメタタリレート(PMMA):住友ィ匕学工業 (株)、 IT44(Tg;115°C、 Td; 290。C、 λ ;285nm)。 (7) Polymethylmetatalylate (PMMA): Sumitomo Chemical Co., Ltd., IT44 (Tg; 115 ° C, Td; 290. C, λ; 285 nm).
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(8)半芳香族ポリアミド (PA):デュポン (株)、ザィテル HTN501 (8) Semi-aromatic polyamide (PA): DuPont Co., Ltd., Zytel HTN501
[0036] 2.無機フィラー (1)酸ィ匕チタン:石原産業 (株)、タイペータ R680 [0036] 2. Inorganic filler (1) Titanium acid: Ishihara Sangyo Co., Ltd., Typeter R680
(2)チタン酸カリウム繊維:大塚ィ匕学 (株)、ティスモ D101 (2) Potassium titanate fiber: Otsuka Igaku Co., Ltd., Tismo D101
[0037] 3.組成物 [0037] 3. Composition
(l) PAZTiO榭脂組成物、 PAZチタン酸カリウム榭脂組成物 (l) PAZTiO resin composition, PAZ potassium titanate composition
2 2
重量比 70/30で、 35mm二軸押出機を用いて、温度 330°C、スクリュー回転数 30 Orpmで混練してペレットを得た。 Pellets were obtained by kneading at a weight ratio of 70/30 using a 35 mm twin screw extruder at a temperature of 330 ° C. and a screw rotation speed of 30 Orpm.
[0038] [評価方法] [0038] [Evaluation method]
1.セル平均粒径の測定方法 1. Measuring method of cell average particle size
走査型電子顕微鏡 (SEM)観察写真にトレーシングペーパーを置き、透かして見え る発泡セルをトレースした。トレースしたものを画像処理機で二値化処理し、発泡セル の断面積を求めた。ここで、発泡セルの個々の形状は略楕円形であることが多いが、 セル毎に歪み等がある。そこで、個々のセル形状を面積が等しい円形に変換し、そ の直径をセル径とした。このようにして求めた個々のセル径から数平均セル径を求め た。 A tracing paper was placed on a scanning electron microscope (SEM) observation photograph, and the foamed cell that was visible through the trace was traced. The trace was binarized with an image processor, and the cross-sectional area of the foam cell was determined. Here, the individual shape of the foam cell is often approximately elliptical, but there is distortion or the like for each cell. Therefore, each cell shape was converted to a circle with the same area, and the diameter was taken as the cell diameter. The number average cell diameter was determined from the individual cell diameters thus determined.
[0039] 2.光線透過率の測定方法 [0039] 2. Method of measuring light transmittance
(株)島津製作所製'自記分光光度計 UV— 2400PCを用い、波長 700〜250nm の範囲で光線透過率(%)を測定した。試料の膜厚は 250 mとし、その材料の光線 透過率が 50%に低下する波長をえ と定義した。 Using a self-recording spectrophotometer UV-2400PC manufactured by Shimadzu Corporation, light transmittance (%) was measured in the wavelength range of 700 to 250 nm. The film thickness of the sample was 250 m, and the wavelength at which the light transmittance of the material dropped to 50% was defined as the wavelength.
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[0040] 3.反射率の測定方法 [0040] 3. Measuring method of reflectance
上記の自記分光光度計に (株)島津製作所製'マルチパーパス大形試料室ユニット MPC— 2200形を取りつけ、波長 700〜250nmの範囲で反射率(%)を測定した。 尚、レファレンスとして酸ィ匕マグネシウムを使用した。 A multi-purpose large sample chamber unit MPC-2200 manufactured by Shimadzu Corporation was attached to the above-mentioned self-recording spectrophotometer, and the reflectance (%) was measured in the wavelength range of 700 to 250 nm. Incidentally, magnesium oxide was used as a reference.
[0041] 4.ガラス転移温度 Tg、結晶化温度 Tc、融点 Tmの測定方法 [0041] 4. Measuring method of glass transition temperature Tg, crystallization temperature Tc, melting point Tm
パーキンエルマ一社製示差走査熱量測定装置 (DSC7)を用い、降温過程(20°C Z分)での Tg、 Tc、 Tmを測定した。 Using a differential scanning calorimeter (DSC7) manufactured by Perkin Elmer Co., Tg, Tc, and Tm were measured in the cooling process (20 ° C Z min).
[0042] 5. 5%重量減少温度 (熱分解温度) Tdの測定方法 [0042] 5. 5% weight loss temperature (pyrolysis temperature) Td measurement method
パーキンエルマ一社製熱重量分析装置 (TGA)を用い、窒素中、昇温速度 20°CZ 分で、 40〜650°Cまで昇温し、全重量の 5%が減少する時の温度を測定し、これを T dと定義した。 Using a thermogravimetric analyzer (TGA) manufactured by Perkin Elma Co., Ltd., measuring the temperature when nitrogen is heated to 40 to 650 ° C at a heating rate of 20 ° CZ for 5% of the total weight. And this is T defined as d.
[0043] 6.温度ムラ、昇温速度の測定方法 [0043] 6. Measuring method of temperature unevenness and heating rate
温度ムラ、昇温速度は榭脂成形品に温度センサーを直接接触させることにより測定 した。 The temperature unevenness and the rate of temperature increase were measured by bringing a temperature sensor directly into contact with the resin molded product.
[0044] 実施例及び比較例の使用榭脂 Z組成物、製造条件等を表 1に示す。 [0044] Table 1 shows the used resin Z compositions, production conditions, and the like of Examples and Comparative Examples.
[0045] 実施例 1 [0045] Example 1
図 2 (a)に示す銅板 1をひとつひとつバラバラにしたものを 25個準備し、その上に圧 縮成形により約 250 mの PET榭脂層を形成した。 PET層が形成された銅板 1を図 2 (b)に示す。 Twenty-five pieces of the copper plate 1 shown in Fig. 2 (a) were prepared one by one, and a PET resin layer of about 250 m was formed on it by compression molding. A copper plate 1 with a PET layer is shown in Fig. 2 (b).
[0046] 図 3に示すオートクレーブ 3 (内 80mm φ X 150mm)をガス浸透容器として使用し た (バッチ式発泡)。該オートクレープ内には 25個のサンプル置き場があり、それぞれ のサンプル置き場は独立にヒータ温調できるように設計されて!ヽる (各サンプル位置 に温度調節器を接続)。該オートクレープ内に榭脂層を形成した銅板 4をそれぞれ設 置し、室温で昇圧された二酸ィ匕炭素を導入した。さらに、室温を保ちながら 15MPa まで昇圧した。次に圧力を 15MPaに保ちながら各サンプル位置の温度を 160°Cま で昇温し、そのまま 1時間放置した。この工程における、製品間の温度ムラは ± 3°C であった。その後、オートクレープ内を脱圧して PET榭脂層を発泡させた。得られた 発泡体を高熱伝導体 (銅板)から丁寧に剥ぎ取り、発泡セル径、反射率を測定した。 結果を表 2に示す。 [0046] The autoclave 3 shown in Fig. 3 (including 80mmφ X 150mm) was used as a gas infiltration container (batch type foaming). There are 25 sample storage areas in the autoclave, and each sample storage area is designed so that the heater temperature can be controlled independently (a temperature controller is connected to each sample position). Copper plates 4 each having a resin layer formed therein were placed in the autoclave, and carbon dioxide with a pressure increased at room temperature was introduced. Furthermore, the pressure was increased to 15 MPa while maintaining the room temperature. Next, while maintaining the pressure at 15 MPa, the temperature at each sample position was raised to 160 ° C and left for 1 hour. The temperature variation between products in this process was ± 3 ° C. Thereafter, the inside of the autoclave was depressurized to foam the PET resin layer. The obtained foam was carefully peeled from the high thermal conductor (copper plate), and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
[0047] 実施例 2 [0047] Example 2
サンプル置き場をヒータ温調する代わりに、オートクレープを 160°Cに設定した恒温 槽に設置した以外は、実施例 1と同様にして発泡体を得た。二酸化炭素含浸工程に おける、製品間の温度ムラは ± 25°Cであった。評価結果を表 2に示す。 A foam was obtained in the same manner as in Example 1 except that the autoclave was installed in a thermostatic bath set at 160 ° C instead of adjusting the temperature of the heater in the sample place. The temperature variation between products in the carbon dioxide impregnation process was ± 25 ° C. Table 2 shows the evaluation results.
[0048] 実施例 3 [0048] Example 3
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に実施例 1と同じ方法で、 2 5個の PETの榭脂層を形成し、それをオートクレープ内に設置した。次に、オートタレ ーブを恒温層に入れ、二酸ィ匕炭素の圧力を 15MPaに保ちながら、恒温槽を 160°C まで昇温し、そのまま 1時間放置した (この間、オートクレーブのヒータは使用しなかつ た)。この工程において、製品間の温度ムラは ± 5。C以内であった。その後、すばやく 圧力を常圧まで開放し、 PET榭脂層を発泡させた。得られた発泡体を銅板から丁寧 に剥ぎ取り、発泡セル径、反射率を測定した。結果を表 2に示す。 In the same manner as in Example 1, without changing the copper plate 1 in FIG. 2 (a), 25 PET resin layers were formed on the entire surface of the copper plate and placed in an autoclave. Next, the autoclave was placed in a thermostatic layer, the temperature of the thermostat was raised to 160 ° C while maintaining the pressure of carbon dioxide and carbon dioxide at 15 MPa, and left for 1 hour (the autoclave heater was used during this time). Natsu ) In this process, the temperature variation between products is ± 5. It was within C. After that, the pressure was quickly released to normal pressure, and the PET resin layer was foamed. The obtained foam was carefully peeled from the copper plate, and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
[0049] 実施例 4 [0049] Example 4
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に PESFフィルムを熱成形 することにより、 25個の PESF榭脂層を形成し、それをオートクレープ内に設置した( 膜厚;約 250 m)。次に、オートクレープを 40°Cに設定した恒温槽に入れ、二酸ィ匕 炭素を導入し 15MPaまで昇圧させ、そのまま 2時間放置した。その後、オートクレー ブ内を脱圧し、銅板 1を大気圧下に取出した。 5分後、銅板を 190°Cに設定された面 上ヒータに 1分間接触させ、 PESF榭脂を発泡させた。面上ヒータに銅板を接触させ たときの榭脂層の昇温速度は場所により異なる力 低くとも 100°CZ分以上であった 。得られた発泡体を銅板から丁寧に剥ぎ取り、発泡セル径、反射率を測定した。結果 を表 2に示す。 The PESF film was thermoformed on the entire copper plate as it was without breaking apart the copper plate 1 in Fig. 2 (a), and 25 PESF resin layers were formed and installed in the autoclave (film thickness; approx. 250 m). Next, the autoclave was placed in a thermostat set at 40 ° C., carbon dioxide was introduced, the pressure was increased to 15 MPa, and the mixture was allowed to stand for 2 hours. Thereafter, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a surface heater set at 190 ° C for 1 minute to foam PESF resin. The temperature rise rate of the resin layer when the copper plate was in contact with the heater on the surface was 100 ° CZ or more even at the lowest, depending on the location. The obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
[0050] 実施例 5 [0050] Example 5
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に、特殊 PCを濃度約 20重 量%でテトラヒドロフランに溶解し塗布した後、溶剤を揮発させることにより、 25個の 特殊 PC榭脂層を形成した (膜厚;約 200 ;ζ ΐη)。次に、それをオートクレープ内に設 置し、 40°Cに設定した恒温槽に入れ、二酸化炭素を導入し 15MPaまで昇圧させた 。そのまま 2時間放置した後、オートクレープ内を脱圧し、銅板 1を大気圧下に取出し た。 5分後、銅板を 270°Cに設定された面状ヒータに 1分間接触させ、特殊 PC榭脂を 発泡させた。面上ヒータに銅板を接触させたときの榭脂層の昇温速度は場所により 異なるが、低くとも 100°CZ分以上であった。得られた発泡体を銅板から丁寧に剥ぎ 取り、発泡セル径、反射率を測定した。結果を表 2に示す。 Fig. 2 (a) Copper plate 1 is not broken apart. The special PC is dissolved and applied in tetrahydrofuran at a concentration of about 20% by weight on the entire surface of the copper plate. A layer was formed (film thickness; about 200; ζ ΐη). Next, it was placed in an autoclave, placed in a thermostatic chamber set at 40 ° C., carbon dioxide was introduced, and the pressure was increased to 15 MPa. After leaving for 2 hours, the pressure in the autoclave was released, and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 270 ° C for 1 minute to foam special PC resin. The temperature rise rate of the resin layer when the copper plate was in contact with the surface heater varied depending on the location, but at least 100 ° CZ min or more. The obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
[0051] 実施例 6 [0051] Example 6
面状ヒータの設定温度を 200°Cとした以外は、実施例 5と同様にして発泡体を得た 。評価結果を表 2に示す。 A foam was obtained in the same manner as in Example 5 except that the set temperature of the planar heater was 200 ° C. Table 2 shows the evaluation results.
[0052] 実施例 7 [0052] Example 7
面状ヒータの設定温度を 140°Cとした以外は、実施例 5と同様にして発泡体を得た 。評価結果を表 2に示す。 A foam was obtained in the same manner as in Example 5 except that the set temperature of the planar heater was 140 ° C. . Table 2 shows the evaluation results.
[0053] 比較例 1 [0053] Comparative Example 1
面状ヒータの設定温度を 330°Cとした以外は、実施例 5と同様にして発泡体を得た 。評価結果を表 2に示す。 A foam was obtained in the same manner as in Example 5 except that the set temperature of the planar heater was 330 ° C. Table 2 shows the evaluation results.
[0054] 比較例 2 [0054] Comparative Example 2
面状ヒータの設定温度を 100°Cとした以外は、実施例 5と同様の操作を行なった。 しかし、ほとんど発泡しな力つた。外観が透明であり、反射率は非常に低いと判断し、 それ以上の評価は実施しな力つた。 The same operation as in Example 5 was performed except that the set temperature of the planar heater was set to 100 ° C. However, there was almost no foaming power. The appearance was transparent and the reflectivity was judged to be very low, and no further evaluation was made.
[0055] 比較例 3 [0055] Comparative Example 3
銅板を面状ヒータに接触させる代わりに 200°Cに設定した恒温槽に設置した以外 は、実施例 6と同様にして発泡体を得た。評価結果を表 2に示す。尚、恒温槽内での 榭脂層の昇温速度は場所により異なり、 30〜70°CZ分であった。 A foam was obtained in the same manner as in Example 6 except that the copper plate was placed in a thermostat set to 200 ° C. instead of contacting the sheet heater. Table 2 shows the evaluation results. The temperature rising rate of the resin layer in the thermostatic chamber varied depending on the location, and was 30 to 70 ° CZ.
[0056] 実施例 8 [0056] Example 8
二酸ィ匕炭素導入後の圧力を 5MPaとした以外は、実施例 6と同様にして発泡体を 得た。結果を表 2に示す。 A foam was obtained in the same manner as in Example 6 except that the pressure after introduction of carbon dioxide was 5 MPa. The results are shown in Table 2.
[0057] 実施例 9 [0057] Example 9
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に、特殊 PIを濃度約 15重量 %で N—メチル 2—ピロリドンに溶解し塗布した後、溶剤を揮発させることにより、 2 5個の特殊 PI榭脂層を形成した (膜厚;約 200 m)。次に、それをオートクレープ内 に設置し、 40°Cに設定した恒温槽に入れ、二酸化炭素を導入し 15MPaまで昇圧さ せた。そのまま 2時間放置した後、オートクレープ内を脱圧し、銅板 1を大気圧下に取 出した。 5分後、銅板を 200°Cに設定された面状ヒータに 1分間接触させ、特殊 PI榭 脂を発泡させた。面上ヒータに銅板を接触させたときの榭脂層の昇温速度は場所に より異なるが、低くとも 100°CZ分以上であった。得られた発泡体を銅板から丁寧に 剥ぎ取り、発泡セル径、反射率を測定した。結果を表 2に示す。 In Fig. 2 (a), the copper plate 1 is not disassembled, but the special PI is dissolved in N-methyl 2-pyrrolidone at a concentration of about 15% by weight and applied to the entire surface of the copper plate. A special PI resin layer was formed (film thickness: approx. 200 m). Next, it was placed in an autoclave and placed in a thermostatic chamber set at 40 ° C. Carbon dioxide was introduced and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized, and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 200 ° C for 1 minute to foam special PI resin. The temperature rise rate of the resin layer when the copper plate was brought into contact with the heater on the surface was at least 100 ° CZ min. The obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
[0058] 実施例 10 [0058] Example 10
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に、 SRCを 150°C、 lOMPa 、 15分の条件でプレスキュアし、さらに、 150°Cで 30分間熱処理することにより、 25 個の熱硬化したシリコーン榭脂層を形成した (膜厚;約 300 m)。次に、それをォー トクレーブ内に設置し、 40°Cに設定した恒温槽に入れ、二酸ィ匕炭素を導入し 15MP aまで昇圧させた。そのまま 2時間放置した後、オートクレープ内を脱圧し、銅板 1を大 気圧下に取出した。 5分後、銅板を 200°Cに設定された面状ヒータに 1分間接触させ 、シリコーン榭脂を発泡させた。面上ヒータに銅板を接触させたときの榭脂層の昇温 速度は場所により異なるが、低くとも 100°CZ分以上であった。得られた発泡体を銅 板から丁寧に剥ぎ取り、発泡セル径、反射率を測定した。結果を表 2に示す。 By pressing and curing SRC at 150 ° C and lOMPa for 15 minutes on the entire surface of the copper plate without breaking apart the copper plate 1 in Fig. 2 (a), and then heat-treating at 150 ° C for 30 minutes, 25 A piece of thermoset silicone resin layer was formed (film thickness; approximately 300 m). Next, it was placed in an autoclave, placed in a thermostatic chamber set at 40 ° C., carbon dioxide was introduced, and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 200 ° C. for 1 minute to foam the silicone resin. The temperature rise rate of the resin layer when the copper plate was in contact with the surface heater varied depending on the location, but it was at least 100 ° CZ min. The obtained foam was carefully peeled from the copper plate, and the foam cell diameter and the reflectance were measured. The results are shown in Table 2.
[0059] 比較例 4 [0059] Comparative Example 4
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に、 PEEKフィルムを 380で 熱成形した後、 25°Cのウォーターバスに投入し、 25個の非晶 PEEK榭脂層を形成し た (膜厚;約 150 m)。次に、それをオートクレープ内に設置し、 40°Cに設定した恒 温槽に入れ、二酸ィ匕炭素を導入し 15MPaまで昇圧させた。そのまま 2時間放置した 後、オートクレープ内を脱圧し、銅板 1を大気圧下に取出した。 5分後、銅板を 120°C に設定された面状ヒータに 1分間接触させ、非晶 PEEK榭脂を発泡させた。面上ヒー タに銅板を接触させたときの榭脂層の昇温速度は場所により異なるが、低くとも 100 °CZ分以上であった。得られた発泡体を銅板力 丁寧に剥ぎ取り、発泡セル径、反 射率を測定した。結果を表 2に示す。 Fig. 2 (a) Copper plate 1 is not broken apart, and the PEEK film is thermoformed at 380 on the entire surface of the copper plate, and then placed in a 25 ° C water bath to form 25 amorphous PEEK resin layers. (Film thickness; about 150 m). Next, it was placed in an autoclave, placed in a constant temperature bath set at 40 ° C, and carbon dioxide was introduced and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 120 ° C for 1 minute to foam amorphous PEEK resin. The rate of temperature rise of the resin layer when the copper plate was brought into contact with the surface heater was at least 100 ° CZ min at least, although it varied depending on the location. The obtained foam was carefully peeled off from the copper plate, and the foam cell diameter and reflectivity were measured. The results are shown in Table 2.
[0060] 実施例 11 [0060] Example 11
図 2 (a)の銅板 1をバラバラにせずにそのまま銅板全面に、 PMMAを濃度約 15重 量%でクロ口ホルムに溶解し塗布した後、溶剤を揮発させることにより、 25個の PMM A層を形成した (膜厚;約 200 m)。次に、それをオートクレープ内に設置し、 40°C に設定した恒温槽に入れ、二酸ィ匕炭素を導入し 15MPaまで昇圧させた。そのまま 2 時間放置した後、オートクレープ内を脱圧し、銅板 1を大気圧下に取出した。 5分後、 銅板を 90°Cに設定された面状ヒータに 1分間接触させ、 PMMA榭脂を発泡させた。 面上ヒータに銅板を接触させたときの榭脂層の昇温速度は場所により異なるが、低く とも 100°CZ分以上であった。得られた発泡体を銅板力も丁寧に剥ぎ取り、発泡セル 径、反射率を測定した。結果を表 2に示す。 Fig. 2 (a) copper plate 1 is not disassembled, and PMMA is dissolved and applied in black mouth form at a concentration of about 15% by weight on the entire surface of the copper plate. (Film thickness; about 200 m). Next, it was placed in an autoclave, placed in a thermostatic chamber set at 40 ° C., carbon dioxide was introduced, and the pressure was increased to 15 MPa. After leaving it for 2 hours, the inside of the autoclave was depressurized and the copper plate 1 was taken out under atmospheric pressure. After 5 minutes, the copper plate was brought into contact with a planar heater set at 90 ° C for 1 minute to foam PMMA resin. The temperature rise rate of the resin layer when the copper plate was in contact with the surface heater was at least 100 ° CZ min. The obtained foam was carefully peeled off from the copper plate, and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
[0061] 実施例 12 図 2 (a)の銅板を 4枚用意し、それぞれの銅板全面に、特殊 PCを濃度約 20重量% でテトラヒドロフランに溶解し塗布した後、溶剤を揮発させることにより、特殊 PC榭脂 層を形成した (膜厚;約 200 m)。次に 4枚の榭脂層をそれぞれの銅板力も剥がし、 オートクレープ内に設置した。そして、室温で二酸化炭素を導入し 5MPaまで昇圧さ せた。そのまま 2時間放置した後、オートクレープ内を脱圧し、 4枚の榭脂層を大気圧 下に取出した。室温でのガス含浸のため、このときの温度ムラは極めて小さく ± 1°Cで あった。 5分後、 4枚の榭脂層を直列に並べ 200°Cに設定された面状ヒータを 5cmの 距離まで接近させ、 1分間放置することにより、特殊 PC榭脂を発泡させた。このときの 榭脂層の昇温速度は場所により異なるが、低くとも 100°CZ分以上であった。得られ た発泡体を 100個の製品に分割し、発泡セル径、反射率を測定した。結果を表 2〖こ 示す。 [0061] Example 12 Prepare four copper plates as shown in Fig. 2 (a). Dissolve and apply special PC in tetrahydrofuran at a concentration of about 20% by weight on the entire surface of each copper plate, and then evaporate the solvent to form a special PC resin layer. (Film thickness; approx. 200 m). Next, the four resin layers were peeled off from each copper plate and placed in an autoclave. Then, carbon dioxide was introduced at room temperature and the pressure was increased to 5 MPa. After leaving it for 2 hours, the pressure inside the autoclave was released, and the four resin layers were taken out under atmospheric pressure. Due to gas impregnation at room temperature, the temperature unevenness at this time was extremely small ± 1 ° C. After 5 minutes, four resin layers were arranged in series, and a planar heater set at 200 ° C was brought close to a distance of 5 cm and left for 1 minute to foam special PC resin. The temperature rising rate of the resin layer at this time was different depending on the location, but it was at least 100 ° CZ min. The obtained foam was divided into 100 products, and the foam cell diameter and reflectance were measured. The results are shown in Table 2.
[0062] 比較例 5 [0062] Comparative Example 5
360°Cで圧縮成形して PAZTiO榭脂組成物のシートを作成した。シートの反射率 A sheet of PAZTiO resin composition was prepared by compression molding at 360 ° C. Sheet reflectivity
2 2
の測定結果を表 2に示す。 Table 2 shows the measurement results.
[0063] 比較例 6 [0063] Comparative Example 6
360°Cで圧縮成形して PAZチタン酸カリウム榭脂組成物のシートを作成した。シー トの反射率の測定結果を表 2に示す。 A sheet of PAZ potassium titanate resin composition was formed by compression molding at 360 ° C. Table 2 shows the measurement results of the sheet reflectivity.
[0064] [表 1] [0064] [Table 1]
試料 製品毎の 樹膽層の ガス浸透条件 発泡条件 Sample Gas permeation condition of tree layer for each product Foaming condition
金属板 Metal plate
種類 Td CC) λ 50 (nm) 温度制御 形成方法 圧力 (MPa) 温度 (で) 温度ムラ (で) 昇温速度 (で/分) S度 (C) 加熱煤体 実施例 1 PET 390 320 不連統 あり 圧縮成形 15 160 ±3 160 - 実施例 2 PET 390 320 不連統 なし 圧縮成形 15 160 ±25 - 160 一 実施例 3 PET 390 320 連統 なし 圧縮成形 15 160 ±5 - 160 一 実施例 4 PESF 481 336 連統 なし 熱成形 15 40 ± 2 ≥100 190 面状ヒ-タ (接触) 実施例 5 特殊 PC 467 2Θ6 連統 なし 溶媒キャスト 15 40 ±2 270 面状ヒ-タ (接触) 実施例 6 特殊 PC 467 2Θ6 連統 なし 溶媒キ tスト 15 40 ±2 >100 200 面状ヒ-タ (接触) 実施例 7 特殊 PC 467 296 連統 なし 溶媒キャスト 15 40 ±2 >100 140 面状ヒ-タ (接 «0 比較例 1 特殊 PC 467 296 ½fe なし 溶媒キ Ϊスト 15 40 ±2 >100 330 面状ヒ-タ (接触) 比較例 2 特殊 PC 467 296 j Vt なし 溶媒キャスト 15 40 ±2 >100 100 面状!:-タ (接 ») 比較例 3 特殊 PC 467 296 連統 なし 溶媒キャスト 15 40 ±2 30-70 200 恒温槽 実施例 8 特殊 PC 467 296 速統 なし 港煤キャスト 5 40 ±2 扇 200 面状ヒ-タ (接触) 実施例 9 特殊 PI 370 361 統 なし 溶媒キャスト 15 40 ±2 薦 200 面状ヒ-タ (接触) 実施例 10 SRC 335 288 速統 なし 熟硬化 15 40 ±2 >100 200 面状ヒ-タ (接触) 比較例 4 非晶 PEEK 550 412 連統 なし ft成形 15 40 ±2 >100 120 面状ヒ-タ (接触) 実施例 1 1 廳 290 285 連統 なし 溶媒キ tスト 15 40 ±2 扇 90 面状ヒ-タ (接触) 実施例 12 特殊 PC 467 296 なし なし 溶媒キャスト 5 室温 ± 1 ≥100 200 面状 t-タ (接近: 5cm) 比較例 5 PA/Ti02 - - 圧縮成形 一 - - - - Type Td CC) λ 50 (nm) Temperature control Formation method Pressure (MPa) Temperature (in) Temperature unevenness (in) Temperature increase rate (in / min) S degree (C) Heating case Example 1 PET 390 320 Discontinuous Consistent Compression molding 15 160 ± 3 160-Example 2 PET 390 320 Discontinuity None Compression molding 15 160 ± 25-160 One Example 3 PET 390 320 Continuous None Compression molding 15 160 ± 5-160 One Example 4 PESF 481 336 Continuous None Thermoforming 15 40 ± 2 ≥100 190 Planar heater (contact) Example 5 Special PC 467 2Θ6 Continuous None Solvent cast 15 40 ± 2 270 Planar heater (contact) Example 6 Special PC 467 2Θ6 Continuous None Solvent text 15 40 ± 2> 100 200 Planar heater (contact) Example 7 Special PC 467 296 Continuous None Solvent cast 15 40 ± 2> 100 140 Planar heater (<0 Comparative example 1 Special PC 467 296 ½fe None Solvent cast 15 40 ± 2> 100 330 Sheet heater (Contact) Comparative example 2 Special PC 467 296 j Vt None Solvent cast 15 40 ± 2> 100 100 Planar!:-T (Contact ») Comparative Example 3 Special PC 467 296 Continuous None Solvent cast 15 40 ± 2 30-70 200 Thermostatic chamber Example 8 Special PC 467 296 Rapid None Minato cast 5 40 ± 2 Fan 200 Planar heater (contact) Implementation Example 9 Special PI 370 361 Series None Solvent cast 15 40 ± 2 Recommended 200 Planar heater (contact) Example 10 SRC 335 288 Rapid sequence None Mature curing 15 40 ± 2> 100 200 Planar heater (contact) Comparative Example 4 Amorphous PEEK 550 412 Continuous None ft molding 15 40 ± 2> 100 120 Planar heater (contact) Example 1 1 290 285 Continuous None Solvent text 15 40 ± 2 Fan 90 Planar Heater (contact) Example 12 Special PC 467 296 None None Solvent cast 5 Room temperature ± 1 ≥100 200 Planar t-ta (Approach: 5cm) Comparative example 5 PA / Ti02--Compression molding 1----
PA/チタン酸 PA / titanic acid
比較例 6 - - 圧縮成形 Comparative Example 6--Compression molding
カリウム緻維 - - - - - Potassium fiber-----
表 2] Table 2]
表 2から分力るように、光路長 250 mでの光線透過率が 50%に低下する波長が 4 OOnm以下の樹脂を、数平均セル径 ( μ m)が 50 μ m以下となるように発泡させた場 合は、 380nmでの反射率が 80%以上と高力つた。また、熱分解温度が 300°C以上 の榭脂を用いると、熱処理による 550nmでの反射率の低下を抑えることができた。ガ ス浸透温度ムラが製品間で ±20°C以内となるように制御した場合、又、加熱発泡時 の昇温速度を 50°CZ分以上に制御した場合は、製品間における 380nmでの反射 率のバラツキを ±5%以内に抑えることができた。 As shown in Table 2, the number average cell diameter (μm) is 50 μm or less for a resin whose wavelength is 4 OOnm or less, which reduces the light transmittance to 50% at an optical path length of 250 m. When foamed, the reflectivity at 380 nm was 80% or higher. In addition, when a resin having a thermal decomposition temperature of 300 ° C or higher was used, a decrease in reflectance at 550 nm due to heat treatment could be suppressed. Ga When the permeation temperature unevenness is controlled to be within ± 20 ° C between products, or when the heating rate during heating and foaming is controlled to 50 ° CZ or more, the reflectance between products at 380 nm The variation in the range was reduced to within ± 5%.
産業上の利用可能性 Industrial applicability
本発明の LED用反射体は、ディスプレイ、行き先表示板、車載照明、信号灯、非常 灯、携帯電話、ビデオカメラ等の、様々な OA機器、電気電子機器及び部品、自動車 部品等に使用できる。 The LED reflector of the present invention can be used for various office automation equipment, electrical and electronic equipment and parts, automobile parts, and the like such as displays, destination display boards, in-vehicle lighting, signal lights, emergency lights, mobile phones, and video cameras.
Claims
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
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| JP2004-307051 | 2004-10-21 | ||
| JP2004307051 | 2004-10-21 | ||
| JP2005-050500 | 2005-02-25 | ||
| JP2005050500A JP2006146123A (en) | 2004-10-21 | 2005-02-25 | LED reflector and manufacturing method thereof |
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| WO2006043462A1 true WO2006043462A1 (en) | 2006-04-27 |
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| PCT/JP2005/018857 Ceased WO2006043462A1 (en) | 2004-10-21 | 2005-10-13 | Reflector for led and method for producing the same |
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| WO (1) | WO2006043462A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008192880A (en) * | 2007-02-06 | 2008-08-21 | Nichia Chem Ind Ltd | LIGHT EMITTING DEVICE, ITS MANUFACTURING METHOD, AND LIGHT EMITTING DEVICE MOLDED BODY |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2013210493A (en) * | 2012-03-30 | 2013-10-10 | Furukawa Electric Co Ltd:The | Light reflecting member and manufacturing method thereof |
| JP2014015514A (en) * | 2012-07-06 | 2014-01-30 | Nitto Denko Corp | Porous thermoplastic resin sheet and production method of the same |
| WO2016166632A1 (en) * | 2015-04-16 | 2016-10-20 | Sabic Global Technologies B.V. | Reflective articles comprising a micro-cellular structure and characterized by improved (blue) led aging performance |
| WO2016166633A1 (en) * | 2015-04-16 | 2016-10-20 | Sabic Global Technologies B.V. | Method of using articles comprising a micro-cellular structure and having an improved (blue) led aging performance |
| JP6968601B2 (en) * | 2017-06-15 | 2021-11-17 | 信越ポリマー株式会社 | Manufacturing method of foam molded product |
| JP2021504523A (en) * | 2017-11-27 | 2021-02-15 | エボニック オペレーションズ ゲーエムベーハー | PESU particle foam for use in aircraft interiors |
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| JPH01500583A (en) * | 1987-01-27 | 1989-03-01 | イーストマン・コダック・カンパニー | Method and apparatus for producing microcytoplasmic foam plastic material with smooth integral skin layer |
| JPH06107841A (en) * | 1992-09-29 | 1994-04-19 | Asahi Chem Ind Co Ltd | Production of thermoplastic resin foam |
| JPH06506724A (en) * | 1991-04-05 | 1994-07-28 | マサチユーセツツ・インステイテユート・オブ・テクノロジー | Ultra-microporous foam material |
| WO1997001117A1 (en) * | 1995-06-23 | 1997-01-09 | The Furukawa Electric Co., Ltd. | Light reflection plate |
| JP2001300954A (en) * | 2000-04-24 | 2001-10-30 | Citizen Electronics Co Ltd | Method for manufacturing light guide plate |
-
2005
- 2005-02-25 JP JP2005050500A patent/JP2006146123A/en active Pending
- 2005-10-13 WO PCT/JP2005/018857 patent/WO2006043462A1/en not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01500583A (en) * | 1987-01-27 | 1989-03-01 | イーストマン・コダック・カンパニー | Method and apparatus for producing microcytoplasmic foam plastic material with smooth integral skin layer |
| JPH06506724A (en) * | 1991-04-05 | 1994-07-28 | マサチユーセツツ・インステイテユート・オブ・テクノロジー | Ultra-microporous foam material |
| JPH06107841A (en) * | 1992-09-29 | 1994-04-19 | Asahi Chem Ind Co Ltd | Production of thermoplastic resin foam |
| WO1997001117A1 (en) * | 1995-06-23 | 1997-01-09 | The Furukawa Electric Co., Ltd. | Light reflection plate |
| JP2001300954A (en) * | 2000-04-24 | 2001-10-30 | Citizen Electronics Co Ltd | Method for manufacturing light guide plate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008192880A (en) * | 2007-02-06 | 2008-08-21 | Nichia Chem Ind Ltd | LIGHT EMITTING DEVICE, ITS MANUFACTURING METHOD, AND LIGHT EMITTING DEVICE MOLDED BODY |
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